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Meaning of "shoulder-length" - Learner's Dictionary
(Definition of "shoulder-length" from the Cambridge Learner's Dictionary © Cambridge University Press)
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- shoulder bag noun
- shoulder blade noun
- shoulder noun
- shoulder verb
- shoulder-length adjective
- shouldn't
- shout noun
- shout verb
- shouty adjective
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Word of the Day
the person who sits in the back of a rowing boat and controls its direction


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Monday, 29 August 2016
Last updated 2 days ago
Oct 6 2011 | 1:26pm ET
If August was a bad month for hedge funds—and it was, the worst in almost three years by some measures—September was a disaster, according to one widely-followed industry benchmark.
The Dow Jones Credit Suisse Core Hedge Fund Index dropped 4.23% last month. The index, already nursing a 2.88% loss from August's market volatility, is now down 7.84% on the year.
Long/short equity and event-driven funds were hardest hit, dropping 6.13% (down 9.16%) and 5.71% (down 13.32%), respectively, last month. Global macro funds fell an average of 5.13% (down 10.78% YTD).
"In the event driven space, losses mainly stemmed from relatively concentrated long equity positions related to special situations, while global macro managers declined following sharp reversals in precious metals, such as gold which posted its worst monthly loss since 1983," Oliver Schupp, president of the Credit Suisse Index Co., said. "Compared to the year-to-date drop of 15.36% for the Dow Jones Global Index, hedge funds have provided some level of capital preservation to date this year, however, all strategies appear to be feeling the pain with market uncertainty at an all time high."
Emerging markets funds dropped 2.87% in September (down 2.83% YTD), convertible arbitrage funds 2.64% (down 6.15% YTD), fixed-income arbitrage funds 1.5% (down 0.17% YTD) and managed futures funds 0.14% (down 0.11% YTD).
Aug 25 2016 | 8:55pm ET
The emergence of private credit as a replacement for traditional bank financing...
Aug 24 2016 | 9:59pm ET
Looking for real estate investments but the typical real estate fare isn't cutting...
Aug 9 2016 | 2:39pm ET
The age-old financial concept that higher yields are the result of higher risk and...

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Helly Hansen Mens Odin Randonee CIS Jacket - Sale - Our CIS - "Component Insulation System" is relaunched for FW14 with great cross over potential as the zip out inner jacket is interchangable with all or CIS campatible midlayers. In the Odin Randonee you have a zip out insulator featuring PrimaloftA(R) Black insulation providing some of the best warmth to weight ratio in the industry. The shell jacket is featured to work on a vast selection of outdoor adventures and zipped together youA're ready for lower temperatures and snow. Features HELLY TECHA(R) PERFORMANCE YKKA(R) Coil Zipped hand warmer pockets PrimaloftA(R) Black 60gr insulation Zip out insulator Bottom hem Cinch cord Adjustable cuffs YKKA(R) Coil pit zip ventilation YKKA(R) Aquaguard water resistant zipped hand pockets YKKA(R) Aquaguard Water resistant front zipper One hand hood adjustments Fixed helmet compatible hood Quick dry lining Lined for comfort Durable Water Repellency treatment (DWR) Fully seam sealed 2 ply fabric construction Waterproof, windproof and breathable Mechanical stretch fabric CIS - 3in 1 Jacket
play pause $().ready(function () { new CirclePlayer('#jquery_jplayer_1', { mp3: 'http://d3gqasl9vmjfd8.cloudfront.net/cfc7184b-2115-4cdc-abb1-ceb5dd461743.mp3', oga: 'http://d3gqasl9vmjfd8.cloudfront.net/5d8cdd4d-386d-449c-82ef-30e1c5cde82a.ogg' }, { cssSelectorAncestor: '#cp_container_1' }); }); Put your hands in the air! Now put them down, you need them to order stuff. Read more
play pause $().ready(function () { new CirclePlayer('#jquery_jplayer_1', { mp3: 'http://d3gqasl9vmjfd8.cloudfront.net/cfc7184b-2115-4cdc-abb1-ceb5dd461743.mp3', oga: 'http://d3gqasl9vmjfd8.cloudfront.net/5d8cdd4d-386d-449c-82ef-30e1c5cde82a.ogg' }, { cssSelectorAncestor: '#cp_container_1' }); }); August has THREE birthstones! One of them is spinel! Spinel is very much like ruby, except it's not a ruby. They call it "the stone of mystery." Read more
play pause $().ready(function () { new CirclePlayer('#jquery_jplayer_1', { mp3: 'http://d3gqasl9vmjfd8.cloudfront.net/cfc7184b-2115-4cdc-abb1-ceb5dd461743.mp3', oga: 'http://d3gqasl9vmjfd8.cloudfront.net/5d8cdd4d-386d-449c-82ef-30e1c5cde82a.ogg' }, { cssSelectorAncestor: '#cp_container_1' }); }); It's never too hot for one of these. Read more
play pause $().ready(function () { new CirclePlayer('#jquery_jplayer_1', { mp3: 'http://d3gqasl9vmjfd8.cloudfront.net/cfc7184b-2115-4cdc-abb1-ceb5dd461743.mp3', oga: 'http://d3gqasl9vmjfd8.cloudfront.net/5d8cdd4d-386d-449c-82ef-30e1c5cde82a.ogg' }, { cssSelectorAncestor: '#cp_container_1' }); }); wine is a lot like love: the headache is inevitable Read more
Unencumbered by missions of grandeur, we are left only with the simple quest of our hearta (TM)s desire, an idea brought home with the Moonset LoPro Trucker Hat. It features a traditional, structured front ball-cap fit in a trucker setup: organic cotton bill and crown; polyester mesh back for increased ventilation. The 6-panel design with front stitching, lower front crown profile and pliable, precurved bill provide all-day comfort. Snaps in back make sure youa (TM)re well-adjusted.
Oh, no! That thing we had here sold out ! So out of our desperate attempt to be rich love for giving you options, we've added a bonus sale for today. Consider it a gift to us from your wallet to all of you who were hoping for something like this. This is your chance to help us look good to our bosses get a little something for yourself, okay? Thank you You're welcome. Read more
Protect your shoes and keep your toes toasty and dry with the Castelli Corsa Shoe Covers. Made from water-repellant and windproof Ultra Fleece fabric, these shoe covers fend off chilly wind and rain to protect your feet during inclement training rides and races. Ultra Fleece also boasts exceptional stretch for a streamlined fit over shoe buckles and other closures. The Corsas are finished with a neoprene cuff for extra protection from errant drizzle and a zip-up closure at the back for easy pull-on and removal. Castelli recommends the Corsa Shoe Cover for temperatures between 43 and 57 degrees Fahrenheit.
Dark Chocolate Mint Almond protein bars are coated with dark chocolate, surrounding a perfect mix of refreshing mint and almonds. A truly great-tasting meal replacement snack or after-workout recovery bar, Honey Stinger's protein bars contain gluten free ingredients and no trans fats. Honey Stinger protein bars are truly unique as they include over 30% USDA certified organic honey, 10 grams of whey protein - 20% of the daily recommended allowance, 22 vitamins and minerals, calcium and antioxidants. Made with gluten free ingredients, but processed on machinery that processes gluten products. Ingredients: - Organic Honey, Dark Chocolate (Evaporated Cane Juice, Chocolate Liquor (processed with Alkali), Cocoa Butter, Milk Fat, Soya Leclthin (an emulsifier), and Vanilla); Whey Protein Isolate, Almonds, Vitamins & MInerals (Dicalcium Phosphate, Magnesium Oxide, Ascorbic Acid (Vit C), Cholecalciferol (Vit D), Alpha-tocopherol Acetate (Vit E), Biotin, Zinc Oxide, Niacin, Ferrous Fumarate (Iron), Molybdenum Glycinate, Calcium Pantothenate, Copper, Manganese, Beta Carote (Vit A), Selenium, Pyridoxine (B6), Riboflavin (B2), Thiamine (B1), Chromium, Cyanocobolamin (B12), Folic Acid, Potassium Iodide), Natural Oil of Peppermint. Allergen Statement: Contains Milk, Almonds and Soy. May Contain Peanut, Wheat, Egg and other Tree Nuts.
