An article of manufacture in which a polymeric structure is bonded to a component of dissimilar material through a polymeric interface material. The polymeric interface material may be a polyolefin having functional monomers grafted thereto, and the component of dissimilar material may be metallic. Further, an improved method of producing an article of manufacture including the steps of heating a component of dissimilar material, placing it in contact with a polymeric interface material for coating and then affixing the coated component of dissimilar material to a polymeric structure.

The present invention relates generally to an improved article and method of manufacture, and more particularly to a polymeric structure with components of dissimilar material bonded thereto through an interface material and a method thereof.
When making polymeric structures, it is often desirable to incorporate components of dissimilar material for a variety of reasons. For example, it may be desirable to incorporate metallic insert structures, which inserts may be used for support, to thread additional elements into, or for other reasons. In addition, it may be desirable to firmly affix components of dissimilar materials such as metal to a polymeric article to provide enhanced structural integrity of the finished product or provide for additional assembly to the polymeric structure.
Heretofore, it has been difficult to obtain a suitable and sufficiently strong connection between a polymeric material and a dissimilar material such as a metal insert or support. If the connection between these elements is not sufficiently strong, it presents a weakness in the finished article.

Polymeric structure secured to dissimilar components


A ramp circuit discharges an output capacitor to generate a substantially linear ramp signal, current injection is used to stabilize the ramp's output, reducing overshooting and ringing. With faster output stabilization, the ramp exhibits significantly faster repetition rates suitable testing high speed components such as RAM, microprocessors, high speed logic, and the like. The ramp includes an output transistor, with its output defining an output node coupled to a current source and a charge storage device such as a capacitor. The charge storage device charges when the transistor is "on". Namely, when the transistor is turned on, the output charge storage device is coupled to a reference voltage, which charges the device in a fixed time. When the transistor is turned "off", the charge storage device discharges, aided by the flow of current through the current source, resulting in the linear ramp signal. After the charge storage device discharges, current injection is used to quickly stabilize the ramp's output. Particularly, while the output transistor is turned on, permitting the charge storage device to recharge, a transistor couples a bias current source to the output node. Specifically, the transistor is configured to selectively couple the bias current source to the output node when the output transistor is turned on, or a predetermined time thereafter. Conversely, the transistor selectively decouples the bias current source from the output node when the ramp output arrives within a predetermined threshold value of the target ramp starting value.

1. Field of the Invention
The present invention relates to electronic timers for generating precise timing signals. More particularly, the invention concerns a timing vernier employing a current injected ramp to reduce recovery time, enabling faster retriggering.
2. Description of the Related Art
Electronic timers are widely used in many different applications. For example, electronic clocks generate carefully defined, high speed clock cycles necessary to operate digital computers. Timers are also an integral component of test circuits that measure and evaluate operational characteristics of circuits such as memory, microprocessors, high speed logic circuits, and the like. This type of test circuit is often implemented in an automatic test equipment board, which frequently includes both digital and analog circuits.
In this context, engineers have developed a class or circuits called "timing verniers", which provide finely adjustable timing signals. Timing verniers are often sold as a "macro" item, selected by a customer for use in an application specific integrated circuit along with other desired components.
There are many known timing verniers, one class of which is exemplified by the model PDS01S product manufactured by Applied Micro Circuits Corp. (AMCC). This class of timing vernier includes a number of components, shown in simplified block form in FIG. 1. Namely, the timing vernier 100 includes a ramp 102, digital-to-analog converter (DAC) 104, comparator 106, and threshold sensor 114. The ramp 102 produces an analog voltage signal (at output 103) that decreases at a prescribed linear rate. The signal at the output 103 may also be called a "ramp" signal. The DAC 104 provides a fixed analog timing signal select (at output 110) according to a digital timing select input signal (at input 108). When the comparator 106 determines that the ramp's decreasing output signal (at 103) reaches the fixed analog timing select signal 110, the comparator 106 produces a timing event. The timing event is a characteristic of the timing output signal, and may comprise a pulse, digital signal transition (i.e., high-to-low or low-to-high), or another recognizable signal characteristic. When the threshold sensor 114 determines that the ramp's decreasing output signal (at 103) matches the fixe reset select signal on the line 115, the sensor 114 issues a reset signal to the ramp 102, causing the ramp 102 to bring its output back to a predetermined starting level.
FIG. 2 depicts a timing diagram illustrating the operation of the timing vernier 100. The output 103 of the ramp 102 is shown by the waveform 200. Starting from a predetermined starting value 222, the waveform 200 then provides an analog voltage decreasing at a constant level throughout a region 202 of the waveform 200. Several alternative analog timing select signals 110 are shown by the levels 204-206. Each different analog timing select signal is produced by changing the voltage of the digital timing select input signal 108. Different analog timing select signals produce timing events that occur at different times.
For example, if the digital timing select signal 108 is chosen to provide an analog timing select signal 204, the comparator 106 detects when the ramp signal 200 reaches the level 204 when this occurs, the output 112 of the comparator 106 exhibits a timing signal 208 including the timing transition 210. As a different example, the digital timing select signal 108 may be set to yield an analog timing select signal at the level 205. In this case, when the comparator 106 detects the ramp signal 202 reaching the level 205, the output 112 of the comparator 106 exhibits a timing signal 212 including the timing transition 214. Alternatively, the digital timing select signal 108 may instead be set to yield an analog timing select signal at the level 206. In this case, when the comparator 106 detects the ramp signal 202 reaching the level 206, the output 112 of the comparator 106 exhibits the timing signal 216 with the timing transition 218.
As shown in FIG. 1, the threshold sensor 114 is provided to recognize when the output signal 103 of the ramp 102 reaches a fixed threshold value 220, set by the input 115. When the output signal 103 reaches the value 220, the threshold sensor 114 resets the ramp 102, causing the ramp 102 to increase its output back to the predetermined starting value 222 (FIG. 2). There may be some delay in reaching the steady-state value 222 due to overshooting and/or ringing that occurs in a region 224 of the waveform 200.
Although known timing verniers such as the foregoing constitute significant advances and enjoy widespread commercial success today, AMCC has continually sought to improve the performance and efficiency of their timing verniers. One area of particular focus is the speed and signal resolution of timing signals. All timing verniers produce timing signals whose frequency is subject to some maximum value, beyond which the resultant timing signal may unreliable. If the timing signal is not sufficiently fast or crisp in definition, the circuit using the timing signal may produce inaccurate data.
Nonetheless, with the ever-increasing operating speeds of circuits to be tested, it is increasingly important to have timers that provide faster and more clearly defined timing signals. Consequently, advances are continually needed to boost the speed and resolution of timing signals.

Current injected ramp with reduced recovery time background of the invention


Polymer surface modification method comprising the steps of first forming a surface of primary reactive end groups tethered to the polymer chain ends during fabrication of an article, and then modifying the reactive surface with bio-active molecules, hydrophilic and hydrophobic monomers, oligomers, or polymers to attain specific surface properties. Alternatively, a multifunctional coupling agent can be used to couple the primary reactive group to a second reactive group capable of reacting with a functional group associated with bio-active molecules, hydrophilic and hydrophobic monomers, oligomers, and polymers to attain specific surface properties. The invention involves bringing reactive endgroups to the surface with surface active spacer attached to the polymer chain end. The surface active spacer allows the migration and enrichment of reactive end groups to the surface during fabrication. The invention provides medical devices having a bio-interface with anti-thrombogenic properties, lubricity, selective adsorption, and antimicrobial properties.

The surface modification of a substrate with a biologically active molecules and synthetic polymers can change the substrate surface properties such as tissue and blood compatibility, lubricity, wettability, permeability, antimicrobial properties that are important to the efficacy and safety of the medical product. Of these surface modification techniques, covalently bonding of molecules that are of specific characteristics is know to have the following advantages. i) This surface modification technique is advantageous in that a stable bond is formed between a surface and the modifier; and ii) Characteristic properties can be exhibited that are attributable to a large difference in affinity for material existing between a covalently bonded and topically coated. The process is often described as 'grafting' to differentiate from the surface alternation by ordinary spreading and solidifying.
Various grafting techniques have been proposed for the application of surface grafted polymers having aforementioned advantages by making use of their characteristic properties. Often, two alternative approaches are distinguished: "grafting-to"—attaching polymers to the solid surface, and "grafting-from"—monomers being polymerized from solid surface using an initiation at the surface. See Prucker et al., J. Am. Chem. Soc., 1999: 121: 8766-70. Regardless of which technique is used, the solid surface must have reactive sites in an area accessible to the grafting monomers and polymers. This often requires additional steps of surface preparation prior to the grafting to provide the initiation sites for "grafting-from" reaction or have function groups available for "grafting-to" attachment.
Physical activation of chemical reactions, especially via controlled degradation of polymer on the substrate surface has been attempted in many different ways by using high energy radiation, e.g. β- or electron, plasma, UV irradiation. For example, U.S. Pat. No. 5,094,876 describes the method of modifying the plastic surfaces using gamma or electron beam irradiation induced chemical grafting. The method comprises the steps of pre-soaking the substrate in a monomer or a monomer solution to facilitate diffusion of said monomer or monomers into said plastic surface. The method lacks the chemical interaction of pre-formed substrate with the formed polymer and requires the use of organic solvent to facilitate diffusion of the monomers to the substrate and therefore poses the difficulty of removing the organic solvent afterwards.
WO 01/17575 A1 describes the radiation method of grafting hydrogel onto organic substrates. It involves steps of exposing a substrate to an initiator to generate reactive radical sites on the surface for graft polymerization of monomers immersed in thereby forming covalent bonds between monomer molecules and the substrate at reactive radical sites on the substrate surface. This "grafting-from" method calls for a separate step of surface preparation and may not applicable to many radical inert polymer substrates.
Plasma initiated hydrophilic coating was disclosed in U.S. Pat. No. 7,217,769 B2, wherein a double bond(alkene) monomer such as N-trimethylsilyl-allylamine (TMSAA), ethylene, propylene and allyl alcohol, was first deposited onto the substrate by plasma grafting and thereby attaching a reactive site for subsequent plasma cross-linking of the hydrophilic molecules bearing a "bifunctional spacer" such as α-hydro-ω-hydroxypoly(oxy-1,2-ethanediyl)-bis-(1-hydroxbenzotriazolyl carbonate) (HPEOC). The method requires the plasma deposition of primary or secondary amine for the subsequent coupling reaction with a "bifunctional" spacer and subsequent bio-conjugation with hydrophilic molecules. The covalent bonding of "prime" coating of primary or secondary amine to the substrate is not guaranteed.
The excitation with high energy irradiation has a low selectivity, bond scissions in the volume of substrate surface and sub-surface are inevitable. The excitation with plasma is very surface specific, however, in addition to the requirement of vacuum, the ablation tendency of the base polymer may be significant. Ulbricht et al., J AppL Polym. Sci., 1995, 56:325. Also, the contribution of the high-energy deep-UV radiation during a direct plasma exposure may lead to an uncontrolled degradation process. Ulbricht, Polymer, 2006, 47: 2217-2262. In addition, the delicate topological feature of the surface may be damaged due to the exposure to the irradiation.
Other surface functionalization methods such as oxidative hydrolysis and chemical oxidative etching have also been used to create reactive surface with functional groups such as amino, aldehyde, epoxide, carboxyl, or other reactive groups for subsequent surface modification. These "grafting-to" surface treatments involve harsh condition which may adversely affect the bulk properties and surface morphology.
The above prior arts, regardless of the method being used, requires the steps of surface preparation to create bonding sites, either by chemical treatment to generate radicals on the surface or by physical irradiation activation. Direct coupling on reactive side groups or end groups of the substrate material (e.g. for cellulose derivatives polyamide or polysulfones) has been reported. See Klein, J. Membr. Sci., 2000, 179:1, and Castilho et al., J. Membr Sci., 2000, 172: 269. However, there has been limited success due to the limited availability of reactive functional groups on the surface directly accessible to a surface modifier.

