A system for providing conducting pads of a display panel has a base layer on a substrate, a first insulator on the base layer having a plurality of grooves, a second conductive layer inside the grooves, and a patterned third conductive layer covering the second conductive layer. The first insulator serves as a barricade for fixing the second conductive layer in the grooves.

1. Field of the Invention
The invention relates to a system for providing conducting pads.
2. Description of the Prior Art
Due to the fast development of electronics, the requirements of displays used as interfaces between machines and human are becoming more and more strict. Because liquid crystal displays (LCD) have light weight, thinness, low energy requirements, no radiation, and other good qualities, they have become the main stream in the market and are widely used in notebooks, personal digital assistants (PDA), digital cameras, cellular phones, and other communication and information equipments. Furthermore, LCDs also tend to replace the traditional cathode ray tube (CRT) monitors and CRT TVs in recent years. On the other hand, organic-light-emitting-diode (OLED) displays also have drawn attention due to the research of organic materials and their advantages of being self-light-emitting, having a high resolution, and having wide viewing angles. As a result, LCD displays, OLED displays and other flat-panel displays have become indispensable for mobile information electronics and have become more popular in people's lives.
A conventional flat display, whether a LCD or an OLED display, contains a pixel array area and a periphery circuit area, wherein a plurality of conducting pads are formed in the periphery circuit area for electrically connecting to external circuits. Please refer to FIG. 1 and FIG. 2. FIG. 1 is a schematic diagram of a top view of a flat display panel 10 according to the prior art, and FIG. 2 is a side view of the flat display panel 10 shown in FIG. 1. The flat display panel 10 is a LCD, comprising two glass substrates 12, 14, and a liquid crystal layer 16 between the glass substrates 12 and 14. As shown in FIG. 1, the upper glass substrate 12 has a smaller size than that of the lower glass substrate 14. Therefore, a portion of the glass substrate 14 is covered by the glass substrate 12 and which defined as a covered region 18, and another portion of the glass substrate 12 is an uncovered region, defined as a periphery circuit area 20. The covered area 18 includes a pixel array area (active area, AA) 11 and a control circuit area 13.
The periphery circuit area 20 has a plurality of periphery circuits and conducting pads 22 for electrically connecting to external circuits and sending signals through internal circuits in the flat display panel 10, such as DC-DC voltage lines or scan control signal lines. A conventional conducting pad structure is illustrated in FIG. 3, which is a cross-section view of the conducting pad 22 shown in FIG. 1. Conventionally, the conducting pad 22 is a multi-layer structure. As shown in FIG. 3, the conducting pad 22 in the periphery circuit area 20 comprises a first insulation layer 24, a first conductive layer 26, a second insulation layer 28, a second conductive layer 30, and a third conductive layer 32 in sequence on the glass substrate 14, wherein the third conductive layer 32 covers the surfaces of the second conductive layer 30, including the top surface and the side surfaces of the second conductive layer 30. In general, the second conductive layer 30 is formed with metal materials with lower impedance, and the third conductive layer 32 is formed with materials with higher impedance while the hardness of the materials of the third conductive layer 32 are harder than that of the materials of the second conductive layer 30.
Since the periphery circuit area 20 on the glass substrate 14 is not covered by the glass substrate 12, it is unavoidable to suffer stresses or forces during the fabrication process, assembling process, or transferring process. However, the material of the third metal layer 32 is usually so brittle that it is easily broken under such stresses or forces. Once the third metal layer 32 is broken by an external force, it may sequentially scratch and cave the second metal layer 30 formed with soft materials, and the third metal layer 32 under the external force may even shift the second metal layer 30 to cause the second metal layer 30 contact another element on the glass substrate 14, resulting in an element short. Also, when the external force scratches the third metal layer 32 and the second metal layer 30, a scratching trace may occur on the surface of the conducting pad 22 such that the flat display panel 10 becomes an inferior product under a visual test.
Accordingly, it is still an important issue for the manufacturer of displays to provide a conducting pad that has preferable structure to avoid traces, shifts or element shorts under external stresses or forces in the uncovered periphery circuit area.

Systems for providing conducting pad and fabrication method thereof


An apparatus for polishing and cleaning a semiconductor wafer (3028) is disclosed to substantially improve the efficiency of chemical-mechanical polishing. The apparatus reduces contamination to a clean room during fabrication of VLSI circuits. The apparatus includes a table (3026) supporting the wafer, and a polishing pad (3024) disposed on a surface of the wafer. The polishing pad performs chemical-mechanical polishing on the surface of the wafer. Further, at least one cleaning head (3042, 3044, 3046) is provided for cleaning the surface of the wafer. The wafer and the cleaning head are housed in a chamber (30). A guiding means (32) is used for guiding the cleaning head over the wafer to clean the surface of the wafer.

1. Field of the Invention
The present invention relates to chemical-mechanical polishing and, more particularly, to an apparatus for polishing and cleaning a semiconductor wafer.
2. Description of the Prior Art
Silicon wafers used for very large scale integration (VLSI) circuits are ideally flat. However, after many process steps, such as growth or deposition of various insulating and conductive layers, a nonplanar structure is usually formed. For example, the gate oxide of a metal oxide semiconductor (MOS) transistor is only 100-250 angstroms thick, whereas the field oxide may be 10,000 angstroms thick. The nonplanarity primarily results in two problems. The first problem is the difficulty of maintaining step coverage without breaks in the continuity of fine lines. The second problem is the inability to lithographically transfer fine-line patterns to the wafer.
More specifically, lithography techniques have steadily shifted toward the use of shorter wavelengths, such as the deep ultraviolet (DUV), in order to reduce minimum feature size. Unfortunately, decreasing the wavelength results in reducing the depth of focus (DOF). The depth of focus is an important parameter because the surface of a microcircuit has a nonplanar topographical surface. Therefore, the number of photolithography steps required to cover the microcircuit is increased, thereby increasing the time required to fabricate the microcircuit.
Techniques for planarization have been proposed to address the disadvantages associated with nonplanar surfaces. Chemical-mechanical polishing (CMP) is one of many conventional planarizing techniques used in fabricating VLSI circuits. Chemical-mechanical polishing is used as an attempt to attain a planar surface over the entire semiconductor substrate. FIG. 1A shows a cross-sectional view of a conventional CMP apparatus 10, which includes a rotating table 12 having a polishing pad 14 disposed thereon, and a rotating holder 16 that holds a wafer 18. A predetermined pressure is exerted on the wafer 18 by the polishing pad 14. As shown in FIG. 1B, a magnified cross-sectional view, an appropriate slurry 19 is applied between the wafer 18 and the polishing pad 14.
As the size of wafers has increased, a different kind of CMP apparatus 20 has been proposed to improve polishing efficiency. This CMP apparatus 20 includes a rotating table 26 that has a wafer 28 disposed thereon, and a holder 22, which is rotating or stationary, for holding a polishing pad 24. A simplified top view of this CMP apparatus 20 is shown in FIG. 2B, illustrating only the wafer 28 and the polishing pad 24.
During the polishing process, the CMP apparatus 10 (FIG. 2A) and the CMP apparatus 20 (FIG. 2A) will generate, either chemically or mechanically, unwanted particles. Such particles represent impurity concentrations that, however slight, can degrade the performance of VLSI circuits. Therefore, cleaning is essential to remove the unwanted particles and to achieve high production yield and device reliability.
In the conventional CMP process, the polished or unfinished wafers are removed from the CMP apparatus to a cleaner where some particle removal method, such as scrubbing and rinsing, is applied to remove the unwanted particles. To adequately complete the CMP process, a wafer must typically be subjected to the cleaning steps involving the CMP apparatus and the cleaner numerous times. Repeated transferring of the wafers back and forth between the CMP apparatus and the cleaner undesirably reduces production efficiency. Moreover, the transferring of the wafers further contaminates the clean environment necessary during VLSI fabrication.

Apparatus for polishing and cleaning a wafer

Vanguard International Semiconductor Corporation


A point of sale device (102) establishes a short range secure radio link (105) with a wireless payment device (104) to complete a transaction. The point of sale device transmits the transaction information to the wireless payment device (304) so the a user of the wireless payment device can approve the transaction (306). Upon approving the transaction, the wireless payment device transmits payment information to the point of sale device (308). The point of sale device uses the payment information to contact the appropriate payment source (110) to record the transaction. Upon the payment source confirming the transaction, the brand of the financial institution, card associations, and affinity groups acting as the payment source is announced so as to be observable by those in the vicinity of the point of sale device.

