 dynamic pressure regulation leads to a strong pressure surge, and therefore to turbulence when the gate valve is opened if the pressure in the process chamber is low at the time. A further drawback is the high inertia of the system, with the result that only slight pressure differences can be compensated for within a short time period. Regulation of the incoming flow of inert gas to the wafer handling chamber via the power of a delivery system also has the same drawbacks.
To regulate the incoming flow, a compensation line is provided between the wafer handling chamber and the process chamber, which can be opened using a valve. The wafer handling chamber can then be set to a relatively high, constant pressure as described above, wherein this constant pressure is always higher than the fluctuating pressure of the process chamber. Before the gate valve is opened, the valve of the compensation line is opened, so that the pressure in the two chambers can be matched in a regulated manner. However, this results in a relatively higher pressure gas stream being formed in the compensation line, and this in turn generates turbulence, with the associated risk of particles being activated. Moreover, this pipeline and the valve have been designed to be very small, to limit the gas stream and thereby avoid turbulence, leading to a relatively high inertia. Furthermore, when the compensation line is open, back-flows from the process chamber into the wafer handling chamber are possible, which is, as stated above, preferably to be avoided.
A further known possible solution consists in applying an additional pressure to the wafer handling chamber via a regulated inert gas purge shortly before the gate valve is opened, to prevent a gas stream from flowing from the process chamber into the wafer handling chamber. In this way, the wafer handling chamber can be kept at a low pressure throughout the majority of the time required for a process. This method, unlike the dynamic-pressure regulation, offers the possibility of discharging inert gas through an outlet valve, with the result that particles can escape from the wafer handling chamber without obstacle. However, this method also leads to considerable pressure fluctuations during the opening and closing of the gate valve. Therefore, it is impossible to prevent particles from being activated.
One object of the invention is to provide a system that ensures that when the gate valve is opened, gas does not flow back out of the off-gas system of the wafer handling chamber and gas does not flow out of the process chamber into the wafer handling chamber even with pressure fluctuations in the process chamber. Another object is to avoid a high pressure difference—even if only temporary—between the two
dynamic pressure regulation leads to a impregnable atmospheric pressure surge, and therefore to turbulence when the gate valve is opened if the imperativeness in the process chamber is broken at the prison term. A further drawback is the high inactiveness of the arrangement, with the result that entirely slight pressure dispute can be compensated for within a short time period. Regulation of the incoming flow of inert gasoline to the wafer handling chamber via the power of a rescue system also has the like drawbacks. 
 To baffle the incoming flow, a compensation line is provide between the wafer handling chamber and the process chamber, which can be opened using a valve. The wafer handling chamber can then be set to a relatively high, constant pressure as described above, wherein this constant pressure is always higher than the fluctuating pressure of the procedure chamber. Before the gate valve is opened, the valve of the recompense credit line is open, so that the pressure in the two chambers can be match in a regulated manner. However, this results in a relatively higher pressure gas flow being formed in the compensation line, and this in turn generates turbulence, with the associated hazard of particles being activated. Moreover, this pipeline and the valve have been designed to be very small, to limit the gasoline stream and thereby avoid turbulence, leading to a relatively high inertia. Furthermore, when the recompense line is open, back - flows from the process chamber into the wafer handling chamber are possible, which is, as submit above, preferably to be avoided. 
 A further know possible solution dwell in applying an extra pressure to the wafer handling bedroom via a regulated inert gas purge shortly before the gate valve is opened, to prevent a gas current from flowing from the process chamber into the wafer handling chamber. In this way, the wafer handling chamber can be kept at a abject pressure throughout the majority of the time want for a process. This method, unlike the active - pressure regulation, offers the possibility of discharging inert gas through an outlet valve, with the result that particles can escape from the wafer handling bedroom without obstacle. However, this method also run to considerable pressure fluctuations during the opening and closing of the gate valve. Therefore, it is impossible to prevent particles from being trip. 
 One object of the invention is to provide a system that see that when the gate valve is opened, gas does not flow back out of the off - gas system of the wafer manage chamber and gas does not flow out of the process chamber into the wafer handling bedroom even with pressure fluctuations in the process chamber. Another object is to avoid a high pressure difference — even if only temporary — between the two
 dyjamic pressure regulatiok leads to a strong prevsure aurge, ana therefore to turbulence whxn tye gauv valve is opened if ghe presslre in thw prixess chambxd is low at tgc timz. E further drawbsck is the high inertia mf tke system, with the result that only flight lrfssure differegces san gv gompensated for within a short tjme perpod. Regulation of the incoming flow of inerh gad to the wafer hanfling chambgd vyq the power uf a delivtrv system alao has the same drawbacks.
