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Patent US6977126 - Pellicle, photomask, pellicle frame, and method for manufacturing pellicle - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More »Sign inAdvanced Patent SearchPatentsA pellicle for protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter, comprising: a pellicle film having a predetermined thickness, through which a light transmits to the reticle; and a pellicle frame, on which a periphery...http://www.google.com/patents/US6977126?utm_source=gb-gplus-sharePatent US6977126 - Pellicle, photomask, pellicle frame, and method for manufacturing pellicleAdvanced Patent SearchPublication numberUS6977126 B2Publication typeGrantApplication numberUS 10/016,628Publication dateDec 20, 2005Filing dateDec 17, 2001Priority dateDec 18, 2000Fee statusPaidAlso published asUS20020090558Publication number016628, 10016628, US 6977126 B2, US 6977126B2, US-B2-6977126, US6977126 B2, US6977126B2InventorsToru ShirasakiOriginal AssigneeShin-Etsu Chemical Co., Ltd.Export CitationBiBTeX, EndNote, RefManPatent Citations (10), Referenced by (1), Classifications (11), Legal Events (3) External Links: USPTO, USPTO Assignment, EspacenetPellicle, photomask, pellicle frame, and method for manufacturing pellicleUS 6977126 B2Abstract A pellicle for protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter, comprising: a pellicle film having a predetermined thickness, through which a light transmits to the reticle; and a pellicle frame, on which a periphery of the pellicle film contacts, including: a body part having a frame shape, the height of which is substantially constant all over the body part; and an upper protruding part formed on an upper end of the body part that protrudes upward from the upper end of the body part for directly contacting with a surface of the pellicle film, the height of the upper protruding part being constant all over the upper protruding part.
1. A pellicle for protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter, comprising:
a pellicle film;
a pellicle frame comprising:
a body part having a frame shape, the height of which is substantially constant; and
an upper protruding part on an upper end of said body part that protrudes upward from said upper end of said body part and directly contacts a surface of said pellicle film, the height of said upper protruding part being constant; and
an adhesive between the body part and the pellicle film and contacting said upper protruding part of said pellicle frame.
2. The pellicle as claimed in claim 1, wherein said upper protruding part is on an inner edge of said upper end of said body part.
3. The pellicle as claimed in claim 1, wherein said upper protruding part is on an outer edge of said upper end of said body part.
4. The pellicle as claimed in claim 1, wherein said upper protruding part comprises upper protruding parts on an inner edge and an outer edge of said upper end of said body part so that a recessed part is formed between said upper protruding parts.
5. The pellicle as claimed in claim 1, wherein said pellicle frame further comprises a lower protruding part on a lower end of said body part that protrudes downward from said lower end of said body part and directly contacts a surface of said reticle, the height of said lower protruding part being constant.
6. The pellicle as claimed in claim 5, wherein said lower protruding part is on an inner edge of said lower end of said body part.
7. The pellicle as claimed in claim 5, wherein said lower protruding part is on an outer edge of said lower end of said body part.
8. The pellicle as claimed in claim 5, wherein said lower protruding part comprises lower protruding parts on an inner edge and an outer edge of said lower end of said body part so that a recessed part is formed between said lower protruding parts.
9. The pellicle as claimed in claim 5, further comprising another adhesive between the lower end of said body part and said surface of said reticle.
10. The pellicle as claimed in claim 5, wherein a bottom end of said lower protruding part contacts said reticle at one point along a cross sectional direction perpendicular to a longitudinal direction of said lower protruding part.
11. The pellicle as claimed in claim 1, wherein said pellicle film and said pellicle frame is adhered such that said upper protruding part directly contacts a surface of said pellicle film, and an upper end of said body part contacts said surface of said pellicle film through an adhesive.
12. The pellicle as claimed in claim 1, wherein a top end of said upper protruding part comprises a sharp edge.
13. The pellicle as claimed in claim 1, wherein said upper protruding part is all around an upper end of said body part.
14. The pellicle of claim 1, wherein said pellicle film contacts a part of said upper protruding part and said adhesive, when said pellicle film is mounted on said pellicle frame.
a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device;
a pellicle for protecting said reticle from an attachment of a foreign matter; and
an adhesive between the body part and the pellicle,
wherein said pellicle comprises:
a pellicle film; and
a pellicle frame comprising
an upper protruding part on an upper end of said body part that protrudes upward from said upper end of said body part and directly contacts a surface of said pellicle film, the height of said upper protruding part being constant, wherein said adhesive contacts said upper protruding part of said pellicle frame.
16. The photomask as claimed in claim 15, further comprising a lower protruding part on a lower end of said body part that protrudes downward from said lower end of said body part and directly contacts a surface of said reticle, the height of said lower protruding part being constant all over said lower protruding part.
17. The photomask as claimed in claim 16, wherein said upper protruding part is on an inner edge of said upper end of said body part, and said lower protruding part is on an inner edge of said lower end of said body part.
18. The photomask as claimed in claim 16, wherein said upper protruding part is on an outer edge of said upper end of said body part, and said lower protruding part is on an outer edge of said lower end of said body part.
19. The photomask as claimed in claim 16, wherein:
said upper protruding part comprises upper protruding parts on an inner edge and an outer edge of said upper end of said body part so that an upper recessed part is formed between said upper protruding parts; and
said lower protruding part comprises lower protruding parts on both an inner edge and an outer edge of said lower end of said body part so that a lower recessed part is formed between said lower protruding parts.
20. The photomask of claim 15, wherein said pellicle film contacts a part of said upper protruding part and said adhesive, when said pellicle film is mounted on said pellicle frame.
21. A pellicle frame between a reticle and a pellicle film, comprising:
a first portion directly contacting said pellicle film;
an adhesive film contacting said pellicle film; and
a second portion contacting said first portion and said adhesive film, wherein said first portion contacts said adhesive film, wherein said first portion directly contacts said reticle.
22. The pellicle frame as claimed in claim 21, further comprising another adhesive film contacting said second portion and said reticle.
23. The pellicle frame as claimed in claim 21, wherein a difference of height between said first portion and said second portion serves as an adhesive accommodation part for accommodating said adhesive film.
24. The pellicle frame of claim 21, wherein said first portion of said pellicle frame comprises an upper protruding part that contacts said pellicle film, when said pellicle film is mounted on said pellicle frame.
25. The pellicle frame of claim 21, wherein said pellicle frame is divided in a vertical direction to form said first portion and said second portion.
26. The pellicle frame of claim 21, wherein said first portion comprises:
an upper protruding part on an upper end of a body portion part; and
a lower protruding part on a lower end of a body portion part.
27. The pellicle frame of claim 26, wherein said upper protruding part contacts said pellicle film.
28. The pellicle frame of claim 26, wherein said lower protruding part contacts said reticle.
29. The pellicle frame of claim 21, wherein a height of said first portion is substantially constant and a height of said second portion is substantially constant.
This patent application claims priority from a Japanese patent application No. 2000-383205 filed on Dec. 18, 2000, the contents of which are incorporated herein by reference.
The present invention relates to a pellicle, a photomask, a pellicle frame, and a method for manufacturing a pellicle. More particularly, the present invention relates to a pellicle, which is used for protecting a reticle from attachment of a foreign matter. A reticle is used for a lithography process for manufacturing a semiconductor device such as an LSI (Large-Scale Integrated) circuit, a VLSI (Very Large-Scale Integrated) circuit, or an LCD (Liquid Crystal Display).
To manufacture a semiconductor device such as an LSI circuit, a VLSI circuit, or an LCD by a lithography process, a light is irradiated to a semiconductor wafer through a reticle, on which a circuit pattern to be transcribed onto the wafer is formed. A reticle is a photomask used for a stepper. If foreign matter is attached to the reticle, this foreign matter absorbs or reflects the light, and thus the pattern transcribed onto the wafer may deform. Also, the shape of the edge of the pattern may deform. Therefore, the size, the quality, and the outward appearance of the pattern transcribed on the wafer deteriorate. Thus, the performance or the yield factor of a semiconductor device and LCD manufactured from this wafer decrease.
Because of the above-mentioned reason, the lithography process described-above is performed inside a clean room. However, even inside the clean room, it is difficult to always maintain the reticle in a normal condition, that is, the condition where the reticle is free from attachment of foreign matter. Thus, usually, a pellicle that protects the reticle from foreign matter is adhered to the surface of the reticle. A pellicle is transparent so that a light used for exposure can transmit through the pellicle onto the reticle.
By using a pellicle, the foreign matter does not attach to the surface of the reticle but attaches to the surface of the pellicle. Therefore, if the light is focused on the pattern of the reticle during the lithography process, the foreign matter, which attaches to the pellicle, does not influence the transcription of the pattern onto the wafer.
FIG. 1 shows a configuration of a conventional photomask. The photomask has a reticle 14 and a pellicle 100. The pellicle 100 includes a pellicle film 12 and a pellicle frame 10.
The pellicle 100 is manufactured by applying a good solvent of the pellicle film 12 on the top end face of a pellicle frame 10, drying the solvent on the pellicle frame 10 with wind, and adhering the pellicle frame 10 on the transparent pellicle film 12 as disclosed in Japanese Patent Application Laid-Open No. S58-219023. The pellicle frame 10 is made from material such as nitrocellulose, cellulose acetate, or fluoroplastics, which has high optical permeability. The pellicle frame 10 can be made from material such as aluminum, stainless steel, or polyethylene, as examples.
The pellicle 100 can also be manufactured by adhering the pellicle frame 10 on a pellicle film 12 with adhesive 20 as disclosed in U.S. Pat. No. 4,861,402, Japanese Patent Application publication No. S63-27707, and Japanese Patent Application Laid-Open No. H7-168345. Acrylic resin, epoxy resin, or fluoroplastics can be used as adhesive 20. Also, an adhesive layer 22 and a separation layer for protecting the adhesive layer 22 is further adhered on a bottom end face of the pellicle frame 10. An adhesive layer is made from material such as polybutene resin, polyvinyl acetate resin, acrylic resin, or silicon resin. Therefore, the pellicle film 12 is adhered to the pellicle frame 10 via the adhesive 20. Then, the photomask 200 is manufactured by adhering the pellicle 100 on the reticle 14 with the adhesive 22.
Recently, the requirement for the resolution of the lithography has gradually increased. Therefore, a light having a shorter wavelength is gradually used to satisfy the requirement of the resolution. Specifically, instead of an ultraviolet light of g-line having 436 nm wavelength or i-line having 365 nm wavelengths, an extreme ultraviolet light of KrF excimer laser has been used recently. In the near future, a vacuum ultraviolet light such as an ArF excimer laser having 193 nm wavelength or an F2 excimer laser having 158 nm wavelengths will be used.
If the wavelength of the light becomes shorter, the photon energy of light becomes large. Thus, the deterioration of the material used for the lithography process becomes large. Especially, in a case of the pellicle film 12, because the material used for the pellicle film 12 is organic material such as fluoroplastics, the pellicle film 12 tends to deteriorate easily when using the light having a shorter wavelength.
Therefore, it is proposed to use an inorganic material for a material of a pellicle film 12. In a case of using an inorganic material for the pellicle film 12, the pellicle film 12 should have a larger thickness than the pellicle film 12 made of organic material in order to have enough strength because the inorganic compound layer is generally weak. However, if the thickness of the pellicle film 12, which is made of inorganic material, is large, it becomes very important that the surface of the pellicle film 12 and the surface of the reticle 14 are accurately parallel to each other because of the optical restriction inside the stepper.
Therefore, comparing the relationship between the surface of the pellicle film 12 made of organic material and the surface of the reticle 14, the surface of the pellicle film 12 made of inorganic material and the surface of the reticle 14 should be more accurately parallel.
If the pellicle film 12 is adhered to the pellicle frame 10 through the adhesive 20 as shown in FIG. 1, it is difficult to make the surface of the pellicle film 12 be accurately parallel to the surface of the reticle 14 because the thickness of the adhesive 20 is not uniform.
Generally, the pellicle 100 is adhered to the reticle 14 through the adhesive 22, which is applied on the bottom end of pellicle frame 10. By pressing and adhering the bottom end face of the pellicle frame 10 to the reticle 14, the adhesive layer protected by the separation layer of the adhesive 22 is collapsed, and the pellicle 100 thus be adhered to the reticle 14.
Because this adhesive 22 has elasticity, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 22 changes according to the pressure applied on the pellicle 100 against the reticle 14. If the distribution of weight applied on the pellicle 100 is different in each location inside the surface of the pellicle 100, to which the reticle 14 is adhered, the height of the adhesive 22 becomes different for each location. Therefore, the surface of the pellicle film 12 and the surface of the reticle 14 do not become parallel to each other.
SUMMARY OF THE INVENTION Therefore, it is an object of the present invention to provide a pellicle, which is capable of overcoming the above drawbacks accompanying the conventional art. The above and other objects can be achieved by combinations described in the independent claims. The dependent claims define further advantageous and exemplary combinations of the present invention.
According to the first aspect of the present invention, a pellicle for protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter, comprises: a pellicle film having a predetermined thickness, through which a light transmits to the reticle; and a pellicle frame, on which a periphery of the pellicle film contacts, including: a body part having a frame shape, the height which are substantially constant all over the body part; and an upper protruding part formed on an upper end of the body part that protrudes upward from the upper end of the body part for directly contacting with a surface of the pellicle film, the height of the upper protruding part being constant all over the upper protruding part.
The upper protruding part may be formed on an inner edge of the upper end of the body part. The upper protruding part may be formed on an outer edge of the upper end of the body part. The upper protruding parts may be formed on both an inner edge and an outer edge of the upper end of the body part so that a recessed part is formed between the upper protruding parts.
The pellicle may further comprise a lower protruding part formed on a lower end of the body part that protrudes downward from the lower end of the body part for directly contacting with a surface of the reticle, the height of the lower protruding part being constant all over the lower protruding part. The lower protruding part may be formed on an inner edge of the lower end of the body part. The lower protruding part may be formed on an outer edge of the lower end of the body part.
The lower protruding parts may be formed on both an inner edge and an outer edge of the lower end of the body part so that a recessed part is formed between the lower protruding parts. The pellicle film and the pellicle frame may be adhered such that the upper protruding part directly contacts a surface of the pellicle film, and an upper end of the body part contacts the surface of the pellicle film through an adhesive.
The pellicle frame and the reticle may be adhered such that the lower protruding part directly contacts a surface of the reticle, and a lower end of the body part contacts the surface of the reticle through an adhesive.
A top end of the upper protruding part may have a sharp edge so that the upper protruding part is contacting the pellicle film at one point along a cross sectional direction perpendicular to a longitudinal direction of the upper protruding part. Furthermore, a bottom end of the lower protruding part may have a sharp edge so that the lower protruding part contacts the reticle at one point along a cross sectional direction perpendicular to a longitudinal direction of the lower protruding part.
According to the second aspect of the present invention, a photomask comprises: a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device; and a pellicle for protecting the reticle from an attachment of a foreign matter; wherein the pellicle has a pellicle film having a predetermined thickness, through which a light transmits to the reticle; and a pellicle frame, on which a periphery of the pellicle frame contacts, including: a body part having a frame shape, the height of which are substantially constant all over the body part; and an upper protruding part formed on an upper end of the body part that protrudes upward from the upper end of the body part for directly contacting with a surface of the pellicle film, the height of the upper protruding part being constant all over the upper protruding part.
The photomask may further comprise a lower protruding part formed on a lower end of the body part that protrudes downward from the lower end of the body part for directly contacting with a surface of the reticle, the height of the lower protruding part being constant all over the lower protruding part.
The upper protruding part may be formed on an inner edge of the upper end of the body part, and the lower protruding part is formed on an inner edge of the lower end of the body part. The upper protruding part may be formed on an outer edge of the upper end of the body part, and the lower protruding part may be formed on an outer edge of the lower end of the body part.
The upper protruding part may be formed on both an inner edge and an outer edge of the upper end of the body part so that an upper recessed part is formed between the upper protruding parts; and the lower protruding part may be formed on both an inner edge and an outer edge of the lower end of the body part so that a lower recessed part is formed between the lower protruding parts.