Wireless devices continue to gain popularity, and with new, low power wireless interfaces, which require only a very small amount of circuitry, commonly used devices can now have wireless interfaces to exchange information with other devices. There are numerous examples of devices that use short range wireless interfaces to communicate with other devices, and some of the more well known are, for example, computer input devices such as keyboards and mice, cellular phone to automobile interfaces for so-called Bluetooth enabled cellular phones, identification cards, keyless entry systems, and so on.
One application for short range wireless communications is electronic payments at a point of sale. Rather than carry credit cards, checks or cash, a user can program a wireless payment device with the user's financial and banking information to enable a point of sale device to complete a transaction. One disadvantage of wireless payment for financial institutions is in using such a payment device the brand name of the financial institution, card associations, affinity groups, and third-party providers are not publicized. Presently, when a customer uses a credit card, for example, there is an opportunity for people to see the brand. The brand is the particular logo, mark, artwork, and other observable media the business has used in association with their products and services. In fact, financial institutions, card associations, affinity groups, and third-party providers offer a variety of artwork on the cards they issue to both attract customers and for others to see when the card is used by the customer. Although the exposure of the card to the view of others is typically very brief, with a short range wireless payment financial institutions loose even that brief exposure. Therefore there is a need for a means by which the brand of the financial institution, card associations, affinity groups, and third-party providers used in making a wireless payment can be announced and further publicized.

Payment brand announcement at a wireless payment point of sale device


A force transmission device for a disc brake operable to move a friction element of the brake into engagement with a rotary brake disc along a first axis in response to a loading from an actuating member, the device comprising: a guide member having a generally cylindrical guide form; a piston comprising a complementary generally cylindrical outer sliding surface slideable within the guide member, wherein; an anti-rotation formation is provided between the guide member and the piston, the formation comprising a recess extending generally parallel to the first axis and a complementary projection.

Force transmission devices of disc brakes, particularly air actuated disc brakes, are mounted within a caliper of the brake and transmit the actuation force from the actuator to friction elements of the brake via tappets or pistons. Typically, force transmission devices also incorporate an adjuster mechanism to compensate for wear of the friction elements in use.
Various arrangements of force transmission device have been employed by air disc brake (ADB) manufacturers. Knorr-Bremse utilise SB and SN series brakes utilise externally threaded spindles that are screwed into a cross-member that is actuated by an operating shaft. The spindles are hollow and have a non-circular inner profile that interfaces with an adjuster mechanism to screw out the spindles to account for wear of the brake pads and maintain a desired running clearance between the brake pads and rotor. The outer threads are problematic for effective sealing of the interior of the brake caliper. An example of this arrangement can be seen in e.g., EP0648952.
The present applicant's ELSA2 series brakes utilise two-part pistons/tappets. The outer piston is smooth and has a trilobular profile to prevent its rotation within a complementary trilobular bush within a fixed guide plate. The inner tappet is threaded with respect to the outer piston such that rotation of the inner tappet causes the rotationally fixed outer piston to extend. By contrast with the Knorr-Bremse arrangement, the operating shaft of the ELSA2 brake transmits the actuating force directly to the inboard end face of the inner tappets.
Whilst the ELSA2 brake has been found to be highly reliable and robust in service the applicant has recognised that it is desirable to reduce the cost associated with machining the trilobular surfaces, the cost of providing seals to seal against the trilobular surfaces, and the cost of providing an inner tappet that is both a relatively complex shape and must be suitably treated to withstand the forces imposed during actuation. In addition the piston housing is presently formed from an aluminium casting having relatively costly trilobular machinings The casting also acts as a cover plate for the rotor side of the housing which requires additional treatment to avoid corrosion issues.
The present invention seeks to overcome or at least mitigate the problems of the prior art.

Meritor Heavy Vehicle Braking Systems (UK) Limited


In a process for the manufacture of contact lenses, a polymerizable contact lens material is dispensed into a mould half (1) and the mould is subsequently closed by means of the second mould half (2). The material located between the two mould halves in the moulding cavity (12) is then polymerized, thus forming an as yet unhydrated contact lens (CL). The moulding surface of one of the two mould halves (1, 2) is pre-treated, before use, in a region (20) outside the optically active zone of the contact lens (CL) in such a manner that, when the mould is opened, the contact lens (CL) adheres to the pre-treated mould half.

1. Field of the Invention
The invention relates to a process and an apparatus for manufacturing a contact lens.
2. Description of the Related Art
In the manufacture of contact lenses by the so-called full-mould process (casting process), contact lenses are usually produced by dispensing a specific amount of a polymerisable contact lens material into the female mould half. The mould is then closed by putting on the male mould half, a moulding cavity being enclosed between the two moulding surfaces. In that moulding cavity there is the previously dispensed contact lens material, which is polymerised to form an as yet unhydrated contact lens. Subsequently, the mould is opened and the polymerised but as yet unhydrated contact lens is removed and further processed.
Unfortunately, it is not possible as a rule to predict reliably to which of the two mould halves the contact lens will adhere: in some cases it adheres to the male mould half (mould half with the convex moulding surface) and, in others, it stays in the female mould half (mould half with the concave moulding surface). Neither case occurs with sufficient frequency, however, to enable an essentially fully automatic process to be tailored to one of those two cases.
The reasons for this lie inter alia in the manufacture of the mould halves. Such mould halves are usually manufactured by the injection-moulding process. The problems encountered with that process will be briefly explained using the manufacture of the female mould half 1 as an example. In injection-moulding, mould inserts of the kind shown in FIG. 1 are usually used. Such mould inserts F1 belong to the state of the art. The example shown here has the shape of a mushroom. They are produced, for example, by means of the turning technique. When turning the head K of the mushroom, first the surface K1 is turned (FIG. 2), then the surface K2 (FIG. 3). In so doing--because of turning with a turning diamond D--a burr G1 or G2 (FIG. 2, FIG. 3) is produced in each case, which has to be removed when the turning process has been completed. Removal of the burr G1 or G2 is carried out, for example, with a cotton wool bud W (FIG. 4). As a result, at the place where the burr has been removed a rounded area R is produced which deviates from the ideal, burr-free corner, said deviation from the ideal shape being in the range of a few micrometers (FIG. 5). If that mould insert F1 is then inserted and the female mould half 1 is moulded around that mould insert, a projection 10 (FIG. 6), albeit a very small projection, is produced in that area. Depending upon its size, however, when the mould halves are opened that projection may have the result that the lens remains in the female mould half because it catches on the projection, or the lens may slide over the projection so that it is found in the male mould half. It is almost impossible to say which, certainly not with the reliability necessary for an automated process. After opening of the mould, therefore, a check must be made in every case to discover on or in which mould half the polymerised but as yet unhydrated contact lens is located.

Process and apparatus for the manufacture of a contact lens


The invention provides a compiler for compiling source code files to generate corresponding object code files, the source code files including a first source code file and a second source code file, the first source code file having an initial occurrence of a unit of source code, and the second source code file having a subsequent occurrence of the unit of source code, the compiler including means for compiling the first source code file to generate the first object code file having a first unit of object code representing the initial occurrence of the unit of source code, and means for compiling the second source code file to generate the second object code file having a pointer to the first unit of object code, whereby the pointer supplants a second unit of object code representing the subsequent occurrence of the unit of source code.

A software template (which can be treated as a unit of source code), hereinafter called a 'template', is a known mechanism for reusing source code so that a software programmer can advantageously avoid rewriting or reconstructing subsequent occurrences of units of source code by using templates. Source code can include several source code files or can be a single source code file. Occurrences of a template can be found in a single source code file or in multiple source code files. A header file is usually used for defining a template. Templates are used with a computer programming language, such as C++ or ADA. However, it will be appreciated that in a generic sense a unit or source code can be repeated used in source code written in a computer programming language, such as an object oriented programming language or a structured programming language. It will be appreciated that a template can be referred by many other names, such as a "generic" in the parlance of the ADA programming language.
Referring to FIG. 1, there is depicted a compilation environment 100 for compiling a single source code file 102 having multiple occurrences of templates 104A, 104B, and 104C. A compiler 106 reads source code file 102 to generate an object code file 108 corresponding to source code file 102. Hereinafter, for the purposes of simplifying the description, the term "object code 'of' source code" will mean "object code 'corresponding to' source code". Object file 108 includes multiple occurrences of object code 110A, 110B, 110C corresponding to the multiple occurrences of templates 104A, 104B, 104C respectively. The manner in which compiler 106 operates is not adequate because compilation time was used for generating identical occurrences object code 110A, 110B, and 110C each corresponding to the same identical template, and storage space was used to store multiple occurrences of identical object code which is disadvantageously wasteful.
Generally, the prior art provides an inadequate method for compiling many source code files each having multiple occurrences of a template. Compilation time is wasted compiling the multiple occurrences of the template to generate many object code files each having multiple occurrences of identical object code of the template. In addition, the resulting generated object code files will be linked to create a bloated executable file due to the presence of the multiple occurrences of identical object code. Therefore, larger amounts of memory storage medium will be required to store the generated executable file.
Accordingly, a compiler which addresses, at least in part, these and other shortcomings is desired.

International Business Machines Corporation


A memory device includes a sense circuit comprising a sense amplifier, a reference sense circuit and a comparator. The sense amplifier detects a signal on a bit line associated with a column of memory cells in a memory array. The reference sense circuit detects a signal on a reference bit line associated with a column of reference cells in the memory array. The comparator compares the outputs of the sense amplifier and the reference sense circuit and provides a signal indicative of the contents of the read memory cell. In response to a transition of an address, the bit line and the reference bit line are precharged prior to reading of the memory cell. The reference sense circuit includes a selectable load that is disabled during the initial time after the address transition so that the bit line and the reference bit line rises substantially identically and then enabled to allow the reference bit line to settle to a steady state.

