A stage apparatus comprising a support device for supporting a table at its center of gravity and a drive device for driving the table at positions apart from the center of gravity of the table without contacting with the table. The stage apparatus effectively reduces stresses created in the table and/or any thermal deformation of the table. The table is connected to three pairs of table support bars on the stage through three respective plate springs so as to minimize any harmful deformation of the table, which could otherwise occur when the table is driven for motion or displacement in the Z-direction or for adjustment of the tilt of the table. The stage apparatus includes three drive units with respective drive pins for driving the stage. For example, when the three drive pins are driven simultaneously by the associated drive units, the table is caused thereby to translate along the Z-axis. The drive pins are so arranged as to provide support for the table at support points just under respective securing points on the table at which the table is secured to the plate springs and to provide a drive for the, table in the Z-direction at the support points. Thus, when driven by the drive pins, the table is only subject to compression forces acting thereon in the Z-direction and not to any moment.

The present invention relates to a stage apparatus for movably mounting a table on a stage, and in particular, to a support mechanism for supporting the table mounted on the stage. More particularly, the present invention relates to a stage apparatus suitable for use in an exposure apparatus, for mounting thereon a photosensitized substrate onto which a pattern formed on a reticle is transferred by exposure through a projection lens.
In a typical stage apparatus for use in an exposure apparatus and the like, a table is movably mounted on a stage at three points which do not lie on a straight line but define a triangle within which the center of gravity of the table lies. Further, the table is driven at these three points in order to provide vertical displacement and/or tilting of the table relative to the stage. The manner in which the table is movably mounted on the stage falls into two general categories: first, direct-contact actuators are used so as to support and drive the table through the direct contacts of the actuators with the table; second, noncontact actuators such as voice coil motors (VCMs) are used for the support and drive purposes.
Unfortunately, in the case where direct-contact actuators are used, stresses may be created within the table by frictional forces occurring at the contact points between the table and actuators. On the other hand, in the case where noncontact actuators such as VCMs are used, the actuators have to be continuously energized to produce vertical thrust forces for bearing the weight of the table, with the result that a considerable amount of heat is generated by the actuators and may affect the table to thereby cause harmful deformation of the table.
As one support structure usable for mounting a stage (or a table), there is used a so-called kinematic structure. Briefly, with the kinematic structure, the stage is supported by the combination of a point, a V-groove and a flat surface. This kinematic structure may be called an ideal support structure because no harmful stress is created within the stage when it is driven for vertical displacements and tilting. Nevertheless, the kinematic structure has a disadvantage in its ability to accommodate the horizontal motion of the stage and is not suitable for use in a case where the support members for the stage themselves are subject to rapid horizontal motion. For this reason, the kinematic structure has not been used for a stage apparatus used in an exposure apparatus.
FIG. 12 shows a schematic exploded perspective view of a typical stage apparatus for use in an exposure apparatus. As shown in FIG. 12, a base or surface plate 600 carries thereon a Y-stage 620 which is driven in the longitudinal direction of the surface plate 600 (or in the Y-direction) by a drive motor 630. The Y-stage 620 in turn carries thereon an X-stage 621 which is driven in the direction perpendicular to the Y-direction (or in the X-direction) by a second drive motor 631. Further, the X-stage 621 carries thereon three table support bars 640, 641 and 642 and three drive pins 720, 721 and 722 such that the table support pins and the drive pins are disposed alternately along a circle at regular angular intervals of 60 degrees. Accordingly, the three table support bars 640, 641 and 642 are disposed on three corner points of a regular triangle, respectively, while the three drive pins 720, 721 and 722 are disposed on the three corner points of another regular triangle, respectively.
A table 660 has three circular holes 670, 671 and 672 formed therein at positions corresponding to the distal (or upper) ends of the three table support bars 640, 641 and 642, respectively. The circular holes 670, 671 and 672 have a diameter slightly greater than that of the table support bars. When the table 660 is attached to the X-stage 621, the distal ends of the table support bars 640, 641 and 642 are inserted into the circular holes 670, 671 and 672, respectively, and then the table support bars 640, 641 and 642 and the table 660 are connected with each other by a ring-shaped plate spring 680 called a "flexure". More specifically, as shown in FIG. 13, the ring-shaped plate spring 680 is secured to the table support bars 640, 641 and 642 by three set screws 701, 703, 705 and to the table 660 by additional three set screws 700, 702 and 704. Thus, six set screws 700-705 in total are used for connecting them with each other. With this arrangement, the plate spring 680 tends to make the top surface of the table 660 coincident with the plane defined by the top (or upper end) surfaces of the table support bars 640, 641 and 642. In this manner, the table 660 is supported on the X-stage 621 by the plate spring 680.
With the table 660 having been thus connected to the X-stage 621, the drive pins 720, 721 and 722 are just under respective screw holes 700a, 701a and 702a formed in the table 660, as shown in FIG. 12. The drive pins 720, 721 and 722 are independently driven by respective drive units 740, 741 and 742 in the direction perpendicular to an XY-plane (or in the Z-direction), so that the table 660 is driven by the three drive pins 720, 721 and 722 at three different support points, such that the position in the Z-direction of the table 660 relative to the X-stage 621 and the tilt angles of the table 660 with respect to an XY-plane may be set to any desired position and angles within limited ranges. The plate spring 680 used here is highly rigid against any horizontal displacement of the table 660 while a low rigidity against any vertical displacement of the table 660 in order to achieve a rapid settling time when a horizontal displacement of the X-stage 621 and/or the Y-stage 620 is made for positioning the table 660.
In general, the flexure (or plate spring), mounted on the stage apparatus as described above and forming a part of an exposure apparatus, has to have rigidities meeting the following two conditions a) and b).
a) The rigidity of the flexure in the Z-direction, Kz, should be set to as small value as possible in the range that suffices the formula below for any possible displacement within the stroke of the table for the focusing and/or levelling operation: EQU M*g>Kz*z
where:
M stands for the mass of the table including any parts mounted on the table; PA1 g stands for the acceleration of gravity; and PA1 z stands for the displacement of the point at which the table is driven.
b) The rigidities of the flexure in the X- and Y-directions and that in the Z.theta.-direction (which is the rotational direction about the Z-axis) are selected depending on the control characteristics of the stage, such that these rigidities should be enough to provide satisfactory settling time and control response.
The typical stage apparatus for an exposure apparatus described above uses the ring-shaped plate spring because it meets these two conditions a) and b). However, the use of the ring-shaped plate spring suffers from the following problems.
Since securing points between the table and the plate spring (flexure), and the other securing points between the table and the stage are disposed on the same circle, respectively; the plate spring tends to be deformed due to the force acting thereon in a Z-direction from the table support bars during a focusing and/or levelling operation. However, because the plate spring is highly rigid in the horizontal direction, it resists being stretched so that tensile stress occurs within the plate spring. While, the table, as shown in FIG. 13, is subjected to forces which act in the direction from a securing point between the table and plate spring to the neighboring securing point between the table and stage (these forces are represented by solid line arrows in FIG. 13). Each of the securing points on the table is subjected to two forces, respectively, tangential components of which are balanced each other, and radial components of which serves as a moment tending to deform the table (these radial components of the forces are represented by dotted line arrows in FIG. 13). As a result, the table is subjected to minute deformation (which may be coneshaped deformation, for example).
This deformation leads to the changes in distance between each of the movable mirrors 760 and 761 mounted on the stage 660 and the photosensitized substrate W held on the table 660, resulting in errors in the measured values produced by respective interferometer units 800 and 801 serving to measure the positions of the movable mirrors 760 and 761. Further, the errors cause offsets between the estimated position for a pattern printing on the substrate W as estimated from the measured positions of the X-stage 621 and the Y-stage and the actual position for the pattern printing, these offsets may affect the accuracy in alignment between the reticle (not shown) and the photosensitized substrate W as well as the accuracy in positioning the exposure shot areas on the photosensitized substrate. The deformation of the table caused according to this mechanism is typically in the order of a few nanometers, which is enough to be a problem in recent exposure apparatus.
The forces tending to cause a minute deformation of the table such as described above may be created by inertial forces acting on the table due to acceleration/deceleration of the stage, or by the deformation of the plate spring which may occur, as a result of a focusing and/or levelling operation as described above. The former factor, the inertial forces, do not occur during the exposure operation following the completion of the positioning of the stage and thus do not directly lead to any deterioration in registration, while the latter factor, the deformation of the plate spring, may occur at any time, and further, may vary depending on the displacement of the table required for the focusing and/or levelling operation, so that it is highly probable that any deformation of the plate spring causes some deterioration in registration.

Stage apparatus and exposure apparatus having the same


A multi-site pulse generator for the treatment of cardiac insufficiencies by stimulation. In such a multi-site cardiac pulse generator, electrodes are placed in a plurality of distinct respective sites, including at least two ventricular sites. The electrodes are connected to independent outputs of the pulse generator in a manner that allows the detection of a potential of depolarization as well as the application of a stimulation pulse. A sensor of contraction of at least one of the ventricles is provided, to detect an instant of beginning of valvular opening, and a research system that determines an optimal electrode configuration operates to commute successively and automatically the different ventricular electrodes according to the various possible connection configurations, and to detect a depolarization or stimulation event on the electrode in the corresponding configuration; to determine a time interval separating, for each given configuration, the depolarization or stimulation event and the instant of beginning of the valvular opening, and to select therefrom the configuration obtaining the shortest time interval. The pulse generator also is able to apply a stimulation on the electrode in the selected optimal configuration, and automatically checks the configuration from time to time to maintain the optimal configuration from among the various configurations. The pulse generator may be included in a pacemaker, cardioverter or defibrillator, and may include single, double, triple or quadruple chamber modes.

