Certain embodiments of this invention relates to a coated article including a substrate (e.g., glass substrate) which supports a coating thereon, wherein the coating includes at least one layer of or including SbOxNy. This layer is desirable for blocking (reflection and/or absorption) of at least some ultraviolet (UV) radiation. In certain example embodiments of this invention, the layer of SbOxNy may be used as a dielectric layer in a low-E (low-emissivity) coating, and may improve UV-blocking capability of such a low-E coating. Coated articles in certain example embodiments of this invention may be used in the context of windows.

Coated articles are known in the art for use in window application such as insulating glass (IG) window units, vehicle windows, and/or the like. In certain situations, designers of coated articles often strive for a combination of high visible transmission, substantially neutral color, low emissivity (or emittance), and blockage of undesirable radiation such as infrared (IR) and/or ultraviolet (UV) radiation to prevent undesirable heating or damage to a building or vehicle interior, or the like. Moreover, in certain example non-limiting instances, it is desirable to heat treat (HT) such coated articles (e.g., thermally temper, heat bend, and/or heat strengthen). Such heat treating often involves exposing the coated articles to temperatures of at least about 580 degrees C., more typically at least about 600 or 625 degrees C. which can lead to undesirable damage to many coatings.
Heat resistant UV blocking coatings deposited by wet chemistry techniques are known in the art. Such UV blocking coatings deal with the use of cerium oxide as the UV blocking material. Cerium oxide is an efficient UV blocker. However, unfortunately, cerium oxide absorbs significant amounts of light in the visible range thereby decreasing visible transmission of coated articles in which it is used, especially when combined with titanium oxide. For this reason, the use of cerium oxide in coated articles for windows or the like is not very desirable in certain applications. Furthermore, because of their high refractive index (n), thin films of cerium oxide provided directly on glass substrates also exhibit undesired optical effects such as interference colour etc. In order to suppress these undesired optical effects, an inner layer of a lower index material may be used. In addition to the drawbacks associated with the optical performance of cerium oxide based UV blocking coatings, fabrication of such coatings by vacuum deposition process is difficult and not attractive to commercial manufacturing applications.
In view of the above, it will be appreciated that there exists a need in the art for a heat resistant UV blocking coating that may be manufactured by high volume vacuum deposition processes such as sputtering. In certain example instances, it would also be desirable to provide UV blocking coatings that are heat resistant and are capable of achieving enhanced optical performance through thin film designs.

Coated article with oxides and/or oxynitrides of antimony and/or zinc dielectric layer(s) and corresponding method


An automatic transmission shifter includes: a shifter body; a shift lever; a control switch unit for controlling the shift lever; and a switch-unit holding member holding the control switch unit. The switch-unit holding member is attached to the shifter body. The control switch unit has a shifter body-based positioning portion configured to be positioned with respect to the shifter body during an operation of attaching the switch-unit holding member to the shifter body.

Heretofore, there has been known a shifter for an automatic transmission usable in a vehicle such as an automotive vehicle, wherein the shifter comprises a shift lock switch (shift lock mechanism) for performing control of locking and unlocking (lock-releasing) a shift lever in a state in which the shift lever is shifted to a parking range position, as disclosed, for example, in JP 11-245680A.
A shift lock mechanism disclosed in the above patent publication is configured to be engaged with an arm formed at a lower end of a rod provided inside a shift lever in an axially movable manner, to thereby inhibit the movement of the rod. More specifically, the shift lock mechanism disclosed in the above patent publication comprises: a key lever and a support lever configured to clampingly hold the arm therebetween; a lock pin configured to be engaged with a concave portion provided in the support lever to thereby inhibit rotational movement of the support lever; and an actuator configured to cause the lock pin to be engaged and disengaged with respect to the concave portion. In the above patent publication, these components of the shift lock mechanism, i.e., the key lever, the support lever, the lock pin and the actuator, are assembled inside a shifter.
However, due to the configuration in which the components of the shift lock mechanism such as the actuator are assembled inside the shifter, the shifter disclosed in the above patent publication has a problem that it is necessary to take a lot of time for the assembling.
It is therefore an object of the present invention to provide an automatic transmission shifter capable of allowing a control switch unit for controlling a shift lever to be readily assembled to a predetermined position.


A reticle assembly for use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second target portion on a substrate, the reticle assembly being arranged to hold a first reticle having the first image field and a second reticle having the second image field such that a distance between the first and second image fields substantially corresponds to a distance between the first and the second target portions. Embodiments also relate to a lithographic apparatus including the reticle assembly, the use in a lithographic process in which a first image field and a second image field are projected onto a first target portion and a second portion on a substrate, of a first reticle having the first image field and a second reticle having the second image field, wherein a distance between the first and second image fields substantially corresponds to a distance between the first and second target portions.

A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, a patterning device, which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC. This pattern can be transferred onto a target portion (e.g. including part of, one, or several dies) on a substrate (e.g. a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. In general, a single substrate will contain a network of adjacent target portions that are successively patterned. Conventional lithographic apparatus include so-called steppers, in which each target portion is irradiated by exposing an entire pattern onto the target portion at once, and so-called scanners, in which each target portion is irradiated by scanning the pattern through a radiation beam in a given direction (the "scanning"-direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. It is also possible to transfer the pattern from the patterning device to the substrate by imprinting the pattern onto the substrate.
In order to make use of a lithographic apparatus as efficiently as possible, it is desirable to achieve a high throughput of the lithographic apparatus, so that a large amount of substrates can be processed by the lithographic apparatus in the short time.
In a scanning mode of a scanning-type lithographic apparatus, the substrate table is moved with a substrate table scanning movement, i.e. a movement with a substantially constant speed, across a projection system. At the same time as the scanning movement of the substrate table, a support supporting a patterning device is scanned also with a scanning movement, i.e. a movement with substantially constant speed across the projection system to impart a pattern in a radiation beam of the lithographic apparatus. Since, during projection, the support of the patterning device is moved from a starting position to an end position, the patterning device support has to be moved back to the start position before the patterning device support is ready for a new scanning movement in the same direction.
Therefore, the lithographic apparatus may be configured to make a meandering pattern of substrate table scanning movements over the substrate. The subsequent scanning movements of the patterning device support may then be in opposite directions, since the direction of the subsequent substrate scanning movements is also in opposite directions. For each substrate table scanning movement, the substrate table has to be decelerated and accelerated to obtain the desired speed and direction. Such deceleration and subsequent acceleration to a substantially constant speed takes considerable time.
During this time for deceleration and acceleration, the lithographic apparatus can not be used for the exposure of image fields on the substrate, which has a negative influence on the throughput of the lithographic apparatus. Since there is an increasing need to increase throughput of a lithographic apparatus, it is desirable that the exposure of target portion a substrate can be performed more efficiently.
A possible solution would be to use of larger reticles which may comprise a number of image fields to expose multiple target portions on the substrate. However, in practice, the possibilities for substantially increasing the size of reticles, while maintaining the same specifications of the reticle are limited.

Reticle assembly, a lithographic apparatus, the use in a lithographic process, and a method to project two or more image fields in a single scanning movement of a lithographic process


A a process as well as an immersion sensor for measuring an electrochemical activity of a layer lying on a melt is provided, using an electrochemical sensor, which has a measuring cell and a counter electrode. In order to make possible reliably reproducible and accurate measurements in the layer, the measuring cell and counter electrode are first immersed in the melt, wherein the measuring cell and counter electrode are protected from contact with the layer and wherein the measuring cell and counter electrode are brought into contact with the melt and are heated. After that, the measuring cell is pulled up to perform the measurement in the layer, wherein the counter electrode is located in the melt during the measurement. For this purpose, the measuring cell and the counter electrode have a protective cover, and the measuring cell is arranged, in the immersion position of the sensor, above the counter electrode.

The invention involves a process for measuring an electrochemical activity of a layer lying on a melt (molten mass or bath), using an electrochemical sensor which has a measuring cell and a counter electrode.
Furthermore, the invention involves an immersion sensor for measuring an electrochemical activity of a layer lying on a melt, using an electrochemical sensor which is arranged on a support and has an electrochemical measuring cell and a counter electrode.
A process of this type and an immersion sensor of this type are known from Radex-Review, Issue 1, 1990, pages 236-243. A measuring process for measuring electrochemical activities, especially of the oxygen content of slag layers lying on iron melts, is described therein. The measurement is done by a conventional electrochemical sensor, which has a measuring cell with zirconium oxide and magnesium oxide as electrolytes and a counter electrode, arranged in the liquid slag layer. In particular, caused by non-homogenieties in the slag, the contact of the sensor with the material to be measured is not exactly defined, so that the measurement result cannot be reproduced with sufficient accuracy.
A similar sensor is described EP 330 264 A1. This sensor is used to determine the bath surface level, wherein the phase boundary between the metal melt and a slag layer lying on the metal melt is determined. A process for the indirect measurement of electrochemical activities in slags on silver melts is described in EP 0 450 090 B1. In this process, an electrochemical measuring cell is arranged in a silver melt. From the measurement, a conclusion is made about the activity in the slag.

Process for measuring an electrochemical activity


Aspect for storage device with fault tolerance capability for neural networks are described herein. The aspects may include a first storage unit of a storage device. The first storage unit is configured to store one or more first bits of data and the data includes floating point type data and fixed point type data. The first bits include one or more sign bits of the floating point type data and the fixed point type data. The aspect may further include a second storage unit of the storage device. The second storage unit may be configured to store one or more second bits of the data. In some examples, the first storage unit may include an ECC memory and the second storage unit may include a non-ECC memory. The ECC memory may include an ECC check Dynamic Random Access Memory and an ECC check Static Random Access Memory.

Neural networks have been successfully applied. However, large-scale neural network parameters make a very high requirement on storage. On one hand, the large-scale neural network parameters require a huge storage capacity. On the other hand, access to massive neural network data may result in huge memory access energy consumption.
At present, a memory storing neural network parameters is an error correcting code (ECC) memory. The ECC memory may correct an error occurring if data is read, but the ECC memory may also bring an additional storage capacity overhead and memory access power consumption overhead. A neural network algorithm has a certain fault-tolerant capability. Storing all parameters of a neural network in an ECC memory ignores fault tolerance of the neural network and results in an additional storage overhead, computation overhead, and memory access overhead. Therefore, how to select a memory suitable for neural network processing in combination with a fault-tolerant capability of a neural network is a problem urgent to be solved.

