ᵻlˈɛktɹɑːnbˈiːm fˈɪzɪkəl vˈeɪpɚ dˌɛpəzˈɪʃən, ɔːɹ ˈɛbpvd, ɪz ɐ fˈɔːɹm ʌv fˈɪzɪkəl vˈeɪpɚ dˌɛpəzˈɪʃən ɪnwˌɪtʃ ɐ tˈɑːɹɡɪt ˈænoʊd ɪz bəmbˈɑːɹdᵻd wɪð ɐn ᵻlˈɛktɹɑːn bˈiːm ɡˈɪvən ˈɔf baɪ ɐ tʃˈɑːɹdʒd tˈʌŋsʔn̩ fˈɪləmənt ˌʌndɚ hˈaɪ vˈækjuːm.
Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum.