An endoscope flexible tube comprises: a tubular structure having flexibility; and a shell layer on an outer peripheral surface of the tubular structure, wherein the shell layer has a two-layer structure including a rigid resin layer of a rigid resin and a soft resin layer of a soft resin, and wherein the two-layer structure is maintained over the entire flexible tube in its length direction.

1. Field of the Invention
The present invention relates to an endoscope flexible tube and its manufacturing method for manufacturing a flexible tube constituting an insertion portion of an endoscope.
2. Description of the Related Art
Endoscopes for medical treatment for observing the insides of patient's body cavities are known. These endoscopes include an insertion portion to be inserted into patient's body cavities, and an operation portion provided at a distal end of the insertion portion. Inside the insertion portion, a treatment tool insertion tube, a light guide which transmits illumination light, a signal cable, and a bending wire which bends the insertion portion, etc. are provided from the distal side to the proximal side.
It is general that the flexible tube which is a main part which constitutes the insertion portion of the endoscope is composed of a spiral tube formed by winding a metallic strip spirally, a tubular net body which covers this helical tube, and a shell layer made of a urethane resin, etc. which is laminated on the surface of the tubular net body. In this case, it is preferable that the pliability at the distal side be high in order to make the insertion portion easily inserted into body cavities, and the pliability at the proximal side of the aforementioned flexible tube be low in order to facilitate operation. Thus, when the flexible tube is manufactured, as described in JP-UM-55-112505, it is suggested that two kinds of rigid and soft resins are used to form a shell layer having a two-layer structure of a soft resin layer and a rigid resin layer such that the ratio of the soft resin is high at the distal side, and the ratio of the rigid resin is soft at the proximal side. Further, in an endoscope flexible tube described in JP-A-2007-159775, a shell layer is constituted by only a soft resin layer at the distal side of the endoscope flexible tube, and the shell layer is constituted by only a rigid resin layer on the proximal side thereof.
Further, in order to efficiently the step of molding the shell layer of such a flexible tube, the configuration of an endoscope flexible tube and a manufacturing method which continuously performs molding of the shell layer while a plurality of flexible tubes are conveyed in a state where they are connected integrally is described in Japanese Patent No. 3586928.
In a case where the shell layer of the flexible tube as described in JP-UM-A-55-112505, and JP-A-2007-159775 is continuously molded as described in Japanese Paten No. 3586928, the molding is performed while the soft resin and the rigid resin are supplied to molding dies, respectively, by an extruder. Therefore, in order to constitute the outer shell with only either the soft resin or the rigid resin layer and set the thickness of the other thereof to zero, it is necessary to stop discharge of the resins by the extruder or to provide bypass passages which makes resins flow out of the molding dies.
However, it is very difficult to adjust the discharge amounts of the resins to the molding dies to zero, and since there are portions (welds) in which the resins stagnate inside the molding dies even if the discharge amounts are set to zero, it is difficult to set the thicknesses of the resins to zero. Moreover, in a case where the discharge amounts are increased gradually after the discharge amounts are set to zero, the resins which have stagnated inside the molding dies are extruded and molded. Therefore, the molding thicknesses of the resins in the circumferential direction of the flexible tube do not become uniform, but nonuniformity will be caused.

Endoscope flexible tube and its manufacturing method


A process for preparing a concentrated photographic spectral sensitizing dye-water composition which comprises adding an anionic sensitizing dye to an aqueous medium in the substantial absence of organic solvent, and agitating the combined dye and aqueous medium, wherein the anionic dye forms a liquid-crystalline dye phase in the aqueous medium and the agitation is performed in the presence of a nonionic surfactant having an HLB of less than 12 and an aqueous solubility at 25xc2x0 C. of greater than 10 ppm, which nonionic surfactant is in the aqueous medium at a level of from 10 to 1000 ppm. In a specific embodiment of the invention, where the viscosity (at 0.1 sxe2x88x921 shear rate) of the dye-water composition in the absence of the nonionic surfactant would be greater than 100 cp and especially where such viscosity would be greater than 500 cp, the surfactant is preferably present at a level sufficient to substantially reduce air entrainment during agitation of the dye-water composition.

This invention relates to a process for preparing concentrated dye-water compositions for use in the spectral sensitization of photographic emulsions, wherein the compositions are formed at concentrations of anionic dyes sufficient to form a liquid crystalline dye phase in the absence of organic solvent and presence of an antifoamant nonionic surfactant.
Many dyes useful for spectrally sensitizing silver halide emulsions are known to be substantially insoluble in water for all practical purposes. Accordingly, such dyes, as well as other photographic additives which are capable of being adsorbed on the grain surfaces of silver salts, have been added to photographic silver halide emulsions in the form of solutions in suitable water miscible solvents such as methyl alcohol, dimethylformamide or the like. However, spectrally sensitizing dyes are difficult to dissolve in the usual solvents. Consequently, large quantities of solvent are often needed for satisfactory dissolution of such additives. This presents a significant problem since the presence of residual solvent generally causes diffusion and migration of spectrally sensitizing dyes in the emulsion. Further, even minute residues of solvent promote recrystallization processes in the photographic layer which, in turn, adversely affect not only the dyes and other additives introduced using solvent but other additives in the emulsion as well. Moreover, if residues of polar organic solvents miscible with water remain in a silver halide emulsion, particularly a silver-rich emulsion having a high silver packing density, the residual solvent considerably reduces the stability of the casting emulsion which in turn causes a reduced stability during processing including phase separation between hydrophilic and hydrophobic phases, agglomeration, and coalescence as well as flocculation before casting.
Additives which need not be held on the surface of silver halide crystals by adsorption after their introduction into a photographic emulsion have long been incorporated into silver halide emulsions in the form of dispersions. For that purpose, the additive is usually dissolved in a suitable solvent, which is generally immiscible with water, in the presence of an oil former and wetting agent, and then emulsified into an aqueous gelatin solution. The low boiling solvent generally used for this purpose is subsequently removed and the resulting dispersion is added to the photographic silver halide emulsion. Unfortunately, the complete removal of the solvent from the resulting dispersion is difficult to achieve, even when low boiling solvents are employed, and particularly when polar solvents are employed. Polar solvents, in particular polar protic solvents, can be removed from gelatin dispersions only by heating, a process which adversely effects the stability of the sensitizing dye molecule. Alternatively, the use of a vacuum to remove the solvent often causes considerable foaming.
One method for obviating the harmful effects of using water miscible or immiscible organic solvents to incorporate substantially insoluble additives into silver halide emulsions and dispersions as described in British Patent 1,570,362 is to sand mill such additives in water to a particle size of less than 1 micron in the presence of a surfactant which gives rise to a surface tension of not less than 38 dynes/cm in water when used in a quantity of 1 g/l. A similar process is disclosed in U.S. Pat. No. 4,006,025 which teaches milling or homogenizing at an elevated temperature in the presence of a relatively high level of surfactant in which the sensitizing dye is at least partially soluble. The process is complicated and the use of surfactant increases finish time.
U.S. Pat. No. 4,474,872 also describes a sensitizing dye dispersion process for substantially water insoluble dyes which requires mechanically milling to a fine grain size (1 micron or less), but teaches that the use of a surfactant can be eliminated if the dye is ground at elevated temperatures (60xc2x0-80xc2x0 C.), and processing conditions such as pH are strictly controlled. U.S. Pat. No. 4,683,193 similarly discloses forming dispersions of sensitizing dyes having water solubility of 0.01% by weight or less by mechanically dispersing the dyes generally at temperatures of from 40 to 80xc2x0 C., and in the absence of a dispersing agent at temperatures of from 60 to 80xc2x0 C. While the ability to form sensitizing dye dispersions in the absence of organic solvents and surfactants is desirable, the need for relatively high temperatures is potentially problematic as the dyes are subject to decomposition damage.
