Methods of suppressing or preventing an infection of a subject by a pathogen that involve administering to the subject a composition that includes a therapeutically effective amount of an MDA-7 polypeptide or a nucleic acid encoding the MDA-7 polypeptide, and a pharmaceutically acceptable preparation suitable for delivery to the subject, wherein the MDA-7 suppresses or prevents the infection, are disclosed. Also disclosed are methods of suppressing or preventing a viral infection of a cell, including obtaining an MDA-7 polypeptide or a nucleic acid encoding the MDA-7 polypeptide, and contacting the cell with the MDA-7 polypeptide or the nucleic acid encoding the MDA-7 polypeptide, wherein the MDA-7 suppresses or prevents infection of the cell.

1. Field of the Invention
The present invention relates generally to the fields of molecular biology, infectious diseases, and pharmacology. More particularly, it concerns methods of suppressing or preventing an infection of a subject or a cell by a pathogen using an MDA-7 polypeptide or a nucleic acid encoding an MDA-7 polypeptide.
2. Description of Related Art
Infections by pathogens are a major cause of morbidity and mortality in the U.S., and throughout the world. Successful vaccination programs against smallpox and polio, between 1950 and 1970, led to a general view by public health authorities, particularly in the West, that the war against infectious diseases was effectively over and some countries scaled-back health measures. However, the emergence of HIV and multi-resistant organisms has shown that constant vigilance is needed where pathogens are concerned.
In addition, in light of the events of Sep. 11, 2001, many anti-terrorist experts and government officials believe that the prospect of a bioterrorism attack against the United States using pathogens is highly likely. For example, terrorists may have the ability of gaining access to pathogens that are associated with substantial morbidity and mortality. Large scale release of a highly infectious pathogenic agent could infect the inhabitants of targeted cities and other areas. The attacks could result in long- and short-term health consequences and possibly death. Thus, in addition to the continuing need for the possibility of mass treatment of pathogens, there is an urgent need to develop strategies to prevent the morbidity and mortality associated with a bioterrorist attack wherein the public is exposed to deadly pathogens.
Viruses pose the threat of inflicting serious morbidity and mortality on the population. As obligate intracellular parasites, viruses rely exclusively on the translational machinery of the host cell for the synthesis of viral proteins. This relationship has imposed numerous challenges on both the infecting virus and the host cell. Importantly, viruses must compete with the endogenous transcripts of the host cell for the translation of viral mRNA. Eukaryotic viruses have evolved diverse mechanisms to ensure translational efficiency of viral mRNA above and beyond that of cellular RNA. These mechanisms serve to redirect the translational apparatus to favor viral transcripts, and they often come at the expense of the host cell.
One such mechanism whereby viruses ensure translational efficiency involves the cellular kinase known as interferon-induced, double-stranded (ds) RNA-activated serine/threonine protein kinase (PKR). PKR is involved in the regulated of apoptosis, cell-proliferation, signal transduction, and differentiation of cells. PKR is believed to localize in the cytoplasm and nucleolus of the cell, and associates with ribosomes. Overexpression or activation of PKR in HeLa, COS-1, U937, and NIH-3T3 cells has been shown to lead to apoptosis. In addition, mouse embryo fibroblasts from PKR knock-out mice are resistant to apoptotic cell death in response to dsRNA, tumor necrosis factor, and lipopolysaccharide. RNaseL and PKR mediate the IFN-induced antiviral response of the host, which is required to limit viral protein synthesis and pathogenesis. As part of the innate immune response to viral infection, RNaseL and PKR are activated by dsRNAs produced as intermediates in viral replication.
PKR also mediates the antiviral actions of interferon, in part by phosphorylating the alpha subunit of eukaryotic initiation factor 2 (eIF-2α), resulting in acute inhibition of mRNA translation and a concomitant block in viral replication (Merrick and Hershey, 1996; Meurs et al., 1990). In addition, PKR facilitates IFN-induced transcriptional programs by participating in the activation of nuclear factor kappa B and INF-regulatory factor 1 (Kumar et al., 1997).
Many viruses inhibit PKR activity. One such example is Hepatitis C virus (HCV), a member of the Flaviviridae, which mediates persistent infection within a majority of infected individuals. Many strains of HCV are resistant to alpha interferon (IFN) therapy. It has recently been shown that HCV represses PKR function through the actions of the viral NS5A protein, which binds and inhibits PKR in vivo (Gale et al., 1998, Gale et al., 1999). Other examples of viruses that inhibit PKR activity include adenovirus, EBV, poxvirus, influenza virus, reovirus, HIV, polio, HSV, and SV40 (Gale et al., 2000). Inhibition of PKR results in inhibition of apoptosis, with resulting continued translation of viral proteins.
Another cellular regulatory mechanism involved in protecting against viral infection involves the PRK-like endoplasmic-reticulum (ER)-resident kinase (PERK). PERK is a type I transmembrane protein that attenuates protein synthesis during endoplasmic reticulum (ER) stress by phosphorylating serine 51 on eIF2α. The HCV envelope protein, E2, can serve as a pseudosubstrate inhibitor of PERK and a potential viral regulator of the ER stress response (Pavio et al., 2003).
Another mediator of ER stress is the Unfolded Protein Response (UPR) (Gething and Sambrook, 1992). The UPR is an ER-to-nucleus signal transduction pathway that regulates a wide variety of target genes and is responsible for maintaining cellular homeostasis. Transient stresses such as glucose deprivation or perturbation of calcium or redox homeostasis can result in transient inhibition of protein translation and growth arrest. Prolonged UPR activation leads to activation of death-related signaling pathways and ultimately, to apoptotic death (Kaufman, 2002; Ron, 2002). The UPR is used by many endoplasmic reticulum-tropic viruses, such as HCV, flaviviruses, HHV6, rubella, LCMV, HIV, and Hepatitis B virus (HBV), to facilitate their life cycle and pathogenesis. Note that many viruses, especially positive strand viruses, modify host intracellular membranes to create a suitable compartment for viral replication—this requirement for virus-induced intracellular membrane production results in activation of UPR.
It is clear that pathogens other than viruses can activate the PKR and UPR defense systems. For example, PKR is activated in response to Salmonella infection (Shtrichman et al., 2002). Shtrichman et al. (2002) describes tissue-selectivity of interferon-stimulated gene expression in mice infected with Dam (+) versus Dam (−) Salmonella enterica serovar Typhimurium strains. In addition, the UPR serves as a defense system in plants (Oh et al., 2003). Oh et al. (2003) have shown conservation between animals and plants of the cis-activating element involved in the UPR.
The intracellular mediators, IRE1 and PERK are activated by ER stress, which can be induced by high-level glycoprotein expression. All enveloped viruses produce excess glycoproteins that could elicit PERK and IRE1 activation to meet the need for increased folding and secretory capacity. Thus, UPR activation is a common feature of viral replication.
Therefore, there is the need for novel agents that can be applied in the prevention and treatment of infections of subjects by viruses and other pathogens. Such novel methods may target not only immunostimulation, but may also be directed at interfering with viral replication through activation of PKR and the UPR response. These agents can be applied in ameliorating the effects of bioterrorism attacks wherein the public is exposed to pathogens.

Use of MDA-7 to inhibit pathogenic infectious organisms


A profile gauge that embodies a measurement geometry for a tool that has a toothed profile designed in particular for the skiving of toothed work pieces, wherein the profile gauge serves to determine at least one measurement quantity which can be used for a machining process, specifically a skiving process, that is to be performed with the tool and wherein, in a phase of said process, the toothed profile of the work piece that is to be generated is formed by a meshing engagement with the teeth of the tool, wherein the profile gauge is distinguished by having a toothed profile section with which, for determining the measurement quantity, the teeth of the tool are brought into a meshing engagement that corresponds to the tooth engagement between the tool and the work piece during the profile-forming phase. The invention further concerns a measuring device and a measurement method.

