An angle measuring guide includes a housing having a plurality of monolithically formed walls and an annular opening formed within selected ones of the walls. The rear wall has a planar surface for being directly mated with the motorcycle. A transparent lens is monolithically formed with the housing and directly connected thereto. A buoyant member is situated within the opening and the cavity. A predetermined quantity of high viscous fluid is contained within the opening and the cavity such that the fluid freely flows therebetween and supports the buoyant member at a free and suspended position during operating conditions. The buoyant member includes a stationary weight member connected to a bottom portion thereof and thereby anchors the buoyant member while allowing the buoyant member to freely rotate about one or both of the x-axis and y-axis.

1. Technical Field
This invention relates to gyroscopes and, more particularly, to an angle measuring gauge for motorcycles and the like.
2. Prior Art
Attitude indicating instruments for aircraft and the like provide information about the pitch and roll attitudes of the carrying aircraft and may also provide information about its directional attitude or heading, and wherein the display of attitude information is in the form of a surface of revolution having delineations of regularly spaced meridians that maintain a vertical orientation in space and regularly spaced parallels transverse to the meridians, one of the parallels being an equator that divides the display into upper and lower halves and corresponds to a horizon.
In certain of its forms, such an attitude indicator has a spherical display that is gyro controlled so that regularly spaced meridians delineated on the spherical display are maintained in a vertical orientation in space and regularly spaced parallels that are transverse to the meridians are correspondingly maintained horizontal.
One of the delineated parallels is an equator that divides the displayed sphere into upper and lower hemispheres and corresponds to the horizon. Relatively fixed to the aircraft in substantially centered relation to the display is an indicator or reference that symbolizes the carrying aircraft and relates its attitude to the attitude of the delineated meridians and parallels on the displayed sphere. Typically this reference takes the form of a circle or dot that symbolizes the fuselage of the carrying aircraft to denote pitch and heading attitudes together with aligned horizontal dashes or bars at opposite sides of the circle or dot that symbolize the wings and show roll or banking attitude.
In level flight the airplane symbol is on the equator delineation of the spherical display, and attitudes of climb or dive are indicated by departures of the equator from that symbol, which departures correspond in direction and magnitude to the direction and magnitude of departure of the longitudinal axis of the aircraft from its normal level flight attitude. In like manner, roll attitudes are depicted by the angle between the equator and the wing symbols of the reference.
Thus, the equator of the spherical display provides a horizontal reference to which the pilot relates the attitude of the aircraft in the same way that he relates aircraft attitude to the natural horizon under visual flight conditions. The meridian delineations of the display can be marked in terms of compass headings and can be confined to fixed orientations in space so that the instrument can combine pitch and roll information with information that would otherwise have to be obtained from a separate directional gyro instrument.
Accordingly, a need remains for an apparatus that overcomes the above noted shortcomings and is applicable to motorcycles and other land or sea vehicles, and not limited to aircraft only. The present invention satisfies such a need by providing an angle measuring gauge that is self-contained and displays the degree of forward-aft or side-to-side inclination for a vehicle operator. Such a leveling gauge is intended for land, sea, and air applications and promptly displays the current orientation of the vehicle upon which it is mounted.

Angle-measuring gauge for motorcycles and the like


A long-range optical apparatus includes an optical unit defined by lenses and an eyepiece and has at least one manually operable adjusting device for adjusting an optical unit defined by the lenses. With the adjusting device, the optical unit can be adjusted relative to a mounting device. The adjusting device is mechanically coupled to at least one optical element or the mounting device. The optical apparatus has an electronic unit including a memory and the electronic unit performs an electronic function in dependence upon a setting parameter stored in the memory. The adjusting device is coupled with a position detection unit so that actuation of the adjusting device triggers an electrical signal of the position detection unit as a function of the position of the adjusting device. The electronic unit stores or changes a setting parameter in the memory in response to the electrical signal of the position detection unit.

DE 40 03 976 A1 describes an electronically controlled camera with zoom lens which can be driven to a tele position by actuating an operational member in a normal direction, and to a wide-angle position by actuating the operational member in the opposite direction. Means are provided for changing the taking mode by a control means, and a display means for displaying the taking mode. The camera further includes a means for manually changing the setting time of a camera shutter and/or the interval time of an interval taking mode when the camera is set in a manual shutter mode or interval mode and the operational member and the taking mode changing means are both operated simultaneously. Adjustment of the optical unit of the camera, zoom and focus is motor-driven. All operational members are configured as electrical switching elements.
DE 19515531 A1 describes an optronic sighting means for handguns which has an optical unit including a plurality of lens groups and a high-resolution CCD device used to generate a video signal of an image of the target area. The sighting means further comprises an electronic unit including an electronic image processing means with a microprocessor, memory, generators for virtual symbols, and components for processing external signals, for processing the video signal from the optical unit, and for generating electric image signals; and a display means on an eyepiece. In order to facilitate and improve the use and operability of such an optronic sighting means, the optical unit can be configured to provide a zoom function and an auto-focus function. The viewing field of the eyepiece has associated therewith at least one sensor of an optical switch which is switchable by changing the viewing direction of an eye with which a user looks into the eyepiece. The zoom function is activated through the viewing direction of the eye.
AT 506 437 B1 describes binoculars including a focusing means for focusing at least a first optical path, and a laser rangefinder. For observation and measuring of the distance of a remote object, the observation device is first directed to the object to target it. Targeting of the object is supported by displaying a target mark. Displaying of the target mark can be triggered by actuating a dedicated key.
U.S. Pat. No. 5,619,378 discloses binoculars including means for optionally observing additional information, with an information carrier or an information deflecting means arranged in the optical path. The information deflecting means can be inserted into the optical path. Insertion of the information deflecting means into the optical path is effected via a control push-button acting on the information deflecting means via a transmitting pivot rod.
United States patent application publication 2001/0028498 discloses binoculars with imaging function, which have a pair of observation optical units including objective lenses and eyepieces, and additionally comprise an imaging device including an imaging optical unit for actualizing a visual field of a field angle such that it is substantially equal to a real field of an image observed through the binocular optical units. A photoelectric converting unit converts an image obtained by the imaging optical unit into an electrical signal. The observation optical unit and the imaging optical unit have individual optical axes different from each other.
The binoculars include operational keys connected to a control unit. Pressing of these keys causes an input to the control unit.
The control unit controls for example the function as an objective lens drive control circuit and an accept of the inputs from the operational keys.
United States patent application publication 2004/0095471 discloses binoculars with imaging and photographing function, in which each tube has an optical path through an objective lens and an eyepiece. Means are provided for extracting a partial light beam, and a module having an image sensor for converting images into digital data, which is mounted on a housing of the tube that contains the means for extracting the partial light beam so that it is possible to extract an optical signal to the image sensor. This permits to capture images through the binoculars using an independent digital camera with an interface for an additional external image sensor. Mechanical displacement of the optical components of the binoculars in front of the image sensor is effected in synchronism with the focusing of the binoculars by the user.
Binoculars with photographing function are further known from U.S. Pat. No. 7,113,331, for example. The focusing of the photographing optical unit is performed manually.
U.S. Pat. No. 7,268,801 also discloses binoculars having a digital camera. The electronic functions are operated via control means on the main body of the binoculars, namely by means of a release switch, a menu key, a recording key, four cursor keys, and an OK or confirmation key.
In the binoculars described in DE 103 59 755 A1 an image capturing sensor is placed into one of the optical paths of the binoculars by means of a mechanical or electric drive, the drive being coupled with a release switch.
U.S. Pat. No. 7,196,844 describes binoculars or a telescope comprising an optical unit having at least two optical components, the distance of which relative to each other being adjustable for focus setting of the optical unit, and an adjustment means which is coupled to at least one of the two optical components for adjusting the distance between the two optical components. A detection means for detecting the position of the optical components relative to one another is in signalling connection with a processor for converting the position data obtained from the detection means into a focal length of the optical unit. Furthermore, an output means is provided which is in signalling connection with the processor for readable display of the converted focal length. The detection means comprises a potentiometer pickoff, for example.
Further, binoculars with additional electronic and optoelectronic functions such as rangefinder, electronic direction meter, inclinometer, altimeter, temperature meter, image recording chip, GPS receiver, wired or wireless interface for data exchange between the binoculars and additional devices are known from DE 10 2004 054 182 A1.
In long-range optical devices such as rifle scopes, binoculars, a spotting scope, etc., more and more electronics are integrated, as becomes apparent from the prior art mentioned above. For operating the electronics, selection of various electronic settings may be required. For appropriate use thereof, more and more keys, buttons, or rotary transducers are necessary. Each additional button on the device requires space, implies additional costs, has to be sealed, and does not necessarily facilitate the operation. Some of the possible settings are not constantly accessed during use.

Electronically adjustable long-range optical device


The invention provides 1,3,4-thiadiazoles and 1,3,4-oxadiazoles having the following Formula I: in which,                Y is S or O,        R1 is alkyl, alkenyl, alkynyl, cycloalkyl, heterocycloalkyl, cycloalkenyl, aryl, heteroaryl or a polycyclic group, optionally substituted,        R2 is alkyl, alkenyl, alkynyl, cycloalkyl, heterocycloalkyl, cycloalkenyl or aryl optionally substituted,        R3 is X2—R′3, in which X2 is a binding group and R′3 is cycloalkyl, heterocycloalkyl, cycloalkenyl, aryl, heteroaryl, or a polycyclic group; optionally substituted, or their pharmaceutically acceptable derivatives, a compound of Formula I, for their preparation, and processes for pharmaceutical compositions containing methods of using the compounds for the treatment of disorders for which a treatment by a PDE7 inhibitor is relevant.

