Title: On the optimal design of grid-based binary holograms for matter wave lithography,
Abstract: Grid based binary holography (GBH) is an attractive method for patterning
with light or matter waves. It is an approximate technique in which different
holographic masks can be used to produce similar patterns. Here we present an
optimal design method for GBH masks that allows for freely selecting the
fraction of open holes in the mask from below 10% to above 90%. Open-fraction
is an important design parameter when making masks for use in lithography
systems. The method also includes a rescaling feature that potentially enables
a better contrast of the generated patterns. Through simulations we investigate
the contrast and robustness of the patterns formed by masks generated by the
proposed optimal design method. It is demonstrated that high contrast patterns
are achievable for a wide range of open-fractions. We conclude that reaching a
desired open-fraction is a trade-off with the contrast of the pattern generated
by the mask.