By predoping of a layer of deposited semiconductor gate material by incorporating dopants during the deposition process, a high uniformity of the dopant distribution may be achieved in the gate electrodes of CMOS devices subsequently formed in the layer of gate material. The improved uniformity of the dopant distribution results in reduced gate depletion and reduced threshold voltage shift in the transistors of the CMOS devices.

1. Field of the Invention
The present invention generally relates to the fabrication of integrated circuits, and, more particularly, to the manufacture of CMOS gate structures comprising a predoped gate material, such as a predoped polysilicon, with an improved uniformity of the dopant distribution.
2. Description of the Related Art
The fabrication of integrated circuits requires the formation of a huge number of circuit elements on a given chip area according to a specified circuit layout. Generally, a plurality of process technologies are currently practiced, wherein, for logic circuitry, such as microprocessors, storage chips and the like, CMOS technology is currently the most promising approach, due to the superior characteristics in view of operational speed and/or power consumption. In this technology, millions of complementary transistors, i.e., N-channel transistors and P-channel transistors, are formed on an appropriate substrate, wherein the ongoing demand for an improved circuit functionality at a maintained chip area or a reduction of chip area while maintaining circuit functionality forces the present trend of scaling transistor dimensions and has additionally rendered transistors with a moderately low ratio of width and length, also referred to herein as narrow width devices, a preferred circuit element for highly advanced CMOS devices. The corresponding reduction of transistor width and length enables a significant reduction of the required chip area of advanced transistor circuit elements, thereby allowing a device functionality and/or chip size that may not be achieved with conventional CMOS devices having a high width/length ratio.
MOS transistors are formed in and on semiconductor regions of a substrate. The regions are separated from adjacent circuit elements by surrounding isolation structures. A typical MOS transistor comprises PN junction regions that are separated from each other by a channel region, which is controlled by a gate electrode formed above the channel region and separated therefrom by a thin insulating layer. The dimension of the channel region corresponding to the distance between the two PN junction regions, which are also referred to as the drain region and the source region, is denoted as channel length and represents the dominant design characteristic of the MOS transistor. The channel width is the dimension of the channel in the substrate plane in the direction perpendicular to the length direction. The channel width is determined by the spacing between the isolation structures in this direction.
By reducing the channel length and width of the transistor, not only the transistor size but also the functional behavior thereof may be specifically designed to obtain a desired transistor performance. The channel length is associated with the gate length and may, in typical MOS transistors, be less than the gate length since the source and drain extension typically extends marginally below the gate electrode. The channel width is substantially identical to the gate width. Presently, a gate length of approximately 0.1 μm and significantly less may be encountered in advanced CMOS devices with corresponding clock frequencies of 2000 MHz and more. A typical gate width of an advanced MOS transistor extends to approximately 0.5 μm or less.
Although the continuous size reduction of transistor elements has provided for significant advantages in view of performance and/or power consumption, a plurality of issues has to be addressed so as to not unduly offset some of the advantages that are offered by the reduced dimensions of the circuit elements. Especially the fabrication of the circuit components having the critical dimensions, such as the gate electrode of the transistor element substantially determining the channel length, requires huge efforts to reliably and reproducibly form these tiny circuit components. For instance, it is an extremely complex process to form gate electrodes having a gate length that is well below the wavelength of the UV radiation used to transfer a layout image from a reticle to a resist layer formed on the substrate. In narrow width transistors, having a substantially reduced channel area, additionally, edge effects at the channel/isolation structure interface, such as edge leakage current and threshold voltage shift, become significant and have to be precisely controlled.
A further difficulty arises from the fact that the PN junctions are defined by dopant profiles that are, at least partially, created by ion implantation and subsequent anneal cycles. Since, typically, reduced feature sizes require higher dopant concentrations to compensate for the reduced conductivity owing to reduced cross-sectional areas, complex implantation cycles are required, wherein the vertical and lateral dopant profile has to be precisely controlled to achieve the desired transistor performance. Since the dopants implanted are subjected to diffusion upon elevated temperatures of the device during the manufacturing processes, very strict requirements have to be met with respect to a thermal budget that describes the diffusivity of the dopants over time. In conventional process technologies, the source/drain implantation is also supplied to the gate electrode acting as an implantation mask during the implant cycles. A reduced transistor gate length also requires extremely shallow PN junctions in order to maintain the required controllability of the channel conductivity. Thus, the doping levels and profiles required in the drain and source regions of advanced transistor elements may necessitate implant processes that may be insufficient to achieve the required conductivity of the polysilicon gate electrode. Moreover, due to the non-uniform dopant distribution of these drain/source implantations, the resulting dopant concentration in the polysilicon gate may not be appropriate for preventing undesired gate charge carrier depletion during transistor operation.
To overcome this problem, a polysilicon predoping process is performed after deposition of the polysilicon gate layer and prior to the gate patterning step. The polysilicon predoping is typically performed by ion implantation and needs to go along with sufficient penetration margin to avoid penetration of dopants through the gate oxide, which otherwise may cause severe radiation damage to the ultra-thin insulation layer. The required penetration margin, however, may result in an undesired dopant distribution in the thickness direction of the polysilicon gate layer. Subsequently performed thermal annealing steps may drive the dopants towards the gate oxide to improve the dopant distribution uniformity but may, for advanced transistors, due to the low thermal budget requirements, not provide the desired distribution uniformity.
Another problem arises from the fact that ion implantation is typically performed by a scanning process. The ion beam impinges approximately perpendicular on the surface of a center region of an aligned substrate, whereas an angle of incidence of the ion beam in an edge region of the substrate in the range of approximately 80-85 degrees may be encountered. The tilted implantation, however, may deteriorate the dopant distribution uniformity in the edge region of the substrate due to shadowing effects caused by, for instance, substrate topography at this stage of manufacture, which may result in an undesired shift of the threshold voltage of transistors formed in the edge region of the substrate.
With reference to FIGS. 1a-1d and 2a-2e, a typical conventional process flow for forming a predoped polysilicon CMOS gate structure for wide width and narrow width (FIG. 2e) transistors will now be described to discuss some of the problems involved in predoping by ion implantation at a center region of a substrate (FIGS. 1a-1d) and at a edge region of a substrate (FIGS. 2a-2e) in more detail. FIGS. 1a-1d and 2b-2e show sectional views of the gate structure in the width direction, i.e., the width direction is in the drawing plane. In FIGS. 1a-1d and 2a-2e, similar or identical components are denoted by the same reference numeral except for the very first digit, which is selected in correspondence with the number of the respective figure.
In FIG. 1a, a CMOS gate structure 100 comprises a substrate 101 comprising N-doped and P-doped crystalline silicon regions 107, 109. A layer of semiconductor gate material 105, which is formed above the silicon regions 107, 109, is separated therefrom by gate insulation layers 113, 115. The layer of semiconductor gate material 105 is typically comprised of polysilicon and the gate insulation layer may be comprised of silicon dioxide, silicon oxynitride and the like. Isolation structures 103 substantially define the dimensions of the N-doped and P-doped crystalline silicon regions 107, 109 and electrically insulate the regions 107, 109 from neighboring circuit elements.
A typical process flow for forming the CMOS gate structure 100 in a center region of a substrate as depicted in FIG. 1a may include the following processes. The substrate 101, typically a silicon substrate, is provided. Thereafter, the isolation structure 103 is formed, for example, of silicon dioxide using well-established photolithography, etch, deposition and polishing techniques. A final wet etch process performed after the polishing step to remove an employed polishing stop layer (not shown) may result in a corresponding substrate topography due to the different etch rates of silicon and silicon oxide. In addition, a well implantation that may comprise several implantation steps with different ion species and different implantation energies is performed to generate a desired well dopant profile in the semiconductor regions 107, 109, for example, a retrograde profile. Thereafter, a thin dielectric layer having the required characteristics for the gate insulation layers 113, 115 may be formed by, for instance, advanced oxidation and/or deposition processes. The polysilicon layer 105 is then formed on the thin dielectric layer by deposition techniques that are well known in the art, for example, by low pressure chemical vapor deposition (LPCVD). The LPCVD process shows a substantially conformal deposition characteristic so that the surface of the deposited polysilicon layer 105 exhibits substantially the topography of the substrate 101 previously structured in the isolation structure forming process.
FIG. 1b schematically shows the CMOS gate structure 100 after the formation of a mask element 111 covering at least the polysilicon layer 105 over the crystalline silicon region 107. The mask element 111 may be formed by patterning a spun-on photoresist layer by means of well-established photolithography and anisotropic etch processes. The patterned resist layer may be formed with an appropriate thickness that provides the required ion blocking effect in the subsequent ion implantation step 120. In the implantation step 120, an N-doped polysilicon region, denoted as 119, is formed by implanting a pentavalent ion species such as, for example, phosphorous or arsenic. In the center region of the substrate 101, the ions impinge on the surface of the substrate 101 substantially perpendicularly to the surface plane. The implant energy is chosen to observe a sufficient penetration margin 118 to avoid penetration of dopants through the gate insulation layer 115. The typical implant energy is on the order of several keV. A thermal annealing step may be performed after the implantation step 120 to drive the dopants towards the gate insulation layer 115 based on the allowed thermal budget with respect to the above-described well profile requirements.
FIG. 1c schematically shows the CMOS gate structure 100 after removal of resist mask element 111 and after the formation of a further mask element 121 covering at least the N-doped polysilicon region 119. The mask element 121 may be formed as noted before with respect to mask element 111. The implantation step 122 may also be performed with an observed penetration margin 116 similar to the implantation step 120 described before but with a trivalent ion species such as, for example, boron or indium, instead of the pentavalent ion species.
FIG. 1d schematically shows the CMOS gate structure 100 after the completion of the implantation step 122 and after the removal of the resist mask element 121. The predoped polysilicon layers 117, 119, exhibiting a non-uniform dopant distribution and being N-doped over the P-doped silicon region 109 and being P-doped over the N-doped silicon region 107, are subjected to a patterning process to form correspondingly doped gate electrodes 177, 179 over the semiconductor regions 107, 109 respectively.
FIGS. 2a-2e illustrate the corresponding implantation process for an edge region of the substrate 201. In FIG. 2a, a side view of the substrate 201 subjected to a scanning implantation process is provided. When the ion beam is deflected to sweep along a line on the substrate, the angle of incidence is varied depending on the distance of the point of incidence from the substrate center. While the ions impinge substantially perpendicular to the surface plane of the substrate at a center region of the substrate, an angle of incidence 204 in the range of 80-85 degrees may be encountered in commercially available implantation tools for edge regions of substrates 201 having a diameter of 200 mm. For 300 and 400 mm substrates, intended for future industrial application, the angle of incidence 204 may be further decreased. The effect of the tilted implantation in the edge region of the substrate on the dopant distribution of the polysilicon layer 205 is illustrated in FIGS. 2b-2e.
FIG. 2b shows a CMOS gate structure 200 like the CMOS gate structure 100 of FIG. 1b but formed in an edge region of the substrate 201 so that, as noted above, a tilted implantation is performed. Due to shadowing effects, caused by the substrate topography, a region with reduced dopant concentration may be formed in the region 219. The region 219 may even be affected more severely from shadowing effects when the CMOS structure is oriented as shown in FIG. 2b so that the resist mask element 211 is also contributing to the shadowing effect resulting in the shadowed region 210. The region 210 further also indicates the region of lower dopant concentration caused by the above-mentioned implantation margin. It is further to be noted that the dashed line defining the region 210 does not indicate a sharp junction but a gradual transition.
FIG. 2c schematically shows the CMOS gate structure 200 after removal of resist mask element 211 and after the formation of a resist mask element 221. The tilted P-dopant implantation 222 over the N-doped silicon region is again adversely affected by shadowing caused by the substrate topography. In the depicted case, there is no shadowing caused by the resist mask element 221. It is to be mentioned that, for a CMOS gate structure formed with the same orientation on the opposite edge of the substrate 201, the resist mask related shadowing effect may affect the P-doped polysilicon region 217. Furthermore, shadowing in the P-doped polysilicon region 217 may be caused by a resist mask element disposed on an adjacent CMOS gate structure (not shown).
FIG. 2d schematically shows the CMOS gate structure 200 after removal of the resist mask element 221. The predoped polysilicon layers 217, 219 are subjected to a patterning process, as noted before with respect to FIG. 1d, to form correspondingly doped gate electrode structures 277, 279 over the semiconductor regions 207, 209 respectively. In contrast to the dopant distribution of FIG. 1d, the obtained non-uniformity of the dopant distribution in the edge region of the gate electrodes 277, 279 is further increased due to the shadowing effects. Thus, wide width CMOS transistors which may be formed from the CMOS gate structure 200 may exhibit threshold voltage (Vt) shifts affecting the edge of the transistor.
FIG. 2e schematically shows the corresponding CMOS gate structure 200 for narrow width transistors. Due to the reduced width of narrow width transistors, the occurring implantation shadowing effects affect a substantial portion of the predoped polysilicon layers 217, 219. In narrow width transistors, the edge effect may significantly affect the device characteristics of the narrow width transistor, resulting in a non-uniformity of device characteristics of devices formed on different substrate locations, thereby negatively affecting production yield.
In view of the situation identified, there exists a need for an improved technique that enables the further scaling of CMOS transistors, particularly of narrow width transistors, while reducing or avoiding one or more of the problems identified above.

