1. A diazonapthoquinonesulfonyl-substituted polymer suitable for use in an anti-reflective coating of a semiconductor device, said polymer being selected from the group consisting of: (a) polyhydroxystyrene polymers having the formula: 41 wherein R is hydrogen, a C 1 - C 6 alkyl group, hydroxy or hydroxymethyl; and m:n is the mole ratio of 0.1-0.9:0.1-0.9; (b) poly(styrene-acrylate) polymers having the formula: 42 wherein R is hydrogen, an C 1 -C 6 alkyl group, hydroxy or hydroxymethyl; x is a number from 1 and 5; and a:b:c:d is the mole ratio of 0.1-0.9:0.1-0.9:0.1-0.9:0.1-0.9; and (c) novolac polymers having the formula: 43 wherein R, is hydrogen, methyl or hydroxy; and e is the average degree of polymerization.