text:
Patent US20040255853 - PECVD reactor in-situ monitoring system - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More »Advanced Patent Search | Sign inAdvanced Patent SearchPatentsAn apparatus for depositing films on a substrate, the apparatus including: a plasma deposition chamber having a first electrode and a second electrode that defines a target plane in which the substrate is held during deposition, and wherein during deposition a plasma is sustained between the first and...http://www.google.com/patents/US20040255853?utm_source=gb-gplus-sharePatent US20040255853 - PECVD reactor in-situ monitoring systemPublication numberUS20040255853 A1Publication typeApplicationApplication numberUS 10/846,991Publication dateDec 23, 2004Filing dateMay 14, 2004Priority dateMay 15, 2003Publication number10846991, 846991, US 2004/0255853 A1, US 2004/255853 A1, US 20040255853 A1, US 20040255853A1, US 2004255853 A1, US 2004255853A1, US-A1-20040255853, US-A1-2004255853, US2004/0255853A1, US2004/255853A1, US20040255853 A1, US20040255853A1, US2004255853 A1, US2004255853A1InventorsEugene Ma, Ming WuOriginal AssigneeAegis SemiconductorExport CitationBiBTeX, EndNote, RefManReferenced by (9), Classifications (11), Legal Events (1) External Links: USPTO, USPTO Assignment, EspacenetPECVD reactor in-situ monitoring systemUS 20040255853 A1Abstract An apparatus for depositing films on a substrate, the apparatus including: a plasma deposition chamber having a first electrode and a second electrode that defines a target plane in which the substrate is held during deposition, and wherein during deposition a plasma is sustained between the first and second electrodes, said deposition chamber also including an input window and an output window; and a monitoring system which includes a light source and an optical detector, both located outside of the deposition chamber, said optical monitoring system also including an optical system that directs a beam from the light source through the input window and into the deposition chamber as a measurement beam, wherein the measurement beam arrives at the target plane along a path that is approximately normal to the target plane and wherein during operation said measurement beam interacts with the substrate to generate a return measurement beam that passes from the substrate out of the chamber through the output window, wherein said optical system directs the measurement return beam onto the optical detector. Images(8) Claims(28)
DETAILED DESCRIPTION [0018] The family of in-situ monitoring systems described below enables precise measurements of thin film growth, especially of optical thicknesses of deposited films, and aids in the deposition of multi-layered optical structures, including multicavity Fabry-Perot optical filters. Deployable in Plasma Enhanced Chemical Vapor Deposition (PECVD) reactors, the in-situ monitoring systems leave the geometry of the growth space, including the plasma gap spacing, unchanged. The optical signals for monitoring the thin-film growth are sourced and collected outside of the chamber, and both transmission and reflection monitoring configurations are possible. Systems and methods using remote measurements for compensating for a variety of noise sources, including mechanical jitter, power drift in the system lasers, and temperature drift in the chamber, are presented. Finally, various approaches to signal processing are described. [0019] I. Beam Architecture [0020] Referring to FIG. 1, one embodiment of a PECVD reactor with an in-situ monitoring system is depicted generally at 1000. Many of the optical components of monitoring system 1000 are external to reactor chamber 1040. An optical signal is introduced into chamber 1040 through port window 1050. The signal then passes through a via hole on backplate 1060 of substrate 1070, interacts with substrate 1070, and is detected. By monitoring this optical signal, information concerning wafer and thin-film properties, including film thickness, is obtained. [0021] In this embodiment, part of the optical signal is reflected off of substrate 1070, and part is transmitted through it, so detectors can be placed to monitor either the transmitted or reflected component. In the reflection-monitoring configuration, the optical signal, originating with laser 1010, passes through fiber optic 1015 and collimator optic 1030, enters chamber 1040 through window 1050, interacts with substrate wafer 1070, and then exits back through window 1050. Upon exiting, the signal passes through collimator optic 1035, passes through fiber optic 1025, and impinges upon detector 1020. In the transmission-monitoring configuration, the optical signal enters chamber 1040, passes through the via in backplate 1060, interacts with substrate wafer 1070, and afterwards continues through a hole in upper showerhead electrode 1080, through window 1090 in bottom showerhead plate 1100, passes through a via in plenum 1110, and exits through port window 1120 to be detected by detector 1130. [0022] Other elements of the PECVD reactor are standard and known to those skilled in the art. Halogen lamps 1140 heat the substrate, which is held by the substrate holder 1150. Holder 1150, which is made of titanium to have a thermal coefficient of expansion similar to that of silicon wafers, has a lip upon which substrate wafer 1070 sits. Clips (not shown) serve to fix wafer 1070 and backplate 1060 in place. Holder 1150, which also serves as one of the plasma electrodes, is grounded. The other electrode, spaced about one inch away in the illustrated embodiment, is upper showerhead electrode 1080, which is electrified by an electrical connection passing through electrical port 1180. Plasma confinement wall 1160, which confines the plasma to between the two electrodes, is adjustable to adjust the rate of gas flow out of the space between the two electrodes. This adjustability is achieved by threading the inside of plasma wall 1160 and the exterior of plenum 1110, and by screwing or unscrewing wall 1160 onto plenum 1110 as needed. The gas enters the space between the two electrodes through gas inlet 1170 and then passes through the holes in bottom showerhead plate 1100 and upper showerhead electrode 1080. Chamber 1040 is evacuated by a vacuum pump connected at vacuum port 1190. [0023] II. Compensating for Drift in the Laser Signal [0024] Referring to FIG. 2, one embodiment of the in-situ monitoring system, generally indicated at 5, uses a second beam as a reference to improve the measurement precision of the beam that interacts with the substrate. As seen in FIG. 2, PECVD reactor chamber 10 contains a target wafer 20, held in a substrate holder (not shown) that serves as one of the plasma-forming electrodes, and a showerhead structure 30 that serves as the other plasma-forming electrode. Primary beam 130 interacts with wafer 20 itself. The second, reference beam 135 is reflected off mirror 40, which is resting on the backside of substrate wafer 20. Beam 135 enters and exits chamber 10, and is detected in a similar fashion, as beam 130. Using a dual beam architecture and beam splitters, system 5 can compensate for power drift in the laser or for changes in the intensity of the laser beam due to mechanical vibration. [0025] In this embodiment, no backing plates are used with the silicon wafer, as silicon has a high enough thermal conductivity to not make these necessary to achieve the required uniformity of temperature over the silicon substrate. If the target wafer is not sufficiently thermally conductive, as with glass wafers, for example, a silicon wafer is used as a backplate to achieve the required uniformity. Such silicon wafer backplates are coated with an anti-reflection coating, such as silicon nitride � of a wavelength thick, to decrease any interference fringe effect. [0026] There are clips (not shown) that hold wafer 20 in the wafer holder. One of these clips also holds monitoring mirror 40 onto wafer 20. Mirror 40 is reflective at the monitoring wavelength of 1550 nm. In the described embodiment, mirror 40 is � the size of wafer 20, though it could be larger or smaller than this. [0027] Exterior to chamber 10 is tunable laser 50, which has a center wavelength of 1550 nm and a tuning range of �50 nm. Laser 50 is tuned during deposition when obtaining data regarding film growth. Laser 50 sends a laser beam to coupler 60, which splits the beam into two beams of equal intensity and couples those beams into corresponding fiber optics 70 and 75. [0028] The beam exiting fiber optic 70 passes through collimator lens 80 and into beam splitter 90. Beam splitter 90 sends half of the beam into collimating optic 100, which then directs beam 130 into chamber 10. Beam splitter 90 sends the other half of the beam into optic 110 and photodetector 120. [0029] Beam 130 enters chamber 10 through a window (not shown), passes through silicon wafer 20, and a portion of it is reflected by the thin films that are being deposited on the front of the wafer. The reflected beam passes back through optic 100, and a portion of it is reflected into optic 140, which focuses it onto photodetector 150. [0030] The beam exiting fiber optic 75 passes through collimator 85 and into beam splitter 90. Beam splitter 90 sends half of that beam into collimating optic 105, which then directs beam 135 into chamber 10. Beam splitter 90 sends the other half of the beam into optic 115 and photodetector 125. [0031] Beam 135, after leaving optic 105, enters chamber 10 through the same window as beam 130. Beam 135 strikes mirror 40, is reflected, passes back through optic 105, and is partially reflected into optic 145, which focuses it onto photodetector 155. The signals acquired by photodetectors 150 and 155 are differenced by differential amplifier 160, and then fed into data acquisition hardware (�DAQ�) 170 along with signals from compensation photodetectors 120 and 125. Computer 180 acquires data from DAQ 170. [0032] Two sources of beam intensity fluctuations can contaminate the data derived from the signal detected by photodetector 150, namely, differential mode fluctuations, e.g., changes in coupler 60 that cause it to split the beam unevenly over time, and common mode fluctuations, e.g., power drift in the tunable laser 50. Data derived from compensation photodetectors 120 and 125 are used to compensate for differential mode fluctuations changes, whereas differencing of the two signals from photodetectors 150 and 155 compensates for the common mode fluctuations. [0033] III. Compensating for Drift in Temperature [0034] Referring to FIG. 3, another embodiment of the in-situ monitoring system, generally indicated at 205, uses a second beam to produce a reference signal to compensate for changes in the measurement signal due to shifts in temperature. In this embodiment, the second beam is generated by a second, separately controllable laser and, instead of using a mirror resting on the backside of the silicon wafer, it uses a thermally tunable thin-film optical filter. [0035] As seen in FIG. 3, PECVD chamber 210 contains a target wafer 220. In this embodiment, reference filter 240 rests on the backside of wafer 220. Filter 240 is a thermo-optically tunable thin-film optical interference filter fabricated as described in detail in U.S. Ser. No. 10/174,503, filed Jun. 17, 2002, and U.S. Ser. No. 10/211,970, filed Aug. 2, 2002, both of which are incorporated herein by reference. The thermo-optically tunable filter 240 has a transmission pass band that is centered at a wavelength that varies as a function of temperature. Thus, the location of the pass band is an accurate indicator of temperature. Filter 240 rests on the backside of the silicon wafer and thus will be at the same temperature as wafer 220. Filter 240 is � the size of wafer 220. [0036] Exterior to chamber 210 are two independently tunable lasers 250 and 255, which each have a center wavelength of 1550 nm and a tuning range of �50 nm. Lasers 250 and 255 are independently tuned during operation of the monitoring system to obtain data concerning film growth and deposition conditions as deposition occurs. Laser 250 emits a beam, which passes through collimator 280 and enters beam splitter 290 to be split into a first and second part. The first part of the beam passes through optic 310, which focus it onto photodetector 320. The second part of the beam passes through collimating optic 300 and through a window into chamber 210 as beam 330. Laser 255 emits a beam, which passes through collimator 285 and enters beam splitter 290 to be split into a first and second part as well. The first part passes through optic 315, which focuses it onto photodetector 325. The second part of the beam passes through collimating optic 305 and through the window into chamber 210 as beam 335. [0037] Beam 330, after entering chamber 210, passes through silicon wafer 220, and a portion of it is reflected by the thin films that are being deposited on the front of the wafer. The reflected beam passes back through optic 300, and a portion of it is reflected into optic 340, which focuses it into photodetector 350. Beam 335, after entering chamber 210, passes through filter 240, and a portion of it is reflected by filter 240. The reflected beam passes back through optic 305, and a portion of it is reflected into optic 345, which focuses it onto photodetector 355. Data from photodetectors 320, 325, 350, and 355 pass through DAQ 370 to computer 380 for processing, as discussed below. [0038] Beam 330 produces a measurement signal that is used to monitor the thickness of the thin film being deposited. Beam 335 produces a reference signal that is used to measure the temperature of the silicon wafer. Since the reflectivity of the stack of thin films that are being deposited will also vary with temperature, knowing the actual temperature fluctuations enables one to compensate for that effect. In other words, knowing the actual temperature fluctuation of the wafer enables one to remove the temperature effect from the measurement signal. Thus, the signal processing software uses the information derived from beam 335 to reduce the impact of variations in temperature on the thin film thickness measurements. [0039] Data derived from the signals produced by compensation photodetectors 320 and 325 are used to compensate for power drifting in lasers 250 and 255, as previously described. [0040] IV. Signal Processing Algorithms [0041] Beam 130 in FIG. 2 and beam 330 in FIG. 3 are focused on the wafer to be monitored. The data collected by photodetectors 150 in FIGS. 2 and 350 in FIG. 3 are compensated for power drift of the laser. After compensation, these data are used to indicate the thickness that the film growth has achieved on the substrate and underlying thin films. [0042] In reflection-monitoring configurations a portion of the measurement beam will also reflect off of the backside of the wafer and will interfere with the beam that reflects off of the front side of the wafer when the thin films are being deposited. These two reflected beams will interfere and that interference will change as the temperature of the wafer changes. This is largely because the wafer thickness will expand or contract, thereby changing the size of the reflection cavity produced by the front and backsides of the wafer. This interference has much greater effect in reflection-monitoring configurations than in transmission-monitoring configurations. There are a number of ways to minimize the impact of these changes on the measurements; some of these ways will now be discussed. [0043] Referring to FIG. 4, interference signal 410 results when the wavelength of the laser is changed. When the temperature changes, interference signal 410 shifts left by an amount 430 to produce interference signal 420. To eliminate the effect of this fringe and its drift, laser 50 in FIG. 2 and laser 250 in FIG. 3 are swept (i.e., tuned) over a range 440 approximately equally to one or more fringes. The average value of the detected signal is free of the fringe effect. [0044] Another signal processing approach that helps reduce the temperature effect is illustrated in FIG. 5. As the thin film is being deposited on an existing filter structure the amplitude of the bandpass curve will change. This change is a measure of the thickness of the film being deposited. Unfortunately, changes in temperature will produce shifts in the location of the peak and thus will also cause a change in the measured signal. By tuning the measurement laser over a range that locates the peak of the bandpass curve, the amplitude of the peak can be determined regardless of where it has shifted. Thus, by measuring the amplitude of the peak, the effects attributable to the shifting of the curve