15. A system for layout decomposition, comprising: a coloring graph generation unit configured to derive data of a coloring graph from layout data for a layout design, the layout design corresponding to at least a portion of an integrated circuit, the layout data comprising mask assignment information for some layout features, the coloring graph comprising vertices representing layout features in the layout design and edges between some pairs of vertices indicating the mask assignment information; a graph reduction unit configured to perform performing a graph reduction process, wherein the graph reduction process comprises collapsing diamond graphs; a graph partitioning unit configured to perform a graph partitioning process; a layout decomposition unit configured to decompose the layout design based on a simplified coloring graph generated by the graph reduction unit and/or the graph partitioning unit to generate decomposition information; and storing the decomposition information.
16. The system recited in claim 15 , wherein the mask assignment information comprises: mask assignment information derived based on device information, mask assignment information derived based on minimum spacing information, mask assignment information derived based on hierarchical information, mask assignment information derived based on cell information, or any combination thereof.