1. A computer-implemented method of test pattern selection for computational lithography model calibration, the method comprising: preparing a sensitivity matrix having matrix elements corresponding to, and thereby defining a sensitivity relationship between, a pool of candidate test patterns and a set of model parameters, wherein the matrix elements quantify how changes in measurements from imaging the test patterns using a lithographic process corresponding to the set of model parameters are induced by changes in the set of model parameters; performing calculations using the sensitivity matrix; and selecting, by the computer, a set of test patterns from the pool of candidate test patterns based on the calculations using the sensitivity matrix.