1. A system comprising: a computing system comprising at least one central processing unit and at least one graphics processing unit; a user interface for interacting with the computer system; a computer readable medium comprising data describing size and placement of features to be formed on a photolithography exposure mask used to manufacture semiconductor devices; a computer readable medium comprising optical proximity correction calculation procedures for acting upon the data, wherein at least a portion of the optical proximity correction calculation procedures are executed using the graphics processing unit; and output devices for displaying the results of applying the optical proximity correction calculation procedures executed using the graphics processing unit upon the data, wherein X and Y coordinates for two opposite corners of a two-dimensional trapezoidal shape of the data is represented in a RGBA (RED-GREEN-BLUE-ALPHA) color space format in the graphics processing unit.