θˈɪnfˈɪlm dˌɛpəzˈɪʃən ɪz ɐ pɹˈɑːsɛs ɐplˈaɪd ɪnðə sˌɛmɪkəndˈʌktɚɹ ˈɪndʌstɹi tə ɡɹˈoʊ ᵻlɛktɹˈɑːnɪk mətˈɪɹiəlz, ɪnðɪ ˈɛɹoʊspˌeɪs ˈɪndʌstɹi tə fˈɔːɹm θˈɜːməl ænd kˈɛmɪkəl bˈæɹiɚ kˈoʊɾɪŋz tə pɹətˈɛkt sˈɜːfɪsᵻz ɐɡˈɛnst kɚɹˈoʊsɪv ɛnvˈaɪɹənmənts, ɪn ˈɑːptɪks tʊ ɪmpˈɑːɹt ðə dɪzˈaɪɚd ɹᵻflˈɛktɪv ænd tɹænsmˈɪsɪv pɹˈɑːpɚɾiz tʊ ɐ sˈʌbstɹeɪt ænd ˈɛlswɛɹ ɪn ˈɪndʌstɹi tə mˈɑːdᵻfˌaɪ sˈɜːfɪsᵻz tə hæv ɐ vɚɹˈaɪəɾi ʌv dɪzˈaɪɚd pɹˈɑːpɚɾiz.
Thin-film deposition is a process applied in the semiconductor industry to grow electronic materials, in the aerospace industry to form thermal and chemical barrier coatings to protect surfaces against corrosive environments, in optics to impart the desired reflective and transmissive properties to a substrate and elsewhere in industry to modify surfaces to have a variety of desired properties.