To correct a deterioration by a deflection aberration of an electron beam spot at a peripheral portion of an image plane and to promote the resolution, a cathode ray tube is proposed which is composed of an acceleration electrode and a first kind and a second kind of focusing electrode group which are applied with a first and a second focusing voltage, wherein a first electron lens in which a first focusing force for focusing the electron beam in the horizontal direction is always stronger than a second focusing force for focusing it in the vertical direction, and a second electron lens wherein the focusing force for focusing the electron beam in the horizontal direction or in the vertical direction is stronger than the other depending on the relative sizes of a first focusing voltage applied on the first kind of focusing electrode group and a second focusing voltage applied on the second kind of focusing electrode group, are formed among the first kind and the second kind of electrode group, and a dynamic voltage which changes in accordance with a deflection amount of the electron beam is superposed on a constant voltage, in either one of the first and the second focusing voltage.

The present invention relates to a cathode ray tube having an electron gun equipped with a main lens having a function of controlling a shape of an electron beam spot which is deflected to the peripheral portion of an display screen, to improve a resolution at the peripheral portion of the screen of the cathode ray tube for use in a direct view color television receiver or a color display terminal.
The cathode ray tube which is utilized in color display of a direct view type or projection type television receiver, display terminal device and the like, is composed of a panel portion that is an image screen, a neck portion accommodating an electron gun, and a funnel portion for connecting the panel portion and the neck portion. A deflection yoke is attached to the funnel portion for scanning an electron beam emitted from the electron gun on a phosphor screen that is formed on an inner face of the panel portion.
The electron gun which is accommodated in the neck portion is provided with an electron beam generating unit having a cathode for generating the electron beam and a control electrode for controlling the electron beam, and a main lens unit comprising various electrodes for focusing, accelerating and converging the controlled electron beam.
The electron beam emitted from the cathode is modulated by signals applied on the control electrode or the cathode, and is directed onto the phosphor screen after being formed into a required sectional shape and provided with a required energy by the main lens electrodes.
FIG. 5 shows a schematic sectional diagram for explaining an example of the structure of the color cathode ray tube, of which shape of the electron gun portion is exaggerated for the purpose of explanation.
In FIG. 5, the electron gun accommodated in the neck portion is composed of the electron beam generating unit and the main lens unit which accelerates and focuses the electron beam generated from the electron beam generating unit and the electron beam is made to impinge on a phosphor screen 3 composed of three color phosphor materials which are coated and formed on an inner wall of a faceplate portion 2 composing a glass envelope 1.
The electron beam generating unit is composed of cathodes 7, 8 and 9, a first grid electrode (G1)10, and a second grid electrode (G2)30. The electron beams which have been emitted from the cathodes 7, 8 and 9, are radiated along center axes 35, 36 and 37 which are disposed approximately in parallel with each other in a common plane (in the horizontal direction) and are incident on the main lens unit after passing through the first grid electrode 10 and the second grid electrode 30.
The main lens unit is composed of a third grid electrode (G3) 31 that is one main lens electrode, a fourth grid electrode (G4) 32 and a shield cup electrode 33. The center axes of electron beam passing holes 70, 71, 72, 76, 77 and 78 which are formed in the third grid electrode (G3) 31 and the shield cup electrode 33, are on the center axes 35, 36 and 37, respectively.
Further, the center axis of a central electron beam passing hole 74 of the fourth grid electrode 32 which is the other main lens electrode, is on the center axis 36. However, the center axes 38 and 39 of side electron beam passing holes 73 and 75 are not on the center axes 35 and 37, and are slightly displaced from the center axes 35 and 37 toward the outside, respectively.
In operation, the potential level of the third grid electrode 31 is set lower than that of the fourth grid electrode 32. The fourth grid electrode 32 and the shield cup electrode 33 having a high potential level is connected to a conductive film 5 such that the potential level thereof is equal to that of the conductive film 5 that is coated on the inner face of the funnel portion by a conductive spring or the like, not shown.
Since the center electron beam passing holes of the third grid electrode 31 and the fourth grid electrode 32 are coaxial, an axisymmetric main lens is formed at the central portions of the two electrodes, and the central electron beam is focused by the main lens and proceeds straight on a trajectory along the axis.
On the other hand, since the axes of the side electron beam passing holes of the two electrodes are deviated from each other, a non-axisymmetric main lens is formed at the side. Therefore, the outside electron beams pass through locations which are deviated from the center axes of the lens toward the central electron beam in a diverging lens region that is formed on the side of the fourth grid electrode 32, in the main lens region, and receive a focusing action by the main lens and at the same time a converging force toward the central electron beam.
In this way, the three the electron beams are focused and at the same time converged on a shadow mask 4 to be overlapped. This converging action is called a static convergence.
The electron beam receives a color selection at an opening of the shadow mask so that only a portion thereof passes through the opening to excite a phosphor of a color corresponding to the respective electron beam.
Further, the deflection yoke 6 deflects and scans the electron beam on the phosphor screen in the horizontal and vertical directions thereby forming a two-dimensional image on the phosphor screen.
Conventionally, an electron gun for a color picture tube having a so-called electrostatic quadrupole lens has been proposed to improve a resolution at a peripheral portion of the screen.
In the electron gun of this type, the cathode, the first grid electrode and the second grid electrode compose the electron beam generating unit, a plurality of electron beams are emitted from the electron beam generating unit along initial paths which are arranged approximately in parallel with each other in a horizontal plane, and are incident on the main lens unit composed of the focusing electrode, the accelerating electrode and the shield cup electrode.
The focusing electrode composing the main lens unit is composed of a first member and a second member, and the electrostatic quadrupole lens is composed by opposing an aperture electrode provided in the first member and planar correction electrodes provided in the second member.
The acceleration electrode is impressed with a final accelerating voltage of 20 through 35 kV that is the highest voltage. Further, a first focusing voltage is applied on the focusing electrode, which is normally a constant voltage of 5 through 10 kV.
On the other hand, a second focusing voltage is applied on the second member of the focusing electrode. The second focusing voltage comprises a constant voltage superposed by a dynamic correction voltage that changes in synchronism with a deflection amount of the electron beam.
The resolution at the peripheral portion of the screen of a color cathode ray tube is considerably improved by using the above electron gun. That is, a correction is performed wherein an astigmatism which elongates in the horizontal direction the electron beam spot that is deflected to the peripheral portion of the screen owing to a self-convergent magnetic deflection field and another astigmatism that elongates the electron beam formed by the electrostatic quadrupole lens in the vertical direction cancel each other.
The distance from the main lens to the center of the screen and the distance from the main lens to the peripheral portion of the screen are different. Therefore, when the electron beam is focused at the center of the image plane in an optimum condition, the focusing condition is deviated from the optimum condition at the peripheral portion of the screen, and this is a curvature-of-field aberration which brings about the deterioration in the resolution. The curvature-of-field aberration is corrected by the above-mentioned dynamic correction voltage, that is, when a dynamic correction voltage is applied, the intensity of the main lens which is a final stage lens formed between the accelerating electrode and the second member of the above-mentioned focusing electrode, is reduced, the deflected electron beam can be optimally focused at the peripheral portion of the screen, and the curvature-of-field aberration as well as the astigmatism are corrected.
However, when the electron gun having this electrostatic quadrupole lens is employed, an electric circuit for generating the dynamic correction voltage is necessary, which increases the production cost especially when the dynamic correction voltage is high. Accordingly, it is necessary to improve a correction sensitivity in deflection aberration.
When the strength of the electrostatic quadrupole lens is increased, the correction sensitivity of the astigmatism in the deflection aberration can easily be improved. However, with respect to the curvature-of-field aberration, the correction sensitivity can not be easily improved, since the curvature-of-field aberration is corrected by the main lens. When the strength of the main lens is increased to improve the correction sensitivity for curvature-of-field aberration, it is not possible to focus the electron beam on the screen, even when the electron beam is not deflected.
Even when the correction sensitivity with respect to only the astigmatism is improved, an unbalance thereof with a curvature-of-field correction is caused which does not result in the reduction of the dynamic correction voltage.
Accordingly, a structure of an electron gun for reducing the dynamic correction voltage and reducing the production cost has been proposed.
FIG. 6 is a schematic diagram for explaining a structure of an electron gun for improving the correction sensitivity in the astigmatism at a low cost without reducing the correction sensitivity for curvature of field, wherein numeral 8 designates a cathode, numeral 10 designates a first grid electrode, numeral 30 designates a second grid electrode, numeral 31 designates a focusing electrode group composing a third grid electrode, numeral 32 designates a fourth grid electrode composing an accelerating electrode, and numeral 33 designates a shield cup electrode.
As shown in FIG. 6, the focusing electrode 31 is divided into a plurality of electrode members 31-1, 31-2, 31-3, 31-4, 31-5 and 31-6. Among the members of a focusing electrode group, in addition to an electrostatic quadrupole lens, at least one axisymmetrical lens is provided which has a function of a curvature-of-field correction lens. Further, the main lens is provided with a strong astigmatism which deforms the sectional shape of the electron beam into the vertically elongated shape. On this occasion, it is necessary to change direct voltage components of two focusing voltages in the above-mentioned conventional electron gun. However, the method of applying the dynamic correction voltage remains the same.
That is, in the conventional gun, the two direct focusing voltages are approximately the same value, and the dynamic correction voltage increases with an increase in the deflection amount of the electron beam. On the other hand, in the electron gun shown in FIG. 6, one of the two direct focusing voltages is considerably made larger than the other, and the difference in voltages is at least larger than the maximum value of the dynamic correciton voltage. In this way, the difference in potential in the axisymmetric lens is reduced and the strength of lens is also reduced when the deflection amount of the electron beam and therefore the dynamic correction voltage increase.
Accordingly, a force for focusing the electron beam is weakened in deflecting the electron beam thereby correcting the curvature-of-field aberration.
In this way, at least one curvature-of-field correction lens is added to the conventional curvature-of-field correction lens that is conventionally provided with only the main lens. Therefore, it is possible to reduce the dynamic correction voltage.
Further, it is possible to reduce a voltage necessary for correction, also with respect to the correction of the astigmatism, by increasing the intensity of the electrostatic quadrupole lens or by increasing the number thereof.
In this way, in the color cathode ray tube employing the electron gun of the type shown in FIG. 6, the dynamic correction voltage can be reduced and the increase in the cost of the circuit can be restrained.
The electron gun employing the above electrostatic quadrupole lens has been disclosed in Japanese Laid Open Patent Publication No. 43532/1992.
However, in the color cathode ray tube employing the electron gun disclosed in the Japanese Laid Open Patent Publication No. 43532/1992, there is the following problem owing to the structure of electrodes of the electron gun.
The effect of correction for curvature of field by the above axisymmetric lens is weak in comparison with the effect by the main lens. Therefore, the focusing electrode should be divided into a number of electrodes and a number of, or actually 4 or 5 axisymmetric lenses should be formed to considerably reduce the dynamic correction voltage.
This brings about a complicated structure of the electron gun and the requirement for the accuracy in manufacturing it is very severe.

