000184440 001__ 184440
000184440 005__ 20181203023017.0
000184440 0247_ $$2doi$$a10.1002/cphc.201200074
000184440 022__ $$a1439-4235 000184440 02470$$2ISI$$a000307841900011 000184440 037__$$aARTICLE
000184440 245__ $$aIron Resonant Photoemission Spectroscopy on Anodized Hematite Points to Electron Hole Doping during Anodization 000184440 260__$$aWeinheim$$bWiley-Blackwell$$c2012
000184440 269__ $$a2012 000184440 300__$$a8
000184440 336__ $$aJournal Articles 000184440 520__$$aAnodization of a-Fe2O3 (hematite) electrodes in alkaline electrolyte under constant potential conditions the electrode surface in a way that an additional current wave occurs in the cyclic voltammogram. The energy position of this current wave is closely below the potential of the anodization treatment. Continued cycling or exchanging of the electrolyte causes depletion of this new feature. The O 1s and Fe 2p core-level X-ray photoelectron spectra (XPS) and near-edge X-ray absorption fine structure (NEXAFS) spectra of such conditioned hematite exhibit a chemical shift towards higher binding energies, in line with the general perception that anodization generates oxide species with dielectric properties. The valence band XPS and particularly the iron resonant valence band photoemission spectra, however, are shifted towards the opposite direction, that is, towards the Fermi energy, suggesting that hole doping on hematite has taken place during anodization. Quantitative analysis of the Fe 2p resonant valence band photoemission spectra shows that the spectra obtained at the Fe 2p absorption threshold are shifted by virtually the same energy as the anodization potential towards the Fermi energy. The tentative interpretation of this observation is that anodization forms a surface film on the hematite that is specific to the anodization potential.
000184440 6531_ $$aanodization 000184440 6531_$$ahematite
000184440 6531_ $$aphotoelectrochemistry 000184440 6531_$$awater splitting
000184440 6531_ $$aX-ray absorption spectroscopy 000184440 700__$$aBraun, Artur$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$aChen, Qianli$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$aFlak, Dorota$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$aFortunato, Giuseppino$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab Adv Fibers, CH-9014 St Gallen, Switzerland 000184440 700__$$aGajda-Schrantz, Krisztina$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$0240191$$aGraetzel, Michael$$g105292$$uEcole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, Switzerland 000184440 700__$$aGraule, Thomas$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$aGuo, Jinghua$$uErnest Orlando Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA 000184440 700__$$aHuang, Tzu-Wen$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$aLiu, Zhi$$uErnest Orlando Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA 000184440 700__$$aPopelo, Anastasiya V.$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$0244210$$aSivula, Kevin$$g178220$$uEcole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, Switzerland 000184440 700__$$aWadati, Hiroki$$uUniv Tokyo, Dept Appl Phys, Tokyo 1130032, Japan 000184440 700__$$aWyss, Pradeep P.$$uEmpa Swiss Fed Labs Mat Sci & Technol, Lab High Performance Ceram, CH-8600 Dubendorf, Switzerland 000184440 700__$$aZhang, Liang$$uErnest Orlando Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA 000184440 700__$$aZhu, Junfa$$uErnest Orlando Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA 000184440 773__$$j13$$k12$$q2937-2944$$tChemphyschem 000184440 909C0$$0252060$$pLPI$$xU10101
000184440 909CO $$ooai:infoscience.tind.io:184440$$pSB$$particle 000184440 917Z8$$x105528
000184440 937__ $$aEPFL-ARTICLE-184440 000184440 973__$$aEPFL$$rREVIEWED$$sPUBLISHED
000184440 980__ aARTICLE
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