The primary subject of the invention is a profile gauge that embodies a measurement geometry for a tool that has a toothed profile designed for the skiving of toothed work pieces, wherein the profile gauge serves to determine at least one measurement quantity which can be used for a skiving process that is to be performed with the tool and wherein, in a phase of said process, the toothed profile to be generated on the work piece is formed by a meshing engagement with the teeth of the tool. The invention further encompasses a measuring device equipped with the profile gauge as well as a measurement method that is based on the profile gauge. More generally, the invention for which protection is sought concerns profile gauges for tools with geometrically defined cutting edges designed to generate and/or finish toothed profiles through rolling engagement with the work piece.
In the skiving (also referred to as "power skiving") of toothed work pieces with skiving wheels designed for this purpose, the dimensions of the skiving wheels as specified by their respective manufacturers enter directly or indirectly into the control settings for the skiving process.
Typically, the manufacturers will specify the outside diameter of the skiving wheel (measured at the tips of the teeth) as well as the height of the tool.
Other measurement methods which are used, e.g., for the contact measurement in the gear-shaping process, such as taking the measurements of the generating cutter, for example with a defined roller, based on which the dimensions of the tool are calculated, are only of limited use for skiving wheels, as the evaluation of such measurements is extremely complex and requires a multitude of input data.
In the just-mentioned gear-shaping process, the cutting edge of the generating cutter wheel as seen in the direction of its axis represents the geometry of a toothed profile of a spur gear in a transverse sectional plane, wherein said spur gear is meshing with the work piece in process like one gear with another (in the case of a straight-toothed cutter wheel). Or in the case of helical generating cutter wheels, at least the contour of the cutting edge as seen perpendicular to the surface normal and along the tooth trace represents the geometry of a toothed profile of a helical gear in a normal section, wherein said helical gear is meshing with the work piece in process like one helical gear with another. In contrast to these situations, the shape of the cutting edge of a skiving wheel will be different from the shape of the tooth gap to be cut in accordance with a specified tooth geometry. Given that in a skiving process, the respective axes of rotation of the work piece and of the tool will cross each other at an angle that is normally set between 10 and 30 degrees, a skiving wheel will for example no longer conform to an involute tooth shape as was the case with the generating cutter wheels mentioned above. As the power-skiving process can be expected to be known to practitioners in this field, further details will not be entered into at this point. A clear presentation of the process can be found in EP 2 537 615 A1.
Because of the reason that has just been explained, the information provided by manufacturers of skiving wheels will normally be limited to the diameter and the height. It has been found, however, that even with the knowledge of these dimensions of the skiving wheel there may be rejects in particular at the beginning of a production run of a series of tooth-profiled work pieces, as the latter can be out of tolerance in several different aspects, for example by being undersized in the base tangent length. In practice, the work pieces are brought to a measurement room where the measurements are taken. Based on the measurement results obtained thereby, corrections are made in the settings of the machine tool for the power-skiving process.
In view of the problems involved in the foregoing conventional procedure, the objective of the present invention is to simplify the practice of the power-skiving process in regard to the aforementioned aspects and to improve the power-skiving process, aiming in particular for high quality of the tooth-profiles produced, preferably already in the first piece of a manufacturing run.

Profile gauge, measuring device equipped with the profile gauge, and measurement method


A dental composition comprising a vinyl monomer containing at least one acidic group in the molecule thereof and an initiator capable of photopolymerizing said monomer by visible light, characterized in that said initiator consisting essentially of:. (a) a photosensitizer selected from an .alpha.-diketone, a quinone and a derivative thereof, and, PA1 (b) an accelerator selected from a compound containing at least one mercapto group in the molecule thereof is provided by the present invention.

1. Field of the Invention
The present invention relates to the polymerization and hardening of dental compositions which are adhesive towards tooth and dental restorative materials such as metals, ceramics, polymers, etc. and comprising monomers containing acidic groups in the molecule thereof by irradiating the dental compositions with visible light That is, the present invention relates to dental compositions comprising monomers containing acidic groups in the molecule thereof and polymerization initiators capable of polymerizing and hardening the monomers by irradiation of visible light.
2. Discussion of the Background
In dental treatment in recent years, an important technique has been the technique for adhesion to the tooth or metals. It is vinyl monomers containing acidic groups in the molecule thereof that plays the greatest role for enhancing the adhesive property In the case of using these monomers, the adhesion to the tooth or metals sufficiently reaches a level significant for dental treatment. Examples of such monomers include methacrylic acid esters containing in the molecule thereof aciding groups such as phosphoric or phosphonic acid diester groups, phosphoric or phosphonic acid mono ester groups, pyrrophosphoric acid groups, phosphinic acid groups, carboxyl groups, acid anhydride groups, acid halide groups, etc.
In recent dental techniques, attention has been focused upon a method for photohardening technique, in place of a conventional method using redox type polymerization initiators, as a method for hardening dental compositions. For this reason, it has been attempted to incorporate photopolymerization initiators into polymerizable monomer-containing compositions, in order to apply the photohardening method. As known photohardening techniques in the prior art, a method using .alpha.-diketones, etc. as sensitizers and amines as accelerators (U.S. Pat. No. 4,071,424), a method using benzoin alkyl ethers or benzyls as sensitizers and organic peroxides as accelerators (Japanese Patent Application OPI 102/80), a method using .alpha.-diketones as sensitizers and organic peroxides as accelerators (U.S. Pat. No. 4,459,193), etc. are known.
However, in the case of applying the catalyst systems using organic peroxides or tertiary amines as accelerators to photohardening of the above-mentioned polymerizable compositions containing the acidic group-containing monomers, irradiation to light requires a longer period of time than in the case of photopolymerizing conventional polymerizable compositions containing no acidic group-containing monomers but containing (meth)acrylic acid esters, which is not practical.


Cases for portable electronic devices are described including multiple alignment elements (e.g. slugs, magnets or physical securing means) embedded in a panel, such as the back panel of the case. Various accessories, such as stands, cord spools, mounts, communication devices, speakers, displays, etc., may also have multiple corresponding alignment elements (e.g. magnets, slugs or cooperative physical securing means) in them that allow the accessories to be semi-securely attached to the case in a plurality of specific positions and/or orientations.

The present subject matter relates to cases and accessories for portable devices, such as personal media players, smartphones, tablet computers, and other electronic devices. As portable devices have become increasingly more functional with increasing computing power, graphics and communications capabilities and decreasing size, there have been ongoing needs to make the devices themselves more user accessible, convenient and easy to use. Various accessories have been provided to address aspects of these and other limitations of mobile devices, such as ruggedized cases, speakers, chargers, etc.
Despite the successes that have been achieved using certain accessories for certain purposes, there are still limitations in the range of solutions that individual accessories can provide. Most (perhaps all) users do not make use of the full range of capabilities that their portable devices can provide. In many cases, the user could benefit from making it easier and/or more secure to use their portable device in many different situations, e.g. by providing stands, holders and the like at various locations that support different orientations and device capabilities. In addition, there is an ongoing consumer need for accessories that improve upon the accessibility of portable devices and help to expand their usefulness in various parts of users' day to day lives.


A process for making silver chloride particles having an average particle size of less than about 25 microns comprising:. (a) reacting silver metal particles having an average particle size of less than about 25 microns with chlorine gas in a chlorine-stable organic solvent for a sufficient amount of time to convert substantially all of said silver metal particles to silver chloride particles; and PA0 (b) recovering said silver chloride particles from said organic solvent.

1. Field of the Invention
The present invention relates to a process for making small particle size silver chloride (AgCl). In particular, the present invention relates to a process for making small Particle size silver chloride by reacting silver metal particles with chlorine gas in a chlorine-stable organic solvent.
2. Brief Description of Relevant Art
Small size silver chloride (AgCl) particles are commonly used as a component in making silver/silver chloride conductive pastes. Such pastes are used in making human contact electrodes, such as those used for measuring cardiovascular activity. See U.S. Pat. No. 4,877,512, which issued to Bowns and Diepholz on Oct. 31, 1989 and is incorporated herein by reference in its entirety.
Small-size silver chloride particles have been conventionally prepared by reaction of silver nitrate with hydrochloride acid. The product made by this process has the disadvantage of being relatively expensive, owing to the high cost of the silver nitrate starting material. Silver chloride has also been made by passing gaseous chlorine over silver metal powder. It has been found that when this latter method is employed, the resulting silver chloride particles commonly agglomerate or fuse together. The thus-formed large size silver chloride particles are formed by the accompanying large heat of reaction and cannot be used in the above-noted conductive pastes. Instead, it is necessary to grind and screen those particles down to a suitable size. Such grinding and screening is time consuming and may greatly increase the cost of the resulting silver chloride product.
Accordingly, there is a need for a new, inexpensive process for making small-size silver chloride particles. It is believed that the present invention is a solution to that need.

Process for preparing small particle size silver chloride


A projection exposure apparatus capable of projecting and exposing mask pattern images onto a substrate by means of a optical projection system, the apparatus includes an optical illumination system capable of illuminating a mask utilizing an excimer laser illuminating light source in a wavelength range of 230 nm or less, and an optical projection system including optical members that include a calcium fluoride crystal with a total alkaline earth metal impurity content of 1.times.10.sup.18 atom/cm.sup.3 or less, and which projects images of the mask pattern onto a substrate. The calcium fluoride crystal is manufactured by a method including the steps of adding a fluorinating agent to a powdered calcium fluoride forming a mixture, placing the mixture in a growing crucible inside a vacuum furnace, and evacuating the vacuum furnace. Once the vacuum furnace is evacuated, the temperature is elevated a first time inside the vacuum furnace to a temperature exceeding a melting point of the mixture and is maintained at a predetermined constant temperature inside the vacuum furnace until a polycrystalline material is formed. The polycrystalline material is then cooled and the temperature inside the vacuum furnace is elevated until the polycrystalline material is melted, wherein crystal growth of the polycrystalline material is promoted and a crystal ingot is formed.