EP 0 640 225 describes a process of preparing concentrated dye-water compositions of spectral sensitizing dyes in the absence of organic solvent or surfactant at moderate temperatures of from 20-50xc2x0 C., wherein the spectral sensitizing dye is selected to be slightly water soluble (at least 0.005 wt %), and a dye-water composition containing dye at a concentration higher than the solubility limit of the dye is agitated for an extended time period of at least 30 minutes. JP Kokai 05-297496 similarly discloses a method of dispersing spectral sensitizing dyes which have limited levels of solubility in water (0.0002 to 0.04 mol/L) in the absence of organic solvents and surfactants, wherein the dyes are mechanically dispersed in the form of solid particles.
For most materials, it is generally accepted that only three states of matter exist; namely, solids, liquids and gases. However, some materials exhibit a fourth state of matter commonly referred to as a liquid crystal phase (or mesophase). Liquid crystal phases are neither crystalline solids nor isotropic liquids, but exhibit some of the characteristics of both. A liquid crystal phase can be described simply as being a liquid with a certain degree of molecular order. This molecular order gives rise to measurable anisotropy in the bulk properties of a material that is otherwise much like a liquid. Consequently, the physical properties of liquid crystalline materials are unique and distinct from those of solids and liquids. It has been found that many dyes may be advantageously dispersed directly in an aqueous medium at concentrations above their water solubility levels in the form of well-ordered liquid-crystalline phases (a lyotropic mesophase), such as dyes which form smectic liquid-crystalline phases (W. J. Harrison, D. L. Ma-teer and G. J. T. Tiddy, J. Phys. Chem. 1996, 100, pp 2310-2321). More specifically, many anionic sensitizing dyes will form liquid-crystalline J-aggregates in aqueous-based media (see The Theory of the Photographic Process, 4th edition, T. H. James, editor, Macmillan Publishing Co., New York, 1977, for a discussion of aggregation). Mesophase-forming dyes may be readily identified by someone skilled in the art using polarized-light optical microscopy as described by N. H. Hartshorne in The Microscopy of Liquid Crystals, Microscope Publications Ltd., London, 1974.
Because of the small size of the liquid crystalline domains in liquid crystalline dispersions or suspensions and the interactions between them, the viscosities of liquid crystalline anionic sensitizing dye dispersions are typically very high, particularly at low shear. However, because these structures are interacting, the dispersions also exhibit strong shear thinning behavior (i.e., their viscosity drops precipitously with increase in the shear rate). The manufacture of such dispersions thus requires high shear mixing of the aqueous phase to overcome the high viscosity of the final dispersions and to ensure that mixing occurs through the entire aqueous phase.
While the preparation of concentrated dye-water compositions comprising liquid crystalline dispersions in the absence of organic solvent and surfactants would be desirable, the preparation of such compositions has been found to be complicated by the problem of air entrainment. Air bubbles may be easily generated, e.g., by cavitation at the tip of impellers used to perform high shear agitation. Another source of air bubbles in the entrainment of air due to formation of a vortex. Since anionic dyes typically have a mild surface activity, they can stabilize entrained air bubbles, resulting in a stable foam. The presence of foaming can substantially reduce the capacity of manufacturing equipment, and also the effectiveness of the dispersion forming process. Additionally, the complete absence of surfactant and resulting high surface tension can lead to a problem of being unable to completely deliver the sensitizing dye composition from equipment used to prepare the dye composition.
In accordance with the invention, a process for preparing a concentrated photographic spectral sensitizing dye-water composition is described which comprises adding an anionic sensitizing dye to an aqueous medium in the substantial absence of organic solvent, and agitating the combined dye and aqueous medium, wherein the anionic dye forms a liquid-crystalline dye phase in the aqueous medium and the agitation is performed in the presence of a nonionic surfactant having an HLB of less than 12 and an aqueous solubility at 25xc2x0 C. of greater than 10 ppm, which nonionic surfactant is in the aqueous medium at a level of from 10 to 1000 ppm. In a specific embodiment of the invention, where the viscosity (at 0.1 sxe2x88x921 shear rate) of the dye-water composition in the absence of the nonionic surfactant would be greater than 100 cp and especially where such viscosity would be greater than 500 cp, the surfactant is preferably present at a level sufficient to substantially reduce air entrainment during agitation of the dye-water composition.
The process of the invention is simple, versatile and forgiving. It does not require the use of organic solvents, milling of the dye to very fine starting grain sizes, use of highly elevated temperatures, or pH control. The process of the invention employs anionic dyes at concentrations which are sufficient to form a liquid-crystalline dye phase, which concentrations will generally exceed that amount of dye which is soluble in the dispersion medium at the preparation, usage, or storage temperatures of the composition. Preferably, from 0.4 to 5 weight percent of dye based on the total weight of the mixture is employed. The addition of a nonionic surfactant as specified greatly reduces or eliminates foam formation caused by air entrainment during the agitation step. The surface tension reduction of the dye-water compositions also aids transfer of the composition from containers and helps flush the dye composition from holding vessels. The low levels of nonionic surfactant employed do not affect the quality of the photographic emulsion sensitization. The use of nonionic surfactant and resulting reduced or eliminated foam also allows for the preparation of higher concentration compositions (e.g., compositions comprising from 1.0 to 5, or even 2.0 to 5 wt % dye), with resulting benefits of increased productivity, reduced cost, and reduced water content in the resulting sensitized emulsions.
The process of the invention provides concentrated sensitizing dye-water compositions comprising liquid-crystalline dispersions or suspensions of anionic sensitizing dyes that are homogeneous, resistant to settling, solvent-free and contain only a low level of nonionic surfactant. If some settling does occur, slight agitation or mixing renders the composition homogeneous once again.
Generally, a solid powder of an anionic sensitizing dye is mixed into an xe2x80x9caqueous mediumxe2x80x9d, which term includes a polymer-containing aqueous medium (water-polymer medium, such as an aqueous gelatin solution), at a concentration of dye sufficient for the formation of a liquid-crystalline dye phase in the aqueous medium. Anionic dyes are in general slightly soluble in water, and the amount employed sufficient to form a liquid-crystalline phase thus must be greater than that which will simply dissolve in the medium at the temperature, pressure, or other conditions of processing, storage, or use of the composition. The dye-water composition is then agitated in the presence of a relatively small amount of nonionic surfactant which functions as an antifoamant. Dye amounts ranging from about 0.4 to about 5 weight percent based on the total weight of the components of the composition are preferred. Because the process is carried out in the absence of solvent and high levels of dispersant surfactants, it is simpler, faster, more forgiving, and more flexible than prior processes.
The process of the invention can be employed using any spectral sensitizing anionic dyes, particularly spectral sensitizing anionic cyanine dyes, which form a liquid-crystalline dye phase when dispersed in an aqueous medium. Preferred anionic sensitizing dyes for use in accordance with the invention include those of the formula
wherein Z1 and Z2 each independently represents the atoms necessary to complete a substituted or unsubstituted heterocyclic nucleus, each L independently represents a substituted or unsubstituted methine group, n is a positive integer of from 1 to 4, p and q each independently represents 0 or 1, A and Axe2x80x2 each independently represents an alkyl group substituted with an anionic acid solubilizing group, and X represents hydrogen or a cationic counterion to balance the charge of the molecule. The acid solubilizing group substituted alkyl substituents represented by A and Axe2x80x2 may be further substituted or unsubstituted. Examples of acid solubilizing group containing substituents represented by A and Axe2x80x2 include: carboxymethyl, carboxyethyl, carboxypropyl, phosphonopropyl, phosphonobutyl, sulfatoethyl, thiosulfatopropyl, and preferably sulfoalkyl groups such as sulfoethyl, sulfopropyl, 3-sulfobutyl, 4-sulfobutyl, 2-hydroxy-3-sulfopropyl, and sulfoethylcarbamoylmethyl. It is recognized that anionic dyes are usually isolated as salts of the acid substituents. Common counterions which may be represented by X are sodium, potassium, triethylammonium (TEA+), tetramethylguanidinium (TMG+), diisopropylammonium (DIPA+), and tetrabutylammonium (TBA+).
