1. A method of creating by a pattern generator features on a workpiece having a substrate, a masking layer, a transfer layer and a resist layer, including the steps: creating a latent image in the resist layer using a pattern generator; creating a plasma etch barrier corresponding to said latent image; directionally etching the transfer layer through said plasma etch barrier; directionally etching the masking layer through said transfer layer; and removing said transfer layer, exposing unetched portions of the masking layer.