Cathode ray tube with low dynamic correction voltage


A nondestructive coating inspection system to inspect a component without removal of a coating thereon, the system including an airflow source to directed heated or cooled air into the component; a sensor directed toward the component to generate an infrared radiation image data of component heated by the heated or cooled air; and a controller in communication with the sensor to register the current infrared radiation image data to at least one infrared reference image data to classify the component based on the comparing.

The present disclosure relates to nondestructive component inspection and, more particularly, to a nondestructive coating inspection system for prognostics and health management, preventative maintenance, and repair of engine parts.
Hot section turbine components in aircraft and industrial gas turbine engines are protected by thermal barrier coatings (TBCs) that provide thermal insulation against high temperatures, and by environmental barrier coatings (EBCs) that provide resistance to environmental attack such as that due to oxidation, corrosion, and recession. TBCs have been used to protect metallic components, especially those constructed from nickel-based superalloys in the hot section of gas turbine engines, such as turbine blades, vanes, endwalls, air seals, and combustor liners. TBCs allow for higher gas temperature operation by protecting components exposed to high temperature gases from thermally activated damage such as melting, creep, oxidation, corrosion, and cyclic thermo-mechanical fatigue, which results in improved fuel consumption, increased thrust or power generation, reduced emissions, improved reliability, reduced cooling requirements, and reduced cost by extended service life and extended time between maintenance intervals.
Thermal protection is typically provided by a ceramic top coat. Coatings are often multilayered systems that include a thermally insulating and porous ceramic topcoat applied on top of various interface and EBC layers that provide additional environmental protection, as well as bonding to the metal alloy substrate. The EBCs and TBCs are considered to be prime reliant, hence are inspected for proper coverage; otherwise, premature field failure may occur. These components are currently inspected manually by visual or tactile inspection. These inspection techniques may be tedious, time consuming, and imprecise.
Several automated inspection processes have been developed based on rapid exterior heating of the component and infrared imaging. For instance, pulsed thermography, where a very short intense flash of light heats a component, has been used to show thermal conductivity of a coating. Similarly, a periodic external thermal signal may be applied to a component and a phase difference in the thermal response indicates damage. These methods, however, require external heating of the component, which may not allow detection of all the desired imperfections, and currently lack automated image analysis for the determination of imperfections and damage.
Methods based on 2D image analytics in visible light have been developed, but these methods are not suitable, for instance, for shallow spallation or for damage on concave surfaces. Methods based on 3D analytics have been developed, but these methods require high resolution 3D scans, which can be slow, and may not detect imperfections such as cracks, delamination, and incorrect coating thickness.

Nondestructive coating imperfection detection system and method therefor


The invention relates to a chair having a seat structure formed by a frame member that defines a central opening. A flexible membrane extends across the central opening. A pair of support pads, one disposed on either side of the cross-beam member, is provided and arranged at a level below the central opening of the frame member. The support pads are arranged within the seat structure so as to be rearwardly disposed with respect to the front edge of the frame by a first distance and spaced apart from each other by a second distance, the first and second distances generally corresponding to the positioning of the ischicial tuberosity of a user when the user assumes a seated position engaging the seat structure.

Ergonomic chairs for reducing various stresses on the body that are often related to sitting for long periods of time and/or due to incorrect posture when in the seated position are known and come in a variety of designs. Mesh chairs that provide a mesh or material covering formed from a resilient material that is arranged over a chair frame for supporting the user in the seated position have gained popularity, at least in part for their modern aesthetics. Mesh chairs are also considered advantageous for allowing air flow through the mesh or material covering enabling the user to remain cool when seated in the chair for long periods of time and for being more easily cleaned and/or sterilized than more traditional chairs that include more fabric and cushioning.


A device includes a first high electronic mobility transistor (HEMT) and a second HEMT. The first HEMT includes a first gate, a source coupled to the first gate, and a drain coupled to the first gate. The second HEMT includes a second gate coupled to the source and to the drain. The second HEMT has a lower threshold voltage than the first HEMT.

A high-electron-mobility transistor (HEMT) is a field effect transistor (FET) that incorporates a junction between two materials with different band gaps as the channel instead of a doped region as is typically the case for metal-oxide semiconductor FETs (MOSFETs). HEMTs are characterized by low on-state resistance, high breakdown voltage, and low switching losses, making them excellent power devices (e.g., power amplifiers) in, for example, wireless communication systems.
In particular, HEMTs using gallium nitride (GaN) and aluminum GaN (AlGaN) on silicon substrates are highly efficient and thus very useful, not only in wireless communication systems but also in many other applications including voltage converters, for example.
Although GaN-based devices do not typically have a pn-junction and usually have fast reverse recovery compared to conventional silicon-based power transistors, when a GaN HEMT is operated in the reverse mode (when the drain-to-source voltage, Vds, goes negative), there can still be measurable switching losses. Depending on the reverse peak current, the reverse conduction mode voltage can go well above two volts, up to four volts or higher, for instance, thus contributing to power losses and reduced efficiency.


An improved resistivity probe comprised of a rigid strip of electrically nonconducting material having a number of metallic, generally parallel pins coupled thereto. The strip can be mounted in a vertically shiftable probe head in any suitable manner. In one embodiment, the pins are rigidly secured by an epoxy to the strip. In another embodiment, the probe includes a pair of rigid strips having semi-cylindrical recesses on the inner faces thereof for receiving therebetween a number of resistivity measuring pins. The strips are held together by rivets or other fasteners. A multiple probe assembly can be made with a disk-like body having a number of angularly disposed slots therethrough for receiving a number of probes with each probe including a rigid strip having a number of pins coupled thereto. The probes extend into respective slots of the body so that the pins project downwardly from the lower face of the body to permit multiple resistivity measurements to be made without having to rotate the probes. An improved mount for a resistivity probe includes an arm mounted on an upright post for up and down movement, and a moving means which can be electrical, pneumatic, hydraulic or vacuum operated, can be used raising and lowering the arm. A single probe or a multiple probe assembly can be used on the outer end of the arm for making resistivity measurements.

