A navigation system (10) comprising a portable navigational device (12) and a remote control for remotely controlling the navigational device (12) is provided in a first preferred embodiment. The navigational device (12) is sized and configured to mount on a dashboard or in an overhead console of a vehicle. A second preferred embodiment provides a navigational device (212) substantially similar to the navigational device (12) of the first preferred embodiment and further including an internal hard drive (84) and a heating element (86) associated with the hard drive (84) and operable to warm the hard drive (84) for facilitating operating performance of the hard drive (84) in cold temperatures. A third preferred embodiment provides a navigation system (310) including a navigational device (312) substantially similar to the navigational device (212) of the second preferred embodiment and a remote control (314) substantially similar to the remote control (14) of the first preferred embodiment.

1. Field of the Invention
The present invention relates to portable electronic devices. More particularly, the invention relates to a navigation system comprising a portable navigational device and a remote control operable to remotely control the navigational device. One embodiment of the navigational device includes an internal hard drive for storing cartographic data or other navigation-related data and a heating element associated with the hard drive and operable to warm the hard drive for improving its performance.
2. Description of the Prior Art
Portable navigational devices for use in vehicles are well known. Such a navigational device may be mounted on a vehicle dashboard or in an overhead console. The navigational device is operable to provide navigation instructions to a user, both audibly using a speaker or visually using a display mounted on a front of the navigational device. The navigational device often includes a plurality of control buttons mounted on the device for controlling and instructing the navigational device. Alternatively, the display of the navigational device is a touch screen display operable to control the navigational device.
The navigational device is frequently used by a driver of the vehicle while in route to a location. As such, the driver is operating the vehicle while also controlling and instructing the navigational device. As can be appreciated, control of the navigational device, just as with control of a mobile telephone or other similarly distracting device, can be dangerous if not carefully used during operation of the vehicle.
Placement of the navigational device within the vehicle is usually for the benefit and use of the driver and is without regard to use by passengers of the vehicle. As such, the navigational device is often put within the driver's reach and thus, is difficult to reach by the passenger, especially if the passenger is in a backseat of the vehicle. Even if the passenger is in a front seat of the vehicle, the passenger may be restrained from reaching towards the middle of the vehicle and towards the dashboard or overhead console by a seat belt. Therefore, use of the navigational device while driving is often minimized due to the difficulty in operating the navigational device while the vehicle is moving. Unfortunately, the navigational device is often most needed while driving, such as when using the navigational device for driving directions.
Accordingly, there is a need for an improved navigational device that overcomes the limitations of the prior art. More particularly, there is a need for a navigation system comprising a navigational device and a remote control for remotely controlling the navigational device. The remote controlled navigational device may then be used in small or restricted quarters, such as in a vehicle, where manual control of the navigational device is difficult or unsafe.
Portable navigational devices also often include internal memory and/or a memory slot for receiving a memory cartridge having cartographic data stored thereon. The internal memory can only store a small amount of cartographic data, and the memory cartridge is commonly preprogrammed with cartographic data for a certain region or use. However, because the amount of possible cartographic data for use with a navigational device can be extremely large, prior art navigational devices do not contain sufficient memory for storing all cartographic data stored thereon. Consequently, users of the navigational devices are required to buy additional memory cartridges having the preprogrammed cartographic data stored thereon or, alternatively, program the memory or memory cartridge with new data.
To remedy the problems of limited storage capacity, some navigational devices now include internal hard drives operable to store a much larger amount of cartographic data. Unfortunately, operation of the hard drives is often slowed by the temperature conditions where the navigational devices are commonly used. For example, navigational devices are often used in outdoor activities where the weather is cold. As is well known, the performance of the hard drives is affected by the cold temperatures, thus causing the hard drives to operate slowly and inefficiently.
Accordingly, there is a need for an improved navigational device that overcomes the limitations of the prior art. More particularly, there is a need for a navigational device having an internal hard drive operable to perform quickly, even in cold temperatures.

Portable navigational device with a remote control, an internal memory, and internal heating element


A reciprocating positive displacement compressor is described having an intake or exhaust valve provided with a deformable seal means, such as a Belleville spring, that makes edge or area contact with a valve seat in the closed condition of the valve, is described.

I. Field of the Invention
The present invention relates to an improved check valve for use in positive displacement compressors and in other applications requiring pressure actuated, unhindered flow in one direction and rapid and complete blockage of flow in the opposite direction. In positive displacement compressors, these valves control the flow of gas into and out of the compression chamber and are usually called suction and discharge valves.
II Prior Art
Conventional suction and discharge valves are pressure actuated, spring loaded check valves containing one or more valve flow control elements. These elements cover flow passages in the valve structure when shut, preventing back flow. When a pressure differential is established in the direction of intended flow, the pressure differential lifts the elements from the flow passage, permitting flow therethrough. Valve spring force is slight and exerts little influence on valve opening.
Various types of valve flow control elements are known for use in compressor valves in common use. A partial list includes: plate, poppet, reed and strip elements. Regardless of type, when the valve is closed, the area of the flow control element exposed to the upstream gas pressure is smaller than the flow control element area exposed to the downstream pressure. This is so because only that portion of the upstream side of the flow control element facing into the flow passage is in contact with the upstream gas. The remaining upstream surface area of the flow control element is in contact with the valve structure adjacent to the flow passage. This area of contact forms the seal to prevent back flow and provides mechanical support for the flow control element when an opposite pressure differential in the direction of the downstream face is present. The whole of the downstream face is exposed to the downstream pressure when the valve is shut. Opening of these pressure actuated valves occurs when the force of the upstream gas pressure operating on the smaller upstream exposed area of the flow control element exceeds the force of the downstream pressure operating on the whole downstream area of the flow control element. The opening pressure differential of such compressor valves therefore depends primarily on the operating pressure of the compressor.
An opening pressure differential of approximately ten percent of the upstream pressure is typically observed with conventional compressor valves. The large pressure imbalance present upon opening causes a high initial flow velocity through the valve. The Bernoulli flow formula predicts a velocity of thirty-eight percent of the speed of sound with a ten percent pressure drop. The almost explosive initial flow causes abrupt pressure changes within the compression chamber and adjacent gas passages that triggers the intense pressure oscillations which can be detected throughout the suction and discharge events. These pressure oscillations increase the work of compression. Also, the variations in gas density associated with the pressure oscillations and their phase angle at valve closing have an effect on the amount of gas delivered. The differential area relationship of the conventional compressor valve thus adversely influences two aspects of compressor performance, mechanical efficiency and predictability or consistency of throughput.


An electrical power plug or receptacle with an over-temperature protection function, including a reset switch operated by a solenoid that electrically connects and disconnects the input side and output side electrical lines, and an temperature-controlled switch disposed in thermal contact with one or more electrical conductor plates on the input or output side. The temperature-controlled switch is connected in series with the solenoid between the output side phase and neutral lines. When the temperature of the temperature-controlled switch is within a normal range, the switch is open and does not form a current path with the solenoid. When the temperature is at or above a threshold temperature, the temperature-controlled switch is closed, a current flows through the switch and the solenoid between the output side phase and neutral lines, and the solenoid operates the reset switch to disconnect the input side from the output side.

Field of the Invention
This invention relates to electrical power plugs and receptacles, and in particular, it relates to power plugs and receptacles that have a protection devices coupled to the conductor plates of the plug and receptacle.
Description of the Related Art
Electrical power plugs and receptacles are widely used in everyday life for connecting to electrical appliances. The electrical contact components such as plates or plates of plugs and receptacles are typically made of copper alloys, and their exterior housings use plastic materials for insulation. Typically, the receptacle is mounted in the wall, and the plug is connected to an appliance or another board having multiple receptacles. During long term use, the contact plates of the receptacle may lose their resilience so the contact between the contact plates of the receptacle and the plug may be affected, the receptacle or plug may be affected by humidity, or over-current conditions may occur during use. In certain conditions, the copper alloy plates may generate a high temperature, which may melt the insulating housing of the receptacle and cause fire. Similarly, in over-load conditions, the copper alloy plates of the receptacles can generate a high temperature, and the contact plates of the plug are also at high temperature, which may melt the insulating housing of the plug and cause fire and damage.

Power plug and power receptacle with over-temperature protection function


A process is described for the formation of a color image on a substrate comprising the steps of:. a) providing a donor element comprising element comprises a carrier substrate, color containing photohardenable layer, and photopolymerizable adhesive layer in which the unexposed photopolymer has a viscosity at 25.degree. C. of less than 100,000 cps, PA1 b) adhering said photopolymer adhesive layer to a first substrate, PA1 c) irradiating said photopolymer adhesive in an imagewise distribution of radiation to polymerize said adhesive in an imagewise distribution, and PA1 d) stripping said element from said first substrate leaving an imagewise distribution of said color containing layer secured to said substrate. This process can be used to form any type of color image and is particularly useful in the formation of color proofs. Both positive and negative images can be provided, a positive image on the element and a negative image on the substrate.

