1. A method for manufacturing a set of masks based on circuit layout migration: wherein the circuit layout migration includes, creating a list of layout components in a source layout, wherein the list of layout components in a source layout includes conducting wires; determining a plurality of first groups of layout components being regularly aligned horizontally or vertically; determining first subsets of layout components which each belong to at least two of a respective set of determined first groups of layout components; determining a plurality of second groups of layout components, each second group comprising mutually exclusive ones of the first subsets of layout components; determining symmetry axes for pairs of second groups in the source layout; building a constraint graph of the layout components of the source layout using alignment constraints for the alignment of layout components within each of the second groups, distance constraints for keeping regularity patterns within each of the second groups, and symmetry constraints for the determined symmetry axes for pairs of second groups; and performing constraint graph based compaction of the source layout using the built constraint graph; and wherein the manufacturing includes, manufacturing the set of masks based on the constraint graph based compaction of the source layout.