Surface modification of polymers via surface active and reactive end groups


An image display system includes: an image projector including a mirror optical element for forming an exit pupil for viewing an image at a viewing location; a viewer eye position detector for generating a signal representing the position of a viewer's eyes relative to the location; and a control system responsive to the signal for providing relative motion between the viewer and the image projector to maintain the viewer's eyes at the exit pupil.

There are numerous systems for the presentation of electronic imagery to viewers. The simplest use projectors for multiple viewers designed to project an image on a viewing surface, such as a screen. Common examples are film or movie projectors and slide or transparency projectors. Other systems are limited to single viewers. For example, head-mounted displays using special glasses allow viewers to move their head while images are optically superimposed on real scenes. More immersive systems entirely obscure a viewer's field of view and replace it with a synthetic view. These systems typically utilize a computer-controlled projector to present the imagery through a suitable optical system. The computer can also provide an interactive experience through the use of image processing and viewer feedback devices.
Immersive systems can be either portable or fixed. Portable systems typically utilize glasses or visors that obscure any sight of the real world and project a synthetic image either into the viewer's eyes or onto a personal screen seen only by the viewer. Fixed systems are generally placed within a special environment with appropriate fixtures and a screen onto which is projected the synthetic image. Viewers enter the environment to view the imagery. Training systems such as flight simulators typically use this approach. Alternatively, fixed systems can project images directly into a viewer's eyes (rather than onto a screen) while the viewer is seated in a fixed position. U.S. Ser. No. 09/738,747 filed Dec. 15, 2000 entitled A Monocentric Autostereoscopic Optical Apparatus and Method, describes such a system.
Systems that project images into a viewer's eyes, in particular stereoscopic viewing systems, require careful alignment of the image projectors with the viewer's eyes. This is problematic, since viewers are of different sizes and frequently move their head in a multiplicity of directions: forward and backward, up and down, left and right, and rotationally around any of three axes. With head-mounted systems this problem is obviated by fixing the projector's position with respect to the eyes (for example with glasses).
Systems that project images directly into a viewer's eyes but are not mounted on the viewer's head must compensate for the relative position and movement of the viewer's eyes with respect to the image projector to ensure that the image is projected into the viewer's eyes. This can be done by tracking the position of the viewer's eyes. Such eye-tracking systems are well known and very sophisticated. For example, EP 0 350 957 A3 entitled Image Pickup Apparatus and Eye Tracking Method Using the Same describes such a system. Compensation for the relative motion of the viewer's head and the image projected by the projection apparatus is then calculated with a computer and the components within the projector are moved to re-align the image with the viewer's eyes. However, the range and type of motion accommodated by the projection system can be very restricted, typically to compensate for a lateral movement of the head from left to right or vice versa. This restricts the viewer's natural body movement and leads to fatigue while viewing. Moreover, viewers of different size cannot be readily or comfortably accommodated.
There is a need, therefore, for an improved system to compensate for viewer movement in a system that projects images into a viewer's eyes so as to align a projected image with a viewer's eyes.

Image display system with body position compensation


An electronic compass assembly includes a first collection portion and a second collection portion that each collect magnetic field data. The magnetic field data collected by the second collection portion partially overlaps the magnetic field data collected by the first collection portion. A processor module determines a calibration output based upon the magnetic field data from the first collection portion if a first predetermined condition exists and determines the calibration output based upon magnetic field data from the second collection portion if a second predetermined condition exists. An example method for controlling the electronic compass includes calibrating the electronic compass based upon one of a first magnetic field data set or a second, partially overlapping magnetic field data set. In another example, the processor module counts the number of magnetic field data points collected by one of the first magnetic field data set, the second magnetic field data set, or both, and determines a calibration output if the number exceeds a threshold. The processor module then uses acceptance criteria to determine whether to accept or reject the calibration output.

The application claims priority to U.S. Provisional Application No. 60/560,206, filed on Apr. 7, 2004.
This invention relates to a compass and, more particularly, to an electronic compass assembly and methods for controlling and calibrating an electronic compass assembly.
Electronic compass assemblies are often used in vehicles to indicate to a driver or passenger of the vehicle the direction that the vehicle is facing or traveling. A typical electronic compass assembly includes magnetic sensors that detect the magnetic field of the Earth. A microprocessor typically then calculates the direction of the vehicle from the detected magnetic field and displays the direction as one of North, South, East, West, Northeast, Northwest, Southeast, and Southwest.
Typical electronic compass assemblies are periodically calibrated to account for magnetic interference, drift in the magnetic sensors over time, and other factors that affect the accuracy of the calculated direction. The microprocessor requires magnetic field data through a 360° rotation (or a predetermined percentage of the 360° turn) of the vehicle to perform the calibration. Magnetic field data is collected and stored until the vehicle undergoes the full 360° rotation (or a predetermined percentage of the 360° turn).
Often, the vehicle travels for a considerable period of time and over a considerable distance before completing a 360° rotation (or a predetermined percentage of the 360° turn) and acquiring a sufficient set of magnetic field data to perform the calibration. Magnetic field data collected over long time periods or over long distances may skew the calibration. The microprocessor clears the stored magnetic field data if a timeout period is exceeded in order to assure that magnetic field data used for the calibration is reliable. Disadvantageously, the timeout period may occur just as the microprocessor is about to begin the calibration. Upon clearing the stored magnetic field data, the microprocessor begins collecting and storing all new magnetic field data without having performed the calibration. This may result in an extended period of time between calibrations and inaccurate calculation of the direction of the vehicle.
Accordingly, there is a need for an electronic compass assembly and method that reliably calibrates more often to provide more accurate calculations of vehicle directions. This invention addresses those needs and provides enhanced capabilities while avoiding the shortcomings and drawbacks of the prior art.

Electronic compass and method of calibration


A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.

