1. An arrangement for automatically selecting alignment marks on a substrate in a lithographic apparatus, comprising: a processor; and a memory operatively interconnected with the processor, the memory containing machine readable information comprising locations of at least one set of substrate alignment marks available for selection, and selection rules to select suitable substrate alignment marks from this at least one set, wherein the selection rules are based on at least one of experimental and theoretical information about which substrate alignment mark locations are optimal based on one or more selection criteria, and wherein the processor is configured and arranged to select said suitable substrate alignment marks by using said selection rules.