A system, method, and machine-readable storage medium for providing a recommendation to a client to modify minimum IOPS settings are provided. In some embodiments, a client may assign a minimum input/output operations per second (IOPS) setting to each volume of a plurality of volumes. The plurality of volumes may reside in a common cluster and include a first number of volumes. A set of volumes of the plurality of volumes may be determined, where each volume of the set of volumes has a relative disparity that satisfies a relative threshold. The set of volumes includes a second number of volumes. A minimum IOPS recommendation may be transmitted to the client to modify (e.g., increase or decrease) the minimum IOPS settings of the set of volumes in response to determining that a ratio of the second number of volumes to the first number of volumes is greater than a performance threshold.

A plurality of storage nodes organized as a cluster may provide a distributed storage architecture configured to service storage requests issued by one or more clients of the cluster. The storage requests are directed to data stored on storage devices coupled to one or more of the storage nodes of the cluster. The data served by the storage nodes may be distributed across multiple storage units embodied as persistent storage devices, such as hard disk drives, solid state drives, flash memory systems, or other storage devices. The storage nodes may logically organize the data stored on the devices as volumes accessible as logical units. Each volume may be implemented as a set of data structures, such as data blocks that store data for the volume and metadata blocks that describe the data of the volume. For example, the metadata may describe, e.g., identify, storage locations on the devices for the data. The data of each volume may be divided into data blocks. The data blocks may be distributed in a content driven manner throughout the nodes of the cluster.
One way of attempting to provide a better client experience is by allowing clients to set a quality of service (QoS) that guarantees a particular level of performance for volumes. For example, QoS may guarantee a particular level of performance by provisioning minimum, maximum, and/or burst levels of input/output operations per second (IOPS) to volumes. The minimum IOPS setting for a volume may refer to a guaranteed number of IOPS at which the volume will perform, assuming that the cluster in which the volume resides is not over-provisioned. The maximum IOPS value for a volume may refer to the number of IOPS at which the volume will be throttled. The burst IOPS value for a volume may be the number of IOPS that a volume will be able to perform at beyond the maximum IOPS value setting for a short amount of time based upon burst IOPS credits. Burst IOPS credits may be accrued when the volume has been performing at fewer than the maximum IOPS value for an extended amount of time. For example, a volume may accrue burst IOPS credits while the volume performs under the maximum IOPS value (e.g., to a maximum number of credits), and the volume may spend or use burst IOPS credits while the volume performs above the maximum IOPS value.
A client may set the QoS IOPS settings for a volume. QoS settings may be complex and difficult for clients to understand. For example, the client may suboptimally set the QoS settings in such a way that the client experiences poor performance and high latency from the system, without awareness of the QoS settings.

Disparity of quality of service (QoS) settings of volumes across a cluster


The present invention has been made for providing a photonic crystal capable of multiplexing or demultiplexing light within a wavelength band having a certain width. It includes a slab-shaped body 21 provided with plural forbidden band zones 211 and 212, and holes 221 and 222 having different sizes are arranged in the forbidden band zones with different cycles, respectively. Also formed are a trunk waveguide 24 extending along the direction inclined by +30 degrees from a perpendicular of the boundary 23 between the forbidden band zones 211 and 212, and a branch waveguide 25 extending along the direction inclined by −30 degrees. A ray of light within the multiplexed/demultiplexed wavelength band, which is excluded from the transmission wavelength band of the trunk waveguide 24 in the forbidden band zone 212 and included in the transmission wavelength band of the trunk waveguide 24 in the forbidden band zone 211, is reflected by the boundary 23 and thereby demultiplexed from the trunk waveguide 24 into the branch waveguide 25. Thus, all the rays of light whose wavelengths are within the multiplexed/demultiplexed wavelength band having a certain width are demultiplexed into the branch waveguide 25. Therefore, even if the wavelength of the optical signal is deviated due to some error, the light can be demultiplexed. This is also true for the multiplexing operation.

In recent years, optical communication lines are spreading to general households as well as being used as backbone lines connecting cities. Making optical communications available in general households requires optical transmitter/receiver modules in every household for the conversion between optical and electrical signals. An optical transmitter/receiver module generally consists of three components: an optical transmitter, optical receiver, and wavelength multiplexer/demultiplexer. Typically, a laser diode (LD) is used as the optical transmitter and a photodiode (PD) is used as the optical receiver. For the wavelength multiplexer/demultiplexer, a flat glass coated with dielectric multilayer films or a cubic prism type has been used so far. However, these devices are relatively large, and a smaller type of wavelength multiplexer/demultiplexer is in demand for use in general households.
Recently, photonic crystals have been drawing attention as new optical devices. A photonic crystal consists of a dielectric body having an artificial cyclic structure. In general, the cyclic structure is created by providing the dielectric body with a cyclical arrangement of areas (called the modified refractive index areas) whose refractive index differs from that of the body. This cyclic structure forms a band structure within the crystal with respect to the energy of light and thereby creates an energy region (called the photonic bandgap or PBG) that disallows the propagation of light. The energy region (or wavelength band) in which the PBG is created depends on the refractive index of the dielectric body and the cycle (cycle distance) of the cyclic structure.
Introduction of an appropriate defect into the photonic crystal creates a specific energy level (called the defect level) within the photonic bandgap, which allows only a ray of light having a wavelength corresponding to the defect level to exist in proximity to the defect. Provision of a point-like defect in a photonic crystal enables the crystal to be used as an optical resonator (i.e. a point-like defect) for the aforementioned wavelength, and provision of a defect extending along a line makes the crystal available as a waveguide (i.e. a linear defect). Furthermore, if the resonator is located in proximity to the waveguide, the photonic crystal functions as a wavelength multiplexer/demultiplexer. This wavelength multiplexer/demultiplexer is capable of functioning as the following two devices: an optical demultiplexer for extracting a ray of light whose wavelength equals the resonance wavelength of the resonator from rays of light having different wavelengths and propagating through the waveguide, and for emitting the extracted light to the outside; and an optical multiplexer for introducing the same ray of light from the outside into the waveguide. Wavelength multiplexers/demultiplexers using a photonic crystal can be smaller in size than the conventional ones using a multilayer-coated flat glass or a cubic prism.
Patent Document 1 discloses such a wavelength multiplexer/demultiplexer, which can multiplex or demultiplex a predetermined wavelength of light by appropriately setting the size and/or shape of the point-like defect. Patent Document 2 discloses a two-dimensional photonic crystal wavelength multiplexer/demultiplexer consisting of a two-dimensional photonic crystal having multiple zones (forbidden band zones) with different cycles, in which a waveguide passes through the multiple zones and a resonator is located in each forbidden band zone. In this construction, each resonator multiplexes or demultiplexes light having a different wavelength due to the different cycle of each zone.
[Patent Document 1] Unexamined Japanese Patent Publication No. 2001-272555 (paragraphs 0023-0027; FIG. 1)
[Patent Document 2] Unexamined Japanese Patent Publication No. 2003-279764 (paragraphs 0029-0034, 0057-0059; FIGS. 17, 18)
The point-like defects formed in the two-dimensional photonic crystal causes the resonation of light within a narrow wavelength band. Although the emission band of laser diodes is also very narrow, it is difficult to produce a product that emits light whose central wavelength coincides exactly with the desired wavelength because the central wavelength varies due to productive factors or other reasons. Therefore, to apply a two-dimensional photonic crystal wavelength multiplexer/demultiplexer to an optical transmitter/receiver module, it is necessary to perform a tuning (or selection) of laser diodes so that the wavelength used by the laser diode falls within the narrow wavelength band of the point-like defect resonator. Such a tuning process enables the two-dimensional photonic crystal wavelength multiplexer/demultiplexer having a point-like defect to be used to construct a high-precision optical transmitter/receiver module for long distance support systems.
However, as for household optical transmitter/receiver modules, the tuning process is difficult to perform in view of its costs. Therefore, it is desirable to invent a wavelength multiplexer/demultiplexer capable of multiplexing or demultiplexing light within a wavelength band having a certain width so that it can accommodate various wavelengths of laser diodes to be used.

Photonic crystal having heterostructure and optical device using the photonic crystal


To be able to form a copper-zinc-tin alloy which optionally comprises at least one chalcogenide and thus forms a semiconductor without the use of toxic substances a metal plating composition for the deposition of a copper-zinc-tin alloy is disclosed, wherein said metal plating composition comprises at least one copper plating species, at lease one zinc plating species, at least one tin plating species and at least one complexing agent and further, if the alloy contains at least one chalcogen, at least one chalcogen plating species.