SW0SW046 SmartWool Mens PhD Outdoor Heavy Crew A new and improved classic. The new PhD Outdoor Heavy OTC features ReliaWool Technology for improved durability in the high wear areas and the 4Degree Elite Fit System to keep the sock in place and giving you allsport versatility. New 4 Degree Elite Fit System uses two elastics for greater stretch and recovery to keep the sock in place Patent pending ReliaWool technology in high impact areas provides the longer lasting protection to keep feet comfortable Strategically placed mesh ventilation zones provide ventilation for temperature and moisture management Flat knit durable toe seam for high burst strength 1x1 ribbed welt 8.5 Inch overall height Height Crew Heavy Full Cushion Fabric 86 Merino Wool 12 Nylon 2 Elastane 4 Degree Elite Fit System The 4 Degree Elite Fit System is a proprietary fourpoint supportive system that provides an incredibly secure comfortable fit around the heel arch and instep. ReliaWool Technology Patent pending ReliaWool Technology in high impact areas provides the longer lasting protection to keep feet comfortable. Product Care Turn inside out to avoid pilling. Machine wash on the gentle cycle with cool or lukewarm water using mild nonbleach detergent. If you prefer powdered detergent make sure to dissolve it completely before adding. Machine dry on low or medium heat.
On Sale. Free Shipping. Kuhl Men's Kontra Air Short FEATURES of the Kuhl Men's Kontra Air Short Kuhlair vent system keeps skin kuhl Super lightweight fabric Pockets: 2 front hand, 2 back, 2 zippered side, 1 welted drop in, 1 3D cell phone, 1 coin Front, back and side pockets are vented Reinforced Grosgrain ribbon for added durability Gusseted crotch vents
Featuring a wide comfortable waistband, comfortable and stylish leg openings, and reflective details, the Pearl Izumi Superstar Knicker is a must-have cycling favorite for cool-weather riding. Select Transfer Dry fabric sets the benchmark for compression and moisture transfer. Flattering wide waistband for superior comfort. Gripper-free. Womens Tour 3D Chamois. Reflective elements for low-light visibility. UPF 50+ for maximum sun protection. Inseam/size medium: 21 in.. Form fit. Womens Tour 3D Chamois:~ Enthusiast to intermediate rider~ Preshaped to provide the highest level of rider comfort~ Breathable 4-way stretch technology adjusts to the body and moves moisture away~ Pressure Point Relief Technology optimizes riding comfort, blood flow, and athletic performance~ 13 mm 2-layer variable-density padding.
Mountain Hardwear Men's Warlow Hybrid Pants - The Men's Warlow Hybrid Pants by Mountain Hardwear are perfect clean, lightweight pants for spring alpine climbing. Mountain Hardwear teamed with speed climber Ueli Steck to create a pant that meets his standards for efficiency, simplicity and elite athletic performance. Their streamlined fit and stretchy yet durable construction are tailor-made for fast ascents. They have an elastic waistband with belt loops that allow for a customized fit. Reinforced, articulated knee panels and scuff guards at the hems ensure long lasting durability. Zippered hand pockets keep essentials secure and close at hand. If you are looking for tough durable pants that will take you where ever you want to go, you have found them with the Men's Warlow Hybrid Pants by Mountain Hardwear.
Norman Bates has informed us that if he can get permission from his mother, he plans to order several of these Bates Motel shirts. After all, what better way to promote his roadside haven for weary travelers? The body of the shirt is made from a 50% cotton / 50% polyester blend and the sleeves are 60% cotton / 40% polyester.
The North Face Womens Pulse Tight - Sale - Reach your fitness goals wearing these compressive, midweight workout leggings that have four-way stretch and deliver technical, wicking performance without sacrificing an ounce of softness. Compressive tights crafted of moisture-wicking four-way stretch fabric Ultrasoft moisture-wicking fabric Flat-locked stitching reduces friction against the skin Updated colorblocking Inseam: R 27 Fabric: solid body: 255 g/m 88% polyester, 12% elastane sueded-knit jersey Fabric: heather and print body: 255 g/m 88% polyester, 12% elastane sueded-knit jersey Source: Imported Guarantee: Lifetime Warranty
play pause $().ready(function () { new CirclePlayer('#jquery_jplayer_1', { mp3: 'http://d3gqasl9vmjfd8.cloudfront.net/cfc7184b-2115-4cdc-abb1-ceb5dd461743.mp3', oga: 'http://d3gqasl9vmjfd8.cloudfront.net/5d8cdd4d-386d-449c-82ef-30e1c5cde82a.ogg' }, { cssSelectorAncestor: '#cp_container_1' }); }); August has THREE birthstones! One of them is sardonyx! That sounds like a Pokemon, doesn't it? But it's not. It's not a Pokemon. Read more
If your always cold, I think its time for some warmth in your life. The Mountain Hardwear Super Compressed Hooded Jacket is going to keep you warm in every condition. What keeps you warm is Thermal.Q Elite, which mimics the structure of down to create the highest warmth to weight ratio available in synthetic insulation. The Super Compressor also has proprietary insulation construction creates heat trapping air pockets that increase warmth without the weight. Single interior toggle hem for easy adjustment on the fly which comes in handy when backpacking or carrying gear. Feel like a toasty smore with the MTHD Super Compressor Hooded Jacket. Proprietary insulation construction creates heat trapping air pockets that increase warmth without the weight, Thermal.Q Elite mimics the structure of down to create the highest warmth to weight ratio available in synthetic insulation, Lightweight, compressible insulation makes it perfect to pack for cold belays, Two pack and harness compatible PU zip handwarmer pockets keep valuables secure, Single interior toggle hem for easy adjustment on the fly, Helmet-compatible hood has a single adjustment for a customized fit, Exterior Material: 20D Nylon Ripstop, Insulation Weight: 100g Thermal.Q Elite, Warranty: One Year, Race: No, Type: Casual, Jacket Fit: Regular, Length: Medium, Insulation Type: Synthetic, Waterproof: None, Breathability: No Breathability, Wind Protection: No, Warmth Factor: Warm, How Does This Fit?: True To Size, Model Year: 2015, Product ID: 387479, Model Number: 1568761437 M, GTIN: 0887487446350
You come from a long line of East Coast fisherpeople, on both sides of your family. While you're not ready to own trawlers and manage a fleet of commercial fishermen, you do enjoy hunting elusive fish and tackling tricky finned foes. In the Wilderness Systems Ride 135 Advance Angler Kayak, you can chase fish or be taken for a sleigh ride by a feisty amberjack. Silent Traction lets you ambush gnarly grouper, and seemingly infinite amounts of storage let you pack everything you'd need for hours of combat with a reef donkey.The Ride 135 Advance has the same profile as the Ride 115 Angler boats, but the extra length and storage space on the Ride 135 makes it a super-stable fishing boat that helps you rise to the challenge, even if the only fish biting are 4-inch goby. Flat through the mid-section, the pontoon style provides a stable platform when you're slowly reeling in the catch of the day. Keels in front and back let you take the shortest path (a straight line) to the bank or the next casting locale. The Phase 3 AirPro Advance seat is lifted four inches higher than the the standard Ride seat. Just like the Ride 115 sweethearts, the seat on the Ride 135 moves forward or backwards so your weight helps, not hinders, moving through the water.An abundance of storage options lets you pack for a weekend on the water or bring every possible fly and weight line ever made. Orbix covers on the bow and midship hatches protect your angling secrets (best to store electronics in a dry bag first, though). The voluminous stern tankwell holds a cooler, your tackle box, and a conservative dry bag. The accessories on the Ride Angler boats are new this season. Yak Attack VISICarbon Pro means you're seen and not heard, Yak Attack Zooka Tube holds your rod when your hands need a rest, and Yak Attack Mighty Mount and Yak Attack Screwballs let you trick out this boat to match your badass fishing style.