According to the third aspect of the present invention, a pellicle frame arranged between a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, and a pellicle film, through which a light transmits to the reticle, comprises: a first portion directly contacting the pellicle film; and a second portion contacting the pellicle film through an adhesive that adheres the pellicle frame to the pellicle film.
The first portion may directly contact the reticle, and the second portion contacting the reticle through an adhesive that adheres the pellicle frame to the reticle. A difference of height between the first portion and the second portion may serve as an adhesive accommodation part for accommodating the adhesive.
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows a configuration of a conventional photomask. The photomask has a reticle 14 and a pellicle 100.
FIGS. 2A and 2B show configuration of a pellicle frame 10A of the present embodiment.
FIG. 3 shows a configuration of a photomask manufactured using the pellicle frame 10A shown in FIGS. 2A and 2B.
FIG. 4 shows another cross sectional view of the pellicle frame 10A.
FIGS. 5A and 5B show configuration of another embodiment of the photomask of the present invention.
FIGS. 6A and 6B show further another embodiment of the photomask of the present invention.
FIG. 7 shows another embodiment of the pellicle frame of the present invention.
FIG. 8 shows further another embodiment of the pellicle frame of the present invention.
FIG. 9 shows further another embodiment of the pellicle frame of the present invention.
FIG. 10 shows further another embodiment of the pellicle frame of the present invention.
FIGS. 11A and 11B show configuration of another embodiment of the pellicle of the present invention.
FIGS. 2A and 2B show configuration of a pellicle frame 10A of the present embodiment. FIG. 2A shows an upper plan view of the pellicle frame 10A. FIG. 2B shows a cross-sectional view of the pellicle frame 10A.
A pellicle frame 10A has a body part 50 having a rectangular frame shape and an upper protruding part 16 formed all around an outer edge of the upper end 70 of the body part 50. The shape of the pellicle frame 10A can be various shapes other than rectangular shape such as circular shape or octagonal shape. Furthermore, the upper protruding part 16 is not necessarily formed all around the upper end 70 of the body part 50. The upper protruding part can be formed on a part of the upper end 70 of the body part 50 as shown in FIG. 11A.
The body part 50 and the upper protruding part 16 are integrally formed. The height of the body part 50 is substantially constant all over the body part 50. The upper protruding part 16 protrudes upward from the upper end 70 of the body part. The height of the upper protruding part 16 is constant all over the upper protruding part 16.
A pellicle frame 10A further has a lower protruding part 18 formed all around an outer edge of the lower end 72 of the body part 50. The lower protruding part 18 is not necessarily formed all around the lower end 72 of the body part 50. The lower protruding part can be formed on a part of the lower end 72 of the body part 50. The lower protruding part 18 protrudes downward from the lower end 72 of the body part 50. The body part 50 and the lower protruding part 18 are integrally formed. The height of the lower protruding part 18 is constant all over the lower protruding part 18. A pellicle frame 10A is formed by such as a rigid material such as metal, glass, ceramic, or plastic, which are conventionally known.
As shown in FIG. 2B, an adhesive 24 is applied on the upper end 70 of the body part 50. Here, the adhesive 24 is not applied on the top end of the upper protruding part 16 as shown in FIG. 2B. Preferably, the adhesive 24 is applied on the upper end 70 of the body part 50 such that the height of the adhesive 24 is slightly higher than the height of the upper protruding part 16. A material such as acrylic resin, epoxy resin, fluoroplastics, polybutene resin, polyvinyl acetate resin, or silicon resin, which are conventionally known, can be used for the adhesive 24.
Furthermore, an adhesive 26 is applied on the lower end 72 of the body part 50 as shown in FIG. 2B. Here, the adhesive 26 is not applied on the bottom end of the lower protruding part 18. Preferably, the adhesive 26 is applied on the lower end 72 of the body part 50 such that the height of the adhesive 26 is slightly higher than the height of the lower protruding part 18. A material such as polybutene resin, polyvinyl acetate resin, acrylic resin, or silicon resin, which are conventionally known, can be used for the adhesive 26.
FIG. 3 shows a configuration of a photomask manufactured using the pellicle frame 10A shown in FIG. 2A and 2B. A photomask 200A has a pellicle film 12, a pellicle frame 10A, and a reticle 14. The pellicle film 12 is transparent so that a light can transmit through the pellicle frame 12 onto the reticle 14. The pellicle film 12 has a predetermined thickness in order to have enough strength.
The pellicle film 12 is made from an inorganic compound. As an example of the inorganic compound, there are materials such as silica glass, calcium fluoride, and magnesium fluoride, which are excellent in extreme ultraviolet radiation permeability. A silica glass is the most preferable material to be used for the pellicle film 12. A circuit pattern is formed on the reticle 14 so that a light that passes through the reticle 14 is irradiated onto the wafer to manufacture a semiconductor device. A conventional reticle may be used for the reticle 14 of the present embodiment.
The pellicle frame 10A is adhered to the pellicle film 12 by the adhesive 24 to form a pellicle 10A. The pellicle film 12 and the pellicle frame 10A are adhered such that the upper protruding part 16 of the pellicle frame 10A directly contacts a surface of the pellicle film 12. At this time, the periphery of the pellicle film 12 contacts the upper protruding part 16 of the pellicle frame 12. By the above-mentioned process, the pellicle 100A that protects the reticle 14 from a foreign matter can be manufactured.
Furthermore, the pellicle 100A and the reticle 14 is adhered by the adhesive 26 such that that the lower protruding part 18 of the pellicle 100A directly contacts a surface of the reticle 14. Then, the photomask 200A used for manufacturing a semiconductor device is manufactured.
The amount of adhesive 24 applied on the upper end 70 of the body part 50 is determined so that the upper protruding part 16 of the pellicle frame 10A directly contacts a surface of the pellicle film 12. Also, the amount of adhesive 26 applied on the lower end 72 of the body part 50 is determined such that the lower protruding part 18 of the pellicle 100A directly contacts a surface of the reticle 14. The amounts of adhesive 24 and 26 are adjusted according to the characteristic of the adhesive 24 and 26 such as viscosity, density, and curing speed of the adhesive 24 and 26.
Because the upper protruding part 16 of the pellicle frame 10A directly contacts a surface of the pellicle film 12, the distance between the pellicle film 12 and the pellicle frame 10A is constant all over the pellicle 10A. That is, the distance between the pellicle film 12 and the pellicle frame 10A is substantially zero all over the pellicle 10A. Furthermore, because the lower protruding part 18 of the pellicle 100A directly contacts a surface of the reticle 14, and because the height of the pellicle frame 10A is constant all over the pellicle frame 10A, the bottom surface of the pellicle film 12 of the pellicle 10A becomes parallel to the top surface of the reticle 14. In other words, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 14 becomes constant all over the pellicle film 12.
Conventionally, the adhesives 20 and 22 adhere the pellicle frame 10 to the pellicle film 12 and the reticle 14 and also control the vertical position of the pellicle 100 against the reticle 14.
Contrary, in the present embodiment, the adhesives 24 and 26 only adhere the pellicle frame 10A to the pellicle film 12 and the reticle 14, respectively, in the pellicle 10A. Instead of adhesive 24 and 26, the upper protruding part 16 and the lower protruding part 18 of the pellicle frame 10A control the vertical position of the pellicle 100A against the reticle 14. Because the pellicle frame 10A is made of rigid material, the surface of the pellicle film 12 and the surface of the reticle 14 can be accurately parallel to each other if the height of the pellicle frame 10A is accurately constant all over the pellicle frame 10A.
FIG. 4 shows another cross sectional view of the pellicle frame 10A. The pellicle frame 10A shown in FIG. 4 is the same as that shown in FIG. 2B except the location of division between a body part and a protruding part.
In FIG. 2B, the pellicle frame 10A is divided in a horizontal direction for each of the upper protruding part 16, the body part, and the lower protruding part 18. In FIG. 4, the pellicle frame 10A is divided in a vertical direction.
The pellicle frame 10A has a first portion 92 that directly contacts the pellicle film 12 and a second portion 94 that contacts the pellicle film 12 through the adhesive 24. The first portion 92 contacts the pellicle film 12 such that the top end 92A of the first portion 92 directly contacts the pellicle film 12. Furthermore, the first portion 92 contacts the reticle 14 such that the bottom end 92B of the first portion 92 directly contacts the reticle 14. The second portion 92 contacts the reticle 14 through the adhesive 26.
The first portion 92 of FIG. 4 corresponds to the sum of the upper protruding part 16, a part of the body part 50, and the lower protruding part 18 shown in FIG. 2B. The second portion 94 of FIG. 4 corresponds to a part of the body part 50 shown in FIG. 2B.
A difference of height H1 and H2 between the first portion 92 and the second portion 94 serves as an adhesive accommodation part for accommodating the adhesives 24 and 26.
FIGS. 5A and 5B show configuration of another embodiment of the photomask of the present invention. The configuration of the photomask 2003 shown in FIGS. 5A and 5B are the same as the configuration of FIG. 3 except the position where the upper protruding part 28 and the lower protruding part 30 are formed.
The upper protruding part 28 shown in FIGS. 5A and 5B is formed all around the inner edge of the upper end 32 of the body part 50. The upper protruding part 28 is not necessarily formed all around the upper end 32 of the body part 50. The upper protruding part 28 can be formed on a part of the upper end 32 of the body part 50. Also, the lower protruding part 30 is formed all around the inner edge of the lower end 34 of the body part 50. The lower protruding part 30 is not necessarily formed all around the upper end 34 of the body part 50. The lower protruding part can be formed on a part of the lower end 34 of the body part 50. The upper protruding part 28, the body part 50, and the lower protruding part 30 are integrally formed.
Because the upper protruding part 28 of the pellicle frame 10B directly contacts a surface of the pellicle film 12, the vertical position of the surface of the pellicle film 12 against the pellicle frame 10B is constant all over the pellicle 10B. Furthermore, because the lower protruding part 30 of the pellicle 100B directly contacts a surface of the reticle 14, the bottom surface of the pellicle film 12 of the pellicle 10B becomes parallel to the top surface of the reticle 14. In other words, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 14 becomes constant all over the pellicle film 12.
FIGS. 6A and 6B show further another embodiment of the photomask of the present invention. The configuration of the photomask 200C shown in FIGS. 6A and 6B are the same as the configuration of FIG. 3 except that two upper protruding parts 16 and 28 and two lower protruding parts 18 and 30 are formed.
The upper protruding parts 16 and 28 are formed all around both the inner edge and outer edge of the upper end 40 of the body part 50 so that an upper recessed part 40 is formed between the upper protruding parts 16 and 28. Furthermore, the lower protruding parts 18 and 30 are formed all around both the inner edge and outer edge of the lower end 46 of the body part 50 so that a lower recessed part 40 is formed between the lower protruding parts 18 and 30. The height of the upper protruding parts 16 and 28 are the same, and the height of the lower protruding parts 18 and 30 are the same.
The upper protruding parts 16 and 28 are not necessarily formed all around the upper end 40 of the body part 50. The upper protruding parts 16 and 28 can be formed on a part of the upper end 40 of the body part 50. Also, the lower protruding parts 18 and 30 are not necessarily formed all around the lower end 46 of the body part 50. The lower protruding parts 18 and 30 can be formed on a part of the lower end 46 of the body part 50.
Because the upper protruding parts 16 and 28 of the pellicle frame 10C directly contact a surface of the pellicle film 12, the vertical position of the pellicle film 12 against the pellicle frame 10C is constant all over the pellicle 10C. Furthermore, because the lower protruding parts 18 and 30 of the pellicle 100C directly contact a surface of the reticle 14, the bottom surface of the pellicle film 12 of the pellicle 10C becomes parallel to the top surface of the reticle 14. In other words, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 14 becomes constant all over the region of the pellicle film 12.
FIG. 7 shows another embodiment of the pellicle frame of the present invention. The configuration of the pellicle frame 10D shown in FIG. 7 is the same as that shown in FIG. 2B except that a top end 80E of the upper protruding part 80 has a sharp edge. The upper protruding part 80 is formed all around an outer edge of the upper end 70 of the body part 50. Also, the lower protruding part 82 is formed all around an outer edge of the lower end 34 of the body part 50.
The upper protruding part 80 is not necessarily formed all around the upper end 70 of the body part 50. The upper protruding part can be formed on a part of the upper end 70 of the body part 50. Also, the lower protruding part 82 is not necessarily formed all around the lower end 34 of the body part 50. The lower protruding part 82 can be formed on a part of the lower end 34 of the body part 50.
Because the top end 80E of the upper protruding part 80 has a sharp edge, the upper protruding part 80 contacts the pellicle film 12 at one point, which is the top end 80E, along a cross sectional direction perpendicular to the longitudinal direction of the upper protruding part 80. If the top plan view of the connection between the pellicle frame 10D and the pellicle film 12 is shown, the shape of the connection is shown as a linear shape.
Thus, when the pellicle frame 10D is pushed and adhered to the pellicle film 12, the adhesive applied on the upper protruding part 80 escapes from the top end 80E of the upper protruding part 80. Therefore, the top end 80E of the upper protruding part 80 can directly and reliably contact a surface of the pellicle film 12. Thus, the vertical position of the pellicle film 12 against the pellicle frame 10D becomes constant all over the pellicle frame 10D because the pellicle frame 10D directly and reliably contacts the surface of the pellicle film 12 all over the pellicle frame 10D.
Furthermore, because the bottom end 82E of the lower protruding part 82 also has a sharp edge, the lower protruding part 82 contacts the reticle 14 at one point, which is the bottom end 82E, along a cross sectional direction perpendicular to the longitudinal direction of the lower protruding part 82. If the bottom plan view of the connection between the pellicle frame 10D and the reticle 14 is shown, the shape of the connection is shown as a linear shape.
Thus, when the pellicle frame 10D is pushed and adhered to the reticle 14, the adhesive applied on the lower protruding part 86 escapes from the bottom end 82E of the lower protruding part 82. Therefore, the bottom end 82E of the lower protruding part 82 can directly and reliably contact a surface of the reticle 14. Thus, the bottom surface of the pellicle film 12 becomes parallel to the top surface of the reticle 14. In other words, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 14 becomes reliably constant all over the region of the pellicle film 12.
FIG. 8 shows further another embodiment of the pellicle frame of the present invention. The configuration of the pellicle frame 10E shown in FIG. 8 is the same as that shown in FIG. 5B except that a top end 84E of the upper protruding part 84 has a sharp edge. The upper protruding part 84 is formed all around an inner edge of the upper end 32 of the body part 50. Also, the lower protruding part 86 is formed all around an inner edge of the lower end 34 of the body part 50.
The upper protruding part 84 is not necessarily formed all around the upper end 32 of the body part 50. The upper protruding part 84 can be formed on a part of the upper end 32 of the body part 50. Also, the lower protruding part 86 is not necessarily formed all around the lower end 34 of the body part 50. The lower protruding part can be formed on a part of the lower end 34 of the body part 50.
Because the top end 84E of the upper protruding part 84 has a sharp edge, the upper protruding part 84 contacts the pellicle film 12 at one point, which is the top end 84E, along a cross sectional direction perpendicular to the longitudinal direction of the upper protruding part 84. If the top plan view of the connection between the pellicle frame 10E and the pellicle film 12 is shown, the shape of the connection is shown as a linear shape.
Thus, when the pellicle frame 10E is pushed and adhered to the pellicle film 12, the adhesive applied on the upper protruding part 84 escapes from the top end 84E of the upper protruding part 84. Therefore, the top end 84E of the upper protruding part 84 can directly and reliably contact a surface of the pellicle film 12. Thus, the vertical position of the pellicle film 12 against the pellicle frame 10E becomes constant all over the pellicle frame 10E because the pellicle frame 10E directly and reliably contacts the surface of the pellicle film 12 all over the pellicle frame 10E.
Furthermore, because the bottom end 86E of the lower protruding part 86 also has a sharp edge, the lower protruding part 86 contacts the reticle 14 at one point, which is the bottom end 86E, along a cross sectional direction perpendicular to the longitudinal direction of the lower protruding part 86. If the bottom plan view of the connection between the pellicle frame 10E and the reticle 14 is shown, the shape of the connection is shown as a linear shape.
Thus, when the pellicle frame 10E is pushed and adhered to the reticle 14, the adhesive applied on the lower protruding part 86 escapes from the bottom end 86E of the lower protruding part 86. Therefore, the bottom end 86E of the lower protruding part 86 can directly and reliably contact a surface of the reticle 14. Thus, the bottom surface of the pellicle film 12 becomes parallel to the top surface of the reticle 14. In other words, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 14 becomes reliably constant all over the region of the pellicle film 12.
FIG. 9 shows further another embodiment of the pellicle frame of the present invention. The configuration of the pellicle frame 10F shown in FIG. 9 is the same as that shown in FIG. 6B except that top ends 80E and 84E of the upper protruding parts 80 and 84 have a sharp edge. The upper protruding parts 80 and 84 are formed all around both of an inner edge and an outer edge of the upper end 40 of the body part 50, respectively. Also, the lower protruding parts 82 and 86 are formed all around both of an inner edge and an outer edge of the lower end 46 of the body part 50, respectively.
The upper protruding parts 80 and 84 are not necessarily formed all around the upper end 40 of the body part 50. The upper protruding parts 80 and 84 can be formed on a part of the upper end 40 of the body part 50. Also, the lower protruding parts 82 and 86 are not necessarily formed all around the lower end 46 of the body part 50. The lower protruding parts 82 and 86 can be formed on a part of the lower end 46 of the body part 50.
