Chemical state analysis of the surface of a silicon wafer reveals chemical shifts due to different formal oxidation states, such as: n-doped silicon and p-doped silicon (metallic silicon), silicon suboxide (Si2O), silicon monoxide (SiO), Si2O3, and silicon dioxide (SiO2). An example of this is seen in the figure "High-resolution spectrum of an oxidized silicon wafer in the energy range of the Si 2p signal".
chemical state analysis of the surface of a silicon wafer reveals chemical shifts due to different formal oxidation states such as n-doped silicon and p-doped silicon (metallic silicon) silicon suboxide (si2o) silicon monoxide (sio) si2o3 and silicon dioxide (sio2) an example of this is seen in the figure "high-resolution spectrum of an oxidized silicon wafer in the energy range of the si 2p signal"