The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step: a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step: b) at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, is applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radicals formed there, and c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionizing radiation; or c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and one or more thermally activatable initiators, and the coating is cured thermally. The invention relates also the use of electron- or H-donors, for example amines, thioethers or thiols, having at least one ethylenically unsaturated group in the production of such layers and to the strongly adherent coatings themselves.

The invention relates to a process for the production of strongly adhering free-radical-curable coatings on inorganic or organic substrates by the deposition of electron- or H-donors having at least one ethylenically unsaturated group on a plasma-activated substrate. The invention relates also to the use of electron- or H-donors, for example amines, thioethers or thiols, having at least one ethylenically unsaturated group in the production of such layers and to the strongly adherent coatings themselves.
The adhesion of finishes, coatings or metallic layers on inorganic or organic substrates, especially on non-polar substrates such as polyethylene, polypropylene or fluorine-containing polyolefins, such as those known by the trade name Teflon(copyright), is frequently inadequate, so that additional coating steps have to be taken in order to achieve satisfactory results. One possibility lies in first applying special priming coatings, so-called primers, and only then applying the desired coating thereto.
A further possibility lies in subjecting the substrates to be coated to a plasma or corona treatment and then coating them, it being possible for a grafting process with e.g. acrylate monomers to be carried out between those two operations (J. Polym. Sci., Part A: Polym. Chem. 31, 1307-1314 (1993)).
International Patent Application WO 00/24527 likewise describes a process for the production of strongly adherent coatings, in which in a first step the surface is pretreated, for example with a low-temperature plasma, and then a photoinitiator containing at least one ethylenically unsaturated bond is grafted onto the surface. The surface so pretreated is then provided with a UV-curable layer.
The production of low-temperature plasmas and the plasma-assisted deposition of thin organic or inorganic layers have been known for some time and are described, for example, by A. T. Bell, xe2x80x9cFundamentals of Plasma Chemistryxe2x80x9d in xe2x80x9cTechnology and Application of Plasma Chemistryxe2x80x9d, published by J. R. Holahan and A. T. Bell, Wiley, New York (1974) or by H. Suhr, Plasma Chem. Plasma Process 3(1), 1, (1983).
It is also known that, for example, plastics surfaces can be subjected to a plasma treatment and as a result the subsequent finish exhibits improved adhesion to the plastics substrate. This is described by H. J. Jacobasch et al. in Farbe+Lack 99(7), 602-607 (1993) for low-temperature plasmas under vacuum conditions and by J. Friedrich et al. in Surf. Coat. Technol. 59, 371-6(1993) for plasmas ranging from in vacuo up to normal pressure conditions, the low-temperature plasma changing into a corona discharge over that range.
It has now been found that coatings having especially good adhesion can be achieved with free-radical-curable compositions by grafting onto the substrate to be coated at least one electron- or H-donor, e.g. a primary, secondary or tertiary amine, a thiol or a thioether or a mixture thereof, each having at least one ethylenically unsaturated group, then providing the substrate so grafted with a free-radical-curable composition which additionally comprises either a photoinitiator or a thermally activatable initiator, e.g. an organic peroxide, and curing that composition under the action of electromagnetic radiation (UV, visible or IR light) or the application of heat. The resulting coatings exhibit surprisingly good adhesion which does not suffer any appreciable impairment even after several days"" storage in sunlight.
The process is simple to carry out and allows a high throughput per unit of time, since lengthy drying steps and slow crosslinking reactions are not required. The process is especially well suited to workpieces that are composed of different plastics and/or metals or types of glass and that without the pretreatment would therefore exhibit different degrees of adhesion to the different components or that in the case of a conventional primer treatment exhibit different affinities for the primer.
The improvement in adhesion can be extraordinarily great, since a covalent bond to the substrate can be formed. The substrate suffers virtually no temperature-related damage, since the process can be carried out in such a manner that the temperatures that occur are at most briefly slightly higher than room temperature. Since the first process step is preferably carried out in vacuo, even substrates on which extraordinarily high purity demands are made can be so treated. Examples thereof can be found in the field of electronics, medicine and food packaging.
In principle, areas that are structured imagewise can also be rendered strongly adherent by the process, for example by pretreating the substrate with the plasma through a mask and thus modifying only certain areas. Structuring can also be carried out subsequently, however, if the free-radical-curable composition contains a photoinitiator and the irradiation is carried out e.g. through a mask.
The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step
a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step
b) at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, is applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radicals formed there, and
c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionising radiation; or
c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and one or more thermally activatable initiators, and the coating is cured thermally.
Possible ways of obtaining plasmas under vacuum conditions have been described frequently in the literature. The electrical energy can be coupled in by inductive or capacitive means. It may be direct current or alternating current; the frequency of the alternating current may vary from a few kHz up into the MHz range. A power supply in the microwave range (GHz) is also possible.
The principles of plasma production and maintenance are described, for example, in the review articles of A. T. Bell and H. Suhr mentioned above.
As primary plasma gases it is possible to use, for example, He, argon, xenon, N2, O2, CO2, NO, steam or air.
The process according to the invention is not sensitive per se in respect of the coupling-in of the electrical energy.
The process can be carried out batchwise, for example in a rotating drum, or continuously in the case of films, fibres or woven fabrics. Those processes are known and are described in the prior art.
The process can also be carried out under corona discharge conditions. Corona discharges are produced under normal pressure conditions, the ionised gas used most frequently being air. In principle, however, other gases are also possible, in which case the operation should be carried out in a closed system in order to exclude atmospheric air. Another possibility is to use air as ionisation gas in corona discharges, so that the operation can be carried out in an apparatus open to the outside and, for example, a film can be drawn through continuously between the discharge electrodes. Such process arrangements are known and are described, for example, in J. Adhesion Sci. Technol. Vol 7, No. 10, 1091-1127, (1993).
When a corona discharge in an open apparatus is used, it is preferable to carry out the operation with the exclusion of oxygen, which can be achieved by a sufficiently large flow of inert gas.
The process can also be carried out using high-energy electromagnetic radiation for the treatment of substrates in vacuo or with the exclusion of oxygen. High-energy electromagnetic radiation that comes into consideration is radiation that is capable of generating free radicals on the surface. Examples thereof are short-wave UV radiation or X-rays. In this context, special mention should be made of electron beams, such as are already used in the curing of surface-coatings and paints and the adhesive bonding of films. It is also possible, however, to use short-wave UV radiation (especially vacuum UV radiation), such as that produced by commercially available UV lamps or by excimer lamps. Radiation having a wavelength of less than 300 nm, especially less than 260 nm, is preferred. In addition to conventional lamps for irradiating a large area, it is also possible to use lasers operating in a corresponding wavelength range for pointwise irradiation or for image-forming xe2x80x9cwritingxe2x80x9d of the surface. When masks or writing lasers are used it is also possible for only certain areas to be loaded selectively with the graft molecules, which leads to different degrees of wetting and, in a subsequent coating, to different degrees of adhesion.
The inorganic or organic substrate to be treated may be in any solid form. The substrate is preferably in the form of a powder, a fibre, a film or a three-dimensional workpiece.
The inorganic or organic substrate is preferably a thermoplastic, elastomeric, structurally crosslinked or crosslinked polymer, a metal oxide, a glass or a metal.
Examples of thermoplastic, elastomeric, structurally crosslinked or crosslinked polymers are listed below.
1. Polymers of mono- and di-olefins, for example polypropylene, polyisobutylene, polybutene-1, poly-4-methylpentene-1, polyisoprene or polybutadiene and also polymerisates of cyclo-olefins, for example of cyclopentene or norbornene; and also polyethylene (which may optionally be cross-linked), for example high density polyethylene (HDPE), high density polyethylene of high molecular weight (HDPE-HMW), high density polyethylene of ultra-high molecular weight (HDPE-UHMW), medium density polyethylene (MDPE), low density polyethylene (LDPE), and linear low density polyethylene (LLDPE), (VLDPE) and (ULDPE).
Polyolefins, that is to say polymers of mono-olefins, as mentioned by way of example in the preceding paragraph, especially polyethylene and polypropylene, can be prepared by various processes, especially by the following methods:
a) by free radical polymerisation (usually at high pressure and high temperature);
b) by means of a catalyst, the catalyst usually containing one or more metals of group IVb, Vb, VIb or VIII. Those metals generally have one or more ligands, such as oxides, halides, alcoholates, esters, ethers, amines, alkyls, alkenyls and/or aryls, which may be either xcfx80- or "sgr"-coordinated. Such metal complexes may be free or fixed to carriers, for example to activated magnesium chloride, titanium(III) chloride, aluminium oxide or silicon oxide. Such catalysts may be soluble or insoluble in the polymerisation medium. The catalysts can be active as such in the polymerisation or further activators may be used, for example metal alkyls, metal hydrides, metal alkyl halides, metal alkyl oxides or metal alkyl oxanes, the metals being elements of group(s) Ia, IIa and/or IIIa. The activators may be modified, for example, with further ester, ether, amine or silyl ether groups. Those catalyst systems are usually known as Phillips, Standard Oil Indiana, Ziegler (-Natta), TNZ (DuPont), metallocene or Single Site Catalysts (SSC).