Even more preferred are dyes having the formula
wherein n is 0 or 1; X1 and X2 each independently represents oxygen or sulfur; Q1, Q2, Q3 and Q4 each independently represents hydrogen, halogen, alkyl, aryl, alkoxy, aryloxy or may contain the atoms necessary to form a beta or linear naphtho-fused ring; R1 and R2 each independently represent an alkyl group substituted with an anionic acid solubilizing group as described for A and Axe2x80x2 above, preferably sulfoalkyl or substituted sulfoalkyl groups; and X+ is H or a cationic counterion as described for X above.
Representative dyes which may be used in the practice of this invention include structures D-1 through D-52. While such representative dyes are depicted with specific cationic counterions or with no indicated counterion (i.e., in acid form), it will be apparent to the artisan that various counterions may readily be employed with each such dye in the practice of the invention.
Liquid-crystalline mesophase-forming anionic sensitizing dyes may be readily identified by someone skilled in the art using polarized-light optical microscopy as described by N. H. Hartshorne in The Microscopy of Liquid Crystals, Microscope Publications Ltd., London, 1974. In one embodiment, preferred anionic dyes when dispersed in the aqueous medium of choice (including water or aqueous gelatin) at optimum concentration and viewed in polarized light as thin films sandwiched between a glass microscope slide and cover slip display the birefringent textures, patterns and flow rheology characteristic of distinct and readily identifiable structural types of mesophase (e.g. smectic, nematic, hexagonal).
In a preferred embodiment of the invention, the anionic dye is selected from among those which when dispersed in the aqueous medium as a liquid-crystalline phase generally exhibit J-aggregation resulting in a unique bathochromically shifted spectral absorption band yielding high fluorescence intensity. Many anionic sensitizing dyes are known which will form J-aggregates in aqueous-based media (see The Theory of the Photographic Process, 4th edition, T. H. James, editor, Macmillan Publishing Co., New York, 1977, for a discussion of aggregation). In particularly preferred embodiments of the invention, the dye or dyes form a liquid-crystalline phase in aqueous medium at a concentration of from 0.4 to 5 weight percent. According to the invention, certain surfactants can be used as antifoaming agents, which surfactants do not detrimentally interact with the sensitizing dyes and which do not themselves foam at the low concentrations that are used. In order to work, these materials are required to displace and replace the sensitizing dyes from the surfaces of any air bubbles which are formed at fairly low concentrations. At the same time, these materials are sufficiently soluble or easily dispersed into fine particles ( less than 10 nm) so that they have a high shelf stability in the dye-water compositions.
The nonionic surfactants used as antifoaming agents in this invention have HLB numbers below 12. In essence, the HLB number of a surface active material is used to specify the nature of an oil/water dispersion that is formed in the presence of the surface active material. If the HLB is less than 7, the dispersed (the drop) phase will be water. If the HLB is above 12, the dispersed phase is oil. It can also be used to predict its ability to form a foam, where oil is replaced by air. In a congruent manner, if the surface active material has an HLB number of 12 or greater, the higher is its probability of stabilizing a foam. In the concentrated dye-water compositions of the invention, the antifoaming agent, which is a surface active material, is expected to completely displace and replace sensitizing dye at the surface of air bubbles. Additionally, the new adsorbed layer should not be a stabilizer for foams. Thus, the requirement that the antifoaming agent have a HLB number less than 12. On the other hand, if the HLB is too low, the solubility of the surface active material in the aqueous phase will be too low to provide an effective active concentration, in the aqueous phase, for the antifoaming agent to work. Also, if the solubility is low, the antifoaming agent will be dispersed as large drops, which can create problems in the shelf stability and functionality of the concentrate sensitizing dye-water compositions. Accordingly the nonionic surfactant employed in accordance with the invention is also selected to have an aqueous solubility at 25xc2x0 C. of greater than 10 ppm. In preferred embodiments of the invention, the antifoaming agent is selected to have an HLB number of at least 2 (i.e., of from 2 to 12).
The HLB of surface active materials can be measured or calculated. There are several methods of measuring HLB. These methods are listed in xe2x80x9cNonionic Surfactantsxe2x80x9d, Ed. M. Schick, xe2x80x9cSurfactant Science Seriesxe2x80x9d, Vol. 1, Marcel Deker Inc., New York, 1967. A technique using gas chromatography is commonly used, where the surface active material is deposited on an acid washed chromatographic resinxe2x80x94Chromosorb(copyright) P resin from an acetone solution. A column, 3 ft long and xc2xc inch in diameter is prepared. With the column maintained at 80xc2x0 C., a 3.0 xcexcl sample of a standard 1:1 ethanol/hexane solution is injected into the instrument. The retention times of each peak are measured and the ratio P of the retention time of ethanol to hexane is calculated. P is directly related to the HLB value of the surface active material as reported by Becher and Birkmeier, J. American Oil Chemists"" Soc., Vol. 41, p 8, 1964. The HLB number is usually reported by surfactant manufacturers, or else, it can be approximately calculated by the preferred method described in the above reference.
There are several kinds of nonionic surfactants that meet the requirements for the antifoaming agent of the present invention. These include ethoxylated alcohols having the generic formula Rxe2x80x94O(CH2CH2O)nH where R can be alkyl, aryl or aralkyl with 2-30 carbon atoms and n can vary from 2 to 20. The HLB of the ethoxylated alcohols is related to ratio of the number of ethylene oxide groups to the number of carbon atoms in the R group. The HLB number of ethoxylated alcohols can be calculated by the formula E/5, where E is the wt % of ethylene oxide in the molecule (ref.: xe2x80x9cNonionic Surfactantsxe2x80x9d, Surfactant Science Series, Vol. 23, Martin Schick, Ed., Marcel Dekker, NY, 1987). Commercially available examples of such materials include Brij93(trademark) (ethoxylated (2) ether of oleyl alcohol) made by ICI Corp. A subset of this class of materials are fluorinated surfactants or ethoxylated fluorocarbons, where all or some of the hydrogen atoms in the R group are substituted by fluorine atoms. Commercially available examples of such materials include FC171(trademark) made by 3M Corp.
Another class of nonionic surfactant materials are block copolymers of ethylene oxide and propylene oxide, where the ratio of the propylene oxide to the ethylene oxide amounts is directly related to the HLB of the surfactant. Examples of these are BASF Pluronics(trademark) (poloxamers) which are triblock copolymers and Tetronics(trademark) (poloxamines), which are tetrafunctional block copolymers derived from the sequential addition of propylene oxide and ethylene oxide to ethylenediamine.
Another class of nonionic surfactant materials are sugar surfactants based on hydrophobically modified derivatives of mono and disacchamides, including sorbitol esters such as SPANS(trademark), alkyl glucosides such as Glucate DO(trademark) (a dioelate ester of methyl glucoside) and hydrophobic sucrose esters such as sucrose distearate. The degree of modification, i.e., number and length of the hydrophobic segments, determines the HLB.
Another class of nonionic surfactant materials are polyalkylene-modified poly(dimethylsiloxanes), or alkoxylated PDMS materials, including those containing ethylene oxide as well as ethylene oxide and propylene oxide and having HLB values in the range defined by this invention. These surfactants have a polydimethylsiloxane backbone with a graft of mixed chains of polypropylene oxide and polyethylene oxide attached via a linking group. The HLB value of the surfactant is varied by adjusting the ratio of the number of ethylene oxide groups to the propylene oxide and dimethylsiloxane groups. Examples of these include Silwet(trademark) surfactants, such as Silwet L-7602.
