A method is provided for generating mask data that is used for forming dummy convex regions in a specified pattern in a trench isolation region in a semiconductor device. Mask and computer readable recording medium are also provided. The method includes the steps of (a) setting a restriction region pattern 262 that defines a restriction region 40 in a semiconductor substrate, (b) setting dummy patterns 310 that define dummy convex regions 32, and (c) mixing the restriction region pattern 262 and the dummy patterns 310, wherein the dummy patterns 310 that at least partially overlap the restriction region pattern 262 are entirely excluded.

1. Field of the Invention
The present invention relates to a method for generating mask data, a mask, a computer readable recording medium, and more particularly a method for generating mask data, a mask, a computer readable recording medium, for forming trench isolation regions.
2. Description of Related Art
With the miniaturization of semiconductor devices (for example, MOS transistors) promoted in recent years, a further miniaturization of element isolation regions in semiconductor devices is required. In order to achieve a further miniaturization of element isolation regions in semiconductor devices, a trench isolation technique has been introduced. In the trench isolation technique, trenches are provided between semiconductor elements in a semiconductor substrate, and a dielectric material is filled in the trenches to isolate the semiconductor elements from one another. One example of the element isolation technique will be described below.
FIGS. 18(a)-18(c) show in cross-section steps of forming trench isolation regions using a conventional trench isolation technique.
FIG. 18(a) shows a silicon substrate 110 having trenches 116, and a dielectric layer 121 formed over the silicon substrate 110. A polishing stopper layer 114 is formed over effective convex regions 130 of the silicon substrate 110. A pad layer 112 is interposed between the effective convex regions 130 and the polishing stopper layer 114.
As shown in FIG. 18(b), the dielectric layer 121 is planarized using the polishing stopper layer 114 as a stopper. The planarization of the dielectric layer 121 is performed by a chemical-mechanical polishing method (hereinafter referred to as a xe2x80x9cCMP methodxe2x80x9d).
Then, as shown in FIG. 18(c), the polishing stopper layer 114 is removed to thereby form trench dielectric layers 120, whereby trench isolation regions 124 are completed.
However, as shown in FIG. 18(b), a device design may require that plural effective convex regions 130 are closely formed in one area and an isolated effective convex region 130 is formed separated from such area. In this case, the following problems occur.
When the dielectric layer 121 is planarized by the CMP method, the polishing stopper layer 114 at the isolated effective convex region 130 may be excessively cut. On the other hand, the polishing stopper layer 114 on the densely formed effective convex regions 130 may not be cut enough as compared to the polishing stopper layer 114 at the isolated effective convex region 130. This phenomenon occurs because the polishing rate differs depending on pattern densities of the effective convex regions 130. In other words, a polishing pressure is concentrated on the polishing stopper layer 114 at the isolated effective convex region 130. As a result, the polishing rate at the isolated effective convex region 130 becomes greater than the polishing rate at the densely formed effective convex regions 130. Consequently, the polishing stopper layer 114 at the isolated effective convex region 130 is excessively polished.
When the polishing stopper layer 114 at the isolated effective convex region 130 is excessively polished, the thickness of the resultant trench dielectric layer 120 becomes irregular, as shown in FIG. 18(c). Also, the polishing stopper layer 114 cannot properly perform its function. Moreover, as the isolated effective convex region 130 is excessively polished, the polishing cloth warps, and erosion occurs in the polishing stopper layer 114 in the area where the effective convex regions 130 are densely formed. The erosion is a phenomenon in which a corner section 114a of the polishing stopper layer 114 is cut. Also, when the polishing cloth warps, dishing occurs in an upper portion of the dielectric layer 121. The dishing is a phenomenon in which an upper portion of the dielectric layer 121 is formed in a dish shape.
In order to solve the problems described above, one technique, in which dummy convex regions 132 are formed in the trench 116, as shown in FIG. 19, is proposed. By the provision of the dummy convex regions 132, the polishing pressure is distributed on the dummy convex regions 132. Accordingly, the concentration of the polishing pressure on the isolated effective convex region 130 is prevented, and the polishing rate at the same region does not become excessively greater. Consequently, by the provision of the dummy convex regions 132, the isolated effective convex region 130 is prevented from being excessively cut.
The technique for forming the dummy convex regions 132 is described in Japanese laid-open patent application HEI 9-107028, Japanese laid-open patent application HEI 9-181159, Japanese laid-open patent application HEI 10-92921, Japanese laid-open patent application HEI 11-26576, U.S. Pat. No. 5,885,856 and U.S. Pat. No. 5,902,752.
It is an object of the present invention to provide a method for generating mask data, a mask, and a computer readable recording medium, which are used for forming dummy convex regions in a specified pattern in a trench isolation region.
(A) In accordance with a first embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device. The semiconductor device has a trench isolation region, provided in a semiconductor substrate, defining a row direction and first virtual linear lines extending in a direction that traverses the row direction, and a plurality of dummy convex regions provided in the trench isolation region, wherein the row direction and the first virtual linear lines define an angle of 2 to 40 degrees, and the dummy convex regions are disposed on the first virtual linear lines. The method may include the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9crow directionxe2x80x9d used here refers to one direction that is virtually defined in consideration of, for example, a restriction region.
In accordance with the present invention, for example, the following two effects are achieved.
(1) In accordance with the first embodiment of the present invention, the dummy patterns are set such that the dummy convex regions are disposed on the first virtual linear lines. The row direction and the first virtual linear lines define an angle of 2 to 40 degrees. In other words, the dummy patterns are set such that adjacent ones of the dummy convex regions formed on the first virtual linear lines and disposed next to one another in the row direction are mutually offset in a column direction. Accordingly, the adjacent dummy patterns disposed in the row direction are mutually offset in the column direction. As a result, in step (c), the dummy patterns can be readily set at a high level of density in an area adjacent to a restriction region pattern that extends in the row direction. In other words, even when some of the dummy patterns overlap the restriction region pattern, the other dummy patterns are securely generated in an area adjacent to the restriction region pattern. As a consequence, dummy patterns can be securely provided in a region where a gap between adjacent restriction region patterns is narrow. As a result, the following effects are achieved.
When dummy convex regions are formed in a trench, the dummy convex regions can be securely disposed in an area adjacent to the restriction regions. As a consequence, when the dielectric layer filled in the trench is polished, the polishing pressure is securely distributed on the dummy convex regions adjacent to the restriction region.
(2) Also, in accordance with the present invention, the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded. As a result, the generation of pattern skipping of dummy convex regions or scratches during polishing of the dielectric layer can be securely prevented, as described below in detail.
The first virtual linear lines may preferably be spaced a specified gap from one another. In one embodiment, the gap may preferably be 1-16 xcexcm.
A center of each of the dummy convex regions may preferably be located on each of the first virtual linear lines.
(B) In accordance with a second embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device, the semiconductor device comprising a trench isolation region, provided in a semiconductor substrate, defining a column direction and second virtual linear lines extending in a direction that traverses the column direction, and a plurality of dummy convex regions provided in the trench isolation region, wherein the column direction and the second virtual linear lines define an angle of 2 to 40 degrees, and the dummy convex regions are disposed on the second virtual linear lines. The method may include the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9ccolumn directionxe2x80x9d used here refers to one direction that perpendicularly traverses the row direction and is virtually defined in consideration of, for example, a restriction region.
In accordance with the present invention, for example, the following two effects are achieved.
(1) In accordance with the second embodiment of the present invention, the dummy patterns are set such that the dummy convex regions are disposed on the second virtual linear lines. The column direction and the second virtual linear lines define an angle of 2 to 40 degrees. In other words, the dummy patterns are set such that adjacent ones of the dummy convex regions formed on the second virtual linear lines and disposed next to one another in the column direction are mutually offset in the row direction. Accordingly, the adjacent dummy patterns disposed in the column direction are mutually offset in the row direction. As a result, in step (c), the dummy patterns can be readily set at a high level of density in an area adjacent to a restriction region pattern that extends in the column direction. In other words, even when some of the dummy patterns overlap the restriction region pattern, the other dummy patterns are securely generated in an area adjacent to the restriction region pattern. As a consequence, dummy patterns can be securely provided in a region where a gap between adjacent restriction region patterns is narrow. As a result, the effect (1) described above in conjunction with the method for generating mask data of the first embodiment can be achieved.
(2) In accordance with the second embodiment of the present invention, the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded. As a result, the effect (2) described above in conjunction with the method for generating mask data of the first embodiment can be achieved.
Also, the method for generating mask data in accordance with the first embodiment and the method for generating mask data in accordance with the second embodiment may be combined. By the method for generating mask data in accordance with the combined embodiments, dummy convex regions can be more securely formed in areas adjacent to restriction regions.
In the method for generating mask data in accordance with the second embodiment of the present invention, the second virtual linear lines may preferably be spaced a specified gap from one another. The gap may preferably be 1-16 xcexcm.
A center of each of the dummy convex regions may preferably be located on each of the second virtual linear lines.
In the method for generating mask data in accordance with the first embodiment or the second embodiment, the dummy convex regions may be formed in any one of the following manners:
(1) A plan area of the dummy convex regions is about 30-50% of a plan area of the trench isolation region. As a result, the polishing pressure can be effectively distributed on the dummy convex regions. In a preferred embodiment, the plan area of the dummy convex regions may be 40% of the plan area of the trench isolation region.
(2) Each of the dummy convex regions may have a generally rectangular shape in plan view. In other words, when the trench region formed in the silicon substrate is viewed from above, each of the dummy convex regions may have a generally rectangular shape. The formation of a dummy convex region in a generally rectangular shape is relatively easy. Preferably, each of the dummy convex regions may have a generally square shape. By forming the dummy convex regions in a generally square shape, the dummy convex regions can be more densely formed. For example, the dummy convex regions can be more securely formed in an area adjacent to a cross point where restriction regions cross one another. As a result, the dummy convex regions can be more effectively formed in an area adjacent to a restriction region with a complex pattern (for example, a prohibited area around a gate region that is formed with a complex pattern).
(3) When each of the dummy convex regions has a rectangular shape in plan (i.e., as viewed from above), adjacent ones of the dummy convex regions disposed on the first virtual linear line or adjacent ones of the dummy convex regions disposed on the second virtual linear line have sides that partially oppose to one another as viewed from above. In a preferred embodiment, the sides of the adjacent ones of the dummy convex regions are spaced a distance from one another, wherein the distance may preferably be shorter than each of the sides of each of the dummy convex regions. Preferably, the distance between the sides may be about 0.5-5 xcexcm. More preferably, the distance between the sides may be about 1 xcexcm.
(4) When the plan configuration of each of the dummy convex regions is rectangular, each side of each of the dummy convex regions may preferably have a length of 1 xcexcm or greater. When each side of each of the dummy convex regions is 1 xcexcm long or greater, the amount of data for generating masks which is used to form the dummy convex regions does not substantially increase.
In a preferred embodiment, each side of each of the dummy convex regions has a length of 10 xcexcm or shorter. In a more preferred embodiment, each side of each of the dummy convex regions has a length of 5 xcexcm or shorter. When each side of each of the dummy convex regions is 5 xcexcm long or shorter, a dielectric layer deposited over the dummy convex regions is prevented from getting thicker when the dielectric layer is embedded in the trench. Accordingly, the dummy convex regions having sides that have a length of 5 xcexcm or shorter are particularly preferable when a dielectric layer is embedded in a trench using a high-density plasma CVD.
