1. A device manufacturing method comprising using a lithographic apparatus to transfer a pattern from a patterning device onto a surface of a substrate to provide a pattern of features on the substrate, the method comprising: calculating a change of at least one setting of one or more apparatus settings based on a model of a response of a feature characteristic to changes of any of the one or more apparatus settings; and applying the at least one change of setting to the lithographic apparatus, wherein the model includes an additive response-model term expressing a spatial variability of the response of the feature characteristic with respect to the surface of the substrate.