Directly compared to photolithography's large area patterning capabilities, e-beam lithography is too slow, and yet e-beam instruments can be found in every lab in the world because it fills a very specific niche not addressed by photolithography.
Directly compared to photolithography's large area patterning capabilities, e-beam lithography is "too slow". Yet, e-beam instruments can be found in every lab and nanofab in the world because it fills a very specific niche not addressed by photolithography.