1. Field of the Invention
The present invention relates to a substrate cleaning device for cleaning a surface of a substrate processed by, for example, an emersion exposure process or a developing process, and a substrate cleaning method to be carried out by the substrate cleaning device.
2. Description of the Related Art
A photoresist pattern forming process, which is one of semiconductor device fabricating processes, coats a surface of a semiconductor wafer (hereinafter, referred to simply as "wafer") with a resist film, exposes the resist film in a predetermined pattern, and develops the exposed resist film to form a resist pattern.
Device patterns have been progressively miniaturized and the thickness of films shows a trend to decrease in recent years. Consequently, there has been a growing request for higher exposure resolution. To improve exposure resolution, efforts have been made to develop exposure techniques, such as an exposure method using extreme ultraviolet rays (EUVL), an exposure method using electron beam projection (EPL) and an exposure method using a fluorine dimer (F2). On the other hand, an immersion exposure method has been studied to achieve higher resolution through the further improvement of exposure techniques using a conventional light source, such as a light source of argon fluoride (ArF) or krypton fluoride (KrF). The immersion exposure method passes light through, for example, pure water to use the effect of water to shorten the wavelength of radiation emitted by an ArF light source from 193 nm to 134 nm. The immersion exposure method can achieve high resolution by using an existing light source.
The immersion exposure method will be briefly described with reference to FIG. 16. An exposure device 1 is placed opposite to a surface of a wafer W. The exposure device 1 is provided on its head with a lens 10. The head of the exposure device 1 is provided in a part near the periphery of the lens 10 with a pouring hole 11 through which a liquid, such as pure water, for forming a liquid layer on the surface of the wafer W is poured, and a suction hole 12 through which pure water poured onto the wafer W is recovered by suction. Pure water is poured through the pouring hole 11 onto the surface of the wafer W to form a water film between the lens 10 and the surface of the wafer W. The pure water wetting the surface of the wafer W is recovered by sucking the pure water through the suction hole 12. Thus a liquid film, namely, the pure water film, is formed between the lens 10 and the surface of the wafer W. A resist film formed on the surface of the wafer W is irradiated with radiation emitted by a light source, not shown, and traveled through the lens 10 and the liquid film to form a latent image of a predetermined circuit pattern in the resist film.
Then as shown in FIG. 17, the wafer W coated with the water film is translated to align the next transfer range (shot range) 13 in the surface of the wafer W with the exposure device 1. An exposure cycle is thus repeated to transfer the predetermined circuit pattern repetitively to the resist film formed on the surface of the wafer W. In FIG. 17, shot regions 13 are shown in a size greater than their actual size.
The possibility that the wafer wetted with water drops is carried from an exposure system to a coating and developing system is a problem in the immersion exposure method. The wafer W processed by an exposure process is subjected to a heat treatment. If the wafer W is wetted with water drops or if water drops have dried and watermarks are formed on the wafer W in the heat treatment, the water drops or the watermarks affect adversely to the resolution of parts of the circuit pattern underlying the water drops or the watermarks. Therefore, the surface of the wafer needs to be cleaned after exposure to remove water drops.
However, the following problems arise in cleaning the wafer processed by the immersion exposure process. Studies have been made to form a highly water-repellent protective film that come into contact with, for example, water at a contact angle between about 70° and about 100° to assure throughput comparable top that of the known exposure system by enhancing the scanning follow-up ability of the immersed part of the exposure device (the head of the lens). However, the high repellency of the protective film increases the possibility of water drops remaining on the protective film.
As generally known, a cleaning unit for cleaning a wafer W is combined with a developing unit. Generally, the cleaning unit cleans the wafer W by a spin cleaning method that rotates a wafer W while a cleaning liquid is poured onto a central part of the wafer W, and then spin-dries the wafer W. FIGS. 18(a), 18(b) and 18(c) typically illustrate changes of the state of a cleaning liquid while a wafer is cleaned by a spin cleaning method. FIG. 18(a) shows a state of a wafer when the contact angle between the surface of the wafer and water is 70° or below and the wafer is rotated at a high rotating speed of 2000 rpm. FIG. 18(b) shows a state of a wafer when the contact angle between the surface of the wafer and water is between 70° and 110° and the wafer is rotated at a high rotating speed of 2000 rpm. FIG. 18(c) shows a state of a wafer when the contact angle between the surface of the wafer and water is between 70° and 110° and the wafer is rotated at a low rotating speed of 200 rpm.
In FIG. 18(a), a cleaning liquid 15 poured through a nozzle 14 onto a central part of a wafer W spreads toward the circumference of the wafer W and covers the surface of the wafer W entirely. Then, the nozzle 14 is moved toward the circumference of the wafer W to expand a dry region on the surface of the wafer W gradually from a central part toward the circumference of the wafer W. Even if the surface of the wafer W is not highly repellent, it is difficult to remove water drops completely from the surface of the wafer W. In other words, the adjustment of parameters including the rate of pouring the cleaning liquid, the moving speed of the nozzle 14 and the rotating speed of the wafer W is considerably difficult. When the surface of the wafer W has high repellency as shown in FIG. 18(b), a film of the cleaning liquid 15 runs about wildly when the cleaning liquid 15 spreads from a central part toward a circumferential part of the surface of the wafer W and a dry region in the surface of the wafer W expands radially outward. Consequently, a cleaning liquid film breaks and cleaning liquid drops cannot be easily removed, i.e., cleaning liquid drops do not roll radially outward on the wafer W. Consequently, the cleaning liquid drops cannot be completely removed even if the parameters are adjusted.
When the wafer W is rotated at a low rotating speed as shown in FIG. 18(c), the cleaning liquid poured through the nozzle 14 onto the wafer W moves radially outward at a low speed. Therefore, the nozzle 14 unavoidably needs to be moved at a low moving speed and processing speed is unavoidably low. Since the wafer W is rotated at a low rotating speed and centrifugal force that acts on the cleaning liquid poured onto the wafer W is low, the cleaning liquid poured onto the wafer W is splashed in all directions and, eventually, the cleaning liquid remains in drops on the wafer W in some cases.
The adjustment of the process parameters of the known spin cleaning process is difficult when the wafer is rotated at a high rotating speed. The adjustment of the process parameters becomes more difficult when the protective film is formed on the wafer because it is expected that different device makers use different types of protective films and contact angle between the protective film and the cleaning liquid changes with time. On the other hand, the cleaning process takes a long time and there is strong possibility of water drops remaining on the wafer when the wafer is rotated at a low rotating speed.
It is preferable to process a substrate coated with a film, such as a resist film or a protective film, by a cleaning process to remove substances contained in the film and capable of being eluted. However, the cleaning process needs to clean the substrate such that any small water drops do not remain on the surface of the substrate. If water drops exist on the surface of the substrate, the so-called water marks, namely, dehydrated stains, will be formed on the surface of the substrate before the substrate is transferred to the exposure unit and will cause defects during an exposure process. The protective film prevents a resist film from coming into contact with a liquid during an immersion exposure process or to enhance the repellency of the surface of the substrate.
An improved, known spin cleaning method proposed in JP-A 2001-53051 (p. 2, paragraphs 0036 and 0050) uses a gas nozzle for jetting an inert gas in addition to a nozzle for pouring a cleaning liquid. A gas is jetted through the gas nozzle at a region on which a cleaning liquid is poured so as to make the cleaning liquid flow outward. Since the gas is jetted simultaneously with pouring the cleaning liquid onto the region, the cleaning liquid poured on the region is splashed in liquid drops. The liquid drops remain on the substrate if the substrate is rotated at a low rotating speed because centrifugal force that acts on the liquid drops is low when the rotating speed is low.

Substrate cleaning device and substrate cleaning method


A controller may process a plurality of video frames to determine an apparent motion of each pixel of one or more pixels or each group of pixels of one or more groups of pixels of each video frame of the plurality of video frames. The controller may select one or more processed video frames, of the plurality of processed video frames, that correspond to a duration of time and may generate a composite video frame based on the one or more processed video frames. The controller may generate a video frame mask based on the composite video frame and may obtain additional video data that includes at least one additional video frame. The controller may cause the video frame mask to be applied to the at least one additional video frame and may cause the at least one additional video frame to be processed using an object detection technique.

In a variety of work industries (e.g., construction, material movement, mining, hauling, and the like), objects in a vicinity or within a path of work machines on a worksite may disrupt working operations of the work machines. Further, such objects may cause damage to the work machine, or other work machines operating on the worksite, if the objects come in contact with the work machine. Accordingly, object detection is often used to ensure that existence of objects lying in the vicinity of a work machine on a worksite, in which the work machine operates, is known to an operator of the work machine.
One attempt to monitor the surroundings of a work machine is disclosed in U.S. Patent Application Publication No. 2018/0209122 that was filed by Sumitomo Heavy Industries, Ltd. on Mar. 19, 2018 ("the '122 publication"). In particular, the '122 publication discloses a controller receiving outputs of an image capturing apparatus and executing software programs to correspond to an extracting part and an identifying part of the controller. Per the '122 publication, the extracting part extracts an identification process target image, which is a partial image (e.g., a part of a captured image) to be subjected to subsequent image processing. As disclosed in the '122 publication, the extracting part masks identification process unsuitable regions (e.g., a region in which a body of a shovel of the work machine is captured) of a target image region of the target image to generate a normalized image of the target image. Thus, per the '122 publication, by masking the image of an identification unsuitable region, the extracting part prevents an image of the identification process unsuitable region from affecting an identification process by the identifying part. According to the'122 publication, this makes it possible for the identifying part to identify whether it is a person image, using the image of a region other than a masked region in a normalized image without being affected by the image of an identification process unsuitable region.
While the controller of the '122 publication may mask an identification unsuitable region of a target image, the '122 publication does not disclose how the controller identifies the identification unsuitable region. Furthermore, the '122 publication does not address identifying regions, which are associated with a moving implement (e.g., a shovel) of the work machine, in a stream of target images.
The controller of the present disclosure solves one or more of the problems set forth above and/or other problems in the art.

Excluding a component of a work machine from a video frame based on motion information


A device for limiting loads on towers that limits loads only in the longitudinal direction and does not affect the manner in which vertical and transverse loads are resisted by the structure. The device incorporates a shield to prevent ice buildup that could affect its operation. It also has optional antifriction bearings to provide a consistent release force independent of the amount of ice that may accumulate on the wires. The device is of simple construction. The device includes an optional energy absorber, such as that used in U.S. Pat. No. 3,211,260 that can provide a resisting force that is within the longitudinal strength of the tower. The device includes both a mechanical fuse and an energy absorbing mechanism that is used to arrest the wire movement. The energy absorber can extend as much as 50 ft to safely absorb the energy released by broken wires with heavy ice coatings.

