1. A method, in a data processing system, for multiple patterning lithography with conflict removal aware coloring, the method comprising: receiving a design layout for performing a multiple patterning photolithographic process to form an integrated circuit; generating, by the data processing system, a conflict graph representing conflicts between shapes; assigning, by the data processing system, weights to conflicts in the conflict graph representing ease of conflict removal to form a weighted conflict graph; performing, by the data processing system, coloring of the design layout based on the weighted conflict graph to form a colored design layout, wherein performing coloring of the design layout comprises performing integer linear program formulation to minimize weight of edges of the conflict graph after coloring; and performing the multiple patterning photolithographic process using the colored design layout to form the integrated circuit.