The measurement of resistivity of semiconductor wafers is an essential part of the processing of such wafers. A number of different types of probes and probe mounts have been conventionally provided for making such measurements. Typical of probes of this nature are those of the type made and sold by Kulicke and Soffa Industries, Inc. of Horsham, Pa. and identified as Fell Resistivity Probe Head, and Kullicke and Soffa Disposable Probe Head. This company also produces the Model 3007A wafer locating resistivity probe base and the Model 5000 resistivity calculator, the latter including mounts for the Fell and disposable probe heads. Other companies which make mounts for probes of this type include Signatone Corporation of Santa Clara, Calif. and Macronetics, Inc. of Mountain View, Calif.
For the most part, the wafer engaging pins of conventional resistivity probes are shiftable relative to the heads which carry the probes. An explanation of the construction of conventional probes is set forth in the periodical, Solid State Technology, June 1969, in an article entitled "Mechanical Aspects of Testing Resistivity of Semiconductor Materials and Diffused Layers," by P. P. Clerx. In this article, it is made clear that the various pins of a probe head are shiftable relative to each other and have individual springs which bias the pins downwardly yet allow the pins to move upwardly when the lower ends of the pins engage selected locations on a semiconductor wafer whose resistivity is to be measured.
While the foregoing probe heads have been suitable for a number of different applications, they require extremely high accuracy in mounting and the use of individual springs for bias forces for seriously affecting their reliability so that the production costs have been relatively high. Since the pins experience wear and are often times having to be replaced, a need for a more economical way of mounting the pins and replacement of the probe has arisen to offset production and operational costs.

Collinear four-point probe head and mount for resistivity measurements


A sensor for detecting and differentiating chemical analytes includes a microscale body having a first end and a second end and a surface between the ends for adsorbing a chemical analyte. The surface includes at least one conductive heating track for heating the chemical analyte and also a conductive response track, which is electrically isolated from the heating track, for producing a thermal response signal from the chemical analyte. The heating track is electrically connected with a voltage source and the response track is electrically connected with a signal recorder. The microscale body is restrained at the first end and the second end and is substantially isolated from its surroundings therebetween, thus having a bridge configuration.

Despite its immediate relevance in homeland security applications, high sensitivity detection of explosives using real-time, miniature sensors still remains as a crucial challenge. Although widely used and highly effective, trace explosive detection based on canines is neither cost effective nor suitable for mass deployment. Currently available technologies, such as ion mobility spectrometry and nuclear quadrupole resonance spectroscopy, are bulky and expensive. Optical spectroscopic techniques, such as Raman and laser-induced breakdown spectroscopies, are highly selective but suffer from poor sensitivity. Micro-electro-mechanical systems (MEMS) can potentially satisfy many of the requirements for an ideal compact chemical sensor, such as low-power consumption, real-time operation, and high sensitivity. However, the suitability of MEMS as practical sensors for vapor detection has traditionally been limited by a lack of chemical selectivity.
The selectivity challenge encountered with micromechanical sensors is not unique to MEMS. Other gravimetric sensors such as quartz crystal microbalance (QCM) and surface acoustic wave (SAW) devices, also lack intrinsic selectivity and rely on selective interfaces for chemical speciation. The need for chemical selectivity forces the use of separation techniques or the use of highly selective recognition layers that are irreversible at room temperature. Although attractive from an analytical standpoint, incorporation of separation techniques with MEMS sensors poses integration problems, especially for explosives detection due to the large volumes of air needed for sample collection.
At present there exist no room-temperature reversible receptors that are highly selective for vapor molecules, especially explosive vapors. Designing high specificity molecular recognition layers for small molecules is challenging due to the limited number of chemical interactions that can serve as a basis for designing selective layers while satisfying the highly desirable sensor attribute of room temperature reversibility.
Approaches for achieving selectivity by using sensor arrays modified with partially selective interfaces and pattern recognition work are presently underway. The molecular recognition interfaces based on weak interactions are not specific enough to produce unique responses with a single sensor. Unique responses (orthogonal) cannot be obtained if the mechanism behind individual sensor elements is unspecific, for example, hydrogen bonding of analyte with the chemoselective layer. Increasing the number of sensor elements in the array for pattern recognition analysis can improve the selectivity only if the responses from individual sensing elements are orthogonal. However, there are only a limited number of weak reversible chemical interactions that can serve as a basis for designing the selective layers. Therefore, despite the chemical sensing advantages offered by microfabricated sensors, their use as a practical sensor may be limited without the development of techniques that can generate orthogonal responses.

Sensor for detecting and differentiating chemical analytes


A twin tower gas drying system is disclosed for cleaning compressed air lines in locomotives, buses, transit vehicles and the like by removing undesirable contaminants from an air or gas stream. A multistage filtration process employs a first scrubber that is capable of removing particulate material or soot from a stream of unpurified gas. A pre-filtering means is employed to remove impurities from the stream of unpurified gas. Coalescing filters are us to remove remaining moisture from the gas stream. Two towers of dessicant material dry the gas stream. The drying system is capable of controlling the flow of gas by alternately switching between supplying unpurified gas to a first tower and supplying unpurified gas to a second tower, with a purge cycle in between. Thus, a first dessicant tower is being purged of moisture while the second tower accumulates moisture, and likewise the second tower is purged while the first tower accumulates moisture, in alternating sequence.

Trucks, buses, locomotives and transit vehicles typically contain compressed air systems that operate brakes and perform other functions such as opening and closing doors, for example. Air that emerges from air compressors in such systems often contains moisture and lubricating oil mist vaporized within the air. Such moisture and oil mist contaminants must be continuously removed from the compressed gas handling system to prevent failure of the system due to build-up of water or sludge in the compressed air lines.
One problem with such air dryers is that particulate material and soot can easily clog the filters of such apparatus, which sometimes causes the filters to crack or break. When filters break, they lose the ability to filter contaminated air. Moisture (water vapor) is considered a contaminant in such systems, and when a filter breaks, unfiltered contaminated gas is allowed to seep through the break, preventing the dryer from operating effectively. In general, removing oil and moisture from a contaminated stream can be a challenging task.
If water or moisture is allowed to build up inside pneumatic air lines in such apparatus, then it is possible that the brakes will fail or alternatively, air actuated pneumatic mechanical apparatus will stop working. On a subway car or a bus, this could mean that the doors will not open or close properly, or the pneumatic load levelers will stop working properly. Many of the components in modern day buses for example, are air driven. It is therefore extremely important to keep moisture and contaminants out of the pneumatic air lines in such systems. Furthermore, oil is a contaminant which degrades and causes further maintenance problems for such pneumatic systems.
It would therefore be desirable to provide a system, apparatus and method for removing contaminants from pneumatic air lines effectively and efficiently. A method of filtration that is capable of removing both the solid particulates, such as soot, and also the contaminants such as entrained oil and water mist is preferred. Furthermore, a method for removing such contaminants which preserves the integrity of the filtration apparatus, and does not undesirably cause filters to fail, would be highly desirable.
A twin tower gas drying system is shown herein by way of drawings and written description. The invention is capable of several configurations, and a person of skill in the art will recognize that other configurations consistent with this description are possible, and within the scope of the invention.
In the invention, a separation means is employed for removing particulate material from a stream of unpurified gas. Typically, a scrubber pad is used as the separation means, but other means for effecting separation may be employed as well. Additionally, a pre-filtering means is used for removing impurities from said stream of unpurified gas flowing from said separation means. First and second coalescing filters are employed to clean the air, the filters being capable of removing water and oil mist from said stream of unpurified gas flowing from said pre-filtering means. Further, a first tower is provided having a first dessicant material therein for removing water vapor from said stream of unpurified gas received from said first coalescing filter so as to supply a first stream of purified gas therefrom. Furthermore, a second tower having a second dessicant material therein for removing water vapor from said remaining stream of unpurified gas received from the second coalescing filter is provided. Finally, a control means is included for controlling flow of unpurified and purified streams of gases through the drying system so that said drying system is capable of alternately switching between supplying gas to said first tower and supplying gas to the second tower.
In one application of the invention, the drying system includes a control means that operates to supply unpurified gas to the first tower while simultaneously purging moisture from the second tower. Also, depending upon the particular configuration employed, it is also possible to employ control means to supply unpurified gas to the second tower while simultaneously purging moisture from the first dessicant material of said first tower.
In some applications, the separation means is a scrubber pad that is capable of operating in a first mode to entrain particulate material upon its surface, and in a second mode to release entrained material from its surface, such that the entrained material is exhausted from the system. In many applications, the scrubber pad flexes in response to air pressure fluctuations to release entrained particulate material from its surface. Then, the material thus released is flushed from the system.
In some applications, the drying system includes first and second towers with first and second cans loaded with dessicant. The drying system of the first tower comprises a first holding means for containing said first dessicant material within said first can to minimize forces acting against the first can. The drying system of the second tower may comprise a second holding means for containing said second dessicant material within said second can to minimize forces acting against the second can.
In another embodiment of the invention, the apparatus may be adapted for drying a moist air stream. The stream may be dried using a housing and a valve body connected to the housing. Furthermore, a chamber is provided within said valve body. The chamber is adapted for separating moisture from a moist air stream, thereby producing a filtered air stream, the chamber further comprises a pre-filter, a first coalescing filter, and a second coalescing filter. Further, a sump is connected to the chamber. The sump collects and expels separated moisture.
A first tower comprises a dessicant material for removing remaining amounts of moisture from the filtered air stream, thereby producing a substantially dried air stream. Also, a second tower having dessicant material for removing moisture from said filtered air stream is provided.
The apparatus also includes a diverter valve that is provided in operable connection to the valve body for affecting the flow of said air streams, the diverter valve being capable of providing in alternating sequence the filtered air stream to the first and second towers to facilitate the simultaneous movement of air along the dessicant material in said first tower, while air in said second tower is purged from the sump. Then, it is possible to repeat the sequence to facilitate the movement of air along the dessicant material in said second tower while air in said first tower is purged from said sump, with alternating repeating cycles.
The invention also may be characterized as a method for drying a wet gas stream having particulate material therein. In the method, it is possible to provide a particulate-containing wet gas stream. Further, the method includes removing particulate from the wet gas stream, and pre-filtering the wet gas stream. The first and second coalescing filters are capable of removing oil and water mist from the prefiltered gas stream, and the output of the first and second coalescing filters comprises a filtered gas stream. Furthermore, a first tower and a second tower are provided, each tower having dessicant material therein for removing wter vapor from said filtered gas stream so as to supply a first stream of substantially purified dry gas therefrom. In some applications of the invention, it is possible to control the flow of said streams of gases to facilitate switching alternately between supplying the filtered gas stream to said first tower, and supplying the filtered gas stream to said second tower.


