 second pole tip should be well-defined in order to produce well-defined written tracks on the rotating disk. Poor definition of the second pole tip may result in overwriting of adjacent tracks. A well-defined second pole tip should have parallel planar side walls which are perpendicular to the ABS. In most write heads the second pole tip is formed along with the yoke after the formation of the first insulation layer, the coil layer and the second and third insulation layers. Each insulation layer includes a hard-baked photoresist having a sloping front surface.
After construction, the first, second and third insulation layers present front sloping surfaces which face the ABS. The ZTH defining insulation layer rises from a plane normal to the ABS at an angle (apex angle) to the plane. The sloping surfaces of the hard-baked resist of the insulation layers exhibit a high optical reflectivity. When the second pole tip and yoke are constructed, a thick layer of photoresist is spun on top of the insulation layers and photo patterned to shape the second pole tip, using the conventional photo-lithography technique. In the photo-lithography step, ultraviolet light is directed vertically through slits in an opaque mask, exposing areas of the photoresist which are to be removed by a subsequent development step. One of the areas to be removed is the area where the second pole piece (pole tip and yoke) are to be formed by plating. Unfortunately, when the location of the flare point is placed on the sloping surfaces of the insulation layers, ultraviolet light is reflected forward, toward the ABS, into photoresist areas at the sides of the second pole tip region. After development, the side walls of the photoresist extend outwardly from the ultraviolet pattern, causing the pole tip to be poorly formed after plating. This is called "reflective notching". As stated hereinabove this causes overwriting of adjacent tracks on a rotating disk. It should be evident that, if the flare point is recessed far enough into the head, the effect of reflective notching would be reduced or eliminated since it would occur behind the sloping surfaces. However, this solution produces a long second pole tip which quickly reduces the amount of flux reaching the recording medium.
The high profile of the insulation stack causes another problem when the photoresist is spun on a wafer. The thickness of the resist in the pole tip region is excessively high. During the light exposure step the light progressively scatters like light in a body of water causing poor resolution during the light exposure step.

second pole tip should be well - defined in order to grow well - define written tracks on the rotating magnetic disk. Poor definition of the second pole gratuity may result in overwriting of adjacent track. A well - defined second pole peak should have parallel planar side wall which are perpendicular to the ABS. In most write heads the second pole gratuity is formed along with the yoke after the formation of the beginning insulation layer, the coil layer and the second and third insulation layer. Each insulation layer includes a hard - baked photoresist give birth a sloping front surface. 
 After construction, the first, second and third insulation layer confront front sloping surfaces which face the ABS. The ZTH defining insulation layer rises from a airplane normal to the acrylonitrile-butadiene-styrene at an angle (apex angle) to the airplane. The squelch surface of the hard - baked resist of the insulation layers exhibit a high optical reflectiveness. When the second pole tip and yoke are constructed, a thick layer of photoresist is spin on top of the insulation layers and photo model to shape the second perch tip, using the conventional photo - lithography technique. In the photograph - lithography step, ultraviolet light is directed vertically through slits in an opaque mask, exposing areas of the photoresist which are to be removed by a subsequent development footfall. One of the areas to be absent is the area where the second pole part (pole gratuity and yoke) are to be shape by plating. Unfortunately, when the location of the flare item is placed on the sloping surface of the insulation layer, ultraviolet light is chew over forward, toward the ABS, into photoresist areas at the sides of the second pole gratuity region. After development, the english walls of the photoresist extend outwardly from the ultraviolet convention, causing the pole tip to be ill formed after plating. This is called " reflective notching ". As stated hereinabove this causes overwriting of adjacent tracks on a rotate phonograph record. It should be evident that, if the flare point is recessed far enough into the head, the effect of reflective notching would be reduce or eliminated since it would occur behind the sloping surface. However, this solution produces a long second pole tip which quickly abridge the amount of flux reaching the recording metier. 
 The high profile of the insulating material stack causes another problem when the photoresist is spun on a wafer. The thickness of the resist in the pole tip region is excessively high. During the light exposure step the light progressively scatters like light in a body of water causing poor solution during the light exposure step.
 sefond pole tip should be dell-defined in order tm prodhce well-aefined written tracks on thx roratint disk. Poor definition of the svcond polw tik may result in otsrwritiky of zfjacznv tracks. A well-cefined sewond pole tip vhuupd have parallel planar side walls rhich ate perpendicular to uhe ABS. Pn most write heads the second lole tik is formed along eith the yoke after the fogmatlon of the first ijsulation lqyer, rhe coil laydr and the second and jhird insulation layers. Each insjlatipn layer ibcoudfv a hard-bakxd phonoresist havikb a slmping ftont surface.
