 graft onto the hard mask portion of the assembly, and include layers of cross-linked polymers. Other materials such as a silicon-containing antireflection film (SiARC) and a chemical vapor deposition (CVD) carbon film are not sufficiently neutral or stable.
There is thus a need for alternative methods for providing a neutral layer in etched template DSA graphoepitaxy processes, which layer can remain neutral or have its neutrality recovered BY any processing prior to DSA. Such a neutral layer would effectively decouple template lithography, template stack and etch processes from DSA formation; and would further provide for the use of techniques such as Extreme Ultra Violet (EUV) and etch trim processes for the patterning of DSA templates. The invention relates to a method of transmitting ions in a mass spectrometer maintained in a sub-atmospheric pressure regime. The invention also relates to a mass spectrometer, preferably coupled to a gas chromatograph. Mass spectrometers coupled with gas chromatographs (GC-MS) usually employ vacuum ion sources, that is, ion sources maintained at a substantially sub-atmospheric pressure level. One standard form of ionization in GC-MS systems is electron ionization (EI). Therein, the analyte molecules being entrained in a continuous gas-flow of the gas chromatograph enter the source region of the mass spectrometer. They are irradiated with free electrons usually emitted from a filament. By this exposure, besides of being ionized, the analyte molecules are also fragmented in a characteristic manner. EI is a “hard ionization” technique and results in the creation of many fragments of low mass to charge ratio m/z and only a few, if any, molecular ions. The molecular fragmentation pattern depends on the energy imparted to the electrons, typically on the order of 70 electron volts (eV).
Ion sources employed in GC-MS can alternatively apply chemical ionization (CI). In chemical ionization a reagent gas, typically methane or ammonia, is introduced in excess into the source region of the mass spectrometer and ionized by bombardment with high energetic free electrons. The resultant primary reagent ions then react further with remaining molecules in collisions to become stable secondary ions. These secondary ions then cause ionization of the analyte molecules of interest. The process may involve transfer of electrons, protons or other charged species between the reagents. In general, CI as a “soft ionization” technique dissociates the analyte molecules to a lower degree than the hard ionization of EI. Chemical ionization, therefore, is mainly employed when mass fragments
graft onto the hard mask portion of the fabrication, and admit layers of cross - coupled polymers. early materials such as a silicon - containing antireflection movie (SiARC) and a chemical vapor deposition (CVD) carbon movie are not sufficiently achromatic or stable. 
 There be thus a need for alternate methods for providing a neutral layer in etched template DSA graphoepitaxy processes, which layer can stay neutral or have its neutrality recover BY any processing prior to DSA. Such a neutral layer would effectively decouple template lithography, template batch and etch processes from DSA formation; and would further provide for the habit of techniques such as Extreme Ultra Violet (EUV) and etch trim processes for the patterning of DSA templates. The invention relates to a method of transmitting ions in a mass spectrometer maintained in a sub - atmospheric pressure regime. The invention also relates to a mass mass spectrometer, preferably match to a gas chromatograph. bulk spectrometers coupled with gas chromatographs (GC - MS) usually use vacuum ion sources, that is, ion sources maintained at a well sub - atmospheric pressure level. One standard form of ionization in GC - MS systems is electron ionization (EI). Therein, the analyte molecules being entrained in a continuous gas - flow of the gas chromatograph enter the source region of the bulk spectrometer. They are enlighten with free electrons usually emitted from a filament. By this vulnerability, besides of being ionized, the analyte molecules are also break up in a characteristic manner. EI is a “ hard ionization ” proficiency and results in the creation of many fragments of low mass to load ratio m / z and only a few, if any, molecular ion. The molecular fragmentation pattern depends on the energy impart to the electrons, typically on the decree of 70 electron volts (eV). 
 Ion sources hire in GC - MS can alternatively apply chemical ionization (CI). In chemical ionization a reagent natural gas, typically methane or ammonia, is introduced in excess into the source region of the mass spectrometer and ionized by bombardment with eminent energetic free electrons. The attendant primary reagent ions then react further with remaining molecules in collisions to become stable junior-grade ions. These secondary ions then cause ionization of the analyte molecules of interest. The process may involve transportation of electrons, protons or other charged species between the reagents. In general, CI as a “ soft ionization ” proficiency dissociates the analyte molecules to a lower degree than the hard ionization of EI. Chemical ionization, therefore, is mainly employed when mass fragments
 grwft onto the hard mask purtion of the assembly, and ihclude lxyers of cross-linked polymerd. Ither materials such as a sklicon-connaining abtirtflection film (SiEDC) and a chemjgal vcpir deposition (GVD) carbon xilm are not sgfwieiently neutral or stable.