In connection with the treatment of the cardiac rhythm disorder, different authors (Hochleitner, Bekker, Cazeau) have proposed to treat with the help of stimulation myocardial contraction disturbances observed in patients with cardiac insufficiency, which disturbances are spontaneous or induced by a traditional stimulation.
Indeed, one has observed that patients presenting class NYHA 3 and 4 disturbances could see their condition improved by an appropriate stimulation. It has been particularly proposed, in a first experience, to use a conventional double-chamber pacemaker by programming a short atrio-ventricular delay ("AVD"). In more recent studies, it has been proposed to stimulate right and left cavities in a triple chamber or quadruple chamber mode.
But, in all cases, no criterion of implantation has ever been clearly defined (except the criterion of a cardiac insufficiency). Nor has there been an explanation of the mechanisms implied in the correction of those cardiac disturbances. The programming of the different stimulation parameters is, therefore, in the current knowledge state, individualized for each patient and by each therapist.

Multi-site cardiac stimulator for the treatment of cardiac insufficiency by stimulation


The present invention discloses a novel process and novel intermediates for the Preparation of 4-[2-(di-n-propyl amino) ethyl]-1,3-dihydro-2H-indol-2-one, commonly known as Ropinirole (I) and pharmaceutical composition comprising the same. Further the present invention also discloses a method of treatment for cardiovascular disorders and Parkinson's disease.

Ropinirole is described in U.S. Pat. No. 4,452,808 as being useful in cardiovascular therapy and in U.S. Pat. No. 4,824,860 as an agent useful in treating Parkinson's disease. The processes for the preparation of Ropinirole HC 1 and its derivatives have previously been described. U.S. Pat. No. 4,452,808 describes the preparation of 4-aminoalkyl-2(3H)-indolones staring from either 4-aminoalkyl-7-hydroxy-2(3H)-indolones or 2-methyl-3-nitro-benzene acetic acid by two different processes. Particularly those processes involving reductive cyclization of nitrostyrene intermediates in presence of acetyl chloride and Iron (III) chloride described in EP 0300614 and WO 91/16306 are of particular relevance. Present invention discloses a novel route and novel intermediates for the preparation of Ropinirole. Present invention comprises of 6 steps leading to desired moiety.
U.S. patents namely U.S. Pat. No. 4,452,808, U.S. Pat. No. 5,336,781, U.S. Pat. No. 4,997,954, U.S. Pat. No. 4,314,944 molecule called Ropinirole. For the present purpose U.S. Pat. No. 4,452,808 and U.S. Pat. No. 4,314,944 are more relevant. Few patents deal with Ropinirole mainly from method of treatment point of view and therefore are not directly related to the present invention.
WO 91/16306 and EP 0300614 are relevant from the point of view of reductive cyclization and are dealt at appropriate place hereafter.
The processes for the preparation of Ropinirole HCl and its derivatives have previously been described. U.S. Pat. No. 4,452,808 describes the preparation of 4-aminoalkyl-2(3H)-indolones starting from either 4-aminoalkyl-7-hydroxy-2(3H)-indolones or 2-methyl-3-nitro-benzene acetic acid by two different processes. The 7-hydroxy intermediate (i) is first converted to its tetrazolo derivative (ii) which is then hydrogenated to get Ropinirole as shown in Scheme 1. Preparation of 7-hydroxy intermediate (i) is described in U.S. Pat. No. 4,314,944 by following a series of steps starting from p-methoxy phenethylamine. Second process described in U.S. Pat. No. 4,452,808 allows preparation of Ropinirole by following a series of steps starting from 2-methyl-3-nitro benzeneacetic acid.

Particularly those processes involving reductive cyclization of nitro styrene intermediates in presence of acetyl chloride and Iron (III) chloride described in EP 0300614 and WO 91/16306, are of relevance, as far as this invention is concerned.
Scheme 2 depicts the route disclosed in EP0300614. EP0300614 describes the preparation of Ropinirole by condensation of 4-[2-(bromoethyl)-1,3-dihydro-2H-indol-2-one (iii) with di-n-propyl amine (iv). The intermediate (iii) is prepared by following a series of steps starting from 2-(2-bromoethyl)benzaldehyde. Major drawback is a possible formation of an elimination product due to loss of HBr as shown in Scheme 2. Such reaction can impact the purity of desired product and can influence the yield aspects.
Elimination Product
The process as described in WO 91/16306 is an improved process for the preparation of Ropinirole comprising of number of steps, total of eight starting from Isochroman, to get the final product Ropinirole. It discloses the route wherein condensation of di-n-propylamine with a novel intermediate of formula (v) is carried out. Intermediate (v) is prepared by series of steps starting from Isochroman. The process involves well over 7 steps and therefore is a longer one.

Process for the preparation of 4-(2-dipropylaminoethyl)-1,3-dihydro-2H-indol-2-one hydrochloride


An object of the invention is to provide a scintillator panel which exhibits excellent cuttability and can be cut without the occurrence of problems such as the separation of a scintillator layer and which can give radiographic images such as X-ray images with excellent sensitivity and sharpness. The scintillator panel of the invention includes a reflective layer and a scintillator layer formed by deposition on a support, and the reflective layer includes light-scattering particles and a specific binder resin and has a specific thickness.

1. Field of the Invention
The present invention relates to deposition substrates and to scintillator panels used in the formation of radiographic images of subjects.
2. Description of the Related Art
Radiographic images such as X-ray images have been widely used in medical diagnosis of disease conditions. In particular, radiographic images based on intensifying screen-film combinations have undergone enhancements in terms of sensitivity and image quality during a long history and consequently remain in use in the medical field worldwide as the imaging system with high reliability and excellent cost performance. However, this image information is analogue and thus cannot be processed freely or transmitted instantaneously in contrast to digital image information which has been developed currently.
Recently, digital radiographic image detectors such as computed radiography (CR) systems and flat panel detectors (FPDs) have come in use. These radiographic image detectors directly give digital radiographic images and allow the images to be directly displayed on displays such as cathode ray tube panels and liquid crystal panels. Thus, there is no need for the images to be created on photographic films. Consequently, the digital X-ray image detectors have decreased a need for the image formation by silver halide photography and have significantly enhanced diagnostic convenience at hospitals and clinics.
The computed radiography (CR) is one of the digital X-ray image techniques currently used in medical practice. However, CR X-ray images are less sharp and are insufficient in spatial resolution as compared to screen film system images such as by silver halide photography, and the level of their image quality compares unfavorably to the quality level of screen film system images. Thus, new digital X-ray image techniques, for example, flat panel detectors (FPDs) involving a thin film transistor (TFT) have been developed (see, for example, Non Patent Literatures 1 and 2).
In principle, a FPD converts X-rays into visible light. For this purpose, a scintillator panel is used which has a scintillator layer made of an X-ray phosphor that, when illuminated with X-rays, convert the radiations into visible light that is emitted. In X-ray photography using a low-dose X-ray source, it is necessary to use a scintillator panel with high luminous efficiency (X-ray to visible light conversion) in order to enhance the ratio (the SN ratio) of signal to noise detected from the scintillator panel. In general, the luminous efficiency of scintillator panels is determined by the thickness of the scintillator layer (the phosphor layer) and the X-ray absorption coefficient of the phosphor. The light produced in the phosphor layer upon illumination with X-rays is scattered more markedly in the scintillator layer with increasing thickness of the phosphor layer, and consequently the sharpness of X-ray images obtained via the scintillator panel is lowered. Thus, setting of the sharpness required for the quality of X-ray images automatically determines the critical thickness of the phosphor layer in the scintillator panel.
On the other hand, some kinds of phosphors permit the critical thickness of phosphor layers in scintillator panels to be increased. Cesium iodide (CsI) is a phosphor that has a relatively high X-rays to visible light conversion ratio and is easily deposited to form a columnar phosphor crystal layer which can suppress the scattering of light in the phosphor crystals (namely, in the scintillator layer) by light guide effects. Thus, the thickness of the phosphor layer can be increased corresponding to the amount of suppressed scattering.
Because the luminous efficiency obtained with CsI alone is low, however, an approach to increasing the visible light conversion efficiency of the scintillator layers is generally adopted. For example, (1) CsI crystals and a sodium compound activator, (2) CsI crystals and a thallium compound activator, or (3) CsI crystals and an indium compound activator are deposited onto substrates to form scintillator layers, and the scintillator layers are annealed in the subsequent step.
Other approaches which have been proposed to increase the optical output of scintillator panels include a method in which scintillator layers are formed on reflective substrates (see, for example, Patent Literature 1), a method in which reflective layers are provided on substrates by depositing metal films (see, for example, Patent Literature 2), and a method in which reflective thin metal films are provided on substrates and coated with transparent organic films, and scintillator layers are formed on the transparent organic films (see, for example, Patent Literature 3). Although scintillator panels obtained by these methods achieve an increase in optical output, the light produced in the scintillator layer is scattered at the interface between the reflective layer and the scintillator layer, with the result that the X-ray image data obtained via the scintillator panels are disturbed and the sharpness of the obtainable X-ray images is markedly deteriorated.
Meanwhile, methods are proposed in which X-ray image detectors are manufactured by arranging scintillator panels on the surface of planar light-receiving elements (see, for example, Patent Literatures 4 and 5). However, the productivity of such detectors is low because of the need that the scintillator panels have to be produced in different sizes in accordance with various sizes of the planar light-receiving elements. Further, such an approach does not solve the aforementioned problem that the sharpness of X-ray images is deteriorated by the scattering of light at the interface between the reflective layer and the scintillator layer.
In the conventional production of scintillator panels by a gas-phase method, it is a general practice to form a scintillator layer on a rigid substrate made of such a material as aluminum or amorphous carbon, and cover the entire surface of the scintillator with a protective film (see, for example, Patent Literature 6). However, such scintillator panels having a scintillator layer on an inflexible and rigid substrate cause a difficulty in obtaining a uniform contact between the scintillator panel and a planar light-receiving element when they are bonded to each other. In detail, such a scintillator panel has irregularities ascribed to the unevenness of the substrate itself as well as to different heights of the columnar phosphor crystals in the scintillator layer, and the inflexible substrate significantly reflects the influence of such irregularities (a flexible substrate may cancel the irregularities by deformation) to make it difficult for the scintillator panel to be tightly and uniformly attached to a planar light-receiving element. To solve this problem, methods are proposed in which a spacer is used at the plane of contact between the scintillator panel and a planar light-receiving element (see, for example, Patent Literatures 4 and 5). However, this approach, which prioritizes the solution of problematic attachment between the scintillator panel and a planar light-receiving element over productivity, has a problem in that because the scintillator panel and the planar light-receiving element are spaced apart by a gap, the light produced in the scintillator layer of the scintillator panel is scattered in the gap to inevitably deteriorate the sharpness of the obtainable X-ray images. This problem has become more serious with the recent enlargement of flat panel detectors.
In order to solve the problems of loose attachment between scintillator panels and planar light-receiving elements as well as the problems associated with the use of spacers, methods have been generally adopted in which a scintillator layer is directly formed on an imaging element by deposition or in which a less sharp but flexible material such as a medical intensifying screen is used instead of a scintillator panel. Further, a method has been adopted in which a flexible protective layer made of such a material as a polyparaxylylene is used to protect layers such as scintillator layers in scintillator panels (see, for example, Patent Literature 7).
However, the substrates used in the above method are rigid materials such as aluminum and amorphous carbon. Even if the protective layer is formed with a thickness of about 10 μm on the scintillator layer or the substrate, the surface of the protective layer will show irregularities ascribed to the unevenness of the substrate itself as well as to different heights of the columnar phosphor crystals in the scintillator layer. Thus, even the adoption of such protective layers with the above thickness does not eliminate the influences of the irregularities on the substrates or the scintillator layers, and it remains difficult to achieve a uniform and close contact between the surface of the scintillator panel and the surface of a planar light-receiving element. On the other hand, increasing the thickness of the flexible protective layer increases the gap between the scintillator panel and a planar light-receiving element, resulting in a deterioration of the sharpness of the obtainable X-ray images.
Under such circumstances, there has been a demand for the development of radiographic flat panel detectors that have excellent luminous efficiency of scintillator panels and have small deteriorations in the sharpness of X-ray images due to factors such as the size of the gap between the scintillator panel and a planar light-receiving element.
Patent Literature 8 discloses a scintillator panel which includes a reflective layer on a substrate and a scintillator layer formed on the top by deposition, the reflective layer including a white pigment and a binder resin. Patent Literature 8 also discloses that because the reflective layer is formed of a white pigment and a binder resin, the scintillator panel exhibits high light-emitting efficiency and consequently sharp X-ray images are obtained. This scintillator panel can solve the aforementioned problem. That is, even when this scintillator panel is used in combination with a planar light-receiving element, the sharpness of X-ray images is negligibly decreased by factors such as the scattering of the emitted light at the interface between the scintillator panel and the planar light-receiving element.
However, the scintillator panels disclosed in Patent Literature 8 are still rife with possibilities for improvements such as in terms of the prevention of the separation of the scintillator layers during the cutting of the scintillator panels.