Storage device and methods with fault tolerance capability for neural networks

SHANGHAI CAMBRICON INFORMATION TECHNOLOGY CO., LTD.


A system and method for ensuring a substantially constant oscillator frequency that is substantially independent of the operating temperature and is substantially independent of variations of the supply voltage level where the oscillator is an on-chip oscillator without requiring significantly additional logic, e.g., not requiring the use of multiple comparators and enabling post packaging modifications of the oscillator frequency. The present invention utilizes one or more paired resistors as part of the RC oscillator where each of the one or more pairs are matched according to their temperature coefficient. That is, each pair includes a resistor with a positive temperature coefficient and a resistor with a corresponding negative temperature coefficient. In addition, the present invention enables post packaging modifications to the resistors based upon one or more program signals that can modify the resistance by forming a short circuit around one or more resistor pairs. The present invention also reduces the effect of voltage variations on the oscillator frequency by comparing a oscillatory signal with a reference signal that is a fixed percentage of the supply voltage. If the supply voltage signal drops, the capacitor of the RC oscillator charges at a slower rate but the oscillatory signal is compared to a reference signal having a lower value since the reference signal is a fixed percentage of the supply voltage.

1. Field of the Invention
The present invention relates generally to the field of microcontrollers and more particularly to microcontroller on chip oscillators.
2. Description of Background Art
Advances in technology have led to an increase in performance and a decrease in size of semiconductor microcontroller or microprocessor chips. Microcontrollers are devices that can control the operation of many items, e.g., braking systems in automobiles, automatic water sprinklers, and cellular telephones. Microcontrollers generally receive power from a supply voltage that is external to the microcontroller. This supply voltage can vary during brown out conditions, for example. In addition, as indicated above microcontrollers are used in a variety of situations and in a variety of environments. Some microcontrollers are used in locations that experience a wide temperature variance. For example, in an automobile engine a microcontroller may be exposed to temperatures that exceed 140 degrees Centigrade and to temperatures that are below negative 30 degrees Centigrade. The frequency of clock pulses generated by conventional oscillator systems is affected by the operating temperature. For example, the transistor-level components of conventional oscillators are temperature dependent which result in oscillator frequency variations.
Such frequency variations are undesirable. In many situations the consistency of the oscillator frequency is important for proper operation of a device. Accordingly, an oscillator that is substantially independent of the operating temperature and of variations of the supply voltage level is necessary for proper operation of many devices.
One conventional oscillation system that attempts to solve some of the above identified problems is described in U.S. Pat. No. 5,565,819 to Cooper which is incorporated by reference herein in its entirety. In Cooper, voltage variations are addressed by requiring multiple comparators, at least one for an upper predefined voltage limit and one for a lower predefined voltage limit. Each comparator compares an oscillatory signal to a modified voltage signal that is slightly below (or above) a threshold voltage for that the oscillatory signal. The design purports to switch each comparator when the oscillatory signal reaches this modified voltage signal in order to account for a delay in the flip-flop transition. Cooper describes a system that purports to oscillate between two voltage levels where these voltage levels are purported to have negligible temperature or power supply variations effects. That is, the voltage level of the oscillator signal is purported to nearly independent of negligible temperature or power supply variations.
However, Cooper does not address the problem of oscillator frequency variations based upon temperature and supply voltage variations. For example, the values of resistors are dependent upon the temperature. When resistors are used in an RC oscillator circuit the resistor values vary as a function of temperature causing the oscillator frequency to vary.
In addition, the Cooper design uses multiple comparators and multiple voltage sampling which is costly in terms of the additional logic necessary to implement. This size problem is compounded if the oscillator is to be located on a microcontroller itself, i.e., it is an on-chip oscillator.
What is needed is a system and method for (1) ensuring a substantially constant oscillator frequency that is substantially independent of the operating temperature; (2) ensuring a substantially constant oscillator frequency that is substantially independent of variations of the supply voltage level; (3) where the oscillator is an on-chip oscillator; (4) without requiring significantly additional logic, e.g., not requiring the use of multiple comparators; and (5) enabling post packaging modifications of the oscillator frequency.

Temperature and voltage independent on-chip oscillator system and method


A network system includes integrated radio transceivers and digitizers, integrated baseband processors and device controllers, digital interfaces there between, and architectures and partitions for same. Licensing methodologies are provided for implementing the features described herein, and for other products and services.

1. Field of the Invention
The present invention is directed to wireless networking devices and, more particularly, to wireless networking devices in compliance with Institute of Electrical and Electronics Engineers (IEEE) 802.11 standards.
2. Related Art
There is a need for greater integration of functions in networking methods and systems. There is also a need for digital interfaces between components in networking systems. There is also a need for improved licensing methodologies to transfer technology between entities in order to increase integration and implement digital interfaces.


An electromagnetic wave detecting device comprising: an emission unit configured to emit electromagnetic waves having coherence; an electromagnetic wave modulating unit configured to modulate one or both of a phase and an amplitude of the emitted electromagnetic waves and to change a state of the modulation relative to an imaging target; and a post-modulation electromagnetic wave intensity detecting unit configured to detect an intensity of post-modulation electromagnetic waves, which are the modulated electromagnetic waves acquired by modulating the electromagnetic waves emitted from the emission unit using the imaging target and the electromagnetic wave modulating unit, using one pixel.

Conventionally, technologies for generating a complex amplitude representing a phase and an amplitude of electromagnetic waves scattered on an imaging target on the basis of a captured image and a random pattern by emitting the electromagnetic waves onto the imaging target and imaging electromagnetic waves acquired by causing the emitted electromagnetic waves to be scattered on the imaging target through a scattering plate having the random pattern of different sizes for attenuating the electromagnetic waves for each area are known (for example, Non-Patent Document 1).

Electromagnetic wave determining device, flow cytometer, electromagnetic wave determining method, and electromagnetic wave determining program


The disclosure discloses an evaporation source and an evaporation device. The evaporation source includes an evaporation case, a crucible, and a heating unit; the evaporation case includes a top plate, a bottom plate, a first side plate, a second side plate, a first end plate, and a second end plate; a connecting section is arranged on the side of the top plate facing the bottom plate, a nozzle group is arranged on the bottom plate to jet gas in the direction away from the top plate; and the crucible includes a cubicle body, and a folded side arranged on the outside of the crucible body, a plurality of gas outlet holes are arranged in the folded side, and the crucible body cooperates slidably with the connecting section through the folded side.

An Organic Light-Emitting Diode (OLED) display panel includes light-emitting elements composed of a plurality of functional layers. The existing OLED is generally fabricated through evaporation technology, and specifically by heating a material using heating wire so that the material is heated and evaporated into a film on the surface of a substrate.
However evaporation nozzles in an evaporation device in the traditional evaporation process are arranged faced upward, and the glass substrate is arranged above the evaporation nozzles, so for the substrate or a metal mask with a large size, the glass substrate may be deformed, the mask may be deformed, and particles may be produced as a result of friction between rolling wheels of the mask being conveyed, and deposited on the surface of the substrate, thus resulting in a defect of the product.

Evaporation source and evaporation device

Hefei Xinsheng Optoelectronics Technology Co., Ltd.


Housing for electrical components includes a housing body, an insulating body and a bus bar. The insulating body is disposed within the housing body and is integral with the housing body. The bus bar is disposed within the within the housing body and embedded in the insulating body. The insulating body and housing body are integral with one another for fixing the bus bar within the housing body.

1. Field of the Invention
The present disclosure relates to electrical assemblies, and more particularly to motor controller housings having integral electrical components
2. Description of Related Art
Aircraft electrical systems typically include motor controllers for electrical machines such as generators, motors and actuators. The controllers can be analog or digital, and operate to regulate, convert and/or condition power. They can include devices such as rectifiers, inverters and frequency converters, and generally include one or more controllers mounted on a printed circuit board coupled to the motor controller.
Electrical components housed within the motor controller housing need to be electrically and mechanically secured to form the motor controller assembly. Generally, a structure such as a conductive bus bar is fastened using hardware, e.g. bolted, within the housing and electrically connected to electrical components associated with the motor controller. For example, one or more printed circuit boards can be fastened to the housing and connected to the bus bar through wiring routed through the housing. Other electrical components, such as rectifiers, inverters, and frequency converters associated with the motor controller generally connect electrically with the controller via the bus bar through other wires routed internally within the housing.
Conventional controllers and bus bars arrangements have generally been considered satisfactory for their intended purpose. However, there is a need for motor controllers with fewer parts and that are relatively compact. There also remains a need in the art for controllers that are easy to make and use. The present disclosure provides a solution for these problems.

Housings with embedded bus bars and standoffs


Discussed herein is a circuit for generating grayscales in a display. The circuit generally comprises grayscale values, one of which is a present grayscale value. Also included is at least one grayscale pattern, comprising at least one pattern bit and corresponding to each of the grayscale values. The circuit may comprise at least one programmable register configured to store at least one grayscale pattern, and a first row multiplexor corresponding to the number of grayscale values, the first row multiplexor configured to receive a pattern bit from each grayscale pattern. The first row multiplexor may also be collectively configured to select a desired grayscale pattern, determined from the present grayscale value. The pixel select circuit is generally configured to determine a desired pattern bit. Finally, a second row multiplexor is coupled to the first row multiplexor and configured to select the desired pattern bit.