1. Field of the Invention
The present invention relates to a projection exposure apparatus that includes an excimer laser as a light source operating in a light wavelength range of 230 nm or less, using a calcium fluoride crystal as an optical material.
2. Discussion of the Related Art
In recent years very-large-scale-integrations (VLSIs) have shown increasingly higher degrees of integration and function so that additional techniques for precision silicon integration on wafers has been required. Typical methods of producing VLSIs and similar devices are generally based on photolithography. For instance a DRAM, a VLSIs circuit with a capacity of 256 M-bits or greater, have been realized in recent years. As more and more integrated circuits are placed on a substrate the line widths separating each IC has become smaller, i.e., 0.35 microns or less. Accordingly, high imaging performance (including resolution and focal depth) is required in projection lenses used in steppers, which are at the cutting edge of photolithographic techniques. In response to these requirements, exposure wavelengths have become shorter and steppers using a KrF excimer laser light source operating at a light wavelength of 248 nm, have begun to appear on the market. There are extremely few optical materials that can be used in photolithography at wavelengths of 248 nm or less. Fluorite (calcium fluoride crystals) and synthetic silica glass are the typically used materials in such cases.
Furthermore, steppers using an ArF excimer laser light source operating at a wavelength of 193 nm have been proposed as the next generation of steppers and are viewed as a technological extension of the KrF excimer lasers. Moreover, light sources with even shorter wavelengths, such as F.sub.2 lasers as the light source, have been proposed.
Various problems have been encountered in the transition from the KrF excimer lasers to the ArF excimer lasers. In particular, calcium fluoride crystals, which exhibit almost no change in internal transmissivity when exposed to the KrF excimer laser light source, begin to exhibit a drop in internal transmissivity when exposed to an ArF excimer laser light source.
Accordingly, research has been directed towards perfecting a projection exposure apparatus using an excimer laser light source in the 230 nm or less wavelength range as a photolithographic light source.
The present invention relates to a projection exposure apparatus which uses an excimer laser in the 230 nm or less wavelength range as an illuminating light source employing a calcium fluoride crystal with a total alkaline earth metal impurity content of 1.times.10.sup.18 atom/cm.sup.3 or less as an optical material, which results in a projection exposure apparatus with a superior exposure treatment capacity, i.e., through-put. The term through-put as used here is defined as the amount of treatment, number of wafers treated, per unit time.


A hollow actuator includes a motor section, a reduction gear section, a brake section, a rotation position detecting section, and a shaft having a hollow shape and transmitting rotation, wherein the motor section and the brake section are disposed in a same chamber.

1. Field of the Invention
The present invention relates to a hollow actuator including a hollow portion.
2. Discussion of the Background
Industrial robots have been increasingly used to assemble automobiles on automobile assembly lines and to assemble other components with or without human intervention. In order to realize such a robot, a hollow actuator is used. As described in Japanese Examined Utility Model Registration Application Publication No. 7-42215 and Japanese Unexamined Patent Application Publication No. 2006-149139, a hollow actuator includes a reduction gear mechanism and an AC servo motor having a hollow shaft.


The invention relates to a transducer comprising a housing, a first and a second diaphragm, and a first and a second signal provider. The housing comprises an inner surface. The first and second diaphragms are positioned in the housing. The first and second diaphragms define a common compartment being delimited by at least both a part of the inner surface and the first and second diaphragms. The first signal provider is configured to convert movement of the first diaphragm into a first signal. The second signal provider is configured to convert movement of the second diaphragm into a second signal. The transducer can be used in a hearing aid.

Usually, directional sensitivity in, for example, hearing aids is achieved by using (i) matched pairs of two omnidirectional microphones or (ii) analogue directional microphones.
Using omnidirectional microphones, directional hearing in hearing aids is normally achieved by the use of a matched pair of two omnidirectional microphones. Two operational modes exist: directional and omnidirectional mode. In the directional mode, the signals of both microphones are subtracted. An electrical time delay is applied to one of the signals. In the omnidirectional mode, either only one of the microphones is used or the signals of both microphones are added, which leads to a 3 dB better SNR.
Instead of using omnidirectional microphones, directional hearing in a hearing aid can also be achieved by the use of an analogue directional microphone. An analogue directional microphone is a microphone with a second sound inlet in the rear volume, wherein one of the sound inlets has an acoustical filter to achieve a time delay. The membrane only detects pressure differences between the front and the rear sound inlet. Therefore, the analogue directional microphone only works in directional mode. The advantage of an analogue directional microphone is that directionality cannot be degraded by drift over time.
These types of systems have advantages and disadvantages. For example, matched pairs of two omnidirectional microphones typically have the following characteristics:                Double space and energy consumption of an omnidirectional microphone.        If the sensitivity and/or phase of the two microphones of a matched pair drift away from each other over time by aging effects or on shorter time scales due to environmental influences directional performance in the low frequencies degrades quickly.        Low signal-to-noise-ratio in directional mode in the low frequencies which makes it necessary to switch to omnidirectional mode in quiet situations.And, analogue directional microphones typically have the following characteristics:        The delay has to be made with acoustic filters such as external tubing or grids and cannot be changed. Therefore, directionality can only be static (no dynamic beam forming).        Low signal-to-noise-ratio in the low frequencies. Switching to omnidirectional mode not possible; thus requiring an additional omnidirectional microphone.
Examples of systems of the above types may be seen in U.S. Pat. Nos. 7,245,734 and 6,788,796.

Transducer, a hearing aid comprising the transducer and a method of operating the transducer


A configurable tooling block for a CNC turret lathe holds a plurality of tools at a single index position of the turret. The tooling block includes a main body, a mounting flange, and a coolant manifold removably mounted on the main body on either a first side face or a second side face of the main body. The main body has a plurality of tool-receiving openings, at least one of which is a rectangular opening for receiving an OD tool. The manifold may be provided with individually operable valves for controlling coolant flow to output ports associated with the tool-receiving opening, and may be made of a material that is lighter than the material used to form the main body to reduce overall weight.

Numerically controlled turret lathes and turning centers generally comprise a motor-driven spindle having a chuck or faceplate for clamping or attaching a workpiece such that the workpiece rotates with the spindle. Opposite the spindle is a turret having a plurality of index positions angularly spaced about a pivot axis of the turret. Each index position may be allocated a different tool for engaging the workpiece. The turret is automatically indexable to bring a desired tool into a working position for engaging the workpiece, such that a programmed sequence of different machining operations may be performed on the workpiece without need for operator intervention.
The tools carried on the turret may include, for example, drill bits, reamers, boring tools, turning tools, facing tools, thread forming tools, and grooving tools. Some of these tools, such as a turning and boring tools, are typically mounted at the end of a rectangular bar, whereas others such as drill bits and reamers are formed at the end of a cylindrical shank. The rectangular bar or cylindrical shank, as the case may be, is gripped by a tool holder mounted on the turret or provided as an integral part of the turret. As used herein, the term "shank" in reference to a tool means both a rectangular bar and a cylindrical shank. One common type of tool holder is a VDI tool holder, which follows standards established by the Association of German Engineers in the early 1970s. These tool holders are characterized by a jagged toothed shaft adapted to be gripped by a VDI chucking mechanism.
A recognized drawback of tool change turrets is that a single tool is allocated to each index position of the turret, such that the turret must be indexed to select a different tool if called for by the programmed sequence of machining operations. Although indexing is carried out automatically in accordance with the machining program, it adds to the overall run time required to machine the workpiece into a finished part. While the additional time for indexing may be a small portion of the overall run time for a single part, the additional time accumulates and becomes quite significant in the context of a production job where a very large number of parts is produced.
Currently, applicants are aware of three commercial products intended to allow more than one tool to be allocated to a single turret index position, thereby making it possible to avoid turret indexing time for some tool changes. The first product is marketed under the trademark TURRETGANG, and includes a rectangular bar shank for mounting at an OD tool index position of a turret. A tool block portion is provided at a distal end of the rectangular bar shank and includes three cylindrical tool-receiving openings spaced along an X-axis of the CNC machine for holding three inner diameter ("ID") tools. The tool block portion also includes coolant passages.
The second product is marketed under the trademark TRIPLIT, and includes a cylindrical shank for mounting in a round drill index position of a turret. The TRIPLET includes a tool block portion coaxially arranged at a distal end of the shank. The tool block portion has three cylindrical tool-receiving openings spaced along an X-axis of the CNC machine for holding three ID tools. The tool block portion also includes coolant passages.
The third product known to applicant is a line of multi-tool blocks offered by Engbar Inc. of Las Vegas, Nev. having multiple cylindrical tool-receiving openings for holding a plurality of ID tools.
One drawback of the existing tooling block products is that they are relatively heavy, which can lead to inaccuracies in positioning a given tool relative to the lather spindle when the turret is indexed. To reduce inaccuracies to acceptable tolerance levels, the number of tools carried by the tooling block must be limited.
Another drawback of the existing tooling block products is that both ID and OD tools cannot be allocated to the same index position on a turret.


