1. A method of generating a mask for use in an imaging process pattern, said method comprising the steps of: (a) obtaining a desired target pattern having a plurality of features to be imaged on a substrate; (b) simulating a wafer image utilizing the target pattern and process parameters associated with a defined process; (c) defining at least one feature category; (d) identifying features in said target pattern having said plurality of features that correspond to said at least one feature category, and recording an error value for each feature identified as corresponding to said at least one feature category; and (e) generating a statistical summary which indicates the error value for each feature identified as corresponding to said at least one feature category.