are eliminated. The maximum value of the spectrum (i.e., the maximum intensity value) is recorded and plotted on time signal graph 540. Note that any shift in wavelength of the spectrum does not affect the plot in graph 540. Graph 540 displays the change in signal intensity over time attributable only to changes in the thickness of the film being deposited on the substrate. Note also that interference fringes arising from the substrate wafer itself will be superimposed on the passband curve. If the substrate wafer is thick, the distance between fringes will be short compared to the size of the passband, and tuning the laser over the passband range will result in high-frequency noise that can be filtered out by using of a low-frequency signal amplifier that does not see the high frequencies caused by the interference signal. [0045] More precise temperature data can be obtained and be used to reduce noise in the thickness data by use of the tuning capability of laser 255. Referring to FIG. 3, reference laser 255 is swept over the wavelength range of the passband of filter 240 to determine the central wavelength of filter 240. Referring to FIG. 6, this passband is represented generally in graph 550 as the plot 560. As the temperature of wafer changes, the passband shifts, for example, to the left as illustrated by plot 580. This results in a displacement of the central wavelength by an amount 565. During film growth, the laser frequency sweeping continues and the change in the central wavelength is tracked, measuring the variations in temperature. By relying on the known properties of filter 240 (e.g., the location of the center of the passband as a function of temperature), the precise change in the temperature and the absolute temperature of wafer 220 is known. Referring to FIG. 7, the effects of these variations upon the wafer monitoring beam can then be determined, as shown by plot 630, and then removed by signal processing 640, resulting in processed data 650 useful in monitoring the fabrication of thin films. Processing 640 can be subtracting plot 630 from plot 620, or include more complicated mathematical operations. [0046] There is another approach to obtaining precise temperature data using the second beam architecture. Referring again to FIG. 3, laser 255 is swept over the passband of filter 240 to determine the central wavelength of filter 240 and the shape of the passband. Referring to FIG. 6, this passband is represented generally in graph 550 as the plot 560. Then the laser is tuned to and fixed at wavelength 570 at the edge of the passband. As the temperature drifts and the passband shifts left as demonstrated by plot 580, the signal reflected by filter 240 changes, resulting in a signal difference 585. [0047] By monitoring the strength of the signal reflected by filter 240, the direction and magnitude of the shift in the position of the central wavelength is known, and the effects of the temperature variations of the wafer can then be subtracted out of the signal collected by photodetector 350. This accurate temperature information is acquired without any physical contact of the wafer 220. [0048] In employing the third or fourth monitoring method to collect data containing information regarding temperature, algorithms can be used to further reduce temperature-related noise in the signal detected by photodetector 350 of FIG. 3. Referring to FIG. 7, raw data from photodetector 350 can be represented by plot 620. Raw data from photodetector 355 are represented by plot 630. Data 620 have some noise due to the unstable temperature in chamber 210. Data 630 contain information about the temperature fluctuation, but data 630 also are correlated to the noise in data 620 because filter 240 is thermally sensitive. Exploiting this correlation, the temperature noise in the processed signal 650 is reduced by signal processing 640 to remove these effects, resulting in processed data 650 useful in monitoring the fabrication of thin films. Processing 640 can be subtracting plot 630 from plot 620, or include more complicated mathematical operations. [0049] The dual beam architecture and the signal processing techniques can also be used in transmission mode in-situ monitoring systems. [0050] The equipment and methods described herein are particularly well suited for fabricating the thermo-optically tunable thin film optical filters described in U.S. Ser. No. 10/174,503, filed Jun. 17, 2002, and U.S. Ser. No. 10/211,970, filed Aug. 2, 2002. When used to fabricate those filters, the reference used in the approach of FIG. 3 can be a thermo-optically tunable filter of the very same type that is being fabricated. Thus, its characteristics and response to temperature variations will be very similar to that of the filter being fabricated. In addition, because the filters have transmission/reflection characteristics that very substantially with temperature, the monitoring wavelength should be selected to be located relative to where the passband is located at the higher fabrication temperatures. For example, if substrate is at 200 C, then that means the passband will have shifted by a substantial amount from where it is located at room temperature. Thus, the wavelengths of the measurement beam and the reference beam should be shifted accordingly so that they are located either at the edge of the passband or at its center, whichever is appropriate for the signal processing technique that is being used. [0051] It should also be understood that the monitoring approaches and various of signal processing approaches can be used in combination within the same system. DESCRIPTION OF DRAWINGS [0011]FIG. 1 illustrates a PECVD reactor with an in-situ monitoring system. [0012]FIG. 2 illustrates an embodiment of a monitoring system for monitoring film growth on a wafer. [0013]FIG. 3 illustrates a second embodiment of a monitoring system for monitoring film growth on a wafer. [0014]FIG. 4 illustrates how interference fringes shift with temperature changes. [0015]FIG. 5 illustrates one way that data are generated from the signals coming from the in-situ monitoring system. [0016]FIG. 6 illustrates how the monitored reference signal changes as a function of temperature. [0017]FIG. 7 illustrates how thermal noise is removed from the monitored signal. TECHNICAL FIELD [0002] This invention relates to in-situ monitoring of thin film growth. BACKGROUND [0003] A new category of optical filter has been designed. This new optical filter is thermo-optically tunable and constructed of multiple thin films to produce one or more Fabry-Perot cavities, which function as an optical interference filter. These filters have been fabricated in a plasma enhanced chemical vapor deposition (�PECVD�) reactor, by changing the gas compositions that enter the reactor at precise times in order to form the thin-film layers with precisely controlled thicknesses. They are described in U.S. Ser. No. 10/174,503, filed Jun. 17, 2002, and U.S. Ser. No. 10/211,970, filed Aug. 2, 2002, both of which are incorporated herein by reference. SUMMARY [0004] In general, in one aspect, the invention features an apparatus for depositing films on a substrate. The apparatus includes: a plasma deposition chamber having an input window and an output window and also having a first electrode and a second electrode that defines a target plane in which the substrate is held during deposition, and wherein during deposition a plasma is sustained between the first and second electrodes; and a monitoring system which includes a light source and an optical detector, both located outside of the deposition chamber. The optical monitoring system further includes an optical system that directs a beam from the light source through the input window and into the deposition chamber as a measurement beam, wherein the measurement beam arrives at the target plane along a path that is approximately normal to the target plane and wherein during operation the measurement beam interacts with the substrate to generate a return measurement beam that passes from the substrate out of the chamber through the output window, wherein the optical system directs the measurement return beam onto the optical detector. [0005] Other embodiments include one or more of the following features. The light source is a laser, e.g., a tunable laser. The plasma deposition chamber is a PECVD chamber, wherein the first electrode is a showerhead through which process gases are introduced into the chamber during operation to form a film on a surface of the substrate. The second electrode has a hole extending therethrough, wherein the hole is located in the second electrode behind a position in which the substrate is held during operation. The input window is located behind the second electrode so that the measurement beam passing through the input window passes through the hole and impinges on the backside of the substrate. In some embodiments, the input window and the output window are located on the same side of the second electrode and the measurement return beam is a reflected beam produced by the measurement beam interacting with the substrate. In some of those embodiments, the input window is the output window. In other embodiments, the output and input windows are located on opposite sides of the second electrode and the measurement return beam is a transmitted beam produced by the measurement beam interacting with the substrate. [0006] In still other embodiments, the optical monitoring system further includes a coupler that splits a beam from the light source into first and second beams that are spaced apart, wherein the optical system directs the first beam into the deposition chamber as the measurement beam and the second beam into the chamber as a reference beam. The optical monitoring system also includes a second detector located outside of the deposition chamber and wherein during operation the reference beam produces within the chamber a reference return beam that passes out of the output window, and the optical system directs the reference return beam onto the second detector. In some of the embodiments, the optical system includes a second detector and an optical splitter that splits the beam from the light source into first and second beams, wherein the optical system directs the first beam into the deposition chamber as the measurement beam and the second beam onto the second detector. The monitoring system further includes a second light source and the optical system directs light from the second light source through the input window into the deposition chamber as a reference beam that is spaced apart from the measurement beam. The monitoring system also includes a second detector located outside of the deposition chamber and wherein during operation the reference beam produces within the chamber a reference return beam that passes out of the output window, and wherein said optical system directs the reference return beam onto the second detector. [0007] In general, in another aspect, the invention features a method of monitoring film thickness on a substrate during deposition. The method includes: in a plasma deposition chamber, plasma depositing a film onto a surface of the substrate; while the film is being deposited, introducing a measurement beam into the deposition chamber from outside of the deposition chamber; delivering the measurement beam to the substrate from a direction that is approximately normal to said surface of the substrate; interacting the measurement beam with the substrate to generate a measurement return beam; delivering the measurement return beam to outside of the deposition chamber; and detecting the measurement return beam that has exited from the deposition chamber. [0008] Other embodiments include one or more of the following features. Plasma depositing also involves introducing a process gas into the plasma and forming the film from the process gas. Interacting the measurement beam with the substrate involves reflecting the measurement beam off of the substrate. Introducing the measurement beam into the deposition chamber involves passing the measurement beam through an input window in the plasma deposition chamber. Delivering the measurement return beam to outside of the plasma deposition chamber involves passing the measurement return beam through an output window in the plasma deposition chamber. The output window is the input window. The method also includes: while the film is being deposited, introducing a reference beam into the deposition chamber from outside of the chamber, the reference beam being spaced apart from the measurement beam inside of the chamber; providing a reference inside of the chamber; interacting the reference beam with the reference to generate a reference return beam; delivering the reference return beam to outside of the deposition chamber; and detecting the reference return beam that has exited from the deposition chamber. The reference is a mirror and wherein interacting the reference beam with the reference involves reflecting the reference beam off of the mirror to generate the reference return beam. The method also involves using the detected reference return beam to compensate for fluctuations in the detected measurement beam due to fluctuations in the measurement beam. The method also involves using both the detected measurement return beam and the detected reference return beam to determine thickness of the film as it is being deposited, wherein the detected reference return beam is used to compensate for changes in detected measurement beam that are due to changes in the measurement beam. [0009] Other embodiments may also include one or more of the following features. The reference is a thermally tunable optical filter, and the method further involves using the detected reference return beam to compensate for changes in the detected measurement beam due to changes in temperature of the substrate. Interacting the reference beam with the reference involves reflecting the reference beam off of the thermally tunable optical filter to generate the reference return beam. The reference is a thermally tunable optical filter and the method further involves using both the detected measurement return beam and the detected reference return beam to determine thickness of the film as it is being deposited, wherein the detected reference return beam is used to compensate for changes in the detected measurement beam that are due to changes in temperature of the substrate. The method further includes putting the reference into thermal contact with the substrate. Putting the reference into thermal contact with the substrate involves resting the reference against the backside of the substrate. [0010] The details of one or more embodiments of the invention are set forth in the accompanying drawings and the description below. Other features, objects, and advantages of the invention will be apparent from the description and drawings, and from the claims.
Referenced byCiting PatentFiling datePublication dateApplicantTitleUS7408645Feb 23, 2006Aug 5, 2008Baker Hughes IncorporatedMethod and apparatus for a downhole spectrometer based on tunable optical filtersUS7470894May 15, 2006Dec 30, 2008Honeywell International Inc.Multi-substrate package assemblyUS7586114Jun 28, 2007Sep 8, 2009Honeywell International Inc.Optical cavity system having an orthogonal inputUS7649189Jun 11, 2008Jan 19, 2010Honeywell International Inc.CRDS mirror for normal incidence fiber optic couplingUS7656532Apr 16, 2007Feb 2, 2010Honeywell International Inc.Cavity ring-down spectrometer having mirror isolationUS7663756Jul 21, 2008Feb 16, 2010Honeywell International IncCavity enhanced photo acoustic gas sensorUS7902534Sep 18, 2008Mar 8, 2011Honeywell International Inc.Cavity ring down system having a common input/output portUS8347813 *Dec 10, 2008Jan 8, 2013Asm Genitech Korea Ltd.Thin film deposition apparatus and method thereofUS20090155452 *Dec 10, 2008Jun 18, 2009Asm Genitech Korea Ltd.Thin film deposition apparatus and method thereof* Cited by examinerClassifications U.S. Classification118/712International ClassificationG01N21/00Cooperative ClassificationC23C16/52, G02B7/008, G01B11/0683, H01J37/32972, H01J2237/2482, G02B5/285European ClassificationH01J37/32S4H, G01B11/06C12, C23C16/52Legal EventsDateCodeEventDescriptionSep 20, 2004ASAssignmentOwner name: AEGIS SEMICONDUCTOR, INC., MASSACHUSETTSFree format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MA, EUGENE YI-SHAN;WU, MING;REEL/FRAME:015150/0245Effective date: 20040810RotateOriginal ImageGoogle Home - Sitemap - USPTO Bulk Downloads - Privacy Policy - Terms of Service - About Google Patents - Send FeedbackData provided by IFI CLAIMS Patent Services©2012 Google

