1. A system for controlling an epitaxial growth process in an epitaxial reactor, the system comprising: an epitaxial reactor for performing a first run of the epitaxial growth process, and controlling a temperature of the epitaxial growth process during the first run by a temperature measuring device that determines the temperature based on a first set of thermocouple offset parameter values; and a controller for determining a second set of thermocouple offset parameters for a second run comprising: an exponential weighted moving average (EWMA) filter for receiving an actual output parameter value of a growth process of the first run that is output from a data analysis module; a processor for setting up a modeled output parameter value as a linear function of the actual output parameter value and a second set of thermocouple offset parameter values, the processor also determining a distance between a target output parameter value and the modeled output parameter value; and an optimizer for determining the second set of thermocouple offset parameter values as a set of thermocouple offset values that provides the minimum distance between the modeled output parameter value and the target parameter value; wherein the epitaxial reactor also performs a second run of the epitaxial growth process, and controls a temperature of the epitaxial growth process during the second run by a temperature measuring device that measures temperature using the determined second set of thermocouple offset parameter values from the optimizer.