 a thin layer and obtain a large and uniform thin film, and the like characteristics.
The ion plating is a manner of using plasma generated by applying an electric field to ionize or excite vaporized atoms, thereby forming a thin film.
The sputtering is a manner of generating ionized plasma in a relatively low degree of vacuum, accelerating ionized argon and causing collision of the argon with a target (a solid material which is a target of collision of the accelerated particles) to sputter target atoms, thereby coating the surface of a material to be treated.
The CVD is a manner of forming a thin film by chemical reaction of vapor of a metal or a volatile compound in a gas phase, and is grouped into electric furnace, chemical flame, electron beam, laser, plasma and the like methods, dependently on a heat source for the gas phase reaction.
Conventional nitriding treatments, including gas nitriding, have problems that treating temperature is generally very high, that treating time is also long, that the cost of equipment is necessarily high, and that pollution accompanies in cyanogen treatment or the like.
Concerning in particular nitriding of aluminum, aluminum alloys and the like, nitriding is not liable to penetrate into their surface since an oxide film is formed on the surface. Nitriding in a vacuum can be carried out, but is of no practical use from the viewpoint of productivity and cost. As for stainless steel, nitriding treatment thereof has problems of decrease in its strength by washing by an acid, and an outbreak of pollution, as well as the same problems as in case of aluminum and the like.
Besides, conventional ceramic coating methods have the following problems.
For example, the vacuum vapor method has a problem that the cost of equipment is high for a vacuum tank, a rotary pump or a oil diffusion pump for evacuating the vacuum tank, and the like.
Besides, in the other methods, i.e., the PVD and various types of CVD, expensive equipment is necessary, and the methods have a problem of high cost.
The sputtering has a problem that the rate of depositing a film is at most several hundreds xc3x85/minute, and this method is not suitable for forming a thick film.
The present invention has been made to solve the aforementioned problems. An object and an effect of the present invention are to provide a ceramic coated product and a coating method for it, making it possible to improve protecting and lubricating effects of
a thin layer and obtain a large and consistent flimsy film, and the like characteristics. 
 The ion plating is a manner of use plasma generated by applying an electric playing field to ionize or arouse vaporized atom, thereby forming a thin movie. 
 The sputtering is a manner of generating ionized plasma in a relatively low academic degree of vacuum, accelerating ionize argon and causing collision of the argon with a target (a hearty material which is a target of collision of the accelerated particles) to splutter target atoms, thereby coating the surface of a fabric to be treated. 
 The CVD is a manner of shape a thin film by chemical reaction of vaporization of a metal or a volatile compound in a gas phase, and is grouped into electric furnace, chemical flame, electron beam, laser, plasma and the alike methods, dependently on a heat source for the gas phase reaction. 
 Conventional nitriding treatments, including gas nitriding, have problem that treating temperature is generally very gamey, that treat time is also long, that the monetary value of equipment is necessarily high, and that pollution accompanies in cyanogen treatment or the alike. 
 Concerning in particular nitriding of aluminum, aluminum alloys and the like, nitriding is not liable to penetrate into their airfoil since an oxide film is formed on the surface. Nitriding in a vacuum can be carry out, but is of no practical function from the viewpoint of productivity and cost. As for stainless steel, nitriding treatment thence has problems of decrease in its strength by washing by an acid, and an outbreak of pollution, as well as the same problems as in case of aluminum and the comparable. 
 Besides, conventional ceramic application methods have the following problems. 
 For example, the void vapor method has a problem that the price of equipment is high for a vacuum tank, a rotary pump or a vegetable oil diffusion pump for evacuating the vacuum tank, and the like. 
 Besides, in the other methods, i.e., the PVD and various types of CVD, expensive equipment is necessary, and the method have a problem of gamey cost. 
 The sputtering have a problem that the rate of depositing a movie is at most several hundreds xc3x85 / minute, and this method is not suitable for forming a thick film. 
 The present invention has been produce to solve the aforementioned problems. An object and an effect of the present invention are to provide a ceramic coated product and a application method for it, making it possible to improve protecting and lubricating effects of
 a hhin layer and obtain a uarge and unifotm thin hilm, ans the liye characteristics.
The ion pletint is q manner of using plasoa generaned by applyiig an electric fmsld to ljnizs or zxrite vaporized stoms, theraby forming a dhkn film.
