1. A method for designing experiments for unit processes for semiconductor substrate manufacturing, the method comprising: processing multiple site-isolated regions on a first substrate with a unit process of a semiconductor manufacturing operation by varying one of the process parameters of the unit process in a combinatorial manner, thereby defining a combinatorial array of site-isolated regions on the first substrate; evaluating the multiple site-isolated regions of the combinatorial array, wherein the semiconductor manufacturing operation is one of a wet chemical operation, a dry processing operation, or a deposition operation; predicting results for varied processing parameter sets; selecting a subset of the varied processing parameter sets having optimal results; and processing multiple site-isolated regions on a second substrate combinatorially according to the subset of the varied processing parameter sets.