Deposition substrate and scintillator panel


An aircraft area having a textile display, aircraft passenger seat having a textile display, and aircraft including an aircraft area. An aircraft area includes an interior component, a textile display on the interior component and including at least one textile fiber capable of changing a color at at least one section of the textile fiber, and a controller operatively coupled to the textile display and configured to change color of the at least one section of the textile fiber, such that the textile display displays information. An aircraft passenger seat includes a back rest, seat pan, and textile display integrated into a seat cover covering the backrest and/or the seat pan. The textile display includes at least one textile fiber capable of changing a color at at least one section of the textile fiber. An aircraft may include one or more aircraft areas and/or one or more aircraft passenger seats.

In recent years developments have been made to provide display devices in passenger seats of an aircraft or similar mass transportation vehicle, so that passengers sitting in such passenger seats are able to derive information displayed on the display devices. For instance, in-flight entertainment systems include a personal display device installed on a back side of the passenger seat facing a passenger seat of a (rearwardly) adjacent seat row.
Furthermore, information displays or other placards are installed inside the passenger cabin, for example signs at a ceiling of the passenger cabin or a separating wall inside of the passenger cabin. Such signs and placards display particular text or symbols to indicate an exit, the occupancy of a lavatory, an obligation to fasten seatbelts, etc.
However, such display devices and placards require a certification of regulating authorities. For example, a certificate is required for display devices due to possible injuries to passengers (particularly in case of a crash). On the other hand, particular placards including safety information require a certificate for the chosen formulation, i.e. the displayed wording.

Aircraft area having a textile display, aircraft passenger seat having a textile display, and aircraft including an aircraft area


Disclosed is a grinding table apparatus for a liquid crystal display panel and a grinder using the adapt to various sizes of unit liquid crystal display panels for grinding edges of the corresponding liquid crystal display panel by adjusting a variable moving distance of the grinding tables instead of replacing the previous grinding table. The present invention includes at least two grinding tables displaced in a direction making the grinding tables get farther from or closer to each other to adapt to the size of the unit liquid crystal display panel to grind edges of the unit liquid crystal display panel.

1. Field of the Invention
The present invention relates to a grinding table apparatus for a liquid crystal display panel and a grinder apparatus using the same, and more particularly, to a grinding table apparatus for a liquid crystal display panel and a grinder apparatus using the same capable of adapting to various sizes of unit liquid crystal display panels for grinding edges of the unit liquid crystal display panels that result from cutting liquid crystal display panels fabricated on a large-sized mother substrate into the unit liquid crystal display panels.
2. Discussion of the Related Art
Generally, a liquid crystal display (LCD) panel is cut into a plurality of unit LCD panels to improve yield. For simultaneously producing LCD panels, a plurality of thin film transistors and color filters are formed on two different mother substrates, respectively. Thereafter, the two mother substrates are attached to each other.
Conventionally, cutting of the unit LCD panel is performed through the process of forming a scribing line on the surface of the mother substrate with a wheel having a hardness higher than glass and then breaking the mother substrate along the scribing line. The process for fabricating an LCD apparatus will be described with reference to the accompanied drawings.
FIG. 1 is a schematic cross-sectional view illustrating a first mother substrate including thin film transistor array substrates and a second mother substrate including color filter substrates. The first and second mother substrates are attached to each other, thereby forming a plurality of unit LCD panels.
With reference to FIG. 1, the unit LCD panels are formed so that one side of thin film transistor array substrate 1 extends beyond color filter substrate 2. This is because a gate pad unit (not shown) and a data pad unit (not shown) are formed in the margin area of the thin film transistor array substrates 1 that do not overlap the color filter substrates 2.
Therefore, the color filter substrates 2 formed on the second mother substrate 30 are spaced apart to allow for a dummy region 31 corresponding to the region where the thin film transistor array substrates 1 extend on the first mother substrate 20.
Also, the respective unit LCD panels are positioned to effectively utilize the first and second mother substrates 20 and 30. The area by which the unit LCD panels are spaced apart to allow for the dummy region 32 depends on the model of the liquid crystal display panel being produced.
The first mother substrate 20 where the thin film transistor array substrates 1 are included, and the second mother substrate 30 where the color filter substrates 2 are included, are attached to each other. Thereafter, the LCD panels are cut into individual panels. The dummy region 31, where the color filter substrates 2 of the second mother substrate 30 are formed, and the dummy region 32 for separating the unit LCD panels are simultaneously removed at this time.
After cutting the second mother substrate 30 into the unit LCD panels, a shorting line formed at the marginal portion of the thin film transistor array substrate 1 for intercepting static electricity is removed. In this process, a sharp corner of the unit LCD panel is ground. Static electricity may occur at the shorting line when a conductive film is formed on the thin film transistor array substrate 1. Also, by grinding the sharp corner of the LCD panel, pieces are not separated from the corner of the unit LCD panel by the external impact. Grinding also prevents an operator from being injured by the sharp corner of the unit LCD panel in the fabrication process.
FIG. 2 is a schematic plan view of the conventional unit LCD panel.
With reference to FIG. 2, a unit LCD panel 10 includes a picture display unit 13 in which liquid crystal cells are arranged in a matrix form, a gate pad unit 14 for connecting a plurality of gate lines GL1 to GLm of the picture display unit 13 to a gate driver integrated circuit (not shown), to which a gate signal is applied, and a data pad unit 15 for connecting a plurality of data lines DL1 to DLn of the picture display unit 13 to a data driver integrated circuit (not shown), to which the picture information is applied. The gate pad unit 14 and the data pad unit 15 are formed at the marginal portion of the thin film transistor array substrate 1 where both side edges extend relative to the color filter substrate 2.
At the region where the data lines DL1 to DLn and the gate lines GL1 to GLm vertically cross one another, a thin film transistor (not shown) for switching the liquid crystal cell is formed therein. A pixel electrode is formed to be connected to the thin film transistor for driving the liquid crystal cell. A passivation film (not shown) is formed on the entire surface to protect the data lines DL1 to DLn, the gate lines GL1 to GLm, the thin film transistors, and the electrodes.
Also, a shorting line (not shown) for electrically shorting out the conductive films is formed at the marginal portion of the thin film transistor array substrate 1, to remove static electricity which may be generated during formation of the data lines DL1 to DLn, the gate lines GL1 to GLm, and the various electrodes on the thin film transistor array substrate 1.
At the color filter substrate 2 of the picture display unit 13, a plurality of color filters (not shown) are coated and separated by cell regions with a black matrix. A common transparent electrode (not shown) corresponding to the pixel electrode is formed at the thin film transistor array substrate 1.
A cell gap (not shown) is formed between the thin film transistor array substrate 1 and the color filter substrate 2 so that the two substrates are spaced apart and face each other. The thin film transistor array substrate 1 and the color filter substrate 2 are attached by a seal (not shown) formed at the exterior of the picture display unit 13. A liquid crystal layer (not shown) is formed between the thin film transistor array substrate 1 and the color filter substrate 2.
A grinder apparatus for grinding each of the individually cut unit liquid crystal display panels 10 is explained in detail by referring to the attached drawing as follows.
FIG. 3 illustrates an exemplary diagram of a grinding table apparatus for a unit liquid crystal display panel and a grinder apparatus using the same according to a related art.
Referring to FIG. 3, a grinder apparatus according to a related art includes a loading unit 50 loading a cut unit liquid crystal display panel 10 thereon, a grinding unit 53 receiving the unit liquid crystal display panel 10 loaded on the loading unit 50 so as to arrange the received unit liquid crystal display panel 10 on a grinding table 51 and for grinding edges of the unit liquid crystal display panel 10 through a grind wheel 52 rotating at high speed, and an unloading unit 54 receiving the grinded unit liquid crystal display panel 10 from the grinding unit 53 so as to unload the received panel 10.
The grinding table 51 should be designed to have a size smaller than that of the unit liquid crystal display panel 10 to grind the edges of the unit liquid crystal display panel 10 obliquely as well as support the unit liquid crystal display panel 10 effectively. Compared to the edges of the grinding table 51, the edges of the unit liquid crystal display panel 10 extend beyond those of the grinding table 51.
FIGS. 4A to 4C illustrate exemplary diagrams of grinding tables in accordance with a variable size of a unit liquid crystal display panel according to a related art.
Referring to FIG. 4A, a grinding table 60 has a size somewhat smaller than that of a unit liquid crystal display panel 10 so that edges of the unit liquid crystal display panel 10 protrude slightly.
However, referring to FIGS. 4B and 4C, when sizes of unit liquid crystal display panels 70 and 80 are greater than that of the unit liquid crystal display panel 10 in FIG. 4A, the grinding table 60 in FIG. 4A fails to support the unit liquid crystal display panel 70 stably. On the contrary, when the size of the unit liquid crystal display panel 80 is smaller than that in FIG. 4A, edges of the liquid crystal display panel 80 do not protrude sufficiently from those of the grinding table 60 in FIG. 4A to allow for proper grinding.
In order to grind the unit liquid crystal display panel 70 in FIG. 4B, the grinding table 60 in FIG. 4A is removed from a production line and a large-sized grinding table 71 is installed at the production line. Likewise, in order to grind the unit liquid crystal display panel 80 in FIG. 4C, the grinding table 60 in FIG. 4A is removed from the production line to install a new grinding table 81 having a smaller size at the production line again.
Unfortunately, the grinding table according to the related art involves a tedious job of replacing the previously used grinding table with the new grinding table having a size corresponding to that of a liquid crystal display panel when the size of the liquid crystal display panel is changed. Such process reduces productivity due to a delayed process time.
Moreover, according to the related art, a plurality of grinding tables must be prepared to correspond to various sizes of liquid crystal display panels, thereby increasing its production cost, as well as requiring extra space to store the plurality of the grinding tables.