Because the top end 80E of the upper protruding part 80 has a sharp edge, the upper protruding part 80 contacts the pellicle film 12 at one point, which is the top end 80E, along a cross sectional direction perpendicular to the longitudinal direction of the upper protruding part 80. Also, because the top end 84E of the upper protruding part 84 has a sharp edge, the upper protruding part 84 contacts the pellicle film 12 at one point, which is the top end 84E, along a cross sectional direction perpendicular to the longitudinal direction of the upper protruding part 84. If the top plan view of the connection between the pellicle frame 10F and the pellicle film 12 is shown, the shape of the connection is shown as two-linear shapes.
Thus, when the pellicle frame 10F is pushed and adhered to the pellicle film 12, the adhesive applied on the upper protruding parts 80 and 84 escapes from the top ends 80E and 84E of the upper protruding parts 80 and 84. Therefore, the top ends 80E and 84E of the upper protruding parts 80 and 84 can directly and reliably contact a surface of the pellicle film 12. Thus, the vertical position of the pellicle film 12 against the pellicle frame 10F becomes constant all over the pellicle frame 10F because the pellicle frame 10F directly and reliably contacts the surface of the pellicle film 12 all over the pellicle frame 10F.
Furthermore, because the bottom end 82E of the lower protruding part 82 also has a sharp edge, the lower protruding part 82 contacts the reticle 14 at one point, which is the bottom end 82E, along a cross sectional direction perpendicular to the longitudinal direction of the lower protruding part 82. Also, because the bottom end 86E of the lower protruding part 86 also has a sharp edge, the lower protruding part 86 contacts the reticle 14 at one point, which is the bottom end 86E, along a cross sectional direction perpendicular to the longitudinal direction of the lower protruding part 86. If the bottom plan view of the connection between the pellicle frame 10F and the reticle 14 is shown, the shape of the connection is shown as two-linear shapes.
Thus, when the pellicle frame 10F is pushed and adhered to the reticle 14, the adhesive applied on the lower protruding parts 82 and 86 escapes from the bottom ends 82E and 86E of the lower protruding parts 82 and 86. Therefore, the bottom ends 82E and 86E of the lower protruding parts 82 and 86 can directly and reliably contact a surface of the reticle 14. Thus, the bottom surface of the pellicle film 12 becomes parallel to the top surface of the reticle 14. In other words, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 14 becomes reliably constant all over the region of the pellicle film 12.
FIG. 10 shows further another embodiment of the pellicle frame of the present invention. The upper protruding part 88 is formed all around a central part of the upper end 92 of the body part 50. Also, the lower protruding part 90 is formed all around a central part of the lower end 94 of the body part 50.
The upper protruding part 88 is not necessarily formed all around the upper end 92 of the body part 50. The upper protruding part 88 can be formed on a part of the upper end 92 of the body part 50. Also, the lower protruding part 90 is not necessarily formed all around the lower end 94 of the body part 50. The lower protruding part 90 can be formed on a part of the lower end 94 of the body part 50.
Because the top end 88E of the upper protruding part 88 has a sharp edge, the upper protruding part 88 contacts the pellicle film 12 at one point, which is the top end 88E, along a cross sectional direction perpendicular to the longitudinal direction of the upper protruding part 88. If the top plan view of the connection between the pellicle frame 10G and the pellicle film 12 is shown, the shape of the connection is shown as a linear shape.
Thus, when the pellicle frame 10G is pushed and adhered to the pellicle film 12, the adhesive applied on the upper protruding part 88 escapes from the top end 88E of the upper protruding part 88. Therefore, the top end 88E of the upper protruding part 88 can directly and reliably contact a surface of the pellicle film 12. Thus, the vertical position of the pellicle film 12 against the pellicle frame 10G becomes constant all over the pellicle frame 10G because the pellicle frame 10G directly and reliably contacts the surface of the pellicle film 12 all over the pellicle frame 10G.
Furthermore, because the bottom end 90E of the lower protruding part 90 also has a sharp edge, the lower protruding part 90 contacts the reticle 14 at one point, which is the bottom end 90E, along a cross sectional direction perpendicular to the longitudinal direction of the lower protruding part 90. If the bottom plan view of the connection between the pellicle frame 10G and the reticle 14 is shown, the shape of the connection is shown as a linear shape.
Thus, when the pellicle frame 10G is pushed and adhered to the reticle 14, the adhesive applied on the lower protruding part 90 escapes from the bottom end 90E of the lower protruding part 90. Therefore, the bottom end 90E of the lower protruding part 90 can directly and reliably contact a surface of the reticle 14. Thus, the bottom surface of the pellicle film 12 becomes parallel to the top surface of the reticle 14. In other words, the distance between the bottom surface of the pellicle film 12 and the top surface of the reticle 14 becomes reliably constant all over the region of the pellicle film 12.
FIGS. 11A and 11B show configuration of another embodiment of the pellicle of the present invention. The configuration of the pellicle 10H shown in FIGS. 11A and 11B are the same as the configuration of FIG. 2 except the upper protruding parts 100 and lower protruding parts 102 are formed only on corners of the body part 50. As shown in FIG. 11A, the upper protruding part and lower protruding part can be formed on a part of the body part 50.
EXAMPLE 1 The pellicle frame 10A as shown in FIGS. 2A and 2B was used for manufacturing a pellicle 100A. The pellicle frame 10A was made of aluminum. The pellicle frame 10A had a rectangular plan shape as shown in FIG. 2A. The body part 50 of the pellicle frame 10A is 150 mm by 120 mm in size, 5 mm height, and 6 mm width. The upper protruding part 16 was formed all around the outer edge of the upper end 70 of the body part 50. Also, the lower protruding part 18 was formed all around the outer edge of the lower end 72 of the body part 50. Each of the upper protruding part 16 and lower protruding part 18 has 1 mm height and 3 mm width. The body part 50, the upper protruding part 16, and the lower protruding part 18 are integrally formed.
A difference between the degree of an inclination of the face formed by connecting the top ends of the upper protruding part 16 and the degree of inclination of the face formed by connecting the bottom ends of the lower protruding part 18 was measured. The difference of the degree of the inclination of the two faces was measured to measure how much the two faces were parallel to each other. The difference obtained by the measurement was 5 μm.
The adhesive 24 was applied all around the upper end 70 of the body part 50 of the pellicle frame 10A. An epoxy adhesive of �SUPER BY� manufactured by Cemedine Co., Ltd. was used for the adhesive 26. Also, the adhesive 26 was applied all around the lower end 72 of the body part 50 of the pellicle frame 10A. A silicon adhesive of �X-40-3004� manufactured by Shin-Etsu Chemical Co., Ltd. was used as the adhesive 24. At this time, the adhesive 24 was applied on the upper end 70 of the body part 50 such that the height of the adhesive 24 was slightly higher than the height of the upper protruding part 16. Furthermore, the adhesive 26 was applied on the lower end 72 of the body part 50 such that the height of the adhesive 26 was slightly higher than the height of the lower protruding part 18.
A pellicle film 12 having 1 mm thickness was adhered to the pellicle frame 10A to form a pellicle 100A. The pellicle film 12 was made of quartz glass. At this time, the upper protruding part 16 of the pellicle frame 10A directly contacted a surface of the pellicle film 12.
Then, the pellicle 100A was pressed and adhered to the reticle 14 to form a photomask 200A as shown in FIG. 3. At this time, the lower protruding part 18 of the pellicle 100A directly contacted a surface of the reticle 14.
A difference between the degree of an inclination of the pellicle film 12 and the degree of an inclination of the reticle 14 was measured. The difference between the degree of the inclination of the pellicle film 12 and that of the reticle 14 was measured to measure how much the pellicle film 12 and the reticle 14 were parallel to each other. The difference obtained by the measurement was 5 μm, which was the same difference obtained by measuring the difference between the degree of the inclination of the face formed by connecting the top ends of the upper protruding part 16 and that of the face formed by connecting the bottom ends of the lower protruding part 18.
EXAMPLE 2 The pellicle frame 10B as shown in FIGS. 5A and 5B was used for manufacturing a pellicle 100B. The pellicle frame 10B was made of aluminum. The pellicle frame 10B had a rectangular plan shape as shown in FIG. 5A. The body part 50 of the pellicle frame 10B is 150 mm by 120 mm in size, 5 mm height, and 6 mm width. The upper protruding part 28 was formed all around the inner edge of the upper end 32 of the body part 50. Also, the lower protruding part 30 was formed all around the inner edge of the lower end 34 of the body part 50. Each of the upper protruding part 28 and lower protruding part 30 has 1 mm height and 3 mm width. The body part 50, the upper protruding part 28, and the lower protruding part 30 are integrally formed.
A difference between the degree of an inclination of the face formed by connecting the top ends of the upper protruding part 28 and the degree of inclination of the face formed by connecting the bottom ends of the lower protruding part 30 was measured. The difference of the degree of the inclination of the two faces was measured to measure how much the two faces were parallel to each other. The difference obtained by the measurement was 5 μm.
The adhesive 60 was applied all around the upper end 32 of the body part 50 of the pellicle frame 10B. An epoxy adhesive of �SUPER B� manufactured by Cemedine Co., Ltd. was used for the adhesive 60. Also, the adhesive 62 was applied all around the lower end 34 of the body part 50 of the pellicle frame 10A. A silicon adhesive of �X-40-3004� manufactured by Shin-Etsu Chemical Co., Ltd. was used as the adhesive 62. At this time, the adhesive 60 was applied on the upper end 32 of the body part 50 such that the height of the adhesive 60 was slightly higher than the height of the upper protruding part 28. Furthermore, the adhesive 62 was applied on the lower end 34 of the body part 50 such that the height of the adhesive 62 was slightly higher than the height of the lower protruding part 30.
A pellicle film 12 having 1 mm thickness was adhered to the pellicle frame 10B to form a pellicle 100B. The pellicle film 12 was made of quartz glass. At this time, the upper protruding part 28 of the pellicle frame 10B directly contacted a surface of the pellicle film 12.
Then, the pellicle 100B was pressed and adhered to the reticle 14 to form a photomask 200B as shown in FIG. 5B. At this time, the lower protruding part 30 of the pellicle 100B directly contacted a surface of the reticle 14.
A difference between the degree of an inclination of the pellicle film 12 and the degree of an inclination of the reticle 14 was measured. The difference between the degree of the inclination of the pellicle film 12 and that of the reticle 14 was measured to measure how much the pellicle film 12 and the reticle 14 were parallel to each other. The difference obtained by the measurement was 5 μm, which was the same difference obtained by measuring the difference between the degree of the inclination of the face formed by connecting the top ends of the upper protruding part 28 and that of the face formed by connecting the bottom ends of the lower protruding part 30.
EXAMPLE 3 The pellicle frame 10C as shown in FIGS. 6A and 6B was used for manufacturing a pellicle 100C. The pellicle frame 10C was made of aluminum. The pellicle frame 10C had a rectangular plan shape as shown in FIG. 6A. The body part 50 of the pellicle frame 10C is 150 mm by 120 mm in size, 5 mm height, and 6 mm width. The body part 50, the upper protruding parts 16 and 28, and the lower protruding parts 18 and 30 are integrally formed.
The upper protruding parts 16 and 28 are formed all around both the inner edge and outer edge of the upper end 40 of the body part 50 so that an upper recessed part 40 is formed between the upper protruding parts 16 and 28. Also, the lower protruding parts 18 and 30 are formed all around both the inner edge and outer edge of the lower end 46 of the body part 50 so that a lower recessed part 46 is formed between the lower protruding parts 18 and 30. Each of the upper protruding parts 16 and 28 and lower protruding parts 18 and 30 has 1 mm height and 3 mm width. Furthermore, the height of the upper protruding parts 16 and 28 are the same, and the height of the lower protruding parts 18 and 30 are the same.
A difference between the degree of an inclination of the face formed by connecting the top ends of the upper protruding parts 16 and 28 and the degree of inclination of the face formed by connecting the bottom ends of the lower protruding parts 18 and 30 was measured. The difference of the degree of the inclination of two faces was measured to measure h how much the two faces were parallel to each other. The difference obtained by the measurement was 5 μm.
The adhesive 64 was applied all around the upper recessed part 40 formed by the upper protruding parts 28 and 16 of the pellicle frame 10A. An epoxy adhesive of �SUPERB � manufactured by Cemedine Co., Ltd. was used for the adhesive 64. Also, the adhesive 66 was applied all around the lower recessed part 46 formed by the lower protruding parts 18 and 30 of the pellicle frame 10A. A silicon adhesive of �X-40-3004� manufactured by Shin-Etsu Chemical Co., Ltd. was used as the adhesive 66. At this time, the adhesive 64 is applied on the recessed part 40 such that the height of the adhesive 64 was slightly higher than the height of the upper protruding parts 16 and 28. Furthermore, the adhesive 66 was applied on the lower recessed part 66 such that the height of the adhesive 66 was slightly higher than the height of the lower protruding parts 18 and 30.
A pellicle film 12 having 1 mm thickness was adhered to the pellicle frame 10C to form a pellicle 100C. The pellicle film 12 was made of quartz glass. At this time, the upper protruding parts 16 and 28 of the pellicle frame 10C directly contacted a surface of the pellicle film 12.
Then, the pellicle 100C was pressed and adhered to the reticle 14 to form a photomask 200C as shown in FIG. 6B. At this time, the lower protruding parts 18 and 30 of the pellicle 100C directly contacted a surface of the reticle 14.
A difference between the degree of an inclination of the pellicle film 12 and the degree of an inclination of the reticle 14 was measured. The difference between the degree of the inclination of the pellicle film 12 and that of the reticle 14 was measured to measure how much the pellicle film 12 and the reticle 14 were parallel to each other. The difference obtained by the measurement was 5 μm, which was the same difference obtained by measuring the difference between the degree of the inclination of the face formed by connecting the top ends of the upper protruding parts 16 and 28 and that of the face formed by connecting the bottom ends of the lower protruding parts 18 and 30.
COMPARATIVE EXAMPLE 1 The pellicle frame 10 as shown in FIG. 1 was used for manufacturing a pellicle 100. The pellicle frame 10 was made of aluminum. The pellicle frame 10 had a rectangular plan shape. The pellicle frame 10 is 150 mm by 120 mm in size, 5 mm height, and 6 mm width. The pellicle frame 10 did not have a protruding part.
A difference between the degree of an inclination of the face formed by connecting the upper ends of the pellicle frame 10 and the degree of inclination of the face formed by connecting the lower ends of the pellicle frame 10 was measured. The difference of the degree of the inclination of two faces was measured to measure how much the two faces were parallel to each other. The difference obtained by the measurement was 5 μm.
The adhesive 20 was applied all around the upper end of the pellicle frame 10. An epoxy adhesive of �SUPER B� manufactured by Cemedine Co., Ltd. was used for the adhesive 20. Also, the adhesive 22 was applied all around the lower end of the pellicle frame 10. A silicon adhesive of �X-40-3004� manufactured by Shin-Etsu Chemical Co., Ltd. was used as the adhesive 22.
A pellicle film 12 having 1 mm thickness was adhered to the upper end face of the pellicle frame 10 to form a pellicle 100. The pellicle film 12 was made of quartz glass. At this time, the upper end face of the pellicle frame 10 was adhered to the pellicle film 12 with the adhesive 20. Therefore, the pellicle frame 10 contacted the pellicle film 12 through the adhesive 20 and did not directly contact the pellicle film 12.
Then, the pellicle 100 was pressed and adhered to the reticle 14 to form a photomask 200 as shown in FIG. 1. At this time, the lower end face of the pellicle frame 10 was adhered to the reticle 14 with the adhesive 22. Therefore, the pellicle frame 10 contacted the reticle 14 through the adhesive 22 and did not directly contact the reticle 14.
A difference between the degree of an inclination of the pellicle film 12 and the degree of an inclination of the reticle 14 was measured. The difference between the degree of the inclination of the pellicle film 12 and that of the reticle 14 was measured to measure how much the pellicle film l2 and the reticle 14 were parallel to each other. The difference obtained by the measurement was 40 μm, which was much larger than the difference obtained by measuring the difference between the degree of the inclination of the face formed by connecting the upper ends of the pellicle frame 10 and that of the face formed by connecting the lower ends of the pellicle frame 10.
As described above, by the pellicle 10 shown in FIG. 1 and explained in the COMPARATIVE EXAMPLE, it is difficult to make the surface of the pellicle film 12 and the surface of the reticle 14 be accurately parallel to each other even if the face formed by the top ends of the upper protruding part and the face formed by the bottom ends of the lower protruding part are accurately parallel to each other because the thickness of the adhesive 20 and 22 is not uniform around the pellicle frame 10.
Contrary, the pellicle of the present embodiment can make the surface of the pellicle film 12 and the surface of the reticle 14 be accurately parallel to each other if the face formed by the top ends of the upper protruding part and the face formed by the bottom ends of the lower protruding part are accurately parallel to each other. Therefore, a photomask having high quality can be easily obtained by the present embodiment.
Patent CitationsCited PatentFiling datePublication dateApplicantTitleUS4861402Aug 31, 1988Aug 29, 1989Du Pont Tau Laboratories, Inc.Method of making a cellulose acetate butyrate pellicleUS6083577 *Jul 8, 1997Jul 4, 2000Mitsui Chemicals, Inc.Mask protective deviceJP2000122266A * Title not availableJP2000194121A * Title not availableJPH1020480A * Title not availableJPH07168345A Title not availableJPH09206723A * Title not availableJPH09319069A * Title not availableJPS6327707A Title not availableJPS58219023A Title not available* Cited by examinerReferenced byCiting PatentFiling datePublication dateApplicantTitleUS7339653Feb 6, 2007Mar 4, 2008Asml Holding N.V.System for a pellicle frame with heightened bonding surfacesClassifications U.S. Classification430/5, 430/311, 428/14International ClassificationG03F1/62, G03F1/64, G03F1/14, H01L21/027Cooperative ClassificationG03F1/64, G03F7/70808European ClassificationG03F1/64, G03F7/70P2Legal EventsDateCodeEventDescriptionMar 11, 2013FPAYFee paymentYear of fee payment: 8May 20, 2009FPAYFee paymentYear of fee payment: 4Mar 14, 2002ASAssignmentOwner name: SHIN-ETSU CHEMICAL CO., LTD., JAPANFree format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SHIRASAKI, TORU;REEL/FRAME:012696/0654Effective date: 20020222RotateOriginal ImageGoogle Home - Sitemap - USPTO Bulk Downloads - Privacy Policy - Terms of Service - About Google Patents - Send FeedbackData provided by IFI CLAIMS Patent Services©2012 Google