Phosphodiesterases (PDE) play an important role in various biological processes by hydrolyzing the key second messengers adenosine and guanosine 3′,5′-cyclic monophosphates (cAMP and cGMP, respectively) into their corresponding 5′-monophosphate nucleotides. Therefore, inhibition of PDE activity produces an increase of cAMP and cGMP intracellular levels that activate specific protein phosphorylation pathways involved in a variety of functional responses.
At least 11 isoenzymes of mammalian cyclic nucleotide phosphodiesterases, numbered PDE1 through PDE11 , have been identified on the basis of primary structure, substrate specificity, or sensitivity to cofactors or inhibitory drugs.
Among these phosphodiesterases, PDE 7 is a cAMP-specific PDE. The biochemical and pharmacological characterization showed a high-affinity cAMP-specific PDE (Km=0.2 μM), that was not affected by cGMP potent selective PDE isoenzyme inhibitors.
PDE 7 activity or protein has been detected in T-cell lines, B-cell lines, airway epithelial (AE) cell lines, and several fetal tissues.
Increasing cAMP levels by selective PDE7 inhibition appears to be a potentially promising approach to specifically block T-cell mediated immune responses. Further studies have demonstrated that elevation of intracellular cAMP levels can modulate inflammatory and immunological processes. This selective approach could presumably be devoid of the side effects associated with known selective inhibitors (eg, PDE3 or PDE4 selective inhibitors) and which limit their use.
A functional role of PDE7 in T-cell activation has also been disclosed; therefore selective PDE7 inhibitors would be candidates for the treatment of T-cell-related diseases.
AE cells actively participate in inflammatory airway diseases by liberating mediators such as arachidonate metabolites and cytokines. Selective inhibition of PDE7 may be a useful anti-inflammatory approach for treating AE cells related diseases.
Thus, there is a need for selective PDE7 inhibitors, which are active at very low concentrations, ie, micromolar inhibitor, preferably nanomolar inhibitors.

Thiadiazoles and oxadiazoles and their use as phosphodiesterase-7 inhibitors


A one-time programmable memory cell and the programming thereof including a programming transistor which is disposed in series with a polycrystalline silicon programming resistor forming the memory element. The programming is non-destructive with respect to the polycrystalline silicon resistor.

1. Field of the Invention
The present invention relates to the field of one-time programming memory cells (OTP) and more specifically to the forming of a one-time programming memory in an integrated circuit.
2. Discussion of the Related Art
Conventionally, integrated circuit one-time programming memories are of EPROM type and thus require specific programming circuits which are not compatible with standard technologies of manufacturing of the MOS transistors used in integrated circuits. There also are one-time programming memories formed by EEPROMs and non-erasable flash memories.
Another category of one-time programming memories is formed of fuse or anti-fuse memories. Such memories include memories formed of a polysilicon bar or track which is submitted to a very high current to physically deteriorate the polysilicon and open the circuit. Such one-time programming memory cells require very high currents (on the order of one hundred milliamperes). This considerably limits their use. Further, the programming performed on a fuse-type cell is optically visible, which is detrimental to the security of a binary code embedded in an integrated circuit and masked in a one-time programming memory.
A similar disadvantage exists with memories of EPROM or EEPROM type, that is, a detection of the state of the storage cells is possible by means of an electronic scanning microscope which can detect the difference of accumulated charges in the floating gate transistors of such memories.
The present invention aims at providing a novel one-time programming memory structure which overcomes the disadvantages of known structures.
The present invention more specifically aims at providing the forming of an integrated circuit memory cell which requires no additional manufacturing step with respect to the steps implemented to manufacture MOS transistors in conventional technologies.
The present invention also aims at improving the security of an embedded code by means of a one-time programming memory cell.
The present invention also aims at providing a low-cost memory cell.
The present invention also aims at providing a one-time programming memory cell.

Memory cell with non-destructive one-time programming


A scalable visualization system includes a plurality of scalable tiles (10) that each comprise a display portion (18) and a processing portion (20). Each of the display portions (18) define a portion of a physical display space. Each of the processing sections defines a processing node in the parallel processing system. The parallel processing system operating on a single node or a plurality of nodes. A message fabric (36) is provided to connect CPU nodes (34) and each of the tiles (10) together. The tiles (10) are scaled by interconnecting them to form the desired display space with each of the display elements (18). As each tile (10) is added to the overall display space, an additional CPU node (34) is also added, such that not only is the display space scaled up from a physical coordinant standpoint, but the processing power is also scaled up. In addition, each of the CPU nodes (34) is operable to update an associated display list (28) that defines the parameters of the display element (18 ). Dependent upon the portion of the display space occupied by the display element (18), the display list (28) will vary. This is determined by the overall processor configuration that is made up of all the nodes (34) acting as a single parallel processing system.

In conventional processing systems, the output device is typically a display for providing a visual representation, in addition to utilizing mass storage for storage of data, etc. When utilizing a display as compared to mass storage, it is desirable to apportion a predetermined amount of the processing time of an associated processor to the task of updating the display. In any type of processing system, this display updating operation can be the "weak link" in the overall operation of the system. This is typically due to the interconnecting scheme between the processing unit and the display or displays.
In one multiple display system, as disclosed in U.S. Pat. No. 4,800,376, issued Jan. 24, 1989 to Suga, et al., a multiple display system is provided that utilizes a plurality of display elements with decoders associated with each of the display elements. However, this system, although utilizing multiple displays or display elements, still utilizes a single data input for providing data to the system, with the data then routed to the various display elements. Therefore, the limiting factor to display updating is the speed of the data that can be input to the overall display system. Since all display data is input through a single data input, the display bandwidth is governed by this data input. The addition of displays requires a higher bandwidth input to maintain the same display update rates.
Another system, that described in U.S. Pat. No. 4,845,480, issued Jul. 4, 1989 to Satou, discloses a system utilizing a frame memory for storing original data with a plurality of display memories for storing image data. Each of the display memories is associated with a display unit for displaying the image represented by the data stored in each of the associated display memories. Image data transferred from the display memory is performed through a programmable data conversion memory such that the data conversion is performed independent of data manipulation of the frame memory. However, even with this type of system, the updating of the display memories is achieved through a single path. Since there is only a single processing center for interfacing with the original data.
Another disadvantage to systems of the prior art is that they are not "scalable". That is, the display size is fixed by the computer manufacturer relative to the processing power. Even though systems, such as that described in the Suga, et al. patent, have provided for expanded display systems, they have still required the same processing power to service and update all of the displays. There is a significant limitation in bandwidth between the processor portion of the system and the display portion since typically only a single data input is provided for the expanded displays.

Microelectronics & Computer Technology Corporation


A fixing base for fixing an optical element and disposing at least two elastic members is provided. The fixing base includes a fixing groove and an elastic member fixing groove. The elastic members abut against the elastic member fixing groove to provide the elastic members with a push force toward the optical element, so that the optical element abuts against the fixing groove. An opening direction of the fixing groove and an opening direction of the elastic member fixing groove are nonparallel to the optical axis of the optical element, and the elastic members and the optical element are respectively disposed in the elastic member fixing groove and the fixing groove along a direction nonparallel to the optical axis. The invention also provides a projection device including the fixing base. The fixing base provided by the invention can accurately and easily fix the optical element.

It is often required to dispose and fix various optical elements in various existing optical devices or apparatus. In the prior art, a fixing base is generally disposed in the device to fix an optical element (e.g., a lens, a mirror, a filter) to the device.
However, the shape or the thickness of the lens often does not completely fit the fixing base due to the manufacturing tolerance. Therefore, problems such as displacement or tilt of the optical element may occur when the optical device or apparatus is subjected to vibration.
Further, additional components such as screws are often needed to fix the optical element fixing base, and the optical device or apparatus is designed to be stacked and assembled along the direction of the optical axis. Thus, not only having high assembly complexity, but also the component cost and assembly time are increased. Therefore, how to make the fixing base accurately and easily fix the optical element is a focus of attention of those skilled in the art.
The information disclosed in this "BACKGROUND OF THE INVENTION" section is only for enhancement understanding of the background of the invention and therefore it may contain information that does not form the prior art that is already known to a person of ordinary skill in the art. Furthermore, the information disclosed in this "BACKGROUND OF THE INVENTION" section does not mean that one or more problems to be solved by one or more embodiments of the invention were acknowledged by a person of ordinary skill in the art.


In a nuclear reactor neutron panels varying in thickness in the circumferential direction are disposed at spaced circumferential locations around the reactor core so that the greatest radial thickness is at the point of highest fluence with lesser thicknesses at adjacent locations where the fluence level is lower. The neutron panels are disposed between the core barrel and the interior of the reactor vessel to maintain radiation exposure to the vessel within acceptable limits.

