1. A system, comprising: a device having an emissive portion configured to produce a patterned beam; a memory configured to store a compressed representation of a requested dose pattern to be formed on a surface by the patterned beam; and a dictionary decompressor configured to at least partially decompress the compressed representation, and comprising a first dictionary memory, and a second dictionary memory, wherein the requested dose pattern comprises two groups of repeating pattern features; and wherein the dictionary decompressor is configured such that: the first dictionary memory is configured to store pattern data corresponding to a first of the groups, and the second dictionary memory is configured to store pattern data corresponding to a second of the groups, wherein the repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group.
1. A system, comprising: a device having an emissive portion configured to produce a patterned beam; a memory configured to store a compressed representation of a requested dose pattern to be formed on a surface by the patterned beam; and a dictionary decompressor configured to at least partially decompress the compressed representation, and comprising a first dictionary memory, and a second dictionary memory, wherein the requested dose pattern comprises two groups of repeating pattern features; and wherein the dictionary decompressor is configured such that: the first dictionary memory is configured to store pattern data corresponding to a first of the groups, and the second dictionary memory is configured to store pattern data corresponding to a second of the groups, wherein the repeating pattern features in the first group have one or more differing characteristics than the repeating pattern features in the second group. 18. The system of claim 1 , wherein a radiation dose in the dose pattern below a dose threshold causes an area of a resist exposed to the radiation dose to be removed.