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9782915495584: La Foi qui Guerit (French Edition) - AbeBooks - Jean Martin Charcot: 2915495580
Jean Martin Charcot La Foi qui Guerit (French Edition)
ISBN 13: 9782915495584
La Foi qui Guerit (French Edition)
ISBN 10: 2915495580 ISBN 13: 9782915495584
Publisher: Buenos Books international, 2014
1. LA FOI QUI GUERIT (French Edition)
Published by BUENOS BOOKS INTERNATIONAL (2008)
Book Description BUENOS BOOKS INTERNATIONAL, 2008. Paperback. Condition: Brand New. large type edition edition. 72 pages. French language. 7.75x5.00x0.25 inches. In Stock. Seller Inventory # zk2915495580
2. La Foi qui Guerit (French Edition)
Published by Buenos Books international (2014)
Book Description Buenos Books international, 2014. Condition: New. book. Seller Inventory # M2915495580
3. LA FOI QUI GUERIT (French Edition)
Book Description BUENOS BOOKS INTERNATIONAL, 2008. Paperback. Condition: New. Large type edition. Seller Inventory # DADAX2915495580
4. La Foi qui Guerit (French Edition)
Book Description Buenos Books international, 2014. Paperback. Condition: New. Never used!. Seller Inventory # P112915495580