Due to many advantages, CZTS is a promising semiconductor compound material for solar cell thin film applications. First, the band gap EG of the material is 1.4 to 1.5 eV and is thus near the optimal value for photovoltaic application. This material also has a high optical absorption coefficient of above 104 cm−1. In addition, all the constituents of the material are non-toxic elements and are abundant on earth (H. Katagiri et al., "Development of Thin Film Solar Cell Based on Cu2ZnSnS4 Thin Films", Solar Energy Mat. & Solar Cells, 65 (2001), 141-148; H. Katagiri, "Cu2ZnSnS4 Thin Film Solar Cells", Thin Solid Films, 480-481 (2005), 426-432; K. Moriya et al., "Characterization of Cu2ZnSnS4 Thin Films Prepared by Photo-Chemical Deposition", Jap. J. Appl. Phys., 44 (1B) (2005), 715-717).
Solar cells are devices that have the characteristics to convert the energy of light into electric energy. Several systems have been developed to maximize the amount of light intercepted and converted to electricity, such as optical concentrators or multi-junctions cells, said cells consisting of junctions with different band gaps (highest band gap on top). Part of the non-absorbed light in the uppermost junction will be absorbed by the second junction lying there beneath, and further non-absorbed light will be absorbed by further junctions lying beneath said second junction and so forth.
A conventional thin film solar cell is composed of a stacking of thin layers on a flat substrate, said thin layers forming the junction. In order to intercept as much sunlight as possible, the visible surface of the junction is maximized, in particular by using a front contact being formed from a thin grid.
CZST thin films are p-type and can serve as an absorber layer in thin film solar cells (K. Moriya at al., ibid.). Various processes for the deposition of CZTS thin films are described in the literature. In 1988 K. Ito at al. formed quaternary stannite-type semiconductor films of CZTS with (112) orientation on heated glass substrate using atom beam sputtering. The sputtering target was made from a synthesized powder of the quarternary compound. Pure argon was used as a sputtering gas (K. Ito et al., "Electrical and Optical Properties of Stannite-Type Quarternary Semiconductor Thin Films", Jap. J. Appl. Phys., 27 (11) (1988), 2094-2097).
Later they continued their studies by using a spray hydrolysis technique for synthesis of the CZTS thin films (N. Nakayama et al., "Sprayed Films of Stannite Cu2ZnSnS4", Appl. Surf. Sci., 92 (1996), 171-175.
J. Madarász at al. applied a spray pyrolysis deposition technique in the same way (J. Madarász at al., "Thermal Decomposition of Thiourea Complexes of Cu(I), Zn(II) and Sn(II) Chlorides as Precursors for the Spray Pyrolysis Deposition of Sulfide Thin Films", Solid State Ionics, 141-142 (2001), 439-446).
The layers produced by decomposition of thiourea from the sprayed electrolyte parallel to a co-deposition of metal chlorides produced almost stoichiometric compositions. In both working groups an annealing step after the deposition was necessary.
All these studies were focused to collect basic physical data, such as band gap energy and absorption coefficient. These studies confirmed that kesterite (Cu2ZnSnS4) is a hopeful candidate to be used as a thin film solar cell material. This material is a p-type semiconductor which is has a tetragonal structure derived from the ZnS sphalerite (or zinkblende). The documents mentioned, however, do not disclose any solar cell conversion efficiencies and the research groups mentioned did not report such data until today.
In 1997 H. Katagiri at al. published an alternative CZTS synthesis. In the first step a metal sandwich layer (Cu/Zn/Sn) was deposited by PVD technique while in a following step vapor-phase sulfurization was performed. The stacked precursors on the substrate were formed by depositing ZnS first, next Sn was deposited and last Cu was deposited by sequential evaporation. (H. Katagiri at al., "Preparation and Evaluation of Cu2ZnSnS4 Thin Films by Sulfurization", Solar Energy Mat. & Solar Cells, 49 (1997) 407-414).
In 2003 J.-S. Seal at al. have reported applying a PVD process (rf magnetron sputtering) for CZTS precursor deposition (J.-S.Seol at al., "Electrical and Optical Properties of Cu2ZnSnS4 Thin Films Prepared by RF Magnetron Sputtering Process", Solar Energy Mat. & Solar Cells, 75 (2003), 155-162).
H. Katagiri reported in 1997 data of a CZTS based solar cell to show an efficiency of 0.66% (H. Katagiri et al., ibid. (1997)). The reported efficiency improved to 2.62% in 2001 (H. Katagiri at al., ibid. (2001)). This reported efficiency also exceeded the efficiency reported by Th. M. Friedlmeier at al. in 1997 which was referred to be 2.3% (Th. M. Friedlmeier et al., "Growth and Characterization of Cu2ZnSnS4 and Cu2ZnSnSe4 thin Films for Photovoltaic Applications", Inst. Phys. Conf. Ser. No, 152: Sec. B: Thin Film Growth and Characterization (1998), 345-348).
Recently pure metal sputtering targets were replaced by metal sulfide ones to avoid expansion effects during the sulfurization step. From the scientific literature H. Katagiri et al. are estimated to be the leading research group which was confirmed in 2005 (H. Katagiri, ibid. (2005)) by a notice by reference to H. Katagiri at al., "Solar Cell Without Environmental Pollution by Using CZTS Thin Films", Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, Osaka, 2874 (2003), that the so far highest reported efficiency value of 5.45% would have been reached in 2003.
Coatings of an alloy comprising copper, zinc and tin, having different atomic ratios, and which are produced by electrodeposition, have an outstanding corrosion resistance. Hence, these systems have gained attention as a replacement for nickel. However, most of the commercially available plating solutions contain free cyanide to maintain high stability of the plating composition used and a constant metal composition:
In U.S. Pat. No. 2,435,967 an electroplating bath for depositing a bright silvery alloy plate is disclosed, which is composed of 50% to 75% copper, 15% to 30% tin and 5% to 20% zinc. The bath comprises, in combination, an aqueous electrolyte composed of free cyanide, copper, tin, zinc, alkali metal hydroxide, an alkali metal carbonate and an anti-pitting and brightening agent composed of a betaine having at least one non-cyclic hydrocarbon radical which contains from 10 to 20 carbon atoms.
U.S. Pat. No. 2,530,967 discloses a method of electrodepositing bright silvery corrosion-resisting coatings of a ternary alloy composed of from 50% to 75% copper, 15% to 30% tin and 5% to 20% zinc. An aqueous solution for electroplating this alloy is used, this solution comprising free cyanide, copper, tin, zinc, alkali metal hydroxide and alkali metal carbonate.
Further, general literature information on basic bath compositions and on monitoring is summarized in Metals Handbook, American Society for Metals, 9th ed. (1993), USA. Reference to bronze plating and ternary alloys of copper and tin that are alloyed with other metals can be plated, but control of the plating process is considered so difficult that they have found very limited use. In general, plating compositions are used which contain excess free cyanide.
In 1971 G. F. Jacky examined electroplating of copper-tin-zinc alloys. Estimated contents of the deposited layers ranged from 55% to 60% copper, 20% to 30% tin and 10% to 20% zinc. An alkaline cyanide aqueous plating bath was used. (G. F. Jacky, "Electroplating a Copper-Tin-Zinc Alloy", Plating 58 (1971), 883-887). The high-performance of this coating system was outlined without giving any detailed information about long term stability or layer composition adjustment.
In 1985, the commercial system Optalloy® (trade mark of Collini-Flühmann, CH) was claimed to be more stable than competing bath systems. J. Cl. Puippe used this commercial bath to study influence of pulsed currents on alloy plating. Besides enhanced reproducibility and improved surface appearance, even adjustment of coating composition could be achieved while using pulse plating (J. Cl. Puippe, "Optalloy—eine elektrolytisch hergestellte Cu—Zn—Sn-Legierung", Galvanotechnik, 76 (1985), 536-441).
In the same year further reports about the commercial Cu—Zn—Sn application Optalloy® confirmed the predicted properties of this electrolyte system (R. Jurczok et at, "Anwendungstechnische Eigenschaften von galvanischen Kupfer-Zinn-Zink-Schichten in der Elektroindustrie", Metalloberfläche, 39 (1985), 201-203).
L. Picincu et al published an investigation about the deposition kinetics of the ternary alloy process in 2001 by using the cyanide containing commercial plating bath Sucoplate® (trade mark of Huber+Suhner AG, CH) (L. Picincu et al., "Electrochemistry of the SUCOPLATE® Electroplating Bath for the Deposition of Cu—Zn—Sn alloy; Part II: Influence of the Concentration of Bath Components", J. Appl. Electrochem., 31 (2001), 395-402). Alloy compositions were obtained ranging from 47% to 51% copper, 8% to 12% zinc and 38% to 43% tin. The electrolyte compositions used to plate these alloys are reported to contain cyanide.
All so far published copper-zinc-tin bath systems would require a fundamental optimization to achieve the metal ratios necessary for a CZTS solar cell precursor (Cu: 50 at.-%, Zn: 25 at.-%, Sn: 25 at.-%). Due to the very high toxicity of cyanide it would be more favourable to develop a non-cyanide plating system. This demand is not served from any known electrolyte.
On a first glance, scientific literature seems to offer several binary electrolytes (Cu/Sn; Cu/Zn; Sn/Zn). However, looking closer most of them cannot fulfil the demand of Cu2ZnSn stoichiometry.
There are just some patents on electrodeposition processes for CuZnSn without using cyanide as a complexing agent. It is known that pyrophosphate based electrolytes offer a high stability and good plating properties. Nevertheless, the low metal contents in the electrolytes described as well as the resulting alloy composition do not fulfil the demand of Cu2ZnSn stoichiometry.
JP 63-206494 A relates to bright copper-tin-zinc alloy electroplating baths free of cyano compounds. These baths comprise salts of Cu, Zn and Sn, alkali metal salts of pyrophosphoric acid and/or polyphosphoric acid, one or more hydroxycarboxilic acid and/or the salts thereof and one or more amino acids and/or the salts thereof. As an example an iron plate was electroplated in a bath consisting of copper pyrophoshate, zinc pyrophospate, potassium stannate, potassium pyrophosphate, sodium polyphosphate, sodium citrate and glycine at 35° C., pH 10.8 and at 0.3-5 A/dm2 cathodic current density to give a bright golden coating. However, the CuZnSn layer deposited does not exhibit the stoichiometry necessary for the use as thin film solar cells. The attempt to increase the tin and zinc content of the deposited layers causes precipitation of the electrolyte.
SU 1236010 A relates to an electrolyte for the deposition of coatings of copper-zinc-tin alloys, which comprises copper sulfate, zinc sulfate, tin sulfide and potassium pyrophosphate. The baths additionally contain polyvinylpyrrolidone. Deposition is performed at 20-40° C., 0.5-1.8 A/dm2 and pH 7-8.5. Tin content in the alloy deposited is 1-3 at.-%. These highly copper-rich deposits (72-90 at.-%) are used to produce structures of low friction for machine engineering devices. Such alloys are further taught to have low internal stress.
Further, K. Moriya et at, "Characterization of Cu2ZnSnS4, Thin Films Prepared by Photo-Chemical Deposition", Jap. J. Appl. Phys., 44 (1B9 (2005), 515-717, disclose the preparation of CZTS thin films by photo-chemical deposition. This method starts from an aqueous solution containing copper sulfate, zinc sulfate, tin(IV) sulfate and sodium thiosulfate. The solution is flown on a soda-lime glass substrate which is illuminated with Deep-UV light of 254 nm. The films deposited are annealed in an atmosphere of N2 at 200° C., 300° C. or 400° C. The films obtained are p-type semiconductors and show photoconductivity.
The segregation of secondary phases in the quaternary system copper-zinc-tin-sulfur due to non-stoichiometry has been studied by Th. M. Friedlmeier, "Multinary Compounds and Alloys for Thin-Film Solar Cells: Cu2ZnSnS4 and Cu(In,Ga)(S,Se)2", Fortschr.-Ber. VDI, Reihe 9, Nr. 340, VDI-Verlag, Dusseldorf (2001). These secondary phases are the ternary compound Cu2SnS3 (copper tin sulfide, CTS) and the binary sulfides sphalerite ZnS, chalcocite CuS, Cu1.8S, SnS and SnS2.
No other quaternary compounds have been reported in the kesterite system.
Cu2SnS3 has a cubic structure with lattice parameters similar to kesterite 5.445 Å, lattice mismatch: 0.37%). CIS forms a solid solution with CZTS, up to a total amount of more than 50 wt.-% of CTS in CZTS.
ZnS obviously has a structure and lattice parameters similar to kesterite, but no solid solution is reported in this case, ZnS segregates from CZTS, but the morphology of this segregation has not been studied: So, both grain boundaries precipitation and precipitation inside the grains of kesterite are possible.
Cu1.8S has a cubic structure with a lattice mismatch of 2.6% to kesterite, but the miscibility of both compounds has not been studied. Th. M. Friedlmeier presumes that copper sulfides Cu1.8S and CuS could precipitate at the grain boundaries or even inside the grains.
Tin sulfides SnS and SnS2 have an orthorhombic and hexagonal structure, respectively, with lattice constants too different from kesterite's for a solid solution to form. These phases are thus expected to segregate from kesterite.
The non-stoichiometry of elements in the kesterite would thus be accommodated as follows: excess of both elements copper and tin would result in a solid solution of Cu2SnS3; excess of copper only would result in segregation of copper sulfides CuS and Cu1.8S (with predominance of CuS when sulfurization is processed under S excess); excess of zinc would result in segregation of ZnS phase; and excess of tin only would result in precipitation of tin sulfide phases SnS and SnS2.
Owing to the complexity of the phase system on the one hand and to the difficulty to accurately analyse these phases within a thin film, the effect of the presence of secondary phases in the kesterite thin film on optical and electrical properties has not be investigated yet.
Nevertheless, copper sulfide is known to be highly conductive and may cause shunt paths through the absorber layer. The ternary compound CTS is also suspected to have the same effect, the solid solution CZTS-CTS being much more conductive than pure CZTS.

