1. A method for forming a photoresist relief image comprising: (a) applying on a substrate a layer of an antireflective composition that comprises a resin binder that has phenyl groups; (b) curing the antireflective composition layer; (c) applying a layer of a photoresist composition over the antireflective composition layer; (d) exposing the photoresist layer to activating radiation and developing the exposed photoresist layer.