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Relevant offers
Home & Property
A raft of changes to the Fair Trading and Consumer Guarantees Acts covers goods bought at auction, including commercial and residential properties.
One of the biggest changes relates to vendor bids, which are still permitted under the new law.
But now, unless properly made, they could be a false and misleading representation under the Fair Trading Act.
Usually an auctioneer makes a vendor bid on the vendor's behalf to start the bidding, keep the bids moving or to persuade buyers to raise their bids so they are closer to the vendor's the reserve price.
"But sometimes these bids have been used to artificially inflate the price that is reported if the property is passed in at auction below the reserve price," the Real Estate Agents Authority says.
"This can inflate the price expectations for a future auction, despite there being no genuine bids at that price," according to the authority.
The new law protects bidders who do not understand the vendor bid process or its purpose, and who could be deceived into thinking that a vendor bid was a genuine bid.
Now a vendor bid can be made only if:
- the property at auction has a reserve price;
- the bid is clearly identified by the auctioneer as a vendor bid; and,
- the reserve price has not been reached.
And if the property is unsold at the end of an auction, any subsequent reference to a vendor bid (if it was the highest bid in the auction) may not be used.
The only amount to be quoted can be bids from genuine prospective purchasers.
Consumer New Zealand calls the law changes "long overdue", especially the amendment of the Consumer Guarantees Act to cover goods bought at auction including internet auctions.
In other changes, the Fair Trading Act now bans unsubstantiated product claims.
This means businesses can't make claims about something they are selling if they don't have evidence or reasonable grounds for making them.
Businesses will also face substantially tougher penalties for serious breaches of the Fair Trading Act.
Maximum penalties for misleading and deceptive conduct, false representations and unfair practices have increased from $60,000 to $200,000 for individuals and from $200,000 to $600,000 for businesses.
Individuals who repeatedly break the law will face banning orders for up to 10 years.
Businesses will also face penalties for failing to comply with the rules relating to door-to- door sales, extended warranties and lay-by sales.
- The Press
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Nehe Milner-Skudder on TV, who he is and when he'll play rugby again
What do you most want to change about your home?


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subset: commoncrawl


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Origami Kawasaki Roses
The one above is just a big one with a smaller one squashed into its centre.
Okay, heres my first attempts at Origami Kawasaki Roses, I saw some on bloomize.com and got inspired.
Previously I have not tried them, the diagram looks really scary… it looks soooo complicated, but I just thought oh well just try..!
I tried a few different videos on youtube.. this I think is the best:
So I realise that anyone can make them, you just have to fold a lot of tiny squares first.
I made 5 so far, I want to commit it to memory, because I don't want to watch anymore videos ever again!
Bloomize offered some helpful tips!
Chrissy Pk
Latest posts by Chrissy Pk (see all)
- How to make an Origami Paperclip - June 26, 2016
- Square Origami Tray / Table Caddy Tutorial - June 25, 2016
- Origami Toolbox or Long Tray Tutorial - June 24, 2016
- Origami Flower Bowl Tutorial - June 18, 2016
- Tall Origami Drawers – Tutorial - June 17, 2016


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Sunday, June 12, 2016
MECHANICUM - A few more Knights
Around the same time as I bought my Warlord Titan last year, I also bought the Questoris Styrix Knight. He has sadly languished in the FW bag for almost a year, but now he stands tall (well, kind of hunched) and ready for paint.
And some of you might remember this guy. A couple of years ago I built this Knight Warden, an homage to the Epic Knight Wardens of ancient times. My conversion was based on the excellent work of Clarence Harrison. But some folks weren't too happy with it. I took a number of suggestions on board, and decided to add a few things that people hadn't suggested.
I wanted to get the feet and legs feeling a lot more like the original, although not a direct copy). I spoke with my friend (and long-time follower of this blog) Jake Schneider, who digitally sculpted the toes, footplate, and greaves that you see in the photos. Jake sent me the files, and it took a little while to get printing sorted. Once I had some great 3D prints (thanks to another friend, Joe) I sent everything off to be molded and cast. I received everything back from the casters a few weeks ago, and now I have started the process of working out how to attach everything : )
This is not the final arrangement of all pieces. I have a few more things to do. I just felt like letting you know that things were finally progressing : )
Friday, June 3, 2016
HERESY - Death Guard Moritat
It has taken me a little while to get him finished, but my DeathGuard Moritat is finally ready to take the field. I know that the "twin plasma pistol devastation" is a thing of the past, but I still love the gunslinger look the paired pistols gives him.
Here's a quick size comparison. My Moritat stands tall, very tall.
And a quick reminder of what he looked like pre-paint.
Thursday, June 2, 2016
UNUSUAL - Painting the Femme Militant Cataphractii
Here's a recent commission I finished. It's the very first time I've painted one of the hallowed Femme Militant models and she was a real treat to work on. I hope you enjoy... Cataphractii
Friday, May 27, 2016
INQUISITOR - Two sides of the same coin?
Thanks for bearing with me through these busy times. So much to do that often there isn't a moment to be posting on this blog or browsing through the wonderful blogs of others.
I wanted to make sure that my client had a chance to check out these models before I posted the, and now that he has seen them, I can reveal the latest two Inquisitor models to you.
The first is Inquisitor Covenant, one of the coolest Jes Goodwin sculpts ever, and certainly a lynchpin in the original releaseof the game and miniatures range. I've copied the Studio paint job here, and I think it's quite interesting how it highlights the variety within the Inquisition. While Witch Hunter Tyrus is all kinds of bold and brash in his gold armor, Covenant is much more reserved, but no less Inquisitorial, in his black stormcoat and deep red armor.
Facing off against Covenant this month is this Chaos Magus. My client gave me free rein on this one. I was allowed to pick the god that he would follow, and any conversions that might entail. I had already decided on Tzeentch (thanks to the prompting of a few friends) and was about to start work on him when the photos of Warhammer Quest: Silver Tower started to drop. I loved the look of the Magus in there, so I went to town. The helmet is sculpted from scratch, putty over vanes of plasticard (see below). When it came to painting him, I knew I wanted to keep him nice and bright and skirting the boundaries of garish. I hope I've hit that mark : )
I'm not sure when I'll get to the Cultists to go with him, but rest assured that they will also be inspired by the Silver Tower models.
