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Dawson is not a giant keeper but he continues to be No 1 for Wednesday | Daily Mail Online
Cameron Dawson is not a giant goalkeeper that fills the goal but he remains No 1 for Sheffield Wednesday - a club with a great tradition
Cameron Dawson is a young goalkeeper developing at Sheffield Wednesday
The 23-year-old, who is a nice size and kicks well, has played 19 times this season
Here Sportsmail's Secret Scout runs the rule over Wednesday's promising No 1
Published: 17:30 EST, 29 November 2018 | Updated: 18:09 EST, 29 November 2018
Our scout is a top football expert who attends matches each week searching for the next star. He'll bring you his verdict for Sportsmail.
This week he has been keeping a close eye on Sheffield Wednesday's Cameron Dawson.
This week our scout has been keeping a close eye on Sheffield Wednesday's Cameron Dawson
Chelsea 4-0 PAOK, RESULT: Relive all the Europa League... 'Nothing is impossible in the transfer market... he loved... 'An international footballer who has been one of the best... 'It is a bit selfish': Karen Carney slams Eddie Nketiah's...
2018-19 APPS: 19
Watching Cameron Dawson in the Sheffield Wednesday goal I sensed a nervousness among the supporters and even a sense of relieved irony when he caught the first two crosses of the night.
This led me to believe that in recent games he had not been at his best. Goalkeepers improve with game time but gaining that vital experience as a young man is difficult.
The manager has to have complete confidence to give a youngster the responsibility of being the last line of defence in a senior team. Dawson is the recipient of that faith at Sheffield Wednesday. He is a nice size and kicks well.
He has an ability to kick with his right when coming under pressure, but it is his mobility that really caught my eye. He showed agility and dexterity to push away a fierce shot to his right and followed this up by palming away another close-range effort to his left.
Dawson keeps a sensible distance behind his back four so he can be in position to race out
He keeps a sensible distance behind his back four so he can be in position to race out and intercept any ball that is played beyond his defenders. He is alert and wasn’t afraid to shout instructions to his defenders.
His confidence was high after an opening period where he saved a goalbound shot with good spring and fielded a piledriver with confidence — moving his feet well to get in a good position. He was under pressure for most of the game and he emerged with flying colours.
From free-kicks and corners he was well protected by his defenders. Because of this he seemed reluctant to come out and claim the ball on a couple of occasions.
He does not appear to be the giant type of goalkeeper that fills the goal with a big presence, but he continues to be No 1 for a club with a great tradition. And while he continues as first choice he will improve and enhance his prospects.
Two seasons ago, I watched him on loan and he has definitely served his apprenticeship.

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Listen to Audiobooks by E.A. West | Audible.com
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Narrated By Cornel West, JD Jackson
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To Capture Mr. Darcy : A Pride and Prejudice Variation Novel

type: global

value: This website is an American online audiobook and podcast service that allows users to purchase and stream audiobooks and other forms of spoken word content. This content can be purchased individually or under a subscription model where the user receives "credits" that can be redeemed for content monthly and receive access to a curated on-demand library of content.


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Patent US5443491 - Three-pole electrocatheter - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More »Sign inAdvanced Patent SearchPatentsAn implantable improved three-pole electrocatheter for permanent cardiac stimulation. The electrocatheter is of the type which comprises a flexible body which extends predominantly axially, is made of biocompatible material and can be surgically inserted through a vein until it reaches the cardiac muscle...http://www.google.com/patents/US5443491?utm_source=gb-gplus-sharePatent US5443491 - Three-pole electrocatheterAdvanced Patent SearchPublication numberUS5443491 APublication typeGrantApplication numberUS 08/302,966Publication dateAug 22, 1995Filing dateSep 12, 1994Priority dateDec 16, 1991Fee statusPaidAlso published asEP0547256A1Publication number08302966, 302966, US 5443491 A, US 5443491A, US-A-5443491, US5443491 A, US5443491AInventorsEugenio SnichelottoOriginal AssigneeM.E.D.I.C.O. Italia S.R.L.Export CitationBiBTeX, EndNote, RefManPatent Citations (4), Referenced by (11), Classifications (4), Legal Events (6) External Links: USPTO, USPTO Assignment, EspacenetThree-pole electrocatheter
Patent CitationsCited PatentFiling datePublication dateApplicantTitleUS4355646 *Nov 26, 1980Oct 26, 1982Medtronic, Inc.Transvenous defibrillating leadUS4784161 *Nov 24, 1986Nov 15, 1988Telectronics, N.V.Porous pacemaker electrode tip using a porous substrateUS4860446 *Feb 16, 1988Aug 29, 1989Medtronic, Inc.Medical electrical lead and method of manufactureUS5007435 *Apr 23, 1990Apr 16, 1991Medtronic, Inc.Connector for multiconductor pacing leads* Cited by examinerReferenced byCiting PatentFiling datePublication dateApplicantTitleUS5948014 *Jan 23, 1998Sep 7, 1999Pacesetter, Inc.Implantable stimulation system having a single-pass, tripolar lead and programmable polarityUS5987354 *Oct 14, 1997Nov 16, 1999Uab Research FoundationDual shock atrial defibrillation apparatusUS6006131 *Aug 13, 1996Dec 21, 1999Uab Research FoundationDual current pathway atrial defibrillation apparatusUS6327500Nov 15, 1999Dec 4, 2001Uab Research FoundationDual shock atrial defibrillation apparatusUS6484057Dec 21, 2000Nov 19, 2002Uab Research FoundationPacing methods and devices for treating cardiac arrhythmias and fibrillationUS7139608Jul 31, 2002Nov 21, 2006Uab Research FoundationPacing methods and devices using feedback controlled timingUS7162298Sep 10, 2002Jan 9, 2007Uab Research FoundationDevices for detecting the presence of cardiac activity following administration of defibrillation therapyUS7522958Mar 13, 2003Apr 21, 2009Uab Research FoundationMethods and systems for reducing discomfort from cardiac defibrillation shocksUS7734344Dec 2, 2003Jun 8, 2010Uab Research FoundationMethods, systems and computer program products to inhibit ventricular fibrillation during cardiopulmonary resuscitationUS8560063Sep 10, 2002Oct 15, 2013Uab Research FoundationPost-defibrillation pacing methods and devicesUS8843195Apr 23, 2010Sep 23, 2014Uab Research FoundationMethods, systems and computer program products to inhibit ventricular fibrillation during cardiopulmonary resuscitation* Cited by examinerClassifications U.S. Classification607/122International ClassificationA61N1/05Cooperative ClassificationA61N1/056European ClassificationA61N1/05NLegal EventsDateCodeEventDescriptionMar 16, 1999REMIMaintenance fee reminder mailedMar 17, 1999SULPSurcharge for late paymentMar 17, 1999FPAYFee paymentYear of fee payment: 4Mar 27, 2003FPAYFee paymentYear of fee payment: 8Mar 27, 2003SULPSurcharge for late paymentYear of fee payment: 7Feb 13, 2007FPAYFee paymentYear of fee payment: 12RotateOriginal ImageGoogle Home - Sitemap - USPTO Bulk Downloads - Privacy Policy - Terms of Service - About Google Patents - Send FeedbackData provided by IFI CLAIMS Patent Services

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Villa Del Fiore, Stintino, Italy - Booking.com
Villa Del Fiore (Villa), Stintino (Italy) Deals
Villa Villa Del Fiore
Punta De su Torrione comparto 4 numero 8, 07040 Stintino, Italy – Show map
Featuring a seasonal outdoor pool, Villa Del Fiore is a detached villa located in Stintino in the region of Sardegna. It provides free private parking.
There is a dining area and a kitchen equipped with dishwasher. A flat-screen TV is provided. Other facilities at Villa Del Fiore include a barbecue.
Alghero is 25 miles from Villa Del Fiore, and Sassari is 22 miles from the property. The nearest airport is Fertilia Airport, 20 miles from the property.
Villa Del Fiore has been welcoming Booking.com guests since Apr 20, 2015
When would you like to stay at Villa Del Fiore?
Just booked in Stintino 1 villa like Villa Del Fiore was just booked on our site
Villa Del Fiore is a beautiful villa with private pool and garden. Our villa is 7 km fa from the famouse beach La Pelosa. The nearest beach is Le Saline. It's also very beautiful and less crowded.
Facilities of Villa Del Fiore
House Rules Villa Del Fiore takes special requests – add in the next step!
Please inform Villa Del Fiore of your expected arrival time in advance. You can use the Special Requests box when booking, or contact the property directly using the contact details in your confirmation.
We need at least 5 reviews before we can calculate a review score. If you book and review your stay, you can help Villa Del Fiore meet this goal.
661987|1,714827,761510,768880,768530|4,770300,768530,661987,566947|1,761430,768530|5,753860,771000,566947,767970,585667,753880,765830,759650,754860,640427,759940,766850,713177

value: This website is a Dutch online travel agency for lodging reservations & other travel products, and a subsidiary of Booking Holdings. It is headquartered in Amsterdam.The website has over 28 million listings.


