A lubricant blend for use on a wire exposed to an HFC refrigerant. The lubricant blend includes an organic phase and an aqueous phase. The organic phase includes a lubricant which has a defined solubility in the HFC refrigerant and a lubricity suitable for application to the wire. The organic phase also includes a solvent in which the lubricant is soluble and, optionally, a hydrophobic surfactant. The aqueous phase includes a surfactant which forms an emulsion between the organic phase and the aqueous phase, which has a defined solubility in a non-CFC containing refrigerant. A magnetic wire lubricant, method of making the lubricant blend, and compressor using the lubricant blend are also described.

The present invention relates to a lubricant blend for magnetic wires that are employed in devices, such as compressors, which employ a refrigerant. More particularly, the present invention relates to a lubricant blend which imparts coefficient of friction values to magnetic wire comparable to that in which a paraffin lubricant and which is compatible with HFC (hydrofluorocarbons) refrigerants.
In the manufacturing of electric motors, magnetic wire is wrapped in the motor in a tight coil. In general, tighter and closer winding of the wire allows more wire to be inserted in a motor of a given size. This generally allows a greater operating efficiency, or space factor. There is an ever-increasing need for motors of even higher efficiency to satisfy energy conservation goals, particularly with hermetic motors used in air conditioners and refrigerators. To meet this end, even more magnetic wire is installed in a motor to achieve a higher space factor.
Prior to assembly, wires are lubricated to minimize friction. This has been accomplished in the past by coating the wire with lubricants such as liquid paraffin. Paraffin has established itself as a preferred external lubricant on magnetic wire to promote windability and insertion in electric motor stators, particularly when used with conventional chlorofluorocarbon (CFC), hydrochlorofluorocarbons (HCFCs), or hydrocarbon (HC) refrigerants. The mechanism by which paraffin promotes windability and insertion is its effectiveness in reducing the wire-to-wire coefficient of friction (COF).
Recent mandates to eliminate CFC refrigerants and other ozone depleting substances require refrigeration compressor manufacturers to convert to non-ozone depleting refrigerants such as hydrofluorocarbons. One example of an HFC is 1,1,1,2-tetrafluoroethane (R134a). This refrigerant exhibits different chemical compatibilities than conventional CFC refrigerants. See, for example, S. G. Sundaresan, W. R. Finkenstadt, Polyalkylene Glycol and Polyolester Lubricant Candidates for Use With HFC-134a in Refrigeration Compressors, ASHRAE Transactions 1992, Vol. 98, Pt. 1, AN-92-5-3. As a result, compatibility investigations have determined that a variety of process fluids conventionally used in compressor manufacturing and operation can no longer be used with these non-ozone depleting refrigerants in view of their differing chemical compatibilities.
Testing of compressors with R134a indicates that serious problems may occur if paraffin is used as an external lubricant to promote the windability of magnetic wire in motor stators. Because paraffin is insoluble in R134a, residues of paraffin can detach from the magnetic wire and get transported to and deposited in critical orifices in the compressor, and thus, block the opening of the compressor valve, the refrigerant expansion valve, or other capillaries. This often leads to compressor failure. Consequently, the use of paraffin as a magnetic wire lubricant in conjunction with the use of non-ozone depleting refrigerants, such as R134a, for example, is undesirable.
Alternate external lubricants have been developed in conjunction with internal lubricants. These lubricants are generally baked into the wire coating to further reduce wire-to-wire COF. These external lubricants are generally based on esters of fatty acids and/or pentaerythritol. Although effective, these lubricants can be quite costly, or require the use of uneconomical and/or hazardous solvents for application.
There is also a need to minimize emissions from manufacturing plants. Conventional lubricants such as paraffin are dissolved in organic solvents, which not only constitute a flammability and potential health hazard, but also increase total air emissions. Water-based lubricants have not been successfully implemented due to ineffective lubrication of the wire or poor processing characteristics, such as poor wettability of applicator felts. As a result, it is also desirable to develop a water-based lubricant that can decrease wire-wire COF, while also being soluble in non-ozone depleting refrigerants, such as R134a, over a wide temperature range.
Thus, there is a particular need for a lubricant blend that imparts a coefficient of friction (COF) value to magnetic wire that is comparable to a magnetic wire to which a paraffin lubricant is applied, but which unlike paraffin lubricant is compatible with non-CFC containing refrigerants. Furthermore, there is a need for a lubricant blend has good lubricity, good processing characteristics and good wettability characteristics in addition to a good solubility in refrigerants.
In a first aspect, the present invention relates to a lubricant blend comprising an emulsion comprising:
(i) an organic phase comprising at least one lubricant, a solvent in which the at least one lubricant is soluble and optionally at least one surfactant, wherein which promote magnet wire lubricity, wherein the at least one lubricant has a solubility in an HFC refrigerant of at least about 0.2% by weight at 0xc2x0 C. and greater than 0.1% in a blend of 2 parts HFC refrigerant and 1 part of a synthetic oil at xe2x88x9220xc2x0 C. (referred to later as xe2x80x9cspecial solubility characteristicsxe2x80x9d); and
(ii) an aqueous phase comprising at least one surfactant which forms an emulsion between the organic phase and the aqueous phase and exhibiting the same solubility as the at least one lubricant.
The synthetic oil is a refrigeration grade synthetic oil, such as a polyolester oil or a polyalkylene glycol oil, with suitable solubility characteristics in an HFC refrigerant.
Preferred lubricants include fatty acid esters, such as alkyl stearyl esters. Especially preferred as the lubricant is methyl stearate.
The surfactant which forms an emulsion with the lubricant is preferably a mixture of a non-ionic surfactant having a lower hydophilic/lipophilic balance (HLB) of between 1 and 7 and a non-ionic surfactant having a higher HLB of between 7 and 12.
The solvent is generally a hydrophobic solvent and more preferably a hydrocarbon.
In a second aspect, the invention relates to a method for making a lubricant blend comprising the steps of:
dissolving at least one lubricant and optionally one or more surfactants having an HLB value of 1 to 7, both of which have a solubility in a non-CFC containing refrigerant of at least 0.2% at 0xc2x0 C. into a hydrophobic solvent and into a first surfactant having an HLB value of 1 to 7 to form a first organic phase mixture;
admixing the organic phase mixture with an aqueous solution comprising 0.5 to 2% of a second surfactant having an HLB value of 7 to 12, with a solubility in a HFC refrigerant of at least 0.2% at 0xc2x0 C. and greater than 0.1% in 2 parts HFC refrigerant/1 part HFC soluble synthetic oil at xe2x88x9220xc2x0 C., the proportion of the organic phase mixture and the aqueous phase mixture being such that the ratio of the hydrophilic and hydrophobic surfactant is 0.5 to 2;
mixing the organic and aqueous phases to form a stable emulsion.
In a preferred embodiment, the organic and aqueous phases are admixed by sonication.
In a third aspect, the invention relates to a compressor comprising an electric motor including a magnetic wire wrapped in a coil, wherein the magnetic wire is coated with the above-described lubricant blend.
In its most preferred aspect the lubricant blend comprises methyl stearate and polyethylene-polypropylene glycol copolymers in a suitable solvent. The lubricant blend may be water based and includes methyl stearate and hydrophilic and hydrophobic surfactants comprised of polyethylene glycol polymers, polypropylene glycol polymers, and copolymers thereof. The components are dissolved in a hydrophobic solvent and emulsified in water. Installation of the magnetic wire is eased by the wire-wire friction reduction achieved by these blends.
Unlike paraffin, the lubricant blends of the invention are soluble in non-ozone depleting refrigerants such as the HFCs and more particularly, 1,1,1,2-tetrafluoroethane (R134a), and standard compressor lubricants used in conjunction with R134a. Consequently, there is no danger of lubricant particles clogging critical orifices of the compressor during operation.


The aromatic formaldehyde condensation products, which are substantially colorless and water-soluble and contain sulphonate and/or carboxylate groups, are obtainable by adding agents which have a reducing action during and/or after the condensation reaction, and are suitable for the treatment of textiles and leather.

The present invention relates to aromatic formaldehyde condensation products which are substantially colourless and water-soluble and contain sulphonate and/or carboxylate groups.
Water-soluble aromatic formaldehyde condensation products are known per se (see Ullmanns Enzyklopadie der technischen Chemie (Ullmann's encyclopaedia of technical chemistry) Volume 16 (1979), pages 140 et seq.) and can be prepared by the processes reported on there or by processes such as are described, for example, in Houben-Weyl: "Methoden der organischen Chemie" (Methods of organic chemistry) Volume 14/2, pages 263-292, G. Thieme Verlag Stuttgart (1963), or in German Offenlegungsschrift 1,960,616 and German Offenlegungsschrift 1,961,369.
However, the known aromatic formaldehyde condensation products have a strong intrinsic colour, which has proved very disadvantageous, particularly when these products are used in the textile field.


An imaging lens module includes a fixed diaphragm and an optical module. The optical module includes first, second, third, fourth and fifth lenses arranged from an object side to an image side in a sequence of: the first lens, having a negative refractive power, a convex surface disposed towards the object side, and a concave surface disposed towards the image side; the diaphragm; the second lens having a positive refractive power and a convex lens disposed towards the image side; and the third lens; being a meniscus negative lens; the fourth lens, being a positive lens, and adhered with the third lens to form a composite lens; the fifth lens, having a positive refractive power, such that the imaging lens module is a lens module with the features of high imaging quality and high yield rate.