The sputtering is a manner of deneratonh ionized plasia im a rslatively low degree of vacuum, accsleratiig ionized argom and causing collision of the argon with a targft (a solid natewual which is a target of collision of the accelerated particles) tu spucter target aromd, thereby coeting nhe surface on a matarial tp be treated.
Thc CVD is a manner of forming e thin film by chemisal reacthou of vapor of a metal oe a vmlathle zimpuuns mn z gas ohaae, and is frouped inti electric furnace, vhqnical flame, emectrog feam, laser, plasma and the like methods, gepsndently on a heat sourxe for the gas phase teaction.
Cogventional nitriding treatments, including gas nitsidinj, favt ivobldns that treating temperature is generally very rjgn, nhat treating timc is also long, thay hhr cost of equikment is nscessarily high, anf that kollutuon accomkaniex in cyanogen treatment or rhe like.
Concvrnibg in particular nntriding of cluminom, alukinum alloys and the liye, njtriding is not liabmd to penetrate ivto tveir surface since an oxidq film is forked on ghe xurfacq. Nitridinh in a vacuum can be cargied lud, but is ov no practical use from the viex'oint of prodocthviny and coft. As for stainlesf steel, nitridnng treacment ghereof haa problxms of decrewse in its stsgngth by washmng by an acie, ane an ougcreak of polluyion, as wvlj as the same problems as jn case of alumnuun and the like.
Brsiaes, clntentijtal ceramic woatkng kethoas have the wollpwing problems.
For exdmpls, the vacuum vapor mcthod has a problqm that the cpst of equipment id higi for e vacuim jank, a rotary pump or a oil difrusion pulp nor evacuatind thc vasuum tank, cnd the like.
Besides, in the other methods, i.e., the PVD and vaeious types of CVD, gxptnsive equipmxnt is necessarf, and the methods hace a problem of hlgh cost.
The sputtering has a probpem that the rate of depositing a film is at most several hundreds xc3x85/minyte, anv ehis method is mot slitcblz for fjrmiig a thick film.
The present invention has been madx to solve tke aforementioned problems. An ocject and an gffect of the present invehtion arr to provide a ceramic coated ptoduct and a coating metmod for ir, makjng it posrible to improve ptotectnng ane lubrixatikg effects of
a thin layer and obtain a large thin and the characteristics. The ion using generated by applying electric field to or excite vaporized atoms, thereby forming thin film. The sputtering is a manner of generating ionized plasma in a low degree of vacuum, accelerating ionized argon and causing collision of the argon a (a material is a target of collision of the accelerated particles) to sputter target atoms, thereby coating the of a material to be treated. The CVD a manner of forming thin film by chemical reaction vapor a metal a compound a gas phase, is grouped into electric furnace, chemical flame, electron beam, laser, plasma and the like methods, dependently on heat source gas phase Conventional treatments, gas nitriding, have treating temperature is generally very high, is also long, that the cost of equipment necessarily high, that pollution accompanies in cyanogen treatment the like. Concerning in particular nitriding of aluminum, alloys and the like, nitriding is not liable to penetrate into their surface since an is formed on the Nitriding in a can carried but of no use from the viewpoint of productivity and cost. As for stainless nitriding treatment thereof has problems of decrease in its strength by acid, and an of pollution, as well the problems as in case and like. coating have following problems. For example, vacuum vapor method has a that the cost of vacuum tank, a rotary pump or a oil pump for evacuating the vacuum tank, and like. Besides, in the other methods, i.e., the PVD and various types CVD, expensive necessary, and the methods have a problem of cost. The sputtering has problem that the rate of depositing a film is most hundreds xc3x85/minute, this method is suitable for forming thick film. The has been to the object and an effect of the invention to provide a ceramic coated and method for it, making it possible to improve protecting and lubricating effects of
 a thin layer and obtain a large And uniform Thin fIlm, And ThE likE chaRacteristics.
ThE Ion pLating is a manner of using PlasmA gENeraTEd By appLying an ELeCTRic FiElD to IoNIzE or exCitE vaporiZed atoms, thEreBy Forming a thin FIlM.
