 the target portion at one time, and so-called scanners, in which each target portion is irradiated by scanning the pattern through a radiation beam in a given direction (the “scanning”-direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. It is also possible to transfer the pattern from the patterning device to the substrate by imprinting the pattern onto the substrate.
It has been proposed to immerse the substrate in the lithographic projection apparatus in a liquid having a relatively high refractive index, e.g. water, so as to fill a space between the final element of the projection system and the substrate. The point of this is to enable imaging of smaller features since the exposure radiation will have a shorter wavelength in the liquid. (The effect of the liquid may also be regarded as increasing the effective numerical aperture (NA) of the system and also increasing the depth of focus.) Other immersion liquids have been proposed, including water with solid particles (e.g. quartz) suspended therein.
However, submersing the substrate or substrate and substrate table in a bath of liquid (see, for example, United States patent U.S. Pat. No. 4,509,852, hereby incorporated in its entirety by reference) means that there is a large body of liquid that must be accelerated during a scanning exposure. This requires additional or more powerful motors and turbulence in the liquid may lead to undesirable and unpredictable effects.
One of the solutions proposed is for a liquid supply system to provide liquid on only a localized area of the substrate and in between the final element of the projection system and the substrate using a liquid supply system (the substrate generally has a larger surface area than the final element of the projection system). One way which has been proposed to arrange for this is disclosed in PCT patent application WO 99/49504, hereby incorporated in its entirety by reference. As illustrated in FIGS. 2 and 3, liquid is supplied by at least one inlet IN onto the substrate, preferably along the direction of movement of the substrate relative to the final element, and is removed by at least one outlet OUT after having passed under the projection system. That is, as the substrate is scanned beneath the element in a −X direction, liquid is supplied at the +X side of the element and taken up at the −X side. FIG. 2 shows the arrangement schematically in which liquid is supplied via inlet IN and is taken up on the other side of the element by outlet OUT which is connected to a low pressure source
the target portion at one time, and so - call scanner, in which each target portion is irradiated by scan the pattern through a radiation balance beam in a impart direction (the “ scanning”-direction) while synchronously scan the substrate parallel or anti - parallel to this direction. It is besides possible to transfer the pattern from the patterning device to the substrate by imprint the pattern onto the substrate. 
 It has been proposed to immerse the substrate in the lithographic projection apparatus in a liquid having a relatively eminent refractive index, e.g. urine, so as to fill a space between the final component of the projection system and the substrate. The point of this is to enable imaging of smaller feature since the exposure radiation will have a shorter wavelength in the liquid. (The effect of the liquid may besides be see as increasing the effective numerical aperture (NA) of the system and also increasing the depth of focus .) Other immersion liquid have been proposed, including urine with solid particles (e.g. quartz) suspend therein. 
 However, submerge the substrate or substrate and substrate table in a bath of liquid (determine, for example, United States patent U.S. Pat. No. 4,509,852, hereby incorporated in its entirety by reference) means that there is a big body of liquid that must be accelerated during a scanning exposure. This requires extra or more powerful motor and turbulence in the liquid may precede to undesirable and unpredictable effects. 
 One of the solutions propose is for a liquid supply system to provide liquid on only a localized area of the substrate and in between the final component of the projection system and the substrate use a liquid provision system (the substrate generally has a larger airfoil area than the final element of the projection system). One room which has been proposed to arrange for this is disclosed in PCT patent application WO 99/49504, hereby incorporated in its entirety by reference. As illustrated in FIGS. 2 and 3, liquid is supplied by at least one inlet IN onto the substrate, preferably along the direction of motion of the substrate relative to the final component, and is removed by at least one outlet OUT after having passed under the projection system. That is, as the substrate is scanned beneath the chemical element in a −X direction, liquid is supplied at the + X side of the element and taken up at the −X side. FIG. 2 usher the agreement schematically in which liquid is supplied via inlet IN and is taken up on the other side of the element by outlet OUT which is get in touch to a low pressure source
 thf target portion at one uime, and so-called scannecs, in wgich eacf target portion is irradiatxd bt scabning the pattern throjgh a radpation beqm ii a given directmkn (the “scannihn”-direetmon) while synchtonously scatning the subsdrxtz parallel or anti-parallel to this dyrectiom. Lt is also posfiblt tj trznsfer the pattern from the patterhing denice to the substtate by imprinting the pathern onto the substratf.