Thursday, May 26, 2016
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Allison E. SouliaSeptember 18,2013Allison E. Soulia
Allison E. Soulia, 97, died Sept. 16, 2013, at Mountain View Genesis Center.
She was the wife of Oscar R. Soulia, who died in 1983.
A complete obituary will be published in a future edition of the Rutland Herald.
Arrangements are under the direction of the Clifford Funeral Home.MORE IN ObituariesFrances M. Bruce
POULTNEY Frances M. Full StoryEdward M. Goutas
Edward M. Goutas, 73, died Sunday, June 19, 2016, after a brief illness. Full StoryCatherine L. Wheeler
Catherine L. Wheeler, 54, died Tuesday, June 7, 2016, at her home. Full Story
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I took advantage of the weather to wear this outfit made of a biker jacket and a military coat. As you know, biker coats are quite fashionable this season and my proposal is to save money: the biker jacket over the coat and we achieve that effect, just changing the order and overlaying garments.
Leather trousers are really warm and a final touch is given by the burgundy lace shirt that I showed (HERE) and my new cowboy boots in leather and pony, both Isabel Marant style. In that way, I was ready for the cold weather! Hope you like it! ;)
love it ! hype
oh gosh! love your jacket!!!!! amazing look!
wooow shoes are perfect :)
beautiful look, i love the top <3


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Lyrics Depot is your source of lyrics to Intro by 2Pac. Please check back for more 2Pac lyrics.
Intro Lyrics
Artist: 2Pac
Album: Better Dayz
Good Evening
I'm reporting live from Sunset Boulevard
Where many excited fans have gathered with candles
Awaiting the much anticipated release, of Tupac Shakur's latest album, Better Dayz
This is yet another post-humorous release by Tupac
Which, raises the question
Where are these songs coming from?
It's interesting how, the message in these songs
Is still relevant today
Even in his death, he's touching people with his lyrics
I can feel the energy in the air, as they count down to midnight
When the album will officially be released
Oh, hold on, I, think they're starting to countdown now
5, 4, 3, 2, 1 ...
2Pac Lyrics
2Pac Better Dayz Lyrics
More 2Pac Music Lyrics:
2Pac - Do For Love Lyrics
2Pac - Enemies With Me Lyrics
2Pac - Everything They Owe Lyrics
2Pac - High 'Til I Die Lyrics
2Pac - Holla If You Hear Me Lyrics
2Pac - Made Niggaz Lyrics
2Pac - Nothing To Lose Lyrics
2Pac - Pour Out A Little Liquor Lyrics


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What a goal this would have been! Sublime Liverpool football thwarted by brilliant Joe Hart save [Video & GIF]
- By Dov Rawson
- December 26, 2013
- Comments0
Liverpool can count themselves unlucky after succumbing to a 2-1 defeat to Manchester City at the Etihad.
At 1-1, Liverpool almost restored their lead after a truly beautiful move involving Raheem Sterling, Luis Suarez and Philipe Coutinho.
The sumptuous piece of play would surely have been the goal of the weekend, but Joe Hart came to Manchester City's rescue with a fine save from Coutinho's shot.
Liverpool's goal was also created by a stunning team move.
A video can be seen below the GIF:
Grab more information on: Joe HartLiverpool
Odds on next game: Arsenal: 1/1, Draw: 12/5 & Liverpool: 11/4


text:
The Gus' Explorer Canopies attraction, December 5, 1973, 12:52 a.m.
These guest-powered canopies have a water's-eye view of the ripples around the Rivers of the Heliport. It's the most intense way to see the shoes of animatronic Native Americans without the convenience of a motor!
Please don't try Pirate Mode
© copyright 2011–2016
A Pants Aflame production


text:
|Publication number
|Publication type
|Application number
|Publication date
|Apr 4, 2000
|Filing date
|Jan 8, 1997
|Priority date
|Jan 8, 1997
|Fee status
|Also published as
|Publication number
|Bret Adams, Gregory N. Hamilton
|Original Assignee
|Applied Materials, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (20), Non-Patent Citations (1), Referenced by (16), Classifications (13), Legal Events (7)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention relates to semi-conductor processing equipment, more specifically to an improved target assembly for ameliorating the effect of back sputtering during vapor deposition.
2. Background of Related Art
In semiconductor processing, and more specifically in physical vapor deposition, a target is disposed on a backing plate in the upper portion of a chamber and a plasma is struck between a work piece and the target to produce ions which bombard the target and result in the deposition of target material onto the work piece. While most processes are finely tuned to result in deposition of target material onto the work piece in a trajectory which is normal to the work piece, some particles are redeposited on or near the target itself. These particles become a source of contamination which loosely adhere to the target and surrounding areas of the chamber and may eventually flake off and fall onto the work piece.
Efforts aimed at reducing the concentration of particles in sputter chambers have taken many different approaches. One approach is to periodically clean the chamber using a wet-clean process. Another approach is to clean the chamber with a cleaning gas that reacts with the deposits. The gaseous by-products of these reactions are exhausted from the chamber. However, in both of these approaches, the deposition process must be discontinued during the cleaning process and additional time must be taken for the cleaning materials and by-products to be evacuated from the chamber before the deposition process can resume.
Another method for managing the particle concentration in a chamber involves the use of sputter shields that prevent sputtered particles from depositing directly on the chamber walls. The sputter shield is periodically replaced as part of the process kit so that buildup of potentially harmful deposits never gets out of control. This method can reduce the frequency at which the chamber must be cleaned, but a fraction of the particles still pass around the shield and eventually form deposits that must be cleaned.
