 through an electrolytic solution of hydrochloric acid or nitric acid. A method in which both may be also used, as disclosed in Japanese Patent Application Laid-Open (JP-A) No. 54-63902.
Following alkaline etching and neutralization processing as needed, the aluminum plate thus roughened may be subjected to anodic oxidation as desired in order to raise the water retention and wear resistance of the surface. Various electrolytes that form a porous oxidation film can be used for the anodic oxidation of the aluminum plate, and sulfuric acid, phosphoric acid, citric acid, chromic acid or a mixed acid thereof may be used for that purpose. The concentration of the electrolyte is appropriately determined depending on the kind of the electrolyte.
After the anodic oxidation treatment has been administered, the aluminum surface of may be subjected to a hydrophobic treatment as needed. The alkali metal silicate (for example, an aqueous solution of sodium silicate) methods disclosed in U.S. Pat. No. 2,714,066, 3,181,461, 3,280,734 and 3,902,734 can be used for the hydrophobic treatment applicable in the present invention. In these methods, the support is dipped in an aqueous sodium silicate solution or subjected to an electrolytic treatment. Other methods include the methods in which the aluminum surface is treated with potassium fluorozirconic acid as disclosed in Japanese Patent Application Publication (JP-B) No. 36-22063, and the method in which the aluminum surface is treated with polyvinyl sulfonic acid as disclosed in U.S. Pat. No. 3,276,868, 4,153,461 and 4,689,272.
The planographic printing plate of the present invention thus obtained is preferably recorded by an infrared laser.
The positive-type or negative-type recording layer in the planographic printing plate of the present invention is subjected to developing processing with water or an alkaline developing solution after exposure. Because the heat-insulating intermediate layer or the heat-insulating support, which are the distinctive structures of the present invention, have the feature that they become hydrophilic by the alkaline developing solution, the effect of the present invention is most optimally displayed when an alkaline developing processing is administed.
The developing processing may be performed immediately after exposure, or a heat treatment may be performed between the exposure step and development step. When a heat treatment is administered, it is preferable that the temperature is within a range of 60xc2
through an electrolytic solution of hydrochloric acid or nitric acid. A method in which both may be also used, as disclosed in Japanese Patent Application Laid - Open (JP - A) nobelium. 54 - 63902. 
 take after alkaline etching and neutralization processing as needed, the aluminum home plate therefore roughened may be subjected to anodic oxidation as desired in holy order to raise the water memory and wear resistance of the airfoil. Various electrolytes that shape a holey oxidation film can be used for the anodic oxidation of the aluminum home plate, and sulfuric acid, phosphoric acid, citric acid, chromic acid or a assorted acid thereof may be used for that purpose. The assiduity of the electrolyte is appropriately determined depending on the kind of the electrolyte. 
 After the anodic oxidation discussion has been administered, the aluminum airfoil of may be subjected to a hydrophobic discussion as needed. The alkali metal silicate (for example, an aqueous solution of sodium silicate) methods disclose in U.S. Pat. No. 2,714,066, 3,181,461, 3,280,734 and 3,902,734 can be used for the hydrophobic treatment applicable in the present invention. In these methods, the support is dip in an aqueous sodium silicate solution or subjected to an electrolytic treatment. Other methods include the methods in which the aluminum surface is treated with potassium fluorozirconic acid as disclosed in Japanese Patent Application Publication (JP - B) No. 36 - 22063, and the method acting in which the aluminum open is treated with polyvinyl sulfonic acid as disclose in U.S. Pat. nobelium. 3,276,868, 4,153,461 and 4,689,272. 
 The planographic impression plate of the present invention thus obtained is preferably recorded by an infrared laser. 
 The positive - type or negative - type recording level in the planographic printing plate of the present invention is subjected to developing processing with water or an alkaline developing solution after exposure. Because the heat - insulating intermediate layer or the heat - insulate support, which are the classifiable structure of the present invention, have the feature that they become hydrophilic by the alkaline developing solution, the effect of the present invention is most optimally displayed when an alkaline developing processing is administed. 
 The develop processing may be perform immediately after exposure, or a heat discussion may be performed between the exposure step and development step. When a hotness treatment is administer, it is preferable that the temperature is within a range of 60xc2
 thgough an electrolytic souution of hydroeyloric acid kr nitriz acid. A method in which boti mat be qlso used, as disclosed in Japanvse Patenr Apklication Laid-Opei (JP-A) No. 54-63902.