2. Mixtures of the polymers mentioned under 1), for example mixtures of polypropylene with polyisobutylene, polypropylene with polyethylene (for example PP/HDPE, PP/LDPE) and mixtures of different types of polyethylene (for example LDPE/HDPE).
3. Copolymers of mono- and di-olefins with one another or with other vinyl monomers, for example ethylene/propylene copolymers, linear low density polyethylene (LLDPE) and mixtures thereof with low density polyethylene (LDPE), propylene/butene-1 copolymers, propylene/isobutylene copolymers, ethylene/butene-1 copolymers, ethylene/hexene copolymers. ethylene/methylpentene copolymers, ethylene/heptene copolymers, ethylene/octene copolymers, propylene/butadiene copolymers, isobutylene/isoprene copolymers, ethylene/alkyl acrylate copolymers, ethylene/alkyl methacrylate copolymers, ethylene/vinyl acetate copolymers and copolymers thereof with carbon monoxide, or ethylene/acrylic acid copolymers and salts thereof (ionomers), and also terpolymers of ethylene with propylene and a diene, such as hexadiene, dicyclopentadiene or ethylidenenorbornene; and also mixtures of such copolymers with one another or with polymers mentioned under 1), for example polypropylene-ethylene/propylene copolymers, LDPE-ethylene/vinyl acetate copolymers, LDPE-ethylene/acrylic acid copolymers, LLDPE-ethylene/vinyl acetate copolymers, LLDPE-ethylene/acrylic acid copolymers and alternately or randomly structured polyalkylene-carbon monoxide copolymers and mixtures thereof with other polymers, for example polyamides.
4. Hydrocarbon resins (for example C5-C9) including hydrogenated modifications thereof (for example tackifier resins) and mixtures of polyalkylenes and starch.
5. Polystyrene, poly(p-methylstyrene), poly(xcex1-methylstyrene).
6. Copolymers of styrene or xcex1-methylstyrene with dienes or acrylic derivatives, for example styrene/butadiene, styrene/acrylonitrile, styrene/alkyl methacrylate, styrene/butadiene/alkyl acrylate and methacrylate, styrene/maleic acid anhydride, styrene/acrylonitrile/methyl acrylate; high-impact-strength mixtures consisting of styrene copolymers and another polymer, for example a polyacrylate, a diene polymer or an ethylene/propylene/diene terpolymer; and also block copolymers of styrene, for example styrene/butadiene/styrene, styrene/isoprene/styrene, styrene/ethylene-butylene/styrene or styrene/ethylene-propylene/styrene.
7. Graft copolymers of styrene or xcex1-methylstyrene, for example styrene on polybutadiene, styrene on polybutadiene/styrene or polybutadiene/acrylonitrile copolymers, styrene and acrylonitrile (or methacrylonitrile) on polybutadiene; styrene, acrylonitrile and methyl methacrylate on polybutadiene; styrene and maleic acid anhydride on polybutadiene; styrene, acrylonitrile and maleic acid anhydride or maleic acid imide on polybutadiene; styrene and maleic acid imide on polybutadiene, styrene and alkyl acrylates or alkyl methacrylates on polybutadiene, styrene and acrylonitrile on ethylene/propylene/diene terpolymers, styrene and acrylonitrile on polyalkyl acrylates or polyalkyl methacrylates, styrene and acrylonitrile on acrylate/butadiene copolymers, and mixtures thereof with the copolymers mentioned under 6), such as those known, for example, as so-called ABS, MBS, ASA or AES polymers.
8. Halogen-containing polymers, for example polychloroprene, chlorinated rubber, chlorinated and brominated copolymer of isobutylene/isoprene (halobutyl rubber), chlorinated or chlorosulfonated polyethylene, copolymers of ethylene and chlorinated ethylene, epichlorohydrin homo- and co-polymers, especially polymers of halogen-containing vinyl compounds, for example polyvinyl chloride, polyvinylidene chloride, polyvinyl fluoride, polyvinylidene fluoride; and copolymers thereof, such as vinyl chloride/vinylidene chloride, vinyl chloride/vinyl acetate or vinylidene chloride/vinyl acetate.
9. Polymers derived from xcex1, xcex2-unsaturated acids and derivatives thereof, such as polyacrylates and polymethacrylates, or polymethyl methacrylates, polyacrylamides and polyacrylonitriles impact-resistant-modified with butyl acrylate.
10. Copolymers of the monomers mentioned under 9) with one another or with other unsaturated monomers, for example acrylonitrile/butadiene copolymers, acrylonitrile/alkyl acrylate copolymers, acrylonitrile/alkoxyalkyl acrylate copolymers, acrylonitrile/vinyl halide copolymers or acrylonitrile/alkyl methacrylate/butadiene terpolymers.
11. Polymers derived from unsaturated alcohols and amines or their acyl derivatives or acetals, such as polyvinyl alcohol, polyvinyl acetate, stearate, benzoate or maleate, polyvinylbutyral, polyallyl phthalate, polyallylmelamine; and the copolymers thereof with olefins mentioned in Point 1.
12. Homo- and co-polymers of cyclic ethers, such as polyalkylene glycols, polyethylene oxide, polypropylene oxide or copolymers thereof with bisglycidyl ethers.
13. Polyacetals, such as polyoxymethylene, and also those polyoxymethylenes which contain comonomers, for example ethylene oxide; polyacetals that are modified with thermoplastic polyurethanes, acrylates or MBS.
14. Polyphenylene oxides and sulfides and mixtures thereof with styrene polymers or polyamides.
15. Polyurethanes derived from polyethers, polyesters and polybutadienes having terminal hydroxyl groups on the one hand and aliphatic or aromatic polyisocyanates on the other hand, and their initial products.
16. Polyamides and copolyamides derived from diamines and dicarboxylic acids and/or from aminocarboxylic acids or the corresponding lactams, such as polyamide 4, polyamide 6, polyamide 6/6, 6/10, 6/9, 6/12, 4/6, 12/12, polyamide 11, polyamide 12, aromatic polyamides derived from m-xylene, diamine and adipic acid; polyamides prepared from hexamethylenediamine and iso- and/or tere-phthalic acid and optionally an elastomer as modifier, for example poly-2,4,4-trimethylhexamethylene terephthalamide or poly-m-phenylene isophthalamide. Block copolymers of the above-mentioned polyamides with polyolefins, olefin copolymers, ionomers or chemically bonded or grafted elastomers; or with polyethers, for example with polyethylene glycol, polypropylene glycol or polytetramethylene glycol. Also polyamides or copolyamides modified with EPDM or ABS; and polyamides condensed during processing (xe2x80x9cRIM polyamide systemsxe2x80x9d).
17. Polyureas, polyimides, polyamide imides, polyether imides, polyester imides, polyhydantoins and polybenzimidazoles.
18. Polyesters derived from dicarboxylic acids and dialcohols and/or from hydroxycarboxylic acids or the corresponding lactones, such as polyethylene terephthalate, polybutylene terephthalate, poly-1,4-dimethylolcyclohexane terephthalate, polyhydroxybenzoates, and also block polyether esters derived from polyethers with hydroxyl terminal groups; and also polyesters modified with polycarbonates or MBS.
19. Polycarbonates and polyester carbonates.
20. Polysulfones, polyether sulfones and polyether ketones.
21. Crosslinked polymers derived from aldehydes on the one hand and phenols, urea or melamine on the other hand, such as phenol-formaldehyde, urea-formaldehyde and melamine-formaldehyde resins.
22. Drying and non-drying alkyd resins.
23. Unsaturated polyester resins derived from copolyesters of saturated and unsaturated dicarboxylic acids with polyhydric alcohols, and also vinyl compounds as crosslinking agents, and also the halogen-containing, difficultly combustible modifications thereof.
24. Crosslinkable acrylic resins derived from substituted acrylic acid esters, e.g. from epoxy acrylates, urethane acrylates or polyester acrylates.
25. Alkyd resins, polyester resins and acrylate resins that are crosslinked with melamine resins, urea resins, isocyanates, isocyanurates, polyisocyanates or epoxy resins.
26. Crosslinked epoxy resins derived from aliphatic, cycloaliphatic, heterocyclic or aromatic glycidyl compounds, e.g. products of bisphenol-A diglycidyl ethers, bisphenol-F diglycidyl ethers, that are crosslinked using customary hardeners, e.g. anhydrides or amines with or without accelerators.
27. Natural polymers, such as cellulose, natural rubber, gelatin, or polymer-homologously chemically modified derivatives thereof, such as cellulose acetates, propionates and butyrates, and the cellulose ethers, such as methyl cellulose; and also colophonium resins and derivatives.
28. Mixtures (polyblends) of the afore-mentioned polymers, for example PP/EPDM, polyamide/EPDM or ABS, PVC/EVA, PVC/ABS, PVC/MBS, PC/ABS, PBTP/ABS, PC/ASA, PC/PBT, PVC/CPE, PVC/acrylates, POM/thermoplastic PUR, PC/thermoplastic PUR, POM/acrylate, POM/MBS, PPO/HIPS, PPO/PA 6.6 and copolymers, PA/HDPE, PA/PP, PA/PPO, PBT/PC/ABS or PBT/PET/PC.
Within the context of the present invention, paper should also be understood as being an structurally crosslinked polymer, especially in the form of cardboard, which can additionally be coated with e.g. Teflon(copyright). Such substrates are, for example, commercially available.
The thermoplastic, crosslinked or structurally crosslinked plastics is preferably a polyolefin, polyamide, polyimide, polyacrylate, polycarbonate, polystyrene or an acrylic/melamine, alkyd or polyurethane surface-coating.
Polycarbonate, polyethylene, polypropylene, polyamide and polyimide are especially preferred. The plastics may be in the form of films, injection-moulded articles, extruded workpieces, fibres, felts or woven fabrics.
As inorganic substrates there come into consideration especially glass, metal oxides and metals. They may be silicates and semi-metal or metal oxide glass which are preferably in the form of powder having average particle diameters of from 10 nm to 2000 xcexcm. The particles may be solid or porous. Examples of oxides and silicates are SiO2, TiO2, ZrO2, MgO, NiO, WO3, Al2O3, La2O3, silica gels, clays and zeolites. Preferred inorganic substrates, in addition to metals, are silica gels, aluminium oxide, titanium oxide and glass and mixtures thereof.
As metal substrates there come into consideration especially Fe, Al, Ti, Ni, Mo, Cr and steel alloys.
The electron- or H-donor is preferably a primary, secondary or tertiary amine, a thiol or a thioether or a mixture thereof.
In principle, any amine, thiol or thioether that contains at least one ethylenically unsaturated group is suitable for use in the process according to the invention.
Amines, especially secondary or tertiary amines, are preferred. Also preferred are aliphatic or cycloaliphatic amines that, in addition to the amine nitrogen atom, may also contain further hetero atoms. Examples are derivatives of piperidine, morpholine or piperazine.
Oligomeric amines are also possible.
Special preference is given to compounds of formulae Ia, Ib, Ic, Id and Ie
wherein
R1 is H or C1-C4alkyl; preferably H or CH3;
R2 and R3 are each independently of the other C1-C18alkyl or, in formulae Ia, Ib and Ie, together with the nitrogen atom to which they are bonded form a 5- or 6-membered cycloaliphatic ring which may additionally be interrupted by a nitrogen or oxygen atom; or R2 in formula Ic has the additional meaning of the group
R4 is C1-C18alkyl, phenyl, phenyl-C1-C3alkyl or a group xe2x80x94C(O)xe2x80x94C1-C18alkyl or xe2x80x94C(O)xe2x80x94(CH2)a-phenyl wherein a is a number from 0 to 3;
R5 is C1-C18alkyl, phenyl or phenyl-C1-C3alkyl;
X is a direct bond, a group xe2x80x94(CH2)nxe2x80x94 or a branched C3-C18alkylene group; and
