1. A method comprising: collecting historical data from a plurality of processed wafers lots; collecting measurement data from one or more skew wafer lots; generating an estimated baseline distribution from the collected historical data and collected measurement data; generating an estimated performance distribution from the estimated baseline distribution based on one or more specified parameters and; determining a bin ratio forecast by applying a bin definition and a yield degradation factor estimation to the estimated performance distribution; determining one or more production targets based on the bin ratio forecast; providing fabrication resources according to the one or more production target; and processing a plurality of wafers based on the one or more determined production targets.