In a more preferred embodiment, each side of each of the dummy convex regions has a length of about 2 xcexcm.
(C) In accordance with a third embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device. The semiconductor device has a trench isolation region, provided in a semiconductor substrate, defining a row direction and a column direction and a plurality of dummy convex regions in the trench isolation region disposed in the row direction and the column direction. Each of the dummy convex regions has a generally square shape in plan. The dummy convex regions that are disposed in the row direction are spaced a first distance from one another, the first distance being about a half of a side of each of the dummy convex regions. The dummy convex regions that are disposed in the row direction are offset by a second distance from one another in the column direction, the second distance being about a half of a side of each of the dummy convex regions. The method may include the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9crow directionxe2x80x9d and the xe2x80x9ccolumn directionxe2x80x9d may be defined in a similar manner as the first and second embodiments.
In accordance with the third embodiment of the present invention, the adjacent dummy patterns disposed in the row direction are mutually offset in the column direction. As a result, the method for generating mask data in accordance with the third embodiment of the present invention provides the same effects achieved by the method for generating mask data in accordance with the first embodiment of the present invention.
(D) In accordance with a third embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device. The semiconductor device comprising a trench isolation region, provided in a semiconductor substrate, defining a row direction and a column direction and a plurality of dummy convex regions in the trench isolation region disposed in the row direction and the column direction, wherein each of the dummy convex regions has a generally square shape in plan, the dummy convex regions that are disposed in the column direction are spaced a first distance from one another, the first distance being about a half of a side of each of the dummy convex regions, and the dummy convex regions that are disposed in the column direction are offset by a second distance from one another in the row direction, the second distance being about a half of a side of each of the dummy convex regions. The method may include the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9crow directionxe2x80x9d and the xe2x80x9ccolumn directionxe2x80x9d may be defined in a similar manner as the first and second embodiments.
In accordance with the fourth embodiment of the present invention, the adjacent dummy patterns disposed in the column direction are mutually offset in the row direction. As a result, the method for generating mask data in accordance with the fourth embodiment of the present invention provides the same effects achieved by the method for generating mask data in accordance with the second embodiment of the present invention.
Also, the method for generating mask data in accordance with the third embodiment and the method for generating mask data in accordance with the fourth embodiment may be combined. By the method for generating mask data in accordance with the combined embodiments, dummy convex regions can be more securely formed in areas adjacent to restriction regions.
In the semiconductor device manufactured by the method in accordance with the third embodiment or the fourth embodiment, each side of each of the dummy convex regions may preferably have a length of about 2 xcexcm.
In any one of the methods for generating mask data in accordance with the first through fourth embodiments of the present invention, the restriction region includes, for example, an effective region and a prohibited area. The effective region may include, for example, an active region, a gate region, a well region formed to function as a resistance and a boundary region between an n-well and a p-well.
(E) In accordance with a fifth embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device. The semiconductor device has a trench isolation region provided in a semiconductor substrate and a plurality of dummy convex regions provided in the trench isolation region. The method may include the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions, and defining a row direction and first virtual linear lines extending in a direction that traverses the row direction, wherein the row direction and the first virtual linear lines define an angle of 2 to 40 degrees, and the dummy convex regions are disposed on the first virtual linear lines; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9crow directionxe2x80x9d used here refers to one direction that is virtually defined in consideration of, for example, a restriction region pattern.
In accordance with the fifth embodiment of the present invention, the dummy patterns are formed to be disposed on the first virtual linear lines. The row direction and the first virtual linear lines define an angle of 2 to 40 degrees. In other words, adjacent ones of the dummy patterns that are formed on the same first virtual linear line and disposed in the row direction are mutually offset in a column direction. As a result, the dummy patterns can be readily disposed at a high level of density in an area adjacent to the restriction region pattern that extends in the row direction. In other words, even when some of the dummy patterns overlap the restriction region pattern, the other dummy patterns in an area adjacent to the restriction region pattern are securely disposed. As a consequence, the dummy convex regions can be securely formed in a region adjacent to the restriction region. As a result, polishing pressure can be securely distributed on the dummy convex regions adjacent to the restriction regions when the dielectric layer filled in the trench is polished. Also, since the dummy patterns can be securely disposed in an area adjacent to the restriction regions, the dummy patterns can also be securely provided in a region where a gap between the adjacent restriction region patterns is narrow.
Also, the fifth embodiment of the present invention can achieve the effect (2) that is obtained by the method for generating mask data in accordance with the first embodiment.
(F) In accordance with a sixth embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device. The semiconductor device has a trench isolation region provided in a semiconductor substrate and a plurality of dummy convex regions provided in the trench isolation region. The method may include the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions, and defining a column direction and second virtual linear lines extending in a direction that traverses the column direction, wherein the column direction and the second virtual linear lines define an angle of 2 to 40 degrees, and the dummy convex regions are disposed on the second virtual linear lines; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9ccolumn directionxe2x80x9d used here refers to one direction that perpendicularly traverses the row direction and is virtually defined in consideration of, for example, a restriction region.
In accordance with the sixth embodiment of the present invention, the dummy patterns are formed to be disposed on the second virtual linear lines. The column direction and the second virtual linear lines define an angle of 2 to 40 degrees. In other words, adjacent ones of the dummy patterns that are formed on the same second virtual linear line and disposed in the column direction are mutually offset in the row direction. As a result, the dummy patterns can be readily disposed at a high level of density in an area adjacent to the restriction region pattern that extends in the column direction. In other words, even when some of the dummy patterns overlap the restriction region pattern, the other dummy patterns in an area adjacent to the restriction region pattern are securely disposed. As a consequence, the dummy convex regions can be securely formed in a region adjacent to the restriction region. As a result, the dummy convex regions can be securely formed in an area adjacent to the restriction regions. As a consequence, when the dielectric layer filled in the trench is polished, the polishing pressure is securely distributed on the dummy convex regions adjacent to the restriction regions.
Also, since the dummy patterns can be securely disposed in an area adjacent to the restriction regions, the dummy patterns can also be securely provided in a region where a gap between the adjacent restriction region patterns is narrow.
Also, the sixth embodiment of the present invention can achieve the effect (2) that is achieved by the method for generating mask data in accordance with the first embodiment.
Also, the method for generating mask data in accordance with the fifth embodiment and the method for generating mask data in accordance with the sixth embodiment may be combined. By the method for generating mask data in accordance with the combined embodiments, dummy patterns can be more securely formed in areas adjacent to restriction region patterns.
(G) In accordance with a seventh embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device, wherein the semiconductor device has a trench isolation region provided in a semiconductor substrate defining a row direction and a column direction and a plurality of dummy convex regions in the trench isolation region disposed in the row direction and the column direction. Placement of the plurality of dummy convex regions may be determined by a method including the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions, wherein each of the dummy convex regions has a generally square shape in plan, the dummy convex regions that are disposed in the row direction are spaced a first distance from one another, the first distance being about a half of a side of each of the dummy convex regions, and the dummy convex regions that are disposed in the row direction are offset by a second distance from one another in the column direction, the second distance being about a half of a side of each of the dummy convex regions; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9crow directionxe2x80x9d and the xe2x80x9ccolumn directionxe2x80x9d may be defined in a similar manner as the fifth and sixth embodiments.
In accordance with the seventh embodiment of the present invention, the adjacent dummy patterns disposed in the row direction are mutually offset in the column direction. As a result, the method for generating mask data in accordance with the seventh embodiment of the present invention provides the same effects achieved by the method for generating mask data in accordance with the fifth embodiment of the present invention.
(H) In accordance with an eighth embodiment of the present invention, a method is provided for generating mask data that is used for a manufacturing method for a semiconductor device, wherein the semiconductor device has a trench isolation region provided in a semiconductor substrate defining a row direction and a column direction and a plurality of dummy convex regions in the trench isolation region disposed in the row direction and the column direction. Placement of the plurality of dummy convex regions may be determined by a method including the steps of:
(a) setting a restriction region pattern that defines a restriction region;
(b) setting dummy patterns that define the dummy convex regions, wherein each of the dummy convex regions has a generally square shape in plan, the dummy convex regions that are disposed in the column direction are spaced a first distance from one another, the first distance being about a half of a side of each of the dummy convex regions, and the dummy convex regions that are disposed in the column direction are offset by a second distance from one another in the row direction, the second distance being about a half of a side of each of the dummy convex regions; and
(c) mixing the restriction region pattern and the dummy patterns, wherein the dummy patterns that at least partially overlap the restriction region pattern are entirely excluded.
The xe2x80x9crow directionxe2x80x9d and the xe2x80x9ccolumn directionxe2x80x9d may be defined in a similar manner as the fifth and sixth embodiments.
In accordance with the eighth embodiment of the present invention, the adjacent dummy patterns disposed in the same column direction are mutually offset in the row direction. As a result, the method for generating mask data in accordance with the eighth embodiment of the present invention provides the same effects achieved by the method for generating mask data in accordance with the sixth embodiment of the present invention.
Also, the method for generating mask data in accordance with the seventh embodiment and the method for generating mask data in accordance with the eighth embodiment may be combined. By the method for generating mask data in accordance with the combined embodiments, dummy patterns can be more securely formed in areas adjacent to restriction region patterns.
The method for generating mask data in accordance with any one of the fifth embodiment through the eighth embodiment may have any one of the following embodiments:
The restriction region includes an effective region and a prohibited area provided around the effective region, and the step (a) includes the steps of (a-1) setting an effective region pattern that defines the effective region and (a-2) setting a prohibited area pattern that defines the prohibited area about the effective region pattern.
The effective region may include an active region pattern, a gate region pattern, an impurity diffusion region pattern formed to function as a resistance and a boundary region pattern between an n-well and a p-well.
The method may further include, before step (c), step (d) of reversing the restriction region pattern. By the inclusion of step (d), the restriction region pattern and the dummy patterns can be easily mixed.
A mask in accordance with one embodiment of the present invention can be formed by the method for generating mask data described above.
By the use of the mask in accordance with the present invention in a method for manufacturing a semiconductor device, dummy convex regions can be securely formed in an area adjacent to restriction regions.
A computer readable recording medium in accordance with the present invention stores mask data obtained by the method for generating mask data according to any one of the embodiments described above.
A mask of the present invention can be formed based on the data stored in the computer readable recording medium in accordance with the present invention.
Other features and advantages of the invention will be apparent from the following detailed description, taken in conjunction with the accompanying drawings that illustrate, by way of example, various features of embodiments of the invention.