1. Field of the Invention
The present invention relates to the formation of color images and sets of color images which may be high contrast images including black images on substrates by dry peal-apart imaging processes. Of particular importance to the practice of the present invention is the fabrication of a three or four color image (cyan, yellow, magenta and optional black) on a transparent substrate, particularly in a process for generating a pre-press color proofing image for the printing industry.
2. Background of the Art
In color reproduction, the color accuracy of graphic art color separation negatives are generally verified using color proofing systems prior to making the corresponding printing plates. The color proofing systems must provide a consistent representation of the final color print. It is well known in the art that the halftone dot retention plays a significant role in the color rendition of the final image. Slight changes in the dot reproduction curve can cause significant changes in visual color perception.
Several different types of color proofing systems are well known in the literature. Both digital and conventional proofing systems are available commercially. In digital systems, digitized data is used to directly image the color proofing materials. However, conventional proofing systems are primarily used when verifying the color accuracy of graphic art color separation films. Conventional color proofing systems consist of two types: overlay and surprint.
Overlay systems provide a convenient and quick way to visualize a representative color on a transparent substrate. A typical overlay film construction includes a polyester substrate and photosensitive color layer. Optional protective layers may also be included over the surface of the photosensitive color layer. A color proof is constructed by individually imaging and developing each representative color proofing film. The color imaged films are then laid upon each other in register on a paper stock. Even though this method provides a very simple way of combining two or more colors in registration, it has several inherent disadvantages. The multiplicity of plastic sheets cause incident light to internally reflect which imparts a gloss, color hue shift and a distortion of the final image. Antireflection coatings improve the visual perception of the proof; however, the presence of the thick polyester between each colored image still causes visual distortion of the final image. Examples of these types of constructions may be generally found in U.S. Pat. Nos. 3,136,637; 4,304,836; 4,482,625; 4,634,652; 4,748,101; 4,952,482; and 5,258,261.
A surprint proof is generated by successively superimposing different colored layers upon each other on a single sheet. The surprint color proofing materials are composed of two primary types: photosensitive precolored sheets and photosensitive colorless sheets whose latent image may be toned with pigments, inks or dyes. Some examples of post-colored proofing materials may be found in U.S. Pat. Nos. 3,060,024; 3,634,087; and DE 3,336,431. In the photopolymer systems the image is generally weak and often requires a protective layer. The resultant color hue is also very user dependent due to the dependency upon color density control, lot to lot variation the colorants and dusting of the toners causing color contamination. The electrostatic systems require more sophisticated equipment and environmental control which can be very expensive.
Another example of a precolored proofing system includes photosensitive constructions that are imaged prior to lamination to the receptor or intermediate sheet. Representative examples of these types of systems are described in U.S. Pat. Nos. 4,482,625 and 4,304,836. These systems require the imaged films to be laminated in register which is dependent upon laminating speed and temperature, and dimensional stability of the film and receptor. The accuracy of the registration is limited to smaller format proofs due to the difficulty in retaining perfect alignment of images during the thermal lamination process. Even though the exposure times may be shorter in these systems, productivity is lost due to the difficulties in producing several small proofs on a single large sheet known as scatter proofing.
U.S. Pat. No. 3,671,236 describes a negative acting presensitized color proofing element comprising a carrier sheet having a smooth release surface, a diazo sensitized color layer and a non-photoactive barrier layer upon which may be coated a pressure sensitive adhesive or a thermal adhesive as described in U.S. Pat. No. 4,656,114. The developing media for this system is a 50:50 mixture of n-propanol and water. The barrier layer is present as a carrier for the image and to reduce interaction between the adhesive and the photoactive layer. U.S. Pat. Nos. 4,650,738; 4,751,166; 4,808,508; 4,929,532; and 5,008,174; EP 365,356 and EP 365,357 patent applications describe improvements on this construction by eliminating the need for a barrier layer between the diazo based photoactive layer and the adhesive. The developer used in these systems are aqueous alkali solutions containing greater than 3% surfactant.
U.S. Pat. No. 4,596,757 discloses a further improvement on the construction described in U.S. Pat. No. 3,671,236 by utilizing a photo monomer system in place of the diazonium binders. Again an aqueous alkali developer is used which contains high concentrations of a surfactant (the example cited used 8.5%).
U.S. Pat. No. 5,248,583 describes a construction which utilizes a photoactive color layer containing a photo-oligomer as the photopolymerizable component and a photopolymerizable barrier layer to provide a proofing element that can be developed in a low solids aqueous developer having a pH of 10.2. This construction allows one to develop the image using a more environmentally compatible effluent since the aqueous developer contains less caustic and less ingredients than those used in the previously described systems.
To achieve a system that is developable in a developing solution having a more neutral pH, the binders used in the photosensitive proofing formulation typically make the image more susceptible to attack by the developer. When the resistively developable image is swelled or attacked by the developer it becomes increasingly more difficult to hold the highlight dots (0.5-10% halftone dots) without sacrificing the shadow areas (90-99.5% halftone dots). The shadow areas are sacrificed when the photosensitive layer is overexposed to achieve sufficient cross-link density in the highlight dots to resist developer attack. However, when a photosensitive layer is overexposed, the shadow areas begin to fill-in due to halation effects. This over-exposure also increases the overall dot gain, which significantly affects the color rendition. Therefore, there exists a need for a proofing system that maintains highlight halftone dots without over-exposure and is provided by thermal laser induced imaging processes which do not require adhesive layers on the donor elements.
One method of making colored images upon a non-photosensitive base uses laser induced colorant transfer or laser induced mask production. A donor element is induced (as by ablative levels of radiation) to transfer donor color material to a receptor surface. The donor may contain radiation or thermally sensitive materials to enhance the efficiency of transfer, or the donor material may be ablated without additional materials. Examples of this type of imaging process includes U.S. Pat. Nos. 5,156,938, 5,171,650, 5,256,506, and 5,089,372. The first three patents generally refer to producing a pattern of intelligence.
U.S. Pat. No. 5,171,650 discloses methods and materials for thermal imaging using an "ablation-transfer" technique. The donor element for that imaging process comprises a support, an intermediate dynamic release layer, and an ablative carrier topcoat. The topcoat carries the colorant. The dynamic release layer may also contain infrared-absorbing (light to heat conversion) dyes or pigments. The pigments also include black copper as an additive. Nitrocellulose is disclosed as a possible binder.
Copending U.S. application Ser. No. 07/855,799 discloses ablative imaging elements comprising a substrate coated on a portion thereof with an energy sensitive layer comprising a glycidyl azide polymer in combination with a radiation absorber. Demonstrated imaging sources included infrared, visible, and ultraviolet lasers. Solid state lasers were disclosed as exposure sources, although laser diodes were not specifically mentioned. This application is primarily concerned with the formation of relief printing plates and lithographic plates by ablation of the energy sensitive layer. No specific mention of utility for thermal mass transfer was made.
U.S. Pat. No. 5,308,737 discloses the use of black metal layers on polymeric substrates with gas-producing polymer layers which generate relatively high volumes of gas when irradiated. The black metal (e.g., aluminum) absorbs the radiation efficiently and converts it to heat for the gas-generating materials. It is observed in the examples that in some cases the black metal was eliminated from the substrate, leaving a positive image on the substrate.
U.S. Pat. No. 5,278,023 discloses laser-addressable thermal transfer materials for producing color proofs, printing plates, films, printed circuit boards, and other media. The materials contain a substrate coated thereon with a propellant layer wherein the propellant layer contains a material capable of producing nitrogen (N.sub.2) gas at a temperature of preferably less than about 300.degree. C.; a radiation absorber; and a thermal mass transfer material. The thermal mass transfer material may be incorporated into the propellant layer or in an additional layer coated onto the propellant layer. The radiation absorber may be employed in one of the above-disclosed layers or in a separate layer in order to achieve localized heating with an electromagnetic energy source, such as a laser. Upon laser induced heating, the transfer material is propelled to the receptor by the rapid expansion of gas. The thermal mass transfer material may contain, for example, pigments, toner particles, resins, metal particles, monomers, polymers, dyes, or combinations thereof. Also disclosed is a process for forming an image as well as an imaged article made thereby.
A series of patents (U.S. Pat. Nos. 4,965,242, 4,962,081, 4,975,410, 4,923,860, 5,073,534, and 5,166,126) have been assigned to Kodak disclosing the use of thermal dye diffusion transfer to make filter elements and color filter constructions. U.S. Pat. Nos. 4,965,242 and 5,073,534 teach the use of high T.sub.g polycarbonate and polyester receiving layers to accept the thermally transferred dye. With both receiving layers, a vaporous solvent treatment is required to drive the dye into the receiving layer.
WO 96/10215 (PCT/EP95/03423) describes a method for the formation of a negative color image comprising the following steps in order:
(A) providing a photosensitive element comprising a transparent support, a subbing layer, a photosensitive layer comprising (polymeric binder, colorant, photoinitiator system, and photopolymerizable ethylenically unsaturated monomer, with the weight ration of monomer/binder being at least 4:1), and an adhesive layer comprising a thermoplastic polymer with a Tg between 20.degree. C. and 100.degree. C., PA1 (B) either (i) providing a receiver base and laminating the receiver base at elevated temperature to the adhesive layer and then imagewise exposing the photosensitive layer, or (ii) imagewise exposing said photosensitive element to actinic radiation, and then providing a receiver base and laminating the receiver base at elevated temperature to the adhesive layer, PA1 (C) peeling apart said transparent layer and said receiver base whereby the adhesive layer and the imagewise exposed areas of said photosensitive layer are transferred to the receiver base. Steps (A) through (C) may be repeated to provide multicolor images. PA1 a) a carrier layer, b) a pigmented color photohardenable layer (referred to herein as the "color" layer), c) a photopolymeric adhesive layer (referred to herein as an "Adhesive" layer), and an optionally preferred strippable liner layer. The viscosity of the unexposed photopolymer adhesive layer must be below 100,000 cps at 25.degree. C. to avoid premature delamination of the color layer from the carrier layer.
WO 96/10216 shows processes similar to those of WO 96/10215 except that by control of the monomer to binder ratio, either positive or negative images may be transferred to a receiver base.
UK Patent Application GB 2 129 952 A describes a peel imaging system comprising a first carrier sheet, a photopolymerizable layer (containing a non-attenuating, non-photosensitive dye or pigment and contains material which changes color when exposed to actinic radiation), and a second carrier sheet, at least the first carrier sheet being transparent or translucent, the photopolymerizable layer both polymerizing and changing color upon exposure to actinic radiation. After peeling apart of the carrier, the photopolymerizable material shears along the edges of the imaged areas so that exposed areas of the photopolymerizable layer remain on the first carrier sheet.
U.S. Pat. No. 4,288,525 describes a photosensitive material which may be used in peel-apart imaging processes, particularly in the formation of dry transfer materials, resist masks, printing plates and silk screen stencils. The imaging material consists of two carrier sheets which may be pealed apart and which are laminated together via at least two interlayers (a photosensitive layer and an image forming layer). Prior to exposure, if the carrier sheets are peeled apart, the carrier sheet adjacent the photosensitive layer separates wholly from it, leaving both photosensitive layer and image forming layer on the other carrier sheet. After exposure, if the sheets are peeled apart, the whole of the photosensitive layer and at least part of the image forming layer (according to its imagewise exposure) remains attached to the carrier sheet adjacent the photosensitive layer. By incorporating adhesive in or adjacent the shearable image forming layer, the photosensitive material may constitute a material from which dry transfers may be manufactured simply by exposure and peeling apart.
EPO Application No. EP 0 323 191 A2 describes a peel-apart imaging material useful in image transfer processes. The imaging material comprises a substrate and a photosensitive layer, the photosensitive layer (as two or more layers) comprising a dye or pigment and a photopolymerizable compound. The dye or pigment is contained in at least one of these two or more layers, but is absent from the layer in direct contact with the substrate. Upon imagewise exposure of the image forming material, the exposed and unexposed areas differ in their adhesion to a receptor and image transfer occurs through a breakaway separation within the layer in direct contact with the substrate.
WO 93/03928 describes peel-apart elements for laser induced thermal imaging processes, the elements comprising, in order, a support, an active layer (infrared absorbing material, and polymeric binder), an adhesive layer, and a cover sheet. The adhesive interrelationship between layers are such that upon peeling the layers apart, regions of the active layer exposed with infrared radiation adhere to the support while exposed regions adhere to the adhesive layer and the cover sheet, forming a negative image and a positive image on the respective sheets.
EPO Applications 0 096 572 A2; 0 385 466 A2; and 0 601 760 A2 and U.S. Pat. Nos. 4,050,936; 4,347,300; 4,291,114; 5,001,036; 5,234,790; 5,300,399; and 5,374,780 also describe peel-apart photosensitive imaging systems with adhesive layers.

