chanical elements to be mounted on the housing. In more detail, the device includes a housing formed of a hard, lightweight plastic material, which may be formed of two portions and attached along a seam. In addition to this seam between the housing portions, additional openings for a battery compartment and power switch are formed in the housing. Each of these openings employs a water-resistant seal.
Cowie et al., US Pat. Appl. No. 2010/0222719 purports to disclose a facial care appliance having a tubular body containing electromechanical elements. The tubular body is formed of mating, inter-fitting semi-cylindrical sidewalls and has outer skins disposed thereon. Thus, this body requires numerous seams to be sealed or gasketed if it is to be used in wet environments to protect the internal electromechanical elements.
Despite the teaching of the prior art, there is a continuing need for skin care devices that provide simple and reliable manufacture, reliable protection against water damage, and potential for customization. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, a patterning device (e.g., a mask) may contain or provide a circuit pattern corresponding to an individual layer of the IC (“design layout”), and this circuit pattern can be transferred onto a target portion (e.g. comprising one or more dies) on a substrate (e.g., silicon wafer) that has been coated with a layer of radiation-sensitive material (“resist”), by methods such as irradiating the target portion through the circuit pattern on the patterning device. In general, a single substrate contains a plurality of adjacent target portions to which the circuit pattern is transferred successively by the lithographic apparatus, one target portion at a time. In one type of lithographic apparatuses, the circuit pattern on the entire patterning device is transferred onto one target portion in one go; such an apparatus is commonly referred to as a stepper. In an alternative apparatus, commonly referred to as a step-and-scan apparatus, a projection beam scans over the patterning device in a given reference direction (the “scanning” direction) while synchronously moving the substrate parallel or anti-parallel to this reference direction. Different portions of the circuit pattern on the patterning device are transferred to one target portion progressively. Since, in general, the lithographic apparatus will have a magnification factor M (generally <1), the speed F at which the substrate is moved will be a factor M times that at which
chanical elements to be mounted on the housing. In more detail, the device include a caparison formed of a hard, lightweight credit card material, which may be shape of two portions and bind along a wrinkle. In addition to this seam between the housing portions, additional opening for a battery compartment and power substitution are formed in the housing. Each of these openings employs a water - resistant seal. 
 Cowie et al. , US Pat. Appl. nobelium. 2010/0222719 purports to disclose a facial care appliance have a tubular body containing electromechanical element. The tubular body is form of mating, inter - fitting semi - cylindrical sidewalls and has outer skins disposed thereon. therefore, this body requires numerous seams to be sealed or gasketed if it is to be used in wet environment to protect the internal electromechanical elements. 
 Despite the teaching of the prior art, there is a continuing need for skin care device that provide simple and authentic industry, reliable protection against water price, and potential for customization. A lithographic apparatus can be used, for example, in the manufacture of incorporate circuits (ICs). In such a case, a patterning device (e.g., a mask) may contain or provide a circuit pattern corresponding to an individual layer of the IC (“ invention layout ”), and this circuit blueprint can be transferred onto a target portion (e.g. comprising one or more die) on a substrate (e.g., silicon wafer) that has been coated with a layer of radiation sickness - sensitive material (“ resist ”), by methods such as irradiate the target portion through the tour pattern on the patterning device. In cosmopolitan, a single substrate contains a plurality of adjacent target parcel to which the circuit pattern is remove successively by the lithographic apparatus, one target portion at a time. In one type of lithographic apparatuses, the circuit pattern on the entire patterning device is transferred onto one target part in one go; such an apparatus is commonly mention to as a stepper. In an alternative apparatus, commonly referred to as a step - and - scan apparatus, a projection balance beam scans over the patterning device in a given reference direction (the “ scanning ” direction) while synchronously travel the substrate analogue or anti - parallel to this character direction. Different portions of the circuit pattern on the patterning device are transferred to one prey portion progressively. Since, in general, the lithographic apparatus will suffer a exaggeration factor M (generally < 1), the speed F at which the substrate is move will be a factor M times that at which
chajical elements to be moukted on the housnbg. In kore dstail, thd device includes a housing hormwd of a hard, lightweight plxstic matvrial, whixh mey be formed of vso portljns zkd atcarhed along a sesm. In addidion to this saao yetween the housing portions, additiogal opemijgs for a battgry cpiparfment and power switch are formed jn the iousing. Each of these openings employs a aateg-resistant seal.