Method for generating mask data, mask and computer readable recording media


A nerve electrode array includes one or more Y-shaped carriers in which the three legs of the Y are curled about a common axis with the lower leg of the Y oppositely directed relative to the other two so that the legs will encircle a nerve substantially sharing the common axis, and a flexible electrode secured to the underside of at least one of the legs.

The present invention relates generally to nerve electrodes, and more particularly to a claw-like electrode assembly or array which is implemented for ease of implantation on and electrical stimulation of a nerve of the patient.
U.S. Pat. No. 4,573,481 ("the '481 patent") discloses an implantable helical electrode assembly in which the configuration is composed of one or more flexible ribbon electrodes each partially embedded in a portion of the peripheral surface of a helically formed dielectric support matrix adapted to be threaded around a selected nerve or nerve bundle during surgical implantation of the electrode assembly. The resiliency of the assembly allows it to expand in the event of swelling of the nerve. The electrode assembly is utilized to electrically trigger or measure an action potential or to block conduction in nerve tissue.
Such a helical electrode has been found somewhat difficult to mount on the patient's nerve during implantation, because it is necessary to unravel the helical configuration and then reform it about the nerve. An improvement over the '481 patent electrode design is disclosed in U.S. Pat. No. 4,920,979 to the same inventor, in which a flexible electrode-supporting matrix has two oppositely directed helical portions which are centrally joined and have free outer ends. The helical portions extend circumferentially at least one turn and up to as much as about two turns. A thin, flexible conductive ribbon is secured to the inner surface to provide multiple electrodes on one or both portions, with a connecting electrical cable to couple the electrode array to an electronics package implanted elsewhere in the body.
The central passage through the two oppositely directed helical portions accommodates a pair of pins which extend at an acute angle from the respective closed legs of a tweezer-like installation tool. When the pins are inserted through the central passage and the legs of the tweezers are opened, the helical portions are distorted and spread open so that the assembly can be slipped over the nerve with the two open-sided portions restrained in a direction generally perpendicular to the length of the nerve. When released by withdrawing the pins of the installation tool, the two end portions return to a helical shape to encircle the nerve with their electrode portions conductively contacting the nerve surface. This type of electrode assembly simplifies installation of the electrode and reduces trauma to the nerve during implantation.
In U.S. patent application Ser. No. 07/695,543 filed May 3, 1991 ("the '543 application"), assigned to the same assignee as is the instant application, another improved helical nerve electrode or electrode array is disclosed. In this invention, the helix is locked together by a backbone which may be one-piece or divided into multiple segments. The electrode array is cut lengthwise through the entire helix at the side diametrically opposite to the backbone. The array is then spreadable at the cut ends of each loop, either one at a time or all together, and either manually or using an appropriate tool, to place it properly over the nerve. The array may then be allowed to collapse, as a consequence of its resiliency, into its unrestrained normal helical configuration about the nerve.
This provides the desirable features of a conventional helical electrode array, but with an improved configuration which allows it be opened in a manner similar to a clamshell when desired to install it on or remove it from the nerve. The array is relatively simple to install and unlikely to cause serious trauma to the nerve during or after implantation. In the latter respect, any subsequent swelling of the nerve is not restricted by the electrode. Some resistance to expansion may be experienced with a closed helical electrode array of the type described in the '481 patent, because of the tendency of the central portion of such a helix to resist expansion as the helix is subjected to outwardly directed radial forces.
In an alternative configuration of the electrode array of the '543 application, the cut in each loop or band of the helix is staggered relative to the cuts in the other bands to assure that the electrode array does not slip or otherwise become displaced from the nerve in the usual event of swelling of the nerve following the surgical implantation. Such swelling is likely to occur before stabilization, in the first few days following implantation of the electrode array. Fibrotic growth occurs and tends to retain everything in place after the first week to ten days following the surgery.
The nerve electrode array of the '543 application is made by forming an electrically insulative helix having a plurality of bands linked together by a lengthwise member, securing a electrically conductive strip to the underside of one of the bands and across the linking member, and severing each of the bands at a point away from the linking member so that each band remains linked to the member and may be spread open for mounting about the nerve.
It is a principal object of the present invention to provide an improved electrode or electrode array for nerve stimulation which is configured to permit relative ease of implantation and yet secure retention on a nerve compared to the prior art nerve electrodes.
Another object of the invention is to provide an improved nerve electrode which is simple to manufacture and simple to install without need for any special installation tool.