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Nombres Gitanos De NiÑa | eBay Please enable JavaScript Our new search experience requires JavaScript to be enabled. Please enable JavaScript on your browser, then try again.
Skip to main contenteBayShop by categoryEnter your search keywordAll CategoriesAntiquesArtBabyBooksBusiness & IndustrialCameras & PhotoCell Phones & AccessoriesClothing, Shoes & AccessoriesCoins & Paper MoneyCollectiblesComputers/Tablets & NetworkingConsumer ElectronicsCraftsDolls & BearsDVDs & MovieseBay MotorsEntertainment MemorabiliaGift Cards & CouponsHealth & BeautyHome & GardenJewelry & WatchesMusicMusical Instruments & GearPet SuppliesPottery & GlassReal EstateSpecialty ServicesSporting GoodsSports Mem, Cards & Fan ShopStampsTickets & ExperiencesToys & HobbiesTravelVideo Games & ConsolesEverything ElseAdvanced or register':' style="margin-right:3px">Hi -User-!'.replace(/-User-/,escape(a)))+"")}catch(b){document.write("")}})();Hi (Sign in to bid or buy)Daily DealsGift CardsSellHelp & ContactMy eBayExpand My eBaySummaryBids/OffersWatch listWish listAll listsPurchase historySellingMy CollectionsFollowed searchesMessagesNotification Refine your search for Nombres Gitanos De NiÑa
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February: Lillian Boxfish Takes a Walk by Kathleen Rooney | Meetup
February: Lillian Boxfish Takes a Walk by Kathleen Rooney
Hosted by Liya and Suzanne
In February, Suzanne will be leading the discuss for Lillian Boxfish Takes A Walk by Kathleen Rooney. I will open up RSVPs after the January meetup.

value: This website is a service used to organize online groups that host in-person and virtual events for people with similar interests. It was founded in 2002 by Chairman Scott Heiferman and four co-founders.


text:
(Redirected from Developmental editor)
Irrespective of when the developmental editor is brought into a writing project, authors retain control over the document and are responsible for providing the content. An editor who creates significant amounts of content is no longer an editor but a contributing author or a ghostwriter.[1]
Retrieved from "https://en.wikipedia.org/w/index.php?title=Developmental_editing&oldid=870449991"

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Alibris ID: 14970025690
Alibris ID: 10898393543
Howell, Troy. Good in very good dust jacket. Ex-library. Signed by author. Signed by author with inscription on title page. Ex-library copy. Otherwise fine condition. Sewn binding. Cloth over boards. With dust jacket. 227 p. Audience: Children/juvenile.

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Words containing arconigra | Words that contain arconigra
Words containing arconigra | Words that contain arconigra http://www.thefreedictionary.com/words-containing-arconigraPrinter Friendly
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text: _.Bk=function(){this.R=[];this.H=[]};_.h=_.Bk.prototype;_.h.Re=function(){return this.R.length+this.H.length};_.h.xe=function(){return _.Gb(this.R)&&_.Gb(this.H)};_.h.clear=function(){this.R=[];this.H=[]};_.h.contains=function(a){return _.Fb(this.R,a)||_.Fb(this.H,a)};_.h.remove=function(a){var b=this.R;var c=(0,_.vb)(b,a);0<=c?(_.Ib(b,c),b=!0):b=!1;return b||_.Jb(this.H,a)}; _.h.Ae=function(){for(var a=[],b=this.R.length-1;0<=b;--b)a.push(this.R[b]);for(var c=this.H.length,b=0;bThe Coop - Google+Press question mark to see available shortcut keysHomeCollectionsJoin Google+Send FeedbackHelpRegionPrivacy Policy - Terms of Service - Maps Terms©2017 GoogleSearchSign inAboutSearchSign inThe CoopAboutThe Coop's postsLooks like you've reached the endLooks like you've reached the endUnable to load more. RetryWait while more posts are being loaded

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Patent US7975293 - Authentication system, authentication method and terminal device - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More »Advanced Patent Search | Sign inAdvanced Patent SearchPatentsProvided are an authentication method, authentication system and a terminal device in which the authentication of a non-participating third node is can be simplified and can be executed in the case of multicast by using an authentication ticket in a distributed processing network system, the non-participating...http://www.google.com/patents/US7975293?utm_source=gb-gplus-sharePatent US7975293 - Authentication system, authentication method and terminal devicePublication numberUS7975293 B2Publication typeGrantApplication numberUS 12/118,944Publication dateJul 5, 2011Filing dateMay 12, 2008Priority dateMay 16, 2007Also published asUS20090271630Publication number118944, 12118944, US 7975293 B2, US 7975293B2, US-B2-7975293, US7975293 B2, US7975293B2InventorsHiroki Yoshida, Satoshi Deishi, Masahiro KitamuraOriginal AssigneeKonica Minolta Holdings, Inc.Export CitationBiBTeX, EndNote, RefManPatent Citations (24), Non-Patent Citations (1), Referenced by (3), Classifications (21), Legal Events (1) External Links: USPTO, USPTO Assignment, EspacenetAuthentication system, authentication method and terminal deviceUS 7975293 B2Abstract Provided are an authentication method, authentication system and a terminal device in which the authentication of a non-participating third node is can be simplified and can be executed in the case of multicast by using an authentication ticket in a distributed processing network system, the non-participating third node being intended to access each of the nodes, including a first and a second node, constituting a workgroup. The first node that has already participated in the workgroup authenticates the third node intended to participate in the workgroup and issues the authentication ticket including the signatures of both nodes, and when the authentication ticket is submitted to the second node, the second node permits the third node to access, without password-based-authentication, by authenticating the first node and the second node which have signed the authentication ticket.
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text: _.zk=function(){this.R=[];this.H=[]};_.Tia=function(a){_.Gb(a.R)&&(a.R=a.H,a.R.reverse(),a.H=[])};_.Dk=function(a){_.Tia(a);return a.R.pop()};_.h=_.zk.prototype;_.h.Ee=function(){return this.R.length+this.H.length};_.h.Ed=function(){return _.Gb(this.R)&&_.Gb(this.H)};_.h.clear=function(){this.R=[];this.H=[]};_.h.contains=function(a){return _.Fb(this.R,a)||_.Fb(this.H,a)};_.h.remove=function(a){var b=this.R;var c=(0,_.vb)(b,a);0<=c?(_.Ib(b,c),b=!0):b=!1;return b||_.Jb(this.H,a)}; _.h.Id=function(){for(var a=[],b=this.R.length-1;0<=b;--b)a.push(this.R[b]);for(var c=this.H.length,b=0;bAnela Wischt - Google+Press question mark to see available shortcut keysHomeCollectionsJoin Google+Send FeedbackHelpRegionPrivacy Policy - Terms of Service - Maps Terms©2017 GoogleSearchSign inAboutSearchSign inAnela Wischt52 followers52 followersAboutAnela's posts Post has shared contentAnela WischtPublicAug 2, 2012Originally shared by CadburyNot everyone will get a chance to walk around the +London 2012 Olympic Park but as Official Treat Provider we're 'treating' you to some of the nicest parts to give you all an inside look - it's the greenest most meadowy Olympic Park we've ever seen, +1 if you'd like to see some more!Photos by +Jerry Daykin.‹›An Olympic Park Tour (13 photos)13 Photos - View album no plus ones no comments no shares Post has shared contentAnela WischtPublicAug 2, 2012Originally shared by Red BullTake an ice-cold break from summer.JOB - The Action Trailer one plus one 1 no comments no shares Post has shared contentAnela WischtPublicAug 2, 2012Originally shared by Jenn KirklandSQUEE!!!!DOCTOR WHO New Season Fall 2012 Trailer Series 7 no plus ones no comments no sharesLooks like you've reached the endLooks like you've reached the endUnable to load more. RetryWait while more posts are being loaded


