Injector for injecting a liquid treatment chemical into a moving body of liquid in a pipe and comprising an elongated hollow quill member having a stem portion of a length to span substantially the inside diameter of the pipe; and said stem being provided along substantially its entire length with a substantially uniform set of jet openings for injecting the cross-section of the body of liquid with a multiplicity of chemical treatment jet streams so that the cross section of the body of liquid will be treated equally across its diametrical cross section.

It is current practice to employ an injector quill to inject pipeline petroleum with different chemicals: H.sub.2 S scavengers, pH controls, anti-foulants and emulsion breakers, as examples. There are other applications as well.
The current quill employed commercially incorporates a nozzle outlet, centered in the pipeline or other conduit. As a consequence, treatment is concentrated in the area around the centerline of the moving stream. The primary object of the present invention is to construct a quill which will account for uniform treatment, even saturation, of the entire cross section of the body of liquid which is to be treated.


An electron emission device and display including the same include a substrate; a cathode electrode including a first electrode portion formed on the substrate and having opening portions, and second electrode portions placed within respective ones of the opening portions such that the second electrodes are separated from the first electrode; a resistance layer electrically interconnecting the first electrode portion and the second electrode portions of the cathode electrode; and electron emission regions electrically connected to the second electrode portions. A width of the second electrode portions or of the resistance layer between the first and second electrode portions varies along a longitudinal direction of the cathode electrode.

1. Field of the Invention
The present invention relates to an electron emission device, and in particular, to an electron emission display which has an electron emission device with electrodes for emitting electrons from electron emission regions.
2. Description of Related Art
In conventional field emitter array electron emission devices, cathode electrodes are electrically connected to the electron emission regions to supply required electric currents. When driving voltages are applied to the cathode electrodes to form electric fields, electrons are emitted from the electron emission regions due to the electric fields. If an unstable voltage is applied to the cathode electrode or a voltage drop is made with respect to the cathode electrode, different voltages may be applied to the electron emission regions of the respective pixels. In this case, the amount of current discharged from the respective electron emission regions is not uniform, and hence, the uniformity in light emission per the respective pixels is deteriorated.
In one approach to solve such a problem, a resistance layer is applied to the cathode electrode to control the amount of the electric current applied to the respective electron emission elements. The electron emission element is, for instance, formed with two electrodes separated from each other on the same plane as the cathode electrode. The two electrodes are connected to each other by way of a resistance layer, and the electron emission region is formed at one of the two electrodes. In this case, the resistance made entirely in-between the respective electrodes is the same.
However, when the same resistance is entirely made in-between the electrodes, even with the application of the resistance layer, the voltage drops in the longitudinal direction of the cathode electrode due to the internal resistance of the cathode electrode. Accordingly, this approach is limited in obtaining excellent electron emission uniformity with the electron emission device having the resistance layer.

Electron emission device and electron emission display having the same


A demodulator demodulates a received signal. A decoder performs inverse-spread spectrum processing on a demodulated signal. The decoder calculates a CIR value and outputs it to a CPU and a predictor. The predictor derives a next CIR value of the next reception time slot from the CIR value. The next CIR value is converted into a DRC with using a CIR-DRC conversion table. The CPU processes reception data internally or supplies those data to an externally connected PC via an external IF unit. The CPU determines, on the basis of the CIR value, a communication quality index of which to inform a user, and causes a display unit to display the index by an antenna mark. The index is supplied to the external PC via the external IF unit. Therefore, the user can recognize the communication quality by referencing to the index which indicates variation of the radio environment.

1. Field of the Invention
The present invention relates to a radio apparatus configured to control variable communication rate. In particular, the present invention relates to a radio apparatus which controls the rate such that the communication rate is varied in accordance with variation of the environment.
2. Description of the Related Art
Recently, cdma2000 1x-EV DO (hereinafter referred to as EV-DO) has been developed as a next-generation high-rate wireless communication system. The EV-DO system is a new version, which is specialized for the purpose of data communication and is higher in transmission rate, compared to the cdma2000 1x system, which is an extended version (third generation system) of the cdmaOne system. "EV" stands for "evolution", and "DO" stands for "data only".
The EV-DO system is approximately the same as the cdma2000 1x system in the configuration of a radio interface of an upstream channel from a radio communication terminal to a base station. As for the configuration of the radio interface of a downstream channel from a base station to a radio communication terminal, whereas the bandwidth of 1.23 MHz is the same with that of the cdma2000 1x system, the modulation method and the multiplexing method are much different from those of the cdma2000 1x system. As for the modulation method, whereas QPSK and HPSK are used in the cdma2000 1x system, QPSK, 8-PSK, or 16QAM is selectively used in the EV-DO system according to a reception state of a downstream channel of a radio communication terminal. As a result, a high transmission rate with low error resistance is used when the reception state is good, and a low transmission rate with high error resistance is used when the reception state is bad.
As for the multiplexing method for enabling multiple communications from one base station to a plurality of radio communication terminals, TDMA (Time Division Multiple Access) is employed in EV-DO system. In such system, communications with a plurality of radio communication terminals are performed in such a manner that time is divided in units of 1/600 second, a communication is performed with one radio communication terminal in each unit time, and the radio communication terminal to be communicated is switched every unit time, rather than CDMA (Code Division Multiple Access) which is employed in the cdmaOne system and the cdma2000 1x system.
A radio communication terminal measures a carrier-to-interference power ratio (hereinafter abbreviated as CIR) of a pilot signal as an index of a reception state of a downstream channel from a base station to be communicated, predicts a reception state during the next reception time slot on the basis of a variation of the CIR, and notify "a maximum transmission rate which enables to receive with a error ratio that is lower than a predetermined rate", which is expected from the predicted reception state to the base station as data rate control bits (hereinafter referred to as DRC) predetermined. The predetermined error rate is usually set to about 1% though it depends on the system design. The base station receives the DRCs from a plurality of radio communication terminals, and a scheduler function in the base station determines with which radio communication terminal is to communicate in each division unit time. Basically, as high a transmission rate as possible is decided on the basis of a DRC sent from each radio communication terminal and is used for a communication with it.
With the above configuration, the EV-DO system enables a maximum transmission rate of 2.4 Mbps (mega-bits per second) per sector in a downstream channel. This transmission rate is the sum of amounts of data communications from one base station to a plurality of radio communication terminals in one frequency band and in one of a plurality of sectors (usually, a plurality of sectors exist). The transmission rate increases if a plurality of frequency bands are used.
JP-A-2002-300644 is known as a related art.
As described above, in the EV-DO system, the transmission rate of a downstream channel depends on the reception state of a radio communication terminal. Although the reception state is as high as 2.4 Mbps in the best reception state in a stationary state, it is about 500 to 700 kbps on average in a state that a radio communication terminal is moving at a middle or high speed with a vehicle and is as low as tens of kilo-bits per second in a bad reception state in a stationary state. Therefore, even when the user of a radio communication terminal is moving at a low speed (i.e., walking) or almost stands still, the transmission rate depends on the location and may decrease to a large extent. To prevent the condition by user's operation so-called antenna mark is displayed and an alarm sound is generated in order to notify the user of the reception state in conventional cellular phones. For example, cellular phones which uses cdmaOne system notify users of a reception state on the basis of Ec/Ic (energy per chip to the total input power).
However, in the EV-DO system, the transmission rate of a downstream channel is influenced by not only the CIR instantaneous value but also a correction using statistical data such as predictive or past data transmission error rates in downstream channels. Therefore, an error may be contained under a reception state decided on the basis of only a CIR. Further, in EV-DO cellular phones, the variation of the transmission rate due to a reception state variation is larger than that in PDC (Personal Digital Cellular) and cdmaOne cellular phones. Therefore, in the EV-DO system, it is required that a reception state is measured with higher accuracy.
On the other hand, in the EV-DO system, the upstream channel transmission power of a radio communication terminal is controlled by a base station as is the case with the cdma2000 1x system. The maximum transmission power is limited to +23 dBm (200 mW) to +24 dBm (about 250 mW) by regulations etc. A base station instructs, whenever necessary, each radio communication station to increase or decrease the transmission power so that the transmission power of each radio communication station is kept almost constant or satisfies desired quality. According to such an instruction, each radio communication station adjusts the transmission power in a range below the above-mentioned maximum transmission power. When a radio communication terminal is located away from a base station and it is hard for an upstream channel signal to reach the base station, the base station instructs the radio communication terminal to increase the transmission power. However, if the transmission power of the radio communication station has reached the maximum transmission power, the radio communication station cannot increase the transmission power any more. The DRC of the upstream channel does not reach the base station. As a result, downstream channel data transmission can no longer be performed.
In radio communication terminals, a demodulator has an AGC (automatic gain control). The transmission rate depends on only the CIR, and is not generally influenced by the reception signal power in an AGC operating range. On the other hand, if the reception signal power becomes lower than the AGC operating range, the CIR steeply decreases and a downstream channel signal can no longer be received.
The transmission rate per sector is shared by all the radio communication terminals that exist in the sector and are connected to the base station. Therefore, the transmission rate that can be used by each radio base station is varied to a large extent by the communication states according to the other radio communication terminals. When a plurality of radio base stations exist in one sector and are communicating with the base station, the allocation of downstream channel transmission rates of the respective radio communication terminals is determined by a scheduler in the base station. Although no scheduler algorithm is defined in the standard, an algorithm called "proportional fair" is generally considered effective in terms of the fairness of provision of transmission rates to respective radio communication terminals and the improvement of the sector transmission rate.
According to the proportional fair algorithm, DRC/R is calculated on the basis of amounts R of data that have just been sent from the base station to the respective radio communication terminals in 1.67 s (corresponds to 1,000 slots) and DRC values that are requested by the respective radio communication terminals. A slot is allocated to a radio communication terminal having a largest DRC/R value. With this scheduler processing, an actual transmission rate is not necessarily equal to a transmission rate that a radio communication terminal requests the base station to allocate using a DRC. In general, the actual transmission rate is lower than the transmission rate that a radio communication terminal requests using the DRC. Therefore, if a DRC itself is used as an index of the reception state, it is insufficient because the presence of the other radio communication terminals is not taken into consideration.