1. Field of the Invention
The present invention relates generally to nuclear reactor internals and more specifically to neutron shields for shielding nuclear reactor pressure vessels from overexposure to neutron flux.
2. Description of Related Art
The primary side of nuclear reactor power generating systems which are cooled with water under pressure comprises a closed circuit which is isolated from and in heat exchange relationship with a secondary side for the production of useful energy. The primary side comprises the reactor pressure vessel enclosing a core internals structure that supports a plurality of fuel assemblies containing fissile material, the primary circuit within heat exchange steam generators, the inner volume of a pressurizer, pumps and pipes for circulating pressurized water; the pipes connecting each of the steam generators and pumps to the reactor pressure vessel independently. Each of the parts of the primary side comprising the steam generator, a pump and a system of pipes which are connected to the vessel, form a loop of the primary side. The primary side is also connected to auxiliary circuits, including a circuit for volumetric and chemical monitoring of the pressurized water. The auxiliary circuit, which is arranged branching from the primary circuit, makes it possible to maintain the quantity of water in the primary circuit by replenishing, when required, with measured quantities of water, and to monitor the chemical properties of the coolant water, particularly its content of boric acid, which is important to the operation of the reactor.
The internal components of the reactor pressure vessel typically include upper and lower internals. The upper internals include control rod guide tube assemblies, support columns, conduits for instrumentation which enter the reactor vessel through the closure head, and a fuel assembly alignment structure, referred to as the upper core plate. The lower internals include a core support structure referred to as the core barrel, a core shroud that sits inside the core barrel and converts the circular interior of the core barrel to a stepped pattern that substantially corresponds to the perimeter profile of the fuel assemblies that constitute the core supported between a lower core support plate and the upper core plate. The stepped pattern of fuel assemblies places the fuel assemblies closest to the core barrel at the four cardinal coordinates. As an alternate to the shroud, a bolted baffle former structure consisting of machined horizontal former and vertical baffle plates, has been employed. Whether a shroud or a bolted baffle former structure is employed the core pattern is still generally the same with the fuel assemblies being positioned closest to the core barrel at the cardinal coordinates.
In pressured water moderated and boiling water nuclear reactors, both of which are used for producing steam to drive a steam turbine, fission takes place within the reactor core whereby the energy of the fission products is transmitted to the water. In a pressurized water-moderated reactor the heated water is pumped from the reactor vessel through a heat exchanger in which heat energy is transferred to another circuit of water to form steam to drive a turbine. In a boiling water reactor the energy of the fission products is transmitted to the water in the reactor vessel to form steam to drive the turbine. In both types of reactor it has been found that neutron flux imposed on the vessel from the reactor core results in the material of the vessel becoming embrittled. That is, with prolonged exposure to high energy neutrons the fracture toughness of the vessel is reduced and could ultimately result in fracturing of the vessel should the condition be allowed to continue.
Several design techniques have been utilized in the past to reduce the radiation exposure of the vessel. For example, in pressured water reactors manufacturers have employed a steel thermal shield to reduce the radiation exposure of the vessel. In one such design illustrated in FIG. 1, the core barrel 32, which surrounds and supports the reactor core 14 within the vessel 10, is itself surrounded by a cylindrical steel wall 15 which is two to three inches (5.08 to 7.62 centimeters) thick and is situated approximately an equal distance from the inner surface of the pressure vessel 10 and the outer surface of the core barrel 32. In an alternative design, disclosed in U.S. Pat. No. 3,868,302, recognizing that the neutron flux level impinging on the inner surface of the reactor vessel 10 varies marketably in the circumferential direction, because some of the fuel assemblies 22 within the core 14 are closer to the core barrel 32 than other fuel assemblies 22, the thickness of the core barrel is selectively increased in those regions where a high flux exists. If the thickness of the core barrel is increased in the high flux regions by an amount corresponding to the thickness of the cylindrical thermal shield 15, the maximum radiation exposure of the reactor vessel 10 is essentially the same as the level that would result with a separate cylindrical thermal shield 15.
Another alternative that has been employed is to affix steel plates to the outside of the core barrel in the regions of the cardinal coordinates to essentially achieve the same affect that would be achieved by increasing the thickness of the core barrel in those areas, but at a lower expense. As the size of the reactors increase, requiring larger thermal shields, the steel plates forming the shields can experience large temperature excursions as they heat up and differences in thermal expansion between the shields and the core barrel can strain the means employed to attach the neutron shields to the core barrel. In addition, as the neutron shields become larger, they can affect the pressure drop within the downcomer region 31 between the core barrel and the reactor vessel which, in turn, increases the pressure drop across the reactor vessel and the amount of flow turbulence that is generated in the downcomer annulus.
Accordingly, an improved neutron shield design is desired that will reduce any adverse affect on pressure drop within the downcomer, region between the pressure vessel and the core barrel.
Furthermore, such an improved neutron shield design is desired that will minimize temperature differences between the thermal shield and the core barrel and reduce the strain on the means employed to attach the neutron shields to the core barrel.

Neutron shielding panels for reactor pressure vessels


A fluid dispenser assembly, characterized in that it comprises:                a fluid dispenser (1, 2) comprising a fluid reservoir (1) and a closure member (2), the reservoir comprising at least one flexible sheet (11) provided with an opening (14) cut out in the sheet, the closure member (2) being mounted in said opening (14); and        a flexible covering (3) wrapped around the dispenser, the covering including a window (34) through which the closure member (2) can be accessed.

In the prior art, document FR 2 822 808 is already known that describes a fluid dispenser assembly comprising a dispenser and a wrapper wrapped around the dispenser. The dispenser is in the form of a small, relatively flat pouch defining a dispenser orifice in one of its edges. The dispenser orifice is initially closed by a stopper that is removed, in particular by pulling it off. The wrapper masks the small pouch, but defines a notch where the removable stopper is positioned. To do this, the notch is defined on a lateral edge of the wrapper.
The drawback with that type of dispenser assembly is that the user has difficulty retrieving the fluid that is dispensed by the dispenser. After pulling off the removable stopper, the user presses on the wrapper, thereby flattening the small pouch of the dispenser. Consequently, the fluid is dispensed through the dispenser orifice situated at the bottom of the notch in the wrapper. It can be understood that it is not easy to retrieve the fluid at the bottom of a small notch. Thus, it often happens that the fluid spreads into the wrapper just beside the dispenser orifice. That prior-art dispenser assembly is thus not really adapted to dispensing pastes such as creams. It is more suited to fluids, such a perfume, that are sprayed. No fluid is retrieved directly at the outlet of the dispenser orifice.


In the multi-color fluorescence detection type electrophoresis apparatus provided with the electrophoresis gel plate, excitation laser source, means to separate the fluorescence images according to each emission wavelength, and the detector of the fluorescence subjected to wavelength selection, two or more laser sources are provided, each of laser lights is irradiated on the sample on a time-sharing basis, and the filter which cuts off the scattered light of each the laser synchronous with the laser beam is installed in front of the wavelength separation means thereby providing simultaneous, quick and real-time analysis of a great number of samples such as DNA and RNA labeled by many types of fluorophores, without overlapping the wavelengths of the excitation light and the fluorescence.

The present invention relates to the electrophoresis separation and photodetection apparatus for the DNA or RNA, especially to the fluorescence detection type electrophoresis apparatus suited to detect the fluorescence having different wavelengths emitted from the samples which are labeled with a plurality of fluorophores.
The gene diagnosis and the analysis of human genome require a quick analysis of many samples. The conventional method used for DNA detection including the base sequence determination for DNA has been autoradiography, whereby the DNA is labeled with the radioactive element, and the pattern of the DNA fragment subjected to electrophoresis gel separation according to its length is photographed and read out. Furthermore, automatic DNA sequencers have recently been developed, whereby the DNA fragment is labeled with the fluorophore to provide real time detection (Nature, Vol. 321, 1986, pp. 674-(679)).
These sequencers use a plurality of fluorophores having different emission wavelengths to distinguish the four types of bases from one another or classifies the types of DNA to be detected. Namely, the means to identify signals emitted from a plurality of fluorophores have been proposed, including;
(1) a system which uses the rotary filter provided with four types of filters which selectively transmit the light emitted from the fluorophores installed on the front of the detector (Nature, Vol. 321, 1986, pp. 674-679),
(2) a system which uses the image splitting prism (Japanese Patent Application Laid-open 2-269936 and U.S. Pat. No. 5,062,942), and
(3) a system which uses the wavelength dispersion prism (Japanese Patent Application Laid-open 1-116441 and U.S. Pat. No. 4,832,815).
However, the multicolor fluorescence detection system using the rotary filter has a problem; the increased number of fluorophores leads to reduced time to measure each fluorophore, hence reduced sensitivity. The conventional method of using the latter image splitting prism permits identification of about four types of fluorophores excited by one laser. However, effective excitation by one laser is possible up to two types of fluorophores generally; use of more than two types of fluorophores requires two or more excitation light sources in practice. As a result, use of two or more excitation light sources have often caused overlapped bands between the second excitation light wavelength and the fluorescent wavelength excited by the first excitation light. Especially, greater numbers of fluorophores tend to increase the frequency of overlaps between the excitation light wavelength and emission wavelength of the fluorophore disadvantageously in measuring. Namely, one laser is used generally because of the measuring problem. However, in this case, the multicolor fluorescence labeling method which detects the fluorescences with different wavelengths from samples labeled with these plurality of fluorophores has the problem of poor excitation efficiency with respect to some of the fluorophores, and of poor sensitivity in general; this is because of lack of the laser system which ensures effective excitation of all the fluorophores. At present, the apparatus using said method is placed on the market by Applied Biosystems Inc. in the U.S.; it has 24 migration lanes. This apparatus permits one measurement in ten to twelve hours, and allows only twenty-four samples at one time.
Another known method uses the procedure of labeling the DNA by a kind of fluorophores, thereby identifying the terminal species according to the difference of the migration lanes. However, this single-color fluorescence labeling system using one fluorophore label permits one measurement in five to six hours, allowing eight to ten samples at one time; the number of samples measured per day (throughput) is limited to only 16 to 20, when two daily measurements are assumed.
As discussed, the conventional DNA sequencers have been far from satisfactory in ensuring a quick, simultaneous analysis of many samples.