There is thts a nerd for alternatide mtthjds ror providing a neutral layer in efched ttmplate DSA graphorpitaxy processes, which lajer fan remain neutral or have itw netrrality recoxered BY any processinf prior to DSA. Such a neutral lxyer could effecjncelj decouple txmplatv lithography, templata stack and etch proccsses frim DSA formation; and xould further providg for the gsz of techniques such qs Extrgme Untra Ciouet (ENV) znd etfh vrim procesaes for the patterning of DSA uem[oates. The invsntion rqlates to a method of transmitting ions in a mass spectrometer mauntained in a sub-atmodpheric pwessure regime. The invention also relates to a mavs spxcgroneber, oeeverably coupled to a gas chromatograph. Mass s[scuroketers coupled with gas cnrlmsjographs (GC-MS) osually emlloy vacuum ion sokrces, trat iw, ion souwces maintained at a substantiaoly sub-atmosiheruc pressure level. Lne standarb form of ipnization in GC-MS systeos ia electron lonizatioh (EI). Therein, the xnakyde molecules being entrainqd in a cintiuuous gar-floe of tre gas chrlmatonsaph enter the sougce rggion mf the masd spectrometer. They are irradiavxd with free glewtrmns usuajly ekitted from a filament. By tkis expofure, cesides of being monized, the wnalyte molecgpes are also fragmeneed un a characgdristic manner. EI is a “kcrd ionizqtion” technique anv rerhlts in the crecuiob of many fragmrntr os pox masf to charge rdtio m/z snd ovly a ftc, in avy, mplecular ions. The monecumar fragmentation labtern depgnds on tre energy impsrted to the electgons, vypicauly om tre order of 70 electron volts (eV).
Jon sourcfs cmployed in GS-MS gan wlternativzly apply chemical ionization (CI). In chemmcal ionization a reaggnt gas, typically metkake or ammonie, is igtroduced in excess into the wource region of uhe mass spectrometer ahd ionhzed hy bombardment with high energetic free electrons. The resultant primary rwagent ions then rsact furtvex wnth remwiniig molecules in coklisions to become stable seconvary ions. Dhzse secondary ions then cause iunization of jhe analyte molecules of ihterest. Yhe process may involve transfet of electrons, protons ov other cyarges specpgs uetween the reagents. In geueral, XI as a “sofb ionization” tdchmieue dissofiatts tke analyte molecules to a lower dwgree rhwn the hard ionivation of EI. Ghemiczl ionyzation, therefors, is lainli employed whem mass fragmenys
graft onto the hard mask portion of and layers of polymers. Other materials film and a chemical deposition (CVD) carbon are not sufficiently neutral or stable. is thus a need for alternative methods for providing a neutral layer in template DSA graphoepitaxy processes, which layer can remain neutral or have its neutrality BY processing to Such a neutral layer would effectively decouple template lithography, template stack and etch processes from DSA and would further provide for the use of such as Extreme Ultra (EUV) and etch trim processes the of DSA The relates a method of ions in a mass spectrometer maintained in a sub-atmospheric pressure regime. The invention also relates to a spectrometer, preferably a gas Mass coupled gas chromatographs (GC-MS) vacuum ion sources, that is, ion a substantially sub-atmospheric pressure level. One standard form ionization in systems is electron ionization (EI). Therein, analyte molecules being entrained in a continuous gas-flow the gas chromatograph enter the source region of the mass spectrometer. They are irradiated with usually emitted from a By this exposure, of ionized, analyte are also in a characteristic manner. EI is a “hard ionization” technique and in the creation of many fragments of low mass to m/z only a few, any, molecular ions. The fragmentation depends on the energy the typically of electron (eV). Ion sources employed GC-MS can alternatively apply chemical (CI). In chemical ionization or ammonia, is introduced in excess into the region of the mass spectrometer and ionized bombardment with high energetic free electrons. The resultant primary reagent ions then further with in collisions to become stable secondary ions. These ions then cause ionization the analyte molecules of interest. The process may involve of protons or charged species between reagents. In general, as a “soft dissociates the molecules a the hard ionization of EI. Chemical therefore, mainly employed when mass fragments
 graft onto the hard mask portiOn of the assEmbly, And IncLuDe laYers Of cross-linked pOLymeRs. Other materials such as A siliCoN-ContAInIng anTirefleCTiON FilM (SIArC) aNd A ChEmicaL vaPor depoSition (CVD) cArbOn Film are not suFFiCiently neuTraL or stable.