A Cu--Sn based sintered material, which has an improved corrosion-resistance, is provided by setting the Pb content at 1 to less than 10% and adding from 0.1 to 30% of a hard matter(s) selected from the groups (a), (b), (c) and (d). The hard matter is. (a) Fe.sub.2 P, Fe.sub.3 P, FeB, Fe.sub.2 B and Mo. PA1 (b) Fe--Cr, Fe--Mn, Fe--Ni, Fe--Si, Fe--W, Fe--Mo, Fe--V, Fe--Ti, Fe--Nb, CuP, Cr, and W; PA1 (c) SiC, TiC, WC, B.sub.4 C, TiN, cubic BN, Si.sub.3 N.sub.4, SiO.sub.2, ZrO.sub.2, and Al.sub.2 O.sub.3 ; PA1 (d) Si--Mn, Cu--Si, and FeS.. Most of said hard matter being dispersed in Cu particles, grain boundaries between Cu particles, and between the Cu and Pb particles.

1. Field of Invention
The present invention relates to a Cu--Sn based sintered, sliding material. More particularly, the sliding material according to the present invention is used in a sliding bearing where corrosion-resistance against the lubricating oil or wear-resistance is required. When the opposed shaft of the sliding bearing has a rough surface and/or is made of material, such as cast iron, a part of the material, particularly graphite, is easily removed during sliding to form a rough surface. The sliding material is worn out by the rough surface, which may be formed either by machining or partial removal of the material during sliding.
2. Description of Related Arts
Bronze and lead bronze, which are used in a large amount for a bush, are sliding materials which exhibit excellent wear-and load-resistance. However, along with a recent change in the conditions under which sliding bearings are used particularly, increase in the surface pressure and rise in the temperature of lubricating oil, bearing troubles due to wear frequently occur. Hard matters are therefore added to the sintered lead-bronze which is sintered on a steel sheet, so as to enhance the wear-resistance such that it can meet to the recent change in the conditions under which the sliding material is used.
The sliding material proposed in Japanese Examined Patent Publication No. 57-50,844 filed by the present assignee is characterized in that its composition is from 10 to 40% of Pb, from 1 to 30% of hard matter, the balance being Cu; or from 10 to 40% of Pb, from 1 to 30% of hard matter, from 0.1 to 10% of Sn and/or from 0.1 to 5% of Sb, the balance being Cu. The hard matter used is Mo, Co, Fe.sub.3 P, FeB, Fe.sub.2 B, or a Ni or Co-based self-fluxing alloy having a particular composition. Since the Pb content of this sliding material is from 10 to 40% the compatibility is improved. However, the effect of the hard matter is not thoroughly exhibited because a portion of the hard matter included in the Pb matrix is removed from the matrix during sliding. In addition, since the Pb content is from 10 to 40%, preferential corrosion of Pb is likely to occur when the temperature of the lubricating oil is from 120.degree. to 130.degree. C. Such corrosion occurred when the above-mentioned sliding material was used in an automatic transmission.


A renal denervation system includes a renal denervation catheter and a flow determining system. The renal denervation catheter includes a plurality of ablation members positioned at a distal end portion thereof. The renal denervation catheter is insertable into a renal artery. The flow determining system includes a processor and first and second flow determining members spaced apart on the renal denervation catheter. The processor is configured to determine a change in blood flow through the renal artery resulting from a renal denervation procedure using the renal denervation catheter in response to input from the first and second flow determining members.

Renal denervation is a method whereby amplified sympathetic activities are suppressed. Amplified sympathetic activities and their associated systems are known to contribute to arterial hypertension. Thus, renal denervation is used to treat hypertension or other cardiovascular disorders and chronic renal diseases.
Renal denervation is achieved through destruction of afferent and efferent nerve fibers that run adjacent to the renal artery, which results in lower blood pressure in a patient. Renal denervation has also been shown to have benefits associated with treatment of heart failure, diabetes, obesity, sleep apnea, and ventricular tachycardia (VT). An established renal denervation procedure involves introducing a radiofrequency (RF) ablation catheter, which ablates renal nerves at 4 to 6 locations. The RF ablation catheter typically uses variable energy up to about 8 Watts. Usually, the operator's objective is to ablate at the lowest power possible for the least amount of time and at the fewest locations. Presently, no feedback mechanisms are available to provide the operator with insight about the efficacy of the renal denervation treatment during the treatment procedure. Thus, it is difficult for the operator to know whether further power and/or ablation locations are needed to accomplish adequate renal denervation.

Feedback systems and methods utilizing two or more sites along denervation catheter

St. Jude Medical, Cardiology Division, Inc.


The present invention includes a driverless data transfer device and method for accessing and downloading item data from an item storage unit associated with an item. The driverless data transfer device includes, inter alia, a data downloading unit configured to download the item data, an interface unit for transferring the downloaded data to an item checking unit via a communications bus, and a decoder configured to decode said stored data to conform to data processing requirements of the item checking unit.

The following prior art is believed to be the current status of the art:
U.S. Published Patent Application No. 2011/00104470 A1 describes a USB device for connecting to a host computer and allowing a user thereof to connect to a manufacturer's website for obtaining details of a product of sale.
WO 2004/093149 describes a USB device including a memory for storing an autorun functionality. The USB devices is interrogated by a host computer and following a successful handshake between the USB and the computer, the autorun firmware on the USB informs the host computer of the presence of an autorun executable file and provides the host with the file. The host executes the autorun executable file to provide the autorun functionality.
U.S. Pat. No. 6,385,677 describes a dual interface memory card with a memory unit and a micro-control unit connected to the memory unit. The micro-control unit includes: a USB interface for connecting to a computer whereby the computer is able to read data from and write data to the memory unit, and a host interface for connecting to an electronic product which has the memory card installed therein such that data output from the electronic product can be stored in the memory unit.
WO2005/043588 describes a portable electronic device may be configured to present information identifying a coupon or rebate offer concerning a product or service in a machine-readable format at a point of sale.
Thus, there is an unmet requirement for a data transfer system for accessing and checking item data stored in an item storage unit associated with an item by means of a driverless data transfer device.


A food press having an elongated body including a forward end to which a perforated cap or the like is removably attached and through which pressed foodstuffs pass, and a chamber means within the body adjacent the forward end of the press for receiving and pressing foodstuffs. A reciprocating piston is slidably fitted within the chamber means for moving and pressing foodstuffs, wherein the piston is adapted to be positioned rearwardly of the foodstuffs in the chamber means in its retracted position and against said forward end for pressing the foodstuffs through the perforations in the cap in its forward position. The press also has a rotatable handle pivotally connected to the elongated body rearwardly of the piston, and a linking member connected to the handle and to the piston. When the handle is rotated in one direction the piston is moved to it's retracted position to allow the chamber means to received foodstuffs. When the handle is rotated in the other direction the piston is moved to it's forward position for pressing foodstuffs through the perforations in the cap. The food press provides progressively increasing pressure ratios through the linking of the non-constant increments of linear movement of the travel of the piston to the constant increments of arcuate travel of the handle.

United States patent application Ser. No. 763,434, filed Sep. 20, 1991 of applicants discloses a food press including a body having perforations through which pressed foodstuffs can pass and a chamber within the body and adjacent to the perforations for receiving and pressing foodstuffs, such as garlic, therethrough. A piston, slidable within the chamber, is provided for moving and pressing foodstuffs as the piston moves in a linear direction into and through the chamber. A rotatable handle is connected to the body of the food press and a linking member is connected to the handle and to the piston. In operation, when the handle is rotated in one direction the piston is linearly moved within the body for loading the press and when the handle is rotated in the other direction the piston is linearly moved in the body for pressing foodstuffs therethrough. The press disclosed in our co-pending application has relatively high mechanical advantage ratios and pressures in crushing foodstuffs. With the press of the invention of our co-pending application, essentially constant pressure on the handle produces substantially increasing piston pressures to meaningfully improve the processing of foodstuffs. The press of the invention of our co-pending application also possesses increased capacity for pressing virgin foodstuffs while being sized for convenient use and storage.
The present invention also relates to a food press which is well suited for pressing foodstuffs, such as garlic.


A method for imaging a structure disposed in a borehole penetrating the earth, the method including: selecting a splice housing having a first port configured to seal the housing to a first fiber optic cable and a second port configured to seal the housing to a fiber optic sensor configured to image the structure, wherein the housing includes a sealed interior volume sufficient to contain a splice of optical fibers for protection and to enable a functional bend of at least ninety degrees for at least one spliced optical fiber; disposing a splice between an optical fiber of the first fiber optic cable and an optical fiber of the fiber optic sensor in the splice housing; disposing the splice housing containing the splice in the borehole; attaching the fiber optic sensor to the structure; and disposing the structure in the borehole after the splice housing is disposed in the borehole.