Electrode assembly for nerve stimulation


The present invention includes lithium cobalt oxides having hexagonal layered crystal structures and methods of making same. The lithium cobalt oxides of the invention have the formula LiwCo1xe2x88x92xAxO2+y wherein 0.96xe2x89xa6wxe2x89xa61.05, 0xe2x89xa6xxe2x89xa60.05, xe2x88x920.02xe2x89xa6yxe2x89xa60.02 and A is one or more dopants. The lithium cobalt oxides of the invention preferably have a position within the principal component space defined by the relationship axi+byixe2x89xa6c, wherein xi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c1; yi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c2; the vector {right arrow over (S)}i is the x-ray spectrum for the LiwCo1xe2x88x92xAxO2+y compound; the vectors {right arrow over (P)}c1 and {right arrow over (P)}c2 defining the principal component space are determined by measuring the x-ray powder diffraction values {right arrow over (S)}i between 15xc2x0 and 120xc2x0 using a 0.02xc2x0 step size and CuKxcex1 rays for a large sample set of lithium cobalt oxides and using the regression of {right arrow over (S)}i of the sample set against the capacity fade after 50 cycles of a lithium coin cell that includes a lithium negative electrode and the lithium cobalt oxide as the positive electrode material and that is cycled between 3.0 and 4.3V at a constant current of C/3 during both charge and discharge cycles; and the values a, b and c are determined by using only the xi and yi values for LiwCo1xe2x88x92xAxO2+y compounds in the sample set that have a capacity fade after 50 cycles of less than or equal to 15%.

The present invention relates to lithium cobalt oxides for use as positive electrode materials for rechargeable lithium and lithium-ion secondary batteries, and to methods of making lithium cobalt oxides.
LiCoO2 is currently being used in over 95% of commercial lithium and lithium-ion secondary batteries as the active positive electrode material. The current production rate of lithium and lithium-ion batteries is about 30 million units per month with each unit containing about 10-15 g of LiCoO2 (i.e., 300-450 metric tons/month).
LiCoO2 can be made by a number of different methods by reacting a lithium salt and a cobalt salt. However, these methods often involve lengthy reaction times thereby reducing the rate of LiCoO2 production.
Therefore, there is a need in the art to provide a method of preparing LiCoO2 that demonstrates good performance in rechargeable lithium and lithium-ion secondary batteries and that can be produced with a relatively short reaction time.
The present invention includes lithium cobalt oxides having hexagonal layered crystal structures and methods of making same. The lithium cobalt oxides of the invention have the formula LiwCo1xe2x88x92xAxO2+y wherein 0.96xe2x89xa6wxe2x89xa61.05, 0xe2x89xa6xxe2x89xa60.05, xe2x88x920.02xe2x89xa6yxe2x89xa60.02 and A is one or more dopants. Preferably, 0.98xe2x89xa6wxe2x89xa61.02 and 0xe2x89xa6xxe2x89xa60.02.
The lithium cobalt oxides of the invention preferably have a position within the principal component space defined by the following relationship:
axi+byixe2x89xa6c
wherein xi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c1; yi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c2; the vector {right arrow over (S)}i is the x-ray spectrum for the LiwCo1xe2x88x92xAxO2+y compound; the vectors {right arrow over (P)}c1 and {right arrow over (P)}c2 are determined by measuring the x-ray powder diffraction values {right arrow over (S)}i between 15xc2x0 and 120xc2x0 using a 0.020 step size and CuKxcex1 rays for a large sample set of lithium cobalt oxides and using the regression of {right arrow over (S)}i of the sample set against the capacity fade after 50 cycles of a lithium coin cell that includes a lithium negative electrode and the lithium cobalt oxide as the positive electrode material and that is cycled between 3.0 and 4.3V at a constant current of C/3 during both charge and discharge cycles; and the values a, b and c are determined by using only the xi and yi values for LiwCo1xe2x88x92xAxO2+y compounds in the sample set that have a capacity fade after 50 cycles of less than or equal to 15%.
More preferably, the lithium cobalt oxides of the invention have a position within the principal component space defined by the following relationship:
xi+0.77yixe2x89xa6xe2x88x926
wherein xi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c1; yi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c2; {right arrow over (S)}i is the x-ray spectrum for the LiwCo1xe2x88x92xAxO2+y compound; and {right arrow over (P)}c1 and {right arrow over (P)}c2 are determined by measuring the x-ray powder diffraction values sh between 15xc2x0 and 120xc2x0 using a 0.020 step size and CuKxcex1 rays for a large sample set of lithium cobalt oxides and using the partial least squares regression (PLSR) of {right arrow over (S)}i of the sample set against the capacity fade after 50 cycles of a lithium coin cell that includes a lithium negative electrode and the lithium cobalt oxide as the positive electrode material and that is cycled between 3.0 and 4.3V at a constant current of C/3 during both charge and discharge cycles. For example, {right arrow over (P)}c1 and {right arrow over (P)}c2 can be defined by the coefficients provided in Table 1 (wherein 2xcex8 is the scattering angle of x-ray powder diffraction measurements using CuKxcex1 rays).
The lithium cobalt oxides of the invention can be used in the positive electrode of a rechargeable lithium or lithium-ion secondary battery in accordance with the invention. For the lithium cobalt oxides of the invention, the capacity fade of a lithium coin cell having a lithium negative electrode and using the lithium cobalt oxide as the positive electrode material when cycled between 3.0 and 4.3V at a constant current of C/3 during both charge and discharge cycles after 50 charge/discharge cycles is preferably less than or equal to 15%, more preferably less than or equal to 10%. Moreover, the initial specific discharge capacity is preferably greater than or equal to 154 mAh/g.
The lithium cobalt oxides of the invention are prepared by heating a lithium source compound, a cobalt source compound and optionally one or more source compounds that include dopants A at a temperature below about 850xc2x0 C. to produce LiwCo1xe2x88x92xAxO2+y and heating the LiwCo1xe2x88x92xAxO2+y compound at a temperature from about 900xc2x0 C. and 1000xc2x0 C. to form and enhance the hexagonal layered crystal structure of the LiwCo1xe2x88x92xAxO2+y compound. The temperature in the first heating step is preferably from about 500xc2x0 C. to about 850xc2x0 C. and the temperature in the second heating step is preferably from about 950xc2x0 C. to about 980xc2x0 C. The source compounds in the first heating step can be heated at more than one temperature below about 850xc2x0 C. In addition, the LiwCo1xe2x88x92xAxO2+y compound in the second heating step can be heated at more than one temperature from about 900xc2x0 C. to about 1000xc2x0 C. Preferably, the first heating step comprises heating the source compounds for a period of time of from about 30 minutes to about 3 hours and the second heating step comprises heating the source compounds for a period of time of from about 30 minutes to about 7 hours. The lithium source compound preferably used with the invention is selected from the group consisting of Li2CO3 and LiOH and the cobalt source compound is preferably selected from the group consisting of Co3O4 and Co(OH)2. The lithium cobalt oxide is preferably cooled after the heating steps at a rate of from 8xc2x0 C./min to 140xc2x0 C./min, more preferably from 10xc2x0 C./min to 100xc2x0 C./min.
The present invention further includes a method of analyzing a compound to determine if the compound is suitable for use as the active positive electrode material in a lithium or lithium-ion secondary battery. The method of the invention comprises determining a principal component space defined by the relationship axi+byixe2x89xa6c, wherein xi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c1; yi={right arrow over (S)}ixe2x97xaf{right arrow over (P)}c2; the vector {right arrow over (S)}i is the x-ray spectrum for the compound; the vectors {right arrow over (P)}c1 and {right arrow over (P)}c2 are determined by measuring the x-ray powder diffraction values {right arrow over (S)}i for a predetermined range of 2xcex8 values using a predetermined step size by sampling a plurality of samples of compounds having the same general formula as the compound and using the regression of {right arrow over (S)}i of the sample set against predetermined battery performance data for the samples by incorporating the samples as the positive electrode active material in a lithium or lithium-ion secondary battery. The xi and yi values for the compounds in the sample set that have the predetermined battery performance data are then used to determine a, b and c. The compound is analyzed by measuring the x-ray diffraction spectra for the compound to obtain x and y values and determining whether the x and y values meet the relationship axi+byixe2x89xa6c and thus whether the compound possesses the battery performance and x-ray diffraction spectra suitable for use as the active positive electrode material.
The lithium cobalt oxides of the invention have good cycleability properties including good initial specific capacities and capacity fades and thus are desirable for use in rechargeable lithium and lithium-ion batteries. In addition, the lithium cobalt oxides of the present invention can be produced quickly in less than 10 hours and thus can be produced at a rate desired in the art.
These and other features and advantages of the present invention will become more readily apparent to those skilled in the art upon consideration of the following detailed description, which describes both the preferred and alternative embodiments of the present invention.

Lithium cobalt oxides and methods of making same


Embodiments of the invention include a selective deposition method that allows for coating of selective portions of an object, such as an electronic device, and inhibits coating of other selective portions of the object, such as the electric contacts. The selective deposition method includes providing a web to transport the object through a deposition chamber. The web may include and reference mechanisms to register the object relative to the web. The method further includes providing deposition material and a shadow mask that has open spaces in it to inhibit coating selective portions of the object. The deposition material serves as the coating material.