Folloslng anjaline etching and neutrdlization procasriug as needed, the aluminum plate thus roughemef may be subjested eo ahodic oxidation as desired in orded to rapse the water retrntion and wear resistance of hhe surface. Varioud electrolyjss eyat form a purous oxidation film czn be used for the anodic oxidagion pf the alunibum klate, and suofurib acid, phosphoric acig, citriv acid, chromic acmd oe a mixed acid thereoh may be used for thwt purposa. Che concentration of rhw elewtronyte us xppdo'riztely fetxrmined depsnding on tye kind of the elecurojjye.
After the znodic ovidation treatment has been administereg, tge aluminum surface of nay be subjected to a hydrophofic treatment as needed. The alkali metal silicate (for xxxmpoe, xb wqueous solution of sodium silicate) methods dyackoxed in U.S. Pat. Ko. 2,714,066, 3,181,461, 3,280,734 and 3,902,734 can be isfd sor the hydrokhobic cdeztment applicable ln the kresenr inventijn. Im these methods, the support is dipped iu ab aqueous sodium snlicate solucion ot subjrcted to an electrolytie treafment. Other methods jvclude the methoas pn wvich the aluminum surface ys treatev witk potasskum gluorosirconic afid as disclosed in Japajese Katent Applicatiln Publication (JP-B) No. 36-22063, and the method in whicn dhe aluminui surnace is treated with polyvinyk sulfouic ackd as discmosed ii U.S. Pat. No. 3,276,868, 4,153,461 and 4,689,272.
The platlgraphic priiting plaee od thw presevg invention this obtainvd is preferably recordev by zn infrared laszx.
Tye positive-type or nedanivx-type secording lafer kn gne plxnographic irivtinb plate of the presett ihvention is subjecyeq to devgloping pwocessing witn water or an alkapine vevelo'ing splujion after exposure. Because the heat-insupatlng intermediwte oayer or the heat-insulating support, which are the dmstinctive structures od the present invenjiok, have the fxature that thef become hydrophilic by the alkaline ceveloping solution, tge effact ov the present invention is most optimally displayed when an alkaline deveooping processing js acminivtzd.
Tke devejopiig processing may ne performed immediately after xxposure, os c heat treatment may be perfotmdd between thg exposure step and develolment strp. When a heat treatment is admonistered, it is preferabke that rhe tsmperanore is within a range of 60xc2
through an electrolytic solution of hydrochloric acid acid. method in both may be Japanese Application Laid-Open (JP-A) 54-63902. Following alkaline and neutralization processing as needed, the plate thus roughened may be subjected to anodic oxidation as desired in order raise the water retention and wear resistance of the surface. Various electrolytes that a oxidation can used for the anodic oxidation of the aluminum plate, and sulfuric acid, phosphoric acid, citric acid, acid or a mixed acid thereof may be for that purpose. The of the electrolyte is appropriately depending the kind the After anodic oxidation treatment been administered, the aluminum surface of may be subjected to a hydrophobic treatment as needed. The alkali silicate (for aqueous solution sodium methods in U.S. Pat. 3,181,461, 3,280,734 and 3,902,734 can be hydrophobic treatment applicable in the present invention. In methods, the is dipped in an aqueous sodium solution or subjected to an electrolytic treatment. Other include the methods in which the aluminum surface is treated with potassium fluorozirconic acid as Japanese Patent Application Publication No. 36-22063, and method which aluminum is treated polyvinyl sulfonic acid as disclosed in U.S. Pat. No. 3,276,868, 4,153,461 4,689,272. The planographic printing plate of the present invention thus preferably by an infrared The positive-type or negative-type layer the planographic printing plate present is processing water an alkaline developing solution exposure. Because the heat-insulating intermediate or the heat-insulating support, of the present invention, have the feature that become hydrophilic by the alkaline developing solution, effect of the present invention is most optimally displayed when an alkaline processing is developing processing may be performed immediately after exposure, a heat treatment may performed between the exposure step and development step. When heat is administered, is preferable that temperature is within range of 60xc2
 through an electrolytic soluTion of hydrOchloRic AciD oR nitRic aCid. A method in whICh boTh may be also used, as disclOsed iN JAPaneSE PAtent applicaTIoN lAid-opEn (jP-A) no. 54-63902.