A keyboard has an upper case, a lower case, and a stacked functional structure formed by stacking and fastening together a membrane switch sheet, a rubber sheet and a housing supporting keys in that order on a curved plate and a flat plate. When assembling the stacked functional structure, the membrane switch sheet and the rubber sheet are placed in that order on the curved plate and the flat plate supported in place on the bottom wall of the lower case and support ribs formed on the inner surface of the bottom wall of the lower case, connecting hooks formed integrally with the housing are inserted through aligned slots formed in the rubber sheet, the membrane switch sheet, the curved plate and the flat plate so that the connecting hooks engage with the lower surfaces of the curved plate and the flat plate with the membrane switch sheet and the rubber sheet are sandwiched firmly between the housing, and the curved plate and the flat plate. The stacked functional structure is sandwiched between the upper and the lower case, and then the upper and the lower case are fastened together to complete the keyboard.

1. Field of the Invention
The present invention relates to a keyboard to be employed in giving signals to an electronic apparatus or the like.
2. Description of the Related Art
Keyboards are used widely as input devices for operating personal computers, word processors and the like. A conventional keyboard will be described with reference to FIGS. 10 to 14. Referring to FIGS. 10 to 12, the keyboard has a support plate 1 of a metal having a curved portion 1a, a bent portion 1c and a flat portion 1b, a membrane switch sheet 2 having an upper membrane provided with electrodes, and a lower membrane closely spaced from the upper membrane and provided with electrodes, local portions of the upper membrane being depressed to bring the electrodes thereof to be in contact with the corresponding electrodes of the lower membrane for switching operation, keys 4, a rubber sheet 3 for absorbing shocks applied to the keys 4 by operator' fingertips, and a housing 5 of a synthetic resin having an upper surface on which the keys 4 are arranged. The support plate 1, the membrane switch sheet 2, the rubber sheet 3 and the housing 5 are stacked in that order. Those members excluding the support plate 1, i.e., the membrane switch sheet 2, the rubber sheet 3 and the housing 5, have moderate flexibility that enables those members to curve along the curved portion 1a of the support plate 1.
The keys 4 arranged on the upper surface of the housing 5 are supported by key support mechanisms 5a on the housing 5, respectively, so as to be vertically movable when depressed.
Fastening projections 5b project from predetermined positions on the lower surface of the housing 5. As shown in FIGS. 11 and 12, the membrane switch sheet 2 and the rubber sheet 3 are stacked in that order on the support plate 1 having the curved portion 1a, the bent portion 1c and the flat portion 1b. The housing 5 is placed on the rubber sheet 3 so that the projections 5b are inserted through aligned holes formed in the rubber sheet 3, the membrane switch sheet 2 and the support plate 1. End portions of the projections 5b project from the lower surface of the support plate 1. The end portions of the projections 5b are upset to form a stacked functional structure 6 consisting of the support plate 1, the membrane switch sheet 2, the rubber sheet 3 and the housing 5. In this stacked functional structure 6, the membrane switch sheet 2, the rubber sheet 3 and the housing 5 are curved so as to conform to the shape of the support plate 1 having the curved portion 1a and the flat portion 1b.
In the keyboard provided with the stacked functional structure 6, the curved portion 1a of the support plate 1 is seated on the upper surface of the bottom wall 9a of a lower case 9 and a rib 9b formed on the bottom wall 9a. The flat portion 1b is seated on ribs 9c formed on the bottom wall 9a of the lower case 9 as shown in FIG. 10. The stacked functional structure 6 is located on the lower case 9 by projections, not shown, formed on the lower case 9 and engaging with positioning recesses 1d (FIG. 14) formed in the support plate 1. An upper case 8 is put on the lower case 9, thus supporting the stacked functional structure 6 so that the keys 4 project outside through holes formed in the upper case 8. The upper case 8 and the lower case 9 sandwiching the stacked functional structure 6 therebetween are fastened together with screws, not shown, to complete the keyboard.
As shown in FIGS. 10 to 12, an alphanumeric key unit A is disposed on the upper surface of the housing 5 with the keys 4 included in the alphanumeric key unit A arranged in a curved arrangement along the curved portion 1a of the support plate 1, and a function key unit B is disposed on the upper surface of the housing 5 with the keys 4 included in the function key unit B arranged in a flat arrangement along the flat portion 1b of the support plate 1. Since the rear end of the curved portion 1a of the support plate 1 is seated on the rib 9b, the alphanumeric key unit A rises gradually along the curved portion 1a of the support plate 1 toward the rear. Since the function key unit B is disposed behind the alphanumeric key unit A (on the right-had side, in FIG. 10), as viewed from the operator's side and the flat portion 1b of the support plate 1 corresponding to the function key unit B are supported on the ribs 9c, the function key unit B is disposed in a substantially horizontal position on a level higher than that of the alphanumeric key unit A.
In the conventional keyboard illustrated in FIGS. 10 to 14, the membrane switch sheet 2 and the rubber sheet 3 are stacked on the upper surface of the support plate 1 and holes 1e through which the projections 5b are inserted are formed in the support plate 1, the membrane switch sheet and the rubber sheet 3 (only the holes 1e formed in the support plate 1 are shown) at positions corresponding to the projections 5b of the housing 1. The stacked functional structure 6 is fabricated by inserting the projections 5b through the holes 1e and upsetting the end portions of the projections 5b projecting from the lower surface of the support plate 1 to hold the membrane switch sheet 2 and the rubbers sheet 3 between the support plate 1 and the housing 5.
Although the support plate 1 has the curved portion 1a and the flat portion 1b respectively having different shapes on the opposite sides of the bent portion 1c, the housing 5 formed of a flexible synthetic resin is bent substantially along the bent portion 1c of the support plate 1 and substantially conforms to the shape of the support plate 1 when the stacked functional structure 6 is completed. The housing 5 has a linear bending portion 5d corresponding to the bent portion 1c of the support plate 1 and is capable of being bent along the bending portion 5d when fastened to the support plate 1.
As shown in FIG. 13, housing 5 is fastened to the support plate 1 with its first portion A1, in which the alphanumeric key unit A is disposed, in conformance to the curved portion 1a and its second portion B1, in which the function key unit B is disposed, in conformance to the flat portion 1b. The keys 4 which are more frequently used among those of the alphanumeric key unit A, corresponding to the curved portion 1a of the support plate 1, are arranged at positions nearer to the operator in the curved first portion A1 than those which are less frequently used to facilitate operator's operation for operating the keys and to reduce load on the operator. The keys 4 of the function key unit B, which are less frequently used than the alphanumeric keys 4, are disposed in the flat second portion B1 remote from the operator to form the keyboard in a small thickness.
The support plate 1 having the curved portion 1a and the flat portion 1b of the conventional keyboard thus constructed is formed by processing a large metal sheet by a pressing process or a roll-bending process. The yield of such a process is low and hence the cost of the support plate 1 manufactured by such a process is high.
It is very difficult to form the support plate 1 having the curved portion 1a and the flat portion 1b on the opposite sides of the bent portion 1c in a high accuracy by a press or a bending roll because of the springback of the metal sheet. If the support plate 1 is not formed accurately is design dimensions, the stacked functional structure 6 cannot stably be seated on the bottom wall 9a and the ribs 9b and 9c of the lower case 9 and rattles, which makes work for assembling the keyboard difficult.
The stacked functional structure 6 is constructed by stacking the membrane switch sheet 2 and the rubber sheet 3 on the support plate 1, the housing is put on the rubber sheet 3 so that the projections 5b are inserted through the holes formed in the support plate 1, the membrane switch sheet 2 and the rubber sheet 3, and the end portions of the projections 5b are upset. Since the number of the projections 5b is relatively large, it is very difficult to upset all the fastening projections 5b uniformly so that the curved portion 5a and the flat portion 5b of the housing 5 are fastened equally to the support plate 1. Furthermore, an expensive, large upsetting machine is necessary to upset the fastening projections 5b so that the curved portion 5a and the flat portion 5b are fastened equally to the support plate 1. Such problems may be solved by individually upsetting the plurality of fastening projections 5b on at a time, which, however, takes much time.


