The average number of atoms ejected from the target per incident ion is called the "sputter yield". The sputter yield depends on several things: the angle at which ions collide with the surface of the material, how much energy they strike it with, their masses, the masses of the target atoms, and the target's surface binding energy. If the target possesses a crystal structure, the orientation of its axes with respect to the surface is an important factor.
The average number of atoms :ejected from the target per incident ion is called the "sputter yield". The sputter yield depends o?n several things: the angle at which ions, collide with the surface of the material, how much energy they strike it with, their masses, the masses of the target atoms, and the target's surface bi:nding energy. If the target possesses a crystal structure, the orientation of its axes ,with respect to the surface is an important factor.