 In practice, one examination may take mammography on the same breast at different directions in order to obtain various sections of mammography images. Next, a doctor can manually suspend a plurality of mammograms on a plurality of light boxes in a consulting room to inspect and compare one by one for any abnormal findings. Sometimes, the mammograms in a previous examination or other mammograms are inspected for reference. Otherwise, for convenient comparison, an order and direction of suspended mammograms are adaptively adjusted. When more parallel mammograms are required, it is not satisfactory because the number of light boxes or the place is limited. Such manually suspending way and demand of the light boxes are inconvenient, time-wasting, expensive, and difficult to increase the diagnostic efficiency.
Accordingly, a special suspending method for the mammograms is provided to meet with the habitual behaviors of people and individual in use, the medical environments, and the operation procedures. However, the effectiveness is limited due to the manually suspending way, even the special suspending method is provided.
Therefore, it is desired to provide a method for displaying mammography images for improving the above displaying method without changing the old suspending habit, so that the practice and completeness are satisfied. An STI technology has been studied so as to improve a LOCOS method that is widely used in manufacturing process of microelectronic devices. According to this STI technology, a semiconductor substrate is etched so that a shallow trench is formed therein, and an insulating material is filled in the shallow trench thereby forming an isolation region. If a conventional LOCOS method is used, the insulating material is formed by thermal oxidation for long time. However, if the conventional STI method is used, a thermal oxidation process is not required. Therefore, problems caused by the thermal oxidation process can be reduced by using the STI technology. For example, during the conventional LOCOS process, a bird's beak phenomenon which is formed at a boundary of an isolation region and an active region, can be reduced.
The conventional STI region is formed as follows.
First, a trench is formed in a semiconductor substrate. An insulating layer is deposited so as to fill inside the trench. The insulating layer is polished by a chemical vapor polishing("CMP") process until a surface of the semiconductor substrate is exposed, thereby filling the insulating layer within the trench.
However, there are problems in the conventional method of forming STI region. During the CMP process to the insulating layer until the surface of the semiconductor substrate is exposed, the
In practice, one examination may take mammography on the same breast at unlike commission in order to receive respective sections of mammography images. Next, a doctor of the church can manually suspend a plurality of mammograms on a battalion of faint boxes in a consulting room to audit and compare one by one for any abnormal findings. Sometimes, the mammograms in a former examination or other mammograms are inspected for reference. Otherwise, for convenient comparison, an ordering and direction of suspended mammograms are adaptively adjust. When more parallel mammograms are required, it is not satisfactory because the number of light box or the place is limited. Such manually suspending way and demand of the clean boxes are inconvenient, time - wasting, expensive, and difficult to increase the diagnostic efficiency. 
 Accordingly, a particular suspending method acting for the mammograms is provided to meet with the habitual behaviors of people and individual in habit, the aesculapian environment, and the operation procedure. However, the potency is specify due to the manually suspending way, even the special suspending method is provided. 
 Therefore, it is desired to provide a method acting for displaying mammography images for improving the above displaying method without changing the old suspending habit, so that the practice and completeness are satisfied. An STI technology has been studied so as to better a LOCOS method that is wide use in manufacturing process of microelectronic devices. According to this STI technology, a semiconductor substrate is etched so that a shallow trench is form therein, and an insulating material is filled in the shallow trench thereby forming an isolation region. If a ceremonious LOCOS method is used, the insulating material is formed by thermal oxidation for retentive time. However, if the ceremonious STI method is used, a thermal oxidation process is not required. consequently, problems caused by the thermal oxidation process can be repress by using the STI engineering. For example, during the conventional LOCOS process, a boo's beak phenomenon which is formed at a boundary of an isolation region and an active region, can be reduced. 
 The ceremonious STI region is formed as comply. 
 First, a trench is formed in a semiconductor substrate. An insulating layer is deposited so as to fill inside the trench. The isolate layer is polished by a chemical vapor polishing("CMP ") process until a surface of the semiconductor substrate is expose, thereby fill the insulating layer within the trench. 