A camera comprising E.sup.2 PROM storing therein writing data for check sum and a plurality of adjustment data for compensating the control value of the camera to control the camera properly, and capable of electrically rewriting the data and holding the rewritten data still after a power source switch is opened, a comparator for finding the sum total of the writing data for check sum and the adjustment data in response to the closing of the power source switch and comparing the sum total with a predetermined value, and a monitoring device for effecting at least one of warning and release inhibition when the result of the comparison by the comparator is that the sum total is not equal to the predetermined value.

1. Field of the Invention
This invention relates to a camera in which a plurality of adjustment data are stored in E.sup.2 PROM capable of electrically rewriting data and retaining the rewritten data still after a power source switch is opened and a control value is compensated by these adjustment data to thereby accomplish proper control.
2. Related Background Art
Heretofore, in a camera of this kind, a plurality of adjustment data have been stored in E.sup.2 PROM and a control value has been compensated by these adjustment data to thereby accomplish proper control.
In the past, however, not much consideration has been paid to reliability, and this has led to a problem that the control value goes wrong when the adjustment data are rewritten by an unexpected accident.


A follow-up system for monitoring the etching process in RIE equipment. A spectrometer is used in an interferometric mode for accurate thickness measuring to produce high-resolution and reproducible patterns in a layer of etchable material formed on a substrate.

1. Field of the Invention
The present invention relates to the manufacture of advanced semiconductor products, and more particularly, to a method for producing submicronic patterns through the use of standard photoresist compositions combined with various conventional UV photolithography equipment.
2. Description of the Prior Art
With the continuous trend towards miniaturized semiconductor devices, e.g. short channel polysilicon gate (0.6 .mu.m) FETs, a major problem to data has been to define and control polysilicon line widths smaller than conventional UV photolithography equipment can achieve on standard photoresist layers. With such classic image exposure techniques, the barrier appears to be about 0.8 .mu.m, so that patterns with smaller dimensions cannot be created by transfer from the imaged photoresist layer.
Enhanced exposure tools for direct image printing, such as excimer lasers and X-ray machines, are not actually commercially available today, although they are of high potential interest owing to their short operating wavelengths. As far as X-ray machines are concerned, there still remain unsolved problems, such as the difficult fabrication of X-ray masks or membranes, and the production of X-rays (the major source of X-rays is a synchrotron). On the other hand, the use of excimer lasers appears to be limited to pilot or laboratory lines; their extension to manufacturing lines has not been contemplated thus far.
To overcome these drawbacks, two major techniques have been developed within the past few years, which aim to improve the semiconductor process per se. They are the so-called "sidewall image transfer" (SIT) and the "multilayer resist" (MLR) techniques. Both techniques capitalize on dry etching technologies to produce fine-line geometries with conventional UV photolithography equipment. Dry etching technologies are rapidly displacing wet etching in the fabrication of VLSICs, because of their capabilities to provide fine-line definition, highly directional etching (anisotropy) and good selectivity, so that precise device fabrication is thereby possible. Basically, dry etching includes plasma etching, a high-pressure process, and reactive ion etching or RIE, which conversely, is a low-pressure process. Under normal conditions, the latter is only anisotropic, producing vertical profiles in the etched layer; however, as will be demonstrated hereinafter, it has been found that RIE may become isotropic, provided that it is operated at high pressure.
In the manufacture of FETs, the SIT technique, basically consists of a sequence of deposition and etching steps that provide submicron FET devices with tight channel control. With this technique, the line width is determined by only the thickness of a conformal layer that can be very thin and accurate. More details of this technique can be found in U.S. Pat. Nos.: 4,430,791; 4,419,809; 4,419,810; and 4,648,937, assigned to the same assignee as the present invention. Implementing the SIT technique in semiconductor processing may require as many as 21 major steps and 4 specific masks.
The MLR technique is essentially based on the use of at least two resist layers with an intermediate layer of an etch-resistant barrier material, such as a PECVD oxide, therebetween. Implementation of the MLR technique in semiconductor processing requires 8 major steps. The MLR technique is described, in particular, in U.S. Pat. Nos. 3,873,361 and 4,003,044, both assigned to the same assignee as the present invention.
The known MLR technique, when applied to the definition of polysilicon fine-line geometries, such as required in the fabrication of polysilicon gates, is described hereinafter, in conjunction with FIGS. 1A to 1F.
Turning now to FIG. 1A, there is shown a semiconductor structure comprising an insulating substrate 10 having a layer 11 of polysilicon (500 nm thick) formed thereon, and a top multilayer photolithographic mask consisting of: a bottom thick (1200 nm) photoresist film 12, an intermediate 200 nm thick (200 nm) PECVD oxide layer 13, and a top thin (600 nm) photoresist film 14. In CMOS FET technology, the insulating substrate can be the thin gate silicon dioxide (SiO.sub.2) layer that is formed above the semiconductor (e.g. silicon) body between the source and drain diffusion regions. The polysilicon layer 11 is formed by conventional deposition techniques and is to be patterned in fine-line geometries or patterns to define the gate electrodes of CMOS FETs, with determined and precise line widths, e.g. of 0.6 .mu.m, for obtaining high-performance FETs.
The process of forming this multilayer photolithographic mask is as follows. First, the polysilicon layer 11 is treated with a photoresist adhesion promoter, such as hexamethyldisilazane (HMDS). The bottom resist film is applied by spin coating and dried. Any standard resist is appropriate for this purpose. Then, the thin layer of PECVD oxide is deposited. Low-temperature deposition equipment, such as an Applied Materials type 5000, is adequate. This step is followed by coating the top resist film and then baking. Next, after hardening, the top resist film is exposed to UV radiation through a mask having the desired configuration in conventional UV photolithography equipment. The exposed top resist is developed in a standard KOH solution to leave the desired remaining portion or pattern that is referenced 14a in FIG. 1B. The width LWe' of pattern 14a is preferably the minimum allowed by the equipment, when operating at the limits of its resolution specifications, e.g. LWe'=0.8 .mu.m.
This pattern is subsequently used as an in-situ mask to RIE etch the underlying PECVD oxide layer 13 to define the PECVD pattern 13a. Preferred operating conditions are 75 cc CHF.sub.3 and 5 cc O.sub.2, at a pressure of 50 mT (6.6 Pa) and an RF frequency power of 1350 W. The PECVD pattern 13a is then used as an in-situ mask to define a corresponding pattern 12a in the bottom thick photoresist layer 12 with vertical walls. This step is achieved in an RIE tool to produce the desired anisotropy with the following typical operating conditions: 50 cc O.sub.2, 3 cc CF.sub.4, a pressure of 35 mTorrs (4.7 Pa) and an RF frequency power of 1000 W. The addition of a small percentage of CF.sub.4 allows improvement of both the etch rate and cleanliness. The resulting structure is shown in FIG. 1B.
In the following step, pattern 12a is eroded anisotropically in an RIE tool using the same operating conditions to ensure the desired isotropic etching, i.e. 3 cc CF.sub.4 and 50 cc O.sub.2, at a pressure of 35 mTorrs and 1000 W. During the overetching step, the lateral dimensions of the pattern are reduced to produce an etch bias of a determined amount dW'. It is important to note that this isotropic etching step is a TIME-controlled process. During this step, the remaining top resist pattern 14a is eliminated. At the end of the overetching step, the lateral dimension of the pattern has diminished by the quantity dWf' on both sides, so that the final pattern width is LWf' as illustrated in FIG. 1C.
Next, the remaining portion of the PECVD layer 13a is removed using the same operating conditions as given above. The resulting structure is shown in FIG. 1D, where the resist pattern 12a' that has been obtained from pattern 12a after lateral reduction is represented. Finally, pattern 12a' is used to anisotropically (unidirectionally etch) define the desired pattern 11a in the polysilicon layer 11 as shown in FIG. 1E. This last step is performed in different equipment using chlorinated gases, as is standard in the art. Once the resist pattern 12a' has been stripped off, the final resulting structure is shown in FIG. 1F. Pattern 11a that is produced by the above MLR process, has a lateral dimension or width LWf', e.g. 0.6 .mu.m, which is less than the original dimension LWe' of 0.8 .mu.m.
In FIG. 1F, pattern 11a is the schematic cross section of a fine-line geometry, e.g. the gate electrode of an FET. However, it must be understood, that pattern 11a is part of a whole image including all the line shaped gate electrodes formed at the same time on the wafer substrate. The above fabrication steps are summarized in TABLE I below, which makes apparent the existence of six critical steps: 2, 6, 7, 8, 9 and 10.
TABLE I ______________________________________ 1. Pre-treatment and bottom resist coating 2. PECVD OXIDE DEPOSITION 3. Top resist coating 4. Mask alignment and exposure 5. Development 6. PECVD OXIDE RIE ETCHING 7. ANISOTROPIC RESIST RIE ETCHING 8. ANISOTROPIC RESIST RIE OVERETCHING (TIME control) 9. PECVD OXIDE REMOVAL 10. ANISOTROPIC POLYSILICON RIE ETCHING 11. Resist stripping ______________________________________
Although the above-described MLR-based process satisfactorily solves the problem stated in the introductory part ofthe present application, it still has numerous inconveniences. It is a relatively complex process, involving many processing steps, six of which are critical. In addition, it necessitates the use of a PECVD oxide layer to allow the control of dimensions of the bottom resist pattern during its etching and, thus, of a specific deposition tool. As a result, it implies the use of different tools. Seen as a whole, it is an expensive process and the manufacturing yields are highly sensitive to contamination. Finally, it is a TIME-controlled process (see step 8, TABLE I), to perform the overetch. The optimum time is determined empirically, and depends, as known in the art, on many process parameters, such as: temperatures, gas pressures, flow rates, etch rates, and RF power. It is therefore clear, that even carefully exercised, the overetch step cannot be carefully controlled, which in turn, results in a process that does not have the required precision and reproducibility. For instance, the final width LWf' of 0.6 .mu.m is given with a precision of +/-0.25 .mu.m (3 .sigma.), with a relatively low reproducibility.