Fluorescence detection type electrophoresis apparatus

Hitachi Electronics Engineering Co., Ltd.


A technique for the determination of dynamic lens field curvature uniquely associated with a photolithographic scanner is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a photolithographic scanner. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that determines the dynamic lens field curvature (ZDLC) perpendicular to the scanning direction in an absolute sense. Furthermore, the effects of wafer flatness, wafer surface non-uniformity, and stage error are considered. The ZDLC information can be used to improve lithographic modeling, overlay modeling, and advanced process control techniques related to scanner stage dynamics.

1. Field of the Invention
The present invention relates generally to processes for semiconductor manufacturing and more particularly to the area of optical lithography. Especially methods for the determination of focal plane deviation (FPD) associated with photolithographic projection systems.
2. Description of the Related Art
In order to produce sub-wavelength semiconductor patterned features (transistors, gates) with very tight process specifications lithography engineers continuously monitor focus during and after the optical lithography process. The ability to produce sub-wavelength features can often be determined by considering the rather simple (3-beam) Rayleigh scaling Resolution (R) (λ/2NA) and Depth-of-Focus (DoF) equations, ˜λ/2NA and ˜λ/2NA2. These coupled equations stress the inverse relationship between resolution and DoF based on the exposure wavelength (λ) and numerical aperture (NA). The semiconductor industry's requirement to produce smaller critical features over time has forced semiconductor manufacturers and lithography tool vendors to produce higher NA lithography systems (steppers or scanners) using exposure sources at smaller wavelengths (for example, 248 nm). The ability to control focus during the lithography process becomes more difficult as the DoF becomes smaller simply because image fidelity degrades quickly with focal changes. Poor lithographic imaging and poor product yields cause semiconductor manufacturing costs to rise and technology ramp to slow. Semiconductor lithographers have discovered creative reticle enhancement techniques (RETs) and other optical techniques to increase the useable DoF. See, for example, "The Attenuated Phase Shift Mask", B. Lin, FLEX like "Method and Apparatus for Enhancing the Focus Latitude in Lithography", Pei-Yang Yan, U.S. Pat. No. 5,303,002 issued Apr. 12, 1994. Despite these efforts, the problem remains. Therefore, it is important to monitor focus during photolithographic processing and develop new methods for focus control. Typically, focus error across a scanner field can be attributed to the following three terms: (1) wafer and reticle non-flatness, (2) dynamic wafer/reticle stage error, and (3) static or dynamic lens field curvature.
For a photolithographic scanner, dynamic lens field curvature varies in the cross scan direction (x) in rather complex ways. While many methods exist for determining and monitoring focal plane deviation (FPD) and best focus by field position for photolithographic exposure tools, these do not account for wafer non-flatness and scanner dynamics, independently of the lithographic process. See, for example, "Distinguishing Dose from Defocus for In-Line Lithography Control", C. Ausschnitt, SPIE, Vol. 3677, pp. 140-147, 1999; "Latent Image Metrology for Production Wafer Steppers", P. Kirksen et al., SPIE, Vol. 2440, pp. 701-711, 1995; "Controlling Focal Plane Tilt", S. Hsu et al., Semiconductor International, Apr. 1, 1998 (available on-line as of February 2004 at the URL of http://www.reed-lectronics.com/semiconductor/article/CA177590?pubdate=4%2F1%2F1999&spacedesc=webex); "Apparatus, Method of Measurement and Method of Data Analysis for Correction of Optical System", A. Smith et al., U.S. Pat. No. 5,828,455 issued Oct. 7, 1998; and "Apparatus, Method of Measurement and Method of Data Analysis for Correction of Optical System", A. Smith et al., U.S. Pat. No. 5,978,085 issued Nov. 2, 1999.
Lithography Process Control and Monitoring
A typical microelectronic device or circuit includes many (˜20) levels or pattern layers. The fidelity and placement of patterned features on critical levels is often difficult to control. Lithographers typically use the following metrics to measure the success (or failure) of the lithographic patterning process: (1) critical dimension (CD), a measure of the critical device feature, (2) overlay error or feature position, as described above, and (3) side wall angle (SWA), the shape of side walls of the critical features. Each of these metrics is illustrated in FIG. 1a. These three metrics are typically measured using a scanning electron microscope (CD-SEM) or optical metrology tool (overlay tool). See, for example, "Quaestor Q7 Brochure", Bio-Rad Semiconductor Systems. Optical metrology tools are less expensive to operate as compared with a CD-SEM and are often used for process control (focus and exposure) applications, as well as overlay monitoring. See, for example, "Distinguishing Dose from Defocus for In-Line Lithography Control", supra.
Most overlay and CD measurements are made on silicon product wafers after each photolithographic process, prior to final etch. Product wafers cannot be etched until the photoresist features are imaged properly and meet the target process specifications (CD and SWA within process limits). Lithographic process engineers rely heavily on exposure tool alignment and focusing calibration procedures to help insure that the scanner is aligning and focusing images properly; poor focus monitoring techniques corrupt the scanner calibration database and degrades lithographic tool performance. See, for example, "193 Step nm and Scan Lithography", G. Davies et al., Semi Tech Symposium, Japan, 1998 and "Using the Focus Monitor Test Mask to Characterize Lithographic Performance", R. Mih et al., SPIE, Vol. 2440, pp. 657-666, 1995. In addition, lack of information concerning the magnitude of fixed errors (aberrations) corrupts process control and overlay modeling routines that try to model-out systematic and random lithographic error.
Over the past 30 years, the semiconductor industry has continued to produce faster (via smaller critical features) and more complex (greater functionality, dense patterning) circuits, year after year. The push to smaller feature sizes is gated by many physical limitations. As the critical dimensions of semiconductor devices approach 50 nm, the usable DoF will approach 100 nm. See, for example, "2001 ITRS Roadmap", SEMATECH, pp. 1-21, 2001. Continued advances in lithography equipment (higher NA systems, smaller wavelength exposure sources), RET, resist processing, and automated process (focus and exposure) control techniques will likely become more difficult and remain critical. See, for example, "2001 ITRS Roadmap", supra. Finally, while FPD measurement on a routine basis is important for lithographic process control, separating the FPD into correctable and non-correctable components is important for assessing the capability limits of advanced process control schemes.
Mathematical Description of Focusing Contributions
Dynamic lens field curvature (ZDLC) is that portion of total defocus due to the lens alone. It can be expressed as a weighted integral of the static lens field curvature as:
                              ZDLC                                (            x            )                          =                              ∫                                          -                SH                            2                                      SH              /              2                                                                                ⅆ              y                        *                          wt                                            (                y                )                                                                ZSLC                                            (                                  x                  ,                  y                                )                                                                        Equation                                                            (          1          )                    where:    ZSLC (x,y)=static lens field curvature over the scanned lens slot    y=scan direction coordinate    wt(y)=weighting function ˜I (y), the intensity across the slot for DUV resists but is generally different for I-line resists in particular it will depend on the scan direction being more heavily weighted on the side of the slot height (+y or −y) where the scan begins.    SH=scanner slot height (FIG. 1b)It should be noted that different illumination settings (conventional, strong annular, quadrupole, etc.) will generally have different illumination profiles 1(y) and therefore will have different ZDLC profiles.
While one could determine ZDLC by measuring or otherwise knowing wt(y) and ZSLC(x,y), it would be advantageous to directly determine ZDLC(x).