Dry peel-apart imaging or proofing system

Minnesota Mining and Manufacturing Company


A radiation imaging apparatus including an accumulation unit to accumulate electrical charge in accordance with radiation for each pixel circuit of a plurality of pixel circuits. An output unit outputs an analog signal for each pixel circuit by sampling and holding an electrical signal in accordance with a voltage of an accumulation unit for each pixel circuit. The output unit stops the output during a reset operation of the accumulation unit. A selection unit selects pixel circuits that output the analog signals. The selection unit stops the selection during a reset operation of the accumulation unit. A determination unit determines whether a total time of an exposure time and an output time required to output the analog signals corresponding to all the pixel circuits is longer than an imaging interval that is based on a synchronization signal representing a radiation generation timing input from an external apparatus.

1. Field of the Invention
The present invention relates to a radiation imaging apparatus, a control method for the radiation imaging apparatus, a storage medium, and, more particularly, to a radiation imaging apparatus that reduces image artifacts upon imaging an object by intermittently irradiating the object with radiation in the form of pulses, a control method for the radiation imaging apparatus, and a storage medium.
2. Description of the Related Art
Recently, in the field of radiation imaging apparatuses, especially, digital X-ray imaging apparatuses, a large-area flat panel type radiation imaging apparatus based on a 1× optical system using photoelectric conversion elements has been widely used, instead of an image intensifier, for the purpose of increasing resolution, decreasing volume, and suppressing image distortion.
A large-area flat panel sensor formed by two-dimensionally joining photoelectric conversion elements generated on a silicon semiconductor wafer by a CMOS semiconductor manufacturing process is available as a flat panel sensor based on a 1× optical system that is used for a radiation imaging apparatus.
Japanese Patent Laid-Open No. 2002-026302 discloses a method of manufacturing a large-area flat panel sensor by tiling a plurality of rectangular semiconductor substrates that are rectangular imaging elements obtained by cutting photoelectric conversion elements in the form of strips from a silicon semiconductor wafer, in order to implement a large-area flat panel sensor equal to or larger than the silicon semiconductor wafer size.
In addition, Japanese Patent Laid-Open No. 2002-344809 discloses a circuit arrangement for each rectangular semiconductor substrate obtained by cutting out photoelectric conversion elements in the form of strips. On each of the rectangular semiconductor substrates cut out in the form of strips, vertical and horizontal shift registers as readout control circuits are arranged together with two-dimensionally arrayed photoelectric conversion elements. External terminals (electrode pads) are provided near the horizontal shift register. Control signals and clock signals input from the external terminals control the vertical and horizontal shift registers on each rectangular semiconductor substrate to cause the respective shift registers to sequentially output the respective pixel arrays in synchronism with the clock signals.
For example, as shown in FIG. 5A, no significant problem occurs when the sum of a scanning time ST required to output electrical signals from all of the photoelectric conversion elements and a radiation signal accumulation time XT (exposure time XT) is less than an imaging interval FT of a synchronization signal, that is, the frame rate is relatively low.
FIG. 5B shows an example of an imaging mode in which the sum of the scanning time ST required to output electrical signals from all of the photoelectric conversion elements and the radiation signal accumulation time XT (exposure time XT) is greater than the imaging interval FT of a synchronization signal. That is, this is an imaging mode in which the frame rate is relatively high, in which the shift registers on each rectangular semiconductor substrate are scanned to perform a resetting operation for starting accumulation of radiation signals at the time point indicated by t9 in FIG. 5B during an output period of an analog signal. If, however, a resetting operation is performed during an analog signal scan, currents simultaneously flow in all of the pixels on the rectangular semiconductor substrate to cause fluctuations in the power supply voltage of the rectangular semiconductor substrate. That is, an analog signal output during a resetting operation is disturbed to produce artifacts in a moving image.
The present invention provides a technique of obtaining a high-quality image by reducing artifacts even in a high-speed imaging mode, in consideration of the above problem.

Radiation imaging apparatus, control method for radiation imaging apparatus, and storage medium


A termite barrier for masonry buildings having a concrete slab. The barrier consists of a profiled sheet of termite resistant material which is set into the slab and the masonry wall during construction. The profiled sheet has movement resisting deformations and one or more regions of curvature which resist sheer fracture of the barrier. Preferred profiles are Z-shaped and T-shaped.