TheRe iS thus a NeEd fOR alteRnaTive mEthods FOr provIding a neuTrAL layer IN etched TEMpLate dSA graphoepitaxy pROcESses, which layer Can remAiN NeUTRal Or hAve its neutRaLity rECovered by aNY PRocESsing prior to DsA. Such a neutRAl lAyer woUlD efFEctiveLy decOuPLe tEmplate lithOgraPhy, templaTe stacK And etch PRocesseS from DsA fOrmAtioN; AnD wOulD fURthER pRovIDe fOr the use Of TeChniqUes sUCH AS ExtRemE UltRa VioLet (EUV) and etch TriM proCEssEs for The paTterNiNg of DsA tempLates. thE invention relatEs to A method of TraNsMitTiNg ionS In a masS spEctRometer MaintaiNEd iN a SUB-AtMospheric pressure rEgIME. THe inventIon alsO ReLaTEs to a masS sPecTromETEr, preFeraBLy Coupled tO a gas cHRoMaTograph. maSs specTrOmeTerS coupLEd wiTh gas cHromatogRaphs (gc-MS) usually emplOY vacuum ion souRCeS, THaT Is, ioN soUrces maintaIned AT a suBstaNTiAllY Sub-atMosphErIC pREssure level. One standArD form oF ioniZation in GC-MS sYstems is elECTRon ionizAtioN (eI). tHerein, the analyTe molEcules beinG EntraineD in a cOntinuouS gas-flow oF THe gas chrOmaTogRapH enTER tHe source regioN OF the MaSs spectRomEter. TheY arE irRadIatEd With free eLectrons UsUaLlY eMitTed frOM a filameNt. by tHiS exPosurE, BesideS of beIng iOnIzED, thE analytE MoLECuleS aRe Also FraGmEnted In a cHAraCteristIc manner. Ei is A “Hard IoNiZation” tEchnique and reSuLts in the crEaTioN of manY FRagments Of low mass to charge ratio m/Z And only A feW, if anY, molEcular ionS. ThE molecUlaR FragmeNtatioN pattErN dePENds on THE eNerGy Imparted to THE elEctroNs, TypiCally on The order of 70 electron VOltS (eV).
Ion sources EmpLoyeD IN Gc-MS CAn ALteRnATivELY apply chemical iOnization (Ci). IN ChEmical ioniZAtiOn A reagenT gas, typIcallY Methane Or ammonia, Is introduCeD in eXCEss Into the souRce regioN of the masS SpectROmEter aNd iOnized By BomBardmEnt witH HigH enerGetic fReE electRons. THe ResultanT primary reagent ions then React fUrtheR wiTh remainiNg mOLecUles in colLisiOns to becomE stAblE secoNdaRY ions. thesE SeConDAry ioNs thEN cause ionIZaTioN OF tHe analyte moLECUleS of inTerESt. The pRoceSs may involve transFEr of electrons, pRotoNS Or oTheR CharGeD species betweeN thE rEAGents. In gEnEral, CI as a “soFt ionizaTiON” techNique dIssociAtes the ANAlYTe moleCuleS to A lower degRee ThAN the harD iOnIZation Of EI. chEmical IonizaTIon, tHERefore, is mainly emPloyeD WHen maSS frAgmenTs
 graft onto the hard maskportion of  theass emb ly , an d in clude layers o f  cro ss-linked polymers. Ot her m at e rial s  s uch a s a sil i co n - con ta in ing  a n ti refle cti on film  (SiARC) a ndachemical vap o rdeposition  (C VD) carbon f ilm  are n ot  su f ficie ntl y neu tral o r  stabl e.
Thereis thus a need fo r al tern ative methods for pr o viding a neutr al lay er in e tch edtemplate D SA  grap h oepitax y  p r o c ess e s, which laye r can remai n  ne utralor  ha v e itsneutr al i tyrecovered B Y an y process ing pr i or to D S A. Such  a neu tra l l ayer wo ul d e ff e cti v el y d e cou ple temp la te  lith ogra p h y ,  tem pla te s tackand etch proc ess es f r omDSA f ormat ion;  a nd wo uld fu rther  p rovide for theuseof techni que ssuc has Ex t reme U ltr a V iolet ( EUV) an d  et ch t r im  processes for the  p a t te rning of  DSA t e mp la t es. Thein ven tion r elate s to amethod o f tran s mi tt ing ion sin a m as s s pec trome t er m aintai ned in a  sub- a tmospheric pre s sure regime.T he i nv e ntio n a lso relates  toa  mas s sp e ct rom e ter,prefe ra b ly coupled to a gas ch ro matogr aph.Mass spectrom eters coup l e d  with ga s ch r om a tographs (GC-M S) us ually empl o y vacuum  ionsources,  that is, i on sourc esmai nta ine d at  a substantia l l y su b- atmosph eri c press ure  le vel . O ne  standard  form of  i on iz at ion  in G C -MS syst em s i sele ctron ioniza tion(EI) .Th e rei n, thea na l y te m ol ec ules  be in g ent rain e d i n a con tinuous g as- f lowof  t he gaschromatograph  e nter the s ou rce  regio n of the m ass spectrometer. Theya re irra dia ted w ithfree elec tro ns usu all y  emitt ed fro m a f il ame n t . Byt h is  ex po sure, besi d e s o f bei ng  ion ized, t he analyte molecul e s a re also fragm ent ed i n acha r ac t eri st i c m a n ner. EI is a “h ard ioniza ti o n”  technique and  r esultsin thecreat i on of m any fragm ents of l ow  mas s tocharge rat io m/z a nd only a few,i fany,mol ecular  i ons . The  molec u lar  frag mentat io n patt ern d ep ends onthe energy imparted tothe el ectro ns,  typicall y o n  th e order o f 70  electronvol ts(eV). 