value: This website is a search engine provided by Google. Handling over 3.5 billion searches per day, it has a 92% share of the global search engine market.


text:
Grand & La Pace Hotel, Montecatini Terme, Italy - Booking.com
Well stayed there for our one year mariage,the night staff Maurizio had absolutely no class and was a horrible little man with no clue how to do his job it was sad to see him represent such a place that we had so much expectation as we arrived at the hotel that we thought they would have offered a much more memorable time for us ,,we will never return and warn anybody to not expect the same as some of the other famous hotels have to offer at this one,and the hotel is locked down in traffic limit zone all around the hotel with big fines that come with them "thats the Italian way"
Wir konnten das Zimmer wechseln - Gott sei Dank, sonst wären wir ausgezogen.
Hotel dal fascino antico con camere finemente ristrutturate, accoglienti e moderne, Spa rilassante, Staff cordiale, buona colazione, buon rapporto qualità-prezzo.
Мы отдыхаем в этом отеле 10лет! Нам очень нравится персонал на рецепции ! Всегда готовы помочь и разрешить любую проблему! Нравиться атмосфера этого отеля!
Todo. La situación, el entorno, la amabilidad del personal. Es un gran hotel con buena relación calidad-precio. Se puede repetir .
The spa features a heated swimming pool, steam bath, hydrotherapy showers and massage chairs. You will have discounts at Montecatini Golf Club 6.8 miles away. This is our guests' favorite part of Montecatini Terme, according to independent reviews.
Grand Hotel & La Pace Spa has been welcoming Booking.com guests since Nov 11, 2009
The most recent booking for this hotel was made on Feb 15 at 1:08 PM from Russia.
1 hotel like Grand Hotel & La Pace Spa was just booked on our site
5 Reasons to Choose Grand Hotel & La Pace Spa
See the 30 best hotels in Montecatini Terme, based on 18,771 verified hotel reviews on Booking.com.
“Location,big rooms,very clean,big near attraction and restaurants”
Customers who viewed Grand Hotel & La Pace Spa also viewed:
Offering a free outdoor pool and fitness centre, Hotel Montecatini Palace overlooks Montecatini Terme. This 5-star hotel dates back to 1910 and boasts an elegant, Art-Nouveau design. WiFi is free. Most recent booking for this hotel was today at 13:34
The Grand Hotel Tettuccio is situated in the heart of Tuscany, on the prestigious Viale Verdi of Montecatini Terme. Most recent booking for this hotel was today at 14:19
This comfortable and modern establishment has recently-renovated community spaces and is situated in the green oasis at the foot of the hill upon which Montecatini is built. Most recent booking for this hotel was today at 16:55
» Grand Hotel & La Pace Spa in Montecatini Terme
눉Breakfast dos not match the quality of the hotel (no fresh orange, poor fruit selection and bad eggs). Staff slow at breakfast to bring coffee. Also Breakfast room a little clinical. Pool area needed some attention.눇Amazing rooms and hotel beautiful. Reception staff were excellent.
눉Sunbeds at pool not always available and some reserved for people who didn't use them till the afternoon leaving them empty all morning while others had no bed at all. The cause of several unpleasant altercations between guests and the pool attendant.눇Style, genteel, luxurious yet very comfortable, service attentive without being ostentatious. Very clean, constant changes of sheets and towels. Lovely pool and garden, breakfast at fresco.
눉in need of a big refurbishment. the whole place is very tired.눇incredible building
눉Waiting staff could have done with not being so serious.눇Staff very helpful. Spoke good English. Wanted to give us fresh towels twice a day.
눉Everything is perfect눇Outstanding property. Colonial Royal.
눉Interior "spa" is a joke with one pool and one steam sauna. It was shocking to see a young couple at the breakfast table with their own brought cereal and squezzed juices. But soon we realized what was it for: Breakfast was disappointing with cheap juices, tasteless omelette, and also with low budget cold cuts.눇Nice room. Nice building.
“Adequate and reasonable value”
눉Air conditioning in room very poor.
Gym did not open until 10 am which is far too late.
Need mossie spray.눇Good location and pool
“Overall liked the hotel.”
눉Waiter charging us 8 euro for small dish of fruit on top of 10 euro at small salad bar as it was not clear fruit wasn't included in salad bar at restaurant lunch poolside. Also waiter was very unfriendly. Also man at desk gave us wrong info as to hours of thermal baths. We walked over there but they were closed. A front desk person should have hours for services town is famous for.눇Comfy beds. Nice pool.
“Maurizio the bitter little man,,,,,,,,,,,,,,,,,,,,,,,,,”
눉Well we stayed there for our year anniversary,the night staff Maurizio had absolutely no class and was a horrible little man with no clue how to do his job it was sad to see him represent such a place that we had so much expectation as we arrived at the hotel that we thought they would have offered a much more memorable time for us,,we will never return and warn anybody to not expect the same as some of the other famous hotels have to offer at this one,and the hotel is locked down in traffic limit zone all around the hotel with big fines that come with them "that's the Italian way"as Maurizio explained it눇Well stayed there for our one year mariage,the night staff Maurizio had absolutely no class and was a horrible little man with no clue how to do his job it was sad to see him represent such a place that we had so much expectation as we arrived at the hotel that we thought they would have offered a much more memorable time for us ,,we will never return and warn anybody to not expect the same as some of the other famous hotels have to offer at this one,and the hotel is locked down in traffic limit zone all around the hotel with big fines that come with them "thats the Italian way"
“Very clean and very big rooms”
“Exellent location, but very old, slightly renovated rooms”
• Senior Suite with Spa Access
눉Very slow service at breakfast눇Good room service
눉House keeping눇Spa menu
206934,207375,203228,205736,203398,203225,204809,206364,198582,206177,201682,206882,201380|3,193868,203700,203218,184105|2,206171,205697,196924,205106,184105|6,207480|1,190946,207483,207480,204355,198584,204545,206364|3,205710,204377,203433,200404,207092,207411,202398,207507,207723,193105,205101,204386,201964,198381,200497,205080,207045,207740,205512,205066,204534,190781,205969,204742,203454|1,195969,201380,205164,206562,204807,207513,206081,203220,207205,185503,205710|1,204909,203207|2,206630,198094,204536,197779,200950,207884,205610,204450,184105,197367,195564,201691,204587,207217,202643,206364|2,200322,207609,204284,207041,204562,195650,202717,202060,206104,203002|1,206291,205401,203207|8,205054,205443,206930,203207,204321,203396,196662,206793,205232,207473,203207|1,204547,203359,206177|4,193924,204124,205677,207745,207077,194153,203056,204913,203002,201523,199682,197382,203454,203206,202145,205682,206291|1,204311,204265

