text:
|Publication number
|Publication type
|Application number
|Publication date
|May 20, 2003
|Filing date
|Jul 26, 2001
|Priority date
|Jul 26, 2001
|Fee status
|Also published as
|Publication number
|Ching-Bore Wang
|Original Assignee
|Micro Lithography, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (21), Non-Patent Citations (1), Referenced by (27), Classifications (5), Legal Events (4)
|External Links: USPTO, USPTO Assignment, Espacenet
The invention relates to photomasks useful in the photolithographic fabrication of semiconductors. In particular, photomasks that are coated with a thin film of chemically inert poly(fluorocarbon) polymer.
The manufacture of semiconductor devices typically involves applying a layer of a photosensitive substance (a photoresist) to the surface of an target wafer. The photoresist is then exposed to light in a selected pattern using a photomask, and the photoresist is then developed to leave exposed regions of wafer. These regions are subsequently etched away or otherwise modified, and the residual photoresist is removed. The pattern of the photomask typically possesses extremely fine details, and the presence of even tiny particles on the surface of the photomask can interfere with the accurate reproduction of the pattern on the target wafer.
To minimize particulate contamination at the mask surface, optical pellicles have been developed that protect the photomask. An optical pellicle is a frame-mounted transparent membrane that is attached to the photomask surface, so that contaminating particles fall onto the pellicle membrane and not the surface of the photomask. The pellicle frame holds the pellicle membrane at a sufficient distance above the mask surface so that any particles that may fall upon the membrane lie outside the focal plane of the illuminating light, and so fail to interfere with the projected mask pattern. The use of optical pellicles in semiconductor manufacture has helped mitigate the effects of contamination by dust and other particulates, and has become widespread in the industry.
However, constant demand for smaller, faster, and more powerful microprocessors has required the semiconductor industry to fabricate smaller and smaller semiconductor circuits. Manufacturing techniques have advanced to the point that the size of the circuits being produced is effectively limited by the wavelength of light used in the photolithographic process, with shorter wavelength radiation permitting finer details in the resulting circuit structure. Thus, photolithography using 248 nm, 193 nm, and 157 nm (Deep Ultra-Violet, or DUV) illumination has become common, and even the use of 13.5 nm (Extreme Ultra-Violet, or EUV) illumination is known.
However, as the wavelength of the radiation used decreases, the energy of that light increases. Many airborne organic compounds that were benign at longer wavelengths will become photolytically activated when exposed to energetic ultra-violet illumination. For example, light with a wavelength of 248 nm reacts with most halogenated organic compounds, and may interact with some non-halogenated organic compounds. Light having a wavelength of 193 nm reacts readily with a wide range of organic airborne contaminants, and 157 nm light is efficiently absorbed by and generates reactions with even the moisture present in air. The reactive breakdown products of these reactions interact with the mask pattern, resulting in the generation of a variety of defects.
Unfortunately, the source of many of these potential contaminants is the optical pellicle itself. Volatile components are released from the pellicle membrane, from various anti-reflective coatings on the pellicle membrane, from the anodized surface of the pellicle frame, or from the adhesives used to attach the pellicle membrane to the frame or the frame to the photomask. These contaminants are essentially trapped in the space beneath the pellicle membrane, even when vents are present in the pellicle frame. Repeated exposure of these contaminants to UV illumination results in the generation of chemically reactive species, and the creation of defects on the photomask. The generation of such reactive species dramatically shortens the lifetime of the photomask, as any defects being generated could be transferred to the photoresist, with the resulting production of flawed circuit patterns. Manufacturers are faced with either frequent replacement of photomasks, or the potential generation of defective products. In either case, manufacturing costs increase and quality controls must be tightened.
The continuing necessity of protecting the photomask from particulate contamination requires that optical pellicles continue to be used. What is needed is a method of protecting the photomask and its mask pattern from the reactive contaminants that are generated during illumination that does not itself compromise the utility of the photomask, and is compatible with existing optical pellicles and manufacturing techniques. The use of the photomasks of the invention permits illumination at highly energetic UV wavelengths, while minimizing the interaction of particulate or reactive contaminants with the surface of the photomask.
Coated photomasks for photolithographic processes, where the photomask includes a transparent substrate with a pattern on the surface of the substrate defining light-transmitting and non-transmitting portions, and a protective film on the surface of the photomask comprising an amorphous poly(fluorocarbon). The invention also includes the preparation of the coated photomasks, and the use of the coated photomasks in a photolithographic process.
FIG. 1 is a sectional view of a photomask according to the present invention.
FIG. 2 is a sectional view of a photomask according to the present invention that includes a mounted optical pellicle.
FIG. 3 is a schematic depiction of a photolithographic process using a photomask according to the present invention.
FIG. 4 is a flowchart depicting the steps of preparing a photomask according to the present invention.
FIG. 5 is a flowchart depicting the steps of a photolithographic process using a photomask according to the present invention.
FIG. 1 is a schematic depiction of a photomask 10 according to the present invention, shown in cross-section. The photomask consists of a transparent substrate 11, with the mask pattern 12 on the surface of the substrate. Often, the substrate is glass, particularly glass that is transparent to the illumination selected for the photolithographic process employed. Where the photolithographic process is highly critical and the highest quality is required, the substrate is typically highly pure quartz glass. Quartz glass substrates are most common in modern photolithography systems, however any other substrate that is suitable for application of a photomask pattern and use in photolithography is a suitable substrate for the purposes of the invention.
Photomask pattern 12 defines light-transmitting and non-light-transmitting portions of the photomask. The photomask is typically prepared by selective deposition of a mask material, or selective etching of a previously deposited mask material. One common mask material is chrome metal, but other mask materials are also appropriate for the purposes of the invention, including iron oxide, molybdenum silicide, or any other mask material that can define a circuit pattern for the purposes of photolithography. The pattern defined by the mask material is typically a circuit that is subsequently projected on a target, typically a semiconductor wafer, that has been covered with a photoresist.
In one aspect of the invention, the photomask incorporates phase shifting techniques. "Phase shifting" refers to the selective modulation of the phase of illumination light as it passes through the photomask to prevent the image of the pattern projected onto the target wafer from blurring. Typically, the use of phase shifting techniques improves resolution and depth of focus so that even small features of the photomask pattern are reproduced accurately on the target wafer. For example, the use of molybdenum suicide as a mask material allows some illumination light to pass through the pattern. However, the amount that passes through is too weak to expose the photoresist present on the target wafer, and is 180� out of phase with the light passing through the substrate itself. Interference at the edges of the pattern serves to sharpen the edges of the design when projected on the target. Another phase shifting technique utilizes selective etching of areas of the substrate, again creating destructive interference at the boundaries between the pattern and the substrate, sharpening the projected pattern.
