▁Co pper ▁C MP ▁Sl ur ry ▁Chem istry ▁on ▁the ▁Col lo idal ▁Be havior ▁of ▁Al um ina ▁A bras ives ," ▁  J ournal ▁of ▁The ▁Elect ro chem ical ▁Society , ▁ 1 5 3 , ▁G 9 4 8   ▁( 2 0 0 6 ). ▁ ▁B . ▁Han , ▁K . ▁M ish ra , ▁M . ▁R au k as , ▁K . ▁Kl ined inst , ▁J . ▁T ao , ▁and ▁J . B . ▁Tal bot , ▁“ Inv estig ation ▁of ▁L um ines c ence ▁from ▁Dy 3 + ▁in ▁Al N ,” ▁Journal ▁of ▁The ▁Elect ro chem ical ▁Society , ▁ 1 5 4 ▁( 1 ), ▁J 4 4 ▁– J 5 2 , ▁ 2 0 0 7 . ▁ ▁J . ▁Lee , ▁and ▁J . ▁B . ▁Tal bot , ▁“ A ▁Model ▁of ▁Elect ro code position ▁on ▁a ▁Rot ating ▁C yl inder ▁Elect ro de ," ▁Journal ▁of ▁The ▁Elect ro chem ical ▁Society , ▁ 1 5 4 ▁( 2 ), ▁D 7 0 - D 7 7 , ▁ 2 0 0 7 . ▁ ▁T . ▁G op al , ▁and ▁J . ▁B . ▁Tal bot , ▁“ Use ▁of ▁Sl ur ry ▁Col lo idal ▁Be havior ▁in ▁Model ing ▁of ▁Material ▁Rem oval ▁R ates ▁for ▁C MP ,” ▁Journal ▁of ▁The ▁Elect ro chem ical ▁Society , ▁ 1 5 4 ▁( 6 ),