1. A method of processing integrated ciruits comprising the steps of: depositing a first layer of photoresistive material on a substrate; depositing a second layer containing a mixture of a polymer and a dye upon said first layer, said dye having a nonlinear photobleaching response to the intensity of an incident fluence; irradiating said second layer with a preselected pattern to convert said second layer to an optical mask of said preselected pattern without substantially effecting said first layer; and illuminating said second layer to transfer said preselected pattern to said first layer without substantially further effecting said second layer.