Volcom Grimshaw Pant - Boys': Ratings: 10,000mm/10,000gm2 FABRICATION: V-Science Oxford V-Science Breathable Lining System 80gm Poly Fill Insulation Critical Taped Seams FEATURES: Zip TechA(R) Jacket to Pant Interface Stone Butt Patch Triple Reinforced Rise Brushed Tricot Lined Handwarmer Pockets Boot Gaitor
Whether you're hunting high desert peaks or lush forests of the northwest, the extremely durable, breathable, and comfortable Element Jacket's 2-way-stretch polyester double weave allows for an excellent fit (being slightly roomier in the shoulders for drawing back as well as the bottom for layering ease) while resisting wind, water and snow. Designed for the active hunter, the low profile fit offers full range of motion while 10.5 inch core vent zippers deliver amazing climate control. A microfleece lining throughout the jacket allows for added warmth without the weight or bulk, while allowing the soft shell exterior to stretch and move. A full-length reversed zipper, four external pockets, one internal pocket, drawcord hem, tapered sleeves, and adjustable Velcro cuffs round out the details for the Element Jacket.
CLOSEOUTS . Perfect for women who are just breaking into the touring scene, Scarpaand#39;s Vanity AT ski boots offer comfort and performance with a women-specific design that features a Pebaxand#174; tongue with T-Flex, a ski-walk mode, adjustable canting and a Vibramand#174; touring rubber outsole. Available Colors: SILVER. Sizes: 22.5, 23, 23.5, 24, 24.5, 25, 25.5, 26, 26.5, 27.
2NDS . Soft as a pillow and light as a feather, this fleece pullover jacket is the ultimate snuggly warm top for chilly weather. Available Colors: BLACK, BLUE, DARK BLUE, DARK BROWN, GREY, IVORY, NAVY, OLIVE, RED, DARK NIGHT, CHARCOAL, CHARCOAL HEATHER, STONE, BLUE GREY, BROWN, BURGUNDY, GREEN, LIME, TURQUOISE, RED ORANGE, BRICK, ORANGE, SPRUCE, STEEL BLUE. Sizes: M, L, XL, 2XL.
Let it rock! Once you get the Fat-ypus I-Rock skis up to cruising speed, they will float and dance through powder, chopped powder and crud. The flat tail (FT) design is more backcountry and mountaineering friendly. -- Rockwell 48 steel edges, p-tex sidewalls -- Vertical laminate poplar wood core -- Durasurf sintered base -- Die-cut graphics
When you're on the go, you want to make sure you don't leave your Cincinnati pride at home. Make sure you always have your team spirit with you with this Bengals Football repositionable decal. This 5'' x 7'' decal features a team name and football graphic, so people all over town can see that you root for the best!
Beetlejuice. That is a name one must be careful to use. Why is that, you ask? If you were to say it three times in a row, then you will awaken a ghost who specializes bio exorcism. He may come off as helpful, but he really just wants to do what ever he can that best services himself. Keep that in mind the next time you ask him for a favor, he may just trick you into an unfun afterlife. For fans of the classic movie Beetlejuice then this Wacky Wobbler is for you!
We are not fair-weather riders, we ride every day--regardless of the weather. We ride to school, to work, to play, and since Five Ten(R) is all about performance and technical advantage, we've upped the bar by adding a new winterized Freerider VXi. This all-mountain shoe has a DWR treated synthetic upper that beads and repels water like a duck . Inside is a PUR foam insulation that wicks sweat but adds that touch of warmth needed to fight freezing temps. The outsole package is Stealth(R) Mi6(TM), a revolutionary new Stealth(R) rubber with unprecedented shock absorption and grip.
CLOSEOUTS . Track the big one through snow, mud and rain in Itasca Big Buck hunting boots. With waterproof breathable construction and 800g Thinsulateand#174; insulation, feet stay dry and comfortable during dawn-to-dusk outings. Available Colors: REALTREE XTRA, MOSSY OAK. Sizes: 7, 7.5, 8, 8.5, 9, 9.5, 10, 10.5, 11, 11.5, 12, 13.
Bring more friends along on your next whitewater rafting adventure by adding an additional thwart to your NRS Osprey Raft. Adding another thwart provides spots for more paddlers and extra flotation for your raft. The NRS BAT(TM) (Batten Attachment Thwart system) lets you easlily add or remove thwarts to accommodate paddlers or a rowing frame (this thwart comes with two unbreakable battens and the thwart side patches, boat side patches not included). Trouble-free Leafield(TM) C7 Valve guarantees simple, reliable inflation and deflation. Built with the same quality materials and workmanship as your NRS inflatable boat.
Umpqua offers the serious fly tier a value-based hook alternative to the current offerings on the market, with a broad range of the most desirable hook styles. After extensive product research, we deliver a quality product at a terrific price. Umpqua U-series hooks features: high grade carbon steel; chemically sharpened points; micro barbs for easy penetration and easy de-barbing, along with a logical numbering system for hook use identification. Features:Curved HookStraight Eye3X LongStandard WireBarbed
Beautiful classic fly reels, the latest revision in over a century of the Perfect. This new model features a wide spool for better capacity, a time proven check system, and that classic Perfect sound. Ever since Forster Hardy was first granted a full patent for the Perfect reel design in 1889, our engineers, developers and consultants have been constantly striving for ways to improve on perfection, tweaking and adjusting to bring you what we believe are the best reels in their class to date. After all, if we offered anything less, it would not be a Perfect. ...
VMX-3T MAGNIFIER Simple, fast, effective--the VMX-3T Magnifier will work with any of our red dots but it is not recommended for use with the prism scopes. The push-button design of the VMX-3T engages and disengages the flip-mount, allowing the magnifier to lock in place. The result, 3x magnified or unmagnified views at will. Optics are fully multi-coated for optimal light transmission. Lightweight and tough; hard-coat-anodized machined-aluminum construction ensures durability. Internally nitrogen purged for reliable waterproof/fogproof performance. Ultimate magnified versatility for virtually any AR-height red dot sight. OPTICAL FEATURES + Fully Multi-Coated Lenses Increase light transmission with multiple anti-reflective coatings on all air-to-glass surfaces. + CONSTRUCTION FEATURES + Waterproof O-ring seals prevent moisture, dust, and debris from getting inside the tube for reliable performance in all environments. + Fogproof Barrels are filled with nitrogen gas to inhibit internal fogging. + Matte Black Finish Hard-coat anodized for durability. Specs + Magnification 3 x + Eye Relief 2.2 inches + Field of View 38.2 feet/100 yards + Tube Size 30 mm + Length 4.3 inches + Weight 11.9 oz
Stay warm and protected no matter what the weather brings with the Sierra Designs womens Tov jacket. Insulated with 600 fillDriDown(TM)hydrophobic down insulation, this puffy down jacket is warm, functional, and looks great on the mountain or out on the town. MaterialsInsulation:600 Fill Goose DriDownShell Fabric:100% Polyester Ripstop w/ DWRTech SpecsCenter Back Length:26 in. / 66 cmFill Weight:5.1 oz. / 0.14 kgTotal Weight:15.5 oz. / 0.44 kg
Local artist Carl Shuptrine offers a Pacific Northwest tribal spin to the Stio jackalope on this laundered, heathered tee. The 65% polyester with 35% ring-spun cotton offers a silky, lightweight feel in a comfy tee that's very durable. Pre-washed to reduce shrinkage.
An Ibex classic, there's a reason the Indie Hoody has been around for so many seasons. The keystone of any layering system, this top works well solo or with partners. 100% Merino wool top regulates moisture during high aerobic activities, keeps you warm when wet, and is guaranteed to last for seasons for adventures.