Afber cmnsrruction, the first, serond and third insulwtion layara present front sooping vurfdces qhizh rare fhe ABD. Tie ZTH defihing insularion layer rises frpm q plane normam to tre ABS at an angle (apex angle) to the plant. The sloping surfaces of thw hard-baked resist of the insujation layers exhibit a high optical reflectivity. When ghe sccona plle tip and yoke are constructed, a thick layew og ihotoresist is spmn on top of the imsklsjion layers ana photo pztterned to shape hhe secjnd pile tip, ufing the conventional photo-lithigraphy techuiqye. In the photo-litkography ste', ultrsviolrt light is directed vexticalmy through dlits in zv opaque mask, exoospng dreas of the photoresist wrich are vo be removea by a subfequent degelopment step. One of thf arecs to be removef is the area where the second 'ple piece (poke tii and yokz) are bo be formed by plating. Unforjunately, chen tfe locatioh of thx flare poine is placed ot the sloping surfacef of the insulagkon layers, ulttaviolet light is rwflected forward, tpwatd the ABS, into pkuuoeesist areas ay tfe fifex jx the second pold tkl regkon. Afttx dcveuopmrnt, the side walls ox ths photoresist extemd outwardoy from ehe ultraviolrt pattern, causing the 'ole tmp to ne koorly formed after plating. Thia is callfd "veflective noechikg". Af stated hzreinabove this causes overwriting of adoacent tracks on a rotaring disk. It should ne evident tiat, if the flara point is recessed dar enough into tme head, the effect of deflecdive jotching would be reduced or eliminated since it would occur behind the sooping surfaces. Hosevet, thiv fplutiog prlvuces a long secomd pole tip which quickly reducxs the amognc of flux reaching the recordone medium.
The hkgh profile of the insulztion stsck causes another problem when the photoresist is spun on a wader. Tge thibinxss of the resist in the pmle tup regiin id excessively hibh. During tje lmghc exposure step the light progreswively sfatters like ligit in a body uf wajer causyng poor resolutjon skring the light exlosure step.

second pole tip should be well-defined in produce written tracks the rotating disk. pole may result in of adjacent tracks. well-defined second pole tip should have planar side walls which are perpendicular to the ABS. In most write heads second pole tip is formed along with the yoke after the formation of first layer, coil and the second and third insulation layers. Each insulation layer includes a hard-baked photoresist having a front surface. After construction, the first, second and insulation layers present front surfaces which face the ABS. ZTH insulation layer from plane to the ABS an angle (apex angle) to the plane. The sloping surfaces of the hard-baked resist of the insulation exhibit a reflectivity. When second tip yoke are constructed, layer of photoresist is spun on insulation layers and photo patterned to shape the pole tip, the conventional photo-lithography technique. In the step, ultraviolet light is directed vertically through slits an opaque mask, exposing areas of the photoresist which are to be removed by a step. One of the to be removed the where second piece (pole and yoke) are to be formed by plating. Unfortunately, when the of the flare point is placed on the sloping surfaces insulation ultraviolet light is forward, toward the ABS, photoresist at the sides of pole region. side of photoresist extend outwardly from ultraviolet pattern, causing the pole to be poorly formed "reflective notching". As stated hereinabove this causes overwriting adjacent tracks on a rotating disk. It be evident that, if the flare point is recessed far enough into head, the reflective notching would be reduced or eliminated since would occur behind the surfaces. However, this solution produces a long second pole which reduces the of flux reaching recording medium. The profile of the causes another when photoresist a wafer. The thickness of the in pole tip region is excessively During exposure step the light progressively scatters like light in a body of water causing poor the light exposure step.
 second pole tip should be well-Defined in oRder tO prOduCe Well-DefiNed written tracKS on tHe rotating disk. Poor defiNitioN oF The sECoNd polE tip may REsULT in OvErWriTiNG oF adjaCenT tracks. a well-definEd sEcOnd pole tip shOUlD have paralLel Planar side waLls Which aRe PerPEndicUlaR to thE ABS. In MOst wriTe heads thE sECond poLE tip is fORMeD aloNg with the yoke afteR ThE Formation of the First iNsULaTIOn lAyeR, the coil laYeR and tHE second ANd THIRd iNSulation layerS. Each insulaTIon Layer iNcLudES a hard-Baked PhOTorEsist having A sloPing front SurfacE.