The invention generally relates to the selective deposition of graded materials, and more particularly, to the selective deposition of materials in such a way as to provide barrier coatings on certain portions of objects transported through a deposition chamber while leaving certain other portions of the objects uncoated.
Electroluminescent ("EL") devices, which may be classified as either organic or inorganic, are well known in the graphic display and imaging arts. EL devices have been produced in different shapes for many applications. Inorganic EL devices, however, typically suffer from a required high activation voltage and low brightness. On the other hand, organic EL devices ("OELDs"), which have been developed more recently, offer the benefits of lower activation voltage and higher brightness in addition to simple manufacture, and, thus, the promise of more widespread applications.
An OELD is typically a thin film structure formed on a substrate such as glass, metal or plastic. A light-emitting layer of an organic EL material and optional adjacent semiconductor layers are sandwiched between a cathode and an anode. The semiconductor layers may be either hole (positive charge)-injecting or electron (negative charge)-injecting layers and also may comprise organic materials. The material for the light-emitting layer may be selected from many organic EL materials. The light emitting organic layer may itself consist of multiple sublayers, each comprising a different organic EL material. State-of-the-art organic EL materials can emit electromagnetic ("EM") radiation having narrow ranges of wavelengths in the visible spectrum. Unless specifically stated, the terms "EM radiation" and "light" are used interchangeably in this disclosure to mean generally radiation having wavelengths in the range from ultraviolet ("UV") to mid-infrared ("mid-IR") or, in other words, wavelengths in the range from about 300 nm to about 10 micrometer. To achieve white light, prior-art devices incorporate closely arranged OELDs emitting blue, green, and red light. These colors are mixed to produce white light.
Conventional OELDs are built on glass substrates because of a combination of transparency and low permeability of glass to oxygen and water vapor. A high permeability of these and other reactive species can lead to corrosion or other degradation of the devices. However, glass substrates are not suitable for certain applications in which flexibility is desired. In addition, manufacturing processes involving large glass substrates are inherently slow and, therefore, result in high manufacturing cost. Flexible plastic substrates have been used to build OELDs. However, these substrates are not impervious to oxygen and water vapor, and, thus, are not suitable per se for the manufacture of long-lasting OELDs. In order to improve the resistance of these substrates to oxygen and water vapor, alternating layers of polymeric and ceramic materials have been applied to a surface of a substrate. It has been suggested that in such multilayer barriers, a polymeric layer acts to mask defects in an adjacent ceramic layer, and therefore provides a tortuous pathway to reduce the diffusion rates of oxygen and/or water vapor through the channels made possible by the defects in the ceramic layer. However, an interface between a polymeric layer and a ceramic layer is generally weak due to the incompatibility of the adjacent materials, and the layers, thus, are prone to be delaminated.
Organic electronics may supplant conventional silicon-based technology if they can be manufactured for large area electronic devices at a much lower cost. Examples of low-cost electronic technologies include organic light-emitting devices (OLEDs), organic photovoltaic devices, thin-film transistors (TFTs) and TFT arrays using organic and solution-processible inorganic materials, and other more complicated circuits. Other electronic technologies include liquid crystal devices (LCDs), photovoltaic cells, electrochromic devices, and electrophoretic devices. Such electronic technologies are conventionally manufactured using predominantly batch-mode semiconductor fabrication processes. Such processes do not, however, fulfill the promise of low cost and large area potential. Thus, considerable research effort is being directed to fabricating organic electronic devices using printing processes on roll-to-roll compatible, mechanically flexible substrates. For example, Konarka Technologies Inc. has developed a photovoltaic cell manufacturing process that allows printing photo-reactive materials onto flexible plastic substrate in continuous roll-to-roll (R2R) fashion, similar to how newspaper is printed on large rolls of paper. Konarka's R2R manufacturing process enables production to scale easily and results in significantly reduced costs over previous generations of solar cells. See, for example, U.S. patent application publication 2003/0192584. SiPix Imaging Inc. has developed a R2R manufacturing process that produces large arrays of microscale containers on a flexible plastic substrate that may be used to fabricate ultra-low power, high contrast electrophoretic display devices (electronic paper). See, for example, U.S. Pat. No. 6,873,452.
OLEDs represent the most advanced of current organic electronic technologies as evidenced by the fact that OLED display products are now commercially available. However, these products are still manufactured using predominantly batch-mode conventional semiconductor fabrication processes and so have still not demonstrated the low cost and large area potential of organic electronics. A key impediment for this effort is the lack of availability of a mechanically flexible substrate that fulfills all the requirements for a functional OLED device. Further, commercial OLED devices use glass substrates and glass or metal encapsulation with epoxy seals and desiccants. These processes provide both low throughput and high cost.
To meet the stringent requirements put forth for the design of OLEDs and other organic electronic devices on flexible or inflexible substrates, a robust coating design should be realized which avoids easy defect pathways for permeation. Multilayer barrier structures including multiple sputter-deposited aluminum oxide inorganic layers separated by polymer multilayer (PML) processed organic layers have demonstrated promising moisture permeation rates in the range of 10−6-10−5 g/m2/day. It is commonly understood that organic layers may decouple defects in the inorganic layers and prevent the propagation of the defects from one inorganic layer to the other inorganic layers. In other words, the multilayer stack stops defects from propagating in the vertical direction through the coating thickness. A modeling study suggests that this defect decoupling forces a tortuous path for moisture and oxygen diffusion, and thus reduces the permeation rate by several orders of magnitude. Another study suggests that the inorganic-organic multilayer stack leads to higher performance through a transient rather than steady-state phenomenon. Regardless of mechanism, the multilayer barrier stack approach appears to be capable of yielding the required level of performance for OLED applications.
One potential limitation of the multilayer stack approach is that this type of structure tends to suffer from poor adhesion and delamination especially during thermal cycles of the OLED fabrication processes, since the inorganic and organic layers have sharp interfaces with weak bonding structure due to the nature of the sputter deposition and PML processes.
Therefore, there is a continued need to provide, in a continuous process, protective coatings over certain portions of the electronic devices, while leaving other portions of the electronic technology uncoated.

Methods for selective deposition of graded materials on continuously fed objects


A valve is described having an inlet, an outlet, a sealing element and a device to generate a magnetic field, whereby the sealing element can be moved at least partially by the device and whereby the sealing element connects the inlet to the outlet in a fluid-conducting manner in that the sealing element lifts off at least partially from a valve seat wherein the sealing element is made at least partially of a foam element that can be deformed by the magnetic field.

Valves of the above-mentioned type are already known from the state of the art. In these valves, the sealing element is configured as a rigid part in order to interact with the magnetic field. Sealing elements are often designed as metal parts or as metal-plastic composite parts.
The valves of the generic type have the disadvantage that the hard sealing elements cause disturbing noises when they are lifted and strike the seat once again. Especially in the case of clocked valves, staccato-like noises can occur which are felt to be extremely unpleasant, particularly inside the cabins of aircraft.

Valve with magnetic sealing element made of foam


From received postal items patterns are recorded and recorded information representing the recorded patterns is generated. Each received postal item is processed directly after the information is recorded from the postal item. The information representing the recorded patterns is stored in a log of received mail. Since the recordal of the pattern is carried out before the step of processing, any log or archive prepared on the basis of the initial recording step will include any documents which are lost or damaged during the subsequent processing.

In European patent application 0 571 308 a method for processing received postal items is described in which, for each one of a plurality of received postal items, at least one pattern is recorded from the received postal item, recorded information representing the at least one recorded pattern is generated, and the received postal item is processed in accordance with processing instructions represented by the information recorded from the postal item.
Also disclosed in this document is an apparatus for processing received postal items, equipped with a registration assembly for recording patterns from received postal items and for generating recorded information representing the recorded patterns, and a processing structure connected to the registration assembly for processing received postal items in accordance with processing instructions represented by the information recorded from the postal items.
The recording of a pattern is for example carried out by scanning a bar-code pattern on a document or an envelope and the processing includes the sorting and routing of documents to different remittance processing devices responsive to coded information obtained by scanning the bar-code pattern of the respective envelope.
Direct integrated processing of received mail provides efficiency advantages in that it eliminates the need of handling batches of mail between successive processing operations. However, there is a need of efficiently preparing and maintaining records of incoming mail which can serve as a log for data regarding received mail. For example, in some organizations all envelopes in which mail has been received are stored for some time so that any items or data in or on these envelopes can be retrieved if necessary. It is also common practice to prepare lists of mail which has been received, but in combination with integrated processing of received mail, this entails the problem that items which have gone astray during the processing are missed.

Method and an apparatus for preprocessing logging of received postal items


A method of incorporating used automobile tire scrap into asphalt uses a step of saturating rubber particles with an aromatic oil. The rubber particle containing oil does not absorb additional oils from the asphalt binder materials and the integrity of the asphalt mix is not compromised.

