▁two ▁co ils . ▁This ▁non - contact ▁sheet ▁resistance ▁measurement ▁method ▁also ▁allows ▁to ▁character ize ▁enc aps ulated ▁thin - fil ms ▁or ▁films ▁with ▁rough ▁surfaces . ▁▁▁▁▁ ▁A ▁very ▁cru de ▁two - point ▁pro be ▁method ▁is ▁to ▁measure ▁resistance ▁with ▁the ▁prob es ▁close ▁together ▁and ▁the ▁resistance ▁with ▁the ▁prob es ▁far ▁apart . ▁The ▁difference ▁between ▁these ▁two ▁resist ances ▁will ▁be ▁of ▁the ▁order ▁of ▁magnitude ▁of ▁the ▁sheet ▁resistance . ▁ ▁Typ ical ▁applications ▁She et ▁resistance ▁measurements ▁are ▁very ▁common ▁to ▁character ize ▁the ▁uniform ity ▁of ▁conduct ive ▁or ▁sem icon duct ive ▁coat ings ▁and ▁materials , ▁e . g . ▁for ▁quality ▁ass urance . ▁Typ ical ▁applications ▁include ▁the ▁inline ▁process ▁control ▁of ▁metal , ▁T CO , ▁conduct ive ▁nan om aterial s ▁or ▁other ▁coat ings ▁on ▁architect ural ▁glass , ▁w af ers , ▁flat ▁panel ▁displays , ▁polym er ▁fo ils , ▁O LED , ▁cer am ics , ▁etc . ▁The ▁contact ing ▁four - point ▁pro be ▁is ▁often ▁applied ▁for ▁single - point ▁measurements ▁of ▁hard ▁or ▁co arse ▁materials . ▁Non - contact ▁ed dy ▁current ▁systems ▁are ▁applied ▁for ▁sensitive ▁or ▁enc aps ulated ▁coat ings , ▁for ▁inline ▁measurements ▁and ▁for ▁high - resol ution ▁mapping . ▁ ▁See ▁also ▁ ▁E SD ▁materials ▁ ▁References ▁▁ ▁Me as uring ▁She et ▁Res istance ▁ ▁General ▁references ▁▁▁▁▁▁▁▁▁▁ ▁Me as uring ▁She et ▁Res istance ▁ ▁Category :