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Low-voltage 0.1 μm organic transistors and complementary inverter circuits fabricated with a low-cost form of near-field photolithography

This letter describes the combined use of a form of near-field photolithography that relies on a conformable phase masks with microcontact printing and shadow masking for low-cost fabrication of organic transistors and simple complementary inverter circuits with critical dimensions of ∼0.1 μm. The good performance of the devices and their low-voltage operation make them and the fabrication procedures potentially attractive for many applications.