 No. 2009-238998 discloses the hole forming method. In this method, a film, a metal film, and a resist mask are formed on base material. Then, the metal film is subjected to dry etching using the resist mask, and, at the same time, the retreat amount of the resist mask by the dry etching is controlled, resulting in forming opening with side surface which has first and second tilt angles.
Japanese Patent Laid-Open No. 2008-198991 discloses the hole forming method. This method comprises forming a first pattern, forming spacers on a side wall of the first pattern, forming a second pattern by filling with an insulating film into a gap between the spacers, removing the spacer in a contact hole region, and forming a contact hole by etching using the first and second patterns and the spacer.
Japanese Patent Laid-Open No. 2007-335628 discloses the method for forming the contact hole. In this method, a first resist film is formed on an insulating film, and, then, a second resist film is formed on the first resist film. Next, a first opening is formed in the second resist film using a first photolithography method and a second opening is formed in the first resist film using a second photolithography method, resulting in forming an overhang portion in the second resist film. Thereafter, a mortar-shape contact hole is formed in the insulating film by selectively removing the insulating film using a reactive ion etching method. Camera equipment has evolved through the years from the old pinhole cameras to the very sophisticated equipment of today. During this time there has been an ever increasing desire to produce photographic, videographic or cinematic special effects, while keeping cost effectiveness of the equipment and technique in mind.
Various camera techniques including chromakeying, luminous keying, and double exposures. These techniques involve the use of two cameras simultaneously, the images of which are combined into a single image. Alternatively, the seperate images can be shot with the same camera with the images combined into a single image.
Before now the equipment needed for these functions have been extremely complicated and expensive. These techniques were limited to those commercial production houses that had sufficient finances and trained personnel for expensive and complex equipment. What is needed in the industry is a simplified piece of equipment and methodology for carrying out these various filming techniques. The simplified method and equipment should be designed to be used by the amateur or beginning enthusiast, yet maintain the high quality of production experienced by the commercial production houses. The invention relates to a lens system
No. 2009 - 238998 discloses the hole forming method acting. In this method acting, a movie, a metal film, and a resist mask are form on base material. Then, the alloy movie is subjected to dry etching using the resist mask, and, at the same prison term, the retreat amount of the resist masquerade by the dry etching is controlled, resulting in forming opening with side surface which accept first and second tilt angle. 
 Japanese Patent Laid - Open No. 2008 - 198991 discloses the hole form method. This method comprises forming a first radiation pattern, forming spacers on a side wall of the first pattern, forming a second pattern by filling with an insulating film into a gap between the spacers, removing the spacer in a contact hole region, and forming a contact hole by etch using the first and second radiation pattern and the spacer. 
 Japanese Patent Laid - Open nobelium. 2007 - 335628 disclose the method for forming the liaison hole. In this method acting, a first resist film is formed on an insulating movie, and, then, a second resist film is formed on the first resist film. Next, a first opening is imprint in the second resist film using a first photolithography method and a second hatchway is formed in the inaugural resist film using a second photolithography method, resulting in forming an overhang helping in the second resist film. Thereafter, a mortar - shape contact fix is formed in the insulating film by selectively removing the insulating movie using a reactive ion etching method. Camera equipment has evolved through the old age from the old pinhole camera to the very sophisticated equipment of today. During this clock time there has been an ever increase desire to produce photographic, videographic or cinematic special effects, while keeping cost potency of the equipment and technique in mind. 
 Various television camera techniques including chromakeying, luminous keying, and double exposure. These technique involve the use of two television camera simultaneously, the images of which are combined into a unmarried image. Alternatively, the seperate images can be shot with the same camera with the images combined into a single image. 
 Before now the equipment necessitate for these function have been highly complicated and expensive. These proficiency were limited to those commercial production houses that had sufficient finances and train personnel for expensive and complex equipment. What is needed in the industry is a simplified objet d'art of equipment and methodology for carrying out these various filming techniques. The simplified method and equipment should be designed to be use by the amateur or beginning enthusiast, yet maintain the high quality of product experienced by the commercial production houses. The invention relates to a lens system
 No. 2009-238998 discloses the hole foroing method. In jhus metiod, a fjlm, a megal film, and a resist mask ace firmed on base material. Then, the metap film iw suujected to dry evdhing using tgc resnsv mask, and, at tme same tima, the retreat dmuuut of the resist mask by the dry etcring is clntrolled, resujtinb in rorming opening with side surface shich hes first and sevond tilt angles.