The antifoaming agents used in the present invention are typically used in relatively small amounts. Based on their medium HLB values, these surfactants have limited solubility in aqueous solutions. In addition, since most of them have an ethylene oxide block as the hydrophilic entity, these surfactants have a cloud point, which is the highest temperature at which the surfactant is soluble in water. Above this temperature, the ethylene oxide groups lose their water of hydration and therefore make the surfactant insoluble. Therefore, it is important that these surfactants be used at levels below their solubility limit at the operating temperature. In general, the amount required is that which can completely displace the sensitizing dye from the surface of any air bubbles. Due to their high surface activity compared to the lower surface activity of the sensitizing dyes, levels between 10 and 1000 parts per million, and preferably less than about 500 parts per million, are sufficient to accomplish defoaming. More preferably, the amount used is between 10 and 200 ppm.
The dye compositions of the invention can also contain a polymeric binder or protective colloid which can be used in the photographic emulsion layers or intermediate layers of a photographic light-sensitive material. Gelatin is advantageously used although other hydrophilic colloids can be used alone or together with gelatin. Either lime processed or acid processed, deionized gelatin can be used.
Preferably, the medium to which the dye and nonionic surfactant are added is heated to a preparation temperature ranging from about 20xc2x0 to about 50xc2x0 C. and maintained at that temperature throughout dye addition and mixing, as higher temperatures are generally not necessary. When gelatin is employed, it is preferred that a temperature greater than about 40xc2x0 C. is used although lower temperatures can be used with other polymers. Where it is desired to include gelatin into the concentrated dye-water compositions, it is preferred to first mix gelatin with water and then heating to prepare an initial gelatin solution. The gelatin solution may then be heated and stirred or mixed or otherwise agitated while an anionic sensitizing dye in accordance with the invention is introduced, preferably in the form of a powder slowly and uniformly over the surface of the mixture being stirred. The process is also flexible in that one temperature can be used during addition while a different temperature is used during mixing.
Mixing or agitation is continued after the addition of the dye to the aqueous medium is complete and until little evidence of the particles of the original dye powder can be observed. This generally requires from about 5 minutes to typically less than 1 hour. The presence of surfactant in accordance with the invention generally results in shorter mixing times being required for complete conversion of the dye into a dispersed liquid crystalline phase, and in most instances advantageously enables mixing times of less than 30 minutes to generally be sufficient. The composition can be mixed or agitated by any suitable means using any suitable device including magnetically driven stirring bars of various shapes and motor driven shaft stirrers of the propeller or Cowles type. The following formula provided by J. Y. Oldshue in xe2x80x9cFluid Mixing Technologyxe2x80x9d, McGraw-Hill, New York, 1983, p. 83, can be used to calculate the preferred amount of agitation to be used:
p/kg=(Diameter)5xc3x97(RPM)3/Batch size
in which Diameter=diameter of Cowles or other blade in inches and Batch size=kg. Best results in terms of complete conversion of the dye into a dispersed liquid crystalline phase can be obtained when p/kg greater than 50xc3x97109.
The solvent-free dye-water compositions prepared by the process of the invention and containing from about 0.4 to about 5 weight percent of anionic dyes in the form of a dispersed liquid crystalline phase are resistant to settling. Similar compositions prepared by prior methods or containing other forms of dyes require either a solvent or significantly higher levels of dispersants to provide similar results or else comprise complicated and difficult preparatory methods.
Sensitizing dye-water compositions obtained in accordance with the invention may be used to spectrally sensitize any suitable silver halide for use in a photographic emulsion layer of a photographic light-sensitive silver halide material. The manufacturing process of silver halide elements usually comprises an emulsion making step, a chemical and optical sensitization step, and a coating step. The silver halide emulsion making step generally comprises a nucleation step, in which silver halide grain seeds are formed, followed by one or more growing steps, in which the grain seeds achieve their final dimension, and a washing step, in which all soluble salts are removed from the final emulsion. A ripening step is usually performed between the nucleation and growing step and/or between the growing and the washing steps.
Silver halide emulsions can be prepared using a single-jet method, a double-jet method, or a combination of these methods and can be ripened using, for instance, an ammonia method, a neutralization method, or an acid method. Features which may be adjusted to control grain growth include pH, pAg, temperature, shape and size of reaction vessel, and the reaction method (e.g., accelerated or constant flow rate precipitation, interrupted precipitation, ultrafiltration during precipitation, reverse mixing process and combinations thereof). A silver halide solvent, such as ammonia, thioethers, thioureas, etc., may be used, if desired, for controlling grain size, form of the grains, particle size distribution of the grains, and the grain-growth rate.
Commonly employed halogen compositions of silver halide grains can be used in the preparation of silver halide emulsions spectrally sensitized with liquid crystalline dye dispersions prepared in accordance with the invention. Suitable silver halides include silver bromide, silver iodobromide, silver chlorobromide, silver iodochlorobromide, silver chloroiodobromide, silver chloride, silver bromochloride, silver iodochloride, silver iodobromochloride, silver bromoiodochloride and the like. The grains of these silver halide emulsions may be coarse or fine, and the grain size distribution may be narrow or broad. In addition, the silver halide grains may be regular grains having a regular crystal structure such as cube, octahedron, and tetradecahedron, or the spherical or irregular crystal structure, or those having crystal defects such as twin planes, or those having a tabular form, or combination thereof. The halogen composition of individual grains may be homogeneous or heterogeneous. Furthermore, the grain structure of the silver halides may be uniform from the interior to exterior thereof, or be multilayer. According to a simple embodiment, the grains may comprise a core and a shell, which may have different halide compositions and/or may have undergone different modifications such as the addition of doping agents. Liquid crystalline dye dispersions prepared in accordance with the invention, e.g., may be used to sensitize silver halide grains having either a higher or a lower surface iodide concentration relative to the average overall grain iodide concentration. Besides having a differently composed core and shell, the silver halide grains may also comprise different phases in-between. Furthermore, the silver halides may be of such a type as allows a latent image to be formed mainly on the surface thereof or such a type as allows it to be formed inside the grains.
Tabular grain silver halide emulsions may preferably be sensitized with a liquid crystalline dye dispersions prepared in accordance with the invention. Tabular silver halide grains are typically regarded as grains having a diameter:thickness ratio (often referred to in the art as aspect ratio) of at least 2, and tabular grain silver halide emulsions are often characterized by their average aspect ratio. The present invention is especially useful for sensitizing both high aspect ratio tabular grain silver halide emulsions (those having an aspect ratio of at least 8:1), as well as lower aspect ratio tabular grain emulsions (e.g., those having an aspect ratio of 2:1 to 8:1). Typical average diameters of tabular silver halide grains range from about 0.3 to about 5 xcexcm, although larger and smaller tabular grains are possible. Tabular silver halide grains preferably have a thickness of less than 0.4 xcexcm, more preferably less than 0.3 xcexcm, and in many instances less than 0.2 xcexcm. The projected area of the tabular grain silver halide grains of a tabular grain emulsion preferably accounts for at least 50%, more preferably at least 80% and typically most preferably at least 90% of the projected area of all the silver halide grains of the emulsion. Silver bromide and silver bromoiodide are preferred silver halide compositions for tabular silver halide grains for use in many photographic elements, with silver bromoiodide compositions containing from 0 to 10 mol % silver iodide, preferably from 0.2 to 5 mol % silver iodide, and more preferably from 0.5 to 1.5% mol silver iodide. Such tabular grains may preferably have a higher surface iodide concentration relative to the average overall grain iodide concentration. The tabular grain silver halide grain dimensions and characteristics described above can be readily ascertained by procedures well known to those skilled in the art. The term xe2x80x9cdiameterxe2x80x9d is defined as the diameter of a circle having an area equal to the projected area of the grain. The term xe2x80x9cthicknessxe2x80x9d means the distance between two substantially parallel main planes constituting the tabular grain silver halide grains. Silver halide emulsions containing tabular silver halide grains can be prepared by various processes known for the preparation of photographic elements.