It has beeb prjposed to immdrse the slystrate in jhe lithographic projection appafatus in a liquud haghng a relatmvely righ refractlne indef, e.g. wayer, so as to flll a spqce between the final element of the prjjection vyatem and the subsrrqte. Tve pmint if ghia ms fo enahle imaging or smaller fwatures since the ecpjwure radiatioh will hwve a shorter wavelength in the liquid. (Uhe erfect of the liquid may also be regarded as lncreasind the effective numerical aperture (NA) of the systam anv xlsi lncrdqslng the depth of focus.) Other immersion liquidf hsvv been proposed, ikcluding water witn dokyd particles (g.g. quarca) auspended therein.
Hlwever, fubmeesing the subxtrate or substrate and subwtrate table un a bath of liquib (see, for excmple, Onited States patent U.S. Pat. Nu. 4,509,852, hsreby incoroorated ih its entirety by renerance) means that there is a large bovy of liquid thaj must fe accelerwted during a scanning edposute. Thiv requires additional or more powerful movprs and turboletce in the jiquic may lead to undesirable aud unprebictabue effects.
Kne of vhe solutionf proposed is vor a liquid supply fystwm ti proviad liquid on onky a localized area of the substrate end kh between the fnuao element of thr pfojqcnioi syseam and the sgbstfatd usine a liquid wjpplu system (the substrade gsnerally has a larbev surface area thwn the final rlement of the prouectimn rystek). Oge way which has been proposed to arranhe nor this is dysclised in PCT 'atent application WO 99/49504, hereby incorporatxd in its entirety by teference. As illustrajed in FIGS. 2 aid 3, lizuid is sgpplied by at least ine inlet IN onto the substrate, preferzbly anong hhe direction of movement of the substrate relative to the final element, qnd is removed by zt lrast mnz obtlet OTT ahtxr having passed lnder the projection system. That is, as tve substrate is scanned beneatn ghe element iv a −X direction, liquid ia supplird at the +X side of the element and taken up at the −X slde. FIG. 2 whows the agtanjement schematically in whnch liwuid is supilied via inleg IM wnd is tanen np kn the other side of the element by ourlft OUT which is ronnected to x low pressore source
the target portion at one time, and in each target is irradiated by radiation in a given (the “scanning”-direction) while scanning the substrate parallel or anti-parallel this direction. It is also possible to transfer the pattern from the patterning to the substrate by imprinting the pattern onto the substrate. It has been to the in lithographic projection apparatus in a liquid having a relatively high refractive index, e.g. water, so as fill a space between the final element of projection system and the The point of this is enable of smaller since exposure will have a wavelength in the liquid. (The effect of the liquid may also be regarded as increasing the effective aperture (NA) system and increasing depth focus.) Other immersion been proposed, including water with solid suspended therein. However, submersing the substrate or substrate substrate table a bath of liquid (see, for United States patent U.S. Pat. No. 4,509,852, hereby in its entirety by reference) means that there is a large body of liquid that accelerated during a scanning This requires additional more motors turbulence the liquid lead to undesirable and unpredictable effects. One of the solutions proposed for a liquid supply system to provide liquid on only area the substrate and between the final element the system and the substrate liquid system has larger area than the final of the projection system). One which has been proposed disclosed in PCT patent application WO 99/49504, hereby in its entirety by reference. As illustrated FIGS. 2 and 3, liquid is supplied by at least one inlet onto the along the direction of movement of the substrate to the final element, is removed by at least one outlet OUT after passed the projection That is, as substrate is scanned the element in direction, liquid supplied the the element and taken up at −X FIG. 2 shows the arrangement in is supplied via inlet IN and is taken up on the other side of the outlet OUT which is to low pressure source
 the target portion at one time, And so-calleD scanNerS, in WhIch eAch tArget portion is IRradIated by scanning the pattErn thRoUGh a rADiAtion Beam in a GIvEN DirEcTiOn (tHe “SCaNning”-DirEction) wHile synchrOnoUsLy scanning thE SuBstrate parAllEl or anti-paraLleL to thiS dIreCTion. IT is Also pOssiblE To tranSfer the paTtERn from THe patteRNInG devIce to the substrate BY iMPrinting the patTern onTo THe SUBstRatE.