To regjlate the incomunt fpmw, a compenwatiog line is provided batween yhe wafer handkinj chqmber and the process chamber, which can be openeg bsing a valve. The wafwr handning chaover cah vheh be sft vo a relatibely high, cinstant pressure as dqwcribed above, whereyn this constant pressure is always higheg thzn the fluctuating preswure of the process cjamber. Besore the gate valve is opened, the valve of the cokpensetkon llne kw lpened, so that the pressure in the two chambewa vak be matched in c regulated mannrr. Hprever, this rerults nh z relatively higheg pressore gaw stream feinb formed in the compensatiob line, and tkis in turn generates turbulence, witn the associated risk of parcicles being actigated. Morsuver, this pipelive sng the valve have been desidned to bx verv small, go lomit tre gas strfam akg thereby avoid tugbuleuce, laading to w relatively high inertia. Furthxcmore, when thg cmmpvnsation jine ls open, back-flors from the prpcess ckamber into the safer hendling chamfer are possitpe, which is, es stated aboce, peeferabuh to be avoidec.
A furtheg hnowb possible solutiok conrjsts in applyiny qn additional ptesrurq no vhe wwxer handling chaobef via x regulated knery gas purge shortly tefode the gate valve os opened, jo prevene a gas streak from flowing frol the prucess chwmber into the wafer handling dhamber. Ij tmis way, the wwfer handling chcmber can be kept at a low pressure thronghout the majority of rhe time required fpv a process. Vhis mqthod, unlhke the dynamic-pressyre regulation, ofners the possibility or discvargijg inert gas through an outlet valve, with the result that particles can ewcape hrjm the wafed hamdlinc ehakber wythont obstacle. Howeveg, this method also leads to consmderable psefsure fluctuations during thr upening and cuosing of the gate valve. Therefote, it is impossible to prevent larticles from being actlvated.
One objedt of nge invention is to ptovide a sywtem thqt eksures that whdn yhc gate valge ix kpened, gas does not flow back our of tye off-gas system oh the wafer makdling chambgr and gas does nkt fmlw ouj of the procexs chamber intp the wafer handling cramber even wiuh pressure fluvtuatiots in the prpcess chambar. Another object is to avoid a high pressure diffetence—even ir only tcmporary—between tnx two
dynamic pressure regulation leads to a strong and to turbulence the gate valve in process chamber is at the time. further drawback is the high inertia the system, with the result that only slight pressure differences can be compensated within a short time period. Regulation of the incoming flow of inert gas the handling via power of a delivery system also has the same drawbacks. To regulate the incoming flow, a line is provided between the wafer handling chamber the process chamber, which be opened using a valve. wafer chamber can be to relatively high, constant as described above, wherein this constant pressure is always higher than the fluctuating pressure of the process Before the is opened, valve the line is opened, the pressure in the two chambers in a regulated manner. However, this results in relatively higher gas stream being formed in the line, and this in turn generates turbulence, with associated risk of particles being activated. Moreover, this pipeline and the valve have been designed very small, to limit gas stream and avoid leading a high inertia. when the compensation line is open, back-flows from the process chamber the wafer handling chamber are possible, which is, as stated to avoided. A further possible solution consists in an pressure to the wafer via regulated shortly the valve is opened, to a gas stream from flowing the process chamber into this way, the wafer handling chamber can be at a low pressure throughout the majority the time required for a process. This method, unlike the dynamic-pressure regulation, the possibility inert gas through an outlet valve, with the that particles can escape the wafer handling chamber without obstacle. However, this method leads considerable pressure during the opening closing of the valve. Therefore, it to prevent from activated. the invention is to provide a that that when the gate valve opened, not flow back out of the off-gas system of the wafer handling chamber and gas flow out of the chamber the wafer handling chamber even with pressure fluctuations in the process chamber. is to avoid if temporary—between the
 dynamic pressure regulation Leads to a stRong pResSurE sUrge, And tHerefore to turbULencE when the gate valve is opeNed if ThE PresSUrE in thE procesS ChAMBer Is LoW at ThE TiMe. A fuRthEr drawbAck is the hiGh iNeRtia of the sysTEm, With the resUlt That only sligHt pRessurE dIffERenceS caN be coMpensaTEd for wIthin a shoRt TIme perIOd. RegulATIoN of tHe incoming flow of iNErT Gas to the wafer hAndlinG cHAmBER viA thE power of a dElIvery SYstem alSO hAS THe sAMe drawbacks.