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The Improbable Adventures of Sherlock Holmes by John Joseph Adams | 9781441839091 | Audiobook (MP3 on CD) | Barnes & Noble
John Joseph Adams, Simon Vance, Anne Flosnik
“A Sherlockiana Primer” by Christopher Roden. © 2009 Christopher Roden.“The Horror of the Many Faces” by Tim Lebbon. © 2003 Tim Lebbon.“The Case of the Bloodless Sock” by Anne Perry. © 2001 Anne Perry.“The Adventure of the Other Detective” by Bradley H. Sinor. © 2003 Bradley H.…
(MP3 on CD - Unabridged, 2 MP3-CD, 21 hrs. 21 min.)
9781441839091
“A Sherlockiana Primer” by Christopher Roden. © 2009 Christopher Roden.“The Horror of the Many Faces” by Tim Lebbon. © 2003 Tim Lebbon.“The Case of the Bloodless Sock” by Anne Perry. © 2001 Anne Perry.“The Adventure of the Other Detective” by Bradley H. Sinor. © 2003 Bradley H. Sinor.“A Scandal in Montreal” by Edward D. Hoch. © 2008 Edward D. Hoch.”The Adventure of the Field Theorems” by Vonda N. McIntyre. © 1995 Vonda N. McIntyre.“The Adventure of the Death-Fetch” by Darrell Schweitzer. © 1994 Darrell Schweitzer.“The Shocking Affair of the Dutch Steamship Friesland” by Mary Robinette Kowal. © 2005 Mary Robinette Kowal.“The Adventure of the Mummy’s Curse” by H. Paul Jeffers. © 2006 H. Paul Jeffers.“The Things That Shall Come Upon Them” by Barbara Roden. © 2008 Barbara Roden.“Murder to Music” by Anthony Burgesss. © 1989 Anthony Burgess.“The Adventure of the Inertial Adjustor” by Stephen Baxter. © 1997 Stephen Baxter.“Mrs. Hudson’s Case” by Laurie R. King. © 1997 Laurie R. King.“The Singular Habits of Wasps” by Geoffrey A. Landis. © 1994 Geoffrey A. Landis.“The Affair of the 46th Birthday” by Amy Myers. © 2009 Amy Myers.“The Specter of Tullyfane Abbey” by Peter Tremayne. © 2001 Peter Tremayne.“The Vale of the White Horse” by Sharyn McCrumb. © 2003 Sharyn McCrumb.“The Adventure of the Dorset Street Lodger” by Michael Moorcock. © 1993 Michael Moorcock.“The Adventure of the Lost World” by Dominic Green. © 2004 Dominic Green.“The Adventure of the Antiquarian’s Niece” by Barbara Hambly. © 2003 Barbara Hambly.“Dynamics of a Hanging” by Tony Pi. © 2005 Tony Pi.“Merridew of Abominable Memory” by Chris Roberson. © 2008 Monkeybrain, Inc.“Commonplaces” by Naomi Novik. © 2008-2009 Naomi Novik.“The Adventure of the Pirates of Devil’s Cape” by Rob Rogers. © 2009 Rob Rogers.“The Adventure of the Green Skull” by Mark Valentine. © 2008 Mark Valentine.“The Human Mystery” by Tanith Lee. © 1999 Tanith Lee.“A Study in Emerald” by Neil Gaiman. © 2003 Neil Gaiman.“You See But You Do Not Observe” by Robert J. Sawyer. © 1995 Robert J. Sawyer.
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Michigan’s Recruiting Team Takes Shape - Michigan - Scout
Michigan’s Recruiting Team Takes ShapeSam Webb06/29/2015Chris Partridge has assumed the reins as Michigan’s Director of Player Personnel and Recruiting and he is already putting his stamp on things in Ann Arbor. So too are his recruiting coordinator partners Matt Doherty and Erik “Soup” Campbell.One of the most obvious changes in the infancy Jim Harbaugh’s tenure at Michigan is the increase in resources allocated for recruiting. The Wolverines new headman not only added two additional recruiting coordinators, he also added more recruiting staffers to help process film and recruiting data. That newly expanded crew had hardly gotten to know one another when former director of player personnel Chris Singletary left to pursue opportunities in the professional ranks. That’s when Harbaugh turned to his new right hand recruiting man, Chris Partridge.
Partridge first entered the Michigan fan consciousness over three years ago as the coach at Paramus Catholic, the high school alma mater of then All-American recruit Jabrill Peppers. The impression he made on Brady Hoke-staff holdovers Singletary and veteran assistant Greg Mattison were instrumental in helping him get his foot in Harbaugh’s door. That was all the opening that Partridge needed. He was quickly thrust into a leadership role in early April and became the point-man for Michigan’s satellite camp tour. Then when the tour started he coordinated the coaching staff’s effort at every stop. That turned out to be his first major task as Michigan’s new Director of Player Personnel and Recruiting. Of all the duties that Partridge’s new title entails, the one most evident to fans will be his direction in recruiting. No place has his influence been more visible than in his home state of New Jersey.
“I think he can have a huge impact (in New Jersey) because he knows how the dynamic works,” Scout.com East Regional Manager Brian Dohn said. “He understands where the players are (and) he relates well to kids. You saw that with how he built Paramus Catholic into a national power in a short amount of time. And he has got the personality to do it. He is engaging with kids, he knows the layout of the state, he knows where the good players are, and he knows who the people are that know the good players.”
Michigan appears to have become a major presence in the Garden State virtually overnight. In addition to the recent pledge form Camden (N.J.) defensive end Ron Johnson the Wolverines rank among the favorites from Camden (N.J.) wide receiver Brad Hawkins, Egg Harbor City (N.J.) Cedar Creek wide receiver Ahmir Mitchell, and five-star Paramus (N.J.) Catholic defensive lineman Rashan Gary.
Gary’s connection with Partridge is especially strong. The two withstood fierce scrutiny from rival coaches in northern New Jersey in the aftermath of Gary’s transfer from Scotch Plains (N.J.) Fanwood to Paramus. The accusations of impropriety were ultimately proven to be unfounded, and the bond between coach and player was fortified in the process. Gary’s mother Jennifer Coney has stated adamantly that her son would not choose Michigan just because of Partridge’s presence, but she did acknowledge that a familiar and trusted face in Ann Arbor is certainly an asset for the Maize & Blue. As a matter of fact she expects Partridge to be a positive factor with most prospects that consider Michigan.
“I think he has a great eye for talent,” Coney said. “Before Rashan even started high school I talked to him, (then) I came back to him and everything he said about Rashan was true. He’s honest, he doesn’t pull any punches, (and he) doesn’t lie about expectations. You may think your son is the best player in the world, but he is honest. I just think that‘s good. He has an eye for talent, he is honest, he is sincere, he likes what he does, and he does it well.”
That sentiment was recently echoed by the father of another top New Jersey prospect. Michigan is already hot on the trail of 2017 Paramus Catholic linebacker Drew Singleton, and the interest is definitely mutual. The elder Singleton saw Partridge’s appeal first hand two years ago when he was deciding which high school to send his son to.
“A friend of mine said, ‘why don’t you look at Paramus Catholic?’” Singleton recalled. “(The friend said), ‘my sons go there and there is a young coach there. He’s changed the whole atmosphere there. He is the leader. He cares about the kids. He cares about the education.’ I said, ‘okay, ‘I’ll take a look.’”
“We went over there and I didn’t say a word. Drew said everything. Coach Partridge never talked to us about football. He didn’t talk to us about football until it was time for us to leave. For about an hour he just talked to us about academics and took us around the school and talked about what the school offers. At the end, he took us into his office and talked to us about the upcoming season and the schedule. I liked that. It wasn’t about football, it was about the kids’ educations. He really gave that impression and it stuck with me.” Not a One man Show
Partridge isn’t the only member of the recruiting staff espousing Michigan’s many virtues. He has two partners in that effort, starting with Matt Doherty. The former University of Miami recruiting coordinator has played a key role in helping Michigan expand its footprint in the talent rich state of Florida. Doherty was the point man at satellite camp in Miami, and the Wolverines have already picked up four commitments from prospects from that area. Delray Beach (Fla.) Atlantic cornerback Antwaine Richardson, Cooper City (Fla.) defensive end Rashad Weaver, and Pembroke Pines (Fla.) Flanagan safeties Josh Metellus Devin Gil have all committed to Michigan in the last month. The Maize & Blue is also among the favorites to land Flanagan four-star linebacker Devin Bush.
The Sunshine State, though, is a fraction of Doherty’s recruiting responsibilities. He assists in much of the national recruiting effort also. The third rung in Michigan’s recruiting wheel, however, is much more specialized.
Erik “Soup” Campbell recruited Detroit for years as an assistant at Michigan and then later at Iowa. Now he is back in Ann Arbor coordinating the Wolverines’ in-state efforts. He gives the new Wolverine staff a much needed familiar face on the home front.
“We go way back,” Detroit East English Village coach Rod Oden said of Campbell. “Soup is a straight shooter. When you got a kid that can play he’s going to tell you, ‘this kid can play… bring him up here…he’s a Michigan caliber kid. If he can’t, Soup is also a great enough guy to tell you, ‘you know what, that kid is maybe not ready yet… I’ve got some coaches I know (elsewhere) that you really should call.’ He’s done that for us in the past and we appreciate that about him. Having him back is like having one of us (in-state coaches) up there… somebody we can directly relate to.” With the NCAA mandated dead period beginning today the entire recruiting staff will get a much needed breather. When it ends on July 13th expect the Wolverines to go full throttle again. A series of visits are scheduled for the last few weeks of July, leading into the “Barbecue at the Big House” recruiting event the first weekend in August. Share on Facebook Share on TwitterTrending on ScoutWATCH: Donlon's Motivational MessagesBeilein: Michigan sticking to same 'formula'Oregon Likes to Run; So Does MichiganStandout WR Hazel Details B1G, ACC SuitorsJayson Tatum declares for NBA DraftShare & EmbedOregon Likes to Run; So Does Michigan Full StoryThe Michigan Insider Top StoriesOregon Likes to Run; So Does MichiganOregon is one of the best transition teams in the country on offense and defense. So if Michigan tries to get up and down in this game it might be to its own detriment, right?…by Sam WebbThe Michigan InsiderYesterday at 9:17 PMWATCH: Donlon's Motivational MessagesFrom "street fight" to "not today", Michigan assistant Billy Donlon goes in-depth on the thoughts behind the messages he has use to motivate the Wolverines during their recent run.by Sam WebbThe Michigan InsiderYesterday at 9:17 PMLa. 2018 WR: U-M is a 'great school'New Orleans (La.) Mcdonogh 2018 WR Lawrence Keys talks Michigan offer, possible visit and more.by Josh NewkirkThe Michigan InsiderYesterday at 9:20 AMTop Fla. '18 WR Copeland Talks MichiganPensacola (Fla.) Escambia 2018 WR Jacob Copeland updates recruitment, talks Michigan and more.by Josh NewkirkThe Michigan InsiderYesterday at 9:01 AMStandout WR Hazel Details B1G, ACC SuitorsUpper Marlboro (Md.) Wise receiver Isaiah Hazel holds six offers, and is making plenty of visits.by Brian DohnScout FootballYesterday at 6:21 AMHamilton 'excited' for WR competitionWith no clear-cut starters at receiver, Pep Hamilton is excited to see who emerges at wide receiver this spring.by Josh HenschkeThe Michigan InsiderYesterday at 5:42 AMPep Hamilton previews quarterback depthOutside of Wilton Speight, the Michigan coaching staff has depth at quarterback to work with. Passing game coordinator Pep Hamilton previews the depth of the quarterback position.by Josh HenschkeThe Michigan InsiderYesterday at 5:25 AMHamilton expecting Speight to take next stepMichigan passing game coordinator Pep Hamilton is expecting quarterback Wilton Speight to take the next step this year.by Josh HenschkeThe Michigan InsiderYesterday at 5:02 AMWolverines latest offer for DL Ronnie PerkinsScout 300 defensive lineman Ronnie Perkins from St. Louis (Mo.) Lutheran North has been offered by Michigan. More on him in this update.by Allen TrieuScout FootballTuesday at 3:35 PMSpring Preview RoundupThe Michigan Insider brings all of the spring football content delivered into one place.by Josh HenschkeThe Michigan InsiderFriday at 7:09 AMBig-time programs pursuing Tenn. OL LawrenceMemphis (Tenn.) Harding Academy offensive tackle Will Lawrence holds nearly 30 scholarship offers and spoke with Scout about the latest developments in his recruitment.by Michael ClarkScout FootballTuesday at 5:23 PMBrian Smtih Excited About Safety OptionsDuring an exclusive sit-down with The Michigan Insider, Michigan defensive backs coach Brian Smith sheds light on the improvement of Tyree Kinnel, Josh Metellus, J'Markick Woods,…by Sam WebbThe Michigan InsiderTuesday at 2:51 PMLoad More