STN LCD panels are composed of many pixels that can either be on or off at any given time. The panel is made up of x number of pixels per line, and have y number of lines per panel. Updating all the pixels on all the lines of a panel constitutes one frame of data. Since each pixel for an STN panel has two states (on and off), each pixel is able to achieve two grayscale values, black and white. To achieve more (perceived) grayscale values, the pixels can turn on and off at a very high rate. Because the human eye is unable to detect this high rate of switching, the resulting grayscale value is somewhere between black and white, thereby giving it an apparent or perceived grayscale value.
One consequence associated with this high rate of switching is known as flickering. Flickering is a phenomenon that results in the human eye perceiving that the panel display is pulsating when the display should be uniform. This phenomenon can be distracting and undesirable.
There are various types of flickering in LCD panels (e.g., single pixel flickering and adjacent pixel flickering). Single pixel flickering can occur if the on/off time has a low frequency. Adjacent pixel flickering can occur when pixels in the same proximity are controlled according to identical schedules. However, when single pixel flickering occurs, those pixels with detectable switching appear to pulsate. When adjacent pixel flickering occurs, areas of the panel appear to pulsate.
The idea of grayscale shading with STN LCD panels is based on the principle that if power to a pixel is oscillated fast enough, the human eye will be unable to perceive the oscillation, and the person will only see the intended shade. One method of applying this theory is to divide a time segment into, for example, 16 parts. To achieve a particular shade, the pixel may be turned on for a predetermined fraction of the time segment.
As a nonlimiting example, if the desired shade of a pixel at a particular point in time is one half of full power, the desired shade value could be assigned a value of 8. If there are 16 possible grayscale values (i.e., the time segment was broken up into 16 parts), then the corresponding denotation is 8/16. To achieve this shade, the pixel may be held on for the first 8 counts, and held off for the last 8 counts.
With respect to single pixel flicker, the problem results when a pixel's state is held for a duration such that the switching is detectable by the human eye. Referring to the previous nonlimiting example, holding a pixel in one state for 8 counts may enable a person to perceive when the pixel switches states. If this occurs, the pixel will appear to pulsate. Of course, pulsating effect can be reduced, by turning the pixel on and off every other count.
Adjacent pixel flickering is a phenomenon that results when multiple pixels on a display are oscillated according to identical schedules within the given time segment. In keeping with the previous example, suppose a pixel were turned on for 8 (out of 16) counts, and it was turned on and off with every other count, such an approach would avoid single-pixel flicker, but if all pixels were turned on and off at the same count, then adjacent pixel flickering could be observed.
Another phenomenon that should be taken into account when designing an STN LCD panel is that the human eye detects brightness in a nonlinear fashion. Thus, a small change in brightness at a dark grayscale is less noticeable than equal change in brightness at a bright grayscale. Therefore, designing an STN LCD panel with a linear shade distribution is less than effective in portraying all possible shades to the observer.
In designing an STN LCD panel, a frame rate control block (FRC) is often desired. A simple method for designing an FRC is to have a frame counter that counts from 0 to 15 and then restarts. The decision to turn one pixel on at a given frame may be based on the simple pseudo-code:
If (data[3:0] >= counter), then output = 1, else output =0where "data [3:0]" is the grayscale value and "counter" isthe current value in the frame counter.
This technique is oftentimes too simplistic and may cause single pixel flicker as well as adjacent pixel flicker.
Accordingly, there is a heretofore unaddressed need to overcome the aforementioned deficiencies and shortcomings.

System, method, and apparatus for generating grayscales in an LCD panel


A composition formulated to form a non-smooth surface on a substrate surface at least after the composition has been applied to the substrate and has substantially dried or set. The composition including a first and second set of colloidal particles. Each of the first and second sets of colloidal particles includes a plurality of colloidal particles. The first set of colloidal particles can have an average particle size that is greater than the average size of the second set of particles. The number of colloidal particles in the second set of colloidal particles can be greater than the number of colloidal particles in the first set of colloidal particles. One or more of the colloidal particles can be modified to include one or more hydrocarbon chains.

For many types of products, it is desirable to form a hydrophobic surface. This hydrophobic surface can be used to improve the liquid repellence of the product and/or stain resistance of the product. Products with surfaces which resist absorbing liquids can have a number of commercially beneficial features. Such features can include, but are not limited to, liquid repellent materials and/or liquid resistant finishes (e.g., waterproof/water repellent clothing and/or fabrics, wood finishes, leather and/or suede coatings and/or finishes, etc.), self-cleaning finishes and/or finishes that have a self cleaning effect (e.g., window pane finishes, windshield finishes, vehicle finishes, tire finishes, outdoor equipment finishes, etc.), and/or stain resistance finishes (e.g., furniture and/or carpet finishes, leather and/or suede finishes, fabric finishes, hard surface finishes, etc.).
The mechanisms associated with liquid repellency and liquid adhesion are in part related to the surface-energy acting between the liquid and the surface in contact with the liquid. When the free surface energy between the surface and liquid are low, there is generally a weak bond or adhesion between the liquid and surface. In such situations, the liquid has a greater tendency to run off the surface and/or be adsorbed at a slower rate by the surface. As such, on such surfaces liquids tend to runoff non-flat surfaces and/or bead on flatter surfaces.
Hydrophobic materials are commonly used to form hydrophobic surfaces. Such materials include waxes, fluorinated polymers, silicones, and the like. These materials are used in vehicle waxes and/or cleaners, tire cleaners, leather polishes and/or cleaners, floor polishes and/or cleaners, etc. For instance, silicones, siloxanes and various fluoro-acrylate polymers are the predominant materials used in fabric water proofing formulations and have been used for many years to protect fabrics from moisture penetration. These formulations are generally sprayed topically onto a fabric surface, and after air curing or drying, provide effective water repellency to rain, moisture, as well as protection against various soils and stains.
Another mechanism for forming hydrophobic surfaces is by altering the topology of the surface of a material. It has been found that elevations or depressions having certain heights and separated by certain distances can create hydrophobic surfaces. These types of surfaces can result in droplet formation of liquids. This principle is borrowed from nature and specifically from the lotus plant. It is known that small contact surfaces can reduce Van der Waals interaction, which is in part responsible for adhesion to flat surfaces with low surface energy. The leaves of the lotus plant have elevations made from a wax, and these elevations tend to lower the contact area with water. Several patent applications disclose the use of these artificially formed elevations on various types of surfaces such as US 2002/0150723; US 2003/0108716 and WO 00/58410, all of which are incorporated herein by reference.
The present invention is directed to an improved product including colloidal particles that can be used on a variety of surfaces to form small elevations and depressions to form a liquid repellent and/or liquid proof surface which inhibits or prevents absorption/adsorption of liquids on the treated surface, and/or to inhibit or prevents staining of the treated surface.


A communication method is provided for performance by a first network function entity. The communication method includes determining a service zone ID, transmitting information including the service zone ID to a second network function entity, where the service zone ID is used for the second network function entity to select a service producer instance from a service producer.

In a service-based architecture of a 5G (fifth generation) mobile communication system, a service zone identifier (service zone ID) is proposed as one of metadata for discovering and selecting a service producer instance. The service zone ID is used for identifying a service zone of the service producer instance. A service framework support function (SFSF) supports discovery of a network function (NF) service based on a combination of a service set identifier (SET ID) and the service zone ID. The service zone ID can be used for indicating that a target NF service instance is to be selected from a service set in a specific service zone identified by the service zone ID.
The service zone ID may represent a service zone of the service producer instance. The service zone ID may also or alternatively represent a zone deployed by the service producer instance.
However, a communication protocol (TR23.742) according to certain existing technologies may only specify that a consumer service instance can select a service producer instance based on a service zone ID, but does not mention how a consumer service obtains the service zone ID of the service producer instance specifically, which may limit use of the service zone ID in the service framework.

TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED


For a method for the formation of a frangible zone for fracture separation of a part, namely a connecting rod for internal combustion engines, by which method, in a fracture plane for the intended triggered break-away, a frangible zone is formed along a side of the plane, through which, ordered depressions with ribs are developed from the surface, there is proposed that in the case of a part comprised of ductile metal, the ribs are at least sectionally embrittled, i.e. penetratingly hardened, for intended formation of initial starting cracks.