CMOS gate structure comprising predoped semiconductor gate material with improved uniformity of dopant distribution and method of forming the structure


A sensor data input device obtains a plurality of sensor data sequences, each indicating time-series sensor values generated by measuring a work of a working subject using a sensor. A class data generator determines a plurality of intervals obtained by temporally dividing each sensor data sequence based on the sensor values, determines classes of the intervals, each class indicating a type of temporal variations in the sensor values included in one of the intervals, and generates a plurality of first class data sequences for each sensor data sequence, each first class data sequence indicating the intervals and the classes of the sensor data sequence. A class data linker associates the corresponding intervals having an identical class with each other, among the plurality of first class data sequences. A determiner calculates characteristic values of the intervals associated with each other.

In the manufacturing industry and the like, it is an important issue to improve work processes for higher productivity. To this end, there is an engineering technique, so-called industrial engineering (IE). In order to improve a work process by the IE, at first, it is necessary to measure a required time of the work for analyzing current conditions. In this case, cyclic works repeated by a working subject are to be analyzed, each work including a series of work elements (each work element being an action for a certain purpose). An analyst calculates characteristic values, such as a standard working time of each work element, and variations in the required time among cycles, based on the required times measured for the respective work elements. Thus, the analyst can determine which work element should be improved, and reconstruct a work or improve a production line for higher productivity.
In general, work analysis through measurement of required times is performed using a stopwatch and/or a video camera by an analyst. Since the analyst should measure required times of work elements over a plurality of cycles with his/her eyes, it takes an enormous amount of time and labor. Accordingly, various work analysis apparatuses for reducing a time spent for work analysis have been proposed.
For example, Patent Document 1 discloses a work analysis system for determining a start point and an end point of a work having been performed, based on parameters indicating positional relationship between positions where the work is to be performed, and positions of targets to be detected in the work. The system of Patent Document 1 classifies work elements at various moments, by comparing work position information predefining positions where the work is to be performed (i.e., templates designed in advance), with position information obtained from the positions of the targets to be detected in the work (i.e., sensor data measured from a work of a working subject). In addition, the system of Patent Document 1 calculate working times of the work elements by determining a start time and an end time of each work element. In addition, the system of Patent Document 1 determines whether or not each work element should be improved, by comparing the working time of each work element with a standard working time of each work element, the standard working time being designed in advance.

Work analysis apparatus for analyzing work including series of actions performed by working subject


Methods, systems, and apparatus's for improving orthodontic treatments. In an embodiment, an orthodontic system including a tactile object is provided for modulating an engagement between a tooth attachment and an orthodontic appliance.

The present invention relates generally to the field of orthodontics, and more particularly to orthodontic appliances, such as shell appliances, and tactile objects for improving the affects of attachment devices.
An objective of orthodontics is to move a patient's teeth to positions where function and/or aesthetics are optimized. Traditionally, appliances such as braces are applied to the patient's teeth by an orthodontist or dentist and the set of braces exerts continual force on the teeth and gradually urges them toward their intended positions. Over time and with a series of clinical visits, the orthodontist adjusts the appliances to move the teeth toward their final destination.
More recently, alternatives to conventional orthodontic treatment with traditional affixed appliances (e.g., braces) have become available. For example, systems including a series of preformed orthodontic appliances have become commercially available from Align Technology, Inc., Santa Clara, Calif., under the trade name Invisalign® System. An Invisalign® System appliance can be made from thin clear plastic and have teeth receiving cavities. In use, the appliance is placed over the patient's teeth and is removable. Shell-shaped orthodontic appliances are designed to impart positioning or repositioning forces to the patient's teeth. The imparted forces are resilient in nature and are associated with corresponding appliance elastic deformation. When used to reposition teeth, a series of individual appliances are worn by a patient to elastically reposition the patient's teeth over time. When used to retain teeth, one or more identical appliances are worn to restrain a patient's teeth in their current arrangement.
Attachment devices coupled to teeth have been utilized in orthodontic treatment and can improve force delivery and/or repositioning of the teeth, e.g., with shell-shaped appliances. Attachments can include those fabricated prior to tooth attachment or may be substantially assembled at the orthodontic practitioner's office prior to or in conjunction with positioning on the patient's tooth (e.g., molded composites, etc.). Use of attachment devices in conjunction with shell-type appliances may be desired for anchoring an appliance to the patient's dentition, eliciting a tooth movement, including eliciting certain movements or more difficult movements, such as more difficult rotation or intrusion/extrusion type movements.
In some instances where tooth attachments are utilized, actual force application to the patient's teeth may differ from the desired or intended force. Errors may occur as attachments made by the practitioner may not always conform to a prescribed or ideally desired shape and/or may not bond in the correct location or orientation. Manufacturing limits or errors in attachment or appliance formation (e.g., attachment receiving well of an appliance) may lead to error in appliance/attachment engagement, such as misalignment or less than ideal coupling between an attachment and appliance. Additionally, wear on an attachment and/or appliance, shape degradation of an appliance, and the like during orthodontic treatment and/or repeated insertion and removal of an appliance may occur, which can further effect force application to the patient's teeth. Accordingly, a corresponding orthodontic appliance may not ideally couple with the attachment as intended, leading to errors in force delivery and the patient's orthodontic treatment.
Accordingly, improved methods, systems, and apparatus's are needed for more optimal or precise tooth movement force delivery in orthodontic treatments utilizing tooth attachments.