1. Field of the Invention
This invention is for processing of recycled asphalt pavement or virgin asphalt where the mixture contains recycled rubber. The Federal Highway bill (ISTEA) enacted in December 1992 requires each state to use asphalt pavement containing asphalt rubber in 5% the total tons of asphalt pavement laid in the state and financed in whole or in part by Federal funds. The required percentage of asphalt pavement containing recycled rubber, in relation to the total tons of asphalt laid in each state, increases by 5% each year until reaching 20% in 1997.
The Federal Highway Bill mandate requires that there be threat to human health or the environment, that the asphalt containing rubber must be recyclable and that the performance of the rubber containing asphalt pavement must be equivalent to that of existing hot-mix pavements.
The accumulation of used tire carcasses has become a substantial environmental problem. A need has therefore developed to dispose of old tire carcasses, and incorporation of the tire rubber into hot-mix asphalt provides an attractive solution.
2. Description of the Prior Art
In the prior art, reprocessed rubber from automobile tires has been used in various mixtures to form paving material for roads.
U.S. Pat. No. 3,915,581, Copp, Jr., teaches the use of shredded or powdered automotive tires which is processed to be suitable for vulcanizing. This utilization of reprocessed rubber is directed to rubber pavement, contains a high percentage of used rubber and is not a component of hot-mix asphalt.
U.S. Pat. No. 2,952,650, Wood, teaches the use of a rubber powder and incorporation of the rubber powder in the amount of generally 1 to 20% of the asphalt content. In this process, butyl rubber is masticated at elevated temperatures with a rubber plasticizer, carbon black and vulcanizing ingredients until the rubber vulcanizes. The contemplated rubber, however, is not used automobile tire. The use of a rubber plasticizer similar to the asphalt used in roads and having a penetration value from 40 to 300 is suggested. The rubber processing oil may be an aromatic, napthanic or asphaltic rubber softening oil.
U.S. Pat. No. 3,915,581, Copp, Jr., teaches the use of a rubber paving material. In this disclosure, the author recommend against adding shredded or ground rubber to a binder, and that the rubber be reprocessed into a vulcanizing state and applied as a solid rubber paving.
U.S. Pat. No. 3,253,521, Endres, teaches a rubberized bitumen particulated rubber. An adhesive composition for the rubbery asphalt is disclosed as containing 3% of rubber and 97% of 85/100 penetration asphalt on a weight basis. The microscopically dispersed rubber in the bitumen is disclosed as being between 2% and no more than 10%.
U.S. Pat. No. 2,977,864 is another example of a rubberized asphalt which may contain 2% weight by rubber. Rubber pellets are heated to a temperature of 250.degree. F. and then placed in a pug mill mixer and mixed fine rubber particles.

Process for adding recycled tire particle to asphalt


Determining a location of a user device comprises a wireless system supported by wireless access points receiving signals from a user device. The wireless system estimates a location of the user device based on a coarse calculation based on an angle of arrival of the received signal and determines if the user device is in an area under an access point. The wireless system identifies received signal strength indicator values for the user device and uses the values and the calculated location of the user device to improve calibration of a received signal strength location model. If the system determines that the user is not in the area under the access point, the wireless system combines the coarse calculation location, a received signal strength determined location, and a previous received signal strength determined location, and estimates a location based on the combined calculations.

Wireless computing systems that provide Internet services and other wireless signal services to user computing devices, such as mobile smartphones, are deployed in many public locations. For example, a mall or a hotel may deploy a wireless access point to provide a wireless network connection to a user computing device. A facility may provide multiple wireless access points to cover a larger area. For example, a sports arena may provide many wireless access points to allow wireless network access for users throughout the facility.
A conventional wireless computing system may use the wireless access points to determine a location of a particular user computing device and offer services to the particular user computing device based on the determined location. In an example, the location of the particular user computing device may be employed by the particular user computing device when accessing a mapping application or a shopping application. Errors in the determined location may result in providing incorrect or incomplete services to the particular user computing device.

Determining location via current and previous wireless signal attributes


A component including a porous portion which may be permeable or impermeable to air, and a method for making. In one example, the component is a cooled wall segment for a gas turbine engine, including a body defining a contact surface configured to be in contact with circulating hot gas and an outer surface configured to be in contact with cooling air. The body includes a first portion with at least one retention element, and a porous second portion made of a porous material permeable to air, containing a plurality of interconnected pores, and having a porosity greater than that of the first portion. The second portion is engaged to the first portion, defines at least part of the contact surface, and defines at least part of a fluid communication between the outer surface and the contact surface through the interconnected pores. The wall segment may be for example a heat shield or shroud segment. Methods of forming components are also discussed.

Turbine shrouds and heat shields are typically provided by a plurality of holes through which cooling air is circulated, such as to cool the shroud or the heat shield for example through impingement of the cooling air. However, the number of holes which are required are typically relatively high, which may provide for a complex and/or lengthy manufacturing processes. Other engine parts are also are often subject to cooling requirements to operate at optimal efficiency. As well, aircraft parts in general benefit from weight reduction measures wherever feasible.

Aircraft components with porous portion and methods of making


In an aspect, a clutched device is provided, including a hub, a pulley and a roller clutch. The roller clutch includes at least one roller and a cage. The roller is engageable with a first engagement surface operatively associated with the hub and is engageable with a second engagement surface operatively associated with the pulley. The cage is movable between a first position in which torque is transferrable from one of the hub and the pulley to the other of the hub and the pulley through the roller clutch and the isolation spring. The other of the hub and the pulley is permitted to overrun said one of the hub and the pulley, and a second position in which torque is transferred from said other of the hub and the pulley to the one of the hub and the pulley through the roller clutch.

It is known to provide an isolator on an engine crankshaft or on a belt-driven accessory, such as an MGU (motor generator unit) or an alternator, that is driven by a belt from the crankshaft of an engine in a vehicle. As is known, the crankshaft undergoes cycles of accelerations and decelerations associated with the firing of the cylinders in the engine. The isolator permits these accelerations and decelerations to occur with reduced effect on the speed of the belt. A problem with some isolators is that they do not provide 'decoupling' which permits overrunning of the belt and the pulley relative to the crankshaft of the engine. Some decouplers have been proposed which include powered clutches to provide decoupling and which also permit BAS (belt/alternator start) capability for the engine when desired. However, such decouplers can be complex. It would beneficial to provide a decoupler that at least partially addresses this problem.

Decoupler with overrunning and belt-start capability with simplified construction


Described is a dynamic web platform configured to provide content rendered with one or more rendering systems. The rendering systems and the modules making up the rendering modules may interact with one another by way of declarative data. Administrators may configure the platform using the declarative data. The declarative data may express operational parameters, business rules, and so forth and may be modified while the platform is operating. The modules in the rendering system may be loosely bound, allowing for concurrent operations, dynamic changes to what content is to be rendered, and so forth.

Users use client devices to access a wide variety of content from online providers. This content may be associated with various endeavors such as ecommerce, communication, medicine, education, and so forth.
Certain implementations and embodiments will now be described more fully below with reference to the accompanying figures, in which various aspects are shown. However, various aspects may be implemented in many different forms and should not be construed as limited to the implementations set forth herein. Like numbers refer to like elements throughout.

Declarative language dynamic web platform


An arylamide derivative of formula (1), a salt thereof and a therapeutic agent for hyperlipemia which comprises the derivative or salt: ##STR1## wherein Ar represents a group ##STR2## a naphthyl group, a pyridinyl group, a furyl group, a thienyl group, a quinolyl group or an indolyl group; Y represents a group ##STR3## and Q represents --O-- or a single bond, Z represents an alkylene group, and R.sup.4 represents a hydroxyl group, an alkoxy group or a group --NH(CH.sub.2).sub.m COOH, useful for the treatment and prevention of hyperlipemia due to their excellent cholesterol reducing action, triglyceride reducing action and high safety.

1. Field of the Invention
The present invention relates to novel arylamide derivatives and salts thereof, and therapeutic agents for hyperlipemia containing the derivatives or salts which exhibit excellent anti-hyperlipemic action.
2. Description of the Related Art
Conventionally, there are many drugs known as therapeutic agents for hyperlipemia. Upon clinical use of a drug for the treatment of hyperlipemia, profile of the disease and functional mechanism of the drug must be taken into account for properly select a drug which is suited for the purpose of treatment. Generally speaking, the purpose of administering the drug is to lower the level of total serum cholesterol (TC), lower the level of triglyceride (TG), or to lower the levels of both, and drugs are selected accordingly.
Recently, the dangerousness of hypertriglyceridemia is highlighted as a risk factor of arteriosclerosis, coronary diseases, cerebrovascular disorders, obesity and the like diseases which involve hyperlipemia, and from the viewpoint of the prevention and treatment of diseases associated with hyperlipemia, the importance of lowering the level of triglyceride in blood has now been recognized.
Conventionally, clofibrate-type drugs have been developed to lower the level of triglyceride in blood, and clofibrate, clinofibrate, phenofibrate, bezafibrate and the like are clinically used.
However, these clofibrate-type drugs are accompanied by adverse side effects such as gastroenteric disorders and liver disorders, and moreover, they must be administered in a large quantity for obtaining a certain clinical effect, and the effect is still unsatisfactory.
Accordingly, therapeutic agents for hyperlipemia which exhibit excellent anti-hyperlipemic action and are very safe have still been desired.
Under the above-mentioned circumstances, the inventors of the present invention have synthesized many arylamide derivatives and carried out extensive studies on their anti-hyperlipemic action, and have found that the arylamide derivatives represented by the formula (1) which will be described hereinbelow or salts thereof have excellent action of lowering the level of cholesterol in blood, lowering the level of triglyceride in blood, are very safe and are useful as a therapeutic agent for hyperlipemia associated with arteriosclerosis, myocardial infarction, high blood pressure and cerebrovascular disorders, leading to completion of the present invention.

