Photolithography processes can be classified according to the type of light used, including ultraviolet lithography, deep ultraviolet lithography, extreme ultraviolet lithography (EUVL), and X-ray lithography. The wavelength of light used determines the minimum feature size that can be formed in the photoresist.
Photolithography processes can be classified according to the type of light used including ultraviolet lithography, deep ultraviolet lithography, extreme ultraviolet lithography (EUVL), and X-ray lithography. The wavelength of light used determines the minimum feature size that can be formed in the photoresist.