1. Field of the Invention
This invention relates to a device that limits the longitudinal loads on an electrical transmission structure and particularly to a device to limit the longitudinal loads on an electrical transmission structure, which includes an energy dissipating mechanism that safely dissipates the energy released when a failure releases the tension in the wires.
2. Description of the Prior Art
On electrical transmission lines, longitudinal loads act parallel to the wires that carry electricity. Transverse loads act horizontally perpendicular to the wires and vertical loads act downward or upward. On the majority of transmission towers, the wires are suspended from the structure as shown in FIG. 1. Under normal loading, a transmission structure with suspended wires is loaded principally in the vertical and transverse directions. The longitudinal loads are typically very small when the wires are suspended. As long as these loads do not exceed the design limits of a tower or other structure, the tower is safe. Circumstances can arise, however, in which these load limits can be exceeded.
An example of this occurs when the wires on one side of the tower are heavily loaded with ice and the wires on the opposite side are bare. Another example of this is when one of the conductors or shield wires breaks. These events cause large unbalanced longitudinal loads on the tower that can cause tower failure. One longitudinal tower failure can transfer load to the adjacent tower causing it to also fail leading to a cascading failure of many towers in a particular line.
To prevent collapse of the line, devices are used to limit the force on the tower due to unbalanced ice loads and loads that occur when a line break or similar failure occurs. Two approaches to limiting the damage are represented in the prior art. The first is to install a mechanical fuse, which releases the wire from the tower at a predetermined force. The second is to install an energy-absorbing element that remains connected to the tower.
Examples of mechanical fuses are found in the following U.S. patents: U.S. Pat. No. 3,150,229 teaches a link type device that is designed to release under the proper longitudinal force. This causes the line to drop away from the tower, thereby protecting the tower from excessive forces. U.S. Pat. No. 3,519,727 teaches a device for releasing a "V" string insulator line during a failure. This is designed to reduce the pulling load on the tower in such a line failure and includes anti-friction pads. U.S. Pat. No. 3,711,049 teaches a load limiter device that is designed to drop a line from a tower under excessive force. By dropping the line, the tower can be saved.
The problem with these mechanical fuses is that they all have limitations on their use. They are complicated devices with many parts. Freezing rain and fog can cause buildups of ice that prevent their proper operation. Anti-friction devices are needed for consistent operation when the weight of the wires changes due to ice buildup.
Examples of energy absorbing devices incorporated in the insulator assemblies of the tower are found in the following U.S. Pat. No. 4,791,243 teaches an energy absorption device that has a non-spring helix that is placed between a tower and the insulator string. The device deforms by plastically uncoiling in response to excessive forces. U.S. Pat. No. 5,898,558 teaches a protective overload device that uses a cable embedded in a frangible matrix to absorb energy during a failure. After the device has operated, the cable and frangible matrix can be replaced without having to replace the entire unit.
The problem with these units is that they operate on the combined vertical, transverse and longitudinal loads. A balanced heavy ice load can trigger unintended operation of the unit that removes the protection against broken wires.
U.S. Pat. No. 3,005,866 teaches a connector that attaches the line to the insulator. The connector has a pair of coils attached between two parts, one of which is connected to the insulator and the other to the conductor. When a line breaks, the connector rotates in relation to the insulator, allowing the two parts to separate. The coils then extend, thereby reducing the shock on the tower and possible preventing the line from dropping to the ground. The problem with this device is that the insulator is typically made up of flexible units that are not stiff enough to ensure the rotation of the connector in relation to the insulator to allow activation of the coils.
Finally, U.S. Pat. No. 3,211,260 teaches an arrester that has a large body of material held in a housing. When excessive force is applied, the material is pulled out of the housing, over a series of pins. This action absorbs the energy as the material is pulled from the housing.

Longitudinal load limiting devices for transmission lines and the like


The present invention relates to a bone fixation device having a fixation member using a shape memory effect to secure bone fractures, including but not limited to, femur, tibia and humerus fractures. The fixation member can be malleable at a room temperature, but become rigid at a body temperature because of the shape memory effect, such as derived from a super-elastic property found in such as a nickel titanium alloy. The fixation member can be formed on one or more of the shaft portion and the two end portions of a nail member for securing bone fractures, such as by providing translational and rotational stabilities. The fixation member is also capable of providing a continuous and controllable compression force over the fractured bone, if needed.

Various fracture fixation devices have been used to treat bone fractures. For example, intramedullary (IM) nailing devices are used for long bone shaft fractures. IM nail members such as reamed or un-reamed nail members can be combined with or without interlocking screws to secure the nail members in position. For example, shaft fractures with significant soft-tissue injuries can be treated using IM nail members which were inserted without reaming.
Conventional fixation devices are associated with various biomechanical problems. For example, reamed nail members can cause damages to the internal cortical blood supply since the medullary cavity has been reamed. Un-reamed nail members typically have a smaller diameter for easy insertion and consequently have loose fittings. Apart from the local damage, some changes such as pulmonary embolization, temperature-related changes of the coagulation system and humoral, neural and inflammatory reactions are to be considered. Moreover, due to the anatomical structures of tibia and humerus, current IM nailing devices cannot repair long bone fractures satisfactorily. Additionally, the entry point at the humerus presents a difficult problem.
The present invention provides a bone fixation device and a fixation member capable of reducing surgical trauma at the time of insertion. Additionally or alternatively, the present invention provides a bone fixation device and a fixation member capable of facilitating faster healing of and providing improved biomechanical properties to the fractured bone during healing.


The invention concerns a method of testing the state of development of a photographic film in a light-proof cartridge. According to the invention, the leading edge of the film is pulled out of the cartridge, the film is positioned between a light source and a photosensor, and the amount of light passing between the light source and photosensor is measured. The state of the film is recognized as being undeveloped if a small amount of light passes therebetween.

The present invention relates to a method and apparatus for testing the state of development of a photographic film, the major portion of which is disposed in a light-proof cartridge but which has a leading end that extends out of the cartridge.
When photographic films are processed in large laboratories, the films are removed from the film cartridges in what is called a splicer and cemented together into a long strip. To do this, the trailing end of one film and the leading end of the subsequent film are positioned in a cementing station in such a way that the ends of the respective films can be joined together with a strip of adhesive. Devices of this genus are described in German Published Application No. 3,833,468 and European Published Application No. 0,212,134, for example. The positioning of the films in the splicing station is usually carried out by means of infrared-light barriers.
U.S. Pat. No. 5,093,686 describes a film system and a laboratory organization wherein the film, after being developed and printed, is rewound back into the cartridge and returned to the customer within the original cartridge along with the finished prints. However, this leads to the problem that the laboratory cannot be certain whether a film cartridge that has been delivered to them contains a film that has not yet been developed or an already developed film from which only repeat orders are to be filled.
A splicer that is suitable for such films can be used in darkroom operation, as has been common in the past, to cement the unexposed films into a strip that is then developed in a developing machine. Such a splicer can, however, also be used in a similar way in lightroom operation to splice together into a strip films that repeat orders are to be filled from, whereupon, however, the strip is not to be developed, but printed. If an error occurs during the sorting of incoming film cartridges, such that, for example, a film that has previously been developed is processed with the as-yet undeveloped films or vice-versa, it can lead to the destruction of the incorrectly sorted film. Whereas a film that has already been developed will fade severely when it is developed again, an as-yet unprocessed film that has been mistakenly included with the previously developed films will be exposed as the result of being processed in the lightroom-operation splicer and accordingly completely ruined.
The U.S. Pat. No. 5,521,662 (not a prior publication) discloses a camera. The description mentions an infrared-transmitting sensor that employs various transmission rates to determine whether the film has been developed.

Method of and device for testing a photographic film


A manually guided implement having a housing that accommodates an internal combustion engine for driving a tool. At least an upper handle extends in a longitudinal direction of the implement on an upper side thereof. A first antivibration element connects the handle to the housing, wherein a longitudinal central axis of the antivibration element is inclined relative to a longitudinal central plane of the implement.

The present invention relates to a manually guided implement, especially a power saw, a cut-off machine, or the like.
A power saw having an upper handle is known from U.S. Pat. No. 5,018,492. The ends of the handle are connected to the housing of the power saw via respective rubber antivibration elements. An only very limited installation space is available for the antivibration elements. These antivibration elements are disposed in the transverse direction of the implement, perpendicular to the longitudinal central plane of the implement. Due to the limited installation space, other antivibration elements, such as coil springs, cannot be installed in this position, so that an optimal adaptation of the dampening characteristic is not always possible.
It is therefore an object of the present invention to provide an implement of the aforementioned general type that has a small overall size and good dampening properties.


A descending bid auction system includes preregistered bids from remote locations. Preregistered bids submitted before an auction cycle begins are awarded a sale when the pricing device declines to a price that matches that of the preregistered bid. In keeping with traditional Dutch auction style, in one example, local bidders who submit a bid are given priority because of the first-submitted tradition. Similarly, when more than one remotely submitted preregistered bid is for the same price, the first such bid submitted is given priority. An alternative way of using a remote bidding terminal designed according to this invention is to competitively bid while an auction cycle is in process. Bids submitted while the auction cycle is in process preferably are submitted when a remote clock, which operates in advance compared to the auction site clock, reaches a desired price. the remote bid preferably is received at the auction site before the auction site clock reaches the intended price.

There are a variety of styles of auctions. "Dutch auctions" are the type where a price continues to go down until a buyer is determined. These types of auctions are also referred to as "descending bid auctions."
Dutch auctions typically include a Dutch clock device that shows the sequentially descending price. Local potential buyers watch the price on the Dutch clock and submit a bid for a price responsive to the clock reaching that price. State of the art systems include bidding devices that identify buyers and enable them to submit a bid including information regarding the amount of the product that they desire to purchase.
According to current standards, there are several ways for the Dutch clock to be stopped during an auction cycle. First, when a buyer indicates a desire to purchase some of the currently offered items at the current price, the clock is stopped and the sale is awarded accordingly. Alternatively, a seller may stop the auction cycle or the auctioneer may stop the auction cycle according to rules established at the various auctions. Other ways that the clock stops includes the price declining to a preselected minimum price, which may be zero or greater, depending on the situation.
One hindrance to the success of Dutch auctions is the perceived aggressive and intimidating environment of the auction. At declining bid auctions, decisions are made in fractions of a second and are completely binding. During busy seasons there is an additional sense of stress and tension at the auction gallery. The very competitive nature of the marketplace, the speed and size of the auction, and the experience of most of the potential buyers frequently intimidates new or inexperienced auction buyers. Additionally, the nature of the Dutch clock device makes any mistakes (i.e., a bid at too high of a price) very public, which presents a humiliation factor to some that is enough to discourage them from attending the auction.
Another drawback of current Dutch auction systems is the inconvenience of having to attend the auction at the auction site. Additionally, the auctions of agricultural products typically start very early in the morning and the typical buyers are located far from the auction site so that significant travel inconvenience is a factor.
With advances in technology, Dutch auctions have been conducted with potential buyers being located at remote locations from the location of the auction clock and the item to be purchased. Such systems, however, present a disadvantage to the remote buyers because the awarded sale in a Dutch auction is typically given to the first bid received at a given price. Therefore, any communication delay from a remote location may result in a potential buyer losing out to a local bidder who is present at the auction site. Additionally, remote buyers may not get an expected price because the price can typically decrement by a selected unit of currency every forty milliseconds. A one-tenth second delay may result in a significant price disadvantage.
There have been attempts at addressing the disadvantage to remote buyers such as allowing the remote buyer to submit the intended price along with the clock stop command. While these methods have not proven completely satisfactory, they have at least enabled remote buyers to participate in declining price auctions. Other attempts have been made to address the situation of remote buyers in auction cycles, however, these do not appear to be sufficient to address the needs of a declining or descending price auction style. One example is shown in the European patent publication EP 0828223. In that document, a series of decision-making rules are applied to various bids in order to sort through the bids and award a sale to a single buyer when there are competing bids that may conflict based upon time or amount, for example. The decision-making rules of that proposed system, however, do not appear useful in a descending price auction where the sale is typically awarded to the first buyer to submit a bid.
There is a need for a Dutch auction system that allows buyers to compete from a remote location to avoid the tension and stresses associated with being at the live auction while not handicapping the remote buyers because of communication delays as described above. This invention provides such a system and enhances the Dutch auction process.