Follow-up system for etch process monitoring

International Business Machines Corporation


Aspects of the present disclosure relate to establishing a secure session between a client device and a stateful backend server or host. The system described herein uses an identity token and an authorization token to generate a globally unique identifier that is associated with the client device. The globally unique identifier is then used to create a one-to-one mapping between the client device and the backend server.

When creating, editing or otherwise accessing content stored on the cloud, it may be desirable to have the backend service maintain all the information about that content. This is generally referred to as a stateful service. As the backend service maintains the information about the content, it may be desirable for a user to have access to the content in a secure manner regardless of the device they are using.
It is with respect to these and other general considerations that embodiments have been described. Also, although relatively specific problems have been discussed, it should be understood that the embodiments should not be limited to solving the specific problems identified in the background.

Establishing secure sessions for stateful cloud services


An object of the present invention is to provide a data processing system which makes it possible to reflect data in a data aggregate of another party, with the mutual relational properties of the data preserved, in a case in which there has been a modification, addition, or the like in any of at least two data aggregates. The data processing system has a data acquisition part for acquiring data recorded in a second data aggregate and described by a designated descriptor; an object generator for generating an object on the basis of the acquired data; a reference relation processor for determining, based on internal attributes, a reference relation among objects in a case in which two or more objects are generated; a save processor for saving the generated objects in a first data aggregate; and a relation updater for extracting, based on the reference relation determined by the reference relation processor, the “ID” in the internal attributes of an object on the referenced side, and using the extracted “ID” to update the internal attributes showing the reference of an object on the reference side.

The present invention relates to a data processing system which makes it possible to reflect data in a data aggregate of another party, with the mutual relational properties of the data preserved, in a case in which there has been a data modification, addition, or the like in either aggregate of data (hereafter referred to as a data aggregate) in at least two data files, databases, or the like.
Various data aggregates are used for processing in computer terminals. In some cases, the data aggregates are related to each other. For example, primary keys are used to specify records when the data aggregates are relational databases. When a specific record in a table is referenced, the referenced destination is specified by the primary key of the record being referenced.
For example, let us consider a case of two systems, A and B, and let system B contain two tables, referred to as "contact" and "connect" (FIG. 4). Relational properties exist between two data because the data of the "connect_id=20" record of the "connect" table in system B references the record of the "contact" table where the "contact_id" is "10." On the other hand, it is assumed that system A contains a "contact" table with the same name as in system B (FIG. 5).
Thus, the two tables of system B are reflected as-is in system A. However, "10" is already used as a "contact_id" in system A, which is the reflection destination. In this case, the "contact_id=10" record of the "contact" table received from system B cannot be used in system A because the record is already in use. In view of this, another primary key, for example, "15," is assigned. The corresponding "contact" and "connect" tables in system A appear as in FIG. 6.
In FIG. 6, the data of the "connect_id=20" record in the table "connect" still references the "contact_id=10" record of the table. However, as stated above, the "contact_id=10" record of the "contact" table received from system B has been newly assigned as "contact_id=15" in system A, and the correct record to be originally referenced is the "contact_id=15" record. The referenced "contact_id" in the table "connect" thus remains unmodified even though the "contact_id" was newly assigned in the "contact" table, creating errors in the relational properties within the data.
Therefore, the relational properties between the two tables transferred from system B are not preserved in system A, and the "connect_id=20" data of the table "connect" in system A is correlated with a separate piece of data, which is "contact_id=10" of the table "contact."
In view of this, a device such as the one described, for example, in Patent Document 1 is used in order to solve these problems.
Patent Document 1: Japanese Laid-open Patent Application No. 10-149308


A pallet changer having additional distribution and storage functions for a manufacturing plant having a central control station, transfer stations at the conveying and storage part of the installation and address readers. The pallet changer comprises a rotatable part capable of rotating about a vertical axis and having pallet guides and pallet feed devices for pallets equipped with switching markers. The rotatable part can be rotated into four fixed change positions offset by about 90.degree. with respect to one another for changing the pallets at one, two or three transfer stations and at one or two machine tools. Rotation of the rotatable part is accomplished as a function of programmes infed to the central control station and by means of four non-rotatably arranged address readers dispositioned at a spacing of about 90.degree. from one another and with the same spacing from the axis of rotation. The address readers are activated by the address switching markers of the pallets inserted onto the pallet guides.