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for the most part, senator mccain, who has really been one of the most vociferous critics of the straight's approach to benghazi not only before and in the aftermath really was tough on secretary clinton in terms of the answers that she provided to the committee. let's take a listen to an exchange between the senator and secretary clinton. >> i categorically reject your answer to senator johnson. why is it that the administration still refuses to provide the full text of the e-mails regarding the deletion of references to al qaeda in the talking snoints why do we care? the classified information had been included. it gives an entirely different version of events to the american people. going to the american people and tell them what happened, then you ought to have your facts straight. >> well, senator, i understand your very, very strong feelings. you knew chris. you were a friend of chris. you were one of the staunchest supporters of the efforts to dislodge gadhafi and try to give the libyan people a chance, and we just have a disagreement. we have a disagreement about what did happen a Erin Burnett Out Front
at that togetherness. >> we did have that. john mccain, mitt romney, marco rubio, newt gingrich, all you know talking about climate change saying we need to address it. what changed you ask. two things. first of all, the great recession. when people are concerned about the economy, issues that are important but not urgent like climate change fall down the scale. the second change, the rise of the tea party. are you willing to work with the other side? newt gingrich took a lot of heat for that ad with nancy pelosi during the campaign. those two factors drive this issue down, but something like hurricane sandy, that could be a wake-up call. >> and hurricane sandy cost a lot of money. now, it's tough with all the pork that went in the bills, but bear with me, we got a $50 billion appropriation that just came to affected states. that cost a lot of money. so might it not, even if we're not really sure what a cut in emissions might do right now to the trajectory of the climate change that we've experienced, might it not be worth trying to do something about things? whether through carbon monoxide emissions CNN Newsroom
. >> okay. >> gingrich isn't only a well known politician on the show. vice president biden, senator john mccain, senator barbara boxer and olympia snowe all made cameos. >>> clinton said president obama went from a five-stroke lead to a one-stroke lead during their last game, their game last month. he joked about the incident at an event in palm springs, california, telling the crowd, i'm only one down and he leaves at hole 13, and says, got to go. clinton didn't accuse the president of ducking out to avoid a loss, but he admitted playing the presidential card himself in the past. >>> and just in time for an inauguration, the white house releasing a new official portrait photo of the president, shows him smiling with his arms folded, standing in front of his desk in the oval office. the president has more gray hair than four years ago and, of course, speaking of hair, first lady michelle obama rocking a new do, has some bangs. michelle obama debuting the new look yesterday. that was actually her 49th birthday as well. happy birthday. >>> monday, not just the day of president obama's second inau The Situation Room