This invention relates to the protection of buildings from subterranean termites and is particularly concerned with physical termite barriers for incorporating into concrete slab-on-ground buildings having a masonry veneer cladding, during their construction.
Subterranean termites typically build nests just beneath the soil surface and forage, principally for cellulose containing material, for distances which can reach hundreds of meters from their nests. Termite damage to buildings, particularly residential buildings can be as many as one building in five in some parts of Australia, costing the community many tens of millions of dollars annually in the repair of the affected timber. As a result, the Australian Building Code has made it compulsory for all new buildings to incorporate suitable termite barriers. The current Building Code is laid down in Australian Standard 3660.1-1995. This standard specifies three permissible systems for protecting concrete slabs from termite penetration. The systems comprise the use of stainless steel mesh, graded stone or chemicals.
Chemical soil barriers have recently come under attack by environmentalists on the basis that their toxicities may be harmful to man. This has lead to the banning of conventional chemicals and the use of more environmentally friendly materials. Unfortunately such materials are less effective and may have no effect whatsoever after as little as twelve months from application.
Graded stone barriers must satisfy a large number of criteria to be effective. The stones must be of crushed igneous or metamorphic origin, be from a sound source, have a minimum sg of 2.52, and be graded and shaped so that the termites cannot lift them or penetrate their voids. A typical product meeting these requirements is GRANITGARD.RTM. which is a granite stone supplied by CSR Readymix, a Division of CSR Limited. The problem with such products, however, is that they cannot effectively be used on sloping ground surfaces, supply in many parts of Australia is difficult, and they are relatively expensive.
Stainless steel mesh barriers are consequently now in widespread use. These barriers are, nevertheless, not without their drawbacks. Apart from their relatively high cost which cannot be avoided, there are particular problems when it comes to their installation at the perimeter of concrete slabs having masonry veneer walls. The commonly used method comprises parging an inner edge of the mesh to the perimeter of the slab and extending the mesh out under the row of bricks which is substantially level with the slab. The parging material is an adhesive which is required to be termite resistant, form a strong bond between the mesh and the concrete, and be durable over the life expectancy of the building. In practice, however, it is difficult to form a proper seal with the parging material due to the relative movement between the bricks and the concrete slab due to different rates of drying, and expansion and contraction taking place. The integrity of the seal is therefore frequently broken and regions for termite entry are provided.


A structure including a compressively strained semiconductor layer, the compressively strained layer having a strain greater than or equal to 0.25%. A tensilely strained semiconductor layer may be formed over the compressively strained layer. The compressively strained layer is substantially planar, having a surface roughness characterized in (i) having an average wavelength greater than an average wavelength of a carrier in the compressively strained layer and/or (ii) having an average height less than 10 nm.

The recent development of silicon (Si) substrates with strained layers has increased the options available for design and fabrication of field-effect transistors (FETs). Enhanced performance of n-type metal-oxide-semiconductor (NMOS) transistors has been demonstrated with heterojunction metal-oxide-semiconductor field effect transistors (MOSFETs) built on substrates having strained silicon and relaxed silicon-germanium (SiGe) layers. Tensilely strained silicon significantly enhances electron mobilities. NMOS devices with strained silicon surface channels, therefore, exhibit improved performance with higher switching speeds. Hole mobilities are enhanced in tensilely strained silicon as well, but to a lesser extent for strain levels less than approximately 1.5%. Accordingly, equivalent enhancement of p-type metal-oxide-semiconductor (PMOS) device performance in such surface-channel devices presents a challenge.
Hole mobility enhancement has been demonstrated in highly strained SiGe layers. The formation of such highly strained layers is made difficult by the tendency of these layers to undulate, especially with increasing strain levels, i.e., with high Ge content. This undulation lowers hole mobilities, thereby offsetting the beneficial mobility enhancement provided by the strained layers.
The observed undulation arises from lattice mismatch with respect to an underlying layer, and increases in severity with formation temperature. Unfortunately, the formation of a tensilely strained layer made of, for example, Si, over the compressively strained layer is desirably carried out at a relatively high temperature, e.g., 550° C., to achieve a commercially viable formation rate and uniformity.


A pivoting chain guide and tensioner assembly for use with an endless chain loop comprising: at least one bracket plate, a tensioner attached to the at least one bracket plate, and a guide attached to the bracket plates. The bracket plate surrounds the chain at least partially between a driving and a driven sprocket and at least one of the plates has a hole for a pivot at a center axis. The tensioner comprises a tensioner arm with a chain sliding face for contacting the outside of the chain and a biasing means. The guide has a chain sliding face that contacts the outside of the chain. When a high local load is applied to the chain, the load is received by the end of the guide, forcing the guide to move away from the chain, such that the bracket plate pivots, moving the tensioner relative to the chain.

1. Field of the Invention
The invention pertains to the field of tensioners. More particularly, the invention pertains to a tensioner that has damping.
2. Description of Related Art
FIG. 1 shows a prior art chain driving system having a blade tensioner and a guide. A closed loop chain encircles driving sprocket 12 and driven sprocket 10. Each sprocket 10, 12 accelerates and decelerates independently while maintaining forward motion. A fixed guide 14 is attached to a bracket 7 on the tight strand of the chain. Opposite the guide 14 on the slack strand of the chain is a tensioner 16, which is at least semi-rigidly fixed to the bracket 7 and biased towards the tight strand of the chain. Bolts 18 fasten the bracket containing the tensioner 16 and the guide 14 to the engine block (not shown).
When the driving sprocket 12 accelerated or the driven sprocket 10 decelerates, an energy wave or high local load is created in the tight strand of the chain, which travels from the sprocket that changed in velocity toward the other sprocket. The chain 8 attempts to span the distance between the link of the chain in contact with the initiating sprocket to the other sprocket in the shortest possible distance, a straight line. The energy moves through the links on the free strand of the chain until it comes to the end of the guide 14, which absorbs the energy. As a result from the constant absorption of the high local load the ends of the guide 14 sustains significant wear. The energy wave would be present and show the same characteristics if it was to originate on the slack strand of the chain, although the wave energy may not occur at all depending on how well the tensioner keeps the slack out of the chain and how much damping the tensioner has.
One solution to reduce the load that results in the prior art chain driving system is to add damping to the tensioner. One problem associated with adding the required damping to a tensioner is that if the tensioner is softened significantly, it may result in a loss of chain control, since tensioners are specifically designed to apply just enough force to provide adequate chain control. Other solutions are shown in U.S. Pat. Nos. 5,180,340, 5,797,818, and 5,976,922, 6,322,470, as well as U.S. application Ser. No. 2002-0045503 and Japanese Application No. 2003-047652.
U.S. Pat. No. 5,180,340 discloses a coil spring attached to a block on the slack side and tight side of the chain that biases an ejector/apex which is located on the inside side of the chain. As force is applied to the ejector/apex, the ejector pivots against the biasing action of the coil spring to swing toward the adjacent sprocket.
U.S. Pat. No. 5,797,818 discloses a chain assembly with reduced noise and vibration on the slack side of the chain comprising a blade shoe, a spring, and a resilient damping device. The shoe is pivotally mounted to the tensioner bracket. The spring is mounted to the shoe and biases the shoe towards the chain. The resilient damping device is mounted between the tensioner bracket and the spring to aid in controlling the vibration that occurs during valve events.
U.S. Pat. No. 5,976,922 discloses a tensioning device comprising a tension lever that has first and second slide blocks affixed, such that the slide blocks are on either side of the slack side of chain. The first slide block is pivotably attached to a guide rail on the tight side of the chain. The second slide block is biased against one of the sides of the slack side of the chain by a tension element comprising a compression spring and a piston.
U.S. Pat. No. 6,322,470 discloses a tensioner that includes a pair of pivoting arms used to simultaneously tension two separate strands of the same chain. A lever with fixed pins is located between the two strands. The arms extend outside the strands of the chain and carry shoes positioned to contact the outside portion of the chain are pivotally mounted to the fixed pins. Rotation of the lever causes the fixed pins to move laterally and the arms draw inward and tension is imparted to the separate chain strands at the same time. In other words, a high load on one side of the chain tries to transfer to the other side of the chain but the load eventually evens out.
US 2002-0045503 discloses a chain tensioner that has a blade and spring assembly. The blade has a first end and a second end. The first end defines a hub. The hub is connected to the central portion of the blade shoe and a first end wall and defines a bore that receives a pin that pivotably connects the blade to a mounting bracket.
Japanese Application No. 2003-074652 discloses a tensioner in which a support member is turnably pivoted on a center line connected the two sprockets. Attached to the support member are pressing members on either side of the chain at the same time. The damping that occurs of the slack and tight side of the chain is individual to each side of the chain, since each of the pressing members floats relative to the chain. While there is only one pivot present between the two pressing members, the load on one tries to affect the other and the pressing members undulate back and forth on the chain.

Pivoting chain guide and tensioner assembly


Embodiments of the present invention facilitate dynamically adapting to state information changes in a graphics processing environment. In one embodiment, a master register holds state information corresponding to units of work (threads) to be performed. The state information in the master register is copied to a per-group state register when a group of threads is to be launched. The per-group state register is coupled to processing engines configured to process the threads, so that the processing engines read state information from the per-group state register rather than the master register. In another embodiment, a number of master registers may be used to store state information for different types of threads.