Method for grinding liquid crystal display panel


A holding device for locking the head of a syringe piston on a pusher has arms connected to respective pinions pivotable and translationally displaceable so that the corresponding arm is involved in the same motion between a rest position, in which the arms are closed and pressed against the pusher, and an open position, in which the arms are opened and remote therefrom, the translation is carried out prior to rotation during the movement toward the open position or in reverse order toward the rest position. The holding device also has a control member and means for converting a part of the control member movement by transmitting it to at least one pinion as a translation movement, which are translationally locked, and means for converting a part of the control member movement by transmitting it to at least one pinion as a rotation movement.

The invention relates to a holding device for locking the head of a syringe piston on a syringe pump pusher, the device being equipped with arms integral each with a pinion pivotable about its axis and movable in translation so as to drive the corresponding arm in a same movement between a rest position, in which the arms are "closed" and "pressed" against the pusher, and an open position, in which the arms are "opened" and "removed" from the pusher, the translation being performed before the rotation during the movement toward the open position, or in reverse order toward the rest position, the holding device further comprising a control member and means for converting a portion of the movement of the control member by transmitting it to at least one pinion in the form of a translation movement and means for converting a portion of the movement of the control member by transmitting it to at least one pinion in the form of a rotation movement.
Syringe pumps are often used in the medical field. These syringe pumps are constituted essentially by a device for immobilizing the cylinder of the syringe and a device for pushing the piston in the cylinder at a defined speed in order to supply the solution to the patient in a controlled manner. Further, it is preferable that the piston head be held against the pusher of the syringe pump to avoid a siphoning phenomenon. It happens sometimes that a depression forms downstream of the syringe. If the piston head is not held, there is a risk that the syringe will empty itself partially or completely and will thus supply the therapeutic solution to the patient at a much too high rate, which can have tragic consequences.
Various solutions have been proposed. For example, a hand-actuated holding device is known from document EP 1 279 410 A1, which device comprises an element mobile perpendicularly to the axis of the syringe. This mobile element is crescent-shaped with a V-shaped slot located in the inner arc of the crescent. By returning the mobile element against the pump housing, the edge of the piston head penetrates into the V-shaped slot, which then holds it against the pusher. This solution requires that the syringe head be aligned with the V-shaped slot of the mobile element.
In another common solution, the holding means are constituted by two arms. These arms, which are parallel to the syringe piston head, are mounted on pivoting axes that are parallel to the main axis of the syringe. When the syringe is placed in the syringe pusher, these arms are moved away from each other by pivoting them towards the outside, the piston head is placed against the pusher and the arms are released so that they return to a closed position, thus locking the piston head between them and the pusher.
By themselves, the arms can lock efficiently only syringe heads that have a defined thickness. In other words, the corresponding syringe pumps can be used only for a type of syringe or syringes from a single manufacturer, provided these syringes all have piston heads of the same thickness. Using these pivoting arms with thicker piston heads is not possible, as the arms cannot return to the closed position, and using them with thinner piston heads is dangerous, to the extent that even a very small siphoning effect can have serious consequences, in particular for solutions supplied at a very small rate.
Thus, arms exist that, not only pivot to open, but also carry out a translation movement along the axis of the syringe, so that they can adjust to the thickness of the piston head. Pushing on a lever triggers, first, the translation of these arms, which tends to move them away from the pusher, and then, a rotation movement of the arms, which tends to rotate them toward the outside while moving them away from each other. Once the piston head is placed against the pusher, the lever is released, the arms close again until they touch the syringe piston rod, then they move back toward the pusher until they touch the syringe piston head.
Such a holding device is known, for example, from document U.S. Pat. No. 6,428,509 B1. This device comprises a first pivoting mechanism that drives the arms in rotation and a second mechanism that drives the arms in translation. The pivoting mechanism is constituted essentially by three toothed wheels placed in series, the first toothed wheel transmitting the rotation movement of the actuating lever to a second toothed wheel, which is integral with the first arm, and the second toothed wheel transmitting in turn the rotation movement to a third toothed wheel integral with the second arm. In the translation mechanism, the rotation axes of the arms are pushed against an actuating plate that has on a protrusion on its other face. The actuating lever is integral with a control plate having a ramp, the protrusion of the actuating plate being supported on the control plate on the side of the ramp. When the lever pivots, this control plate moves until the protrusion slides against the ramp, thus triggering the downward movement of the actuating plate, and as a result, the translation of the arms away from the pusher. A hook locks the actuating plate when it reaches a certain distance, so that it is locked in this position without being able of moving backward again. When the actuating lever is moved back again, the arms close again. The hook that holds the actuating plate is released only during the last degrees of the pivoting movement of the lever, which enables the plate to move back toward the pusher, thus driving the arms along in the same movement. This device is particularly complex and requires a high number of parts.
Another holding device is known from document EP 1 066 846 A1, which device has arms that are pivotable and movable in translation. Each arm is mounted on an axis carrying each a toothed wheel equipped with a central radial groove. A toothed wheel, connected indirectly to an electric motor, is equipped with a central radial projection. This driving toothed wheel is intended to cooperate with the toothed wheel of the first arm, wherein the radial projection of the first toothed wheel projects into the central radial groove of the second. The driving toothed wheel cooperates also with a transmission toothed wheel that transmits the rotation movement of the driving wheel to the toothed wheel of the second arm. The toothed wheel of the second arm is positioned such that the radial projection of the driving toothed wheel also projects into its central radial groove, without meshing, however. Further, the driving toothed wheel is mounted on a ring equipped with an inner thread. The ring it itself mounted on a hollow rod having an outside thread and carrying at one of its ends a toothed wheel that cooperates with the motor. A rod having a flange at one of its ends has its free end projecting into the hollow rod, on the side opposed to the toothed wheel that cooperates with the motor. This rod is free in rotation in the hollow rod while being locked in translation. This assembly enables the driving toothed wheel to move in translation, thus driving the toothed wheels of the arms along in the same movement because the radial projection projects into the radial grooves of the toothed wheels of the arms. The translation movement is limited, on one side, by the toothed wheel that cooperates with the motor, and on the other side, by the flange. A group of springs promotes the translation of the driving wheel to the detriment of its rotation, which is triggered only when the driving wheel can no longer move in translation. Here also, the mechanism requires a high number of parts and its design is particularly complex.
Further, a holding device for the syringe cylinder is known from document US 2004/0116893 A1, which device provides, in one of its variants, three arms pivotable in a radial plane toward the center of the adapter. However, these arms are not movable in the axial direction.