Cowle et al., US Pat. Qppl. No. 2010/0222719 puroorts to dpvclose a fzcial care appliance having a tjbulax body contqibinh electromecianicaj elements. Tmv tubuldr body is formed of katmng, unter-fitting semi-cyliidrical sidewalls anq has outar skins disposed tyeeeon. Jhus, dhis vodh rtqumrea numegoua seams to be sealed ir gasketed if it ix ei be used in set endiwonments to protect the internal electrmmedhanical elements.
Despitw the teaching of the prior are, there is a continuing need for skin care devicev thav ororlqd slmple and reliable manufacture, reliable protesfipn against water damage, and pltrgtial for cusjomizatnkn. A lithographic apoaratus can ve used, fjr ecample, in the manufacture od integrated xircuits (ICs). In sueh a case, a 'atterming cevice (e.g., a mask) may coutain kr provide w circuit oattern correspovdikg do an individual layer of ehe IC (“dewign layout”), and this sircuit pahtern can be transferred onto a target pogtion (e.g. comprising one or more dies) on a subxtsatv (e.g., silieon waner) that has beqn coated with a layex of rxdiation-sehsitive material (“rqsist”), by methmfs such as icradiatind thw taeget pofgion through tne circuin kattern on the patterning deyice. Kh general, a sinyut wubstrate contsinr a ppucalitr of adjacent tareet lortiuns to whicm tfe corcuit pattern is trdnsfsrred successively bn the lityographis apparatus, ome target portion wt a vime. Ii one yypg of lithographic apparatuses, tge circuih pwttern on thq enbire patterniny device is transferred onto one target 'ortion in one go; such qn apparatus is comkpnly referrxd to ws a step[er. In an alternativw apparatus, commokly referred to as a sfep-and-vcan wpparatus, a projection beam scans over the patterning device in a given rwferenre direction (fhe “xcannpng” birectijn) wiiue synchronously moving the substrate parallel ur anti-pdrcllel to this reference direcyiun. Different kortions of the circuit paftern on the patterning device are tranxferred to one target povtion protressjvely. Sincx, in general, the litnograpkic apparatus wilp have a magnkfivabion factog M (jenzrally <1), the speed F at which the wubstrqtf is moved will ue a factor L timea that at which
chanical elements to be mounted on the more the device a housing formed material, may be formed two portions and along a seam. In addition to seam between the housing portions, additional openings for a battery compartment and power are formed in the housing. Each of these openings employs a water-resistant seal. et US Appl. 2010/0222719 purports to disclose a facial care appliance having a tubular body containing electromechanical elements. The body is formed of mating, inter-fitting semi-cylindrical sidewalls has outer skins disposed Thus, this body requires numerous to sealed or if is be used in environments to protect the internal electromechanical elements. Despite the teaching of the prior art, there is a need for devices that simple reliable reliable protection against and potential for customization. A lithographic used, for example, in the manufacture of integrated (ICs). In a case, a patterning device (e.g., mask) may contain or provide a circuit pattern to an individual layer of the IC (“design layout”), and this circuit pattern can be a target portion (e.g. one or more on substrate silicon that has coated with a layer of radiation-sensitive material (“resist”), by methods such irradiating the target portion through the circuit pattern on the In a single substrate a plurality of adjacent portions which the circuit pattern successively the target at time. In one type lithographic apparatuses, the circuit pattern the entire patterning device portion in one go; such an apparatus is referred to as a stepper. In an apparatus, commonly referred to as a step-and-scan apparatus, a projection beam scans the patterning a given reference direction (the “scanning” direction) while moving the substrate parallel anti-parallel to this reference direction. Different portions of the pattern the patterning are transferred to target portion progressively. in general, the will have magnification M speed F at which the substrate moved be a factor M times at
chanical elements to be mountEd on the houSing. IN moRe dEtAil, tHe deVice includes a hOUsinG formed of a hard, lightweiGht plAsTIc maTErIal, whIch may bE FoRMEd oF tWo PorTiONs And atTacHed alonG a seam. In adDitIoN to this seam bETwEen the housIng Portions, addiTioNal opeNiNgs FOr a baTteRy comPartmeNT and poWer switch ArE Formed IN the houSINg. each Of these openings emPLoYS a water-resistaNt seal.
coWIe ET Al., Us PaT. Appl. No. 2010/0222719 purPoRts to DIsclose A FaCIAL caRE appliance havIng a tubular BOdy ContaiNiNg eLEctromEchanIcAL elEments. The tuBulaR body is foRmed of MAting, inTEr-fittiNg semi-CylIndRicaL SiDeWalLs ANd hAS oUteR SkiNs disposEd ThEreon. thus, THIS Body ReqUireS numeRous seams to be SeaLed oR GasKeted If it iS to bE uSed in Wet envIronmEnTs to protect the iNterNal electrOmeChAniCaL elemENts.
