ðə dɪvˈɛləpmənt ʌvðə fˈɪlm mətˈɪɹiəl ɪz kˈæɹid ˈaʊt æt tˈɛmpɹɪtʃɚz ʌv ɚɹˈaʊnd sˈɛvənti fˈaɪv dᵻɡɹˈiːz ˈɛf twˈɛnti fˈoːɹ dᵻɡɹˈiːz sˈiː, mˌeɪkɪŋ ðə pɹˈɑːsɛs ɪŋkəmpˈæɾᵻbəl wɪððə mˈoːɹ mˈɑːdɚn sˈiː fˈoːɹɾi wˈʌn pɹˈɑːsɛs, wˌɪtʃ jˈuːzᵻz ɐ tˈɛmpɹɪtʃɚɹ ʌv wˈʌnhˈʌndɹɪd dᵻɡɹˈiːz ˈɛf θˈɜːɾi ˈeɪt dᵻɡɹˈiːz sˈiː.
The development of the film material is carried out at temperatures of around 75°F (24°C), making the process incompatible with the more modern C-41 process, which uses a temperature of 100°F (38°C).