The invention relates to a method for the formation of a frangible zone for fracture separation of a part, in particular, connecting rods for internal combustion machines. A frangible zone is produced for the intended triggered fracture having ribs and depressions which are separated, one from the other, and arranged at least partially in the surface of the part along one side of the fracture separation plane.
A method for the formation of stress riser grooves in the fracture plane of a separable part is known through the U.S. Pat. No. 5,208,979. To produce stress riser grooves that are essentially knife-sharp at their bases, grooves having a V-shaped cross section are formed in the part's surface by means of a laser at appropriate locations in or on the part. The depth of the groove is greater than its width. As is known, the hairline cracks that initially form at the beginning of a fracturing process at the bottom of a stress riser groove are of considerable importance for the quality of the fracturing surfaces, said cracks not being deliberately predictable because of the inhomogeneous structure of the part over the length of the stress riser grooves.
This disadvantage should be overcome in accordance with German patent document DE-U 295 19 126 in the case of a formed workpiece, especially a connecting rod with an opening (a bore for a bearing), having diametrically opposed frangible zones. Instead of every continuous, straight line V-groove being produced by a laser in accord with U.S. Pat. No. 5,208,979, a plurality of indentations laid linearly next to each other serve as groove sections. The laser employed for the boring of the groove sections into finger shaped, or cylindrical blind holes, is so far reduced in load capacity by this procedure, that the transformation associated with heat input (Martinsite) in the adjacent areas of the groove sections is exceptionally small. It is a stated goal, to avoid in all cases, a continuous transformation occurring in the ribs which remain between the groove sections, in order that these frangible zones can be machined away following a fracture.
Further, the production of a series of blind holes, in a naturally hardened work piece next to one another by means of a laser for the purpose of engendering a controlled fracture, is also known, as this is described in the American magazine "Mechanical Engineering" in the April issue of 1990 in the article "Detroit looks to lasers" on page 41 in the left column.
The goal of the invention is to form the intended frangible zones in a fracturing plane for the predicted production of a crack, in a part made of ductile metal and divisible by fracturing in such a manner that starting cracks are achieved that are deliberately distributed over the length of the respective frangible zone.
The present invention achieves this goal by a method for the formation of a frangible zone for fracture separation of a part, in particular, connecting rods for internal combustion machines. A frangible zone is produced for the intended triggered fracture having ribs and depressions which are separated, one from the other, and arranged at least partially in the surface of the part along one side of the fracture separation plane. In the part, such as a rod, made of ductile metal, the ribs, at least in their free end sections near to the surface of the part, are penetratively embrittled for making an initial starting crack for triggering the break. This is done by performing a transformation across their cross sections. In the case of a part of ductile metal, the ribs, at least in their free end segments near to the surface of the part, become penetratably embrittled by a material transformation over their cross section, thus making the initial cracking for the triggering of the fracture.
Along with the frangible zones produced in accordance with the invention, contrary to a conventional, continuous groove parting line, or contrary to groove sections of softened material arranged in rows, there arises in an advantageous manner a number of transversely embrittled ribs defining short line segments, the length of which in total is substantially shorter, as opposed to the continuous groove separating line or a plurality of groove portions. By means of this situation, the fracturing severance strength, apportioned over a small cross section in the embrittled break-susceptible ribs, acts over the frangible zone to trigger the initiation of cracking. With the choice of the rib cross section in combination with the respective embrittlement process, the simultaneous triggering of starting cracks over the entire, invention oriented, frangible zone is achieved in an advantageous manner. Thereby, a point to point starting crack is avoided. Starting cracks per se, in sinter forged parts, among others, are made known by the German patent document DE-C 38 06 236. In the formulation of the invention, this advantage is thereby enhanced, in that the depressions in the respective base between the ribs, at least in the area of the fracture plane, are additionally embrittled.
Out of this arises the advantage that in the respectively weakest cross section of the rib, self elongating starting cracks combine with each other in reaching the respective base between the depressions to form a continuing fracture front as they progress through the rib.
Without expensive measures, the fracturing points in accordance with the invention in the case of a part made of a ferrous material with a carbon content of C.apprxeq.0.55 to 0.85% can be made, since the embrittlement of the ribs and/or the depressions are achievable by temperature dependent transformation. Especially advantageous is a hardening with self quenching which serves as a means of engendering transformation.
This measure is especially advantageously carried out, in that the depressions are created in the course of the procedure in accordance with the invention, that is, on a known basis of the fusing of the material of the part through radiant energy. The radiant energy is so applied by a laser, and the fused material is ejected or burned by means of a jet of air or oxygen. As a result, at least in the free end segments of the ribs, close to the surface of the part, the initial starting cracks are produced in embrittled transformed zones which overlap themselves at an acute angle. For the avoidance of subsequent finishing work in the area of the frangible zone, the ribs between neighboring depressions are disposed deeper, or deepened in relation to the surface of the part and, advantageously, the air or oxygen jet additionally serves this end.
The overlapped, embrittled zones produced by the procedure in accordance with the invention, are created in an especially advantageous and simple manner. The depressions are formed in a conical shape by a laser apparatus with a beam energy divided over the cross section of the pulsed laser beam according to the Gaussian distribution curve.
Through this clever application of the laser for the formation of the depressions, the goal is reached that a generally glass hard coating on all sides of the depressions formed through self quenching also permeates the ribs in the smallest cross sections. What is further achieved thereby, is a formation which is fracture sensitive and reaches to the very base of the frangible zone. This formation, depending upon the hardening process, can immediately exhibit hardening cracks as starting cracks.
The depressions formed advantageously by a pulsed laser show in respective optional cross section in the direction of their arrangement beside one another on the surface of the part a breadth of 0.4 mm and a depth between about 0.4 to 0.9 mm. The advantage of these relatively narrow frangible zones, is that they can remain, depending on the finishing operation of a bearing boring, with additional installation of bearing bushings or roller bearings to the part. Support for this is provided according to a further feature of the procedure in accordance with the invention, in that the embrittled rib tips produced from the top cut-off portions of neighboring, conically formed depressions are permitted to remain unchanged in their respective intervals deepened in relation to the surface of the part.
For carrying out the procedure in accordance with the invention, in further embodiments, an apparatus of advantageously simple construction is proposed, in which the laser devices are employed in an opening (bearing bore) of a part with interpenetrating, crossing laser beams in simultaneous, diametrically opposed frangible zones, whereby for the protection of the laser optical system, the part in a treatment position relative to the fixed laser equipment is moved forward for sequential formation of the depressions which are arranged-in an adjacently spaced manner.
Within the framework of the invention there is also known another type of ribs and depressions, which are annealed by means of an electron beam to achieve an increased fracturing sensitivity as is taught by U.S. Pat. No. 3,818,577.
Further, embrittlement is offered by means of thermal processes, mechanical working, and/or by means of cast ribs, and/or depressions by means of the occlusion of a gas in the metal of the respective part, as this is especially made known in the U.S. Pat. No. 4,970,783 which describes hydrogen embrittlement.
In an embodiment of a part having diametrically opposed frangible zones in a bearing boring, the procedure in accordance with the invention finds a preferential application in that, first the frangible zones are installed prior to the final finishing operation of the respective bearing boring of a formed connecting rod or machine bearing part, and second, the respective bearing cap between cap screws is so flexibly made that, with a broach chosen 0.05 to 0.15 mm smaller in diameter relative to the premachined bearing boring, an elastic deformation ensues that serves to create starting cracks in the ribs and/or the depressions. The advantage of this measure is that high tension stress is provided at the start of the fracture loading in the embrittled ribs for the triggering of starting cracks in which high quality break surfaces are of importance.

Method for the formation of a frangible zone for the fracture separation of a machine part, in particular, a connecting rod for internal combustion engines

Bayerische Motoren Werke Aktiengesellschaft


A user interface suited for use on mobile devices for entering characters which may require one or more modifiers is disclosed. The interface may be implemented utilizing a touch screen interface on which a user engages the interface, is provided feedback, and removes the user's touch to enter a character. The interface presents a series of main, supplemental and modifier keys. Touching an interface button or main key presents a series of “petals” or supplemental keys emanating from the main key. Each petal or supplemental key may in turn present one or more sub petals or modifier keys emanating from the supplemental key. Each petal or sub-petal may represent another character or a modifier action. The characters and/or actions on the supplemental keys and modifier keys provide options for characters or modifiers which are dependent or related to the main input key.

The Japanese language is written with a combination of Chinese characters called kanji and modified Chinese characters called hiragana and katakana. The system used to input Japanese on mobile phones is based on the numerical keypad. Each number is associated with a particular sequence of kana and, in one embodiment, a button is pressed repeatedly to get the correct kana, while the number of presses determines the row. Marks, punctuation, and other symbols can be added by other buttons in the same way. Kana to kanji conversion is done via other keys
After the kana have been input, they are either left as they are, or converted into kanji (Chinese characters). Various techniques have been implemented by mobile phone developers to enable Japanese language input on mobile phones. In touch sensitive phones, Japanese language keyboards provide 12 keys of kanji characters, the selection of one character of which highlights the character as well as four alternatives to the main character which a user can select by sliding their finger from the selected main character to the alternative character. A sub-menu is then presented in the text entry area with additional options.

User character input interface with modifier support


A method of determining whether a septic tank containing a liquid and sludge or scum mixture needs to be emptied, comprising locating a sensor in the mixture wherein the sensor is adapted to measure a parameter which can be used to determining the depth of sludge or scum in the septic tank and generating a warning signal when a signal from the sensor is indicative of a depth of sludge or scum exceeding a predetermined limit.

Septic tanks operate by allowing sewage to be digested in the tank for an appropriate residence time before fluid which has been subject to digestion in the tank overflows from the tank into a distribution system in surrounding soil. After a period of time, there is an inevitable build-up of sludge at the bottom of the septic tank. As the level of sludge in the septic tank rises, the residence time of sewerage entering the tank for digestion begins to decrease. When the sludge level becomes high, the residence time of sewerage may be so short that there is insufficient time for adequate digestion. As a result, inadequately digested sewerage from the overflow outlet of the tank which may even contain suspended matter is fed to the surrounding liquid distribution system. The dirty effluent can cause the distribution lines to clog with the result that the surrounding area may become contaminated with dangerous biological material. This biological material can even seep into nearby creeks and rivers making them unsafe for recreational or drinking purposes.
Scum, a lightweight layer typically including a substantial oil component may also build up as a surface layer with time. Excess scum may also hinder digestion and lead to premature overflow of inadequately digested material.
In order to reduce the likelihood of contamination of surrounding areas and water courses by septic tanks, there is a mandatory legal requirement in the State of Victoria, Australia that septic tanks be emptied at least once every three years to remove sludge and/or scum. However, in practice despite this mandatory legal requirement, most septic tanks are not emptied for far longer periods.
In most instances, sludge or scum build-up in a typical septic tank will not be unacceptable in the relatively short time span of three years. However, because of the variable nature of usage of different septic tanks and the fact that there is no adequate monitoring system, the relatively short mandatory three year time span for emptying septic tanks is necessary to cover the unusual situation where some septic tanks require emptying within such a short period. The risks of not following such a regime, such as threats to health and the expense of redoing the distribution lines when they are clogged, are otherwise too great.
Thus there is a need for a method of monitoring when a septic tank needs to be inspected for excess scum or sludge so as to avoid the need for mandatory emptying every three years or such other time as is set by legislation.


A focusing unit can be inserted into and removed from an illumination light path by rotating around a supporting portion. An index light source, a green LED, is attached to the bottom of a base. A transparent acrylic-resin disk is fixed to the base. A deflection prism is attached to the bottom of the disk. A beam from the light source enters the deflection prism. A focus index forming portion is provided on the top of the disk. In the center of a light-shielding portion is formed a slit-like opening, under which split prisms are provided. Deflected by the prisms, the beam from the light source is split into two, right-half and left-half, directional beams, and combined with an illumination optical system, in the form of two slit images, at the opening.