Metal plating composition and method for the deposition of copper—zinc—tin suitable for manufacturing thin film solar cell


A decrease in determination accuracy on filter trouble due to a decrease in detection accuracy of a PM sensor is restricted. A filter, a selective reduction type NOx catalyst provided on a downstream of the filter, the PM sensor detecting an amount of PM on a downstream of the selective reduction type NOx catalyst, and a removal section conducting a process for removing a reducing agent attached to the PM sensor in a case where at least one of conditions is satisfied that a temperature of the selective reduction type NOx catalyst is equal to or lower than a threshold, that a temperature of the exhaust is equal to or lower than a threshold, that a flow rate of the exhaust is equal to or higher than a threshold, and that an adsorption amount of the reducing agent in the selective reduction type NOx catalyst is equal to or larger than a threshold are included.

A technique (for example, see Patent Document 1) has been known that prohibits supply of an aqueous urea solution when an accumulation amount of intermediate products that are produced in a reaction from urea to ammonia in an exhaust passage reaches an upper limit amount in an exhaust purification device that supplies urea to a selective reduction type NOx catalyst (also simply referred to as "NOx catalyst" hereinafter). According to the technique, a reducing agent can be supplied to the NOx catalyst until the accumulation amount of the intermediate products in the exhaust passage reaches the upper limit amount.
Incidentally, a filter for collecting particulate matters (also simply referred to "PM" hereinafter) may be installed in the exhaust passage. In addition, a PM sensor that detects a PM amount in the exhaust is installed for determination on trouble of the filter. It may become difficult to accurately detect the PM amount when the intermediate products attach to an electrode or a cover of the PM sensor. This may decrease accuracy of a determination on filter trouble.

Exhaust purification device for internal combustion engine


In a pipeline process operation including a branching process unit 25 as one of process modules, this branching process unit 25 is provided with an input management unit 251 for managing an input condition, a branching information management unit 252 for managing information as to branching destinations, a buffer unit 253 whose upper storage limit can be designated, and a branching control unit 254 for controlling an entire branching process unit. The branching process unit 25 may execute an arbitrary number of branching process operations without having such a buffer for an entire image.