Tactile objects for orthodontics, systems and methods


Various embodiments of the present invention relate generally to systems for performing Raman spectroscopy. In one embodiment, a system for performing Raman spectroscopy comprises an analyte holder having a surface configured to retain an analyte and a light concentrator configured to receive an incident beam of light, split the incident beam into one or more beams, and direct the one or more beams to substantially intersect at the surface. The system may also include a collector configured to focus each of the one or more beams onto the surface, collect the Raman scattered light emitted from the analyte, and direct the Raman scattered light away from the surface.

Raman spectroscopy is a spectroscopic technique used in condensed matter physics and chemistry to study vibrational, rotational, and other low-frequency modes of a molecular system. In a Raman spectroscopic experiment, a monochromatic beam of light, typically in the ultraviolet, visible, or infrared regions of the electromagnetic spectrum, passes through a sample of molecules and a spectrum of scattered light is emitted. The term "light" refers to electromagnetic radiation having wavelengths within the visible and non-visible portions of the electromagnetic spectrum, such as the ultraviolet and infrared portions of the spectrum. The spectrum of light emitted from the molecule is called a "Raman spectrum" and the scattered light is also called "Raman scattered light." A Raman spectrum can reveal electronic, vibrational, and rotational energies levels of a molecule. Different molecules produce different Raman spectrums that can be used like a fingerprint to identify molecules and even determine the structure of molecules. For example, Raman gas analyzers have many practical applications such as providing real-time monitoring of molecular changes in gas mixtures.
The Raman scattered light generated by a compound (or ion) adsorbed on or within a few nanometers of a structured metal surface can be 103-106 or more times greater than the Raman scattered light generated by the same compound in solution. This surface-enhanced Raman scattering ("SERS") is strongest on silver ("Ag"), gold ("Au"), and copper ("Cu") surfaces. SERS arises from two mechanisms. The first mechanism is an enhanced electromagnetic field produced at the surface of a metal. When the wavelength of incident light is close to the plasma wavelength of the metal, conduction electrons in the metal surface are excited into an extended, surface, excited electronic state called a "surface plasmon." Molecules adsorbed or in close proximity to the surface experience a relatively strong electromagnetic field. Molecular vibrational modes directed normal to the surface are most strongly enhanced. The intensity of the surface plasmon resonance is dependent on many factors including the wavelength of the incident light and the morphology of the metal surface. The second mode of enhancement occurs from the formation of a charge-transfer complex between the surface and a molecule absorbed to the surface. The electronic transitions of many charge transfer complexes are typically in the visible range of the electromagnetic spectrum.
SERS is often used to study monolayers of materials adsorbed on metals. However, typical optical systems for performing Raman spectroscopy consist of an optical microscope that focuses light from a source onto an analyte, and the Raman spectrum emitted from the analyte is gathered through the same optical system. Collecting an emission spectrum in this manner is inefficient and these optical systems are often bulky.

Systems for performing Raman spectroscopy

Hewlett-Packard Development Company, L.P.


A structure and method for fabricating an ESD device for FET transistors by forming a silicon germanium region 40 under a channel region 44 of a field effect transistor (FET). The silicon germanium region 40 comprises the base of a parasitic bipolar 200 transistor that increases the turn on speed. The method comprises:. a) forming a gate dielectric layer 20 over a substrate 10; PA1 b) forming a gate 30 over the gate 30; the substrate having a channel region under the gate; the channel region extending from the surface of the substrate to a channel depth below the substrate surface; PA1 c) forming a silicon germanium region 40 under the channel region 44 using a tilt angle ion implant of Germanium ions; PA1 d) forming source and drain doped regions 50 70 adjacent to the channel region and the silicon germanium region whereby the silicon germanium region comprises a base of a parasitic bipolar transistor 40.

1) Field of the Invention
This invention relates generally to fabrication of Semiconductor devices having Electro Static Discharge (ESD) circuits and more particularly to a Ge implant process to improve the performance of Electro Static Discharge (ESD) transistors.
2) Description of the Prior Art
In current processes, the Electro Static Discharge (ESD) device often uses the snapback characteristics of parasitic bipolar of NMOS transistor to carry away the high current pulse. Because of the p-well, the emitter injection efficiency is low. So the ESD device can not have high performance, especially for deep sub-micron devices with higher p-well concentrations which will degrade the current gain.
The importance of overcoming the various deficiencies noted above is evidenced by the extensive technological development directed to the subject, as documented by the relevant patent and technical literature. The closest and apparently more relevant technical developments in the patent literature can be gleaned by considering U.S. Pat. No. 5,413,969 (Huang): Differential treatment to selectively avoid silicide formation on ESD I/O transistors in a salicide process--shows a Ge implant into S/D regions in a silicide process for ESD. Selective salicidation of source/drain regions of a transistor is accomplished by Ge I/I a first subset of the source/drain regions to hinder formation of metal-silicide over the first subset of the source/drain regions. See col. 4, line 63.
U.S. Pat. No. 5,496,751 (Wei) Method of forming an ESD and hot carrier resistant integrated circuit structure--shows a method of forming a ESD device using LATID I/I processes.
U.S. Pat. No. 5,360,749 (Anjum)--Method of making semiconductor structure with germanium implant for reducing short channel effects and subthreshold current near the substrate surface--shows a method of tilt angle I/I Ge into S/D regions and in a portion of the channel. The semiconductor structure is adapted to receive non-perpendicular implant of germanium in the juncture between the channel and the source/drain regions as well as in the juncture between field oxide channel stop implant and source/drain regions.
U.S. Pat. No. 5,312,766 (Aronowitz) Method of providing lower contact resistance in MOS transistors--shows Ge implanted immediately on the substrate surface of a FET.

ESD device protection structure and process with high tilt angle GE implant

Taiwan Semiconductor Manufacturing Company, Ltd.


A multi-stage transmission with nine forward and one reverse gear includes four planetary gearsets, shafts and shifting elements. The sun gear of gearset (P1) couples shaft (5) which can coupled, via brake (05), the housing. The input shaft can couple, via clutch (14), shaft (4) which couples the carriers of gearsets (P1, P2) and can coupled, via brake (04), the housing. The input shaft can couple, via clutch (17), shaft (7) which couples the ring gear of gearset (P1) and the sun gear of gearset (P2) and can couple, via clutch (18), shaft (8), which couples the carrier of gearset (P4) and the ring gear of gearset (P3). Shaft (6) couples the ring gears of gearsets (P2, P4). Shaft (3) couples the sun gears of gearsets (P3, P4) and can couple, via brake (03), the housing. The output shaft couples the carrier of gearset (P3).

