tˈʌŋsʔn̩ sˈɪlɪsˌaɪd lˈeɪɚz kæn biː pɹɪpˈɛɹd baɪ kˈɛmɪkəl vˈeɪpɚ dˌɛpəzˈɪʃən, ˈiː.dʒˈiː. jˈuːzɪŋ mˈɑːnoʊsˌɪleɪn ɔːɹ dˈɪklˌoːɹoʊsˌɪleɪn wɪð tˈʌŋsʔn̩ hˈɛksɐflˌʊɹɹaɪd æz sˈoːɹs ɡˈæsᵻz.
Tungsten silicide layers can be prepared by chemical vapor deposition, e.g. using monosilane or dichlorosilane with tungsten hexafluoride as source gases.