1. A process for preparing a positive photoresist image using a portable conformable mask which consists essentially of in order: (a) forming a first photosensitive composition which consists essentially of (i) from about 1% to about 25% based on the weight of the solid parts of the composition of a photosensitive compound having the formula ##STR40## wherein R.sup.1 =1, 2-benzoquinone-2-diazide-4-sulfonyl; 1,2-naphthoquinone-2-diazide-4-sulfonyl; or 1,2-anthraquinone-2-diazide-4-sulfonyl R.sub.2 =R, R.sub.7, OR.sub.6 or ##STR41## R.sub.3 =H, R.sub.7, OR.sub.6 or ##STR42## R.sub.4 =H, R.sub.7, OR.sub.6 or ##STR43## R.sub.6 =H, alkyl, aryl, aralkyl or R.sub.1 R.sub.7 =alkyl, aryl or aralkyl (ii) from about 75% to about 99% based on the weight of the solid parts of the composition of a novolak, and/or polyvinyl phenol resin; and (iii) from about 0.5% to about 20% based on the weight of the solid parts of said composition of a crosslinking compound which, when in the presence of that amount and strength of the acid generated when said diazide is exposed to actinic radiation, is capable of crosslinking said resin under the application of the heating conditions of step (d); and (iv) sufficient solvent to dissolve the foregoing composition components; and (b) coating said first composition on a suitable substrate; and (c) heat treating said coated substrate at a temperature of from about 20? C. to about 100? C. until enough of said solvent is dried off to render it non-tacky; and (d) non-imagewise exposing said composition overall to sufficient actinic ultraviolet radiation and sufficient heat to partially cross-link said composition while substantially retaining its photosensitivity; and (e) coating said first photosensitive composition directly with a second photosensitive composition comprising an o-quinone diazied, a dye which absorbs at the exposure wavelength of step (g) such that transmission through the second photosensitive composition at step (g) is about 1% or less, and a novolak and/or polyvinyl phenol resin, wherein said first photosensitive composition and said second photosensitive composition are reactive to ultraviolet radiation at substantially different wavelengths; and, (f) imagewise exposing said second photosensitive composition to actinic ultraviolet radiation and developing with an aqueous alkaline solution to form an image mask; and (g) exposing said first photosensitive composition to actinic ultraviolet radiation at a wavelength different from step (f) through said image mask and developing with an aqueous alkaline solution to remove the exposed portion of said first photosensitive composition.