 generator which generates an acid in the resist by exposure. The acid generator decomposes the chemically amplified resist (in the case where the resist is of a positive type) or cross-links the resist (in the case where the resist is of a negative type). As a result, solubility of the resist by a developing solution changes. This feature is utilized to obtain high resolution.
In the lithography process using the chemically amplified resist film, it is practical to carry out a heating process called PEB (Post-Exposure Baking) for diffusing the acid generated at the time of exposure. In the PEB process, since there is an intimate relationship between an amount of heat supplied and a dimension of a resist film pattern formed after exposure, severe temperature uniformity is required with reduction of the size of a pattern to be formed.
In a conventional PEB process, there has been widely used a so-called proximity baking method in which a substrate to be treated is placed above a hot plate heated by a heater to supply heat to the substrate from its back surface. It is general to set a distance (gap) between the hot plate and the substrate to be about 100 μm to shorten the heat time. However, since the substrate having undergone a film forming process or the like has a warp due to a stress of a film, the gap between the hot plate and the substrate becomes non-uniform within the plane of the substrate. This becomes a factor of degrading temperature uniformity within the plane of the substrate.
As another heating method, there is proposed a lamp heating method in which a light is irradiated onto a substrate from a lamp installed above the substrate to heat the substrate. With this method, a substrate warp is not so problematic as compared with the proximity baking method. However, there is a problem that it is difficult to ensure luminance uniformity of the lamp and thus good temperature uniformity within the plane of the substrate cannot be obtained.
There is a demand for a pattern forming method capable of forming a pattern having good dimensional uniformity within the plane of the substrate against a substrate having a warp. This invention relates to automated banking machines. Specifically, this invention relates to an automated banking machine which delivers and receives various types of sheet materials through a single opening in the machine.
Automated banking machines are known in the prior art. A common type of automated banking machine is an automated teller machine (ATM). ATMs may be used by individuals to receive cash from their accounts, to pay bills, to transfer cash between accounts, and to make
generator which generates an acid in the resist by exposure. The acid generator decomposes the chemically amplified resist (in the subject where the resist is of a incontrovertible type) or cross - links the resist (in the lawsuit where the resist is of a negative type). As a consequence, solubility of the resist by a developing solution change. This feature is utilized to prevail high resolution. 
 In the lithography summons use the chemically amplified resist movie, it is practical to dribble out a heating system process called PEB (Post - Exposure Baking) for diffusing the acid render at the time of exposure. In the PEB procedure, since there is an cozy relationship between an amount of heat supplied and a dimension of a resist movie pattern formed after exposure, severe temperature uniformity is required with reduction of the size of a radiation pattern to be formed. 
 In a conventional PEB process, there has been widely used a so - called proximity baking method in which a substrate to be treated is place above a hot plate heat by a fastball to add heat to the substrate from its back surface. It is general to set a distance (gap) between the hot plate and the substrate to be approximately 100 μm to shorten the heat time. However, since the substrate having undergone a film forming process or the like has a warp due to a stress of a film, the break between the hot home plate and the substrate becomes non - uniform within the plane of the substrate. This becomes a factor of corrupting temperature uniformity within the plane of the substrate. 
 As another heating method, there be proposed a lamp heating method in which a light is irradiate onto a substrate from a lamp installed above the substrate to heat the substrate. With this method acting, a substrate warp is not so problematic as compared with the proximity bake method. However, there be a problem that it is difficult to ensure luminance uniformity of the lamp and thus full temperature uniformity within the plane of the substrate cannot be receive. 
 There is a demand for a pattern forming method adequate to of forming a pattern have good dimensional uniformity within the plane of the substrate against a substrate having a warp. This invention relates to automated banking machine. Specifically, this invention relates to an automated banking machine which delivers and receives various types of sail material through a single opening in the machine. 
 Automated banking machines are known in the anterior art. A common type of automated banking machine is an automated teller machine (ATM). ATMs may be used by individual to receive cash from their accounts, to pay circular, to transfer cash between accounts, and to make
 gejerator which generates xn acid in the tewist bb exposhre. The xcid generator decomposes thx chwmicaoly amplified resist (iv the casv where tye rtsist is of a posmfive tyiz) or dvoss-lnnjs the resist (ln the case where the reshsg ns of a negative type). As a result, sojubilitu lf the resist fy a qevemoping solution changes. This featude is uuilized to obtain nigh resolution.
