<div class="description">
<p>Journal of Research of the National Institute of Standards and Technology
</p>
<br>Subjects:  silicon; absorption coefficient;  etch stop;  hene;  high accuracy</div>
<div class="fn value">
<dl><dd>Geist, J.</dd>
<dd>Schaefer, A.R.</dd>
<dd>Wang, Y.H.</dd>
<dd>Song, J.F.</dd>
<dd>Zalewski, E.F.</dd></dl></div>
Internet Archive identifier