 However, there are problems in the conventional method of forming STI area. During the CMP process to the insulating layer until the surface of the semiconductor substrate is exposed, the
 In practice, one examinatiok may take mammoyeaphy mn the same brdast at different directions ib ordtg to obtain various sdctions ov mammogeaphb images. Next, a vkctor can manhwlly wuspend a plurslity of mdmmograms on a puuxality of light boxes in a consultind room yo inspect and cjmpage one by one for any abnormal findings. Aometimts, the mammograms on a previous examination lr ohher mammograms arf inspected for eeference. Otferwise, fog convenienj comparison, an order and directkon oy suspended mqmmlcrams are avaptivvly adjusted. When mora paralkel mammograms arx rewuired, it is not sativfactory because tre number oy light boxes or the plqce iv likitea. Suzh jaiuamly sudpeiding way ahd demand od the light boxes ate pmconvenient, fime-waftyng, expensive, and difficult to increase ths diagnostic efficiency.
Qccordingly, a special suspendigg method for the mammograms is provided to meet fith vhd hcnltuau bfhaviors of people and individual in use, the isdocsl environmentf, and the olegayyon procedurer. Howersr, the effectiveness is limyted eue to tht manially suspending way, even tye special slspebding method is prlvided.
Thereyore, ij is drsired to provide a metkod fod displayinh mammogrzohy images for ioprpvhng the above displaying mqthod witiout ehanging the old stspending jabit, so that the practife anb com[leteness wre satisfied. An STI technology has been studoeg sm as to nmprovc a LOCOS methoq that is wideky used in mxnufacturihg procxss of microqlectronic deelces. Accordiig to thif STU texhnologh, a semiconductpr substrcue is etchwd so that a shallpw jrsnch is formed cketwin, and an insilagind laveriaj is filled it thd sfsllow trench thevebh fotming an isolation ragioh. If a conventionak JOCOS mejhod is ufed, the insulsting material is vormev by tiermal oxydation for long time. However, jf the cojvektional STI mqthoe is used, a chermal oxidation process is not requirev. Therefore, problems caysed by the thermal pxidation pcocess can be raduced by using the WTI technology. Fov example, during the cknventhonal LOCOS process, a bird's beak phenomenon which is formed at a boundary of ab isoletyon region znd sn acnivz rzgion, cwn bx ceduced.
The convennional STI region is formed as fullows.
Fissc, a trench is formed in a semocunductor subsjrate. An insulating layer js deposoted so as to fill inside the ttench. The insulating laycr is polushed by a bgeoical vapor polishong("CMP") procwss untul a surface of tfe xeliconductlr snbscrate is exposed, thereby filling rhe inwupating layer witiin the trengh.
Mowevet, there wre problems in fhe dlnvenjional method pf forming STI region. During the CKP process to tht insulating laier unjnn the surfacx of the semhconductor substrate is exposed, the
In practice, one examination may take mammography same at different in order to images. a doctor can suspend a plurality mammograms on a plurality of light in a consulting room to inspect and compare one by one for any findings. Sometimes, the mammograms in a previous examination or other mammograms are inspected reference. for comparison, order and direction of suspended mammograms are adaptively adjusted. When more parallel mammograms are required, it not satisfactory because the number of light boxes the place is limited. manually suspending way and demand the boxes are time-wasting, and to increase the efficiency. Accordingly, a special suspending method for the mammograms is provided to meet with the habitual behaviors people and use, the environments, the procedures. However, the limited due to the manually suspending special suspending method is provided. Therefore, it is to provide method for displaying mammography images for the above displaying method without changing the old habit, so that the practice and completeness are satisfied. An STI technology has been studied to improve a LOCOS that is widely in process microelectronic According to STI technology, a semiconductor substrate is etched so that a shallow is formed therein, and an insulating material is filled in trench forming an isolation If a conventional LOCOS is the insulating material is thermal for if conventional method is used, a oxidation process is not required. problems caused by the reduced by using the STI technology. For example, the conventional LOCOS process, a bird's beak which is formed at a boundary of an isolation region and an region, can The conventional STI region is formed as follows. a trench is formed a semiconductor substrate. An insulating layer is deposited so to inside the The insulating layer polished by a vapor polishing("CMP") process surface of semiconductor is the insulating layer within the trench. there problems in the conventional method forming During the CMP process to the insulating layer until the surface of the semiconductor substrate the
 In practice, one examination mAy take mammOgrapHy oN thE sAme bReasT at different diREctiOns in order to obtain variOus seCtIOns oF MaMmogrAphy imaGEs. nEXt, a DoCtOr cAn MAnUally SusPend a plUrality of mAmmOgRams on a pluraLItY of light boXes In a consultinG roOm to inSpEct ANd comParE one bY one foR Any abnOrmal findInGS. SometIMes, the mAMMoGramS in a previous examiNAtIOn or other mammoGrams aRe INsPECteD foR reference. otHerwiSE, for conVEnIENT coMParison, an ordeR and directiON of SuspenDeD maMMogramS are aDaPTivEly adjusted. when More paralLel mamMOgrams aRE requirEd, it is Not SatIsfaCToRy BecAuSE thE NuMbeR Of lIght boxeS oR tHe plaCe is LIMITed. SUch ManuAlly sUspending way aNd dEmanD Of tHe ligHt boxEs arE iNconvEnient, Time-wAsTing, expensive, anD difFicult to iNcrEaSe tHe DiagnOStic efFicIenCy.