FPD: There are a number of methods that with greater or lesser accuracy measure defocus or focal plane deviation (FPD) over an exposure field. In general terms, each of these techniques estimate the focal error across the field using a variety of special reticle patterns (focusing fiducials, FF). In addition, some of these methods utilize the stepper or scanner wafer stage leveling and positioning system and/or optical alignment system to aide in the determination of FPD. See, for example, "Twin Scan 1100 Product Literature", ASML. The term "FPD" is a rather general term describing the complete focus error associated with the photolithographic stepper or scanner-deviations from the focal plane in reference to the wafer surface. Among other things, FPD can be caused by lens tilt, stage/reticle tilt, reticle bow, lens field curvature, and stage synchronization error. FIG. 3a shows a generic photolithographic leveling system. FIGS. 3b and 3c illustrate some common reticle patterns (e.g., the IBM Corporation Phase Shift Focus Monitor (PSFM), and the ASML FOCAL alignment mark) that are used to determine FPD for both steppers and scanners. Typically, FPD calibration/monitoring is performed daily or at least weekly to ensure that the stepper or scanner is operating within design limits (verifying the focus system works, the stage is level, etc.). While both techniques are widely accepted both techniques require complex calibrations to be performed at each field point. See, for example, "Detailed Study of a Phase-Shift Focus Monitor", G. Pugh et al., SPIE, Vol. 2440, pp. 690-700, 1995; and "Latent Image Metrology for Production Wafer Steppers", supra.
These FPD prior art methods are listed Table 1 below:
TABLE 1MethodMeasurement TypeCommentISI (See, for example, U.S. Pat. No.AbsoluteExtremely accurate.5,828,455, supra and U.S. Pat. No.5,978,085, supra)FOCAL (See, for example, "FOCAL,RelativePublished version claimsP. Dirksen et al., SPIE, Vol. 2440, p.high absolute accuracy,701, 1995)resolution averaging inpracticeIBM focus monitor (See, for example,AbsoluteRequires 'calibration'. It"Optical Focus Phase Shift Testis very processPattern, Monitoring System andindependent.Process", T. Brunner et al., U.S.Pat. No. 5,300,786, Apr. 5, 1994)Schnitzl (See, for example,Relative with oneComplex calibration,"Distinguishing Dose from Defocusexposurevarying target sensitivity,for In-Line Lithography Control",sign of focus ambiguous.supra)TIS (See, for example, "193 Step andRelativeRelies on wafer Z-stage,Scan Lithography", supra and "Twinaccuracy/repeat.Scan 1100 Product Literature", supra)
ISI (Litel): A method for determining the aberrations of an optical system is described in U.S. Pat. No. 5,828,455 to A. Smith supra and U.S. Pat. No. 5,978,085 to A. Smith supra. In these descriptions, a special reticle is used to determine the Zernike coefficients for photolithographic steppers and scanners. Knowing the wavefront aberration (Zernike coefficients and the associated polynomial) associated with the exit pupil of the projection system includes information about the lens field curvature or focus (Zernike coefficient a4, for example). A special reticle and a self-referencing technique are used to rapidly identify FPD to a high degree of accuracy and determine focusing errors to ˜5 nm, even in the presence of scanner noise. This method automatically determines lens field curvature information for both static and dynamic exposure tools (steppers and scanners).
PSFM: A method (Phase Shift Focus Monitor) described in U.S. Pat. No. 5,300,786 supra, can be used to determine and monitor the focal plane deviation (FPD) associated with the lithographic process. More information can be found in the document "Detailed Study of a Phase-Shift Focus Monitor", referred to above. In general, an alternating PSM with phase close to 90° possesses unusual optical properties that can be exploited to measure focus errors. See, for example, "Quantitative Stepper Metrology Using the Focus Monitor Test Mask", T. Brunner et al., SPIE, Vol. 2197, pp. 541-549 and "Using the Focus Monitor Test Mask to Characterize Lithographic Performance", supra. It is generally possible to design a "box-in-box" overlay target using a phase shift mask pattern (called here a focusing fiducial; see FIGS. 3b and 3c), in which the measured overlay error is proportional to the focus error (see FIG. 5). Focal plane non-flatness is then determined by measuring the focusing fiducials across the lens field. Astigmatism information appears as differences between the delta-X overlay error and the delta-Y overlay error measurement. This technology has also been used for assessing variations in focus across the wafer due to lens heating, misfocusing near the edge of the wafer, and chuck/stage non-flatness. One major drawback with the PSFM method is that a fairly elaborate calibration procedure (focus offset vs. overlay shift for each field point) is required before it can be used, as the PSFM technique is rather sensitive to the source-sigma (i.e., NA-source/NA-objective) that varies from process to process. Additional PSM techniques, such as those described in "Focus Monitor for Alternating Phase Shift Masks", L. Liebmann et al., U.S. Pat. No. 5,936,738 issued Aug. 10, 1999, are used in a similar way. While the PSFM method provides an FPD map across a scanner or stepper field it does not provide a method for determining the dynamic lens field curvature independent of wafer height variation in the presence of stage synchronization error. See, for example, "Comprehensive Focus-Overlay-CD Correlation to Identify Photolithographic Performance", Dusa et al., SPIE, Vol. 2726-2729, 1996.
FOCAL: A method (FOCAL—Focus determination using stepper alignment system) described by P. Dirksen et al. in "FOCAL", supra, specifies a focusing fiducial that can be used to find FPD and astigmatism across the exposure field (lens). FOCAL alignment marks (focusing fiducials) consist of modified wafer alignment marks that are measured using the stepper wafer alignment subsystem. See "Latent Image Metrology for Production Wafer Steppers" by P. Dirksen et al., SPIE Vol. 2440, 1995 at pp. 701-711. Defocus of the tool results in an apparent shift of the center of the alignment mark relative to that of the 'best focus' position. The FOCAL technique makes use of the exposure tool's alignment mechanism and therefore requires that the stepper or scanner be off-line for the length of the measurement sequence. FOCAL marks are sensitive to exposure and sigma like the PSFM method; however, since fiducial response is a function of pitch, the target features are less dependent upon reticle error. Furthermore, the FOCAL data (focus vs. overlay error) must be calibrated for every point in the exposure field similar to phase-shift monitors (typically at 121 points across an exposure field). Now, it is possible to use FOCAL to separate out lens tilt and astigmatism from dynamic FPD maps and provide a dynamic focal plane map, but wafer height variation and stage synchronization errors would still be included in the result. See, for example, "193 Step and Scan Lithography", supra, and "Comprehensive Focus-Overlay-CD Correlation to Identify Photolithographic Performance", Dusa et al., SPIE, Vol. 2726-2729, 1996.
Schnitzl Targets: A method described in "Distinguishing Dose from Defocus for In-Line Lithography Control", supra, makes use of line-end shortening effects to decouple focus drift from exposure drift on semiconductor product wafers. FIG. 3c shows a typical pair of Schnitzl targets (focusing fiducials). It is widely known that resist line-ends (FIG. 3c) are very sensitive (exhibit greater line-end shortening) to both focus and exposure drifts; the effect is further enhanced as the lithographic process is pushed near performance limit of the scanner tool (˜λ/2NA). Using the Schnitzl targets and a fairly elaborate method of calibration (CD-SEM measurements and a coupled system of equations), Ausschnitt describes a method that can determine the magnitude of focus drift on product wafers using one or more exposures in the presence of exposure drift. Since changes in focus and exposure can produce similar changes in the critical dimension (CD), the Schnitzl method is useful for day-to-day process monitoring because it eliminates the need to constantly perform focus and exposure experiments (FEM—a Focus Exposure Matrix) in-between production runs. In addition, the method uses fast and accurate optical overlay tools to measure the Schnitzl patterns (in several forms, CD targets or Overlay targets, FIG. 3b) after wafer processing, this saves monitoring costs because optical overlay tools are less expensive to operate as compared with a CD-SEM. While decoupling focus drift from exposure drift is useful for process monitoring, the method in its present form requires two exposures at different focus settings to determine the absolute focal drift (direction). Performing extra exposures during production runs is very costly. In addition, since the initial Schnitzl target calibration procedure depends on a number of lithographic tool settings (line size, pitch, sigma, NA) re-calibration is required for each lithographic process change—including changes in metrology tools. The Schnitzl focusing fiducials are often used to map out FPD across a stepper or scanner field, but methods similar to those described in "Comprehensive Focus-Overlay-CD Correlation" by Dusa, supra, would need to be implemented to obtain a dynamic focus map. Nevertheless, wafer height variation and scanning dynamics are not considered in the discussion.
Summarizing:
We have described several methods for determining FPD. Common to all of these methods is that a feature (focusing fiducial or FF) is printed on a wafer and the focusing fiducial subsequently measured. The data from the focusing fiducial is processed and an FPD value, δZ, determined. Further, and common to all these methods, the contributions of wafer height, lens aberrations (in the form of lens field curvature), and stage synchronization are not resolved into their distinct components.

