1. A method, comprising: generating a plurality of stochastic error models, using a processor, from probability data for a distribution of random and non-uniform errors applied to a semiconductor photolithographic mask of a photolithography process; using the processor to provide an analysis by analyzing the plurality of stochastic error models applied to the semiconductor photolithographic mask based on one or more semiconductor fabrication criteria; and generating a recommendation for modifying the semiconductor photolithographic mask based on the analysis of the plurality of stochastic error models.