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Formica in Fort Worth, Texas with Reviews & Ratings - YP.comFind People•Advertise With UsBrowseFind PeopleFeatured CollectionsRestaurantsAutomotiveHome ImprovementHealth & WellnessLegalAdvertise with usWhat do you want to find?Search by business name, or keywordnearWhere? Address, ZIP Code, or NeighborhoodMy current locationSearchWelcome mybookProfileReviewsPhotosSign OutSign In•JoinHomeFort Worth, TXFormicaFort Worth FormicaSort:Most RelevantMost RelevantDistanceRatingName (A - Z)FiltersFiltersMore NeighborhoodsDoneClear AllMore CategoriesPlastics & Plastic ProductsPlastics-High Pressure LaminatesDoneClear AllCategoryPlastics & Plastic ProductsPlastics-High Pressure LaminatesFeaturesBook A TableCouponsOrder OnlineNeighborhoodsGo to List ViewSearch This Area1. Formica CorpDirectionsPlastics-High Pressure Laminates902 W North Carrier PkwyGrand Prairie, TX 75050(972) 623-4150WebsiteDirectionsMore InfoTile Marble and Granite Works LPDirectionsKitchen Planning & Remodeling Service7201 W Vickery BlvdBenbrook, TX 76116(817) 731-1925WebsiteDirectionsMore InfoAdCornerstone RefinishingDirectionsBathtubs & Sinks-Repair & Refinish1224 Security DrDallas, TX 75247(469) 828-2652WebsiteDirectionsMore InfoAdVerona Marble CompanyDirectionsStone ProductsBuilding MaterialsGranite8484 Endicott LnDallas, TX 75227(214) 381-8405DirectionsMore InfoAdSears Home ImprovementsWindowsRoofing ContractorsAzle, TX 76020(888) 929-6923WebsiteMore InfoAdMiracle Method Surface RefinishingBathtubs & Sinks-Repair & RefinishServing the Fort Worth Area.(877) 412-4594WebsiteMore InfoAdSponsored LinksImprove Our ResultsYou can help improve our service by giving us some details.
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Patent US6796316 - Atomic layer deposition (ALD) thin film deposition equipment having cleaning ... - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More »Sign inAdvanced Patent SearchPatentsAn atomic layer desposition (ALD) thin film deposition equipment having a cleaning apparatus, this equipment including a reactor in which a wafer is mounted and a thin film is deposited on the wafer, a first reaction gas supply portion for supplying a first reaction gas to the reactor, a second reaction...http://www.google.com/patents/US6796316?utm_source=gb-gplus-sharePatent US6796316 - Atomic layer deposition (ALD) thin film deposition equipment having cleaning apparatus and cleaning methodAdvanced Patent SearchPublication numberUS6796316 B2Publication typeGrantApplication numberUS 09/848,533Publication dateSep 28, 2004Filing dateMay 3, 2001Priority dateJul 22, 2000Fee statusPaidAlso published asEP1174527A1, US20020007790Publication number09848533, 848533, US 6796316 B2, US 6796316B2, US-B2-6796316, US6796316 B2, US6796316B2InventorsYoung-hoon ParkOriginal AssigneeIps Ltd.Export CitationBiBTeX, EndNote, RefManPatent Citations (16), Non-Patent Citations (1), Referenced by (5), Classifications (25), Legal Events (6) External Links: USPTO, USPTO Assignment, EspacenetAtomic layer deposition (ALD) thin film deposition equipment having cleaning apparatus and cleaning methodUS 6796316 B2Abstract An atomic layer desposition (ALD) thin film deposition equipment having a cleaning apparatus, this equipment including a reactor in which a wafer is mounted and a thin film is deposited on the wafer, a first reaction gas supply portion for supplying a first reaction gas to the reactor, a second reaction gas supply portion for supplying a second reaction gas to the reactor, a first reaction gas supply line for connecting the first reaction gas supply portion to the reactor, a second reaction gas supply line for connecting the second reaction gas supply portion to the reactor, a first inert gas supply line for supplying an inert gas from inert gas supply source to the first reaction gas supply line, a second inert gas supply line for supplying the inert gas from the inert gas supply source to the second reaction gas supply line, an exhaust line for exhausting the gas from the reactor to the outside, and a cleaning gas supply line connected to the first reaction gas supply line for supplying a cleaning gas for cleaning the reactor.
What is claimed is: 1. A cleaning method for an ALD thin film deposition equipment comprising a reactor including a reactor block on which a wafer is mounted, a wafer block installed within the reactor block, on which the wafer is seated, and a diffusion plate having a plurality of spray hole formed over the wafer block and a plurality of nozzles slanted toward the inner sidewall of the reactor block to spray a gas toward the edges of the wafer block, the cleaning method comprising:
performing a main cleaning process in a state where no wafers are received within the reactor, including spraying a mixture of a cleaning gas and an inert gas onto the wafer block through the spray holes and spraying the inert gas toward edges of the wafer block through the nozzles. 2. The cleaning method of claim 1, wherein the main cleaning process further comprises setting a flow rate of the cleaning gas at 50 SCCM or higher, mixing the inert gas with the cleaning gas and flowing the mixture to the spray holes to be at 50 SCCM or higher, and setting a flow rate of the inert gas to the nozzles at 300 SCCM or higher.
3. The cleaning method of claim 2, further comprising setting an inside pressure of the reactor to be 0.5 to 10 torr.
4. The cleaning method of claim 2, further comprising setting the an inside surface temperature of the reactor, except for the wafer block, to be 200� C. or less.
5. The cleaning method of claim 1, further comprising performing a sub cleaning process in the state where no wafers are received within the reactor, including pulse-introducing the cleaning gas into the reactor to induce instantaneous diffusion due to pressure fluctuation.
6. The cleaning method of claim 5, wherein the sub cleaning process further comprises setting the flow rate of the cleaning gas to be at 50 SCCM or higher, mixing the inert gas with the cleaning gas and flowing the mixture to the spray holes at 50 SCCM or higher, and setting a flow rate of the inert gas to the nozzles at 300 SCCM or higher.
7. The cleaning method of claim 5, further comprising setting an inside pressure of the reactor to be 0.5 to 10 torr.
8. The cleaning method of claim 5, further comprising setting an inside surface temperature of the reactor, except for the wafer block, to be 200� C. or less.
9. The cleaning method of claim 1, further comprising performing a pre-coating process in the state where no wafers are received within the reactor, including adhering fine particles remaining within the reactor to an inside surface of the reactor.
10. The cleaning method of claim 9, wherein the pre-coating process comprises spraying a first mixture gas of a first reaction gas and the inert gas onto the wafer block through the spray holes, and spraying a second mixture gas of a second reaction gas and the inert gas toward edges of the wafer block through the nozzles.
11. The cleaning method of claim 9, wherein the pre-coating process comprises introducing first mixture gas of a first reaction gas and the inert gas; introducing the inert gas without the first reaction gas for a predetennined period of time; introducing a second mixture gas of a second reaction gas and the inert gas into the reactor; and introducing the inert gas without the second reaction gas for a predetermined period of time.
12. The cleaning method of claim 9, wherein the pre-coating process comprises introducing a first mixture gas of a first reaction gas and the inert gas and introducing the inert gas without the first reaction gas for a predetermined period of time in a state where a second reaction gas and the inert gas are continuously introduced into the reactor.
13. The cleaning method of claim 9, wherein the pre-coating process comprises introducing NH3 gas into the reactor at least several seconds before introducing a first reaction gas into the reactor, when a compound gas containing Cl is used as the first reaction gas, and the NH3 gas is used as a second reaction gas.
14. The cleaning method of claim 1, wherein the cleaning gas is ClF3.
SUMMARY OF THE INVENTION To achieve the above objective, the present invention provides an atomic layer deposition (ALD) thin film deposition equipment having a cleaning apparatus, this equipment including: a reactor in which a wafer is mounted and a thin film is deposited on the wafer; a first reaction gas supply portion for supplying a first reaction gas to the reactor; a second reaction gas supply portion for supplying a second reaction gas to the reactor; a first reaction gas supply line for connecting the first reaction gas supply portion to the reactor; a second reaction gas supply line for connecting the second reaction gas supply portion to the reactor; a first inert gas supply line for supplying an inert gas from an inert gas supply source to the first reaction gas supply line; a second inert gas supply line for supplying the inert gas from the inert gas supply source to the second reaction gas supply line; an exhaust line for exhausting the gas from the reactor to the outside; and a cleaning gas supply line connected to the first reaction gas supply line for supplying a cleaning gas for cleaning the reactor. Here, the cleaning gas is ClF3.
Preferably, the cleaning gas supply line includes: a cleaning gas mass flow controller (MFC) for controlling the flow of a supplied cleaning gas; and at least one valve for allowing or blocking the flow of the cleaning gas. Also, preferably, the cleaning gas supply line further included a filter for filtering out foreign materials existing within the cleaning gas.
To achieve the above ojective, the present invention provides a cleaning method for ALD thin film deposition equipment having a reactor including a reactor block on which a wafer is mounted, a wafer block installed within the reactor block, on which the wafer is seated, and a diffusion plate having a plurality of spray holes formed over the wafer block and a plurality of nozzles slanted toward the inner sidewall of the reactor block to spray a gas toward the edges of the wafer block. This cleaning method includes a main cleaning process performed in a state where no wafers are received within the reactor, for spraying a mixture of a cleaning gas and an inert gas onto the wafer through the spray holes and spraying an inert gas toward the edges of the wafer block through the nozzles.
Preferably, this cleaning method further includes a sub cleaning process performed in a state where no wafers are received within the reactor, for pulse-introducing the cleaning gas into the reactor to induce instantaneous diffusion due to a pressure fluctuation. Also, preferably, this cleaning method further includes a pre-coating process performed in a state where no wafers are received within the reactor, for adhering fine particles remaining within the reactor to the inside surface of the reactor.
FIG. 1 is a schematic diagram of atomic layer deposition (ALD) thin film deposition equipment having a cleaning apparatus, according to a first embodiment of the present invention;
FIG. 2 is an exploded perspective view of a reactor in the ALD thin film deposition equipment of FIG. 1;
FIG. 3 is an exploded perspective view of a shower head and a diffusion plate in the reactor of FIG. 2;
FIG. 6 is a graph showing the relationship between an interval (D) and a specific resistance while a thin film is formed;
FIG. 7 is a graph showing the relationship between the bottom temperature of a diffusion plate and the speed of deposition of a TiN thin film when a TiN film is deposited using a TiCl4 gas and an NH3 gas;
FIG. 8 shows a reactor combined with a transfer module through a vat valve;
FIG. 9 is a data showing the number of particles detected within a reactor after a cleaning process;
FIG. 10 is a cross-sectional view of ALD thin film deposition equipment having a cleaning apparatus, according to a second embodiment of the present invention; and
FIG. 11 is a cross-sectional view of ALD thin film deposition equipment having a cleaning apparatus, according to a third embodiment of the present invention.
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows atomic layer deposition (ALD) thin film deposition equipment having a cleaning apparatus, according to a first embodiment of the present invention. This ALD thin film deposition equipment can deposit a thin film, such as a TiN film or a TaN film, on a wafer. Deposition of a TiN thin film will now be described as an example. In order to form a TiN thin film, TiCl4 is used as a first reaction gas, NH3 is used as a second reaction gas, and Ar is used as an inert gas.
FIG. 2 is an exploded perspective view of a reactor in the ALD thin film deposition equipment of FIG. 1. FIG. 3 is an exploded perspective view of the reactor of FIG. 2, in which a shower head plate is separated from a diffusion plate. FIG. 4 is a cross-sectional view of the reactor of FIG. 2, and FIG. 5 is a magnified cross-sectional view of the first mixing unit of the reactor of FIG. 4.
The second mixing portion 135 for evenly mixing a second reaction gas and an inert gas is formed between the second connection line 122 and the shower head plate 120, as shown in FIG. 4. The second mixing portion 135 has a structure in which a hole 135 b is formed through a partition 135 a. The wafer block 140, on which a wafer w is safely seated, has a heater H installed in the wafer block 140 to heat and maintain the wafer block 140 to a predetermined temperature during deposition.
The above-described thin film deposition reactor has heaters (H) formed inside and outside to heat the reactor when a thin film is deposited. For example, in a TiN thin film deposition process, when a TiN thin film is deposited, the temperature of the inner surface of the reactor block 110 must be kept at about 120 to 200� C., and the temperature of the diffusion plate 130 must be kept at about 150 to 260� C. Also, the wafer block 140 must be kept at a temperature of about 425 to 650� C., and the pumping baffle 150 must be kept at a temperature of about 150 to 230� C. The temperature of a vat valve 101 between the reactor 100 and a transfer module 102 for supplying and transferring a wafer w must be maintained at about 140 to 170� C. Such a temperature setting can minimize formation of process byproducts.
FIG. 7 is a graph showing the relationship between the bottom temperature of the diffusion plate 130 and the speed of deposition of a TiN thin film, when a TiN film is deposited using a TiCl4 gas and an NH3 gas. A graph when the bottom temperature of the diffusion plate 130 is T1, and a graph when the bottom temperature of the diffusion plate 130 is T2, are shown in FIG. 7. Here, T2 is greater than T1. As shown in the graph of FIG. 7, when the temperature of the diffusion plate 130 exceeds the optimum temperature range, that is, when T1<T2, a greater amount of TiCl4 gas must be introduced into the reactor 100 to obtain the same deposition speed of a TiN thin film, since a relatively greater amount of TiCl4 gas are used to produce particles by reacting to the bottom of the diffusion plate 130 or to deposit a thin film on the diffusion plate 130, instead of being used to deposit a thin film on a wafer w. Accordingly, the increased temperature of the diffusion plate 130 needs to be easily lowered as necessary. In this case, the temperature of the diffusion plate 130 can be reduced by allowing a coolant to flow to the coolant passage 123 formed on the shower head plate 120. Consequently, during depositing a thin film, a thin film or process byproduct deposited on the bottom of a diffusion plate can be minimized by voluntarily increasing or decreasing the temperature of the diffusion plate 130. Thus, particles and undesired influences upon the process can be excluded, so finally a cleaning period can be increased, and a cleaning effect can be improved.
In this gas jungle, a cold spot due to undesired condensation occurring when a reaction gas flows may be formed. Since a cold spot badly affects the process for depositing a thin film, heaters (not shown) for preventing generation of a cold spot are installed on the lines. Preferably, the heaters are independently installed at as many areas as possible along lines, and a temperature gradient is formed along a line. In this embodiment, the temperature gradient is established to be within a range of 40 to 200� C. toward the reactor 100.
The gas jungle further includes a cleaning gas supply line 340 for cleaning the reactor 100. The cleaning gas supply line 340 is connected to the first reaction gas supply line 220, and includes a cleaning gas supply portion 330 for supplying a cleaning gas, a twenty first valve V21 for allowing or blocking the flow of a supplied cleaning gas, a cleaning gas MFC 342 for controlling the flow of a cleaning gas which has passed through the twenty first valve V21, and a twenty second valve V22 for allowing or blocking the flow of a cleaning gas which has been controlled by the cleaning gas MFC 342. Here, a filter 332 for filtering out foreign materials existing within a cleaning gas is installed on the line between the cleaning gas supply portion 330 and the twenty first valve V21. In the above-described structure, a ClF3 gas can be used as a cleaning gas.
Next, an Ar gas is flowed into the reactor 100 through the seventh and ninth valves V7 and V9. Before the Ar gas is introduced, the internal pressure of the reactor 100 is kept at 10−4�5�10−3 torr. However, as the Ar gas is introduced, the internal pressure of the reactor 100 is 1 to 10 torr. This pressure is obtained by the pressure measuring portion 160 installed in the reactor 100 appropriately opening the throttle valve TV of the exhaust line 400. Here, the reason why the seventh and ninth valves V7 and V9 are opened after the sixth and eighth valves V6 and V8 are opened is that the gas within the reactor 100 may flow backward through the seventh and ninth valves V7 and V9 when they are suddenly opened.
In the main cleaning process, a cleaning gas controlled in its flow by the cleaning gas MFC 342, and an inert gas controlled in its flow by the first inert gas MFC 262 are mixed in the first reaction gas supply lines 220, and sprayed onto the wafer block 140 through the spray holes 131 of the diffusion plate 130, and an inert gas controlled in its flow by the second inert gas MFC 272 is sprayed to the edges of the wafer block 140 through the second reaction gas supply line 240 and the nozzles 133 of the diffusion plate 130. In this embodiment, a ClF3 gas is used as a cleaning gas, and an Ar gas is used as an inert gas.
A ClF3 gas is nearly colorless transparent at room temperature, and has a boiling point of 11.75� C. The ClF3 gas must not be liquefied until it is introduced into the reactor 100, and heaters must be installed along lines to apply an appropriate temperature to the gas.
An Ar gas adequately dilutes a ClF3 gas by allowing the ClF3 gas to flow to the diffusion plate 130 via the first reaction gas supply line 220, and allows the ClF3 gas to smoothly flow into the reactor 100.
Upon the main cleaning process, the inside of the reactor must be set to a temperature which prevents damage to the material of the reactor due to excessive etching. Most of the components of the reactor are stable to a ClF3 gas when they have a surface temperature of 170� C. or less, and it is proper that the temperature of an exhaust line is also 170� C. or less. Accordingly, heaters are controlled so that the surface temperature of the components of the reactor 100 except for the wafer block 140 does not exceed 200� C., preferably, is at 170� C. or less. Also, the main cleaning process is performed when the thin film deposition process temperature (425 to 650� C.) of the wafer block 140 is lowered to about 300� C.
Here, preferably, the flow of the ClF3 gas is controlled to 50 SCCM or greater, the flow of an Ar gas, which is mixed with the ClF3 gas, and flows to the spray holes 131, is controlled to 50 SCCM or greater, and an Ar gas flowing to the nozzles 133 via the second reaction gas supply line 240 is controlled to 300 SCCM or greater. It is preferable that the inside pressure of the reactor 100 is set to a range of 0.5 to 10 torr. This gas cleaning process requires about 50 to 90 minutes.
The sub cleaning process denotes pulse introduction in which a ClF3 gas is introduced into the reactor 100 by periodically opening and closing the twenty second valve V22. When the twenty second valve V22 is periodically opened and closed, a ClF3 gas causes a pressure fluctuation within the reactor 100, and etches out a thin film or process byproducts excessively deposited on local areas within the reactor 100 while being instantaneously evenly diffused due to the pressure fluctuation when being introduced into the reactor.
Here, the flow rate of the ClF3 gas is controlled to 50 SCCM or higher, the flow rate of an Ar gas, which is mixed with the ClF3 gas and flows to the spray holes 131, is controlled to 50 SCCM or higher, and the flow rate of an Ar gas, which is mixed with the ClF3 gas in the second reaction gas supply line 240 and flows to the nozzles 133, is controlled to 300 SCCM or higher.
In the pulse introduction process, while an Ar gas is continuously sprayed through the nozzles 133, a ClF3 gas is introduced into the reactor 100 by periodically opening/closing the twenty second valve V22. The opening/closing period of the twenty second valve V22 is set to be about 1 to 2 seconds, and the total pulse introducing time is set to be about 5 minutes or more. Here, the inside pressure of the reactor 100 is set to be within a range of 0.5 to 10 torr. Also, the temperature of the wafer block 140 is set to be about 400� C. or less, and the temperatures of the components of the reactor 100 except for the wafer block 140 are set to be at most 200� C., preferably, at 170� C. or less.
In these main and sub cleaning processes, when a constant amount of a ClF3 gas flows into the reactor 100 and the inside pressure of the reactor 100 is not variable, it is preferable that the sum of the amount of an Ar gas sprayed through the spray holes 131 and an Ar gas sprayed through the nozzles 133 is made constant in order to make the average etching speed of a thin film deposited on the entire inside surface of the reactor 100 uniform.
The pre-coating process is performed in a state where the reactor 100 receives no wafers, and adheres fine particles, which remain within the reactor 100 after the main cleaning process using a ClF3 gas, to the inside surface of the reactor 100. This process prevents particles from dropping over a wafer during depositing a thin film.
The gases within the reactor 100 must be sufficiently exhausted before the pre-coating process is performed. In order to achieve this, after the main cleaning process or sub cleaning process is completed, pumping is performed as much as possible by 100% opening the throttle valve TV while introduction of all gases into the reactor 100 is stopped, thereby rapidly exhausting remaining ClF3 gas and Ar gas within the reactor 100 and remaining process byproducts to the exhaust line 400.
When the inside of the reactor 100 is sufficiently in a vacuum state, the temperature of the wafer block 140, which has dropped during the main cleaning process, starts being increased to the thin film deposition process temperature of about 425 to 650� C. While the temperature of the wafer block 140 is increased, flushing for introducing an Ar gas into the reactor 100 is performed at the same time. Flushing is performed by opening the sixth and seventh valves V6 and V7 to allow an Ar gas to flow into the reactor 100 via the first reaction gas supply line 220 and simultaneously opening the eighth and ninth valves V8 and V9 to allow an Ar gas to flow into the reactor 100 via the second reaction gas supply line 240.
The pre-coating process is very similar to a thin film deposition process, except that it is performed in a state where no wafers are mounted within the reactor 100. Also, the pre-coating process is very similar to a thin film deposition process in terms of deposition conditions. That is, as in a thin film deposition process, when a compound gas containing a transfer metal element such as Ti, Ta or W is used as a first reaction gas, and an NH3 gas is used as a second reaction gas, the temperature of the wafer w during thin film deposition is maintained at 400 to 600� C., and the temperature of lines connected to the reactor 100 is maintained at 40 to 200� C.
Patent CitationsCited PatentFiling datePublication dateApplicantTitleUS4960488 *Dec 19, 1989Oct 2, 1990Applied Materials, Inc.Two step continuous etch sequence is used in which the first step uses high pressure, etching with fluorocarbon gas and the second step uses lower pressure, etching with fluorinated gasUS5294262Jun 24, 1993Mar 15, 1994Tokyo Electron LimitedMethod of cleaning a process tube with ClF3 gas and controlling the temperature of processUS5338363 *Nov 24, 1992Aug 16, 1994Mitsubishi Denki Kabushiki KaishaChemical vapor deposition method, and chemical vapor deposition treatment system and chemical vapor deposition apparatus thereforUS5522934 *Apr 25, 1995Jun 4, 1996Tokyo Electron LimitedPlasma processing apparatus using vertical gas inlets one on top of anotherUS5670218 *Oct 3, 1996Sep 23, 1997Hyundai Electronics Industries Co., Ltd.Method for forming ferroelectric thin film and apparatus thereforUS5926743Sep 2, 1998Jul 20, 1999Applied Materials, Inc.Process for chlorine trifluoride chamber cleaningUS5963834Dec 17, 1997Oct 5, 1999Tokyo Electron LimitedMethod for forming a CVD filmUS5988187 *Jul 9, 1996Nov 23, 1999Lam Research CorporationChemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection portsUS6183563 *May 18, 1999Feb 6, 2001Ips Ltd.Apparatus for depositing thin films on semiconductor wafersUS6217658 *Jun 9, 1999Apr 17, 2001Applied Materials, Inc.Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD ProcessingUS6573184 *Mar 7, 2002Jun 3, 2003Ips, Ltd.Apparatus and method for depositing thin film on wafer using atomic layer depositionUS6579372 *May 3, 2001Jun 17, 2003Ips, Ltd.Apparatus and method for depositing thin film on wafer using atomic layer depositionUS6626185 *Mar 4, 1999Sep 30, 2003Lam Research CorporationRemoval deposits in vapor deposition enclosuresEP0959150A2May 18, 1999Nov 24, 1999IPS LtdApparatus for depositing thin filmsKR950027979A Title not availableKR970067905A Title not available* Cited by examinerNon-Patent CitationsReference1"Notice to Submit Response in Korean Application No. 10-2000-0042169", Korean Patent Office, Nov. 15, 2002.Referenced byCiting PatentFiling datePublication dateApplicantTitleUS7692222Nov 7, 2006Apr 6, 2010Raytheon CompanyAtomic layer deposition in the formation of gate structures for III-V semiconductorUS7749815Jun 26, 2007Jul 6, 2010Applied Materials, Inc.Methods for depositing tungsten after surface treatmentUS8012261Nov 6, 2009Sep 6, 2011Sundew Technologies, LlcALD apparatus and methodCN100530533CMay 22, 2007Aug 19, 2009细美事有限公司Method and apparatus for cleaning substratesWO2012073139A1 *Nov 16, 2011Jun 7, 2012Lam Research AgMethod and apparatus for wafer wet processing* Cited by examinerClassifications U.S. Classification134/22.18, 134/902, 134/2, 438/905, 134/37, 134/30International ClassificationH01L21/3065, C23C16/455, H01L21/302, C23C16/44, H01L21/20Cooperative ClassificationY10S134/902, Y10S438/905, C23C16/45561, C23C16/45565, C23C16/45519, C23C16/45525, C23C16/4405, C23C16/45544European ClassificationC23C16/455J, C23C16/455K2, C23C16/455E, C23C16/455F2, C23C16/44A6, C23C16/455F2DLegal EventsDateCodeEventDescriptionMar 1, 2012FPAYFee paymentYear of fee payment: 8Nov 15, 2011ASAssignmentEffective date: 20110324Free format text: CHANGE OF NAME;ASSIGNOR:ATTO CO., LTD.;REEL/FRAME:027231/0896Owner name: WONIK IPS CO., LTD., KOREA, REPUBLIC OFNov 13, 2011ASAssignmentOwner name: ATTO CO., LTD., KOREA, REPUBLIC OFFree format text: MERGER;ASSIGNOR:IPS LTD.;REEL/FRAME:027218/0383Effective date: 20101230Apr 7, 2008REMIMaintenance fee reminder mailedMar 28, 2008FPAYFee paymentYear of fee payment: 4May 3, 2001ASAssignmentOwner name: IPS LTD., KOREA, REPUBLIC OFFree format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:PARK, YOUNG HOON;REEL/FRAME:011777/0013Effective date: 20010406Owner name: IPS LTD. 33 JIJE-DONG, PYUNGTAEK-SIKYUNGKI-DO, (1)Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:PARK, YOUNG HOON /AR;REEL/FRAME:011777/0013RotateOriginal ImageGoogle Home - Sitemap - USPTO Bulk Downloads - Privacy Policy - Terms of Service - About Google Patents - Send FeedbackData provided by IFI CLAIMS Patent Services


