1. A method of tuning an ion beam in an ion implanter, wherein the ion beam is dependent upon a plurality of operational parameters of the ion implanter, the method comprising: retrieving a set of operational parameters at least some of which are stored in a dynamic database; configuring the ion implanter according to the retrieved set of operational parameters thereby to provide an ion beam; optimising the ion beam by varying one or more of the operational parameters; and updating the operational parameters stored in the dynamic database that changed during optimisation.