Dutch auction system with preregistered bid feature


The present invention provides a liquid methylene bis(phenylisocyanate) composition including a high concentration of methylene bis(phenylisocyanate) which has an improved storage stability. The invention further provides a method of making the liquid methylene bis(phenylisocyanate) compositions of the present invention.

1. Technical Field
The invention relates to a liquid methylene bis(phenylisocyanate) composition having improved storage stability.
2. Description of Prior Art
Polyisocyanate compositions including a high concentration of methylene bis(phenylisocyanate) (xe2x80x9cMDIxe2x80x9d), particularly 4,4xe2x80x2-methylene bis(phenylisocyanate) (xe2x80x9c4,4xe2x80x2-MDIxe2x80x9d), while useful for various cellular and non-cellular polyurethane applications often pose a processing problem in that they are normally a solid at room temperature, i.e., about 25xc2x0 C. The material, therefore, has to be melted and maintained in order to be useful as a liquid.
Unfortunately, methylene bis(phenylisocyanate) compositions having relatively high levels of 4,4xe2x80x2-MDI are also known to have a limited life due to the formation of diphenylmethane uretdione, otherwise referred to herein as uretdione. Uretdione tends to couple with the 4,4xe2x80x2-MDI molecules contained in methylene bis(phenylisocyanate) compositions, thereby forming a substantially insoluble precipitate over time. For example, 4,4xe2x80x2-MDI compositions maintained at about 43xc2x0 C. for 14 days have exhibited uretdione concentrations above the generally acceptable saturation concentration of 0.5%. The formation of high concentrations of uretdione have heretofore rendered the methylene bis(phenylisocyanate) compositions substantially useless.
Interestingly, the uretdione reaction is both temperature and phase dependent. For example, as the temperature of a 4,4xe2x80x2-MDI composition is increased above about 43xc2x0 C., the rate of uretdione formation increases. Further, the rate of uretdione formation is accelerated when the methylene bis(phenylisocyanate) is in the solid state as compared to a liquid composition at 43xc2x0 C.; such formation being generally attributed to the alignment of the isocyanate groups in the crystal lattice structure.
In an effort to limit the formation of uretdione, methylene bis(phenylisocyanate) compositions, particularly 4,4xe2x80x2-MDI compositions, are often frozen and stored at temperatures below about 0xc2x0 C. While this temporarily retards the formation of uretdione dimer, refrigerating the compositions for extended periods of time prior to use can be expensive and introduces logistic considerations which must be addressed.
It is, therefore, an object of the present invention to provide a liquid methylene bis(phenylisocyanate) composition which is storage stable at temperatures above about 30xc2x0 C.
It is a further object of the invention to provide a liquid methylene bis(phenylisocyanate) composition which increases the saturation concentration of uretdione.
It is another object of the present invention to provide a methylene bis(phenylisocyanate) having a reduced freezing point.
It is still another object of the present invention to provide a liquid methylene bis(phenylisocyanate) composition which can be used in the preparation of all types of polyurethanes for which pure MDI is currently employed.
In view of the foregoing, the development of a liquid storage stable methylene bis(phenylisocyanate) composition including a high concentration of 4,4xe2x80x2-MDI that could be shipped in bulk, thereby reducing the high costs associated with shipping frozen drummed compositions would be highly desirable.
The foregoing objects, among others, are achieved by the methylene bis(phenylisocyanate) compositions of the present invention comprising a mixture of a) a methylene bis(phenylisocyanate) component including at least about 90.0 weight percent 4,4xe2x80x2-MDI; and b) an uretonimine. Under preferred embodiments, the uretonimine will be present in positive amounts of less than about 5.0 weight percent, based on the weight of the methylene bis(phenylisocyanate) composition. More preferably the uretonimine is present in amounts ranging from about 0.1 to less than about 5.0 parts per 100.0 parts of methylene bis(phenylisocyanate) composition, with amounts ranging from about 0.25 parts to about 2.5 parts being highly preferred. As will be described in greater detail below, a catalyst may be employed to cause the formation of uretonimine in situ. The amount of catalyst will generally range from about 0.0001 to about 5.0 parts, preferably about 0.0002 to about 2.5 parts, per 100.0 of methylene bis(phenylisocyanate).
The invention also provides a method of preparing storage stable liquid methylene bis(phenylisocyanate) compositions by admixing a methylene bis(phenylisocyanate) component including at least about 90.0 weight percent 4,4xe2x80x2MDI with an uretonimine to form a liquid methylene bis(phenylisocyanate) composition which is storage stable at temperatures as low as about 30xc2x0 C.
Another method of the present invention relates to the in situ formation of uretonimine in liquid methylene bis(phenylisocyanate) composition including at least about 90.0 weight percent 4,4xe2x80x2-MDI.
The methylene bis(phenylisocyanate) composition of the present invention comprises a) a methylene bis(phenylisocyanate) component including at least about 90.0 weight percent 4,4xe2x80x2-MDI; and b) an uretonimine.
The methylene bis(phenylisocyanate) component a) which includes at least about 90.0 weight percent 4,4xe2x80x2-MDI, more preferably will include at least about 95.0 weight percent 4,4xe2x80x2-MDI and under a highly preferred embodiment will include at least about 98.0 weight percent 4,4xe2x80x2-MDI. Generally, in addition to the 4,4xe2x80x2-MDI, the component a) may include 2,4xe2x80x2-MDI; 2,2xe2x80x2-MDI and other isomers, the 2,4xe2x80x2-MDI isomer being the predominant specie therein. The 2,4xe2x80x2-MDI isomer (and other MDI isomers) may make up the balance of the component a). Preferably, however, these isomers are limited to relatively low levels, i.e., about 2% or less by weight of component a).
The amount of methylene bis(phenylisocyanate) component a) in the composition of the present invention may be as low as about 80 weight percent, based on the total weight of the methylene bis(phenylisocyanate) composition. However, compositions of the present invention preferably comprise at least about 90.0 weight percent, more preferably at least about 95 weight percent, most preferably at least about 99 weight percent, of the methylene bis(phenylisocyanate) component.
In another aspect of the present invention, the source of uretonimine to the composition may contribute additional amounts of methylene bis(phenylisocyanate) isomers (predominantly 4,4xe2x80x2-MDI) to raise the level of methylene bis(phenylisocyanate) component in the composition, as described below. As such, the amount of methylene bis(phenylisocyanate) component a) in the composition of the present invention may be at least 97.5 weight percent, based on the total weight of the methylene bis(phenylisocyanate) composition, preferably at least about 98.75 weight percent, and still more preferably, at least about 99.75 weight percent. As described above, this component a) will predominantly comprise the 4,4xe2x80x2-MDI isomer, with the remainder of the methylene bis(phenylisocyanate) component (preferably 2% or less) comprising 2,4xe2x80x2-MDI and other isomers.
The methylene bis(phenylisocyanate) component a) can be produced by any of the commonly employed processes including the distillation of crude mixtures of isocyanate obtained by phosgenating a mixture of polyamines generally obtained by acid condensation of aniline and formaldehyde.
The uretonimine b) may be introduced into the methylene bis(phenylisocyanate) composition as part of an organic isocyanate blend or may be formed in situ in the methylene bis(phenylisocyanate) component to form the composition of the present invention. The uretonimine b) is generally formed by initially reacting, for example, 4,4xe2x80x2-MDI with a suitable catalyst such as a phospholene oxide with heating to give MDI carbodiimide. The MDI carbodiimide then reacts with excess 4,4xe2x80x2-MDI to give uretonimine groups as illustrated by the following reaction:
Thus, in the presence of excess 4,4xe2x80x2-MDI, the carbodiimide converts (but remains in equillibrium with the carbodiimide) to the uretonimine. This organic isocyanate blend, therefore, comprises uretonimine and methylene bis(phenylisocyanate), e.g., for example at ratios of 25:75, respectively. In the composition of the present invention, the amount of methylene bis(phenylisocyanate) takes into account amounts contributed thereto coming from the organic isocyanate blend.
The uretonimine may be formed as described above from organic isocyanates including 2,4xe2x80x2-MDI and 2,2xe2x80x2-MDI isomers and mixtures thereof (particularly those comprising at least about 45 weight percent 4,4xe2x80x2-MDI), as well as aromatic, aliphatic and cycloaliphatic polyisocyanates and combinations thereof. Representative of these types are monoisocyanates including phenyl isocyanates, cyclohexyl isocyanate; the diisocyanates such as m-phenylene diisocyanate, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, mixtures of 2,4- and 2,6-toluene diisocyanate, hexamethylene diisocyanate, tetramethylene diisocyanate, cyclohexane-1,4-diisocyanate, hexahydrotoluene diisocyanate (and isomers), isophorone diisocyanate, hydrogenated methylene bis(phenylisocyanate), naphthalene-1,5 diisocyanate, 1-methoxyphenyl-2,4-diisocyanate, 4,4xe2x80x2-biphenylene diisocyanate, 3,3xe2x80x2-dimethoxy-4,4xe2x80x2-biphenyl diisocyanate, 3,3xe2x80x2-dimethyldiphenylmethane-4,4xe2x80x2-diisocyanate; the triisocyanate such as 4,4xe2x80x2,4xe2x80x3-triphenylmethane triisocyanate and toluene 2,4,6-triisocyanate; and the tetraisocyanates such as 4,4xe2x80x2-dimethyldiphenylmethane-2,2xe2x80x2,5,5xe2x80x2-tetraisocyanate and polymeric polyisocyanates such as polymethylene polyphenylene polyisocyanate, by way of non-limiting example. The reaction mechanism in each case is well known to those skilled in the art and are similar to the one exemplified above for production of the uretonimine from 4,4xe2x80x2-MDI.
The amount of uretonimine to be included in the methylene bis(phenylisocyanate) composition of the present invention will generally range from about 0.1 to about 5.0 parts per 100.0 parts of methylene bis(phenylisocyanate) composition, more preferably, from about 0.25 parts to about 2.5 parts, and most preferably from about 0.25 to about 1.25 parts per 100.0 parts of the composition.
In an alternative embodiment of the present invention, a desired amount of uretonimine is produced in situ in the methylene bis(phenylisocyanate) composition of the present invention, wherein a catalyst c) capable of reacting with 4,4xe2x80x2-MDI to give MDI carbodiimide, at least some of which is then converted to uretonimine in the presence of excess 4,4xe2x80x2-MDI, as described above. Thus, under certain embodiments, it may be desirable to add a catalyst c) into the methylene bis(phenylisocyanate) component a) to produce the storage stable liquid methylene bis(phenylisocyanate) compositions of the present invention.
Illustrative of such catalysts are:
(a) phospholene 1-oxides and 1-sulfides having the formulae:
wherein a, b, c and d are each selected from the group consisting of hydrogen and hydrocarbyl from 1 to 12 carbon atoms inclusive, R is selected from the group consisting of lower alkyl and aryl and X is selected from the group consisting of oxygen and sulfur. The above phospholene compounds and methods for their preparation are described in U.S. Pat. Nos. 2,633,737, 2,663,738 and 2,853,473, which are hereby incorporated by reference. The 3-phospholenes can be isomerized readily to the corresponding 2-phospholenes by thermal treatment or by refluxing with an aqueous base as disclosed by Quin et al, Journal American Chemical Society, 33, 1024, 1968. Representative compounds within the above class are 1-phenyl-2-phospholene-1-oxide; 3-methyl-1-phenyl-2-phospholene-1-oxide; 1-phenyl-2-phospholene-1-sulfide; 1-ethyl-2-phospholene-1-oxide; 1-ethyl-3-methyl-2-phospholene-1-oxide; 1-ethyl-3-methyl-2-phospholene-1-sulfide; and the isomeric phospholenes corresponding to the above named compounds. Also, polymer bound phospholene oxide may be employed specifically those having recurring units, for example.