text:
How to create a dynamic PHP switch statement from MySQL query - Stack Overflow
How to create a dynamic PHP switch statement from MySQL query
This is for adding images, categories and comments from an email to a photo gallery I'm working on.
I'm pulling the first two found category names out of an email message body and need to assign the category id to $cat variable for insertion into DB.
I have it working fine hardcoded, but would like to make it dynamic so changes to category names will cascade throughout.
The switch statement I'd like to change:
foreach($foundKeywords as $key => $value) {
if($key<=1){
$cat='3';
case 'friends';
$cat='4';
case 'fun';
$cat='6';
case 'places';
$cat='5';
case 'general';
$cat='2';
case 'henry';
$cat='7';
I'd like to pull the categories from a MySQL table and do it this way:
$res = mysql_query('SELECT * FROM gallery_category');
$cat_switch_list = "";
$cat_switch_list .= "case '".$row[1]."':
$cat = ".$row[0].";
echo $cat_switch_list;
$cat='1';
In theory, I believe this should work, but something is not right.
php mysql switch-statement share|improve this question asked Jul 13 '11 at 21:51
You realize that your $cat variable is just going to end up as whatever the last "keyword" is, right? You cannot dynamically generate PHP this way (at least, not without eval or similar) and you shouldn't, and there is no need for it.
Jul 13 '11 at 21:57
You'd be better of to either use mysql directly for querying:
mysql_query('select id from gallery_category where name=\''.mysql_real_escape($name).'\'');
or by generating an array from your result:
$result = mysql_query('select * from gallery_category');
while($row = mysql_fetch_num($result))
$categories[$row[1]] = $row[0];
Then you can find the correct id simply be looking it up in your categories array: $id = $categories[$name].
If you want to generate code and it looks like it, you can use var_export() to save the $categories variable to real php code. Do you want to generate code?
Thanks very much for your help. Simply querying the DB was the obvious way to go! No wonder I didn't think of it.
There's no need for a switch statement at all (what you're asking for is not what switch statements are for). Simply store the $cat value in the same table that describes the categories. Then you just select from that table, and in each row you have the $value and the $cat that you need.
9,93323058
No, Jimmy. That's not what switches are for. I'm still learning. However, it did get the job done at the time so I was happy that at least it was working.
Right, (short) lists of static values are fine, but when you try to make it dynamic, that's when it gets hairy. Didn't mean to sound like a jerk, just wanted to express that your situation is now easier because you don't need the switch. :)
Jul 13 '11 at 23:44
Do your database query and load the results into an associative array:
$result = mysql_query('SELECT name, id FROM gallery_category');
$categories[$row['name']] = $row['id'];
foreach ($foundKeywords as $key => $val)
if ($key <= 1)
$cat = $categories[$val];
// Do whatever processing/output you need to do with this keyword
N.B.: This code is untested.
10.3k23155
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text:
Law Firm Leaves Conclusions From Report to HealthSouth - The New York Times
Archives|Law Firm Leaves Conclusions From Report to HealthSouth
Law Firm Leaves Conclusions From Report to HealthSouth
By MILT FREUDENHEIM NOV. 5, 2002
The Washington law firm that investigated accusations of insider trading against Richard M. Scrushy, the chairman of HealthSouth, the big chain of rehabilitation hospitals and clinics, said yesterday that it was taking no responsibility for interpretations of its findings made by Mr. Scrushy and the company.
In an unusual statement issued yesterday ahead of its scheduled quarterly earnings report today, HealthSouth quoted the firm, Fulbright & Jaworski, as saying that it ''expresses no views as to the inferences that may be drawn from the facts and circumstances contained'' in its Oct. 29 report to the HealthSouth board.
The law firm said in the report that it had ''uncovered no oral interview or written document'' that would have established that Mr. Scrushy had inside knowledge when he sold $74 million in stock in May and sold $25 million in shares to the company in July to repay a loan.
HealthSouth's stock, which traded as high as $15.90 in May, plummeted to $2.79 in September and closed yesterday at $4.88, up 35 cents.
In its statement concerning the law firm's report, HealthSouth said yesterday, ''All other public statements are analyses by others.''
A spokesman for Fulbright & Jaworski declined to comment further yesterday.
Last Thursday, Mr. Scrushy hailed the report as ''confirmation of the facts and the truth concerning my lack of knowledge'' before he sold the stock. The company's news release said he was ''cleared by an outside investigation by a national law firm of all allegations of inside knowledge'' in the transactions.
Wall Street analysts said the law firm seemed to be narrowing the focus of its findings.
''My impression from this statement is that they have limited themselves to just a certain set of facts,'' said Phillip Seligman, a health care stock analyst at Standard & Poor's. ''Beyond the narrow view, there may be something else that we are not seeing,'' he said.
The law firm may be ''very nervous,'' said Herbert A. Denton, president of Providence Capital, which owns HealthSouth shares. ''They have, in effect, tried to prove a negative,'' he said, referring to what Mr. Scrushy and the company knew or did not know at certain dates.
Fulbright & Jaworski ''are concerned that they don't want to be held liable for fluctuations in the stock price based on the company's release,'' Mr. Denton added. Lawyers nationwide have filed a number of shareholder suits against HealthSouth since the stock tumbled.
The law firm has had other relationships with HealthSouth. Two of its lawyers, Thomas A. Countryman and Charles A. Deacon, were briefly listed as members of a group of lawyers defending HealthSouth on accusations of Medicare fraud in a pending civil lawsuit in the Justice Department. They withdrew in May.
Lanny Davis, a spokesman for HealthSouth, said no one at the company knew that the Fulbright & Jaworski lawyers had joined the team, which he said was just ''a professional courtesy'' to another law firm.
HealthSouth said yesterday that it had given documents to the Securities and Exchange Commission. The company repeated that it was cooperating with the agency. Fulbright & Jaworski are representing the company in the S.E.C. inquiry.
A version of this article appears in print on November 5, 2002, on Page C00010 of the National edition with the headline: Law Firm Leaves Conclusions From Report to HealthSouth. Order Reprints| Today's Paper|Subscribe