1. Field of the Invention
The present invention relates to an ophthalmic photographing apparatus used in opthalmologist's offices, clinics, and so forth.
2. Description of the Related Art
A fundus camera disclosed in Japanese Patent Laid-Open No. 5-95902 includes an index for focus indication, a light source that illuminates this index, and a projection optical system that has a split prism for projecting index images onto the fundus of a subject's eye from different positions of the pupil.
In addition, there is also known a method such that a minute prism is provided in an illumination optical system, a slit image illuminated by fundus observation light is projected onto the fundus of an eye, and focus adjustment is performed as disclosed in Japanese Patent Laid-Open No. 6-142050.
In the case of the above-described method, since both a focus index projection lens barrel and a minute mirror that branch from the illumination optical system must be moved in the optical axis direction, a large space is necessary.
In the case of the method in which a minute prism is provided in an illumination optical system, since fundus illumination light is decentered by a prism to project a focus index, the focus index is darker than the surrounding fundus region.
U.S. Pat. Appl. Pub. No. 2006/0077346 proposes an ophthalmic apparatus to solve the above problems, that is, the difficulty of downsizing the apparatus, the problem of increase in cost due to the number of components, adjustment, and so forth, and the problem of light quantity of the focus index. However, in the ophthalmic apparatus of U.S. Pat. Appl. Pub. No. 2006/0077346, a wavelength range different from that of the light illuminating the fundus must be used as an index light source. Specifically, it is necessary to use a near-infrared observation light source and an index light source whose wavelength regions are different from that of a white photographing light source for color photographing. Therefore, the art of U.S. Pat. Appl. Pub. No. 2006/0077346 is limited to non-mydriatic fundus cameras. In addition, the optical axis of the light source for focusing cannot be changed. Therefore, an opening is necessary in the center of a crystalline lens diaphragm, and ghost light can be generated.
As described above, in the conventional arts, the size of the apparatus can be increased or ghost light can be generated.

Focusing unit and ophthalmic photographing apparatus


The invention provides new processes for preparing compositions containing at least one triazine compound, including new compounds for use in these processes to form the compositions and the new compositions that are formed.

This invention relates to new processes for the preparation of substituted triazines which have utility as ultraviolet radiation absorbers.
Exposure to sunlight and other sources of ultraviolet radiation is known to cause degradation of a wide variety of materials, especially polymeric materials. For example, polymeric materials such as plastics often discolor and/or become brittle as a result of prolonged exposure to ultraviolet light. Accordingly, a large body of art has been developed directed towards materials such as ultraviolet light absorbers and stabilizers which are capable of inhibiting such degradation.
A class of materials known to be ultraviolet light absorbers are triazines. Triazine ultraviolet light absorbers are a class of compounds which have at least one 2-hydroxyphenyl substituent on the 1,3,5-triazine ring.
Trisaryltriazine ultraviolet light absorbers are compounds which have aromatic substituents at the 2-, 4- and 6positions of the 1,3,5-triazine ring, and in which at least one of the aromatic rings has a hydroxyl substituent at the ortho position. These aromatic rings may contain other substituents or may be fused polyaromatics. In general this class of compounds is well known in the art. Disclosures of a number of such trisaryl-1,3,5-triazines, as well as processes for preparing and uses thereof, can be found in the following publications, all of which are incorporated by reference as if fully set forth herein: U.S. Pat. Nos. 3,118,887, 3,242,175, 3,244,708, 3,249,608, 3,268,474, 3,423,360, 4,619,956, 4,740,542, 5,084,570, 5,288,778, 5,461,151, 5,476,937, 5,478,935, 5,543,518, 5,545,836, 5,591,850, and 5,597,854, British patent 1,033,387, Swiss patents 480,091 and 484,695, European patent applications 0,444,323 and 0,649,841, and PCT applications WO94/05645, and WO96/28431.
A commonly used class of trisaryl-1,3,5-triazine ultraviolet light absorbers is based on 2-(2,4-dihydroxyphenyl)-4,6-bisaryl-1,3,5-triazines. In these compounds two non-phenolic aromatic groups and one phenolic aromatic group are attached to the 1,3,5-triazine. The phenolic aromatic group is derived from resorcinol.
Of this class of compounds there are number of commercial products in which the para-hydroxyl group of the phenolic ring is functionalized and the non-phenolic aromatic rings are either unsubstituted phenyl (e.g., TINUVIN 1577) or m-xylyl (e.g., CYASORB UV-1164, CYASORB UV-1164L and TINUVIN 400). These 2-(2-hydroxy-4-alkoxyphenyl)-4,6-bisaryl-1,3,5-triazines UV absorbers exhibit high inherent light stability and permanence as compared to other classes of UV absorbers such as benzotriazoles and benzophenones.
CYASORB UV 1164: R=n-C8H17xe2x80x83TINUVIN 1577
CYASORB UV 1164 (L): R=iso-C8H17
TINUVIN 400: R=CH2CH(OH)CH2OCNNH2N+1
N=12-14
These compounds are generally made by alkylating the corresponding 4-hydroxy precursor, viz., 2-(2,4-dihydroxyphenyl)-4,6-bisaryl-1,3,5-triazine with alkylating reagents.
For example, CYASORB UV-1164 is made by reacting 2-(2,4-dihydroxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine with 1-octyl halide in the presence of a base.
A second class of trisaryl-1,3,5-triazine ultraviolet light absorbers is based on 2,4-bis(2,4-dihydroxyphenyl)-6-aryl-1,3,5-triazines. In these compounds two resorcinol rings and one non-phenolic aromatic ring are attached to the 1,3,5-triazine, the 4 and 4xe2x80x2 hydroxyl groups of the two resorcinol rings being further alkylated. Disclosures of such triazines and applications thereof, can be found in U.S. Pat. Nos. 5,489,503, 5,668,200 and 5,686,233, each of which is incorporated by reference as if fully set forth herein.
U.S. Pat. No. 5,668,200 discloses that the combination of the above two classes of triazine ultraviolet absorbers has some advantages over their use individually.
Several approaches are reported in the literature regarding methods of production of 2-(2,4-dihydroxyphenyl)-4,6-bisaryl-1,3,5-triazines and 2,4-bis(2,4-dihydroxyphenyl)-6-aryl-1,3,5-triazines, the precursors, respectively, to 2-(2-hydroxy-4-alkoxyphenyl)-4,6-bisaryl-1,3,5-triazines and 2,4-bis(2-hydroxy-4-alkoxyphenyl)-6-aryl-1,3,5-triazine ultraviolet absorbers. For example, H. Brunetti and C. E. Luethi, Helvetica Chimica Acta, vol. 55, pages 1566-1595 (1972), and S. Tanimoto and M. Yamagata, Senryo to Yakahin, vol. 40 (12), pages 325-339 (1995).
One widely used approach, shown below, involves the reaction of 2-chloro-4,6-bisaryl-1,3,5 triazines and 2,4-dichloro-6-aryl-1,3,5-triazines, respectively, with resorcinol in the presence of aluminum chloride to form the aforementioned mono- and bis- precursors. A disadvantage of this process is that it requires an additional alkylation step to form the 2-hydroxy-4-alkoxyphenyl product. The alkylation step has associated problems such as ease of reaction and selectivity.
An alternate approach to the preparation of 2,4-bis(2,4-dihydroxyphenyl)-6-aryl-1,3,5-triazines involves the reaction of 2,4-bis(2,4-dihydroxyphenyl)-6-chloro-1,3,5-triazines with aromatic compounds in the presence of aluminum chloride.
A third class of trisaryl-1,3,5-triazine ultraviolet light absorbers is based on 2,4,6-tris(2,4-dihydroxyphenyl)-1,3,5-triazines. In these compounds, all three aryl groups on the triazine ring are derived from resorcinol. Disclosures of such trisaryltriazines, and applications thereof, can be found in U.S. Pat. Nos. 3,268,474, 5,400,414 and 5,410,048, each of which is incorporated by reference as if fully set forth herein.
These compounds are generally prepared from cyanuric chloride in a two step process, shown below, wherein cyanuric chloride is first reacted with resorcinol to form 2,4,6-tris-(2,4-dihydroxyphenyl)-1,3,5-triazine, which is subsequently reacted with an alkylating agent in a second step to form the desired 2,4,6-tris-(2-hydroxy-4-alkoxyphenyl)-1,3,5-triazines product. For example, U.S. Pat. No. 3,268,474 discloses the reaction of cyanuric chloride with resorcinol to form 2,4,6-tris(2,4-dihydroxyphenyl)-1,3,5-triazine with no formation of carbon-oxygen linked products. This approach has disadvantages in that the solubility of 2,4,6-tris-(2,4-dihydroxyphenyl)-1,3,5-triazine in common organic solvents is poor, thus making the alkylation step difficult, and that side products due to overalkylation are also formed.
Similarly, reaction of cyanuric chloride with dialkylated resorcinol is known in the art. For example, U.S. Pat. No. 3,268,474 discloses the reaction of cyanuric chloride with an excess of 1,3-dimethoxybenzene to form a mixture of 2,4,6-tris(2,4-dimethoxyphenyl)-1,3,5-triazine and 2,4-bis(2-hydroxy-4-methoxyphenyl)-6- (2,4-dimethoxyphenyl)-1,3,5-triazine.
In the reaction of cyanuric chloride with phenols, however, formation of either C-alkylation or O-alkylation has been reported depending on the substituents on the phenol. For example, Y. Horikoshi et al., Nippon Kagaku Kaishi, (3), pages 530-535, (1974), CA 81:152177. Japanese patent application 09-059,263 (CA 126: 277502) discloses the use of phenols substituted with alkyl, alkoxy, alkenyl, halo or nitro substituents to form carbon-oxygen products when reacted with cyanuric chloride.
JP 09-059263
Thus, there remains a need for improved processes for the production of this class of important triazine ultraviolet light absorbing compounds, which processes avoid the need to carry out alkylation of intermediate products.
The present invention relates to new processes for the preparation of substituted triazines which have utility as ultraviolet radiation absorbers.
In particular, the present invention relates to a process for preparing a composition comprising at least one triazine compound of Formula A:
In one embodiment, the invention relates to a process for preparing a composition comprising at least one triazine compound of Formula A, which process comprises reacting in the presence of a first catalyst, sufficient amounts of a compound of Formula D:
wherein X is a halogen, and a compound of Formula E:
wherein R1, R2, R3, R4 and R5 are the same or different and each is hydrogen, halogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, aracyl of 6 to 24 carbon atoms, OR, NRRxe2x80x2, CONRRxe2x80x2, OCOR, CN, SR, SO2R, SO3H, SO3M, wherein M is an alkali metal, R and Rxe2x80x2are the same or different and each is hydrogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, or aracyl of 6 to 24 carbon atoms, optionally with either of R3 and R4, or R4 and R5, taken together being a part of a saturated or unsaturated fused carbocyclic ring optionally containing O, N or S atoms in the ring, and Y is a direct bond, O, NRxe2x80x3, or SRxe2x80x3, wherein Rxe2x80x3is hydrogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms or aracyl of 6 to 24 carbon atoms; at a suitable temperature and pressure in the presence of an inert solvent and for a time sufficient to form a second reaction mixture comprising the composition.
In another embodiment, the invention relates to a process for preparing a composition comprising at least one triazine compound of Formula A, which process comprises:
(i) reacting in the presence of a first catalyst, sufficient amounts of a compound of Formula D:
wherein X is a halogen, and a compound of Formula E:
wherein R1, R2, R3, R4, and R5 are as defined above, at a suitable temperature and pressure, and for a time sufficient to produce a first reaction mixture comprising at least one intermediate compound of:
wherein Ar1, X, R1, R2, R3, R4, and R5 are as defined above; and
(ii) reacting the first reaction mixture and a compound of Formula F:
wherein R6, R7, R8, R9 and R10 are the same or different and each is hydrogen, halogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, aracyl of 6 to 24 carbon atoms, OR, NRRxe2x80x2, CONRRxe2x80x2, OCOR, CN, SR, SO2R, SO3H, SO3M, wherein M is an alkali metal, R and Rxe2x80x2 are the same or different and each is hydrogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, or aracyl of 6 to 24 carbon atoms, and optionally with either of R6 and R7 taken together, R7 and R8 taken together, R8 and R9 taken together, or R9 and R10 taken together being a art of a saturated or unsaturated fused carbocyclic ring optionally containing O, N or S atoms in the ring, in the presence of a second catalyst and at a suitable temperature and pressure, and for a time sufficient to produce a second reaction mixture comprising the composition.
In yet another embodiment the invention relates to novel processes for the preparation of substituted triazines wherein intermediate products produced in a first reaction mixture may be isolated. The intermediate compounds of Formula I and Formula J are novel triazine compounds:
The present invention relates to new processes for the preparation of substituted triazines which have utility as ultraviolet radiation absorbers.
In particular, the present invention relates to a process for preparing a composition comprising at least one triazine compound of Formula A:
wherein Ar1 and Ar2 are the same or different, and each independently is a radical of a compound of Formula B:
wherein R1, R2, R3, R4 and R5 are the same or different and each is hydrogen, halogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, aracyl of 6 to 24 carbon atoms, OR, NRRxe2x80x2, CONRRxe2x80x2, OCOR, CN, SR, SO2R, SO3H, SO3M, wherein M is an alkali metal, R and Rxe2x80x2 are the same or different and each is hydrogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, or aracyl of 6 to 24 carbon atoms, optionally with either of R3 and R4, or R4 and R5, taken together being a part of a saturated or unsaturated fused carbocyclic ring optionally containing O, N or S atoms in the ring, and Y is a direct bond, O, NRxe2x80x3, or SRxe2x80x3, wherein Rxe2x80x3 is hydrogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms or aracyl of 6 to 24 carbon atoms; or a radical of a compound of Formula C:
wherein R6, R7, R8, R9 and R10 are the same or different and each is hydrogen, halogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, aracyl of 6 to 24 carbon atoms, OR, NRRxe2x80x2, CONRRxe2x80x2, OCOR, CN, SR, SO2R, SO3H, SO3M, wherein M is an alkali metal, R and Rxe2x80x2 are the same or different and each is hydrogen, alkyl of 1 to 24 carbon atoms, haloalkyl of 1 to 24 carbon atoms, aryl of 6 to 24 carbon atoms, alkenyl of 2 to 24 carbon atoms, acyl of 1 to 24 carbon atoms, cycloalkyl of 5 to 24 carbon atoms, cycloacyl of 5 to 24 carbon atoms, aralkyl of 7 to 24 carbon atoms, or aracyl of 6 to 24 carbon atoms, and optionally with either of R6 and R7 taken together, R7 and R8 taken together, R8 and R9 taken together, or R9 and R10 taken together being a part of a saturated or unsaturated fused carbocyclic ring optionally containing O, N or S atoms in the ring, which process comprises:
(i) reacting in the presence of a first catalyst, sufficient amounts of a compound of. Formula D:
wherein X is a halogen, and a compound of Formula E:
wherein R1, R2, R3, R4 and R5 are as described above, at a suitable temperature and pressure in the presence of an inert solvent and for a time sufficient to form a second reaction mixture comprising the composition.
In one preferred embodiment, the process of the present invention relates to a process for preparing a composition comprising at least one triazine compound of Formula A:
wherein Ar1 and Ar2 are the same or different, and each independently is a radical of a compound of Formula B:
wherein Y, R1, R2, R3, R4 and R5 are as described above or a radical of a compound of Formula C:
wherein R6, R7, R8, R9 and R10 are as described above, which process comprises:
(i) reacting in the presence of a first catalyst, sufficient amounts of a compound of Formula D:
wherein X is a halogen, and a compound of Formula E:
wherein Ar1, X, R1, R2, R3, R4, and R5 are as defined above at a suitable temperature and pressure, and for a time sufficient to produce a first reaction mixture comprising at least one intermediate compound of:
wherein Ar1, X, R1, R2, R3, R4, and R5 are as defined above; and
(ii) reacting the first reaction mixture and a compound of Formula F:
wherein R6, R7, R8, R9 and R10 are as described above, in the presence of a second catalyst and at a suitable temperature and pressure, and for a time sufficient to produce a second reaction mixture comprising the composition.
In another preferred embodiment, the intermediate products produced in the first reaction mixture are isolated.
The intermediate compounds of Formula I and Formula J are novel triazine compounds:
In another embodiment of the present invention, triazine compositions comprising Formula I, Formula J or mixtures therof may be further combined with a compound of Formula F or a compound of Formula E, as described above.
In another embodiment of the present invention, triazine compositions comprising Formula I, Formula J or mixtures therof are prepared.
The compound of Formula F may typically be selected from benzene, isopropylbenzene, di-isopropylbenzene, t-butyl benzene,toluene, ethylbenzene, ortho-xylene, meta-xylene, para-xylene, mesitylene, biphenyl, naphthalene, tetralin, substituted naphthalenes and substituted tetralins.
The reaction is carried out in a suitable solvent and at a temperature and pressure sufficient to produce a reaction mixture, and leads to production of a trisaryltriazine compound or mixture of trisaryltriazine compounds which have utility as ultraviolet radiation absorbers.
Suitable solvents for use in the process of the present invention are aliphatic hydrocarbons, hydrogenated aliphatic and aromatic compounds, aliphatic and aromatic nitro compounds and carbon disulfide. Preferred solvents are halogenated solvents such as chlorobenzene, dichlorobenzene and 1,1,2,2-tetrachloroethane.
The catalyst used in the process of the present invention is a Lewis Acid catalyst. Preferred catalysts are aluminum trihalides. The most preferred catalyst is aluminum trichloride.
The process of the present invention is carried out by combining the reactants in the reactor under suitable conditions to bringing about the reaction. The reaction takes place at a temperature of between about 0xc2x0 C. to about 150xc2x0 C. for a time of between about 1 to about 20 hours.
The amount of catalyst used is between about 0.5 to about 5 equivalents based upon the amount of the compound of Formula D.
The amount of compound of formula B used is between about 0.75 to 4 equivalents based upon the amount of the compound of Formula D.
In a preferred embodiment of the reaction, cyanuric chloride is reacted with three equivalents of alkoxylated phenol in the presence of a Lewis Acid catalyst to produce 2,4,6-tris(2-hydroxy-4-alkoxyphenyl)-1,3,5-triazines as the major product.
From the literature, it would be expected that a carbon-oxygen linked product would result from the reaction of cyanuric chloride with partially alkoxylated resorcinol in the presence of a Lewis Acid. The formation of carbon-carbon inked products on reaction of cyanuric chloride with 3-alkoxyphenols is contrary to expectation.
Further, although two carbon-carbon linked products could result, one with the carbon-carbon linkage ortho to the phenolic hydroxyl and para to the alkoxy group, the other with the carbon-carbon linkage para to the phenolic hydroxyl and ortho to the alkoxy group, the former product with the carbon-carbon linkage ortho to the phenolic hydroxyl and para to the alkoxy group is preferably formed.

