As of 2011, their high-end Twinscan NXT:1950i system is used for producing features down to 32 nanometres (and outlook for 22 nm) at up to 200 wafers per hour,[REF] using a water immersion lens and an argon fluoride laser that produces light at a wavelength of 193 nm.
ASML manufactures extreme ultraviolet lithography machines that produce 13.5 nm wavelength light.