A computer screen enhancing device including a front panel having a central opening therethrough. The front panel is positionable on a computer monitor whereby a computer screen of the monitor is visible through the central opening. A pair of side panels are foldably secured to outer edges of a pair of side portions of the front panel. The side panels have a pair of vertically disposed hook and loop strips disposed on outer surfaces thereof. A top panel is foldably secured to an outer edge of an upper portion of the front panel. The top panel has two pairs of horizontally disposed hook and loop strips on an inner surface thereof for mating with the pair of vertically disposed hook and loop strips of the pair of side panels in a closed orientation.

The present invention relates to a computer screen enhancing device and more particularly pertains to enhancing images seen through the computer screen by minimizing glare.
As the advent of the computer age has changed into the computer revolution, constant improvements in the computer field are being sought out. Because more and more people are spending more time sitting in front of a computer monitor, improvements are necessary to enhance the user's ability to view the monitor with as few distractions as possible. One of the more annoying problems associated with viewing a computer monitor is the glare that sometimes occurs due to excessive light, either natural or unnatural. The glare makes it difficult for the user to see the monitor and will ultimately contribute to mistakes and frustration.
Numerous shading devices have been created in order to solve this problem. Most of these devices do not provide the convertibility or the desired level of securement that is necessary to completely solve this problem. Most of these devices are often bulky, making packaging difficult. Additionally, most of these devices do not provide the ability to be properly secured to the computer monitor in such a way as to prevent the unwanted disengagement therefrom.
The present invention seeks to provide a solution to these problems by providing a simple device that is flat and compact in it's closed orientation to benefit packaging and can be secured around the periphery of the computer monitor and to the front face surrounding the screen so that the securement is sound.
The use of visors for display equipment is known in the prior art. More specifically, visors for display equipment heretofore devised and utilized for the purpose of facilitating the viewing of contents on a display are known to consist basically of familiar, expected and obvious structural configurations, notwithstanding the myriad of designs encompassed by the crowded prior art which have been developed for the fulfillment of countless objectives and requirements.
By way of example, U.S. Pat. No. 5,717,566 to Tao discloses a shade device for notebook computer display screens that facilitates viewing in excessive light. U.S. Pat. No. 5,243,463 to Waintroob discloses a visor for a video display terminal having a light absorbing and non-reflecting inner surface that increases visual contrast on the display. U.S. Pat. No. 5,218,474 to Kirschner discloses a video display terminal visor that surrounds the display and is secured thereto around only its periphery. U.S. Pat. No. 5,121,253 to Waintroob discloses a visor for a computer terminal display and method that is also secured to the display around only its periphery. U.S. Pat. No. 5,115,345 to Hobson et al. discloses an anti-glare, antistatic video monitor visor.
While these devices fulfill their respective, particular objective and requirements, the aforementioned patents do not describe a computer screen enhancing device for enhancing images seen through the computer screen by minimizing glare.
In this respect, the computer screen enhancing device according to the present invention substantially departs from the conventional concepts and designs of the prior art, and in doing so provides an apparatus primarily developed for the purpose of enhancing images seen through the computer screen by minimizing glare.
Therefore, it can be appreciated that there exists a continuing need for new and improved computer screen enhancing device which can be used for enhancing images seen through the computer screen by minimizing glare. In this regard, the present invention substantially fulfills this need.


A distortion generating sheet (22) intervenes between a first and a second flexible sheets (11) and (12), respectively, with one end (23) thereof fixed to the first sheet (11), and the other end (24) fixed to the second sheet (12). As a consequence, when a shear takes place across the first and second sheets (11) and (12), respectively, the shear is conveyed to the distortion generating sheet (22). A strain gauge (21) fixed to the distortion generating sheet (22) detects and measures the distortion generated by the shear in the distortion generating sheets (22). A third sheet (15) is further provided with its periphery bonded to the first sheet (11) to form a closed space. The force bearing the patient is measured by measuring the pressure in the space formed.

There has been known a care index called Braden scale for predicting a risk of pressure ulcer. This scale is based on the examinations and assessments of patient's physical conditions, including his sensation of pressure, wetness of skin, activeness, mobility, nutrient condition, and friction and shear occurring on his skin. The Braden scale is used to prognosticate pressure ulcers. By improving risky conditions and providing preventive measures against those factors that lead to pressure ulcer, it is possible to minimize development of pressure ulcers. Of the factors mentioned above, "friction" implies friction of an object slipping on skin by a relatively weak external. Friction is a risk factor in that it can damage the skin and become a cause of pressure ulcer. "Shear" implies compression or stretching of tissues lying between the skin and a bone occurring under a tangential stress due to a relatively strong external force acting on the skin. "Shear" is a risk factor in that it can cause blood stream inhibition leading to pressure ulcer.
As shown in FIG. 9, when the body of a patient 2 lying on a medical bed or nursing care bed, such as Gatch bed 1 whose back and knee sections can be bent (lifted), shearing forces "a" act on the patient's body in the direction from the lower half to the upper half of the body and shearing forces "b" act in the opposite direction. Such forces are generated over such regions of the patient's body as the scapula 3, lumbar 4, sacrum bone 5, and thighbones 6 during lifting up of the Gatch bed by a care worker in lifting and/or adjusting the patient's back and/or knee or moving the patient. When the patient 2 is too weak to move his body for himself, he cannot relieve himself of the shearing forces "a" and "b". If the patient were left under such condition, the shearing forces would develop pressure ulcers at bony prominences.
Unfortunately, there is no known apparatus for measuring such shearing force actually acting on the patient's skin and causing pressure ulcer. As a consequence, no satisfactory analysis of shear has been made so far. Moreover, how a shearing force acts on the patient's body depends on the patient 2. That is, it depends on the region of the body the force acts, his weight and somato type, and whether a bony prominence exists or not. Thus, these factors must be also taken into account in the analyses. Therefore, in order to make more accurate the assessment of such care index as Braden scale, a need exists for an improved apparatus capable of accurately measuring a shearing force acting on patient's body.
In view of the circumstances as mentioned above, the invention is directed to an apparatus for accurately measuring the shearing force and pressure acting on the patient's skin and calculating the resultant force arising from the shearing force and the pressure accurately to evaluate risk factors that may cause pressure ulcer.


Fluoride-containing scale can be removed from metal surfaces such as titanium, titanium alloys, nickel alloys, and stainless steel by contacting the metal surfaces with an aqueous salt solution of an inorganic acid, including its hydrates. The cationic portion of the salt can be aluminum, iron and mixtures thereof. The anionic portion of the salt can be a chloride, a nitrate, a sulfate, and mixtures thereof. The contracting occurs in the absence of the addition of an acid, such as hydrochloric, nitric, or sulfuric acid. The presence of the aqueous salt solution with the dissolved fluoride scale does not accelerate or increase the normal rate of metal corrosion that can occur in the absence of the aqueous salt solution or any acidic cleaning agent.

1. Field of the Invention
The invention is relates to the removal of scale from metal surfaces, and more particularly, to the removal of scales containing fluorides from metal surfaces.
2. Description of the Prior Art
When coal or other ash-containing organic materials are gasified in a high-pressure, high-temperature partial oxidation quench gasification system, the ash material commonly becomes partitioned between coarse slag, finely divided slag particles, and water-soluble ash components. Water is used in the system to slurry the feed coal, to quench the hot synthesis gas, also referred to as "syngas" and to quench the hot slag byproduct. Water is also used to scrub particulate matter from the syngas, and to assist in conveying the slag byproduct out of the gasifier.
Calcium fluoride and magnesium fluoride scale which forms on evaporator tubes is usually chemically removed by inorganic acids such as sulfuric, hydrochloric, or nitric acids. When sulfuric acid is used for scale removal, CaSO.sub.4 is sometimes precipitated. During acid cleaning of fluoride scale, corrosive hydrofluoric acid is formed in the cleaning solution and certain metals and metal alloys, such as titanium, nickel, and stainless steel can become subject to severe corrosion from the hydrofluoric acid. The presence of fluoride ion (F.sup.-) in the solution interferes with the protective oxide films that form on these metals and allows for dissolution of the titanium, iron, and nickel ions in an acidic solution. Therefore, chemical cleaning of fluoride scale by the use of acids alone in process equipment is not practical. It is also noted that calcium scale can be chemically removed by use of ethylene diamine tetracetic acid.
Scale can also be removed by mechanical means such as by scraping or by impact with a hammer or by hydroblasting. However, chemical cleaning is preferred and is usually more thorough because scale can be dissolved and removed in places where a hydroblasting nozzle cannot reach. It is therefore desirable to chemically dissolve fluoride scale from equipment constructed of titanium or stainless steel. Titanium and stainless steels are commonly used in the wastewater treatment industry, especially in the construction of wastewater evaporators.
The literature has also addressed the problem of hydrofluoric acid corrosion in process equipment made of stainless steels, nickel alloys and titanium alloys. Koch, G. H., "Localized Corrosion in Halides Other Than Chlorides," Environment Effects, June 1993 discloses that ferric or aluminum ions can inhibit corrosion.
The effect of water solutions and their corrosiveness in flue gas desulfurization process scrubbers has also been studied. These solutions contain chlorides, fluorides and sulfates at low pH, for example, 4800 mg/kg fluoride at a pH of 1. The addition of flyash minerals which contain significant amounts of silicon, iron, and aluminum can inhibit corrosion of titanium in otherwise aggressive fluoride containing solutions. It was also found that if 10,000 mg aluminum/kg (added as aluminum sulfate) were added to a corrosive acidic solution containing 10,000 mg/kg chloride and 1,000 mg/kg fluoride, the solution is no longer corrosive to titanium.