Another approach is to replace what is known as the processing kit components. Typically, a processing kit includes both a cylindrical sputter shield and a clamp ring which holds the work piece on the support member. The cylindrical shield is suspended in the chamber below the target and prevents deposition on the chamber walls, while the clamp ring is disposed in the chamber near the work piece to expose one surface of the work piece to the target. The cylindrical shield and clamp ring are consumables that are periodically removed from the chamber and replaced with new components. However, the target is an expensive item and is not replaced as often as the shield and clamp ring. Therefore, the target still accumulates particles that can result in product failure and frequently must be replaced prior to the planned life of the target.
The problem of redeposition of sputtered material back onto the target sidewall has also been recognized as an undesirable source of particles in the chamber. Sputtered particles that become scattered in the chamber atmosphere can redeposit onto the side of the target and accumulate to form particles of the deposition material. Because RF or DC power is applied to the target during sputter deposition on a substrate and then removed from the target between substrates, the target, as well as the redeposited material, is continually heated and cooled and thereby subjected to thermal stress. Over a period of time, this stress will cause particles of the redeposited material to come loose and fall onto the substrate.
U.S. Pat. No. 5,334,298 describes a sputtering cathode which was designed to reduce sputtering around the edges of a target. A "dark space shield" was added to expose only one surface of the target and stop ignition of plasma around the perimeter of the target. Such a shield could be replaced along with other components as needed to reduce particle contaminants.
The target in a physical vapor deposition system is typically attached to a baseplate which serves as a lid to the deposition chamber. The portion of the baseplate surrounding the outer perimeter of the target is an area in which back sputtered particles tend to deposit, and then, over time, fall to deposit on the substrate.
Therefore, there exists a need to provide a method and apparatus which provides an easy and cost effective way of removing particles from the sputter chamber. More particularly, there is a need for a method and apparatus for periodically cleaning the surfaces around a target in a process chamber on which back sputtered particles may deposit. It would be most desirable if the apparatus and method could be carried out in accordance with usual and customary cleaning processes in order to maintain the substrate throughput of the system.
The invention is an improved target assembly for a deposition chamber wherein the backing plate which mounts a target has a groove for receiving a target shield. The target shield collects stray particles and can be replaced during normal cleaning operations without replacement of the remainder of the target assembly. The target shield can be used with targets having tapered edges.
So that the manner in which the above recited features, advantages and objects of the present invention are attained and can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the embodiments thereof which are illustrated in the appended drawings.
It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.
FIG. 1 is a cross-sectional view through, a typical physical vapor deposition chamber showing a target assembly that is an embodiment of the present invention;
FIG. 2 is an expanded view of a portion of the target assembly identified in FIG. 1;
FIG. 3 is a bottom view showing a target shield connected to a backing plate; and
FIG. 4 is an alternative expanded view of FIG. 2 showing an alternative embodiment wherein the target edges are tapered to reduce accumulation of particles on the edges.
The process of sputtering is a physical vapor deposition (PVD) technique in which a solid material, such as titanium or aluminum, is used as the source (also referred to as the "target") and is bombarded with ions which cause ejection of target material and deposition of the ejected material onto a work piece. The target is typically mounted to a backing plate and positioned in the top of a vacuum chamber containing an inert gas such as argon. A DC or RF voltage may then be applied to the target to generate a plasma in the region between the target and the work piece. The high energy ions in the plasma, such as argon ions, bombard the target and dislodge metal atoms. The metal atoms or particles may have various trajectories that cause deposition on a desired surface, such as a substrate, as well as on the chamber walls and other chamber components. Furthermore, particle trajectories may be changed by interaction with the plasma or collisions with gas molecules or the like.
A simplified sectional view of a conventional sputtering chamber 10 which has been modified in accordance with the present invention is shown in FIG. 1 and includes a conventional sputtering target 14 which typically has edges tapered at about 15� from normal. The chamber 10 generally includes a chamber enclosure wall 24, having at least one gas inlet (not shown) and an exhaust outlet 28 connected to an exhaust pump (not shown). A substrate support pedestal 20 is disposed at the lower end of the chamber 10, and a target 14 is received at the upper end of the chamber 10 opposite the substrate support pedestal 20. The target 14 is connected to an insulative member 15 which electrically isolates the target 14 from the enclosure wall 24. The insulative member 15 is typically a non-conductive metal such as aluminum oxide and is generally disposed between the target 14 and a backing plate 18 which forms a portion of the enclosure wall 24.
The backing plate 18 typically forms a wall of the chamber, preferably a removable lid which provides access to the chamber 10. The combination of the backing plate 18, the insulative member 15, and the target 14 forms a target assembly which is conveniently replaced as a unit when the target 14 stops producing a consistent and reproducible distribution of metal atoms. The enclosure wall 24, including the backing plate 18, is preferably grounded, so that a negative voltage may be maintained on the target 14 with respect to the grounded enclosure wall 24. A support shield 40 may be suspended from the backing plate 18 or other portion of the enclosure wall 24, where the shield 40 preferably includes an annular, upturned, wall 41 on which a clamp ring 38 may be suspended over the pedestal 20 when the pedestal 20 is retracted downwardly in the chamber 10 as shown in FIG. 1. When a gas is introduced into the chamber at low pressure, a negative bias voltage is applied to the target and the chamber walls are grounded, a portion of the gas can be ionized to form a plasma. The positively charged gas ions are electrically attracted to the sputter target and collide therewith to dislodge atoms or larger particles of target material from the target.
In sputtering, the chamber 10 is used to form a metal film by sputtering particles from the target 14 onto a substrate 16. A major portion of the sputtered metal atoms or groups of atoms follow a substantially linear trajectory over a distribution of angles due to the low pressure maintained in the chamber. The gas composition and pressure in the sputtering chamber 10 is typically achieved by evacuating the chamber to between about 10-6 to about 10-9 Torr before back-filling the chamber 10 with argon to a pressure of a few mTorr. At these gas pressures, the distance between the target 14 and the substrate 16 can be less than the mean free path of the argon gas molecules. Therefore, many sputtered particles travel directly to the substrate 16 without a collision with other particles. However, a significant portion of the sputtered particles become scattered in the gas, due to collisions within the plasma discharge, electrical field effects and the like. These scattered particles can redeposit onto various surfaces of the chamber 10, including the exposed areas of the backing plate 18, the insulative member 15, and the target 14 itself.
