1. An undercoating composition for photolithographic resist which comprises, as a uniform solution: (A) a nitrogen-containing organic compound having, in a molecule, at least two amino groups substituted by at least one substituent group selected from the group consisting of hydroxyalkyl groups and alkoxyalkyl groups; (B) an acid selected from the group consisting of aliphatic carboxylic acids and inorganic sulfur-containing acids; (C) an organic solvent; and (D) a light-absorbing compound which is an anthracene compound having at least one hydroxyl group or carboxyl group in a molecule.