Silver halide emulsions are usually chemically sensitized, for example by sulfur sensitization using active gelatin or compounds such as thiosulfates, thioureas, mercapto compounds and rhodanines containing sulfur capable of reacting with silver; a reduction sensitization process using reducing substances such as stannous salts, amines, hydrazine derivatives, formamidinesulfinic acid, silane compounds and the like; a noble metal sensitization process using noble metal compounds such as complex salts of the Group VIII metals of the Periodic Table including platinum, iridium, palladium and the like as well as gold complex salts; alone or in combination with each other.
Spectral sensitization can be performed at any stage of silver halide preparation. It can be performed subsequent to the completion of chemical sensitization or concurrently with chemical sensitization, or can precede chemical sensitization, or even can commence prior to the completion of silver halide precipitation. The amount of sensitizing dye that is useful is typically in the range of from 0.001 to 10 millimoles per mole of silver halide, more typically from 0.1 to 4.0 millimoles per mole of silver halide. Optimum dye concentrations will depend upon the particular dye and silver halide grains employed, and can be determined by methods known in the art.
The photographic emulsion can include various compounds for preventing fog formation or stabilizing photographic characteristics during production, storage, or processing. For example, antifoggants or stabilizers include azoles such as benzothiazolium salts, nitroimidazoles, nitrobenzimidazoles, chlorobenzimid-azoles, bromobenzimidazoles, mercapto-thiazoles, mercaptobenzothiazoles, mercaptobenzimidazoles, mercaptothiadiazoles, aminotriazoles, benzotriazoles, nitrobenzotriazoles, mercaptotetrazoles particularly 1-phenyl-5-mercaptotetrazole; mercaptopyrimidines, mercapto-triazines, thioketo compounds such as oxazolinethione, azaindenes such as triazanidenes, tetraazaindenes particularly 4-hydroxy substituted 1,3,3a,7 tetraazaindenes, pentaazaindenes, benzenethiosulfonic acids, benzenesulfinic acids, benzenesulfonic amides and the like.
Various surface active agents can be incorporated into the photographic emulsion or other hydrophilic colloid layers of the photographic light-sensitive materials sensitized in accordance with the invention as coating aids, to prevent charging, improve slip properties, accelerate emulsification and dispersion, prevent adhesion, improve photographic characteristics such a accelerating development, high contrast, sensitization, and the like.
The photographic emulsion layer can also contain compounds such as polyalkylene oxide or its ether, ester, amine or the like derivatives, thioether compounds, thiomorpholines, quaternary ammonium salt compounds, urethane derivatives, urea derivatives, imidazole derivatives, and 3-pyrazolidones to increase sensitivity or contrast or accelerate development.
Water insoluble or only sparingly soluble synthetic polymer dispersions can be incorporated into the photographic emulsion layer or other hydrophilic colloid layer to improve dimensional stability and the like. Some synthetic polymers which can be used include homo or copolymers of alkyl acrylate or methacrylate, alkoxyalkyl acrylate or methacrylate, glycidyl acrylate or methacrylate, acrylamide or methacrylamide, vinyl esters such as vinyl acetate, acrylonitrile, olefins, styrene and the like and copolymers thereof with acrylic acid, methacrylic acid, alpha, beta-unsaturated dicarboxylic acid, hydroxyalkyl acrylate or methacrylate, sulfoalkyl acrylate or methacrylate, styrenesulfonic acid and the like.
In addition to the concentrated dye-water composition of the invention for spectrally sensitizing photographic emulsions prior to coating on a support, other sensitizing dyes can be used which do not in themselves give rise to spectral sensitization but provide a supersensitizing effect such as, for example, aminostyryl compounds substituted with a nitrogen-containing heterocyclic group including those described in U.S. Pat. Nos. 2,933,390 and 3,635,721 which are hereby incorporated herein by reference, aromatic organic acid-formaldehyde condensates such as those described in U.S. Pat. No. 3,743,510 which is hereby incorporated herein by reference, cadmium salts, azaindene compounds and the like. It is also contemplated to use anionic dye dispersion compositions prepared in accordance with the invention in a layered sensitization dye combination, or a combination of two or more spectral sensitizing dyes wherein at least one of the dyes contains an anionic substituent and at least one of the dyes contains a cationic substituent, as described in U.S. Pat. Nos. 6,143,486, 6,165,703, 6,312,883 and 6,331,385, the disclosures of which are incorporated by reference herein. It is further contemplated that two or more anionic sensitizing dyes may be dispersed individually in accordance with the invention and added individually to a silver halide emulsion to be spectrally sensitized, or a combination of two or more such dyes may be co-dispersed prior to addition to a silver halide emulsion as taught in U.S. Pat. No. 5,965,345, the disclosure of which is incorporated by reference.
The photographic material can contain inorganic or organic hardeners in the emulsion layer or other hydrophilic colloid layer thereof. For example, chromium salts such as chromium alum, chromium acetate and the like; aldehydes such as formaldehyde, glyoxal, glutaraldehyde and the like; N-methylol compounds such as dimethylolurea, methyloldimethyl-hydantoin and the like; dioxane derivatives such as 2,3-dihydroxydioxane and the like; active vinyl compounds such as 1,3,5-triacryloylhexahydro-s-triazine and the like; mucohalogenic acids such as mucochloric acid, mucophenoxy-chloric acid and the like can be used, either alone or in combination.
When dyes, ultraviolet light absorbing agents, and the like are incorporated in the hydrophilic colloid layers of a photographic light-sensitive material, they may be mordanted with cationic polymers and the like. The photographic light-sensitive material can also contain hydroquinone derivatives, aminophenol derivatives, gallic acid derivatives, ascorbic acid derivatives and the like as color fog preventing agents.
Dyes which can be incorporated into the hydrophilic colloid layers of a photographic light sensitive material include benzotriazole compounds substituted with aryl groups, and 4-thiazolidone, benzophenone, cinnamic acid ester, butadiene, benzoxazole and the like compounds. Ultraviolet light absorbing couplers such as alpha naphthol type cyan dye forming couplers and ultraviolet light absorbing polymers can also be used. Such ultraviolet light absorbing agents can also be mordanted in a specific layer, if desired.
Photographic light sensitive elements prepared using silver halide emulsions spectrally sensitized in with a dye-water composition of the invention may contain water soluble dyes in the hydrophilic colloid layers as a filter dye or for other purposes such as irradiation prevention and the like. Some such suitable dyes include oxonol, hemioxonol, styryl, merocyanine, cyanine, azo and the like dyes. Oxonol, hemioxonal, and merocyanine dyes are particularly useful.
Any suitable color fading prevention agents can also be used as well as color image stabilizers, either alone or in combination with each other. Some suitable color fading prevention agents include hydroquinone derivatives, gallic acid derivatives, p-oxyphenol derivatives, bisphenols, and the like.
Silver halide photographic emulsions sensitized with dye water compositions in accordance with the invention can also contain various other additives used for photography including any suitable hardeners, surfactants, fluorescent whiteners, physical property modifiers such as humectants, water dispersants and the like; condensates of phenols and formalin and the like.
Silver halide emulsions sensitized in accordance with the invention can be coated on any suitable support and dried to prepare a light sensitive silver halide photographic element. Some suitable supports include paper, glass, cellulose acetate, cellulose nitrate, polyester such as polyethylene terephthalate, polyethylene, polypropylene and other well known supports, polyamide, polystyrene and the like or laminated products of two or more substrates such as laminated products of paper and a polyolefin such as polyethylene, polypropylene and the like. The support may be subjected to various surface modification treatments for improving adhesion to the silver halide emulsion such as subbing, electron impact treatment and the like.
Coating and drying of the silver halide photographic emulsion on the support may be carried out conventionally by dip coating, roller coating, multislide hopper coating, curtain flow coating and the like followed by drying. The invention is applicable to sensitization of emulsions for use in light-sensitive photographic color elements such as color negative films, color reversal films, color papers, etc., as well as black-and-white light-sensitive photographic elements such as X-ray light-sensitive elements, lithographic light-sensitive elements, black-and-white photographic printing papers, black-and-white negative films, etc.