In another preferred embodiment of the present invention, cyanuric chloride is reacted with 1-2 equivalents of 3-alkoxyphenol in the presence of a Lewis Acid catalyst to produce a mixture of 2-(2-hydroxy-4alkoxyphenyl)-4,6-dichloro-1,3,5-triazines and/or 2,4-bis(2-hydroxy-4-alkoxyphenyl)-6-chloro-1,3,5-triazines, such mixtures being significantly free from 2,4,6-tris(2-hydroxy-4-alkoxyphenyl)-1,3,5-triazines. The reaction mixture can be further reacted with aromatic compounds, Z in the same pot to obtain a mixture of 2-(2-hydroxy-4alkoxyphenyl)-4,6-bisaryl-1,3,5-triazines and 2,4-bis(2-hydroxy-4-alkoxyphenyl)-6-aryl,1,3,5-triazines. Such mixtures are useful UV absorbers and are reported to be more effective than 2-(2-hydroxy-alkoxyphenyl)-4,6-bisaryl-1,3,5-triazines or 2,4-bis(2hydroxy-4-alkoxyphenyl)-6-aryl-1,3,5-triazines used individually. However, if desired, these mixtures can be separated at this state and the individual compound used separately. Furthermore the separation can be done following the initial step, and the pure intermediates then can be reacted with aromatics to obtain pure 2-(2-hydroxy-4alkoxyphenyl)-4,6-bisaryl-1,3,5-triazines or 2,4-bis(2-hydroxy-4-alkoxyphenyl)-6-aryl-1,3,5-triazines.