The present invention relates to an image processing apparatus and an image processing method, for processing digitized image data. More specifically, the present invention is directed to an image producing apparatus and an image producing method, capable of realizing various sorts of image processing functions by preparing a plurality of element/functional image processing modules and by combining these image processing modules with each other.
Techniques capable of providing various sorts of image processing functions by preparing a plurality of element/functional image processing modules and by combing these element/functional image processing modules and by combining thereof with each other are utilized in various systems capable of handling digital images, for example, document editors, drawing tools, image transfer apparatus, printers, and the like. Then, such image processing functions may be provided as image processing libraries in some cases. In the case of these image processing libraries, functions thereof may be utilized by linking the image processing libraries to application programs by which the image processing functions are wanted to be utilized.
In DTP (desk top publishing) systems capable of inputting images, and print systems capable of outputting images, various sorts of image processing operations are carried out with respect to images which should be processed. In these image processing operations, for instance, enlarging operations, reducing operations, rotating operations, affine transformations, color conversions, filtering processes, synthesizing operations, and the like are carried out. When these image processing operations are carried out, these image processing operations may be carried out by employing dedicated hardware in such a case that attributes, image processed contents, sequential orders, parameters of input images are fixed. However, for instance, in such a case that various types (different color spaces, and different bit numbers per bit) are entered, and/or sequential orders of image processed contents and parameters thereof are changed, these image processing operations must be carried out by properly employing image-processing arrangements having more flexible characteristics.
As means capable of satisfying such a requirement, several conventional techniques are proposed, by which desirable image processing operations can be carried out in flexible manners while programmable modules are connected to each other in pipeline modes and/or DAG (Directed Acyclic Graph) modes (for example, the Unexamined Japanese Patent Application Publication Nos. Hei5-260373 and Hei7-105020).
The Unexamined Japanese Patent Application Publication No. Hei5-260373 describes the digital picture signal processing apparatus capable of executing the high calculating process operation in high speeds by arranging this digital picture signal processing apparatus in such a manner that both the respective calculating process contents of a plurality of programmable calculating process units, and the connection modes of the respective programmable calculating process units by way of the network unit can be freely set via the host control means from the external unit. Thus, the digital picture signal processing apparatus may have high degrees of freedom with respect to changes in the functions and changes in the systems.
Further, the Unexamined Japanese Patent Application Publication No. Hei7-105020 describes the pipeline-formed image processing system capable of executing the image processing operation in the flexible manner, since the necessary functional modules are connected in the pipeline shape and initialized in the desirable sequence so as to execute the image processing operation. The operations of this pipeline-formed image processing system are carried out as follows.
In other words, when the connection of the necessary functional modules is completed, the acquisition of the header is requested with respect to the last-positioned functional module, if required. This request is sequentially traced through the connected modules, and is reached to the image input module located at the top, and the header information of the image to be read is returned. After each of the modules rewrites the information of the portion changed by the own module, this module transfers the rewritten information to the post-staged module. For instance, in such a case that a size of an input image is defined by (1000×1000) pixels, and a reducing process module capable of reducing the above-described image size into (500×500) pixels is contained in the processing pipeline, this reducing process module changes the size information (1000×1000 pixels) contained in the header information which is transferred from the pre-staged module into another size information (500×500 pixels), and, transfers this changed size information to the post-staged module.
While such an image processing operation is sequentially repeated, the last-positioned process module finally outputs to the external unit, the header information of the image which is outputted by this image processing pipeline. Next, the data processing operation is carried out based upon the acquired header information and the like. Similar to the header information processing operation, this data processing operation is performed in such a manner that when a constant amount of data is requested to be outputted with respect to the last-positioned module, this last-positioned module requires the pre-staged module to input such an image data required for this data processing operation. This request is traced back to the pre-staged module so as to be transferred to the image input module in a similar manner, the necessary image data is read out form the image input module, and, this read necessary image data is transferred to the post-staged process module. Then, while this image data is sequentially processed, the processed image data is finally outputted form the last-positioned process module.
When the above-explained image processing operation is carried out as to the final image, or the necessary image portion, since the processing pipeline is no longer required, the completion of the image processing operation is requested with respect to the last-positioned process module. Similar to the header information acquiring operation and the above-described process operation, this completion request is similarly traced back to the connections of these process modules, and thereafter, is reached to the frontmost image input module. Then, this image input module releases the resources employed in the process operation, and releases the own module, and returns the control to the post-staged module. This post-staged module to which the control is returned similarly performs such a process operation for releasing the resources and the own module, and further, returns this control to the post-staged module. At such a time instant when releasing of the resources/own module as to the last-positioned module is accomplished, all of the image processing operations are accomplished.
The above-described conventional technique described in the Unexamined Japanese Patent Application Publication No. Hei7-105020 implies that the simulation system for the multiple processing pipeline constructed by the single processor, which is utilized in such an operating system (OS) as UNIX (registered trademark), is applied to technical fields such as an image processing field. Then, more specifically, in this image processing field, since a single processing unit is limited to a portion of an image, for example, one line of an image is limited to be processed, each of the process modules can extremely reduce memory areas used to hold image-processed data.
As a result, this conventional technique can provide the low-cost image processing apparatus capable of executing the complex image processing operations with using the small memory capacity. Alternatively, in the case that such an image processing apparatus is operable on an operating system for supporting a virtual memory, since "swap out" caused by a shortage of memory capacity can be suppressed to a minimum value, this image processing apparatus can execute the image processing operation in a high speed.
Furthermore, as another conventional technique, the following image processing apparatus is proposed (see the Unexamined Japanese Patent Application Publication No. Hei8-272981). That is, for instance, in such a process operation that an entire input image is required in order to obtain 1 line of an output image, e.g., in a 90-degree rotating process operation, or in such a case of branching modules in which an input image is outputted to a plurality of process modules, when buffering of the entire image is ended, an ending process operation is carried out with respect to a pre-staged module. As a consequence, while a necessary memory resource can be suppressed to a minimum resource mount, the image can be processed in high speeds.
In the case that an image processing apparatus is arranged by which the desirable complex process operations can be carried out by combining the above-explained element/functional modules with each other in an arbitrary manner, as a very specific/important module, there is a branching module for outputting an input image to a plurality of processing modules. Although there are many process operations in which all of these process operations defined from an input process operation up to a final process operation may be carried out without executing a branching operation one time, such a branching module is required in the below-mentioned pipeline process operation.
For example, this pipeline process operation is realized in an adaptive filtering process operation in which filtering results obtained by executing a filtering process operation in different kernel sizes are compared with each other, and a filtering output is determined based upon this comparison result. Concretely speaking, as indicated in FIG. 12, while this process module contains an image input unit 111, an enlarging/reducing process unit 112, a color converting process unit 113, a branching process unit 114, filtering process units 115-1/115-2, and an output selecting unit 16, the adaptive filtering process operation is carried out with respect to image data which is stored in an image storage unit 100 and is to be processed.
In such a pipeline process operation, if the branching module is not used, as shown in FIG. 13, such a method is employed. That is, two sets of pipeline systems "A" and "B" are separately formed so as to perform the pipeline process operation, and a module for integrating these pipeline process results is formed. However, in the case of employing such an arrangement for separately forming the two pipeline systems, the completely same image input process, enlarging/reducing process, and color converting process operations are carried out two times respectively, as compared with such a case that the branching module of FIG. 12 is employed. As a result, large waste aspects will occur in view of resources/processing speeds.
Because of these reasons, the pipeline system constructed of the branching module, as indicated in FIG. 12, may constitute the effective method. The previously-explained Unexamined Japanese Patent Application Publication No. Hei7-105020 describes that branching of the pipeline system is performed, and/or the "fan-out" pipeline portion is present. However, detailed operations thereof are not described. Therefore, the following pipeline branching method is merely realized from the contents described in this publication. That is, while the entire image is buffered, the required intervening process results are merely outputted to the respective branching destinations.
Further, the above-described Unexamined Japanese Patent Application Publication No. Hei8-272981 discloses the following techniques. That is, by releasing the process module located at the pre-stage of the branching module, at least such a resource which has already become useless may be released. Also, while either the flag or the counter is employed which are used to check as to whether or not the processing operations are accomplished in all of a plurality of branched output destinations, if all of these process operations are accomplished, then the buffers and the like held by this branching module are released and the own branching module is released. However, as apparent from this operation explanation, the entire image corresponding to the intervening process results must be buffered in the branching module.
As previously described, although the branching module is very important in order that the arbitrary modules are combined with each other to realize the desirable complex process operation, the conventional techniques must buffer the entire image of the intervening process results obtained in the process modules up to the branching module, so that a large number of memories is necessarily required. As a result, this buffering necessity may cause one of factors for mitigating the merits of the pipeline type processing operation (including DAG type pipeline), namely highspeed processing operation can be carried out using a small number of memories.

Image processing apparatus and image processing method for processing digitized image data


Methods and devices for rhinoplasty and treating nasal valve stenosis are disclosed herein. The nasal valve acts as a flow-limiter and can contribute to airway obstruction if resistance within the nasal valve is excessive. In one embodiment, a system for treating nasal valve stenosis includes a first elongate implant and a second elongate implant configured to support the nasal valves when implanted. The implants can be coupled together by connecting elements, such as eyelets, tethers, complementary socket joints, and button-rivet supports.

