1. A method for overlay control, the method comprising: patterning a target layer covering a workpiece using a reticle, wherein the patterning forms a plurality of exposure fields arranged according to a first exposure field layout; measuring alignment of the exposure fields relative to the workpiece to generate displacement vectors; training an inter-field model and an intra-field model using the displacement vectors and a reference field layout; transforming the intra-field model for use with a second exposure field layout, wherein the second exposure field layout is different than the first exposure field layout; and generating overlay corrections based on the trained inter-field model and the transformed intra-field model.