Holding device for locking the head of a syringe piston on a syringe pump pusher


Embodiments disclosed herein relate to programmable duplexers. The frequency pass band of the programmable duplexer is changed according to a selection of a channel-pair to control or maximize the transition band between the receiver path and the transmitter path. The programmable duplexer permits selections of desired pass bands without the need for multiple duplexer filters.

Duplexers are an essential part of 3G cellular communication handsets. The overall purpose of a duplexer is to allow both the transmit (TX) and receive (RX) portions of a cellular radio to share a common antenna (ANT). Typically, a duplexer is a passive device with three ports: (1) a transmit port that connects to the output of the power amplifier (PA) stage of the radio, (2) a receive port that connects to the input of the low-noise-amplifier (LNA) receive stage of the radio, and (3) an antenna port which connects directly to the handset's antenna.
At present, most duplexers for cellular handset applications are made using surface acoustic wave (SAW) technology. However, the requirements for some communications standards (notably the third generation partnership project (3GPP) bands 2, 3, and 8) are extremely difficult or impossible to achieve with standard SAW devices. The problem with respect to these bands is the very narrow frequency separation between the transmission and receiver bands. This separation in frequency is usually referred to as the "transition band." The steepness of the filters in this region is proportional to their quality factor (Q). Even SAW filter having Qs in the neighborhood of 300-500 cannot meet the rigorous requirements of the aforementioned 3GPP bands. Not only do those bands require very narrow transition bands, the problem is exacerbated by the necessary addition of margins for manufacturing and temperature variations. As an example, temperature variations may cause the pass bands of the SAW devices to shift in frequency in an undesirable fashion.
Thus, there is a need for an improved duplexer that can meet the requirements of the 3GPP bands and provide improved performance by minimizing temperature related variations.

Duplexer with active temperature compensation

Abstract: Embodiments disclosed herein also relate to temperature compensating a programmable duplexer based upon one or more temperature indications. The one or more temperature indications may be based upon a temperature of a semiconductor circuit, a temperature of a substrate of a one-port resonator of the programmable duplexer, and/or a temperature of the one-port resonator. The resulting programmable duplexer has an added additional advantage of lessening the temperature variations of the programmable duplexer.


A ballast controller integrated circuit which executes a specific set of instructions via an integrated state diagram architecture to control a fluorescent lamp or high intensity discharge lamp and protect the ballast. The state diagram architecture controls powering up and down of the IC and the half-bridge circuit driven by the IC, preheating and striking of the lamp, running of the lamp, sensing for numerous possible fault conditions, and recovering from these fault conditions based on the normal maintenance of a lamp, while requiring fewer internal and external components than previous electronic ballasts.

1. Field of the Invention
The present invention relates to an electronic ballast for controlling fluorescent or high-intensity discharge lamps, and more particularly, to an electronic ballast that requires fewer internal and external components.
2. Description of the Related Art
Electronic ballasts for controlling fluorescent or high-intensity discharge (HID) lamps usually require electronics necessary for preheating the lamp filaments, striking the lamp, driving the lamp to a given power, detecting lamp fault conditions, and safely deactivating the circuit.
Electronic ballasts for gas discharge circuits have recently come into widespread use because of the availability of power MOSFET switching devices and insulated gate bipolar transistors ("IGBTs") that can replace previously used power bipolar switching devices. Monolithic gate driver circuits, such as the IR2155 sold by International Rectifier Corporation and described in U.S. Pat. No. 5,545,955, the disclosure of which is incorporated herein by reference in its entirety, have been devised for driving the power MOSFETs or IGBTs in electronic ballasts.
The IR2155 gate driver IC offers significant advantages over prior circuits: The driver is packaged in a conventional DIP or SOIC package. The package contains internal level shifting circuitry, under voltage lockout circuitry, deadtime delay circuitry, and additional logic circuitry and inputs so that the driver can self-oscillate at a frequency determined by external resistors RT and capacitors CT.
Although the IR2155 offers a vast improvement over prior ballast control circuits, it lacks a number of desirable features such as the following: (i) a start-up procedure which ensures a flash-free start without an initial high voltage pulse across the lamp, (ii) non-zero voltage switching protection circuitry, (iii) over-temperature shutdown circuitry, (iv) DC bus and AC on/off control circuitry, and (v) near or below resonance detection circuitry.
U.S. Pat. No. 6,211,623 to Wilhelm et al. issued Apr. 3, 2001 and having common assignment with the present application discloses an electronic ballast which addresses limitations of the IR2155, such as those discussed above. The electronic ballast is identified by the assignee, International Rectifier Corporation, as the IR2157.
The ballast control circuit of the '623 patent, as in commonly known ballasts, requires an implementation of the preheat timer that includes a comparator for comparing the CPH pin against a fixed threshold. In addition, the oscillator circuit requires more than one comparator. These and other configuration details result in additional components being required both inside and outside the chip. Accordingly, the prior art could be improved upon by providing a ballast control IC which performs the primary ballast functions while minimizing the internal and external component count. Applications for such ballasts would include linear fluorescent lamps, compact fluorescent lamps (CFL), cold-cathode fluorescent lamps (CCFL), high-intensity discharge (HID) lamps, and flat fluorescent lamps.

Ballast control IC with minimal internal and external components


Line shortening and other defects in integrated circuits are measured by imprinting accuracy determinative patterns in the scribe lines or die margins of the mask field. The patterns are ideally formed in the general nature of the usual box in a box configuration with one of the boxes being specially configured to include a series of lines and spaces having narrow widths comparable to the width of the lines to be formed in the integrated circuit. The use of the narrow lines provides the box in a box configuration with the same line shortening that the circuit feature will itself experience. Small spaces between the lines permit the standard measuring equipment to locate at the ends of the lines.

In the manufacture of integrated circuits each element is ordinarily produced by a lithographic process wherein an image of one or several of the individual circuit elements or features is projected onto the wafer at a time. Because of the small size of such elements and the importance of their being accurately sized and positioned, the fabrication equipment is frequently checked for a number of possible dimensional anomalies and aberrations. These checks include "best focus" at the center of the lens for both the x and y directions as well as the "best focus" at a number of locations displaced from the center, again for both the x and y directions. Likewise, it is checked for coma (comatic aberration) and other aberrations. Such aberrations are well known in the art. See, for instance, E. HECHT, OPTICS (2d ed. reprinted with corrections 1990) p.223 or OPTICAL SOCIETY of AMERICA, HANDBOOK OF OPTICS Vol. II (2d ed. 1995) Chapter 1.
The usual way at the present time for making such checks and measuring discrepancies is with a traditional box in a box configuration having an outside box of about 20 .mu.m square defined by a line or trench and a centrally disposed inside box of about 10 .mu.m square similarly defined by a line or trench. Sometimes, one of the boxes is formed as a solid square rather than merely a line configuration. Moreover, the boxes need not be limited to clear tone patterns but could be formed of a dark tone. In any case the square in a square configuration utilizes a measurement between edges of the two squares. Such measurements can be taken with the aid of a scanning electronic microscope (SEM) and can be very accurate when measuring relatively large areas or verifying the position and dimensions of relatively large features. Even so, they may be quite time consuming since only about 40 individual measurements can be completed per hour.
Not all features of integrated circuits are in the relatively large category. In many instances, some of the individual features of the circuit, such as the gate lines, have extremely small dimensions and may have widths of less than 0.2 .mu.m to 0.4 .mu.m with their lengths being considerably greater, perhaps 0.8 .mu.m to 2.0 .mu.m. When dimensions reach such small size there is a tendency for the formed line to be shorter than its design length as defined by the mask. Such "line shortening", as the term is used herein, occurs when a line is particularly thin because the light passed through the mask to define the periphery of the line, while relatively constant along the length of the line, is amplified at each end of the line due to the fact that the end of the line is subjected not only to the light along the two sides but also the light at the end of the line. The shortening effect is increased when the projection is out of focus, thereby causing more light scatter. Consequently, the focus throughout the entire field of the projection must be considered. In addition the length of the line may be reduced by coma and this aberration is also carefully monitored. In such cases, the accuracy of the lens projecting light through the particular mask to create the features becomes extremely important.
When the feature is in the form of a long thin line, the usual box in a box system does not accurately measure the length of the line. Rather, it merely measures the distances between the walls of the two boxes thereby ignoring any line shortening. Moreover, measurements of the feature with an SEM is impractical because, in order to place the entire line in the measurement screen, only a very low magnification of about 10K to 20K can be employed. At such magnification the precision is only in the order to 20-25 nm.
Even though the projection of the entire mask onto the wafer has a usual dimension of less than 20 mm square, variations of the lens parameters over that small area can be critical. The slightest aberration in the lens projection can cause errors in the construction of the individual elements such as a fatal reduction in the length of the gate line known as "gate shortening". Thus, it is intended that the focus of the lens lies in a single plane and, if there is any variation from that single plane, it has to be identified so that corrections can be applied. This is important not only for the center of the lens, but for various points throughout the projection area. The same is true for other lens aberrations such as coma which can intensify the reduction in line length.

