1. A pattern measurement device comprising: a computation device that measures a measurement target pattern by using a waveform signal obtained by scanning a pattern with a charged particle beam, wherein the computation device classifies pattern sites which are repeatedly arrayed at a specific interval, in accordance with positions of the pattern sites, on the basis of the waveform signal, and executes a pattern edge type identification, a pattern type identification, or measurement of dimensions between predetermined pattern sites, on the basis of association between the classified pattern site, and information pertaining to a pattern edge type, or information pertaining to a pattern type.