As much happens during the in-between as it does during the events before and after. The Transfer Jacket(TM) was designed for all of these moments. Breathable, stretch-woven fabric provides protection from the elements, and a soft fleece interior provides light insulation ideal for warmer backcountry days, skate skiing and shoulder season activities. Thoughtfully designed pockets and adjustment features round out this streamlined soft shell package. Drawcord Hem. Water Resistant. Wind Resistant. Breathable. Hook/Loop Cuff Closures. Brushed-Tricot-Lined Collar. Two Zippered Hand Pockets. Arm Pocket.
Built with the lightweight construction of the K2 WayBack, the K2 BackDrop Skis' chubbier waists will conquer the deepest pow stashes you can find and still leave you with enough energy multiple laps. All-Terrain Rocker profile (70% tip rocker, 30% camber) consists of an elevated tip for variable and soft snow performance and camber underfoot for power, energy, and edgehold in firmer conditions. Cap construction offers a lightweight ski with a low swing weight and smooth turn initiation. Lightweight core features a blend of aspen, paulownia and maple, which results in a 15% weight savings over traditional cores. Powder Tip design pulls the widest point of the tip further down the ski, which retains float in soft snow and also minimizes deflection in adverse snow conditions. SnoPhobic Topsheet technology has a snow-repellent topsheet so snow doesn't collect and add excess weight while you climb. Carbon Web technology (webbed carbon overlay located on the tail and forebody of the ski) gives lightweight torsional rigidity, which increases edge grip especially when you skin up an icy sidehill. ZCLIP Skin Compatible - Tip and Tail hardware functions as attachment points for your K2 BackDrop Precut Skins (sold separately) and comes with a removable plug. Tip and Tail holes also allow you to build a rescue sled, construct various ski anchors, and carry less weight while increasing your safety margin. Triaxial braided construction delivers a forgiving and extremely responsive ski, and consists of braided fiberglass around a wood core that provides torsional rigidity for added control. A sweet powder touring ski that responds better than most other skis designed for deep snow, the K2 Dropback men's powder skis are awesome performers and exceptional hikers. Sizes: 174, 181. Binding Options: no binding. Radius: 23 m (size 174 cm). Construction: Triaxial Braid, Cap Construction, Aspen/Paulownia/Maple Core. Weight: 1820 g or 4 lbs (size 174). Dimensions: 142 / 112 / 131 mm
The North Face Glacier Full Zip Hoodie for Boy's is the perfect layer for romping around in the woods as the snow starts to melt. Split kangaroo-style pockets are a cozy place to warm hands on chilly days. This product contains at least 90% bluesign approved fabric -- a standard for environmentally responsible production. Features: Extremely durable, pill-resistant surface Lightweight warmth Kangaroo handwarmer pockets Embroidered logo at left chest bluesign approved fabric Average Weight: 130 g (4.6 oz) Length from Center Back: 21.5 inches Fabric: 100% polyester fleece
The Vintage Hotel is a Winter Park, Colorado landmark. This AAA three diamond property is located at the entrance to the resort and has the new Coca-Cola Tubing Hill right outside the door. Lodging at the Vintage includes 114 guest rooms with, high quality mattresses, pillows, linens, and towels. This hotel features guest rooms from traditional hotel rooms to studios to one and two bedroom suites of which most include kitchenettes and fireplaces.The one bedroom plus loft units can accommodate eight guests with two queen beds in a separate room, a queen bed in the loft and a double sofa bed in the living room. Photos are representative of the property and may differ from the actual unit that is reserved.
Featuring Acclimate Dry fabric, the Double Base Layer collection contains microfibers that are cuddly soft to keep you toasty and dry during any outdoor cold weather activity.At Polarmax, they know that if something is working then hey, don't mess with the formula. Double Base Layer is our most Popular Layering Piece! This collection is great for skiing, hiking, climbing, fishing - all winter sports - or if you just want to be warm. Look no further than Double Base Layer!
The Salomon Women's Enduro Jacket has tight, technical styling that's fit for use on and off the snow. The two-layer twill jacket features AdvancedSkin Dry technology to keep you protected from the elements, and lightweight AdvancedSkin WARM insulation will keep you cozy. The active fit cut gives you a flattering feminine silhouette, making this jacket great for big lines and long aprA^s sessions. The removable hood and attached stretch powder skirt will add extra coverage when you need it, and there are plenty of pockets to secure your personal items that need to remain close by. The Enduro Jacket from Salomon is versatile, stylish, and perform in inclement weather -a must-have this season. AdvancedSkin WARM insulation keeps you comfortable on chilly days AdvancedSkin Dry technology fends off the elements Air venting system with mesh backing provides better airflow when you're working hard Hood and powder skirt will give you extra coverage on stormy days Multiple pockets on the inside and out will keep your essentials safe .
The Garden Genie Gardening Gloves are specially designed to allow you to perform basic gardening tasks without tools! The unique design has "claws" on the Right Handed Glove that allows you to dig and rake without using a garden tool. The fingers and palms of the gloves are also waterproof, which a surprising number of garden gloves are not, thus allowing you to work with moist soil without getting your hands soaked. Durable enough to protect your hands, yet delicate enough to pick cherry tomatoes. The top-notch quality make these the last pair of garden gloves you may ever need to buy! This As Seen on TV item is not available in stores yet and the PulseTV low price and quality guarantee makes it a must to grab a pair. FEATURES: - High density plastic claws instantly replace hand tools - 4 claws on the Right Hand Glove - Makes digging, planting, grading and raking fast and easy - Puncture resistant - Prevents cuts and blisters - Flexible, ergonomic design for handling small objects - One Size Fits Most PLEASE NOTE: The claw feature is only on the right handed glove. [*MULTI*]Buy more to save even more... Get one pair for $9.99 Save $8.00 more and get two pair for $11.98 Save $12.00 more and get three pair for $17.97 Save $16.00 more and get four pair for $23.96 Save $20.00 nore and get five pair for $29.95 [*MULTI*]
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Home > Press > Nanotechnology Community to Come Together at Advanced Therapeutics Symposium
The Nano Science and Technology Institute (NSTI) Invites Researchers to Submit Abstracts for the Merck Corporate Symposium on Targeted Delivery of siRNA, Taking Place During Nanotech 2008 in Boston, MA, USA
The Nano Science and Technology Institute (NSTI) is pleased to announce that abstracts are being accepted for the Merck Corporate Symposium: Targeted Delivery of siRNA, which will be held exclusively during NSTI Nanotech 2008 June 1-5 in Boston, MA. The Symposium will provide a significant platform for Merck to engage leading researchers in the nano tech community and focus discussion around the application of emerging nano technologies and their ability to affect targeted delivery of therapeutic siRNA molecules.
The Merck Corporate Symposium will focus on enabling technologies that can be applied to the efficient delivery of siRNA in vivo which results in reduced levels of specific mRNAs/proteins. In addition, technologies useful for the accelerated development of siRNA containing therapeutics are relevant. Specific areas of interest include:
• Biodegradable delivery components with low levels of toxicity
• Delivery systems for multiple tissues
• Delivery approaches amenable to alternate routes of administration
• Enhanced siRNA delivery using molecular targeting strategies
• Improved siRNA intracellular trafficking, endosomal escape and RISC incorporation
• Advanced siRNA structures which improve in vivo potency, stability, duration of action, specificity and toxicity profiles
• Whole animal methods for efficiently evaluating biodistribution and gene silencing
• Analytical methods for the physical and chemical characterization of complex assemblies
"Merck is pleased to partner with the NSTI in bringing the Symposium to Boston," said Dr. Reid Leonard, Merck's Executive Director of Licensing and External Research. "Nanotech 2008 reflects our commitment to innovation and provides an ideal forum for the presentation of siRNA enabling technologies - an area where Merck has assumed a leadership role."