(1) Field of the Invention
The present invention relates to the field of optical lenses, and more particularly to an imaging lens module capable of providing excellent imaging effect.
(2) Description of the Prior Art
As digital imaging technologies used for optical lenses becomes extensively used, particularly used for digital carriers such as mobile phones, PC CAM, DSC or DVC, etc. The digital carrier tends to be miniaturized under the industrial research and development and market trend, and also emphasizes in the light, thin, short and small structure, high performance and scale of economic effect, and thus the lens module in the carrier also requires the miniaturization, and the development of imaging lens module is improved with such trend and manufacturers spare no effort to produce imaging lens modules with high quality in the severe industrial competition. However, a prior art generally uses a lens module composed of 3 or 4 lenses, and thus a high imaging quality cannot be achieved due to excessively large color difference and aberration, and the prior art is not applicable for high-end lenses. If the high imaging quality is maintained, the optical length will become longer, and a general small electronic carrier will be unable to take care of the space and quality at the same time due to the limitation of space.


An electric power supply system of an electrical vehicle includes a first battery, a battery controller managing the first battery, a second battery supplying second power having a voltage lower than a voltage of the first power, and a control electric power supply management device including a joining line that is able to draw a current from each of a first and a second power supply lines. The control electric power supply management device transmits, depending on a magnitude in voltage level between first and second voltages, one of the first and second powers to the battery controller from one of the first and second power supply lines via the joining line. The first and second voltages are respectively applied to the joining line from the first and second power supply lines when the currents are to be drawn from the first and second power supply lines, respectively.

The technology relates to an electric power supply system of an electrical vehicle.
In general, an electrical vehicle such as an electric vehicle (EV) or a hybrid electric vehicle (HEV) includes a high-voltage battery and a low-voltage battery. The high-voltage battery supplies electric power to a traveling motor, while the low-voltage battery supplies electric power to a control system of the electrical vehicle. The low-voltage battery also supplies the electric power to devices such as accessories of the electrical vehicle or auxiliary devices for an engine. The above-described electrical vehicle further includes a battery electronic control unit (battery ECU). The battery ECU manages charge and discharge of the high-voltage battery. The battery ECU monitors a state of the high-voltage battery. Non-limiting examples of the state of the high-voltage battery may include a voltage, temperature, a state of charge (SOC), and a state of health (SOH). The battery ECU provides information relating to the state of the high-voltage battery to a vehicle controller. The information relating to the state of the high-voltage battery includes, for example, information as to whether the high-voltage battery is chargeable or not, or information as to whether the high-voltage battery is dischargeable or not.
A control system of the electrical vehicle including the battery ECU receives electric power from the low-voltage battery for its operation. However, such a configuration may cause a situation that, when a remaining amount of the electric power charged in the low-voltage battery is reduced, and thereby the electric power is no longer supplied to the control system of the electrical vehicle, the electrical vehicle is caused to stop its system even when electric power still remains in the high-voltage battery.
In order to overcome such a situation, Japanese Patent No. 5010288 describes, in paragraph 0018, a technique of avoiding electric power depletion in the low-voltage battery during execution of a failsafe control in a hybrid vehicle. In this technique, when a hybrid control unit determines that an output voltage of the low-voltage battery is lower than a predetermined voltage lower limit value, the hybrid control unit causes a converter to be switched to be in an operation state, to thereby execute an emergency control that performs charging from a high-voltage battery to the low-voltage battery.

Electric power supply system of electrical vehicle


An improved nebulizer places a venturi in a rainfall chamber and in close proximity to or inside a patient's oral cavity. One or more medicine feed lines feeds the medicine to a location proximate to a venturi. The rainfall chamber contains a sump communicating with the venturi for collecting medication not delivered to the patient and for recycling that medication for delivery to the patient. A medicine receiver may be pre-filled with a standard unit dose of medication.

1. Field of the Invention
The invention is directed to nebulizers and, more particularly to intra-oral nebulizers.
2. Description of the Prior Art
Inhalation is a very old method of drug delivery. In the twentieth century it became a mainstay of respiratory care and was known as aerosol therapy. Use of inhaled epinephrine for relief of asthma was reported as early as 1929, in England. Dry powder inhalers have been utilized to administer penicillin dust to treat respiratory infections. In 1956, the first metered dosed inhaler was approved for clinical use.
The scientific basis for aerosol therapy developed relatively late, following the 1974 Sugar Loaf conference on the scientific basis of respiratory therapy.
A more complete history of the development of aerosol therapy and the modem nebulizer is described in the 2004 Phillip Kitridge Memorial Lecture entitled, "The Inhalation of Drugs: Advantages and Problems by Joseph L. Row; printed in the March 2005 issue of Respiratory Care, vol. 50, no. 3.
The typically used modem nebulizer is delivered as a kit of seven plastic pieces which are assembled prior to use to provide for delivery of the medication to a patient via inhalation. An exploded view of the seven pieces showing their relationship for assembly is given in FIG. 1. There is a mouthpiece 100 that is force fit onto one end of a T connector 110. Similarly, the other end of the T connector 110 is attached to a flex tube 120, also by force fit. The parts are such that the components can be assembled and disassembled with a simple twisting action. Nevertheless, when engaged and pressed together, the pieces form a substantially airtight seal. The bottom part of the T connector 110 is connected to a cup cover 130. That, too, is connected by pushing the cup cover onto the bottom part of the T connector in such a way that the airtight seal is formed. The cup cover 130 has a screen 135 that screens the material going into the T connector. There is a cup 150 for receiving the medicine to be nebulized. The cup also has a venturi projecting through the bottom.
In a typical use, a vial containing the medication for administration through the nebulizer is opened and poured into the cup 150 where it accumulates at the edges of the rounded bottom of the cup. The venturi is surrounded by a conical plastic piece through which it passes. The shape of the conical piece of the medicine cup 150 matches substantially the shape of the venturi cover 140. Once the medicine is poured into the cup, the venturi cover 140 is placed over the venturi and the filled medicine cup is screwed, using threaded portions on each piece, onto the cup cover 130. In this way, the medicine is held in place ready for administration.
In use, the bottom of the airline feeding the venturi in the medicine cup is attached to an air hose 160, to which is applied to a source of air pressure thus activating airflow through the venturi. By venturi action, the exhaust of the air flow through the small opening of the venturi results in a reduction in pressure on the downstream side of the airflow so that the medicine from the medicine cup is fed under positive pressure up in the interstices between the conical shape of the medicine cup and the venturi cover and is exhausted then through the screen 135 into the bottom of the T connector 110.
A patient is asked to inhale the aerosol mist provided through the cup cover screen into the airflow channel between the mouthpiece 100 and the flex tube 120. As a patient takes the mouthpiece 100 in their mouth, and inhales, air flows through the open end of the flex tube 120, through the T connector 110, picking up the aerosol medication and into the patients' air passages through the mouthpiece 100.
3. Problems of the Prior Art
Table 8 of the Respiratory Care article, referred to above, page 381, lists the characteristics of an ideal aerosol inhaler as follows:
TABLE 8Dose reliability and reproducibilityHigh lung-deposition efficiency (target lungdeposition of 100% of nominal dose)Production of the fine particles ≦5 μm diameter,with correspondingly low mass mediandiameterSimple to use and handleShort treatment timeSmall size and easy to carryMultiple-dose capabilityResistance to bacterial contaminationDurableCost-effectiveNo drug released to ambient-airEfficient (small particle size, high lung deposition)for the specific drug being aerosolizedLiked by patients and health care personnel
The standard nebulizer shown in FIG. 1, fails to achieve a number of these characteristics. Specifically, the nebulizer of FIG. 1 wastes medication during exhalation. Further, the particle size is often too large to reach the bottom of the lungs where the medication may be most needed. There is difficulty in estimating the dose of the drug being given to a patient and there is difficulty in reproducing that dose. There is a possibility of contamination when opening the initially sterile kit, poring medication into the cup, and assembling the pieces for use by a patient. There is also considerable inefficiency in the medication delivery, with much of it being deposited in the throat, rather than in the lungs.

Intra-oral nebulizer with rainfall chamber


A data processing system using a main processor 8 and a coprocessor 10 provides coprocessor load instructions (USALD) for loading a variable number of data values dependent upon alignment into the coprocessor 10 and also specifying data processing operations to be performed upon operands within those loaded data words to generate result data words. The specified coprocessor processing operations may be a sum of absolute differences calculation for a row of pixel byte values. The result of this may be accumulated within an accumulate register 22. A coprocessor memory 18 is provided within the coprocessor 10 to provide local storage of frequently used operand values for the coprocessor 10.

1. Field of the Invention
This invention relates to data processing systems. More particularly, this invention relates to data processing systems incorporating both a main processor and a coprocessor.
2. Description of the Prior Art
It is known to provide data processing systems incorporating both a main processor and a coprocessor. Examples of such data processing systems are those of ARM Limited, Cambridge, England, which provides main processors such as the ARM7 or ARM9 that may be combined with a coprocessor, such as the Piccolo coprocessor, for performing functions such as specialised digital signal processing operations. Further examples of coprocessors may be floating point arithmetic coprocessors and the like.
Coprocessors are often used to provide additional functionality within a data processing system that is not required in the basic system, but may be useful in certain circumstances when the additional overhead of providing a suitable coprocessor is justified. Particularly demanding data processing environment are those that involve digital signal processing, such as video image manipulation. The volumes of data that require processing in such applications can be high. This presents a challenge to provide data processing systems able to cope with the volume of processing necessary whilst simultaneously having a relatively low cost and low power consumption.
One approach to dealing with such computationally intensive applications is to provide special purpose digital signal processing circuitry. Such special purpose circuitry can have an architecture specifically adapted to perform a relatively restricted range of processing operations, but at a relatively high speed. As an example, multiple data channels may be provided to stream data into and out of the relevant circuit portions in parallel. Whilst such an arrangement may be able to cope with the high data processing volumes required, it generally has the disadvantage of being inflexible. This inflexibility may mean that a relatively minor change in the algorithm it is desired to execute could require expensive corresponding hardware changes. This contrasts with a general purpose processor which is generally designed from the outset to be able to execute an enormous variety of different algorithms.