Accumulation of redeposited particles around the target edge can eventually form an electrical short between the target 14 and the backing, plate 18 requiring that the chamber be shut down and cleaned. Redeposition of particles can also lead to a buildup of material on the target and backing plate that will periodically flake off, thereby generating undesired particles that can then cause fatal defects in devices formed from the substrate 16, typically integrated circuit devices.
Referring to FIGS. 1-3, the present invention provides a modified target assembly for use in a conventional deposition chamber 10. The target assembly has a backing plate 18, typically made of anodized aluminum, modified to include a removable target shield 50 positioned on the face of the backing plate adjacent the target. The target shield 50 is preferably a metal ring which is mounted in an annular groove 52 in the backing plate 18. The target shield 50 is disposed about the outer perimeter of the target where significant particle deposition occurs in conventional deposition chambers. While a target shield providing some benefit can be made with a variety of inner and outer dimensions with respect to the target is preferred that the target shield have an inner dimension that abuts the edge of the target and an outer dimension that extends away from the target to at least a point where the tipper edge of the sputter shield protects the outer perimeter of the backing plate 18. A target shield having these dimensions cooperates with the sputter shield and clamp ring to provide a system of continuous deposition shields between the target and the substrate which are quickly and easily replaced.
The target shield 50 is preferably recessed into the backing plate 18 to provide a planar surface therewith and avoid interference with the target 14. The target shield 50 may be fastened to the backing plate 18 by any conventional fastening means, preferably flat head screws 54 that are flush with the surface of the target shield 50 and made of the same material as the shield. The target shield 50 preferably has a rectangular cross-section with a rough exposed surface to increase adhesion to stray particles. It may be further desirable for the annular groove 52 and mating target shield 50 to have outwardly tapered side walls (i.e., the groove width increases as it approaches the surface of the backing plate exposed to the chamber environment as shown in FIG. 4) to assist in the placement and removal of the shield and to accommodate any expansion of the various components during processing.
It is preferred that the target shield 50 be produced from a material having the same or similar expansion coefficient as the target. Preferably, the shield 50 is made of the same material as the target, such as Ti, Cu, or Al, or stainless steel. Stainless steel has advantages from a cost efficient standpoint. In addition, the shield 50 may be made of the same metal as the backing plate, such as anodized aluminum, although a different material could be selected based on improved performance in repulsing or adhering to stray particles. Preferred materials for the target shield include Ti, Cu, Al and stainless steel, with the most preferred material being the target material in a selected process. The choice of materials depends not only on improving, the operation of the process chamber, but also the ability to remove the target shield 50 from the backing plate 18 during normal cleaning operations.
The roughness of the target shield is important for providing sufficient mechanical support for particles depositing thereon. When the material is too smooth, the redeposited particles only loosely adhere to the smooth surface and can very easily detach and fall onto a substrate during processing. While it would be desirable to avoid redeposition, once target material is in fact redeposited, it is generally preferred that the material firmly attach rather than flake off or otherwise separate from the shield surface. Therefore, the preferred roughness for the target shield of the present invention is between about 0.05 mm and about 0.5 mm.
In preparation for receiving a semiconductor substrate 16 into the chamber 10 for processing, the substrate support pedestal 20 is lowered by a drive mechanism well below the clamp ring 38 suspended on the shield 40, and so that the bottom of the pedestal 20 is close to a pin positioning platform 36. The pedestal 20 typically includes three or more vertical bores (not shown), each of which contains a vertically slidable pin 34. When the pedestal 20 is in the lowered position just described, the bottom tip of each pin 34 rests on the platform 36, and the upper tip of each pin protrudes above the upper surface of the pedestal 20. The upper tips define a plane parallel to the upper surface of the pedestal 20.
A conventional robot arm (not shown) typically transfers the substrate 16 into the chamber 10 and places the substrate 16 above the upper tips of the pins 34. A lift mechanism 43 moves the pin platform 36 upwardly, to place the upper tips of the pins 34 against the underside of the substrate 16 to lift the substrate 16 off the robot arm. The robot arm then retracts from the chamber 10, and the lift mechanism 43 raises the pedestal 20 so that the pins slide down in the pedestal 20, thereby lowering the substrate 16 onto the top surface of the pedestal 20. Substrate alignment pins 47 disposed on the perimeter of the upper surface of the pedestal 20 provide a sloped surface to urge the substrate 16 into a centered position.
The lift mechanism 43 continues to raise the pedestal 20 until the substrate 16 is an appropriate distance from the target 14. When an annular clamp ring 38 is used, the substrate 16 contacts the inner portion 60 of the annular clamp ring 38 resting on the upturned wall portion 41 and lifts the clamp ring off the upturned wall portion. The inner diameter of the clamp ring 38 is slightly smaller than the diameter of the substrate 16 so that the edge of the substrate is protected from the deposition environment and supports the weight of the clamp ring.
At this point, the film deposition process can begin. In the case of the exemplary sputtering chamber 10 shown in FIG. 1, a sputtering process gas (typically argon) is supplied to the chamber through the gas inlet (not shown), and a DC power supply 12 applies a negative voltage to the sputtering target 14. The voltage excites the argon gas to a plasma state, and argon ions bombard the negatively biased target 14 to sputter material off the target 14. Sputtered material then deposits on the substrate 16, except for the periphery thereof which is shielded by the clamp ring 38.