This patent is subject to a terminal disclaimer.

Apparatus and process for determination of dynamic lens field curvature


A planar fully integrated variable reluctance micromotor (10) is microfabricated on a substrate base (18). The micromotor includes a pin (19), rotor (12) with radially extending poles (16), and a stator (20) having a plurality of poles (21) configured in pairs (22) circumferentially spaced about the rotor. The rotor is microfabricated in place, or in situ, contiguous to the substrate base. The pairs of stator poles include a multilevel core (26) wrapped around a meander conductor (27) which is connected to bonding pads (32). The variable reluctance micromotor is particularly adapted to operating as a micropump (45) for conductive fluids.

Microstructures are being used more and more in a variety of applications such as chemical processes, medical procedures, and space navigation systems. Several specific kinds of microstructures which are desirable in such applications are microvalves, micropumps, microsensors, and microfans. The development of these micromechanical structures requires comparably sized micromotors to drive these microstructures. However, the technology necessary to fabricate micromotors is in a state of infancy. A great amount of effort is presently being directed toward developing practical micromotors which can be fabricated using microfabrication techniques similar to those used in manufacturing semiconductors so that they can be economically produced on a mass scale in order to satisfy present demand. Unfortunately, the microscopic nature of these structures and motors makes the implementation of the simplest idea complex, tedious and time consuming, often resulting in a non-intuitive solution.
Various operating principles have been considered for micromotors such as electrostatic, ultrasonic, dielectric induction, and magnetic. Of the several proposed operating principles, electrostatic and magnetic drives have generally been favored.
Electrostatic micromotors operate by selectively applying a potential difference between a rotor and selected poles of a stator surrounding the rotor. As a result, the rotor poles closest to the charged stator poles of an opposite charge are pulled toward the stator pole causing the rotor to rotate. A limitation to the speed and rotational force of the electrostatic micromotor is the threshold voltage at which the electric field breaks down in the air gaps between the stator poles and rotor poles. This threshold voltage is controlled by a number of factors such as temperature, pressure and surface smoothness. Examples of electrostatic micromotors can be found in U.S. Pat. No. 5,252,881 to Muller et al., U.S. Pat. No. 4,943,750 to Howe et al., and U.S. Pat. No. 5,013,954 to Shibaike et al.
Magnetic micromotors generally fall into one of two categories, salient, meaning with poles, or non-salient, meaning without poles. The two types are most easily differentiated by the fact that variable reluctance magnetic micromotors usually include poles, while variable inductance micromotors usually do not include poles. Unlike electrostatic micromotors which are driven by voltage, magnetic micromotors are driven by magnetic flux typically generated by current flowing through an inductive component in accordance with Ampere's law. An example of a magnetic micromotor can be found in U.S. Pat. No. 5,113,100 to Taghezout.
Though not presently developed to the extent of electrostatic micromotors, magnetic micromotors have several advantages over electrostatic micromotors with regard to the environment in which the motors operate and the functions which they are capable of performing. For example, magnetic micromotors may be used in conductive fluids for bio-medical or chemical applications. Additionally, since magnetic micromotors usually require low driving voltages, the operation of magnetic micromotors is not inhibited by environments where high driving voltages are unacceptable or unattainable. Lastly, magnetic micromotors are often preferred over electrostatic micromotors because of their ability to achieve relatively high torques. Consequently, because of these advantages, magnetic micromotors are more attractive than electrostatic micromotors for many applications.
However, the development of a practical magnetic micromotor has been frustrated because of various difficulties encountered in their fabrication. Magnetic micromotors have previously been implemented by placing a permanent magnet rotor onto integrated planar coils and then introducing externally applied magnetic fields onto the assembled high-permeability moving parts, or by assembling electroplated rotors onto stators fabricated with wire-bonded coils. A reason that these approaches have been taken is due to the difficulty in fabricating three dimensional `wrapped` coils using an integrated and planar fabrication process, as well as due to the lack of techniques to fabricate the rotor and the stator in a fully integrated fashion using electroplating techniques. However, recently a new three dimensional planar integrated meander-type inductive component has been proposed and demonstrated in Chong Ahn, Yong Kim and Mark Allen, "A Planar Variable Reluctance Magnetic Micromotor With Fully Integrated Stator and Wrapped Coils," IEEE Micro Electro Mechanical Systems Workshop, pp. 1-6, Fort Lauderdale, Fla., 1993, the disclosure of which is incorporated herein by reference, in which multilevel magnetic cores were `wrapped` around planar meander conductors. This configuration can be thought of as the result of interchanging the roles of the conductor wire and magnetic core in a conventional inductor. With this integrated inductive component, it is possible to guide magnetic flux confined in an integrated magnetic core to the locations where magnetic actuation or sensing take place.
In further regard to the device disclosed in Ahn et al. are the structural configuration and fabrication technique utilized therein. Structurally, the rotor is spaced from the substrate base and positioned in the same plane as the top layer of the core. The rotor rests upon a pin bearing surface disposed on the pin support. In fabricating this micromotor, the rotor is first formed on a substrate separate from the pin and stator. The rotor is then released from the substrate and microassembled onto the pin. With this hybrid-assembled rotor, the micromotor achieves almost the smallest contact gap possible between the pin and rotor. Even though such optimal contact gap is achievable through the teachings of Ahn et al., the difficulties associated with microassembling the rotor onto the pin were not resolved. Thus, it would not be feasible to mass produce magnetic micromotors economically because of high production cost and manufacturing difficulties encountered with hybrid-assembling techniques.
Thus, it can be seen that it would be desirable to fully integrate the rotor and pin in manufacturing, eliminating the need to microassemble the rotor onto the pin. However, one of the difficulties in fabricating a fully integrated magnetic micromotor is how to produce a rotor of precise dimensions and having uniform gaps between the rotor poles and stator poles. The photolithography techniques used in forming fully integrated electrostatic micromotors are not directly applicable to magnetic micromotors for two reasons. First, electrostatic micromotors are thin film structures and magnetic micromotors are thick film structures. Secondly, electrostatic micromotors are planar structures with essentially all components in the same plane. In contrast, magnetic micromotors require multiple layers for construction of the multilevel wrapped coil. Therefore, to date, no known fully integrated magnetic micromotors have been developed.

Fully integrated magnetic micromotors and methods for their fabrication


An automatically re-configurable solar array apparatus is disclosed. The apparatus includes a solar array electrically connected to an inverter through a power switch controlled by a microprocessor. The solar array comprises a combination of solar panel strings wired in parallel. Each solar panel string comprises a plurality of solar panels wired in series. An output electrical parameter level of the combination of solar panel strings is capable of producing output power from the inverter. The output electrical parameter level of the combination of solar panel strings is equal to about a predetermined electrical parameter level under sunny conditions. The solar array is pre-wired to permit microprocessor-controlled switching to reconfigure the array into solar panel strings of varying lengths. The electrical parameter level is at least one of a voltage level, a current level, and a power level.

Conventional photo-voltaic solar arrays are comprised of individual solar panels wired in series as strings (i.e., sub-arrays) to attain a selected (i.e., predetermined range of) voltage output. The strings may be wired in parallel to provide a desired current/power (See FIG. 1). These arrays/strings are wired into a combiner box, which comprises a group of disconnects and bus bars.
Both large and small photo-voltaic solar arrays produce power when the sun is shining brightly and at certain (i.e., direct) angles. As the angle of the sun decreases, fewer photons may strike a panel, since oblique angles of incident light cause the photons to spread over a larger area. As a result, power output decreases. Power output also decreases as a result of cloud cover. Unfortunately, there may not be sufficient string voltage and/or current to "push" electricity through an inverter to produce a useable output power. While it is true that the open circuit voltage (OCV) of a solar pane(s)/array may be unaffected by low light periods/shallow sun angles/cloud cover, it is also true that if a load (such as an inverter) is applied, panel and thus string voltage will drop immediately and no output from the inverter would be provided.
As a result, energy production of photo-voltaic solar arrays is lost each day. Sun angle/cloud cover problems lower daily energy production, lower power output, and lower useable power, and hence lower electrical production/revenue. This lost time/energy production may be as much as 15% to 35% per day of energy production.

Instantaneous solar array recombining technology


A supporting device for a display apparatus having a simplified configuration and an ease in manufacture with reduced manufacturing costs, and a display apparatus having the same. The supporting device includes a first supporting member coupled to a body of the display apparatus and defining therein a bore having an opened bottom, a second supporting member having a connecting portion to be inserted into the bore, an outer surface of the connecting portion being configured to correspond to the bore, a base to support the second supporting member, a connecting shaft to rotatably connect the first supporting member with the connecting portion and having both ends fixed to the first supporting member, and a friction structure provided between an outer surface of the connecting shaft and the connecting portion.

1. Field of the Invention
The present invention relates to a supporting device for a display apparatus, and, more particularly, to a supporting device for a display apparatus, which has a simplified configuration and an ease in manufacture, and a display apparatus having the same.
2. Description of the Related Art
A display apparatus, such as an LCD or PDP, includes a supporting device to support a body of the display apparatus such that the display apparatus can be used on a desk or table. Conventionally, the supporting device for the display apparatus has the function of adjusting the screen angle of the body, etc.
Korean Patent Laid-Open Publication No. 2006-0074206 (published on Jul. 3, 2006) discloses an example of the supporting device. The conventional supporting device comprises a pivot bracket coupled to a rear surface of a monitor body, and a stand having an upper end rotatably connected to the pivot bracket by a monitor hinge unit and a lower end rotatably connected to a base by a base hinge unit. The conventional supporting device further comprises a link bar to keep the monitor body at a constant angle while the height of the monitor body is being adjusted. Together with the upper end of the stand, an upper end of the link bar is coupled to the pivot bracket by means of a hinge shaft of the monitor hinge unit. Also, together with the lower end of the stand, a lower end of the link bar is coupled to the base by a hinge shaft of the base hinge unit.
The above described supporting device for a display apparatus has a great number of elements including the stand, the link bar, the monitor hinge unit, the base hinge unit, etc., and consequently, suffers from a complicated configuration. Therefore, the conventional supporting device is difficult and expensive to manufacture.

Supporting device for display apparatus and display apparatus having the same


An improved method and apparatus for filtering electronic mail. The method and apparatus allows the receiver of electronic mail to make a decision to accept, reject, prioritize, or expedite delivery of a piece of electronic mail based on the value of an attached electronic stamp. The apparatus consists of two complimentary parts: a sender side part with responsibility for attaching the electronic stamp; and a receiver side part with responsibility for removing the electronic stamp and filtering the electronic mail based on the value of the electronic stamp. The method and apparatus are used in a system for reducing or eliminating the amount of junk electronic mail in the electronic mail system.