1. Field of the Invention
Embodiments of the present invention disclose devices and methods for treating the collapse of structures within the nose that form the passageways for airflow during inhalation.
2. Description of the Related Art
The airflow resistance provided by the airways during breathing is essential for good pulmonary function. The nose is responsible for almost two thirds of this resistance. Most of this resistance occurs in the anterior part of the nose. This region is called the nasal valve, and it acts as a flow-limiter.
The nasal valve was originally described by Mink in 1903. It is divided into external and internal portions. The external nasal valve is formed by the columella, the nasal floor, and the nasal rim (or caudal border of the lower lateral cartilage). The nasalis muscle dilates this portion during inspiration. The internal nasal valve accounts for the larger part of the nasal resistance. It is located in the area of transition between the skin and respiratory epithelium, and it is usually the narrowest part of the nose. The internal nasal valve is the better-known valve and is often referred to as the nasal valve.
The two terms should be differentiated because the internal nasal valve or "nasal valve" accounts only for the aperture between the nasal septum and the caudal border of the upper lateral cartilage (ULC). The angle formed between them is normally between about 10°-15°.
The nasal valve area is formed by the nasal septum, the caudal border of the ULC, the head of the inferior turbinate, and the pyriform aperture and the tissues that surround it. This area is responsible for more than two thirds of the resistance produced by the nose.
In 1894, Franke performed nasal-flow experiments in models and cadavers and found that whirl formation occurred near the head of the turbinate during calm breathing. The term nasal valve was first coined by Mink in 1903. He developed this concept further in 1920, suggesting that the greatest area of resistance was in the limen nasi or the union of the lobular cartilage and ULCs.
In 1940, Uddstromer found that 70% of the resistance of the nose was produced in the nasal valve area and the remaining 30% was due to the nasal fossa. Van Dishoeck further investigated the mechanisms of the nasal valve in 1942, and in 1970, Bridger and Proctor wrote about a "flow-limiting segment" that included the limen nasi and the pyriform aperture. In 1972, Bachman and Legler found the pyriform aperture to have the smallest cross-sectional area of the nasal airway.
In 1983, Haight and Cole continued the study of Bridger and Proctor and demonstrated that the maximal nasal resistance was localized near the pyriform aperture and depended on engorgement of the head of the inferior turbinate.
As many as 13% of the patients with chronic nasal obstruction have nasal valve collapse. Of these patients, 88% have unilateral collapse.
External nasal valve collapse is often found in patients who do not have a history of trauma or surgery. These patients commonly have an overprojecting nose with extremely narrow nostrils. Another cause can be an extremely wide columella.
Types of internal nasal valve collapse can be differentiated depending on the structure that caused the collapse. In many cases, more than one structure is affected. The most common cause is probably septal deviation. The second cause is collapse secondary to rhinologic surgery, especially after removal of the nasal roof.
In 1987, Kasperbauer and Kern developed a comprehensive classification; however, the classification below depends on the anatomical area.
Deviations of the caudal septum are the most common cause of valvular collapse. They are usually secondary to trauma. The septum can be overly thick in the valvular area, decreasing the space in it. Also, an absence of cartilage in this area leaves a flaccid septum that moves during inspiration.
Thickened cartilage can compromise an adequate aperture. The cartilage can also be twisted, deflected, or associated with excessive return of the caudal border. An absence of cartilage, either congenital or iatrogenic, can produce a flaccid valve that collapses during inspiration.
Overresection during rhinoplasty can weaken the cartilage and cause inspiratory collapse. Deformation of the cartilage can be a result of trauma or congenital malformations of the cartilage.
Trauma or previous surgery can create webs or stenosis in the valvular area. The tissue can also be too thick, reducing the lumen of the valve. This can be a result of inflammation or hypertrophy.
Hypertrophy of the inferior turbinate can significantly increase nasal resistance. Several studies have demonstrated that the head of the turbinate is responsible for most of this increase. In comparison, the body and tail of the turbinate play minor roles in nasal resistance. The increase in size can be secondary only to mucosa or bone hypertrophy.
Although uncommon, some patients may have deformities of the pyriform aperture that reduce the space of the nasal valve. The first description the authors found of a congenital stenosis of the pyriform aperture was made by Brown et al in 1988; other reports have followed, such as Ramadan, 1995; Fornelli, 2000; and Lee, 2002. A more common cause of obstruction is the osteotomy made during a rhinoplasty. In particular, the type known as low-to-low is blamed for excessive narrowing of the pyriform aperture. Some modifications to this procedure allow an osteotomy to be performed without compromising the space in the valve.
Rhinoplastic procedures are particularly prone to disturbing the nasal valve area. Hump removal affects the nasal valve in several ways. If the hump is particularly large, separation of the ULC can be necessary. Resection of the T-shaped area of the dorsal border of the septum produces a narrower area in the roof. If the mucosa in the valve is not protected during the surgery, which occurred with the use of many older techniques, scarring of the valve can lead to structure formation or stenosis of the valve. In reduction rhinoplasties, the cross-sectional area of the overall nose is reduced. This increases the resistance to airflow. If the nasal valve is not properly repaired during the surgery, patients may report nasal obstruction after the surgery, even if this was not reported preoperatively. Overresection of the lower lateral cartilage can lead to pinching and inspiratory collapse.
Age is another factor to consider. The relaxation of tissues may eventually produce a flaccid valve. In these cases, surgery of the valve can correct the loss of patency.
The internal nasal valve works as a flow-limiting area. The fixed part of the valve is composed of the septum and the pyriform aperture. The ULC and the mucosa of the turbinate act as the mobile part. When air is inspired, it is forced through this narrow area, increasing its speed and pressure. Just after passing the valve, the air expands in the bony cavum, creating turbulence that promotes contact between the air and the mucosa. In this way, the inspired air is cleansed of particles, humidified, and heated or cooled (depending on its temperature).
Because it is the narrowest part of the nose, the nasal valve can be affected by minute alterations of the nasal anatomy that would not be important in other areas. The angle between the ULC and the nasal septum is typically between about 10°-15°. Internal nasal valve collapse occurs when, for some reason, this angle is diminished. The result is an increase in nasal resistance to airflow; consequently, the patient reports nasal obstruction. The opposite is known as ballooning. In this case, the nasal valve is excessively open.
The increase in nasal resistance is also related to abnormalities of pulmonary function. These changes in pulmonary function return to normal after septal surgery is performed and nasal resistance is decreased.
Patients primarily report nasal obstruction. Other symptoms are crusting and bleeding, but these are more often associated with septal deviation.
Diagnosis can be difficult if the physician does not visualize the valvular area. Examining the valve without disturbing it with a nasal speculum is important because the speculum usually opens the valve. Sometimes, trimming the vibrissae is necessary to obtain a clearer view of the valve. Another method is to use a 0° endoscope.
The Cottle test is useful to evaluate nasal valve stenosis. The cheek of the evaluated side is gently pulled laterally with 1-2 fingers, which opens the valve. The examiner then asks the patient to breathe and evaluates if breathing is better before or after pulling the cheek. A positive test result is when the patient feels less resistance with the valve opened. This test is easy and quick to perform.
The internal nasal valve is limited medially by the nasal septum. Laterally, in its superior part, it is limited by the caudal border of the ULC, where it forms the limen nasi with the cephalic border of the lobular cartilage. The angle between the septum and the ULC is generally between about 10°-15° in patients of Caucasian descent. Patients of other ethnic backgrounds can demonstrate great variability in this septum-ULC angle measurement. In this area, epithelium shifts from the skin of the vestibule to the respiratory mucosa of the bony cavum.
The pyriform aperture continues the limit of the valve from the ULC to the floor. The head of the inferior turbinate is immediately posterior to the pyriform aperture and plays an important role in the function of the valve, which is the reason it is also considered part of the internal nasal valve. In some patients, particularly white persons, the caudal border of the ULC scrolls externally in what is called the returning of the ULC. When this returning is excessive, it can produce valve collapse.
In addition to the typical reasons to avoid surgery (e.g., bleeding disorders), other contraindications include excessive scarring due to multiple previous surgeries, which may compromise the outcome of the procedure, the presence of cheloid scarring, and unrealistic patient expectations.
Imaging studies such as CT scanning of paranasal sinuses can be performed to, for example, obtain coronal views which can provide good information on the patency of the nasal valve, especially the area under the nasal dorsum (nasal valve area), which is sometimes difficult to visualize. However, these studies are expensive and should not be considered a substitute for comprehensive physical examinations.
Other diagnostic tests that can performed include rhinomanometry and acoustic rhinometry. Rhinomanometry aids in evaluating the airflow resistance offered by each cavity but does not provide information about the location of the obstruction. Acoustic rhinometry is relatively new, as it was introduced in the late 1980s, and it can provide information about the cross-sectional area of the nose and about the position of obstructions. Results from the anterior portion of the nose tend to be more accurate than results from the posterior portion, making this test particularly suitable for evaluating the valve. Acoustic rhinometry can be used to evaluate the symmetry of nasal areas.
The nasal valve is better explored without instruments because tools can open the valve and produce the false impression that the area is normal. A headlight and an endoscope are the only necessary instruments to examine the nasal valve. In many male patients (and some females), the vibrissae are thick, making direct visualization of the area difficult. If this occurs, one option is to trim them until the valve can be visualized.
The Cottle test is a good method to examine the vestibular portion of the nasal valve. It consists of pulling the nasolabial fold upward and laterally and asking the patient if breathing is better. An affirmative answer implies that a collapse of the valve is present on that side. A negative answer means the cause of the obstruction is elsewhere in the nose. A false-positive result can occur in patients with collapse of the nasal ala. False-negative results are observed in patients with scars or webs in the valve that prevent it from opening. False-negative results also occur in those with narrowing of the pyriform aperture secondary to congenital malformation or after an excessive narrowing of the nasal base with an osteotomy.
When the valvular collapse is secondary to inflammation of the mucosa covering the valve (e.g., secondary to allergic rhinitis or infection), proper treatment, such as anti-inflammatory agents or antibiotics, can help remedy the problem.
Collapse secondary to mechanical obstruction is more common. In this case, surgery is the only solution. Some patients use a self-adhesive stent that opens the nasal valve; however, this is only a temporary solution.
Several surgical techniques are used to correct a stenotic or collapsed nasal valve. Depending on the type of pathology, the surgeon can choose to use one or several methods. The scope of techniques varies from sutures to the application of grafts. The common goal is to open the valve, restoring the appropriate anatomy. Explaining each technique is beyond the scope of this article; however the following is a summary of these techniques depending on the structure modified.
A valvuloplasty is the surgery historically used to reconstruct the nasal valve. The goal of this surgery is to open the valve by removing the returning ULC and trimming the caudal border of the cartilage. It is not the only technique used to correct valvular alterations, but it provides an excellent view of the caudal border of the ULC and can be used in conjunction with other techniques. Because the valve is formed by several different structures, other techniques may be necessary, depending on the type of deformity that produced the stenosis.
The goal of this procedure is to expose the caudal border of the ULC to correct any deformity (e.g., resection of the caudal border of the ULC, excessive returning of the ULC). The following preliminary steps can be taken when performing this procedure: expose the caudal border of the ULC through an intercartilaginous incision, avoid damaging the valvular mucosa in order to decrease the risk of a synechia, and place intercartilaginous incisions 1-2 mm caudal to the border of the ULC. The area of transition from skin to respiratory epithelium is prone to developing unwanted scarring or synechiae. Then the following steps can be taken:
Undermine the skin over the dorsum.
To obtain better exposure, gently retract the alar margin of the nostril with a 10- or 12-mm double hook.
Grasp the caudal border of the ULC with an Adson-Brown or similar forceps.
Dissect the mucosa in the underside of the ULC with the tip of a Walter or curved Iris scissors.
Similarly separate the upper side of the ULC from the subcutaneous tissue until the caudal border is completely visible.
Repeat the same procedure if the dorsum is visible from both sides.
Almost any deformity of the ULC can be identified this way.
If a septoplasty or rhinoseptoplasty was performed and the caudal border of the septum was resected, resect a similar amount of the caudal border of the ULC. This maintains the proportions between the septum and the ULC.
Resection of the caudal border of the ULC reduces its flexibility. To maintain it, removing a small triangle near the septum may be necessary.
If another deformity is present, direct surgery to correct it. For example, if the ULC is twisted, a batten may be necessary to straighten it.
Spreader grafts can be inserted and fixed through this incision to increase the cross-sectional area of the nose.
When intercartilaginous incisions do not allow enough space to see and work because of the complexity of the stenosis, an open approach provides excellent exposure (i.e., when spreader grafts and flaring sutures are applied in the same procedure).
A dry field is important in this surgery because the space is limited and bleeding can obstruct the visual field and make the procedure time consuming. To avoid this, the cul-de-sac can be infiltrated 5-10 minutes prior to the incision. Apply only a small amount of lidocaine and epinephrine (Octocaine with epinephrine [2%], Xylocaine with epinephrine [2%]). Approximately 0.5 mL is needed in each valve to avoid distortion of the structures. Help from an assistant is invaluable.
Suturing of the intercartilaginous incision is performed at the end of the surgery, when all other maneuvers have been completed. Some prefer to use catgut or 4-0 Vicryl with ophthalmic needles. These small curved needles are easy to handle in the confined space of the vestibule.
Normal preoperative examinations can be performed, and no special care is required. The surgery is often performed in combination with septoplasty or rhinoseptoplasty. Local or general anesthesia can be used.
Because the valve is formed by several structures, the surgery is directed toward realigning the obstructing parts.
If a caudal deviation is causing the obstruction, a septoplasty can correct the problem. Septoplasty is a difficult surgery because caudal deviations are commonly complex deformities of the septal framework and obtaining a completely straight septum proves to be a frustrating task. In some cases, obtaining straight cartilage from the posterior septum and transplanting it is preferable. This is particularly true in those patients with horizontal fractures of the caudal septum (e.g., Chevallet fractures). The use of battens is sometimes necessary to keep the repaired septum straight.
The nasal roof can be excessively narrowed after rhinoplasty or with congenital or traumatic deformities. In these cases, the use of spreader grafts, as described by Sheen in 1984, is particularly useful. They keep the nasal profile straight, and they also increase the cross-sectional area of the entire nasal valve.
If the cartilage is thick or if excessive returning of the caudal border of the cartilage occurs, modification is possible by resecting the caudal border and reshaping the valve. This is commonly a surgery performed concomitantly with septoplasty. Also, the previously mentioned spreader grafts can modify the position of the cartilage, allowing the valve to open. In case the cartilage is absent, a graft can be fashioned from septal or auricular cartilage. Another method described to open the nasal valve is to apply a flaring suture that lifts the ULCs. A combination of both techniques has recently been reported to have the best results. The ULC can be sutured using several different techniques, including suspension sutures (Lee, 2001) and mattress sutures (Ozturan, 2002).
When the alar cartilage is weakened after surgical overresection or trauma, its rigidity must be restored. The basic method consists of applying a batten of cartilage to keep the lobule rigid during inspiration. A method described by O'Halloran in 2003 consists of the removal of excessive skin in the valvular area through an incision anterior to the LLC.
Although complete resection of the turbinate is best avoided, conservative resection (or manicuring) of the head of the turbinate significantly decreases the total resistance offered by the internal valve. This procedure, when performed properly, is a useful tool when the other areas are difficult to correct. Unless hypertrophy is extremely large, resecting more than 2 cm from the head typically is not necessary because the airflow follows a superior direction afterwards.
Narrow pyriform apertures should be handled depending on the origin of the constriction. Congenital pyriform stenosis can be produced from an excess of bone. This bone can be drilled away through a sublabial approach. If the stenosis was produced by an excessive narrowing of the nasal bones in a previous surgery, it can be handled with resection of a small wedge of bone in the narrowest area. Another approach is to displace the bones laterally (outfracture) after performing new osteotomies. In this case, performing medial and lateral osteotomies is recommended. If neither procedure is successful, conservative resection of the head of the inferior turbinate is an alternative plan. In many patients, more than one procedure is necessary to open the valve.
This situation is difficult to handle. Obstructive scarring is common after surgery. Resection of the synechia or scarring is performed with scissors. Because some synechia and scars are quite thick, a good method is to clamp the valve with a forceps for 5 minutes before the procedure in order to obtain better hemostasis. Good results have been obtained by separating both sides of the valve with a silicone sheet (Silastic). Because the author routinely uses silicone (Silastic) splints for septal surgery, the splint must simply be cut into a proper shape and size and then sutured to the septum with nylon 3-0 or 4-0 suture. A contralateral splint is recommended to avoid unnecessary damage to the mucosa.
Incisions can be closed with 4-0 catgut or Vicryl, preferably with ophthalmic needles to facilitate the closure. A typical dressing can be applied to the rest of the nose, depending on the surgery performed (e.g., dressing and cast for rhinoplasty).
The need for hospitalization following these types of procedures depends on the type of anesthesia used, the recovery of the patient, and the evaluation of the physician. Because the procedures are primarily performed in combination with septoplasty, the same care used following septoplasty is applicable for these procedures.
Thus, there remains an unmet need in the art for non-traumatic, non-surgical treatments for the collapse of structures within the nose that form the passageways for airflow.

