1. A method of forming a pattern on a nanometer scale comprising the steps of: binding to a substrate surface a self-assembled two-dimensionally ordered material array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variations, said pattern having a characteristic dimension of 1-50 nanometers, forming at least one overlayer on said array; and forming a two-dimension, nanometer scale pattern of holes in said overlayer which is determined by said pattern in said array.