The present invention relates to a new and improved pallet changer having additional distribution and storage functions for fabrication installations or manufacturing plants equipped with a central control station, transfer stations at the conveyor or storage part of the system and address readers, and of the type possessing a rotatable part which can be rotated about a vertical axis and equipped with pallet guides and pallet feed or displacement devices for pallets having switching markers.
In heretofore known manufacturing installations equipped with conveyor lines the workpieces are clamped in a clamping zone upon pallets and successively transported at the conveyor line to one, several or all machines. Operatively associated with each machine is a pallet changer having two change positions and a transfer station at the conveyor line. The pallet changers usually possess a rotatable part which can be rotated through an angle of 180.degree. and having two pallet support guides and associated pallet feed or displacement devices. After a pallet has moved through the part of the conveyor line or path at the side of the machine, then it is either transported to the clamping zone or returned back to the start of the conveyor line. This pallet circulation is accomplished for such length of time until the pallet changer is free at the machine indicated by the central control station. The workpiece which has been finished at a machine is then reintroduced back into the conveyor line by means of the transfer station which is usually rotatable through an angle of 90.degree.. The effectiveness of the conveyor line or path as a storage is limited, since the total number of the pallets which can be received by the conveyor line is limited. Additionally, the pallets dam-up in front of the transfer stations and hinder one another, partially because of the return movement. The desired flexible charging of the machines with different types of workpieces and with priority workpieces is likewise unsatisfactory.
A somewhat improved effectiveness of the conveyor line is obtained by the provision of additional transverse conveyors, a primary conveyor loop being guided about the machines, which are arranged at the transverse conveyors. The pallet outfed by each machine through the action of a second transfer station associated therewith generally brings about a somewhat lesser damming-up of the pallets throughout the entire operation of the installation. The drawbacks attendant with such arrangement reside in increased equipment expenditure and cost owing to the need to provide additional transverse conveyors and transfer stations, and further, the impaired accessibility to the machines and pallet changers.
Furthermore, it is already known in this field of technology to design the conveyor path or line to possess a circular configuration. By means of a pallet changer located at the clamping and unclamping zone or station, it is possible to charge and unload a circular conveyor. Each machine has operatively associated therewith a further pallet changer which coacts with the circular conveyor. The expenditure constituted by three pallet changers and a circular conveyor is extremely high in order to, for instance, interlink two machines.
Now in German patent publication No. 24 35 622 there is described a fabrication installation having, apart from infeeding and return feeding primary conveyor paths or lines, an additional buffer conveyor line or path arranged along all of the erected machines parallel to the main or primary conveyor line. This prior art publication further discloses a technique of controlling priority pallets and routine pallets in conjunction with the buffer conveyor line, as well as the checking of the destination with the selection of the machines. This proposal for a flexible fabrication installation for small, suspended transportable pallets, however cannot be employed at conveyor or conveying lines for supported transportable heavy pallets.
In the case of fabrication installations having a pallet conveyor or feed device which travels upon rails, and which by elevationally adjusting its pallet support can service a shelf storage having large storage capacity, likewise requires for each machine a pallet changer having two change positions and a transfer station at the shelf storage (see the publication Werkstatt und Betrieb 107 (1974/8)). The pallet feed or conveyor device coacts with the clamping and unclamping zone, the shelf storage and the transfer stations in the shelf storage. Due to this arrangement there is afforded a flexible pallet flow, since priority workpieces can be directly inserted for machining. The pallet changers which are employed with such installation for larger sized pallets do not possess any storage capacity, so that particularly when used with manufacturing or fabrication installations having a multiplicity of installed machines, it is possible for the pallet feed device to become easily overloaded if at one or a number of machines there is only carried out an extremely brief amount of work at a workpiece, for instance post-finishing work and, consequently, there can occur standstill times.
Other fabrication installations having a pallet feed or conveyor device for small pallets and workpieces transported in containers, do not have this drawback, because between the transfer station of the shelf storage and the machine there is provided a combined buffer, charging and cleaning station, where the pallets are moved in a number of horizontal planes. The construction of such station is, however, not suitable for large pallets and cannot solve the objectives to which the present invention addresses itself.


A packaging machine for packaging articles into cartons includes a first conveyor for conveying cartons along a carton stream, a second conveyor for conveying first article groups adjacent to the carton stream, a third conveyor for conveying divider pads adjacent to the carton stream, and a fourth conveyor for conveying second article groups adjacent to the carton stream. A first lateral transfer mechanism transfers the first article groups transversely into cartons within the carton stream. A second lateral transfer mechanism transfers the divider pads transversely into the cartons within the carton stream and onto said first article groups contained therein. A third lateral transfer mechanism transfers the second article groups transversely into the cartons within the carton stream and onto the divider pads contained therein.

In the field of packaging it is often required to provide consumers with a package comprising multiple primary product containers, such multi-packs being desirable for shipping and distribution and for display of promotional information.
It is known to automate packaging of the primary product containers into the package by placing the primary product containers into a carton formed from a carton blank.
It is also desirable to produce packaging machine which can be coupled to the output of a processing machine which places product into the primary product containers; for example, this may be a bottling or canning machine. It may be further desirable to reorganise the output stream of primary product containers to facilitate placement into cartons.
It is further desirable to provide a packaging machine having a layout which is capable of processing a variety of different carton formats, for example, wrap around cartons, basket carriers, or fully enclosed cartons, and to be able to side or end load, top load or bottom load the chosen carton format with primary product containers. In one particular example, it is desirable that such a machine be able to process cartons having product containers arranged in two or more layers. Furthermore it is desirable to be able to rapidly change the format or layout of the packaging machine to adapt to the carton format or loading method required.

Packaging machine and method of packaging articles


A piston for use in pneumatically operated piston-cylinder apparatus has a disc-shaped steel core for connection with a piston rod, a sealing ring of resilient material surrounding the core and having an integral sealing lip extending from each axial end an incomplete guide ring fitted around the sealing ring. The guide ring is formed of a graphite-filled plastics material and embraces a circumferential surface of the sealing ring to be axially fixed but radially resilient relative to the piston core.

With a piston of the type which comprises a cylindrical steel core, for example of disc form, connected with a piston rod and, fitted to this core, a sealing ring with sealing lips, formed integrally of rubber or a plastics material similar to rubber having good sealing properties, it is not only necessary to ensure that the piston is accurately controlled during its reciprocal movements inside a cylinder but it must also be ensured that a reliable seal is provided between the piston and the cylinder walls which guide the piston, because the chambers on either side of the piston must be well sealed against each other. Known assemblies which are comparable to the above fail to provide an optimum solution of the problem and are moreover relatively expensive.
According to the present invention there is provided a piston especially for pneumatic cylinders, comprising a rigid core connectable with a piston rod, a sealing ring mounted on the core and having integrally formed sealing lips, the sealing ring being formed of rubber or a plastics material having sealing properties similar to rubber, and a guide ring which is fitted around the sealing ring and is formed of a slideable plastics material to be axially fixed and radially resilient relative to the core.
Preferably the guide ring is slotted and the cross-section of the guide ring is of the shape of a letter C turned into a horizontal position. Preferably also the sealing ring has a circumferential surface and a transverse member of the guide ring extends parallel to the circumferential surface, two legs, of the guide ring embracing the circumferential surface of the sealing ring from opposite sides. It is particularly advantageous that the guide ring is formed of a graphite-filled plastics material, preferably of the polyamide group.
Further the core may have a plurality of cut-outs which are uniformly arranged around the circumference of the core, are of a substantially arcuate contour, and open externally so that the material of the sealing ring may engage with the core from externally. The circumference of the core may be completely covered by the material of the sealing ring, the thickness of the covering being greater in the regions of the cut-outs than in the regions therebetween.

Piston for use in pneumatically operated piston-cylinder apparatus


The invention is directed to the crystalline isopropyl alcohol solvate of loracarbef, and also is directed to a process for the preparation of the crystalline monohydrate form of the compound of formula (I) ##STR1## which includes exposing the crystalline isopropyl solvate form of the compound of formula (I) to a temperature of between about 50.degree. and 90.degree. C. and a relative humidity of between about 60 to about 100%.

This invention relates to a process for the preparation of crystalline loracarbef monohydrate.
The .beta.-lactam antibiotic of the formula (I) ##STR2## is the potent orally active antibiotic known as loracarbef. The antibiotic is described, for example, by Hashimoto et al. in U.S. Pat. No. 4,335,211, issued Jun. 15, 1982.
The above compound comes in various forms, including the crystalline monohydrate form, which is disclosed in European Patent Publication 0,311,366 having a publication date of Apr. 12, 1989. Other known solvate forms of the compound are disclosed in Eckrich et al. U.S. Pat. No. 4,977,257. The crystalline dihydrate form of loracarbef is disclosed in European Patent Publication 0,369,686 having a publication date of May 23, 1990. As indicated in the EPO application, the crystalline monohydrate may be prepared by first suspending the dihydrate in water and effecting solution by the addition of acid followed by the adjustment of the pH with base, or by the addition of base followed by acid.
It has been determined that loracarbef crystalline monohydrate is a fine "hair-like" crystal which results in very slow filtration. In filtering the monohydrate, the crystals tend to from a mat on the filter medium which prevents or reduces the ability to complete filtration, such that the crystals must be washed with water. As loracarbef monohydrate is moderately soluble in water, (approximately 10 mg/ml), loss of yield results when such washes are needed.
What is needed in light of the above difficulties is a process for preparing crystalline loracarbef monohydrate in a more efficient manner, that is, to avoid the requirement of filtering the crystalline monohydrate.

