1. A plasma processing control system comprising: a plasma processor for performing plasma processing operation over a sample accommodated within a vacuum processing chamber; a sensor for monitoring process parameters during processing operation of the processor; means for providing a processing-result estimation model to estimate a processed result on the basis of a monitored output from the sensor and a preset processed-result estimation equation; means for providing an optimum recipe calculation model which calculates optimum processing conditions such that the processed result becomes a target value on the basis of the estimated result of the processed-result estimation model; and a controller for controlling the plasma processing system on the basis of a recipe generated from said optimum recipe calculation model.