Multilayer multicolor photographic materials typically contain layers sensitive to at least two different spectral wavelength ranges on a support. By combining various photographic silver halide emulsion layers sensitized to different wavelengths, intermediate layers, protective layers, filter layers, antihalation layers, backing layers and others, a light sensitive color photographic element can be formed. In such a case, each light sensitive emulsion layer can comprise two emulsion layers with different sensitivities. A multilayer natural color photographic material generally possesses at least one red-sensitive silver halide emulsion layer, at least one green-sensitive silver halide emulsion layer, and at least one blue-sensitive silver halide emulsion layer on a support. The order of the layers can be varied as desired. Ordinarily, a cyan forming coupler is present in the red-sensitive emulsion layer, a magenta forming coupler is present in the green-sensitive emulsion layer, and a yellow forming coupler is present in the blue-sensitive emulsion layer, respectively. Different combinations can be employed as desired.
Any suitable dye-forming couplers, that is, compounds capable of forming color upon oxidative coupling with aromatic primary amine developing agents such as phenylene-diamine derivatives, aminophenol derivatives and the like during color development processing, can be incorporated into the same or different photographic silver halide emulsion layer as desired. Examples of some such couplers include magenta couplers such as 5-pyrazolone coupler, cyanoacetylcoumarone couplers and open chain acylaceto-nitrile couplers, and the like; yellow couplers such as acylacetamide couplers including benzoylacetanilides, pivaloylacetanilides and the like; cyan couplers such as naphthol couplers and phenol couplers and the like. Preferably, nondiffusible couplers containing a hydrophobic group or ballast group within the molecule or polymeric coupler is used. They may be either 4-equivalent or 2-equivalent with respect to silver ions. Colored couplers capable of exerting color correction effects or couplers capable of releasing development inhibitors during the course of development or DIR couplers, can also be used. Two or more couplers can be employed.
The concentrated dye-water sensitizing compositions of the invention are particularly useful in sensitizing silver halide emulsions for use in radiographic films, particularly for tabular grain emulsions employed in such elements, coated on at least one surface, and more preferably on both surfaces of a polyethylene terephthalate support. Usually, radiographic film elements are associated with intensifying screens so as to be exposed to radiation emitted by the screens. The screens are made of relatively thick phosphor layers which transform X-rays into light radiation (e.g., visible light). The screens absorb a portion of X-rays much larger than the light-sensitive element and are used to reduce the X-ray dose necessary to obtain a useful image. According to their chemical composition, the phosphors can emit radiation in the blue, green or red region of the visible spectrum and the silver halide emulsions are sensitized to the wavelength region of the light emitted by the screens.
The exposed light-sensitive elements can be processed by any of the conventional processing techniques. The processing can be a black-and-white photographic processing for forming a silver image or a color photographic processing for forming a dye image depending upon the purpose, as is well known in the art.

Process for the preparation of concentrated dye-water compositions


A networked system shares operational information (tasks, positions, times, etc.) between dissimilar operators performing dissimilar operations in a same marine field. The shared information include associations (linkages and conflicts) that allows each operator to optimize its operations and complete tasks in a more efficient manner. As part of this system, a planning tool having a graphical user interface can be used to visualize plans at an operator (and nearby operators). Changes made to plans by one operator are shared with other operators via the system and illustrated in the interface at the other operators, thereby allowing the other operators to make their own respective operational changes in response.

Situational awareness can be a significant requirement in the management of operations, such as aviation, air traffic control, ship navigation, power plant operations, military command and control, emergency services such as firefighting and policing, self-driving automobiles and bicycles, and the like. Situational awareness is generally defined as the perception of environmental elements with respect to time and/or space, the comprehension of their meaning, and the projection of their status after some variable has changed, such as time, or some other variable, such as a predetermined event. It is also a field of study concerned with perception of the environment critical to decision-makers in complex, dynamic areas such as the ones listed above.
Situational awareness involves being aware of what is happening in the vicinity, in order to understand how information, events, and one's own actions will impact goals and objectives, both immediately and in the near future. One with an adept sense of situation awareness generally has a high degree of knowledge with respect to inputs and outputs of a system, i.e. an innate "feel" for situations, people, and events that play out due to variables the subject can control. Lacking or inadequate situational awareness has been identified as one of the primary factors in accidents attributed to human error. Thus, situational awareness is especially important in work domains where the information flow can be quite high and poor decisions may lead to serious consequences.
In truth, only limited situational awareness is available through scheduling tools or Gantt charts, communications, and collaboration among people assigned tasks related to a project. In fact, there is generally no common view or picture of the situation in the field; spatial awareness is also limited or non-existent. Additionally, efficiency is purposefully sacrificed so operations can avoid issues.
An oil and gas marine field may have several operators (installations, structures, vessels, resources, entities, etc.) that may be operating in the area either together or merely at the same time. For example, the marine field may have one or more platform complexes, floating storage units (FSOs), platform supply vessels, support vessels for the FSOs, inter-field vessels (used for basket transfer and ad hoc requirements), accommodation vessels, drilling rigs in field, barges, helicopter flights, well service vessels, multipurpose vessels for ROV and diving, seismic vessel, etc. The logistics involved in the operations, timing, and interaction of these various entities can be very complex and congested, especially in light of the necessary considerations of health, safety, and environment.
The logistics involved in the operations, timing, and interaction of these various operators can be further complication by the expansion of oil and gas production operations in new regions, such as the Arctic. This increasing activity makes it more likely that fixed or floating production platforms, drill ships, other structures, support vessels, survey vessels, etc. will be used in these regions to perform various types of marine operations.
A concern for marine operations in such regions is potential for damage caused by objects that are uncontrolled and floating or submerged in the water, such as flotsam, jetsam, debris, icebergs, ice floes, and other threats ("marine obstacles"). In icy regions, for example, large icebergs and strong ice floes can pass through survey, production, and drilling areas. Weather conditions may also pose threats to operators and their operations. Although vessels, structures, and the like may be designed to handle some impacts from such marine obstacles and weather conditions, they may have limits on how long impacts can be sustained and what force of potential impacts can be handled safely.
For these reasons, the desire is to have improved sharing and visualization in such a complex marine field having multiple operators performing various operations. To that end, the subject matter of the present disclosure is directed to overcoming, or at least reducing the effects of, one or more of the problems set forth above.

This patent is subject to a terminal disclaimer.

Simultaneous operations coordination and planning system


Disclosed is a method of controlling a transition to an idle mode in an operation method for transitioning to an idle mode in a wideband wireless communication system, including: receiving an unsolicited deregistration response message including an action code instructing the terminal to transmit a deregistration request message for a transition to an idle mode and deregistration request message transmission time information from a base station; extracting control information in which a poll bit for reporting whether or not a message has been received is set from the received unsolicited deregistration response message; transmitting a deregistration request message including response information with respect to the extracted control information and a deregistration request code for requesting a transition to an idle mode, to the base station; and receiving a deregistration response message including an action code permitting a transition to an idle mode.

In a wideband wireless communication system, an idle mode is supported to reduce power consumption of a mobile terminal. The idle mode starts by any one of a terminal or a serving base station to which the terminal belongs.
Hereinafter, messages used for a terminal to transition to an idle mode will be described in detail.
AAI DREG-REQ and AAI DREG-RSP Message
Table 1 shows deregistration codes of deregistration request (AAI_DREG-REQ) messages and descriptions of respective deregistration request codes.