In the lithlgraohy process using hhe chemicaoly wnplified reskst film, iu ns practicam to carry out a heating procesr calked PEB (Powt-Wxplvure Baking) for qiffusing thc acid ceneratrd at the time of exposure. In the PEB proress, since there is wn intimade relationship betqewn an amognt ud hdat snppmied ajd e dimension of a resisr film pattern formtd wdter exposure, severq eemperature uniformity is required with resuction of the size of q pattern to be formef.
In a condentional PEB process, there has been widely used d so-celued pvoxioutj baking method in which a substrate to be trqzttd ps placed above a hot plate newtrq by a heater to su'llg heat to the subshrate ftom itw back suwfacr. It is general to set a diwtance (gap) bvtwewn the hot plate aud the substxate tp be sbout 100 μm to shorten the heaf time. Howeger, since ghe substrate haxinn utdergone a film forming prjcess or vhe lnke has x watp due eo a stresd of a film, the gap betwfen tke hod plate anf the substrate becomes non-uniform within the pnanv of the fubstvate. This becomqs a factor of degradnng teoperature lniformitb within the plane of the dubstrate.
As enother hqatibg mwthod, tfdre is proposec a lamp ktating metyod in which a ligmt is jrradiated onto a wubstrate from s lxmp ijsvalleq above the sgbstfatd to hdat the subwgratr. With this method, a subatrate warp is not sj problenatic as compared witn the proximity baning ketiod. Hoeevgr, there is a problem that it ia difficupt bo ensure lumynange ugiformity pf the lamp and thus good temperature uiiformity within the plqne of the substratg csnnot be obvained.
Ehere is d demand for a patteen forming method capable of forming a pattesn haging good dimensional uniformity within the plane of the substrate againsr a suuserate havinf a earp. Nhif inveneion celates to automaned banking machines. Specificallb, this invancion relates to an automated navking machine which delivers and recejves varoous types of sheet materials tnrough a single opening ln the maxhine.
Zutomangd uanking machines are known in tye prioe arb. A common typd og wutomated banliug machine is an automated teller machibe (ATM). ATMs may be used by inflviduams to teceive cash from thejg accuunts, to pay nills, to transger cash between accmugts, and to makt
generator which generates an acid in the exposure. acid generator the chemically amplified the is of a type) or cross-links resist (in the case where the is of a negative type). As a result, solubility of the resist by developing solution changes. This feature is utilized to obtain high resolution. In the process the amplified film, it is practical to carry out a heating process called PEB (Post-Exposure Baking) for diffusing acid generated at the time of exposure. In PEB process, since there an intimate relationship between an of supplied and dimension a film pattern formed exposure, severe temperature uniformity is required with reduction of the size of a pattern to be formed. a conventional there has widely a proximity baking method a substrate to be treated is hot plate heated by a heater to supply to the from its back surface. It is to set a distance (gap) between the hot and the substrate to be about 100 μm to shorten the heat time. However, since having undergone a film process or the has warp to stress of film, the gap between the hot plate and the substrate becomes within the plane of the substrate. This becomes a factor temperature within the plane the substrate. As another method, is proposed a lamp in a onto substrate a lamp installed above substrate to heat the substrate. this method, a substrate as compared with the proximity baking method. However, is a problem that it is difficult ensure luminance uniformity of the lamp and thus good temperature uniformity within plane of cannot be obtained. There is a demand for pattern forming method capable forming a pattern having good dimensional uniformity within the of substrate against substrate having a This invention relates automated banking machines. invention relates an banking and receives various types of sheet through single opening in the machine. banking known in the prior art. A common type of automated banking machine is an automated (ATM). ATMs may be by to receive cash from their accounts, to pay bills, to transfer cash and to make
 generator which generates an Acid in the rEsist By eXpoSuRe. ThE aciD generator decoMPoseS the chemically amplifieD resiSt (IN the CAsE wherE the resISt IS Of a PoSiTivE tYPe) Or croSs-lInks the Resist (in thE caSe Where the resiST iS of a negatiVe tYpe). As a result, SolUbilitY oF thE ResisT by A deveLoping SOlutioN changes. THiS FeaturE Is utiliZED tO obtAin high resolution.
iN tHE lithography prOcess uSiNG tHE CheMicAlly amplifIeD resiST film, it IS pRACTicAL to carry out a hEating proceSS caLled PEb (POst-eXposurE BakiNg) FOr dIffusing the Acid Generated At the tIMe of expOSure. In tHe PEB pRocEss, SincE ThErE is An INtiMAtE reLAtiOnship beTwEeN an amOunt OF HEAt suPplIed aNd a diMension of a resIst Film PAttErn foRmed aFter ExPosurE, severE tempErAture uniformity Is reQuired witH reDuCtiOn Of the SIze of a PatTerN to be foRmed.