type: global

value: This website is a Dutch online travel agency for lodging reservations & other travel products, and a subsidiary of Booking Holdings. It is headquartered in Amsterdam.The website has over 28 million listings.


text:
Amazon.co.uk: Katie mac's review of Consuming Passions: Leisure and Pleasure i...
Detailed history, 8 April 2013
This review is from: Consuming Passions: Leisure and Pleasure in Victorian Britain (Hardcover)
Flanders provides a broad picture of the topic, revealing a fair amount of insight into the lives of our ancestors, before technology! Useful to historians, researchers and writers, and those who just want to know.
Consuming Passions: Leisure and Pleasure in Victorian Britain 0007172958
Top Reviewer Ranking: 602,412

value: This website is an American multinational technology company which focuses on e-commerce, cloud computing, digital streaming, and artificial intelligence.


text:
Vancouver Theme & Amusement Parks - Deals in Vancouver, BC | Groupon
Theme & Amusement Parks in Vancouver Tweet
C$10 for a Triple the Fun Pass with Go-Karts, Mini Golf, and Batting Cages at All Fun Recreation Park (C$20 Value)

value: This website is an American global e-commerce marketplace connecting subscribers with local merchants by offering activities, travel, goods and services in 15 countries. Based in Chicago, Groupon was launched there in November 2008, launching soon after in Boston, New York City and Toronto.


text:
P. 1A letter to Elie Wiesel from Sheikh Jarrah activistsA letter to Elie Wiesel from Sheikh Jarrah activistsRatings: 5.0 (1)|Views: 612|Likes: 5Published by Yuval Drier ShiloA letter sent to author Elie Wiesel by a group of Israeli peace activists, in response to his public letter to president Obama clamming Jerusalem to be "above politics".A letter sent to author Elie Wiesel by a group of Israeli peace activists, in response to his public letter to president Obama clamming Jerusalem to be "above politics".More info:Categories:Types, Books - Non-fiction, PoliticsPublished by: Yuval Drier Shilo on Apr 22, 2010Copyright:Attribution Non-commercialAvailability:Read on Scribd mobile: iPhone, iPad and Android.download as PDF, TXT or read online from ScribdFlag for inappropriate content|Add to collectionSee moreSee lesshttps://www.scribd.com/doc/30362703/A-letter-to-Elie-Wiesel-from-Sheikh-Jarrah-activists05/12/2010pdftextoriginal From Jerusalem, an open letter to Elie Wiesel
Dear Mr. Wiesel,We write to you from Jerusalem to convey our frustration, even outrage, at your recently published letter on Jerusalem. We are Jewish Jerusalemites – residents by choice of a battered city, a city used and abused, ransacked time and again first by foreignconquerors and now by its own politicians. We cannot recognize our city in thesentimental abstraction you call by its name.Our Jerusalem is concrete, its hills covered with limestone houses and pine trees; itsstreets lined with synagogues, mosques and churches. Your Jerusalem is an ideal, anobject of prayers and a bearer of the collective memory of a people whose membersactually bear many individual memories. Our Jerusalem is populated with people, youngand old, women and men, who wish their city to be a symbol of dignity - not of hubris,inequality and discrimination. You speak of the celestial Jerusalem; we live in the earthlyone.For more than a generation now the earthly city we call home has been crumbling under the weight of its own idealization. Your letter troubles us, not simply because it is repletewith factual errors and false representations, but because it upholds an attachment tosome other-worldly city which purports to supersede the interests of those who live in thethis-worldly one. For every Jew, you say, a visit to Jerusalem is a homecoming, yet it isour commitment that makes your homecoming possible. We prefer the hardship of realizing citizenship in this city to the convenience of merely yearning for it.Indeed, your claim that Jerusalem is above politics is doubly outrageous. First, becausecontemporary Jerusalem was created by a political decision and politics alone keeps itformally unified. The tortuous municipal boundaries of today’s Jerusalem were drawn byIsraeli generals and politicians shortly after the 1967 war. Feigning to unify an ancientcity, they created an unwieldy behemoth, encircling dozens of Palestinian villages which
were never part of Jerusalem. Stretching from the outskirts of Ramallah in the north tothe edge of Bethlehem in the south, the Jerusalem the Israeli government foolishlyconcocted is larger than Paris. Its historical core, the nexus of memories and religioussignificance often called “the Holy Basin”, comprises a mere one percent of its area. Nowthey call this artificial fabrication ‘Jerusalem’ in order to obviate any approaching chancefor peace.Second, your attempt to keep Jerusalem above politics means divesting us of a future. For being above politics is being devoid of the power to shape the reality of one’s life. Astrue Jerusalemites, we cannot stand by and watch our beloved city, parts of which areutterly neglected, being used as a springboard for crafty politicians and sentimental populists who claim Jerusalem is above politics and negotiation. All the while, theyfranticly “Judaize” Eastern Jerusalem in order to transform its geopolitics beyondrecognition.We invite you to our city to view with your own eyes the catastrophic effects of thefrenzy of construction. You will witness that, contrary to some media reports, Arabs are
not allowed to build their homes anywhere in Jerusalem. You discover see the grossinequality in allocation of municipal resources and services between east and west. Wewill take you to Sheikh Jarrah, where Palestinian families are being evicted from their homes to make room for a new Jewish neighborhood, and to Silwan, where dozens of houses face demolition because of the Jerusalem Municipality’s refusal to issue building permits to Palestinians.We, the people of Jerusalem, can no longer be sacrificed for the fantasies of those wholove our city from afar. This-worldly Jerusalem must be shared by the people of the twonations residing in it. Only a shared city will live up to the prophet’s vision: “Zion shall be redeemed with justice”. As we chant weekly in our vigils in Sheikh Jarrah: “Nothingcan be holy in an occupied city!”Respectfully,Just Jerusalem (Sheikh Jarrah) Activists
Ada Bilu2.
Alon Harel3.
Amiel Vardi4.
Amit Lavi5.
Amit Miller 6.
Amos Goldberg7.
Ariela Brin8.
Assaf Sharon9.
Avichay Sharon10.
Avishai Margalit11.
Avital Abudi12.
Avital Sharon13.
Avner Inbar 14.
Avrum Burg15.
Barbara Spectre16.
Bernard Avishai17.
Daniella Gordon18.
Dani Schrire19.
Daniel Argo20.
Danny Felsteiner 21.
Daphna Stroumsa22.
David Shulman23.
Diana Steigler 24.
Dolev Rahat25.
Dorit Gat26.
Dorit Argo27.
Edna Ulman-Margalit28.
Eitan Buchvall29.
Eli Sharon30.
Freddie Rokem31.
Activity (3)FiltersAdd to collectionReviewAdd NoteLikeShowingAllMost RecentReviewsAll NotesLikesYou've already reviewed this. Edit your review.Rating 0/5Post notePost reviewPost replyPost note and like1 thousand reads1 hundred readsfrghyju liked thisLoad more
More From This UserA7fbe2677-5a99-4b55-ba40-a2d55bb02af9Yuval Drier Shiloאבנר דה שליט : הוראת תאוריה דמוקרטית וניטרליות אקדמיתYuval Drier Shiloמצגת על מזרח ירושלים ושייח' ג'ראחYuval Drier Shiloסיסמאות שייח' ג'ראח + לא נפסיק לשירYuval Drier ShiloElie Wiesel(2)Yuval Drier Shilo

