1. A method for retuning a parameter of a semiconductor fabrication component, comprising: evaluating processing data associated with a semiconductor fabrication component to formulate performance indices; performing one or more fabrication process change simulations based upon the performance indices to generate a component operating behavior data structure; identifying a first tuning value for a first parameter used by the semiconductor fabrication component based upon the component operating behavior data structure indicating the first tuning value retunes the semiconductor fabrication component with respect to a first current value for the first parameter specified within the processing data; identifying a second tuning value for a second parameter used by the semiconductor fabrication component based upon the component operating behavior data structure indicating the second tuning value retunes the semiconductor fabrication component with respect to a second current value for the second parameter specified within the processing data; and retuning the first parameter from the first current value to the first tuning value and the second parameter from the second current value to the second tuning value, wherein: the component operating behavior data structure comprises a characteristic surface for the first parameter and the second parameter; and the characteristic surface comprises a surface comprising a retuning point that correlates a selected retuning cost to a tuning parameter pairing value corresponding to the first tuning value for the first parameter and the second tuning value for the second parameter, the first tuning value and the second tuning value selected based upon the tuning parameter pairing value being correlated to the selected retuning cost.