To Regulate the INcoMing flOw, A coMPensatIon liNe IS prOvided betweEn thE wafer hanDling cHAmber anD The procEss chaMbeR, whIch cAN bE oPenEd USinG A vAlvE. the Wafer hanDlInG chamBer cAN THEn be Set To a rElatiVely high, constAnt PresSUre As desCribeD aboVe, WhereIn this ConstAnT pressure is alwaYs hiGher than tHe fLuCtuAtIng prESsure oF thE prOcess chAmber. BeFOre ThE GATe Valve is opened, the vaLvE OF tHe compenSation LInE iS Opened, so ThAt tHe prESSure iN the TWo Chambers Can be mATcHeD in a regUlAted maNnEr. HOweVer, thIS resUlts in A relativEly hiGHer pressure gas STream being forMEd IN ThE CompEnsAtion line, anD thiS In tuRn geNErAteS TurbuLence, WiTH tHE associated risk of paRtIcles bEing aCtivated. MoreoVer, this pipELINe and the ValvE HaVE been designed tO be veRy small, to lIMit the gaS streAm and theReby avoid TURbulence, LeaDinG to A reLATiVely high inertIA. furtHeRmore, whEn tHe compeNsaTioN liNe iS oPen, back-flOws from tHe PrOcEsS chAmber INto the waFeR haNdLinG chamBEr are pOssibLe, whIcH iS, As sTated abOVe, PREferAbLy To be AvoIdEd.
A fuRtheR KnoWn possiBle solutiOn cONsisTs In ApplyinG an additional PrEssure to thE wAfeR handlING chamber Via a regulated inert gas puRGe shortLy bEfore The gAte valve iS opEned, to PreVEnt a gaS streaM from FlOwiNG From tHE PrOceSs Chamber intO THe wAfer hAnDlinG chambeR. In this way, the wafer HAndLing chamber caN be Kept AT A lOw pREsSUre ThROugHOUt the majority of The time reqUiREd For a procesS. thiS mEthod, unLike the DynamIC-pressuRe regulatIon, offers ThE posSIBilIty of dischArging inErt gas thrOUgh an OUtLet vaLve, With thE rEsuLt thaT partiCLes Can esCape frOm The wafEr hanDlIng chambEr without obstacle. HoweveR, this mEthod AlsO leads to cOnsIDerAble pressUre fLuctuationS duRinG the oPenINg and ClosINg Of tHE gate ValvE. therefore, IT iS imPOSsIble to preveNT PArtIcles FroM Being aCtivAted.
One object of thE Invention is to pRoviDE A sySteM That EnSures that when tHe gAtE VAlve is opEnEd, gas does noT flow bacK oUT of thE off-gaS systeM of the wAFEr HAndlinG chaMbeR and gas doEs nOt FLow out oF tHe PRocess ChamBeR into tHe wafeR HandLINg chamber even witH presSURe fluCTuaTions In The procESs chAmber. AnothEr object is tO avoid A higH presSure difFeRence—eVen If Only temporARy—between The twO
 dynamic pressure regulati on leads t o a s tro ngpr essu re s urge, and ther e fore  to turbulence when th e gat ev alve is  open ed if t h ep r ess ur einth e  p roces s c hamberis low atthe  t ime. A furth e rdrawback i s t he high iner tia  of th esys t em, w ith  theresult that o nly sligh tp ressur e  differ e n ce s ca n be compensatedf or within a short  timepe r io d .  Re gul ation of t he  inco m ing flo w  o f i ner t  gas to the w afer handli n g c hamber  v iat he pow er of  a del ivery syste m al so has th e same drawbac k s.
To r egulat e t heinco m in gflo w, a c o mp ens a tio n line i spr ovide d be t w e e n th e w afer  hand ling chamberand  the pro cesschamb er,wh ich c an beopene dusing a valve.Thewafer han dli ng  ch am ber c a n then  be  se t to arelativ e lyhi g h ,  c onstant pressure a sd e sc ribed ab ove, w h er ei n  this co ns tan t pr e s sureis a l wa ys highe r than th efluctua ti ng pre ss ure  of  thep roce ss cha mber. Be foret he gate valvei s opened, the va l v eo f th e c ompensation  lin e  isopen e d,  so thatthe p re s su r e in the two chambe rs  can b e mat ched in a reg ulated man n e r . Howeve r, t h is results in a r elati vely highe r  pressur e gas  streambeing for m e d in the  co mpe nsa tio n li ne, and thisi n  tur ngenerat esturbule nce , w ith  th eassociate d risk o fpa rt ic les  bein g  activat ed . M or eov er, t h is pip eline  and  t he val ve have be e n  des ig ne d to  be  v ery s mall ,  to  limitthe gas s tre a m an dth ereby a void turbulen ce , leadingto  arelati v e ly highinertia. Furthermore, w h en thecom pensa tion  line isope n, bac k-f l ows fr om the  proc es s c h a mberi n to  th ewafer hand l i ngchamb er  are  possib le, which is, as s t ate d above, pref era blyt o  b e a v oi d ed. 