value: This website is an American e-book and audiobook subscription service that includes one million titles.


text:
Patent US5907281 - Swimmer location monitor - Google PatentsSearch Images Maps Play YouTube News Gmail Drive More »Sign inAdvanced Patent SearchPatentsA system is disclosed for locating swimmers who could be in danger of drowning, as determined by preset parameters such as the time duration that they remain at a depth where breathing is impossible. In this system, each individual swimmer wears a Swimmer Location Monitor (SLM). This is a miniature electronic...http://www.google.com/patents/US5907281?utm_source=gb-gplus-sharePatent US5907281 - Swimmer location monitorAdvanced Patent SearchPublication numberUS5907281 APublication typeGrantApplication numberUS 09/072,680Publication dateMay 25, 1999Filing dateMay 5, 1998Priority dateMay 5, 1998Fee statusLapsedAlso published asWO1999057696A1Publication number072680, 09072680, US 5907281 A, US 5907281A, US-A-5907281, US5907281 A, US5907281AInventorsBenjamin K. Miller, Jr., James E. Halwachs, Arnold J. FarstadOriginal AssigneeJohnson Engineering CorporationExport CitationBiBTeX, EndNote, RefManPatent Citations (23), Referenced by (30), Classifications (9), Legal Events (7) External Links: USPTO, USPTO Assignment, EspacenetSwimmer location monitorUS 5907281 AAbstract A system is disclosed for locating swimmers who could be in danger of drowning, as determined by preset parameters such as the time duration that they remain at a depth where breathing is impossible. In this system, each individual swimmer wears a Swimmer Location Monitor (SLM). This is a miniature electronic device that not only determines the extent of the swimmer's danger but also emits an electromagnetic alarm signal whenever such a danger exists. At each occurrence, an alarm, which may be audible and/or visual, is sounded on the surface while the swimmer's location is tracked in real time from the signals received on an antenna network deployed along the bottom of the swimming area. These signals are combined in a central processor and the computed real-time location is displayed graphically on a monitor to guide the guard personnel in rescue operations. The invention is intended for use in pools, beaches, water parks and other swimming areas.
Patent CitationsCited PatentFiling datePublication dateApplicantTitleUS3602877 *Jan 3, 1969Aug 31, 1971Honeywell IncUnderwater position determining systemUS3953843 *May 9, 1974Apr 27, 1976General Scanning Devices, Inc.Swimming pool alarmUS3969712 *May 25, 1973Jul 13, 1976Applied Systems LaboratoriesPool alarmUS4079364 *Aug 11, 1976Mar 14, 1978James D. Pauls & Associates, Ltd.Water safety alarm apparatusUS4121200 *Jul 22, 1976Oct 17, 1978Colmenero Gustavo TSwimming pool alarm systemUS4187502 *Dec 12, 1977Feb 5, 1980Beverly Frank OSwimming pool alarm systemUS4305143 *Aug 8, 1979Dec 8, 1981Simms Larry LAutomatic man overboard sensor and rescue systemUS4307449 *Jun 5, 1979Dec 22, 1981Montres Rolex S.A.Electronic time-counter for the divingUS4336591 *Jul 7, 1980Jun 22, 1982The United States Of America As Represented By The Secretary Of The NavyMaximum depth monitoring apparatusUS4337527 *Sep 29, 1971Jun 29, 1982The United States Of America As Represented By The Secretary Of The NavyAcoustic Doppler detectorUS4459689 *Dec 28, 1981Jul 10, 1984Polaroid CorporationIntrusion monitoring apparatusUS4549169 *Dec 6, 1982Oct 22, 1985Kelmar Marine Inc.Personal ocean security systemUS4635242 *Jul 20, 1984Jan 6, 1987Hart James EUnderwater signalling deviceUS4747085 *Feb 24, 1986May 24, 1988Gerald W. DuneganMethod and apparatus for monitoring swimming poolsUS4932009 *Mar 10, 1989Jun 5, 1990Sonar International, Inc.Apparatus and method for detecting swimmersUS4949072 *Mar 3, 1988Aug 14, 1990Ernest ComerfordDive parameter indicating assemblyUS4999606 *Jun 25, 1990Mar 12, 1991Ernest ComerfordUnderwater transmitter/receiverUS5006831 *Sep 19, 1989Apr 9, 1991Thomson-CsfDevice providing for the safety of a man overboardUS5019822 *Jul 9, 1973May 28, 1991The United States Of America As Represented By The Secretary Of The NavyMarine object detectorUS5049859 *Oct 9, 1990Sep 17, 1991Karla J. RoffeeWater entry alarm systemUS5097254 *Sep 21, 1990Mar 17, 1992Merrithew Walter FSwimmer protection and pool safety warning deviceUS5408222 *Sep 10, 1993Apr 18, 1995Yaffe; YacobDevice for warning when a person is submerged beneath waterUS5619187 *Sep 25, 1995Apr 8, 1997Serfontein; Marius P.Warning device* Cited by examinerReferenced byCiting PatentFiling datePublication dateApplicantTitleUS6111510 *Sep 15, 1999Aug 29, 2000Coffelt, Jr.; Louis ArthurMethod of drowning detectionUS6114832 *Feb 25, 1999Sep 5, 2000Polar Electro OyCharging method and charging arrangementUS6154140 *Oct 4, 1999Nov 28, 2000The United States Of America As Represented By The Secretary Of The NavyIntelligent personal underwater monitoring deviceUS6476721 *Oct 5, 1999Nov 5, 2002Diel Marketing (Pty) Ltd.Alarm arrangementUS6618059 *Jun 10, 1999Sep 9, 2003Seiko Epson CorporationDiver's information display deviceUS7088236Jun 25, 2003Aug 8, 2006It University Of CopenhagenMethod of and a system for surveillance of an environment utilising electromagnetic wavesUS7388512Sep 2, 2005Jun 17, 2008Daniel F. Moorer, Jr.Diver locating method and apparatusUS7554453Dec 22, 2006Jun 30, 2009Thermocline Ventures LlcWater alarm devices, systems and related methodsUS7642921Jul 18, 2008Jan 5, 2010Aquatic Safety Concepts, LLCElectronic swimmer monitoring systemUS7690897Oct 13, 2006Apr 6, 2010A.O. Smith CorporationController for a motor and a method of controlling the motorUS8022830 *Jun 10, 2010Sep 20, 2011Ping-Hsun YangLifeguard alarm system for a swimming poolUS8133034Feb 7, 2006Mar 13, 2012Regal Beloit Epc Inc.Controller for a motor and a method of controlling the motorUS8144020May 29, 2009Mar 27, 2012Thermocline Ventures, LlcWater alarm devices, systems and related methodsUS8177519Jul 21, 2009May 15, 2012Regal Beloit Epc Inc.Controller for a motor and a method of controlling the motorUS8177520Apr 8, 2005May 15, 2012Regal Beloit Epc Inc.Controller for a motor and a method of controlling the motorUS8208345 *Jan 15, 2010Jun 26, 2012Hon Hai Precision Industry Co., Ltd.Personal water safety device and method thereofUS8281425Nov 1, 2005Oct 9, 2012Cohen Joseph DLoad sensor safety vacuum release systemUS8282361Jul 21, 2009Oct 9, 2012Regal Beloit Epc Inc.Controller for a motor and a method of controlling the motorUS8313306Oct 2, 2009Nov 20, 2012Pentair Water Pool And Spa, Inc.Method of operating a safety vacuum release systemUS8353678Jul 21, 2009Jan 15, 2013Regal Beloit Epc Inc.Controller for a motor and a method of controlling the motorUS8354809Sep 24, 2009Jan 15, 2013Regal Beloit Epc Inc.Controller for a motor and a method of controlling the motorUS8360736Mar 31, 2010Jan 29, 2013Regal Beloit Epc Inc.Controller for a motor and a method of controlling the motorUS8374055 *Jun 19, 2009Feb 12, 2013The United States Of America, As Represented By The Secretary Of The NavyAcoustic communication and locating devices for underground minesUS8508382Feb 22, 2011Aug 13, 2013John C. NovakLight emitting inflatable safety beaconEP2249322A1 *Apr 27, 2009Nov 10, 2010Ping-Hsun YangLife saving and warning system for a swimming poolEP2395491A1 *Jun 3, 2011Dec 14, 2011Ping-Hsun YangLifeguard alarm system for a swimming poolEP2701130A1Jul 30, 2013Feb 26, 2014Safety Cap XXI, S.L.Drowning prevention systemWO2007015088A1 *Aug 2, 2006Feb 8, 2007Sentag LtdA portable bather monitoring device and a waterside monitoring systemWO2009015060A2 *Jul 21, 2008Jan 29, 2009Aquatic Safety Concepts LlcElectronic swimmer monitoring systemWO2012107620A1 *Feb 7, 2012Aug 16, 2012Fernandez Alcala AlfredoEquipment for determining and monitoring physical exercise and technique in swimming* Cited by examinerClassifications U.S. Classification340/573.6, 367/141, 340/573.1, 340/539.26, 367/131, 340/539.1International ClassificationG08B21/08Cooperative ClassificationG08B21/088European ClassificationG08B21/08WLegal EventsDateCodeEventDescriptionJul 17, 2007FPExpired due to failure to pay maintenance feeEffective date: 20070525May 25, 2007LAPSLapse for failure to pay maintenance feesDec 13, 2006REMIMaintenance fee reminder mailedDec 23, 2002SULPSurcharge for late paymentDec 23, 2002FPAYFee paymentYear of fee payment: 4Dec 11, 2002REMIMaintenance fee reminder mailedMay 5, 1998ASAssignmentOwner name: JOHNSON ENGINEERING CORPORATION, TEXASFree format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MILLER, JR., BENJAMIN K.;HALWACHS, JAMES E.;FARSTAD, ARNOLD J.;REEL/FRAME:009193/0668;SIGNING DATES FROM 19980327 TO 19980408RotateOriginal ImageGoogle Home - Sitemap - USPTO Bulk Downloads - Privacy Policy - Terms of Service - About Google Patents - Send FeedbackData provided by IFI CLAIMS Patent Services©2012 Google


