1. A system for applying an optical proximity correction to chip designs to control accuracy in VLSI patterning operations, said system comprising: graphics design means for generating an original design data set of a chip design; shapes processor means for subjecting a level of the original design data set to a fracturing procedure including a series of shrink, expand and subtraction operations to fracture the design data set into a plurality of basic geometric shades abutting at vertices existent in the original design data set and sort the plurality of basic geometric shapes by width, said processor means locating and identifying relevant fractions of the sorted plurality of basic geometric shapes which are critical regions to the original design data set; and postprocessor means for applying optical proximity correction biasing all of tractions having been identified as critical regions to the design data set.