n is a number from 1 to 12.
Preferably R2 and R3 are C1-C4alkyl or together with the nitrogen atom to which they are bonded form a morpholine radical.
Preferably R4 is C1-C4alkyl or benzyl. R5 is preferably C1-C4alkyl and n is preferably from 1 to 4.
The meanings of the substituents in the different radicals are explained below.
C1-C18Alkyl is linear or branched and is, for example, C1-C8-, C1-C6- or C1-C4-alkyl.
Examples are methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, iso-butyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl-pentyl, 2-ethylhexyl, octyl, nonyl, decyl, undecyl, dodecyl and octadecyl, especially e.g. methyl or butyl.
Phenylalkyl is phenylpropyl, phenylethyl and especially benzyl.
When R2 and R3 together with the nitrogen atom form a 5- or 6-membered cycloaliphatic ring which may additionally be interrupted by a nitrogen or oxygen atom, they form, for example, cyclopentyl, cyclohexyl, pyrrolidine, morpholine, pyrazoline, pyrazolidone, imidazoline, imidazolidine, oxazolidine, oxazolidinone, piperidine, piperazine or piperazinone.
The compounds of formulae Ia to Ie are mostly known and are commercially available or can be prepared in accordance with analogy processes.
Suitable compounds are also amine-group-containing or thio-group-containing vinyl ethers or styrenes. Examples are given below:
Specific examples of suitable ethylenically unsaturated amines, thiols and thioethers are given below.
2-N-Morpholinoethyl acrylate, 2-N-morpholinoethyl methacrylate, N,N-diethylaminoethyl acrylate, N,N-dimethylaminoethyl acrylate, 3-(dimethylamino)propyl acrylate, 2-(diethylamino)ethyl methacrylate, 2-(dimethylamino)ethyl methacrylate, 3-(dimethylamino)neopentyl acrylate, 2-(tert-butylamino)ethyl methacrylate, 2-(diisopropylamino)ethyl methacrylate, 2-aminoethyl methacrylate hydrochloride, methyl-3-(dimethylamino)-2-(2,2-dimethylpropanoyl) acrylate, ethyl-3-dimethylaminoacrylate, benzyl-2-(diphenylmethylaminomethyl) acrylate hydrobromide, 2-dimethylamino-1-benzamido-methyl acrylate, 3-(dimethylamino)propyl acrylate, 3-amino-3-(trifluoromethylphenylamino)ethyl acrylate hydrochloride, 2-((2-acetyl-3-oxo-1-butenyl)amino)-3-(dimethylamino)methyl acrylate, ethylthioethyl methacrylate, thioldiethylene glycol diacrylate, 2-(methylthio)ethyl methacrylate and methyl-2-methylthioacrylate.
Also suitable are dimethyl-bis(methylthio)methylene malonate, N-vinylpyrrolidone, N,N-diethyl-2-ethylvinyl ether.
Those compounds are all known and are commercially available. Furthermore, suitable amines are provided by a number of manufacturers under their trade names and these too can be used in the context of the present invention. Examples are mentioned below. From UCB SA Ebecryl(copyright) P 115 and Ebecryl(copyright) 7100. From Cray Valley CN 371, CN 383, CN 384, CN 381, CN 386. From Rahn Genomer(copyright) 5248, Genomer(copyright)5275, Genomer(copyright)5695, ACMO (acryloylmorpholine). From Akcros Chemicals Actilan(copyright) 705, 715, 725, 735, 745. From CPS Chemical Company Ageflex(copyright) FH 1, FH 2, FU 1, FU 2, FU 4. From Cognis Photomer 4770, Photomer 4967, RCC 13-660, RCC 13-661. From BASF Laromer LR 8956.
The electron- or H-donors, for example the amines, thiols and thioethers, containing at least one ethylenically unsaturated group can be vaporised, for example, on a heatable device in vacuo after the free-radical-forming discharge or irradiation (Process step a)) has been discontinued, so that they are deposited on the workpiece being treated, where they react with free radical sites. The vaporisation can be effected in the form of a solid, a melt or with a suitable solvent, the vapour pressure of the solvent preferably being close to that of the electron- or H-donors. Other methods of application, e.g. pouring, immersion, spraying, spreading, knife application, roller application, spin-coating or electrophoretic deposition, are also possible, however.
In the case of a corona discharge under atmospheric conditions, the electron- or H-donors having at least one ethylenically unsaturated group can also be applied from a solution by spraying. This is preferably effected as soon as possible after the corona discharge, for example in a continuous process by means of nozzles downstream of the discharge zone.
In a further embodiment of the process, in Process step b) together with the electron- or H-donors having at least one ethylenically unsaturated group there is simultaneously applied a photoinitiator and/or an ethylenically unsaturated monomer.
Examples of suitable photoinitiators and monomers are given below.
The ratio of electron- or H-donors to photoinitiator and/or monomer is preferably from 10:1 to 1:2.
After the application of the compounds, the workpiece can be stored or immediately processed further, a free-radical-curable composition containing ethylenically unsaturated bonds being applied by means of known technology. This can be effected by means of pouring, immersion, spraying, spreading, knife application, roller application or spin-coating. Electrophoretic deposition is also possible.
The unsaturated compounds of the free-radical-curable composition may contain one or more ethylenically unsaturated double bonds. They may be low molecular weight (monomeric) or higher molecular weight (oligomeric). Examples of monomers having a double bond are alkyl and hydroxyalkyl acrylates and methacrylates, e.g. methyl, ethyl, butyl, 2-ethylhexyl and 2-hydroxyethyl acrylate, isobornyl acrylate and methyl and ethyl methacrylate. Also of interest are silicone acrylates. Further examples are acrylonitrile, acrylamide, methacrylamide, N-substituted (meth)acrylamides, vinyl esters, such as vinyl acetate, vinyl ethers, such as isobutyl vinyl ether, styrene, alkyl- and halo-styrenes, N-vinylpyrrolidone, vinyl chloride and vinylidene chloride.
Examples of monomers having several double bonds are ethylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, hexamethylene glycol diacrylate, bisphenol-A diacrylate, 4,4xe2x80x2-bis(2-acryloyloxyethoxy)diphenylpropane, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, vinyl acrylate, divinylbenzene, divinyl succinate, diallyl phthalate, triallyl phosphate, triallyl isocyanurate, tris(hydroxyethyl) isocyanurate triacrylate and tris(2-acryloylethyl) isocyanurate.
Examples of higher molecular weight (oligomeric) polyunsaturated compounds are acrylated epoxy resins, acrylated or vinyl-ether- or epoxy-group-containing polyesters, polyurethanes and polyethers. Further examples of unsaturated oligomers are unsaturated polyester resins, which are usually produced from maleic acid, phthalic acid and one or more diols and have molecular weights of about from 500 to 3000. In addition it is also possible to use vinyl ether monomers and oligomers, and also maleate-terminated oligomers having polyester, polyurethane, polyether, polyvinyl ether and epoxide main chains. In particular, combinations of vinyl-ether-group-carrying oligomers and polymers, as described in WO 90/01512, are very suitable, but copolymers of monomers functionalised with vinyl ether and maleic acid also come into consideration. Such unsaturated oligomers can also be termed prepolymers.
Especially suitable are, for example, esters of ethylenically unsaturated carboxylic acids and polyols or polyepoxides, and polymers having ethylenically unsaturated groups in the chain or in side groups, e.g. unsaturated polyesters, polyamides and polyurethanes and copolymers thereof, alkyd resins, polybutadiene and butadiene copolymers, polyisoprene and isoprene copolymers, polymers and copolymers having (meth)acrylic groups in side chains, and also mixtures of one or more such polymers.
Examples of unsaturated carboxylic acids are acrylic acid, methacrylic acid, crotonic acid, itaconic acid, cinnamic acid and unsaturated fatty acids such as linolenic acid or oleic acid. Acrylic and methacrylic acid are preferred.
Suitable polyols are aromatic and especially aliphatic and cycloaliphatic polyols. Examples of aromatic polyols are hydroquinone, 4,4xe2x80x2-dihydroxydiphenyl, 2,2-di(4-hydroxyphenyl)propane, and novolaks and resols. Examples of polyepoxides are those based on the said polyols, especially the aromatic polyols and epichlorohydrin. Also suitable as polyols are polymers and copolymers that contain hydroxyl groups in the polymer chain or in side groups, e.g. polyvinyl alcohol and copolymers thereof or polymethacrylic acid hydroxyalkyl esters or copolymers thereof. Further suitable polyols are oligoesters having hydroxyl terminal groups.
Examples of aliphatic and cycloaliphatic polyols include alkylenediols having preferably from 2 to 12 carbon atoms, such as ethylene glycol, 1,2- or 1,3-propanediol, 1,2-, 1,3- or 1,4-butanediol, pentanediol, hexanediol, octanediol, dodecanediol, diethylene glycol, triethylene glycol, polyethylene glycols having molecular weights of preferably from 200 to 1500, 1,3-cyclopentanediol, 1,2-, 1,3- or 1,4-cyclohexanediol, 1,4-dihydroxymethylcyclohexane, glycerol, tris(xcex2-hydroxyethyl)amine, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol and sorbitol.
The polyols may be partially or fully esterified by one or by different unsaturated carboxylic acid(s), it being possible for the free hydroxyl groups in partial esters to have been modified, for example etherified, or esterified by other carboxylic acids.
Examples of esters are:
trimethylolpropane triacrylate, trimethylolethane triacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tripentaerythritol octaacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol tetramethacrylate, tripentaerythritol octamethacrylate, pentaerythritol diitaconate, dipentaerythritol trisitaconate, dipentaerythritol pentaitaconate, dipentaerythritol hexaitaconate, ethylene glycol diacrylate, 1,3-butanediol diacrylate, 1,3-butanediol dimethacrylate, 1,4-butanediol diitaconate, sorbitol triacrylate, sorbitol tetraacrylate, pentaerythritol-modified triacrylate, sorbitol tetramethacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, oligoester acrylates and methacrylates, glycerol di- and tri-acrylate, 1,4-cyclohexane diacrylate, bisacrylates and bismethacrylates of polyethylene glycol having a molecular weight of from 200 to 1500, and mixtures thereof.
Also suitable as a component are the amides of identical or different unsaturated carboxylic acids and aromatic, cycloaliphatic and aliphatic polyamines having preferably from 2 to 6, especially from 2 to 4, amino groups. Examples of such polyamines are ethylenediamine, 1,2- or 1,3-propylenediamine, 1,2-, 1,3- or 1,4-butylenediamine, 1,5-pentylenediamine, 1,6-hexylenediamine, octylenediamine, dodecylenediamine, 1,4-diamino-cyclohexane, isophoronediamine, phenylenediamine, bisphenylenediamine, di-xcex2-aminoethyl ether, diethylenetriamine, triethylenetetramine and di(xcex2-aminoethoxy)- and di(xcex2-aminopropoxy)-ethane. Further suitable polyamines are polymers and copolymers which may have additional amino groups in the side chain and oligoamides having amino terminal groups. Examples of such unsaturated amides are: methylene bisacrylamide, 1,6-hexamethylene bisacrylamide, diethylenetriamine trismethacrylamide, bis(methacrylamidopropoxy)ethane, xcex2-methacrylamidoethyl methacrylate and N-[(xcex2-hydroxyethoxy)ethyl]-acrylamide.