The present invention relates to memory devices, and more particularly relates to differential sensing of memory cells.
Flash memory devices include a memory array of memory cells arranged in rows and columns. A reference column of reference memory cells generates reference voltages for comparing to data stored in columns of memory cells. A sense circuit includes a plurality of sense amplifiers, a plurality of reference sense amplifiers, and a plurality of comparators. One of the sense amplifiers is coupled to a corresponding bit line that is coupled to a column of memory cells. Each of the reference sense amplifiers is coupled to a reference bit line that is coupled to the reference column of reference memory cells. One of the comparators is coupled to a corresponding sense amplifier and a corresponding reference sense amplifier for generating a signal indicative of the content of the read memory cell. The output of the comparator is latched and buffered. Before reading the memory cell, the bit line and the reference bit line are precharged. Before the data can be read and latched, the precharge voltage on the bit line and the reference bit line must settle.
The present invention provides a sense amplifier circuit that comprises a sense amplifier, a reference sense circuit and a comparator. The sense amplifier provides a sense signal in response to a voltage level on a bit line. The reference sense circuit provides a reference sense signal in response to a voltage on a reference column line. The reference sense circuit provides variable loading on the reference column line in response to a delay signal. The comparator provides a signal indicative of the signal on the bit line in response to the sense signal and the reference sense signal.
In one aspect of the invention, the delay signal is applied in response to a detected address transition. The delay signal may have a pulse width sufficient to allow precharge signals applied to the bit line and the reference bit line to achieve a near steady state condition.
In another aspect of the present invention, a memory circuit comprises an array of memory cells arranged in rows and columns and including a column of reference cells, a plurality of bit lines, and a reference bit line. Each of the plurality of bit lines connects a corresponding column of memory cells. The reference bit line connects the column of reference cells. A decoder is coupled to the rows of memory cells for selecting a row of memory cells and a corresponding reference cell in response to an address signal. An address detection circuit provides an address detection signal and a delay signal in response to a change of the address signal. A precharge circuit is coupled to the address detection circuit and the memory array for precharging the plurality of bit lines and the reference bit line in response to the address detection signal. A sense amplifier circuit comprises a sense amplifier, a reference sense circuit and a comparator. The sense amplifier provides a sense signal in response to a voltage level on a bit line. The reference sense circuit provides a reference sense signal in response to a voltage on a reference column line. The reference sense circuit provides variable loading on the reference column line in response to a delay signal. The comparator provides a signal indicative of the signal on the bit line in response to the sense signal and the reference sense signal.


The present invention relates to an inflator device that is adapted for producing a sufficient quantity of a gaseous product to substantially inflate an inflatable member. The inflator device has a first stage gas source in fluid communication with a second stage gas source, which, in turn, is in fluid communication with the inflatable member. The second stage gas source contains a liquified gas in an amount sufficient to inflate the inflatable member upon vaporization of the liquified gas, and the first stage gas source is capable of providing a sufficient quantity of gas at a sufficiently high temperature to the second stage gas source to vaporize substantially all of the liquified gas in the second stage gas source.

Initially, gas generators used to inflate large emergency exit ramps or slides on commercial aircraft used a pyrotechnic gas generant that produced a large volume of hot gas on combustion. However, it was soon discovered that the temperature of the hot gas was sufficiently high to burn the fabric used to construct the exit ramp or slide, as well as anyone using the ramp or slide. In addition, because the temperature of the inflation gas was well above the ambient temperature, the ramp or slide would partially deflate as the gas cooled and the pressure of the gas decreased as a result of the temperature change. This was particularly true if the airplane was required to put down in cold water, such as that found in northern oceans.
In an attempt to overcome the deficiencies of pyrotechnic inflators, as described above, such rafts and ramps or slides were inflated using a compressed gas, as disclosed in U.S. Pat. No. 4,355,987 to Miller and U.S. Pat. No. 5,586,615 to Hammer et al. However, where only a compressed gas is utilized to inflate the raft or ramp or slide, a large drop in temperature occurs in the gas as it expands, often causing ice to form, which can block the flow of gas. To overcome these problems, emergency exit ramps or slides and rafts presently carried on commercial aircraft typically employ an inflation system comprising a compressed gas source and an aspirator, such as that disclosed in U.S. Pat. No. 4,368,009 to Heimovics et al. As the compressed gas is released, the vacuum produced thereby causes the aspirator to ingest about four times as much gas as is supplied by the compressed gas source.
However, even these aspirator systems have several disadvantages. They are large and heavy, and produce gas at a relatively slow rate. Moreover, the rate is further slowed as the back pressure of the gas in the object being inflated increases. This can cause difficulties, e.g., in the deployment of an emergency ramp or slide from an aircraft that has landed in water. Because of the slow rate of inflation, a ramp or slide may float under the aircraft before becoming fully inflated, and become trapped. Even where the ramp or slide does not become trapped, the slow rate of inflation may force occupants of the aircraft to wait for the ramp or slide to fully inflate, which can result in panic on the part of the passengers. Therefore, it is desirable to minimize the amount of time required to inflate the ramp or slide.
The weight of an aspiration inflator system is high even when the high pressure container required to store the pressurized gas is made from lightweight materials, such as titanium with a wound graphite filament overwrap. This reduces the carrying capacity of the aircraft. These systems also present a maintenance problem to ensure that the required gas pressure is maintained, and that the aspirator will function properly. Moreover, even using a high pressure gas source, an aspiration system can only provide a maximum pressure of about 2 psig, i.e., about 2 psi above normal atmospheric pressure. Therefore, to support occupants from the aircraft, an inflatable member inflated with an aspirator system must be much larger than would be required if the member was inflated to a higher pressure.
Therefore, there remains a need for a rapid, relatively low weight inflator that is able to inflate an aircraft emergency exit ramp or slide, life raft, or other relatively large inflatable objects rapidly and to a relatively high pressure. The present invention provides such an inflator.

Apparatus for rapid inflation of inflatable object and related method


A method includes receiving information indicative of a first worksite plan, determining a travel path extending along a work surface, causing a mobile machine to traverse the travel path, and receiving first sensor information associated with the work surface from a sensor of the mobile machine. The method also includes generating a second worksite plan based at least partly on the first sensor information, and providing instructions to a slave machine which, when executed by a controller of the slave machine, cause the controller of the slave machine to control the slave machine to perform at least part of the second worksite plan. The method further includes receiving second sensor information determined by the sensor of the mobile machine, and generating at least one of a safety metric and an accuracy metric based at least partly on the second sensor information.

At a paving, construction, mining, or other such worksite, one or more heavy-duty machines can be used to modify a work surface. For example, in some paving worksites, an excavator, cold planer or other such machine may be employed to remove a portion (e.g., a top layer) of the work surface to expose a paving surface. In such examples, once the paving surface is exposed, one or more other machines (e.g., a paving machine, a compaction machine, etc.) may be used to perform further operations on the paving surface until a desired outcome is reached at the worksite.
Due to the size of many worksites, the large number of machines in operation at such worksites, and the complexity of the operations being performed by such machines, it can be difficult to coordinate the activities of such machines. This difficulty increases when autonomous or semi-autonomous machines are used to perform various operations at the worksite. For instance, it may be difficult for large, heavy-duty, autonomous machines to determine the contours, boundaries, and other characteristics of the work surface before beginning operations at the worksite. As a result, such machines may be prone to damage and/or failure caused by encountering unexpected obstacles at the worksite. Additionally, while such machines may employ onboard sensors to identify other machines, workers, or other objects disposed on the work surface, the fields of view of the respective sensors may be at least partially blocked by conveyors, booms, sticks, implements, and other components of such machines. As a result, the effectiveness of such sensors may suffer, thereby increasing the risk of machine damage and potentially putting such objects in harm's way. Moreover, due to the rugged conditions at most worksites, it may not be desirable to mount relatively expensive and delicate sensors on such machines since such sensors may be easily damaged in such conditions.
An example system for use in controlling various machines is described in U.S. Pat. No. 9,879,386 (hereinafter referred to as the '386 patent). In particular, the '386 patent describes a system for coordinating operations of a cold planer and a paving machine at a worksite. The system described in the '395 patent also includes a sensor operable to generate a signal indicative of a position of the cold planer, a production monitoring system associated with the cold planer, and a communicating device operable to exchange information between the cold planer and the paver. The '386 patent does not, however, describe examples in which sensors may be utilized to determine the contour, boundary, and/or other characteristics of the worksite, as well as the presence and location of various objects at the worksite, without the respective fields of view of such sensors being at least partly obstructed. Moreover, the '386 patent fails to describe examples in which such sensors may also be utilized to monitor the performance of various operations by the machines at the disclosed worksite.
Example embodiments of the present disclosure are directed toward overcoming the difficulties described above.


A pole base bolt template that provides easy and accurate means to hold pole anchor bolts and a rebar cage in a pole base form while pouring concrete or other filling material into the form. The pole base bolt template comprises a plurality of arms disposed around a central hub, each arm comprising a slotted bolt hole, bolt diameter markings, and a form hook adaptable to secure the template to a form, and each arm being shaped so as to raise the entire template above the top of the form. The template further comprises a plurality of gaps between the arms that allow easy access to the form and the filling material.