According to the prior art, automatic transmissions, in particular for motor vehicles, comprise planetary gearsets which are shifted by means of frictional or shifting elements such as clutches and brakes, and are usually connected with a starting element which can be operated with slip and is optionally provided with a bridging clutch, such as a hydrodynamic torque converter or a fluid coupling.
Such an automatic transmission is known, for example, from DE 199 12 480 B4 by the present applicant. It comprises three single-carrier planetary gearsets as well as three brakes and two clutches for engaging six forward gears and one reverse gear, a drive input shaft and a drive output shaft, wherein the carrier of the first planetary gearset is connected permanently to the ring gear of the second planetary gearset, the carrier of the second planetary gearset is connected permanently to the ring gear of the third planetary gearset and the drive input shaft is connected directly to the sun gear of the second planetary gearset.
Furthermore, in this known transmission it is provided that the drive input shaft can be connected by the first clutch to the sun gear of the first planetary gearset and by the second clutch to the carrier of the first planetary gearset, the sun gear of the first planetary gearset can be connected by the first brake to a housing of the transmission and the carrier of the first planetary gearset can be connected by the second brake to the housing of the transmission, whereas the sun gear of the third planetary gearset can be connected by the third brake to the housing of the transmission. The drive output shaft of the transmission is connected permanently to the carrier of the third planetary gearset and to the ring gear of the first planetary gearset.
In addition a 9-gear multi-stage transmission is known from DE 29 36 969 A1; this comprises eight shifting elements and four planetary gearsets, one planetary gearset serving as the upstream gearset and the main transmission comprising a Simpson gearset and a further planetary gearset that serves as a reversing gearset.
Other multi-stage transmissions are known, for example, from DE 10 2005 010 210 A1 and DE 10 2006 006 637 A1 by the present applicant.
In general, automatically shifted vehicle transmissions of planetary design have already been described many times in the prior art and are continually undergoing further development and improvement. These transmissions should take up little structural space, in particular requiring a small number of shifting elements, and in sequential shifting operations should avoid double shifts, i.e. an engagement or disengagement of two shifting elements at a time, so that for shifting operations in defined gear groups in each case only one shifting element is changed.
From DE 10 2008 000 428 A1 by the present applicant a multi-stage transmission of planetary design is known, which comprises a drive input and a drive output arranged in a housing. In this known transmission there are at least four planetary gearsets, denoted in what follows as the first, second, third and fourth planetary gearsets, at least eight rotating shafts—denoted in what follows as the drive input shaft, the drive output shaft and the third, fourth, fifth, sixth, seventh and eighth shafts—and at least six shifting elements including brakes and clutches, whose selective engagement produces various gear ratios between the drive input and the drive output, so that preferably nine forward gears and one reverse gear can be produced.
In this case the first and second planetary gearsets, preferably designed as minus planetary gearsets, namely ones with a negative fixed transmission gear ratio, form a shiftable upstream gearset whereas the third and fourth planetary gearsets form a main gearset.
In this known multi-stage transmission it is provided that the carriers of the first and second planetary gearsets are coupled with one another by the fourth shaft, which is connected to an element of the main gearset, the ring gear of the first planetary gearset is coupled to the sun gear of the second planetary gearset by way of the eighth shaft, which can be connected detachably to the drive input shaft by a first clutch, and the sun gear of the first planetary gearset can be coupled by means of the third shaft via a first brake to a housing of the transmission and can be detachably connected via a second clutch to the drive input shaft, whereas the ring gear of the second planetary gearset can be coupled by means of the fifth shaft via a second brake to a housing of the transmission. In addition the seventh shaft is permanently connected to at least one element of the main gearset and can be coupled by a third brake to the housing of the transmission, whereas the sixth shaft is permanently connected to at least one further element of the main gearset and can be detachably connected to the drive input shaft by means of a third clutch; the drive output shaft is permanently connected to at least one further element of the main gearset.
Preferably, in this known transmission the fourth shaft is permanently connected to the ring gear of the third planetary gearset, whereas the sixth shaft is permanently connected to the ring gear of the fourth planetary gearset and to the carrier of the third planetary gearset, and can be detachably connected by the third clutch to the drive input shaft. Furthermore, the seventh shaft is connected permanently to the sun gears of the third and fourth planetary gearsets and can be coupled by the third brake to a transmission housing. In this case the drive output takes place by way of the drive output shaft which is permanently connected to the carrier of the fourth planetary gearset. In addition, the third and fourth planetary gearsets can be combined or reduced to a Ravigneaux gearset with a common carrier and a common ring gear.
According to the prior art the shifting elements of multi-stage transmissions designed in that way, which are usually in the form of disk clutches or disk brakes, are actuated hydraulically, but this results disadvantageously in high hydraulic losses. To avoid these actuation losses, it would be particularly advantageous to use shifting elements that can be actuated only as required, for example electro-mechanically actuated shifting elements.
To enable the use of shifting elements that can be actuated as required, the shifting elements, clutches in particular, have to be easily accessible from outside.
Shifting elements that can be actuated as required are in particular understood to mean ones which consume only little energy or even none when they remain in their current shifting position. Such shifting elements may be for example shifting elements that are actuated electro-mechanically or electro-hydraulically.


A manufacturing method for a solid processing composition for processing a silver halide photographic light sensitive material, wherein the composition is manufactured by using a stirring granulation method, and at least part of said stirring granulation is performed in the temperature range of 35.degree. C. to 120.degree. C.. The manufacturing method for the solid processing composition mentioned above, wherein the content of the added solution in the stirring granulation process is 0.01 to 2.0 weight % of the total weight of said solid processing composition and wherein not less than 60% of the total weight of said solid processing composition has particle size of 1.0 .mu.m to 150 .mu.m.. The solid processing composition mentioned above may contain reductone derivative, sugar derivative and polyethylene glycol derivative.

Photographic silver halide materials are generally exposed imagewisely, developed, fixed, washed with water, and then dried, thereby the photographic image is finally observed.
The processing composition used in these process are provided as concentrated solution kits, thereafter these kits are diluted when practically used as working solutions. The concentrated solution kits have an advantage from the viewpoint of excellent solubility, moreover, since there can be wide range of selection of agents including liquid state raw materials, thereby the concentrated solution kits are prepared at less burden in manufacturing processes and at low manufacturing cost.
However, the concentrated solution kits have some dangerous problem such as a contact with skin. Especially the problem becomes more serious when these kits penetrate into eyes. Moreover, the kits must need heavy plastic bottles to contain them. Excessive weight and large volume of processing vessels not only causes increasing transportation cost but also environmentally unacceptable problem with large amount of disposal of the waste vessels.
Accordingly, from the viewpoint of small light weight and compact, the processing composition in the kits is preferably a solid such as a powder form, a granule form, and a tablet form.
However, as mentioned above, compared with a liquid form, a solid form has a big problem in manufacturing cost because it must be passed through various processes, namely, process of measuring raw materials, mixing process, pulverizing process, granulating process, drying process, and dressing process, furthermore, in the case of a tablet form, compressed tableting process is included.
Accordingly, to supply the solid form to the market at similar price to that of the liquid form, there exists the subject that attains to lower the manufacturing cost of the solid form. On the other hand, there is a problem of the deterioration of the properties of the solid processing composition, such as the occurrence of dust, the lowering of it's stability, and the lowering of it's solubility.

Manufacturing method for solid processing composition for processing silver halide light-sensitive photographic material


A method of producing a methacrylic acid ester which comprises carrying out an ester-exchange reaction between methyl methacrylate and an alcohol or a phenol while removing by-product methanol as an azeotropic mixture with methyl methacrylate from the reaction system under reflux conditions, by the use of a reaction apparatus equipped with a distillation column. A methacrylic acid ester is produced with a good productivity by controlling the reflux ratio.

Heretofore, a methacrylic acid ester is industrially produced by an esterification reaction between a methacrylic acid and an alcohol or a phenol in the presence of an acid catalyst, or by an ester-exchange reaction between a methacrylic acid ester and an alcohol or a phenol in the presence of an ester-exchange catalyst. In recent years, the method of producing the methacrylic acid ester by the ester-exchange reaction is often used, because both of a starting material and a product are an ester and an alcohol or a phenol, and hence, the products are relatively easily separated by distillation and waste water is not generated.
As the ester-exchange reaction, a reaction using methyl methacrylate as shown in the following formula (1) is frequently employed:
wherein R represents an alkyl group, an aryl group, an alkenyl group, or an aralkyl group.
However, the ester-exchange reaction shown by the above formula (1) is an equilibrium reaction, and hence, it does not proceed beyond a certain conversion. When the conversion is low, it is necessary to separate all the ingredients of a raw methyl methacrylate (A), a raw alcohol (B), an end product methacrylic acid ester (C), and by-product methanol (D) after the reaction, which makes the operations complicated.
Therefore, in order to shift the equilibrium to the product side and further enhance the conversion, it is conducted to remove by-product methanol (D) together with an azeotropic solvent from the reaction system. For example, since raw methyl methacrylate (A) forms an azeotropic mixture with by-product methanol (D), a charge mole number of raw methyl methacrylate (A) is set so as to be in excess of a charge mole number of the raw alcohol (B), and by-product methanol (D) is removed as an azeotropic mixture with methyl methacrylate (A) from the reaction system.
However, in a case where the reaction rate, i.e., the production rate of by-product methanol (D) is not sufficiently high, a large excess of methyl methacrylate (A) is necessary to remove by-product methanol (D), so that the productivity tends to be poor.
Accordingly, in order to form an azeotropic mixture in which a concentration of by-product methanol (D) is enhanced and to remove it from the reaction system, there is employed a method wherein a portion of the azeotropic mixture is distilled out and the remainder is refluxed while controlling a reflux ratio, by the use of a distillation column. In this method, it is desired to produce the methacrylic acid ester with a higher productivity.
For example, Japanese Patent Laid-Open Nos. 87747/1980, 115850/88 and 118352/1991 contain processes for producing an intended methacrylic acid ester by an ester-exchange reaction between methyl methacrylate and an alcohol or a phenol by the use of a reactor equipped with a distillation column, wherein the ester-exchange reaction is carried out while extracting an azeotropic mixture of methyl methacrylate and methanol under the control of only a column top temperature of the distillation column.


