ðiːz ˈaɪɑːn sˈoːɹsᵻz ɑːɹ jˈuːzd fɔːɹ sˈʌbstɹeɪt ˈɛtʃɪŋ ænd klˈiːnɪŋ, spˈʌɾɚɹɪŋ ðə tˈɑːɹɡɪt ænd kəntɹˈoʊlɪŋ ðə mˌaɪkɹoʊstɹˈʌktʃɚɹ ʌvðə sˈʌbstɹeɪt.
These ion sources are used for substrate etching and cleaning, sputtering the target and controlling the microstructure of the substrate.