After a film layer has been deposited on the substrate 16, the substrate 16 is removed from the chamber 10 by reversing the sequence of steps by which it was carried into the chamber 10. Specifically, the lift mechanism 43 lowers the pedestal 20 below the upturned wall portion 41, so that the clamp ring 38 descends onto the shield. At this point the weight of the clamp ring 38 is supported by the shield 40, not by the substrate 16 and pedestal 20. The clamp ring 38 may comprise a leaf spring 45 to assist in separating the substrate 16 from the clamp ring 38. During deposition, deposits may form at the interface of the clamp ring 38 and substrate 16. The biasing force of the leaf spring 45 separates the clamp ring 38 from the substrate without causing damage to the substrate.
Performance of the target shield 50 of the present invention as described above may be enhanced by altering the profile of the target edges. For example, the target edges may be tapered to reduce accumulation of particles as shown in FIG. 4. However, it should be recognized that the target edge may have any profile within the scope of the present invention.
The frequency at which process components are replaced is effected by the particular process conditions and chamber design. For example, in one aspect of the invention, a process kit may include a sputter shield, clamp ring, collimator and a target shield of the present invention. It is possible that any of these kit components will be the first to require replacing. If the gas pressure is high, there may be greater particle scattering in the gas causing greater redeposition on the target shield. If the collimator is designed to pass only those particles with trajectories within a few degrees of normal to the substrate surface, then the collimator will receive greater amounts of deposits. It should be understood by one in the art that certain chambers and processes may result in one component of the kit receiving deposition at a greater rate than the other components and, therefore, may require more frequent replacement. However, it is generally preferred that the entire processing kit be replaced at the same time to minimize process interruptions.
The target shield 50 provides improved particle performance and target life in two ways: Firstly, removing and replacing the target shield 50 allows the continued use of the target until it is fully consumed, while ridding the chamber of particles that have accumulated on the target shield and have potential for interfering with the deposition process or reducing product quality; and, secondly, removing and replacing the target shield removes a possible short circuit pathway where metal particles have accumulated.
The target shield is preferably replaced during replacement of the processing kit and following the same general procedures. When the chamber has been shut down, i.e. the power is off and the chamber has been purged and pressurized to near atmospheric pressure, the chamber is opened and the target and target shield are inspected. If the target has been fully consumed, then the target and backing plate are replaced. If the target has remaining life, the target shield having deposits thereon is detached and a clean target shield is mounted in its place. After replacement of the other processing kit components, the chamber is closed for further processing. In this manner, significant amounts of potentially-contaminating particle deposits are quickly removed from the chamber without using reactive gases or liquids, and the useful life of the target is limited by the quantity of target material thereon, and not by contamination of the backing plate with backsputtered materials.
While the foregoing is directed to preferred embodiments of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims which follow.
|Cited Patent
|Filing date
|Publication date
|Oct 29, 1981
|Sep 18, 1984
|Materials Research Corporation
|Focusing magnetron sputtering apparatus
|Nov 28, 1983
|Jun 25, 1985
|Materials Research Corporation
|Magnetron reactive bias sputtering method and apparatus
|Dec 8, 1988
|Jun 12, 1990
|Kabushiki Kaisha Toshiba
|Sputtering device
|May 1, 1989
|Oct 30, 1990
|Kabushiki Kaisha Toshiba
|Sputtering target
|Mar 19, 1992
|Dec 21, 1993
|Vlsi Technology, Inc.
|Design for sputter targets to reduce defects in refractory metal films
|Dec 4, 1992
|Jul 12, 1994
|Honeywell Inc.
|Off-axis magnetron sputter deposition of mirrors
|Oct 20, 1992
|Aug 2, 1994
|Leybold Ag
|Sputtering cathode
|Aug 11, 1992
|Feb 21, 1995
|Applied Materials, Inc.
|Method for preparing a shield to reduce particles in a physical vapor deposition chamber
|Oct 19, 1994
|Jul 23, 1996
|Applied Materials, Inc.
|Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus
|Jul 16, 1993
|Jul 30, 1996
|Applied Materials, Inc.
|Method and apparatus for adjustment of spacing between wafer and PVD target during semiconductor processing
|May 22, 1995
|May 27, 1997
|Stevens; Joseph J.
|Two piece anti-stick clamp ring
|Oct 8, 1993
|Jun 3, 1997
|Varian Associates, Inc.
|Collimated deposition apparatus and method
|Mar 12, 1984
|Dec 5, 1984
|Materials Research Corporation
|Focusing magnetron sputtering apparatus
|Jul 5, 1986
|Feb 4, 1987
|Leybold Aktiengesellschaft
|Sputtering cathode according to the magnetron principle
|Jan 24, 1991
|Jul 31, 1991
|Varian Associates, Inc.
|Rotating sputtering apparatus for selected erosion
|Title not available
|Title not available
|Title not available
|Title not available
|Title not available
|Citing Patent
|Filing date
|Publication date
|Feb 28, 2002
|Jan 27, 2004
|Texas Instruments Incorporated
|Cathodic sputtering chamber for applying material to the surface of a semiconductor wafer located therein
|Mar 6, 2002
|May 4, 2004
|Applied Materials, Inc.
|Unitary removable shield assembly
|Aug 19, 2002
|Aug 24, 2004
|Set, Tosoh
|Shield assembly for substrate processing chamber
|Feb 9, 2011
|Mar 3, 2015
|Applied Materials, Inc.
|PVD sputtering target with a protected backing plate
|Nov 29, 2007
|Dec 29, 2015
|Applied Materials, Inc.
|Apparatus and method for depositing electrically conductive pasting material
|Jul 17, 2012
|Feb 2, 2016
|Applied Materials, Inc.
|Two piece shutter disk assembly for a substrate process chamber
|Mar 26, 2003
|Jul 28, 2005
|Tosoh Smd, Inc
|Replaceable target sidewall insert with texturing
|Oct 21, 2005
|Feb 16, 2006
|Tokyo Electron Limited
|Sputtering cathode adapter assembly and method
|Oct 6, 2006
|Feb 15, 2007
|Hoya Corporation
|Phase shift mask blank, photo mask blank, and manufacturing apparatus and method of blanks
|Nov 29, 2007
|Jun 4, 2009
|John Forster
|Apparatus and method for depositing electrically conductive pasting material
|Aug 9, 2012
|Applied Materials, Inc.