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text:
Patent US6705126 - Method for fabricating holey optical fiber - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More »Sign in<nobr>Advanced Patent Search</nobr>PatentsThere is provided an apparatus and method for fabricating a holey optical fiber. An optical fiber with air holes of a predetermined size and shape along the length of the optical fiber is drawn by supplying nitrogen gas into air holes through one end of a holey optical fiber preform while heating the...http://www.google.com/patents/US6705126?utm_source=gb-gplus-sharePatent US6705126 - Method for fabricating holey optical fiberAdvanced Patent SearchPublication numberUS6705126 B2Publication typeGrantApplication numberUS 09/798,706Publication dateMar 16, 2004Filing dateMar 2, 2001Priority dateApr 18, 2000Fee statusPaidAlso published asUS7320232, US20010029756, US20040011082Publication number09798706, 798706, US 6705126 B2, US 6705126B2, US-B2-6705126, US6705126 B2, US6705126B2InventorsUn-Chul Paek, Duk-Young Kim, Young-Min PaikOriginal AssigneeSamsung Electronics Co, Ltd.Export CitationBiBTeX, EndNote, RefManPatent Citations (12), Referenced by (10), Classifications (28), Legal Events (3) External Links: USPTO, USPTO Assignment, EspacenetMethod for fabricating holey optical fiberUS 6705126 B2Abstract There is provided an apparatus and method for fabricating a holey optical fiber. An optical fiber with air holes of a predetermined size and shape along the length of the optical fiber is drawn by supplying nitrogen gas into air holes through one end of a holey optical fiber preform while heating the other end of the preform.
Patent CitationsCited PatentFiling datePublication dateApplicantTitleUS5802236 *Feb 14, 1997Sep 1, 1998Lucent Technologies Inc.Article comprising a micro-structured optical fiber, and method of making such fiberUS5907652 *Mar 13, 1998May 25, 1999Lucent Technologies Inc.Article comprising an air-clad optical fiberUS5922099 *Mar 10, 1998Jul 13, 1999Samsung Electronics Co., Ltd.Tube shaped glassUS6299822 *Feb 12, 1999Oct 9, 2001Samsung Electronics Co., Ltd.Method of fabricating silica glass by sol-gel processUS6418258 *Jun 9, 2000Jul 9, 2002Gazillion Bits, Inc.Microstructured optical fiber with improved transmission efficiency and durabilityUS6467312 *Jul 11, 2000Oct 22, 2002Fitel Usa Corp.Sol gel method of making an optical fiber with multiple apeturesUS6470127 *Jan 31, 2001Oct 22, 2002Intelligent Optical Systems, Inc.Photonic band-gap light-emitting fibersUS6608952 *Aug 15, 2001Aug 19, 2003Fitel Usa Corp.Fiber apparatus and method for manipulating optical signalsUS20020061176 *Jul 20, 2001May 23, 2002Libori Stig Eigil BarkouDispersion manipulating fibreUS20030012535 *Jun 12, 2002Jan 16, 2003Graham TownHoley wave guide manufactureUS20030161599 *Aug 13, 2001Aug 28, 2003Broderick Neil Gregory RaphaelHoley optical fibres of non-silica based glassUS20030165313 *Aug 30, 2002Sep 4, 2003Jes BroengOptical fibre with high numerical aperture, method of its production, and use thereof* Cited by examinerReferenced byCiting PatentFiling datePublication dateApplicantTitleUS6895155 *Aug 20, 2003May 17, 2005AlcatelMethod of fabricating an optical fiber with microstructuresUS7013678 *Sep 19, 2002Mar 21, 2006Fitel Usa CorpMethod of fabricating graded-index optical fiber lensesUS7080529 *Jun 9, 2003Jul 25, 2006Weatherford/Lamb, Inc.Method for making large diameter optical waveguide having Bragg grating and being configured for reducing the bulk modulus of compressibility thereofUS7295740Jan 16, 2007Nov 13, 2007The United States Of America As Represented By The Secretary Of The NavyHigh air fraction photonic band gap fibersUS7444838Jun 9, 2004Nov 4, 2008Virginia Tech Intellectual Properties, Inc.Holey optical fiber with random pattern of holes and method for making sameUS7567742 *Oct 30, 2007Jul 28, 2009Virginia Tech Intellectual Properties, Inc.Holey optical fiber with random pattern of holes and method for making sameUS7769263 *Feb 2, 2009Aug 3, 2010Corning IncorporatedOptical fiber and a method for making suchUS7873251 *Apr 23, 2010Jan 18, 2011Bayya Shyam Scomprising germanium oxide, a longitudinal central opening in the fiber, a microstructured region in the fiber comprising a plurality of longitudinal openings disposed around the central opening, a jacket surrounding the microstructured regionUS8769995Jul 25, 2006Jul 8, 2014Weatherford/Lamb, Inc.Method for making large diameter multicore optical waveguideDE102004059868B3 *Dec 8, 2004May 18, 2006Institut f�r Physikalische Hochtechnologie e.V.Process and assembly to make homogenous micro-optic fiber by application of compressed gas and vacuum removal within tube mantle* Cited by examinerClassifications U.S. Classification65/395, 65/393International ClassificationC03B37/15, C03B37/016, C03B37/027, C03B37/012, G02B6/032, C03B37/075, G02B6/00, G02B6/02, C03B37/022Cooperative ClassificationC03B37/0756, C03B37/016, C03B2201/31, C03B2203/42, C03B2203/14, G02B6/02333, C03B2201/34, C03B2205/10, G02B6/02347, C03B37/027, C03B37/01205European ClassificationC03B37/012B, C03B37/027, C03B37/075C, G02B6/02P6K2, C03B37/016, G02B6/02P6C4Legal EventsDateCodeEventDescriptionAug 18, 2011FPAYFee paymentYear of fee payment: 8Aug 24, 2007FPAYFee paymentYear of fee payment: 4Mar 2, 2001ASAssignmentOwner name: SAMSUNG ELECTRONIC CO., LTD., KOREA, REPUBLIC OFFree format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:PAEK, UN-CHUL;KIM, DUK-YOUNG;PAIK, YOUNG-MIN;REEL/FRAME:011591/0931Effective date: 20010224Owner name: SAMSUNG ELECTRONIC CO., LTD. 416, MAETAN-DONG, PALFree format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:PAEK, UN-CHUL /AR;REEL/FRAME:011591/0931RotateOriginal ImageGoogle Home - Sitemap - USPTO Bulk Downloads - Privacy Policy - Terms of Service - About Google Patents - Send FeedbackData provided by IFI CLAIMS Patent Services©2012 Google