An improved enclosed multi-purpose utility table adaptable for mounting on a horizontal fence railing or for resting on a floor surface or wheelable on a floor surface. The table includes a rectangular base member with a pair of stationary secured end plates. A pair of bars are inserted in corresponding upper corner openings of the end plates and a cover sheet is mounted over the bars and end plates with the bottom ends of the sheet extending to the base member sides to allow each side of the cover sheet to be independently opened and closed. The bottom ends of the cover sheet are weighted and may be fitted into corresponding lower corner openings of the end plates when it is desired to maintain the cover sheet closed, flat and wrinkle free on either or both sides. A third bar is provided on the cover sheet, centered between the first and second bars with locking structure overlapping the three bars for maintaining the cover sheet in a fixed position to prevent any shifting of the cover sheet when it is opened on either or both sides of the table. The locking structure together with the overlapped three bars form a cradle to support either or both sides of the cover sheet when either or both sides are opened for access to the interior of the table. Various alternative leg support structure are provided on the backside of the base member. In one instance, where it is desired to mount the table on a fence railing, the leg supports are wrapped tightly to the vertical members of the railing to prevent the base member from tilting and multiple structure are provided on the underside of the base member to sandwich it to the top of the railing to prevent lateral sliding. In another instance, the leg supports are provided with stabilizing structure to allow the table to be free standing on a floor surface. In further instance, one of the leg supports can be provided with wheels and hand bar structure connected to the underside of the base member to allow for a hand held easily movable table on a floor surface.

The present invention relates to tables, and more particularly, to an enclosed table adapted for a variety of purposes. The table may be adapted for mounting on the horizontal top railing of an outdoor fence or may be arranged to be free standing on a floor surface or may be provided with wheel and hand bar means to permit easy movement of the table on a floor surface. The variety of purposes to which the table may be used is enhanced by a unique cover design and an enhanced load supporting capability. The cover can be opened from both sides and thereby may be used buffet style for lawn parties and when used on floor surfaces may be moved about as might be required by caterers. It can also be used as a terrarium and would be useful in quantity by nurseries because of its mobility. When mounted on a fence railing it can be used for patio parties and family cookouts and because of its easily operated cover it can protect from insects or the elements. Whether rail attached or free standing it can provide a separate area for beverages, juices, cups, salads, desserts etc.
A type of enclosed utility table known in the prior art is U.S. Pat. No. 4,986,505, which issued to joint inventors S. M. Zabawski and the present applicant, E. L. Dombroski. The enclosed patio table disclosed in this patent provides a table for mounting on the horizontal top railing of an outdoor fence but has no provision for allowing it to be free standing or moveable on a floor surface as is the case in the present invention.
Additionally, the Zabawski et al patent discloses a utility table with a cover enclosure composed of rigid plates connected to a rigid side plate which may be formed from glass like material whereas the enclosed utility table of the present invention provides a light weight cover sheet which is not fixed to a side of the table but instead a cradle like locking arrangement is provided for maintaining the cover sheet in a fixed position.
Further, the cover enclosure of the Zabawski et al patent is limited to being opened only on one side whereas the arrangement of the present invention permits the cover sheet to be opened on either or both sides of the table.
Still further, one side of the cover enclosure of the Zabawski et al patent when fully opened is placed against the other side of the cover enclosure thereby precluding the ability to open the other side of the cover enclosure whereas the cradle like arrangement of the present invention which maintains the cover sheet in a fixed position is used to support either or both sides of the cover sheet when either or both sides are opened for ready access to the interior of the table.
Even further, the frame of the Zabawski et al patent provides a complex clamping mechanism which includes clamping brackets slidably mounted on threaded rods for maintaing the table engaged with a horizontal fence railing whereas the present invention simply provides a series of peg supports on the underside of the table for maintaining the table engaged with the horizontal fence railing. The table of the present invention includes leg supports with simple wrap means for wrapping the leg supports against the vertical members of the railing to prevent tilting of the table. Such an arrangement is neither shown nor disclosed in the Zabawski et al patent.
Another advantage of the present invention not found in the prior art is the provision of weighted means attached to the bottom ends of the cover sheet which when placed in corresponding corner openings of the end plates of the table maintains the cover sheet closed, flat and wrinkle free and when removed from the openings allows the cover sheet to be opened on either side of the table for ready access to the interior of the table.
Accordingly, it is an object of the invention to provide a new and improved multi-purpose utility table.
Another object of the invention is to provide a new and improved enclosed utility table which may be mounted on a horizontal fence railing or may be adapted for resting or wheelably moveable on a floor surface.
Still another object of the invention is to provide a new and improved enclosed utility table which uses a cradle like arrangement for maintaining the enclosure sheet in a fixed position.
A further object of the invention is to provide a new and improved enclosed utility table in which the enclosure sheet may be opened on either or both sides of the table.
Still a further object of the invention is to provide a new and improved enclosed utility table for mounting on top of a fence railing with simplified means to prevent lateral sliding of the table.
An even further object of the invention is to provide a new and improved enclosed utility table for mounting on a fence railing with leg means tightly wrapped to the vertical members of the railing to prevent the table from tilting.


A warning system for displaying a warning that a device unit is in use includes a sign unit configured to display warning information. A device unit includes a communication module configured to provide a wireless communication between the device unit and the sign unit such that when the device unit is activated, the communication module automatically transmits a wireless warning signal to the sign unit instructing the sign unit to display the warning information.

The present invention relates to local warning systems and, more particularly, to automatic warning systems for use with portable radiation emitting devices.
Safety regulations governing the use of radiation emitting devices, such as class 3b and 4 lasers, typically require that a warning, sign be placed outside the door of any room in which a laser is being used. The warning sign may be removed when the emitting device is not in use to reduce the risk that the sign may be ignored. A technician may place a passive (e.g., unlit) sign on the door when the device is in use, but such a device may not draw sufficient attention to be noticed at all times. The technician may leave the sign in place continuously, which can increase the risk that the sign may be ignored. Technicians may also forget to place the sign on the door at all, leading to non-compliance with safety regulations and increased liability.
Active warning systems for laser use are available and typically use a hardwired connection from the laser to a sign on an access door to the room or enclosure in which the laser is used. When the laser is on, the warning sign on the door is illuminated. These systems may incorporate locks for the door and beam interrupters for the laser that activate if the door is open. These systems can require significant installation preparation, particularly when the laser is relocated. Mobile or semi-mobile radiation emitting devices may be disconnected and reconnected to a warning system when they are moved from one room to another. This process can be cumbersome and can increase laser operator or set-up errors.

Warning systems, devices and methods for radiation emitting devices


A new and distinct cultivar of Kalanchoe plant named ‘Mayon’, characterized by its compact, upright and uniform growth habit; freely branching plant habit; dark green-colored leaves; uniform, freely and early flowering habit; red and pink bi-colored flowers; and excellent postproduction longevity.

The present invention relates to a new and distinct cultivar of Kalanchoe, botanically known as Kalanchoe blossfeldiana, and hereinafter referred to by the name 'Mayon'.
The new Kalanchoe is a product of a planned breeding program conducted by the Inventor in De Lier, The Netherlands. The objective of the breeding program is to create new freely-branching and freely-flowering Kalanchoe cultivars with attractive foliage and flower coloration.
The new Kalanchoe originated from a cross-pollination made by the Inventor in De Lier, The Netherlands in November, 2000, of a proprietary Kalanchoe blossfeldiana selection identified as 3810 (96), not patented, as the female, or seed, parent with a proprietary Kalanchoe blossfeldiana selection identified as 2303 (99), not patented, as the male, or pollen, parent. The cultivar Mayon was discovered and selected by the Inventor as a flowering plant from within the progeny of the stated cross-pollination in a controlled environment in De Lier, The Netherlands.
Asexual reproduction of the new Kalanchoe by vegetative terminal cuttings in a controlled environment in De Lier, The Netherlands since 2002, has shown that the unique features of this new Kalanchoe are stable and reproduced true to type in successive generations.


The antenna amplifier for mobile FM radio reception includes a signal amplifier, a controllable adjusting element having a PIN diode for impedance adaptation, and a control amplifier for regulating the adjusting element. The antenna amplifier has a compensation for the temperature response occurring as a result of very great differences (summer/winter) in ambient temperature, the PIN diode connection point is optimized, and the control range is maximized.