text:
1.The Original Konfidence Children's Sw...
�19.78 - �24.99 2.Intex Explorer K2 Kayak - Yellow/Black
�169.99 �85.27 9 new from �85.27
3.Splash About Kids Neoprene Float Jack...
�15.00 - �137.80 4.Adult 50N and CHILD 30-50N SOLES UP F...
�19.99 - �34.99 5.Sevylor Riviera Inflatable Two Person...
�149.99 �78.53 13 new from �78.53
6.FLY ADULT 50n BUOYANCY AID life Jacke...
�19.99 7.Helly Hansen Sport II Buoyancy Aid
�17.04 - �33.00 �12.48 8.Sevylor KC Compact 215 Convertible Pa...
�39.95 �32.54 10 new from �29.70
9.Sevylor Inflateable Kayak Skeg (suita...
�19.99 �17.95 2 new from �17.95
10.Adult Inflatable Life Vest Jacket Gre...
�13.99 11.Baltic Standard Velcro Fastening Pet...
�17.99 - �32.99 12.Bravo Canoe/Kayak Paddle - Silver, 225cm
�14.95 13.Leader International Sport I Buoyancy...
�29.49 - �43.99 �26.49 - �28.49 14.ZJchao Children and Adult Life Jacket...
�13.99 - �16.99 15.Docooler Adult Life Jacket Aid Buoyan...
�11.89 16.Helly Hansen Rider Vest Buoyancy Aid
�27.50 - �69.00 17.Marinepool CHILDS 100n Buoyancy Lifej...
�27.16 - �34.95 18.Self-Adhesive Foam Roll for various u...
�14.99 �8.39 2 new from �8.39
19.Paddle Leash - TWIN PACK - Fantastic...
20.TBF 100N Life Jacket (Hi Vis Orange)...
�19.99 1-20
About Best Sellers in Kayaking These lists, updated hourly, contain best-selling items.
Most Wished For›See Top 100 Intex Explorer K2 Kayak - Y... �85.27 Sevylor Riviera Inflatable... �78.53 Bluefin Single Sit On Top F... �259.99 - �399.99 Most Gifted›See Top 100 Sevylor Riviera Inflatable... �78.53 Intex Explorer K2 Kayak - Y... �85.27 Splash About Kids Neoprene... �15.00 - �137.80 Back to top


text:
Martin Johnson Obituary - Juneau, AK | Juneau Empire
Martin Hugh "Poiken" Johnson Sr (1921 - 2016)
"Martin was a great man with a warm and generous heart. I..."
"Our thoughts are with Marty's family. Bob and Betty mcVey"
Martin Hugh "Poiken" Johnson, Sr., who over his nearly 95 years was a commercial fisherman, pilot, trapper, prospector, carpenter, soldier and musher, died Sept. 4, with family members by his side.
He was born Dec. 1, 1921, in Naknek, the son of Charles August Johnson, a sailor from Denmark, and Sarah Jennie McGlashan, of Akutan. When he was 19 his father died, and Martin, the oldest son of 14 children, took over responsibility for raising the younger ones.
He learned at an early age to work hard to help support his large family. He fished, hunted, trapped, and used dog sleds to fetch water for the home. Martin learned how to set-net when he was 14, and after that fished sailboats – hard work that gave him an iron grip until the day he died.
He attended school in Naknek through eighth grade, the highest grade available in Naknek at that time. He enlisted in the U.S. Army Aug. 15, 1944, and was discharged July 9, 1946, with a World War II Victory Medal and an Asiatic Pacific Theater Ribbon.
After the war, Martin returned to construction, working for a time in Anchorage. Once a torch that a member of the crew had filled with gasoline instead of kerosene blew up in his face, and he spent a long time in the hospital.
As a child he and his brothers had seen their first float plane – a "flying boat!" – and in Anchorage Martin decided to learn to fly, working for Jack Parr Air in exchange for lessons. His first plane was a Taylorcraft, and he flew a Gull Wing Stinson from Kansas to Anchorage in the 1940s. When he moved back to Naknek he and family members formed the Tundra Flying Club. He fished summers and worked construction the rest of the year.
It was while working on a new public health clinic in Naknek that he met the new clinic nurse, Bertha Bloomer. He was smitten, and he courted her for a year after she transferred to the Health Department in Juneau. She finally set a wedding date: Oct. 27, 1951.
After moving to Juneau, Bertha worked as a public health consultant for the state, and Martin joined Cole and Paddock construction company, fishing Bristol Bay in the summers and building docks in Southeast. It was while building Alaska Coastal Ellis dock in Juneau that the operator of a pile driver miscalculated and Martin was thrown 40 feet onto rocks, suffering an open skull fracture and broken bones – injured so severely it was thought he'd die. But he again toughed it out, using knee pads until he could walk again.
The Johnsons became active members of the Chapel by the Lake church, and Martin helped build the new manse, the main sanctuary, and covered walkway.
Although he never had formal training in construction, he'd worked in Naknek and with Bill Lockart in Juneau, and formed Auke Bay Builders.
Martin loved woodworking, crafts, and hooking rugs. He also enjoyed sports – bowling was one passion, and golf was another. He was also very good at cribbage – he knew the point count of very possible cribbage hand by memory.
There was also his love of family – he was proud of his three children and their families. He spent many hours building model sleds, rugs and boats for them.
He and Bertha moved to Sitka in 2013, and became residents at the Pioneers Home in 2014. It took them only a little while to find the Swan Lake Senior Center and the Sitka Lutheran Church, where they made more friends. Once in the Pioneers Home, Martin had coffee friends, staff friends and people who stopped by to visit – and he enjoyed them all.
He was a member of the Auke Bay Volunteer Fire Department, Alaska Independent Fishermen's Marketing Association, and a shareholder of Sealaska and Goldbelt Native corporations.
Martin was preceded in death by his sisters, Feckla Metrokin, Martha Johnson, JoHanna Anderson, Florence Lesher, Elsa Martin, Elvira Maney and Agnes Parks, and his brothers, Hugh, Charles, Robert and Howard Johnson.
He is survived by his wife, Bertha Johnson of Sitka; brother Richard (Martha) Johnson of Naknek; sister Emma Love of Anchorage; sons Martin H. Johnson Jr. and wife Tina of Sitka, and Eric H. Johnson and wife Sue of Anchorage; and daughter Susan J. McFadden, Sitka.
Also surviving are his granddaughter Elizabeth (Dan) Morrow, Anchorage; and grandsons Amon (Megan) Johnson of Portland, Ore.; Jenner (Lakrisha) Johnson, Sitka; Matthew (Lauren) Johnson, Gresham, Ore.; and Ben Johnson, Gresham, Ore. Many nieces, nephews and cousins live throughout Alaska and the U.S.
Services were held Sept. 8 in the Pioneers Home chapel, and Sept. 10 at the Chapel by the Lake in Juneau.
Published in The Juneau Empire from Oct. 25 to Nov. 24, 2016

value: This website is a United States-based website founded in 1998, the world's largest commercial provider of online memorials. The Web site hosts obituaries and memorials for more than 70 percent of all U.S. deaths.