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Beach Music by Pat Conroy | 9780307804730 | NOOK Book (eBook) | Barnes & Noble
Pat Conroy is without doubt America's favorite storyteller, a writer who portrays the anguished truth of the human heart and the painful secrets offamilies in richly lyrical prose and unforgettable narratives. Now, in Beach Music, he tells of the dark memories that haunt generations, in a storythat spans South Carolina and Rome and reaches back into the…
Beach Music: A Novel available in
In 1980, a year after my wife leapt to her death from the Silas Pearlman Bridge in Charleston, South Carolina, I moved to Italy to begin life anew, taking our small daughter with me. Our sweet Leah was not quite two when my wife, Shyla, stopped her car on the highest point of the bridge and looked over, for the last time, the city she loved so well. She had put on the emergency brake and opened the door of our car, then lifted herself up to the rail of the bridge with the delicacy and enigmatic grace that was always Shyla's catlike gift. She was also quick-witted and funny, but she carried within her a dark side that she hid with bright allusions and an irony as finely wrought as lace. She had so mastered the strategies of camouflage that her own history had seemed a series of well-placed mirrors that kept her hidden from herself. It was nearly sunset and a tape of the Drifters' Greatest Hits poured out of the car's stereo. She had recently had our car serviced and the gasoline tank was full. She had paid all the bills and set up an appointment with Dr. Joseph for my teeth to be cleaned. Even in her final moments, her instincts tended toward the orderly and the functional. She had always prided herself in keeping her madness invisible and at bay; and when she could no longer fend off the voices that grew inside her, their evil set to chaos in a minor key, her breakdown enfolded upon her, like a tarpaulin pulled across that part of her brain where once there had been light. Having served her time in mental hospitals, exhausted the wide range of pharmaceuticals, and submitted herself to the priestly rites of therapists of every theoretic persuasion, she was defenseless when the black music of her subconscious sounded its elegy for her time on earth. On the rail, all eyewitnesses agreed, Shyla hesitated and looked out toward the sea and shipping lanes that cut past Fort Sumter, trying to compose herself for the last action of her life. Her beauty had always been a disquieting thing about her and as the wind from the sea caught her black hair, lifting it like streamers behind her, no one could understand why anyone so lovely would want to take her own life. But Shyla was tired of feeling ill-made and transitory and she wanted to set the flags of all her tomorrows at half-mast. Three days earlier, she had disappeared from our house in Ansonborough and only later did I discover that she had checked in to the Mills-Hyatt House to put her affairs in order. After making appointments, writing schedules, letters, and notes that would allow our household to continue in its predictable harmony, she marked the mirror in her hotel room with an annulling X in bright red lipstick, paid her bill with cash, flirted with the doorman, and gave a large tip to the boy who brought her the car. The staff at the hotel remarked on her cheerfulness and composure during her stay. As Shyla steadied herself on the rail of the bridge a man approached her from behind, a man coming up from Florida, besotted with citrus and Disney World, and said in a low voice so as not to frighten the comely stranger on the bridge, "Are you okay, honey?" She pirouetted slowly and faced him. Then with tears streaming down her face, she stepped back, and with that step, changed the lives of her family forever. Her death surprised no one who loved her, yet none of us got over it completely. Shyla was that rarest of suicides: no one held her responsible for the act itself; she was forgiven as instantly as she was missed and afterward she was deeply mourned. For three days I joined the grim-faced crew of volunteers who searched for Shyla's remains. Ceaselessly, we dragged the length and breadth of the harbor, enacting a grotesque form of braille as hoods felt their way along the mudflats and the pilings of the old bridge that connected Mount Pleasant and Sullivan's Island. Two boys were crabbing when they noticed her body moving toward them beside the marsh grass. After her funeral, a sadness took over me that seemed permanent, and I lost myself in the details and technicalities connected to death in the South. Great sorrow still needs to be fed and I dealt with my disconsolate emptiness by feeding everyone who gathered around me to offer their support. I felt as though I were providing sustenance for the entire army in the field who had come together to ease the malignant ache I felt every time Shyla's name was mentioned. The word Shyla itself became a land mine. That sweet-sounding word was merciless and I could not bear to hear it. So I lost myself in the oils and condiments of my well-stocked kitchen. I fatted up my friends and family, attempted complicated recipes I had always put off making, and even tried my hand at Asian cuisine for the first time. With six gas burners ablaze, I turned out velvety soups and rib-sticking stews. I alternated between cooking and weeping and I prayed for the repose of the soul of my sad, hurt wife. I suffered, I grieved, I broke down, and I cooked fabulous meals for those who came to comfort me. It was only a short time after we buried Shyla that her parents sued me for custody of my child, Leah, and their lawsuit brought me running back into the real world. I spent a dispiriting year in court trying to prove my fitness as a father. It was a time when I met a series of reptilian lawyers so unscrupulous that I would not have used their marrow to feed wild dogs or their wiry flesh to bait a crab pot. Shyla's mother and father had gone crazy with grief and I learned much about the power of scapegoating by watching their quiet hatred of me as they grimaced though the testimony regarding my sanity, my finances, my reputation in the community, and my sexual life with their eldest child. Though I have a whole range of faults that piqued the curiosity of the court, few who have ever seen me with my daughter have any doubts about my feelings for her. I get weak at the knees at the very sight of her. She is my certification, my boarding pass into the family of man, and whatever faith in the future I still retain. But it was not my overriding love of Leah that won the day in court. Before she took her final drive, Shyla had mailed me a letter that was part love letter and part apology for what she had done. When my lawyer had me read that letter aloud to the court, it became clear to Shyla's parents and everyone present that laying her death at my feet was, at best, a miscarriage of justice. Her letter was an act of extraordinary generosity written in the blackest hours of her life. She blew it like a kiss toward me as a final gesture of a rare, exquisite sensibility. Her letter saved Leah for me. But the ferocity of that court battle left me exhausted, bitter, and raw around the edges. It felt as though Shyla had died twice. I answered my wife's leap from the bridge and the fierceness of that legal battle with a time of disorientation and sadness; and then with Italy. Toward Europe, I looked for respite and hermitage, and the imminence of my secret flight from South Carolina again restored a fight spirit within me. I had made a good living as a food and travel writer and running away had always been one of the things I did best. The flight to Europe was my attempt to place the memory of both Shyla and South Carolina permanently in the past. I hoped I would save my life and Leah's from the suffocation I was beginning to feel in the place where Shyla and I had come of age together. For me, the South was carry-on baggage I could not shed no matter how many borders I crossed, but my daughter was still a child and I wanted her to grow into young womanhood as a European, blissfully unaware of that soft ruinous South that had killed her mother in one of its prettiest rivers. My many duties as a father I took with great seriousness, but there was no law that I was aware of that insisted I raise Leah as a Southerner. Certainly, the South had been a mixed blessing for me and I carried some grievous wounds into exile with me. All the way across the Atlantic Leah slept in my lap and when she awoke, I began her transformation by teaching her to count in Italian. And so in Rome we settled and began the long process of refusing to be Southern, even though my mother started a letter-writing campaign to coax me back home. Her letters arrived every Friday: "A Southerner in Rome? A low country boy in Italy? Ridiculous. You've always been restless, Jack, never knew how to be comfortable with your own kind. But mark my words. You'll be back soon. The South's got a lot wrong with it. But it's permanent press and it doesn't wash out." Though my mother was onto something real, I stuck by my guns. I would tell American tourists who questioned me about my accent that I no longer checked the scores of the Atlanta Braves in the Herald Tribune and they could not get me to reread Faulkner or Miss Eudora at gun-point. I did not realize or care that I was attempting to expunge all that was most authentic about me. I was serious about needing some time to heal and giving my soul a much needed rest. My quest was amnesia; my vehicle was Rome. For five years, my plan worked very well. But no one walks out of his family without reprisals: a family is too disciplined an army to offer compassion to its deserters. No matter how much they sympathized with all my motives, those who loved me most read a clear text of treason in my action. They thought that by forcing me away from South Carolina, Shyla's leap had succeeded in taking Leah and me over the rail with her. I understood completely, but I was so burnt out I did not care. I threw myself at the Italian language with gusto and became fluent in the street talk of the shopkeepers and the vendors of our neighborhood. In the first year of our exile, working all the angles of my trade, I completed my third cookbook, a compilation of recipes I had gathered over a ten-year career of dining out in some of the best restaurants in the South. I also wrote a travel book on Rome that became popular with American tourists as soon as it hit the giornalai. I urged every American who read it to understand Rome was both sublime and imperishably beautiful, a city that melted into leaf-blown silences and gave a splendid return to any tourist adventurous enough to stray from the main trade routes of tourism. All the pangs and difficulties of my own homesickness went into the writing of that book. The artfully hidden subtext in those first years was that foreign travel was worth every discomfort and foul-up, but took a radical toll on the spirit. Though I could write about the imperishable charms of Rome forever, I could not quiet that pearly ache in my heart that I diagnosed as the cry of home. I kept that cry to myself, in fact, did not even admit that it was something I heard or felt. I concentrated on the task of raising Leah in a culture alien to me and I hired a maid named Maria Parise from the Umbrian countryside and watched with pleasure as she took over the task of mothering Leah. Maria was a simple, strong-willed woman, God-fearing and superstitious, as only a peasant can be, who brought an undiminishable joy to the raising of this small motherless American. In a short amount of time Leah became part of the native fauna around the Palazzo Farnese, a beloved romanina adopted by the people who loved and plied their trades around the piazza, and she rapidly turned into the first real linguist produced by my family. Her Italian was flawless as she navigated the teeming stalls along the Campo dei Fiori with its wild rivers of fruit and cheese and olives. Very early on, I taught Leah how to tell where we were in the Campo by using her sense of smell. The south side was glazed with the smell of slain fish and no amount of water or broomwork could ever eliminate the tincture of ammonia scenting that part of the piazza. The fish had written their names in those stones. But so had the young lambs and the coffee beans and the torn arugula and the glistening tiers of citrus and the bread baking that produced a golden brown perfume from the great ovens. I whispered to Leah that a sense of smell was better than a yearbook for imprinting the delicate graffiti of time in the memory. I knew that Leah had developed a bloodhound's nose when in the middle of the second year she stopped me as we passed by the Ruggeri brothers' alimentari and said, "The truffles have arrived, Daddy, they're here," as I caught the signature odor of pure earth. As a reward, I bought Leah a fraction of that truffle, priced as dearly as uranium, and sliced it into her scrambled eggs the next morning. The raising of Leah consumed a large portion of my days and made me place my own sorrow over the loss of Shyla in a seldom visited back lot of my life, allowing me no time to devote to my own complex feelings over her death. Leah's happiness superseded everything in my life and I was determined I would not pass our family's infinite capacity for suffering on to her. I knew that Leah, as Shyla's child and my own, would get more than her portion of the genes of grief. Together, our families contained enough sad stories to jump-start a colony of lemmings toward the nearest body of water. I had no idea if the seeds of our madness burned in secret deposits in my beautiful child's bloodstream or not. But I vowed to protect her from those stories, from both sides of her family, that could set in motion the forces that had brought me spiritually bloody and beaten to the Fiumicino airport in the first place. I confess that I became the censor of my daughter's history. The South that I described to Leah at bedtime every night existed only in my imagination. I admitted no signs of danger or nightmare. There was no dark side to the Southern moon that I recalled to my daughter, and the rivers ran clean and the camellias were always in bloom. It was a South that existed without sting or thorns or heartache. Because I have inherited my family's gift for storytelling, my well-told lies became Leah's memories. Without realizing it, I made the mistake of turning South Carolina into a lost and secret paradise to my daughter. By carefully editing what I thought would harm her, I turned my childhood into something as glamorous as forbidden fruit. Though Rome would mark her with its most exacting emblems, I did not note the exact moment I touched my child with a lust to see the fierce, rarefied beauty of her birthplace. Even as Leah became part of the secrets that Rome whispered, she was not a native of the city, not indigenous like the flowery lichens that grew along the wall that held back the Tiber.From the Paperback edition.

