1. An analysis system for classifying possible defects identified within an inspection image of an inspected object, the system comprising: a pattern matcher configured to determine an anchor location with respect to the inspection image, based on a matching of a template and a portion of the inspection image; wherein an accuracy of the determining of the anchor location exceeds a resolution of the inspection image; a distribution analysis module configured to determine, based on the anchor location and a mask which defines different segments within an area, a distribution of a potential defect with respect to one or more of the segments; and a classifier, configured to classify the potential defect based on the distribution.