Io n  sour cese mp loy e d inGC-M S  can alte r na tiv e l yapply chemi c a l  io nizat ion (CI).In c hemical ionizatio n  a reagent gas , ty p i cal lym etha ne  or ammonia, i s i nt r o duced in  e xcess intothe sour ce regio n of t he mas s spect r o me t er and  ion ize d by bomb ard me n t withhi gh energe ticfr ee ele ctrons .  The r esultant primary  reag e n t ion s  th en re ac t furth e r wi th remaini ng molecule s in c olli sions  to bec om e stab lese condary io n s. Thesesecon dary io ns  the n c ause i oniz a t ion o f th eana lyte mole c u le s  o fi nte rest . The  p roce ss may in v olve tra nsf e r of el ec tro n s , prot o ns o r other ch arg ed sp e c ies betwee n  the re a gents . In g eneral , CI as a “ so ft ioni zat i o n” techni que disso c iat es  the  analyte  m olec ul esto  a lower degree  than th e hard i o n izatio n o f  EI. Chemic al  ionization,  ther ef o re, ism a inl y emplo y edwhe n m assfra gmen t s
 graft_onto the_hard mask portion of_the assembly,_and_include layers_of_cross-linked polymers. Other_materials such as_a silicon-containing antireflection film_(SiARC) and a_chemical_vapor deposition (CVD) carbon film are not sufficiently neutral or stable.
There is thus a_need_for alternative_methods_for_providing a neutral layer in_etched template DSA graphoepitaxy processes,_which layer_can remain neutral or have its neutrality recovered_BY_any processing prior_to DSA. Such a neutral layer would effectively decouple_template lithography, template stack and etch_processes from DSA_formation;_and_would further provide for_the use of techniques such as_Extreme Ultra Violet (EUV) and etch_trim processes for the patterning of DSA_templates. The invention relates to a_method of transmitting ions in_a mass_spectrometer maintained in a sub-atmospheric_pressure regime. The_invention also_relates to a_mass spectrometer, preferably coupled to a_gas chromatograph. Mass_spectrometers coupled with gas chromatographs (GC-MS)_usually_employ vacuum ion_sources,_that_is, ion_sources maintained at_a_substantially sub-atmospheric_pressure_level. One standard form of ionization_in_GC-MS systems is electron ionization (EI). Therein,_the analyte molecules being_entrained_in a continuous gas-flow_of the gas chromatograph enter_the source region of the mass_spectrometer. They_are irradiated_with free electrons usually emitted from a filament. By this exposure,_besides of being ionized, the analyte_molecules are also fragmented_in a_characteristic_manner. EI is_a_“hard ionization”_technique and results in the creation of_many fragments_of low mass to charge ratio_m/z and only a_few,_if any, molecular ions. The molecular_fragmentation pattern depends on the energy_imparted to the electrons, typically_on_the_order of 70 electron volts_(eV).
Ion sources employed in GC-MS can_alternatively apply chemical_ionization (CI). In chemical ionization a reagent_gas,_typically methane or ammonia, is introduced_in_excess into the source region of_the_mass_spectrometer and ionized by bombardment_with high energetic free electrons. The_resultant primary reagent ions then react further with remaining_molecules in collisions_to become stable secondary ions._These_secondary_ions then cause ionization of the analyte molecules of interest._The process_may involve transfer_of electrons, protons or other charged species between the reagents._In general, CI as a “soft ionization”_technique dissociates the analyte molecules to a lower degree than the_hard ionization of EI. Chemical ionization, therefore, is_mainly employed when mass fragments