1. A method of making a device structure, comprising: (a) providing a crystalline donor having a first surface and a first cleavage plane substantially parallel to said first surface so as to define a first donee layer between said first surface and said first cleavage plane; (b) fabricating at least one device upon said first surface so that said device is monolithic with said first donee layer, said at least one device being any one of an electronic type, an optoelectronic type and an optic type; and (c) cleaving said first donee layer from said crystalline donor so as to liberate said first donee layer from said crystalline donor.