1. Field of the Invention
The invention disclosed herein relates to method and apparatus for imaging a structure downhole and, in particular, to imaging using a fiber optic sensor.
2. Description of the Related Art
Hydrocarbons are generally recovered through boreholes penetrating reservoirs of the hydrocarbons. Various types of structures may be disposed in the boreholes for the recovery process. During well completion, one type of structure known as a casing or tubular is disposed in a borehole. The casing, similar to a pipe, is used to contain the hydrocarbons flowing to the surface of the earth for recovery.
Structures such as casings disposed in boreholes can be exposed to harsh environments. The harsh environments include high temperature, high pressure, and high stress. The high stress can result from the high temperature, the high pressure, high loads or high vibration. Because of the high cost of well completion, it is important to monitor the downhole environment and strains experienced by the downhole structures to prevent damage.
Monitoring the downhole environment and the downhole structures requires both a communication medium and sensors that are able to withstand a harsh environment. Optical fibers disposed in cables known as a fiber optic cable are used as the communication medium and as sensors in the borehole because the fiber optics have characteristics which make them suitable to withstand the harsh environment encountered in the borehole.
Because more than one fiber optic sensor may be used in one borehole, splices are required to couple each fiber optic sensor to an assigned optical fiber in a fiber optic communication cable. While fiber optics may be able to withstand the pressures and temperatures of the harsh downhole environment, fiber optics are delicate and require careful and precise installation especially when installing the splices. Unfortunately, installing the splices on the floor of a completion rig is not conducive to the care and precision required for a reliable and working installation.
Another problem can arise when a faulty sensor is first inserted into the borehole before a splice is made coupling the sensor to the fiber optic communication cable. In this case, the faulty sensor can be far down the borehole before the fault is detected resulting in wasted time to remove the sensor from the borehole for repair or replacement. This is especially true when the sensor is a fiber optic with embedded fiber Bragg gratings used for real time casing imaging (RTCI).
In RTCI, the fiber optic with the embedded fiber Bragg gratings is wrapped around a section of the casing in a spiral shape. The fiber optic is then epoxied in place and sometimes wrapped in tape. Thus, much time is required for a custom installation, and the rework time to repair or replace a faulty RTCI fiber optic sensor can be considerable.
The sensor is typically inserted into the borehole before the splice because the conventional splice housing is an "upside-down Y" having one uphole leg and two downhole legs. The uphole leg is connected to a fiber optic cable leading to the surface of the earth. The two downhole legs are generally connected to different sensors.
Therefore, what are needed are techniques for deploying a fiber optic communication cable and a fiber optic strain sensor in a borehole. Preferably, the techniques enable testing the strain sensor prior to the strain sensor being inserted into the borehole.

Method of deployment for real time casing imaging


The semiconductor device according to this disclosure includes an analog input terminal, an amplifier circuit, a sample-and-hold circuit, an analog input switch connected between the analog input terminal and the input terminal of the amplifier circuit, a control switch connected between the output terminal of the amplifier circuit and the input terminal of the sample-and-hold circuit, a comparison circuit connected to the output terminal of the sample-and-hold circuit, an analog-to-digital converter connected to the comparator circuit, a control circuit, and a signal conversion circuit for converting the first control signal from the control circuit into a second control signal. The analog input switch is turned on during the activation level of the second control signal. The period of the activation level of the second control signal is longer than that of the first control signal to reduce a conversion error of an analog-to-digital conversion circuit.

The present disclosure relates to a semiconductor device, and more particularly, the present disclosure is applicable to a semiconductor device including analog-to-digital conversion circuits of a successive approximation type.
There are disclosed techniques listed below.
[Patent Document 1] Japanese Unexamined Patent Application Publication No. 2009-135738
In a successive approximation type analog-to-digital conversion circuit, a configuration has been proposed in which outputs of a plurality of amplifier circuits provided corresponding to a plurality of analog input terminals are selectively connected to the analog-to-digital conversion circuit (for example, see Japanese Unexamined Patent Application Publication No. 2009-135738).


A touch control method and a touch control electronic apparatus are provided. The touch control electronic apparatus comprises an angle database, a function database, a touch panel and a central processing unit (CPU). The touch panel senses a plurality of touch points. The CPU calculates a plurality of touch angles according to the touch points, and stores the touch angles to an angle queue. The CPU accesses a comparative model from the angle database, and compares the angle queue with the comparative model to generate a plurality of comparative results. The CPU sequentially stores the comparative results to a comparative queue. The CPU accesses a result queue from the function database, and determines whether the comparative queue matches the result queue. The CPU performs a function operation corresponding to the result queue if the comparative queue matches the result queue.

1. Field of the Invention
The invention relates in general to an electronic apparatus, and more particularly to a touch control method and a touch control electronic apparatus.
2. Description of the Related Art
Along with the advance in technology, more and more electronic apparatuses use touch panel as standard input/output interface in lieu of conventional key board and mouse. The user can execute touch operations by touching or sliding on the touch panel of an electronic apparatus with finger.
In recent years, multi-touch devices become more and more popular, and are used in more and more application fields. When facing a program interface or frame using dynamic touch control, the user can move, switch or scale the frame through a multi-touch hand gesture operation. However, when facing program interface or frame using static touch control, the user still rely on the window click components provided by the frame. If corresponding window click components are not displayed on the frame, touch operation will not work.

Touch control method and touch control electronic apparatus


A drum for a clothes dryer in which an internal structure, especially, a baffle structure, of the drum is improved to prevent target items from being entangled and damaged during a drying operation to thereby improve the drying efficiency of the clothes dryer. Rotatable balls are inserted in the baffles mounted on an internal surface of the drum, the mounting arrangement of the baffles is changed, or the baffles are modified to thus improve the drying operation. In addition, an absorbent is filled in the baffles to thus increase the drying efficiency.

1. Field of the Invention
The present invention relates to a clothes dryer and, more particularly, to a drum for a clothes dryer which is capable of preventing target items to be dried from being twisted, entangled and damaged.
2. Description of the Related Art
In general, a clothes dryer performs drying of items to be dried (referred to as 'target items' hereinafter) by blowing air heated by a heater into a rotating drum mounted therein. The related art clothes dryers can be divided by type into an exhaust (vented) type clothes dryer and a condensing type clothes dryer according to how the moist air generated while drying target items is treated.
The exhaust type clothes dryer discharges, i.e., vents, the moist air to the exterior, while the condensing type clothes dryer condenses the moist air discharged from the drum by using a condenser to condense moisture from the air and send the de-humidified air to the drum, thus re-circulating the air.
The condensing type dryer generally includes a drum in which the laundry (namely, the target items) to be dried is loaded, a filter that filters out debris, a heat exchanging unit (or condenser) that condenses out moisture from the laundry through heat exchanging, a fan that facilitates the drying by generating an air flow, a heater that heats the air to accelerate drying, and ducts that connect the components.
FIG. 1A is a right side interior view of the prior art condensing type clothes dryer, FIG. 1B is a top internal view of the clothes dryer in FIG. 1, FIG. 2 selectively shows a drum, a belt and a motor in the dryer of FIG. 1A. The arrows 'I' in FIGS. 1A and 1B indicate the flow of external air and the arrows 'II' indicate the flow of circulating air.
With reference to FIGS. 1A and 1B, in the prior art dryer, a drum 11 that receives target items is rotatably installed within a main body 10 having a door 12 installed at its front side. The drum 11 is connected via a belt 19 with a motor 17 installed at a lower portion of the main body 10 so as to be rotated.
A condenser 13 is installed at a lower portion of the main body 10, and condenses moisture from high temperature and high moisture air circulating through the drum 11 to dry the circulating air. Front and rear sides of the condenser 13 are respectively connected with circulation ducts 14a and 14b respectively connected with front and rear sides of the drum 11. Through the circulation ducts 14, the air discharged through the drum 11 is introduced again into the drum 11 after passing through the condenser 13.
A heater 15 that heats the air which has passed through the condenser 13 and a circulation fan 16 that forcibly circulates the air through the circulation ducts 14a and 14b are respectively installed at the circulation ducts 14a and 14b. The circulation fan 16 is connected with another end of the shaft of the motor 17 that drives the drum 11.
In order to condense the air circulating through the circulation duct 14a by heat exchanging at the condenser 13, external cold air is supplied to the condenser 13. For this purpose, an external air supply duct 18 communicating with the outside is connected with one side of the condenser 13 and a cooling fan 20 that forcibly draws external air in through the external air supply duct 18 and discharges it into the main body 10 and a cooling fan driving motor 21 are installed at the other side of the condenser 13 where the external air supply duct 18 is connected. Reference numeral 22 indicates a filter that filters out debris such as waste pieces of thread from the air discharged into the circulation duct 14a through the front side of the drum 11.
A water receiver (not shown) for collecting condensation water dropped after being generated during the condensing process is installed at a lower portion of the condenser 13, and a pump 23 is installed in order to send the condensation water collected in the water receiver to a condensation water storage tank 2.
The process of drying laundry in a clothes dryer having the construction as described above will now be described.
With reference to FIG. 2A, the belt 19 connected with a driving shaft of the motor 17 is wound on an outer circumferential surface of the drum 11 to transfer the rotary force from the motor 17 to the drum 11. A plurality of baffles 11′ are mounted on the inner surface of the drum and move to baffle and tumble the target items during the forward or backward rotation of the drum 11. Herein, the baffles 11′ serve to push the target items upward within the drum 11 in the operation of the clothes dryer.
When a large load of target items is received in the drum 11, the target items are apt to become entangled due to frictional contact between the baffles 11′ and the target items during operation of the dryer. In addition, when the rotation of the drum 11 is changed from a forward direction to a backward direction or from the backward direction to the forward direction, the baffles 11′ and the clothes (namely, the target items to be dried) contact frictionally, causing the target items to become entangled and possibly damaged.