Suitable unsaturated polyesters and polyamides are derived, for example, from maleic acid and diols or diamines. The maleic acid may have been partially replaced by other dicarboxylic acids. They may be used together with ethylenically unsaturated comonomers, e.g. styrene. The polyesters and polyamides may also be derived from dicarboxylic acids and ethylenically unsaturated diols or diamines, especially from those having longer chains of e.g. from 6 to 20 carbon atoms. Examples of polyurethanes are those composed of saturated diisocyanates and unsaturated diols or unsaturated diisocyanates and saturated diols.
Polybutadiene and polyisoprene and copolymers thereof are known. Suitable comonomers include, for example, olefins, such as ethylene, propene, butene, hexene, (meth)acrylates, acrylonitrile, styrene and vinyl chloride. Polymers having (meth)acrylate groups in the side chain are likewise known. Examples are reaction products of novolak-based epoxy resins with (meth)acrylic acid; homo- or co-polymers of vinyl alcohol or hydroxyalkyl derivatives thereof that have been esterified with (meth)acrylic acid; and homo- and co-polymers of (meth)acrylates that have been esterified with hydroxyalkyl (meth)acrylates.
It is especially preferred to use an acrylate or methacrylate compound as ethylenically mono- or poly-unsaturated compound.
Very especially preferred are polyunsaturated acrylate compounds, as already listed above.
Special preference is given to a process in which at least one of the ethylenically unsaturated monomers or oligomers of the composition is a mono-, di-, tri- or tetra-functional acrylate or methacrylate.
The composition can be cured thermally in the presence of a thermally activatable initiator. Suitable initiators, e.g. peroxides or azo compounds, are known to the person skilled in the art and are commercially available.
Examples of suitable peroxides are:
acetyl-cyclohexanesulfonyl peroxide, diisopropyl peroxydicarbonate, tert-amyl perneodecanoate, tert-butyl perneodecanoate, tert-butyl perpivalate, tert-amyl perpivalate, bis(2,4-dichlorobenzoyl)peroxide, diisononanoyl peroxide, didecanoyl peroxide, dioctanoyl peroxide, dilauroyl peroxide, bis(2-methylbenzoyl)peroxide, disuccinic acid peroxides, diacetyl peroxide, dibenzoyl peroxide, tert-butyl per-2-ethylhexanoate, bis(4-chlorobenzoyl)peroxide, tert-butyl perisobutyrate, tert-butyl permaleinate, 1,1-bis(tert-butylperoxy)-3,5,5-trimethyl-cyclohexane, 1,1-bis(tert-butylperoxy)cyclohexane, tert-butyl-peroxyisopropyl carbonate, tert-butyl perisononanoate, 2,5-dimethylhexane-2,5-dibenzoate, tert-butyl peracetate, tert-amyl perbenzoate, tert-butyl perbenzoate, 2,2-bis(tert-butylperoxy)butane, 2,2-bis(tert-butylperoxy)propane, dicumyl peroxides, 2,5-dimethylhexane-2,5-di-tert-butyl peroxide, 3-tert-butylperoxy-3-phenylphthalide, di-tert-amyl peroxide, xcex1,xcex1xe2x80x2-bis(tert-butylperoxy-isopropyl)-benzene, 3,5-bis(tert-butylperoxy)-3,5-dimethyl-1,2-dioxolane, di-tert-butyl peroxides, 2,5-dimethylhexyne-2,5-di-tert-butyl peroxides, 3,3,6,6,9,9-hexamethyl-1,2,4,5-tetraoxacyclononane, p-menthane hydroperoxide, pinane hydroperoxide, diisopropylbenzene mono-xcex1-hydroperoxide, cumene hydroperoxide and tert-butyl hydroperoxide.
Examples of suitable azo componds are: azoisobutyronitrile (AIBN), and the products marketed by DuPont under the name Vazo(copyright).
The composition can also be cured by UV/VIS/IR radiation in the presence of a photoinitiator. Such curing is preferred, but electron beam curing is also possible.
In the context of the present invention, UV/VIS radiation is to be understood as being electromagnetic radiation in a wavelength range of from 100 nm to 1200 nm. Preference is given to the range from 200 nm to 600 nm, especially from 300 nm to 600 nm. Suitable radiation sources are known to the person skilled in the art and are commercially available.
The photosensitivity of the compositions usually extends from approximately 200 nm to approximately 600 nm (UV field). Suitable radiation is present, for example, in sunlight or light from artificial light sources. Accordingly a large number of the most varied kinds of light source may be used. Both point sources and planiform radiators (lamp carpets) are suitable. Examples are: carbon arc lamps, xenon arc lamps, medium-pressure, high-pressure and low-pressure mercury arc radiators doped, where appropriate, with metal halides (metal halide lamps), microwave-excited metal vapour lamps, excimer lamps, superactinic fluorescent tubes, fluorescent lamps, argon incandescent lamps, electronic flash lamps, photographic floodlight lamps and light-emitting diodes (LED). The distance between the lamp and the substrate to be irradiated may vary according to the intended use and the type and strength of the lamp and may be, for example, from 2 cm to 150 cm. Especially suitable are laser light sources, for example excimer lasers, such as Krypton-F lasers for irradiation at 248 nm. Lasers in the visible range may also be used.
The free-radical-curable composition preferably comprises at least one ethylenically unsaturated monomer or oligomer and at least one photoinitiator and is cured by UV/VIS radiation.
As photoinitiators in the radiation-curable surface-coatings it is possible to use any initiators known from the prior art. Such photoinitiators can also, as described above, be vaporised in Process step b).
They are especially aromatic carbonyl compounds, e.g. benzophenone and derivatives, acetophenone and derivatives thereof, acylphosphine oxides, bisacylphosphine oxides, thioxanthone, especially also isopropyl thioxanthone, anthraquinone derivatives and 3-acylcoumarin derivatives, terphenyls, styryl ketones, and also 3-(aroylmethylene)-thiazolines, camphor quinone, and also eosine, rhodamine and erythrosine dyes. It is also possible to use hexaarylbisimidazoles (EP-A-475 153), acridines (U.S. Pat. No. 5,334,484) and dye borate salts and combinations of dyes with borates (U.S. Pat. Nos. 4,772,541 and 5,932,393).
Typical examples are mentioned below, which can be used both on their own or in admixture with one another. For example, benzophenones, benzophenone derivatives, acetophenone, acetophenone derivatives, e.g. xcex1-hydroxycycloalkylphenylketones or 2-hydroxy-2-methyl-1-phenyl-propanone, dialkoxyacetophenones, xcex1-hydroxy- or xcex1-amino-acetophenones, e.g. (4-methylthiobenzoyl)-1-methyl-1-morpholino-ethane, (4-morpholino-benzoyl)-1-benzyl-1-dimethylamino-propane, 4-aroyl-1,3-dioxolanes, benzoin alkyl ethers and benzil ketals, e.g. benzil dimethyl ketal, phenyl glyoxalates and derivatives thereof, dimeric phenyl glyoxalates, monoacylphosphine oxides, e.g. (2,4,6-trimethylbenzoyl)phenylphosphine oxide, bisacylphosphine oxides, e.g. bis(2,6-dimethoxybenzoyl)-(2,4,4-trimethyl-pent-1-yl)phosphine oxide, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide or bis(2,4,6-trimethylbenzoyl)-(2,4-dipentyloxyphenyl)phosphine oxide, trisacylphosphine oxides, ferrocenium compounds or titanocenes, e.g. dicyclopentadienyl-bis(2,6-difluoro-3-pyrrolo-phenyl)titanium. A further class of suitable photoinitiators is that of the oxime esters. The following compounds may be mentioned by way of example: 1-(4-phenylsulfanyl-phenyl)-butane-1,2-dione 2-oxime-O-benzoate, 1-(4-phenylsulfanyl-phenyl)-octane-1,2-dione 2-oxime-O-benzoate, 1-(4-phenyl-sulfanyl-phenyl)-octan-1-one oxime-O-acetate, 1-(4-phenylsulfanyl-phenyl)-butan-1-one oxime-O-acetate and 1-(4-phenylsulfanyl-phenyl)-octane-1,2-dione 2-oxime-O-benzoate.
Further examples of suitable photoinitiators and sensitisers are listed below.
1. Thioxanthones
Thioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2-dodecylthioxanthone, 2,4-diethylthioxanthone, 2,4-dimethylthioxanthone, 1-methoxycarbonylthioxanthone, 2-ethoxy-carbonylthioxanthone, 3-(2-methoxyethoxycarbonyl)-thioxanthone, 4-butoxycarbonyl-thioxanthone, 3-butoxycarbonyl-7-methylthioxanthone, 1-cyano-3-chlorothioxanthone, 1-ethoxycarbonyl-3-chlorothioxanthone, 1-ethoxycarbonyl-3-ethoxythioxanthone, 1-ethoxy-carbonyl-3-aminothioxanthone, 1-ethoxycarbonyl-3-phenylsulfurylthioxanthone, 3,4-di[2-(2-methoxyethoxy)ethoxycarbonyl]thioxanthone, 1-ethoxycarbonyl-3-(1-methyl-1-morpholino-ethyl)-thioxanthone, 2-methyl-6-dimethoxymethyl-thioxanthone, 2-methyl-6-(1,1-dimethoxy-benzyl)-thioxanthone, 2-morpholinomethylthioxanthone, 2-methyl-6-morpholinomethylthioxanthone, N-allylthioxanthone-3,4-dicarboximide, N-octylthioxanthone-3,4-dicarboximide, N-(1,1,3,3-tetramethylbutyl)-thioxanthone-3,4-dicarboximide, 1-phenoxythioxanthone, 6-ethoxycarbonyl-2-methoxythioxanthone, 6-ethoxycarbonyl-2-methylthioxanthone, thioxanthone-2-polyethylene glycol ester, 2-hydroxy-3-(3,4-dimethyl-9-oxo-9H-thioxanthon-2-yloxy)-N,N,N-trimethyl-1-propanaminium chloride;
2. Benzophenones
Benzophenone, 4-phenylbenzophenone, 4-methoxybenzophenone, 4,4xe2x80x2-dimethoxy-benzophenone, 4,4xe2x80x2-dimethylbenzophenone, 4,4xe2x80x2-dichlorobenzophenone, 4,4xe2x80x2-dimethylaminobenzophenone, 4,4xe2x80x2-diethylaminobenzophenone, 4-methylbenzophenone, 2,4,6-trimethylbenzophenone, 4-(4-methylthiophenyl)-benzophenone, 3,3xe2x80x2-dimethyl-4-methoxybenzophenone, methyl-2-benzoyl benzoate, 4-(2-hydroxyethylthio)-benzophenone, 4-(4-tolylthio)benzophenone, 4-benzoyl-N,N,N-trimethylbenzenemethanaminium chloride, 2-hydroxy-3-(4-benzoylphenoxy)-N,N,N-trimethyl-1-propanaminium chloride monohydrate, 4-(13-acryloyl-1,4,7,10,13-pentaoxatridecyl)-benzophenone, 4-benzoyl-N,N-dimethyl-N-[2-(1-oxo-2-propenyl)oxy]ethyl-benzenemethanaminium chloride; and also asymmetrically substituted benzophenone derivatives, as described in WO 98/33764;
3. 3-Acylcoumarins
3-Benzoylcoumarin, 3-benzoyl-7-methoxycoumarin, 3-benzoyl-5,7-di(propoxy)coumarin, 3-benzoyl-6,8-dichlorocoumarin, 3-benzoyl-6-chlorocoumarin, 3,3xe2x80x2-carbonyl-bis[5,7-di-(propoxy)coumarin], 3,3xe2x80x2-carbonyl-bis(7-methoxycoumarin), 3,3xe2x80x2-carbonyl-bis(7-diethyl-aminocoumarin), 3-isobutyroylcoumarin, 3-benzoyl-5,7-dimethoxycoumarin, 3-benzoyl-5,7-diethoxycoumarin, 3-benzoyl-5,7-dibutoxycoumarin, 3-benzoyl-5,7-di(methoxyethoxy)coumarin, 3-benzoyl-5,7-di(allyloxy)coumarin, 3-benzoyl-7-dimethylaminocoumarin, 3-benzoyl-7-diethylaminocoumarin, 3-isobutyroyl-7-dimethylaminocoumarin, 5,7-dimethoxy-3-(1-naphthoyl)-coumarin, 5,7-dimethoxy-3-(1-naphthoyl)-coumarin, 3-benzoylbenzo[f]coumarin, 7-diethylamino-3-thienoylcoumarin, 3-(4-cyanobenzoyl)-5,7-dimethoxycoumarin;
4. 3-(Aroylmethylene)-thiazolines
3-Methyl-2-benzoylmethylene-xcex2-naphthothiazoline, 3-methyl-2-benzoylmethylene-benzothiazoline, 3-ethyl-2-propionylmethylene-xcex2-naphthothiazoline;
5. Other Carbonyl Compounds
Acetophenone, 3-methoxyacetophenone, 4-phenylacetophenone, benzil, 2-acetylnaphthalene, 2-naphthaldehyde, 9,10-anthraquinone, 9-fluorenone, dibenzosuberone, xanthone, 2,5-bis(4-diethylaminobenzylidene)cyclopentanone, xcex1-(para-dimethylamino-benzylidene)ketones, such as 2-(4-dimethylamino-benzylidene)-indan-1-one or 3-(4-dimethylamino-phenyl)-1-indan-5-yl-propenone, 3-phenylthiophthalimide, N-methyl-3,5-di(ethylthio)phthalimide, N-methyl-3,5-di(ethylthio)phthalimide.
The classes of the benzophenones, benzophenone derivatives, thioxanthone, thioxanthone derivatives, acetophenone and acetophenone derivatives are preferred. Some of the compounds of those classes have been mentioned above. They are known to the person skilled in the art and are commercially available.
In addition to those additives, which are important for the curing, the free-radical-curable composition may also comprise further additives, especially light stabilisers.
The radiation-curable compositions may also be pigmented when a suitable photoinitiator is chosen, it being possible for coloured pigments as well as white pigments, dyes and fillers to be used.