An example game system includes a plurality of operating devices for outputting first operation data, a transportable display device for outputting second operation data, and a game apparatus. The game apparatus controls a plurality of first operation targets based on the first operation data, and a second operation target based on the second operation data. In addition, the game apparatus generates a first game image including a plurality of images representing a virtual space as viewed from first virtual cameras each corresponding to one of the first operation targets. The game apparatus generates a second game image including an image representing the virtual space as viewed from a second virtual camera corresponding to the second operation target. The first game image is outputted to a predetermined display device. The second game image is displayed on the transportable display device.

Conventionally, there are game systems in which a plurality of players can play a game at the same time. For example, there is a conventional game system for executing a competitive game to be played by a plurality of players. In this game system, game images including operation targets to be controlled by the players are generated for their respective players, and displayed on their respective sections on a screen area of a display device.
In the case where game images for their respective players are displayed on one display device as described above, a game image for one player can be viewed by the other player. As a result, for example, the position of one player's operation target (in a game space) or a position aimed at by one player's operation target in a shooting game or such like can be inconveniently revealed to the other player, impairing a strategic aspect of the game.
Therefore, the present specification discloses a game system, a game apparatus, a storage medium having a game program stored therein, and a game process method, which are capable of enhancing the strategic aspect of a multiplayer game, thereby rendering the game highly enjoyable.
(1) An example game system described herein includes a plurality of operating devices for outputting first operation data, a transportable display device for outputting second operation data, and a game apparatus.
The game apparatus includes an operation data acquisition section, an action control section, a first camera setting section, a first image generation section, a second camera setting section, a second image generation section, a first image output section, and a second image output section. The operation data acquisition section acquires the first operation data from the operating devices and the second operation data from the transportable display device. The action control section controls individual actions of a plurality of first operation targets in a virtual space based on the first operation data, and an action of a second operation target in the virtual space based on the second operation data. The first camera setting section sets a plurality of first virtual cameras in the virtual space, each camera corresponding to one of the first operation targets. The first image generation section generates a first game image including a plurality of images representing the virtual space as viewed from the first virtual cameras. The second camera setting section sets a second virtual camera in the virtual space, the camera corresponding to the second operation target and having a different viewpoint from the first virtual cameras. The second image generation section generates a second game image including an image representing the virtual space as viewed from the second virtual camera. The first image output section outputs the first game image to a predetermined display device different from the transportable display device. The second image output section wirelessly transmits the second game image to the transportable display device.
The transportable display device includes an image reception section and a display section. The image reception section receives the second game image. The display section displays the second game image.
The "operating device" may be any device which can be manipulated by the player and outputs operation data. The "operating device" may include operating means, such as operation buttons, and various sensors, such as an acceleration sensor and a gyroscope, as in a controller 5 to be described later, or may include either one or the other. Alternatively, the "operating device" may include other input means such as a touch panel.
The "transportable display device" may be any device which can be manipulated by the player, outputs operation data, and includes a display section for displaying game images, as in the case of a terminal device 7 in an example embodiment to be described later. Note that the term "transportable" is intended to mean a size that allows the player to hold and move the device or arbitrarily change the position of the device.
The "game apparatus" may be any information processing apparatus which performs game processes and generates game images based on the game processes. The game apparatus may be an information processing apparatus for game use or a multipurpose information processing apparatus such as a general personal computer.
The "game system" includes a game apparatus, an operating device, and a transportable display device, and may or may not include a predetermined display device for displaying first game images. That is, the game system may or may not be provided in the form which includes the predetermined display device.
The "operation target" may be any object, such as an object arranged in a game space, so long as its action can be controlled by the player's operation.
The wording "virtual cameras corresponding to operation targets", as a concept, encompasses virtual cameras being set so as to include operation targets in game images generated using the virtual cameras or virtual cameras being set at positions corresponding to operation targets.
According to the above configuration (1), the predetermined display device displays a game space image (first game image) generated by the first virtual cameras, and the transportable display device displays a game space image (second game image) generated by the second virtual camera being set at a position different from the first virtual cameras. Accordingly, the first game image to be viewed by players using operating devices (referred to as "first players") and the second game image to be viewed by a player using a transportable display device (referred to as a "second player") have different viewpoints from each other.
Here, the content of the second game image is displayed on the transportable display device manipulated by the second player, and cannot be viewed by the first players, so that only the second player can know the game situation represented by the second game image. In this manner, by allowing only the second player to know certain information (game situation), it is rendered possible to provide a highly strategic game. Specifically, the second player can successfully utilize the information only he/she can know to proceed with the game, thereby strategically playing the game. On the other hand, each first player can view the first game image displayed on a predetermined display device, and therefore can view game images for other first players. Thus, each first player can view game images for other first players, or exchange information among first players, thereby estimating information only the second player knows, so that the first players can strategically play the game. As described above, according to the above configuration (1), game images to be displayed on two display devices are different in terms of their areas of a displayed game space, and both game images can be viewed by only selected players, which makes it possible to enhance the strategic aspect of a multiplayer game and render the game highly enjoyable. Moreover, for example, in the case of a game for a plurality of first players to play against one second player, the game can be rendered highly enjoyable without excessive disadvantage to the second player even in the one-to-many situation.
(2) The action control section may control a plurality of first objects arranged in the virtual space to move based on the first operation data as the first operation targets. In this case, the first camera setting section sets the first virtual cameras such that each of the first objects is included within a field-of-view range of its corresponding one of the first virtual cameras.
According to the above configuration (2), the first game image includes a plurality of game images including the first objects being manipulated by the players. Thus, each first player can readily perform a game operation by viewing a game image including his/her own operation target.
(3) The action control section may control a second object arranged in the virtual space to move based on the second operation data as the second operation target. In this case, the second camera setting section sets the second virtual camera such that the second object is included within a field-of-view range of the second virtual camera.
According to the above configuration (3), the second game image includes a plurality of game images including the second object being manipulated by the second player. Thus, the second player can readily perform a game operation by viewing a game image including his/her own operation target.
(4) The second camera setting section may set the second virtual camera so as to have a greater angle of depression than the first virtual cameras with respect to a predetermined plane of the virtual space on which the first operation targets are movable.
The "predetermined plane" may be a plane of, for example, a field object (terrain object), if any, arranged in the game space, but the field object is not always arranged.
The term "angle of depression of a virtual camera" refers to an angle between the line-of-sight direction of the virtual camera and a predetermined plane.
According to the above configuration (4), the angle of depression of the second virtual camera is set to be greater than the angle of depression of any first virtual camera, and therefore the second game image represents the positions of first operation targets within a wider range of the predetermined plane when compared to each image included in the first game image. Thus, according to the above configuration (4), by viewing the second game image, the second player can recognize the positions of the first operation targets more readily than the first players viewing the first game image. As a result, the second player can strategically play the game by taking advantage of only he/she knowing the position of each first operation target. That is, the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(5) The first camera setting section may set each of the first virtual cameras such that a direction of that first virtual camera changes in accordance with a direction of the first operation target that corresponds to the first virtual camera. In this case, the second camera setting section sets the second virtual camera in a direction approximately perpendicular to the predetermined plane.
According to the above configuration (5), the first virtual cameras are directed in accordance with the directions of the first operation targets, and therefore the first game image represents the game space as viewed from predetermined positions toward directions corresponding to the directions of the first operation targets. As a result, the first players can confirm the situation of the game space only with respect to the directions corresponding to the directions of the first operation targets. On the other hand, the second virtual camera is directed perpendicularly to the predetermined plane, so that the second game image can represent a wide range of the predetermined plane with the position of each operation target being viewed from above. Accordingly, the second player can readily recognize the position of each operation target. Thus, according to the above configuration (5), the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(6) The second camera setting section may set the second virtual camera so as to be higher than the first virtual cameras with respect to a predetermined plane of the virtual space on which the first operation targets are movable.
According to the above configuration (6), the second virtual camera is set to be higher than the first virtual cameras, and therefore the second game image represents the positions of first operation targets within a wider range of the predetermined plane when compared to each image included in the first game image. Thus, according to the above configuration (6), by viewing the second game image, the second player can recognize the positions of the first operation targets more readily than the first players viewing the first game image. As a result, the second player can strategically play the game by taking advantage of only he/she knowing the position of each first operation target. That is, the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(7) The first camera setting section may set each of the first virtual cameras at a lower position than an obstacle object having a predetermined range of height with respect to the predetermined plane. In this case, the second camera setting section sets the second virtual camera at a higher position than the obstacle object.
According to the above configuration (7), each first virtual camera is set at a lower position than the obstacle object, and therefore the field of view of the first game image is blocked by the obstacle. On the other hand, the second virtual camera is set at a higher position than the obstacle object, the second game image displays the predetermined plane without the obstacle object blocking the field of view. As a result, while the first players can recognize the situation of only a narrow range of the game space limited by the obstacle object, the second player can recognize the situation of a wider range of the game space. Accordingly, the second player can recognize the positions of the first operation targets more readily than the first players. Thus, according to the above configuration (7), the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(8) The first image generation section may generate as the first game image a game image in which a plurality of images representing the virtual space as viewed from the first virtual cameras are arranged in a plurality of areas into which an entire area of the first game image is divided.
