1. A system, comprising: one or more processors configured to: obtain an image of a portion of a fabricated device; extract contours of the portion of the fabricated device from the obtained image; align the extracted contours to a matching section of a reference design; decompose the matching section of the reference design into one or more patterns; and update a pattern tracking database with information pertaining to at least one pattern in the one or more patterns generated as a result of the decomposition; and a memory coupled to the one or more processors and configured to provide the one or more processors with instructions.