The existing art describes FM antenna amplifiers that are used for mobile reception in order to improve radio reception if antennas either are poorly adapted and/or possess low antenna efficiency. In the context of reception close to the transmitter, very high levels occur in the antenna amplifier and also in the car radio downstream. These high levels cause an intermodulation which interferes with reception if the frequency of an intermodulation product coincides with the reception channel that is selected. To prevent these kinds of interference, antenna amplifiers having a level setting element at the amplifier input are used. The result, when the preset control threshold is reached, is that the level at the output of the control element and the intermodulation products no longer rise even if the intermodulation products continue to increase, i.e. continue to rise. This applies, however, only to the control range implemented within the circuit. Above the control range, the output level rises to the same degree as the input level.
Amplifiers having these aforementioned features are known, and are exported e.g. to the United States. Such amplifiers are used in particular in motor vehicles that are intended for export to the United States. The known amplifiers have the following substantial disadvantages:
The magnitude of the controlled output level depends greatly on the ambient temperature. In addition, the control range—i.e. the range within which the output level remains constant as the input level rises—is insufficiently wide.
The result of the dependency on ambient temperature is that in a cold winter, when temperatures of e.g. −40° C. can occur at the antenna amplifier, the controlled output level will have a value different from that in a hot summer, when the temperature at the antenna amplifier can rise to approx. 90° C. The behavior of the reception system when passing through strong signal areas therefore depends on the season.
The inadequate control range means that the input level is damped by only a few decibels in the adjusting element. This yields almost no improvement in reception, since intermodulation is only slightly suppressed.
FIG. 5 shows the circuit diagram of an antenna amplifier according to the existing art in which the output level is regulated. The antenna amplifier has a signal amplifier V, a control circuit RS that controls a PIN diode, and an antenna adapter A having an input HF-E for the antenna signal and an output HF-A for the amplified signal. A small portion of the power of the output signal of signal amplifier V is diverted to a rectifier Dg, Rg, Cg. In control circuit RS, a rectified voltage Ub is amplified in a first operational amplifier stage OP1 and integrated in second stage OP2. The output signal controls a PIN diode PIN whose anode is connected to the positive voltage and has a high-frequency connection to ground by way of a capacitor. Diode PIN short-circuits the HF voltage to ground when it is completely conductive. The temperature dependency occurs in diode Dg of the HF rectifier. To ensure that the wide fluctuation range in the conducting-stage voltage that occurs here does not result in malfunctions, the value of the control threshold is selected so that the resulting rectified voltage is high compared to the temperature-related fluctuation range of the conducting-state voltage. With this known amplifier device, the object is achieved by the fact that the output voltage is picked off at the high point of a series oscillator circuit Ls/Cs, where the voltage is higher (because of the high impedance) than directly at the amplifier output. A high voltage is present at rectifier diode Dg, however, and causes an intermodulation problem there.
The size of the control range and thus the maximum damping achievable by way of PIN diode PIN depends here on the antenna impedance, which together with PIN diode PIN forms a voltage divider. The ratio of this voltage divider is high in order to yield a high level of antenna signal damping. This is achievable if the antenna's source impedance is high, but that impedance varies greatly in frequency-dependent fashion. As the impedance fluctuates, the damping frequency response that results at the maximum PIN diode current is also inhomogeneous.


The present invention provides a vacuum processing apparatus that allows easy exchange of processing chambers. A vacuum processing apparatus of the present invention has a processing chamber and a carrying-in-and-out chamber. The carrying-in-and-out chamber is fixed and located at a position above the processing chamber. The processing chamber can be lowered by a vertically moving mechanism. Therefore, the processing chamber is separated from the carrying-in-and-out chamber by lowering the processing chamber. A conveying means is connected to the processing chamber so that it is possible to easily convey the processing chamber after being removed from the carrying-in-and-out chamber. The operation for exchanging the processing chambers can be simpler than in the conventional systems.

1. Field of the Invention
The present invention generally relates to techniques of vacuum processing apparatuses.
2. Discussion of the Relevant Art
Reference numeral 101 in FIG. 5 shows a conventional vacuum processing apparatus. The vacuum processing apparatus 101 has a carrying-in-and-out chamber 110 and a processing chamber 130.
The processing chamber 130 is connected to the carrying-in-and-out chamber 110 in an airtight manner at a position above the carrying-in-and-out chamber 110 so that a substrate disposed inside the carrying-in-and-out chamber 110 can be carried into and out the inside of the processing chamber 130 without exposing the substrate to the outside air.
A plurality of substrates can be disposed inside the carrying-in-and-out chamber 110. The substrate subjected to etching inside the processing chamber 130 is returned from the processing chamber 130 to the carrying-in-and-out chamber 110; and thereafter, another substrate that has not been subjected to etching is carried into the processing chamber 130.
After repeating etching a number of times, the inside of the processing chamber 130 is contaminated by a processing gas. Therefore, after a set number of times of etching, etching is suspended. Then, the processing chamber 130 is removed from the carrying-in-and-out chamber 110, and a new processing chamber 130 is attached to the carrying-in-and-out chamber 110. After that, etching process is restarted.
The operation for removing a component attached to an exterior wall of the processing chamber 130 so as to separate the processing chamber 130 from the carrying-in-and-out chamber 110 is performed manually. Since the processing chamber 130 is disposed above the carrying-in-and-out chamber 110, people use steps or the like to perform the removing operation. However, since the processing chamber 130 is extremely heavy, the removing operation for the processing chamber 130 that is located in a high place has been dangerous.
In particular, due to recent increase in the substrate size, the processing chamber 130 also is getting larger, which makes an exchange operation of the processing chamber 130 significantly dangerous. The above-mentioned related art is disclosed in Japanese Patent Laid-Open Publication 2000-182967.
The present invention was achieved to solve the above problems in the conventional systems, and the object thereof is to provide a vacuum processing apparatus that allows an easy operation for exchanging processing chambers.


A lighting device for a vehicle comprises: a plurality of light source sections connected in parallel with each other; and a transformer for supplying an electric power to the plurality of light source sections. The transformer includes a primary coil and a plurality of secondary coils provided corresponding to the plurality of light source sections, for respectively supplying electric power to the corresponding light source sections. One end of each light source section is grounded and a semiconductor light emitting element is provided between one end and the other end of the light source section. The lighting device further comprises: a voltage detecting section for detecting voltages at the other ends of the plurality of light sources; and an output control section for controlling an electric current outputted from the transformer according to the voltage detected by the voltage detecting section.

1. Field of the Invention
The present invention relates to a lighting device for a vehicle.
2. Description of the Related Art
In a related art, a lighting device for a vehicle uses a light emitting diode element (for example, refer to JP-A-2002-231013). In some cases, a plurality of light emitting diode elements are used for the lighting device for the vehicle.
In the lighting device for the vehicle, from the viewpoint of securing safety, even when one light emitting diode element is out of order, it is desired that the other light emitting diode element is turned on as far as it is possible. However, in some cases, depending on a failure mode of the light emitting diode element, it is safer that all the light emitting diode elements are turned off. Therefore, in the lighting device for the vehicle, it is desired to conduct a lighting control depending on the failure mode.


A method for treating autoimmune and/or inflammatory diseases includes a step of identifying a subject having a gastrointestinal autoimmune/inflammatory disease. A fasting mimicking diet (FMD) is administered to the subject for a first time period.

Autoimmune diseases involve a miscommunication between innate and adaptive immunity and an imbalance between T lymphocytes populations, which play critical roles in the immuno-pathogenesis of many autoimmune/chronic inflammatory diseases1-3. It has been shown that both hyperactive innate immune response (i.e. macrophages and dendritic cells), imbalance between autoreactive associated effector cells (i.e. CD4+ Th1 and CD4+ Th17) and anti-inflammatory associated regulatory T cells (CD4+ Treg), and pro-inflammatory cytokine productions contribute to the pathogenesis of major gastrointestinal autoimmune/inflammatory diseases including Crohn's disease (CD), ulcerative colitis (UC), irritable bowel syndrome, celiac disease, microscopic colitis (collagenous and lymphocytic colitis), and Bejcet disease3-8. See also Table 1 for comprehensive list of autoimmune/inflammatory diseases5,8-11.
Current therapies for gastrointestinal autoimmune/inflammatory diseases are monoclonal antibodies or a combination therapy with monoclonal antibody and immunomodulatory treatment; however the efficacy of the monoclonal or the combination therapy are still controversial and its long-term safety still remains to be investigated12-14. Moreover, the limitation in the number of efficacious monoclonal antibodies, infusion reactions, immunogenicity, high-cost, and adverse events such as lymphoma or acute anaphylaxis limit their applications15,16.
Accordingly, there is a need for improved methods of treating autoimmune and/or inflammatory disease, and in particular for treating gastrointestinal autoimmune/inflammatory disease.

Fasting mimicking diet (FMD) as an immunoregulatory treatment for gastrointestinal autoimmune/inflammatory diseases


The present invention relates to a system (40) for air filter management, the system comprising a plurality of air filter devices (41a,b) and an air filter control station (42). Each air filter device (41a,b) is provided at an air filter arrangement in an air flow inlet to an industrial installation and comprises at least one filter medium capable of removing particulate material and/or airborne molecular contamination, AMC, from an air flow received at the air flow inlet. Each air filter device comprises a set of sensors arranged to gather sensor data representative of an operating state of the air filter arrangement, a microprocessor and a communication unit. The air filter control station (42) comprises communication unit arranged to receive operating state information from the plurality of air filter devices and a user interface for selecting an air filter arrangement of an air filter device. The air filter control station also comprises processing circuitry arranged to estimate a life expectancy of the selected air filter arrangement based on the operating state information received from an air filter device provided at the selected air filter arrangement and on operating state information received from one or more other air filter devices provided at other filter arrangements.