as disclosed in U.S. Pat. No. 4,105,643 and those of the following structure as disclosed in U.S. Pat. No. 4,105,642, both of which patents are expressly incorporated herein by reference.
(b) diaza- and oxaza-phospholenes and -phosphorinanes
wherein CnH2n represents alkylene from 1 to 12 carbon atoms, inclusive, at least one and not more than three adjacent carbon atoms and said alkylene radical forming a chain, one end of which is attached to Y, the other end of which is attached to N, thereby completing the heterocyclic ring; Rxe2x80x2 is selected from the group consisting of hydrocarbyl containing 1 to 12 carbon atoms, inclusive; and halo, nitro, alkoxy, alkyl, mercapto, and cyano substituted hydrocarbyl from 1 to 12 carbon atoms, inclusive; Rxe2x80x3 is hydrocarbyl containing from 1 to 12 carbon atoms, inclusive, and Y is selected from the group consisting of xe2x80x94Oxe2x80x94 and xe2x80x94NRxe2x80x3xe2x80x94 wherein Rxe2x80x3 has the significance as defined above. The above compounds and methods for their preparation are described in U.S. Pat. No. 3,522,303. Representative examples of such compounds are: 2-ethyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-chloromethyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-trichloromethyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-phenyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-phenyl-1,3-dimethyl-1,3,2-diaza-phosphorinane-2-oxide; 2-benzyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-allyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-bromomethyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-cyclohexyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; 2-cyclohexyl-1,3-dimethyl-1,3,2-diaphospholane-2-oxide; 2-(2-ethoxyethyl)-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide; and 2-naphthyl-1,3-dimethyl-1,3,2-diazaphospholane-2-oxide.
(c) Triaryl arsines wherein the aryl groups are free from substituents containing reactive hydrogen atoms, said arsine being represented by the formulae:
wherein each of R, R1 and R2 represents the same or different aryl moieties having from 6 to 12 carbon atoms, inclusive. Such compounds are described in U.S. Pat. No. 3,406,198. Representative examples are: triphenylarsine, tris(p-tolyl)arsine, tris(p-methoxyphenyl)arsine, tris(p-ethoxyphenyl)arsine, tris(p-chlorophenyl)arsine, tris(p-fluorophenyl)arsine, tris(2,5-xylyl)arsine, tris(p-cyanophenyl)arsine, tris(1-naphthyl)arsine, tris(p-methylmercaptophenyl)arsine, tris(p-biphenylyl)arsine, p-chlorophenyl bis(ptolyl)arsine and phenyl(p-chlorophenyl)(p-bromophenyl)arsine.
(d) Also included are compounds of the formula:
wherein each R, R1 and R2 represents the same or different alkyl or aryl groups having from 6 to 12 carbon atoms, inclusive. Representative examples of such are: triphenylarsine oxide, triethylarsine oxide, and polymer bound arsine oxide such as are described in U.S. Pat. No. 4,143,063:
wherein R1 and R2 are hydrocarbyl from 1 to 12 carbon atoms inclusive, R3 is hydrogen, chloro or methyl, R4 is hydrogen or methyl, and n is 0 or 1.
(e) Metallic derivatives of acetylacetone such as the beryllium, aluminum, zirconium, chromium, and iron derivatives thereof as disclosed in U.S. Pat. No. 3,152,131.
(f) Phosphate esters of the formula:
(RO)3PO
wherein R is hydrocarbyl from 1 to 12 carbon atoms, inclusive. Such esters and methods for their preparation are disclosed in U.S. Pat. No. 3,056,835. Representative examples are trimethylphosphate, triethylphosphate, ethyldipropylphosphate, triisopropylphosphate, triallylphosphate, triphenylphosphate and tricresylphosphate.
(g) Phosphine oxides of the formula:
R3PO
wherein R is hydrocarbyl from 1 to 12 carbon atoms, inclusive. Representative examples are triethylphosphine oxide, tributylphosphine oxide, triphenylphosphine oxide and tris(chloromethyl)phosphine oxide.
(h) Metal complexes derived from a d-group transition element and xcfx80-bonding ligand selected from the group consisting of carbon monoxide, nitric oxide, hydrocarbylisocyanides, trihydrocarbylphosphine, trihydfrocarbylarsine, trihydrocarbylstilbine and dihydrocarbylsulfide wherein hydrocarbyl in each instance contains from 1 to 12 carbon atoms, inclusive, provided that at least one of the xcfx80-bonding ligands in the complex is carbon monoxide or hydrocarbylisocyanide. Such complexes and methods for the preparation are disclosed in U.S. Pat. No. 3,406,197. Representative examples of such complexes are iron pentacarbonyl, di-iron pentacarbonyl, tungsten hexacarbonyl, molybdenum hexacarbonyl, chromium hexacarbonyl, dimanganese decacarbonyl, nickel tetracarbonyl, ruthenium pentacarbonyl and the complex of iron tetracarbonyl:methylisocyanide.
The term xe2x80x9chydrocarbylxe2x80x9d from 1 to 12 carbon atoms inclusive employed herein means the monovalent radical obtained by removing one hydrogen atom from a parent hydrocarbon having the stated carbon atom content. Illustrative of such groups are alkyl such as methyl-, ethyl-, propyl-, butyl-, pentyl-, hexyl-, heptyl-, octyl-, nonyl-,decyl-, undecyl-, undodecyl-, including isomeric forms thereof; alkenyl such as allyl, butenyl, pentenyl, hexenyl, heptenyl, octenyl, nonenyl, decenyl, undecenyl and dodecenyl, including isomeric forms thereof; cycloalkyl such as cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and the like; cycloalkenyls such as cyclopentenyl, cyclohexenyl, cycloheptenyl and the like; aralkyls such as benzyl, phenethyl, phenylpropyl, benzhydryl, naphthylmethyl and the like; and aryls such as phenyl, tolyl, xylyl, naphthyl, biphenylyl and the like.
The term xe2x80x9clower alkylxe2x80x9d as used herein means alkyl from 1 to 6 carbon atoms, inclusive, such a methyl, ethyl, propyl, butyl, pentyl, hexyl and isomeric forms thereof.
The preferred carbodiimide catalysts for use in preparing the compounds of the instant invention are the 1-phospholenes and 2-phospholenes, respectively. The preferred carbodiimide catalysts for use in preparing these compounds in accordance with the invention are the 1-aryl-3-lower alkyl-2-phospholene 1-oxide and 1,3-di(lower alkyl)-2-phoslene 1-oxide, 1-phenyl-3-methyl-2-phospholene 1-oxide 1-ethyl-3-methyl-2-phospholene-1-oxide and the tris(chloromethyl)phosphine oxide. The most preferred phospholene oxide catalyst is 1H-phospholene, 2,5-dihydro-3-methyl-1-phenyl-1-oxide.
(i) Organotin compounds.
Organotin compounds may also be employed in the present invention. The Organotin compounds which may be employed in the present invention are both quadrivalent and divalent organotin compounds. The quadrivalent organotin compound may be described by the following formula:
wherein Z and Zxe2x80x2 are individually alkyl, aryl, alicyclic, heterocyclic, oxyalkyl or acyloxy group having from 1 to 18 carbon atoms and may be the same or different, X is an alkyl, aryl, alicyclic, heterocyclic, oxyalkyl, acyloxy, thioalkyl or thioalkylene acyloxy group having 1 to 18 carbon atoms, Y is equal to X or oxy groups or a group represented by the following formula:
provided that when Y is this group, X is an alkyl or aryl group, m is equal to 1 except when Y is an oxy group then m is equal to 0 and a divalent organotin compound which may be described by the following formula:
Sn(OOCZxe2x80x3)2
wherein Zxe2x80x3 is alkyl, aryl, alicyclic, heterocyclic having from 1 to 18 carbon atoms. Those quadrivalent organotin compounds which may be employed as described in the formula above, are dibutyltin dilaurate, dibutyltin diacetate, dibutyltin di(2-ethylhexanoate), dioctyltin dilaurate, dibutylin maleate, di(n-octyl)tin maleate, bis(dibutylacetoxytin) oxide, bis(dibutyllauroyloxytin) oxide, dibutyltin dibutoxide, dibutyltin dimethoxide, dibutyltin disalicilate, dibutyltin bis(isooctylmaleate), dibutyltin bis(isopropylmaleate), dibutyltin oxide, tributyltin acetate, tributyltin isopropyl succinate, tributyltin linoleate, tributyltin nicotinate, dimethyltin dilaurate, dimethyltin oxide, diotyltin oxide, bis(tributyltin) oxide, diphenyltin oxide, triphenyltin acetate, tri-n-propyltin acetate, tri-n-propyltin laurate and bis(tri-n-propyltin) oxide, dibutyltin dilaurylmercaptide, dibutyltin bis(isooctylmercaptoacetate) and bis(triphenyltin)oxide. Those preferred are dibutyltin diacetate, dibutyltin dilaurate, dibutyltin dilaurylmercaptide, dibutyltin bis(isooctylmercaptoacetate), dibutyltin oxide, bis(triphenyltin) oxide, bis(tri-n-butyltin) oxide. Those divalent organotin compounds which may be employed s catalysts as described in the formula above are: stannous oxalate, stannous oleate, stannous naphthenate, stannous acetate, stannous butyrate, stannous 2-ethylhexanoate, stannous laurate, stannous palmitate and stannous stearate. The preferred divalent tin compounds are stannous oxalate, stannous oleate and stannous 2-ethylhexanoate.
The catalyst c) which assists in forming uretonimine in the methylene bis(phenylisocyanate) compositions of the present invention as will be demonstrated in the following data, will generally be present in amounts ranging from 0.0001 parts to about 5.0 parts per 100 parts of methylene bis(phenylisocyanate) and preferably will range from about 0.0002 parts to about 2.5 parts, depending on the catalyst being employed.
For example, and without limitation, the phospholene oxides will generally range form about 0.0001 to about 0.1 parts per 100 parts methylene bis(phenylisocyanate) with a range of 0.0002 to 0.05 being preferred. The tricarbyl phosphates will, however, preferably range from about 0.1 to about 5.0 parts per 100 parts methylene bis(phenylisocyanate) with a range of 0.2 parts to about 2.5 parts being preferred.
To terminate the rate of uretonimine formation, a limited amount of acid can be added to the polyisocyanate composition to deactivate the catalyst. Useful catalyst deactivators include aliphatic and aromatic acid chlorides such as acetyl chloride, benzoyl m-chloride and benzenesulfonyl chloride, oxalyl chloride, adipyl chloride, sebacyl chloride and carbonyl chloride, by way of non-limiting example. Also inorganic acids such as perchloric acid and strong organic acids such as trifluoromethanesulfonic acid and trifluoroacetic acid may be employed.
Chloroformates may also be employed such as methyl chloroformate, ethyl chloroformate, isopropyl chloroformate, n-butyl chloroformate, isopropyl chloroformate, n-butyl chloroformate, sec-butyl chloroformate and diethylene glycol bis chloroformate.
A method for preparing of uretonimine modified methylene bis(phenylisocyanate) for blended compositions will now be described using two different catalysts.
Uretonimine Modified Isocyanate A
One thousand parts of a mixture of 98% 4,4- and 2.0% 2,4- isomers of methylene bis(phenylisocyanate) and 10 parts of triethyl phosphate are heated rapidly to 220xc2x0 C. and maintained at that temperature for 2.5 to 3 hrs. The reaction contents are then rapidly cooled to 25xc2x0 C. The product thus made displays an NCO content of 29.3% by weight and a viscosity of 40 cps at 25xc2x0 C. The same procedure may be repeated to make compositions using methylene bis(phenylisocyanate) compositions having up to 55% 2,4xe2x80x2-isomer.
Uretonimine Modified Isocyanate B
One thousand parts of a mixture of 98% 4,4xe2x80x2- and 2.0% 2,4xe2x80x2- isomers of methylene bis(phenylisocyanate) are admixed with 0.004 parts of 3-methyl-1-phenyl-2-phospholene-1-oxide and rapidly heated to 105xc2x0 C. and maintained at that temperature for 3-4 hrs. The reaction contents are then cooled to 70xc2x0 C. and 0.04 parts of trifluromethane sulfonic acid is added to deactivate the catalyst. When the product is cooled to 25xc2x0 C., it displays an NCO content of 29.3% by weight and a viscosity of 40 cps at 25xc2x0 C. The same procedure may be repeated to make compositions using methylene bis(phenylisocyanate) compositions having up to 55% 2,4xe2x80x2-MDI isomer.
In addition to the foregoing uretonimine modified isocyanate compositions, certain similar commercially available uretonimine products such as MONDUR(copyright) CD available from Bayer Corporation, ISONATE(copyright) 143L and 143LM available from Dow Chemical Company, RUBINATE(copyright) LF 168 available from ICI Limited and LUPRINATE(copyright) MM103, available from BASF Corporation can be employed.
Experiments are conducted to monitor the formation of uretdione over time at various temperatures to determine rates of formation, product lifetimes and uretdione saturation concentrations of the methylene bis(phenylisocyanate) compositions of the present invention. As such, samples of essentially pure MDI, i.e., 98.0% 4,4xe2x80x2-MDI (the remainder being predominantly 2,4xe2x80x2-MDI isomers and other isomers), are admixed with various amounts of uretonimine optionally with a catalyst as described in greater detail below.

