1. A method for patterning adherent silicone polyamic acid on the surface of at least a portion of a substrate, where the silicone polyamic acid is patterned by (1) spin coating a silicone polyamic acid onto the surface of the substrate, (2) drying the silicone polyamic acid at a temperature of at least 100.degree. C., (3) spin coating a positive photoresist onto the surface of the silicone polyamic acid to produce a silicone polyamic acid-photoresist composite, (4) exposing the applied positive photoresist to patterned UV light, and (5) developing the resulting patterned silicone polyamic acid-photoresist composite, where the silicone polyamic acid is the intercondensation product of reaction of about 2% less than stoichiometric, to about stoichiometric, of aryldiamine and organic dianhydride, comprising a mixture of from about 20 to 80 mole percent of norbornane organosiloxane bisanhydride and from about 80 mole percent to about 20 mole percent of aromatic organic bisanhydride, based on the total moles of organic dianhydride.