1. Technical Field of the Disclosure
The present invention relates in general to templates for installing pole bases. More specifically, the present disclosure relates to a pole base bolt template for providing an easy and accurate means to hold pole anchor bolts and a rebar cage in a pole base form while pouring concrete or other filling material into the form for the future installation of a pole.
2. Description of the Related Art
Pole base bolt templates allow contractors to easily install pole anchor bolts and rebar cages in pole bases. Pole bases, which are used to support among other items, street lights, parking lot lights, street signs, parking lot signs, traffic signals, flag poles, lighting fixtures, and other column-like structures generally comprising a concrete base including anchor bolts, rebar cages, and conduit stubs, and generally support any column made of concrete, metal, wood, or other suitable materials. Pole base bolt templates allow pole anchor bolts and rebar cages to be set accurately in the concrete base form at the correct bolt circle alignment, angle, projection (height) and in a level arrangement. Ideally, pole base bolt templates come in a variety of sizes to accommodate different form sizes, and include means to allow for bolt placement to meet various bolt patterns as well as different bolt sizes for use in various situations.
Conventional templates for supporting anchor bolts and rebar cages in pole base installations suffer from considerable drawbacks. For example, these templates often require additional materials to support the template, require extensive modification for each application, or are custom-made for each installation and generally not reusable. These limitations frequently make such conventional templates expensive, both in terms of material cost and labor cost. Such conventional templates are typically cumbersome to use, often requiring additional manpower to pour and finish the base. Additionally, such conventional templates frequently yield inconsistent results. Pole bases constructed using these crude templates frequently suffer misalignment of the anchor bolts, un-centered rebar cages, leaning bases, unfinished tops of bases, bottom leveling nuts buried in the concrete base, inaccurate bolt projections, and the necessity of re-working the pole base, thereby increasing the labor and material costs. Also, conventional templates must be removed during the concrete finishing process in order to provide access for the installers to smoothly finish the concrete on top of the pole base and remove the bottom-leveling nut from the concrete for future use. This premature removal of the template can compromise the structural integrity of the base as well as disturb the alignment of the anchor bolts and rebar cage. That is to say, the conventional template itself often impedes the ability of workers to reach the top of the pole base in order to smooth the pole base concrete, as well as to save the bottom nuts for reuse. Two commonly used conventional templates are: 1) a simple assembly of 2×4 dimensional lumber and fastening devices; and 2) a square template made of plywood. Both of these conventional templates require the drilling of holes for anchor bolts and are sometimes removed after the concrete has hardened. This leaves indentations and other marks on the hardened concrete pole base, which later require chipping, patching or sacking of the base. Many times these conventional templates are removed while the concrete is still wet, potentially disturbing the bolts and rebar cage, and thus potentially compromising the structural integrity of the pole base.
Therefore, there is a need for a pole base bolt template that will provide a cost effective and improved means for anchor bolt and rebar cage installation. Such a template would provide an efficient and accurate means of anchor bolt and rebar cage installation, and would not require any additional material to support the template itself and would be reusable. Such a template would be raised from the top of the concrete form to keep the bottom leveling nuts and washers out of the concrete. Such a template would also provide easy access for the installer to create a smooth concrete finish on the top of the pole base at the time the concrete is poured into the form instead of attempting to remove the template and finish the top surface while the concrete is only partially set, or patching or chipping the top surface later.


The present invention relates to additive composition for control and inhibition of polymerization of monomers including styrene, wherein the composition consists of:                (a) one or more of quinone methide derivatives; and        CHARACTERIZED IN THAT the composition further comprises:        (b) one or more of tertiary amines,        wherein said tertiary amine is selected from a group consisting of:        (i) tri isopropanol amine (TIPA),        (ii) N,N,N′,N′-Tetrakis(2-hydroxyethyl)ethylene-diamine) (THEED), and        (iii) mixture thereof.

The polymerization of monomers, particularly of styrene during processing is a matter of concern, because it causes formation of unwanted polymers and results in loss of yield of end product and makes the process un-economical.
In the prior art use of inhibitors and retarders, and combination thereof to overcome problem of polymerization of styrene has been reported.
The problem of using the inhibitors alone is that these are to be added continuously or at regular interval, because once they are consumed, the polymerization will re-start.
The problem of using the retarders alone is that these are not very effective to reduce polymerization of styrene to a level of substantial inhibition or to the commercially acceptable level of inhibition.
The prior art discloses use of some of quinone methide (QM) derivatives including 4-benzylidene, 2,6 di tert butyl cyclohexa-2,5 dienone as polymerization inhibitor. However, the inventor has found [refer to examples—Table 1] that main problem of using the quinone methide (QM) is that it has to be used in higher amounts to achieve commercially acceptable level of inhibition, and such higher amount not only results in increase of cost of process, but also results in formation of undesired products due to unstable nature of quinone methide.
The prior art also proposes quinone methide based composition comprising quinone methide (QM) derivatives including 4-benzylidene, 2,6 di tert butyl cyclohexa-2,5 dienone and 4HT (4 hydroxy tempo 2,2,6,6-tetramethyl-, 1-oxide) as styrene polymerization inhibitor. However, the inventor has found that main problem of using this known composition of quinone methide is that even at higher amounts the problem of polymerization is not resolved to commercially acceptable level.
The prior art [U.S. Pat. No. 7,651,635] discloses use of combination of an inhibitor and a retarder, wherein the inhibitor is "polymerization inhibitor" consisting of alkylhydroxylamine and retarder is 7-substituted quinone methide (substituted QM). The main problem of this composition is that it employs inhibitor, which are consumed continuously and get gradually depleted, and hence, the inhibitor has to be added continuously or intermittently or at least it has to be ensured that an appropriate amount of the inhibitor is maintained in the system [Col. 4, lines 7-13 of US'635].
The co-pending International (PCT) patent application no. PCT/IN2012/000553 discloses an additive composition comprising quinone methide (QM), and amine or oxide treated derivative of amine.
The another co-pending International (PCT) patent application no. PCT/IN2012/000839 discloses an additive composition comprising:
(A) one or more of the quinone methide or derivatives thereof,
(B) one or more of nitroxides (i.e. nitroxyl) compounds, and
characterized in that the said composition further comprises:
(C) one or more of aliphatic tertiary amines or mixture thereof.

This patent is subject to a terminal disclaimer.

Composition of quinone methide derivatives and amines for control and inhibition of polymerization of monomers, and method of preparation and use thereof

Abstract: In one embodiment, the present invention relates to method of preparation thereof and uses thereof, and a method for controlling and inhibiting polymerization of monomers including styrene.

Dorf Ketal Chemicals (India) Private Limited


In a reflective a display device based on layer break up or layer displacement having at least two different states, in which one of the fluids (5) e.g. oil in a first state adjoins at least a first support plate (3) and in the second state the other fluid (6) at least partly adjoins the first support plate, in which picture elements are separated by areas (13) having a hydrophilic surface dyes (or sometimes pigments) are added to the oil (usually hydrocarbon but also possibly silicone or fluorocarbon), to provide sufficient optical intensity.

Optical switches may be used in shutter applications, diaphragms, but also in switchable color filters in e.g. display applications. If the fluid is a (colored) oil and the second fluid is water (due to interfacial tensions), a two-layer system is provided which comprises a water layer and an oil layer. However, if a voltage is applied between the water and an electrode on the first support plate, the oil layer moves aside or breaks up due to electrostatic forces. Since parts of the water now penetrate the oil layer, the picture element becomes partly transparent.
Display devices based on this principle have been described in PCT-Application PCT/IB03/00196 (PH-NL 02.0129).
When used in a reflective display the optical performance of a picture element depends a. o. on the optical intensity of the colored film in the non-reflective state (off state) dyes (or sometimes pigments) are added to the oil (usually hydrocarbon but also possibly silicone or fluorocarbon), to provide sufficient optical intensity. Using the electro-wetting display principle the brightness in the reflective state (on state) is dependent on the scattering properties of the (underlying) substrate and the area fraction occupied by residual oil. This implies that the use of as little oil as possible will yield a high brightness. Contrast however also depends on the intensity and homogeneity of the optical intensity of the colored film in non-reflective state, so for high contrast a thicker layer of oil would be preferable.

Display device based on electrowetting effect


A cooling structure for electronic equipment including a plurality of electronic devices superposed on each other, each of the electronic devices having a lower part where an air ventilation part configured to ventilate air so as to cool the electronic device is provided, the cooling structure includes an air intake and exhaust hole forming part which is formed at an upper part of a first one of the electronic devices and below the air ventilation part of a second one of the electronic devices provided on the first electronic device. Air outside of the electronic equipment is taken into an inside of the second electronic device or air inside of the first electronic device is exhausted to the outside of the electronic equipment via the air intake and exhaust hole forming part, so that an amount of the air ventilated inside of the first electronic device is controlled.