The photomask of the invention is coated with a thin film of an amorphous poly(fluorocarbon) film, shown as 13 in FIG. 1. The poly(fluorocarbon) film is typically substantially transparent to the wavelength of light used to illuminate the pattern during photolithography, and typically completely covers at least the mask pattern present on the photomask surface. Any polymer of a fluorinated hydrocarbon that is capable of forming a protective film on the photomask is a suitable fluorinated polymer for the purposes of the invention. Preferred poly(fluorocarbons) include, but are not limited to, homopolymers or copolymers of perfluoro-2,2-dimethyl-1,3-dioxole (PDD), tetrafluoroethylene, chlorotrifluoroethylene, vinylidene fluoride, hexafluoropropylene, and trifluoroethylene. In one aspect, the poly(fluorocarbon) is a cyclized polymer obtained by copolymerization of perfluoro (alkenyl vinyl ethers). Alternatively, the poly(fluorocarbon) is a homopolymer or copolymer of perfluoro-2,2-dimethyl-1,3-dioxole (PDD), the structure of which is provided below. In another aspect of the invention, the amorphous poly(fluorocarbon) is a copolymer of PDD and one or more of a perfluoro(alkylvinyl ether), a vinyl fluoride, and a (perfluoroalkyl)ethylene. In yet another aspect of the invention, the amorphous poly(fluorocarbon) is a copolymer of PDD with perfluoro(butenyl vinyl ether) and optionally with a third comonomer that is a perhaloolefin or perfluoro(alkyl vinyl ether).
The chemical structure of PDD
Polymerization of PDD with other fluorinated hydrocarbons produces a variety of amorphous copolymers that typically possess multiple advantageous properties. These poly(fluorocarbon) polymers typically possess a high glass transition temperature, a high modulus, high strength, and exhibit low creep under compressive load. They typically also exhibit low refractive indices, possess excellent dielectric properties, and exhibit excellent chemical resistance. These amorphous polymers may be readily applied by solvent casting or spray coating, and so are well-suited to coat photomasks in order to confer resistance to contamination during lithography. The low dielectric of the polymer coating prevents small particulates from being attracted to, or adhering to, the photomask itself. In addition, the chemically inert character of the polymer coating prevents even the highly reactive species generated by UV illumination from reacting with the mask pattern itself.
A variety of amorphous fluorinated polymers suitable for the preparation of the photomasks of the invention are described in U.S. Pat. Nos. 4,399,264 to Squire (1983); 4,485,250 to Squire (1984); 4,754,009 to Squire (1988); 4,935,477 to Squire (1990); 5,276,121 to Resnick (1994); 5,326,839 to Resnick (1994); 5,353,368 to Resnick (1994); 5,324,889 to Resnick (1994); 5,338,608 to Resnick (1994); 5,310,838 to Hung et al. (1994); 5,354,910 to Hung et al. (1994); and 5,408,020 to Hung et al. (1995), each of which is hereby incorporated by reference. Suitable amorphous poly(fluorocarbons) for the purposes of the invention are commercially available under the trademarks TEFLON AF, particularly the fluoropolymers AF-1600 and AF-2400 (E. I. du Pont de Nemours and Company).
Particularly preferred fluorinated polymers for the preparation of the photomasks of the invention are commercially available under the trademark CYTOP (Asahi Glass Company). CYTOP poly(fluorocarbons) are obtained by copolymerization of perfluoro(alkenyl vinyl ethers), and exhibit excellent temperature and chemical resistance, a refractive index of 1.34, a dielectric constant of 2.1, UV and near-IR transmittance of greater than 95%, and CYTOP poly(fluorocarbons) are soluble in perfluorinated solvents and readily cast in very thin films using conventional coating technologies (spin coating, dip coating, etc.).
The poly(fluorocarbons) useful for preparing the photomasks of the invention are readily soluble in fluorinated hydrocarbon solvents, facilitating the application of thin films of the amorphous polymers to the photomask. Selected fluorinated solvents that are appropriate for preparing amorphous poly(fluorocarbon) solutions include perfluorinated cyclic ethers, or perfluorinated tirbutylamine, perfluorooctane, perfluorodecaline. Typically, the amorphous poly(fluorocarbon) is solubilized in a solvent that includes perfluoro(2-butyltetrahydrofuran). Suitable fluorinated solvents for preparing solutions of amorphous poly(fluorocarbons) are commercially available under the trademark FLUORINERT (Minnesota Mining And Manufacturing Company Corporation). Particularly useful solvents include FLUORINERT Electronic Liquid FC-43 and FLUORINERT Electronic Liquid FC-75.
The amorphous poly(fluorocarbon) is typically applied to the photomask using conventional coating techniques known in the art of semiconductor manufacture. The method of manufacturing a coated photomask is generally outlined at FIG. 4, and includes providing a suitable photomask, preparing a solution of the selected amorphous poly(fluorocarbon) polymer in a suitable solvent, applying the solution of polymer to the surface of the photomask to form a coating, and curing the coating to form a poly(fluorocarbon) film. Particularly suitable coating techniques include, without limitation, spray coating, meniscus coating, or spin coating.
Spray coating utilizes a spray application to apply a solution of the poly(fluorocarbon) to the photomask. In meniscus coating processes, the photomask to be coated is inverted and passed over a laminar flow of the poly(fluorocarbon) solution. Spin coating is a particularly useful application method, and typically utilizes a vacuum chuck to hold the photomask and spin it at high rpm while the poly(fluorocarbon) solution is applied to the center of the photomask. The thickness of the resulting film is controlled by the viscosity of the solution and the rotation rate of the photomask. Spin coating typically utilizes a solution of the selected polymer in a fluorocarbon solvent, as described above, at a solids content of about 1% to about 5%. In particular, a solution with a solids content of about 2% is particularly suitable for spin coating the photomask.
Although the coating of poly(fluorocarbon) polymer must be cured, the step of curing may occur at any temperature from room temperature up to a temperature of about 100� C. Where curing occurs at room temperature, it typically requires 8-12 hours. Where curing occurs at elevated temperatures, it may require as little as 10 minutes to be essentially complete. Any combination of curing temperature and curing time that produces a cured film with the desired film properties is a suitable combination of curing conditions for the purposes of the invention.
After curing, the resulting thin polymer film is typically about 100 Å to about 700 Å in thickness, more typically about 300 Å to about 400 Å in thickness. In general, the film thickness must only be sufficient to satisfactorily protect the surface of the photomask itself, while not so thick that effective transmission of the illumination light is compromised.
Articles prepared from amorphous poly(fluorocarbons), and their method of manufacture are described in U.S. Pat. Nos. 4,530,569 to Squire (1985); 4,948,851 to Squire (1990); 4,975,505 to Squire (1990); 4,982,056 to Squire (1991); 5,000,547 to Squire (1991); 4,977,025 to Squire (1990); 4,977,026 to Squire (1990); 4,977,008 to Squire (1990); 4,977,297 to Squire (1990); 4,973,142 to Squire (1990); 4,999,248 to Squire (1991); 4,985,308 to Squire (1991); 5,006,382 to Squire (1991); 5,296,283 to Froggatt (1994); 5,308,685 to Froggatt (1994); 5,076,659 to Bekiarian et al. (1991) and 5,051,114 to Nemser et al. (1991), each of which is hereby incorporated by reference.