Method for measuring dimensional anomalies in photolithographed integrated circuits using overlay metrology, and masks therefor


A process of realizing large scale integrated circuits by means of a programmed data processor includes minimizing timing delays in the technology mapping phase by employing algorithms which are based on a linear model in terms of number of inputs and a load capacitance of a gating function and which permit a decomposition of the gating function into gates having m inputs and [(n-m)+1] inputs wherein m is greater than two. Balanced decompositions may be allowed in appropriate conditions.

The present invention concerns the design and fabrication of large scale integrated circuits with the aid of a programmed data processor, hereinafter called compiler, by means of which an operator initially specifies a function and achieves a detailed instruction for the layout of a large scale integrated circuit which implements, in the selected technical realisation, the function which has been specified by the operator. The design, checking and testing of large scale integrated circuits is so complex that the use of such a programmed data processor is essential for any normal circuit or function. This is partly because the digital signal processing functions are inherently complicated, partly because the main data processing functions need to be decomposed into simpler functions which are within the library of the processor and partly because considerable computation is required in order to achieve an efficient layout of the network. It will be understood that the result of the computerised design process is a detailed specification defining, in terms of a particular technology, a complex integrated circuit. Such a specification may be regarded as a template for the fabrication of the physical embodiment of the integrated circuit.
Compilers of the kind set forth above are commercially available and have been described in the literature. Reference may be made for example to Rabaey et al.
"Cathedral - 2: Computer Aided Synthesis of Digital Signal Processing Systems", Proceedings of the IEEE CICC 1987 pages 157-160 (1987), S. G. Smith and R. W. Morgan "High Level DSPASIC Design Tool", Proceedings Euro--ASIC 1989 pages 117-129, Grenoble, France, January 1989; Hartley et al., "A Digit--Serial Silicon Compiler" Proceedings 25th ACM/IEEE DA Conference pages 646-649, California, June 1988; Proceedings of the 24th Design Automation Conference, Miami, Florida, June 1987; Proceedings of the International Workshop on Logic and Architectural Synthesis for Silicon Compilers, Grenoble, May 1988; Proceedings of the International Conference on Computer Aided Design, Santa Clara, California, November 1988; and IEEE Transactions on Computer Aided Design on Integrated Circuits and Systems, Volume CAD-5 Number 4, October 1986.
As an example of the complexity of the circuits which are realized with the aid of such processors, a sixteen bit discrete cosine transform circuit, comprising twenty five digital adders, twenty five digital subtractors and eleven digital rotators, requires for its full specification about seventy pages or more of schematic diagrams when expressed in detailed circuit form. It is not feasible to design circuits of such complexity by hand within any reasonable time. An added factor in the need to employ computer aided design is constituted by a multiplicity of other requirements, including the achieving of efficient utilization of area in the layout of the integrated circuit and particularly for digital signal processing, the optimization of throughput. One of many factors affecting throughput is the phenomenon of different arrival times of each of a multiplicity of signals at a multiple input gate, such as a NAND or AND gate.

Method and apparatus for the design and fabrication of integrated circuits employing logic decomposition algorithms for the timing optimization of multilevel logic


A process for the hydroformylation of ethylenically unsaturated compounds with carbon monoxide and hydrogen in the presence of a catalyst system comprising:. a) a source of palladium, platinum, or nickel cations; PA0 b) a source of anions, other than halide anions, such as unsubstituted alkyl sulfonic acids, aryl sulfonic acids, perfluorinated alkyl sulfonic acids, perfluorinated aryl sulfonic acids, boric acid derivatives or alkylated versions thereof; PA0 c) a source of at least one bidentate ligands of the formula EQU R.sup.1 R.sup.2 M.sup.1 RM.sup.2 R.sup.3 R.sup.4 (I) PA0 wherein M.sup.1 and M.sup.2 independently represent a phosphorus, arsenic or antimony atom, R represents a bivalent bridging group containing from 1-4 atoms in the bridge, R.sup.1 and R.sup.2 together represent a bivalent cyclic group whereby the two.cndot.free valencies are linked to M.sup.1, and R.sup.3 and R.sup.4 independently represent a hydrocarbyl group, or together represent a bivalent cyclic group whereby the two free valencies are linked to M.sup.2 ; PA0 wherein said source of cations, anions, and ligands are selected to form a catalyst system having a solubility of at least 2.times.10.sup.-4 mole of the cation a) per liter of a liquid mixture comprising said ethylenically unsaturated compound and the hydroformylation products;. and separating the hydroformylation products from the catalyst system in a solventless evaporative separator such as a falling film evaporator or a wiping film evaporator.

This invention relates to a process for the hydroformylation of unsaturated hydrocarbons, and more specifically, to a process for hydroformylation in the presence of a catalyst system which is soluble to an amount of at least 2.times.10.sup.-4 mole of the catalyst cation per liter of a liquid mixture of an ethylenically unsaturated compound feed and the hydroformylation product, followed by separating the hydroformylation reaction products from the catalyst system in a solventless evaporative separator.


A method for manufacturing a semiconductor device includes the steps of consecutively depositing a Poly-Si layer, a WN layer and a W layer on a SiO2 layer, forming a mask pattern on the W layer, selectively etching the W layer by using plasma in a first etching gas having a high etch selectivity ratio between W and WN, selectively etching the WN layer and the Poly-Si layer by using plasma in a second etching gas having a high etch selectivity between WN and Si, and selectively etching the Poly-Si layer 13 by using plasma in a third etching gas having a high etch selectivity between Si and silicon oxide.

1. Field of the Invention
The present invention relates to a method for manufacturing a semiconductor device and, more particularly, to a technology for forming a pattern on a W/WN/polysilicon layered film structure by using a dry etching technique.
2. Description of the Related Art
Gate electrodes are designed to have a lower wiring resistance and a smaller thickness to match the request for a higher integration density and a higher performance of semiconductor integrated circuits. As a gate electrode structure for realizing the lower wiring resistance and the smaller film thickness, there is known a polysilicon-metal structure in which a high-melting-point metal layer is stacked on a Poly-Si (polysilicon:polycrystalline silicon) layer. A polysilicon-metal gate electrode structure having a W/WN/Poly-Si/SiO2 layered film has been developed, in which the SiO2 film is used for a gate insulating film underlying the gate electrode structure, the W layer is used as a high-melting-point metal film, and the WN layer is interposed as a barrier metal film between the W layer and the Poly-Si layer.
The gate electrode structure having the W/WN/Poly-Si/SiO2 layered film, as shown in FIG. 3, is manufactured by forming a mask 23 made of an insulating film on the W/WN/Poly-Si/SiO2 layered film 10 and patterning the layered film 10 by using a dry etching technique. Such a method for manufacturing the gate electrode is described in, for example, Jpn. Pat. Appln. Publication Nos. 2000-40696 and 2003-78034.
In the above patent documents, the dry etching technique is used as a first step wherein metal layers, such as the W layer 15 and WN layer 14, are etched by using plasma generated in mixed gas containing SF6. Thereafter, in a second step, the Poly-Si layer 13 is etched by using plasma generated in mixed gas containing Cl2 and Ar. Subsequently, in a third step, residues of the Poly-Si layer 13 are etched while maintaining a high selectivity ratio of the Poly-Si layer 13 from the SiO2 layer 12 by using plasma generated in mixed gas containing HBr and O2.
In a DRAM (Dynamic Random Access Memory) having a gate width of 110 nm for a next generation, the thickness of the layered film is extremely reduced in order to raise the operational speed of the semiconductor device, wherein the design thickness of the Poly-Si layer 13 is 70 nm or less, and the design thickness of the gate oxide film made of SiO2 is 4 nm or less, for example. For using the manufacturing methods described in the above patent documents in the semiconductor device having such a gate electrode structure, there occurs a problem of so-called "penetration of SiO2 layer" wherein the SiO2 layer is broken by penetration during the etching process in the second or third step. Although the problem of penetration of the SiO2 layer is also described in the above patent documents, it is difficult to effectively suppress the penetration of the SiO2 layer in the process of manufacturing the gate electrode structure having the above-described thin SiO2 layer 12 and Poly-Si layer 13.

Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film


Reciprocating rasps for the surgical preparation of the bone prior to the implantation of a glenoid or acetabular component with complex geometry are disclosed. Surgical methods for the use of such reciprocating rasps are also disclosed. Some of the methods include inserting a guide pin into the glenoid of the patient, advancing a reciprocating surgical rasp over the guide pin, reciprocating the surgical rasp so as to abrade bone tissue to form a cavity shaped to receive the glenoid component, and implanting the glenoid component in the cavity.