1. Field of the Invention
The present invention generally relates to cooling structures and cooling methods for electronic equipment, and more particularly, to a cooling structure and a cooling method for electronic equipment which is composed of a plurality of electronic devices superposed on each other.
2. Description of the Related Art
A structure where plural electronic devices are superposed on each other in a rack is applied for electronic equipment such as telecommunication equipment. More specifically, plural plug-in units wherein electronic parts such as an integrated circuit (IC) or a large scale integration circuit (LSI) are mounted on a printed wiring board are received in a shelf. The plug-in unit is plugged in a back board provided in the shelf by a connector of the plug-in unit so that a single electronic device is formed.
In the above-mentioned electronic equipment, the temperature of an inside of the electronic equipment rises due to generation of heat of the electronic parts or others. Because of this, a forced air type of cooling means is applied in order to keep the temperature of the inside of the electronic equipment as a desirable temperature. More specifically, a fan having a high cooling ability is installed and operated into the electronic equipment so that air is forcibly taken in the electronic equipment from the outside and circulated inside of the electronic equipment. As a result of this, the electronic parts which generate heat are cooled and then the heat is discharged outside.
Conventionally, the operation of the fan, which forcibly cools the inside of the electronic equipment wherein plural electronic devices are superposed on each other in the rack, is determined based on an air flow whereby the electronic devices can be cooled so that the temperature in the electronic equipment is prevented from exceeding a temperature at which it is guaranteed that the electronic devices can be properly operated, namely an operation guarantee temperature, on the assumption that the greatest number of the plug-in units are installed in the shelf so that a calorific value generated when the greatest number of the electronic devices are installed in the rack, namely a maximum calorific value, is generated.
According to the above-discussed conventional forced air type cooling means, the fan is set up and always driven so that the air flow corresponding to the maximum calorific value is always generated regardless of the amount of the rack actually occupied by the electronic devices. Therefore, the fan always consumes the maximum amount of consumption electric power.
However, as a matter of fact, the greatest number of the plug-in units is not always installed in the shelf. Hence, there are a lot of cases wherein the calorific power generated by the electronic equipment does not reach to the maximum calorific power.
According to the conventional forced air type cooling means, even in this case, the fan is set up and always driven so that the air flow corresponding to the maximum calorific value is always generated so that the fan generates air flow larger than necessary. Therefore, in the conventional forced air type cooling means, there is waste of electric power.
Meanwhile, in other conventional art, a necessary number of temperature sensors are provided at proper parts in the electric equipment. By this sensor, the temperature of parts generating heat on the printed circuit board is always detected directly or indirectly. In addition, in this art, in order to make the temperature in the electronic equipment be equal to a setting temperature, a signal corresponding to a difference between the temperature in the electronic equipment and the setting temperature is output to a rotation control part.

Cooling structure and cooling method for electronic equipment


Semiconductor devices and methods for fabricating semiconductor devices are provided. In one example, a semiconductor device includes a semiconductor structure. An electrically semi-insulating passivation layer overlies the semiconductor structure. An electrically substantially fully insulating passivation layer overlies the electrically semi-insulating passivation layer.

Semiconductor devices including fast recovery diodes ("FREDs") are well-known and are a hybrid of Schottky diodes and P-N junction diodes. This arrangement produces a lower forward voltage drop at higher currents, along with a higher switching speed than is available in only a P-N junction diode or a Schottky diode. It is desirable when switching from current passing mode (when a semiconductor device is forward biased) back to current blocking mode (when the semiconductor device is reverse biased) that the required reverse voltage can be achieved quickly and that this voltage remains stable once achieved.
It is important for fast recovery diodes to have a stable reverse bias breakdown voltage (reverse bias breakdown voltage is also sometimes referred to as blocking voltage) to ensure the performance and reliability of the semiconductor device. Unfortunately, some fast recovery diodes, especially those being used in relatively high voltage applications (e.g., about 500 V or greater (e.g., about 500 V to about 2000 V)), can have reverse bias breakdown voltages that can change or become unstable, for example, when the diode is exposed to moisture (e.g. high humidity conditions for example greater than about 60% relative humidity) and/or when trace amounts of ionic contamination (e.g., sodium or the like) are present on the surface layer of the diode or the like semiconductor structure. In particular, when a negative voltage bias is applied, for example, to the main anode of some fast recovery diodes in the presence of high humidity, dormant surface charges on the exterior of the diode can become mobile and pool together to create localized pockets of electric fields in undesirable locations that can alter the depletion zones of the dopant tubs or wells of the diode, causing a reduction (e.g., "walk-in" effect), for example, in the reverse bias breakdown voltage, thereby detrimentally affecting the performance and reliability of the semiconductor device. Additionally, in some cases when the device is not packaged and/or is not in a controlled low humidity environment, the degrading effect of moisture on the reverse bias breakdown voltage can be more severe. Therefore, the testing conditions for the device should be considered when determining the magnitude of these effects on the device.
Accordingly, it is desirable to provide semiconductor devices including semiconductor structures such as fast recovery diodes or the like that have a stable reverse bias breakdown voltage, for example, even in the presence of moisture, to improve the performance and reliability of the semiconductor device and methods for fabricating such semiconductor devices. Furthermore, other desirable features and characteristics will become apparent from the subsequent detailed description and the appended claims, taken in conjunction with the accompanying drawings and this background.

Semiconductor devices including semiconductor structures and methods of fabricating the same


Accessing data stored in a memory device through an interface, with addressing data on the memory device through at least one address bus, controlling at least data flow to and from the memory device through at least one command bus, and transferring data to and from the memory through at least one data bus wherein commands on the command bus are adjusted depending on the type of memory connected to the interface.

Memory technology implies the need for accessing data within memory devices, such as DRAM or other memory devices. Therefore, different addressing strategies have already been proposed.
A possible feature of DRAMs is address multiplexing. This technique enables splitting the address in half and feeding each half in turn to the chip on the address bus pins.
The chip has a large array of memory capacitors that are arranged in rows and columns. To read one location in the array, the control circuit first calculates its row number, which it places on the DRAM's address pins. It then toggles the row address select (RAS) pin, causing the DRAM to read the row address. Internally, the DRAM connects the selected row to a bank of amplifiers called sense amplifiers, which read the contents of all the capacitors in the row. The control circuit then places the column number of the desired location on the same address pins, and toggles the column address select (CAS) pin, causing the DRAM to read the column address. The DRAM uses this to select the output of the sense amplifier corresponding to the selected column. After a delay called the CAS access time, this output is presented to the outside world on the DRAM's data I/O pin.
To write data to the DRAM, the control logic uses the same two-step addressing method, but instead of reading the data from the chip at the end of the operation, it provides data to the chip at the start of the operation.
After a read or write operation, the control circuit returns the RAS and CAS pins to their original states to ready the DRAM for its next operation. The DRAM requires a certain interval called the precharge interval between operations.
Once the control circuit has selected a particular row, it can select several columns in succession by placing different column addresses on the address pins, toggling CAS each time, while the DRAM keeps the same row activated. This is quicker than accessing each location using the full row-column procedure. This method is useful for retrieving microprocessor instructions, which tend to be stored at successive addresses in memory.
In addition, the provision of commands is typically provided through command strobes on the command bus. The number of different commands depends on the number of pins on the command bus with 2N commands being a possibility with N being the number of pins at the command bus. With the increasing demand for different commands, the command bus needed to be expanded. However, as die size is a crucial factor in application specific integrated circuit (ASIC) design, the number of pins on the command bus needs to be decreased.
Further, the size of the buses is also relevant for the overall size of the connection interface between the memory device and the central processing unit (CPU). The higher data rates that were required, the higher the number of connection pins on the data bus were selected. This increased the size of the interface. In addition, the number of pins on the address bus and the overall number of pins of the interface determined the type of memory to be used on the interface, besides protocol issues. However, the demand for flexibility of usage of different kinds of memory devices was not accounted for. There is a need for a flexible interface, which enables the use of different kinds of memory devices with different kinds of capabilities in terms of data throughput on the data bus.
With the rising need for flexible use of standard components, there is a need for providing a memory interface enabling to use both volatile memory and non-volatile memory on one same interface. However, as non-volatile memory and volatile memory have different prerequisites for the interfaces, there needs to be a possibility to adapt the interface for use with both types of memory.

Memory interface for volatile and non-volatile memory devices


A universal connector for connecting a mop frame to a fluid source. The universal connector includes an upper connector piece with a proximal end for connection to a mop housing and a distal end with a pair of pivot arms. A fluid distributor having a hollow nipple portion connects to the fluid source and has a pair of pivot plates for pivotal connection to the upper connection piece for side to side pivot. Fluid distributor also has a pair of opposed elongated hollow arms for coupling to a mop frame. A fluid conduit passing through the upper connector piece from the fluid source and connected to the nipple portion of the distributor for distribution of fluid to the mop frame through the hollow distributor arms. Fabric mop pockets with an opening to permit rotation of the mop frame about the distributor.