Prior to using a photomask of the invention in a photolithographic process, it is typically outfitted with an optical pellicle to protect the surface of the photomask from particulate contamination, as described above. A schematic diagram of a photomask of the invention fitted with a pellicle is generally shown in FIG. 2, where pellicle frame 15 is shown supporting the pellicle membrane 16 at a distance about the surface of the amorphous poly(fluorocarbon) film 13.
The photomask of the invention is generally useful in any photolithographic process that currently utilizes a photomask. In one aspect of the invention, the photomask is used in contact printing, where the photomask is brought into direct physical contact with the target wafer before illumination. More typically, however, scan projection photolithography is used and the image of the mask pattern is projected at a reduced size on the target wafer. The photolithographic process is depicted schematically at FIG. 3, where the illuminating light from light source 25 is projected through the pellicle membrane by the condenser lens system 26. The image of the mask pattern 12 is projected via reduction lens system 27 onto the target wafer 20 with a photoresist coating 21.
The photolithography process is outlined in the flowchart of FIG. 5, and includes providing a target substrate covered with a layer of photoresist, placing a photomask between the photoresist layer and a radiation source, where the photomask includes a substrate, a mask pattern on the surface of the substrate, and an amorphous poly(fluorocarbon) film on the surface of the substrate, and then exposing the layer of the photoresist to the radiation from the source through the photomask.
Although the present invention has been shown and described with reference to the foregoing operational principles and preferred embodiments, it will be apparent that those of skill in the art of semiconductor manufacture will be able to vary the details of photomask substrate composition, mask pattern composition, illumination wavelength, the photolithographic process, and other various changes in form and detail without departing from the spirit and scope of the invention. The present invention is intended to embrace all such alternatives, modifications and variances which fall within the scope of the appended claims.
|Cited Patent
|Filing date
|Publication date
|Nov 19, 1981
|Aug 16, 1983
|E. I. Du Pont De Nemours & Co.
|Perfluorodioxole and its polymers
|Mar 20, 1984
|Jul 23, 1985
|E. I. Du Pont De Nemours And Company
|Optical fibers comprising cores clad with amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Sep 4, 1986
|Jun 28, 1988
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Jun 5, 1989
|Jun 19, 1990
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Dec 28, 1989
|Aug 14, 1990
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Mar 29, 1990
|Dec 4, 1990
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Mar 29, 1990
|Dec 11, 1990
|E. I Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Mar 29, 1990
|Jan 1, 1991
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxide
|Apr 9, 1990
|Jan 15, 1991
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Mar 29, 1990
|Mar 19, 1991
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of perfluoro-2,2-dimethyl-1,3-dioxole
|Jun 13, 1990
|Sep 24, 1991
|Du Pont Canada Inc.
|Perfluorodioxole membranes
|Jun 21, 1990
|Dec 31, 1991
|E. I. Du Pont De Nemours And Company
|Process for the stabilization of fluoropolymers
|May 5, 1992
|Jan 4, 1994
|E. I. Du Pont De Nemours And Company
|Amorphous copolymers of two fluorinated ring monomers
|Nov 13, 1992
|Mar 22, 1994
|E. I. Du Pont De Nemours And Company
|Protective coating for machine-readable markings
|Sep 30, 1993
|May 3, 1994
|E. I. Du Pont De Nemours And Company
|Protective coating for machine-readable markings
|Sep 7, 1993
|May 10, 1994
|E. I. Du Pont De Nemours And Company
|Functional fluoropolymers
|Jan 22, 1993
|Oct 18, 1994
|Asahi Glass Company Ltd.
|Stainproof protector made from fluorine-containing aliphatic cyclic polymer for preventing staining of lithographic masks
|Jan 25, 1994
|Sep 16, 1997
|Mitsui Petrochemical Industries, Ltd.
|Highly light-transmitting dust protective film, process for preparation thereof and dust protective member
|Dec 9, 1997
|May 2, 2000
|International Business Machines Corporation
|Top antireflective coating film
|Title not available
|Title not available
|Grenon et al., "Formation and Detection of Sub-Pellicle Defects by Exposure to DUV System Illumination" SPIE vol. 3873, 162-176 (1999).
|Citing Patent
|Filing date
|Publication date
|Apr 30, 2004
|Aug 15, 2006
|Solvay Solexis S.P.A.
|Amorphous perfluorinated polymers
|Dec 31, 2002
|Apr 17, 2007
|Intel Corporation
|Venting of pellicle cavity for a mask
|Jun 23, 2005
|Apr 15, 2008
|International Business Machines Corporation
|Topcoat compositions and methods of use thereof
|Sep 28, 2004
|Jul 29, 2008
|Infineon Technologies Ag
|Lithographic mask, and method for covering a mask layer
|Feb 22, 2008
|Jun 1, 2010
|International Business Machines Corporation
|Topcoat compositions and methods of use thereof
|Jan 11, 2010
|May 8, 2012
|International Business Machines Corporation
|Method and apparatus for sub-pellicle defect reduction on photomasks
|Jun 27, 2011
|Jul 2, 2013
|United Microelectronics Corp.
|Method for forming photoresist patterns
|Jan 30, 2013
|Jan 7, 2014
|United Microelectronics Corp.
|Method for making photomask layout
|Jan 23, 2013
|Apr 15, 2014
|United Microelectronics Corp.
|Method of optical proximity correction in combination with double patterning technique
|Apr 10, 2012
|Jun 24, 2014
|International Business Machines Corporation
|Method and apparatus for sub-pellicle defect reduction on photomasks
|Jun 4, 2012
|Sep 30, 2014
|Micron Technology, Inc.
|Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate
|Sep 9, 2014
|Jul 7, 2015
|Micron Technology, Inc.
|Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate
|May 22, 2013
|Jan 5, 2016
|United Microelectronics Corp.
|Method for forming semiconductor structure having opening
|Dec 31, 2002
|Jul 1, 2004
|Boyd Patrick D.
|Venting of pellicle cavity for a mask
|Apr 30, 2004
|Dec 2, 2004
|Vincenzo Arcella
|Amorphous perfluorinated polymers
|Sep 28, 2004
|May 19, 2005
|Schroeder Uwe P.
|Lithographic mask, and method for covering a mask layer
|Feb 7, 2006
|Jun 22, 2006
|Laurent Dieu
|Photomask and method for maintaining optical properties of the same
|May 3, 2005
|Nov 9, 2006
|Richard Schenker
|Photo-Mask with variable transmission by ion implantation
|May 13, 2005
|Nov 16, 2006
|Karin Eggers
|Photo mask and method to form a self-assembled monolayer and an inorganic ultra thin film on the photo mask
|Jun 23, 2005
|Dec 28, 2006
|Hiroshi Ito
|Topcoat compositions and methods of use thereof
|Aug 15, 2005
|Feb 15, 2007
|Ching-Bore Wang
|Optical pellicle with a filter and a vent
|Sep 28, 2005
|Mar 29, 2007
|Sheng-Yueh Chang
|Reticle having a protection layer
|Feb 22, 2008
|Jun 19, 2008
|Hiroshi Ito
|Topcoat compositions and methods of use thereof
|Jun 12, 2007
|Dec 18, 2008
|William Stanton
|Photomasks Used to Fabricate Integrated Circuitry, Finished-Construction Binary Photomasks Used to Fabricate Integrated Circuitry, Methods of Forming Photomasks, and Methods of Photolithographically Patterning Substrates
|Jan 11, 2010
|Jul 15, 2010
|International Business Machines Corporation
|Method and apparatus for sub-pellicle defect reduction on photomasks
|Dec 1, 2003
|Jul 7, 2005
|Infineon Technologies Ag
|Reflection or transmission photomask for projection onto semiconductor substrate, e.g. wafer, in integrated circuit production, has substrate with opaque or semitransparent layer(s) covered by passivating layer with unpolar surface
|Dec 1, 2003
|Jan 3, 2008
|Infineon Technologies Ag
|Verfahren zur Herstellung einer Photomaske
|U.S. Classification
|International Classification
|Cooperative Classification
|European Classification
|Jul 26, 2001
Owner name: MICRO LITHOGRAPHY, INC., CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:WANG, CHING-BORE;REEL/FRAME:012031/0461
Effective date: 20010620
|Nov 1, 2006
|Fee payment
Year of fee payment: 4
|Nov 19, 2010
|Fee payment
Year of fee payment: 8
|Sep 11, 2014
|Fee payment
Year of fee payment: 12