Removal of fluoride-containing scales using aluminum salt solution


A vertical adjuster for a suspending lamp comprises a cylinder at an upper end of the lamp; an inner upper side of the cylinder having a threaded section; a lead wire having one end connected to the lamp and being positioned at a bottom of the cylinder; another end of the lead wire being fixed to a retainer; an adjuster formed by a seat and a slidable annular block; a center of the seat having a hole; the seat being locked to an upper end of the cylinder; the slidable annular block having an axial hole; a lateral side of the slidable annular block having a radial screw hole communicated to the axial hole; a screw unit being located in the screw hole; a cross section of the slidable annular block being slightly larger than that of the hole and the slidable annular block being located below the seat.

In many prior art lamps, the lamps are made glasses. In the manufacturing process of the lamps, the lamps cannot be made with uniform distributed weight so that they are easily to incline to one side. Thereby it is necessary to adjust the lamps in a vertical position. Referring to FIG. 1, it is illustrated that a lead wire 11 is extended from an upper end of the lamp 10. A long sleeve 12 encloses the wire 11. Adjusting the sleeve 12 will make the lamp 20 be in a vertical position. Furthermore, the installation of the sleeve 12 can make a visual effect of causing the viewer to feel the lamp to be in a vertical position. However its effect is not preferred.


Disclosed are pharmaceutical compositions containing saposin C and phosphatidylserine that are useful for treating various cancers. Also disclosed are methods for assaying potency of a test composition comprising saposin C and an anionic phospholipid.

Saposins, a family of small (˜80 amino acids) heat stable glycoproteins, are essential for the in vivo hydrolytic activity of several lysosomal enzymes in the catabolic pathway of glycosphingolipids. Saposins A, B, C, and D are described in U.S. Pat. Nos. 7,834,147 and 9,271,932.
Nanovesicles comprising saposin C ("SapC") and dioleoyl phosphatidylserine (DOPS) have high affinity for phosphatidylserine-rich membranes in vitro and in vivo, and can induce apoptosis and/necrosis in target cells (Qi et al. (2009), Clin Cancer Res 2009; 15: 5840-5851). The proposed mechanism by which the SapC-DOPS nanovesicles induce apoptosis is via ceramide elevation through activation of β-glucosidase and acid sphingomyelinase (with subsequent degradation of glucosylceramide and sphingomyelin, respectively), which leads to activation of caspases. The nanovesicle preparation was found to be efficacious against a wide variety of tumor types in vitro and in orthotopic murine tumor models (Qi et al. (2009); Wojton et al. (2013), Mol Ther, 21: 1517-1525; Abu-Baker et al. (2012), J Cancer Ther, 3: 321-326; Chu et al. (2013), PLoS One; 8: e75507; U.S. Pat. No. 7,834,147).

Saposin C pharmaceutical compositions and methods of treating cancer


A block-based seeking method for Windows Media Audio (WMA) stream can be implemented in a portable electronic device with a first processor and a second processor. The first processor initially reads a WMA stream from a block-based storage device. Next, the WMA stream is transmitted to a memory of a second processor block by block. The first processor generates and transmits a block number before it transmits a block of data. Next, the second processor decodes the WMA stream packet by packet. If a discontinuous block number occurs, a desired position of the WMA stream is sought according to the discontinuous block number. Next, the second processor outputs decoded samples of the WMA stream.

1. Field of Invention
The present invention relates to a seeking method for Windows Media Audio stream, and more particularly, to a block-based seeking method for Windows Media Audio stream.
2. Description of Related Art
Windows Media Audio (WMA) is a proprietary compressed audio file format developed by Microsoft and is a default audio file format supported by Windows Media Player (WMP). WMA is also popularly implemented on portable electronic devices, such as personal digital assistants (PDA), mobile phones and digital audio players. However, due to resource limitations, it is desirable to utilize specific hardware and software to improve the efficiency of the resource-limited portable device in order to support the WMA format file. For example, utilizing a generalized dual-processor (GDP) system or a multi-processor (MP) system is advantageous. The multi-processor system has a plurality of processors communicating with each other to separately deal with control commands and data processing.
WMA seeking approach is the querying and modifying of the current position within a WMA stream. There are some basic shortcomings to the conventional WMA seeking approach implemented in a multi-processor system. The first problem is that the communication between the processors is complicated. The second problem is that the system cannot handle seeking event while a packet of the WMA stream is being decoded.
Conventional seeking method for WMA stream implemented in portable devices is stream-based, i.e., the basic unit of data to process is bytes. How to provide a block-based seeking method for WMA stream in order to efficiently and conveniently implemented in a multi-processor system is an issue of great consequence.

Block-based seeking method for windows media audio stream


A method for converting a set of input image pixels having a first resolution and being represented by a set of input image signals to a set of output image pixels having a second resolution and being represented by a set of output image signals. The method is adapted for use in an electroreprographic machine having a memory for storing images and an image output terminal for printing the images. The method comprises the following steps: first, developing a set of state determination rules which govern the conversion of the set of input image pixels having the first resolution to the set of output image pixels having the second resolution; second, communicating the set of input image signals and the set output image signals to the memory, third, relating a plurality of selected input image pixels with a selected one of the output image pixels; fourth, determining respective binary states of the plurality of selected input image pixels; finally, corresponding the selected output image pixel with one of at least three output states by reference to the determined, respective binary states and one of the state determination rules.