During the lifetime of a patient, it may be necessary to perform a total shoulder replacement procedure on the patient as a result of, for example, disease or trauma. In a total shoulder replacement procedure, a humeral component having a prosthetic head is used to replace the natural head of the patient's humerus. The humeral component typically includes an elongated stem that is implanted into the intramedullary canal of the patient's humerus. In such a total shoulder replacement procedure, the natural glenoid surface of the scapula is resurfaced or otherwise replaced with a glenoid component that provides a bearing surface upon which the prosthetic head of the humeral component articulates.
As alluded to above, the need for a shoulder replacement procedure may be created by the presence of any one of a number of conditions. One such condition is the deterioration of the patient's scapula in the area proximate to the glenoid surface as a result of, for example, glenohumeral arthritis. In such a condition, the erosion of the patient's scapula is generally observed posteriorly on the glenoid surface. Such erosion of the scapula renders treatment difficult, if not impossible, with a conventional glenoid component. One way to treat such a condition is by the use of a modified glenoid component, known generally as an augmented glenoid component. An augmented glenoid component has a posterior edge that is thicker than the corresponding anterior edge.
From time-to-time, revision surgery is performed to replace a glenoid component. In such a revision surgery, the previously implanted glenoid component is surgically removed and a replacement glenoid component is implanted in the patient's glenoid. The subcondylar plate may be damaged or missing subsequent to revision surgery. Revision surgery may also result in defects, some of which may be fairly large, in the cancellous bone of the glenoid vault of the scapula. Fixation of a revision glenoid component can be difficult to achieve with the limited bone remaining on the glenoid vault of the scapula after the revision surgery has been performed. Vault-filling revision glenoid components have been developed that include a metal backing that extends into (i.e., "fills") the glenoid vault to replace the lost bone. A bearing component, generally made of polyethylene (e.g., UHMWPE) or other materials such as ceramics or metals, is then fixed to the implanted metal backing to create the bearing surface upon which the proximal end (e.g., a prosthetic head) of the humeral component articulates.
Simple surgical instruments such as revolving spherical or circular reamers are generally used to prepare the glenoid surface during a glenoid surgical procedure. This is sufficient since traditional glenoid components (i.e., non-augmented glenoid components or non-vault-filling glenoid components) typically have a uniform backside geometry that is either curved or flat, which makes glenoid preparation fairly straightforward. However, the use of glenoid components with complex backside geometries (e.g., augmented glenoid components or vault-filling glenoid components) makes bone preparation more of a challenge. A surgeon is forced to use a combination of reamers, saws, and burrs in the performance of a free-hand technique that requires frequent interruptions for intraoperative assessment to implant these complex components.
A similar condition can occur in the acetabulum of a patient's hip. Namely, deterioration of the patient's hip bone in the area proximate to the acetabulum can occur as a result of, for example, arthritis. Such erosion of the hip bone renders treatment difficult, if not impossible, with a conventional acetabular component. One way to treat such a condition is by the use of an acetabular augment component that replaces the diseased or damage bone tissue.

Reciprocating rasps for use in an orthopaedic surgical procedure


A sewing machine including a shuttle/hook & bobbin assembly reciprocated to carry an under thread for making stitches with an upper thread on a workpiece, a stroke-adjustable feed mechanism controlled by a micro-inch stitch adjusting device to feed the workpiece in either direction or to let the workpiece be retained in place during stitching. The major parts of the sewing machine are respectively molded from ABS (acrylonitrile-butadiene-styrene) so that the weight as well as the manufacturing cost of the sewing machine are relatively reduced.

The present invention relates to sewing machines, and more particularly the present invention relates to a compact sewing machine for home use which is lightweight and, which has a stitch adjusting device for adjusting the stitch density steplessly.
The base plate as well as the major mechanical parts of conventional home type sewing machines, including the early treadle-operated sewing machines and the present electric sewing machines, are commonly made of metal. Therefore, conventional sewing machines are commonly heavy. Further, the manufacturing cost of a sewing machine can not be greatly reduced when its major mechanical parts are made from metal. It is a good way to use plastics for making the base plate and the major parts for a sewing machine so as to reduce the manufacturing cost and the machine weight. Because the strength of regular plastics is inferior to metal, sewing machine manufacturers may use plastics for making the outer shell for a sewing machine, however, there is not any sewing machine manufacturer who dares to use plastics for making the major mechanical parts for a sewing machine.

Compact home use sewing machine with an adjusting mechanism for controlling the stitch length and feed direction


A process for device fabrication and resist materials that are used in the process are disclosed. The resist material contains a polymer in combination with a dissolution inhibitor and a photoacid generator (PAG). The dissolution inhibitor is the condensation reaction product of a saturated polycyclic hydrocarbon compound with at least one hydroxy (OH) substituent and a difunctional saturated linear, branched, or cyclic hydrocarbon compound wherein the functional groups are either carboxylic acid or carboxylic acid chloride groups. The condensation product has at least two polycylic moieties. The polymer optionally has acid labile groups pendant thereto which significantly decrease the solubility of the polymer in a solution of aqueous base. A film of the resist material is formed on a substrate and exposed to delineating radiation. The radiation induces a chemical change in the resist material rendering the exposed resist material substantially more soluble in aqueous base solution than the unexposed portion of the resist material. The image introduced into the resist material is developed using conventional techniques, and the resulting pattern is then transferred into the underlying substrate.

1. Technical Field
The invention is directed to a process for device fabrication in which an energy sensitive resist material containing a dissolution inhibitor is used.
2. Art Background
Devices such as integrated circuits are complex structures made of a variety of materials. These materials are precisely configured to form the desired device by a variety of processes. A lithographic process is frequently used to transfer the desired configuration into a substrate to fabricate such devices.
Lithographic processes use intermediate materials frequently referred to as resists. A positive or negative image of the desired configuration is first introduced into the resist by exposing it to patterned radiation which induces a chemical change in the exposed portions of the resist. This chemical change is then exploited to develop a pattern in the resist, which is then transferred into the substrate underlying the resist.
The efficacy of a lithographic process depends at least in part on the resist used to transfer the pattern into the substrate. Certain types of resists offer particular advantages in the context of specific lithographic processes. For example, solution-developed resists are designed to have absorption characteristics appropriate for use at certain exposure wavelengths. It is axiomatic that, if the resist material is opaque to the exposing radiation, the exposing radiation will not be transmitted into the resist material and the desired chemical change will not occur. Therefore it is important to select a resist material that has the appropriate light transmission characteristics at the wavelength of the exposing radiation. Other considerations that drive the selection of an appropriate resist material include the etch resistance of the resist after it has been exposed and developed.
In this regard, resist materials that contain polymers with ethylenic and/or aromatic unsaturation are typically used in lithographic processes for device fabrication in which the wavelength of the exposing radiation is in the traditional ultraviolet (UV) or deep UV range (i.e., about 240 nm to about 370 nm). However, these resist materials are often not suitable in processes in which the exposing radiation is 193 nm because the carbon-carbon double bond absorbs radiation at this wavelength. Consequently, resist materials that are being used for lithographic processes in which the exposing radiation has a wavelength of 248 nm or more are generally not useful in processes that use exposing radiation with a wavelength of 193 nm. Since lithographic processes for fabricating devices using 0.18 .mu.m and 0.13 .mu.m design rules are likely to use 193 nm-wavelength light as the exposing radiation, resist polymers that do not contain significant amounts of ethylenic unsaturation are sought.

Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material


A punchdown tool for fitting wires into connectors including a housing with a front side, a back side, a front end, a rear end opposite the front end, a leading surface on the front end, and an interior defined between the front and back sides. The punchdown tool also includes a drive mechanism with a hammer, an anvil, and a drive spring. The drive mechanism is positioned in the interior of the housing adjacent the front end. The punchdown tool further includes a circuit board positioned in the interior of the housing adjacent the rear end with a controller. The punchdown tool also includes a light positioned on the leading surface of the housing that is electrically coupled to the controller and at least one battery positioned in the interior of the housing for supplying power to the light and the circuit board.

The present invention relates to hand tools and particularly to punchdown hand tools.
Punchdown tools are used to fit electrical wires into an electrical connector. Punchdown tools typically include an impact-type drive mechanism that drives a blade. The drive mechanism drives the blade with enough force to fit the electrical wire into the electrical connector. Generally, the drive mechanism includes compression springs that when loaded drive a hammer to impact an anvil, thus transferring momentum to the blade to strike the electrical wire. However, many users using punchdown tools need to fit wires in electrical connectors that are in the dark. Additionally, many impact tools are bulky and difficult to hold comfortably.


A reproduction apparatus comprising a communication unit adapted to receive digital data distributed by a distribution apparatus, a reproduction unit adapted to reproduce the digital data received by the communication unit, a prediction unit adapted to predict a reproducible time using remaining power of a battery before the reproduction apparatus requests the distribution apparatus to distribute the digital data, and a determination unit adapted to determine whether the digital data can be reproduced to the end or not based on the reproducible time predicted by the prediction unit. If the determination unit determines that the digital data can be reproduced to the end, the reproduction apparatus requests the distribution apparatus to distribute the digital data to be reproduced by the reproduction unit, and if the determination unit determines that the digital data cannot be reproduced to the end, the reproduction apparatus issues an alarm indicating that the digital data cannot be reproduced to the end.

There is a conventional battery-driven transmission apparatus that decides whether a data transmission function can be used or not based on remaining power of a battery and issues an alarm when it decides that data cannot be sent.
On the other hand, a music distribution system for battery-driven portable terminals is put to practical use. For example, there are a case where a portable terminal downloads MP3 music data, records it in a flash memory to listen to the music using a headphone and a case where latest melodies signaling an incoming call are downloaded to a cellular phone. Furthermore, a portable device such as a portable video player, portable audio player, notebook PC, PDA (Personal Digital Assistant), etc., is driven by a battery and has the function of reproducing digital data such as video data, audio data from recording media. Such portable devices also check the remaining power of the battery and issue an alarm to users when the battery level is low.
However, such conventional battery-driven portable devices only display the remaining power of the battery and there are cases where distribution of data may be incomplete due to a shortage of the remaining power of the battery.
Furthermore, the above-described conventional power saving technology performs power saving processing but does not perform any special reproduction considering the remaining power of the battery and just turns off power when the battery is exhausted, and cannot decide before reproducing desired digital data whether the digital data can be reproduced to the end or not. Further, it cannot efficiently overview data when the battery level is low, either.