Entering its 11th year, Nanotech 2008 is the world's largest and most comprehensive technical and business event in nanotechnology. "Merck's Corporate Symposium is one of the most anticipated programs at next year's conference," noted Dr. Matthew Laudon, Executive Director of the Nano Science and Technology Institute. "We are very pleased that Merck, one of the world's most prominent pharmaceutical companies, has partnered with our conference to help address their company's advanced research needs."
To participate in the Merck Corporate Symposium, please submit your abstract through the NSTI Nanotech On-Line Abstract Submission form. The abstract deadline is December 6th, 2007.
About NSTI
The Nano Science and Technology Institute (NSTI) is chartered with the promotion and integration of nano and other advanced technologies through education, technology and business development. NSTI accomplishes this mission through its offerings of continuing education programs, scientific and business publishing and community outreach. NSTI produces the annual Nanotech conference and trade show, the most comprehensive international nanotechnology convention in the world. NSTI also produces the semi-annual Nanotech Venture, Nanotech Industrial Impact Workshop, Nano Impact Summit and the Nanotech Course Series in the US and Europe. NSTI was founded in 1997 as a result of the merger between various scientific societies, and is headquartered in Cambridge, Massachusetts with additional offices in California and Switzerland.
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Whats coming by end of the year for Canon mounts...
Started Jul 26, 2014 | Discussions thread
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MichaelVadon • Senior Member • Posts: 1,112
Whats coming by end of the year for Canon mounts...
Jul 26, 2014
Here is whats coming up in the immediate future with Canon and Sigma:
- Canon 7D Mark II in August or September.
- Canon 5D Mark IV/ 1DX Mark II by end of year.
- Sigma 20, 24, 28 1.4 Art lens in next few months.
- Canon 100-400 IS II by September
- Sigma 300-600 OS by end of year
- Sigma 85 1.4 by end of year
- Sigma 135mm 1.8 OS Art lens by end of year - big lens
What might not be coming:
Canon 24-70 F2- 24-70s are generally very hard to get right. Even Canons 24-70 II isnt right if you get a bad copy which has happened to me and many popular lens reviewers. I think they are working on it, but this will be very hard and I will be pleasantly surprised if it does happen.
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Global Issues in Pharmaceutical Marketing presents a balanced, research-based perspective combined with a practical outlook on the current issues faced by the ethical, biotech, and generic segments of the pharmaceutical industry. It integrates an analytical…
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Globalization has had a profound impact on the sports industry, creating an international market in which sports teams, leagues and players have become internationally recognized brands. This important new study of contemporary sports marketing examines the…
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This international market-leading book, aimed at both students and practising managers, provides a comprehensive and balanced introduction to service operations management. Building on the basic principles of operations management, the authors examine the…
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A fully revised and updated 8th edition of the highly renowned international bestseller The 8th edition of this highly acclaimed bestseller is thoroughly revised with every chapter having been updated with special attention to the latest developments in…
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Pitch, Tweet, or Engage on the Street offers a modern guide for how to practice public relations and strategic communication around the globe. Drawing upon interviews with public relations professionals in over 30 countries as well as the author¿s own experience…
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A strong corporate image has power in a competitive marketplace. Its influence on reputational value and customer decision-making is only now beginning to be understood. Interest in corporate branding is exploding as marketing academics and…
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By examining the interface between consumer behavior and new product development, People and Products: Consumer Behavior and Product Design demonstrates the ways in which consumers contribute to product design, enhance product utility, and determine brand…
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'America's Got Talent' Found Its Susan Boyle in Texas
America may have just found its Susan Boyle. In the Houston, Texas audition of Got an awkward housewife named Cindy Chang decided to make her dream as a singer come true. At the end of the day, her pipes made judge Piers Morgan stand up and people chant her name.
The 42-year-old said in the interview that she is a full-time housemaker who wants to fulfill her childhood dream as a singer. She only trained her voice in her twenties and she drinks olive oil to loosen her vocal cords.
When told by Morgan to say something special about her, Chang said, "I used to be really shy. I'm still a little shy but I've come out of my shell a little bit," adding, "I wanted to always be a singer but my parents said no." After wowing the audience and the judges, Chang burst into tears and covered her face.
Morgan said if her parents had watched her performance, they would realize that they have made a "big mistake". Sharon Osbourne commented, "You have a very beautiful voice Cindy and you're a very beautiful woman too. I can tell inside as well as out."
Through unanimous votes, Chang went through to the next audition in Las Vegas, Nevada.
More America's Got Talent News
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- Red Band Trailer for 'Kevin Hart: What Now?' Sees Halle Berry as the Comedian's Bond Girl
- Watch Ariana Grande and Nicki Minaj Ooze Sexiness in 'Side to Side' Video


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On article Adobe releases Lightroom 3.5 and ACR 6.5 (30 comments in total)
So they release it with support for Olympus cameras, but they don't bother to include any Olympus lens profiles?
That hardly makes sense.
Link | Posted on Sep 29, 2011 at 17:23 UTC as 9th comment | 1 reply
On article Nikon shares rise as Nikkei suggests mirrorless launch (114 comments in total)
In reply to:
IcyVeins: Why anyone would pay that much for a 2.7x crop is beyond me. There are so many better options. Nikon is going to find that its brand won't have nearly as much power in the mirrorless market.
It is stupefying that someone could say that there are "many better options" than a camera that doesn't officially exist.
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Lawmakers demand hearing on Ehud Barak's claim that Netanyahu hurt Israeli security
Barak had publicly claimed the prime minister recently opened up the state to a "central security threat."
Barak had publicly claimed the prime minister recently opened up the state to a "central security threat."
The former prime minister said a 'fanatic nucleus of extremist ideology has taken over Likud.'
Barak was Israel's defense minister when commandos raided the Turkish boat seeking to break the Gaza blockade, killing nine pro-Palestinian activists. More ▸
The ex-prime minister reneged on a promise to give the writers the English-language rights, a co-author said. More ▸
The recording follows a similar release on Friday, in which Barak disclosed that he and Netanyahu wanted to order a strike on Iran but were stopped by other officials. More ▸
Former Defense Minister Ehud Barak revealed that both he and Prime Minister Benjamin Netanyahu sought to strike Iran's nuclear facilities in 2010 and 2011. More ▸
A pro-Palestinian group in Canada, calling Ehud Barak an "Israel war criminal," is protesting a visit by the former Israeli prime minister. More ▸
The United States in 2007 rented an apartment directly across the road from then-Defense Minister Ehud Barak, it was reported in the wake of revelations that the U.S. and British intelligence were spying on Israeli leaders. More ▸
Ehud Barak stepped down as Israeli defense minister at an official farewell event. More ▸
Secretary of Defense Chuck Hagel reassured Ehud Barak, his Israeli counterpart, that he would continue to advocate for Israel's missile defense programs despite looming budget cuts. More ▸
WatchOlympic figure skater Sasha Cohen dances hora at wedding — to Bruno Mars
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The couple party in L.A. Plus: Brangelina, Britney Spears and more
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Updated: Friday Nov 18, 2005 | 06:00 AM EST
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The hole is in a road in Roath and residents are trying to make sure it doesn't get any bigger
Capital Links buses will be driving around the capital's streets from September 4
David Farr, 44, was jailed for stealing items worth up to £13,000 from Chalmers Opticians in the Roath area of Cardiff
Hannah and Amani Yusuf, from Kings Monkton school in Roath, are amazing
The two factories in Ely and Roath are unconnected
Lee Strickland, 31, from Cardiff now has a dozen burglary convictions
Police were called to Halifax Bank on Albany Road, Cardiff, on Saturday
Faruk Yavuzel has poured his life savings into Oz Urfa
Mathab Khan was suspended by Cardiff council in February after it found he had refused to pick up a fare
Adam Hobbs' condition in Thailand is deteriorating after he was left paralysed from a motorbike accident last week
There is a vacancy in the Plasnewydd ward after the death of Labour Councillor Mohammad Javed
Davey Paxton, 23, used an aerosol deodorant can and lighter in a late-night stunt
The Scandinavian export is opening in Roath next month
The incident left Adam Hobbs, from Cardiff, unable to breathe and with locked-in syndrome meaning complete paralysis of nearly all voluntary muscles
The volunteers at Keep Roath Tidy meet every week to tackle litter in their local streets
It's not pretty but it's the city we live in
Friends of Adam Hobbs, 28, hope to raise £10,000 to bring him home to Wales after the accident on Monday
'It makes me sad how much rubbish you see'
One of the city's biggest litter issues is how it deals with trash that spills out of waste bags
Dr Charles Allanby was the third generation of his family to run Clifton Surgery in Roath
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UnbreakableHow can you use your suffering to point others to God?
