1. A simulation method, comprising: providing a plurality of input data sets for an integrated circuit (IC) model; performing a first simulation using a computing unit by applying a first of the plurality of input data sets to the IC model to generate a first simulation result, wherein the first input data set includes a first input device parameter with a first baseline parametric value and a second input device parameter with a second baseline parametric value; performing a second simulation by applying a second of the plurality of input data sets to the IC model to generate a second simulation result, wherein the second input data set includes the first input device parameter but with a first parametric value that differs from the first baseline parametric value and also includes the second input device parameter with the second baseline parametric value; determining a sensitivity of the IC model to the first input device parameter by comparing results of the first and second simulations; defining a simulation order for remaining input data sets of the plurality of input data sets according to the sensitivity of the IC model to the first input device parameter; and manufacturing an integrated circuit on a semiconductor substrate, wherein the manufactured integrated circuit corresponds to the IC model.