1. A method of forming a precursor for use in manufacturing integrated circuits comprising the steps of: providing a quantity of an antireflective compound and a substrate having a surface onto which said compound is to be applied; subjecting said antireflective compound to a chemical vapor deposition process so as to deposit said antireflective compound in a layer on said substrate surface; and applying a photoresist layer to said antireflective compound layer to yield the circuit precursor.