Many industrial installations require a large supply of intake air, e.g., to support a combustion process or to cool the industrial installation during operation. It is desirable to filter the inlet air for the purposes of removing various particles and/or gaseous matter and the like which may be entrained in the air, and thereby provide a better quality conditioned inlet air. For this purpose, industrial filter arrangements may be provided at the air flow inlet. The filters are arranged so that inlet air generally passes through a series of filters to remove the contaminants; contaminants that otherwise could cause damage that would reduce the life expectancy and performance of the industrial installation.
As can be appreciated, filters in such arrangements gradually accumulate matter from the air and as this matter accumulates on the filter the resistance to flow of air through the filter increases. Industrial filter arrangements are clogged up by particles trapped in the air filters but also by environmental conditions such as fog, rain, snow, and the like. The clogging may reduce filtration and operating efficiency while increasing the overall pressure drop. An increase of the pressure drop over the filter arrangement implies an inlet air pressure loss that may affect the operation and performance of the industrial installation.
In a typical industrial filter arrangement, a plurality of air filters are arranged in a sequential set up. The first filter is usually a coarse filter arranged to remove larger particles in the air. The pressure drop increase over such a coarse filter may be insignificant. An intermediary filter may be arranged to protect the air flow inlet from mid-size particles. The air quality reaching the industrial installation, e.g., a turbine, is determined through the use of a final filter arranged to collect particles of smaller sizes, e.g. saline particles. The problems with clogging is particularly true with final filters, where the gathering of small particles may alter the qualities of the filter in such a way that the air feed to the receiving industrial installation may be reduced resulting in a decrease in operating efficiency or requiring more energy to receiving fans to avoid such decrease in operating efficiency. In some ventilation systems, the flow to the receiving installation is not allowed to change, thus requiring increased energy to the fans when upon reduced throughput in the filters.
Combustion turbine power plants, e.g., gas turbine power plants, are examples of industrial installations that require a large supply of intake air to support the combustion process. Other examples worth mentioning are turbine powered compressor stations or turbine powered mechanical drives. In order to protect a combustion turbine from impure air with dust particles, salt, and other contaminants that may damage the compressor blades and parts of the power plant equipment, air filter arrangements are provided at the air flow inlet to the combustion turbine.
A filter has a certain lifespan during which it functions adequately. The lifespan depends on different factors such as particle density in the air, the flow of air etc. There is a cost involved in exchanging a filter. This cost can comprise different parts such as the cost for the filter itself, the cost for the transport of the filter, the cost of the work required to exchange the filter or other environmental costs such as the carbon dioxide footprint etc. From a filter cost perspective, the filters should be used as long as possible until their technical lifetime has come to an end, e.g., at a time when a pressure loss over the filter results in inadequate air supply in support of the combustion process. Historically, the performance of the air filters in industrial applications, such as in conjunction with plants, has been mostly estimated relative to the efficiency (separation capability) and pressure loss (pressure drop) without taking the cost aspects of filter change into consideration. However, a problem when trying to benefit from the full technical life span of a filter is that the increased clogging of the filter and the related pressure loss induces increased energy consumption during operation. There exists known ways of determining the cost for the increased energy consumption due to operation with a clogged filter.
U.S. Pat. No. 6,009,404 discloses a method and device for cost-oriented monitoring operation of a filter arrangement. A plurality of sensors is used to obtain information relevant for determining an operating state of the filter. An evaluation unit is provided wherein information gathered in the sensors is processed and used to determine operating costs associated with the determined operating state of the filter.
SE537506 describes a method of determining an optimal time for operating a filter in a ventilation system in order to save costs and leave as little carbon dioxide footprint as possible. The method is based on obtaining information on environmental impact for manufacturing a new filter, information on environmental impact from using the present filter and information relevant for determining an operating state of a filter. An optimal lifetime for a filter in the ventilation system is determined based on this information. Thus, a life-cycle cost analysis is provided wherein environmental aspects are taken into account.
While the mentioned prior art provides decision support systems for determining an optimal filter use time for a specific type of filter in a given application, the optimal filter use time is based on estimates from current conditions in the specific industrial installation. Current conditions may be established with high accuracy, but there is a lack of actual data for continued operation of the filter arrangements and estimates for future operating states of the industrial installation may be quite unreliable. When considering the combustion turbine scenario, the main problem when using a filter with an inadequate operating state is not the increase of energy consumption for operating the combustion turbine, but a reduction in the output of the turbine. The impact of such a reduction in the output of the turbine is so significant that even a fairly moderate reduction in the operating state of a filter, may imply a high loss in production for a plant owner. Another problem for the plant owner is that an exchange of filter may require reduced operation during the time needed for the filter exchange.
For the above reasons, there is a need to improve air filter management and to provide accurate estimates of operational data for an air filter arrangement at an industrial installation.

System, method and computer program product for air filter management


A method for fabricating a semiconductor device, including forming gate patterns over a substrate, forming conductive layer covering top and sidewalls of each gate pattern, forming a metal layer for a silicidation process over the conductive layer, and silicifying the conductive layer and the gate patterns using the metal layer.

The present disclosure relates to a method for fabricating a semiconductor device, and more particularly, to a method for fabricating a semiconductor device including a silicide layer.
Improvement in the integration degree of a semiconductor device has reduced an area occupied by the semiconductor device while increasing resistances of gate patterns and word lines, which leads to deteriorated characteristics of the semiconductor device. Particularly, a non-volatile memory device performing a program/erase operation on a page basis has a program of decreased program/erase operation rate due to an increase in the resistance of word lines because the distance between each memory cell and a decoder is different. Therefore, conventional technologies seek to decrease the resistance by forming gate patterns and word lines by using a metal silicide layer having a low resistance value.
Hereafter, a conventional method for fabricating a gate pattern and drawbacks of the conventional method will be described with reference to the accompanying drawings.
FIGS. 1A to 1D are cross-sectional views describing a conventional method for forming gate patterns. Referring to FIG. 1A, gate patterns 11 are formed over a substrate 10. The gate patterns 11 may be gate patterns of a Dynamic Random Access Memory (DRAM) device or gate patterns of a non-volatile memory device. In the case of a gate pattern of a DRAM device, the gate pattern includes a gate insulation layer and a gate electrode. In the case of a gate pattern of a non-volatile memory device, the gate pattern includes a tunnel insulation layer, a charge trapping layer, a charge blocking layer, and a gate electrode. Herein, only a gate electrode is illustrated for the sake of convenience in description.
Subsequently, an interlayer dielectric layer 12 is formed over the substrate with the gate patterns 11 formed therein and a planarization process is performed until the uppermost surface of each gate pattern 11 is exposed.
Referring to FIG. 1B, the interlayer dielectric layer 12 is etched back to expose the upper portion of each gate pattern 11. Herein, the etched interlayer dielectric layer is denoted with a reference numeral 12A.
Referring to FIG. 1C, a metal layer 13 is formed over the substrate with the gate patterns 11 having an exposed upper portion.
Referring to FIG. 1D, the upper portion of each gate pattern 11 is silicified by having the metal layer 13 react with the upper portions of the gate patterns 11 through a thermal treatment. Herein, the gate patterns having a silicified upper portion are denoted with a reference numeral 11A. Subsequently, unreacted metal layer 13 is removed during the thermal treatment.
According to the conventional technology described above, the upper portion of each gate pattern 11, which is a gate electrode, may be metal-silicified. However, the width W of the gate electrode decreases due to a procedural limitation, while the gate patterns 11 are formed and silicified. The decreased width W of the gate electrode increases not only the resistance of the gate electrode, but also the surface resistance of word lines as well, thereby deteriorating the read/write rate of a DRAM device or the program/erase rate of a non-volatile memory device.
Hereafter, problems of conventional technology for forming gate patterns will be described specifically with reference to FIGS. 2A to 2C.
FIG. 2A illustrates a cross section of an intermediate resultant substrate with gate patterns 21 having the upper portion exposed by performing an etch-back of an interlayer dielectric layer 22. FIG. 2A corresponds to FIG. 1B described before.
As illustrated, during the etch-back process of the interlayer dielectric layer 22, the margins of a gate pattern 21 (see region labeled B in FIG. 2A) is damaged. In other words, silicon (Si) of the gate electrode is lost. In this case, the gate electrode lacks an adequate silicon source and a silicidation reaction is not performed sufficiently during a subsequent silicidation process.
In particular, the width of the upper portion of the gate electrode is decreased due to the damage of the gate pattern 21. Accordingly, the upper portion of the gate pattern 21 comes to have a conical shape (see region labeled A in FIG. 2A), thus increasing the resistance of the gate electrode.
Also, the surface of the gate pattern 21 may be damaged by a plasma gas during the etch-back process of the interlayer dielectric layer 22, and an impurity layer (see reference indicator C in FIG. 2A) may be formed on the surface due to impurities.
FIG. 2B illustrates a cross section of an intermediate resultant substrate with a metal layer 23. The drawing corresponds to FIG. 1C. As illustrated in the drawing, when the metal layer 23 is formed over the gate pattern 21 with its upper portion whose width is decreased, the metal layer 23 is not uniformly deposited over the upper portion of the gate pattern 21. Rather, it is deposited disproportionally on one side, which is a problem.
FIG. 2C illustrates a cross section of the upper portion 24 of a gate pattern 21A. The drawing corresponds to FIG. 1D. As described above, since the width of the upper portion 24 of the gate pattern 21A is decreased by the damage during the etch-back process, the gate electrode lacks an adequate silicon source to be used during a silicidation process. Accordingly, the width W1 of the upper portion 24 of the gate pattern 21A is decreased even more, thereby increasing the resistance of the gate electrode. As a result, the surface resistance of word lines increases, and the read/write operation rate of a DRAM device or a program/erase operation rate of a non-volatile memory device is decreased.
When an impurity layer (see reference indicator C) is formed over the surface of the upper portion of the gate pattern 21 during the etch-back process of the interlayer dielectric layer 22, impurities permeate during the silicidation process and inhibit the silicidation of the gate pattern 21.
Also, when the uppermost portion of the gate pattern 21 has a conical shape, the metal layer 23 is disproportionally deposited on one side of the upper portion of the gate pattern 21. Thus, there is a problem in that the gate pattern 21 inclines (see reference indicator D) or is broken (see reference indicator E).
In addition, to form a metal silicide layer having a small resistance value, the silicon of the gate pattern may be amorphous or of a small grain size. However, a thermal treatment crystallizes the silicon or increases the size of the grains. Therefore, even though a metal silicide layer is formed, the quality of the metal silicide layer is poor, and thus, the surface resistance increases.
The aforementioned problems become worse as the integration degree of a semiconductor device increases. At a high integration degree, the width of the gate pattern 21 is decreased, and thus, relatively more silicon is lost during the etch-back process. Thus, the silicidation process is not performed smoothly due to lack of the silicon source. Moreover, since the width of the upper portions 24 of the silicified gate patterns 21A are decreased, the chances that the upper portions 24 of the silicified gate patterns 21A become inclined or broken are high. In sum, as the integration degree increases, the imbalance in line width of the silicified gate patterns 21A becomes severe due to procedural limitations, and this leads to a problem of increased resistance values.
FIG. 2D shows a picture of the gate patterns inclining according to conventional technology. As illustrated in the drawing, the lack of silicon source and the unbalanced deposition of the metal layer 23 decreases the width of the gate patterns and makes the gate pattern incline.