The present invention relates in general to parallel data processing, and in particular to managing state information for a multi-threaded processor.
Parallel processing techniques enhance throughput of a processor or multiprocessor system when multiple independent computations need to be performed. A computation can be divided into tasks, with each task being performed as a separate thread. (As used herein, a "thread" refers generally to an instance of execution of a particular program using particular input data.) Parallel threads are executed simultaneously using different processing engines.
Numerous existing processor architectures support parallel processing. The earliest such architectures used multiple discrete processors networked together. More recently, multiple processing cores have been fabricated on a single chip. These cores are controlled in various ways. In some instances, known as multiple-instruction, multiple data (MIMD) machines, each core or processor independently fetches and issues its own instructions to its own processing engine (or engines). In other instances, known as single-instruction, multiple-data (SIMD) machines, a core or group of processors has a single instruction unit that issues the same instruction in parallel to multiple processing engines (or multiple processors), which execute the instruction on different input operands. SIMD machines generally have advantages in chip area (since only one instruction unit is needed) and therefore cost; the downside is that parallelism is only available to the extent that multiple instances of the same instruction can be executed concurrently.
Graphics processors have used very wide SIMD architectures to achieve high throughput in image-rendering applications. Such applications generally entail executing the same programs (vertex shaders or pixel shaders) on large numbers of objects (vertices or primitives). Since each object is processed independently of all others using the same sequence of operations, a SIMD architecture provides considerable performance enhancement at reasonable cost. Typically, a GPU includes one SIMD core (e.g., 200 threads wide) that executes vertex shader programs, and another SIMD core of comparable size that executes pixel shader programs. In high-end GPUs, multiple sets of SIMD cores are sometimes provided to support an even higher degree of parallelism.
These designs have several shortcomings. First, the separate processing cores for vertex and pixel shaders are separately designed and tested, often leading to at least some duplication of effort. Second, the division of the graphics processing load between vertex operations and pixel operations varies greatly from one application to another. As is known in the art, detail can be added to an image by using many small primitives, which increases the load on the vertex shader core, and/or by using complex texture-mapping and pixel shading operations, which increases the load on the pixel shader core. In most cases, the loads are not perfectly balanced, and one core or the other is underused. For instance, in a pixel-intensive application, the pixel shader core may run at maximum throughput while the vertex core is idle, waiting for already-processed vertices to move into the pixel shader stage of the pipeline. Conversely, in a vertex-intensive application, the vertex shader core may run at maximum throughput while the pixel core is idle, waiting for new vertices to be supplied. In either case, some fraction of available processing cycles are effectively wasted.
It would therefore be desirable to provide systems and methods wherein a GPU can dynamically adapt to changing pixel and vertex shader requirements.

Managing state information for a multi-threaded processor


When a radio communication device inputs a target place, it receives information of a radio control apparatus at the target place and those on the route from a database or a radio control apparatus. Upon reception of identification information of the radio control apparatus, the radio communication device compares it with the information of the radio control apparatus, and notifies the comparison result, thereby confirming its current position.

The present invention relates to a radio communication device which can be connected to a plurality of radio control apparatuses.
A conventional navigation system displays the current position on a map using as a medium a GPS (global positioning system) that detects the latitude and longitude from information obtained by receiving radio waves transmitted from communication satellites in the outer space.
However, the prior art suffers the following problems.
Since radio waves transmitted from the communication satellites in the outer space must be used, the position cannot be measured at a position very close to a skyscraper or under the ground. PA1 Since only the latitude and longitude of the terminal position are detected based on radio waves supplied from the communication satellites, each terminal must have area information required for navigation, and a large-capacity storage medium must be prepared on the terminal side.

Navigation apparatus using radio communication device


An embedded resistor including a first interdielectric layer, a cap layer, a resistive layer and a cap film is provided. The first interdielectric layer is located on a substrate. The cap layer is located on the first interdielectric layer, wherein the cap layer has a trench. The resistive layer conformally covers the trench, thereby having a U-shaped cross-sectional profile. The cap film is located in the trench and on the resistive layer, or, an embedded thin film resistor including a first interdielectric layer, a cap layer and a bulk resistive layer is provided. The first interdielectric layer is located on a substrate. The cap layer is located on the first interdielectric layer, wherein the cap layer has a trench. The bulk resistive layer is located in the trench.

1. Field of the Invention
The present invention relates generally to a resistor, and more specifically to an embedded resistor.
2. Description of the Prior Art
In a semiconductor process, semiconductor materials, such as polysilicon, are often positioned to function as resistors capable of providing high resistance. These resistors can be used in place of load transistors. When load transistors of a static random access memory (SRAM) are replaced by semiconductor resistors, the number of transistors in the SRAM can be reduced thereby saving costs and enhancing the integration of the SRAM.
Conventionally used semiconductor resistors can be divided into polysilicon resistors and diffusion resistors. A polysilicon resistor is formed, for example, by forming a polysilicon film into which dopants are doped through an insulating film on a semiconductor substrate. The resistance of the polysilicon resistor can be controlled by the dopant concentration of the polysilicon layer. A diffusion resistor is formed, for example, by doping dopants into a semiconductor substrate to form a diffusion layer, and then by using a thermal diffusion method to activate the dopants in the diffusion layer and adjust the resistance thereof. Normally, whether it is a polysilicon resistor or a diffusion resistor, the resistor has a sandwich-like structure that sandwiches a high resistance region between two low resistance ends. The low resistance ends are provided for forming interconnection contact plugs to connect the resistor with other wirings. The high resistance region is used to provide a high resistance to satisfy circuit designs or device demands.
With the development of the various and miniaturized electronic products, circuit designs applying load resistors become more and more complicated, and requirements in volume, position and high resistance of the load resistors therefore become more and more critical as well.


A system and method for applying intensional category representations to provide dynamic categorization of information items in a data storage and retrieval system is disclosed. The disclosed system may apply pattern recognition techniques during information storage and retrieval to provide dynamic categorization of information items. Information items are categorized as they are observed. Information items may each be associated with one or more categories. An information item may become a member of a category either initially, when it is created, or subsequently by dynamic acquisition of certain properties. Category membership may be further be acquired or lost when property values are changed, and/or as a result of changes to properties or property values of referenced or referring information items. The disclosed information storage and retrieval system operates to categorize objects as they evolve over time. Properties may be added to information items, thus changing the structure of the information item, with the result that new functionality is dynamically associated with the information items.

Many types of software systems have been developed for storing and retrieving data. Relational databases are one type of solution that performs well in the specialized use areas they are designed for. However, relational databases are not applicable to all problems. It is generally understood that the performance of relational databases suffers when they are used to provide run-time flexibility in the information categories (i.e. tables) being stored.
In the area of non-relational systems, some systems are referred to as "semi-structured", in that they involve the storage and retrieval of "semi-structured" information, such as XML (extensible Markup Language) documents. For example, non-relational systems may be more suitable than relational systems for the storage, management, retrieval, and exchange of personal information, and/or information relating to information workers.
Moreover, areas that have traditionally been approached using non-relational systems may not actually be cleanly reducible to a set of documents. Accordingly, existing "semi-structured" approaches may be inadequate for a category of data storage and retrieval applications. This category includes the storage and retrieval of personal information, and is characterized by high variability of the structure of the stored information. For example, a user of a personal information database may wish to store information regarding multiple personal contacts. However, when various communication modes are considered, the contact information stored for each contact is highly variable from contact to contact, and potentially also over time. Moreover, the functional context for each contact is also highly variable, since each piece of stored contact information for a given contact may or may not be relevant to a specific communication application. While existing systems using an XML-based approach have fared better than relational databases with regard to this problem, the information being represented is really not hierarchical, and imposing a hierarchy is the defining feature of the XML approach.
Additionally, if it is desirable to share parts of documents in a document based system, there arises the problem of maintaining different document versions, and the resulting dependencies become too complex for a system in which the documents are totally independent. File systems also suffer from the same problem, since they are based on an independent container model.
For the above reasons and others, it would be desirable to have a new system for information storage and retrieval that is applicable to problems not amenable to solution using relational databases, or using existing non-relational systems, such as existing semi-structured document-based systems, and necessarily having highly variable information structure. The new system should be applicable to storage, management, retrieval and exchange of various specific kinds of information, including personal information and/or information relating to information workers.

Data storage and retrieval system with intensional category representations to provide dynamic categorization of information items


A toilet aid (10), for use on an ordinary water closet/toilet fitted with an ordinary lift up toilet seat, which aid comprises an overseat (20) supported on an annular or part annular pneumatically inflatable bag assembly (21), and is characterized in that flexible locating means (22) is attached to a bottom part of the bag assembly (21) so as to be foldable or bendable to extend beneath the toilet seat (14) to locate the bag assembly (21) on the toilet seat (14) for pneumatically raising and lowering the overseat (20) relative thereto.

There are a multiplicity of such aids already known, which vary greatly in complexity and effectiveness. For example, one known aid comprises a thick plastic overseat having adjustable brackets on its underside to engage and locate the overseat on an ordinary seat of a water closet. This aid is passive and merely enables a user to sit down at a higher than standard height, so that less effort is required to stand up again. It has also been proposed to mount a toilet set on a hydraulically or electrically powered mechanism which can raise and lower the seat (and a person thereon) between a low seating position for using the toilet and a raised position in which the person can straighten his or her legs and move his or her body forwards to achieve a standing position. However, all the aids known at the present time appear to give rise to problems for such persons, including problems of initialing the aid, lack of sufficient assistance afforded by most of the aids, and with those aids which offer lifting assistance, problems of cost, mechanical complexity and physical bulk.