By changing the ratio of cyanuric chloride to 3-alkoxyphenol, it is also possible to get a mixture of mono-bis- and tris-triazines, namely, 2-(2-hydroxy-4-alkoxyphenyl)-4,6-bisaryl-1,3,5-triazines, 2,4-bis-(2-hydroxy-4-alkoxyphenyl)-6-aryl-1,3,5-triazines and 2,4,6-tris-(2-hydroxy-4-alkoxyphenyl)-1,3,5-triazines.
In another preferred embodiment of the present invention, cyanuric chloride is reacted with 1-2 equivalents of 1,3-dialkoxybenzene in the presence of a Lewis Acid catalyst, and the reaction mixture reacted in a second step with aromatic compounds, Z to produce a mixture of 2-(2-hydroxy-4-alkoxyphenyl)-4,6-bisaryl-1,3,5-triazines, 2,4-bis(2-hydroxy-4-alkoxyphenyl)-6-aryl-1,3,5-triazines and 2-(2-hydroxy-4-alkoxyphenyl)-4-(2,4-dialkoxyphenyl)-6-aryl-1,3,5-triazines.
In another preferred embodiment of the present invention, cyanuric chloride is reacted with about 0.5 equivalents of resorcinol in the presence of a Lewis Acid catalyst to produce a mixture of mono- and bis-resorcinol substituted triazine products, 2-(2,4-dihydroxyphenyl)-4,6-dichloro-1,3,5-triazine and 2,4-bis(2,4-dihydroxyphenyl)-6-chloro-1,3,5-triazines. The reaction mixture on further reaction with aromatic compounds, Z produces a mixture of 2-(2,4-dihydroxyphenyl)-4,6-bisaryl-1,3,5-triazine and 2,4-bis(2,4-dihydroxyphenyl)-6-aryl-1,3,5-triazines.

The 2-(2,4-dihydroxyphenyl)-4,6-dichloro-1,3,5-triazine and 2,4-bis(2,4-dihydroxyphenyl)-6-chloro-1,3,5-triazines formed from the reaction of cyanuric chloride with resorcinol can be separated at the first step. The reaction of 2-(2,4-dihydroxyphenyl)-4,6-dichloro-1,3,5-triazine thus obtained with aromatic compounds in the presence of a Lewis Acid catalyst produces 2-(2,4-dihydroxyphenyl)-4,6-bisaryl-1,3,5-triazines substantially free of 2,4-bis(2,4-dihydroxyphenyl)-6-aryl-1,3,5-triazines. This is a new and general process for making 2-(2,4-dihydroxyphenyl)-4,6-bisaryl-1,3,5-triazines.

The triazines of the present invention are particularly useful as ultraviolet light absorber agents for stabilizing a wide variety of materials including, for example, various polymers (both crosslinked and thermoplastic), photographic materials and dye solutions for textile materials, as well as in ultraviolet light screening agents (such as sunscreens). The triazines of the present invention can be incorporated into such material in any one of a variety of conventional manners, including for example, physical mixing or blending, optionally, with chemical bonding to the material (typically to a polymer), as a component in a light stabilizing composition such as a coating or solution, or as a component in a UV screening composition such as a sunscreen composition.
The triazines of the present invention can be employed to stabilize materials which are subject to degradation by ultraviolet radiation by incorporating the presently claimed compounds into polymeric materials, either chemically or physically. Non-limiting examples of polymeric materials that may be so stabilized are polyolefins, polyesters, polyethers, polyketones, polyamides, natural and synthetic rubbers, polyurethanes, polystyrenes, high-impact polystyrenes, polyacrylates, polymethacrylates, polyacetals, polyacrylonitriles, polybutadienes, polystyrenes, ABS, SAN (styrene acrylonitrile), ASA (acrylate styrene acrylonitrile), cellulosic acetate butyrate, cellulosic polymers, polyimides, polyamideimides, polyetherimides, polyphenylsulfide, PPO, polysulfones, polyethersulfones, polyvinylchlorides, polycarbonates, polyketones, aliphatic polyketones, thermoplastic TPU""s, aminoresin crosslinked polyacrylates and polyesters, polyisocyanate crosslinked polyesters and polyacrylates, phenol/formaldehyde, urea/formaldehyde and melamine/formaldehyde resins, drying and non-drying alkyd resins, alkyd resins, polyester resins, acrylate resins cross-linked with melamine resins, urea resins, isocyanates, isocyanurates, carbamates, and epoxy resins, cross-linked epoxy resins derived from aliphatic, cycloaliphatic, heterocyclic and aromatic glycidyl compounds, which are cross-linked with anhydrides or amines, polysiloxanes, Michael addition polymers, amines, blocked amines with activated unsaturated and methylene compounds, ketimines with activated unsaturated and methylene compounds, polyketimines in combination with unsaturated acrylic polyacetoacetate resins, polyketimines in combination with unsaturated acrylic resins, radiation curable compositions, epoxymelamine resins, organic dyes, cosmetic products, cellulose-based paper formulations, photographic film paper, ink, and blends thereof.
Further non-limiting examples of specific polymers which may be stabilized include:
1. Homo- and copolymers of monoolefins and diolefins including but not limited to ethylene, propylene, isobutylene, butene, methylpentene, hexene, heptene, octene, isoprene, butadiene, hexadiene, dicyclopentadiene, ethylidene and cycloolefins such as cyclopentene and norbornene; for example, polyethylenes (which optionally can be crosslinked) such as high density polyethylene (HDPE), high density and high molecular weight polyethylene (HDPE-HMW), high density and ultrahigh molecular weight polyethylene (HDPE-UHMW), medium density polyethylene (MDPE), low density polyethylene (LDPE), linear low density polyethylene (LLDPE) and branched low density polyethylene (BLDPE).
2. Copolymers of one or more monoolefins and/or diolefins with carbon monoxide and/or with other vinyl monomers, including limited acrylic and methacrylic acid, acrylates and methacrylates, acrylamides, acrylonitriles, styrenes, vinyl acetate (such as ethylene/vinyl acetate copolymers), vinyl halides, vinylidene halides, maleic anhydride and allyl monomers such as allyl alcohol, allyl amine ally glycidyl ether and derivatives thereof.
3. Hydrocarbon resins (such as C5-C9) including hydrogenated modifications thereof and mixtures of polyalkylenes and starch.
4. Homo- and copolymers of styrenes such as styrene, p-methylstyrene and xcex1a-methylstyrene.
5. Copolymers of one or more styrenes with other vinyl monomers such as olefins and diolefins (e.g., ethylene, isoprene and/or butadiene), acrylic and methacrylic acid, acrylates and methacrylates, acrylamides, acrylonitriles, vinyl acetate (such as ethylene/vinyl acetate copolymers), vinyl halides, vinylidene halides, maleic anhydride and allyl compounds such as allyl alcohol, allyl amine allyl glycidyl ether and derivatives thereof.
6. Graft copolymers of styrenes on polybutadienes, polybutadiene/styrene copolymers and polybutadiene/acrylonitrile copolymers; styrene (or xcex1-methylstyrene) and acrylonitrile (or methacrylonitrile) on polybutadiene; styrene and maleic anhydride on polybutadiene; styrene, acrylonitrile and maleic anhydride or maleimide on polybutadiene; styrene and acrylonitrile on ethylene/propylene/diene copolymers; styrene and acrylonitrile on polyalkyl acrylates or methacrylates; and styrene and acrylonitrile on acrylate/butadiene copolymers.
7. Halogen-containing polymers such as polychloroprene; chlorinated rubbers; chlorinated and brominated isobutylene/isoprene copolymers; chlorinated or sulfochlorinated polyethylene; copolymers of ethylene and chlorinated ethylene; epichlorohydrin polymers and copolymers; and polymers and copolymers of halogen-containing vinyl compounds such as vinyl chloride, vinylidene chloride, vinyl fluoride and/or vinylidene fluoride and other vinyl monomers.
8. Homo- and copolymers derived from xcex1, xcex2-unsaturated acids and derivatives thereof such as acrylic acid, methacrylic acid, acrylates, methacrylates, acrylamides and acrylonitriles.
9. Copolymers of the monomers mentioned in (8) with other unsaturated monomers such as olefins and diolefins (e.g., butadiene), styrenes, vinyl halides, maleic anhydride and allyl monomer such as allyl alcohol, allyl amine, allyl glycidyl ether and derivatives thereof.
10. Homo- and copolymers derived from unsaturated alcohols and amines or the acyl derivatives or acetals thereof, such as vinyl alcohol, vinyl acetate, vinyl stearate, vinyl benzoate, vinyl maleate, vinyl butyral, allyl alcohol, allyl amine, allyl glycidyl ether, allyl phthalate and allyl melamine; as well as copolymers of such monomers with other ethylenically unsaturated monomers mentioned above.
For the preceding polymer groups 1-10, the present invention includes these polymers as prepared by metallocene catalysts.
11. Homo- and copolymers of cyclic ethers such as alkylene glycols and alkylene oxides, as well as copolymers with bisglycidyl ethers.
12. Polyacetals such as polyoxymethylene and those polyoxymethylenes which contain ethylene oxide as a comonomer; and polyoxymethylenes modified with thermoplastic polyurethanes, acrylates and/or MBS.
13. Polyphenylene oxides and sulfides.
14. Polyurethanes derived from hydroxy-functional components such as polyhydric alcohols, polyethers, polyesters, polyacrylics and/or polybutadienes on the one hand, and aliphatic and/or aromatic isocyanates on the other, as well as precursors thereof.
15. Polyamides and copolyamides derived from diamines, dicarboxylic acids and/or aminocarboxylic acids or the corresponding lactams, such as polyamide 4, polyamide 6, polyamide 6/6, polyamide 6/10, polyamide 6/9, polyamide 6/12, polyamide 4/6, polyamide 12/12, polyamide 11 and polyamide 12; aromatic polyamides starting from m-xylene diamine and adipic acid; polyamides prepared from hexamethylene diamine and isophthalic and/or terephthalic acid and with or without an elastomer as a modifier, for example, poly-2,4,4-trimethylhexamethylene terephthalamide or poly-m-phenylene isophthalamide; block copolymers of the aforementioned polyamides with polyolefins, olefin copolymer, ionomers, chemically bonded or grafted elastomers, or polyethers such as polyethylene glycol, polypropylene glycol or polytetramethylene glycol; and polyamides condensed during processing (RIM polyamide systems).
16. Polyureas, polyimides, polyamide-imides, polyetherimides, polyesterimides, polyhydantoins and polybenzimidazoles.
17. Polyesters derived from dicarboxylic acids, diols and/or hydroxycarboxylic acids or the corresponding lactones, such as polyethylene terephthalate, polybutylene terephthalate, poly-1,4-dimethylcyclohexane terephthalate and polyhydroxybenzoates, as well as block copolyether esters derived from hydroxyl-terminated ethers; PETG; PEN; PTT; and also polyesters modified with polycarbonate or MBS.
18. Polycarbonates and polyester carbonates.
19. Polysulfones, polyether sulfones and polyether ketones.
20. Crosslinked polymers derived from aldehydes condensation resins such as phenol/formaldehyde resins, urea/formaldehyde resins and melamine/formaldehyde resins.
21. Drying and non-drying alkyd resins.
22. Unsaturated polyester resins derived from copolyesters of saturated and unsaturated dicarboxylic acids with polyhydric alcohols and vinyl compounds as crosslinking agents and also halogen-containing modifications thereof.
23. Crosslinkable acrylic resins derived from substituted acrylates such as epoxy acrylates, hydroxy acrylates, isocyanato acrylates, urethane acrylates or polyester acrylates.
24. Alkyd resins, polyester resins and acrylate resins crosslinked with melamine resins, urea resins, isocyanates, isocyanurates, carbamates or epoxy resins.
25. Crosslinked epoxy resins derived from aliphatic, cycloaliphatic, heterocyclic and/or aromatic glycidyl compounds such as bisphenol A and bisphenol F, which are crosslinked with customary hardeners such as anhydrides or amines.
26. Natural polymers such as cellulose, rubber, gelatin and chemically modified homologous derivatives thereof, including cellulose acetates, cellulose propionates and cellulose butyrates, or the cellulose ethers such as methyl cellulose, as well as rosins and their derivatives.
27. Polysiloxanes.
28. Michael addition polymers of amines or blocked amines (e.g., ketimines) with activated unsaturated and/or methylene compounds such as acrylates and methacrylates, maleates and acetoacetates.
29. Mixtures or blends of any of the above, such as PP/EPDM, polyamide/EPDM or ABS, PVC/EVA, PVC/ABS, PVC/MBS, PC/ABS, PBTP/ABS, PC/ASA, PC/PBT, PVC/CPE, PVC/acrylate, POM/thermoplastic PUR, PC/thermoplastic polyurethane, POM/acrylate, POM/MBS, PPO/HIPS, PPO/PA6.6 and copolymers, PA/HDPE, PP/HDPE, PP/LDPE, LDPE/HDPE, LDPE/EVA, LDPE/EAA, PA/PP, PA/PPO, PBT/PC/ABS, PBT/PET/PC and the like.
30. Polyketimines in combination with unsaturated acrylic polyacetoacetate resins or with unsaturated acrylic resins including urethane acrylates, polyether acrylates, vinyl or acryl copolymers with pendant unsaturated groups and acrylated melamines.
31. Radiation curable compositions containing ethylenically unsaturated monomers or oligomers and a polyunsaturated aliphatic oligomer.
32. Epoxymelamine resins such as light-stable epoxy resins cross-linked by an epoxy functional coetherified high solids melamine resin.
Other materials which can be stabilized include, for example:
33. Naturally occurring and synthetic organic materials which may be mixtures of compounds, including mineral oils, animal and vegetable fats, oils and waxes, or oils, fats or waxes based on synthetic esters (e.g., phthalates, adipates, phosphates or trimellitates) and also mixtures of synthetic esters with mineral oils in any ratio.
34. Aqueous emulsions of natural or synthetic rubber such as natural latex or lattices of carboxylated styrene/butadiene copolymers.
35. Organic dyes such as azo dyes (diazo, triazo and polyazo), anthraquinones, benzodifuranones, polycyclic aromatic carbonyl dyes, indigoid dyes, polymethines, styryl dyes, di- and triaryl carbonium dyes, phthalocyanines, quinophthalones, sulfur dyes, nitro and nitroso dyes, stilbene dyes, formazan dyes, quinacridones, carbazoles and perylene tetracarboxylic diimides.
36. Cosmetic products, such as skin lotions, collagen creams, sunscreen, facial make-up, etc., comprising synthetic materials such as antioxidants, preservatives, lipids, solvents, surfactants, colorants, antiperspirants, skin conditioners, moisturizers etc.; as well as natural products such as collagen, proteins, mink oil, olive oil, coconut oil, carnauba wax, beeswax, lanolin, cocoa butter, xanthan gum, aloe, etc.
37. Cellulose-based paper formulations for use, e.g., in newsprint, cardboard, posters, packaging, labels, stationery, book and magazine paper, bond typing paper, multi-purpose and office paper, computer paper, xerographic paper, laser and ink-jet printer paper, offset paper, currency paper, etc.
38. Photographic film paper.
39. Ink.
The invention will now be illustrated by the following examples. The examples are not intended to be limiting of the scope of the present invention. In conjunction with the general and detailed descriptions above, the examples provide further understanding of the present invention.

