1. A method, comprising: providing a set of initial characteristic values associated with a semiconductor device; performing a first fabrication process on the semiconductor device; collecting fabrication data associated with the first fabrication process; replacing at least one of the initial characteristic values with the fabrication data collected for the first fabrication process to generate a first modified set of characteristic values; and predicting a first value for at least one electrical characteristic of the semiconductor device based on the first modified set of characteristic values.