Toilet aids for partially disabled and handicapped persons


A polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or C2F5, A is an optionally fluorine or oxygen-substituted divalent organic group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or may form a ring with the sulfur atom, N=0-2, R8 is H or alkyl, B is a single bond or optionally oxygen-substituted divalent organic group, a=0-3, b=1-3, and X is an acid labile group. The polymer generates a strong sulfonic acid which provides for effective cleavage of acid labile groups in a chemically amplified resist composition.

While a number of recent efforts are being made to achieve a finer pattern rule in the drive for higher integration and operating speeds in LSI devices, DUV and VUV lithography is thought to hold particular promise as the next generation in microfabrication technology. In particular, photolithography using an ArF excimer laser as the light source is thought requisite to the micropatterning technique capable of achieving a feature size of 0.13 μm or less.
The ArF lithography started partial use from the fabrication of 130-nm node devices and became the main lithography since 90-nm node devices. Although lithography using F2 laser (157 nm) was initially thought promising as the next lithography for 45-nm node devices, its development was retarded by several problems. A highlight was suddenly placed on the ArF immersion lithography that introduces a liquid having a higher refractive index than air (e.g., water, ethylene glycol, glycerol) between the projection lens and the wafer, allowing the projection lens to be designed to a numerical aperture (NA) of 1.0 or higher and achieving a higher resolution. See Journal of Photopolymer Science and Technology, Vol. 17, No. 4, p 587 (2004).
In the photolithography using an ArF excimer laser (wavelength 193 nm) as the light source, a high sensitivity resist material capable of achieving a high resolution at a small dose of exposure is needed to prevent the degradation of precise and expensive optical system materials. Among several measures for providing high sensitivity resist material, the most common is to select each component which is highly transparent at the wavelength of 193 nm. For example, polymers of acrylic acid and derivatives thereof, norbornene-maleic anhydride alternating copolymers, polynorbornene, ring-opening metathesis polymerization (ROMP) polymers, and hydrogenated ROMP polymers have been proposed as the base resin. This choice is effective to some extent in that the transparency of a resin alone is increased.
Studies have also been made on photoacid generators. In prior art chemically amplified resist compositions for lithography using KrF excimer laser, photoacid generators capable of generating alkane- or arene-sulfonic acids are used. However, the use of these photoacid generators in chemically amplified resist compositions for ArF lithography results in an insufficient acid strength to scissor acid labile groups on the resin, a failure of resolution, or a low sensitivity. Thus these photoacid generators are not suited for the fabrication of microelectronic devices.
For the above reason, photoacid generators capable of generating perfluoroalkanesulfonic acids having a high acid strength are generally used in ArF chemically amplified resist compositions. These photoacid generators capable of generating perfluoroalkanesulfonic acids have already been developed for use in the KrF resist compositions. For instance, JP-A 2000-122296 and U.S. Pat. No. 6,048,672 (or JP-A 11-282168) describe photoacid generators capable of generating perfluorohexanesulfonic acid, perfluorooctanesulfonic acid, perfluoro-4-ethylcyclohexanesulfonic acid, and perfluorobutanesulfonic acid. JP-A 2002-214774, US Patent Application Publication 2003-0113659 A1 (JP-A 2003-140332), and US Patent Application Publication 2002-0197558 A1 describe novel acid generators capable of generating perfluoroalkyl ether sulfonic acids.
Among these, perfluorooctanesulfonic acid and homologues thereof (collectively referred to as PFOS) are considered problematic with respect to their non-degradability and biological concentration in the environment. Manufacturers made efforts to develop partially fluorinated alkane sulfonic acids having a reduced degree of fluorine substitution as the replacement to PFOS. For instance, JP-A 2004-531749 describes the synthesis of α,α-difluoroalkanesulfonic acid salts from α,α-difluoroalkene and a sulfur compound and discloses a resist composition comprising a photoacid generator which generates such sulfonic acid upon exposure, specifically di(4-tert-butylphenyl)iodonium 1,1-difluoro-2-(1-naphthyl)-ethanesulfonate. JP-A 2004-2252 describes the development of α,α,β,β-tetrafluoroalkanesulfonic acid salts from α,α,β,β-tetrafluoro-α-iodoalkane and sulfur compound and discloses a photoacid generator capable of generating such a sulfonic acid and a resist composition comprising the same. JP-A 2002-214774 discloses such photoacid generators as difluorosulfoacetic acid alkyl esters and difluorosulfoacetic acid amides although their synthesis method is lacking. Furthermore, JP-A 2005-266766 discloses a photosensitive composition comprising a compound capable of generating a partially fluorinated alkane sulfonic acid having a sulfonylamide structure derived from perfluoroalkylene disulfonyl difluoride.
In an attempt to form a fine feature size pattern with a pitch of less than 200 nm, the problem of pattern density dependency (or optical proximity effect), that is, the size difference between isolated and grouped patterns having different optical contrast becomes significant. Using a photoacid generator capable of generating an acid with low diffusion, the problem of pattern density dependency can be overcome to some extent, but not to a satisfactory extent. While the resist composition is required to achieve a further reduction of the pattern rule as well as a good balance of sensitivity, substrate adhesion, and etching resistance, it is also required to ameliorate the pattern density dependency fundamentally without a loss of resolution.
Under the circumstances, it was proposed to form a polymer from an acryloyloxyphenyldiphenylsulfonium salt as a monomer for enhancing sensitivity (as described in JP-A 4-230645) and to incorporate the monomer into a polyhydroxystyrene resin for improving the line edge roughness of this base resin (as described in JP-A 2005-84365). However, since the sulfonium salt is bonded at its cation side to the polymer, the sulfonic acid generated therefrom upon exposure to high-energy radiation is equivalent to the sulfonic acids generated by conventional photoacid generators, which is unsatisfactory to overcome the outstanding problem. Also, sulfonium salts having an anion side incorporated into the polymer backbone such as polystyrenesulfonic acid are disclosed as effective in enhancing sensitivity or improving resist pattern profile (Japanese Patent No. 3613491). The acids generated therefrom are arenesulfonic and alkylsulfonic acid derivatives which have too low an acid strength to sever acid labile groups, especially acid labile groups in ArF chemically amplified resist compositions. JP-A 2006-178317 discloses a polymer having a plurality of partially fluorinated sulfonic acid anions as polymerizable units, and a resist material comprising the polymer. WO 2006-121096 discloses a polymer having three partially fluorinated sulfonic acid anions in combination with a specific lactone compound. JP-A 2007-197718 discloses three anions.
With respect to the immersion lithography, some problems arise from minute water droplets which are left on the resist and wafer after the immersion exposure. They can often cause damages and defects to the resist pattern profile. The resist pattern after development can collapse or deform into a T-top profile. There exists a need for a patterning process which can form a satisfactory resist pattern after development according to the immersion lithography.
The lithography techniques which are considered promising next to the ArF lithography include electron beam (EB) lithography, F2 lithography, extreme ultraviolet (EUV) lithography, and x-ray lithography. In these techniques, exposure must be done in vacuum or reduced pressure, which allows the sulfonic acid generated during exposure to volatilize, failing to form a satisfactory pattern profile. The sulfonic acid volatilized is damaging to the exposure system. In the EB and EUV lithography, it is desired to provide the resist material with a higher sensitivity, especially for the purpose of reducing the load to the system.
A tradeoff between sensitivity and roughness is pointed out. For example, SPIE Vol. 3331 p 531 (1998) describes that sensitivity is in inverse proportion to roughness. It is expected that the roughness of a resist material is reduced by increasing an exposure dose to reduce shot noise. SPIE Vol. 5374 p 74 (2004) describes a tradeoff between sensitivity and roughness in the EUV lithography in that a resist material containing a more amount of quencher is effective in reducing roughness, but suffers from a decline of sensitivity at the same time. There is a need to enhance the quantum efficiency of acid generation in order to overcome the problem.
With respect to the acid generating mechanism triggered by electron beam exposure, SPIE Vol. 5753 p 361 (2005) reports that PAG releases acid through the mechanism that a polymer is excited by exposure so that electrons migrate to the PAG. It is presumed that the base polymer is readily ionized since either of EB and EUV provides an ionization potential energy higher than the threshold of 10 eV. It is reported in SPIE Vol. 5753 p 1034 (2005) that poly-4-hydroxystyrene has a higher acid generation efficiency in EB exposure than poly-4-methoxystyrene, indicating that poly-4-hydroxystyrene provides for efficient migration of electrons to PAG upon EB exposure.
Reported in SPIE Vol. 6519 p 6519 F1-1 (2007) is a material obtained through copolymerization of hydroxystyrene for increasing the acid generation efficiency by electron migration, a methacrylate of PAG having sulfonic acid directly bonded to a polymer backbone for suppressing acid diffusion low, and a methacrylate having an acid labile group.
Citation List                Patent Document 1: JP-A 2000-122296        Patent Document 2: U.S. Pat. No. 6,048,672 (or JP-A 11-282168)        Patent Document 3: JP-A 2002-214774        Patent Document 4: US 2003-0113659 A1 (JP-A 2003-140332)        Patent Document 5: US 2002-0197558 A1        Patent Document 6: JP-A 2004-531749        Patent Document 7: JP-A 2004-2252        Patent Document 8: JP-A 2005-266766        Patent Document 9: JP-A 4-230645        Patent Document 10: JP-A 2005-84365        Patent Document 11: JP 3613491        Patent Document 12: JP-A 2006-178317        Patent Document 13: WO 2006-121096        Patent Document 14: JP-A 2007-197718        Non-Patent Document 1: Journal of Photopolymer Science and Technology, Vol. 17, No. 4, p 587 (2004)        Non-Patent Document 2: SPIE Vol. 3331 p 531 (1998)        Non-Patent Document 3: SPIE Vol. 5374 p 74 (2004)        Non-Patent Document 4: SPIE Vol. 5753 p 361 (2005)        Non-Patent Document 5: SPIE Vol. 5753 p 1034 (2005)        Non-Patent Document 6: SPIE Vol. 6519 p 6519 F1-1 (2007)

