1. A non-volatile memory device structure comprising: a first wiring structure; a first p type semiconductor material overlying the first wiring structure; a first n− type state change semiconductor material overlying the first p type semiconductor material, the first n− type state change semiconductor material having a resistance change characteristic, wherein the first n− type state change semiconductor material comprises a zinc oxide; a first steering device formed from the first p type semiconductor material and the first n− type state change semiconductor material; a first n+ type active conductive material overlying the first n− type state change semiconductor material, wherein the n+ type active conductive material comprises an aluminum doped zinc oxide material; a first resistive switching device formed from the first n+ type active conductive material, the first n− type state change semiconductor material and the first wiring structure; and a second wiring structure overlying the first n+ type active conductor material.