1. A method for moving a wafer in a semiconductor manufacturing process, the method comprising: providing a tunnel capable of being sealed for holding a sealed environment, a plurality of process ports disposed in a wall of the tunnel, an exchange zone having at least one exchange zone port, an exchange port disposed in the wall of the tunnel and being distinct from the plurality of process ports and at least one exchange zone port, and a track for guiding cart motion within the tunnel, where the exchange zone is communicably coupled to a sealable wafer handling interface, the sealable wafer handling interface having an external atmosphere and including a wafer handling interface robotic arm, each one of the at least one exchange zone port and the plurality of process ports having an isolation valve that opens and closes a respective one of the ports, and a sealable workpiece handling module is communicably coupled to the tunnel through a respective one of the process ports or exchange port of the tunnel and including a robotic arm operable to reach through the respective one of the process ports or the exchange port from outside the tunnel; retrieving a wafer with a respective one of the robotic arms; positioning the wafer outside at least one of the plurality of process ports or the exchange port of the tunnel; positioning a cart inside the tunnel adjacent the at least one of the plurality of process ports or the exchange port of the tunnel; opening the at least one of the plurality of process ports or the exchange port of the tunnel; inserting a respective one of the robotic arms into the tunnel through the at least one of the plurality of process ports or the exchange port of the tunnel and transferring the wafer to the cart; withdrawing the robotic arm from the tunnel; closing the at least one of the plurality of process ports or the exchange port of the tunnel; and transferring the wafer between the tunnel and the external atmosphere wherein the tunnel includes a first end and a second end, at least one of the first end and second end being communicably coupled to the sealable workpiece handling module including the robotic arm at the at least one exchange zone port for reaching into the exchange zone through the at least one exchange zone port and indirectly transferring the wafer between the tunnel and the external atmosphere of the sealable wafer handling interface through the sealable workpiece handling module and the at least one exchange zone port.