Method for fabricating semiconductor device


In accordance with the present invention, the method of manufacturing a vacuum chamber which is used as a cluster tool, a vacuum film-forming apparatus, or the like of a manufacturing apparatus used for semiconductors, liquid crystals, solar cells, and the like, and which is formed by a vessel in which an opening (4A) is provided at one surface for forming a cover, and a hole (4) smaller than the opening (4A) is provided in an opposite surface to the opening (4A), includes the steps of:. by using a forging press which is provided with an outer die (3) and an inner die (2) for die forging a material (1-1), PA1 cutting the material to dimensions suitable for the die forging of the material (1-1) which is made of a metal; PA1 heating the material (1-1) to a temperature for die forging; PA1 placing the heated material (1-1) in the outer die (3) of the press, and pressing the inner die (2) against the material (1-1) by the forging press to effect forging; and PA1 subjecting the forged material to machining into a predetermined configuration.

1. Related Art
The present invention relates to a method of manufacturing a vacuum chamber which is used as a cluster tool, a vacuum film-forming apparatus, or the like of a manufacturing apparatus used for semiconductors, liquid crystals, solar cells, and the like, and which is used as an apparatus for manufacturing semiconductors, liquid crystals and the like, the pressure within the vacuum chamber being determined by its application and purpose in a range from a low vacuum close to the atmosphere to an ultra-high vacuum. More particularly, the present invention relates to novel improvements for manufacturing a vacuum chamber by forging.
2. Related Art
As the conventional methods of manufacturing a chamber of this type, a method in which a rolled plate-shaped material 10 to machining as it is, as well as a method in which the chamber is fabricated with a welded structure, are known.
With the conventional machining method, as shown in FIG. 6, since a fibrous structure 13 is formed along the rolling direction of the plate material 10, very small spaces exist in the direction of the fibers, and the very small spaces are liable to occur on machined surfaces facing the vacuum. Since the portion indicated at reference numeral 12 at the inner surface of a vacuum chamber 11 is a perpendicularly sectioned portion of the fibrous structure 13, and the very small spaces are deeply entrapped inside the material, the following problems are encountered.
In a case where the chamber is used as a vacuum chamber, the very small spaces result in an increase in the amount of gas released from the interior of the material and in lengthened release time.
Further, if water, contaminants, or the like has entered the very small spaces, they are difficult to be removed even under a vacuum condition, and the time until a required degree of vacuum is reached by the continuous discharging of air by a vacuum pump is appreciably delayed.
For this reason, the time until the processing of wafers or the like inside the chamber becomes possible is delayed (leads to a reduction in throughput). This constitutes a cause which deteriorates the performance of the vacuum chamber.
In addition, with the method in which the vacuum chamber is fabricated with a welded structure, very small cracks are liable to occur in the welds, and there occurs the phenomenon in which the gas fused in the beads during welding is emitted under vacuum for a long time, and adverse effects are often exerted on the performance of the vacuum chamber in the same way as described above. With the conventional machining method in which the rolled plate-shaped material is subjected to machining as it is, since a fibrous structure 13 is formed along the rolling direction of the plate material as shown in FIG. 6, very small spaces are exposed to the inner surfaces of the vacuum chamber as perpendicularly sectioned portions of the fibers, and the very small spaces are liable to be produced on the machined surfaces.
In an application to the vacuum chamber, as described above, these very small spaces cause an increase in the amount of gas released from the interior of the material, and water, contaminants and the like which entered the vary small spaces are difficult to be removed under a high vacuum, thereby exerting adverse effects to the performance of the vessel.
In addition, in recent years the apparatus tends to become larger in size.
For example, the diameters of silicon wafers processed by a semiconductor manufacturing apparatus are shifting from 8 inches (about 200 mm) to 12 inches (about 300 mm), and the manufacturing apparatus is becoming large correspondingly. For this reason, in cases where the chamber is fabricated by cutting out a plate material, the amount of material to be removed from the interior of the chamber is large, so that the manufacturing cost is tending to become high.
Furthermore, with the method in which the vacuum chamber is fabricated with the welded structure, very small cracks are liable to occur since the welds are even longer in conjunction with the need for the large-sized chamber, and adverse effects are often exerted on the performance of the vacuum chamber.


A system for purging high purity interfaces connecting a high purity chemical container to process lines comprises a first purging manifold, connected at one end to a first adapter manifold extending from the high purity chemical container, and connected at the other end either to a process tool, to a second high purity container, to a source of gas, or to a source of vacuum on one side, or to a source of vent or to a source of vacuum on the other side; and a second purging manifold connecting the second adapter manifold either to a source of push gas, a source of purge gas, or a source of vacuum; or to a source of vent. A related method comprises blowing purge gas through both the first and the second purging manifolds, and, optionally, applying vacuum to both purging manifolds.

1. Field of the Invention
The present invention concerns a system and a method for purging high purity interfaces. More specifically, the present invention concerns a manifold system and a method for purging interfaces connected to containers of high purity, low vapor pressure chemicals, wherein potential areas of entrapment of the low vapor pressure chemical are eliminated.
2. Description of Related Art
Certain manufacturing processes require the use of low vapor pressure chemicals at high purity levels. One example is semiconductor manufacturing, which requires the distribution of highly reactive, low vapor pressure chemicals in high purity conditions, in order to avoid unwanted contamination during the fabrication process and to maintain competitive process yields. These low vapor pressure chemicals include, among others, organo-metallic precursors such as tetrakis(dimethylamido) titanium (TDMAT), tetrakis(diethylamino) titanium (TDEAT), tantalum pentaethoxide (TAETO), copper hexafluoroacetylacetonate-trimethylvinylsilane (Cu(hfac)TMVS), tetramethyltetracyclosiloxane (TMCTS), tetraethyl ortosilicate (TEOS), and trimethylphosphate (TMP). Typically, these low pressure chemicals are stored in containers having a capacity varying from 100 milliliters to 200 liters, which are known by a variety of common and trade names such as "canisters," "ampoules," or "hosts", and are delivered to chemical vapor deposition (CVD) process tools, either by a direct liquid injection (DLI) process or by a "bubbler" process.
With DLI, the low vapor pressure chemical is delivered to a process tool by injecting a push gas (generally, an inert gas such as nitrogen or helium) through a first manifold into the container, in the headspace above the low vapor pressure chemical in liquid state. The increase in gas pressure inside the container causes the low vapor pressure chemical to be ejected from the container through a diptube immersed in the chemical and then through a second manifold connected to the container, and to be delivered eventually to the process tool, either directly, or by means of an intermediate, "refill" container.
With the "bubbler" process, a push gas (generally, an inert gas such as nitrogen or helium) is injected into the container through a first manifold connected to the container and through a diptube immersed in the low vapor pressure chemical in the container. Instead, the low vapor pressure chemical is supplied to the container as a liquid by means of pressurized gas delivery through a second manifold. The container is heated, in order to increase vapor pressure and to saturate the bubbling gas with vaporized chemical, and the bubbling mixture of gas and chemical is then ejected from the container through a third manifold and delivered to a process tool. The container needs to be refilled with the low vapor pressure chemical on a regular basis. A first container storing liquid low vapor pressure chemical may act as a "refill" container, providing a continuing supply of low vapor pressure chemical to the primary, "bubbler" container.
From time to time, it is necessary to replace and clean a container storing liquid low vapor pressure chemical, for instance, due to maintenance requirements, or due to decomposition of the low vapor chemical within the container, or for other reasons. Before detaching the container from the process chemical delivery lines, the low vapor pressure chemical must be completely removed from the points of connection between the manifold valves and the process lines. Typically, the low vapor pressure chemical is evacuated and purged through a multi-step procedure comprising sequences of blow cycles, which push the residual chemical into the container, and of vacuum cycles, which vaporize and remove the chemical particles trapped into the manifolds. Because of the high level of decontamination required, and because some liquid low vapor pressure chemical may remain trapped within the interstices, or dead spaces, of the system, this procedure is extremely time consuming and affects process yields significantly. Therefore, there is a need for a manifold system that can be purged with reduced cycle times.
Different invention have been disclosed in the prior art addressing the above needs to different degrees. U.S. Pat. No. 5,964,230 and U.S. Pat. No. 6,138,691, both to Voloshin et al., teach a solvent purging system that not only adds complexity to the purging procedure, but that also creates the additional requirement of expensive decontamination of highly toxic chemicals from the solvent.
U.S. Pat. No. 6,431,229 to Birtcher et al. discloses a solventless, purgeable, diaphragm valved manifold for low vapor pressure chemicals, comprising a block valve assembly that includes two diaphragm valves. There remains a dead space between the two valves in the valve block assembly, which complicates cleaning and which requires longer purge cycles in order to remove the chemical from that dead space.
U.S. Pat. No. 6,648,034 to Birtcher et al. teaches a purgeable manifold for low pressure chemical containers, with similar features and drawbacks as the invention taught in U.S. Pat. No. 6,431,229.
U.S. Patent Application 2003/0131885 to Birtcher et al. discloses a cabinet for chemical delivery with solvent purging, which includes some of the features and drawbacks of the inventions disclosed in U.S. Pat. Nos. 6,138,691 and 6,431,229.
Japanese Patent JP 2004-063833 A to Yoshitome Koichi teaches a low pressure chemical supply system for use in a CVD process, comprising a manifold block fed by entry and exit valves and containing a bypass route with two additional valves. While this invention appears to offer process improvements over the invention disclosed in U.S. Pat. No. 6,431,229, this supply system still contains dead spaces where the low pressure chemical may be trapped, requiring extended purge cycles.
None of the above inventions appears to disclose a system or method for purging high purity interfaces that eliminates dead spaces and also costly specialty valves.