text:
The Handy Book of Artistic Printing covers an oft forgotten period of design history. In the 19th-Century engravers, printers, and the like struck out against the traditional design and presented intricate boarders, corner embellishments, and quirky typefaces. Advertisers jumped at the new style, which became known as Artistic. As quickly as the style was adopted, it just as abruptly fell out of favor. The authors of The Handy Book of Artistic Printing assess the origins of the look in the British Aesthetic Movement and provide firm analysis of key features.
Out now from Princeton Architectural Press.

subset: commoncrawl


text:
3d Object – Blocks set
Compatible only with photoshop CS4 extended and up.
With this file you can combine several items as the preview images show, for that you must take off the model 3d FLOOR object.
You can rotate each object 360 degrees in any direction, scale, changing the lighting, change the type of shadows, soft or hard, change the color and surfaces reflection.
See the video tutorial for furder information at http://www.youtube.com/watch?v=J-YZT4_uiKo http://www.youtube.com/watch?v=3VozsTzRiVQ http://www.youtube.com/watch?v=n94iMsomfqM


text:
Everything You Need To Know About The Emergin g 'Fiscal Cliff' Compromise
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- http://thinkprogress.org/economy/2012/12/31/1381631/everything-you-need-to-know-about-the-gops-fiscal-cliff-tax-proposal/
Everything You Need To Know About The Emerging 'Fiscal Cliff' CompromiseSenate Minority Leader Mitch McConnell (R-KY) and Vice President Joe Biden have reportedly reached an agreement that would solve the tax side of the debate over the so-called "fiscal cliff," the package of tax increases and spending cuts that will begin automatically at midnight tonight.Senate Majority Leader Harry Reid (D-NV) and the Democratic caucus have not yet indicated support for the compromise, which extends most of the Bush tax cuts and other tax provisions, and while the Senate may vote tonight, no vote is expected in the House before tonight's deadline. Here is a breakdown of the different provisions of the reported compromise:Bush tax cuts: The deal would extend all of the Bush tax cuts for incomes below $400,000 for individuals and $450,000 for families, while reinstating the Clinton-era 39.6 percent tax rate for income above those thresholds. It will also push the capital gains rate on investment income back to 20 percent for income above $400,000 for individuals and $450,000 for families. President Obama had asked for an extension of rates only for incomes below $250,000.Stimulus tax credits: Three tax credits expanded as part of the stimulus will be extended for one year as part of the compromise. The America's Opportunity Tax Credit, Child Tax Credit, and Earned Income Tax Credit collectively benefit nearly 20 million Americans each year, and extending them was a priority for Obama and Democrats. Republicans allowed all three to expire in tax legislation earlier this year.Payroll tax cut: The payroll tax cut would expire as part of this compromise. The payroll tax cut, which benefits all wage-earning workers, is the most damaging piece of the "fiscal cliff" according to the Congressional Budget Office. Republicans have opposed extending the payroll tax cut in the past; many Democrats opposed its extension over fears that it would undermine Social Security, which it helps fund.Unemployment insurance: The federal unemployment insurance program would be extended for one year under this deal. Without an extension, more than 2 million would lose benefits at the beginning of 2013, while another million would lose them in the early part of the year.Estate tax: The estate tax was set to revert to its Clinton-era levels, where it was taxed at 55 percent after a $1 million exemption. This deal would set the exemption at $5 million and tax at a 40 percent rate after that — at a cost of $375 billion over 10 years compared to the Clinton level.Other provisions: The deal would also include a permanent fix to the Alternative Minimum Tax and a one-year "doc fix," which would prevent cuts in provider payments through Medicare. It also extends certain corporate tax provisions for another year.The reported McConnell-Biden compromise does not deal with the spending cuts side of the fiscal cliff, though CNN's Dana Bash reported that the sequester may simply be delayed for two months. The spending cuts are the part of the fiscal cliff that the Congressional Budget Office says would be the most damaging to America's economic growth. It also does not include an increase in the debt ceiling, setting up another fight over the coming months like the one that created the fiscal cliff in the first place.
UpdateThe New York Times reports a tentative deal has been struck: "Senate Republicans said negotiators also agreed to put off $110 billion in across-the-board cuts to military and domestic programs for two months while broader deficit reduction talks continue." Also the $5 million estate tax exemption will be indexed to inflation.
UpdateHarry Reid and Nancy Pelosi have singed off on the deal.
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I moved from ohio to texas two weeks ago. I am going back to ohio for a few days and need to mount a doe for someone in indiana. The doe cape is commercial tanned and ready for me to rehydrate, but I can not find a form that is grooming its shoulder in a doe. Please help.
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sounds complicated but it is not all that hard. Make lots of wedge cuts and glue them in backwards, refoam and sand. I think there was an article in Breakthrough about the sleeping giant which showed this? If not Calvin Farner at one time had a video which showed the very basics and you can go from there.
Dave Toms


text:
Stable tax rates help keep city attractive
The expectation of stable property tax rates for the Ennis municipal government and school district is welcome news to all of us.
The Ennis Daily News is not strictly philosophically opposed to increases in the ad valorem tax rate. We weigh the decision based on the circumstances at hand, looking for the greatest good before we discuss the issue. In this scenario, where the economy is slowly struggling its way back to a more active kind of life in this area, keeping rates steady is almost certainly the way to go.
Click here to sign up for our E-Edition and read the rest of the story!


text:
Members of the local World Development Movement group met with the Bexhill and Battle MP to persuade him to get UK banks out of coal.
Following on from their campaign outside HSBC bank in Devonshire Road in October, the group confronted Greg Barker to ask him to push for new rules to stop UK banks pouring billions of pounds into the global coal industry.
Greg Barker is the Minister of State for energy and climate change.
Branch member Christina Lucey said: "In November the UK government announced it would stop using UK aid money for coal projects overseas. But the money going into coal from UK banks is at least 27 times what the government spent.
The UK's five biggest banks have invested £12 billion in coal mining around the world since 2005. Of all fossil fuels, coal has the most damaging effect on climate change."
The campaigners from the Bexhill and Hastings WDM group also highlighted the "devastating" effects of coal on people living where it is mined.
Christina commented: "UK banks are financing a coal boom in Indonesian Borneo, which is destroying the forests and rivers indigenous people rely on.
In Colombia, whole villages have been wiped off the map by the massive Cerrejón coal mine, also financed by UK bank.
Chairman Denis Lucey said: "Coal is a disaster for the climate and for local communities. It's great that the government is stopping aid money going to coal – but unless our banks pull out of coal, UK money will carry on financing these man-made disasters across the world.
"We need government regulation to make the banks change their ways."
The Bexhill and Hastings branch of WDM has been campaigning for nearly fourteen years for justice for the world's poor - tackling the root causes of poverty and working for real change long term.
The WDM has a reputation for punching above its weight and has been instrumental in bringing about better conditions for the poor, for example it exposed trade negotiations aimed at removing government regulations of services, which could threaten access to water, education and health care for the world's poor.
Full details can be accessed on the website www.wdm.org.uk
For more information please contact Denis on 01424 845225


text:
Yale to host conference for centennial of Franz Boas's "The Mind of Primitive Men"Historians in the News
NEW HAVEN, Connecticut—Eminent scholars from the United States, Canada and Europe will gather at Yale for a centennial symposium on Franz Boas, the public intellectual who established the idea that people of every color and from every corner of the world can contribute to modern life.
"Indigenous Visions: Rediscovering the World of Franz Boas" takes place Sept. 15–17—one hundred years after Boas released The Mind of Primitive Man, a landmark treatise that drew upon Boas' studies of American Indians and immigrants to reject the idea that race determines ability and present a new theory of culture for a global age. The symposium brings together scholars involved in a reevaluation of the "father of modern anthropology," who influenced thinkers from John Dewey to W. E. B. Du Bois, presaged the development of Africana studies, and advanced the cause of native rights.
The Howard R. Lamar Center for the Study of Frontiers and Borders will present the centennial symposium, co-sponsored by the Gilder Lehrman Center for the Study of Slavery, Resistance, and Abolition and a dozen Yale departments and organizations. Events kickoff Thursday, Sept. 15, at 5:30 p.m. with a reception in the Beinecke Library (121 Wall Street), where the Dean of Yale College, Sterling Professor of History of Art Mary Miller, will offer welcoming remarks. Presentations and lectures begin at 9 a.m. the following morning, Friday, Sept. 16, in Luce Hall Auditorium (34 Hillhouse Avenue).
[The symposium is free and open to the public, but advance registration is requested. To register, and for a full schedule of events, visit www.yale.edu/glc/boas]
Speakers include Elizabeth Alexander, the inaugural poet for Barack Obama, who will examine Boas' relationship with Zora Neale Hurston; Berkeley's David Hollinger, the recent president of the Organization of American Historians, who will give a talk entitled, "Print the Legend Not the Fact? Anthropologists, Missionaries, and the Man Who Shot Liberty Valance"; and Michael Silverstein, the renowned language theorist at the University of Chicago, who will discuss 1911 as an "annus mirabilis" in thought.
The keynote address—and the Stanley T. Woodward lecture—will be given by political philosopher James Tully, Distinguished Professor of Political Science, Law, Indigenous Governance and Philosophy at the University of Victoria, who served as a special advisor to Canada's Royal Commission on Aboriginal Peoples. "Diversity and Democracy After Boas" is the title of his talk. It takes place Friday, September 16, at 7 p.m. in Luce Hall. Tully, the author of Public Philosophy in a New Key, received the prestigious Killam Prize in 2010 in recognition of exceptional contributions to Canadian public life.
The idea of a Boas centennial began in a brainstorm between Yale anthropologist William W. Kelly and Yale History Ph.D. student Isaiah Wilner, who developed the program with professors Glenda Gilmore and Ned Blackhawk. They saw Boas as an Enlightenment inheritor, yet something of an avatar for our own times. "When we look at Franz Boas, we see the face of our society," Wilner said. "He was a culture surfer and border crosser who bore scars on his face from duels with anti-Semites yet succeeded in making the case for a more collaborative way of life."
Boas stunned the American public in 1911 when he refuted scientific claims that placed white people at the top of a pyramid leading from savagery to civilization. He pointed to evidence of American Indian and African achievement. Timecalled The Mind of Primitive Man the "Magna Carta of race equality" in a cover story on Boas in 1936. After German authorities removed the book from circulation, Boas wrote a new edition, pressed a campaign against Nazi science, and rescued scholars from the Third Reich.
Many of the great themes that moved Boas derived from his work with native people. He learned the need for cross-cultural understanding during a year spent on icy Baffin Island, where he lived with the Inuit—"as an Eskimo among the Eskimo," he put it. His sense of the rich mental life of all people was influenced by his visits to the Kwakwaka'wakw of British Columbia, where elders and scholars contributed to his work and still discuss it.
Now a wider group of scholars is discovering that Boas spoke early and directly to challenges as pressing today as in his time—ethnic hatred, religious strife, globalization, immigration, war. The centennial of The Mind of Primitive Man has presented a diverse group of thinkers a chance to reflect on the continuing history of race in America, the role of the concept of culture in global claims to justice, and the active role of indigenous people in the creation of today's society. With Boas as a lens, "Indigenous Visions" will extend beyond him to illuminate a wide circle of American moderns—including William James, Ella Deloria, and Margaret Mead—whose ideas continue to shape the twenty-first century and offer insights that may contribute to a revitalization of democracy.
Advance registration opens today. Visit www.yale.edu/glc/boas for a full list of speakers and key readings, including the 1911 edition of The Mind of Primitive Man.
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text:
After rushing for 1,000 yards in his first season Michigan's starting tailback, redshirt junior Fitzgerald Toussaint hasn't had to prove his worth this spring. Instead, he's fine-tuning his game while helping to coach the Wolverines' younger ball carriers ...
That's not to say Toussaint is comfortable enough in his standing on this team to just lounge around this spring. He's a competitor and wants to make it clear the job is his.
"You have to keep competing because somebody can be right behind you trying to take that spot at any moment," said the 5-10, 195-pounder. "We're all trying to compete for that No. 1 spot."
Toussaint, though, doesn't likely have to worry about losing his hold on the starting role, not after he busted out for 1,041 yards and nine touchdowns on 187 carries (5.6 yards per rush) last season. The coaches, in fact, feel so good about him, they've reduced his reps in practice to take a longer look at sophomore Thomas Rawls and redshirt freshman Justice Hayes.
"I just have to take advantage of the plays I do have," Toussaint said. "But I think it's good for the young guys to get in and do what they have to do. It's not hard for me because I can coach those guys up, and I feel my experience can go higher with that.
"Rawls is a little speedster and Hayes has a little power. It's like the opposite - you'd think Rawls would have more power."
On Saturday, in the second of two scrimmages last week, Toussaint broke off a pair of long runs, showing even with fewer reps, he's the man to beat. But he does have skills he's trying to work on in drills, especially his blocking and catching out of the backfield.
"My blocking skills, working on that, because that is really heavy in this offense. You have to be able to pick up pass protection and stuff like that," he said. "Sometimes I look at the linemen and see how they do it, and try to translate that, and do my thing with it."
Toussaint caught six balls a year ago, including a touchdown reception against Iowa but senior teammate Vincent Smith almost doubled him up, with 11 grabs, as U-M's third-down back in 2011. If Toussaint can improve his hands, and his pass protection, he may never have to come off the field.
"I'm a little more aggressive. I know what I have to do and I'm willing to do anything for my team," he said. "I can be put in any position and handle it well."