In a COnvEnTIONaL PEB process, there haS bEEN wIdely useD a so-caLLeD pROximity bAkIng MethOD In whiCh a sUBsTrate to bE treatED iS pLaced abOvE a hot pLaTe hEatEd by a HEateR to supPly heat tO the sUBstrate from its BAck surface. It iS GeNERaL To seT a dIstance (gap) bEtweEN the Hot pLAtE anD The suBstraTe TO bE About 100 μm to shorten the HeAt time. howevEr, since the subStrate haviNG UNdergone A filM FoRMing process or tHe likE has a warp dUE to a streSs of a Film, the gAp between THE hot platE anD thE suBstRATe Becomes non-uniFORm wiThIn the plAne Of the suBstRatE. ThIs bEcOmes a factOr of degrAdInG tEmPerAture UNiformitY wIthIn The Plane OF the suBstraTe.
As AnOtHEr hEating mEThOD, TherE iS pRopoSed A lAmp heAtinG MetHod in whIch a light Is iRRadiAtEd Onto a suBstrate from a lAmP installed AbOve The subSTRate to heAt the substrate. With this mEThod, a suBstRate wArp iS not so proBleMatic aS coMPared wIth the ProxiMiTy bAKIng meTHOd. howEvEr, there is a PROblEm thaT iT is dIfficulT to ensure luminance UNifOrmity of the laMp aNd thUS GoOd tEMpERatUrE UniFORmity within the pLane of the sUbSTrAte cannot bE ObtAiNed.
TherE is a demAnd foR A patterN forming mEthod capaBlE of fORMinG a pattern hAving gooD dimensioNAl uniFOrMity wIthIn the pLaNe oF the sUbstraTE agAinst A substRaTe haviNg a waRp. this inveNtion relates to automated BankinG machIneS. SpecificAllY, ThiS inventioN relAtes to an auTomAteD bankIng MAchinE whiCH dEliVErs anD recEIves varioUS tYpeS OF sHeet materiaLS THroUgh a sIngLE openiNg in The machine.
AutomatED banking machinEs arE KNowN in THe prIoR art. A common typE of AuTOMated banKiNg machine is An automaTeD TelleR machiNe (ATM). AtMs may bE USeD By indiViduAls To receive CasH fROm their AcCoUNts, to pAy biLlS, to traNsfer cASh beTWEen accounts, and to Make
 generator which generates  an acid i n the  re sis tby e xpos ure. The acidg ener ator decomposes the ch emica ll y  amp l if ied r esist ( i nt h e c as ewhe re th e res ist  is ofa positive  ty pe ) or cross-l i nk s the resi st(in the case  wh ere th eres i st is  of  a ne gative type).  As a res ul t , solu b ility o f th e re sist by a develop i ng solution chang es. Th is fe a t ure  is  utilizedto  obta i n highr es o l u tio n .
In the lith ography pro c ess  using  t hec hemica lly a mp l ifi ed resist f ilm,  it is pr actica l  to car r y out a  heati ngpro cess ca ll edPE B  (P o st -Ex p osu re Bakin g)  f or di ffus i n g theaci d ge nerat ed at the tim e o f ex p osu re. I n the  PEB  p roces s, sin ce th er e is an intimat e re lationshi p b et wee nan am o unt of  he atsupplie d and a dim en s i o nof a resist film p at t e rn  formedaftere xp os u re, seve re  te mper a t ure u nifo r mi ty is re quired wi th  reduct io n of t he  si zeof ap atte rn tobe forme d.
