6. A method for isolating one or more causes of semiconductor misprocessing comprising the steps of: a. creating a wafer tracking database for storing a plurality of process parameters and a plurality of identifying information associated with each wafer; b. generating a first plurality of queries wherein each query is associated with at least one of said plurality of process parameters; c. applying said first plurality of queries to said wafer tracking database to obtain a set of observations for each query of said first plurality of queries; d. filtering said first plurality of queries to create a second plurality of queries having a first predetermined criterion; e. detecting outliers in the set of observations for each of said second plurality of queries; f. creating a third plurality of queries containing queries from said second plurality of queries having outliers; g. detecting trends in the set of observations for each of said second plurality of queries; h. adding queries from said second plurality of queries having a trend to said third plurality of queries; i. filtering said third plurality of queries to create a fourth plurality of queries having a second predetermined criterion; and j. listing said fourth plurality of queries.
6. A method for isolating one or more causes of semiconductor misprocessing comprising the steps of: a. creating a wafer tracking database for storing a plurality of process parameters and a plurality of identifying information associated with each wafer; b. generating a first plurality of queries wherein each query is associated with at least one of said plurality of process parameters; c. applying said first plurality of queries to said wafer tracking database to obtain a set of observations for each query of said first plurality of queries; d. filtering said first plurality of queries to create a second plurality of queries having a first predetermined criterion; e. detecting outliers in the set of observations for each of said second plurality of queries; f. creating a third plurality of queries containing queries from said second plurality of queries having outliers; g. detecting trends in the set of observations for each of said second plurality of queries; h. adding queries from said second plurality of queries having a trend to said third plurality of queries; i. filtering said third plurality of queries to create a fourth plurality of queries having a second predetermined criterion; and j. listing said fourth plurality of queries. 9. The system of claim 6, wherein said first predetermined criterion is yield loss.