text: On 10/31/2010 06:46 AM, Pauli Virtanen wrote: > Sat, 30 Oct 2010 20:42:49 -0500, Jason Grout wrote: > >> I notice that in Lapack, Matlab, and Mathematica, the LU decomposition >> routine for a matrix A returns a P, L, and U matrices so that: >> >> PA=LU > LAPACK returns the P L U decomposition. Quote from the relevant manual > page: > > """ > DGETRF computes an LU factorization of a general M-by-N matrix A using > partial pivoting with row interchanges. The factorization has the form > > A = P * L * U > > where P is a permutation matrix, L is lower triangular with unit > diagonal elements (lower trapezoidal if m> n), and U is upper triangular > (upper trapezoidal if m< n). This is the right-looking Level 3 BLAS > version of the algorithm. > """ > I can't find the documentation I was looking at to come to the erroneous conclusion that LAPACK gave back (the equivalent of) PA=LU; clearly the official LAPACK docs (quoted above) contradicts what I originally said. So now it makes perfect sense why scipy gives back A=PLU. (and yes, I realize that LAPACK doesn't really return P as a matrix, and that P is trivial to invert; I was trying to simplify the question to one about convention of where the P was.) Thanks, and sorry for the noise, Jason


text:
Congo river's Grand Inga dam 'could power Africa'
The idea of using the mighty Congo river to provide electricity across the African continent has been around since the 1960s.
Now, thanks to a recent deal signed by South Africa promising to buy electricity from the planned Grand Inga dam, in eight years' time it may start to become a reality.
If the full project is completed, the Grand Inga would be the largest hydropower station in the world.
Maud Jullien visited the existing dams on the Congo and the site for the new, larger structure.
15 Nov 2013
- From the section Africa


text:
Unilife Medical Solutions Limited ("Unilife" or "the Company") (ASX: UNI) is pleased to announce that on June 30, 2009, it entered into an Industrialisation Agreement with Sanofi Winthrop Industrie, a wholly-owned subsidiary of sanofi-aventis ("sanofi-aventis"), for the commercialisation of the Unilife Ready-to-Fill Syringe (RTFS).
Under an exclusive agreement entered into by both parties on July 1, 2008 ("Exclusive Agreement"), sanofi-aventis paid to Unilife A$16.4 million (€10 million) for the exclusive right to negotiate for the purchase of the RTFS (also known as the Unilife Prefilled Syringe) and to bear the costs of its industrialisation subject to the signing of the Industrialisation Agreement and the completion of agreed quarterly milestones.
The Industrialisation Agreement together with the Exclusive Agreement (as amended) ("the Agreements) set forth the terms of the on-going relationship of the parties, including sanofi-aventis' commitment to complete the funding of the A$30.4 million (€17 million) RTFS industrialisation program commenced by Unilife one year ago. Furthermore, the Agreements outline the agreed pricing structure under which sanofi-aventis will purchase the RTFS, subject to the signing of a Supply Agreement, and provide to Unilife the right to supply the RTFS to other pharmaceutical companies in certain therapeutic drug classes (Unilife Therapeutic Drug Classes).
Key terms of the Agreements include:
Update on Industrialisation Program
Unilife is pleased to provide the following update with regard to the industrialisation of the RTFS.
Comments by Unilife
Unilife CEO Alan Shortall stated that "The signing of this agreement with sanofi-aventis puts Unilife in a strong position to complete the industrialisation of the RTFS, and become a global leader in the fast-growing pharmaceutical market for prefilled safety syringes."
"Whilst sanofi-aventis is the world's largest consumer of prefilled syringes, Unilife has also received significant levels of interest in the RTFS from many other major pharmaceutical companies. With the signing of this agreement, Unilife can now move forward in its discussions with these other potential customers which are all major prefilled syringe consumers in their own right."
"Unilife has allocated significant resources in the past year towards the industrialisation of the RTFS and the development of a world-class management team. It is this management team, in combination with our projected equipment suppliers, that has allowed Unilife to develop a more effective and efficient production strategy for the RTFS. We will continue to work towards the high-volume production of the RTFS in Pennsylvania, and the continued expansion of commercial relationships with pharmaceutical industry leaders."
Shareholder / Analyst Enquiries:
Australia Jeff Carter Phone: +61 2 8346 6500
United States Stuart Fine Phone: + 1 908 469 1788
Media Enquiries:
Australia Michael Mullane Phone: +61 2 8284 9990
United States Sharon O'Shea Phone: + 1 610 659 9091