Storage stable methylene bis(phenylisocyanate) compositions


A micro-light emitting diode (LED) display panel and a method of forming the display panel, the micro-LED display panel having a monolithically grown micro-structure including a first color micro-LED that is a first color nanowire LED, and a second color micro-LED that is a second color nanowire LED.

Displays having microscopic light-emitting diodes (LEDs) are known as micro-LED, mLED, and pLED. As the name implies, micro-LED displays have arrays of micro-LEDs forming the individual pixel elements.
A pixel may be a minute area of illumination on a display screen, one of many from which an image is composed. In other words, pixels may be small discrete elements that together constitute an image as on a display. These primarily square or rectangular-shaped units may be the smallest item of information in an image. Pixels are normally arranged in a 2-dimensional grid, and are represented using dots, squares, or rectangles. Pixels may be the basic building blocks of a display or digital image and with geometric coordinates.
The same numbers are used throughout the disclosure and the figures to reference like components and features. Numbers in the 100 series refer to features originally found in FIG. 1; numbers in the 200 series refer to features originally found in FIG. 2; and so on.

This patent is subject to a terminal disclaimer.


Apparatus and methods for measuring infrared absorption of a sample that includes delivering a pulse of infrared radiation to a region of the sample, delivering pulses of radiation of a shorter wavelength than infrared radiation to a sub-region within the region, and using one or more properties of the induced photoacoustic signals to create a signal indicative of infrared absorption of the sub-region of the sample.

Photoacoustic imaging is based on the photoacoustic effect where pulsed or modulated radiation is delivered to a sample and some of the delivered energy is absorbed and converted into heat, leading to transient thermoelastic expansion generating ultrasonic emissions. The ultrasonic emissions can be detected by an ultrasonic transducer device and analyzed to produce photoacoustic images. A photoacoustic image depends on the optical absorption properties of the sample being imaged. As a consequence, it offers greater molecular specificity than conventional ultrasound imaging with the ability to detect hemoglobin, lipids, water and other light-absorbing chromophores, but with greater penetration depth than pure optical imaging modalities that rely on ballistic photons. These attributes lend photoacoustic imaging to a wide variety of applications in clinical medicine, preclinical research and basic biology for studying cancer, cardiovascular disease, abnormalities of the microcirculation and other conditions.

Enhanced-resolution infrared photoacoustic microscopy and spectroscopy


An ultrasonic transducer is disclosed for emitting an ultrasonic wave radially inward. The transducer is constructed with a strip of piezoelectric material laminated with a pair of electrically conductive metal layers that are conductively isolated from one another. In a preferred embodiment, the strip of piezoelectric material is formed in a cylindrical shape and with continuous sinusoidal ripples along the circumference. The sinusoidal ripples are designed to emit a specific wave length of a desired frequency. The radius of the sinusoidal wave is based on material characteristics and the desired resonance frequency. The invention discloses various methods and apparatus for constructing and maintaining the transducer sinusoidal shape. One method includes attachment of a pair of rigid end caps on the laminated piezoelectric material, and another discloses weaving the laminated piezoelectric material through a nonconductive mesh cage, and yet another includes adhesively attaching the transducer to a housing. The invention also includes an application of the above described transducers in a gas analyzer having an internal chamber in which the transducer is arranged. The method of analyzing gas includes passing the gas through the internal chamber and across the surface of the transducer, energizing the transducer to emit an ultrasonic wave into the passing gas toward the center of the transducer. The ultrasonic wave is reflected from a pressure center and sensed by the same transducer that emitted the wave. The invention also includes a method of manufacturing the transducer with sinusoidal ripples to accomplish an emission of desired frequency.