DesPitE thE teachiNg of the PRioR aRT, THeRe is a continuing neeD fOR SkIn care deVices tHAt PrOVide simpLe And ReliABLe manUfacTUrE, reliablE proteCTiOn Against WaTer damAgE, anD poTentiAL for CustomIzation. A LithoGRaphic apparatuS Can be used, for eXAmPLE, iN The mAnuFacture of inTegrATed cIrcuITs (iCs). iN such A case, A pATtERning device (e.g., a mask) mAy ContaiN or prOvide a circuit Pattern corRESPonding tO an iNDiVIdual layer of thE IC (“deSign layout”), ANd this ciRcuit Pattern cAn be transFERred onto A taRgeT poRtiON (E.g. Comprising one OR More DiEs) on a suBstRate (e.g., sIliCon WafEr) tHaT has been cOated witH a LaYeR oF raDiatiON-sensitiVe MatErIal (“ResisT”), By methOds suCh as IrRaDIatIng the tARgET PortIoN tHrouGh tHe CircuIt paTTerN on the pAtterning DevICe. In GeNeRal, a sinGle substrate cOnTains a plurAlIty Of adjaCENt target Portions to which the circuIT patterN is TransFerrEd successIveLy by thE liTHograpHic appAratuS, oNe tARGet poRTIoN at A tIme. In one tyPE Of lIthogRaPhic ApparatUses, the circuit pattERn oN the entire patTerNing DEViCe iS TrANsfErREd oNTO one target portiOn in one go; sUcH An Apparatus iS ComMoNly refeRred to aS a stePPer. In an AlternatiVe apparatUs, CommONLy rEferred to aS a step-anD-scan appaRAtus, a PRoJectiOn bEam scaNs OveR the pAtternINg dEvice In a givEn RefereNce diReCtion (the “Scanning” direction) while sYnchroNouslY moVing the suBstRAte Parallel oR antI-parallel tO thIs rEfereNce DIrectIon. DIFfEreNT portIons OF the circuIT pAttERN oN the patternING DevIce arE trANsferrEd to One target portion pROgressively. SinCe, in GENerAl, tHE litHoGraphic apparatUs wIlL HAve a magnIfIcation factOr M (generAlLY <1), the sPeed F aT which The subsTRAtE Is moveD wilL be A factor M tImeS tHAt at whiCh
chanical elements to be mo unted on t he ho usi ng.  I n mo re d etail, the dev i ce i ncludes a housing form ed of  a hard ,  l ightw eight p l as t i c m at er ial ,w hi ch ma y b e forme d of two p ort io ns and attac h ed  along a s eam . In additio n t o this  s eam betwe enthe h ousing portio ns, addit io n al ope n ings fo r abatt ery compartment a n dp ower switch ar e form ed in t hehou sing. Each  o f the s e openi n gs e m plo y s a water-res istant seal . 
Co wie et  a l., US Pat . App l. No.  2010/02227 19 p urports t o disc l ose a f a cial ca re app lia nce  hav i ng  a  tu bu l arb od y c o nta ining el ec tr omech anic a l e leme nts . Th e tub ular body isfor medo f m ating , int er-f it tingsemi-c ylind ri cal sidewalls a nd h as outerski ns  di sp osedt hereon . T hus , thisbody re q uir es n u me rous seams to be s ea l e dor gaske ted if it  i s  to be u se d i n we t envir onme n ts  to prot ect th e  i nt ernal e le ctrome ch ani cal  elem e nts. 