A transmitted optical signal is first subjected to polarization mode dispersion compensation by a polarization mode dispersion compensator (PMDC), and then, its chromatic dispersion is compensated by a variable chromatic dispersion compensator (VDC) after the polarization mode dispersion compensation. How much the optical transmission signal suffers from polarization mode dispersion, which is needed to perform the polarization mode dispersion is measured using a Stokes parameter that is not affected by chromatic dispersion.

1. Field of the Invention
The present invention relates to both a chromatic dispersion compensation method and a polarization mode dispersion compensation method, which are essential to realize the current large capacity, high speed and long haul of an optical communication system. More particularly, the present invention relates to a system for optimally compensating for both chromatic dispersion and polarization mode dispersion in a super-high-speed single-wave or wavelength-division multiplex optical transmission system.
2. Description of the Related Art
With the recent rapid increase of network capacity, a far larger-capacity network is needed. Although currently a wavelength-division multiplex (WDM) optical transmission method based on the transmission capacity per channel of 10 Gb/s has been put into practical use, a far larger capacity will be needed in the future, and for the reasons of the use efficiency of a frequency and equipment cost, the realization of a high-speed optical transmission system with a capacity of 40 Gb/s per channel is expected.
However, since in such a super-high-speed optical transmission system, transmission waveform degradation due to both chromatic dispersion and polarization mode dispersion occurs, the transmission length of optical signals is restricted, which is a problem. Therefore, in order to realize such a super-high-speed optical transmission system, a system for compensating for both the chromatic dispersion and polarization mode dispersion with high accuracy is needed.
(I) About Chromatic Dispersion
Firstly, the summary of chromatic dispersion is described.
In an optical communication system with a transmission rate of 10 Gb/s or more, chromatic dispersion torelance remarkably decreases. For example, the chromatic dispersion tolerance of a 40 Gb/s NRZ (non-return-to-zero) signal is 100 ps/nm or less.
However, the repeater span of an optical communication system is not constant. Therefore, if 1.3 μm zero-dispersion single mode fiber (SMF) having a chromatic dispersion value of 17 ps/nm/km is used, the chromatic dispersion tolerance deviates if the repeater span differs only by several kilometers.
However, the distance of each repeater span and its chromatic dispersion value of an optical fiber transmission line possessed by a communication carrier are not accurately obtained, and it is often difficult to realize highly accurate chromatic dispersion compensation by a fixed chromatic dispersion compensation method using a DCF (dispersion compensation fiber) or the like.
Furthermore, since the chromatic dispersion value varies depending on fiber temperature, stress or the like as time elapses, it is necessary to optimally adjust the amount of chromatic dispersion of each repeater span by strictly measuring chromatic dispersion not only at the time of system operation commencement but also during the operation. For example, if the following conditions are assumed,
Type of optical fiber: DCF
Length of transmission line: 500 km
Temperature fluctuations: 100° C.
                                                                        [                                  Amount                                                                                of                                                                                chromatic                                                                                dispersion                                ]                                                    =                                  [                                    Temperature                                                                                dependency                                                                                of                                                                                zero                        -                                                                                dispersion                                                                          wavelength                    ]                ×                                                                      [                          Amount                                                                                of                                                                                temperature                                                                                change                        ]                    ×                                                                              [                          Dispersion                                                                                slope                                                                                of                                                                                transmission                                                                                line                        ]                    ×                                                                  [                      Transmission                                                                          distance                    ]                                        =                                  0.03                                                                          nm            /            °                                                                                C            .                    ×          100                    °                                                                          C            .                    ×                                                                  0.07                                                                                ps              /                              nm                2                                      /            km                    ×          500                                                              km                                        =                                  105                                                                          ps            /            nm
This value is almost equal to that of the chromatic dispersion tolerance of a 40 Gb/s NRZ signal. Therefore, an automatic chromatic dispersion compensation system for optimally controlling the amount of chromatic dispersion compensation is essential to not only a system using an SMF as a transmission line but also one using 1.55 zero-dispersion shift fiber (DSF) and NZ (non-zero)-DSF as a transmission line.
(II) About Polarization Mode Dispersion
Next, polarization mode dispersion (PMD) is described.
PMD is caused by a difference in propagation delay time between the polarization components (such as between a TE mode and a TM mode) of an optical signal, and is caused in an optical fiber.
Generally, the larger an optical signal is, the larger the influence of polarization mode dispersion becomes. The longer the transmission distance is, the larger the influence of polarization mode dispersion becomes. The influence cannot be neglected.
There is one with a large PMD value per unit length of 1 ps/km1/2 (pico-second/km1/2) (pico indicates 10−12) in optical fibers constituting an old optical transmission line mainly laid outside Japan. Even if a short-haul transmission (such as 50 km transmission) is conducted using such an optical fiber, optical differential delay (Δτ) is 7 ps or more against one time-slot 25 ps of a 40 Gb/s NRZ signal. Therefore, the influence of polarization mode dispersion cannot be neglected like the earlier-mentioned chromatic dispersion. In reality, since in an optical communication system, materials that cause polarization mode dispersion, such as an optical amplifier, a chromatic dispersion compensator and the like must be provided in a transmission line, there is a possibility that the transmission length of optical signals is further restricted. Furthermore, since polarization mode dispersion varies depending on stress applied to an optical fiber and temperature change as time elapses, the state of polarization mode dispersion in a transmission line must be monitored not only at the time of installation but also during its operation, and the polarization mode dispersionmust be dynamically compensated.
As described above, chromatic dispersion and polarization mode dispersion are major factors in limiting the performance of an optical communication system. Therefore, in order to improve the performance of the optical communication system, an automatic dispersion compensation system for independently and dynamically compensating for both chromatic dispersion and polarization mode dispersion must be prepared.
Device technologies for realizing the automatic dispersion compensator are grouped into the following three items (a) through (c).    (a) Realization of a variable chromatic dispersion compensator    (b) Realization of a transmission line dispersion monitor    (c) Realization of the feedback optimization control method of a variable chromatic dispersion compensator
As a chromatic dispersion compensator in (a) above, the following ones are proposed as examples.
(1) VIPA (Virtually Imaged Phased Array)
"Variable Dispersion Compensator Using the Virtually Imaged Phased Array (VIPA) for 40 Gbit/s WDM Transmission Systems", ECOC2000, PD Topic 2, 2.3
(2) Tunable Ring Resonator
"Tunable Ring Resonator Dispersion Compensators Realized in High Refractive-index Contrast Technology" ECOC2000, PD topic 2, 2.2
(3) FBG (Fiber Bragg Grating)
"Twin Fiber Grating-Adjustable Dispersion Compensator for 40 Gbit/s" ECOC2000, PD Topic 2, 2.4
As the polarization mode dispersion compensator, the following ones are proposed as examples.    (1) A method for providing a polarization controller (PC) at an optical signal transmitting terminal, feeding back its transmission characteristic from its receiving terminal and controlling the branch ratio γ of its optical intensity to two polarization modes so as to be 0 or 1.
"Optical Equalization of Polarization Dispersion", SPIE Vol. 1. 1787 Multi-gigabit Fiber Communications, 1992, pp. 346-357    (2) A method for providing both a polarization controller and a polarization maintaining fiber (PMF) at an optical signal receiving terminal and giving a differential delay between two polarization modes with a sign the reversal of that of an optical transmission line by controlling the polarization controller.
"Automatic Compensation Technique for Timewise Fluctuating Polarization Mode Dispersion in In-line Amplifier Systems", Electro. Lett., Vol. 30, No. 4, 1994, pp. 348-349    (3) A method for providing a polarization controller, a polarization beam splitter, two light receivers receiving each of two demultiplexed optical signal components and a variable delay device giving a differential delay between two electrical signals obtained by these light receivers, and controlling both the polarization controller and variable delay device.
"Polarization Control Method for Suppressing Polarization Mode Dispersion Influence in Optical Transmission Systems", Journal of Ligthwave Technology, Vo. 12, No. 5, 1994, pp. 891-898
Next, as to the transmission line dispersion value monitor essential to the feedback/control in (b) above, several methods are proposed.
Firstly, as the measurement method of chromatic dispersion values, a pulse method and a phase method for inputting a plurality of segments of light each with a different wavelength and a group delay or a phase difference between a plurality of segments of output light has been conventionally proposed. However, in order to always conduct chromatic dispersion measurements without degrading communication quality during system operation, using these methods, (1) one set of chromatic dispersion measurement instruments are needed for each repeater span, and (2) wavelength-division multiplexing must be applied to a plurality of segments of measurement light each with a wavelength different from that of a data signal, which are problems. However, it is not practical from the viewpoints of economy and equipment size to realize these.
Several methods are proposed on a chromatic dispersion monitor used to solve such problems. Examples of such a chromatic dispersion monitoring methods are as follows.
(1) A Method Utilizing the Principal that the Intensity of a Specific Frequency Component Varies Due to Waveform Distortion and Using the Intensity of a Specific Frequency Component of a Received Baseband Signal
("Automatic Dispersion Equalization in 40 Gbit/s Transmission by Seamless Switching between Multiple Signal Wavelengths", ECOC′ 99, pp. 1-150-151)
(2) A Method Using an Error Rate
In this method, an error rate is monitored by a receiver, and feedback/control is exercised over a chromatic dispersion compensator so that the error rate may become the best.
In any of practical dispersion monitors, waveform distortion due to dispersion is directly or indirectly used. If chromatic dispersion and polarization mode dispersion are simultaneously caused, it cannot be determined by which waveform distortion is caused, chromatic dispersion or polarization mode dispersion. Therefore, in this case, it is difficult to realize an automatic dispersion compensator for simultaneously compensating for both chromatic dispersion and polarization mode dispersion.
As the polarization mode dispersion measurement method, the following ones are proposed.    (1) Senarmont Method    (2) Rotary analyzer method    (3) Rotary phase-retarder method    (4) Phase Modulation method
As the polarization state indication (expression) method, the following ones are proposed ("Indication Method and Measurement Method of Polarization State", OPTRONICS, No. 5 pp. 109-117 (1997)).    (1) Poincare sphere    (2) Jones vector    (3) Stokes vector
As an example, a polarization mode dispersion measurement method using Jones vector and a device thereof is proposed by Japanese Patent Laid-open Application No. 9-72827. Although it is difficult to apply it in an environment where chromatic dispersion exists, a polarization mode dispersion monitor monitoring a specific frequency component in a received signal is also proposed (this applicant is now filing it for a patent).