System and method for purging high purity interfaces


A wet photographic processing apparatus adapted for processing an imagewise exposed silver halide photographic material compsiring a support having thereon at least one light-sensitive silver halide emulsion layer, said processing comprising at least developing step followed by at least one of a washing step and a stabilizing step, said apparatus comprising: (i) a developing bath; (ii) at least one set of a plurality of washing baths in cascade connection to form countercurrent and/or a plurality of stabilizing baths in cascade connection to form countercurrent; (iii) means for filtering at least a portion of a washing and/or stabilizing solution drawn from a upstream bath among said plurality of baths, said filtering means including a reverse osmotic membrane apparatus filtering said washing and/or stabilizing solution to produce a filtrate; (iv) means for introducing the filtrate from said reverse osmotic membrane apparatus into a downstream bath among said plurality of baths; and (v) means, provided in said pipe, for shutting-off fluid flow between said upstream bath and said reverse osmotic membrane apparatus. The present apparatus prevents loss of processing solution and contamination of the washing baths upon suspension of operation of the processing apparatus.

In photographic processing of color photographic light-sensitive materials, there recently has been a demand to shorten the processing time to thereby also shorten delivery time and lighten laboratory working. The time required for each processing step can generally be reduced by raising the processing temperature or increasing the replenishment rate. In addition, intensification of agitation or the addition of various accelerators has often been proposed.
In particular, a method comprising processing a color photographic light-sensitive material containing a high silver chloride content emulsion having a high silver chloride content as the light-sensitive silver halide emulsion in place of a silver bromide emulsion or a silver iodide emulsion has heretofore been proposed for expediting color development and/or reducing the replenishment rate, as disclosed, e.g., in International Patent Application Disclosure WO87-04534 corresponding to U.S. Pat. No. 4,892,804 and EP 258288B.
Thus, the use of such a high silver chloride content emulsion or formulation of the developer reduces the development time in a conventional silver bromochloride emulsion system from 210 seconds (e.g., color processing CP-20 of Fiji Photo Film Co., Ltd.) to 45 seconds (e.g., total processing time of 4 minutes, such as color processing CP-40FAS of Fuji Photo Film Co., Ltd.). However, this development time can not be said to be at a satisfactory level as compared with other color processing systems (e.g., electrostatic transfer system, heat transfer system, ink jet system).
Therefore, it has been desired to develop a technique for rapid processing of a silver halide color photographic material which provides a remarkable reduction in total processing time by carrying out color development within 20 seconds, using a system which provides high image quality color prints at low cost.
As an approach for reducing the total processing time, a method which comprises developing a high silver chloride content emulsion with a color developer substantially free of benzyl alcohol to reduce the color development time to 25 seconds or less, and to reduce the sum of the color development time and the time required for blix and rinse and/or stabilization to 2 minutes or less is disclosed in JP-A-1-196044.
However, the above described approach used to reduce both the development time and expedite the entire processing, disadvantageously results in staining of the white background. It is considered that the reduction of development time increases the residual amount of coloring materials (e.g., dyes) in the light-sensitive material. Furthermore, reduction of the time alloted for the subsequent processing steps results in insufficient removal (e.g., washing away) of such coloring materials, to thereby result in staining of the white background. This tendency becomes more pronounced when the recent requirement for low replenishment rate is concurrently employed.
On the other hand, as another approach for inhibiting stain, a method which comprises treating the processing solution in the washing (with water) and/or stabilizing step by a reverse osmosis treatment is known as disclosed in JP-A-60-241053 and JP-A-62-254151. Furthermore, JP-A-3-214155 (corresponding to EP 438156B) discloses a method which comprises treating washing water and/or stabilizing solution in a rapid processing system using a reverse osmotic membrane. In these methods, undesired components (particularly fixing and blix components) can be removed from the washing water and/or stabilizing solution by osmosis filtration of these processing solutions, thereby possibly reducing adverse effects on the light-sensitive material.
The apparatus disclosed in JP-A-3-214155 is basically the same as an apparatus generally used for production pure water using a reverse osmotic membrane. The apparatus is the same as that shown in FIG. 2, except that valves 44, 46 and 48 are not provided. The reverse osmotic membrane (34) is equipped in a cylindrical form. Water in the contaminated processing solution permeates into the cylinder from outside the cylinder leaving concentrated water at the outside, and the permiating water flows out from the inside of the cylinder.
It was found that when only the above described reverse osmosis treatment is applied to the method for reduction of the washing and/or stabilizing time, particularly the time required for the entire sequence of rapid processing steps including color development and drying, sufficient photographic properties cannot be obtained. Consequently, it is difficult to sufficiently inhibit stain using reverse osmosis treatment alone.
Furthermore, even the approach disclosed in the above cited JP-A-3-214155 does not sufficiently accomodate expedition of the blix step or efficiency of removal by the osmotic membrane, leaving much to be desired in the reduction of the time required for the entire sequence of processing steps. For example, it was found that operation of processing machine equipped for reverse osmosis for a prolonged period of time, results in an undesired overflow of washing water or causing insufficient washing of the photographic material once the processing is suspended. The present inventors' study showed that this phenomenon can be explained by the following mechanism. After operation of the processing machine is suspended, pressure is no longer applied to the reverse osmotic membrane, causing osmosis at the osmotic membrane. In some detail, the processing solution (permeating water) inside the osmotic membrane cylinder migrates to the outside of the osmotic membrane cylinder, causing the contaminated water and the concentrated water of the contaminated water outside the reverse osmotic membrane cylinder to flow backward to the washing bath connected thereto through a pipe. Then, the amount of the washing water in the washing bath exceeds the capacity of the washing bath, causing an overflow. Since the washing bath is designed in a counterflow system, the washing water repeatedly overflows towards the prebath to reach the forefront bath from which the washing water eventually overflows.
Even if overflow occurs while operation of the apparatus is suspended to thereby maintain the liquid level, resumed operation of the apparatus causes the processing solution such as washing water to again pass into the reverse osmotic membrane apparatus to thereby lower the liquid level in the washing bath from which the contaminated water is introduced into the reverse osmotic membrane apparatus. The reduced amount of the washing water depends on the time during which the operation of the apparatus is suspended or the area of the reverse osmotic membrane. In the case where a 1.1 m.sup.2 DRA-80 membrane (Dicel Kagaku Kogyo K.K; polysulfon composite membrane) is used, the overflow of washing water was found to be 400 ml to 500 ml. When the operation of the processing machine is resumed, the washing water is first pumped into the reverse osmotic membrane apparatus until the inside of the osmotic membrane cylinder is filled therewith. Therefore, the bath from which the contaminated water has been taken out is deficient in washing water by 400 ml to 500 ml. Thus, if the replenishment rate is 60 ml/m.sup.2, 8 m.sup.2 of the light-sensitive material needs to be processed (8.9 cm wide.times.90 m long light-sensitive material) so that the specified amount of washing water is reached. During this period, the light-sensitive material is not sufficiently washed in this bath (reduction in the effective washing time), thereby causing increased occurrence of stain. Furthermore, the unexpected overflow during suspension of the operation of the apparatus is disadvantageous and contrary to reduced replenishment rate and waste liquid in small-sized processing baths. Moreover, the replenishment of washing water in a specified amount upon the resumption of the operation of the apparatus (to make up for loss in washing water) causes undesirable problems such as complicated working and installation of water pipe.
Thus, as the washing and/or stabilizing step is expedited, the fluctuation in the processing time due to the fluctuation in the liquid level cannot be neglected. In particular, the fluctuation in the processing time causes an increased occurrence of stain. Furthermore, since the intended washing water or stabilizing solution cannot be used for processing, the system is susceptible to an increased occurrence of stain.
It has been proposed to solve this problem by providing an air intake in the liquid circulation path so that the bath and the piping are separated from each other. However, even if this approach is employed, the reverse osmotic membrane still acts as a pump such that the problem of fluctuation in liquid level remains.


Nonadepsipeptides and methods for their preparation and their use for the production of medicaments for the treatment and/or prophylaxis of diseases, in particular bacterial infectious diseases are described.