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text:
Black Visual Culture: Modernity and Postmodernity by Gen Doy, Paperback | Barnes & Noble®
by Gen DoyGen Doy
Black Visual Culture presents a critical introduction to the work of contemporary black American and British artists, including Chris Ofili, Isaac Julien, Keith Piper, Rasheed Areen, Robert Mapplethorpe, Roshini Kempadoo, and Anish Kapoor. The central aim of the book is to show how black artists have been and continue to be influenced by the politics,
9781860643828
Doy (history and theory of visual culture, De Montfort University, UK) introduces the theory and practice of Black visual culture and explores through an examination of the work of Black and Asian artists the dynamics of this work's relationship with postmodern critical theorists and theories. She helps students and general readers understand intellectual and cultural forces that have influenced the position of Black British artists in the modern world. The volume includes b&w photos of art. Distributed by St. Martin's Press. Annotation c. Book News, Inc., Portland, OR (booknews.com)
5.66(w) x 10.16(h) x 0.77(d)
Gen Doy is Reader in Art History at de Montfort University and the author of Materializing Art History (1998).


text:
3 bedroom semi-detached house to rent in Overfield Road, Luton, LU2
www.rightmove.co.uk/property/52456446
Call: 01582 934042
To view this media, please visit the on-line version of this page at www.rightmove.co.uk/property-to-rent/property-52456446.html
Property reference 8463003. The information displayed about this property comprises a property advertisement. Rightmove.co.uk makes no warranty as to the accuracy or completeness of the advertisement or any linked or associated information, and Rightmove has no control over the content. This property advertisement does not constitute property particulars. The information is provided and maintained by Urban & Rural Property Services, Stopsley.
or call: 01582 934042