According to the above configuration (8), the predetermined display device has game images for the first players displayed on their respective screen areas, and therefore each first player can readily distinguish his/her own game image (a game image corresponding to the operation target being manipulated by that first player) from game images for other first players.
(9) The transportable display device may include an inertial sensor. In this case, the action control section sets the second virtual camera based on an output from the inertial sensor.
According to the above configuration (9), the second player can control the second virtual camera by moving the transportable display device, and can move the second virtual camera by an intuitive and easy operation of moving the transportable display device.
(10) Another example game system described herein includes a plurality of operating devices for outputting first operation data, a transportable display device for outputting second operation data, and a game apparatus.
The game apparatus includes an operation data acquisition section, an action control section, a first image generation section, a second image generation section, a first image output section, and a second image output section. The operation data acquisition section acquires the first operation data from the operating devices and the second operation data from the transportable display device. The action control section controls individual actions of a plurality of first operation targets in a virtual space based on the first operation data, and an action of a second operation target in the virtual space based on the second operation data. The first image generation section generates a first game image representing an area within a predetermined range of the virtual space that is determined in accordance with positions of the first operation targets. The second image generation section generates a second game image representing an area of the virtual space, the area including the second operation target and being wider than the range represented by the first game image. The first image output section outputs the first game image to a predetermined display device different from the transportable display device. The second image output section wirelessly transmits the second game image to the transportable display device.
The transportable display device includes an image reception section and a display section. The image reception section receives the second game image. The display section displays the second game image.
The wording "representing a wider area than the range represented by the first game image" is intended to mean that the second game image is wider than the first game image in terms of the range (of the game space) that is represented thereby, and the entire range represented by the first game image is not always included in the range represented by the second game image. For example, as in the example embodiment or a first variant to be described later, when any obstacle object is set on a predetermined plane of the game space, or when any field object being set on the predetermined plane has an uneven surface, if the second game image is set to have a higher viewpoint or a wider angle of depression in the line-of-sight direction than the first game image, the second game image can represent a wider range of area than the first game image.
According to the above configuration (10), the first game image displayed on the predetermined display device represents a predetermined range of area that is determined in accordance with the positions of the first operation targets, and the second game image displayed on the transportable display device represents a wider range of area than the first game image. Consequently, as in the case of the above configuration (1), game images to be displayed on two display devices are different in terms of their areas of a displayed game space, and both game images can be viewed by only selected players, which makes it possible to enhance the strategic aspect of a multiplayer game and render the game highly enjoyable. Moreover, for example, in the case of a game for a plurality of first players to play against one second player, the game can be rendered highly enjoyable without excessive disadvantage to the second player even in the one-to-many situation.
(11) The first image generation section may generate the first game image by generating for each of the first operation targets an image representing the virtual space in a line-of-sight direction corresponding to a direction of that first operation target. In this case, the second image generation section generates as the second game image a game image with a predetermined plane on which the first operation targets are movable being viewed in a line-of-sight direction approximately perpendicular to the predetermined plane.
According to the above configuration (11), the first game image represents the game space as viewed from predetermined positions toward directions corresponding to the directions of the first operation targets. As a result, the first players can confirm the situation of the game space only with respect to the directions corresponding to the directions of the first operation targets. On the other hand, the second game image can represent a wide range of the predetermined plane with the position of each operation target being viewed from above. Accordingly, the second player can readily recognize the position of each operation target. Thus, according to the above configuration (11), the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(12) The virtual space may have set therein an obstacle object having a predetermined range of height with respect to a predetermined plane on which the first operation targets are movable. In this case, the first image generation section generates the first game image as viewed from a viewpoint lower than the obstacle object. The second image generation section generates the second game image as viewed from a viewpoint higher than the obstacle object.
According to the above configuration (12), the field of view of the first game image is blocked by the obstacle, whereas the second game image displays the predetermined plane without the obstacle object blocking the field of view. As a result, while the first players can recognize the situation of only a narrow range of the game space limited by the obstacle object, the second player can recognize the situation of a wider range of the game space. Accordingly, the second player can recognize the positions of the first operation targets more readily than the first players. Thus, according to the above configuration (12), the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(13) The first image generation section may generate the first game image such that only some portions within a predetermined range of the virtual space that are determined in accordance with positions of the first operation targets are visually recognizable. In this case, the second image generation section generates the second game image so as to represent the predetermined range of the virtual space.
The wording "only some portions are visually recognizable", as a concept, encompasses only some portions being displayed on the display screen and a predetermined range of area, excluding some portions, being displayed as black (or translucent or blurred).
According to the above configuration (13), the first game image has only some visually recognizable portions within a predetermined range of area, whereas the second game image has the entire predetermined range of area become visually recognizable. As a result, while the first players can recognize the situation of only a narrow range of the game space, the second player can recognize the situation of a wider range of the game space. Accordingly, the second player can recognize the positions of the first operation targets more readily than the first players. Thus, according to the above configuration (13), the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(14) The first image generation section may set a virtual camera in the virtual space to generate as the first game image an image representing the virtual space as viewed from the virtual camera. In this case, the second image generation section generates the second game image as an image representing the virtual space using image data that is prestored in a storage accessible by the game apparatus.
According to the above configuration (14), prepared image data is used to generate the second game image, and therefore the second game image can be readily generated by a simplified process.
(15) The second image generation section may generate the second game image so as to include images rendered on a game image representing the virtual space, the images representing positions of the first operation targets and the second operation target and directions of the operation targets or virtual cameras.
According to the above configuration (15), by the second game image, the second player can know the position of each operation target and the direction of each operation target or its corresponding virtual camera, and therefore the second player can more reliably be provided with a game image which makes it easy to recognize the situation of the game space.
(16) The transportable display device may further include a touch panel provided on a screen of the display section. In this case, the action control section moves the second operation target based on an input to the touch panel.
According to the above configuration (16), the second player can move the operation target by an operation using the touch panel, and therefore can perform a game operation by an intuitive and easy operation method.
(17) The transportable display device may further include a direction input section which allows inputs to be made in at least four directions, including up, down, right, and left. In this case, the action control section moves the second operation target in accordance with a direction inputted with the direction input section.
According to the above configuration (17), the second player can move the operation target by an operation using the direction input section, and therefore can perform a game operation by an easy operation method.
(18) The action control section may move the first operation targets and the second operation target on a predetermined plane being set in the virtual space. In this case, the game apparatus further includes an effect addition section for adding a predetermined game effect in response to the second operation target contacting any of the first operation targets.
The "game effect" is a concept encompassing any arbitrary effect to be added to the game, including, for example, addition of points, and display of a predetermined effect image.
According to the above configuration (18), it is possible to realize a game in which the first operation targets attempt to catch the second operation target or vice versa, as in the example embodiment to be described later. In such a game, it is advantageous to know the positions of other players' operation targets, and therefore in the case of the above configuration (18), the second player, who can recognize the positions of other operation targets from the second game image, can be put in a more advantageous position than the first players. Thus, in the case of a game for a plurality of first players to play against one second player, the game can be rendered highly enjoyable without excessive disadvantage to the second player even in the one-to-many situation.
(19) The action control section may cause the first operation targets to perform moving and shooting actions on a predetermined plane being set in the virtual space, and may also cause the second operation target to perform moving and shooting actions in a space above the predetermined plane.
According to the above configuration (19), it is possible to realize a shooting game in which the first operation targets and the second operation target shoot each other. In such a game, it is advantageous to know the positions of other players' operation targets, and therefore in the case of the above configuration (19), the second player, who can recognize the positions of other operation targets from the second game image, can be put in a more advantageous position than the first players. Thus, in the case of a game for a plurality of first players to play against one second player, the game can be rendered highly enjoyable without excessive disadvantage to the second player even in the one-to-many situation.
(20) The game apparatus may further include an image compression section for compressing the second game image. In this case, the second image output section wirelessly transmits the compressed second game image. The transportable display device further includes an image decompression section for decompressing the compressed second game image received by the image reception section. The display section displays the second game image decompressed by the image decompression section.
According to the above configuration (20), the second game image is compressed and then transmitted from the game apparatus to the transportable display device, which makes it possible to wirelessly transmit game images at high speed and thereby reduce any delay in displaying a game image when a game process is performed.
The present specification discloses example game apparatuses as included in the game systems described in (1) to (20) above. Moreover, the present specification discloses example non-transitory computer-readable storage media each having stored therein a game program for causing computers of the game apparatuses to function as means equivalent to elements for game processes as described above (which may exclude the first image output section and the second image output section). Furthermore, the present specification discloses example game process methods as performed in the game systems described in (1) to (20) above.
In the game systems, the game apparatuses, the storage media each having a game program stored therein, and the game process methods as mentioned above, game images to be displayed on two display devices are different in terms of their ranges of a displayed game space, and both game images can be viewed by only selected players, which makes it possible to enhance the strategic aspect of a multiplayer game and render the game highly enjoyable.
These and other objects, features, aspects and advantages will become more apparent from the following detailed description when taken in conjunction with the accompanying drawings.