The present invention relates generally to a technique for converting images in scale or resolution, and more specifically to a technique in which binary input image data of one resolution is converted to gray output image data of another resolution.
Image information, be it color or black and white, is commonly generated in a bitmap format at a particular scale, orientation .THETA. and resolution K.times.L.times.b, corresponding to a desired printer output, where K is a number of spots per unit of length in one dimension, L is a number of spots per unit length in the other dimension, and b is the depth of each pixel, in number of levels. This bitmap is present for every color separation of the output device, i.e., 4 bitmaps for a 4-color output device, 3 for a 3-color, 2 for a 2-color and 1 for a black and white output device. In a common example of a black and white output, image data comprising a bitmap to be printed is provided to a printer suitable for printing at 300 spots per inch (spi) in both dimensions, at a one bit depth giving 2 levels. Many considerations drive this single selection of resolution, including the desirability of providing only a limited number of fonts (alphanumeric bitmaps) so as to use only a limited amount of storage space. Common software packages available on personal computers or for operation of input scanners for document creation also usually provide only a single resolution output. Images are commonly arranged at a fixed orientation
Increasingly, the resolution available from printers varies over a wider range of choices. Printer resolutions are available over a range, for example, from less than 200 spi to more than 600 spi. Resolutions vary for a number of reasons, generally related to the quality of the output image. Simply printing a 300 spi bitmap at 400 spi or 600 spi is undesirable however, since the image will be reduced substantially in size on the output page or display. It would be highly desirable to provide the capability of printing any image at any resolution, while selecting the output size and orientation.
It is a common practice to implement conversion of a bitmap of first resolution K.times.L.times.b to a bitmap of second resolution M.times.N.times.d through simple pixel level and raster level operations, such as pixel doubling. When resolution is changed by integer multiples, the resolution conversion can be achieved by pixel replication. Pixel replication, however, does not best use the capabilities of higher resolution output devices. Hence in performing resolution conversion with a higher resolution output device it is desirable to perform a smoothing operation.
Scaling is an identical operation to resolution conversion, and the number of pixels representing the image is either increased or decreased. In particular, a conversion is implemented for a bitmap of first resolution K.times.L.times.b to a bitmap of second resolution M.times.N.times.d through simple pixel level and raster level operations, such as pixel doupling, but if the image is then directed to a K.times.L.times.b for output, it is considered scaled.
Alternatively, more elaborate methods than pixel replication have been developed to facilitate resolution conversion, some of which are described in the following patent applications:
U.S. patent application Ser. No. 07/513,415; Filed: Apr. 23, 1990; Title: "Bit-Map Image Resolution Converter" PA0 U.S. patent application Ser. No. 07/588,125; Filed: Sep. 25, 1990; Title: "Bit-Map Image Resolution Converter Compensating for Write-White Xerographic Laser Printing" PA0 U.S. Pat. No. 4,630,947; Patentee: Yoshida et al. Issued: Dec. 23, 1986. PA0 U.S. Pat. No. 4,829,587; Patentee: Glazer et al. Issued: May 9, 1989. PA0 U.S. Pat. No. 4,907,152; Patentee: Lempriere; Issued: Mar. 6, 1990
Each of the above-mentioned patent applications contemplates a method of magnifying, by a predetermined magnification factor (n), original image pixels in two dimensions. The method includes the steps of selecting an original image pixel, as well as determining the binary state of both the selected original image pixel and all immediately surrounding original image pixels. Additionally, the selected original image pixel is expanded into an n.times.n array of magnified image pixels to represent the magnification of the selected original image pixel. Finally, a binary state is assigned to each pixel in the array of magnified image pixels according to the pattern of binary signals previously determined for the selected original image pixel and all immediately surrounding original image pixels. In these patent applications, the assignment of the binary states to the pixels in the array of magnified image pixels is made according to a set of state determination rules.
Employing sophisticated resolution conversion techniques does not insure that the resulting output image will have a desirable appearance. For instance, the output image can be excessively blocky and/or contain noticeable "jaggies." Hence, smoothing operations are sometimes used in conjunction with the conversion or scaling of the image. Through use of the state determination rules in the techniques of the above-mentioned applications, smoothing operations are achieved. For example, the method of the patent application entitled "Bit-Map Image Resolution Converter" permits such operations as smoothing of edges, smoothing of half-bitting effects and smoothing of lines. Moreover, the method of the patent application entitled "Bit-Map Image Resolution Converter Compensating for Write-White Xerographic Laser Printing" ("Compensating for Write-White Application") permits enhancing of single bits in printing and compensating for loss of resolution in write-white printing. Indeed, the compensating technique disclosed in the Compensating for Write-White Application is presently employed in the DocuTech.RTM. electronic printer manufactured by Xerox.RTM. Corporation. The pertinent portions of the above-mentioned patent applications entitled "Bit-Map Image Resolution Converter" and "Bit-Map Image Resolution Converter Compensating for Write-White Xerographic Laser Printing" are incorporated herein by reference.
The following patents relate to the area of resolution conversion:
U.S. Pat. No. 4,630,947 discloses an enlarged pattern generator for generating an enlarged dot matrix pattern from an original dot matrix pattern by providing up to four mutually adjacent dots.
U.S. Pat. No. 4,829,587 discloses a device for rescaling an image in which a gray level output is produced by convolving the image with a filter kernal.
U.S. Pat. No. 4,907,152 discloses a method for increasing the resolution of a computed tomography (CT) scanner where the density of the captured data is averaged by use of density values obtained on successive first and second scans, wherein the first scan is offset from the second scan.
While an advantageous technique for using state determination rules to convert input image data of one resolution to output image data of a second resolution is disclosed by U.S. patent application Ser. No. 07/513,415, these rules are only be used to convert binary input image data to binary output image data. It would be desirable to provide a rules-based technique in which binary input image data of one resolution is converted to gray output image data of another resolution.

Resolution conversion with simulated multi-bit gray


An inkjet printer system includes a print head, a sub tank, a pressure controller, and a check valve. The print head is configured to eject ink. The sub tank is connected to the print head and has a pressure control hole. The pressure controller is connected to the pressure control hole to control an inner pressure of the sub tank. The check valve is provided at the pressure control hole to prevent ink in the sub tank from flowing into the pressure control hole from the sub tank.

1. Field of the Invention
The present invention relates to an inkjet printer system and an ink supply apparatus.
2. Discussion of the Background
An inkjet printer is an apparatus which forms images of information such as characters, graphics, patterns, and photographs on a print surface by ejecting fine particles of ink from a plurality of nozzles, which are formed in a print head, to deposit the ink on a print medium while moving the print head relative to the print medium. In the inkjet printer, since ink is consumed according to the ejection of the ink, a carriage of the print head or a printer body is provided with an ink tank (ink cartridge) having a volume based on the intended use. In case of a large-sized inkjet printer for printing commercial advertisements, banners, and the like, a large amount of ink is consumed in a relatively-short time. In such an industrial inkjet printer, therefore, a large volumetric ink tank is generally provided in the printer body, and the ink tank and the print head are connected through tubes or the like so as to supply ink from the ink tank to the print head according to the ejection of the ink.
As the inner pressure of the print head becomes higher than the normal atmospheric pressure, a problem that ink is pushed out of nozzles to drip onto a print medium, i.e. a dripping problem occurs. To solve this problem, in the inkjet printer, the ink supply device is adapted to control the inner pressure of the print head to be slightly lower than the normal atmospheric pressure, i.e. slight negative pressure. As one of conventional ink supply devices, there is known an ink supply device which includes an ink tank (main tank) disposed on a printer body and a sub tank of a smaller volume disposed between the ink tank and a print head on a carriage, and which is of a "negative pressure producing type" in which the print head is made into a slight negative pressure by reducing the pressure of the sub tank (see, for example, JP-A-2004-284207 and JP-A-2006-62330).
In the ink supply device of the aforementioned type, for example, a pressure control means communicating with the ink chamber of the sub tank is provided. The pressure control means reduces the inner pressure of the ink chamber by sucking air from the inside of the ink chamber and, on the other hand, increases the inner pressure of the ink chamber by forcing air into the ink chamber, thereby conducting the pressure control of the ink chamber. For this, the pressure control means is attached to an upper portion of the sub tank to prevent the ink from being sucked through an ink chamber-side opening of the pressure control means, i.e. to prevent the backflow of the ink. The pressure control means also controls the ink supply in such a manner as to prevent the ink from the main tank from being supplied to excess a predetermined upper limit in the ink chamber by detecting the level of the ink in the ink chamber.
However, even with the structure as mentioned above, there may be a case that the ink is undesirably supplied to excess the predetermined upper limit in the ink chamber. That is, if such a situation that the normal detection of the level of the ink in the ink chamber is impossible is brought, it is difficult to control the ink supply into the ink chamber based on the correct detection of the level of the ink. There is a problem that, when the ink is supplied over the predetermined upper limit like the above case, the excessively supplied ink may be sucked by the pressure control means and thus backflow occurs.

Inkjet printer system and ink supply apparatus


A semiconductor light-emitting device includes a support body multiple, multiple light-emitting elements arranged in a matrix on the support body, a transparent resin layer provided on the light-emitting elements, multiple transparent plates provided on the transparent resin layer, each of the transparent plates being provided over one of the multiple light-emitting elements, and multiple optical shield layers each provided at one of a first side face of a first one of the transparent plates and a second the face of a second one of the transparent plates opposing the first the face of the first transparent plate.