value: This website is a UK-based company that runs rightmove.co.uk, the UK's largest online real estate portal and property website. It is listed on the London Stock Exchange and is a constituent of the FTSE 100 Index.


text:
changing autoconf version on a linux server - Stack Overflow
I need to run a program on a linux machine, and the only one I have access to is my university's server with (for some reason) outdated versions of autoconf and automake. My program needs more recent versions. I have the most recent versions of each on the server in my home directory, but can't install them in /usr/local/bin since I'm not a root user. So I guess I have two questions:
How to get autoconf/automake to install somewhere in my home directory? Is this possible?
How to get a program to access these newer versions, instead of automatically calling the outdated ones?
linux autoconf automake share|improve this question asked Jul 20 '12 at 17:14
2 common solutions which have been mentioned are stow and just installing with --prefix=$HOME (some people like --prefix=$HOME/usr, if you use NFS mounted home directories --prefix=$HOME/$(uname -m) is handy.) Another good choice is to use pkgsrc and add/update your packages as needed.
My preferred method for this is to use GNU Stow to manage packages in my home directory. You can use $HOME or $HOME/usr or whatever else. I think $HOME/usr is probably best, as it stops stow from having to walk all over your homedir.
So first you configure and install stow. Download and unpack it, then run something like:
$ ./configure --prefix=$HOME/usr && make && make install prefix=$HOME/usr/stow/stow-2.2.0
Then you make stow stow itself:
$ cd ~/usr/stow
$ stow-2.2.0/bin/stow stow-2.2.0
Now you add $HOME/usr/bin to $PATH. Then you install autoconf. Unpack and cd into it, then run:
$ ./configure --prefix=$HOME/usr && make && make install prefix=$HOME/usr/stow/autoconf-2.69
$ stow autoconf-2.69
Why do I do this? it lets me easily remove a package from my home directory without causing massive headaches: cd ~/usr/stow && stow -D autoconf-2.69, for instance. I manage /usr/local in a similar fashion, but there I can get stow from apt, so there's no bootstrapping trouble.
I don't remember for sure, but most likely both are autotools-based, so you can configure then using ./configure --prefix=${HOME}/autoprefix and install.
Except that I suggest to use the same prefix for all the GNU software you'll need to install, so ./configure --prefix=$HOME/usr then add $HOME/usr/bin in front of your $PATH
@BasileStarynkevitch, yeah, I normally use $HOME/prefix if I have to. Was just illustrating the technique.
Not the answer you're looking for?	Browse other questions tagged linux autoconf automake or ask your own question.	asked

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9787511027085: Confucius (Chinese Edition) - AbeBooks - Cai Zhizhong: 7511027083
Cai Zhizhong Confucius (Chinese Edition)
ISBN 13: 9787511027085
Confucius (Chinese Edition)
ISBN 10: 7511027083 ISBN 13: 9787511027085
Publisher: Dolphin Books, 2016
This book vividly introduces the life of Confucius with ups and downs, presenting this great philosopher's emotions, giving kids a chance to learn about the famous philoslpher.Written with humor and a distinct style, this book describes the classic principles in the Analects of Confucius in stories of texts and pictures. Child readers can go on a journey through time and space listening to the teaching of Confucius. Meanwhile,with distinct characters, it introduces the disciples of Confucius in order to set an example to follow for todays children. In addition, the pinyin annotation helps children with independent reading.
1. Tsai Guoxue series: Confucius(Chinese Edition)
Book Description paperback. Book Condition: New. Paperback. Pub Date: 2016-01-01 Pages: 252 Language: Chinese Publisher: Dolphin Press Tsai Guoxue series. comic artist Tsai is specially designed for primary set Guoxue books. his brush strokes with warm. simple and smooth lines. plain relaxed conversation. lively story about Confucius ups and downs of life. three-dimensional demonstration of Confucius emotions. let the children happy close. Book with both humor and personalized brushwork. and the story in the form of Venturi control describe. Bookseller Inventory # CW004476


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text:
Freshman literacy course 2013-14 ...
Freshman English-2
THE USAGE OF THE COMMA 2.
RULE 1

Use commas to separate independent clauses when they are joined by any of these seven coordinating conjunctions.

Example:

The game was over, but the crowd refused to leave.

RULE 2

Use commas after introductory clauses, phrases, or words that come before the main clause.

Example:

While I was eating, the cat scratched at the door.

RULE 3

Use a pair of commas in the middle of a sentence to set off clauses, phrases, and words that are not essential to the meaning of the sentence. Use one comma before to indicate the beginning of the pause and one at the end to indicate the end of the pause .

Example:

The restaurant had an exciting atmosphere. The food, on the other hand, is rather bland.

RULE 4

Do not use commas to set off essential elements of the sentence, such as clauses beginning with that (relative clauses). That clauses after nouns are always essential. That clauses following a verb expressing mental action are always essential.

Example:

The baby wearing the yellow jumpsuit is my niece. (essential)

My niece, wearing the yellow jumpsuit, is playing in the living room.

(non-essential)

RULE 5

Use commas to separate three or more words, phrases, or clauses written in a series.

Example:

The constitution establishes the legislative, executive, and judicial branches of government.

RULE 6

Use commas to separate two or more coordinate adjectives that describe the same noun. Be sure never to add an extra comma between the final adjective and the noun itself or to use commas with non-coordinate adjectives.

Example:

He was a difficult, stubborn child. (coordinate)

They lived in a white frame house. (non- coordinate)

RULE 7

Use a comma near the end of a sentence to separate contrasted coordinate elements or to indicate a distinct pause or shift.

Example:

He was merely ignorant, not stupid.

RULE 8

Use commas to set off phrases at the end of the sentence that refer back to the beginning or middle of the sentence. Such phrases are free modifiers that can be placed anywhere in the sentence without causing confusion.

Example:

Nancy waved enthusiastically at the docking ship, laughing joyously.

RULE 9

Use commas to set off all geographical names, items in dates (except the month and day), addresses (except the street number and name), and titles in names.

Example:

Birmingham, Alabama, gets its name from Birmingham, England

RULE 10

Use a comma to shift between the main discourse and a quotation.

Example:

John said without emotion, “I’ll see you tomorrow.”

QUIZ INDICATE WHETHER THE STATEMENTS ARE CORRECT, IF NOT FIX THEM.

The student explained her question yet the instructor still didn't seem to understand.

When the snow stops falling, we'll shovel the driveway.

That Tuesday, which happens to be my birthday, is the only day when I am available to meet.

Tom the captain of the team was injured in the game.

The candidate promised to lower taxes protect the environment reduce crime and end unemployment.

SOURCE

http://owl.english.purdue.edu/owl/resource/607/02/

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