Methods and devices for rhinoplasty and treating internal valve stenosis


An image forming apparatus includes: a document conveyance section for conveying a document of a document bundle to a document reading position; a reading section for reading the document in the document bundle to obtain image of the document; a designation section for designating to read a first document of the document bundle as a document with a tab; and a reading control section for controlling the reading section to read image for a whole document area of the first document including a tab potion, when designated by the designation section.

The present invention relates to an image forming apparatus and an image forming method.
Heretofore, there has been known an image forming apparatus dealing with a sheet having a tab. Such an image forming apparatus, specifically for example, is equipped with a sensor to discriminate between a document with tab and a normal document in Japanese Patent Publication Laid-Open No. HEI 9-258615. Thus, the cost of the image forming apparatus was disadvantageously increased due to the sensor equipped.
In order to cope with the above problem, for example, there has been proposed an image forming apparatus capable of handling a sheet having a tab without being equipped with the sensor by causing a document with a tab and a bundle of normal documents to be read separately in Japanese Patent Publication Laid-Open No. 2002-359720.
However, the above image forming apparatus as described in Japanese Patent Publication Laid-Open No. 2002-359720 cannot take advantage of a document conveyance mechanism provided in the image forming apparatus. More particularly, the apparatus cannot read at once the document with tab and a bundle of the normal documents sequentially in order of the documents, for example, first reading image data from the document with tab which has been set in the document conveyance mechanism, followed by reading image data from the normal document bundle which has been set in the document conveyance mechanism. Thus, there is a problem that work and time are required to sort the sheets with images formed thereon and thereby the image forming cannot be effectively carried out.

Image forming apparatus and image forming method capable of reading image data from document bundle including document with tab

Konica Minolta Business Technologies, Inc.


A human machine interface includes a capacitive touch screen having a capacitive sensor. The capacitive touch screen displays text characters and/or graphical information. A control device is rotatably coupled to a structure such that the control device is superimposed over the screen. The control device includes at least one electrically conductive element. The control device rotates about an axis substantially perpendicular to the screen such that the at least one electrically conductive element follows the rotation of the control device. The capacitive sensor senses a rotational position of the at least one electrically conductive element.

1. Field of the Invention
The present invention relates to capacitive touch screens, and, more particularly, to a control device that is applied to a capacitive touch screen.
2. Description of the Related Art
Current systems require discrete rotary encoders and additional support circuitry attached to a printed circuit board, and are not able to be located over the active display area without obstructing the display from view. This not only occupies valuable display area, but also limits design freedom and the ability to dynamically assign and label the control function.
Other inventions targeted toward the automotive industry include projection type displays and camera-based pattern recognition to decode the controls which have been overlaid on the display surface. However, these known approaches have significantly higher costs than the present invention, and have yet to be automotive qualified.

This patent is subject to a terminal disclaimer.

Panasonic Automotive Systems Company of America, Division of Panasonic Corporation of North America


A system for removing heat from an electronic component associated with an information handling system is disclosed. The system may comprise a mass providing a heat sink to the electronic component and a set of extended surfaces for transferring heat from the mass. The set of extended surfaces may define a primary flow direction for a cooling fluid. A first subset of the set of extended surfaces may have a first length measured in the primary flow direction. A second subset of the set of extended surfaces may have a second length measured in the primary flow direction. Each of the first and second subsets of extended surfaces may include one or more extended surfaces. The second subset of extended surfaces may be generally proximate the hotspot of the electronic component. The second length may be less than the first length such that the flow rate of the cooling fluid through the second subset of extended surfaces is greater than a flow rate of the cooling fluid through the first subset of extended surfaces.

As the value and use of information continues to increase, individuals and businesses seek additional ways to process and store information. One option available to users is information handling systems. An information handling system generally processes, compiles, stores, and/or communicates information or data for business, personal, or other purposes thereby allowing users to take advantage of the value of the information. Because technology and information handling needs and requirements vary between different users or applications, information handling systems may also vary regarding what information is handled, how the information is handled, how much information is processed, stored, or communicated, and how quickly and efficiently the information may be processed, stored, or communicated. The variations in information handling systems allow for information handling systems to be general or configured for a specific user or specific use such as financial transaction processing, airline reservations, enterprise data storage, or global communications. In addition, information handling systems may include a variety of hardware and software components that may be configured to process, store, and communicate information and may include one or more computer systems, data storage systems, and networking systems.
An information handling system may include one or more microprocessors or other electronic components configured to perform the functions of a central processing unit (CPU). One or more heat sinks may be associated with an electronic component to increase the effective thermal mass and heat dissipation associated with the component. Electronics designers and users may find that a better cooling rate allows increased operating speeds of the components so cooled. Some benefits of increased operating speeds may include, for example, an increase in how quickly and/or efficiently information may be processed, stored, and/or communicated.


A fuel cell device and method of forming the fuel cell device including a base portion, formed of a singular body, and having a major surface. At least one fuel cell membrane electrode assembly is formed on the major surface of the base portion. A fluid supply channel including a mixing chamber is defined in the base portion and communicating with the fuel cell membrane electrode assembly for supplying a fuel-bearing fluid to the membrane electrode assembly. An exhaust channel is defined in the base portion and communicating with the membrane electrode. A multi-dimensional fuel flow field is defined in the multi-layer base portion and in communication with the fluid supply channel, the membrane electrode assembly and the exhaust channel.