AccorDingly, a SPecIaL SUSpEnding method for the MaMMOgRams is prOvided TO mEeT With the hAbItuAl beHAViors Of peOPlE and indiVidual IN uSe, The mediCaL envirOnMenTs, aNd the OPeraTion prOcedures. howevER, the effectivenESs is limited duE To THE mANualLy sUspending waY, eveN The sPeciAL sUspENding MethoD iS PrOVided.
Therefore, it is dEsIred to ProviDe a method for dIsplaying mAMMOgraphy iMageS FoR Improving the abOve diSplaying meTHod withoUt chaNging the Old suspenDINg habit, sO thAt tHe pRacTICe And completeneSS Are sAtIsfied. AN STi technoLogY haS beEn sTuDied so as tO improve A LoCoS MeThoD that IS widely uSeD in MaNufActurINg procEss of MicrOeLeCTroNic deviCEs. aCCordInG tO thiS STi tEchnoLogy, A SemIconducTor substrAte IS etcHeD sO that a sHallow trench iS fOrmed thereIn, And An insuLATing mateRial is filled in the shalloW Trench tHerEby foRminG an isolatIon Region. if a COnventIonal LoCOS mEtHod IS Used, tHE InSulAtIng materiaL IS foRmed bY tHermAl oxidaTion for long time. HowEVer, If the conventiOnaL STI METhOd iS UsED, a tHeRMal OXIdation process iS not requirEd. tHeRefore, probLEms CaUsed by tHe thermAl oxiDAtion prOcess can bE reduced bY uSing THE STi technologY. For examPle, during THe conVEnTionaL LOcOS proCeSs, a Bird's Beak phENomEnon wHich is FoRmed at A bounDaRy of an isOlation region and an activE regioN, can bE reDuced.
The cOnvENtiOnal STI reGion Is formed as FolLowS.
FirsT, a tREnch iS forMEd In a SEmicoNducTOr substraTE. AN inSULaTing layer is DEPOsiTed so As tO Fill inSide The trench. The insulATing layer is polIsheD BY a cHemICal vApOr polishing("CMP") ProCeSS Until a suRfAce of the semIconductOr SUbstrAte is eXposed, Thereby FILlINg the iNsulAtiNg layer wiThiN tHE trench.
hoWeVEr, therE are PrOblems In the cONvenTIOnal method of formIng STi REgion. dUriNg the cMp procesS To thE insulatinG layer until The surFace Of the SemiconDuCtor suBstRaTe is exposeD, The
 In practice, one examinat ion may ta ke ma mmo gra ph y on  the  same breast a t  dif ferent directions in o rderto obta i nvario us sect i on s ofma mm ogr ap h yimage s.Next, a  doctor ca n m an ually suspen d  a  plurality  of  mammogramsona plur al ity of li ght  boxe s in a consul ting room  t o  inspe c t and c o m pa re o ne by one for any ab n ormal findings . Some ti m es , the  ma mmograms i na pre v ious ex a mi n a t ion or other mamm ograms arei nsp ectedfo r r e ferenc e. Ot he r wis e, for conv enie nt compar ison,a n order and dir ection  of  su spen d ed  m amm og r ams ar e a d apt ively ad ju st ed. W henm o r e  par all el m ammog rams are requ ire d, i t  is  notsatis fact or y bec ause t he nu mb er of light box es o r the pla ceis  li mi ted.S uch ma nua lly  suspen ding wa y  an dd e m an d of the light box es a re  inconve nient, ti me - wasting,  e xpe nsiv e ,  anddiff i cu lt to in crease th ediagnos ti c effi ci enc y.Accor d ingl y, a s pecial s uspen d ing method for the mammogram s  i s pr o vide d t o meet with  the habi tual be hav i ors o f peo pl e  a n d individual in use ,the me dical  environments , and theo p e ration p roce d ur e s. However, th e eff ectiveness is limit ed du e to the  manually s uspendin g w ay,  ev ent h especial suspe n d ingme thod is  pr ovided. 
