1. A method for constructing an integrated circuit comprising: generating a mask layout data set associated with a desired set of features for a layer of an integrated circuit device; generating from the mask layout data set a proximity corrected data set associated with proximity corrected features within the layer of the integrated circuit device; and generating a bounded contour data set from the proximity corrected data set, the bounded contour data set representing the theoretically predicted structures which would be formed using a mask constructed from the proximity corrected data set.