The present invention relates generally to ultrasonic transducers, and more particularly to a cylindrical or circular ultrasonic transducer designed to emit ultrasonic sound waves radially inward and to sense reflected ultrasonic waves from a pressure center at or near the center of the ultrasonic transducer. One particular application for the transducer of the present invention is in a gas analyzer that would be particularly useful in the medical field. A method of analyzing gas and a method of manufacturing the ultrasonic transducer are also disclosed.
Acoustical monitoring of gas can employ ultrasound having a frequency ranging from a few kHz to 10 MHZ. Acoustical techniques have been extensively used for gas flow monitoring. Most recently, efforts have turned to developing acoustical cells and processes which can determine the concentration of a component of a binary gas mixture. In general, acoustical concentration analysis of a gas mixture is performed by measuring the speed with which sound waves propagate through a gas mixture. Because the speed at which the sound waves travel through a gas is related to molecular weight, the concentration of a component of a gas mixture can be accurately determined.
Ultrasonic transducers that transmit and receive ultrasonic sound waves are common in the prior art, and have been commonly used in gas analyzers and gas flow meters. Typically, either two transducers are placed within a tube, or cylinder housing, one at each end, or a single transducer is placed at one end and an acoustical reflector at the other. For example, just a few include U.S. Pat. Nos. 5,452,621, 5,285,677, 4,938,066, 4,280,183, and 2,874,564, all of which either use multiple transducers, one for a transmitter and one for a receiver, or a single transducer and at least one separate reflector. This basic arrangement generally results in a low signal to noise ratio (i.e. high noise), an undesirable high detraction of emitted waves, and high structure reverberation. Much of the cited prior art attempts to correct these physical flaws of the transducers and the transducer arrangement through the use of sophisticated controls and processors.
It would therefore be desirable to eliminate these physical problems up-front at the source rather than at the back end with error correction controls.
Other types of methods and apparatus have been used as well for determining the concentration of a gas within a particular specimen, such as the concentration of oxygen as used in medical applications. For example, the concentration of oxygen has been detected by passing a gas over a fuel cell terminal that analyzes the gas being measured by generating a signal as a result of exposure of the gas to the cell terminal. Another, tests the consumption of oxygen in a test specimen and extrapolates that percentage to the overall gas sample. Another uses expendable chemical cells. Many others exist, but are generally unacceptable because they either interfere with the flow of the gas to be analyzed, have finite life due to cell consumption, require constant calibration, or are cost prohibitive.
Therefore, it would also be desirable to have an inwardly directed wave mode ultrasonic transducer, gas analyzer, and method of use and manufacture that solves all the aforementioned problems and could provide a high signal to noise ratio, has a wide emission surface area of for low defraction, and is relatively inexpensive to manufacture.

Inwardly directed wave mode ultrasonic transducer, gas analyzer, and method of use and manufacture


A motorcycle towing apparatus including a securing portion (42) for securing the front wheel (43) of a motorcycle (41) to the tow bar (50) of a towing vehicle. A link (44) fastens the wheel (43) to the securing device (42). The securing means (42) can pivot relative to a tow bar (50) in a substantially horizontal plane. Rigid member (52) is pivotally connected (53) to securing portion (42). The distal end of rigid member (52) is pivotally connected to motorcycle (41) via arms (61,62) and links (67,68). The arrangement maintains the front wheel (43) of the motorcycle (41) in fixed relationship to the motorcycle (41) whilst allowing rotation in the horizontal plane about a coupler (48).

To the present time devices for towing motorcycles and the like behind a vehicle have been complex and/or expensive and/or inconvenient. Typically, it has been necessary to secure the motorcycle to a trailer specifically adapted to carry a motorcycle.
It has been proposed to tow a motorcycle behind a vehicle by securing a front wheel of a motorcycle to a tow bar so that the wheel is fixed relative to the vehicle. The steering head of the motorcycle is allowed to rotate so that the motorcycle tilts as the vehicle turns. This arrangement has the disadvantage during backing or a tight turn that the motorcycle may tip over if the steering head is allowed to rotate too far.
Further, many prior arrangements have the disadvantage that they are bulky and cannot be easily and conveniently transported.


The invention relates to an apparatus to produce coated paper, cardboard or other fibrous webs with at least one thermo-sensitive layer as a functional layer through the application of at least one liquid or paste-like thermo-sensitive coating medium onto a carrier web by way of a unit which forms a functional layer, the units each include at least one applicator device and one drying section following the applicator device. The two units are capable of being installed in series and each form at least one functional layer on the carrier web, whereby in the merging area between the two functional layer forming units a web turning device is located, creating a first web path and a device to bypass the web turning device, thus creating a second web path for the carrier web between the two functional layer forming units. The invention further relates to a method to operate an apparatus of this type.

1. Field of the Invention
The invention relates to an apparatus to produce coated paper, cardboard or other fibrous webs with at least one thermo-sensitive layer as a functional layer through the application of at least one liquid or paste-like thermo-sensitive coating medium onto a carrier web by way of a unit which forms a functional layer. The invention also relates to a method to operate an apparatus to produce coated paper, cardboard or other fibrous webs with at least one thermo-sensitive layer. The invention is also suitable for other webs that are suitable for recording mediums, such as films or textile substrates which are to be given a thermo-sensitive layer on one or both sides.
2. Description of the Related Art
A thermal sensitive or thermo-sensitive layer is to be understood to be a coating layer which, under the effect of heat, especially through contact with a heatable printing head, is suitable to provide an image of visually recognizable information by way of a color change. This may involve at least one color generator, one color developer and a fixing agent. Apparatuses to produce coated paper, cardboard or other fibrous webs with at least one thermo-sensitive layer in the form of thermo papers through the application of a liquid or paste-like thermo-sensitive coating medium onto a carrier web by way of a curtain coater are already known for example from                La papeterie 275, April-May 2006, pages 6-14 and        Revue de Papier Carton #85, February-March 2006, pages 34-37
Here, a dryer section is located after the applicator device which is in the embodiment of a curtain coater. In order to avoid curling, water is applied to the backside to improve laying flat. With this type of basic configuration a single thermo-sensitive layer can be applied. Further developments in the area of thermo papers and the expansion of the scope of application have led to the development of high quality thermo papers. These are coated either on both sides with one thermo-sensitive coating or feature a cover layer as a protective layer over the thermo-sensitive layer. In order to achieve these additional functional layers, units which form functional layers are to be provided in accordance with the number of individual layers. These units comprise applicator devices with coating medium supply systems allocated to them, followed by a drying section in order to ensure the required dry content. Such devices are however characterized by a considerable space requirement and, because of the multitude of functional layer forming units, are cost intensive. However, depending upon the type of coated fibrous web that is to be produced, individual applicator devices and the following drying sections are not required, so that over capacities exist over large parts of the entire operational area and the apparatus is not utilized to its optimum.
What is needed in the art is an apparatus to produce coated paper, cardboard or other fibrous webs, especially in the form of thermo papers, so that the disadvantages existing in the current state of the art are avoided. The apparatus should be characterized by a simple construction with few components and should be capable of coating one carrier web several times on one side, especially twice, or capable of coating it on both sides with at least one coating. Change-over to run the different types of coated paper, cardboard or other fibrous webs is to be simple and involve few control changes and should be possible in a timely manner, without conversion measures to meet current demands.

Apparatus to produce coated paper, cardboard or other fibrous webs with at least one thermo-sensitive layer and a method to operate an apparatus of this type


The invention uses a garnish of tufts of filaments or strips attached to camouflage material, particularly camouflage material for use on mobile equipment, vehicles and personnel. The garnish or tuft is formed from a sheet of flexible, low emissivity material that has been cut into filaments or strips adhesively attached along one uncut longitudinal strip edge portion of the sheet. The tuft is formed by rolling the strip edge portion longitudinally around one part of a tuft retaining anchor, to form a rolled, adhesive-bound segment attached to the tuft part. When the rolled strips or filaments are so bound about the tuft retaining anchor part, a tuft is formed therefrom. When all the tuft retaining anchor parts are assembled, the tuft retaining anchor and tuft together constitute the garnish. A plurality of garnishes is attached to a base camouflage material on, e.g., mobile equipment, vehicles and personnel. The garnishes are preferably removably attached, to enable the color and other properties of the tuft to be varied in accordance with the surroundings in which the camouflage is to be effected. The tuft effectively absorbs and then dissipates heat by inducing air currents around the camouflaged object. The heat absorbed and dissipated otherwise would have been absorbed either by the base camouflage material or the device sought to be camouflaged, with a concomitant increase in the infrared signature of that device. This absorption and dissipation of heat is particularly effective when conditions of bright sunshine and calm or still conditions exist, especially in the early morning hours.

1. Field of the Invention
The field of the invention relates to camouflage materials, and more particularly to a new and improved camouflage material featuring a garnish for use with a base camouflage material, the combination providing camouflage with a low temperature rise even when exposed to bright sunlight under still conditions. The invention features a low thermal signature, particularly at wavelengths detected by infrared detectors designed to reveal camouflaged vehicles, equipment and personnel.
2. Description of the Prior Art
The use of camouflage materials to camouflage and thereby protect from detection vehicles and equipment is known in the prior art. However, the known camouflage materials suffer from various drawbacks and disadvantages. The known camouflage materials suffer variously from practicality, durability or temperature/infrared signature problems. Currently used systems generally either are durable but have a high temperature/infrared signature, or consist of a material such as a net suspended by standoffs over the vehicle or equipment, which has durability problems when used on a mobile vehicle. Other systems, such as that shown in U.S. Pat. No. 4,495,239, are for use in conjunction with other camouflaging materials and equipment, which increases the complexity and therefore decreases the practicality of use.
U.S. Pat. No. 4,106,124 discloses a combat helmet cover comprising a colored elastic or power net material with flexible grasslike strips which function as silhouette disrupter elements. The strips extend from a base which is sewn to a helmet cover. The dimensions of the strips vary irregularly, with the length of each strip being randomly selected. This helmet cover is not practical for use with large vehicles or equipment, and is only disclosed to have silhouette disrupter characteristics.
U.S. Pat. No. 5,281,460 discloses a camouflage covering including an underlying layer of lightweight porous material with a multiplicity of special fabric strips attached. The strips act as infrared signature and shape disrupters. The strips are said to be cooled by convection of the surrounding ambient air as a result of the ability of the strips to bunch, intertwine and fold. This camouflage covering suffers from the drawback that it comprises a lightweight porous material which would snag on bushes or other protruding objects.
U.S. Pat. No. 5,347,659 discloses a camouflage garment arranged to enclose an individual. The garment has a base web and a multitude of loop members formed of a camouflage material chosen to minimize reflection of light relative to the garment structure. This garment suffers from the drawback that both its loop members and the underlying web material would snag on bushes or other protruding objects.

Low thermal signature camouflage garnish