The coating can be applied in any layer thicknesses, preferably from about 0.1 xcexcm to about 1000 xcexcm, especially about from 1 xcexcm to 100 xcexcm. In the range of low layer thicknesses  less than 5 xcexcm, pigmented surface-coatings are also referred to as printing inks.
As light stabilisers it is possible to add UV absorbers, e.g. those of the hydroxyphenylbenzotriazole, hydroxyphenylbenzophenone, oxalic acid amide or hydroxyphenyl-s-triazine type. Such compounds can be used on their own or in the form of mixtures, with or without the use of sterically hindered amines (HALS).
Examples of such UV absorbers and light stabilisers are
1. 2-(2xe2x80x2-Hydroxyphenyl)-benzotriazoles, e.g. 2-(2xe2x80x2-hydroxy-5xe2x80x2-methylphenyl)-benzotriazole, 2-(3xe2x80x2,5xe2x80x2-di-tert-butyl-2xe2x80x2-hydroxyphenyl)-benzotriazole, 2-(5xe2x80x2-tert-butyl-2xe2x80x2-hydroxyphenyl)-benzotriazole, 2-(2xe2x80x2-hydroxy-5xe2x80x2-(1,1,3,3-tetramethylbutyl)-phenyl)-benzotriazole, 2-(3xe2x80x2,5xe2x80x2-di-tert-butyl-2xe2x80x2-hydroxyphenyl)-5-chlorobenzotriazole, 2-(3xe2x80x2-tert-butyl-2xe2x80x2-hydroxy-5xe2x80x2-methylphenyl)-5-chlorobenzotriazole, 2-(3xe2x80x2-sec-butyl-5xe2x80x2-tert-butyl-2xe2x80x2-hydroxyphenyl)-benzotriazole, 2-(2xe2x80x2-hydroxy-4xe2x80x2-octyloxyphenyl)-benzotriazole, 2-(3xe2x80x2,5xe2x80x2-di-tert-amyl-2xe2x80x2-hydroxyphenyl)-benzotriazole, 2-(3xe2x80x2,5xe2x80x2-bis(xcex1,xcex1-dimethylbenzyl)-2xe2x80x2-hydroxyphenyl)benzotriazole, mixture of 2-(3xe2x80x2-tert-butyl-2xe2x80x2-hydroxy-5xe2x80x2-(2-octyloxycarbonylethyl)phenyl)-5-chlorobenzotriazole, 2-(3xe2x80x2-tert-butyl-5xe2x80x2-[2-(2-ethylhexyloxy)carbonylethyl]-2xe2x80x2-hydroxyphenyl)-5-chlorobenzotriazole, 2-(3xe2x80x2-tert-butyl-2xe2x80x2-hydroxy-5xe2x80x2-(2-methoxycarbonylethyl)phenyl)-5-chlorobenzotriazole, 2-(3xe2x80x2-tert-butyl-2xe2x80x2-hydroxy-5xe2x80x2-(2-methoxycarbonylethyl)phenyl)-benzotriazole, 2-(3xe2x80x2-tert-butyl-2xe2x80x2-hydroxy-5xe2x80x2-(2-octyloxycarbonylethyl)phenyl)-benzotriazole, 2-(3xe2x80x2-tert-butyl-5xe2x80x2-[2-(2-ethylhexyloxy)carbonylethyl]-2xe2x80x2-hydroxyphenyl)-benzotriazole, 2-(3xe2x80x2-dodecyl-2xe2x80x2-hydroxy-5xe2x80x2-methylphenyl)-benzotriazole and 2-(3xe2x80x2-tert-butyl-2xe2x80x2-hydroxy-5xe2x80x2-(2-isooctyloxycarbonylethyl)-phenyl-benzotriazole, 2,2xe2x80x2-methylene-bis[4-(1,1,3,3-tetramethylbutyl)-6-benzotriazol-2-yl-phenol]; transesterification product of 2-[3xe2x80x2-tert-butyl-5xe2x80x2-(2-methoxycarbonylethyl)-2xe2x80x2-hydroxyphenyl]-benzotriazole with polyethylene glycol 300; [R-CH2CH2-COO(CH2)3]2- wherein R=3xe2x80x2-tert-butyl4xe2x80x2-hydroxy-5xe2x80x2-2H-benzotriazol-2-yl-phenyl.
2. 2-Hydroxybenzophenones, e.g. the 4-hydroxy, 4-methoxy, 4-octyloxy, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, 4,2xe2x80x2,4xe2x80x2-trihydroxy or 2xe2x80x2-hydroxy-4,4xe2x80x2-dimethoxy derivative.
3. Esters of Unsubstituted or Substituted Benzoic Acids, e.g. 4-tert-butyl-phenyl salicylate, phenyl salicylate, octylphenyl salicylate, dibenzoylresorcinol, bis(4-tert-butylbenzoyl)-resorcinol, benzoylresorcinol, 3,5-di-tert-butyl-4-hydroxybenzoic acid 2,4-di-tert-butylphenyl ester, 3,5-di-tert-butyl-4-hydroxybenzoic acid hexadecyl ester, 3,5-di-tert-butyl-4-hydroxy-benzoic acid octadecyl ester, 3,5-di-tert-butyl4-hydroxybenzoic acid 2-methyl-4,6-di-tert-butylphenyl ester.
4 Acrylates, e.g. xcex1-cyano-xcex2,xcex2-diphenylacrylic acid ethyl ester or isooctyl ester, xcex1-methoxy-carbonylcinnamic acid methyl ester, xcex1-cyano-xcex2-methyl-p-methoxycinnamic acid methyl ester or butyl ester, xcex1-methoxycarbonyl-p-methoxycinnamic acid methyl ester, N-(xcex2-methoxy-carbonyl-xcex2cyanovinyl)-2-methyl-indoline.
5. Sterically Hindered Amines, e.g. bis(2,2,6,6-tetramethylpiperidyl) sebacate, bis(2,2,6,6-tetramethylpiperidyl) succinate, bis(1,2,2,6,6-pentamethylpiperidyl) sebacate, n-butyl-3,5-di-tert-butyl-4-hydroxybenzylmalonic acid bis(1,2,2,6,6-pentamethylpiperidyl) ester, condensation product of 1-hydroxyethyl-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid, condensation product of N,Nxe2x80x2-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine and 4-tert-octylamino-2,6-dichloro-1,3,5-s-triazine, tris(2,2,6,6-tetramethyl-4-piperidyl) nitrilotriacetate, tetrakis(2,2,6,6-tetramethyl-4-piperidyl)-1,2,3,4-butanetetraoate, 1,1xe2x80x2-(1,2-ethane-diyl)bis(3,3,5,5-tetramethylpiperazinone), 4-benzoyl-2,2,6,6-tetramethylpiperidine, 4-stearyl-oxy-2,2,6,6-tetramethylpiperidine, bis(1,2,2,6,6-pentamethylpiperidyl)-2-n-butyl-2-(2-hydroxy-3,5-di-tert-butylbenzyl) malonate, 3-n-octyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro[4.5]decane-2,4-dione, bis(1-octyloxy-2,2,6,6-tetramethylpiperidyl) sebacate, bis(1-octyloxy-2,2,6,6-tetramethylpiperidyl) succinate, condensation product of N,Nxe2x80x2-bis(2,2,6,6-tetramethyl-4-piperidyl)-hexamethylenediamine and 4-morpholino-2,6-dichloro-1,3,5-triazine, condensation product of 2-chloro-4,6-di(4-n-butylamino-2,2,6,6-tetramethylpiperidyl)-1,3,5-triazine and 1,2-bis(3-aminopropylamino)ethane, condensation product of 2-chloro-4,6-di(4-n-butylamino-1,2,2,6,6-pentamethylpiperidyl)-1,3,5-triazine and 1,2-bis(3-aminopropylamino)ethane, 8-acetyl-3-dodecyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro[4.5]decane-2,4-dione, 3-dodecyl-1-(2,2,6,6-tetramethyl-4-piperidyl)pyrrolidine-2,5-dione, 3-dodecyl-1-(1,2,2,6,6-pentamethyl-4-piperidyl)pyrrolidine-2,5-dione.
6. Oxalic Acid Diamides, e.g. 4,4xe2x80x2-dioctyloxy oxanilide, 2,2xe2x80x2-diethoxy oxanilide, 2,2xe2x80x2-dioctyloxy-5,5xe2x80x2-di-tert-butyl oxanilide, 2,2xe2x80x2-didodecyloxy-5,5xe2x80x2-di-tert-butyl oxanilide, 2-ethoxy-2xe2x80x2-ethyl oxanilide, N,Nxe2x80x2-bis(3-dimethylaminopropyl) oxalamide, 2-ethoxy-5-tert-butyl-2xe2x80x2-ethyl oxanilide and a mixture thereof with 2-ethoxy-2xe2x80x2-ethyl-5,4xe2x80x2-di-tert-butyl oxanilide, mixtures of o- and p-methoxy- and also of o- and p-ethoxy-di-substituted oxanilides.
7.2-(2-Hydroxyphenyl)-1,3,5-triazines, e.g. 2,4,6-tris(2-hydroxy-4-octyloxyphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-octyloxyphenyl)4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2,4-dihydroxyphenyl)4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2,4-bis(2-hydroxy-4-propyloxyphenyl)-6-(2,4-dimethylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-octyloxyphenyl)4,6-bis(4-methylphenyl)-1,3,5-triazine, 2-(2-hydroxy-4-dodecyloxyphenyl)-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-[2-hydroxy-4-(2-hydroxy-3-butyloxypropyloxy)phenyl]4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-[2-hydroxy-4-(2-hydroxy-3-octyloxypropyloxy)phenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine, 2-[4-(dodecyloxy/tridecyloxy-2-hydroxypropyl)oxy-2-hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-triazine.
In addition to the light stabilisers mentioned above, other stabilisers, such as phosphites or phosphonites, are also suitable.
8. Phosphites and Phosphonites, e.g. triphenyl phosphite, diphenylalkyl phosphites, phenyldialkyl phosphites, tris(nonylphenyl)phosphite, trilauryl phosphite, trioctadecyl phosphite, distearyl-pentaerythritol diphosphite, tris(2,4-di-tert-butylphenyl)phosphite, diisodecylpenta-erythritol diphosphite, bis(2,4-di-tert-butylphenyl)pentaerythritol diphosphite, bis(2,6-di-tert-butyl-4-methylphenyl)pentaerythritol diphosphite, bis-isodecyloxy-pentaerythritol diphosphite, bis(2,4-di-tert-butyl-6-methylphenyl)pentaerythritol diphosphite, bis(2,4,6-tri-tert-butylphenyl)-pentaerythritol diphosphite, tristearyl sorbitol triphosphite, tetrakis(2,4-di-tert-butylphenyl)-4,4xe2x80x2-biphenylene diphosphonite, 6-isooctyloxy-2,4,8,10-tetra-tert-butyl-12H-dibenzo[d,g]-1,3,2-dioxaphosphocine, 6-fluoro-2,4,8,10-tetra-tert-butyl-12-methyl-dibenzo[d,g]-1,3,2-dioxaphosphocine, bis(2,4-di-tert-butyl-6-methylphenyl)methyl phosphite, bis(2,4-di-tert-butyl-6-methylphenyl)ethyl phosphite.
It is also possible to use additives customary in the art, e.g. antistatics, flow improvers and adhesion promoters.
Process step a) is preferably carried out with a low-temperature plasma discharge.
The process can be carried out within a wide pressure range; as pressure increases the discharge characteristics shift from pure low-temperature plasma towards corona discharge and ultimately at atmospheric pressure of about 1000-1100 mbar change into a pure corona discharge.
The process is preferably carried out at a process pressure of from 10xe2x88x926 mbar up to atmospheric pressure (1013 mbar), especially in the range from 10xe2x88x924 to 10xe2x88x922 mbar as a plasma process and at atmospheric pressure as a corona process.
The process is preferably carried out by using as plasma gas an inert gas or a mixture of an inert gas with a reactive gas.
It is especially preferable to use as plasma gases He, Ar, Kr, Xe, N2, O2 or H2O on their own or in the form of a mixture.
The temperature at which an electron- or H-donor, e.g. an amine, a thiol or a thioether or a mixture thereof, each containing at least one ethylenically unsaturated group, is vaporised in vacuo is preferably from 20xc2x0 C. to 250xc2x0 C., especially from 40xc2x0 C. to 150xc2x0 C.
The deposited layer of electron- or H-donor preferably has a thickness ranging from a monomolecular layer up to 100 nm, especially from 10 nm to 60 nm.
The plasma treatment of the inorganic or organic substrate a) is preferably carried out for from 1 s to 300 s, especially from 10 s to 200 s.
The deposition of the electron- or H-donor in Process step b) is carried out in vacuo preferably for from 1 s to 100 minutes.
When a corona discharge is carried out, a solution or melt of the electron- or H-donor is preferably applied by spraying immediately after the discharge zone. The corona discharge can also be carried out under a protective gas atmosphere.
When the substrate has been pretreated with a plasma or corona discharge or by irradiation with high-energy radiation, the further processing time depends upon the lifespan of the resulting free radicals on the surface. In principle, it is advantageous to apply the electron- or H-donor as quickly as possible, since at the beginning a high number of reactive free radicals are present on the surface for the grafting reaction. For many purposes, however, it can also be acceptable to carry out Reaction step b) after a time delay, but it is preferable to carry out Process step b) immediately after, or within 10 hours of, Process step a).
The invention relates also to the use of at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, in the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step
a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step
b) one or more electron-donors as coinitiators, containing at least one ethylenically unsaturated group, are applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radical sites formed there, and
c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionising radiation; or
c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and one or more thermally activatable initiators, and the coating is cured thermally.
The invention relates also to strongly adherent coatings, obtainable in accordance with the process described above.
Such strongly adherent coatings are important both as protective layers or coverings (it being possible for such coatings additionally to be pigmented) and as image-forming coatings, e.g. in resist technology.
The following Examples illustrate the invention.