Sulfonium salt-containing polymer, resist composition, and patterning process


An engine start control device which in a time period from the start of a starting operation by a starter for starting an engine to the start of the engine, reads out substitute values used at the time of starting the engine, instead of reading out backup data used for normal operation control of the engine, and after starting of the engine, reads out the backup data instead of the substitute values.

Among start control devices for engines such as outboard motors, for example, there is a type that simultaneously performs a memory check and reads backup data, at the time of the initial engine start processing.
This will be described using FIG. 3. Firstly, after an engine is started by a recoil starter, an SRF setting step, in which the input-output terminal of an ECU is set, is performed in step S1, then in step S2 a ROM (Read Only Memory) health check and a RAM (Random Access Memory) health check are performed, and afterwards, in step S3, backup data and the like, to be used for engine operation control, are,read out from an EEP-ROM (Electronically Erasable and Programmable Read Only Memory), and in step S4, the flow proceeds to an engine control mode.
Incidentally, due to recent exhaust gas regulatory policies, engines that are provided with a fuel injection device have been used. However, in an engine in which a fuel injection device is incorporated, firstly the engine start operation is performed, then initial processing similar to that stated above is performed, and afterwards the fuel injection is started to start the engine (for example, refer to Japanese Unexamined Patent Application, First Publication No. H09-256887).
However, in the above-described conventional engine start control device, since time is required for the ROM check, RAM check, and readout of backup data and the like from the EEP-ROM, there is a problem in that the engine control start is delayed. Even with such a delay, in the case where the engine, being the object, is furnished with a battery such that power can be supplied to the ignition system without interruption, there is no problem. However, in the case where the engine, being the object, is an outboard motor provided with a recoil starter, or an engine provided with a kick starter, and it is also a battery-less system, there is a problem in that the engine cannot start if no power is supplied to the ignition system while pulling the rope of the recoil starter, or while giving a kick.
That is, it takes time for the health check of each of the memories, and readout of backup data. Therefore, if cranking has already been completed at the point in time for ignition, generated power cannot be obtained, and thus the engine cannot start. Furthermore, even in the case where a battery is provided, a similar problem occurs when the battery capacity is low.
Especially, in the aforementioned engine incorporating a fuel injection device, since fuel is supplied from the fuel pump to the injector, and fuel injection is performed by driving the injector, more power is required to start the engine. Hence, the above-described problem is serious.
Therefore, the present invention has an object of providing an engine start control device and a start control method, by which startability is improved, and control can shift to an engine control mode in a short time.

Engine start control device and start control method


Method for the determination of start commutation in synchronous servo-drives by means of two coupled control loops, a current control circuit and an angle control circuit. The angle control circuit contains an incremental position sensor signal. A ramped desired value is predetermined by the current control. A constant angle desired value is predetermined by the angle control. The angle control is embodied in such a manner that is has a faster dynamic than the current control dynamic of the signal which is impinged upon by the current control by rotating the magnetic field. The method can be controlled in all positions by the input of an S-shaped disturbance variable signal in the angle control. The shaft of the electric drive can be mechanically blocked in the position during initialization of the start commutation and is regulated to the same position as in the beginning of the start commutation.

1. Field of Invention
This invention relates to a method for determining the start commutation in rotary and linear synchronous and reluctance servo-drives with the aid of two coupled control loops or circuits.
2. Description of the Prior Art
Direct current machines have a collector and two or more brushes serving as commutators. In the direct current machine, the said commutator ensures that the current always flows through the windings in the armature in such a way that the magnetic fields resulting from the current attract so that a torque is generated, and in this way the motor shaft rotates. In the case of synchronous servo-drives, which nowadays have largely replaced direct current machines due to certain decisive advantages (approximately 50% smaller construction volume for the same power with no need of maintaining the brushes), said commutator is missing. Said commutator must be simulated in the servo amplifier, complex electronics also providing the current control, speed control and position control of the synchronous servo-drive, is nowadays almost always implemented with the aid of Clarke-Park transformation. For simulating the commutator, switching on the electronics of the servo amplifier initially requires the rotor position relative to the stator, hereinafter called "start commutation". This information can be provided with corresponding costs by a measuring system or use is made of the method according to DE 196 04 701 C1, which requires additional hardware.
EP 784 378 A2 discloses a method for initializing the start commutation for a synchronous motor with incremental position sensors in which a position controller and a current controller are used, and with said position controller the motor movement is minimized on the basis of the commutation initialization. Thus, a quantity consisting of moment-forming and flow-forming components are impressed in the direction of the estimated rotor position angle in that the moment-forming component is selected as zero, and the flow-forming component is chosen with a value higher than zero (estimated). If the rotor position angle estimated value diverges from the actual rotor position angle, a torque is generated which causes a rotor movement in the direction of the estimated rotor position. Thus, in the least favourable estimated case, an angular movement of the rotor is required which does not make it possible to start it from the stationary, i.e. fixed braked state.
It is disadvantageous in the prior art that implementation takes place in the form of additional hardware which, as a function of the data of the electric drive, must be hardware-adapted, and that the electrical machine must twice perform an uncontrolled movement in the millimetre range so that such methods cannot function when the brake is applied. It is also disadvantageous that the position change resulting from the uncontrolled movement is maintained after finding the start commutation, and the implemented mathematical equations necessary in the servo amplifier for vector control using Clarke-Park transformation cannot be used for finding the start commutation which makes the additional hardware costs considerable.
The problem of the invention is to provide a simple method making it possible in the case of dynamic movement freedom and zero movement freedom in the stationary end value, using the hardware and software which is always present in any vector-controlled electric drive, to determine the start commutation, and after producing the latter to keep the electric drive by means of electromotive force in the position which it occupied prior to the start of finding the start commutation.

Determination of start commutation in synchronous servo-drives


A method for cold working metal structures. A compound indenter is used to produce deformation in a workpiece, to provide a selected beneficial residual stress profile, to provide improved fatigue life structures with minimal manufacturing steps. A compound indenter deforms a workpiece, resulting in dimples therein. A relatively uniform beneficial residual stress profile is provided at the surface and at the midplane of apertures in a workpiece, so as to improve overall fatigue life. A compound indenter tool having a first, elongate indenter with a shaped indenter surface portion, and a second shaped indenter surrounding the first indenter and forming an annular shoulder recessed from the surface portion of the first indenter, is used. Optionally, a foot having a bottom portion is used to confiningly surround an indenter during application of deforming force to the surface of a workpiece, to prevent deformation of adjacent workpiece surface.

Metal fatigue is a problem common to just about any component or structure that experiences cyclic stresses or repetitive loading. Such problems are especially important in the metal structures utilized in various components of transportation systems as they experience a varying amount of repetitive loads during normal operation. Structures or components that are prone to fatigue damage include, but are not limited to, commercial and private transport aircraft, general aviation, military aircraft, helicopters, jet engines, turbines, passenger cars, trucks, off-road equipment, construction vehicles, heavy construction equipment, boats, ships, trains, rolling stock, railroad track, stationary and moving bridges, medical implants, pressurized pipes and vessels, guns, cannons and the like.
Metal fatigue can generally be defined as the progressive damage, usually evidenced in the form of cracks, that occurs to structures as a result of cyclic or repetitive loading. The lower surface of an aircraft wing is a classical example of the type of loading that produces fatigue. The wing is subjected to various cyclic stresses resulting from gust, maneuvering, taxi and take-off loads, etc., which over the service life of the aircraft can produce fatigue damage.
Fatigue damage is generally observed, at time of initiation, in the form of growth of small cracks from areas of highly concentrated stress. Typical stress concentrators include holes, fillet radii, abrupt changes in section, notches, and the like. Fatigue damage can often be hidden to the untrained because it generally occurs under loads that do not generally cause yielding or deformation of the structure. In fact, failure usually occurs under loads typically experienced in the operation of the structure. Undetected, a fatigue crack can grow until it reaches a critical and catastrophic size or length. At the critical length, the unstable crack races through the metal, causing sudden failure of the component. Catastrophic failure of the entire structure, such as a wing or fuselage, can occur when other members of the structure can not carry the additional load from the failed member.
Even stationary objects such as railroad track, pressurized vessels and artillery equipment may fail in fatigue because of cyclic stresses. Cyclic loads caused by repeated loading due to rail car wheels running over an unsupported span of railroad track are the cause of many track failures. In fact, some of the earliest examples of fatigue failures were in the railroad and bridge building industry. Sudden pressure vessel failures can also be caused by repeated pressurization cycles acting on initially small cracks. It is not surprising that U.S. governmental studies report that fatigue damage is a significant economic factor in the U.S. economy.
While many methods have been developed and utilized for the manufacture of structures having improved fatigue life at fasteners, it would nevertheless still be desirable to reduce the amount of handling involved in producing such structures. That is because such a development would facilitate reduced manufacturing costs of enhanced fatigue life structures, thus reducing the cost of end products utilizing such structures, and/or enabling more widespread use of improved fatigue life components in industrial applications.