The invention relates generally to a fluid mop, and more particularly to a universal connector for connecting a mop frame to a fluid source in the mop housing.
Wet and dry mops have been widely used for cleaning floors. A type of wet mop is a steam mop, which works as a steaming device.
Steaming devices used to apply steam to household objects are well known. The uses of the devices vary widely, and may include the application of steam to drapes or other fabrics to ease wrinkles, and the application of steam to objects to assist in cleaning the objects.
Typical steam devices have a reservoir for storing water that is connected to an electrical water pump with an on/off switch. The exit from the electric water pump is connected to a steam boiler with a heating element to heat the water. The heated water generates steam, which may be directed towards its intended destination through a nozzle which controls the application of the steam. Variation of the shape and size of the nozzle allows for preferred distribution of generated steam to an object to be cleaned. The nozzles may be disconnectable from the steam generator to allow different nozzles to be utilized, based on the object to be steamed. The nozzle may be either closely coupled to the steam generator, or located at a distance from the steam generator, requiring tubing or other steam transfer structures to be interconnected between the steam generator and the discharge nozzle. Typically, these connections provide suitable limited steering capabilities.
Accordingly, it is desirable to provide a universal connector for connecting the mop frame to a fluid source for changing the angle between the housing and frame, to provide a full range of steering and that easily disconnects from the mop frame.


A method for simulating a gas turbine including the steps of: sensing values of a plurality of first operating parameters of an actual gas turbine; applying the sensed values of the first operating parameters to a model of the gas turbine, wherein the model generates a plurality of predicted second operating parameters; determining difference values between the predicted second operating parameters and corresponding sensed second operating parameters of the actual gas turbine; modifying the difference values based on tuning factors generated by a Kalman filter gain matrix during operation of the gas turbine, and using the adjusted difference values to adjust the model of the gas turbine. The method may further comprise generating the tuning factors by applying to the model the sensed values of the plurality of first operating parameters and perturbated values of the adjusted different values to determine optimal tuning factors.

The present invention relates generally to control systems for power generation and industrial gas turbines. In particular, the invention relates to a gas turbine control system having a Kalman filter applied to tune an electronic model of an industrial gas turbine.
Industrial and power generation gas turbines have control systems ("controllers") that monitor and control their operation. These controllers govern the combustion system of the gas turbine and other operational aspects of the gas turbine. Typically, the controller executes scheduling algorithms that adjust the fuel flow, inlet guide vanes (IGV) and other control inputs to ensure safe and efficient operation of the gas turbine.
Gas turbine controllers typically receive input values of measured operating parameters and desired operating settings that in conjunction with scheduling algorithms determine settings for control parameters to achieve the desired operation. Measured operating parameters may include but are not limited to compressor inlet pressure and temperature, compressor exit pressure and temperature, turbine exhaust temperature, generator power output. Desired operating settings may include but are not limited to generator power output, and exhaust energy. Control parameters may include but are not limited to fuel flow, combustor fuel splits, compressor inlet guide vane, and inlet bleed heat flow.
It is presumed that the values prescribed by the scheduling algorithms for the control parameters will cause the gas turbine to operate at a desired state, such as at a desired power output level and within defined emission limits. The scheduling algorithms incorporate assumptions regarding the gas turbine, such as that it is operating at a certain efficiency, with a certain flow capacity and at other assumed conditions.
As the gas turbine operates for an extended period, component efficiencies tend to degrade, flow capacities and other operating conditions vary from the assumed conditions. Because of this deterioration, the control scheduling algorithms becomes increasingly out of tune and causes the gas turbine to operate at states that increasingly diverge from the desired operational state.
The feedback signals assist in adjusting the algorithms to compensate for changes in the gas turbine. However, feedback signals do not tune the control scheduling algorithms to entirely compensate for degradation of the performance of the turbine. As performance degrades, the controller has increasing difficulty in operating the gas turbine at the desired operational state.
To correct for changes in the efficiency and flow capacity, the gas turbine is periodically "tuned" which generally requires an engineer or technician to manually adjusts the gas turbine. The gas turbine may needed to be taken off-line to be instrumented for tuning.
There is a long felt need for gas turbine control systems that automatically adjust to changes in the gas turbine, e.g., component efficiencies and flow capacities, that occur during long term operation of the turbine. Further, there is a long felt need for control systems that require less manual tuning than is required for traditional control systems.

Method and system for gas turbine engine simulation using adaptive Kalman filter


A message board assembly including a support layer, a top layer, and a magnetic attachment layer. The top layer is coupled to a top surface of the support layer and may include a dry erase surface. The magnetic attachment layer is coupled to a bottom surface of the support layer and extends substantially across the entirety of the bottom surface.

Message board assemblies are useful in home and office applications as they allow a user to display information. When the message board assembly includes a dry erase surface, the information may be displayed for a time and then erased when no longer needed. It is desirable to provide a convenient method for attaching the message board assemblies to common surfaces found in home and office environments to facilitate use of the boards.


The present disclosure relates to stable cosmetic compositions for delivering high amounts of ascorbic acid (vitamin C) and ceramides to the skin, products containing such cosmetic compositions, and methods for treating skin using the cosmetic compositions. The cosmetic compositions include ascorbic acid, one or more ceramides, panthenol, one or more monoalcohols having from 2 to 6 carbon atoms, one or more polyols, one or more fatty compounds, one or more emulsifiers, one or more cationic surfactants, and water. The cosmetic compositions are particularly useful for treating the effects of skin aging, for example, reducing the appearance of wrinkles and improving skin tone.

Skin acts as a natural barrier between internal and external environments and therefore plays an important role in vital biological functions such as protection against mechanical and chemical injury, micro-organisms, and ultraviolet damage. Human skin is made up mainly of two main layers, the dermis and the epidermis, which superficially covers the dermis. The dermis provides the epidermis with a solid support. The dermis is composed mainly of fibroblasts and an extracellular matrix of collagen, elastin, and a substance known as ground substance. These components are synthesized by the fibroblasts.
The epidermis, which covers the dermis and is in direct contact with the external environment, has the main role of protecting the body against the dehydration and external attack. Natural human epidermis is composed mainly of three types of cells, namely keratinocytes, which form the vast majority, melanocytes and Langerhans cells. Each of these cell types contributes to protecting the body against external attacking factors (the weather, ultraviolet rays, tobacco, etc.). The epidermis is a keratinized, stratified pavement of epithelium that is about 90% keratinocytes. The gradual differentiation of the cells of the basal membrane, which separates the dermis from the epidermis, towards the surface of the epidermis includes the differentiation of keratinocytes, which migrate towards the surface of the skin, where they desquamate.
Ageing of the epidermis results in a reduction of thickness. Atrophy of the epidermis is the consequence of the slowing down of keratinocyte proliferation and of the accumulation of senescent keratinocytes. The outer layer becomes dull. The cells constituting the epidermis are delimited by a lipid domain. In the course of differentiation, phospholipids, the role of which consists in producing the fluid structure of the cell membranes of the living layers of the epidermis, are gradually replaced by a mixture composed predominantly of fatty acids, cholesterol and ceramides (sphingolipids).
These lipids are organized in specific lamellar structures, the integrity of which depends on the quality of the fractions present, but also on their respective proportions. This lamellar structure of the lipids of the lipid domain of the epidermis is responsible for the fluidity and thus the suppleness of the skin. The lipids are also responsible for the "barrier" properties of the epidermis, particularly of the stratum corneum.
The epidermal lipids are mainly synthesized in living epidermis. They are made up mainly of phospholipids, sphingolipids, cholesterol, free fatty is acids, triglycerides, cholesterol esters and alkanes. The phospholipids are essential for the constitution of cell membranes. They play an important role in the mediation of extracellular signals and the formation of free aliphatic chains used for energy production. They constitute a reservoir of free fatty acids necessary for the constitution of the sphingolipids. The cholesterol plays a fundamental role in moisturization of the skin and in the "barrier" function of the epidermis. Free fatty acids play a major role in maintaining the lamellar structure of the lipids of the stratum corneum, and also in the constitution of cell membranes, where they are responsible for the membrane fluidity, but also for physiological processes such as the functioning of receptors or enzymatic activity.
Ceramides are lipids that play a paramount role in the metabolism of the epidermis, and are necessary for maintaining the multilamellar structure of the intercorneocytic lipids. They are also essential for the "barrier" function of the epidermis and for water exchanges, especially for overcoming age-related moisturization problems. It has been suggested that ascorbic acid (vitamin C), and certain derivatives thereof, may promote an increase in the synthesis of ceramides.
Vitamin C is a potent antioxidant that can be used topically in dermatology to treat and prevent changes associated with photoageing, hyperpigmentation, etc. Vitamin C is very unstable and difficult to formulate and deliver into the dermis. Research has been ongoing to develop stable compositions that deliver high amounts of ascorbic acid to the skin.

Cosmetic composition comprising vitamin C and ceramides


A simple, compact and inexpensive ultrasonic wave diagnostic apparatus of electronic focus type in which the delay amount for controlling the phase of a transmission signal for each piezoelectric element is stored in a delay amount storage unit, the pulse width for controlling the frequency of the transmission signal for each piezoelectric element is stored in a pulse width storage unit, the time elapsed from a reference time point is counted by a counter, a change point of the transmission signal from the reference time point is calculated by a processor, the output of the processor is compared with the output of the counter by a comparator, a plurality of clock signals having different phases are generated by a multiphase clock generator, a clock generated by the multiphase clock signal generator is selected by a selective controller, and a pulse of the transmission signal is generated on the basis of the selected clock by a toggle circuit. The delay amount, the duty factor and the frequency of the transmission signal are controlled for each piezoelectric element to converge the ultrasonic wave beam, thereby making possible a highly accurate diagnosis with high image quality.