Japanese Pwtenh Laid-Open No. 2008-198991 disfloses the yole dorming methud. This meuhmd comprisgs forming a first pattern, formivg spccers on a wiee adll of the hirst iattern, formikb a sewond paytern by fillikg wivh ab insulating film intm a gap between thg spacers, sejoving the spacer ib a cmntawt huoe fegjoi, ahd forlinj a contact hole by etxhing using the firxt qnd second pafterns agd the spacer.
Japanese Patent Laid-Open Nm. 2007-335628 siscloses the method foe forming the contact hole. In ehis method, a first resist film is formed on an itsulavivg yljo, ajd, then, a second resist film is formed on the ritsn resist film. Nexb, a first opening os fptmed in the sezond rzaiat film using a figst phojolithigraphy mtthod and a second opening is foemed in the yirwt resist film usiug a second 'hotolothogtaphy method, resulting nn forjing an oveghang porfkon in the secona rvsisd film. Thereafter, a mortar-fhape convact kole is wormgd in tre insulatlng flnm by selectively gemovnng tve insulatlng film using a reactive ion evrhing method. Vakerd equipmznt hax evolved thrjugh the years from tke old pinhole czmeras vo the very fophisticated gquipment of voday. Duryng rhis time tfdre has been am ever inbrtasing desure to produce phobograkhjc, videographic or cinematic specoal efsebts, wrhle keeping wost efwrctivdness of thc eduipkent and technique it mihd.
Various camera trcmniques ibcluding chromakeying, luminous keying, ajd donble eeposurrs. Jhese techniques involve the uss of two famcras simultanqousoy, the imagex of which are combined into a single inage. Alternativeli, the seperate images gan be shot xith tre same cdmera with the imagew combined into a single image.
Before nkw the equioment needed for these functions have been extremely complicated and expebsive. Vhqse techniqhes eere niinted to thodx commercial prodlction houses that had sufficienv finances aud trained personnel for expemskve and complgx equipment. What is needes in the industry is a simplified piece of equipment and methodplogy foe cardying out vhese various filminb techuiques. The sinplinied method ana eaulpment shokld ue besigned to be used by the amateue or bwglnning enthusiasv, yet maintaln the gigh qoality of productjon sdperignced by the cpmmercial prodiction houses. The inneneion relates ti a lens systgm
No. 2009-238998 discloses the hole forming method. method, film, a film, and a base Then, the metal is subjected to etching using the resist mask, and, the same time, the retreat amount of the resist mask by the dry is controlled, resulting in forming opening with side surface which has first and tilt Japanese Laid-Open 2008-198991 discloses the hole forming method. This method comprises forming a first pattern, forming spacers on side wall of the first pattern, forming a pattern by filling with insulating film into a gap the removing the in contact region, and forming contact hole by etching using the first and second patterns and the spacer. Japanese Patent Laid-Open No. discloses the forming the hole. this a first resist formed on an insulating film, and, resist film is formed on the first resist Next, a opening is formed in the second film using a first photolithography method and a opening is formed in the first resist film using a second photolithography method, resulting in overhang portion in the resist film. Thereafter, mortar-shape hole formed the insulating by selectively removing the insulating film using a reactive ion etching Camera equipment has evolved through the years from the old to very sophisticated equipment today. During this time has an ever increasing desire photographic, or while cost of the equipment and in mind. Various camera techniques chromakeying, luminous keying, and the use of two cameras simultaneously, the images which are combined into a single image. the seperate images can be shot with the same camera with the combined into image. Before now the equipment needed for these have been extremely complicated expensive. These techniques were limited to those commercial production that sufficient finances trained personnel for and complex equipment. is needed in is a piece equipment carrying out these various filming techniques. simplified and equipment should be designed be the amateur or beginning enthusiast, yet maintain the high quality of production experienced by the houses. The invention relates a system
 No. 2009-238998 discloses the hole forming Method. In thIs metHod, A fiLm, A metAl fiLm, and a resist maSK are Formed on base material. ThEn, the MeTAl fiLM iS subjEcted to DRy ETChiNg UsIng ThE ReSist mAsk, And, at thE same time, tHe rEtReat amount of THe Resist mask By tHe dry etching Is cOntrolLeD, reSUltinG in FormiNg openINg with Side surfaCe WHich haS First anD SEcOnd tIlt angles.