text:
Motive Gear Performance® and Motive Gear Performance® AX Series Ring and Pinions Are Engineered Using The Most Innovative Technology and Rigorous Testing Available. Product Confidence Is Achieved Through:
CNC Start To Finish Cutting Edge Lapping Indexed Tooth Spacing Central Contact PatternSpecifications: 10 Bolt 3rd Member Alum Or Steel Housing Rg Diameter 9" 10 7/16" X 20 Rh Threaded Bolts Pinion Diameter 1. 313" 28 Splines No Case Breaks 8620 MaterialPit Stop USA offers Motive Gear Ring and Pinion Set - 5.67:1 Ratio - Ford - 9" F890567 at low everyday prices. Be sure to check out all of our products from Motive Gear including Motive Gear Ford 9" Ring and Pinion.
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text:
" Address: Nethercourt Hill / Ramsgate / Kent / CT11 0RX "
Nethercourt Touring Park is located in Ramsgate, Kent and the grounds originally formed part of the gardens for the grand Nethercourt house. The land is now divided in to several sections, one containing a park (more on that later) and several fields (one of which is the camping/touring park).
The site welcomes backpackers, campers & tourers alike and offers a warm welcome to everyone and a variety of rates depending on how many of you there are and how much space your tent/vehicle takes up. There are quite a few different facilities on site and this was my first site camping so I will give you a little information on everything available to help you decide if this is the park for you.
Tom & I (my fiancé) arrived on Friday lunchtime and left on Monday morning (departures before 12pm except by prior arrangement which may incur additional costs) so stayed for four nights and as we had a small tent and required no electricity we paid the small sum of just £31.50 for a pitch for three nights for both of us. I don't think you'd find many bargains like this for your holidays!
Service Pitches: These areas are available for people who are travelling in a camper van, caravan etc and require the use of electric. The larger spaces are a maximum of 7.9m so should be accommodating to most vehicle sizes. The electric hook-ups are provided in conjunction with you having a RCD protected cable. There were quite a few different people who came and went during out stay and all of them seemed very well equipped with us gazing wistfully at some of the televisions as we strolled past at 1am on our way to the toilets.
Tenting Area: For tents & tourers who do not require electricity, such as us, this area was very well laid out with lots of space left for each pitch. As we were also travelling with my Mum & her boyfriend we had been left a fairly large space under the shade of the trees and we decided to have the front of our tents facing each other so that we could lay in the warmth of our tents at night and still be able to chat easily and cook dinner etc. The shade in which we pitched our tents meant that we did not swelter in the fairly warm summer days we were blessed with and we got to hear lots of birds & wildlife throughout the day. We found that we had the full sun from around 10:30am and this did not disappear until 8 or 9pm meaning that our tents had time to cool down just enough before bedtime without becoming too cold & we were not woken up in the morning because of the heat and on one occasion I even managed to lie in bed until after 11am!
The service pitches run towards the main camp building (toilets, showers, TV room, Games room, shop, washing up area etc) and the tenting area is in the middle of some of the service pitches so most areas are very close to the camp building so it's usually only 1 or 2 minutes walk to any of the facilities.
Toilets: This facility is in one large block and contains the showers etc as well. The female toilets contained around 8 cubicles which each had a small flip top bin (clean & tidy at all times) and were always kept stocked with toilet rolls. The sinks were cleaned very regular and there was a soap dispenser which was well stocked as well as a hand dryer which was completely automatic and used by simply placing your hands underneath (great for preventing the spread of germs). There was a baby changing area in the female toilets & whilst our group did not have to use it I did notice it looked clean & tidy with a changing mate and lots of lovely stickers up (I think they were ducks) so nice and welcoming for mother & baby. Tom advised that the male toilets were laid out pretty much the same with urinals in addition to the cubicles and we both felt that everything was kept very clean & tidy at all times and the floors were clean & tidy as well as the toilets being kept well stocked & very clean. I felt very comfortable visiting these toilets and there was a mop & bucket on hand by the showers to give the floor a quick wipe over if I'd made a mess so that made me feel nice knowing I was helping to keep it clean & tidy and I didn't need to use my towel to clean the floor after using the shower and traipsing back and forth like I usually do! There was also lots of mirrors & a big shelf running along the entire length of the sinks which meant that there was lots of space for my washbag, toothbrush etc when getting ready in the mornings/evenings. Tom advised me that there was a disabled toilet available with ramp access but because I do not need this facility I am not able to provide further information on this the male & female toilets themselves had just two steps for access.
Showers: There were three cubicles in the male toilet area & three in the female toilet area and these were lockable cubicles which had hooks on the back of the door as well as a little square table to hold my clean washing and toiletries. The shower itself was partitioned off within the cubicle by a shower curtain which was very clean (it looked almost brand new to me!) and there was a small area in each shower to hold soap, razor, shower gel etc and this was very useful as I didn't have to worry about dropping my soap and it disappearing through in to the next shower. The showers were very simple to use with a simple hot & cold tap and I could just turn both of them until I reached my desired temperature. The shower head itself was fixed to the wall and tall enough even for Tom (6' 2") so no complaints there either. Everything was kept very clean and I found myself spending more and more time in the shower each day trying to soothe away the aches from all the long walks that we went on. There is a hairdryer provided free of charge in both male & female toilets and this was a fantastic additional touch although as the weather was so warm I just let the sun dry my hair naturally. (I did miss my hair straighteners though!).
Both the showers & the toilets are open 24 hours a day and I visited at miscellaneous times throughout the day and night and always found everything to be very clean & satisfactory and I had no issues here at all (I was a little sceptical before we went camping and thought it may be a communal affair but thankfully not, although I'm sure Tom wouldn't have complained!).
Utility Room: This room contained a washing machine & tumble drier that were available for use for a small fee as well as a payphone, sink, draining area for washing up & lots of useful tourist information. We picked up several brochures here on Ramsgate, Margate and the surrounding areas and because I did most of the cooking I did not have to do much washing up which was a right result! There were a couple of sinks here so there was never any queue at busy times and this was kept clean and tidy and open from 9am-10:30pm. I did not visit this room much (except for some brochures) but I did notice a book exchange area which I think is a fantastic idea as you just leave your old book and swap it for a different one or visit reception and make a small donation and you can pick yourself up a new holiday read for when you visit the beach.
Reception/Shop: Here you are welcomed upon arrival (time dependant) by Mark & Emma and you can make payment for your pitch for the duration of your stay and you will be informed what area has been set aside for you or even offered from a variety of available pitches so you can choose whether you can more sun/more shade etc and this is fantastic as they seemed to be very flexible about this (depending on the number of campers they had of course). Within the shop you can pick up lots of different items such as cold drinks, sweets, crisps, chocolate etc & essential toiletry items such as sachets of shampoo, feminine hygiene products, tissues etc and this is great if you've run out of anything or just want something to satisfy your sweet tooth and have already eaten all of your suppliers. There is a fridge with a large selection of cold soft drinks & they also have an ice pack exchange where you can freeze your ice packs for just 10p (bargain!) and this is great if you are storing your own food for cooking and don't have electricity or a car (as we didn't). I only realised this service was available on the last day and will definitely use it during my next stay. The shop is well stocked & has lots of toys & souvenirs available at reasonable prices, it seems to be open for most of the day (between 9am & 10:30pm) and on a couple of occasions when it was closed I simply waited until Mark or Emma popped out of their on site accommodation and asked them if it was ok to purchase something or get change for the pool machine etc and they were always very happy to oblige. There is also tea & coffee & hot food available (see below for prices/further information) and although the four of us only ate from here once (our last day - trying to conserve funds throughout our break by cooking ourselves!) we were very pleased with the food that we had and everything was well cooked and piping hot.
Game/TV Room: There is quite a lot of entertainment within the game room and there is a TV room located to one side which contains a well sized TV, several chairs and some tables. The TV room is lovely and cool and is ideal for sitting to escape the sun and catch up with your favourite TV shows or just to read the paper in peace and quiet. The game room itself contains a full sized pool table (50p), quiz machine (Cludeo, WWTBAM, Weakest Link and several others 50p with cash payout for winning), pinball machine (50p), skill based fruit machine (various stakes from 10p - 50p) and another game machine (50p with lots of games available). This room provided lots of entertainment for us and there was lots of information on offer there such as local restaurants, special offers in pubs etc and this gave us a few good (and cheap) ideas of places to visit and pubs to eat in. We spent quite a few hours here over the 3 nights we stayed there and Tom & I thoroughly enjoyed being able to just turn up and play pool whenever we wanted. Most of the time this was very quiet and when there were people playing it was very simple to just put our 50p on the table and wait for our turn on the pool table.
BBQ/Seating Area: There was an area available for BBQ's or you could just collect some breeze blocks from the recycling/refuse area and build your own BBQ near your tent (these are provided to prevent any burning of the grass). There was several picnic benches and a long bench by the BBQ area so that there was lots of space to sit and eat as a family but we took advantage of the blocks and built our BBQ by out tent.
Water: There was a fire hose in the middle of the tent area which I noticed one couple using or there was drinking water available by the BBQ/Seating area (near the main camp building) and this was very convenient to use to get water for cooking or just for drinking purposes and we took a 10 litre container with us to keep water by our tent at night (a bargain for £1.00 from Poundland and it folded down in to our case when we left).
Refuse Area: Here you can recycle bottles, cans etc or simple dump your standard refuse. The area is well partitioned away from the main campsite and was kept clean and tidy. I was very pleased that you could recycle here as I like to do this at home and help do my bit for the environment.
Park: The park is just opposite the camp site and is well fenced off, for security. There are slides, swings, baby swings, climbing frames etc and one evening (when all the other children had left for the evening) Tom & I visited and just spent lots of time swinging away and chatting about things. It was really enjoyable and took me right back to my childhood!
Pitch Prices:
Backpacker (up to 2.0m x 3.0m - small tent, 2 people, no vehicle) £9.50 (O/Peak) £10.50 (Peak)
Standard Tent (up to 2.5m x 4.5m - includes 2 adults & 1 car) £12.50 (O/Peak) £13.50 (Peak)
Large Tent (up to 4.5m x 6.5m - includes 2 adults, 2 children & 1 car) £15.50 (O/Peak) £18.00 (Peak)
Super Size Tent (over 4.5m x 6.5m - includes 2 adults & 1 car) £18.00 (O/Peak) £24.00 (Peak)
Motor Home (up to 6.5m - no attachments - includes 2 adults) £12.50 (O/Peak) £13.50 (Peak)
Service Pitch (up to 7.2m - includes 2 adults, electric & awning) £15.00 (O/Peak) £16.00 (Peak)
Large Service Pitch (maximum 7.9m - includes 2 adults, electric & awning) £16.00 (O/Peak) £17.00 (Peak)
Additional Adults £2.50
Additional Child £1.50
Dogs £0.50 (Must be kept on a lead at all times within the campsite and being walked in the park).
Additional cars can be taken but must be pre-booked, arrivals from midday (unless previously arranged) & departures by midday (unless previously arranged).
Restaurant Prices: There are miscellaneous items available from the restaurant such as toasties from £2.50, all day breakfast for £4.50, toast 90p, tea or coffee 75p and I think that these items are very well priced and between the four of us we sampled the butties, toasties, breakfasts & chips on offer (all on our last day) and was very pleased with everything.
We thoroughly enjoyed our break and spent most of the days exploring and the evenings around a BBQ or just chatting outside the entrance to our tents. There was lots of wildlife around (birds, squirrels etc) and several times I noticed a bird (unsure of the type) that was particularly bold and kept flying over when we were making our BBQ! I relished watching all the wildlife around while sitting around and got some very nice photographs of some butterflies in the hedges and trees around the site.
We did not feel crowded at all and had lots of space. The noise was kept to a minimum and on the second and third night I slept so well that I actually woke up wondering where I was and gave Tom quite a laugh when I kept saying 'how long have we been here' at miscellaneous times throughout the night!
Children are very welcome at the site and there was quite a few of them for the first two nights as it was the half term holiday and therefore lots of families were away. I was very surprised at how little noise I heard and I was awake long before most of the children on the nights we stayed because I am quite a light sleeper so Tom tossing & turning woke me up!
Overall Tom & I really enjoyed the camping experience and we will definitely be returning to this particular park later in the year, the couple who run the park (Emma & Mark) are very friendly and made us feel very welcome. I would thoroughly recommend the site for first time campers or seasoned campers alike, there really is something to keep most people entertained and there is lots of space around as well as lots of things to do in the surrounding areas such as restaurants, pubs, beaches etc and we found lots to keep us entertained the whole time we were there.
The park is currently open from 1st April - 31st October but they may have a year round license in the future.
Contact Information:
01843 595485
Nethercourt Touring Park
Nethercourt Hill
I am rating this park 5/5 as I could not find a single fault with the whole place. The staff are very polite & helpful at all times, our pitch was very well spaced, and there were lovely birds around & a park for entertaining the children. We enjoyed playing pool most nights and the shop, although small, was very well stocked and there was lots of choices of drinks, sweets etc.
Caravan and camping park.