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Region Five REO wants probe of son's death
Regional Executive Officer (REO) of Region 5, Ashford Ambedkar is calling for an inquiry into the accident at Cotton Tree, West Coast Berbice on Wednesday night which claimed the life of his son.
Donald Ambedkar, 31, of Pouderoyen, West Bank Demerara was killed when his Toyota Carina AT 212 motorcar PRR 6417 collided with a canter truck GHH 7950 at D' Edward, West Coast Berbice around 10:30 pm.
The grieving father said the canter which was transporting two police ranks was hit to the front while his son's car was hit mostly on the side.
Further, he said his son had received his salary that day and had about $200,000 in his possession. He said the money along with his son's iPhone cannot be accounted for.
Ambedkar also alleged that based on "checks" with persons at the scene, the police were the ones who were consuming alcohol. He also lamented that no breathalyser tests were done on the ranks who sought treatment at a private doctor for their minor injuries.
However, a police source denied that the officers were consuming alcohol and lamented that they had only asked the driver of the canter for a ride to the Fort Wellington Station.
The REO is desperately searching for answers and called for an inquiry into the accident so his doubts can be cleared up.
Ambedkar sustained injuries to his head and was pronounced dead on arrival at the Fort Wellington Hospital. His friend, Sookdeo 'Roy' Sahadeo of Bath Settlement, West Coast Berbice was treated and immediately transferred to the Georgetown Public Hospital where he was admitted in the Intensive Care Unit. His condition is said to be improving.
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text:
Welcome to Brick Breaker!Have fun playing some of the best online games ever created and remember to check back often because we are always adding new and even better games.
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text:
It was way back in January that we told you all about a great modern soul album from C. C. (CORNELL CARTER). Mr C is a top session singer working in and around San Francisco. His CV boasts work with people like Ray Charles, James Brown, The Whispers, The Temptations, the late Natalie Cole, Kool and the Gang and Narada Michael Walden and his long player 'In The Moment' won him loadsa friends in the UK soul community.
Since then, the release of a series of singles has kept Cornell's name out there and early September sees the release of what is possibly his strongest single yet... 'Sunshine'. As the title suggests, it's a great summer vibe and maybe when our Indian summer arrives, the cut will become a perfect accompaniment, especially in the new, big, optimistic DJ SPEN/GARY HUDGINS.
Last Updated on Thursday, 25 August 2016 18:20


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RIP Gene Wilder: Children's Literature's Avatar - Consider, if you will, the life of Gene Wilder. Since his death, many people have been doing precisely that. It makes me happy, but since I've harbored a...
5 hours ago
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Hi, Medeia! :o)
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I like this one. I would love to read and learn about Frankincense. I also think the Luban must really be pretty if it's like hardened pearls. I'm going to write this book down. Thanks.
Hi, Tea! I hope you get a hold of a copy and enjoy the story. :o)
Copyright © 2009 Asia in the Heart, World on the Mind
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Another candidate has joined the byelection race in Ward 5. Rob Johnston, a 29-year-old account manager and small business owner, announced his intentions Thursday to seek the seat vacated by Gordon Wyant earlier this week. A University of Saskatchewan political studies graduate, Johnston said he's "scratching the itch" to run a campaign. His platform includes […]
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The Washington Post Co. has long been owned by the Graham family, but it revealed on Monday, August 4, that it had agreed to sell the flagship publication to Jeffrey Bezos, most famous for founding Amazon, Inc. The Washington Post says that Bezos will pay $250 million in cash for it and affiliated newspapers.
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Let's face it, classic works of architecture are boring and nobody cares about them anymore. This week the Something Awful Forum Goons aimed to change that by giving them some new and exciting uses, most of which make no sense whatsoever. But that's the kind of world we live in, so just deal with it and enjoy.
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Available in Large, which is actually a Medium stretched out to appear bigger.
Photoshop Phriday showcases the tremendous image manipulation talents of the Something Awful Forum Goons. Each week they tackle a new theme, parodying movies, video games, comics, history, and anything else you can think of. If you want in on the action, join us on the Something Awful Forums!
Copyright ©2016 Rich "Lowtax" Kyanka & Something Awful LLC.


text:
|Publication number
|Publication type
|Application number
|Publication date
|Mar 21, 2000
|Filing date
|Sep 30, 1998
|Priority date
|Sep 30, 1998
|Fee status
|Publication number
|William A. Enichen, Christophe F. Robinson
|Original Assignee
|Nikon Corporation
|Export Citation
|BiBTeX, EndNote, RefMan
|Referenced by (21), Classifications (16), Legal Events (6)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention generally relates to charged particle beam projection lithography tools and, more particularly, to electron beam (e-beam) projection masks or reticles.
2. Description of the Prior Art
Numerous lithography techniques are known and are in widespread use for manufacture of integrated circuit devices, in particular. Essentially, such lithography processes define potentially very minute areas and shapes on a surface through selective exposure and removal of portions of a layer of resist to expose areas of a surface for further processing by, for example, etching, implantation and/or deposition. Exposure has generally been accomplished in the past by use of radiant energy such as visible wavelength light.
There is a strong incentive in the manufacture of integrated circuits to increase integration density to the greatest possible degree consistent with acceptable manufacturing yields. Device arrays of increased density provide increased performance since signal propagation time is reduced with reduced connection length and capacitance. Further, increased device density on a chip allows greater chip functionality as well as greater numbers of devices which can be manufactured on a chip of a given area. Accordingly, increased integration density reduces manufacturing costs by maximizing the number of devices (or the number of chips of a particular functionality) which can be formed in the course of processing a single wafer of a given size. That is, for a given processing schedule, the cost of processing each wafer (including amortization and maintenance of the tools and processing reactor vessels) is substantially constant regardless of the number of devices or chips simultaneously formed.
While electromagnetic radiation (EMR) has been widely used in the past for exposure of lithographic resists, resolution is limited by the wavelength of the radiation employed. To produce very small feature sizes for high integration density, deep ultra-violet (DUV), extreme ultra-violet (EUV) and x-rays have been investigated for exposure of lithographic resists. However, it is generally considered that EMR is not suitable for minimum feature size regimes at or below one-tenth micron. To resolve such minimum feature sizes, charged particle beams are generally believed to be required. Electron beams are generally preferred since the much lower mass of electrons, relative to ions allows the beam to be readily controlled with relatively lower power requirements of the exposure tool optical elements.
However, to be economically viable for production of integrated circuits, electron beam tools must have throughput which is comparable to EMR lithography exposure tools. To achieve such throughput, exposure must be accomplished over relatively large sub-fields often containing one million pixels or more by projection of a pattern formed on a reticle or mask placed in the electron beam path. The masks must be formed with extremely high dimensional accuracy so that the sub-field patterns can be accurately abutted or "stitched" together into a larger continuous pattern.