Japanese pAtENt Laid-Open No. 2008-198991 diScloseS tHE hOLE foRmiNg method. ThIs MethoD ComprisES fORMIng A First pattern, fOrming spaceRS on A side wAlL of THe firsT pattErN, ForMing a second PattErn by fillIng witH An insulATing filM into a Gap BetWeen THe SpAceRs, REmoVInG thE SpaCer in a coNtAcT hole RegiON, AND forMinG a coNtact Hole by etching UsiNg thE FirSt and SeconD patTeRns anD the spAcer.
JApAnese Patent Laid-open no. 2007-335628 disclosEs tHe MetHoD for fORming tHe cOntAct hole. in this mEThoD, a FIRSt Resist film is formed On AN InSulating Film, anD, ThEn, A Second reSiSt fIlm iS FOrmed On thE FiRst resisT film. NEXt, A fIrst opeNiNg is foRmEd iN thE secoND resIst filM using a fIrst pHOtolithography MEthod and a secoND oPENiNG is fOrmEd in the firsT resISt fiLm usINg A seCOnd phOtoliThOGrAPhy method, resulting iN fOrming An oveRhang portion iN the second RESIst film. THereAFtER, a mortar-shape cOntacT hole is forMEd in the iNsulaTing film By selectiVELy removiNg tHe iNsuLatING fIlm using a reacTIVe ioN eTching mEthOd. CamerA eqUipMenT haS eVolved thrOugh the yEaRs FrOm The Old piNHole cameRaS to ThE veRy sopHIsticaTed eqUipmEnT oF TodAy. DurinG ThIS Time ThErE has BeeN aN ever IncrEAsiNg desirE to producE phOTogrApHiC, videogRaphic or cinemAtIc special eFfEctS, while KEEping cosT effectiveness of the equiPMent and TecHniquE in mInd.
VariouS caMera teChnIQues inCludinG chroMaKeyING, lumiNOUs KeyInG, and double EXPosUres. THeSe teChniqueS involve the use of twO CamEras simultaneOusLy, thE IMaGes OF wHIch ArE ComBINed into a single iMage. AlternAtIVeLy, the seperATe iMaGes can bE shot wiTh the SAme cameRa with the Images comBiNed iNTO a sIngle image.
before noW the equipMEnt neEDeD for tHesE functIoNs hAve beEn extrEMelY compLicateD aNd expeNsive. thEse technIques were limited to those CommerCial pRodUction houSes THat Had sufficIent Finances anD trAinEd perSonNEl for ExpeNSiVe aND compLex eQUipment. WhAT iS neEDEd In the industRY IS a sImpliFieD Piece oF equIpment and methodolOGy for carrying oUt thESE vaRioUS filMiNg techniques. ThE siMpLIFied methOd And equipmenT should bE dESigneD to be uSed by tHe amateUR Or BEginniNg enThuSiast, yet mAinTaIN the higH qUaLIty of pRoduCtIon expEriencED by tHE Commercial producTion hOUSes. ThE InvEntioN rElates tO A lenS system
 No. 2009-238998 discloses  the holeformi ngmet ho d. I n th is method, a f i lm,a metal film, and a re sistma s k ar e  f ormed  on bas e  m a t eri al .The n, th e met alfilm is  subjected  to  d ry etching u s in g the resi stmask, and, a t t he sam etim e , the  re treat  amoun t  of th e resistma s k by t h e dry e t c hi ng i s controlled, res u lt i ng in formingopenin gw it h sid e s urface whi ch  hasf irst an d  s e c o ndt ilt angles.
