# Thermal re-emission model

Research output: Contribution to journalArticlepeer-review

## Abstract

Starting from a continuum description, we study the nonequilibrium roughening of a thermal re-emission model for etching in one and two spatial dimensions. Using standard analytical techniques, we map our problem to a generalized version of an earlier nonlocal KPZ (Kardar-Parisi-Zhang) model. In 2 + 1 dimensions, the values of the roughness and the dynamic exponents calculated from our theory go like α ≈ z ≈ 1 and in 1 + 1 dimensions, the exponents resemble the KPZ values for low vapor pressure, supporting experimental results. Interestingly, Galilean invariance is maintained throughout.
Original language English 41405 4 Physical Review B 65 4 https://doi.org/10.1103/PhysRevB.65.041405 Published - 4 Jan 2002

## Keywords

• analytic method
• article
• mathematical analysis
• molecular dynamics
• molecular physics
• nonbiological model
• theory
• vapor pressure
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