1. Field of the Invention
The present invention relates to an ultrasonic wave diagnostic apparatus or more particularly to an ultrasonic wave diagnostic apparatus of electronic focus type in which an ultrasonic beam is converged by controlling the phase of a signal transmitted from a plurality of piezoelectric elements.
2. Description of the Related Art
In conventional ultrasonic wave diagnostic apparatuses of electronic focus type, the ultrasonic wave beam is converged or deflected by displacing the transmission time of the ultrasonic waves from a plurality of piezoelectric elements and thus controlling the focus of the transmitted waves.
A first conventional ultrasonic wave diagnostic apparatus of this type is disclosed in JP-A-62-277944 (JP-B-6-96016). FIG. 5 shows a configuration of an ultrasonic transmission wave focus control circuit of the conventional ultrasonic wave diagnostic apparatus, and FIG. 6 is a timing chart of an output waveform of the apparatus. The conventional ultrasonic wave diagnostic apparatus, as shown in FIGS. 5 and 6, comprises a delayed clock generating circuit 51 for generating multiphase delayed clock signals CK1 to CK4 and controlling the delay amount of .DELTA.T, a delayed data latch circuit 52 for storing the delay time, a multiplexer 53 for selecting one clock CK0 signal (CK4 in FIG. 6) from the delayed clock signals CK1 to CK4, a delay amount counter 54 for counting the delayed clock signals and determining the delay amount, a transmission wave pulse counter 55 for counting the number of transmission pulses, and a transmission wave pulse generating circuit 56 for generating transmission pulses.
In the conventional ultrasonic wave diagnostic apparatus having the above-mentioned configuration, an output DS of the delayed data latch circuit 52 is counted by the delay amount counter 54 and a signal CR is output. After this signal CR rises, a transmission pulse CP for generating an ultrasonic wave is produced thereby to control the delay amount.
In a second conventional ultrasonic wave diagnostic apparatus suggested in JP-A-62-180267, on the other hand, an oscillation circuit is configured of at least a resistor and at least a capacitor, and the frequency of the transmission pulses is controlled by setting the characteristic values of the resistor and the capacitor.
According to the first conventional ultrasonic wave diagnostic apparatus above mentioned, however, the transmission pulses output from the transmission pulse generating circuit 56 has a frequency obtained by dividing the frequency of the delayed clock signal. For controlling the frequency and the duty factor of the transmission pulses, therefore, an additional circuit is required.
According to the second conventional ultrasonic wave diagnostic apparatus described above, on the other hand, there is a problem that the constants of the resistor and the capacitor are required to be changed for setting the frequency, and therefore there are required resistors and capacitors corresponding to the frequency involved, resulting in the circuit scale being increased in accordance with a number of operating frequencies of the transmission pulses. Further, the dependence of the frequency on the characteristic values of the resistors and the capacitors makes impossible a highly accurate setting. The frequency, therefore, cannot be finely adjusted.

Ultrasonic wave diagnostic apparatus with beam convergence and clock signal selection

Matsushita Electric Industrial Co., Ltd.


A four valve disc frictionless ball valve includes a spherical valve core assembly, wherein the spherical valve core assembly includes a wedge-shaped valve core. A closed-position valve disc is respectively installed on a pair of closed-position wedge-shaped sides. A closed-position guide key is respectively arranged at the middle positions of the pair of closed-position wedge-shaped sides along an axial direction. A closed-position guide groove is arranged on each closed-position valve disc along the axial direction. An open-position valve disc is respectively installed on a pair of open-position wedge-shaped sides. An open-position guide key is respectively arranged at the middle positions of the pair of open-position wedge-shaped sides along the axial direction. An open-position guide groove is arranged on each open-position valve disc along the axial direction.

Currently, ball valves are used in oil pipelines for switching oil products; and used with pig launchers and receivers, and at pig launching and receiving stations, etc. During the production process, the product sent through the pipeline contains a variety of impurities. During the course of ball valves opening and closing, the sealing surface is likely to be scratched by hard impurities due to the close contact of the valve body with the valve seat. Eventually resulting in seal failure and internal leakage of the ball valve.
The valve stem is prone to jamming during the opening and closing of the conventional ball valve. Therefore, the functional torque when in operation is large, and the valve core and the valve seat are abraded, which is likely to generate leakages, and results in poor operation.
Moreover, conventional ball valves cannot perform real-time leak detection during use. The valve must be removed from the pipeline to perform leak detection and maintenance when a failure has occurred, and thus the ability of conventional ball valves to do maintenance in real-time is poor, which makes use of conventional ball valves inconvenient.

South China Company, China Oil & Gas pipeline Network corporation

Xi'an Aerospace Yuanzheng Fluid Control Co. Ltd


In a disk storage drive having a CPU, a disk and an EEPROM, the CPU measures throughput performance. The CPU measures the throughput performance for a measured area provided on a data-recording surface of the disk, in response to a test command supplied from a host system. The measured area consists of three zones designated by a pointer stored in the EPROM. The CPU stores the throughput performance measured for the measured area, into the EEPROM, and updates the pointer so that the CPU may measure the throughput performance for the next measured area provided on the data-recording surface.

The present invention relates to a system for monitoring data related to disk storage drive performance. More particularly, the invention relates to a system which measures the throughput performance of a disk storage drive.
In recent years, hard disk drives (HDDs) have been developed which can predict HDD errors. These HDDs monitor various performance criteria, including the number of times the HDD motor has been started and stopped, and the length of time the HDD has had a supply of electric power. As a result, most HDDs can notify a host system, such as a personal computer, regarding potential HDD errors.
Another performance criterion that is commonly monitored in an HDD is throughput performance. Throughput performance is defined as the time the HDD requires to read data from the data-recording surface of the disk. The CPU incorporated in the HDD compares the time spent to read data from the data-recording surface of the disk (the "actual throughput performance") with a reference time (the "theoretical throughput performance"). The overall performance of the HDD over a period of time can be determined by monitoring the difference between actual throughput performance and theoretical throughput performance.
The time required to read data from the HDD may vary depending on several factors, including: (1) the seek operation, in which the read/write head of the HDD moves to a target position in the disk; and (2) the number of times the head attempts to read data from the disk, which in turn, may be affected by the presence of defects on the data-recording surface of the disk. The lower the speed of the seek operation, or the greater the number of data-reading attempts, the longer the time the HDD requires to read data from the disk.
The present way of measuring throughput performance is time-consuming because the entire data-recording surface of the disk has to be read before the throughput performance can be measured. In order to shorten the time for measuring throughput performance, one may read only a part of the data-recording surface of the disk. However, defects in other parts of the data-recording surface will not be reflected in such a measurement. Thus, there is a need for a system that measures throughput performance efficiently and accurately.

System for monitoring the throughput performance of a disk storage system


A method of cleaning a silicon material using a polyvinyl acetal sponge material. The sponge material is purified by an extracting process which includes alternating exposure of the sponge material to acid and oxidizing solutions. The extracting process permits residual amounts of calcium, zinc, sulfate, arsenic, barium, cadmium, chloride, chromium, copper, iron, lead, manganese, magnesium, mercury, nitrate, potassium, selenium, silica, silver and sodium to be 2 ppm or less. Following the extracting process, the silicon material is contacted with the sponge material to thereby clean the silicon material.

1. Field of the Invention
The present invention relates to an industrial sponge used for cleaning surfaces. More specifically, the invention is a synthetic industrial sponge made of polyvinyl acetal, and a method for extracting residue from the sponge to yield a sponge that leaves less particulate matter and has a longer life than conventional sponges, and a method of cleaning semiconductor material using the sponges.
2. Description of the Related Art
The use of synthetic sponges, made of polyvinyl acetal for example, is well known. For example, U.S. Pat. No. 4,566,911 discloses a scrubbing device using a polyvinyl acetal elastic material. Conventional sponges have been shaped in various forms, such as rollers and pads. These sponges are used to clean critical materials such as thin film disks, semiconductor wafers, data storage media, and other materials requiring removal of particles in the 0.1 micron range, i.e. "ultimate cleaning". Conventional synthetic sponges have a polymer structure with "dead end pockets" formed therein that trap residue and trace amounts of metals. As the sponge wears, these metals can come out of the sponge in the form of particulate matter. Such particulate matter can damage the surfaces that are to be cleaned. Further, this type of sponge has tiny fibrils in the pores thereof that are a result of spaces between the pore forming chemical additive during a cross-linking reaction. "Cross-linking" is the formation of ester bonding between chains of the two adjacent hydroxyl groups that occur with the reaction of polyvinyl alcohol and aldehyde. This reaction hardens and strengthens the resulting material.
U.S. Pat. No. 4,098,728, the disclosure of which is incorporated herein by reference, discloses a polyvinyl acetal sponge and a method for making the same. In this method, pore spaces in the sponge are formed by gas bubbles; not pore forming chemical additives such as starch/sulfate combinations. Because the sponge disclosed in this patent does not have any starch residue, or the like, it has been particularly useful in medical applications in which starch residues can cause a foreign body reaction when in contact with mucosal tissue.
Also, conventional sponges have been used to form cleaning rollers or the like having projections formed on a surface thereof. However, the conventional projections have walls that extend perpendicular to an outer surface of the sponge body. Such a configuration creates stress concentration areas. Accordingly, the projections break off of the roller surface after continued use. Therefore, conventional sponges having projections have a short useful life.
Finally, extraction processes, also known as purification processes, are used to remove particulate matter and residue from the sponge before the sponge is used for cleaning. However, conventional extraction processes have not adequately removed residue to the extent necessary for reliably cleaning semiconductor wafers or similar materials.