J apanese Pat e ntLaid-O pe n N o . 2008 -1989 91 dis closes thehole  formingmethod .  This m e thod co mprise s f orm inga  f ir stpa t ter n ,for m ing  spacers  o na sid e wa l l o f th e f irst  patt ern, forminga s econ d  pa ttern  by f illi ng  with  an in sulat in g film into a g ap b etween th e s pa cer s,  remo v ing th e s pac er in a  contac t  ho le r e gi on, and forming aco n t ac t hole b y etch i ng  u s ing thefi rst  and s econd  pat t er ns and t he spa c er .Japanes ePatent  L aid -Op en No .  200 7-3356 28 discl osest he method forf orming the co n ta c t  h o le.Inthis method , af irst  res i st  fi l m isforme do na n insulating film,an d, the n, asecond resist  film is f o r m ed on th e fi r st resist film. N ext,a first op e ning isforme d in the  second r e s ist film  us ing  afir s t  p hotolithograp h y  met ho d and a  se cond op eni ngisfor me d in thefirst re si st  f il m u singa  secondph oto li tho graph y  metho d, re sult in gi n f orminga no v erha ng  p orti onin  theseco n d r esist f ilm. Ther eaf t er,amo rtar-sh ape contact h ol e is forme dinthe in s u lating f ilm by selectively remo v ing the  in sulat ingfilm usin g a  react ive ion et chingmetho d.  Ca m e ra eq u i pm ent  h as evolved t hro ugh t he  yea rs from  the old pinhole c a mer as to the ver y s ophi s t ic ate d  e q uip me n t o f today. During t his time t he r ehas been a n  ev er  increa sing de siret o produ ce photog raphic, v id eogr a p hic  or cinema tic spec ial effec t s, wh i le  keep ing  costef fec tiven ess of the  equi pmentan d tech nique  i n mind.Various camera techniqu es inc ludin g c hromakeyi ng, lum inous key ing,  and doubl e e xpo sures . T h ese t echn i qu esi nvolv e th e  use of t w ocam e r as  simultaneo u s l y,the i mag e s of w hich  are combined int o  a single imag e. A l t ern ati v ely,  t he seperate im age sc a n be sho twith the sa me camer aw ith t he ima ges co mbinedi n to a sing le i mag e.
Before  no wt he equi pm en t  neede d fo rthesefuncti o ns h a v e been extremely  comp l i cated and  expe ns ive. Th e se t echniqueswere limite d to t hose  comm ercialpr oducti onho uses thath ad suffic ientfinance sandtra ined p erso n n el fo r ex pe nsi ve and co m p le x  e qu i pme nt.Whatis  nee ded in th e  industr y i s  a simp li fie d pieceo fe q uipment an d m ethod o l ogy for ca r ryin g  o u t the se var ious f ilmingt ech ni ques. T hes i mplifiedmethod an d  eq ui pmen t should  b e de si gne dto be used by t he amate ur or be g i nningent h usia s t, yet  m aintain thehighqu a lity of p rod uctione xpe rie nce d by  th e co m mercial production house s. T he in v ent ion r elate sto a len s  sys tem
 No._2009-238998 discloses_the hole forming method._In this_method,_a film,_a_metal film, and_a resist mask_are formed on base_material. Then, the_metal_film is subjected to dry etching using the resist mask, and, at the same_time,_the retreat_amount_of_the resist mask by the_dry etching is controlled, resulting_in forming_opening with side surface which has first and_second_tilt angles.
Japanese Patent_Laid-Open No. 2008-198991 discloses the hole forming method. This_method comprises forming a first pattern,_forming spacers on_a_side_wall of the first_pattern, forming a second pattern by_filling with an insulating film into_a gap between the spacers, removing the_spacer in a contact hole region,_and forming a contact hole_by etching_using the first and second_patterns and the_spacer.
Japanese Patent_Laid-Open No. 2007-335628_discloses the method for forming the_contact hole. In_this method, a first resist film_is_formed on an_insulating_film,_and, then,_a second resist_film_is formed_on_the first resist film. Next, a_first_opening is formed in the second resist_film using a first_photolithography_method and a second_opening is formed in the_first resist film using a second_photolithography method,_resulting in_forming an overhang portion in the second resist film. Thereafter, a_mortar-shape contact hole is formed in_the insulating film by_selectively removing_the_insulating film using_a_reactive ion_etching method. Camera equipment has evolved through_the years_from the old pinhole cameras to_the very sophisticated equipment_of_today. During this time there has_been an ever increasing desire to_produce photographic, videographic or cinematic_special_effects,_while keeping cost effectiveness of_the equipment and technique in mind.
Various_camera techniques including_chromakeying, luminous keying, and double exposures. These_techniques_involve the use of two cameras_simultaneously,_the images of which are combined_into_a_single image. Alternatively, the seperate_images can be shot with the_same camera with the images combined into a single_image.
Before now the_equipment needed for these functions_have_been_extremely complicated and expensive. These techniques were limited to those_commercial production_houses that had_sufficient finances and trained personnel for expensive and complex equipment._What is needed in the industry is_a simplified piece of equipment and methodology for carrying out these_various filming techniques. The simplified method and equipment_should be designed to be used by_the amateur or beginning_enthusiast,_yet maintain the high quality of production_experienced_by_the_commercial production houses._The invention relates_to a lens_system