System for compensating for chromatic dispersion and polarization mode dispersion


A modular manufacturing system uses a universal base and power infrastructure to receive a variety of tooling plates. This is accomplished by the creation of a modular service interface for simultaneous connection of electrical and fluid power from the base to the tooling plate. In addition, a sensing system is used to automatically identify the specific tool set, and to distinguish between a single plate tool set and a double plate tool set. Individual tool sets are located with certainty through the use of physical placement guide rollers, stops, and friction fit. A PLC manages the power, tool set identification and user interface.

Field of the Invention
The present invention relates to manufacturing systems and, more specifically, to modular manufacturing systems where modular tool sets may be swapped for different operations.
Related Art
In the area of tooling and tool sets, the typical approach is to have a machine that is designed to perform a specific operation using a specific tool set. Depending on volumes, it is not unusual for a particular machine to be in use for anywhere between 2 and 20 hours per week. There could easily be between 5 and 15 machines used to produce a specific product, with some machines having more use than others depending on volume. For example, a machine that produces wheels for a toy car may have four times the volume as a machine that produces the car body.
Each machine used shares common requirements. There is a need for power—often in the form of electricity and fluids (pneumatics and hydraulics). There is a need for a user interface to provide information on the process and to allow for interruptions of mechanical processes. There is a need to apply the power correctly to a work piece.
This application of power is accomplished through the use of a work piece-specific tool set, and through the managed application of electrical power and fluid power through the tool set. The management of the application of electrical power and fluid is often done through the use of a programmable logic controller (PLC). In addition, the PLC will usually manage the user interface.
Even though there are common requirements, each machine normally has unique requirements. Some machines need 2 electrical power sources and 2 pneumatic power sources connected to the tool set at specific locations, whereas other machines could need 4 electrical power sources, and no pneumatic power sources, and still others might require only pneumatic power sources only. These differing requirements make converting a particular machine from one operation with one tool set to another operation with a second tool set very tool-set dependent, time-consuming, and impractical. Moreover, the machine has to be converted back to its original condition for the first operation. Each change in tooling takes time and labor—meanwhile, the production worker may be simply waiting for the changeover.
Not surprisingly, prior efforts at attempting to use fewer machines to accomplish multiple machine operations have not been commercially or widely adopted. Accordingly, the machine tool industry largely uses separate purpose built machines for each operation, as this has been generally the most efficient approach.

Apparatus and control for modular manufacturing system


A filter section performs color carrier component removal and high-frequency level correction according to color image signal data, and a correction section performs edge enhancement correction. By these operations, luminance signal data is obtained. The characteristics of the filter section are established adaptively in accordance with the luminance signal level of low spatial frequency components in the color image signal data, the luminance signal edge level in the color image signal data, whether or not a predetermined color is exhibited in the color image signal data, a color difference edge level in the color image signal data, or whether or not the RGB data reaches the saturation level in the color image signal data.

1. Field of the Invention
The present invention relates to a luminance signal processing device such as an image signal processing device, e.g., capable of attaining a high-definition image by obtaining a wideband digital luminance signal from an image signal output from an image sensor developed for use in digital cameras.
2. Description of the Related Art
In the camera industry, there has been a remarkable shift from analog to digital technology in recent years. In particular, digital still cameras, which do not require any films and development, are selling very well, and as for mobile phones, those with a camera are the mainstream.
At present, in the field of digital cameras, for example, the mainstream cameras adopt a sensor that places emphasis on color reproducibility and is thus equipped with a primary color filter, and signal processing associated with the sensor. Such a camera needs digital signal processing that places importance on resolution and provides excellent color S/N. In view of this, an imaging device and the like, in which noise can be removed while resolution decrease is suppressed, have been proposed (see, e.g., Japanese Laid-Open Publication No. 2001-189944).
This type of imaging device includes a luminance signal processing device which is configured as shown in FIG. 9, for example. In FIG. 9, the reference numeral 501 denotes a preprocessing section for performing black level correction, gamma correction, gain correction and the like for image signal data obtained by subjecting the output of an image sensor having an RGB (red, green and blue) Bayer pattern filter to noise removal process, amplification process, and A/D conversion process. The reference numeral 502 represents a multiple line output converter, which converts the output of the preprocessing section to parallel outputs in which data sets in a plurality of horizontal lines are output in parallel. The reference numeral 503 indicates a low-pass filter, which removes color carrier components, occurring due to the Bayer pattern of the sensor and superposed on the output of the sensor, so as to generate luminance signal data. The reference numeral 504 denotes an edge enhancement correction section, which performs edge enhancement of the luminance signal data by extracting the high-frequency components from the luminance signal data obtained after the color carrier component removal and adding the extracted components to the original luminance signal data. The reference numeral 505 indicates a postprocessing section for adjusting the bias level of the luminance signal data, the gain and the like.
FIG. 10 indicates frequency components of the output of the above-described sensor.
In the luminance signal processing device described above, as the first step of the processing, the low-pass filter processing is performed so that the high-frequency color carrier components in the vicinity of the Nyquist frequency are removed to generate the main signals of the luminance signals. By using these signals, the edge enhancement correction is carried out. In this device, the luminance signal processing is performed frame by frame and the characteristics of the low-pass filter 503 for removing the color carrier components are uniform in all portions within the single image area.
Nevertheless, the conventional luminance signal processing device described above has a problem because of the fact that the characteristics of the color-carrier-component-removing low-pass filter 503 are uniform in all portions in the single image area; if the pass-band of the low-pass filter 503 is increased toward the high frequency side in order to increase the resolution in a specific color portion, e.g., a skin color portion, a false edge signal is produced from the remaining color carrier components at a boundary where the colors change greatly in the RGB Bayer pattern, which results in inappropriate edge enhancement.


A traffic control method and device are provided. The method may include: monitoring a user behavior status of an application, where the user behavior status includes an active state or an inactive state; according to predefined correspondence between a user behavior status and a traffic control threshold, determining a traffic control threshold corresponding to the monitored user behavior status; and controlling traffic of the application by using the determined traffic control threshold. Therefore, the traffic of the application can be dynamically monitored and the intelligence of traffic control can be improved.

As network technologies develop, the rapid development of new network applications quickly follows suit. Some of such network applications are client applications, in which the applications communicate with servers or other clients in a network, thereby generating network traffic. For example, as cellular networks become more advanced, ever more advanced smart phone applications are developed that stream data to and from a client device such as a smart-phone. These applications allow a user of the device to watch video clips, post pictures to social media sites, play games with friends, etc., all of which generate network traffic. When network traffic generated by such applications increases abruptly, a network overload may occur, thereby lowering performance of applications and affecting their normal use. Therefore, performing traffic control on client applications is important to guaranteeing the normal use of the applications. In some conventional methods of traffic control, a traffic control threshold is employed to prevent a network overload (e.g., on the client side, in the form of an outbound traffic threshold, or on the server side, in the form of a request traffic threshold). In such methods, a maximum value of traffic (e.g., the traffic control threshold) is set for a respective client corresponding to a specific period of time (for example, the client is allowed to generate 2 megabytes per hour of traffic). When the total traffic generated by the applications of the client are less than or equal to the traffic control threshold, each application can be used in a normal mode of operation. On the other hand, when the total traffic generated by the applications of the client is greater than the traffic control threshold, network abnormality processing is performed, which can include, for example, restarting a networking program of an application or reporting abnormality information to a network server for handling.
However, in such methods, the control is performed with respect to total traffic of the client without taking into account usage differences between the various applications of the client and behavioral characteristics of the user. Conventional methods of traffic control are thus inconvenient and burdensome for users because they are blind to the behavioral characteristics of the user, which in some circumstances will indicate that a user would likely prefer that a particular application be treated differently with respect to traffic control than another application. For example, in some circumstances it may be preferable to control traffic more severely for applications running in the background, whose real-time services are less critical than an application running in the foreground. Likewise, in some circumstances it may be preferable to control traffic less severely for applications running in the foreground.

TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED


A hinge assembly (100) for joining a cover section (110) to a body section (120) of a foldable electronic device includes a main shaft (1), a cam (2), a follower (3), a first elastic element (4), a control (5), a sleeve (6), a second elastic element (7) and a fixing element (8). The shaft has an outer thread (101) at one end and an engaging portion at an opposite end. The cam includes an end cam surface (212), and an inner thread (211). The follower includes a latching cam surface (312). The control has at least one projection (52) at one end thereof, and engages with the engaging portion. The sleeve is connected with the follower, and rotation of the sleeve is limited by the control. When the control is pushed, the hinge assembly fully opens the cover section from body section. This provides a user with convenient one-handed operation.

At present, perhaps the most popular portable electronic device in the marketplace is the foldable cellular telephone, which generally includes a cover section and a body section. Typically, the cover section and the body section are rotatably interconnected through a hinge assembly, for switching the telephone between an open in-use position and a closed position.
One kind of hinge assembly employs a cam and a follower, to make the cover section open up from the body section and be held in an open position. An example of such kind of hinge assembly is disclosed in U.S. Pat. No. 6,292,980. The hinge assembly includes a cam having a concave portion, a shaft having a convex portion, and a spring which makes the concave portion tightly contact the convex portion. The cam, the shaft and the spring are received in a housing. A flip cover rotates about a main body of the mobile phone by overcoming the force of the spring, to make the concave portion rotate about the convex portion. However, a user must open the mobile phone using both hands. This makes the mobile phone awkward to utilize in situations when the user has only one hand free.
Therefore, a new hinge mechanism is desired in order to overcome the above-described shortcoming.

This patent is subject to a terminal disclaimer.

Hinge assembly for portable electronic device

BaoAn District, Shenzhen, Guangdong Province

Shenzhen Futaihong Precision Industrial Co., Ltd.


A new and distinct cultivar of Petunia plant named ‘Sunhore’, characterized by its outwardly spreading, mounded and decumbent plant habit; vigorous and freely branching growth habit; freely flowering habit; large coral pink-colored flowers with purple-colored venation; long flowering period; and good garden performance.

The present Invention relates to a new and distinct cultivar of Petunia plant, botanically known as Petunia×hybrida, and hereinafter referred to by the cultivar name Sunhore.
The new Petunia is a naturally-occurring branch mutation of the Petunia×hybrida cultivar Revolution Marrose, disclosed in U.S. Plant Pat. No. 10,904. The new Petunia was discovered and selected by the Inventors in a controlled environment in Higashiomi, Shiga, Japan in April, 2000.
Asexual reproduction of the new cultivar by terminal cuttings in a controlled environment in Higashiomi, Shiga, Japan since October, 2000 has shown that the unique features of this new Petunia are stable and reproduced true to type in successive generations.


Provided are a chimeric antigen receptor comprising an extracellular domain capable of binding to an antigen, a transmembrane domain and at least one intracellular domain, the chimeric antigen receptor being characterized in that an intracellular domain of a glucocorticoid-induced tumor necrosis factor receptor (GITR) is contained as the intracellular domain; a nucleic acid encoding the chimeric antigen receptor; a cell expressing the chimeric antigen receptor; and a method for producing the cell.

As a therapeutic strategy for tumors, it can be expected that a gene of a T cell receptor (TCR) capable of binding to a specific antigen is introduced into any T cell to prepare a T cell targeting the antigen of interest. Based on this strategy, adoptive immunity gene therapies using TCR genes targeting many tumor antigens, for example, WT1, MART1, gp100, CEA, CD19 and mHAG HA-2 antigens have been attempted.
As a novel adoptive immunity gene therapy for tumors, attention has been paid to a gene-modified T cell therapy. The gene-modified T cell therapy comprises introducing a nucleic acid encoding a chimeric antigen receptor (CAR) into a T cell, wherein the CAR has specificity for a surface antigen of a tumor cell and ability to activate a T cell, growing ex vivo the gene-introduced T cell thus obtained, and then transfusing the cell into a patient. This therapy is believed to have a stronger and longer-lasted anti-tumor effect than that of an antibody drug, and therefore the clinical effect thereof is greatly expected.
A representative structure of CAR comprises a single chain variable fragment (scFv) recognizing a surface antigen of a tumor cell, a transmembrane domain, and an intracellular domain of a TCR complex CD3ζ that activates a T cell. A CAR having such a constitution is called a first generation CAR. A gene of a single chain variable fragment portion is isolated from, for example, a hybridoma producing a monoclonal antibody that recognizes a target antigen. A T cell expressing a CAR directly recognizes a surface antigen of a tumor cell independently of the expression of major histocompatibility antigen class I on the tumor cell, and at the same time, activates the T cell, and thereby the CAR-expressing T cell can efficiently kill the tumor cell.
For the purpose of enhancing the ability of a first generation CAR to activate a T cell, a second generation CAR has been developed, wherein an intracellular domain of CD28 which is a costimulatory molecule of a T cell is linked to a first generation CAR. As a further improved version, a third generation CAR has also been developed, wherein an intracellular domain derived from CD137 (4-1BB) or CD134 (OX40) which is a tumor necrosis factor (TNF) receptor superfamily is tandemly linked to a first generation CAR. Thus, many CAR molecules targeting variety of tumor antigens have been reported (Non-Patent Document 1). However, costimulatory molecules used as the intracellular domain for the second generation and third generation CARs which are currently reported are limited. It is known that when linked to a CAR, an intracellular domain derived from every costimulatory molecule of a T cell does not uniformly stimulate a T cell strongly to damage a target tumor cell. For example, it has been reported that a second generation CAR in which an intracellular domain derived from CD137 is linked exhibits a cytotoxic activity only to the same extent as that of a first generation CAR, that is, the intracellular domain has no effect in improving the function of a CAR (Non-Patent Document 2). Therefore, finding of a novel costimulatory molecule that is effective when linked to a CAR has been demanded.
A glucocorticoid-induced tumor necrosis factor receptor (GITR) found as a gene being expressed on a regulatory T cell which is a subset of T cells is a transmembrane protein receptor on a cell surface, and is one member of a TNF receptor superfamily (Non-Patent Document 3). A GITR is shown to exist constitutively on a non-activated T cell. A GITR binds to another transmembrane protein called a GITR ligand (hereinafter, referred to as a GITRL). An agonistic antibody to a GITR is shown to eliminate an immunosuppressive activity of a regulatory T cell, which suggests that a GITRL plays a functional role of controlling the activity of a regulatory T cell via a GITR (see Non-Patent Document 4).


The invention relates to an MDR family P-glycoprotein located on human chromosome 7p15-21, polynucleotide sequences encoding this P-glycoprotein and fragments thereof. This gene is utilized in methods for assessing cancer cell susceptibility to therapies directed against multidrug resistance, and for the design of diagnostic and therapeutic methods relating to cancer multidrug resistance. The invention also relates to methods for determining whether a test compound may inhibit multidrug resistance.

P-glycoprotein, an adenosine triphosphate (ATP)-dependent drug efflux pump, is overexpressed in multidrug-resistant (MDR) tumor cells. It reduces the intracellular concentration of cytotoxic xenobiotics, thereby decreasing the effectiveness of many cancer chemotherapeutic regimens. P-glycoprotein belongs to the ABC (ATP-binding cassette) superfamily of active transporters, and is encoded by a multigene family in higher eukaryotes. Mammalian P-glycoprotein family members can be divided into three classes. Class I and class II P-glycoproteins confer multidrug resistance whereas class III proteins do not.
In humans, P-glycoprotein is encoded by two linked genes ("MDR1" and "MDR3") on chromosome 7g21.1. MDR3 functions as a lipid translocase and mutations in this gene are associated with familial intrahepatic cholestasis. MDR1 confers drug resistance on certain cancer cells. In addition to being overexpressed in cancer cells, MDRI P-glycoprotein is widely expressed in normal, predominantly secretory and absorptive human tissues, where it functions in diverse physiologic processes including cellular differentiation, cell proliferation and cell survival. In these normal cell types, P-glycoprotein functions in the transmembrane release or uptake of xenobiotics and certain therapeutic drugs, small peptide molecules, certain steroid compounds, and phospholipids.
P-glycoprotein is also expressed by lymphoid cell populations from human bone marrow and the peripheral blood. Specifically, P-glycoprotein has been shown to be expressed on the membrane of pluripotent stem cells, monocytes, dendritic cells, CD4+ and CD8+ T lymphocytes, natural killer cells, and B lymphocytes. In immune cells, P-glycoprotein functions in the transport of cytokines and other small molecules, which are critical for physiologic immune responses to occur. Specific blockade of P-glycoprotein can suppress the immune response to alloantigen and nominal antigen. However, a degree of redundancy exists for P-glycoprotein function in these cell types, pointing to the existence of additional, hitherto unidentified related molecules.
Pluripotent stem cells and other tissue progenitor cells also possess a unique P-glycoprotein-like activity, characterized by decreased intracellular accumulation of fluorescent dyes, which allows for the specific isolation of these cell types for therapeutic uses. However, it is thought that this function is not mediated by MDR1 P-glycoprotein, but rather by a related, as yet unidentified, P-glycoprotein family member.
Despite the irrefutable role of MDR1 P-glycoprotein in cancer multidrug resistance, attempts to improve chemotherapy by inhibiting this protein have met with only limited success. Thus, it may be inferred that there are homologous proteins that, like MDR1, are able to make cells resistant to therapeutic agents. In addition, it may be inferred that MDR1 homologous proteins serve P-glycoprotein-like functions in physiologic human tissues, in particular in cells of the immune system, pluripotent stem cells and tissue progenitor cells, where either redundancy exists for MDR1 P-glycoprotein function, or where MDR1 P-glycoprotein is known to not promote the observed P-glycoprotein-associated activity.

