fɔːɹ sˈʌtʃ pˈɜːpəsᵻz, fˈɪlmz ʌv tˈʌŋsʔn̩ sˈɪlɪsˌaɪd kæn biː plˈæzməˈɛtʃt jˈuːzɪŋ ˈiː.dʒˈiː. nˈaɪtɹədʒən tɹˈaɪflʊɹɹˌaɪd ɡˈæs.
For such purposes, films of tungsten silicide can be plasma-etched using e.g. nitrogen trifluoride gas.