This patent is subject to a terminal disclaimer.

Game system, game apparatus, storage medium having game program stored therein, and game process method


Disclosed are 4-(N,N-dialkylamino)aniline compounds having a 4-N substituent which is a polyethyleneoxy group and which forms a condensed ring with benzene ring, such as aniline compounds having the following structure, a processing composition containing such a compound and a method for forming a color image with the processing solution. The aniline compound is useful as a color developing agent capable of having a low fog density and sufficient yellow and cyan image densities and suitable for the rapid process.

The present invention relates to 4-(N,N-dialkylamino)aniline compounds having a 4-N substituent which is a polyethyleneoxy group and which forms a condensed ring with benzene ring, a processing composition containing such a compound and a method for forming a color image with the processing solution.
4-(N,N-dialkylamino)aniline compounds are useful as a developing agent for a silver halide color photographic material and they are described in, for example, Japanese Patent Unexamined Published Application (hereinafter referred to as "J.P. KOKAI") No. Hei 5-257248, 6-161061 and 7-36162.
As mini-labs for processing photosensitive materials within the shops and the amount of color negative films used in the field of news photos are increasing recently, the demand for completion of the development process in a shorter time to immediately provide the prints to the customers or to immediately place the photo in newspapers or the like is rapidly increasing. The demand for reduction of the processing time is becoming more and more eager in processing color negative films, since the time necessitated therefor is longer than that necessitated for processing color papers.
For the reduction of the time necessitated for the color development step in the processing steps, J.P. KOKAI No. Hei 4-45440 discloses a method wherein tetrahydroquinoline or a dihydroindole derivative is used as the color developing agent. The use of such a compound as the color developing agent is also described in U.S. Pat. Nos. 2,196,739 and 2,566,259. In particular, it is described in J.P. KOKAI No. Hei 4-45440 that the time necessitating for the color developing step can be reduced by using such a compound as the color developing agent even in color photograhic photosensitive materials mainly comprising a silver bromoiodide emulsion such as color negative films. Further, it is described in European Patent No. 670,312A1 that when at lease one of three carbon atoms forming the propylene chain of tetrahydroquinoline skeleton is free from hydrogen atom, the fog density is lowered.
However, it was found that the development of a photosensitive material for color photography with one of the compounds described in these specifications has some defects. Namely, since the image density in the unexposed part is high to cause a fog, the yellow and cyan image densities are insufficient as compared with the magenta image density in the exposed part, and the three-colors are not well balanced.
Polyethyleneoxy groups having two or more repeating units are not described in the description or in the examples of the compounds as a 4-N substituent of a tetrahydroquinoline compound or dihydroindole compound in the above-described J.P. KOKAI No. Hei 4-45440, U.S. Pat. Nos. 2,196,739 and 2,566,259 and European Patent No. 670,312A1. Not only in the compounds usable as the developing agent for silver halide color photographic materials but also in known 4-(N,N-dialkylamino)aniline compounds in which a 4-N substituent is capable of forming a condensed ring with a benzene ring such as te trahydroquinoline compounds and dihydroindole compounds, there are no compounds having a polyethyleneoxy group having two or more repeating units as N-substituent.

4-(N,N-dialklylamino)aniline compounds, photographic processing composition containing the same and color image-forming method


The present invention includes a substrate support system that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the chuck body to move with respect to the plane. As a result the substrate support system attenuates if not avoids generating non-planarity in a substrate that results from a presence of particulate contaminants. This is achieved by fabricating the pin to be compliant, allowing the same to move to accommodate the presence of the particle while maintaining sufficient planarity in the substrate.

The field of invention relates generally to support for substrates. More particularly, the present invention is directed to a chuck suited for use in imprint lithography.
Micro-fabrication involves the fabrication of very small structures, e.g., having features on the order of micro-meters or smaller. One area in which micro-fabrication has had a sizeable impact is in the processing of integrated circuits. As the semiconductor processing industry continues to strive for larger production yields while increasing the circuits per unit area formed on a substrate, micro-fabrication becomes increasingly important. Micro-fabrication provides greater process control while allowing increased reduction of the minimum feature dimension of the structures formed. Other areas of development in which micro-fabrication has been employed include biotechnology, optical technology, mechanical systems and the like. Many of the micro-fabrication techniques involve various processes, including deposition, such as chemical vapor deposition, physical vapor deposition, atomic layer deposition and the like, as well as wet and/or dry etching techniques to pattern substrates.
In addition to the standard micro-fabrication techniques, there exists a relatively new and efficient patterning technique referred to as imprint lithography. An exemplary imprint lithography is described in detail in numerous publications, such as U.S. Pat. No. 6,873,087 entitled HIGH PRECISION ORIENTATION ALIGNMENT AND GAP CONTROL STAGES FOR IMPRINT LITHOGRAPHY PROCESSES; U.S. Pat. No. 6,842,226, entitled IMPRINT LITHOGRAPHY TEMPLATE COMPRISING ALIGNMENT MARKS; U.S. Pat. No. 6,696,220 entitled TEMPLATE FOR ROOM TEMPERATURE, LOW PRESSURE MICRO-AND NANO-IMPRINT LITHOGRAPHY; and U.S. Pat. No. 6,719,915 entitled STEP AND FLASH IMPRINT LITHOGRAPHY, all of which are assigned to the assignee of the present invention. The fundamental imprint lithography technique as shown in each of the aforementioned published patent applications includes formatting a relief pattern in a polymerizable layer and transferring the relief pattern into an underlying substrate to form a relief image in the substrate. To that end, a template is employed spaced-apart from the substrate with a formable liquid present between the template and the substrate. The liquid is solidified forming a solidified layer that has a pattern recorded therein that is conforming to a shape of the surface of the template in contact with the liquid. The substrate and the solidified layer are then subjected to processes to transfer into the substrate a relief image that corresponds to the pattern in the solidified layer.
As a result of the aforementioned micro-fabrication techniques, the demand to ensure the flatness/planarity of substrates being processed/patterned has increased, because of the decreasing size of the features being formed. There are a number of factors affecting substrate planarity, many of which can be corrected by conventional substrate chucks. However, the presence of backside particles, particles that contact a surface of a substrate opposite to the surface being patterned, are problematic. For example, particles may become lodged between the substrate and the chuck, referred to as backside particles, which may cause out-of-plane distortion of the substrate resulting in distortions in the pattern generated on the substrate. Out-of-plane distortions may be characterized as possessing two parameters: 1) distortion height; and 2) gap radius. The distortion height is defined as the maximum out-of-plane deviation produced in the substrate by the backside particle. Gap radius is defined as a measure of the length of a region of the substrate spaced-apart from the chuck, measured between the particle and a point of the substrate closest to the particle at which the substrate contacts the chuck. It can be realized that the area of a substrate that undergoes distortion due to the presence of particulate contaminants is much greater than the size of the particulates.
Prior art attempts to overcome particulate contaminants include pin type and groove type chucks. These chucking systems attempt to avoid the drawbacks associated with backside particles by minimizing the contact area between the substrate and the chuck. However, these chucking systems only reduce the probability of particles being lodged between the chuck and the substrate, but do not avoid or attenuate the non-planarity should a particle get lodged between a chuck and a substrate.
There is a need, therefore, to provide improved support systems for substrates.

Board of Regents, The University of Texas System


A semiconductor package having a plurality of conductors arrayed in two (or more) parallel planes, and an available ground conductor. Conductors in the auxiliary or second plane substantially overlay the primary signal conductors in the first plane, and the impedance of any lead or lead pair is arbitrarily set at the assembly process by connecting the auxiliary conductors to ground or by leaving them floating. Differential pairs of signal conductors, either odd or even mode are set by connecting the auxiliary conductors to a ground contact.