Process for making 2-hydroxy-4-alkoxyphenyl or 2,4-dihydroxyphenyl substituted 1,3,5-triazine UV absorbers


An apparatus and method for characterizing or measuring chromatic dispersion in an optical fiber segment. The fiber is accessed at one end with a signal generator injecting modulating pulsed signals which are reflected at the other end of the fiber, the apparatus determining the phase difference between the modulation signals and the reflected modulation signals and calculating the chromatic dispersion therefrom.

Chromatic dispersion is a particularly important characteristic of optical fibers due to the distortion effects it causes on the optical signals that propagate in fibers for telecommunications.
Such a phenomenon is, as is well known, linked to the different group velocities with which various spectral components of optical signals propagate in a fiber, for instance between an optical transmitter and receiver or a first and a second end of the fiber.
The spectral components of an optical signal, due to the different group velocities, reach the receiver at different times and determine a distortion of the received signal both in analogue transmission systems, and in digital transmission systems.
The chromatic dispersion of optical fibers, as is well known, is determined mainly by two factors, the dispersion characteristics of the material whereof the fibers are made (dependence of the refractive index of the material on frequency), and the very nature of the propagation of an optical signal in a waveguide (the so-called "waveguide dispersion").
The chromatic dispersion of optical fibers can be suitably controlled by a careful design of the profile of the refractive index of the fibers. In fact, today, optical fibers are manufactured with chromatic dispersion characteristics specifically studied to meet the requirements of the most sophisticated optical transmission systems.
As these requirements become ever more stringent, in particular for transmission systems with bit rates of 10 Gbit/s or higher, the need also increases to "characterize" the CD of the optical fibers with accuracy, not only in the factory during the product qualification stage, but also in field, for new or less recently installed systems.
Such "characterization" is indispensable in order to design and install new-generation transmission systems (with bit rates of 10 Gbit/s or higher) on recent fibers or to verify, in case of less recent systems, the possibility of supporting a higher transmission capacity.
Today, the chromatic dispersion of optical fibers is measured by means of at least three different, consolidated techniques, as described, for instance, in the ITU-T Recommendation G.650. Amongst such techniques, one of the most commonly used is is the so-called Phase Shift (or PS) technique. It consists of measuring the phase shift introduced by the optical fiber segment being measured on a sinusoidal signal that modulates an optical carrier which is made to propagate in the fiber itself. The measurement is repeated at different wavelengths of the aforesaid optical carrier and for each of them the group delay of the modulating sinusoidal signal, which is proportional to the aforesaid phase shift, is calculated.
An apparatus or instrument for measuring chromatic dispersion is, for instance, described in U.S. Pat. No. 6,313,934.
This document describes, inter ails, a methodology for measuring chromatic dispersion wherein the phase shift of the sinusoidal signal, that modulates the optical carrier, introduced by the fiber segment is measured by synchronizing, by means of absolute timing systems obtained from a GPS (Global Positioning System), appropriate devices for generating and measuring the sinusoidal signal, positioned at the ends of the fiber itself.
The prior art method entails the need to simultaneously access the two ends of the fiber to be characterized, to apply appropriate instrumentation to the two ends of the fiber and to use an absolute reference system with which to synchronize the instrumentation at the two ends of the fiber.

Apparatus and method for measuring chromatic dispersion by variable wavelength


A flag setting, reading and clearing circuit is described which includes self arbitrating logic to provide priority for the flag setting portion of the circuit over the flag clearing portion. The flag is set by a set flag signal generated by a portion of a computer system to which the flag setting, reading and clearing circuit is a part. The set flag signal sets the flag by latching the voltage level of a voltage supply to a node in the circuit. A read status signal then latches the voltage at the node to another location which other portions of the computer system can access. At the same time, the read status signal clears the voltage level at the node unless the self arbitrating logic prevents it from doing so. The self arbitrating logic prevents the clearing portion of the circuit from clearing the flag when the set flag signal and the read status signal are both activated or HIGH at the same time. It does this by effectively canceling a control signal to the clearing portion of the circuit which is activated by the read status signal.

This invention relates in general to flag setting and reading circuits and in particular, to a self arbitrating and automatically resettable flag setting and reading circuit.
A flag or status bit signal is initiated by one part of a computer system so that another part of the computer system can be made aware of the existence or nonexistence of a condition and accordingly, take appropriate action. For example, when a microprocessor unit tries to write to an already full buffer, a buffer controller initiates a flag setting signal which is transmitted to a flag setting and reading circuit to indicate an overrun condition. The flag setting and reading circuit then sets a flag in its circuitry. To check the status of the buffer, the microprocessor initiates a flag reading signal which is transmitted to the flag setting and reading circuit. The flag setting and reading circuit then latches the previously set flag into a location accessible to the microprocessor. The microprocessor then reads the flag from the location, is made aware of the overrun condition, and stops attempting to write to the buffer until the buffer clears.

Self arbitrating auto resettable flag circuit