1. A system comprising: a computing system comprising at least one central processing unit and at least one graphics processing unit; a user interface for interacting with the computer system; a computer readable medium comprising data describing size and placement of features to be formed on a photolithography exposure mask used to manufacture semiconductor devices; and a computer readable medium comprising optical proximity correction calculation procedures for acting upon the data, wherein at least a portion of the optical proximity correction calculation procedures are executed using the graphics processing unit, and the optical proximity correction calculation procedures comprise: causing conversion of a matrix of into a set of polynomials; and causing processing the set of polynomials in parallel using the graphics processing unit.