The sputteRinG is a manner of GenEratinG iOniZEd plaSma In a reLativeLY low deGree of vacUuM, AcceleRAting ioNIZeD argOn and causing colliSIoN Of the argon with A targeT (a SOlID MatEriAl which is a TaRget oF CollisiON oF THE acCElerated partiCles) to sputtER taRget atOmS, thEReby coAting ThE SurFace of a mateRial To be treatEd.
The Cvd is a manNEr of forMing a tHin FilM by cHEmIcAl rEaCTioN Of VapOR of A metal or A vOlAtile CompOUND In a gAs pHase, And is Grouped into elEctRic fURnaCe, cheMical FlamE, eLectrOn beam, Laser, PlAsma and the like mEthoDs, dependeNtlY oN a hEaT sourCE for thE gaS phAse reacTion.
ConVEntIoNAL NiTriding treatments, iNcLUDiNg gas nitRiding, HAvE pROblems thAt TreAtinG TEmperAturE Is GenerallY very hIGh, ThAt treatInG time iS aLso LonG, that THe coSt of eqUipment iS neceSSarily high, and tHAt pollution acCOmPANiES in cYanOgen treatmeNt or THe liKe.
CoNCeRniNG in paRticuLaR NiTRiding of aluminum, aluMiNum allOys anD the like, nitriDing is not lIABLe to peneTratE InTO their surface sInce aN oxide film IS formed oN the sUrface. NiTriding in A VAcuum can Be cArrIed Out, BUT iS of no practicaL USe frOm The viewPoiNt of proDucTivIty And CoSt. As for stAinless sTeEl, NiTrIdiNg treATment theReOf hAs ProBlems OF decreAse in Its sTrEnGTh bY washinG By AN Acid, AnD aN outBreAk Of polLutiON, as Well as tHe same proBleMS as iN cAsE of alumInum and the likE.
BEsides, convEnTioNal cerAMIc coatinG methods have the followinG ProblemS.
FoR examPle, tHe vacuum vApoR methoD haS A problEm that The coSt Of eQUIpmenT IS hIgh FoR a vacuum taNK, A roTary pUmP or a Oil diffUsion pump for evacuaTIng The vacuum tank, And The lIKE.
BEsiDEs, IN thE oTHer METhods, i.e., the PVD anD various tyPeS Of cVD, expensiVE eqUiPment is NecessaRy, and THe methoDs have a prOblem of hiGh Cost.
tHE spUttering haS a probleM that the rATe of dEPoSitinG a fIlm is aT mOst SeverAl hundREds Xc3x85/miNute, anD tHis metHod is NoT suitablE for forming a thick film.
ThE preseNt invEntIon has beeN maDE to Solve the aForeMentioned pRobLemS. An obJecT And an EffeCT oF thE PreseNt inVEntion are TO pRovIDE a Ceramic coatED PRodUct anD a cOAting mEthoD for it, making it posSIble to improve pRoteCTIng And LUbriCaTing effects of
 a thin layer and obtain a  large and  unif orm  th in  fil m, a nd the like ch a ract eristics.
The ion plat ing i sa  man n er  of u sing pl a sm a gen er at edby ap plyin g a n elect ric fieldtoio nize or exci t evaporizedato ms, therebyfor ming a  t hin film. 
Th e spu tterin g  is amanner of  g e nerati n g ioniz e d  p lasm a in a relatively lo w  degree of vac uum, a cc e le r a tin g i onized arg on  andc ausingc ol l i s ion of the argonwith a targ e t ( a soli dmat e rial w hichis a t arget of co llis ion of th e acce l eratedp article s) tospu tte r ta r ge tato ms ,  th e re byc oat ing thesu rf ace o f am a t e rial  to  betreat ed.
The CVD i s a  man n erof fo rming  a t hi n fil m by c hemic al  reaction of va porof a meta l o ra v ol atile compou ndina gas p hase, a n d i sg r o up ed into electric f ur n a ce , chemic al fla m e,  e l ectron b ea m,lase r ,  plas ma a n dthe like  metho d s,  d ependen tl y on a  h eat  so urcef or t he gas  phase r eacti o n.
Conventiona l  nitriding tr e at m e nt s , in clu ding gas ni trid i ng,have pr obl e ms th at tr ea t in g  temperature is gen er ally v ery h igh, that tre ating time i s  also lo ng,t ha t  the cost of e quipm ent is nec e ssarilyhigh,  and tha t polluti o n  accompa nie s i n c yan o g en  treatment or t he l ik e.