Masks for electron beam projection rely on scattering of electrons predominantly by one of two basic mechanisms and are thus of one of two basic physical types. Aperture or stencil masks have a thin membrane, generally of silicon, corresponding to sub-field areas which are respectively patterned by etching of holes therein. While the membrane of aperture masks is thin enough for electrons to penetrate, the electrons penetrating the membrane are scattered sufficiently to be intercepted by a contrast aperture before reaching the target while electrons penetrating an aperture reach the target unimpeded.
The other type of mask has a continuous membrane of a material, such as silicon nitride, which is much thinner than the membrane of an aperture mask such that electrons can readily penetrate the membrane without significant scattering. The membrane is patterned with a pattern of material such as tantalum formed thereon which is capable of strongly scattering electrons which are incident on the pattern of material. A separate contrast aperture is generally used with this latter type of scattering mask, as well, to collect strongly scattered electrons and prevent them from reaching the target.
Both types of mask are generally constructed from a relatively thick sheet of material which is reduced in thickness (e.g. by etching) in the sub-field areas to form mask membrane areas. The remaining relatively thick material between the sub-field membrane areas thus defines a cross-hatch pattern or grillage of thicker material; portions of which are referred to as struts. The grillage pattern provides mechanical support to the membrane areas and a path to thermal ground for the few electrons absorbed in the thin membrane.
The beam is sized, shaped and positioned to fill the sub-field membrane areas with little or no electron impingement on the struts. As is known, electron absorption by any portion of the mask will cause heating which, in turn, increases the risk of thermal distortion of the mask. Thermal cycling and large temperature excursions can also cause persistent distortions of the mask and/or the sub-field membrane areas thereof. Additionally, while masks are made with extremely high precision, distortions may occur in the mask, as fabricated, when material is removed or deposited in the desired pattern and internal stresses in the mask are thus altered. Thermal cycling can also alter internal stresses in the mask which may result in or contribute to mask distortion.
The quality of the projection mask is critical to implementation of projection e-beam lithography. It can be readily understood that the distortion of the mask must be held to a small fraction of the feature size or pitch (e.g. in the mask itself or referred to the target plane since demagrification is usually employed) if exposures of sub-fields are to stitch together properly. Distortions due to temperature, however, are superimposed on any distortions in the mask, as fabricated, and persistent distortions which may occur through use of the mask in the e-beam exposure tool. Therefore, it is necessary to evaluate the mask periodically to determine the extent of persistent distortion which may have occurred during use and to evaluate the quality of the mask periodically over its useful lifetime.
It is known to provide registration and measurement marks on masks in regions which correspond to the kerf between chips on a wafer. This location is chosen because measurement marks on known exposure masks also results in exposure of resist on the wafer corresponding to the measurement mark. However, when sub-field exposures are made and stitched together, such exposure would overlap another sub-field and thus cannot be readily accommodated without compromising the design and layout of the chip and consuming significant chip space. By the same token, measurement marks provided only at the perimeter of the mask do not reveal distortions which may occur in sub-fields and which may partially compensate each other over the dimensions of the entire mask.
Accordingly, prior mask structures and designs do not provide measurement marks which avoid printing of the measurement mark on the wafer or provide for detection, much less allowing optical correction or compensation, of local (e.g. sub-field) distortion of the mask. Therefore, known mask structures and designs do not allow initial assessment or evaluation and/or monitoring of the quality of the mask, which is critical to high throughput e-beam projection lithography at small feature size and fine pitch.
It is therefore an object of the present invention to provide an e-beam projection mask which has measurement marks which reveal sub-field distortion without resulting in exposure of the target with an image of the measurement mark.
It is another object of the invention to support provision of sub-field mask distortion correction or compensation in an electron-optical system.
It is a further object of the invention to provide monitoring of mask quality over the useful lifetime of the mask.
It is yet another object of the invention to support extended useful lifetime of an e-beam projection mask by determination of corrections for measured distortions therein.
In order to accomplish these and other objects of the invention, a charged particle beam projection mask is provided which includes a plurality of patterned sub-field membrane mask areas, a grillage of struts extending between and supporting the membrane mask areas, and a plurality of measurement marks corresponding in number to said plurality of the sub-field membrane mask areas and located on the grillage of struts adjacent to the sub-field membrane mask areas and formed concurrently with patterning of the sub-field membrane mask areas in the same process so that the locations of the measurement marks are associated with the locations of features of the sub-field mask area patterns.
In accordance with another aspect of the invention, a method of operating an charged particle beam projection lithography system is provided including the steps of fabricating a mask having a plurality of measurement marks corresponding in number to a plurality of patterned sub-field membrane mask areas and located on a grillage of struts adjacent to said sub-field membrane mask areas, said measurement marks being formed concurrently and in the same process by which said sub-field membrane mask areas are patterned, measuring distortions of said mask based on locations of said measurement marks, and generating corrections of operating parameters of said e-beam projection lithography system in accordance with measured distortions of said locations of said measurement marks.
The foregoing and other objects, aspects and advantages will be better understood from the following detailed description of a preferred embodiment of the invention with reference to the drawings, in which:
FIG. 1 is a cross-sectional view of an e-beam projection mask in accordance with the invention,
FIG. 1A is an enlarged cross-sectional view of portion 160 of FIG. 1 illustrating application of the invention to an aperture mask,
FIG. 1B is an enlarged cross-sectional view of portion 160 of FIG. 1 illustrating application of the invention to a mask having a strongly scattering material deposited thereon, and
FIG. 2 is a plan view of the E-beam projection mask of FIG. 1 including measurement marks in accordance with a preferred embodiment of the invention.
Referring now to the drawings, and more particularly to FIG. 1, there is shown, in cross-section, a mask 100 in accordance with the invention and suitable for use in an e-beam lithography tool. It should be understood that in the cross-sectional view of FIG. 1, the depiction of the mask resembles masks currently in use since the measurement marks in accordance with the invention are not visible in this view but are depicted in the enlargement of region 160 of FIG. 1 shown in FIGS. 1A and 1B. However, no portion of any Figure is admitted to be prior art in regard to the present application. It should also be understood that both FIGS. 1 and 2 are not to scale and illustrate basic features which are common to both types of scattering masks discussed above and the application of the invention thereto. The patterning of the membrane areas is not illustrated in the interest of clarity and since it is arbitrary in regard to the principles of the invention.
Mask 100 is preferably formed from a wafer (generally of an initial thickness of about 320 microns but which is not at all critical to the practice of the invention) of silicon. A layer 140 of silicon nitride formed on a silicon wafer as indicated by dashed line 140 can be used and is preferred for masks having very thin membranes and deposited scattering materials. Other suitable materials and combinations of materials will be evident to those skilled in the art.
(In this regard and as will be recognized by those skilled in the art, silicon nitride exhibits an etch rate which is distinctly different from the etch rate of silicon for many etchants. A similar effect can be produced in silicon to a readily controllable depth within the wafer by, for example, implantation of boron. For this reason, it is preferred but not critical to the practice of the invention to etch the sub-field areas to form the membrane subsequent to the patterning of the sub-field areas, as will be discussed in greater detail below, regardless of the type of scattering mask which is formed.)
The wafer is etched from surface 130 in the sub-field areas to a thin (e.g. about 2.0 microns for an aperture or stencil mask and about 0.2 microns for a mask using deposited scattering material) membrane 120 at surface 150 which will be masked, patterned in the membrane areas and etched to form apertures in desired sub-field patterns or, alternatively, have a layer of tantalum or other scattering material deposited thereon which is later etched to form the desired sub-field pattern. Of course, other processes could also be used to form the scattering sub-field pattern. Formation of the membranes 120 at the sub-field areas thus leaves the full thickness of the wafer in the regions between the sub-field areas which form struts 110 that serve to support the membrane regions 120.
Referring now to FIG. 2, a plan view of a portion of the reticle or mask in accordance with the invention is shown. The sub-field area membrane regions 120 are preferably rectangular but other shapes which will form images that can fully tile the chip surface (e.g. hexagons) can be used. The regions between the sub-field area membranes 120 form a grillage of struts 110 which provide structural robustness to the entire mask and support the membrane areas at their edges.