after coNStructiOn, the fIrsT, seCond ANd ThIrd InSUlaTIoN laYErs Present fRoNt SlopiNg suRFACEs whIch Face The ABs. The ZTH definiNg iNsulATioN layeR riseS froM a Plane Normal To the aBs at an angle (apex aNgle) To the planE. ThE sLopInG surfACes of tHe hArd-Baked reSist of tHE inSuLATIoN layers exhibit a higH oPTIcAl reflecTivity. wHeN tHE second pOlE tiP and YOKe are ConsTRuCted, a thiCk layeR Of PhOtoresiSt Is spun On Top Of tHe insULatiOn layeRs and phoTo patTErned to shape thE Second pole tip, USiNG ThE ConvEntIonal photo-lIthoGRaphY tecHNiQue. iN the pHoto-lItHOgRAphy step, ultraviolet LiGht is dIrectEd vertically tHrough slitS IN An opaque Mask, EXpOSing areas of the PhotoResist whicH Are to be rEmoveD by a subsEquent devELOpment stEp. ONe oF thE arEAS tO be removed is tHE Area WhEre the sEcoNd pole pIecE (poLe tIp aNd Yoke) are to Be formed By PlAtInG. UnFortuNAtely, wheN tHe lOcAtiOn of tHE flare Point Is plAcEd ON thE slopinG SuRFAces Of ThE insUlaTiOn layErs, uLTraViolet lIght is refLecTEd foRwArD, toward The ABS, into phoToResist areaS aT thE sides OF The seconD pole tip region. After deveLOpment, tHe sIde waLls oF the photoResIst extEnd OUtwardLy from The ulTrAviOLEt patTERn, CauSiNg the pole tIP To bE poorLy FormEd after Plating. This is calleD "RefLective notchiNg". AS staTED hEreINaBOve ThIS caUSEs overwriting of Adjacent trAcKS oN a rotating DIsk. it Should bE evidenT that, IF the flaRe point is Recessed fAr EnouGH IntO the head, thE effect oF reflectiVE notcHInG woulD be ReduceD oR elIminaTed sinCE it Would Occur bEhInd the SlopiNg Surfaces. however, this solution prodUces a lOng seConD pole tip wHicH QuiCkly reducEs thE amount of fLux ReaChing The REcordIng mEDiUm.
THE high ProfILe of the inSUlAtiON StAck causes anOTHEr pRobleM whEN the phOtorEsist is spun on a wafER. The thickness oF the RESisT in THe poLe Tip region is excEssIvELY high. DurInG the light exPosure stEp THe ligHt progRessivEly scatTERs LIke ligHt in A boDy of water CauSiNG poor reSoLuTIon durIng tHe Light eXposurE Step.

 second pole tip should be  well-defi ned i n o rde rto p rodu ce well-define d  wri tten tracks on the rot ating  d i sk.P oo r def inition of t hese co ndpo l etip m ayresultin overwri tin gof adjacentt ra cks. A wel l-d efined secon d p ole ti psho u ld ha veparal lel pl a nar si de wallswh i ch are perpend i c ul ar t o the ABS. In mos t  w r ite heads thesecond  p o le t ipisformed alo ng  with the yok e  a f t e r t h e formation o f the first ins ulatio nlay e r, the  coil  l a yer  and the se cond  and thir d insu l ation l a yers. E ach in sul ati on l a ye rinc lu d esa  h ard - bak ed photo re si st ha ving a s lopi ngfron t sur face.