Loracarbef isopropanolate and a process for converting loracarbef isopropanolate to loracarbef monohydrate


The mobile relay according to one embodiment of the present invention comprises: a base station communication unit for transmitting/receiving data to/from a base station through a backhaul link; a sensing unit for sensing the state of the backhaul link; a control unit for determining a transmission mode and a transmission format for a terminal in view of the sensed state of the backhaul link; and a terminal communication unit for transmitting the determined transmission mode and transmission format to the terminal.

In a communication system, a relay has been introduced to eliminate a shadow area. A repeater technology has been evolved from a simple amplify- and forward method to a method which is made intelligent such as decode-and-forward, reconfiguration/reallocation- and forward, and the like.
In particular, in a next-generation mobile communication system, introduction of a plurality of relays which are made intelligent may be unavoidable in order to enlarge the coverage and to improve data throughput while reducing the costs of installing more base stations and maintenance costs of a backhaul communication network.
In addition, in recent years, a mobile relay whose position is flexible as well as a fixed relay whose position is fixed has been used in a communication system.
However, as to such a mobile relay, there is no problem with data communication when a state of a backhaul link between a donor eNodeB that provides a backhaul link to the mobile relay and the mobile relay is good, but there is a problem with the data communication when the state of the backhaul link is bad.
Therefore, in recent years, there has been a demand for more efficient transmission method of a mobile relay that can transmit and receive data in consideration of the state of the backhaul link.

Mobile relay, means of transportation comprising same, and terminal operated by mobile relay

Industry-Academic Cooperation Foundation, Dankook University


An apparatus for cooperation with an existing opening within a cooling radiator of a vehicle for determining the liquid level in the radiator. The radiator, which may be an automobile or truck radiator, is connected to an electrical power source of the vehicle through the vehicle chassis. An insulator is established relative to the vehicle radiator in a substantially fixed relation. A sensor is mounted to the insulator for extending into the liquid in the radiator when a sufficient quantity of liquid is contained therein. The sensor has a plurality of curved surfaces for increasing the surface area of the sensor. An indicator interconnects the sensor with the electrical power source of the vehicle for indicating the level of liquid contained in the radiator by conductivity through the liquid in contact with the sensor. The increased surface area of the sensor enables the indicator means to be a conventional incandescent lamp connected in series with the sensor and the electrical power source of the vehicle. Also included is a first and a second sensor mounted at a first and a second vertical height within the vehicle radiator. The indicator may include a first and a second indicator connected in series with the first and second sensors respectively for indicating a cool liquid level and a hot liquid level within the radiator respectively.

1. Field of the Invention
This invention relates to electrical communications and more particularly to a system which is automatically responsive to conditions of a liquid level incorporating an electrode.
2. Description of the Prior Art
The prior art has known many types of devices and apparati for determining the liquid level in a reservoir. An important aspect of these devices is the detection of the liquid level within a cooling radiator of a vehicle such as an automobile, truck or the like. Many automobiles and trucks have warning lamps or meters to indicate an excessive temperature of the cylinder head of the vehicle internal combustion engine. However, these temperature sensors are not entirely satisfactory, since in many cases they produce false readings for the operator of the vehicle. These temperature sensors only determine the temperature at a single point in the engine whereas another portion of the engine may be overheating. Damage may occur within the engine before indication by the temperature warning device.
Accordingly, the prior art has produced a variety of liquid level sensing devices for determining the liquid level in the cooling radiator of a vehicle. Many of these devices incorporated an electrical probe connected to an indicator for indicating contact of the liquid to the probe. These devices did not work satisfactorily since the amount of electrical current passing through the cooling liquid into the probe was insufficient to power many indicators such as an incandescent lamp. To overcome this problem, the prior art has complicated the system by incorporating a variety of amplifying devices connected between the probe and the indicator for amplifying the small current flowing within the cooling liquid. These circuits must be temperature compensated and are subject to failure due to extreme operating temperatures, vibrations and the like.
Another serious problem encountered with these apparati is the change in operating level within the cooling radiator when the liquid is in a cool condition or when the liquid is in a hot condition. The apparatus must be able to account for a change in temperature of the cooling liquid to determine whether an adequate amount of liquid exists for both a cool and a hot cooling liquid.
A further disadvantage of these prior art devices is that many of them require a special access hole into the internal portions of the cooling radiator to sense the liquid level therein. Many "do it yourself" consumers are reluctant to make access holes in a vehicle radiator and accordingly, these prior art devices were either installed during fabrication of the radiator or by professional personnel.
Therefore, it is an object of this invention to provide an apparatus which overcomes the aforementioned inadequacies of the prior art devices and provides an improvement which is a significant contribution to the advancement of the pertinent art.
Another object of this invention is to provide an apparatus for cooperation with an existing opening within a cooling radiator of a vehicle to determine the liquid level within the radiator.
Another object of this invention is to provide an apparatus for determining the liquid level in the radiator including sensor means extending into the liquid in the radiator when a sufficient quantity of liquid is contained therein with the sensor having a plurality of curved surfaces for increasing the surface area of the sensor means to provide a sufficient amount of current to power a conventional indicating device.
Another object of this invention is to provide an apparatus for determining the liquid level in a vehicle radiator having a first and a second sensor element mounted at a first and second vertical height within the vehicle radiator with a first and second indicator connected in series with the first and second sensor elements, respectively, and switch means interconnecting the first and second sensor means with the first and second indicators for sensing a cool liquid level and a hot liquid level within the cooling radiator.
Another object of this invention is to provide an apparatus for determining the liquid level in a vehicle radiator comprising a substantially planar conductive element and a plurality of semi-cylindrical elements affixed to the planar member for increasing the surface area of the sensor element at a given vertical height within the vehicle radiator.
Another object of this invention is to provide an apparatus for determining the liquid level in a vehicle radiator comprising insulator means affixed to the underside of a vehicle radiator filling cap and sensor means comprising a substantially spring-shaped element extending downwardly into the vehicle radiator for determining the liquid level therein.
Another object of this invention is to provide an apparatus for determining the liquid level in a vehicle radiator comprising a device for replacing a glass sight window in the side of an existing radiator.
Other objects and a fuller understanding of this invention may be had by referring to the summary of the invention, the description and the claims, taken in conjunction with the accompanying drawings.


The cloning and expression of genes in the common aromatic pathway of E. coli are described. A compound for which chorismate, the final product of the common aromatic pathway, is an anabolic intermediate can be produced by cloning and expressing selected genes of the common aromatic pathway and the genes coding for enzymes necessary to convert chorismate to the selected compound. Plasmids carrying selected genes of the common aromatic pathway are also described.