|Pvd sputtering target with a protected backing plate
|May 7, 2001
|Nov 21, 2002
|Texas Instruments Deutschland
|Kathodenzerst�ubungskammer zum Aufbringen von Material auf der Oberfl�che einer in der Kammer befindlichen Halbleiterscheibe
|May 7, 2001
|Jul 7, 2005
|Texas Instruments Deutschland Gmbh
|Kathodenzerst�ubungskammer zum Aufbringen von Material auf der Oberfl�che einer in der Kammer befindlichen Halbleiterscheibe
|Mar 26, 2003
|Dec 4, 2003
|Tosoh Smd,Inc.
|Replaceable target sidewall insert with texturing
|Feb 2, 2005
|Aug 18, 2005
|Honeywell International Inc.
|Physical vapor deposition target constructions
|Feb 2, 2005
|Mar 9, 2006
|Frank Alford
|Physical vapor deposition target constructions
|U.S. Classification
|204/298.11, 204/192.12, 204/298.12
|International Classification
|Cooperative Classification
|European Classification
|Jun 9, 1997
Owner name: MOTOROLA, INC., ILLINOIS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:HAMILTON, GREGORY H.;REEL/FRAME:008571/0262
Effective date: 19970515
|Aug 8, 1997
Owner name: APPLIED MATERIALS, INC., CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:ADAMS, BRET;REEL/FRAME:008644/0629
Effective date: 19960923
|Mar 27, 2001
|Certificate of correction
|Oct 22, 2003
|Maintenance fee reminder mailed
|Apr 5, 2004
|Lapse for failure to pay maintenance fees
|May 7, 2004
Owner name: FREESCALE SEMICONDUCTOR, INC., TEXAS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MOTOROLA, INC.;REEL/FRAME:015698/0657
Effective date: 20040404
Owner name: FREESCALE SEMICONDUCTOR, INC.,TEXAS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MOTOROLA, INC.;REEL/FRAME:015698/0657
Effective date: 20040404
|Jun 1, 2004
|Expired due to failure to pay maintenance fee
Effective date: 20040404


text:
Josh Harrison is not in the Pirates starting lineup for Tuesday's contest against the Mariners.
Gregory Polanco (leg) has returned to the Pirates starting lineup for Tuesday night's showdown against the Mariners.
Carlos Beltran was forced to leave Tuesday's game against the Rangers in the second inning with an apparent leg injury.
Ryan Raburn was scratched from the Rockies starting lineup on Tuesday.
Wade LeBlanc will remain in the Mariners starting rotation to start against the Orioles on Friday.
Taijuan Walker (foot) will start against the Orioles on Thursday.
Mariners manager Scott Servais announced Tuesday that Nate Karns has been moved to the bullpen.
Aledmys Diaz is expected to miss a few games until the swelling above his right eye subsides.


text:
Sadie's soulful eyes say it all
Breed: Spaniel mix
Age: 11 years
Sex: Spayed female
Size: About 25 pounds
Sadie's story: Sadie's sad eyes, staring out of the run at OC Animal Care, and her age made Shamrock Rescue Foundation step in to save her. Older dogs such as Sadie have a very hard time getting adopted from shelters because so many younger, more active dogs are available. But Sadie's eyes also hold knowledge and nothing but love for the people who save her. Sadie is calm and friendly and would love to spend the rest of her years – and at 11, she could have quite a few left – with someone who will provide care and comfort. Sadie does not appear to have any medical issues, though she could stand to lose a few pounds. (She is on a diet.) She just needs love and kindness from someone willing to open his or her heart to her. She'll pay that back a hundredfold.
Adoption fee: $175; includes spay, microchip, flea treatment, veterinary exam and vaccinations.
Adoption procedure: Contact Maryanne with Shamrock Rescue Foundation at email@example.com or 714-270-4187.
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text: Take some more MooMooMilk but dont drink the whole thing unless its the only way to heal again. If it is, tie yourself down with whatever you can before you drink it so you dont run off and do stupid stuff on a Milk high. Once that wears off, take a minute to think about why you have so much random knowledge.


text:
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Tucson Area Real Estate Home Search
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text:
CES 2008: Sanyo Xacti HD700 and HD1000 camcorders launched
Sanyo has launched two new HD digital camcorders at CES in Las Vegas.
The new models the Xacti HD700 and Xacti HD1000 offer 720p and 1080i resolutions respectively.
The Sanyo Xacti HD700 is 16% smaller and 10% lighter than the company's HD2 camcorder and is capable of recording both high-definition video and 7.1 megapixel photos onto an SD or SDHC memory card.
The Sanyo Xacti HD1000 is, the company claims, the world's smallest and lightest full HD digital camcorder and comes with a 4 megapixel still camera.
Both models will feature a 2.7-inch LCD screen that can rotate up to 285 degrees, while the docking station sports a HDMI cable.
Video for both the HD700 and HD1000 is recorded in MPEG4 AVC/H.264 and Sanyo say users will be able to record up to 2 hour and 46 minutes of 720p high-definition video on a single 8GB card on the HD700 and 85 minutes on the HD1000.
User of the HD700 will get a digital still camera that offers a 5x optical zoom, 12x digital zoom, ISO setting up to 3200 as well as offering face tracking technology that automatically detects and isolates faces to assist the camera's exposure and auto-focus.
The HD1000 ups the ante with a 10x optical zoom and 10x digital zoom, an image stabilizer for both stills and video and manual controls for focus adjustment, aperture adjustment, exposure compensation, shutter speed, and image-quality.
According to Sanyo, both models are capable of detecting up to 12 independent faces at a time.
The Xacti HD700 will come with Adobe Premiere Elements 3.0 video editing software is also bundled in the box. The HD1000 is bundled with "Nero 7 Essentials" for playback and "Ulead DVD MovieFactory 5 SE" for editing.