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text:
09.11.13 Leader Andrea Stewart-Cousins Statement on September 11 Anniversary
P. 109.11.13 Leader Andrea Stewart-Cousins Statement on September 11 Anniversary09.11.13 Leader Andrea Stewart-Cousins Statement on September 11 AnniversaryRatings: (0)|Views: 270|Likes: 0Published by New York State Senate Democratic Conference09.11.13 Leader Andrea Stewart-Cousins Statement on September 11 Anniversary09.11.13 Leader Andrea Stewart-Cousins Statement on September 11 AnniversaryMore info:Published by: New York State Senate Democratic Conference on Sep 11, 2013Copyright:Attribution Non-commercialAvailability:Read on Scribd mobile: iPhone, iPad and Android.download as DOCX, PDF, TXT or read online from ScribdFlag for inappropriate content|Add to collectionSee moreSee lesshttp://www.scribd.com/doc/167339884/09-11-13-Leader-Andrea-Stewart-Cousins-Statement-on-September-11-Anniversary09/17/2013pdftextoriginal Activity (1)FiltersAdd to collectionReview Add NoteLikeShowingAllMost RecentReviewsAll NotesLikesYou've already reviewed this. Edit your review.Rating 0/5Post notePost reviewPost replyPost note and like1 hundred readsLoad more