TABLE 1Attributes/Array ofM/OattributesSize(bits)Value/NoteConditionsMDe-3Used to indicate the purpose of this messageN.A.registration_Request_Code0x00: AMS deregistration request from ABS andnetwork0x01: request for AMS deregistration from servingABS and initiation of AMS idle mode.0x02: response for the unsolicited AAI_DREG-RSP message with action code 0x05 by the ABS.0x03: reject for the unsolicited AAI_DREG-RSPmessage with action code 0x05 by the ABS. Thiscode is applicable only when an AMS has a pendingUL data to transmit.0x04: request for AMS deregistration from servingABS to enter DCR mode0x05: response for the unsolicited AAI_DREG-RSP message with action code 0x00, 0x01, 0x02or 0x030x06-0x07: reserved
With reference to Table 1, a terminal sets a deregistration request code De-registration_Request_Code) of a deregistration request message to '01' and transmits the same to a base station to request that the terminal will transition to an idle mode. Also, when the terminal receives an unsolicited registration response message including an operation code '05' instructing the terminal to transmit a deregistration request message for a transition to an idle mode from the BS, the terminal sets the deregistration request code (De-registration_Request_Code) to '02' of the deregistration request message and transmits the same to the base station in response thereto.
Table 2 below shows action codes of a deregistration response (AAI_DREG-RSP) and descriptions of operations of a terminal instructed by respective action codes.
TABLE 2Attributes/Array ofM/OattributesSize (bits)Value/NoteConditionsMAction code4Used to indicate the purpose of this messageN.A.0x00: AMS shall immediately terminate servicewith the ABS and should attempt network entryat another ABS0x01: AMS shall listen to the current ABS butshall not transmit until a RES-CMD message orAAI_DREG-RSP message with action code 0x02or 0x03 is received.0x02: AMS shall listen to the current ABS butonly transmit on the control connection.0x03: AMS shall return to normal operation andmay transmit on any of its active connections.0x04: This option is valid in response to aAAI_DREG-REQ message with De-RegistrationRequest Code = 0x00. The AMS shall terminatecurrent Normal Operation with the ABS.0x05: AMS shall begin idle mode initiation: a) tosignal AMS to begin idle mode in unsolicitedmanner or b) to allow AMS to transmit AMS-initiatedidle mode request at the REQ-Durationexpiration0x06: This option is valid only in response to aAAI_DREG-REQ message with De-RegistrationCode 0x01: a) to reject AMS-initiated idle moderequest or b) to allow AMS to transmit AMS-initiatedidle mode request at the REQ-Durationexpiration0x07: This option is valid in response to aAAI_DREG-REQ message with De-registration-request-code = 0x01 to allow AMS-initiated idlemode request.0x08: This option is valid only in response to anAAI_DREG-REQ message with De-RegistrationRequest Code 0x04 to allow retention of theAMS's connection information0x09: This option is valid only in response to anAAI_DREG-REQ message with De-RegistrationRequest Code 0x04 to reject retention of theAMS's connection information.0x10-0x15: reserved
With reference to Table 2, when the base sets the action code to '05' and transmits a deregistration response message to the terminal, the terminal starts a transition to an idle mode in an unsolicited manner or transmits a deregistration request message for requesting a transition to an idle mode after the expiry of REQ-Duration. Namely, the action code '05' is a code instructing the terminal to start to transition to an idle mode.
Also, when the base station receives a deregistration request message including a deregistration request code '01' from the terminal, the base station sets an action code '07' and transmits a deregistration response message to the terminal in response thereto.
MCEH (MAC Control Extended Header), MAEH (MAC Control Message ACK Extended Header) and AAI MSG-ACK Message
Table 3 below shows an example of a format of an MCEH (MAC Control Extended Header).
TABLE 3SizeSyntax(bit)NotesMCEH ( ) { Type4Extended header type = 0b0010(MCEH Type) Control Connection Channel1Channel ID to identify separate ID (CCC ID)fragmentation/reassemblystate machines0: channel 11: channel 2  Polling10 = no acknowledgementrequired1 = acknowledge required uponreceiving the MAC message  FC2Fragmentation control(see Table 669)  SN8Payload sequence number, SNis maintained per CCC ID, the'SN' value increments by one(modulo 256) sequentially.}
With reference to Table 3, the MCEH includes a polling parameter indicating a response with respect to whether or not a message has been received. For example, when a poll bit is set to '1', it requests a response with respect to a message reception, and when the poll bit is set to '0', it does not request a response with respect to a message reception.
Table 4 below shows an example of a format of an MAEH (MAC Control message ACK Extended Header).
TABLE 4SyntaxSize (bits)NotesMAEH ( ) {Type4Extended header type =0b0100 (MAEH type)MAEH sub-type10b0: Indicates reception of acontrol message0b1: Indicates reception of aService SpecificScheduling Control headerIf (MAEH sub-type == 0b0) {ACK_SN6SN retrieved from the MCEHof the MAC PDU with thePolling bit set to 1Control Connection1Control Connection ChannelChannel ID (CCC ID)ID (CCC ID) that the MACcontrol message is received.}ReservedVariableFor byte alignment}
The MAEH may be used by a terminal or a base station in order to instruct a response with respect to a received MAC control message. When the base station or the terminal receives a MAC control message in which a poll bit of the MCEH is set to '1', or a portion of the MAC control message, the base station or the terminal transmits the MAEH as an acknowledgement thereto.
Table 5 below shows an example of an AAI_MSG-ACK message format.
TABLE 5Attributes/Array ofSizeM/Oattributes(bits)Value/NoteConditionsMACK_SN6SN retrieved from MCEHN.A.of the received MAC PDU.MCCC ID1Control Connection Channel IDN.A.(CCC ID) that the MACmanagement message is received.
The base station or the terminal may use an AAI_MSG-ACK message in order to indicate a reception of a MAC management. When the base station or the terminal receives a MAC message including the MCEH in which a poll bit is set to '1', the base station or the terminal transmits an AAI_MSG-ACK message as an acknowledgement thereto.
AMS Initiated Idle Mode Entry
FIG. 1 is a flow chart illustrating a process of transitioning to an idle mode started by a terminal according to the related art.
With reference to FIG. 1, when the terminal wants to transition to an idle mode, the terminal transmits a deregistration request (DREG-REQ) message including a deregistration request code '01' to the base station (step S11). The base station a deregistration (DREG-RSP) message including an action code '07' in response to the DREG-REQ message which has been transmitted from the terminal (step S12). Upon receiving the DREG-RSP message, the terminal transitions to an idle mode (step S13).
Type 1 ABS Initiated Idle Mode Entry
FIG. 2 is a flow chart illustrating a process of transitioning to an idle mode by Type 1 ABS initiation according to the related art.
With reference to FIG. 2, in order to instruct the terminal to transition to an AMS initiated idle mode, the base station transmits a DREG-RSP message including an action code '05' to the terminal (step S21). Upon receiving the DREG-RSP message, the terminal transmits a DREG-REQ (including deregistration request code '02') in which a poll bit in the MCEH (MAC Control Extended Header) is set to '1' to the base station in response thereto (step S22). Upon receiving the DREG-REQ message, the base station transmits an AAI_MSG-ACK message to the terminal (step S23).
Type 2 ABS Initiated Idle Mode Entry
FIG. 3 is a flow chart illustrating a process of transitioning to an idle mode by Type 2 ABS initiation according to the related art.
With reference to FIG. 3, the base station transmits a DREG-RSP message including an action code '05' along with an REQ-Duration to the terminal in order to instruct the terminal to transition to an AMS initiated idle mode (step S31). Upon receiving the DREG-RSP message, the terminal transmits a DREG-REQ message including a deregistration request code '01' to the base station before an REQ-Duration timer expires in response thereto (step S32). Upon receiving the DREG-REQ message, the base station transmits a DREG-RSP message including an action code '05' allowing the terminal to transition to an idle mode, to the terminal (step S33).
FIG. 4 is a flow chart illustrating a situation in which the DREG-RSP message is lost during the process of transitioning to an idle mode by Type 2 ABS initiation according to the related art.