The invention relates to nonadepsipeptides and methods for their preparation, as well as to their use for the production of medicaments for the treatment and/or prophylaxis of diseases, in particular bacterial infectious diseases.
The bacterial cell wall is synthesized by a number of enzymes (cell wall biosynthesis) and is essential for the survival and reproduction of microorganisms. The structure of this macromolecule, as well as the proteins involved in its synthesis, are highly conserved within the bacteria. On account of its essential nature and uniformity, cell wall biosynthesis is an ideal point of attack for novel antibiotics (D. W. Green, The bacterial cell wall as a source of antibacterial targets, Expert Opin. Ther. Targets, 2002, 6, 1-19).
Vancomycin and penicillins are inhibitors of the bacterial cell wall biosynthesis and represent successful examples of the antibiotic potency of this principle of action. They have been employed for several decades clinically for the treatment of bacterial infections, especially with Gram-positive pathogens. Owing to the growing occurrence of resistant microorganisms, e.g. methicillin-resistant staphylococci, penicillin-resistant pneumococci and vancomycin-resistant enterococci (F. Baquero, Gram-positive resistance: challenge for the development of new antibiotics, J. Antimicrob. Chemother., 1997, 39, Suppl A: 1-6; A. P. Johnson, D. M. Livermore, G. S. Tillotson, Antimicrobial susceptibility of Gram-positive bacteria: what's current, what's anticipated?, J. Hosp. Infect., 2001, (49), Suppl A: 3-11) and recently also for the first time vancomycin-resistant staphylococci (B. Goldrick, First reported case of VRSA in the United States, Am. J. Nurs., 2002, 102, 17), these substances are increasingly losing their therapeutic efficacy.
The present invention describes a novel class of cell wall biosynthesis inhibitors without cross resistances to known classes of antibiotics.
The natural product lysobactin and some derivatives are described as having antibacterial activity in U.S. Pat. No. 4,754,018. The isolation and antibacterial activity of lysobactin is also described in EP-A-196 042 and JP 01132600. WO04/099239 describes derivatives of lysobactin having antibacterial activity.
The antibacterial activity of lysobactin and katanosin A is furthermore described in O'Sullivan, J. et al., J. Antibiot. 1988, 41, 1740-1744, Bonner, D. P. et al., J. Antibiot. 1988, 41, 1745-1751, Shoji, J. et al., J. Antibiot. 1988, 41, 713-718 and Tymiak, A. A. et al., J. Org. Chem. 1989, 54, 1149-1157.


A two-stage hybrid cryocooler includes a first-stage Stirling expander having a first-stage regenerator having a first-stage-regenerator inlet and a first-stage-regenerator outlet, and a second-stage pulse tube expander. The second-stage pulse tube expander includes a second-stage regenerator having a second-stage regenerator inlet in gaseous communication with the first-stage regenerator outlet, and a second-stage regenerator outlet, and a pulse tube having a pulse-tube inlet in gaseous communication with the second-stage regenerator outlet, and a pulse-tube outlet. The second-stage regenerator and the pulse tube together provide a first gas-flow path between the first-stage regenerator and the pulse-tube outlet. A pulse tube pressure drop structure has a pulse-tube-pressure-drop inlet in gaseous communication with the pulse-tube outlet, and a pulse-tube pressure-drop outlet, and a gas volume is in gaseous communication with the pulse-tube pressure-drop outlet. A gas flow shunt provides gaseous communication between the first-stage regenerator and the pulse-tube outlet. The gas flow shunt provides a second gas-flow path between the first-stage regenerator and the pulse-tube outlet.

Some sensors and other components of spacecraft and aircraft must be cooled to cryogenic temperatures of about 77° K or less to function properly. A number of approaches are available to perform this cooling, including thermal contact to liquefied gases and cryogenic refrigerators, usually termed cryocoolers. The use of a liquefied gas is ordinarily limited to short-term missions. Cryocoolers typically function by the expansion of a gas, which absorbs heat from the surroundings. Intermediate temperatures in the cooled component may be reached using a single-stage expansion. To reach colder temperatures required for the operation of some sensors, such as about 40° K or less, a multiple-stage expansion cooler is often preferred. The present invention is concerned with applications requiring continuous cooling to such very low temperatures over extended periods of time.
One type of cryocooler used for such applications is a two-stage Stirling/pulse tube cryocooler. Stirling/pulse tube cryocoolers are described, for example, in U.S. Pat. Nos. 6,167,707 and 6,330,800. Briefly, a Stirling expander piston produces refrigeration in the first, warmer, stage. A pulse tube produces refrigeration in the second, colder, stage. Both stages are driven by a pressure wave generated by a reciprocating compressor connected to the inlet of the Stirling-expander first stage.
In the work leading to the present invention, two problems have been observed to limit the performance of the Stirling/pulse tube cryocooler. First, the efficiency falls with lower temperatures, particularly in the pulse tube second stage wherein the working gas is at the lower temperatures. Pulse tube losses consume about 25-40 percent of the gross refrigeration capacity. Second, the compressor pressure wave-to-piston motion phase angle is about ten degrees larger than required for optimal performance.
The Stirling/pulse tube cryocooler has great potential for use in sensor and other cooling applications requiring cooling to low temperatures, but there is a need to overcome these problems to improve its performance even further. The present invention fulfills this need, and further provides related advantages.

Stirling/pulse tube hybrid cryocooler with gas flow shunt


A power distribution system includes a plurality of node devices and a computer communicatively coupled to the node devices. The computer includes a memory area configured to store at least one operating parameter of each of the node devices, and a processor that is programmed to determine a desired operating limitation of the power distribution system to be optimized, calculate an effect on the operating limitation based on a modification of the operating parameter of at least one of the node devices, and transmit a command to the node device to cause the node device to modify the operating parameter.

The embodiments described herein relate generally to power distribution systems and, more particularly, to systems and methods for use in enhancing operation of power distribution systems.
As the demand for power has increased, the likelihood of brownouts and/or rolling blackouts has similarly increased. To reduce the likelihood of such events, at least some known power distribution systems initiate demand response events during periods of high energy demand to avoid overburdening the power grid. For example, some known power distribution systems use smart meters to monitor and to automatically modify power usage by a load, such as a consumer's home or a particular home appliance within a home. When at least some known smart meters receive a message from the utility that a demand response event has been initiated, the smart meter determines one or more loads that are drawing an excessive amount of power, is programmed to then automatically power off those loads or alert the owner of the excessive power draw in response to the demand response event. However, known devices reduce load on the power grid without considering the effect the load reduction can have on efficiency and/or delivery costs elsewhere in the grid. As such, the overall benefits of such devices may be limited by losses created elsewhere in the grid.

System, method, and apparatus for operating a power distribution system


An apparatus for failsafe disconnection of an electrical load has a first and at least one second safety switching device. The first safety switching device has a first evaluation and control unit, an output and an electronic switching element, for producing a potential-related switching signal at the out-put under the control of the first evaluation and control unit. The second safety switching device has a second evaluation and control unit and an input. The input and the output are connected to one another via a single-channel connecting line, and the input supplies the second evaluation and control unit with the potential-related switching signal from the output of the first safety switching device. In order to fulfill safety standards for such kind of apparatus, the second safety switching device has at least two input circuits to which the potential-related switching signal from the output of the first safety switching device is supplied in a mutually redundant manner.

The present invention generally relates to an apparatus for fail-safely disconnecting an electrical load, and more particularly to an apparatus having a first and at least one second safety switching device. The invention also relates to safety switching devices for use in such an apparatus.
Safety switching devices are particularly used in industrial production environments in order to reliably and safely disconnect machines, such as a hydraulic press or a milling machine, when this is necessary for the safety of operators, or for other reasons. Safety switching devices of this generic type typically have one or more input terminals, to which input devices such as emergency-stop buttons, two-hand operator buttons, guard doors or light barriers can be connected. An evaluation and control unit evaluates the input signals from these input devices in a failsafe manner and produces a switching signal on an output side as a function of them, once again in a failsafe manner. The switching signal controls actuators, in particular contactors, by means of which the machine is disconnected, once again in a failsafe manner.
The term "failsafe" in this context means that disconnection of the machine must be ensured in all circumstances, and even when a functional fault occurs within the chain comprising the input device, the safety switching device and the actuator. Safety switching devices must therefore be designed such that they ensure that the machine being monitored is always in a safe state, even in the event of failure of a component, in the event of cable breaks, or in the event of other malfunctions. Accordingly, the term safety switching device in this context refers only to those devices and appliances which comply at least with Category 3 of European Standard EN 954-1, or comparable requirements.
Conventionally, safety switching devices of this generic type have until now and are still often designed with discrete components and with electromechanical switching elements (relays). Only in the last few years have changes been made to designing safety switching devices which also make use of electronic components and, in particular, electronic switching elements (bipolar and/or field-effect transistors). WO 01/67610 A1 discloses safety switching devices and apparatuses with combined safety switching devices which produce potential-related switching signals at the output. In contrast to this, conventional safety switching devices use floating outputs. Owing to the potential-related outputs, it is no longer useful to connect the outputs of two or more safety switching devices according to WO 01/67610 A1 in series with one another in order to implement an apparatus comprising a plurality of safety switching devices. WO 01/67610 A1 therefore proposes a new approach of combining safety switching devices having potential-related outputs. In this approach, the potential-related outputs of a first safety switching device are connected to specific inputs of a downstream, second safety switching device. This results in an apparatus which can be used in a very flexible and versatile manner. However, in the case of the apparatus of WO 01/67610 A1, at least two potential-related outputs of the first safety switching device have to be connected in parallel with at least two corresponding inputs of the second safety switching device in order to achieve maximum failsafety.
DE 100 37 737 A1 discloses a method and an apparatus for safe single-channel evaluation of sensor signals. In this case, specific redundant signals are derived from redundantly produced sensor signals. All the signals are then digitized, are converted to a single-channel digital signal, and are transmitted to a higher-level processing unit. However, this method is not suitable for a combination of two or more safety switching devices of the type described above to form a system of safety switching devices as is known from WO 01/67610 A1.

Apparatus for fail-safely disconnecting an electrical load; in particular in industrial production plants