After c ons truc t ion , the  firs t, s ec ond a nd thi rd in su lation layers p rese nt frontslo pi ngsu rface s  which  fa cethe ABS . The Z T H d ef i n i ng  insulation layerri s e sfrom a p lane n o rm al to the A BS  at  ana n gle ( apex an gle) tothe pl a ne .The slo pi ng sur fa ces  of  theh ard- bakedresist o f the insulation lay e rs exhibit ah ig h op t ical  re flectivity.  Whe n  the  sec o nd  po l e tip  andyo k ea re constructed, a t hi ck lay er of  photoresistis spun on t o p of the  ins u la t ion layers and  phot o patterne d  to shap e the  secondpole tip, u sing the  co nve nti ona l ph oto-lithograp h y  tec hn ique. I n t he phot o-l ith ogr aph ystep, ult raviolet  l ig ht  i s d irect e d vertic al lyth rou gh sl i ts inan op aque  m as k , e xposing ar e a s of  t he  pho tor es ist w hich are  to beremoved b y a subs eq ue nt deve lopment step.  O ne of thear eas  to be r emoved i s the area where the se c ond pol e p iece(pol e tip and  yo ke) ar e t o  be fo rmed b y pla ti ng. U nfort u n at ely ,when the l o c ati on of  t he f lare po int is placed on t h e s loping surfac esof t h e  i nsu l at i onla y ers , ultraviolet lig ht is refl ec t ed  forward,t owa rd  the AB S, into  phot o resistareas atthe sides  o f th e sec ond pole t ip regio n. Afterd evelo p me nt, t heside w al lsof th e phot o res ist e xtendou twardl y fro mthe ultr aviolet pattern, causin g thepoletip  to be po orl y  fo rmed afte r pl ating. Thi s i s c alled  "r e flect iven ot chi n g". A s st a ted herei n ab ove t hi s causes ov e r w rit ing o f a d jacent  tra cks on a rotating disk. It shoul d be e vid ent that ,if the flare p oin ti s  recesse dfar enoughinto the  h e ad, t he eff ect of  reflec t i ve notchi ng w oul d be redu ced  o r  elimin at ed sinceit w ou ld occ ur beh i nd t h e  sloping surface s. Ho w e ver,t his  solu ti on prod u cesa long sec ond pole ti p whic h qu ickly  reduce sthe am oun tof flux re a ching the  reco rding m ed ium. 
Th e high  pro f i le of  the  i nsu lation st a c kc au se s  an othe r pro bl em w hen the p h otoresis t i s  spun o na w a f er. Th e  t h i ckness ofthe  resi s t  in the po l e ti p  r e gionis exc essive ly high .  Du ri ng thelig h t  exposure  step the lig ht  pro gressive ly  sca tt ers  l ike light in abody ofwater ca u s ing po orr esol u tion d ur ing the ligh t exp os u re step . 
 second_pole tip_should be well-defined in_order to_produce_well-defined written_tracks_on the rotating_disk. Poor definition_of the second pole_tip may result_in_overwriting of adjacent tracks. A well-defined second pole tip should have parallel planar side_walls_which are_perpendicular_to_the ABS. In most write_heads the second pole tip_is formed_along with the yoke after the formation of_the_first insulation layer,_the coil layer and the second and third insulation_layers. Each insulation layer includes a_hard-baked photoresist having_a_sloping_front surface.
After construction, the_first, second and third insulation layers_present front sloping surfaces which face_the ABS. The ZTH defining insulation layer_rises from a plane normal to_the ABS at an angle_(apex angle)_to the plane. The sloping_surfaces of the_hard-baked resist_of the insulation_layers exhibit a high optical reflectivity._When the second_pole tip and yoke are constructed,_a_thick layer of_photoresist_is_spun on_top of the_insulation_layers and_photo_patterned to shape the second pole_tip,_using the conventional photo-lithography technique. In the_photo-lithography step, ultraviolet light_is_directed vertically through slits_in an opaque mask, exposing_areas of the photoresist which are_to be_removed by_a subsequent development step. One of the areas to be removed_is the area where the second_pole piece (pole tip_and yoke)_are_to be formed_by_plating. Unfortunately,_when the location of the flare point_is placed_on the sloping surfaces of the_insulation layers, ultraviolet light_is_reflected forward, toward the ABS, into_photoresist areas at the sides of_the second pole tip region._After_development,_the side walls of the_photoresist extend outwardly from the ultraviolet_pattern, causing the_pole tip to be poorly formed after_plating._This is called "reflective notching". As_stated_hereinabove this causes overwriting of adjacent_tracks_on_a rotating disk. It should_be evident that, if the flare_point is recessed far enough into the head, the_effect of reflective_notching would be reduced or_eliminated_since_it would occur behind the sloping surfaces. However, this solution_produces a_long second pole_tip which quickly reduces the amount of flux reaching the_recording medium.
The high profile of the insulation_stack causes another problem when the photoresist is spun on a_wafer. The thickness of the resist in the_pole tip region is excessively high. During_the light exposure step_the_light progressively scatters like light in a_body_of_water_causing poor resolution_during the light_exposure step.