The present invention pertains to fuel cells, and more particularly to a direct methanol fuel cell including an integrated fuel flow field and a method of fabricating the device, in which even distribution of the fuel into the fuel cell is achieved during the process of generating electrical energy.
Fuel cells in general, are xe2x80x9cbattery replacementsxe2x80x9d, and like batteries, produce electricity through an electrochemical process without combustion. The electrochemical process utilized provides for the combining of protons with oxygen from air or as a pure gas. The process is accomplished utilizing a proton exchange membrane (PEM) sandwiched between two electrodes, namely an anode and a cathode. Fuel cells, as known, are a perpetual provider of electricity. Hydrogen is typically used as the fuel for producing the electricity and can be processed from methanol, natural gas, petroleum, or stored as pure hydrogen. Direct methanol fuel cells (DMFCs) utilize methanol, in a gaseous or liquid form as fuel, thus eliminating the need for expensive reforming operations. DMFCs provide for a simpler PEM cell system, lower weight, streamlined production, and thus lower costs.
In a standard DMFC, a dilute aqueous solution of methanol is fed as the fuel on the anode side (first electrode) and the cathode side (second electrode) is exposed to forced or ambient air (or 02). A Nafion(copyright) type proton conducting membrane typically separates the anode and the cathode sides. Several of these fuel cells can be connected in series or parallel depending on power requirements.
Typically, DMFC designs are large stacks with forced airflow operating at elevated temperatures of approximately 60-80xc2x0 C. Smaller air breathing DMFC designs require the miniaturization of all the system components and are thus more complicated. In conventional PEM fuel cells, stack connections are made between the fuel cell assemblies with conductive plates, having channels or grooves for gas distribution formed therein. A typical conventional fuel cell is comprised of an anode (H2 or methanol side) current collector, anode backing, membrane electrode assembly (MEA) (anode/ion conducting membrane/cathode), cathode backing, and cathode current collector. Typical open circuit voltage under load for a direct methanol fuel cell is approximately in the range of 0.3-0.5 V To obtain higher voltages, fuel cells are typically stacked in series (bi-polar mannerxe2x80x94positive to negative) one on top of another, or by connecting different cells in series in a planar arrangement. Conventional fuel cells can also be stacked in parallel (positive to positive) to obtain higher current, but generally, larger active areas are simply used instead.
During operation of a direct methanol fuel cell, a dilute aqueous methanol (usually 3-4% methanol) solution is used as the fuel on the anode side. If the methanol concentration is too high, then there is a methanol crossover problem that will reduce the efficiency of the fuel cell. If the methanol concentration is too low then there will not be enough fuel on the anode side for the fuel cell reaction to take place. Current DMFC designs are for larger stacks with forced airflow. The smaller air breathing DMFC designs are difficult to accomplish because of the complexity in miniaturizing all the required system components and integrating them in a small unit required for portable applications. Carrying the fuel in the form of a very dilute methanol mixture would require carrying a large quantity of fuel which is not practical for the design of a miniature power source for portable applications. Miniaturizing the DMFC system requires having on hand separate sources of methanol and water and mixing them in-situ for the fuel cell reaction. In addition, even distribution of the fuel onto the anode of the fuel cell is critical for optimum performance.
In the instance where a designated fuel flow is not present, the fuel flow will follow the path of least resistance to the fuel cell. This path of least resistance results in uneven distribution of the fuel to the anode. In addition, if an inefficient flow field is present, carbon dioxide by-products can accumulate in areas and prevent fuel from accessing the anode, or electrocatalyst. This results in back pressure which is formed due to the lack of means for exhausting of the carbon dioxide. To aid in supplying fuel, and more specifically methanol and water to the anode, it would be beneficial to form a fuel flow field that would provide for the even distribution of the fuel onto the anode, and more specifically onto the anode backing, and thus into the membrane electrode assembly (MEA). This provision for the equal distribution of the fuel would provide for optimum performance of the fuel cell device.
Accordingly, it is a purpose of the present invention to provide for a direct methanol fuel cell system design in which a fuel flow field is integrated into a miniaturized device.
It is a purpose of the present invention to provide for a direct methanol fuel cell including an integrated fuel flow field, comprised of microchannels, cavities, and microfluidics technology for the equal distribution of a fuel-bearing fluid to the anode of a fuel cell device.
It is still a further purpose of the present invention to provide for a direct methanol fuel cell including an integrated fuel flow field in which all of the system components are embedded inside a base portion, such as a ceramic base portion.
It is yet a further purpose of the present invention to provide for method of fabricating a direct methanol fuel cell including an integrated fuel flow field, comprised of microchannels, cavities, and microfluidics technology for the equal distribution of a fuel-bearing fluid to the anode of a fuel cell device.
The above problems and others are at least partially solved and the above purposes and others are realized in a fuel cell device and method of forming the fuel cell device including a base portion, formed of a singular body, and having a major surface. At least one membrane electrode assembly is formed on the major surface of the base portion. The base portion includes an integrated fuel flow field for the equal distribution of fuel to the membrane electrode assembly. A fluid supply channel is defined in the base portion and communicating with the fuel flow field and the at least one membrane electrode assembly for supplying a fuel-bearing fluid to the at least one membrane electrode assembly. An exhaust channel is defined in the base portion and communicating with the at least one membrane electrode assembly. The exhaust channel is spaced apart from the fluid supply channel for exhausting by-product fluid, including water, from the at least one membrane electrode assembly. The membrane electrode assembly and the cooperating fluid supply channel and cooperating exhaust channel forming a single fuel cell assembly.

Direct methanol fuel cell including integrated flow field and method of fabrication


A substrate is exposed to a plasma generated from a gas containing an impurity, thereby doping a surface portion of the substrate with the impurity and thus forming an impurity region. A predetermined plasma doping time is used, which is included within a time range over which a deposition rate on the substrate by the plasma is greater than 0 nm/min and less than or equal to 5 nm/min.

In recent years, there are increasing demands for miniaturizing semiconductor devices along with the increase in the degree of integration, functionality and speed thereof. Accordingly, there are increasing demands for realizing an ultra-shallow semiconductor region formed by implanting a substrate with an impurity. Under such circumstances, plasma doping has been drawing attention as a technique with which it is easier to form an ultra-shallow semiconductor region implanted with an impurity, as compared with ion implantation widely used in the prior art as a technique for implanting a substrate with an impurity. With plasma doping, by exposing a substrate directly to a plasma, it is possible to implant an impurity in the plasma into the substrate without drawing the impurity out of the plasma. Thus, not only impurity ions in the plasma, but also electrically neutral impurities such as radicals or gas constituent atoms or molecules (hereinafter referred to simply as a "gas") in the plasma can be implanted into the substrate in large quantities with a low energy. Therefore, as characteristics of plasma doping, it is widely known that
1. since the rate at which the impurity is implanted into the substrate is very high, the throughput is very high as compared with ion implantation; and
2. since the impurity implantation energy can be set very low, it is easy to implant an impurity into an ultra-shallow region.
By utilizing the first characteristic of plasma doping that the implantation rate is very high, an impurity can be implanted into the polysilicon gate with a very high throughput (see Shu Qin, Allen Mc Teer, Device Performance Evaluation of PMOS Devices Fabricated by B2H6 PIII/PLAD Process on Poly-Si Gate Doping, International Workshop on Junction Technology, p 68 (2006) (hereinafter referred to as "Non-Patent Document 1")).
It has been reported that by applying the second characteristic of plasma doping that the implantation energy can be set very low, in combination with the first characteristic, a source/drain extension region which is a region substantially thinner than the gate can be formed with a low resistance (see Y. Sasaki, et al., B2H6 Plasma Doping with "In-situ He Pre-amorphization", Symp. on VLSI Tech, p 180 (2004) (hereinafter referred to as "Non-Patent Document 2") and Nuclear Instruments and Methods in Physics Research B 237 p 41-45 (2005) (hereinafter referred to as "Non-Patent Document 3")).
Moreover, a technique has been recently proposed in the art which, in addition to realizing an ultra-shallow source/drain extension region with a low resistance, can control the uniformity in the impurity dose, which has been considered in the prior art as an important problem in putting into practice the formation of an ultra-shallow impurity region by plasma doping, as precisely as required for the source/drain extension region (see IIT(2006)524AIP866 (hereinafter referred to as "Non-Patent Document 4"), International Publication WO06/064772 pamphlet (hereinafter referred to as Patent Document 1″) and International Publication WO06/121131 pamphlet (hereinafter referred to as "Patent Document 2")).
With regard to the dose controllability, which is another important problem in putting into practice the formation of an ultra-shallow impurity region by plasma doping, a technique has been disclosed in the art for suppressing the deposition of electrically neutral impurities such as radicals and the gas on the substrate (see United States Patent Application Publication No. 2006/0099830 (hereinafter referred to as "Patent Document 3")). Patent Document 3 states that by measuring only the implantation dose of impurity ions with Faraday cups, it is possible to identify the dose and to thereby enhance the dose controllability.
As a technique that actively utilizes electrically neutral impurities such as radicals and the gas in plasma doping, a technique has been disclosed in the art in which a thin semiconductor film is formed on an insulative substrate, and then a thin impurity film is formed so as to be in contact with the thin semiconductor film, wherein the primary component of the thin impurity film is impurity atoms that can be electrically activated into carriers in the thin semiconductor film (see International Publication WO05/034221 pamphlet (hereinafter referred to as "Patent Document 4")).

Method for manufacturing semiconductor device


A faceplate assembly for an ostomy pouch system including an invertible stoma collar is provided. The invertible stoma collar protrudes toward a stoma and defines an inlet opening. The invertible stoma collar is formed from a flexible material having an elastic memory, such that the stoma collar hugs the stoma as the stoma is received through the inlet opening, and becomes inverted. The inverted stoma collar has a tendency to regain its original shape, and thus, applies sufficient pressure to seal around the stoma without strangulating the stoma.

