1. A semiconductor measurement method to correct measurement error data of a semiconductor wafer, the method comprising: providing a measurement system for: obtaining measurement data in the semiconductor wafer; performing a first order regression analysis using the measurement data; calculating an estimate of erroneous data using the first order regression analysis; restoring the erroneous data using the calculated estimate; performing a second or higher order regression analysis using the measurement data and the restored data; and correcting measurement errors in the semiconductor wafer based on the second or higher order regression analysis.