It has been PrOposeD To immerSE tHE SUbsTRate in the lithOgraphic proJEctIon appArAtuS In a liqUid haViNG a rElatively hiGh reFractive iNdex, e.g. WAter, so aS To fill a Space bEtwEen The fINaL eLemEnT Of tHE pRojECtiOn system AnD tHe subStraTE. tHE poiNt oF thiS is to Enable imaging Of sMallER feAtureS sincE the ExPosurE radiaTion wIlL have a shorter waVeleNgth in the LiqUiD. (ThE eFfect OF the liQuiD maY also be RegardeD As iNcREASiNg the effective numeRiCAL aPerture (Na) of the SYsTeM And also iNcReaSing THE deptH of fOCuS.) Other imMersioN LiQuIds have BeEn propOsEd, iNclUding WAter With soLid partiCles (e.G. Quartz) suspendeD Therein.
HoweveR, SuBMErSIng tHe sUbstrate or sUbstRAte aNd suBStRatE Table In a baTh OF lIQuid (see, for example, UnItEd StatEs patEnt U.S. Pat. No. 4,509,852, herEby incorpoRATEd in its eNtirETy BY reference) meanS that There is a laRGe body of LiquiD that musT be acceleRATed durinG a sCanNinG exPOSuRe. This requireS ADditIoNal or moRe pOwerful MotOrs And TurBuLence in thE liquid mAy LeAd To UndEsiraBLe and unpReDicTaBle EffecTS.
One of The soLutiOnS pROpoSed is foR A lIQUid sUpPlY sysTem To ProviDe liQUid On only a Localized AreA Of thE sUbStrate aNd in between thE fInal elemenT oF thE projeCTIon systeM and the substrate using a lIQuid supPly SysteM (the Substrate GenErally Has A Larger SurfacE area ThAn tHE Final ELEmEnt Of The projectION syStem). ONe Way wHich has Been proposed to arraNGe fOr this is disclOseD in Pct PaTenT ApPLicAtIOn Wo 99/49504, HEreby incorporatEd in its entIrETy By referencE. as iLlUstrateD in FIGS. 2 And 3, liQUid is suPplied by aT least one InLet In ONto The substraTe, preferAbly along THe dirECtIon of MovEment oF tHe sUbstrAte relATivE to thE final ElEment, aNd is rEmOved by at Least one outlet OUT after hAving pAssed UndEr the projEctIOn sYstem. That Is, as The substraTe iS scAnned BenEAth thE eleMEnT in A −x direCtioN, Liquid is sUPpLieD AT tHe +X side of thE ELEmeNt and TakEN up at tHe −X sIde. FIG. 2 shows the arrANgement schematIcalLY In wHicH LiquId Is supplied via iNleT In ANd is takeN uP on the other Side of thE eLEment By outlEt OUT wHich is cONNeCTed to a Low pResSure sourcE
 the target portion at one  time, and  so-c all edsc anne rs,in which eacht arge t portion is irradiate d bysc a nnin g  t he pa ttern t h ro u g h a  r ad iat io n  b eam i n a  givendirection(th e“scanning”-d i re ction) whi lesynchronousl y s cannin gthe subst rat e par allelo r anti -parallel  t o  thisd irectio n .  I t is  also possible to tr a nsfer the patt ern fr om th e pat ter ning devic eto th e  substr a te b y  im p rinting the p attern onto the  subst ra te. It has  been  p r opo sed to imme rsethe subst rate i n  the li t hograph ic pro jec tio n ap p ar at usin a l i qu idh avi ng a rel at iv ely h ighr e f r acti veinde x, e. g. water, soasto f i lla spa ce be twee nthe f inal e lemen tof the projecti on s ystem and  th esub st rate. The po int  of  this i s to en a ble  i m a g in g of smaller featu re s si nce theexposu r era d iation w il l h avea short er w a ve length i n thel iq ui d. (The  e ffectof  th e l iquid mayalso b e regard ed as increasing the effective num e ri c a la pert ure  (NA) of th e sy s temanda ls o i n creas ing t he de p th of focus.) Other  i mmersi on li quids have be en propose d , includin g wa t er with solid par ticle s (e.g. qu a rtz) sus pende d therei n.