Process for the production of strongly adherent surface-coatings by plasma-activated grafting


An infrared imaging system is described which includes a pyro-optic sensor for receiving a thermal image on one of its sides, the sensor exhibiting a substantial change in refractive index in responses to changes in its temperature. A light beam is projected onto a second side of the sensor, the beam being selectively, locally reflected by the sensor in accordance with local changes in its refractive index. A receiver detects the reflected beam and responds to the reflectance changes to derive a visible image of the thermal image.. The pyro-optic sensor comprises a sandwich structure which includes a film of energy absorbant material upon which the thermal image is received; a thin film of thermal-optic material; and a supporting layer which includes an optically transparent foam positioned next to the pyro-optic material on the side at which is directed an interrogating light beam.

There are many types of infrared thermal imaging systems in the prior art. The most widely used classes of infrared imagers employ photon detection and thermal detection. In the latter category, i.e. thermal detectors, the pyro-electric effect present in certain materials is employed as the primary detection means. While the pyro-electric capabilities of materials are often very good, and can achieve a noise equivalent temperature differences of less than 0.01 K, few detectors can approach that performance and still remain both commercially and practically usable. The main problems lie in electrical and thermal isolation of the sensor, electrical contacts to the readout, and the limiting of noise bandwidth which, together, all act to degrade the detector's response in an assembly or array of detectors.
As an example, many thermal detectors employ thin liquid crystals as the heat sensing medium. It is particularly difficult to temperature stabilize the liquid crystal media, as the electrical contacts thereto act as heat sinks and tend to dissipate the accumulated energy, thus decreasing the sensitivity of the system.
Others have attempted to avoid the heat dissipation problem by employing liquid crystal detection units in a light transmission arrangement. In specific, an infrared image is focussed on a liquid crystal detector which, in response to local temperature variations in the crystal medium, accordingly alters its local index of refraction. Subsequently, a polarized light beam is transmitted through the liquid crystal medium which interacts with the polarized light to locally alter the angle of polarization in accordance with the local changes in index of refraction. These changes are detected after the beam exits from the liquid crystal and enable the image to be reproduced. Transmission detection systems require reasonably thick liquid cells which exhibit both low thermal efficiency and significant crystalline noise. Such systems are described by B. F. Lamouroux et al. in "Signal-to-Noise Ratio Analysis of a Digital Polarimeter Application to Thermal Imaging", Review of Scientific Instruments, 54 (5), May 1983 pages 582-585; in "Infrared Video Camera at 10 Microns", Andre et al. Applied Optics Vol. 18, No. 15, Aug. 1979 pages 2607-2608, and in British published patent application GB 2 150 387 A, to Elliot et al. entitled "Thermal Imager".
In U.S. Pat. No. 4,160,907 to Bly, an infrared imager is described wherein a thin semiconducting film, such as vitreous selenium is employed as the infrared detector. This detector exhibits a temperature-dependent optical absorption spectrum which results in local areas on the detector varying in transmissivity in relation to radiation incident thereon. Detection of the infrared radiation is accomplished by transmitting light through the detector and sensing, on the other side thereof, local changes in the intensity of the transmitted light as an indication of the infrared image. This systems suffers a decrease in sensitivity due to the loss of brightness which occurs as the result of having to sense the light, after its passage through the absorption medium.
Accordingly, it is an object of this invention to provide a pyro-optic detector wherein the use of electrical contacts to the pyro-optic element are avoided.
It is another object of this invention to provide a pyro-optic detector wherein the detection element exhibits high thermal efficiency.
It is still another object of this invention to provide a pyro-optic detector which employs a detection material exhibiting a high temperature coefficient of refractive index.
Yet another object of this invention is to provide a pyro-optic detector which avoids losses inherent in transmission imaging systems.


