1. A method for moving a wafer in a semiconductor manufacturing process that includes a tunnel having a vacuum environment, a plurality of ports, and a track for guiding cart motion within the tunnel, each one of the plurality of ports having an isolation valve that opens and closes the port and a robotic arm operable to reach through the port from outside the tunnel, the method comprising: retrieving a wafer with a robotic arm; position the wafer outside a port of the tunnel; positioning a cart inside the port of the tunnel; opening the port; inserting the robotic arm into the tunnel and placing the wafer on the cart; withdrawing the robotic arm from the tunnel; and closing the port.