Gene encoding a multidrug resistance human P-glycoprotein homologue on chromosome 7p15-21 and uses thereof


An apparatus, a system, and a method for in-situ etching monitoring in a plasma processing chamber are provided. The apparatus includes a continuous wave broadband light source to generate incident light beam, an illumination system configured to illuminate an area on a substrate with an incident light beam being directed at normal incidence to the substrate, a collection system configured to collect a reflected light beam being reflected from the illuminated area on the substrate, and direct the reflected light beam to a detector, and processing circuitry. The processing circuitry is configured to process the reflected light beam to suppress background light, determine a property of the substrate or structures formed thereupon based on reference light beam and the reflected light beam that are processed to suppress the background light, and control an etch process based on the determined property.

The present disclosure relates to in-situ etch process monitoring, and, more particularly, to methods, systems, and apparatuses for real-time in-situ film properties monitoring of the plasma etch process.
Plasma etch processes are commonly used in conjunction with photolithography in the process of manufacturing semiconductor devices, liquid crystal displays (LCDs), light-emitting diodes (LEDs), and some photovoltaics (PVs).
In many types of devices, such as semiconductor devices, a plasma etch process is performed in a top material layer overlying a second material layer, and it is important that the etch process be stopped accurately once the etch process has formed an opening or pattern in the top material layer, without continuing to etch the underlying second material layer. The duration of the etch process has to be controlled accurately so as to either achieve a precise etch stop at the top of an underlying material, or to achieve an exact vertical dimension of etched features.
For purposes of controlling the etch process various methods are utilized, some of which rely on analyzing the chemistry of a gas in a plasma processing chamber in order to deduce whether the etch process has progressed, for example, to an underlying material layer of a different chemical composition than the material of the layer being etched.
Alternatively, in-situ metrology devices (optical sensors) can be used to directly measure the etched layer during the etch process and provide feedback control for accurately stopping the etch process once a certain vertical feature has been attained. For example, in a generic spacer application the goal for an in-situ optical sensor for film thickness monitoring is to stop anisotropic oxide-etch at a few nm before touchdown (soft landing), then switch to isotropic etching to achieve an ideal spacer profile. Further, the in-situ metrology devices may be used for real-time actual measurement of the films and etch features during the etch process to determine information about the sizes of structures which can be used to control the etch process and/or to control subsequent processes (e.g., a process to compensate for a certain out-of-specification dimension).
The foregoing "Background" description is for the purpose of generally presenting the context of the disclosure. Work of the inventor, to the extent it is described in this background section, as well as aspects of the description which may not otherwise qualify as prior art at the time of filing, are neither expressly or impliedly admitted as prior art against the present invention.

Normal-incident in-situ process monitor sensor


A full-flow filter is disclosed and which comprises a screen or element housed between two body halves. The construction of the filter is such that fluid to be filtered enters and exits the filter body from the same side thereof.

Fluid filters have been in use for many years and are available in numerous forms. The present invention relates to that type of filter having a removable filter element or screen. These are sometimes referred to as disc filters due to their configuration. One example of a prior art filter may be seen in U.S. Pat. No. 3,485,376, Petersen et al., of Dec. 23, 1969. This patent specification discloses a disc type filter using a plurality of separate sections and separable components therein.
U.S. Pat. No. 3,028,012, Billner, Apr. 3, 1962, illustrates a sandwich type of filter, having fluid inlet and outlets to the filter on opposite sides of the filter body.
U.S. Pat. No. 4,446,017, May 1, 1984, Oberg, illustrates a sandwich type of filter utilizing a removable filter element of wire screen. The filter has upper and lower halves which, together, clamp the filter element therebetween. The path taken by the fluid to the filter interior is such that the fluid enters the filter on one side of the filter body and exits through an outlet opening on the opposite side of the filter body.
Another example of the prior art is shown in Canadian Patent 891,031, Forster, of Jan. 18, 1972. This specification discloses a plate for a filter press in which a slanted interior wall is utilized to facilitate filter cake removable by gravity. An interior gasket is mounted within a groove extending along the slanted wall to mount the filter cloth within the peripheral edges of the filter plate to eliminate wear of the filter cloth.
In the examples of prior art listed above, fluid to the filter enters one side of the filter body and leaves on an opposite side. With such arrangements, removing the filter element for either with a fresh element or for cleaning, and re-installation if it is a reusable element, requires removal of at least one hose from one side of the filter. This disrupts the fluid circuitry and requires expensive hoses and hydraulic hardware. Other disadvantages result from having the fluid entrance on one side of the body and the fluid exit on the other, not the least of which is the difficulty in using fixed piping for a reduction in maintenance and safety risks.

Black, Sivalls & Bryson, Limited (Canada)


One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.