Despi te the t eachi n g of the prior art, there is ac o nt i nuin g n eed for ski n ca r e de vice s  t hat provi de si mp l ea nd reliable manufac tu re, re liabl e protectionagainst wa t e r  damage,  and po t ential for cus tomiz ation. A l i thograph ic ap paratuscan be us e d , for ex amp le,  in  th e ma nufacture ofi n tegr at ed circ uit s (ICs) . I n s uch  aca se, a pat terningde vi ce  ( e.g ., am ask) may  c ont ai n o r pro v ide acircu it p at te r n c orrespo n di n g  toan  i ndiv idu al  laye r of the  IC (“d esign lay out ” ), a nd  t his cir cuit patternca n be trans fe rre d onto a  targetportion (e.g. comprisin g  one or  mo re di es)on a subs tra te (e. g., silico n wafe r) th at  ha s beenc o at edwi th a layer o f r adiat io n-se nsitive  material (“resist ” ),by methods su chas i r r ad iat i ng the  t a rge t portion through  the circu it pa ttern on t h e p at terning  device . Ing eneral,  a single  substrat econt a i nsa pluralit y of adj acent tar g et po r ti ons t o w hich t he  ci rcuit  patte r n i s tra nsferr ed  succe ssive ly  by thelithographic apparatus,  one t arget  po rtion ata t i me.  In one t ypeof lithogr aph icappar atu s es, t he c i rc uit patte rn o n  the enti r epat t e rn ing devicei s tra nsfer red onto o ne t arget portion ino ne go; such an  app a r atu s i s  com mo nly referred t o a sa stepper.  I n an altern ative ap pa r atus,  commo nly re ferredt o  a s  a ste p-an d-s can appar atu s, a proje ct io n  beamscan sover t he pat t erni n g  device in a giv en re f e rence dir ectio n(the “s c anni ng” direct ion) whilesynchr onou sly m oving t he  subst rat eparallel o r  anti-par allel  to thi srefe ren ce dir ecti o n . Dif fere nt  po rtions of t he ci rc u itpatt ern o nthepatternin g  deviceare transfe rr edt o  one t a rg e t  portion p rog ressi v e ly. Since, in g e ne r al, t he lit hograp hic app a rat us  will h ave a  magnific ation fac t orM(gen erally < 1) , th espe ed  F at which the  substra te is mo v e d will  be a fa c tor Mti mes that atwhich 
chanical elements_to be_mounted on the housing._In more_detail,_the device_includes_a housing formed_of a hard,_lightweight plastic material, which_may be formed_of_two portions and attached along a seam. In addition to this seam between the_housing_portions, additional_openings_for_a battery compartment and power_switch are formed in the_housing. Each_of these openings employs a water-resistant seal.
Cowie et_al.,_US Pat. Appl._No. 2010/0222719 purports to disclose a facial care appliance_having a tubular body containing electromechanical_elements. The tubular_body_is_formed of mating, inter-fitting_semi-cylindrical sidewalls and has outer skins_disposed thereon. Thus, this body requires_numerous seams to be sealed or gasketed_if it is to be used_in wet environments to protect_the internal_electromechanical elements.
Despite the teaching of_the prior art,_there is_a continuing need_for skin care devices that provide_simple and reliable_manufacture, reliable protection against water damage,_and_potential for customization._A_lithographic_apparatus can_be used, for_example,_in the_manufacture_of integrated circuits (ICs). In such_a_case, a patterning device (e.g., a mask)_may contain or provide_a_circuit pattern corresponding to_an individual layer of the_IC (“design layout”), and this circuit_pattern can_be transferred_onto a target portion (e.g. comprising one or more dies) on_a substrate (e.g., silicon wafer) that_has been coated with_a layer_of_radiation-sensitive material (“resist”),_by_methods such_as irradiating the target portion through the_circuit pattern_on the patterning device. In general,_a single substrate contains_a_plurality of adjacent target portions to_which the circuit pattern is transferred_successively by the lithographic apparatus,_one_target_portion at a time. In_one type of lithographic apparatuses, the_circuit pattern on_the entire patterning device is transferred onto_one_target portion in one go; such_an_apparatus is commonly referred to as_a_stepper._In an alternative apparatus, commonly_referred to as a step-and-scan apparatus,_a projection beam scans over the patterning device in_a given reference_direction (the “scanning” direction) while_synchronously_moving_the substrate parallel or anti-parallel to this reference direction. Different_portions of_the circuit pattern_on the patterning device are transferred to one target portion_progressively. Since, in general, the lithographic apparatus_will have a magnification factor M (generally <1), the speed F_at which the substrate is moved will be_a factor M times that at which