The present disclosure relates to a faceplate for ostomy appliances, and more particularly to a faceplate assembly including a stoma collar.
An ostomy appliance or system is a medical device or prosthetic that provides a means for collecting waste from a stoma typically created as a result of a surgical procedure to divert a portion of the colon or small intestine. One type of ostomy appliance is a pouch that is attached to a user around the stoma or the peristomal area.
Two common types of ostomy pouch systems are available, a one-piece pouch system and a two-piece pouch system. In a one-piece pouch system, a pouch is permanently attached to a faceplate, which also includes a skin barrier on its opposite surface for attaching the pouch system to a user. The skin barrier is typically formed from a sealing material that can provide a seal between the user's skin and the pouch system. Thus, in such a one-piece pouch system, the entire pouch system including the faceplate and the skin barrier must be removed from the user when a user wants to replace a pouch.
A two-piece pouch system also includes a faceplate and a pouch. However, the pouch and the faceplate are two separate assemblies, and are not permanently attached to each other. Instead, a two-piece pouch system includes a pair of coupling rings, one of which is fixedly attached to a faceplate assembly, while the other is attached to a pouch assembly. The coupling rings are configured to mate with each other, such that the pouch assembly can be securely and removeably attached to the faceplate assembly by engaging the coupling rings together. In use, the faceplate assembly is first attached to a user via a skin barrier, and the pouch assembly is secured to the faceplate by engaging the coupling rings together. Thus, a two-piece pouch system allows a user to remove and replace a pouch without removing the faceplate that is adhered to the user's skin. This can help to reduce the discomfort and irritation associated with removing skin barrier adhesive or gel from the user's skin.
The faceplate includes an inlet opening to receive a stoma. Leakage of stoma effluent can weaken the seal between a skin barrier and the user's skin, and can irritate the peristomal skin and cause infection. Peristomal skin irritation and infection can be very difficult to cure. Thus, efforts have been made to provide a faceplate that can fit and seal around a stoma to reduce the risk of stoma effluent coming in contact with a skin barrier or user's skin. However, an effective seal around a stoma remains as an area for further developments. The present disclosure provides a faceplate assembly according to various embodiments to provide improved seal around a stoma to reduce the risk of stoma effluent coming in contact with a skin barrier or user's skin.

Ostomy faceplate including invertible stoma collar


An animal housing assembly includes a cage coupled to a base assembly to provide an enclosure for one or more animals to be kept in captivity. The cage is collapsible such that the cage may transition from an expanded state, wherein the cage may cooperate with the base assembly to form an enclosure for an animal, to a collapsed state, wherein portions of the cage may fold into one another into a compact condition. The base assembly may transition from an assembled state, wherein first and second base members are releasably coupled to one another to form the base assembly, to a disassembled state, wherein the first and second base members are separated from one another, thereby allowing a more compact condition.

Various types of pet or animal enclosures are used to accommodate, confine and/or transport pets or animals. Some current animal enclosures are formed having a rigid box shape and tend to be bulky, heavy and difficult to move from one location to another. More specifically, some current animal enclosures, particularly relatively large animal enclosures, are not able to be easily transported (e.g. stored in the trunk of a typical family vehicle). As such, a large vehicle, such as a truck or utility vehicle, may be required to transport animal enclosures, or the animal has to be left behind.
More recently, some foldable/collapsible animal enclosures have been introduced into the market place which may allow the enclosure to be disassembled into smaller, separate components. However, current collapsible animal enclosures tend to be bulky, of relatively high weight, difficult to move from one location to another, and more importantly, not sufficiently foldable/collapsible for ease of storage and transport. Additionally, some current collapsible animal enclosures require tools (e.g. a screw driver, a hammer, etc.) to assemble or dissemble the enclosures, which presents obvious drawbacks to the end user.
In short, current animal enclosures may be difficult to construct, take up valuable space in distribution and at retail outlets, difficult to transport for the distributor and retailer, difficult for consumers to transport home or to different locations, and difficult for consumers to store when not in use.


Systems and methods for managing frame rates during multimedia playback are described herein. The ideal playback timing associated with video data is determined. If an actual playback timing of the video data lags the ideal playback timing, a frame rate associated with the video data is varied using a smoothing function to recover toward the ideal playback timing. An iterative frame-dropping algorithm is applied to vary the frame rate in accordance with the smoothing function. The smoothing function incorporates as a variable an average delay associated with playback of frames in the video data.

Today's computers are versatile machines capable of performing many tasks that traditionally require many separate machines. For example, general purpose personal computers are increasingly being used for playing back multimedia data, which usually require dedicated video viewing electronics, such as VCD players, DVD players, and the like. Multimedia data are often compressed for ease of transmission and storage. Substantial processing power and memory capabilities are required to decompress and render multimedia data. These requirements for multimedia playback can be taxing even for powerful personal computers.
Multimedia playback is a familiar and desirable feature of today's small handheld computers and other portable consumer electronic devices. The design of these computers places priorities on portability and economy. These priorities often result in reductions in processing power and memory capacity. Also, many of today's portable consumer electronic devices, including handheld computers, typically lack hardware audio/video acceleration. As a result, handheld computers and other portable consumer electronic devices typically offer a small fraction of the multimedia playback capabilities possessed by a typical personal computer. Still, users are increasingly demanding and expecting their portable consumer electronic devices to playback the same multimedia data that can be handled by their more powerful personal computers.
The current trends of multimedia data are to use higher frame rates and resolution to increase the quality of the playback while using more aggressive video compression methods to maintain reasonable requirements for transmission and storage of the data. Achieving smooth playback of computationally intensive multimedia data is challenging on a computer having insufficient processing power. Conventional audio/video synchronization methods do not deal adequately with this problem. In fact, these conventional methods tend to degrade the quality of the multimedia playback by dropping frames at the most inopportune moments, such as when the viewer's full attention is attracted by quick action or scene changes.
Thus, there is a need for a system that enables multimedia playback on computers with limited processing power without substantially degrading the quality of the playback.


A container includes a chamber for containing fluid. At least one sensor is disposed within the chamber for sensing a property of fluid in the container. A unit that receives a signal from the sensor communicates with a device that displays the property of the fluid in the container. The container may include first and second chambers. A first sensor is disposed within the first chamber. The first sensor is in contact with fluid in the first chamber. The first sensor senses a volume of fluid in the first chamber. A second sensor is disposed within the second chamber. The second sensor is in contact with fluid in the second chamber. The second sensor senses a volume of fluid in the second chamber. A diverter may direct fluid from an inlet to a bottom portion of the chamber and prevents the fluid from contacting the sensor. A releasable device may prevent fluid from flowing from the first chamber to the second chamber. The releasable device permits fluid to flow from the first chamber into the second chamber upon release of the releasable device. An element of the sensor may have a first portion with an electrical resistance per unit length greater than an electrical resistance per unit length of a second portion of the element. A shunt resistor extending between lower portions of first and second elements of the sensor may have a resistance equal to approximately 0.08 times a resistance of the sensor when the chamber is empty.

For a variety of reasons, it is desirable to supply fluids, such as electrolytes, to a patient or to collect physiological fluids from a patient in various settings including hospitals, nursing homes, private homes, or wheel chairs. For example, there are many instances of patient treatment where it is necessary to collect and determine, at all times, the accurate amount of expelled body fluids, such as urine, that is being released by the patient. It is, in fact, conventional in hospitals to collect urine from certain patients to measure and monitor urine output over time. This is routinely done for post-operative patients as well as those with urology disorders where, for example, urine output is directly related to renal function. This type of procedure for collecting, measuring and monitoring urine takes on added importance in some cases because sudden changes in urine flow, which can occur at any time, can indicate that there is a deteriorating clinical condition in the patient. Changes in urine output have also been correlated with changes in cardiac output.
The collection of urine and measurement of urine output (i.e., volume per unit time) are typically accomplished by first catheterizing the patient. In this procedure, the catheter is passed through the urethra of the patient into the bladder. The other end of the catheter is connected to a rigid collection container or a flexible vinyl drainage bag through a length of flexible tubing attached to a barbed fluid inlet port on the container. Typically the container is supported below the patient and from the patient's bed or other support system, such as a wheel chair, and urine drains by gravity from the patient through the flexible tubing and into the collection device. For patients who are mobile, this collection device is called a leg bag (flexible container), and for patients in a hospital bed it is called a urine collection device (flexible or rigid container). Hospital bed containers are usually 2,000 ml in capacity and leg bags are typically 1,000 ml, 800 ml, 700 ml, or even smaller. The measurement of container fill volume and urine output are typically accomplished by periodically draining the contents of the container into a graduated cylinder and manually recording the volume collected and the time it was collected. The urine output is then manually calculated and manually entered into the patient's record.
In addition to monitoring urine output as a function of time, the caregiver must monitor the collection container total volume to make sure it does not fill to capacity. This event can occur at unpredicted intervals and someone must empty the container before it can fill once again with urine. Further, patients can sometimes obstruct the flow of urine into the container by lying on and possibly crimping the drain tube. In this case, no urine appears in the container after an expected time period. Both a filled container and blocked input tube can cause urine backup into the bladder and a backup condition can have a deleterious effect on the patient's health. Also, the urine can spill onto the patient's bed linen and potentially cause/worsen various skin problems associated with being bedridden. For all the above reasons, caregivers must monitor the fill level in the collection container over time to make sure it does not overfill or is not properly filling. This manual process is time consuming (i.e., costly) and could also lead to problems associated with handling of urine, which is a biohazard.
U.S. Patent Publication No. 2006/0229515 describes a device for continuously and automatically monitoring the fluid level in collection and delivery containers. A disposable sensor is placed inside the container to measure fluid fill level. A reusable electronic device is attached to the outside of the container to continuously record sensor changes and to wirelessly transmit fill level information to external receiver/data processor/display devices. A connection device through the container wall allows the external electronic device to interface with the internal sensor. The device helps save time, minimize urine backup and also reduce the amount of caregiver-patient urine contact.
An advantage of the device described in U.S. Patent Publication No. 2006/0229515 is that the container could have a variable cross-sectional area typical of flexible, low-cost vinyl bags used in the medical industry. It is desirable to improve the accuracy of fluid level measurements, especially for urine collection devices used in the hospital's intensive care unit (ICU) where accurate initial urine flow rates are considered much more important. It is also desirable to improve measurement accuracy at low container fill volumes.