Control of reproduction apparatus and distribution apparatus based on remaining power of battery


A method for preparing a diene elastomer, such as a butadiene homopolymer or copolymer, in particular, a polybutadiene, with a high level of cis-1,4 linkages that has both a Mooney viscosity greater than or equal to 40 and a polydispersity index of less than 2.1. The method comprises a reaction of a catalyst system with at least one conjugated diene monomer to be polymerized and the catalyst system is based on at least:

1. Field of the Invention
The present invention relates to a method for preparing a diene elastomer, such as a butadiene homopolymer or copolymer. The invention especially applies to the production of a polybutadiene with a high level of cis-1,4 linkages that has both a Mooney viscosity greater than or equal to 40 and a reduced polydispersity index.
2. Description of the Related Art
In order to prepare butadiene homopolymers or copolymers having a high level of cis-1,4 linkages, it is known to use catalyst systems based on:                a salt of rare-earth metal(s) in solution in a hydrocarbon-based solvent;        an alkylating agent of this salt formed from an alkylaluminum; and        an alkylaluminum halide.
Patent document EP-B-207 558 teaches, in order to obtain a butadiene homopolymer or copolymer having a Mooney viscosity that is more or less independent of the degree of conversion of the monomers:                initiating the polymerization reaction with a catalyst system comprising:                    a) a neodymium compound chosen from neodymium oxide, and neodymium alkoxides, phenates and carboxylates;            b) an organic compound having a hydroxyl or carboxyl group;            c) a non-halogenated organometallic aluminum compound; and            d) a halogenated compound chosen from secondary or tertiary alkyl halides, organic acid halides, metal and organometallic halides, hydrogen halide acids and halogens,                        so that the aluminum/neodymium molar ratio in this catalyst system varies from 10 to 30; and        adding in continuous or batch mode, after the start of the polymerization reaction and over a time period at least equal to half of the total duration of this reaction, a given amount of this compound c) until an aluminum/neodymium molar ratio ranging from 20 to 80 is obtained.
As indicated in the embodiment examples of this document, the purpose of this addition of the organoaluminum compound after the initiation of the polymerization reaction is to obtain Mooney viscosities ML (1+4) that are always substantially below 40, in comparison with the Mooney viscosities that are obtained by adding this compound at the same time as the catalyst system, which does not give these polybutadienes that are well suited for use in tire cover treads.
Patent documents WO-A-02/38636 and WO-A-03/097708 in the name of the Applicants teach, for obtaining polybutadienes, the use of a "preformed" type catalyst system based on at least:                one preforming conjugated diene, such as butadiene;        one organic phosphoric acid salt of one or more rare-earth metal(s), which salt is in suspension in at least one saturated and aliphatic or alicyclic, inert hydrocarbon-based solvent;        an alkylating agent formed from an alkylaluminum of formula AlR3 or HAlR2, and        a halogen donor that belongs to the family of alkylaluminum halides excluding alkylaluminum sesquihalides.
The polybutadienes obtained using this catalyst system have, in particular, a polydispersity index less than 2.1 and a Mooney viscosity ML (1+4) at 100° C. greater than or equal to 40. These combined characteristics make these polybutadienes well suited for use in tire cover treads.

Abstract: optionally one preforming conjugated diene;

Abstract: one salt of one or more rare earth metals;

Abstract: an inert hydrocarbon-based solvent;

Abstract: an alkylating agent comprising an allyl derivative of aluminum of formula R″nAlR′3-n, where R′ is a saturated or unsaturated alkyl group or else a hydride, where R″ is an allyl group and where n is an integer inclusively between 1 and 3; and

Abstract: a halogen donor that belongs to the family of alkylaluminum halides, excluding alkylaluminum sesquihalides.


Various systems and techniques are disclosed relating to dynamic storage of documents. According to one or more exemplary systems and techniques, a location may be dynamically determined from a group of locations to store a state associated with a document based on one or more criteria.

Documents are commonly exchanged or transmitted between devices over the Internet or other networks. Some languages, due to their data-intensive nature, may require significant resources to store and communicate documents. For example, XML (eXtensible Markup Language) or other languages may be used to exchange documents, e.g., between a browser and a server. When the browser returns to edit a document, this information may be retrieved and reloaded, edited, and then may be saved again for future processing. Thus, the processing and communication of documents may in some cases consume a significant amount of computer or memory resources to store the documents and may require significant network resources to communicate this information. In addition, the storage location of a document is typically a static decision. Even when conditions change, the document may typically be stored in the same location. This approach is typically unable to adapt to changing network conditions and may introduce further load on a system.


A new and distinct cultivar of Lavandula plant named ‘Early Summer’, characterized by its compact, upright and somewhat outwardly spreading plant habit; freely branching growth habit; dense and bushy plant form; early and freely flowering habit; dark violet blue-colored flowers with violet-colored terminal flower bracts; flowers arranged in compact verticillasters on crowded spikes; and good garden performance.

The present invention relates to a new and distinct cultivar of Lavandula plant, botanically known as Lavandula stoechas and hereinafter referred to by the name 'Early Summer'.
The new Lavandula plant is a whole plant mutation of Lavandula stoechas 'Alexandra', not patented. The new Lavandula plant was discovered and selected by the Inventor in 2006 as a single flowering plant within a population of plants of 'Alexandra' in a controlled outdoor nursery environment in Komen, Belgium. The new Lavandula was selected on the basis of its compact plant habit and early flowering habit.
Asexual reproduction of the new Lavandula by terminal cuttings in a controlled greenhouse environment in Komen, Belgium since 2006 has shown that the unique features of this new Lavandula plant are stable and reproduced true to type in successive generations.


A porous polyimide obtained by removing a silica phase from an organic-inorganic polymer hybrid having a molecule structure in which a polyimide phase and the silica phase are held together by covalent bond.

Polyimides have been widely used as materials for various industrial parts because of their excellent electric properties (low dielectric constants), heat resistance, mechanical strength, chemical resistance, formability and so on. Recently, polyimides for any use have been demanded to have better properties than ever before. Especially, polyimides used as materials for electric parts have been demanded to exhibit better electric properties (low dielectric constants).
As polyimides used as materials for electric parts, which have excellent properties, various polyimides are conventionally proposed. Non-Patent Document 1 discloses one of the polyimides. Specifically, Non-Patent Document 1 discloses that a straight-chain porous polyimide having pores of prescribed size is attained by removing silica particles from a straight-chain polyimide obtained via sol-gel reaction and having silica particles-dispersed phase, through hydrofluoric acid treatment of the straight-chain polyimide. The thus resulting porous straight-chain polyimide is considered to exhibit excellent electric properties (low dielectric constants) due to the presence of pores.
However, the inventors of the present invention have conducted an intensive study of the porous polyimide disclosed in Non-Patent Document 1 and found that although an improvement of electric properties (low dielectric constants) is confirmed, there is a risk of remarkable deterioration in mechanical strength because of relatively large pores present in the polyimide. The porous polyimide disclosed in Non-Patent Document 1 is obtained by removing the silica particles from the straight-chain polyimide having silica particles-dispersed phases (hereinafter, called as silica particles-containing polyimide in this paragraph). In the silica particles-containing polyimide, polyimide molecules and silica particles are merely mixed. As is obvious from the description of Non-Patent Document 1, there are no particular chemical bonds between the polyimide molecules and the silica particles.
Meanwhile, in JP-A-2007-246772, the present inventors have previously proposed a hyperbranched polyimide-based hybrid material that is obtained by using a mixture including a hyperbranched polyamic acid, which is obtained by reaction of an aromatic tetracarboxylic dianhydride with an aromatic triamine, and inorganic oxide particles. The hyperbranched polyamic acid present in the mixture is imidized to obtain the hyperbranched polyimide, thereby obtaining the hyperbranched polyimide-based hybrid material. Further, in Patent Document 1 (WO06/25327 pamphlet), the present inventors have proposed a hyperbranched polyimide-based hybrid material comprising an organic-inorganic polymer hybrid having a composite structure in which a polyimide phase and a silica phase are held together by covalent bond.    Patent Document 1: WO06/25327 pamphlet    Non-Patent Document 1: L. Jiang et al., "A methodology for the preparation of nanoporous polyimide films with low dielectric constants", Thin Solid films, the U.S.A, Elsevier B.V., Jun. 3, 2006, Vol. 510, pp. 241-246


An inflatable airbag assembly includes first and second walls sealably connected to define an inflatable bladder having an interior volume that is operable between inflated and deflated states. At least one pleat is defined within at least one of the first and second walls, and defines an expanded portion of the interior volume. First and second slits are defined within the first wall that define a vent in communication with the expanded portion of the interior volume, wherein the vent defines an open position with the inflatable bladder in the deflated state, and wherein the vent moves to a closed position as the inflatable bladder operates to the inflated state.

Typically, vehicles include various airbag assemblies disposed in and around the passenger cabin of the vehicle. Depending upon the location of the airbag assembly within the vehicle, each airbag assembly can have specific properties, such as size and shape of the airbag when loaded and when deployed, rates of inflation of the airbag, as well as other properties.

Self-actuating flow restrictor for a vehicle airbag assembly


Fishing lures which include an empty firearm ammunition shell casing and a fishhook attached thereto. Soundwave-propagation is achieved by means of one or more rattle bead or beads freely housed within the interior cylindrical space of the shell casing to thereby attract game fish when the lure is submerged during use. Most preferably, the fishhook is attached rigidly to the rearward rim surface of the shell casing (e.g., in the pocket space in which the primer for the cartridge is seated) and protrudes rearwardly therefrom. A spoon or other decorative lure devices may optionally be attached to the shell casing to provide the fisherman with the desired effect.

It is known that a variety of fish are attracted by soundwaves propagating from submerged simulated bait and lures. According to the present invention, therefore, such soundwave-propagation is achieved by means of one or more rattle bead or beads freely housed within the interior cylindrical space of an empty ammunition cartridge or shell casing for firearms. Most preferably, the fishhook is attached rigidly to the rearward rim surface of the shell casing (e.g., in the pocket space in which the primer for the cartridge is seated) and protrudes rearwardly therefrom. A spoon or other decorative lure devices may optionally be attached to the shell casing to provide the fisherman with the desired effect.