Arylamide derivatives for treating hyperlipemia


Disclosed is a self-sealing valve and cylinder configuration, an internal combustion rotary engine, or pump or compressor, with a rotating central housing which includes at least one cylinder aperture, a non-rotating timing pulley mount concentrically positioned within the central housing, a crank shaft eccentrically mounted within the central housing, a valve housing attached to the central housing and which retains a cylinder between it and the central housing, a piston within each cylinder, the piston rod is eccentrically mounted to the crank shaft, and a rotating valve within each valve housing.

For many years the predominant engine used for vehicles has been the reciprocating engine. While the concept of a rotary engine is superior to reciprocating valve engines for many reasons, there have been inherent problems with the specific applications of rotary engines which have been attempted. The major problem with prior attempts at the rotary engine have been related to the effective and reliable sealing of the cylinder where the forces from combustion eventually overcome the sealing means used.
It will be appreciated by those skilled in the art that this invention has applications not only for engines, but also for pumps and compressors, even though an engine will be referred to and used throughout this specification.
Objects of this invention are without limitation:
1. To provide an engine wherein the net effective valve opening is increased and is superior.
2. To provide an engine wherein traditional poppet valves are eliminated.
3. To provide an engine which achieves the superior rotation features of a rotary engine and thereby eliminates the acceleration, deceleration, reversal, re-acceleration, deceleration and seating that a traditional poppet valve engine continually undergoes.
4. To provide an engine which maintains a maximum orifice opening due to the rotary motion, and which consequently results in more crank degrees than in traditional poppet valve engine. PA0 5. To provide an engine wherein the number of valves needed to achieve a certain power level is greatly minimized, and consequently, the need for valve seals, valve keepers, valve springs, buckets, valve guides and cam shafts is likewise greatly reduced or eliminated. PA0 6. To provide an engine wherein the required overall mass of the engine is substantially reduced, as compared to a typical reciprocating engine. PA0 7. To provide an engine wherein the vibration of the engine is greatly reduced as compared to the vibration experienced in a reciprocating engine. This reduction in vibration further results in greatly minimizing or eliminating the need for counter-weighting and balancing, and thereby maximizes the overall balance and durability of the engine. PA0 8. To substantially increase the overall efficiency of the engine as compared to a traditional poppet valve engine. PA0 9. To provide a more efficient combustion chamber by greatly reducing or eliminating complex shapes, by reducing crevice volumes and thereby achieving faster gas flow rates. PA0 10. To provide an engine configuration which achieves more efficient cooling and larger flow paths by having embodiment options which may configure the cylinders and the rotary valves as thermally separate from one another. PA0 11. To provide an engine wherein the surface-to-volume ratio is minimized, thereby minimizing emission levels and the heat transfer per cycle. PA0 12. To provide an engine configuration wherein the flame front utilizes a substantially shorter path than in typical reciprocating engines. PA0 13. To provide an engine wherein the need for a head gasket is eliminated, which thereby has the advantages of also eliminating the leaks, failures and large crevice volumes associated with head gaskets. PA0 14. To provide an engine wherein the number of components or parts needed in the engine and the combustion chamber is minimized, which also has the advantage of minimizing crevice volumes. PA0 15. To provide an engine in which the size of the cylinder head is minimized and the overall mass and volume of the engine is minimized. PA0 16. To provide an engine which eliminates the side-to-side swing motion of the piston rod which occurs in a typical reciprocating engine, which also serves to eliminate of side loads on the piston. This invention achieves this object by utilizing a piston motion which is co-linear with the cylinder, combined with a rotation system for maintaining the piston rod and piston head properly aligned within the cylinder. PA0 17. To provide an engine which minimizes the effective length of the exhaust path, which consequently minimizes the heat transfer within the engine. PA0 18. To provide an engine which maximizes the air intake, which is achieved by positioning the air intake at the spin or rotational center of the engine, the engine being a centrifugal device. Therefore, higher revolutions per minute act analogously to a supercharger in increasing flow efficiency, overall engine efficiency and the miles per gallon the engine can achieve in a vehicle. PA0 19. To provide an engine wherein the centrifugal effects of the rotary motion increases the natural flow of exhaust as the rotational motion will naturally tend to move the exhaust radially out of the combustion chamber. Achieving this objective has the further advantage of reducing the tendency to create back pressure. PA0 20. To provide an engine wherein the need for a crank or torsion damper is eliminated, which also results from the minimal crank length utilized by this invention. PA0 21. To provide an engine which has embodiment options which may eliminate the need to use castings to manufacture the engine, which this invention achieves due to its unique configuration and design. PA0 22. To provide an engine which reduces emissions, which is expected to be accomplished by this invention by the reduction of valve overlap, achieving superior volumetric combustion efficiency, achieving a faster burn and by reducing crevice volumes. PA0 23. To provide an engine which can run more efficiently than typical reciprocating engines at higher revolutions per minute. This is achieved through the improved overall engine balance of its mass, the supercharging effect of the centrifugal motion, the general engine configuration, and the reduction or elimination of the need for counters weights. PA0 24. To provide an engine which maximizes power and torque, which is achieved through the numerous advantages and achievements stated above. PA0 25. To provide an engine which minimizes the necessary length of the crank shaft, which in turn minimizes the flex of the crank shaft. PA0 26. To provide an engine in which the spacing between the bearings is minimized or reduced, which provides for a more stable engine with less vibration.

Rotary and reciprocating internal combustion engine and compressor


A method for the decolorization of waste water containing coloring matters comprising dyestuff and/or pigment, in which PVA is added to a waste water containing coloring matters as above mentioned so as to catch the coloring matters in the waste water into the PVA, a precipitant of the coloring matters is added to the resultant waste water so as to render the coloring matters absorbed onto the PVA insoluble, a coagulant of PVA is added to the waste water so as to make the PVA insoluble, and then the thus insolubilized PVA containing the coloring matters is separated for the recovery thereof, and thus the decolorization of a waste water containing the coloring matters can be done skillfully and economically by eliminating the drawbacks in the conventional arts.

1. Field of the Invention
The present invention relates to a method for the decolorization of colored waste water containing dyestuff and/or pigment disposed from a dyeing factory of a textile product.
2. Description of the Prior Art
For instance, in the dyeing factory of a textile product comprising a material such as cloth industrially, a large quantity of waste water containing dyestuff and/or pigment is exhausted. When such a waste water is disposed as it stands into a river, the river is polluted, and there occurs the problem of public pollution. Therefore, the waste water exhausted from the dyeing factory of a textile product has conventionally been subjected to a decolorization treatment prior to the discharge into a river. In the prior arts for the decolorization treatment of such coloring matters, there have been known the following processes: (a) by the coagulation with the addition of a suitable metal hydroxide such as of iron and aluminum, (b) by the adsorption with the use of an adsorbent such as ion exchange resin, active carbon, silica gel and alumina, (c) by the oxidation-decomposition with the use of an oxidant such as chlorine, ozone and hydrogen peroxide and (d) by the neutralization-coagulation with the addition of a polyelectrolyte having an opposite charge.
However, there are various difficulties in the above-mentioned conventional decolorization treatment methods. Namely, a large quantity of sludge is formed in the method (a), the decolorization is difficult when the waste water contains a large quantity of coloring matters in the method (b), a large quantity of decolorization chemical and a long treating time (2-3 days) are needed in the method (c) and further, in the method (d), since the waste water to be decolorized contains usually various kinds of coloring matter, complete decolorization is difficult.