In a conventional PEB process,t he r e  h a s be enwidely used  a s o -cal ledp ro xim i ty ba kingme t ho d  in which a substra te  to be  trea ted is placed  above a h o t plate he ated by a heater to su pplyheat to th e  substra te fr om its b ack surfa c e . It isgen era l t o s e t  a  distance (ga p )  bet we en thehot  plateand  th e s ubs tr ate to be  about 1 00  μ mto  sh orten the heat  t ime .How ever, sincethe s ubst ra te hav ing und e rg o n e afi lm  for min gproce ss o r  th e likehas a war p d u e to  a  s tress o f a film, the  g ap between  t hehot pl a t e and th e substrate becomes non - uniform  wi thintheplane ofthe  subst rat e . This  becom es afa cto r of de g r ad ing  t emperature u nif ormit ywith in theplane of the subst r ate .
As anotherhea ting m et hod ,  t h ere  i s  pr o p osed a lamp hea ting metho di nwhich a li g htis  irradi ated on to as ubstrat e from alamp inst al leda b ove  the subst rate toheat thes ubstr a te . Wit h t his me th od,  a su bstrat e  wa rp is  not s oproble matic  a s compar ed with the proximity b akingmetho d.However,the r e i s a probl em t hat it isdif fic ult t o e n surelumi n an ceu nifor mity of the la m pand t hu s good temp e r a tur e uni for m ity wi thin  the plane of the substrate cann ot b e obt ain e d.
T he re is a demand  fo ra patternfo rming metho d capabl eo f for ming a  patte rn havi n g  g o od dim ensi ona l uniform ity  w i thin th epl a ne ofthesu bstrat e agai n st a s ubstrate havinga war p .  This inv entio nrelates to a utomated b anking mach ines.Spec ifica lly, th is  inven tio nrelates to an automa ted b ankingma chin e w hich d eliv e r s and  rec ei ves  varioust y pe s  o fs hee t ma teria ls  thr ough a si n gle open ing in thema chi n e .
Auto m at e d  banking m ach inesa r e known in thep ri o r art . A co mmon t ype ofa uto ma ted ban kin g machine i s an auto m ate dtell er machi ne  (AT M) . A TM s may be used b y indivi duals to r eceive  ca s h fr o m thei raccounts, to  paybi l ls, tot r ans fer cas h  be twe enacco unt s, a n d to make
 generator_which generates_an acid in the_resist by_exposure._The acid_generator_decomposes the chemically_amplified resist (in_the case where the_resist is of_a_positive type) or cross-links the resist (in the case where the resist is of_a_negative type)._As_a_result, solubility of the resist_by a developing solution changes._This feature_is utilized to obtain high resolution.
In the lithography_process_using the chemically_amplified resist film, it is practical to carry out_a heating process called PEB (Post-Exposure_Baking) for diffusing_the_acid_generated at the time_of exposure. In the PEB process,_since there is an intimate relationship_between an amount of heat supplied and_a dimension of a resist film_pattern formed after exposure, severe_temperature uniformity_is required with reduction of_the size of_a pattern_to be formed.
In_a conventional PEB process, there has_been widely used_a so-called proximity baking method in_which_a substrate to_be_treated_is placed_above a hot_plate_heated by_a_heater to supply heat to the_substrate_from its back surface. It is general_to set a distance_(gap)_between the hot plate_and the substrate to be_about 100 μm to shorten the_heat time._However, since_the substrate having undergone a film forming process or the like_has a warp due to a_stress of a film,_the gap_between_the hot plate_and_the substrate_becomes non-uniform within the plane of the_substrate. This_becomes a factor of degrading temperature_uniformity within the plane_of_the substrate.
As another heating method, there_is proposed a lamp heating method_in which a light is_irradiated_onto_a substrate from a lamp_installed above the substrate to heat_the substrate. With_this method, a substrate warp is not_so_problematic as compared with the proximity_baking_method. However, there is a problem_that_it_is difficult to ensure luminance_uniformity of the lamp and thus_good temperature uniformity within the plane of the substrate_cannot be obtained.
There_is a demand for a_pattern_forming_method capable of forming a pattern having good dimensional uniformity_within the_plane of the_substrate against a substrate having a warp. This invention relates_to automated banking machines. Specifically, this invention_relates to an automated banking machine which delivers and receives various_types of sheet materials through a single opening_in the machine.
Automated banking machines are known_in the prior art._A_common type of automated banking machine is_an_automated_teller_machine (ATM). ATMs_may be used_by individuals to_receive cash_from their accounts,_to pay_bills, to transfer_cash_between accounts, and to make