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Kartingf1Fan comments on So my friend got woke up by a weird sound yesterday morning. Anybody got any idea's what the hell this is?jump to contentmy subredditsannouncementsArtAskRedditaskscienceawwblogbookscreepydataisbeautifulDIYDocumentariesEarthPornexplainlikeimfiveFitnessfoodfunnyFuturologygadgetsgamingGetMotivatedgifshistoryIAmAInternetIsBeautifulJokesLifeProTipslistentothismildlyinterestingmoviesMusicnewsnosleepnottheonionOldSchoolCoolpersonalfinancephilosophyphotoshopbattlespicsscienceShowerthoughtsspacesportstelevisiontifutodayilearnedTwoXChromosomesUpliftingNewsvideosworldnewsWritingPromptsedit subscriptionsfront-all-random | Documentaries-EarthPorn-Music-WritingPrompts-todayilearned-movies-pics-sports-creepy-books-dataisbeautiful-funny-DIY-gaming-history-InternetIsBeautiful-OldSchoolCool-television-TwoXChromosomes-space-philosophy-Fitness-worldnews-UpliftingNews-aww-nottheonion-nosleep-photoshopbattles-science-gadgets-listentothis-AskReddit-IAmA-tifu-GetMotivated-askscience-videos-explainlikeimfive-Jokes-Art-personalfinance-food-LifeProTips-gifs-mildlyinteresting-Futurology-news-Showerthoughtsmore »reddit.com commentsrelatedwant to join? login or register in seconds|Englishuse the following search parameters to narrow your results:subreddit:subredditfind submissions in "subreddit"author:usernamefind submissions by "username"site:example.comfind submissions from "example.com"url:textsearch for "text" in urlselftext:textsearch for "text" in self post contentsself:yes (or self:no)include (or exclude) self postsnsfw:yes (or nsfw:no)include (or exclude) results marked as NSFWe.g. subreddit:aww site:imgur.com dogsee the search faq for details.advanced search: by author, subreddit...this post was submitted on 28 Oct 201327 points (69% upvoted)shortlink: remember mereset passwordloginSubmit a new linkSubmit a new text postdaily reddit gold goal20%help support redditreddit gold gives you extra features and helps keep our servers running. We believe the more reddit can be user-supported, the freer we will be to make reddit the best it can be.Buy gold for yourself to gain access to extra features and special benefits. A month of gold pays for 231.26 minutes of reddit server time!Give gold to thank exemplary people and encourage them to post more.This daily goal updates every 10 minutes and is reset at midnight Pacific Time (21 hours, 8 minutes from now).Yesterday's reddit gold goal135%262728So my friend got woke up by a weird sound yesterday morning. Anybody got any idea's what the hell this is? (youtube.com)submitted 11 months ago by blucherie to /r/videos48 commentssharecancelsorry, this has been archived and can no longer be voted onloading...sorted by: bestbesttopnewhotcontroversialoldrandomyou are viewing a single comment's thread.view the rest of the comments →[–]Kartingf1Fan 0 points1 point2 points 11 months ago (0 children)sorry, this has been archived and can no longer be voted onIt's the beast of craggy island. http://www.youtube.com/watch?v=W_xOfxY5n2U
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Communication and Knowledge Transfer: Theories and Cases in Journalism, Public Relations and Advertising (Series on Innovation and Knowledge Management): Seow Ting Lee, I-Huei Cheng: 9789814271028: Amazon.com: Books
Seow Ting Lee (Author), I-Huei Cheng (Author)
ISBN-13: 978-9814271028
ISBN-10: 9814271020
Publisher: World Scientific Publishing Company (May 31, 2014)
Amazon Best Sellers Rank: #15,958,568 in Books (See Top 100 in Books)
#4574 in Books > Business & Money > Marketing & Sales > Public Relations
#15697 in Books > Business & Money > Marketing & Sales > Advertising
› Visit Amazon's Irene Cheng Page

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text:
(Redirected from Renault Vehicules Industriels)
Retrieved from "https://en.wikipedia.org/w/index.php?title=Renault_Trucks&oldid=876977639"


text:
Amazon.com: Clio Palmperfect Cordless Shaver for Women (Colors May Vary): Beauty
Usually ships within 4 to 5 days. Ships from and sold by Walker Lucius.
This item:Clio Palmperfect Cordless Shaver for Women (Colors May Vary) $15.99
Ships from and sold by Walker Lucius.
Clio Designs Palmperfect Electric Shaver in Patterns, Color and Pattern may vary $8.82
Remington WSF4810 Women's Travel Foil Shaver, Color/Design May Vary $8.99 Add-on Item
2-Year Protection Asurion, LLC $4.89
Product Dimensions: 1 x 2.8 x 3.5 inches ; 6.6 ounces
ASIN: B000V4QZG8
UPC: 843445001467
Item model number: 3800(TU)
Amazon Best Sellers Rank: #257,540 in Beauty & Personal Care (See Top 100 in Beauty & Personal Care)
#946 in Beauty & Personal Care > Hair Care > Hair Cutting Tools > Hair Clippers & Accessories
#12930 in Beauty & Personal Care > Tools & Accessories > Shave & Hair Removal
SELLER IS NOT RESPONSIBLE FOR ANY INJURY DUE TO USING THIS PRODUCT. PLEASE READ THE MANUFACTURER'S DIRECTIONS.
shave razor batteries shaving close electric legs area travel died waste razors blades stopped shavers hairs bikini wet wouldn expensive
1.0 out of 5 starsSticky and Yucky......
Never got to try the shaver. When it was taken out of its packaging, it was extremely sticky. Tried to wipe it off and some sort of yellowish sticky film smeared al over. I could use my fingernail to scrape gobs of it off. Picked it up in my hand, turned my hand upside down, and it was so sticky it stuck to my palm and never fell off. Found a coupon for replacement blades in the packaging. It expired in 2007. I had gotten this as my granddaughter's first razor. No way was I letting her use this disgusting thing. She didn't even want to touch it. This is the first item from Amazon that I returned. Have no intension of ordering another
3.0 out of 5 stars... about 4 years ago at a pharmacy and I LOVED it. I used it all the time
I purchased the older model of the Clio shaver about 4 years ago at a pharmacy and I LOVED it. I used it all the time...no bumps, nice and clean, it was like THE ideal electric shaver. That particular model was awesome because it was rechargeable. Sadly, after many years I lost the cap, the screen fell out and all the trimming teeth began to break off. It was finally time for a new one! So I came to Amazon to purchase another. Unfortunately, Clio doesn't seem to make the rechargeable model anymore (or if they do, it is unavailable on Amazon) and I settled for this half-assed battery powered version. It works fine, and functions pretty much the same as my previous model, I'm just bummed that I have to destroy the earth with more used batteries. It's a shame that the company decided to do away with the rechargeable model (I'd imagine it was a bottom line issue - cheaper NOT to manufacture rechargeable parts and just make the consumer buy batteries and kill the earth slowly over time). So basically, 3 stars, minus 1 star for not being rechargeable, and minus another for killing the earth slowly. That said, it's okay for now, but if the batteries die in in just a day right in the middle of trimming my tender nether-regions then I will immediately buy a completely different manufacturer's model that is rechargeable.
I guess this didn't cost much for a reason. It doesn't shave as close as others and I have to play around with the batteries before it will even turn on. It never starts when you turn it on. I've tried different batteries to no avail. A waste of time and money.
Don't waste your money. Invest in a proper shaver, or you will end up spending more at the end of the day. I ordered this shaver and was so excited when it showed up, as the colors and patterns are very pretty. However, it didn't last a full month. I went on vacation with it and it simply stopped working, even when I tried changing the batteries. I did not get to return it, as I was out of the country and the return deadline was a couple days away. Horrible purchase. Horrible experience. Just don't.
5.0 out of 5 starsDefinitely a good find!
I was hesitant to order this razor based on the cost alone. I love a bargain, but quite often you get what you pay for. In this case though I feel I got much more than that and couldn't be happier about finding this deal.
Prior to ordering this I had used the Remington WDF-1100 Smooth & Silky Women Body Contour Shaver for the last year. Remington WDF-1100 Smooth & Silky Women Body Contour Shaver (Color May Vary) It performed just fine, but I had always considered it a bit bulky. Recently though it went *kaput* so I was in search for a replacement.
Now back to the Clio. Although I had not heard of this brand before, the reviews her were mostly positive and for the price is was worth the risk.
~ Can be used both wet and dry
~ Provides a close shave in all areas and I haven't received one nick, which I had problems with using my other razor
~ Small palm size, makes it easy to hold especially when wet
~ Takes just 2 AAA batteries and they seem to last quite awhile
~ Small enough that it'll be easy to take for travel or to the gym
~ Removable wrist strap or shower hanger keeps it handy
~ Replacement blades that don't cost an arm and a leg Clio Designs Refill Blades for all Clio 3800 Series Shavers (2 Packs of 2)
~ I still believe most electric razors are too noisy, this one is no exception
~ And finally...that I didn't find this razor a year ago!
Overall I recommend this cute little pink Clio to any woman out there looking to change razors or add one in to her routine.
1.0 out of 5 starsOnly worked for a half second
Be warned! Work for a half of second then... nothing! I tried everything and nothing got it working. The bad news... I would outside of the return period when I needed it. SO I quickly ordered another brand.
While waiting for my Clio shaver to arrive from Amazon, I saw & bought the exact one at Wal-Mart for less than $9.00. I think I paid about $21 from Amazon, so before buying, do some cost comparing. I did keep the one from Amazon also instead of returning it (as a back up). As all shavers, it doesn't do as close a shave as a razor, but good enough. Being on a blood thinner it took forever to stop a razor cut, so that is why I switched to the Clio shaver. It fits comfortable in the hand and easy to clean the razor head.
5.0 out of 5 starsFinally a small ladies Shaver!
I've been looking for a small shaver. And, so happy this one has batteries. My previous shaver had a cord and had to be charged before every use. The charge never held for a full shave for me...very frustrating. This Clio is perfect...fits in the palm of the hand and completed a full shave without running down. This will be great for carrying on trips as it is very small and no attachements to worry about taking along.
In short I shaved half my right leg before it died. Took five minutes of shaking to get it back to life. Then before I could get to my other leg it died again.Read more
disappointed, did not work properly
The design is cute BUT I used it twice & it stopped working. It wasn't worth sending back.
I love the razor! It works so smooth on your skin, it's really good quality and I would recommend it for pre-teens and women!
Didn't last a month before it stopped working
doesn't seem to work great
If I could give this zero stars I would. Truthfully I don't know if or how well this product works since it won't even turn on.Read more
5.0 out of 5 starsThis is a great razor. It works very well and I don't ...
This is a great razor. It works very well and I don't have to worry about my daughter cutting herself while shaving.Read more
This didn't work so well. It was disappointing. It was not a good shave at all.
5.0 out of 5 starsBest leg shaver
Love this! No pain.
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