1. Field of Invention
This invention relates to electronic mail, specifically an improved method for filtering electronic mail.
2. Prior Art
Electronic mail, the electronic equivalent of paper based letters and memoranda, is a widely used means of written communication. Its primary advantages over other forms of written communication are its short delivery time and its low cost. These two factors contribute greatly to electronic mail's current popularity.
Unfortunately, this popularity comes with a price tag. Because electronic mail is easy, quick, and inexpensive, people seem inclined to create more of it. This forces the receiver to read and sort ever increasing quantities of it--a task that can take a considerable amount of time and effort.
Because of this, methods for automatically analyzing and filtering incoming electronic mail were developed.
Filtering
Most filtering methods build upon the premise that the receiver is not equally interested in all types of subject matter. Such methods perform some type of content based filtering on electronic mail. Content based filters examine the address of the sender of the electronic mail, the subject of the electronic mail, or the body of the electronic mail in order to decide what action to take.
One of the most popular stand-alone packages available, and one of the best examples of the state of the art, is a package called Procmail. Procmail, created by Stephen R. van den Berg, is an autonomous electronic mail processor. Once properly configured with a set of patterns and their associated actions, it goes to work on incoming electronic mail. Procmail examines each piece of electronic mail. It looks for a sequence of characters matching any one of the set of user-defined patterns. If such a sequence is found, Procmail performs the associated action on the piece of electronic mail.
An article by Arensburger and Rosenfeld, entitled "To Take Arms Against a Sea of Email", published in the Vol. 38, No. 3, March 95 edition of Communications of the ACM, describes a method for filtering electronic mail. Their scheme, nicknamed Jeeves, uses the MH mail system and a PERL package to filter electronic mail based on who it came from and who it was addressed to.
Examples of inventions claiming filtering functionality include:
U.S. Pat. No. 5,377,354 to Scannell et al. describes a method of prioritizing electronic mail based on stored rules. The system relies on keywords chosen by the user which, when found in the body of a piece of electronic mail, provide the basis for prioritization.
U.S. Pat. No. 5,555,346 to Gross et al. describes a system for triggering events in response to electronic mail messages. The events could include the filtering of electronic mail messages.
U.S. Pat. No. 5,613,108 to Morikawa describes a method of storing a data file written in an electronic mail in a folder based on a classification of the data file according to specific data contained in the electronic mail.
U.S. Pat. No. 5,619,648 to Canale et al. describes a technique for reducing the amount of electronic mail received by a user of an electronic mail system. Their solution involves adding, on the sender's side, non-address information to the electronic mail. The receiver's electronic mail filter has access to a model of the user and his or her preferences. The electronic mail filter uses the non-address information and the model information to determine whether or not the electronic mail should be provided to the user.
Junk Electronic Mail
A major annoyance associated with conventional mail is junk mail. Junk mail is typically unsolicited, is often distributed in large quantities, and is, by definition, of little interest to most of its recipients. Unfortunately, electronic mail systems suffer from their own version of the same.
Junk electronic mail is similar in spirit to junk mail, junk phone calls, and junk faxes. In each case the receiver receives unwanted material or solicitations from another party. Junk electronic mail, however, has two significant advantages the others do not. First, electronic mail is easy to send in large quantities. Off-the-shelf software can automate much of this process as well as assemble target mailing lists and handle responses. Second, electronic mail is inexpensive, especially when compared with the cost of bandwidth hungry network activities such as file transfers and image data transfers.
Junk mail (including junk electronic mail) depends for its success on it ability to satisfy two requirements. The first requirement is broad distribution. Broad distribution is necessary because typically only a small number, perhaps 1 or 2 percent, of the targeted recipients ever respond. The second requirement is low incremental cost. Because so few recipients respond, distribution costs will quickly consume profits--unless those distribution costs are small.
Junk electronic mail is successful because it satisfies both of these requirements extremely well. Any successful solution to the problem of junk electronic mail must address this fact.
A solution is necessary. The author already receives more junk electronic mail than non-junk electronic mail on any given day.
Filtering Junk Electronic Mail
Although originally designed to sort and categorize electronic mail, electronic mail filters (such as those cited above) are now being applied to the problem of detecting and rejecting junk electronic mail. Existing filters, however, have seen only moderate success. In large part, this is because they all suffer from several flaws:
First, content based filtering is difficult to do correctly.
As Canale et al. say in their background, "A problem with all such filters is that sorting for another person is difficult, even for a human being, and if a filter is going to be useful, it cannot do much worse than a human would".
This flaw shows itself in the following dilemma: content based filtering will sooner-or-later either allow through a piece of electronic mail it should have rejected, or worse, reject a piece of electronic mail it should have allowed through. Systems that depend entirely on content based filtering are especially vulnerable. A successful solution to the problem of junk electronic mail must either dramatically improve upon current content based filtering methods, or it must reduce the significance of the role content based filtering plays.
Second, none of the prior art cited above encourages the sender to voluntarily limit distribution.
Filtering electronic mail on the receiver's side is much more expensive and time consuming than simply limiting its distribution on the sender's side. Electronic mail is both easy to send and inexpensive. Therefore, there is no incentive for the sender to identify those receivers likely to be interested in the electronic mail, and to voluntarily limit its distribution to those individuals. On the contrary, the existence and use of content based filtering encourages just the opposite behavior--in order to meet response goals the sender must broaden his or her distribution. An effective solution to the problem of junk electronic mail must encourage the sender to do just the opposite.
Third, none of the prior art cited above provides a mechanism by which the sender can influence the receiver side filtering process by rating his or her own electronic mail.
Research has shown that an electronic mail filtering system can effectively use information provided by the sender to more efficiently rate a piece of electronic mail. The fatal difficulty has always been honesty. The information provided by the sender must honestly and reliably convey information about the importance of the piece of electronic mail to the receiver. A successful solution will result in a system in which the receiver can trust the sender's evaluation of the importance of the electronic mail.
This invention provides an improved method and apparatus for filtering electronic mail that addresses each of the flaws mentioned above.

Electronic mail filtering by electronic stamp


An air cleaner device is disposed beside an engine chamber. A connection pipe is connected to the engine chamber and the air cleaner device. The air cleaner device is adjacent to an accumulator. The air cleaner device has a lower box, an upper cover covering the lower box, four clamp devices disposed on four upper corners of the lower box, and a filter device disposed in the lower box. A connection pipe is connected to the upper cover. An air inlet pipe is connected to the lower box. An air activation block is disposed on the filter device. A large number of air passages are formed on the air activation block.

The present invention relates to an air cleaner device. More particularly, the present invention relates to an air cleaner device which has an energy saving air activation block.
Referring to FIGS. 1 to 3, a conventional air cleaner device 2' is disposed beside an engine chamber 1'. A connection pipe 3' is connected to the engine chamber 1' and the conventional air cleaner device 2'. In general, the conventional air cleaner device 2' is adjacent to an accumulator 4'. The conventional air cleaner device 2' comprises a lower box 7', an upper cover 6' covering the lower box 7', four inner bars 8' disposed in the lower box 7', four clamp devices 14' disposed on four upper corners of the lower box 7', and a filter device 10' disposed in the lower box 7'. A connection pipe 3' is connected to the upper cover 6'. An air inlet pipe 5' is connected to the lower box 7'. The filter device 10' comprises a frame 11', a large number of posts 12' disposed in the frame 11' and a plurality of filteration elements 13' supported by the posts 12'. However, the gasoline in the engine chamber 1' cannot be burned completely.


A method for producing a colored cosmetic composition having inorganic pigments resistant to agglomeration in an oil-in-water emulsion. The method includes the following: preparing an oil dispersion by adding inorganic pigments directly to an oil; preparing an aqueous base that includes water; combining the oil dispersion and aqueous base; and partitioning the inorganic pigments between the oil and the aqueous phase under controlled conditions, for example, hydrophile-lipophile balance, agitation time and speed, and cooling rate. The present invention provides a process to easily disperse iron-oxide pigments, even black iron-oxide pigments, in oil-in-water emulsions. The present invention provides colored cosmetic compositions that have excellent properties, such as smoothness, adhesion to skin, uniform color, ease of removal, smudge resistance and non-oiliness.

This invention relates to a novel process for preparing metal oxide pigment dispersions. More particularly, this invention relates to pigment dispersions that are well-suited to color cosmetics.
Various cosmetic products, such as loose or compact powders, make-up foundations, blushes, eye shadows and lipsticks are colored using inorganic pigments dispersed in a carrier. Examples of these inorganic pigments are iron oxides, zinc oxide, talc, titanium dioxide, chromium hydroxide, and chromium oxide. The formed cosmetic products may be oil-in-water emulsions, water-in-oil emulsions or anhydrous compositions.
In general, cosmetics must (1) feel smooth and apply uniformly, (2) be easy to remove, (3) be hard to smudge and (4) be non-oily. Water or aqueous based cosmetics satisfy most of these requirements, usually in the form of oil-in-water emulsions. Oil-in-water emulsions are desirable because they have a pleasing skin-feel and texture. Moreover, they do not have the greasy feel of water-in-oil emulsions or the rough, dry, powdery feel of anhydrous cosmetic compositions.
Despite the desirable properties of oil-in-water emulsions, it is difficult to prepare these emulsions while maintaining even dispersion of inorganic pigments within the emulsions. This is because inorganic pigments, especially metal oxide pigments, tend to agglomerate. Specifically, the pigment particles attract to one another and form a colloid or enlarged clump of pigment when added directly to oil-in-water dispersions. If the pigments are not evenly dispersed, aesthetically unpleasing dark spots or swirls may appear in the final cosmetic. Further, the uneven dispersions or agglomeration of pigment particles creates an abrasive feel on the skin.
A variety of methods are used to enhance dispersion and prevent agglomeration of inorganic pigments. In all of these methods, the pigment particles are treated and directly added to the oil-in-water emulsion or the water phase of the oil-in-water emulsion to provide coloring. One method disclosed in U.S. Pat. No. 5,260,052 to Peters et al, coats inorganic pigments with polymers to promote even dispersion in a water base. Another method in U.S. Pat. No. 6,004,567 to Marchi-Lemann uses nano-pigment particles mixed with fillers and dispersed in a water base. Yet another method directly coats metal oxide pigments with a hydrophilic surfactant to increase its water dispersibility when added directly to an oil-in-water emulsion.
The above methods produce acceptable results for some inorganic pigments, but typically fail to evenly disperse metal oxide pigments in the emulsion. This problem is particularly acute when using black iron-oxide pigments. Due to their magnetic nature, iron-oxide pigments agglomerate even when they are treated with the methods above. Thus to keep the pigment particles evenly dispersed in the oil-in-water emulsion, high-speed shearing mixers are used. Even when such techniques are implemented, re-agglomeration may occur in holding tanks before the finished product is poured into retail sale packaging. To prevent this, many manufacturers add a second high-speed mixer to the holding tank. In some cases, however, a high-speed mixer over-agitates, whips or froths the product before it is poured into retail containers. Resulting froth or air bubbles can cause color changes, discoloration, air pockets and/or pigment particle agglomeration in the final product.