One or more embodiments of the present invention relate generally to methods for fabricating patterned features utilizing imprint lithography.
There is currently a strong trend, for example and without limitation, in the semiconductor manufacturing industry, toward micro-fabrication, i.e., fabricating small structures and downsizing existing structures. For example, micro-fabrication typically involves fabricating structures having features on the order of micro-meters or smaller.
One area in which micro-fabrication has had a sizeable impact is in microelectronics. In particular, downsizing microelectronic structures has generally enabled such microelectronic structures to be less expensive, have higher performance, exhibit reduced power consumption, and contain more components for a given dimension relative to conventional electronic devices. Although micro-fabrication has been utilized widely in the electronics industry, it has also been utilized in other applications such as biotechnology, optics, mechanical systems, sensing devices, and reactors.
As is well known, methods for fabricating patterned features are an important part of micro-fabrication. In the art of micro-fabrication of, for example and without limitation, semiconductor devices, "lift-off" is a well known method for fabricating patterned metal features such as, for example and without limitation, lines on a substrate or wafer. FIGS. 1A–1D illustrate a well known process for fabricating patterned metal features in which a photoresist mask is undercut by a developer prior to metal deposition. As shown in FIG. 1A, substrate 100 has been coated with photoresist layer 110 in accordance with any one of a number of methods that are well known to those of ordinary skill in the art, and photoresist mask layer 110 has been patterned in accordance with any one of a number of methods that are well known to those of ordinary skill in the art to provide aperture 120 having relatively straight side walls. For example, in accordance with one such lithography technique, photoresist 110 was exposed to a beam of electrons, photons, or ions by either passing a flood beam through a mask or scanning a focused beam. The beam changed the chemical structure of an exposed area of photoresist layer 110 so that, when immersed in a developer, either the exposed area or an unexposed area of photoresist layer 110 (depending on the type of photoresist used) was removed to recreate a pattern, or its obverse, of the mask or the scanning. Next, as shown in FIG. 1B, aperture 120 has been undercut in accordance with any one of a number of methods that are well known to those of ordinary skill in the art to form aperture 130 in photoresist mask layer 110. Next, as shown in FIG. 1C, a relatively thin metal layer has been blanket-deposited over the structure shown in FIG. 1B. As is well known, metal thin film deposition techniques such as, for example and without limitation, physical vapor deposition ("PVD") or sputtering (and excepting conformal deposition techniques such as, for example and without limitation, chemical vapor deposition ("CVD") and electroplating) provide limited step coverage. As a result, metal deposited using such techniques does not coat steep or undercut steps. Thus, as shown in FIG. 1C, after blank metal deposition, the undercut side walls of aperture 130 are not coated. In other words, the use of undercut aperture 130 in photoresist mask layer 110 avoids side wall metal deposition, and provides discontinuous metal regions on substrate 100 and photoresist mask layer 110. Lastly, as shown in FIG. 1D, a photoresist lift-off process has been carried out in accordance with any one of a number of methods that are well known to those of ordinary skill in the art to provide patterned metal feature 150 on substrate 100. As is well known, during the lift-off process, photoresist material under metal film 140 is removed using, for example and without limitation, a solvent or a photoresist stripper. As a result, metal film 140 is removed, and patterned metal feature 150 that was deposited directly on substrate 100 remains.
Lithography is an important technique or process in micro-fabrication that is used to fabricate semiconductor integrated electrical circuits, integrated optical, magnetic, mechanical circuits and microdevices, and the like. As is well known, and as was discussed above, lithography may be used to create a pattern in a thin film carried on a substrate or wafer so that, in subsequent processing steps, the pattern can be replicated in the substrate or in another material that is deposited on the substrate. An imprint lithography technology for producing nanostructures with 10 nm feature sizes has been discussed in the literature. One embodiment of imprint lithography—referred to in the art as Step and Flash Imprint Lithography ("SFIL")—is disclosed in an article by B. J. Smith, N. A. Stacey, J. P. Donnelly, D. M. Onsongo, T. C. Bailey, C. J. Mackay, D. J. Resnick, W. J. Dauksher, D. Mancini, K. J. Nordquist, S. V. Sreenivasan, S. K. Banerjee, J. G. Ekerdt, and C. G. Willson entitled "Employing Step and Flash Imprint Lithography for Gate Level Patterning of a MOSFET Device" SPIE Microlithography Conference, February 2003, which article is available on the Internet at www.molecularimprints.com, and which article is incorporated by reference herein. SFIL is a lithography technique that enables patterning of sub-100 nm features at a cost that has the potential to be substantially lower than either conventional projection lithography or proposed next generation lithography techniques. As described in the article, SFIL is a molding process that transfers the topography of a rigid transparent template using a low-viscosity, UV-curable organosilicon solution at room temperature with low pressure mechanical processes.
One such SFIL process is illustrated in conjunction with FIGS. 2A–2F. As shown in FIG. 2A, thinorganic layer 210 (referred to as a transfer layer) has been spin-coated on silicon substrate 200. Next, a small amount of low viscosity, photopolymerizable, organosilicon solution 220 is dispensed over transfer layer 210 in an area to be imprinted (solution 220 is sometimes referred to as an "imprinting material"). The viscosity of solution 220 is sufficiently low so that minimal pressure (for example and without limitation, a pressure of about 2–4 psi) and no additional heating is necessary to move the liquid into an imprint template. For example, solution 220 may be a solution of an organic monomer, a silylated monomer, and a dimethyl siloxane oligomer ("DMS") and a multifunctional cross-linker. Each component plays a role in the imaging process. For example: (a) the free radical generator initiates polymerization upon exposure to actinic (typically UV) radiation; (b) the organic monomer ensures adequate solubility of the free radical generator, desirable cohesive strength of cured imprinting material and adhesion to underlying organic transfer layer 210; (c) and the silylated monomers and the DMS provide silicon required to provide high-oxygen etch resistance (useful in subsequent processing steps described below); and (d) multi-functional crosslinker provides chemical crosslinking. In addition, these monomer types help maintain a low viscosity that is useful during imprinting. In further addition, the silylated monomer and the DMS derivative also lower the surface energy of solution 220, thereby enhancing a separation process (described below). Advantageously, the organic monomer polymerizes in a fraction of a second using low cost, broadband light sources. For example, as described in the article, solution 220 consisted of 15% (w/w) ethylene glycol diacrylate (obtained from Aldrich Chemical Company of Milwaukee, Wis.), 44% (3-acryloxypropyl)tris(trimethylsiloxy)silane (obtained under the trade name SIA0210.0 from Gelest, Inc. of Morrisville, Pa.), 37% t-butyl acrylate (obtained from Lancaster Synthesis Inc. of Windham, N.H.), and 4% 2-hydrozy-2-methyl-1-phenyl-propan-1-one (obtained under the trade name Darocur 1173 from CIBA® of Tarrytown, N.Y.).
Next, as shown in FIG. 2B, template 230—bearing patterned relief structures (for example and without limitation, a circuit pattern) and whose surface was treated with a fluorocarbon release film—was aligned over dispensed solution 220 and moved to decrease a gap between template 230 and substrate 200. This displaced solution 220, and filled the patterned relief structures on template 230. Suitable release layers are described in an article by D. J. Resnick, D. P. Mancini, S. V. Sreenivasan, and C. G. Willson entitled "Release Layers for Contact and Imprint Lithography" Semiconductor International, June 2002, pp. 71–80, which article is incorporated by reference herein. As is known, it is desired that a template release layer has a low enough surface energy to enable template/substrate separation, and also is reasonably durably bonded to the template surface to remain functional after a number of imprints. Alkyltrichlorosilanes form strong covalent bonds with a surface of fused silica, or SiO2. In addition, in the presence of surface water, they react to form silanol intermediates which undergo a condensation reaction with surface hydroxyl groups and adjacent silanols to form a networked siloxane monolayer. When this functional group is synthetically attached to a long fluorinated aliphatic chain, a bifunctional molecule suitable as a template release film may be created. The silane-terminated end bonds itself to a template's surface, providing durability useful for repeated imprints. The fluorinated chain, with its tendency to orient itself away from the surface, forms a tightly packed comb-like structure, and provides a low-energy release surface. Annealing further enhances the condensation, thereby creating a highly networked, durable, low surface energy coating.
Next, as shown in FIG. 2C, once filling has occurred, the area is irradiated with broadband UV ultraviolet light (for example and without limitation, a 500 W Hg arc lamp) through a back side of template 230, and cross-linking of solution 220 occurs.
Next, as shown in FIG. 2D, template 230 and substrate 200 are mechanically separated to expose cured, organosilicon relief pattern 240 (an imprinted version of the relief pattern in template 230) that is disposed on residual layer 250 (a residue of cross-linked solution 220). The SFIL steps illustrated in FIGS. 2A–2D may be carried out in a tool described by I. McMackin, P. Schumaker, D. Babbs, J. Choi, W. Collison, S. V. Sreenivasan, N. Schumaker, M. Watts, and R. Voisin in an article entitled "Design and Performance of a Step and Repeat Imprinting Machine" SPIE Microlithography Conference, February 2003, which article is available on the Internet at www.molecularimprints.com, and which article is incorporated by reference herein.
Next, etching is performed in a two-step process. S. C. Johnson, T. C. Bailey, M. D. Dickey, B. J. Smith, E. K. Kim, A. T. Jamieson, N. A. Stacey, J. G. Ekerdt, and C. G. Willson describe suitable etch processes in an article entitled "Advances in Step and Flash Imprint Lithography" SPIE Microlithography Conference, February 2003, which article is available on the Internet at www.molecularimprints.com, and which article is incorporated by reference herein. As set forth in the article, the first etch step, referred to as a "break-through etch," anisotropically removes residual cross-linked layer 250 to break through to underlying transfer later 210. The second etch step, referred to as a "transfer etch," uses the remaining cross-linked relief pattern 240 as an etch mask to transfer the pattern into underlying transfer layer 210. In one embodiment of SFIL, silicon in polymerized solution 220, and lack of silicon in transfer layer 210, provides etch selectivity between polymerized solution 220 and transfer layer 210. In such an embodiment, the etching may be done in a LAM Research 9400SE obtained from Lam Research, Inc. of Fremont, Calif.
As shown in FIG. 2E, a halogen "breakthrough etch" was performed. For example and without limitation, the halogen etch described in the article was an anisotropic halogen reactive ion etch ("RIE") rich in fluorine, i.e., wherein at least one of the precursors was a fluorine-containing material (for example and without limitation a combination of CHF3 and O2, where the organosilicon nature of solution 220 called for the use of a halogen gas). Other suitable halogen compounds include, for example and without limitation, CF4. This etch is similar to a standard SiO2 etch performed in modern integrated circuit processing. Lastly, as shown in FIG. 2F, an anisotropic oxygen reactive ion etch was used to transfer features 260 to underlying substrate 200. The remaining silicon containing features 260 served as an etch mask to transfer the pattern to underlying substrate 200. The "transfer etch" was achieved with a standard, anisotropic, oxygen RIE processing tool.
In order to imprint sub-100 nm features, it is useful to avoid intermixing between an imprinting material and a transfer layer. Intermixing may cause problems such as, for example and without limitation, distortion of features when an imprint template is separated from a substrate after exposure to polymerizing radiation. This can be particularly problematic when feature thicknesses are as small as 50 to 100 nm. In addition, intermixing may be particularly problematic when using an imprinting material comprised of low viscosity acrylate components because such components have solvency toward many polymers. Because of this, some have used a cross-linked BARC material (BARC or "bottom antireflective coating" is an organic antireflective coating that is typically produced by a spin-on process) as a transfer layer. However, because BARC is cross-linked, it cannot be undercut by conventional wet developers and removed by organic photostrippers. As a result, the above described method for fabricating patterned metal features using lift-off cannot be used.
In light of the above, there is a need for methods for fabricating patterned features utilizing imprint lithography that overcome one or more of the above-identified problems.

Methods for fabricating patterned features utilizing imprint lithography


This technology is directed to a method and apparatus for monitoring or testing defects associated with an ion lens connected within a mass spectrometer. In some implementations, the testing mechanism monitors a connection of one or more ion lenses configured in the mass spectrometer to determine if voltage is effectively applied to the ion lens. The testing circuit of the present technology includes at least one Zener diode added to the voltage divider and monitoring a change in slope of the applied voltage versus the voltage at the read-back circuit. The change in slope may be easily measured.

Mass spectrometers typically utilize multiple ion lenses for extraction, guiding, and focusing of ions along a desired path. Generally described, an ion lens consists of one or more electrodes to which a static or dynamic potential is applied, thereby establishing an electrical field that influences the direction of ion movement. In order to ensure that a mass spectrometer is operating correctly, or to diagnose the cause of malfunction, it is desirable to provide verification to the operator that the ion lenses are receiving the correct potential. In mass spectrometer systems that constitute the prior art, it is known to employ a read-back circuit to confirm that an ion lens driver is operating correctly, and to sense shorts to ground or to another ion lens. However, such read-back circuits are unable to determine if the voltage produced by the driver does not reach the corresponding ion lens, which is clearly desirable to insure that the ion lens is working properly. One current method used to make this determination is by configuring an additional wire from the ion lens back to the read-back circuit. Apart from being a cumbersome and costly solution, this technique is undesirable, as it requires additional wiring inserted through a manifold wall via feed-through pins, which introduces more hardware and increases cost.
In view of the foregoing discussion, it would be advantageous to develop an effective solution for determining whether an ion lens located within a mass spectrometer is receiving the correct potential while avoiding the need to add feed-throughs or otherwise increase complexity and cost.

Method and apparatus for monitoring ion lens connections