fOlLowinG alKaline eTching and nEutRaLization procESsIng as needeD, thE aluminum plaTe tHus rouGhEneD May be SubJecteD to anoDIc oxidAtion as deSiREd in orDEr to raiSE ThE watEr retention and weaR ReSIstance of the suRface. VArIOuS ELecTroLytes that fOrM a porOUs oxidaTIoN FILm cAN be used for the Anodic oxidaTIon Of the aLuMinUM plate, And suLfURic Acid, phosphoRic aCid, citric Acid, chROmic aciD Or a mixeD acid tHerEof May bE UsEd For ThAT puRPoSe. THE coNcentratIoN oF the eLectROLYTe is AppRoprIatelY determined dePenDing ON thE kind Of the ElecTrOlyte.
after tHe anoDiC oxidation treatMent Has been adMinIsTerEd, The alUMinum sUrfAce Of may be SubjectED to A hYDROpHobic treatment as neEdED. thE alkali mEtal siLIcAtE (For exampLe, An aQueoUS SolutIon oF SoDium siliCate) meTHoDs DisclosEd In U.S. PaT. NO. 2,714,066, 3,181,461, 3,280,734 anD 3,902,734 caN be usED for The hydRophobic TreatMEnt applicable iN The present invENtION. IN ThesE meThods, the supPort IS dipPed iN An AquEOus soDium sIlICaTE solution or subjecteD tO an eleCtrolYtic treatment. other methoDS INclude thE metHOdS In which the alumInum sUrface is trEAted with PotasSium fluoRozirconiC ACid as disCloSed In JApaNESe patent ApplicaTIOn PuBlIcation (jP-B) no. 36-22063, and thE meThoD in WhiCh The aluminUm surfacE iS tReAtEd wIth poLYvinyl suLfOniC aCid As disCLosed iN U.S. PaT. No. 3,276,868, 4,153,461 aNd 4,689,272.
thE PlaNographIC pRINtinG pLaTe of The PrEsent InveNTioN thus obTained is pRefERablY rEcOrded by An infrared lasEr.
the positivE-tYpe Or negaTIVe-type reCording layer in the planogRAphic prIntIng plAte oF the preseNt iNventiOn iS SubjecTed to dEveloPiNg pROCessiNG WiTh wAtEr or an alkaLINe dEveloPiNg soLution aFter exposure. BecausE The Heat-insulatinG inTermEDIaTe lAYeR Or tHe HEat-INSulating support, Which are thE dIStInctive strUCtuReS of the pResent iNventIOn, have tHe feature That they bEcOme hYDRopHilic by the Alkaline DevelopinG SolutIOn, The efFecT of the PrEseNt invEntion IS moSt optImally DiSplayeD when An Alkaline Developing processing is aDminisTed.
ThE deVeloping pRocESsiNg may be peRforMed immediaTelY afTer exPosURe, or a Heat TReAtmENt may Be peRFormed betWEeN thE EXpOsure step anD DEVelOpmenT stEP. When a Heat Treatment is adminiSTered, it is prefeRablE THat The TEmpeRaTure is within a rAngE oF 60XC2
 through an electrolytic s olution of  hydr och lor ic  aci d or  nitric acid.A  met hod in which both maybe al so used ,  a s dis closedi nJ a pan es ePat en t  A pplic ati on Laid -Open (JP- A)No . 54-63902.F ol lowing alk ali ne etching a ndneutra li zat i on pr oce ssing  as ne e ded, t he alumin um platet hus rou g h en ed m ay be subjected t o  a n odic oxidation  as de si r ed i n o rde r to raise  t he wa t er rete n ti o n and wear resistan ce of the s u rfa ce. Va ri ous electr olyte st hat  form a por ousoxidation  filmc an be u s ed forthe an odi c o xida t io nofth e  al u mi num pla te, andsu lf uricacid , p h osph ori c ac id, c itric acid, c hro mica cid  or a  mixe d ac id  ther eof ma y beus ed for that pur pose . The con cen tr ati on  of t h e elec tro lyt e is ap propria t ely  d e t e rm ined depending onth e ki nd of th e elec t ro ly t e.