text:
Baltimore Orioles vs. Toronto Blue Jays - Recap - September 14, 2003 - ESPN
Final Series: Game 3 of 3CloseToronto won 2-1Game 1: Friday, September 12Baltimore2FinalToronto4Boxscore »
Orioles 5(67-81, 29-45 away)Blue Jays 3(76-73, 36-38 home)
1:05 PM ET, September 14, 2003Rogers Centre, Toronto, Ontario 123456789
BAL 300002000
W: M. Riley (1-0)L: C. Lidle (12-13)S: J. Julio (33)
Baltimore 5, Toronto 3Recommend0
TORONTO (AP) -- Matt Riley never thought it would take this long
to get his first major league win.Riley returned to the major leagues after a four-year absence
and led the Baltimore Orioles over the Toronto Blue Jays 5-3
Sunday."It feels great. It's been long road back since 1999. I figured
I'd get his win a long time ago," Riley said.Riley (1-0) allowed two runs and four hits in five innings,
struck out four and walked three. The 24-year-old left-hander, who
had not pitched in the major leagues since Sept. 30, 1999, against
the New York Yankees, and was 4-2 with a 3.58 ERA in 13 starts this
season with Triple-A Ottawa."I felt like I belonged out there today. In '99, I wasn't quite
ready," Riley said. "I was really nervous. I remember I balked
twice in my first start. Today, my team scored three runs in the
first for me, and that took the edge off a lot."Riley was on the fast track to success in 1999, when he made his
major league debut with Baltimore in only his second professional
season. He made three starts that September -- his only big leagues
appearances before Sunday. The following spring, the 21-year-old
arrived late for several practices.He struggled in 2000 and missed the 2001 season after elbow
ligament replacement surgery.Baltimore manager Mike Hargrove said Riley has matured."He's grown up and settled down," Hargrove said. "He wasn't a
wild man, don't get me wrong. He wasn't a bad kid, but he was real
hyper all the time. He was a true left-hander."Riley said he'll give the game ball to his mother."I'm sure they are waiting for me to call," he said.Jay Gibbons hit a two-run homer for Baltimore, which stopped a
four-game losing streak.Cory Lidle (12-13) allowed five runs and seven hits in seven
innings for Toronto, which had won four straight."I'm going to take positives out of the outing. I felt good
about it," Lidle said.Baltimore took a 3-0 lead in the first on RBI singles by Larry
Bigbie and Tony Batista, and a run-scoring grounder by B.J.
Surhoff.Josh Phelps homered in the second, his 20th of the season. Riley
didn't allow another hit until Dave Berg singled in the fifth. Reed
Johnson followed with a single, and Mike Bordick had an RBI single.Gibbons homered off the left-field foul pole in the sixth.Baltimore reliever Omar Daal allowed Carlos Delgado and Phelps
to reach in the eighth, but Kerry Ligtenberg retired Bobby Kielty
on a flyout, and B.J. Ryan struck out Eric Hinske. Tom Wilson then
grounded out.Jorge Julio finished for his 33rd save in 40 chances.Game notesThe Orioles haven't announced whether OF Melvin Mora will
miss the rest of the season with a knee injury, but Mora is walking
around with crutches and has a soft cast around his left knee. Mora
crashed into the right-field wall while trying to make a catch on
Saturday. He was taken to a hospital for X-rays and an MRI exam,
and is to be re-examined in Baltimore on Monday. ... Baltimore CF
Luis Matos is day to day with a strained left hamstring. ... Hinske
leads AL third baseman with 21 errors.
Regular Season SeriesToronto leads 11-8 (as of Sun 9/14)
Complete Schedule: Orioles | Blue JaysScoring SummaryBALTOR1stL Bigbie singled to right, B Roberts scored.101stT Batista singled to right, L Bigbie scored, J Gibbons to third.201stB Surhoff grounded into fielder's choice to third, J Gibbons scored, T Batista out at second.302ndJ Phelps homered to right center.315thM Bordick singled to center, D Berg scored, R Johnson to second.326thJ Gibbons homered to left, L Bigbie scored.526thT Wilson singled to center, J Phelps scored, B Kielty to second.53View complete Play-By-PlayGame InformationStadiumRogers Centre, Toronto, ONAttendance18,763 (38.1% full) - % is based on regular season capacityGame Time2:41Weather75 degrees, cloudyWind7 mphUmpiresHome Plate - Chuck Meriwether, First Base - Tim Welke, Second Base - Mark Wegner, Third Base - Gary Cederstrom

value: This website is the official website of ESPN. It is owned by ESPN Internet Ventures, a division of ESPN Inc.


text:
SECTION G - TEARDOWN for Frigidaire Affinity Dryer Service Manual
Welcome to Scribd, the world's digital library. Read, publish, and share books and documents. See moreDownloadStandard viewFull view of .Look up keyword or sectionLike thisShare on social networks2Activity×Share to your social networks.TweetEmbedTable Of ContentsSPECIFICATIONCycle SelectionAutoDrySECTION A - OPERATING INSTRUCTIONSBefore Operating Your DryerOperating StepsTowelsHeavyDutyNormalPermPressDelicatesTouchUpTimed DryCycle SettingsDrying TemperatureDryness LevelOptionsDryer FeaturesStart/PauseCancelStatusLightsSECTION B - OWNERS GUIDEProduct Registration- WHAT TO DO IFYOU SMELLGAS:PedestalImportantSafetyInstructionsPrevent FireProtect ChildrenPrevent InjuryDryingProceduresFeaturesEnd of Cycle SignalReversible Dryer DoorCommon Drying ProblemsCare and CleaningInsideOutsideSECTION C - INSTALLATION INSTRUCTIONS GAS & ELECTRIC DRYERGASDryerEXHAUSTSYSTEMREQUIREMENTSPRE-INSTALLATIONREQUIREMENTSTools and Materials Required for Installation:ELECTRICALREQUIREMENTSELECTRICDryerGasDryerEXHAUSTDIRECTIONINSTALLATION IN RECESS OR CLOSETTHISDRYERMUSTBEEXHAUSTEDOUTDOORSDryerInstallationDimensionsUNPACKINGPACKINGELECTRICALINSTALLATIONELECTRICDryersFor a grounded, cord-connected dryer:For a permanently connected dryer:GASCONNECTIONGENERALINSTALLATIONREPLACEMENTPARTSWASHER INSTALLATIONDRYER INSTALLATIONWARRANTYSECTION E - HOW THE COMPONENTS
P. 1Frigidaire Affinity Dryer Service ManualFrigidaire Affinity Dryer Service ManualRatings: (0)|Views: 1,879
Added to My Library Click again to add to a collection _AffinityWasherManual


text:
Will Russia Take ‘Yes’ for an Answer? - The New York Times
Global Opinion|Will Russia Take ‘Yes’ for an Answer?
Global Opinion | Op-Ed Contributor Will Russia Take ‘Yes’ for an Answer?
By STEVEN K. PIFERMARCH 29, 2013
When Secretary of Defense Chuck Hagel announced this month that the Pentagon would increase the number of missile interceptors in Alaska, he noted that the U.S. missile defense program in Europe would be restructured. This means cancellation of Phase 4 of the plan, which called for the deployment of upgraded interceptors in Eastern Europe.The decision could open the way for resolving U.S.-Russian differences over missile defense, one of the thorniest problems on the bilateral agenda, and remove an obstacle to further nuclear arms reductions — if Moscow can say something other than “nyet.”The initial Russian reaction gave little ground for optimism. But Russian officials often react slowly to new ideas, so we may not yet have the final word.The Obama administration unveiled its “European Phased Adaptive Approach” in 2009 with the goal of deploying increasingly capable SM-3 missile interceptors in anticipation that Iran would develop missiles with increasingly longer ranges. Moscow initially appeared to welcome the approach.In November 2010, NATO and Russia agreed to explore a cooperative missile defense for Europe. Talks between U.S. and Russian officials in early 2011 yielded significant convergence on questions such as transparency, joint exercises and jointly manned NATO-Russia centers to share early warning data and plan how NATO and Russia missile defense systems would work together.
The dialogue stalled, however, as Russian officials began to complain more vociferously about Phase 4 of the plan, originally scheduled for 2020, when the SM-3 IIB interceptor would achieve the capability to engage intercontinental ballistic missiles.Moscow asserted that Iran stood many years, if not decades, from developing an ICBM, and claimed that the United States instead planned to target SM-3 IIBs against Russian ICBMs. U.S. officials countered that SM-3 IIBs in Europe would be ill-placed to engage Russian strategic missiles.Hagel’s announcement renders that argument moot.Now if the Russians do not want to move forward on resolving their differences with Washington over missile defense, they have to find other reasons to object. And they may.A Russian official has expressed opposition to the fact that Phases 2 and 3 of the missile defense plan will go forward in Romania and Poland. SM-3 interceptors in those phases, however, will only be able to engage intermediate-range missiles. That presumably poses no problem for Moscow, as a 1987 treaty bans Russia (and the United States) from having intermediate-range missiles.Russian recalcitrance may reflect simmering resentment about NATO enlargement, and the prospective deployment of SM-3 missile interceptors in Eastern Europe could add to the unhappiness. But how will small U.S. military detachments with interceptors to defend against missiles that Russia does not have pose a threat to Russia?
Moscow has sought a “legal guarantee” that U.S. missile defenses would not be directed against Russian strategic missiles, even though they know full well that Senate Republicans would block such a treaty. Russian officials assert that the absence of legally binding limits creates uncertainty about the offense-defense relationship.Moscow is correct that increasing missile defense capabilities could undermine the balance in strategic offensive forces, but that problem will not arise for 15 or 20 years, if then. The United States plans to deploy only 44 interceptors capable of engaging ICBMs in 2017.Russia could cut its strategic missile force by 50 percent or even 75 percent and still easily overwhelm those interceptors. Until the gap between strategic offense and defense narrows considerably, a U.S. political commitment not to target Russian missiles, coupled with transparency on missile defense plans, should suffice.Domestic motives may lie behind the Russian position. President Vladimir Putin may see political value in scratchy relations with the United States. Similarly, the Russian Ministry of Defense may hope that keeping alive tensions over missile defense will produce greater resources for military modernization.
If the Russians want to continue the argument over missile defense, they can offer various pretexts. But that should not obscure the main point: their assertion that missile defenses, specifically SM-3 IIB interceptors, will threaten Russian ICBMs and thereby undermine the strategic balance now has no substantive basis.So is Moscow prepared to engage in a serious way with Washington and NATO to settle the missile defense question and pursue a cooperative approach?Russian officials have begun to offer a more nuanced reaction to Hagel’s announcement and, on Monday, he and the Russian defense minister, Sergei Shoigu, agreed to resume consultations on missile defense. This is good news.The question now is whether Moscow can find a way to say yes. Or will it instead seek an excuse to keep the fight going? President Putin, over to you. Steven Pifer directs the Brookings Arms Control Initiative and is co-author of “The Opportunity: Next Steps in Reducing Nuclear Arms.”
Correction: April 3, 2013 An op-ed on Saturday incorrectly identified Chuck Hagel as the U.S. secretary of state. He is the defense secretary. A version of this op-ed appears in print on March 30, 2013, in The International Herald Tribune. Today's Paper|Subscribe