Method of cleaning silicon material with a sponge


A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

2. Description of the Related Art
Photolithographic projection objectives have been in use for several decades for producing semiconductor components and other finely structured structural elements. They serve the purpose of projecting patterns of photomasks or reticles, which are also denoted below as masks or reticles, onto an object coated with a photosensitive layer with very high resolution on a reducing scale.
Three developments running in parallel chiefly contribute to the production of ever finer structures of the order of magnitude of 100 nm or below. Firstly, an attempt is being made to increase the image-side numerical aperture (NA) of the projection objectives beyond the currently customary values into the region of NA=0.8 or above. Secondly, ever shorter wavelengths of ultraviolet light are being used, preferably wavelengths of less than 260 nm, for example 248 nm, 193 nm, 157 nm or below. Finally, still other measures are being used to increase resolution, for example phase-shifting masks and/or oblique illumination.
In addition, there are already approaches to improving the achievable resolution by introducing an immersion medium of high refractive index into the space between the last optical element of the projection objective and the substrate. This technique is denoted here as immersion lithography. The projection objectives suitable for this purpose are denoted as immersion objectives or immersion systems. Introducing the immersion medium yields an effective wavelength of λeff=λ0/n, λ0 being the vacuum operating wavelength and n the refractive index of the immersion medium. This yields a resolution of R=k1 (λeff/NA0) and a depth of focus (DOF) of DOF=±k2 (λeff/NA02), NA0= sin Θ0 being the "dry" numerical aperture, and Θ0 being half the aperture angle of the objective. The empirical constants k1 and k2 depend on the process.
The theoretical advantages of immersion lithography reside in the reduction of the effective operating wavelength and the resolution improved thereby. This can be achieved in conjunction with an unchanged vacuum wavelength, and so established techniques for producing light, for selecting optical materials, for coating technology etc. can be adopted largely without change for the appropriate wavelength. However, measures are required for providing projection objectives with very high numerical apertures in the region of NA=1 or above. Furthermore, suitable immersion media must be available.
Ultra-pure water with n1≈1.43 emerges as a suitable immersion medium for 193 nm.
The article entitled "Immersion Lithography at 157 nm" by M. Switkes and M. Rothschild, J. Vac. Sci. Technol. Vol.19 (6), November/December 2001, pages 1 ff. presents immersion fluids based on perfluoropolyethers (PFPE) which are sufficiently transparent for a working wavelength of 157 nm and are compatible with some photoresist materials currently being used in microlithography. One tested immersion fluid has a refractive index of n1=1.37 at 157 nm. The publication also describes a lens-free optical system, operating with calcium fluoride elements and silicon mirrors, for immersion interference lithography, which is intended to permit the projection of 60 nm structures and below in conjunction with a numerical aperture of NA=0.86. The optical system may not be suitable for use in the series production of semiconductors or the like.
Patent Specifications U.S. Pat. No. 4,480,910 and U.S. Pat. No. 5,610,683 (corresponding to EP 0 605 103) describe projection exposure machines, provided for immersion lithography, having devices for introducing immersion fluid between the projection objective and the substrate. No design is specified for the optical projection system.
Some projection objectives suitable for immersion lithography have recently become known. Purely refractive projection objectives known from the international patent applications WO 03/077036 and WO 03/077037 A1 (corresponding to US 2003/30174408) of the applicant are designed as so-called single-waist systems or two-belly systems with an object-side belly, an image-side belly and a waist situated there between, that is to say a constriction of the beam bundle diameter. Image-side numeral apertures of up to NA=1.1 have been achieved in this case.
Attempts to achieve yet higher apertures are rendered difficult because the maximum lens diameters increase dramatically as apertures become larger, and this complicates the fabrication of the projection objectives, making it more expensive. In addition, the chromatic aberrations and here, in particular, the lateral chromatic aberrations assume disturbing values. The lateral chromatic aberrations (CHV) are also denoted as chromatic magnification aberrations, and have the effect that partial images are imaged with a different size for different wavelengths. The consequence of this is that the lateral chromatic aberration does not occur on the optical axis, but is noticed ever more strongly toward the edge of the image field (field dependence).
Chromatic aberrations are usually reduced by using at least two optical materials of different dispersion inside a projection objective. However, in the wavelength region of the deep ultraviolet (DUV) at operating wavelengths of less than 200 nm only a few transparent optical materials with sufficiently low absorption are available. For applications at 193 nm, use is made chiefly of synthetic silica glass (fused silica) (SiO2) as principal material and, as second type of material, fluoride crystal materials such as calcium fluoride (CaF2) or barium fluoride (BaF2). As a rule, at 157 nm calcium fluoride is used as principal material and barium fluoride as second material. However, said fluoride crystal materials are available only to a limited extent, expensive and difficult to work. Consequently, it is desired to have optical designs that manage with only one type of material, in particular with synthetic silica glass. In any case, the chromatic aberrations must be minimized such that contrast losses caused by the chromatic aberrations remain tolerable when use is made of radiation sources that are suitably narrowband. Particularly important here is the correction of the lateral chromatic aberration, since the latter produces a contrast loss that is a function of the field.

Refractive projection objective for immersion lithography


A polyepoxy composition comprising a trisepoxide represented by general formula (I) described below which is well-balanced between thermal stability and water resistance is provided. ##STR1## In the formula, R represents a methyl group, X represents an alkyl group having a carbon number of 1 to 6, an alkoxy group having a carbon number of 1 to 6, or a halogen atom, which may be identical or different, respectively, Y represents a hydrogen atom or a methyl group, and m and n represent an integer of 0 to 2.

Heretofore, as a polyepoxy composition containing a trisepoxide, there have been known an epoxide (confer JP-A-62-197415) of a polyphenol compound obtained by a condensation reaction of hydroxybenzaldehydes with phenols and an epoxide (confer JP-A-61-65876) of a polyphenol compound obtained by a condensation and addition reaction of unsaturated aliphatic aldehydes such as croton aldehyde with phenols. A cured product of an epoxy resin prepared from the polyepoxy compositions is excellent in thermal stability, however, it very readily absorbs water. As a result, it cause problems such as formation of cracks in a package when it is employed as an encapsulant for semiconductors, and a deterioration in insulating properties when it is employed as an electric insulator. On the other hand, there has been known a polyepoxy composition (confer JP-A-61- 123618) obtained from a polyphenol having alicyclic structures in the molecule which is derived from dicyclopentadiene to improve water resistance. The cured product of an epoxy resin prepared from the polyepoxy composition is excellent in water resistance, however, thermal stability and flame-retardability thereof deteriorate, thereby being not preferred in view of the reliability at high temperature.

Polyepoxy composition containing trisepoxide


A method is disclosed of lowering plasma levels of xcex1-dicarbonyl precursors of advanced glycation end-products, such as methylglyoxal, in a patient having type 2 diabetes by administrating metformin in a dosage from twenty-five to fifty percent in excess of its antidiabetic therapeutic regimen. The high dosage of metformin acts to reduce plasma levels of xcex1-dicarbonyl compounds by a mechanism distinct from that whereby it exerts its antidiabetic activity.

Metformin, i.e. N,N-dimethylimidocarbonimide diamide, is a known compound approved by the U.S. Food and Drug Administration for the therapeutic treatment of diabetes. The compound and its preparation are disclosed, for example, in U.S. Pat. No. 3,174,901, issued May 23, 1965. It is known that metformin is effective in the treatment of type 2 diabetes, otherwise known as non-insulin-dependent diabetes mellitus (NIDDM). Metformin was the first oral antidiabetic agent introduced that is chemically and pharmacologically unrelated to the oral sulfonylurea diabetic agents, such as tolbutamide.
A statement used to describe metformin in the Informed Drug Guide is that proof that it has an advantageous effect on the prognosis of diabetes (complications, mortality) does not exist. In accordance with the present invention, it has unexpectedly been found that metformin does exert an effect against long term complications that are frequently associated with type 2 diabetes. This effect, not previously known, is quite possibly due to a mechanism of activity separate and distinct from its hypoglycemic activity.
The invention relates to the use of metformin in a dosage regimen significantly higher than its established therapeutic antidiabetic dosage as a treatment/preventative against long-term complications of type 2 diabetes as might normally occur during extended therapy of the disease. This activity would typically not manifest itself during the administration of metformin in the generally prescribed therapeutic dosage ranges.

Treatment for complications of type 2 diabetes