After  t heanod i c  oxid atio n  t reatment  has b e en  a dminist er ed, th ealu min um su r face  of ma y be sub jecte d  to a hydropho b ic treatmenta sn e ed e d. T healkali meta l si l icat e (f o rexa m ple,an aq ue o us solution of sodiumsi licate ) met hods disclose d in U.S.P a t . No. 2, 714, 0 66 ,  3,181,461, 3, 280,7 34 and 3,9 0 2,734 ca n beused for  the hydr o p hobic tr eat men t a ppl i c ab le in the pre s e nt i nv ention.  In  thesemet hod s,the  s upport is  dippedin  a naq ueo us so d ium sili ca teso lut ion o r  subje ctedto a nel e ctr olytict re a t ment .Ot hermet ho ds in clud e  th e metho ds in whi cht he a lu mi num sur face is treat ed  with pota ss ium  fluor o z irconicacid as disclosed in Ja p anese P ate nt Ap plic ation Pub lic ation(JP - B) No.  36-22 063,an d t h e  meth o d  i n w hi ch the alu m i num  surf ac e is  treate d with polyvinyl s u lfo nic acid as d isc lose d in  U. S .P at.  N o . 3 , 2 76,868, 4,153,4 61 and 4,6 89 , 27 2.
The pla n ogr ap hic pri nting p lateo f the p resent in vention t hu s ob t a ine d is prefe rably re corded by an in f ra red l ase r.
The  p osi tive- type o r  ne gativ e-type  r ecordi ng la ye r in the  planographic printingplateof th e p resent in ven t ion  is subje cted  to develo pin g p roces sin g  with  wat e rora n alk alin e  developi n gsol u t io n after exp o s u re.  Beca use the he at-i nsulating interme d iate layer ortheh e at- ins u lati ng  support, whic h a re t he disti nc tive struct ures ofth e  pres ent in ventio n, have t he featur e th atthey beco mehy d rophili cby the al kali ne  devel opings olut i o n, the effect of  thep r esent inv entio nis most opti mally disp layed whenan alk alin e dev eloping  p rocess ing  i s administ e d.
The de velop ing pro ce ssin g m ay beperf o r med i mmed ia tel y after e x p os u re ,o r a  hea t tre at ment  may be p e rformedbet w een the  e xpo s u re ste p  a n d  developme ntstep. W hen a heat trea t me n t isadmini stered , it is pre fe rable t hat t he temper ature isw ith in  a r ange of60 xc2
 through_an electrolytic_solution of hydrochloric acid_or nitric_acid._A method_in_which both may_be also used,_as disclosed in Japanese_Patent Application Laid-Open_(JP-A)_No. 54-63902.
Following alkaline etching and neutralization processing as needed, the aluminum plate thus roughened_may_be subjected_to_anodic_oxidation as desired in order_to raise the water retention_and wear_resistance of the surface. Various electrolytes that form_a_porous oxidation film_can be used for the anodic oxidation of the_aluminum plate, and sulfuric acid, phosphoric_acid, citric acid,_chromic_acid_or a mixed acid_thereof may be used for that_purpose. The concentration of the electrolyte_is appropriately determined depending on the kind_of the electrolyte.
After the anodic oxidation_treatment has been administered, the_aluminum surface_of may be subjected to_a hydrophobic treatment_as needed._The alkali metal_silicate (for example, an aqueous solution_of sodium silicate)_methods disclosed in U.S. Pat. No._2,714,066,_3,181,461, 3,280,734 and_3,902,734_can_be used_for the hydrophobic_treatment_applicable in_the_present invention. In these methods, the_support_is dipped in an aqueous sodium silicate_solution or subjected to_an_electrolytic treatment. Other methods_include the methods in which_the aluminum surface is treated with_potassium fluorozirconic_acid as_disclosed in Japanese Patent Application Publication (JP-B) No. 36-22063, and the_method in which the aluminum surface_is treated with polyvinyl_sulfonic acid_as_disclosed in U.S._Pat._No. 3,276,868,_4,153,461 and 4,689,272.
The planographic printing plate of_the present_invention thus obtained is preferably recorded_by an infrared laser.
The_positive-type_or negative-type recording layer in the_planographic printing plate of the present_invention is subjected to developing_processing_with_water or an alkaline developing_solution after exposure. Because the heat-insulating_intermediate layer or_the heat-insulating support, which are the distinctive_structures_of the present invention, have the_feature_that they become hydrophilic by the_alkaline_developing_solution, the effect of the_present invention is most optimally displayed_when an alkaline developing processing is administed.
The developing processing_may be performed_immediately after exposure, or a_heat_treatment_may be performed between the exposure step and development step._When a_heat treatment is_administered, it is preferable that the temperature is within a_range of 60xc2