Both small enough to put in your pocket, the SANYO Xacti HD700 will come in Silver, Red and Brown and will cost $599.99, while the Sanyo Xacti HD1000 will cost $799.99. Both are available now.
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text:
Anand Ritz, Matheran
Near Matheran Police Station Raigarh Dist.
Ranked 24 from 75 hotels in Matheran
Anand Ritz Reviews
Poor service of hotel. Clearness is poor, no service. We had selected of villa but management given duplex room and not given any facilities. Housekeeping service is not available. Light is not working.
I stayed with my friends at this property during the Holi weekend. We had booked the hotel from its Mumbai office. The property is located at 10 minutes walking distance from the Matheran market. The property looks very old and dusty and features pool side facing rooms. This property had 2 swimming pools (one for kids) and both were smelly and so d....Read More
"Hotel was conveniently located"
The destination was very good. The environment of the hotel was good. The hotel was conveniently located at the centre of the city. The appearance of the hotel was good. Booking and front office services were good as well. The room allotted to me was maintained neat and clean and the basic amenities were provided in the room. The food was provided....Read More
A good hotel to stay in. Room service was almost good. Food was good. Rooms were a bit old but yet good. Location of the hotel is , it's a good place.
"Bad location but staff was very good"
Hotel location was bad. I also heard from many of my friends and finally I gave a try to this hotel. Hotel staff was very good. Food was very bad. It was my worst experience.
"Matheran was fun and the hotel added to it"
Matheran was fun and the hotel added to it. The weather added more fun to it and it was all a memorable one. It was a trip with my wife and 4 month old daughter. Food in the hotel, though vegetarian only, was nice, no complaints. All hotels in Matheran should ideally have some transport system, like horses, for their clients at a reasonable rate.
"Good services; worth the stay"
I recently visited this hotel for 2 nights and 3 days at a very good discount. I visited this hotel with my friends and enjoyed a lot. My visiting period was in rainy season and I must say the monsoon in Matheran is very good. Staying in this hotel is worth, their infrastructure is too good. Room they gave me of my choice with good services. The....Read More
"Very good hotel with awesome atmosphere"
It is a very good hotel. It has a awesome atmosphere around it. There employee are very polite. They are giving very good facility. But there indoor games have to be improved. It is at very good destination. It is far from railway station. It is very nice place and has A wide area. It has swimming pool also.
"Had a great stay & Matheran was awesome"
I stayed last month. Hotel was in the market area, very easy to reach near the station. Hotel was good. Good room & nice staff. Nice linen & food was good. Nothing special & there are many thing which need an improvement. That too we can understand Matheran has no vehicles allowed so very difficult to get in. Overall enjoyed, Matheran.
Nice location and good services. Tastes of food are very nice. Nice entertainment and the games are really good. Best food quality. Helping staff and fast service beautiful view and nice greenery. Healthy breakfast, tasty lunch and delightful dinner. Big swimming pool. Gym with big instruments. Nice rooms with air conditioner and tv. Rocking disco....Read More
Top 5 Reviews of Anand Ritz
It was wonderful staying at anand ritz, friendly and family environment...he resort provides 5 star comfort level. Madhurima is a 24 hours coffee shop, Swarnim a multicuisine veg restauran
it is amazing
It was wonderfull ataying at anand ritz, friendly and family environment.
"Good rooms with good view from balcony, good pool"
Matheran is the of the best place to see in Maharashtra. Hotel was nice. Rooms are also nice. I took the duplex one. There is also a swimming pool for children and other for adults. There is also a restaurant in this hotel. The view from balcony was superrb. There is many place to see. The plus point is there is no vehicle allowed so no pollution.
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Kalavantin Durg
Deemed as one of the world's most dangerous fortresses Kalavantin Durg is located between Matheran and Panvel in Western Ghats. Kalavantin Durg is just 49.7 km away from Matheran and can be reached via MH SH 79. Just before Prabal
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For the avid trekkar Matheran
Matheran is small hill station offering sc
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NFL Network: Baltimore Ravens Media Day
Get all the latest NFL news from New Orleans as the Baltimore Ravens players attended media day.
Designed to focus on specific competitive cheer skills, Junior Ravens is the perfect camp for competitive cheerleaders! Participants will have the chance to perform at our annual Fireworks Night during Training Camp at M&T Bank Stadium.


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SYNOPSIS: A film crew and their psychic tag along enter an abandoned home to investigate rumors of its murderous past for the next episode of Sinister Sites, a reality show in the vein of Ghost Hunters. After filming numerous episodes that never revealed anything supernatural, what will happen to them when they encounter the real deal? REVIEW: "Take a good, …Read More »
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September 10, 2013
Hello, I am a Geek. I love technology and I would like to make a new friends. I am living in Melbourne at 1 month and half and I will use this new opportunity to learn English.
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*According to Star Magazine, Lamar Odom has been cheating on his wife Khloe Kardashian for more than a year with a woman named Jennifer Richardson.
Due to his infidelities, it was reported that Kardashian kicked the NBA star of the their California mansion.
Odom apparently met Richardson back in January 2012 at a strip club following a game in Washington, D.C. Their affair started nearly a year later after they ran back into each other.
Richardson says Odom seemed "deeply unhappy" with his marriage and once told her, upon leaving her hotel room, "I have to go be a Kardashian now."
While rumors circulate about the affair, Odom was seen lashing out at a group of paparazzi that were following him Hollywood on Wednesday. Odom apparently smashed one of the photographer's car with a metal rod and broke the camera of another.
The incident was caught on camera. See it below
The world has gotten a chance to watch Kardashian and Odom as they embarked on their journey together since they married in 2009. The fate of the couple seems to currently be in jeopardy.
Kardashian said last year, "I'd like to think divorce is not an option."
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Senior Derek Army
Nov. 30, 2013
PROVIDENCE, R.I. - The fourth-ranked Providence College men's hockey team defeated cross-town rival Brown, 3-2, on Saturday night in the 28th meeting of the Annual Mayor's Cup at Schneider Arena. Senior Derek Army's (North Kingstown, R.I.) goal at 9:17 of the third period proved to be the game-winner.