This invention relates to synthesis of aromatic compounds by the conversion of biomass-derived carbon sources. More particularly, the invention relates to cloned genes, transformed hosts carrying such cloned genes, and methods of use thereof for producing selected aromatic compounds by the biocatalytic conversion of glucose and other sugars capable of being used in the biosynthesis of such aromatic compounds. Selected genes of the E. coli common aromatic pathway have been cloned and expressed in bacterial hosts. A host carrying vectors for over-expression of the selected genes of the common aromatic pathway plus an additional gene or genes for converting chorismate, the final product of the common aromatic pathway, to a selected aromatic compound results in production of substantial amounts of such selected aromatic compound.
Chorismate is an intermediate in biosynthetic pathways that lead to the production of many aromatic compounds. Because of the large number of aromatic pathways that branch from chorismate, the biosynthetic pathway used by organisms to produce chorismate is often known as the "common aromatic pathway." This pathway is also known as the shikimate pathway because shikimate was the first identified intermediate in the pathway.
Efficient and cost-effective biosynthetic production of chorismate and its biosynthetic derivatives require that carbon sources such as glucose, lactose, galactose, and other sugars be converted to the selected product in high percentage yields. Accordingly, it is valuable from the standpoint of industrial biosynthetic production of aromatic compounds or other biosynthetic derivatives of chorismate to increase the flux of carbon sources into and through the common aromatic pathway, thereby enhancing biosynthesis of chorismate and its derivatives.
The present invention provides for enhanced commitment of cellular carbon sources to enter and flow through the common aromatic pathway by transferring into host cells genetic elements encoding enzymes that catalyze synthesis of the initial carbon compounds of the common aromatic pathway, genetic elements encoding selected enzymes of the common aromatic pathway, and genetic elements encoding enzymes that catalyze conversion of chorismate to a selected aromatic compound. The genetic elements can be in the form of extrachromosomal plasmids, cosmids, phages, or other replicable elements configured for carrying these genetic elements for expression in a host cell.
U.S. Pat. No. 5,168,056 to Frost discloses cloning and expression of transketolase and optionally the aroF gene and/or aroB gene for enhancing diversion of carbon resources into the common aromatic pathway. U.S. Pat. No. 5,272,073 to Frost & Draths describes a method for synthesizing catechol from a carbon source, such as glucose, by creating a pathway that diverges from the common aromatic pathway for conversion of dehydroshikimate to protocatechuate and then to catechol. This divergent pathway is induced by transforming a host with recombinant DNA carrying the transketolase, DAHP synthase, and 3-dehydroquinate synthase genes. U.S. Pat. No. 5,008,190 and U.S. Pat. No. 5,030,567 to Lee et al. describe cloning of the aroF gene and the pheA gene for increasing the biosynthesis of phenylalanine. EP 77196 discloses cloning of a gene that specifies biosynthesis of a DAHP synthase that is resistant to feedback inhibition by aromatic amino acids. R. Meuller et al., 43 Appl. Microbiol. Biotech. 985-88 (1995); M. Seibert et al., 140 Microbiol. 897-904 (1994); G. Wu et al., 139 J. Gen. Microbiol. 17995-1805 (1993); B. P. Nichols et al., 174 J. Bacteriol. 5309-16 (1992); M. Siebert et al., 307 FEBS Lett. 347-50 (1992); L. Heide et al., 175 J. Bacteriol. 5728-29 (1993); H. Matsude et al., JP 96107789, disclose cloning of the chorismate pyruvate lyase gene that encodes the enzyme for converting chorismate to 4-hydroxybenzoic acid. U.S. Pat. No. 5,487,987 to J. Frost et al. discloses synthesis of adipic acid from biomass-derived carbon sources by expression of 3-dehydroshikimate dehydratase and other enzymes for conversion of 3-dehydroshikimate to adipic acid. WO 94/08015 by Frost et al. teaches the synthesis of quinic acid from glucose by cloning and expressing enzymes in the early stages of the common aromatic pathway for synthesis of dehydroquinate and subsequent conversion to quinic acid. WO 95/33843 by Frost et al. describes enhanced efficiency of production of aromatic compounds by cloning and expressing 3-dehydroquinate synthase, shikimate kinase, 5-enolpyruvoyl-shikimate-3-phosphate synthase, and chorismate synthase and optionally with transketolase and DAHP synthase. All of these processes are inadequate for the production of commercially acceptable levels of selected aromatic compounds for which chorismate is a precursor.
In view of the foregoing, it will be appreciated that cloned genes of the common aromatic pathway and additional genes for converting chorismate to a selected aromatic compound, transformed hosts carrying such cloned genes, and methods of using such cloned genes and transformed hosts for producing the selected aromatic compound would be a significant advancement in the art.

Development of genetically engineered bacteria for production of selected aromatic compounds


A process for removing chlorate from a caustic solution by the reduction of the chlorate with metallic iron. The process is particularly distinguished by the steps of contacting the caustic solution with iron to reduce the chlorate to chloride, contacting the caustic solution containing dissolved iron therein with a conductive substrate to electrolytically precipitate the iron on the substrate, thus providing a caustic solution which is substantially free from iron and chlorate ions, separating the purified portion of the caustic solution, and periodically using the iron coated substrate for treating an untreated portion of the caustic solution to reduce the chlorate to chloride, and periodically reusing the iron depleted substrate, for recovering dissolved iron from the caustic solution. The process of this invention decreases the chlorate content of caustic solutions to an acceptable level of a few ppm and also recovers dissolved iron on an iron depleted substrate for reuse and further reduction of chlorate of an untreated portion of the caustic solution.

The present invention resides in the removal of chlorate from caustic solutions with iron and the consecutive recovery of said iron in metal form.
The removal of unwanted excess chlorate in sodium hydroxide solutions obtained from the diaphragm electrolysis of brine is carried out by using reducing agents, a number of which have been described, including iron. Thus, U.S. Pat. No. 2,404,453 discloses the reduction of chlorate in sodium hydroxide solutions containing about 50 percent NaOH using iron in comminuted form (chips or turnings), said iron particles being coupled with a more noble metal such as copper. Also, U.S. Pat. No. 2,403,789 discloses the purifying of 30-60 percent NaOH solution from excess chlorate by means of iron powder or filings. In such processes, the iron dissolves in the caustic forming Fe.sup.+2 and Fe.sup.3+ ions and simultaneously reducing the chlorate to chloride.
The dissolved iron which is then present as an impurity in the caustic solution as the result of the removal of chlorate should thereafter be eliminated by means involving, for example, oxidation, precipitation or electrolytic reduction. Thus, the cathodic removal of iron and other metal ions has been disclosed in the following publications: U.S. Pat. No. 3,244,605 and French Pat. No. 1,505,466. According to the prior art, the caustic solution containing the iron to be removed (and possibly other metal impurities) is subjected to electrolysis whereby the iron deposits as a metallic coating on the cathode of the electrolytic cell. However, it has not been reported that such electrolytically deposited iron can be re-used for again reducing the chlorate content of a yet untreated caustic solution.

Method for removing chlorate from caustic solutions with electrolytic iron


A solar receiver in which a rod of high thermal conductivity is mounted in an evacuated envelope so as to receive thermal energy and which is coated with a selective absorbing surface so as to minimize radiation has a heat transfer end which is surrounded by a suitable material such as pyroceram or porcelain or other suitable material which extends into a container from which the heat produced by the solar energy is removed. The glass envelope surrounding the rod is attached by welding to the pyroceram cylinder and the heat transfer cavity is connected with an O-ring to the pyroceram cylinder so as to provide a liquid seal.

1. Field of the Invention
This invention relates in general to solar receivers and in particular to a novel solar receiver of high efficiency.
2. Description of the Prior Art
In a solar collector, it is possible to absorb about 99% of the available energy, however, subsequent losses severely degrade the overall collector efficiency. These losses become greater as the operating temperature increases.
When solar radiation is absorbed by a conventional flat plate absorber, the absorber surface becomes hotter than its surroundings and gives up its heat not only to the working fluid but also to the environment through convection, conduction and reradiation. A glass plate is commonly placed over the absorber to minimize the convection losses. A selective surface such as a black chrome plating is often applied to the absorber so as to reduce and minimize the reradiation losses by reducing the emissivity of the plate while maintaining the absorbitivity at a high level. Such techniques are effective up to about 180.degree. F. operating temperature. Concentrating collectors are used above this temperature to further minimize the reradiation losses by reducing the area over which reradiation occurs. This improvement is somewhat marginal but generally allows reasonable efficient operation up to roughly 220.degree. F.
Above 200.degree. to 250.degree. F. it is necessary to enclose the absorber in a high vacuum which will virtually eliminate convective and conduction losses. Conventional approaches using evacuated receivers require glass to metal seals which are expensive and unreliable. Generally, glass to metal seals are accomplished by using a material which has a coefficient of expansion halfway between that of glass and metal but such seals become very unreliable over a period of time when the metal portion has a large characteristic dimension such as the diameter of the tube which carries the liquid through the collector and when the temperature cycle is over a large range. Both of these conditions exist in solar collectors of the prior art.
It has been known in the prior art to provide two concentric tubes which are welded at one end and between which a vacuum is maintained. However, such apparatuses have several disadvantages in that the sun light must go through two separate thicknesses of glasses with a 10% loss through each thickness. Also, the inside glass tube reaches a temperature equivalent to the absorber surface which might be as high as 300.degree. F. and at this temperature the emissivity of the glass is very high which reduces and negates the advantage of applying a selective coating on the absorber surface.
It is also known to provide a receiver which comprises a pair of layers of glass separated by vacuum with a selective coating on the outside diameter of the inner tube. The sun light passes through one thickness of glass and is absorbed and the inner tube becomes hot and transfers its heat to a metal member which is in intimate contact with the inner glass tube. Generally, however, the metal does not contact the glass as well as desired and losses occur. It is very difficult to apply a selective emissivity coating to glass which will withstand hard vacuum and high temperature.

Evacuated solar receiver utilizing a heat pipe