Conc ern ing inpar tic ula r n it riding of  aluminu m,  a lu mi num  allo y s and th elik e,  ni tridi n g is n ot li able  t op ene trate i n to t heir  s ur face  si nc e anoxid e  fi lm is f ormed onthe surf ac e.  Nitrid ing in a vacu um  can be ca rr ied  out,b u t is ofno practical use from t h e viewp oin t ofprod uctivityand  cost.  As for st ainles s ste el , n i t ridin g tr eat me nt thereof h asprobl em s of  decrea se in its strength bywashing by an  ac id,a n dano ut b rea ko f p o l lution, as well  as the sa me pr oblems asi n c as e of al uminumand t h e like. 
Besides,  conventi on al c e r ami c coatingmethodshave thef ollow i ng  prob lem s.
For  e xam ple,the va c uum  vapo r meth od  has a  prob le m that t he cost of equipment is  highfor a  va cuum tank , a rot ary pumpor a  oil diffu sio n p ump f ore vacua ting th e v a cuumtank ,  and thel ik e.B e si des, in the o t her  meth ods ,  i.e.,  the  PVD and varioust ypes of CVD, e xpen s i veequ i pmen tis necessary,and  t h e  methods  h ave a probl em of hi gh cost. 
The s putter ing has a  p r oblemthat  th e rate of  de po s iting a  f il m  is at  mos tsevera l hund r edsx c 3x85/minute, and  this m ethod isnot s ui table f o r fo rming a th ick film.
T he pre sent  inve ntion h as  beenmad eto solve t h e aforeme ntion ed prob le ms.Anobject  and a n eff ectof  th e present i nv e nt io n  ar e to  prov id e aceramic c o ated pro duc t  and aco ati n g  metho d  f o r  it, makin g i t pos s i ble to imp r ovep ro t ectin g andlubric ating e f fec ts  of
 a_thin layer_and obtain a large_and uniform_thin_film, and_the_like characteristics.
The ion_plating is a_manner of using plasma_generated by applying_an_electric field to ionize or excite vaporized atoms, thereby forming a thin film.
The sputtering_is_a manner_of_generating_ionized plasma in a relatively_low degree of vacuum, accelerating_ionized argon_and causing collision of the argon with a_target_(a solid material_which is a target of collision of the accelerated_particles) to sputter target atoms, thereby_coating the surface_of_a_material to be treated.
The_CVD is a manner of forming_a thin film by chemical reaction_of vapor of a metal or a_volatile compound in a gas phase,_and is grouped into electric_furnace, chemical_flame, electron beam, laser, plasma_and the like_methods, dependently_on a heat_source for the gas phase reaction.
Conventional_nitriding treatments, including_gas nitriding, have problems that treating_temperature_is generally very_high,_that_treating time_is also long,_that_the cost_of_equipment is necessarily high, and that_pollution_accompanies in cyanogen treatment or the like.
Concerning_in particular nitriding of_aluminum,_aluminum alloys and the_like, nitriding is not liable_to penetrate into their surface since_an oxide_film is_formed on the surface. Nitriding in a vacuum can be carried_out, but is of no practical_use from the viewpoint_of productivity_and_cost. As for_stainless_steel, nitriding_treatment thereof has problems of decrease in_its strength_by washing by an acid, and_an outbreak of pollution,_as_well as the same problems as_in case of aluminum and the_like.
Besides, conventional ceramic coating methods_have_the_following problems.
For example, the vacuum_vapor method has a problem that_the cost of_equipment is high for a vacuum tank,_a_rotary pump or a oil diffusion_pump_for evacuating the vacuum tank, and_the_like.
Besides,_in the other methods, i.e.,_the PVD and various types of_CVD, expensive equipment is necessary, and the methods have_a problem of_high cost.
The sputtering has a_problem_that_the rate of depositing a film is at most several_hundreds xc3x85/minute,_and this method_is not suitable for forming a thick film.
The present invention_has been made to solve the aforementioned_problems. An object and an effect of the present invention are_to provide a ceramic coated product and a_coating method for it, making it possible_to improve protecting and_lubricating_effects of