Method for decolorization of waste water


A tractor which is towing two agricultural implements extending transversely relative to the longitudinal axis of the tractor and having a width which is substantially greater than that of the tractor's width, the two implements being coupled to the tractor in tandem. The interior of the tractor's cab has a convex (as seen by the driver) mirror which extends almost completely across the interior of the glassed-in cab of the tractor so as not to block the driver's forward vision, whereby the driver can observe in the mirror both implements across their entire widths as well as the device for coupling both implements to the tractor. In a modification, the convex mirror is of less width (about one-half of the width of the cab) and is flanked by further mirrors on each side which reflect from still further mirrors mounted on the overhead of the cab to provide an increased lateral area which is within the vision of the driver through the mirrors. In a further modification, mirrors mounted forwardly and on both sides of the deck of the cabin reflect from mirrors on the after part of the overhead to provide vision behind the tractor wherein the tractor has a cab located forward and the engine aft with a rearwardly sloped hood over the engine. The mirrors are preferably curved in at least one plane and may be of stainless steel coated with a reflective foil, plexiglass with a silver layer, or a silver-plated tempered glass. The degree of tilt of the mirrors may be established by adjustable members connected thereto.

The invention relates to a mirror arrangement for the interior of a tractor which is adapted to have coupled thereto one or more implements having a substantially greater width than the tractor whereby the operator of the tractor can see the implements coupled to the tractor and the coupling means effecting such coupling.
In agricultural operations wherein one or more implements are towed by a tractor, the tractor's operator is required constantly to turn rearwardly during such operations to determine that the implements are properly disposed and operating correctly. This can not only be tiring for the operator but, in addition, takes his eyes away from the front of the tractor whereby the tractor may not be steered as desired.
Known devices for rear vision mirrors of motor vehicles frequently are not conducive to tractor operations. Often the mirrors are on the outside of the tractor where they may gather dust and the like and require the operator to turn his head from side or the other whereby his forward vision is impeded. In addition, mirror arrangements which permit an operator to see the blind spot behind the motor vehicle frequently fail to address further areas which should be within the vision of the operator such as occurs with implements having a substantial width. When the mirrors are placed within the cab, frequently reflection on the glass of the cab seriously obstructs the view of the operator through the mirrors. Further, within interior mirror arrangements it is usually necessary that they be relatively inexpensive to produce and install and relatively easy for the operator to manipulate.
Thus, a need exists for a mirror arrangement which will enable the operator of an agricultural tractor to see the coupling devices immediately behind the tractor and, at the same time, a width which extends to both sides of the tractor and which includes the width of the agricultural implements which may be towed or otherwise coupled to the rear of the tractor.

Mirror arrangements to provide side and rear vision for tractor with implements


A smart multimedia content receiver automatically resizes video images based on the content being displayed on the TV screen. Such a self-formatting content receiver includes on-board image processing capability that provides continuous video analysis to detect changes in program formatting and convert each frame as it is received in real time, as opposed to processing and re-releasing an entire program or movie, or relying on the viewer to re-format programs manually. In response to detecting a change, aspect ratio adjustments are made as needed. Because the self-formatting content receiver has access to the video data before it is displayed, such automatic on-the-fly adjustments ensure that the viewer's experience during program changes is seamless and without distortion. Subscribers can influence decisions made by the content receiver by pre-setting viewer preferences for aspect ratio adjustment.

Technical Field
The present disclosure generally relates to TV displays, and in particular, to automatically formatting media content for display on a TV screen.
Description of the Related Art
Movies and television programming use various image size formats for projecting images onto movie screens or television displays. Formats that have been used historically originated in the film industry and were based on the size of individual frames used in motion picture film, e.g., 28 mm, 35 mm, and so on. The high-definition format currently in use for broadcast television in the U.S. (HDTV) has an aspect ratio of 16:9, meaning the picture is rectangular, having dimensions of 16 units wide and 9 units high. The 16:9 aspect ratio is equivalently expressed as the normalized ratio 1.77:1. Other aspect ratios commonly used for video include widescreen TV format having an aspect ratio of 4:3, equivalent to 1.33:1, various intermediate aspect ratios between 1.33:1 and 1.77:1, 1.85:1, and 2.4:1. Older TV shows that were originally filmed for widescreen TV, and older movies, can be re-mastered by a production studio to convert the format to the 1.77:1 format.
With the recent advent of many types of displays, the video content may not have a standard aspect ratio of a type commonly used. For example, videos are being recorded on many different brands of cell phones, video cameras, and various portable electronic devices. With the wide availability of many types of video recording devices and video cameras, the aspect ratio of a particular recorded video cannot be easily determined in advanced, and may vary over a wide range. In addition, a large number of different displays are now available. Displays can be as small as a watch or a cell phone, and as large as the size of a wall. Further, the aspect ratio of a particular display may not fit any standard, and may vary widely from one display to another.
The term high definition (HD), as it is used today, refers to a high density video image having a resolution of at least 1280×720 pixels, projected onto a display at a frame rate of 60 frames/sec, or 60 Hz. More specifically, HD video has 720 horizontal lines and 1280 vertical columns, wherein 1280/720=16:9=1.77. While a standard SD-DVD disc stores up to 4.5 GB of standard resolution video image data, a typical HD-DVD video disc stores up to 15 GB of HD video image data.
TV displays typically allow viewers to configure the screen differently as needed for different resolution programs having different aspect ratios. Depending on the screen size and the format of the program, the video images may fill the entire screen, or there may be black vertical or horizontal sidebars at the edges of the screen, filling in the unused portion, or a portion of the image may bleed off the screen and not be visible. The viewer may have to decide whether to make the image size smaller than the screen and tolerate the sidebars, or lose some of the picture because it is too big to fit on the screen. Once the viewer adjusts the screen according to the desired format for the current program, if the viewer switches channels or if a commercial comes on, the adjustment made for the initial program may not be suitable for the new video images. For example, commercials may be distorted or a new show may be partially off the screen, thus requiring the viewer to manually re-adjust the format settings every time they switch from one program to another. Such constant re-adjustment is a nuisance for the viewer.
In the case of commercials in particular, it is unlikely that a viewer will bother to manually adjust the format settings for each new commercial that is broadcast. As a result, commercial advertising messages may be lost on the audience because viewers are distracted by distorted commercial images. Alternatively, a portion of the commercial message that exceeds the size of the screen may not be visible, which could impair its effectiveness in marketing to the viewer.

Automatic program formatting for TV displays


A drive controlling circuit for electric shutters provided with a plurality of discriminating circuits for detecting failures and a plurality of warning circuits including buzzers or luminous diodes operated by the discriminating circuits in order that various failures of the shutter in use can be positively and quickly known. This controlling circuit makes impossible to release the shutter when something is wrong with the shutter.

(a) Field of the Invention
This invention relates to drive controlling circuits for electric shutters and more particularly to a controlling circuit whereby whether the shutter is being properly operated is detected and the result can be known.
(b) Description of the Prior Art
In most cases, in a microscopic camera or any industrial camera, only an electromagnetic actuator for directly driving shutter blades and a mechanical mechanism related with it are incorporated in the camera body but electric control circuit parts including a releasing switch and exposure time controlling circuit are contained in a control box provided separately from the camera body and the camera body and control box are used as connected with each other through cables.
In the camera of such system, it has been difficult and inconvenient in practice for the operator to know by the operation on the control box whether the shutter is operating accurately or not.

Drive controlling circuit for electric shutters


A fastening plate for fastening a hinge arm to a supporting wall of a piece of furniture includes two oblong holes on an common centerline through which fastening screws engage. One fastening screw is supported with its head on a spacer element having a height greater than that of the fastening plate, and another fastening screw braces the fastening plate against the supporting wall. The height of the spacer element is greater than that of the fastening plate so that a slight amount of play is provided between the head of the fastening screw supported on the spacer element and the surface of the fastening plate, so that the fastening plate can be moved for adjustment while any undesired lifting of the fastening plate is prevented.

1. Field of the Invention
The invention relates to a fastening assembly for a metal fitting means, preferably to fasten a hinge arm to a supporting wall of a piece of furniture, having a fastening plate which for adjustment purposes is provided with two oblong holes on a common centreline through which fastening screws engage, wherein one fastening screw is supported with its head on a spacer means whose height is greater than that of the fastening plate, and wherein another fastening screw braces the fastening plate against the supporting wall or similar.
2. Brief Description of the Related Art
A fastening plate of this type is known from DE 35 01 048 C2 and consists of a bottom portion in the shape of a cross and plate with an elongated centre section which is provided with lateral wing-like attachments with the bottom portion being covered by a correspondingly designed top portion, oblong holes being provided in the wing-like attachments of the top portion and with the spacer means comprising a shaft-like protrusion which penetrates an oblong hole of the top portion in such a way that some slight axial play remains between the head of a screw screwed into the shaft-like protrusion and the top plate so that the top plate can be moved in the direction of the two oblong holes relatively to the bottom plate for the purpose of adjustment in one direction. To secure the position set, the top plate is braced with the bottom plate by means of the fastening screw penetrating the other oblong hole. The known fastening plate is relatively complex as it is designed in two parts and comprises a T-shaped bottom plate which is completely covered by a correspondingly designed top plate.

Fastening plate for a metal fitting means, preferably to fasten a hinge arm to a supporting wall of a piece of furniture