The invention relates to a nondestructive ultrasonic test method in which at least one ultrasonic pulse is emitted into a workpiece under test by means of at least one ultrasonic transmitter (3), the ultrasonic pulse is reflected on boundary surfaces within the workpiece, the reflected ultrasound is received by at least one ultrasonic receiver (2), and the associated signals are evaluated, the ultrasound penetrating a damping block (4) that is arranged between the workpiece and the transmitter or receiver. Said method is characterized in that it includes at least one step for determining at least one dimension (alpha, d1, d2) of the damping block (4) that is relevant for the ultrasonic test; in said step, the propagation time of at least one ultrasonic pulse which is generated by the ultrasonic transmitter (3), is reflected on a boundary surface (5) of the damping block (4), and is received by the ultrasonic receiver (2) is measured, and at least one dimension (alpha, d1, d2) of the damping block (4) that is relevant for the ultrasonic test is determined from said measurement.

Like all testing methods, ultrasound inspection is also standardized and is carried out in accordance with guidelines, such as according to DIN EN 10228-3 1998-07 Zerstörungsfreie Prüfung von Schmiedestücken aus Stahl—Teil 3: Ultraschallprüfung von Schmiedestücken aus ferritischem and martensitischem Stahl (Non-destructive testing of steel forgings—Part 3: Ultrasonic testing of ferritic or martensitic steel forgings), which is hereby incorporated by reference. Suitable testing devices and methods are known for the non-destructive testing of a workpiece by means of ultrasound. General reference is made to the textbook by J. and. H. Krautkrämer, Werkstoffprüfung mit Ultraschall, ISBN-13: 978-3-540-15754-0, 5th edition (1986), Springer (Berlin).
These methods are generally based on the reflection of sound on boundary surfaces. The sound source most frequently used is an ultrasonic probe or probe whose radiation is in the frequency range of 10 kHz to 100 MHz. In the case of the pulse-echo method, the ultrasonic probe does not emit a continuous radiation, but very short sound pulses with a duration of 1 μs and less. The pulse emanating from the transmitter passes through the workpiece to be inspected with the respective speed of sound, and is almost completely reflected at the solid-air boundary surface. The sound probe is most frequently not only able to transmit pulses, but also to convert incoming pulses into electrical measuring signals; it thus also works as a receiver. The time required by the sound pulse to travel from the transmitter through the workpiece and back again is measured with an oscilloscope or a computer unit as an evaluation unit. Given a known speed of sound c in the material, the thickness of a workpiece, for example, can thus be checked. The core of such a probe is at least one ultrasonic transducer, e.g. in the form of a piezo-electric element. Furthermore, it is known, for example from WO 2007/144271, to use a phased array of several, separately controllable ultrasonic transducers that are in a fixed spatial relation for the generation and reception of the ultrasonic pulses.
The transducer(s) are most frequently coupled to the workpiece to be inspected with a matching layer—also referred to as leading body—disposed therebetween and having, for example, a wedge shape and most frequently made of a thermoplastic synthetic material such as poly(methyl methacrylate) (PMMA). A coupling surface is provided on the leading body via which the sound generated by the ultrasonic transducer(s) can be coupled into the workpiece to be inspected, with the wedge shape causing the sound to enter into the workpiece obliquely. The leading body and the piezo-electric element (s) are generally disposed in a housing which is closed on its one side and which, on its other side, has a coupling aperture through which the ultrasound emitted by the sound coupling surface can exit.
In order to couple the workpiece and the probe, i.e. the leading body, a couplant (e.g. a glue (solution), gel, water or oil) is applied onto the surface of the workpiece to be inspected. The surface to be tested is most frequently passed over with the probe. This can take place manually, mechanically or automatically (for example in production lines). In the latter case, the test piece is often immersed in a suitable liquid (immersion technique) or wetted in a defined manner for the purpose of transmitting the sound signal.
The knowledge of the dimensions of the leading body that are relevant for the ultrasound inspection is, for example, essential for exactly locating flaws of a workpiece and/or for determining the dimensions of the workpiece. Furthermore, the geometry of the leading body has a strong influence on ultrasound inspections using the so-called DGS method, in particular if the latter is carried out with a probe that permits an electronic adjustment of the insonification angle. In the case of a wedge-shaped leading body, the dimensions relevant for the ultrasound inspection are, for example, the wedge angle alpha and the distance d between the coupling surface (i.e. the boundary surface contiguous to the workpiece to be inspected) of the leading body and the center of the surface covered by the transducers on the opposite boundary surface of the leading body.
It is known to configure the connection between the ultrasonic transducers and the leading body so as to be detachable, in order to be able to vary the inspection conditions, such as, for example, the insonification angle, during the ultrasound inspection of the workpiece, in accordance with the workpiece geometry to be inspected and/or the desired inspection direction. Moreover, it is known to store the specific data of the leading wedge in a non-volatile memory connected to the leading wedge and the read them out during the ultrasound inspection and transmit them to the evaluation unit. This is known, for example, from DE 3327526 A1, but proves to require a lot of effort in practice because data communication between the leading body and the evaluation unit is required. Moreover, faulty mounting of the leading body on the ultrasonic transducer (e.g. twisted direction of mounting) also cannot be detected in this manner.
Moreover, it was found that the dimensions of the leading body changes due to wear, which can be ascribed, among other things, to the frequently used thermoplastic, and thus often very soft, synthetic materials and the usually manual displacement of the leading body over a surface of the workpiece to be inspected. Consequently, a check of the dimensions of the leading body that are relevant for the ultrasound inspection is required. Basically, checking the dimensions of the leading body is known from DE 3327526 A1. However, this is done by means of a back-face echo of a special calibration body that must be disposed adjacent to the coupling surface of the leading body. This is comparatively complex and the measurement is adversely affected with regard to its accuracy by the variation of the calibration body and the coupling between the calibration body and the leading body.
Furthermore, the determination of the thickness in a workpiece using the back-face echo of the workpiece is known from DE 3441894 A1.

Pulse-echo method for determining the damping block geometry


A processing method and apparatus for a virtual resource in a game scene are provided. The method includes: according to a current position of a virtual character in a game scene, determining a region where the virtual character is located, loading a corresponding virtual resource in the game scene according to the range of the region, and updating the state of the virtual resource in the game scene in a unit of the region, thereby effectively reducing the resource consumption and greatly reducing the pressure of data processing.

In the wave of the Internet, the continuous development and evolution of hardware and software technologies have promoted the emergence of smart devices and software. At the same time, a large number of games with different themes have emerged to meet the needs of users.
There are currently many different themes and play types in game applications running on terminals, and the combination of a variety of different game plays to improve the playability of games is currently the development direction of the field. For example, combining a shooting type game with a construction type game, combining a strategy game with a parkour game, and so on.
For a game type that combines a shoot type game with a build type game, complex gameplay is often not realized or greatly limited by terminals with limited computing capabilities, such as construction gameplay in the game. Since there are a large number of detachable and buildable models in the game scene, all the models will occupy a very large memory, and terminals with smaller memory cannot bear. Even with enough memory, so many trivial subdivision models may put a lot of pressure on the terminal in terms of data processing and graphics rendering.
It should be noted that the information disclosed in the Background section above is only used to enhance an understanding of the background of the present disclosure, and thus may include information that does not constitute the conventional art known to those of ordinary skill in the art.

Processing method and apparatus for virtual resource in game scene


A method of receiving a plurality of simultaneously transmitted data streams is disclosed. Each data stream is divided into portions and transmitted at predetermined frequencies and times according to a frequency-hopping pattern. The portions are received using a plurality of receivers. Each receiver is configured to receive portions transmitted on one of the predetermined frequencies. The received portions are temporarily stored in a memory such that the received portions are stored as a function of receiver and time. The stored portions are compared to the frequency-hopping pattern. It is determined if any combination of the stored portions corresponds to the predetermined frequencies and times of the frequency-hopping pattern.

Frequency-hopping communication systems, which transmit portions of messages or data streams across multiple frequencies in a spectrum according to a predetermined pattern, are widely used in situations where secure communications are vital. Unless one knows the precise sequence and frequencies used by the system, it is very difficult to intercept a data stream so transmitted. Furthermore, because multiple frequencies are used to transmit a single data stream, the act of jamming or spoofing a frequency-hopped message can be very difficult.
There has been some effort in increasing the efficiency of frequency-hopping networks by simultaneously transmitting multiple messages or data streams across a specific frequency spectrum. Each message is transmitted using a given sequence of frequency and timing. To minimize the probability that portions of two messages are transmitted on the same frequency at the same time, one or more of the messages may be slightly delayed, or a different frequency-hopping pattern may be used.
One challenge of such a frequency-hopping system is that of receiving and re-assembling multiple messages. Known systems employ a single receiver dedicated to receiving each message or data stream that is being received. Each dedicated receiver requires expensive synchronization to ensure it is accurately and rapidly jumping from frequency to frequency according to the predetermined frequency-hopping pattern. When multiple data streams are concurrently transmitted according to the frequency-hopping pattern, a corresponding number of dedicated receivers are required to receive each data stream. The additional cost and space requirements due to adding dedicated receivers may adversely affect product design.
For security reasons, the predetermined frequency-hopping pattern may be changed as often as 10 milliseconds. Data streams transmitted from long distances, according to one frequency-hopping pattern, may not be received until after a new frequency-hopping pattern is initiated. Increasing the range of a frequency-hopping communications system has required either (1) using additional dedicated receivers configured to sense previously-used frequency-hopping patterns, or (2) increasing the time between changes of frequency-hopping patterns.
It is therefore an object of the invention to provide a frequency-hopping communications system that can inexpensively and efficiently process multiple data streams or messages.
It is a further object of the invention to provide a frequency-hopping communications system that may be used over long distances.
It is a further object of the invention to provide such a long-range system that can be configured to rapidly change the predetermined frequency-hopping pattern.
A feature of the invention is the use of multiple non-frequency-hopping receivers, where each receiver is configured to receive portions of any message—from a plurality of messages or data streams—that are transmitted on a given frequency.
Another feature of the invention is the extraction, from a memory, of message portions belonging to a common message, by comparing the message portions with the known frequency-hopping pattern.
An advantage of the invention is the reception of multiple data streams or messages, even from long-range transmitters, using inexpensive receivers.

Architecture for receiving data from a multiplicity of frequency hopping emitters


Provided is a thin film magnetic head capable of appropriately control the flow of magnetic flux from a yoke layer to a pole layer so as to prevent information from being overwritten without intention during recording. A perpendicular recording system thin film magnetic head is formed so that a portion of a yoke layer and a portion of a pole layer are connected to each other in a connecting surface. When a large amount of the magnetic flux contained in the yoke layer flows into the pole layer through the connecting surface, the large amount of the magnetic flux is concentrated in the connecting surface, so an excessive amount of the magnetic flux is not supplied to a front end portion of the pole layer, and an appropriate amount of the magnetic flux is supplied. Therefore, by the function of concentrating the magnetic flux in the connecting surface, the flow of the magnetic flux from the yoke layer to the pole layer can be appropriately controlled, thereby information can be prevented from being overwritten without intention during recording.

