ɡˈæliəm ɹˌoʊmən θɹˈiː tˈɛlʊɹɹˌaɪd hˈæzbiːn jˈuːzd ɪnðə pɹədˈʌkʃən ʌv spˈʌɾɚɹɪŋ tˈɑːɹɡɪts, jˈuːzd fɔːɹ sˌɛmɪkəndˈʌktɚ, kˈɛmɪkəl vˈeɪpɚ dˌɛpəzˈɪʃən sˌiːvˌiːdˈiː ænd fˈɪzɪkəl vˈeɪpɚ dˌɛpəzˈɪʃən pˌiːvˌiːdˈiː dɪsplˈeɪ ænd ˈɑːptɪkəl ˌæplɪkˈeɪʃənz.
Gallium(III) telluride has been used in the production of sputtering targets, used for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.