Pigment dispersion and related method of manufacture


The disclosure is related to creating different functional micro devices by integrating functional tuning materials and creating an encapsulation capsule to protect these materials. Various embodiments of the present disclosure also related to improve light extraction efficiencies of micro devices by mounting micro devices at a proximity of a corner of a pixel active area and arranging QD films with optical layers in a micro device structure.

System performance can be enhanced by integrating different micro devices into a system substrate. The challenge is that different micro devices can have different performance and also use different material systems. These material systems are in general sensitive to environmental agents (e.g., oxygen or water). Therefore, it is desirable to provide protection to these materials to enhance system performance.

Method of integrating functional tuning materials with micro devices and structures thereof


A patterning method is provided. First, a mask layer and a plurality of first transfer patterns are sequentially formed on a target layer. Thereafter, a plurality of second patterns is formed in the gaps between the first transfer patterns. Afterwards, a plurality of third transfer patterns is formed, wherein each of the third transfer patterns is in a gap between a first transfer pattern and a second transfer pattern adjacent to the first transfer pattern. A portion of the mask layer is then removed, using the first transfer patterns, the second transfer patterns and third transfer patterns as a mask, so as to form a patterned mask layer. Further, a portion of the target layer is removed using the patterned mask layer as a mask.

1. Field of Invention
The present invention relates to a patterning method and an integrated circuit structure.
2. Description of Related Art
Non-volatile memories provide the property of multiple entries, retrievals and erasures of data, and are able to retain the stored information even when the electrical power is off. As a result, non-volatile memories are widely used in personal computers and consumer electronic products.
As the level of integration of a non-volatile memory is getting higher, the critical dimension of the same is getting smaller. Minimizing the critical dimension and increasing the level of integration have become the mainstream in the industry, and the key technology is in photolithography.
In the photolithography process, it is known that raising a line or space resolution beyond 65 nm, especially a line/space width of no more than 25/25 nm, in the current state of technology is rather difficult, unless a light source having a shorter wavelength and a corresponding photoresist are used. However, it is very costly to replace existing machines entirely with new machines for this purpose.
Accordingly, how to reduce a line/space width to no more than 25/25 nm with existing machines and processes has become an important topic in the industry.

Patterning method and integrated circuit structure


The digital logic level conversion circuit is for converting a small sinusoidal signal or an unbalanced digital signal to a balanced digital signal with 50% duty ratio, and includes an input level shift circuit, two differential amplifiers, an RS flip-flop, a charge-pump circuit, and a bias circuit. The input level shift circuit for AC coupling a sinusoidal wave with a small amplitude (with a minimum of 0.4 Vpp) and converting it into a middle logic level. The two differential amplifiers is used as comparators having hysteresis each other, operates inversely, and outputs digital signals into the RS flip-flop; the bias circuit for controlling a driving current of the differential amplifiers; the RS flip-flop for driving the charge-pump circuit by outputting a digital signal upon receiving outputs from the differential amplifiers; and the charge-pump circuit for generating a reference potential level of the differential amplifiers.

1. Field of the Invention
This invention relates to a digital logic, level conversion circuit, and more particularly a digital logic level conversion circuit with a small sinusoidal wave input for converting a level of signal in order to use a sinusoidal wave with a small amplitude of several hundreds mV as a source of clock of an internal digital circuit.
2. Description of the Prior Art
Typically, a majority of circuit of late is possible to be integrated highly and has been replaced with an economical and reliable digital logic circuit. This trend is matched to customer's taste. In other words, a purchase desire of general customer can be raised through a miniature of size and a lightness of weight.
Therefore, a single chip of a high degree of integration has a remarkable tendency to incorporate a variety of function compoundly.
As a result, a circuit for converting a sinusoidal input with a small amplitude into a digital level can be designed very variously. For example, there is a method to amplify a signal with a small amplitude using an amplifier and then increase a noise margin by use of a schmitt trigger circuit and other circuits. In the method, however, a center potential is changed due to a perturbation of an offset potential when an outputted digital signal is amplified and the variation of a duty ratio of a source of digital clock outputted by hysteresis of a locked schmitt trigger circuit is very large.
Using this digital signal in general as a source of clock of a circuit causes a problem. Particulary, the clock used in a comparator such as a mixer circuit or an analog to digital (A/D) converter must be a clock with a duty ratio of just 50%.
In view of the foregoing problem, it is therfore an object of this invention to provide a signal conversion circuit which generates successively a digital signal with a duty ratio of just 50% and is not susceptible to a variation of semiconductor process, in other words, a digital logic level conversion circuit with a small sinusoidal input, as a circuit for converting a level of signal to use a sinusoidal wave with a small amplitude of several hundreds mV as a source of clock of an internal digital circuit, which allows the generated digital output to have an exact duty ratio of 50%.

Digital logic level conversion circuit with a small sinusodal wave input

Electronics and Telecommunications Research Institute


A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and (C) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of forming a negative pattern by development of the film with a developer containing an organic solvent after the exposing of the film, wherein a content of the compound (B) is 21% by mass to 70% by mass on the basis of all solids content of the composition.

In the manufacturing processes of semiconductor devices such as IC and LSI, fine process by lithography with a photoresist composition has been conventionally carried out. In recent years, ultrafine pattern formation of a sub-micron region and a quarter micron region has been required with higher integration of integrated circuits. In such a circumstance, exposure wavelength also shows a tendency to become shorter such as from g-rays to i-rays, and further to KrF excimer laser rays. Further, besides KrF excimer laser rays, development of lithography using electron beams, X-rays or EUV rays is also now progressing.
Lithography using electron beams, X-rays or EUV rays is positioned as a pattern-forming technique of the next generation or the next of the next generation, and resist compositions of high sensitivity and high resolution are desired.
In particular, for shortening the processing time of wafers, increase of sensitivity is a very important subject. However, pursuit of higher sensitization is accompanied by lowering of pattern form and resolution that is shown by limiting resolution line width, accordingly development of a resist composition satisfying these characteristics at the same time is strongly desired.
High sensitivity, high resolution and a good pattern form are in a relationship of trade-off, and it is very important how to meet these characteristics at the same time.
There are generally two types of actinic ray-sensitive or radiation-sensitive resin compositions, that is, one is a "positive" resin composition using a resin hardly soluble or insoluble in an alkali developer and capable of forming a pattern by making an exposed part soluble in an alkali developer by exposure with radiation, and another is a "negative" resin composition using a resin soluble in an alkali developer and capable of forming a pattern by making an exposed part hardly soluble or insoluble in an alkali developer by exposure with radiation.
As such actinic ray-sensitive or radiation-sensitive resin compositions suitable for lithographic process using electron beams, X-rays or EUV rays, chemical amplification type positive resist compositions primarily utilizing acid catalytic reaction are examined from the viewpoint of the increase in sensitivity, and chemical amplification type positive resist composition comprising phenolic resin having a property insoluble or hardly soluble in an alkali developer and capable of being soluble in an alkali developer by the action of an acid (hereinafter abbreviated to a phenolic acid-decomposable resin), and an acid generator as the main components are effectively used.
On the other hand, in manufacturing semiconductor devices and the like, there are requirements to form patterns having various forms such as lines, trenches, holes, etc. For meeting the requirements for forming patterns having various forms, not only positive resin compositions but also negative actinic ray-sensitive or radiation-sensitive resin compositions have been developed (for example, refer to JP-A-2002-148806 (The term "JP-A" as used herein refers to an "unexamined published Japanese patent application".) and JP-A-2008-268935).
In forming super fine patterns, further improvements of the reductions of resolution and a pattern form are required.
For solving these problems, a method of developing an acid-decomposable resin with a developer other than an alkali developer is also proposed (for example, refer to JP-A-2010-217884 and JP-A-2011-123469).
However, it is demanded to satisfy high sensitivity, high resolution, and high line width roughness (LWR) performance in a super fine processing region at the same time on a higher order.

Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device