text:
second hard disk will not mount on client
I have a second hard drive installed on server. It has been mounted on server but I cannot mount it on client. I've tried to export it from server by putting:
/opt2 name.domain(rw,no_root_squash)
in server's /etc/exports.
In server's /etc/fstab, I have the entry:
/dev/hdb1 /opt2 ext3 defaults 1 2
In client's /etc/fstab, I put:
name.domain:/opt2 /opt2mnt nfs defaults 0 0
When trying to mount I get:
mount: name.domain:/opt2 failed, reason given by server: Permission denied
I've also try to mount it on client manually by:
mount -t nfs name.domain:/opt2 /opt2mnt
I am also mounting server's home directory on client, without problems, so I'd say NFS works fine.
Does anybody have an idea what might cause the problem?
Did you run "exportfs -a" after editing /etc/exports on the server?
Have you run "exportfs" to verify it shows as exported?
Hi jlightner,
Thank you for your reply.
I did do exportfs -a and I did verify exports with exportfs. It shows my entry: /opt2 name.domain
I've also restarted nfs. I've rebooted server and client too, but to no avail.
Could it be that I have to change some permissions?
Here are permissions for opt2 folder on server:
drwxr-xr-x root root
The opt2 folder contains hdb1. Permissions of hdb1 are:
drwxrwxrwx root root
I don't see anything wrong with these permissions but I am far away from being a linux expert.
|All times are GMT -5. The time now is 02:50 PM.


text:
Berlin (Apr. 4)
The frequent association of "Freemasons and Jews" often found in the rabid anti-Semitic literature of Germany, caused a section of German Freemasonry to renounce any such association.
At a mass meeting of the Wandsbeck Freemasons called for the purpose of defending themselves against the agitation carried on by the former war, lord, von Ludendorf, one of the speakers, a teacher, declared in behalf of three old Prussian lodges that they are "one hundred per cent free of Jews." Other lodges which engage in humanitarian work admit a three percent Jewish membership, he stated. "We, too, consider the international Jewish finance as a sore on the people's body," he declared, adding that before the war there was not a single Jewish officer in the Prussian regiments, and that the only regiment where there was a baptized Jewish officer was known as the "Cohen regiment." "We ask every applicant for membership in our order whether he is aware that he has Jewish blood in his veins."
This action of the three Prussian lodges caused a stir in the democratic German press. The newspapers urge the old Prussian lodges to publicly state whether they identify themselves
(Continued on Page 4)
(continue from page 1)
with the anti-semitic doctrine of the Voelkische ###.The police authorities as W### refused the local Haken-kre### organization permission to hold a public demonstration in connection with the forthcoming medical congress which is to take place there.
Several hundred ### physicians are expected to attend the sessions. The Hake### took this occasion to demand that Wies### be closed to Jewish visitors.
Sympathy for all the German anti Semines because after all ther### too, are a part of the German nation was demanded of German Jews in an article Published in the official ### of the national German Jewish Association.
Max Ne### writing in the paper, ##ges German Jews to have "understanding and a feeling of justice in their attitude towards ex-Kaiser Wil###, although he was a lifelong anti-Semites, because the anti-Semites, too are our German occupa###.


text: I say it's time to fire Dick Harter. He was brought in to teach the Pacers how to play defense. He's a defensive specialist...but obviously the game has passed him by. Either our players are not good enough to execute his system, or he's so old he's lost his ability to teach it properly and enforce how to do it the right way. Which ever, Harter should take full responsibility for our defensive struggles and be fired immediately! I love Obrien's offense...it's just Harter's defense I can't stand.