Th ere for e,it  is desir ed to pr ov id eamet hod f o r displa yi ngma mmo graph y  image s for  imp ro vi n g t he abov e  d i s play in gmeth odwi thout  cha n gin g the o ld suspen din g  hab it ,so that  the practice  a nd complet en ess  are s a t isfied.An STI technology has b e en stud ied  so a s to  improvea L OCOS m eth o d that  is wi delyus edi n  manu f a ct uri ng  process o f mic roele ct roni c devic es. According to t h isSTI technolog y,a se m i co ndu c to r  su bs t rat e is etched so th at a shall ow tr ench is fo r med  t herein,  and an  insu l ating m aterial i s filledin  the s hal low trench  thereby  forminga n iso l at ion r egi on. If  a  co nvent ionalL OCO S met hod is  u sed, t he in su lating m aterial is formed by th ermaloxida tio n for lon g t i me.  However,  ifthe conven tio nal  STImet h od is  use d ,a t h ermal  oxi d ation pro c es s i s no t required. T h ere fore,  pr o blemscaus ed by the thermal oxidation proc essc a n b e r e duce dby using the S TIte c h nology.Fo r example,during t he conve ntiona l LOCO S proce s s ,a  bird' s be akphenomeno n w hi c h is fo rm ed at a b ound ar y of a n isol a tion r egion and an act ive r e g ion,c anbe re du ced.
Th e  con ventionalSTI regionis for medas fo llows.Fi rst, a  tr en ch is form e d in a se micon ductorsu bstr ate . An i nsul a t ing l ayer  i s d epositeds o  a s  t of ill  ins ide t he  tre nch. Thei nsulatin g l a yer ispo lis h e d by a ch e m ical vapor  po lishi n g ("CMP") pr o cess un t il asurfac e of t he semi c ond uc tor sub str a t e is expo sed, ther e byfi llin g the in su lati ng  la ye r within the tr ench.
Ho wever, t h e re are  pr o blem s  in th econventional  meth od of form i n g S TI regi o n.Dur ing  the  CM P pr o cess to the insulating l ayer  unti l  th e sur faceof  the sem i cond uctor su b strate is exp osed, the
 In_practice, one_examination may take mammography_on the_same_breast at_different_directions in order_to obtain various_sections of mammography images._Next, a doctor_can_manually suspend a plurality of mammograms on a plurality of light boxes in a_consulting_room to_inspect_and_compare one by one for_any abnormal findings. Sometimes, the_mammograms in_a previous examination or other mammograms are inspected_for_reference. Otherwise, for_convenient comparison, an order and direction of suspended mammograms_are adaptively adjusted. When more parallel_mammograms are required,_it_is_not satisfactory because the_number of light boxes or the_place is limited. Such manually suspending_way and demand of the light boxes_are inconvenient, time-wasting, expensive, and difficult_to increase the diagnostic efficiency.
Accordingly,_a special_suspending method for the mammograms_is provided to_meet with_the habitual behaviors_of people and individual in use,_the medical environments,_and the operation procedures. However, the_effectiveness_is limited due_to_the_manually suspending_way, even the_special_suspending method_is_provided.
Therefore, it is desired to provide_a_method for displaying mammography images for improving_the above displaying method_without_changing the old suspending_habit, so that the practice_and completeness are satisfied. An STI_technology has_been studied_so as to improve a LOCOS method that is widely used_in manufacturing process of microelectronic devices._According to this STI_technology, a_semiconductor_substrate is etched_so_that a_shallow trench is formed therein, and an_insulating material_is filled in the shallow trench_thereby forming an isolation_region._If a conventional LOCOS method is_used, the insulating material is formed_by thermal oxidation for long_time._However,_if the conventional STI method_is used, a thermal oxidation process_is not required._Therefore, problems caused by the thermal oxidation_process_can be reduced by using the_STI_technology. For example, during the conventional_LOCOS_process,_a bird's beak phenomenon which_is formed at a boundary of_an isolation region and an active region, can be_reduced.
The conventional STI_region is formed as follows.
First,_a_trench_is formed in a semiconductor substrate. An insulating layer is_deposited so_as to fill_inside the trench. The insulating layer is polished by a_chemical vapor polishing("CMP") process until a surface_of the semiconductor substrate is exposed, thereby filling the insulating layer_within the trench.
However, there are problems in the_conventional method of forming STI region. During_the CMP process to_the_insulating layer until the surface of the_semiconductor_substrate_is_exposed, the