1. A semiconductor device, comprising: a first electrode; a metal-containing film formed on the first electrode and containing metallic atoms; a resistance change film formed on the metal-containing film and containing metal oxide; and a second electrode formed on the resistance change film, wherein the metal-containing film is composed of a substance which is easier to bond with oxygen than a substance composing the resistance change film, a resistance of the resistance change film changes in accordance with a voltage applied between the first electrode and the second electrode, and the resistance change film is composed of at least one kind of substance selected from a group consisting of titanium oxide, nickel oxide, yttrium oxide, cerium oxide, magnesium oxide, zinc oxide, zirconium oxide, tungsten oxide, niobium oxide, tantalum oxide, chromium oxide, manganese oxide, aluminum oxide, vanadium oxide and silicon oxide.