Each sub-field is preferably surrounded by four measurement marks 200. These marks can be shared by adjacent sub-fields or four marks can be dedicated to an individual sub-field. Measurement in the X and Y directions of the four marks associated with an individual sub-field allow characterization of the sub-field in terms of X and Y displacement, X and Y magnification error compared to nominal, rotation and orthogonality error and X and Y trapezoid error. Fewer marks per sub-field could be used in accordance with the basic principles of the invention but fewer types of distortions would be characterized.
These marks are preferably shaped in the form of an "L" since preferred X-Y metrology tools such as the commercially available Nikon 3i or the Leitz LMS 2000 are particularly efficient for detecting that particular shape. Other shapes could be used and may be preferred for other metrology tools but generally should include orthogonal pairs of parallel edges. Marks could possibly be combined into shapes having edges referenced to adjacent sub-field membrane areas.
These marks are preferably formed by the same process (e.g. etching for an aperture mask to form depressions 210 of FIG. 1A, deposition and patterning of scattering material, as depicted by dashed line 210' of FIG. 1B) which is used to pattern the sub-field membrane areas which serves the dual purpose of avoiding additional process and alignment steps and necessarily referencing the measurement marks 200 to the sub-field pattern, however formed. For this reason, it is preferred to carry out the sub-field patterning process, including the formation of measurement marks 200 from planar side 150 of the wafer.
While not critical to the practice of the invention, the measurement marks are, as mentioned above, in the form of an "L" with horizontal and vertical portions of equal length and width, preferably 20 μm long and 2.5 μm wide (in the mask plane). Mark dimensions are, in any event, preferably chosen to be compatible with the capabilities of the measurement tool.
It should be appreciated that the measurement marks are formed over struts 110 which is relatively thick in comparison with the membrane regions 120. Accordingly, while it is not intended that the strut regions and measurement marks thereon will be illuminated during the lithography process (to minimize electron absorption and heating of the mask), the measurement marks will not print to the resist even if illumination of the measurement marks inadvertantly occurs due to the thickness of the struts which will effectivly prevent transmission of the electron beam even in silicon nitride scattering masks.
It should also be appreciated that distortions of the mask, as fabricated, will be evident and can be quantitatively evaluated immediately after the mask is formed. The ability to measure such distortions allows a relatively large, if not complete, degree of optical compensation or correction of the distortion to be achieved in the electron-optical system. It is preferred, as a practical matter and to avoid complication of the charged particle beam projection tool, to perform measurements of distortion while the mask or reticle is detached from the lithography tool. In view of the high accuracy of the metrology tool, changes in mask distortion during charged particle beam projection are relatively minor compared to distortions occurring during mask fabrication and persistent distortions occurring over a period of use.
Periodic evaluation of the quality of the mask (e.g. after an incremental period of use) thus not only serves to monitor the development of distortions of the mask but, as in the initial measurement and evaluation process after fabrication and before use, can provide an updated set of corrections or compensations which can be provided by the electron-optical system. Thus the useful lifetime of the expensive mask structure can generally be extended since the mask continues to be usable as long as sufficient correction of distortion of the sub-fields can be achieved to allow the sub-fields to be adequately stitched together or tessellated.
Additionally, it should be appreciated that the measurement marks and mask in accordance with the invention provide many more measurement marks than have been available in previous mask designs and that these additional marks are distributed throughout the mask area and yet do not result in exposure (i.e. of the resist) at the target plane. Therefore, the quality of the mask can be more thoroughly and quantitatively evaluated at any point in time and at the level of a sub-field which has not heretofore been possible. This detailed evaluation of distortions allows correction or compensation of the distortion for individual sub-fields which, similarly, has not heretofore been possible.
In view of the foregoing, it is seen that the mask including measurement marks in accordance with the invention provides an e-beam projection mask which reveals sub-field distortion without resulting in exposure of the target with an image of the measurement mark, supports provision of sub-field mask distortion correction or compensation in an electron-optical system, provides monitoring of mask quality over the useful lifetime of the mask and can effectively extend the useful lifetime of an e-beam projection mask by determination of corrections for measured distortions therein.
While the invention has been described in terms of a single preferred embodiment, those skilled in the art will recognize that the invention can be practiced with modification within the spirit and scope of the appended claims.
|Citing Patent
|Filing date
|Publication date
|Nov 5, 1999
|Feb 27, 2001
|Tower Semiconductor Ltd.
|Method of forming reticle from larger size reticle information
|Nov 12, 1998
|Mar 20, 2001
|Nikon Corporation
|Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correction
|Oct 23, 1998
|Apr 3, 2001
|Mitsubishi Denki Kabushiki Kaisha
|X-ray mask provided with an alignment mark and method of manufacturing the same
|May 20, 1999
|May 1, 2001
|Tower Semiconductor Ltd.
|Stitching design rules for forming interconnect layers
|Jun 25, 1999
|Jan 1, 2002
|Canon Kabushiki Kaisha
|Charged beam mask having strut wider than charged beam, with shape that matches charged beam
|Sep 19, 2000
|Feb 26, 2002
|Advanced Micro Devices, Inc.
|Mask identification database server
|Jan 26, 2001
|Aug 26, 2003
|International Business Machines Corporation
|Information storage on masks for microlithographic tools
|Aug 21, 2001
|Mar 21, 2006
|Carl Zeiss Smt Ag
|Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose
|Dec 7, 2001
|Jan 9, 2007
|Advanced Micro Devices, Inc.
|Mask identification database server
|May 19, 2004
|Feb 13, 2007
|Sony Corporation
|Method of generating mask distortion data, exposure method and method of producing semiconductor device
|Feb 23, 2004
|Sep 15, 2009
|Micronic Laser Systems Ab
|Data path for high performance pattern generator
|Sep 28, 2010
|Jordan Valley Semiconductors Ltd.
|Accurate measurement of layer dimensions using XRF
|Mar 23, 2014
|Jul 12, 2016
|Bruker Jv Israel Ltd.
|Estimation of XRF intensity from an array of micro-bumps
|Oct 9, 2012
|Jul 12, 2016
|Bruker Jv Israel Ltd.
|X-ray inspection of bumps on a semiconductor substrate
|Aug 21, 2001
|Jun 13, 2002
|Oliver Kienzle
|Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose
|Oct 25, 2002
|Dec 11, 2003
|Seagate Technology Llc
|Method and structure to reduce e-beam and magnetic material interactions
|Feb 23, 2004
|Aug 19, 2004
|Torbjorn Sandstrom
|Data path for high performance pattern generator
|May 19, 2004
|Jan 20, 2005
|Shinji Omori
|Method of generating mask distortion data, exposure method and method of producing semiconductor device
|May 12, 2011
|Industrial Technology Research Institute
|Conductive film structure, fabrication method thereof, and conductive film type probe device for ic
|Jul 14, 2011
|Industrial Technology Research Institute
|Conductive film structure, fabrication method thereof, and conductive film type probe device for ic
|May 25, 2004
|Dec 1, 2004
|Sony Corporation
|Method of generating mask distortion data, exposure method and method of producing semiconductor device
|U.S. Classification
|430/5, 430/22, 430/296, 430/30
|International Classification
|Cooperative Classification
|European Classification
|Sep 30, 1998
Owner name: NIKON CORPORATION, JAPAN
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ENICHEN, WILLIAM A.;ROBINSON, CHRISTOPHE F.;REEL/FRAME:009492/0991
Effective date: 19980929
|Aug 26, 2003
|Fee payment
Year of fee payment: 4
|Aug 22, 2007
|Fee payment
Year of fee payment: 8
|Oct 31, 2011
|Maintenance fee reminder mailed
|Mar 21, 2012
|Lapse for failure to pay maintenance fees
|May 8, 2012
|Expired due to failure to pay maintenance fee
Effective date: 20120321