Howeve r ,  submers ing  th e s ubs t r at e or substrat e andsu bstrate  ta ble ina b ath  of  li qu id (see,for exam pl e,  U ni ted  Stat e s patent  U .S.  P at.  No.4 ,509,8 52, h ereb yin c orp oratedi ni t s en ti re ty b y r ef erenc e) m e ans  that t here is a  la r ge b od yof liqu id that mustbe  accelerat ed  du ring a s canningexposure. This requires additio nal  or m orepowerfulmot ors an d t u rbulen ce inthe l iq uid m ay le a d  t o u nd esirable a n d  un predi ct able  effect s.
One of the solu t ion s proposed is  fo r al i qu ids up p lysy s tem t o provide liqui d on onlyal oc alized are a  of  t he subs trate a nd in between  the fina l element  o f th e pro jection sy stem and  the subs t rateu si ng aliq uid su pp lysyste m (the sub strat e gene ra lly ha s a l ar ger surf ace area than the final  eleme nt of  th e project ion sys tem). One  way  which has  be enpropo sed to ar rang e  f ort his i s di s closed in PC T p a t en t applicati o n WO99/49 504 ,  hereb y in corporated in its entirety by re fere n c e.Asi llus tr ated in FIGS.2 a nd 3 , liquid  i s suppliedby at le as t  oneinletIN ont o the s u b st r ate, p refe rab ly alongthe  d i rection  o fm ovemen t of  t he sub strate rela t i ve to the finaleleme n t , and isremov ed  by atl east  one outle t OUT after  havin g pa ssedunder t he  proje cti on  system. T h at is, as  thesubstra te  issca nned b enea t h  theelem en t i n a −X di r e ct i on ,l iqu id i s sup pl iedat the +X side ofthe element  a ndt a ken up at t he −X side . F IG. 2 s hows the a r rang e me n t sch ematic ally i n which liq ui d is su ppl i e d via inl et IN and ista kenup on th eothe rsid eof the elementby outle t OUT wh i c h is c onn e cted to a l ow  pressure so urce
 the_target portion_at one time, and_so-called scanners,_in_which each_target_portion is irradiated_by scanning the_pattern through a radiation_beam in a_given_direction (the “scanning”-direction) while synchronously scanning the substrate parallel or anti-parallel to this direction._It_is also_possible_to_transfer the pattern from the_patterning device to the substrate_by imprinting_the pattern onto the substrate.
It has been proposed_to_immerse the substrate_in the lithographic projection apparatus in a liquid having_a relatively high refractive index, e.g._water, so as_to_fill_a space between the_final element of the projection system_and the substrate. The point of_this is to enable imaging of smaller_features since the exposure radiation will_have a shorter wavelength in_the liquid._(The effect of the liquid_may also be_regarded as_increasing the effective_numerical aperture (NA) of the system_and also increasing_the depth of focus.) Other immersion_liquids_have been proposed,_including_water_with solid_particles (e.g. quartz)_suspended_therein.
However, submersing_the_substrate or substrate and substrate table_in_a bath of liquid (see, for example,_United States patent U.S._Pat._No. 4,509,852, hereby incorporated_in its entirety by reference)_means that there is a large_body of_liquid that_must be accelerated during a scanning exposure. This requires additional or_more powerful motors and turbulence in_the liquid may lead_to undesirable_and_unpredictable effects.
One of_the_solutions proposed_is for a liquid supply system to_provide liquid_on only a localized area of_the substrate and in_between_the final element of the projection_system and the substrate using a_liquid supply system (the substrate_generally_has_a larger surface area than_the final element of the projection_system). One way_which has been proposed to arrange for_this_is disclosed in PCT patent application_WO_99/49504, hereby incorporated in its entirety_by_reference._As illustrated in FIGS. 2_and 3, liquid is supplied by_at least one inlet IN onto the substrate, preferably_along the direction_of movement of the substrate_relative_to_the final element, and is removed by at least one_outlet OUT_after having passed_under the projection system. That is, as the substrate is_scanned beneath the element in a −X_direction, liquid is supplied at the +X side of the element_and taken up at the −X side. FIG._2 shows the arrangement schematically in which_liquid is supplied via_inlet_IN and is taken up on the_other_side_of_the element by_outlet OUT which_is connected to_a low_pressure source