Field
The presently disclosed subject matter relates to a semiconductor light-emitting device having multiple light-emitting elements such as light-emitting diode (LED) elements arranged in a matrix.
Description of the Related Art
Generally, a semiconductor light-emitting device formed by LED elements arranged in a matrix including rows and columns has been used as a vehicle headlamp. In such a semiconductor light-emitting device, luminous intensities of the LED elements are individually controlled in real time to realize an adaptive drive beam (ADB) and an adaptive front-lighting system (AFS) (see: JP2013-54849A & JP2013-54956A).
In an ADB control, when a preceding vehicle including an oncoming vehicle is detected by a radar unit or the like, the luminous intensities of only the LED elements facing toward the preceding vehicle are decreased to decrease the illuminance toward the preceding vehicle while a high-beam mode is maintained. As a result, glare toward the preceding vehicle can be suppressed while the visibility in a high-beam mode can be maintained toward the preceding vehicle.
In an AFS control, when a steering angle read from a steering angle sensor or the like is larger than a predetermined value, the LED elements having high luminous intensities are shifted from a central area of the device to a right side or a left side of the device, to substantially decline the optical axis of the device while the visibility in a high-beam mode is maintained.
FIG. 1A is a plan view illustrating a first prior art semiconductor light-emitting device, as the above-mentioned device and FIG. 1B is a cross-sectional view taken along the line B-B in FIG. 1A. As illustrated in FIGS. 1A and 1B, this semiconductor light-emitting device includes a semiconductor wafer (body) 1 in which blue LED elements D11, D12, . . . , and D33 in three rows, three columns are formed. Also, a wavelength-converting layer 3 including a transparent resin layer 31 having yitrium aluminium garnet Y2Al5O12:Ce3+ (YAG) particles for wavelength-converting blue light into yellow light to form white light and barium-titanium-based particulate spacers 32 is formed on the LED elements D11, D12, . . . , and D33. Further, a support body 2 is provided to support the semiconductor body 1. In this case, the semiconductor body 1 is wafer-bonded onto the support body 2. This device further includes a transparent plate 4 to make the wavelength-converting layer 3 uniform.
Note that each of the LED elements D11, D12, . . . , and D33 is square or rectangular viewed from the top, so that the LED elements D11, D12, . . . , and D33 can be in close proximity to each other.
In the first prior art semiconductor light-emitting device of FIGS. 1A and 1B, since there are still relatively large spaces between the LED elements D11, D12, . . . , and D33, even when the LED elements D11, D12, and D33 are operated to emit lights L11, L12, . . . , and L33, respectively, as illustrated in FIG. 2A, dark regions DR forming a dark grid would be created at the spaces. As a result, as illustrated in FIG. 2B, light emitting regions ER21 and ER22 of the LED elements D21 and D22 would be decreased. In this case, the larger the spacing between the LED elements D11, D12, . . . , and D33, the larger the dark regions DR.
On the other hand, when the LED elements D11, D12, . . . , D33 are closer to each other as illustrated in FIGS. 3A and 3B, the dark regions DR would be reduced in size to increase the light emitting regions ER21 and ER22. In this case, however, when the LED elements D11, D12, D13, D21, D23, D31, D32, and D33 except for the LED element D22 are operated to emit lights L11, L12, L13, L21, L23, L31, L32, and L33, leakage lights LL would be leaked into the non-operated LED element D22 from its adjacent operated LED elements. Therefore, weak light would be emitted from the non-operated LED element D22, so that optical crosstalk would be generated between the non-operated LED element and its adjacent operated LED elements.
Thus, in the first prior art semiconductor light-emitting device of FIGS. 1A and 1B, it is preferable that both of the dark regions DR and the optical crosstalk be as small as possible; however, there is a tradeoff relationship between the dark regions DR and the optical crosstalk.
A second prior art semiconductor light-emitting device includes multiple light-emitting elements each with one wavelength-converting layer thereon on a support body, a grid-shaped optical shield wall for separating the multiple light-emitting elements from each other, multiple transparent plates each provided on one of the multiple light-emitting elements, and a grid-type optical shield frame for separating the transparent plates from each other (see: JP2013-187371A). Thus, both of the dark regions and the optical crosstalk can be decreased by the grid-shaped optical shield frame.
In the above-described second prior art semiconductor light-emitting device, however, since the thickness of the walls of the grid-type optical shield frame is actually very large, i.e., several tens of μ m, the dark regions are still very large. Also, the presence of the grid-shaped optical shield frame would increase the manufacturing cost.
A third prior art semiconductor light-emitting device includes multiple light-emitting elements on a support body, a grid-shaped optical shield frame having throughholes corresponding to the light-emitting elements on the support body, and multiple wavelength-converting filter plates each provided in one of the throughholes over one of the light-emitting elements (see: JP2009-134965A). Thus, both of the dark regions and the optical crosstalk can be decreased by the grid-shaped optical shield frame.
In the above-described third prior art semiconductor light-emitting device, however, since the thickness of the walls of the grid-shaped shield frame is actually very large, the dark portions are still very large. Also, the presence of the grid-shaped optical shield frame would increase the manufacturing cost.

Semiconductor light-emitting device having matrix-arranged light-emitting elements and transparent plates


Compositions and methods for making nanostructures and nanowires on substrates, including but not limited to metal-semiconductor nanostructures and semiconductor nanowires on semiconductor substrates. Particularly described are methods for making cobalt silicide nanostructures on silicon substrates and for making silicon nanowires on silicon substrates using cobalt nanoparticles. Nanogrooves and methods of making nanogrooves. Methods of making silanes.

With the advent of new nanotechnology techniques over the past few years, it is becoming possible to produce materials with nanoscale features that have new and useful optical, electronic, and other properties. For example, nanoscale structures embedded on the surface of a semiconductor or other substrate and made of a material different from the substrate may be useful in a variety of applications including as contacts, interconnects, and gates in nanoelectronics integrated circuit technology; in the formation of advanced transistors from conductive and semiconductor nanostructures; as sensors, especially high temperature sensors; as nanoscale templates for building other nanostructures; as photoluminescent devices; as infrared detectors; as a method of examining crystalline wafers; in the nanofabrication of high density nanostructures of high aspect ratios; as patterned nanostructure catalysts and photocatalysts; as field emission display panels; and for generating optical harmonics from the nanostructures. It is also becoming possible to make other nanoscale structures such as nanowires that may be useful in a variety of applications including as infrared detectors; photoluminescent devices; and patterned detectors and emitter arrays.
Currently, two general methods can be used to make nanostructures on crystalline substrates.
The first method deposits atoms on a substrate and allows them to react with the substrate to make lines of one-atom width. This method is extremely difficult to perform because individual atoms have to be deposited onto the surface. Therefore, the location of those atomic lines is difficult to control. More importantly, the structures so produced are limited in their width and may not possess the required properties, such as being electrical conductors. It is also impossible to form multiple component crystalline wires because the width is only one atom wide.
A second method employs thin film deposition (one-step or multiple-step deposition (Dass et al., 1991 APL), and high energy ion implantation (White et al. 1987 APL)) followed by heating (laser (Tung et al. 1983 APL) or other methods of heating). Depending on the thickness of the films deposited on the substrate, either small particles are formed and then converted into metal silicides (when the substrate is silicon) or the thin films are directly converted into metal silicide films (when the substrate is silicon). Lithography is then used to make micro-structures. There are several drawbacks associate with these thin film methods. First, the location of the structures produced is random, depending on where and how the thin films are broken. For example, thin films may break down into particles of different sizes, which may lead to the production of differently sized structures. Since the average size of thin films determines the structures produced subsequently, extremely thin films are needed to make nanometer sized structures. Second, thin film deposition is usually preformed in high vacuum, making it difficult to operate and more costly. Third, the width of lithographically produced nanostructures is more than tens of nanometers, too large for future nanoelectronics.
These existing methods of making nanostructures have substantial drawbacks in making nanostructures useful in the applications listed above and there is a need for methods of producing nanostructures that are capable of accurately controlling the size and morphology of the nanostructures, producing nanostructures of a variety of sizes, and working without the use of high vacuum.
Several methods have been developed to make nanowires, particularly Si nanowires, and most of them need to provide Si in the gas phase, normally in the form of silane (SiH4). Yan et al. (Jour of Crystal Growth, Vol 257, p69 (2003)) reported the growth of thick (100-200 nm diameter.), short, and straight Si nanowires from H2, SiH4, and Au—Pd alloy films deposited on Si wafers. Hu et al. (Chem. Phys. Lett. Vol 378, p299 (2003)) use high temperature furnace (1350 C) to evaporate Si to form Si nanowires (20-1000 nm in diameter.). Laser ablation of silicon at high temperature furnace (1200 C) has also been used by Tang et al. (J. Vac. Sci. Technol. B 19(1), p317 (2001)) and of silicon and metals by Morales et al. However, the nanowires by laser ablation are highly curved. Silane and Ti catalysts have been used to make Si nanowires by Kamins et al. (Appl. Phys. Lett., Vol 82, p263 (2003)). Au nanoparticles and diphenylsilane are used by Holmes et al. to make Si nanowires (Science, Vol 287, p1471 (2000)). In other cases (e.g. Kim et al. Chem Commun, p256 (2003)), low melting solids such as Ga have been used together with Si substrate and H2 to induce the growth of Si nanowires. Although no silanes are used, this method lacks the control over the locations of the nanowire growth.
These existing methods of making nanowire have substantial drawbacks in making nanowires useful in the applications listed above and there is a need for methods of producing nanowires, particularly Si nanowires, that eliminate the use of silanes and provides control over the location of the growth, and the size and homogeneity of the nanowires grown.

Nanostructures, nanogrooves, and nanowires

The Regents of the University of California