This patent is subject to a terminal disclaimer.

Method for manufacturing improved fatigue life structures, and structures made via the method


Methods, system, and computer readable medium are presented for predicting defects using a machine learning component based on a generated signature. A trained machine learning component that has been trained with historic data that represents a series of events that occurred within a plurality of heterogeneous systems over a plurality of periods of change for the heterogeneous systems can be received. A base signature for a first heterogeneous system that includes a first mix of modules can be compared to a current signature for the first heterogeneous system to identify one or more irregularities. The trained machine learning component can predict one or more defects for the first heterogeneous system based on the identified irregularity.

Modern software applications have grown into robust offerings that provide dynamic service. Enterprise level software applications often include numerous and different components working together to achieve sophisticated functionality. In such an environment, various moving parts can generate layers of complexity that result in sub-optimal performance. For example, when an update is pushed to a sub-component of a software module that is part of a larger software service offering, unanticipated effects can be experienced at various levels of the service. In another example, when the context for a given software module changes, such as when the module is operating in a new environment, with new use cases, and the like, the given module itself can experience sub-optimal performance or defects, and other modules that work in tandem with the given module can similarly experience these issues. Thus, while modern software can achieve remarkable functionality, the leveled structure can be cumbersome in certain circumstances. A software tool that can predict how software modules will perform in the context of a potential or current change can therefore improve the functionality, reliability, and extensibility of modern software.

Machine defect prediction based on a signature


A prepreg for fiber-reinforced composite materials comprising (A) a reinforcing fiber having a modulus of elasticity of 200 GPa or more, (B) a fibrous thermoplastic resin having a modulus of elasticity of 100 GPa or less, and (C) a thermosetting matrix resin. The prepreg of the present invention does not only have excellent handling property equivalent to that of the prepreg with the conventional thermosetting resin as a matrix, but also gives excellent toughness to the resulting molded product without injuring the thermal and mechanical properties. Particularly, it has a high resistance to interlaminar fracture when exposed to impact, so that it is preferably used as a structural material for airplanes, etc.

1. Field of the Invention
The present invention relates to a prepreg with thermosetting resins as a matrix for producing fiber-reinforced composite materials which can give excellent toughness to the resulting molded product without injuring excellent handling property and thermal and mechanical properties inherent to such the prepreg, a process for producing the same and laminates produced with the same.
2. Description of the Related Art
Advanced composite materials with high-strength, high-elastic modulus fibers (e.g. carbon fiber) as a reinforcing material have been widely used chiefly in the field of sports by effectively using their characteristics of being excellent in specific strength and specific elastic modulus.
These advanced composite materials are supplied and used in the form of an intermediate material generally called a prepreg, so that resins usually used as a matrix resin are thermosetting resins which are easy to give moderate tackiness and flexibility (draping property) necessary to laminate the prepregs.
While, however, thermosetting resins represented by epoxy resins have various characteristics of being excellent in heat resistance, solvent resistance, mechanical properties, etc. in addition to the foregoing characteristics, they have defects of being inferior in impact resistance because of their poor toughness. Particularly, when advanced composite materials are used as laminates, resistance to impact is governed in many cases by interlaminar fracture strength, so that use of thermosetting resins of poor toughness as the matrix results also in a reduction in impact resistance of the advanced composite materials. Because of this, use of the advanced composite materials, particularly, as structural materials has been fairly limited.
For improving the defect of this thermosetting matrix resin, for example a method of adding a rubber component is known. However, a large amount of the rubber component needs to be added in order to obtain a sufficient toughness-improving effect, which results in a large reduction in heat resistance, solvent resistance, etc.
Further, a method of adding thermoplastic resins, particularly the so-called engineering plastics excellent in heat resistance and solvent resistance is proposed (Japanese Patent Application Kokai No. 61-212543, No. 61-228016, No. 58-134111, etc.). These references report that reduction in heat resistance, solvent resistance, etc. is inhibited as compared with the above case wherein the rubber component is added, but a large amount of the thermoplastic resin needs to be added in order to obtain a sufficient toughness. Even in this method, however, there yet remains serious problems that the impregnation properties of the resin for producing a prepreg and the tack level of the prepreg lower with an increase in viscosity of the whole system.
Further, these trials to improve the toughness of these thermosetting matrix resins themselves are not a very effective method from the standpoint of improving the interlaminar peeling strength of the laminate. Also, a method of distributing the fine particles of thermoplastic resins between the layers is proposed (Japanese Patent Application Kokai No. 1-110537) with the object of effectively improving the interlaminar peeling strength of the laminate. However, a large reduction in tack level of the prepreg tends not to be avoided, and further problems of complicated manufacturing process and quality control newly occur. Although trials to localize chopped fibers, milled fibers, or the like between the layers also are proposed for the same object, the same problems cannot be avoided, and also the effect of the trials is usually not sufficient.
Further, a method of inserting one kind of impact-absorbing layer called an interleaf between the layers also is proposed (for example, U.S. Pat. No. 3,472,730, Japanese patent Application Kokai No. 51-58484, No. 60-63229, No. 60-231738, etc.). In any of these references, however, the thickness between the layers becomes large to lower the fiber ratio of the prepreg and the heat resistance and handling property become poor, so that this method has not yet come to find wide and practical application.

Prepregs, process for producing the same and laminates produced with the same


Method and apparatus are set forth for providing a reactive radical species at a substrate surface. A wall structure defines an interior chamber. A substrate is mounted in the chamber at a target position therein with a surface region of the substrate oriented in a selected direction. A first vaporous chemical is introduced to the chamber with the first vaporous chemical flowing toward the surface region of the substrate. A first radical species is generated from the first vaporous chemical intermediate the position of introduction of the first vaporous chemical and the substrate surface region and at a pressure of no more than about 0.1 Torr without producing significant amounts of ionized species. The first radical species flows toward the surface region of the substrate. The chamber is evacuated and maintained at a pressure of .ltoreq.10.sup.-7 Torr during the introduction of the first vaporous chemical. A second vaporous species may be introduced which reacts with the first radical species to produce a second radical species. Deposition, etching and cleaning can thereby be provided.

The semiconductor industry is continually attempting to develop smaller and finer delineations on the semiconductor devices and to, at the same time, increase the throughput of acceptable devices. There are a number of factors involved which effect the transferring onto wafers of contaminants. These include the use of high temperatures in wafer processing, the use of high electric fields near the surface, the use of liquids in contact with wafers during processing, the use of relatively high gas pressures (greater than one Torr), for example, during wafer processing and the handling of wafers by processing personnel.
At higher temperatures the mobility of contaminants in and on the wafer is greatly increased. Such elevated temperatures are used during epitaxy, diffusion and post-ion implantation annealing.
The use of high electrical fields near the wafer results in at least two types of problems. Charged particles on the surface have their mobilities greatly enhanced by the high fields. Furthermore, the high fields used in ion implantation and reactive ion etching impart large momenta to charged particles in the vicinity of the wafer. These large-momentum charged particles can drive surface contaminants into the wafer and can cause crystal damage to the wafer (as in the case of ion implantation). A crystal defect can be considered to be a contaminant or a set of contaminants relative to several semiconductor device functions.
Liquids are well known to exhibit a `bathtub ring` effect. This effect is the removing of a contaminant from one surface (or area on a surface) to another surface (or another area on the surface). Furthermore, dissolved materials in the liquid can deposit out on the surfaces in contact with the liquid.
When vapor phase chemistries are carried out on the surface of the wafer the by-products must be able to escape from the surface, or they will interfere with the desired chemistries, and they become trapped on the surface (or in the material being deposited when deposition chemistries are being used).
Finally, it is well-known that the `dirtiest things` in a clean room are the people in it. Some handling of wafers by people at this stage of development of wafer fabrication is unavoidable. It is, however, essential that this handling be minimized.