Sophomore Nick Saracino (St. Louis, Mo.) scored the first goal of the game 17 minutes into the first period by putting back his own rebound, giving Providence (11-2-2, 6-2-0 HEA) a 1-0 advantage. Junior Ross Mauermann (Janesville, Wis.) and sophomore John Gilmour (Montreal, Que.) assisted on the play.
Providence increased its lead to 2-0 at 5:58 of the second period when junior Drew Brown (Grass Lake, Mich.) scored his first goal of the year. Sophomore Mark Jankowski's (Dundas, Ont.) shot got pushed aside by Marco De Filippo and Brown gathered the rebound and finished from in tight. Red-shirt sophomore Trevor Mingoia (Fairport, N.Y.) also assisted on the goal.
Brown (3-6-1, 1-4-1 ECAC) closed the gap when Matt Lorito found the back of the net at 3:44 of the third period to bring the score to 2-1, in favor of the Friars. Nick Lappin and Mark Naclerio assisted on the play, both their eighth of the year. The goal was Lorito's team-leading sixth of the year.
Providence regained a two-goal lead, 3-1, when sophomore Steven McParland (Schreiber, Ont.) sent a pass to Army down the near side of the boards. Army continued into the offensive zone and fired a shot that beat De Filippo low. Red-shirt sophomore Noel Acciari (Johnston, R.I.) had the second assist on the play. The Bears retaliated yet again when at the 11:10 mark when Matt Harlow scored to inch closer to Providence, 3-2. Dennis Robertson and Mark Hourihan combined for the assists.
Sophomore goalie Jon Gillies (South Portland, Maine) recorded 32 saves in net for the Friars while De Filippo stopped 26 shots for the Bears.
Brown outshot Providence, 34-29. Each team was 0-3 on the power play. The Friars had the advantage in face-offs, winning 50 out of 79.
The Friars will travel to Boston, Mass. on Friday, Dec. 6 to square off against Northeastern. Puck drop is set for 8:00 p.m.
Nick Saracino extended his point streak to six games (3-3-6) ... John Gilmour notched an assist for the fourth consecutive game ... With an assist, Ross Mauermann now has 21 points on the year (12-9-21), tied for fifth-most in the nation ... Trevor Mingoia notched an assist, giving him two assists in two games played as a Friar ... Derek Army's game winner was his first of the season and the third of his Friar career.
Official StoreOfficial Online
Nick Ellis Named Team MVP at...
The Providence College men's hockey team announced its team awards at the annual season-ending banquet held Friday night (April 22) at The Squantum...
Jankowski, Walman Earn All-A...
The duo also earned First Team Hockey East and All-New England accolades last month.
Nick Ellis Signs Entry Level...
The junior recorded the best season by a Friar goaltender in program history.
Jankowski, Walman Named All-...
The duo also earned First Team Hockey East accolades last month at the annual Hockey East awards banquet.
Steven McParland Inks ATO...
McParland becomes the seventh member of the senior class to sign a professional deal this week.
Nick Saracino Signs ATO with...
The senior winger was the 50th Friar to reach the 100-point milestone for his career.
Nate Leaman Named Spencer...
Leaman named a Spencer Penrose Award finalist for the fourth time in his career.
Jankowski, Tanev Sign NHL...
Both senior forwards inked NHL entry level contracts on Wednesday (March 30).


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Texas suffered another decommitment on Monday, this time for a member of the 2015 class.
2015 Texas commit Lanfear visits Aggies
881dMax Olson
Top programs start fast for 2015 class
1038dGerry Hamilton
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1074dMax Olson
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1074dCraig Haubert
OL Lanfear is third commit of day for Horns
1109dCarter Strickland and William Wilkerson
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1122dMax Olson
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1183dMax Olson
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1184dWilliam Wilkerson
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filme de vazut 2013
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Cloud Atlas (2012)
An exploration of how the actions of individual lives impact one another in the past, present and future, as one soul is shaped from a killer into a hero, and an act of kindness ripples across centuries to inspire a revolution. (172 mins.)
Director: Tom Tykwer, Lana Wachowski
Stars: Tom Hanks, Halle Berry, Hugh Grant, Hugo Weaving
Disconnect (2012)
A drama centered on a group of people searching for human connections in today's wired world. (115 mins.)
Director: Henry-Alex Rubin
Stars: Jason Bateman, Jonah Bobo, Haley Ramm, Hope Davis
Remember Me (2010)
A romantic drama centered on two new lovers: Tyler, whose parents have split in the wake of his brother's suicide, and Ally, who lives each day to the fullest since witnessing her mother's murder. (113 mins.)
Director: Allen Coulter
Dear John (2010)
A romantic drama about a soldier who falls for a conservative college student while he's home on leave. (108 mins.)
Director: Lasse Hallström
Charlie St. Cloud (2010)
Charlie's brother, Sam, dies in a car crash that Charlie survives. Charlie is given the gift of seeing his dead brother, but when the girl he falls in love with's life is at risk, he must choose between his girlfriend and his brother. (99 mins.)
Director: Burr Steers
Stars: Zac Efron, Kim Basinger, Charlie Tahan, Amanda Crew
The Lucky One (2012)
A Marine travels to North Carolina after serving three tours in Iraq and searches for the unknown woman he believes was his good luck charm during the war. (101 mins.)
Director: Scott Hicks
Letters to Juliet (2010)
Sophie dreams of becoming a writer and travels to Verona, Italy where she meets the "Secretaries of Juliet". (105 mins.)
Director: Gary Winick
Entourage (2004 TV Series)
Film star Vince Chase navigates the vapid terrain of Los Angeles with a close circle of friends and his trusty agent. (28 mins.)
The Photographer (2000)
A Photographer has a single evening to find ten magical photographs or else he stands to lose everything that is important to him. (91 mins.)
Director: Jeremy Stein


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