In order to maintain signal integrity, the design of high speed integrated circuit (IC) devices requires specific characteristic impedance of conductors which interconnect an IC chip to a printed wiring board or the next level of interconnection. For example, clock circuit drivers of many high frequency circuits are designed for 50 ohm matched impedance, and this in turn necessitates a specific geometric conductor design, and a predetermined output location for the conductor system in a package or substrate to match the circuit design. Moreover, the conductor system within a substrate or package used for both single ended and differential signal transmission has different impedance levels for each mode, and thus a specific conductor design for individual devices.
Arrays of conductors provide transmission lines in semiconductor packages or substrates; these arrays or systems include signal layer(s), and a ground conductor(s) which may be within the substrate, the printed wiring board or the semiconductor chip itself. The conductive layers are interspaced with dielectric materials. Characteristic impedance of the conductors is a function of conductor spacing, dielectric thickness, conductor width, the electrical properties of the materials, and the velocity of signal propagation on the line.
Differential impedance between a pair of conductors is either odd mode or even mode depending upon the direction of signal propagation, and for some circuits the need for both modes exists within the same device. This is particularly true of higher frequency and microwave devices designed for even mode impedance, often at 100 ohms.
The ongoing proliferation of high speed circuits with specific conductor requirements places a difficult and costly demand for as many package or substrate designs. A need exists for more flexible conductor systems which accommodate a number of different circuit design requirements.

Semiconductor package with conductor impedance selected during assembly


According to one configuration, a shared wireless access node supports wireless access for multiple wireless network service providers. A mobile communication device receives notification of multiple wireless network service providers, each of which provides access to a remote network through the shared wireless access node. The notification includes connection information such as priority information assigned to the wireless network service providers. The priority information indicates an order in which to select amongst the multiple available wireless network service providers to access the remote network. Based at least in part on the priority information, the mobile communication device selects a wireless network service provider amongst the multiple wireless network service providers. The mobile communication device communicates with the wireless access node to establish a wireless communication link to access the remote network through the corresponding wireless access node using wireless services provided by the selected service provider.

Conventional LTE (Long Term Evolution) cellular networks typically include a core network, a RAN (Radio Access Network), and one or more mobile communication devices (so-called UE or User Equipment).
The Radio Access Network (RAN) resides between user equipment (UE) such as a mobile phone, a computer, or any remotely controlled machine and provides connection with its core network (CN). As its name suggests, the radio access network provides respective user equipment access (such as Internet access) via the core network.
In certain instances, conventional LTE networks offer both voice and data services to user equipment via a single subscription such as a single SIM (Subscriber Identity Module). As well known, a Subscriber Identity Module (SIM) is an integrated circuit that securely stores information such as the International Mobile Subscriber Identity (IMSI) number and its related key. This information is used to identify and authenticate subscribers on mobile telephony devices (such as mobile phones and computers). It is also possible to store contact information on many SIM cards.
A new-shared spectrum scheme is being introduced in the United States at 3.5 GHz called CBRS (Citizens Broadband Radio Service). This new band can be used to provide LTE communications to mobile communication devices in a wireless network.
It has been proposed via CBRS working group that a wireless access node (such as a so-called neutral host network) can be configured to implement use of LTE services over CBRS for multiple different service providers.

Service provider selection in a wireless network


Provided is a system for predicting production of a fruit tree, including a plant image obtaining unit collecting images of a fruit tree and confirming identification information about the fruit tree from the collected images, a branch pattern recognizing unit receiving an image of the fruit tree whose identification information is confirmed and extracting fruit bearing branches from among various kinds of branches belonging to the fruit tree, a fruit tree bud recognizing unit receiving an image of each of the extracted fruit bearing branches and extracting information about buds that fruits are actually to be born from among buds belonging to the fruit bearing branch, a meta database storing previous production predicting information about the fruit tree corresponding to the collected images, and a production estimating unit comparing the received bud information and the previous production predicting information to predict production of the fruit tree.

The present invention disclosed herein relates to a system for predicting production of a fruit tree and a driving method thereof, and more particularly, to a system for predicting production of fruit tree by using an imaging device.
A system for predicting production of a fruit tree is used for predicting production of a fruit tree in a next year in advance. Overall price and supply of the fruit tree in the next year can be adjusted on the basis of the production information predicted by the system for predicting production of a fruit tree.
Recently, as the development of electronic technologies, a system for predicting production of a fruit tree by using an imaging device is being developed. The system for predicting production of a fruit tree may predict production of a fruit tree in a next year by collecting image information on the fruit tree from the imaging device and analyzing the collected image information.
In addition, typically, imaging fruit trees is performed at the time when the fruits are actually born. However, it may be difficult to obtain exact fruit tree images due to lots of leaves surrounding the fruits at the time when the fruits are actually born.

System for predicting production of fruit tree and driving method thereof

ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE


A thermoplastic composition includes a functionalized poly(arylene ether) and a copolymer of (a) ethylene or an α-olefin, and (b) an alkyl(meth)acrylate. Optional components in the composition include an impact modifier and a flame retardant. The composition is useful for fabricating wire and cable insulation.

Thermoplastic compositions comprising poly(arylene ether) resins and ethylene-alkyl acrylate copolymers are known in the art. For example, U.S. Pat. No. 4,442,251 to Haaf et al. generally describes compositions of polyphenylene ether resin, optionally containing an impact modifier, and small amounts of a copolymer of ethylene and methyl acrylate. U.S. Pat. No. 5,008,333 to Yates et al. generally describes thermoplastic blends prepared from a polyphenylene ether, a linear polyester such as poly(alkylene dicarboxylate), a polymer containing a substantial proportion or aromatic polycarbonate units, and property improving amounts of an alkylene acrylate copolymer. U.S. Pat. No. 5,162,435 to Shibuya et al. generally describes a resin composition comprising 20–77 weight percent of a polyolefin, 20–77 weight percent of a polyphenylene ether resin, 2–50 weight percent of a polymer including an alkenyl aromatic polymerization chain and an aliphatic hydrocarbon chain, and 1–25 weight of an ester-group-containing ethylene copolymer. There remains a need for compositions comprising poly(arylene ether) resins and ethylene-alkyl acrylate copolymers, where the compositions exhibit improved resin compatibility and improved tensile properties.

Composition comprising functionalized poly(arylene ether) and ethylene-alkyl (meth)acrylate copolymer, method for the preparation thereof, and articles prepared therefrom


An internal, rechargable, battery operated device for outdoor use in deterring livestock from passing through an open gate in a fence. The device incorporates a detector which senses the body heat of a large approching animal and relays a signal to a special siren, thus producing high intensity ear-splitting sound waves to frighten them away. The sensing mechanism is of the type capable of detecting infrared heat generated by the animal's body. The operating principle of this invention is very straightforeward. However, its uniqueness lies not only in the application of this technology but also in the electronic circuit which operates and controls the device. The device is ruggedly constructed to whithstand the rigors of farm, ranch, or industrial use in all kinds of weather and is inexpensive and easy to install using its built in hanger.

Fences are an integral part of the livestock industry. Good husbandry requires that cattle be contained with some type of fencing, not only for their own safety and well being but also out of respect for the property rights and saftey of others.
Almost all livestock fencing systems have gates of some type to allow vehicles to pass from one side of the fence to the other when open, and then when closed, prevent the contained livestock (mainly cattle) from leaving the containment area. For years, gates have been made out of barbed wire, boards or steel. In recent times, gates have often been replaced by devices known in the industry as "cattle guards". These cattle guards consist of a flat grate made from heavy steel pipe or beams welded to cross members at approximately six inch spacings, spanning the width of the road and positioned over a deep narrow trench. A vehicle can then pass over the cattle guard's grate but cattle will usually not attempt to because they perceive the cattle guard as a regular part of the fence.
However, there are serious problems associated with both conventional gates and cattle guards.
FIRST: If they are located in high use areas they will require high maintenance.
SECOND: They are difficult to construct and install.
THIRD: They are expensive, especially cattle guards which usually cost upwards of $1,000 dollars and generally require at least two days to install.
FORTH: They are a potential source of injury both to personnel and to livestock, as anyone acquainted with barbed wire knows. Furthermore, cattle occasionally attempt to cross a cattle guard, and when they do, they usually get their legs caught between the steel beams. This results in severe trauma and injury to the animal which may be extensive enough to require euthanasia.
FIFTH: Gates are a "hassle" to deal with. One of the most aggravating, annoying and time consuming tasks for a livestock producer is having to open and close gates. Which consists of driving up to the gate, stopping your vehicle, getting out, walking through the mud to the gate, opening the gate, walking back to your vehicle, clean the mud off your feet, get back in your vehicle, drive through the gate, stop your vehicle, get back out, walk back through the mud to the gate, shut the gate, walk back to your vehicle, clean your feet and then get back in your vehicle and drive on. This invention addresses all of these problems and provides a simple and relatively inexpensive alternative to both gates and cattle guards. It costs about one-fifth of the price of a cattle guard and can be installed and fully functional in about five minutes.