1. Field of the Invention
The present invention relates to a thin film magnetic head comprising at least an inductive magnetic transducer for recording, and a method of manufacturing the same.
2. Description of the Related Art
In recent years, an improvement in performance of a thin film magnetic head has been sought in accordance with an increase in the areal density of a magnetic recording medium (hereinafter simply referred to as "recording medium") such as a hard disk or the like. As magnetic recording systems applicable to the thin film magnetic head, for example, a longitudinal recording system in which a signal magnetic field is oriented in an in-plane direction (a longitudinal direction) of a recoding medium and a perpendicular recording system in which the signal magnetic field is oriented in a direction perpendicular to a surface of the recording medium are well known. At present, the longitudinal recording system is widely used, but in consideration of market forces in accordance with an improvement in areal density, it is assumed that the perpendicular recording system instead of the longitudinal recording system holds promise for future, because the perpendicular recording system can obtain such an advantage that higher liner recording density can be achieved, and a recording medium in which data has been already recorded has resistance to thermal decay effects.
As recording modes using the perpendicular recording system, for example, (1) a mode using a head (ring type head) facing each other with a gap in between on an end side and being magnetically coupled to each other on the other end side and a recording medium having a single-layer structure as a main part, and (2) a mode using a head (single-pole type head) being disposed perpendicular to a recording medium and a recording medium having a two-layer structure as a main part have been proposed. In these modes, the mode using a combination of the single-pole type head and the recording medium having the two-layer structure becomes a focus of attention as a mode which can improve the performance of the thin film magnetic head, because the mode has remarkably superior resistance to thermal decay.
As the single-pole type thin film magnetic head using the perpendicular recording system, for example, a thin film magnetic head with a structure in which on a yoke layer disposed so that a thin film coil is covered with the yoke layer, a pole layer is disposed so as to be connected to the yoke layer is well known. The thin film coil generates magnetic flux for recording, and has a winding structure in which the thin film coil is wound around an end portion (back gap) of the yoke layer on a side farther from an air bearing surface. In the thin film magnetic head, when the magnetic flux is generated in the thin film coil, after the magnetic flux flows into the pole layer through the yoke layer, the magnetic flux is emitted from an end of the pole layer to outside. A magnetic field (perpendicular magnetic field) for recording is generated by the emitted magnetic flux, and a surface of the recording medium is selectively magnetized by the perpendicular magnetic field, so information is magnetically recorded on the recording medium.
In order to secure stable and high recording performance in the perpendicular recording system thin film magnetic head, for example, it is required to appropriately control the flow of magnetic flux from the yoke layer to the pole layer so as to prevent an excessive amount of the magnetic flux from being supplied to an end of the pole layer. It is because when the excessive amount of the magnetic flux is supplied to the end of the pole layer, thereby an unnecessary magnetic flux is emitted from a portion of the pole layer except for the end, that is, a portion around the end from which the magnetic flux should not be emitted to outside, due to a magnetic field (leakage magnetic flux) generated by the unnecessary magnetic flux, information which has been already recorded on the recording medium may be overwritten without intension.
However, in a conventional perpendicular recording system thin film magnetic head, when the flow of the magnetic flux from the yoke layer to the pole layer is not appropriately controlled, for example, depending upon conditions such as an amount of magnetic flux generated in the thin film coil, or the like, information may be overwritten without intention due to the leakage magnetic field. Such a problem exerts a large influence on reliability of the thin film magnetic head, so it is required to take immediate measures against the problem.
As in the case of the invention, some thin film magnetic heads have been already known as the thin film magnetic head for the purpose of securing stable and high recording performance.
More specifically, for example, as a thin film magnetic head capable of securing high frequency recording performance, a thin film magnetic head comprising a first magnetic member having a laminate structure in which a layer on a side closer to a write gap layer is made of a high saturation magnetic flux density material, a second magnetic member having a laminate structure in which a layer on a side closer to the write gap layer is made of a high saturation magnetic flux density material, and a third magnetic member constituting a magnetic circuit together with the first and the second magnetic members, and having a laminate structure in which an outer magnetic film is made of a high-permeability material, and an inner magnetic film is made of a high resistivity material is known (for example, refer to Japanese Unexamined Patent Application Publication No. 2001-297409). Moreover, as a thin film magnetic head capable of securing high frequency characteristics, a thin film magnetic head comprising a bottom core layer, a write gap layer, and a top core layer including a top first magnetic layer and a top second magnetic layer, and having a structure capable of processing the dimension of a track width with high precision and capable of reducing the generation of an eddy current by the shape of a connecting region between the top first and second magnetic layers is known (for example, refer to Japanese Unexamined Patent Application Publication No. 2002-8209). However, these thin film magnetic heads use the longitudinal recording system, and it is not certain whether the thin film magnetic heads can control the flow of magnetic flux in a top core layer so as to prevent information from being overwritten without intention.
Further, for example, as a perpendicular recording system thin film magnetic head capable of improving efficiency of passing magnetic flux from a yoke layer to a main pole layer, a thin film magnetic head having a structure in which a main pole layer is disposed on a inclined or curved front end surface of the yoke layer is known (for example, refer to Japanese Unexamined Patent Application Publication No. 2002-197611). In the thin film magnetic head, the main pole layer can be appropriately plated in a predetermined shape, and the efficiency of passing the magnetic flux from the yoke layer to the main pole layer can be improved. However, in the thin film magnetic head, by improving the efficiency of passing the magnetic flux from the yoke layer to the main pole layer, the flow of magnetic flux is controlled in order to reduce the leakage of the magnetic flux from the yoke layer to outside. Therefore, in the thin film magnetic head, the flow of the magnetic flux is not controlled in order to reduce the leakage of the magnetic flux from a portion around an end of the main pole layer to outside.
Moreover, for example, as a perpendicular recording system thin film magnetic head capable of improving signal quality of a reproducing waveform, a thin film magnetic head comprising a main pole, a coil for excitation and a return yoke of which a portion facing the main pole is cut away is known (for example, refer to Japanese Unexamined Patent Application Publication No. Hei 6-180810). However, it is not certain whether the thin film magnetic head can control the flow of the magnetic flux in the main pole so as to prevent information from being overwritten without intention.
For example, as a perpendicular recording system thin film magnetic head capable of appropriately guiding magnetic flux induced from a coil layer to an end surface of a main pole layer, a thin film magnetic head comprising an auxiliary pole layer, a main pole layer disposed on a flat insulating layer, and a yoke layer disposed on the main pole layer, and having a structure in which the width of a front end surface of the main pole layer gradually increases in a track width direction with distance from the auxiliary pole layer is known (for example, refer to Japanese Unexamined Patent Application Publication No. 2002-197615). However, it is not certain whether the thin film magnetic head can control the flow of the magnetic flux in the main pole layer so as to prevent information from being overwritten without intention.

Perpendicular magnetic recording head and method of manufacturing the same


An apparatus for at least one of providing a decorative shelf, decorative framing, decorative shelving, decorative paneling and a decorative member for supporting and hanging preselected articles. The apparatus comprises a panel member formed with a brick like design adjacent an outer surface thereof and having each of a first predetermined shape and a predetermined thickness and at least one of an opening, having a second predetermined shape, formed in the panel member to provide a frame like member for at least one of a mirror and a picture and a means formed in the brick like design for supporting at least one of a shelf and a bracket for supporting and hanging such preselected articles.

Paneling has been used for countless number of years for many reasons. It may be to improve the appearance of a room, to eliminate the need for painting or for other decorative ideas.
However, one problem that is frequently encountered with paneled areas is that generally there is a problem if a person wants to put up shelving on a paneled wall. Unfortunately too often it becomes very difficult to find shelving that matches the wall decor. Another problem is that the studs that must be found in order to mount the shelves are often not located where it is desirable to mount the shelves.
Also, decorative wall mounts which can easily be installed and in which attachments can be secured to the wall mount without tools are virtually impossible to find and thus would be a welcome addition for decorating a room.


A surgical device particularly directed toward the endoscopic repair of inguinal hemas is disclosed. The device includes of a specially adapted surgical mesh and a mechanical means for attaching the surgical mesh to the pubic bone. The surgical mesh is mechanically attached to the pubic bone by an orthopedic screw and the peripheral margins of the mesh either sutured or stapled to the appropriate anatomical structures. The screw is held by the distal end of an inner tube which is positioned inside an outer tube providing an annular space therebetween. The surgical mesh is wrapped around the distal end of the inner tube and the screw and is held in place in the annular space. An actuator tool is placed in the inner tube to provide torque to the screw.

A hernia is the formation of an opening in the abdominal wall typically accompanied with abdominal tissue and viscera which push through the opening in the abdominal wall. The abdominal wall has several relatively weak regions where hernias tend to occur with greatest frequency. These include: 1) the internal inguinal ring where an indirect hernia occurs, 2) Hesselbach's triangle where a direct hernia occurs, and 3) the femoral ring where a femoral hernia occurs. Each of these defects is considered an inguinal hernia.
A femoral hernia forms in the femoral ring in the iliopubic tract spanning the gap between the inguinal ligament and the pubic bone. This conforms to the space between the femoral vessels and the pubic bone beneath the inguinal ligament.
A direct hernia is the result of weakness of the transversalis fascia that forms the floor of the Hesselbach's triangle. The Hesselbach triangle is bordered by the conjoined tendon and edge of the rectus sheath medially, the inguinal ligament at the base, and the inferior epigastric artery laterally and superiorly. The functional lateral and superior border of the direct hernia is actually the edge of the transversus abdominis muscle.
An indirect inguinal hernia is situated adjacent the direct hernia; the two being separated by the inferior epigastric artery. Unlike the other two hernias, the indirect hernia is the result of a congenital flaw. A sac of peritoneum follows the testis in its descent through the inguinal ring and into the scrotum during development. Normally, the sac seals itself as it passes through the internal ring.
The treatment of an inguinal hernia frequently involves surgery in an effort to repair the defect. In most inguinal hernias, abdominal tissue has pushed through a defect in the abdominal wall. Normally, the abdominal tissue forms a sac lined by the peritoneum with viscera contained in the sac. Treatment requires that the contents of the sac be returned to their normal position in the abdomen and the defect in the abdominal wall surgically repaired by suturing the ruptured fascia at the site of the defect in an effort to close and restore the integrity of the abdominal wall.
Conventional procedures for hernia repair may provide only temporary relief. Typically, they involve stretching of the musculature and ligamentous tissue in order to close the defect. The tissues are sutured while in a stretched configuration which makes the abdominal wall further susceptible to a recurring hernia. Thus, surgical correction of a recurring hernia often results in further degeneration of the involved fascia, muscles, and ligaments.
In an effort to avoid recurring hernias and the resulting progressive deterioration, surgeons commonly use implantable mesh material to repair the defect. A sheet of surgical mesh material, usually polypropylene or Gore-rex.TM., is placed over the defect and sutured in place as determined by the surgeon. A single sheet of surgical mesh, generally 3.times.5 inches in size, may be used to cover all three inguinal defects. Although some hernias may be successfully treated in this manner, others result in failure and recurrence of the hernia.
Endoscopic surgery has been a major improvement in the field of orthopedics, gynecology and general surgery because surgical procedures can be performed in a less invasive manner than previously possible. The surgeon performing an endoscopic procedure will make two to three small incisions rather than one large incision. He then uses an endoscopic camera to view the interior anatomy of the patient. He directs surgical instruments through the incisions not occupied by the camera to the surgical site and performs the surgical procedure. The use of smaller incisions requires that less muscle tissue be cut than when a single large incision is required. Generally, endoscopic procedures significantly reduce the surgical trauma to the patient and consequently reduce the recovery time that the patient requires.
While endoscopic surgery has been quite successful in dealing with many problems, it has not been as successful in the treatment of inguinal hernias. Using the endoscopic pre-peritoneal approach, a single 3.times.5 inch sheet of mesh may be used to cover all three inguinal detects. A problem arising with the endoscopic or laparascopic approach has been the lack of a predictably effective method of attaching surgical mesh to the tissues proximate to the pubic bone, an area commonly the site of recurrent hernias. Generally, in open surgical procedures for inguinal hernias where surgical mesh has been used, the mesh has been sutured to Cooper's ligament which is attached to the pubic bone. Cooper's ligament is a very tough, fibrous ligament offering good retention of mesh properly sutured to it. Endoscopically, surgical mesh has generally been attached by use of endoscopic staples. Endoscopic staples, however, have not proven to be predictably effective to attach surgical mesh to Cooper's ligament, thereby resulting in recurrence of hernias in the area proximate the pubic bone.
To complete existing procedures using mesh for repairing inguinal hemas, the remaining margins of the surgical mesh have been generally attached to surrounding tissue by endoscopic stapling. This portion of the procedure in endoscopic hernia repair has not proven to be as great a problem because recurrence of a hernia predominately occurs in the region of the pubic bone.

Surgical mesh introduce with bone screw applicator for the repair of an inguinal hernia


A method, non-transitory computer readable medium, and apparatus for recommending a food item are disclosed. For example, the method receives one or more food item data communications over a short range communications protocol that are pushed to a mobile endpoint device, filters the one or more food item data communications in accordance with a food item filter pre-defined by a user to identify an acceptable food item to recommend to the user and recommends the acceptable food item to the user.

Consumers are becoming more conscious of the food items they consume. Consumers with specific disease states, nutritional objectives and/or goals encounter significant inconvenience and costs during shopping and/or dining.
Food items are typically packaged with a description of the ingredients and nutritional information in a nutritional label. However, the nutritional label may be small, obscure and difficult to read. As a result, it may be difficult for consumers to understand or decipher the information contained in the nutritional label.
For example, the nutritional label may contain ingredients that consumers are unfamiliar with, deceptive nutritional information based on serving sizes, and the like. Consequently, consumers may not know how a food item fits within their nutritional objectives or goals based on reading the nutritional information.

Method and apparatus for recommending a food item