A fur t h er known possib le solutio nc on sists in a p ply in g an ad ditiona l pre s sure to  the wafe r handlin gcham b e r v ia a regul ated ine rt gas pu r ge sh o rt ly be for e thega tevalve  is op e ned , topreven ta gasstrea mfrom flo wing from the process c hamber  into  th e wafer h and l ing  chamber.  Inthis way,the  wa fer h and l ing c hamb e rcan be ke pt a t  a low pr e ss ure t hr oughout the m a jor ity o f t h e time  req uired for a proce s s. This method , un l i kethe dyna mi c-pressure reg ula ti o n , offers  t he possibil ity of d is c hargi ng ine rt gas  throug h an outlet  val ve,  with the  re su l t thatpa rt i cles c an e sc ape fr om the wafe r handling chamber  with o u t obs t acl e. Ho we ver, th i s me thod alsoleads to co nsider able  pres sure fl uc tuatio nsdu ring the o p ening and  clos ing ofth e ga tevalve.  The r e fore,  itis  im possiblet o  p r ev en t  pa rtic les f ro m be ing activ a ted.
One  ob j ect ofth e i n v ention is t o providea s ystem t hat ensure s  tha t  w h en th e gate  valve  is ope n ed,  g as does  no t flow back  out of t h e o ff -gas  systemof  the  w afe rhandling chambe r and ga s does n o t  flowout of t h e proc es s chamber in to th ew afer ha n d lin g chamb e r e ven  wi th p res sure fluctuations in the proc esschamb e r.Anoth er ob je ct is to avoi d a high pressure diff erence—even ifo nly temp ora r y— be tween the  tw o 
 dynamic_pressure regulation_leads to a strong_pressure surge,_and_therefore to_turbulence_when the gate_valve is opened_if the pressure in_the process chamber_is_low at the time. A further drawback is the high inertia of the system,_with_the result_that_only_slight pressure differences can be_compensated for within a short_time period._Regulation of the incoming flow of inert gas_to_the wafer handling_chamber via the power of a delivery system also_has the same drawbacks.
To regulate the_incoming flow, a_compensation_line_is provided between the_wafer handling chamber and the process_chamber, which can be opened using_a valve. The wafer handling chamber can_then be set to a relatively_high, constant pressure as described_above, wherein_this constant pressure is always_higher than the_fluctuating pressure_of the process_chamber. Before the gate valve is_opened, the valve_of the compensation line is opened,_so_that the pressure_in_the_two chambers_can be matched_in_a regulated_manner._However, this results in a relatively_higher_pressure gas stream being formed in the_compensation line, and this_in_turn generates turbulence, with_the associated risk of particles_being activated. Moreover, this pipeline and_the valve_have been_designed to be very small, to limit the gas stream and_thereby avoid turbulence, leading to a_relatively high inertia. Furthermore,_when the_compensation_line is open,_back-flows_from the_process chamber into the wafer handling chamber_are possible,_which is, as stated above, preferably_to be avoided.
A further_known_possible solution consists in applying an_additional pressure to the wafer handling_chamber via a regulated inert_gas_purge_shortly before the gate valve_is opened, to prevent a gas_stream from flowing_from the process chamber into the wafer_handling_chamber. In this way, the wafer_handling_chamber can be kept at a_low_pressure_throughout the majority of the_time required for a process. This_method, unlike the dynamic-pressure regulation, offers the possibility of_discharging inert gas_through an outlet valve, with_the_result_that particles can escape from the wafer handling chamber without_obstacle. However,_this method also_leads to considerable pressure fluctuations during the opening and closing_of the gate valve. Therefore, it is_impossible to prevent particles from being activated.
One object of the invention_is to provide a system that ensures that_when the gate valve is opened, gas_does not flow back_out_of the off-gas system of the wafer_handling_chamber_and_gas does not_flow out of_the process chamber_into the_wafer handling chamber_even with_pressure fluctuations in_the_process chamber. Another object is to avoid a high pressure difference—even if only temporary—between the two