text:
US growth underpins sales surge at Divine Chocolate
Fairtrade confectionery manufacturer Divine Chocolate saw a 50%-plus boost to revenues last year as US growth helped make up for losing listings in UK supermarkets.
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First Lady Featured in Exclusive Event PSA Debuting on Sept. 3
NEW YORK, Sept. 1, 2011 /PRNewswire/ — Nickelodeon is joining with the First Lady's "Let's Move" campaign and the President's Council on Fitness, Sports and Nutrition to bring for the first time its flagship Worldwide Day of Play (WWDOP) event to the Ellipse in Washington, D.C., for the biggest celebration of active play in the eight-year history of the initiative. On Saturday, Sept. 24, Nickelodeon and its partners will host an entire day of activities and games for kids and their families to encourage active and healthy lifestyles. Additionally, as it has for the past seven years, Nickelodeon's networks and websites will go dark from 12 to 3 p.m. (all times ET/PT) as a signal to kids and families to get up and get active.
"Kids need to get moving every day to grow up healthy and strong," said First Lady Michelle Obama. "Whether it's hoola hooping, kicking around a soccer ball or – yes – double dutching, playing is the perfect way to keep active, stay healthy and have fun."
"First Lady Michelle Obama and the President's Council have shown admirable leadership in raising awareness about the importance of kids and families living healthier and more active lifestyles," added Marva Smalls, Executive Vice President, Public Affairs, Nickelodeon. "We share the same passion for that message, and at Nick we hope to continue to inspire action through Worldwide Day of Play and The Big Help."
In the weeks leading up to WWDOP, First Lady Michelle Obama will be featured in an exclusive PSA to raise awareness for the event and the Presidential Active Lifestyle Award (PALA) Challenge. In the spot, speaking from the White House lawn, Mrs. Obama encourages kids to get active an hour a day to earn the Presidential Active Lifestyle Award and asks families to celebrate at Nickelodeon's WWDOP with her in Washington, D.C. The spot, which bows on Nickelodeon and its digital networks (TeenNick, Nicktoons and Nick Jr.) on Sept. 3, also features the First Lady jumping double dutch with D.C.-area kids to highlight the importance of play.
Kids in every state across the U.S. and in 12 countries worldwide are expected to participate in Nickelodeon's WWDOP at the more than 3,000 local events anticipated. Launched in 2002, WWDOP is part of Nickelodeon's The Big Help health and wellness efforts, which include grants programs, public service announcements, websites, games and more. Millions of kids have participated in WWDOP and Nickelodeon's other initiatives that promote healthier lifestyles. The Big Help campaign is a kid-led movement for positive change that focuses on four key issues: the environment, education, health and wellness and community service. For more information about Nickelodeon's WWDOP, visit http://www.nick.com/thebighelp/road-to-wwdop.html. Click on resources for WWDOP event planning materials.
Nickelodeon, now in its 32nd year, is the number-one entertainment brand for kids. It has built a diverse, global business by putting kids first in everything it does. The company includes television programming and production in the United States and around the world, plus consumer products, online, recreation, books and feature films. Nickelodeon's U.S. television network is seen in more than 100 million households and has been the number-one-rated basic cable network for 16 consecutive years. For more information or artwork, visit http://www.nickpress.com. Nickelodeon and all related titles, characters and logos are trademarks of Viacom Inc. (NYSE: VIA, VIA.B).
SOURCE Nickelodeon


text:
Epicurious loves a party and for a while now we've wanted to create the ultimate guide to entertaining. In addition to sharing tips for stocking the bar, advice on how much food to make, and ideas for decorating the table, we also wanted to give you a feel for our entertaining personality, and to show you just how fun (and easy) it can be to host a great party.
Enter Clinton Kelly, the host of TLC's What Not to Wear and everyone's favorite advice giver. It turns out that Kelly's expertise isn't limited to overhauling wardrobes. He's actually a bit of a renaissance man with a wealth of lifestyle savvy. And, eager to share his ideas, Kelly has written a book called Freakin' Fabulous: How to Dress, Speak, Behave, Eat, Drink, Entertain, Decorate, and Generally Be Better Than Everyone Else.
With Kelly on board, the natural next step was to get out the camera and create a video series. The result, The Epicurious Guide to Entertaining, includes nine videos to help you throw a party with tons of style but very little stress. Looking for easy, last-minute hors d'oeuvres? Kelly shares three of his favorites: Radishes with Butter and Kosher Salt, Prosciutto Stuffed with Arugula and Gorgonzola, and Lobster Salad on Cucumber Slices. Clueless when it comes to centerpieces? Kelly demonstrates how to make two super-simple floral arrangements, and offers ideas for decorating with candles and fresh, seasonal ingredients. Plus, we have videos on setting up a home bar, organizing the party buffet, setting the table, and arranging your party space.
In the words of Clinton Kelly, "Here's to you and your next shindig!"


text:
Hookah done right since 2004.
- Unlimited Al Fakher hookahs all night, any night
- Fantasia premium hookah tobacco available
- Mouth-watering mixes lovingly prepared by experts
- Open 8PM – 3AM, seven days a week
- Plush, half-moon shaped couches that each fit 12 people
- FREE WiFi & power outlets behind every booth
- Live music weekly & eclectic playlist of over 3,000 songs
FIRST TIME? Check out our frequently asked questions, discounts & specials, and find a location nearest you.


text:
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text: I need some pros/cons on car rentals for our 8 day visit to WDW, please. Originally I thought we'd just use a towncar service for roundtrip service between the resort and the airport, but then I got to thinking about the other things we'll be doing during our trip (visiting US/IOA, going to Downtown Disney for "La Nouba", etc.) and I wondered if the cost of taxi fare combined with the $100 cost for towncar service (approx. cost + tip) would end up being more or equal to the amount we'd spend if we just rented a car ... I'm not crazy about the idea of having to drive around WDW, but it sure would make getting to and from US/IOA much easier, not to mention Downtown Disney. When we made our "La Nouba" reservations, the lady on the phone told my DF specifically that we'd need to allow approximately 2 HOURS to get from our resort (ASMu) to DD. That sounds crazy to me, and I don't want to have to pay taxi fare just to ensure we get to the show on-time without having to go super early. It's a dilemna! What would you all suggest? I've checked into some preliminary costs for car rental, and even with some discount codes from MouseSavers.com, we're still looking at around $180 or so for the week for an economy-grade car. Any and all ideas you could give would be fantastic!


text:
3 Sioux Falls policemen injured during arrest
SIOUX FALLS (AP) — Authorities in Sioux Falls say three policemen have been treated for injuries they sustained when trying to arrest a man following the report of a suspected domestic dispute.
Police on Wednesday said the officers were transported to a hospital.
Police say 31-year-old Rocky T. Traversie Jr. allegedly hit two relatives with a brick and threatened to not let them leave a northern Sioux Falls home. Authorities say three more people where at the home during the incident. Police say a teenager escaped through a window and called police.
Eighteen police officers responded to the scene.
Police say the Sioux Falls man has been arrested on three counts of aggravated assault on law enforcement, five counts of kidnapping and two counts of aggravated assault domestic.
Traversie's attorney information couldn't be found.


text:
foldable multiwii quadcopter
by muellerr_ch, published
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this is my first foldable quadcopter that i designed to accompany me on hikes in the mountains. the model was created in creo elements express (free cad package from ptc). the model can therefore be modified freely.
here's a first film of the thing in the air:
the main picture shows the quadcopter after the first crash. despite a free fall of more than 20 m nothing major got damaged except for the legs that broke off.
quadcopter on my site:
- 3d print the following parts:
- house_1 to house_6
- mount_1 to mount_4
- ball_1 to ball_3
- legattachment
- cut an 8 mm carbon rod of 1 m length in half
- cut 3 pieces of 70 mm length from a 4 mm carbon rod
- cut lid_1, lid_2, lid_4, lid_6 and lid_7 from 1 mm birch plywood
- cut lid_3 and lid_5 from 2 mm birch plywood
- glue an 8 mm carbon rod to house_3
- glue an 8 mm carbon rod to house_4
- glue mount_1-4 to the ends of the 8 mm carbon rods
- glue the 4 mm carbon rod to the legattachment
- glue the balls to the other ends of the 4 mm carbon rods
- assemble using m3 bolts and m2 bolts for the motor attachment ...
further material required:
- 4 esc's (turnigy multistar 10 a)
- 4 brushless motors (turnigy mt2204-14t)
- 4 propellers 8x4.5 cw and ccw
- 2s lipo 2200 mah
- multiwii mini (40x40)
- rc receiver
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I wonder if you could improve the landing gear by making it out of a flexible filament. I have been playing with polyurethane (http://www.thingiverse.com/thing:93148)http://www.thingiverse.com/thi... and I think it might make great rubber landing gear which could withstand the impact and even cushion it to help protect the craft.
Just an idea. And Love your design =D.
I like the idea of printing a flexible landing gear. Unfortunately the quadcopter does not always crash on its landing gear. Last saturday it lost a propeller in flight and the quadcopter rammed motor first into the ground.
Flexible prints might actually be very useful for vibration insulation. After attaching a camera to this quadcopter I had a really hard time getting rid of the rolling shutter effect. I tried almost everything except for a 3d printed motor mount made of flexible plastic.
That's another excellent idea. Have been playing with this printable rubber for a bit now, but haven't had too many really good ideas for what to use it for. The camera mount and shock absorbers would be excellent uses for it. Let me know if you do design either and want me to give it a try printing them if you can't.
For now I solved the problem by using alpha gel pads. But I might consider designing another camera mount that could be printed.
Awesome foldable design. I never seen one like this great idea and great build.
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foldable multiwii quadcopter by muellerr_ch is licensed under the Creative Commons - Attribution license.
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