; and (II) outcome metrics that measure cumulative risk reduction over time for high-risk covered chemical facilities; ; (5) by striking subparagraph (E); (6) by redesignating subparagraph (F) as subparagraph (E); (7) in subparagraph (E), as so redesignated, by striking the period at the end and inserting a semicolon; and (8) by adding at the end the following: (F) the number of chemical facilities of interest that have submitted Top-Screens and are awaiting tiering designation; (G) with respect to each chemical facility of interest described in subparagraph (F), the number of days during which the tiering designation for the chemical facility of interest has been pending; (H) information relating to covered products or mixtures, as defined in paragraph (7)(A), that the Secretary has excluded from the designation as chemicals of interest for purposes of the definition of the term chemical facility of interest , including— (i) the total number of petitions submitted under the regulations prescribed under paragraph (5)(C); (ii) the total number of covered products or mixtures that the Secretary has affirmatively excluded from the designation; (iii) the rationale for affirmatively excluding each covered product or mixture for which a petition described in clause (i) was submitted; and (iv) the rationale for not affirmatively excluding each covered product or mixture for which a petition described in clause (i) was submitted; (I) information related to the security harmonization waiver program established under section 2114, including— (i) the total number of covered chemical facilities that have applied for a waiver under that section; (ii) the total number of covered chemical facilities that the Secretary has granted a waiver under that section; (iii) the total number of waivers applied for and, separately, total number of waivers granted for all or part of the regulatory requirements under this title; (iv) the rationale for granting a covered facility a waiver