value: This website is an American daily newspaper based in New York City with a worldwide readership. Founded in 1851, the Times has since won 132 Pulitzer Prizes, the most of any newspaper, and has long been regarded within the industry as a national "newspaper of record".


text:
dissolved oxygen meter | eBay
Related: ph meter dissolved oxygen sensor dissolved oxygen probe ysi dissolved oxygen meter do meter digital ph meter refractometer extech dissolved oxygen meter
YSI Field Dissolved Oxygen (DO) Meter Selection Guide
results for dissolved oxygen meter
Follow dissolved oxygen meter to get e-mail alerts and updates on your eBay Feed.
Unfollow dissolved oxygen meter to stop getting updates on your eBay Feed.
Yay! You're now following dissolved oxygen meter in your eBay Feed.Email me new items that match this interest
dissolved oxygen meter: Items in search results
Fisher Scientific* accumet* Basic AB40 Dissolved Oxygen Meter BOD Probe
Milwaukee MW600 Dissolved Oxygen DO Meter, SM600 NEW!
Newly ListedPROFESSIONAL DISSOLVED OXYGEN DO METER Digital PRESSURE SALINITY MONITOR TESTER
YSI 95 Dissolved Oxygen and Temperature Meter System 95/10 ft
YSI 95 Dissolved Oxygen & Temperature Meter. 95/10ft Mint Condition w/Warranty!
Hach sensION 6 Dissolved Oxygen Meter
YSI 5100 Dissolved Oxygen/BOD Meter, 3 YSI 5010 probes for OUR/SOUR, and extras
Hach sensION 156 pH/Conductivity/Dissolved Oxygen Meter - Parts
YSI 54 54A 54 RC Dissolved OXYGEN Meter TESTED WORKING GUARANTEED YSI 54ARC
Extech DO600 Waterproof Dissolved Oxygen Meter
YSI Pro20 Lab/Field Dissolved Oxygen/Temperature Meter, 0 to 50 mg/L, 0.1 mg/L,
Lamotte DO4000 Dissolved Oxygen Meter
Portable Hand Held Meter Digital Readout
DISSOLVED OXYGEN DO METER KIT 199.9% MONITOR 99 RECORDS PROFESSIONAL LARGE LCD
Amprobe WT-50 Dissolved Oxygen Water Quality Meter
Lot of 2 YSI Fisher Scientific Dissolved Oxygen Meters Model 54 & 57 With Probe
YSI Model 52CE Dissolved Oxygen meter
EXTECH DO600, Dissolved Oxygen Meter
Hanna HI 8043 - Dissolved Oxygen Meter - DO Meter - D.O. Meter - Professional
Newly ListedHach HQ20 LDO dissolved Oxygen Meter
Milwaukee MW600 + MA9070 + MA9071 + MA841 Dissolved Oxygen Meter COMBO, SM600
Hach sension6 Portable Dissolved Oxygen Meter
YSI Dissolved Oxygen Meter System Model 59 probes, software, power supplies,etc
Orion Model 810 Dissolved Oxygen Meter
Orion Model 810 Dissolved Oxygen Meter Used No Probe
Extech DO700 Portable Dissolved Oxygen Meter Kit
YSI 57 Portable Dissolved Oxygen Meter Liquid Temperature Measurement NO PROBE
World Precision Instruments ISO2 Dissolved Oxygen Meter
Thermo Scientific Orion Star A323 Portable Dissolved Oxygen Meter
YSI Model 54A Dissolved Oxygen Meter
YSI ProODO Dissolved Oxygen Meter with 4 meter probe NEW
THERMO 862A ADVANCED DISSOLVED OXYGEN METER
Hanna HI 9143 Dissolved Oxygen Water Meter
YSI DISSOLVED OXYGEN METER MODEL 5000 , 5000-115V
Manual Calibration Dissolved Oxygen Portable DO Meter
Milwaukee Instruments Portable Dissolved Oxygen Meter Field Application MI605
EXTECH ExStik Dissolved Oxygen Meter Kit
WPI World Precision Instruments Dissolved Oxygen Meter ISO2 ISO 2 w/ electrode
YSI DISSOLVED OXYGEN METER 54A 54ARC
HORIBA OM-14 Dissolved Oxygen DO Meter Water Analysis W/O Probe Accessories
YSI Pro20, Dissolved Oxygen Meter, 0 to 50 mg/L
Fisher Scientific Dissolved Oxygen/Temperature Meter AP74

value: This website is an American multinational e-commerce corporation based in San Jose, California, that facilitates consumer-to-consumer and business-to-consumer sales through its website.


text:
Shutterstock Contributors Earn Over $500 Million (PRNewsfoto/Shutterstock, Inc.)
Shutterstock, Inc. (NYSE: SSTK), directly and through its group subsidiaries, is a leading global provider of high-quality licensed photographs,vectors,illustrations,videos and music to businesses, marketing agencies and media organizations around the world. Working with its growing community of over 225,000 contributors, Shutterstock adds hundreds of thousands of images each week, and currently has more than 125 million images and more than 7 million video clips available.
May 03, 2017, 07:02 ET
Preview: Shutterstock Reports First Quarter 2017 Financial Results

value: This website .


text:
media queries - How to display a Zurb Foundation sticky menu that is overflowing on small screens? - Stack Overflow
But when I use the sticky menu on small screens, there are so many items in my menu that the bottom of it overflows and I cannot get it into the screen (because of the sticky property).
The easiest answer is to create two menus, one that is sticky for large screens and one that is fixed for small screens but then I'll have duplicate markup. Is there another way ?
I'm using the code of the Top Bar provided on the Zurb Documentation. The problem arises when the menu is expanded vertically. Some of it is overflowing.
EDIT2: Here is the visual rendering of the problem : Screenshots
screen media-queries zurb-foundation sticky share|improve this question edited Mar 22 '13 at 11:34
asked Mar 21 '13 at 19:33
Are you trying this on a desktop browser? If yes, then you would not be able to try it like that and it's because you do not have the "swipe" capability on your browser. You need to install an emulator like Ripple that you can get from here and test your application with it. It (still) works by the way.
Yes, I'm showing this using my desktop Chrome Browser because the Chrome Browser on my smartphone (Nexus 4) is behaving exactly the same... And it's up to date, I don't understand what I'm missing...
Hmm, that's odd. I tried the code I gave you below and added a lot more menus and I can scroll through them, using Ripple, tested on different devices. I can't test it on a server right now so I can't be of further help tonight.
I can reproduce the same problem in Ripple with the WebWorks v2.0.0 platform with a Blackberry Bold 9700 in portrait mode... This is really strange. Thanks again !
Obviously since there are inconsistencies, seems like not all devices supports a long list of menu, better report this as a bug.
It's best to use the Top Bar as it will handle the resizing and toggling of elements (navs) for you. Here's a code I borrowed and simplified from the doc page of Foundation:

Dropdown Level 1 Label

Dropdown Level 1a

Dropdown Level 2a

Dropdown Level 2b

Button!
The key here is that you need to wrap the navigation inside a sticky div, which I think you already know, and a top-bar class on the nav element. If you do that Foundation will take care of the rest for you. To understand how the menus are hidden on smaller screens, a height of 45px is applied to it, the same height that the entire nav has. When you click on the menu icon an expanded class is applied to the nav so you can see your menus.
Thanks @von-v but I'm already using the Top Bar menu. The problem comes when it expands and the screen is too small to show the whole menu... It works well with non-sticky menus because you can scroll, but it doesn't work when it's sticky (it overflows).
It works on mine, best that you provide in your question what you have.
I've added a screenshot in the question to better describe my problem. Thanks for your help.
After reading the answers and comments, it seems this is a Zurb Foundation 4.0.9 bug (inconsistencies across devices but still reproducible).
Not the answer you're looking for?	Browse other questions tagged screen media-queries zurb-foundation sticky or ask your own question.	asked
How to add overflow to Zurb Foundation drop down menu?
Zurb Foundation: Nav Bar disappears for small range of screen sizes
zurb-foundation top-bar sticky mobile

value: This website is a question and answer website for professional and enthusiast programmers. It is the flagship site of the Stack Exchange Network, created in 2008 by Jeff Atwood and Joel Spolsky.