1. A system comprising: a computing system comprising a plurality of nodes, wherein each node comprises at least one of at least one central processing unit or at least one graphics processing unit; an interface to couple the plurality of nodes together; a user interface for interacting with the computer system; a computer readable medium comprising data describing the size and placement of features to be formed on a photolithography exposure mask used to manufacture semiconductor devices; and a computer readable medium comprising optical proximity correction calculation procedures for acting upon the data, wherein at least a portion of the optical proximity correction calculation procedures are executed using the graphics processing unit in one of the nodes.