During the Type 2 ABS initiated idle mode entry process, the base station transmits a DREG-RSP message including the action code '05' instructing the terminal to transition to the AMS initiated idle mode, to the terminal. Here, it may happen that the DREG-RSP message is lost while being transmitted and the terminal transmits the DREG-REQ message including the deregistration request code '01' requesting a transition to an idle mode to the base station (step S42).
In this case, the base station may consider an AAI_DREG-REQ (including the deregistration request code '01') message received from the terminal as a response to an unsolicited AAI_DREG-RSP (including the action code '05') the base station has transmitted to the terminal, and transmits an AAI_DREG-RSP (including the action code '05') to the terminal in response thereto (step S43).
However, the terminal has not received the AAI_DREG-RSP (including the action code '05') the base station had transmitted, the terminal expects to receive an AAI_DREG-RSP (including an action code '07') from the base station (step S44). In this case, there is delay during the process of transitioning to an idle mode of the terminal.

Idle mode transition control method in a wireband wireless communication system


An ion beam milling system and method for electron microscopy specimen preparation is provided and is useful for the preparation for analysis by either TEM or SEM of semiconductors, metals, alloys, ceramics, and other inorganic materials. In one embodiment, a system and process are provided for the preparation of specimens for analysis by transmission electron microscopy including a specimen processing chamber, at least two ion beam generators, and a specimen support or holder. An ion beam masking member is secured to a surface of the specimen and the specimen is milled. Preferably, the system also includes the ability to view the progress of the milling operation and may include an imaging device such as a light microscope which permits monitoring of the area of interest on a specimen as the specimen is milled.

This invention relates to a method and system for the preparation of specimens for analysis by electron microscopy, and more particularly to a method and system for the milling of specimens using an ion beam.
Ion beam milling systems are used for the preparation of specimens whose internal and surface structures are then analyzed using transmission electron microscopy (TEM) or scanning electron microscopy (SEM). Many techniques have been developed which have included the use of mechanical cutting, grinding, and/or polishing operations in combination with ion beam bombardment. In many instances, such techniques have required that the specimen be repeatedly moved from one apparatus to another (either different preparation devices or observation devices) and/or be moved or realigned while mounted in a cuffing, grinding, or milling device.
Transmission electron microscopy is an important technique for studying the detailed microstructure of many materials. Improvements in the design and operation of electron microscopes have generated considerable interest in obtaining atomic resolution images of various materials. However, the preparation of specimens for atomic resolution transmission electron microscopy is demanding, requiring a final specimen which is very thin (i.e.,  less than 50 nm) and free from artifacts. Typically, specimen preparation involves initial slicing, sectioning, trepanning, and/or grinding operations to produce a relatively thin (100-200 xcexcm) disk of approximately 3 mm diameter.
Ion beam milling systems have been used to prepare specimens of various materials including ceramics, semiconductors, metals, and combinations thereof for atomic resolution transmission electron microscopy. In such ion beam milling systems, such as the system disclosed in commonly-assigned U.S. Pat. No. 5,009,743, to Swann, specimens are mounted on holders and placed in the path of one or more ion beams. The ion beams gradually remove atoms from the surface of the specimen until a small perforation is formed in the center of the specimen. Generally, the area immediately around the perforation is then thin enough (i.e.,  less than 50 nm) for atomic resolution analysis by a transmission electron microscope.
Swann et al, U.S. Pat. No. 5,472,566, provides a specimen holder adapted to permit the simultaneous two-sided ion beam milling of a specimen at very low angles of beam incidence, down to 0xc2x0, from both sides of the specimen through the use of one or more support arms to secure the specimen. This produces both rapid milling as well as reducing artifacts to provide high quality specimens for transmission electron microscopy analysis.
In such ion beam milling systems, the ion milled specimens have to be removed from the specimen holders and loaded in a TEM holder for imaging. Clearly, loading and unloading of the specimen from the holders increases the potential of damage to fragile specimens. Additionally, if the specimen is not completely electron transparent upon initial TEM examination, it must be returned to the ion mill for further thinning. Multiple milling steps may be required, depending upon thickness requirements at the area of interest in the specimen.
Slope cutting by directing an ion beam at a masking screen located at or near a specimen surface is also known. The masking screen protects a portion of the specimen, while the remainder of the specimen is milled by the ion beam to reveal desired profiles. This technique is capable of providing cross-sectional profiles of layered structures, the surfaces of which can then be studied by scanning electron microscopy. For example, Hauffe, East German published Patent Application No. 201,538, teaches an apparatus and method for preparing specimens for SEM analysis by providing an ion gun inside the specimen chamber of a scanning electron microscope. A mask is positioned adjacent the sample and is used, in conjunction with the ion gun, to remove material from the specimen.
Double slope cutting to produce a very thin film of a specimen for TEM analysis has also been developed. Yoshioka et al, U.S. Pat. No. 5,907,157, describe a method and apparatus for preparing a specimen adapted for electron microscopy which includes an evacuated specimen-processing chamber. A specimen having a surface to be processed is placed inside the processing chamber and a beam-blocking member is placed close to the processed surface so as to block a part of an etching beam. A first etching step is performed by directing the beam at the specimen via the blocking member. Then, the specimen and the blocking member are moved relative to each other to expose another portion of the specimen. A second etching step is then performed by directing the beam at the specimen via the blocking member. As a result, the specimen is thinned and can be observed with an electron microscope. However, the requirement that the specimen and blocking member be moved relative to one another to perform the second etching step complicates the process and introduces the potential for errors as the relative positions of the two must be controlled to within an accuracy on the order of a few hundred nanometers (10xe2x88x929 meters) or less.
Mitro et al, U.S. Pat. No. 5,922,179, teaches an apparatus and process for etching and coating specimens in a single vacuum chamber, to minimize handling and transfer. The apparatus includes a sealed chamber and a vacuum pump for forming and maintaining a vacuum in the chamber, a first ion gun positioned in the chamber to etch a specimen, a sputtering target in the chamber, and at least one additional ion gun positioned in the chamber to cause material from the target to be directed onto the specimen.
Techniques have also been developed in the preparation of specimens for scanning electron microscopy in which the specimen may be observed by a SEM during preparation thereof. For example, Grxc3xcnewald, U.S. Pat. No. 5,986,264, teaches an ion beam milling system using two ion guns for use in the preparation of samples to be used in both SEM and TEM analysis. The system uses an SEM as a high resolution imaging device to observe the progress of the ion milling of a sample and to determine when a proper sample thickness has been achieved. Also, as the sample stage can be tilted, the system is also taught to be useful for slope cutting of specimens.
The inadequacy in localized thinning of TEM specimens with broad ion beams, coupled with the ability of focused ion beam (FIB) to micro-machine materials, has led to the development of FIB milling systems. The first FIB based instrument (Precision Ion Milling System (PIMS)), became commercially available in 1984 from Gatan, Inc. Since the introduction of this instrument, several other commercial FIB systems have become available. These machines are capable of both imaging and milling selected areas within TEM and SEM specimens with submicron resolutions. The PIMS system is a gas ion source (argon) instrument, whereas the newer generation FIB systems employ liquid metal (gallium) ion sources having superior milling and imaging capabilities.
Specimens are normally milled in gallium based FIB systems with higher energy ions (compared to the PIMS), which may produce a thick amorphous surface artifact (damaged layer). This damaged layer should be removed to produce high quality specimens. Post-FIB milling in broad ion beam systems for final milling and cleaning of such specimens is a common practice. Specifically, FIB milled specimens have been re-milled and cleaned in broad ion beam machines using the specimen holder described in the above-mentioned U.S. Pat. No. 5,472,566 to improve specimen quality. However, again, this requires moving the specimen among various specimen preparation systems and the final TEM or SEM.
Others have reported the use of a wire shadow technique for TEM specimen preparation. Senz et al, Ultramicroscopy 70 (1997) pp. 23-28, and Langer, Elektronenoptische Untersuchung des Werkstoffverhaltesn in mechanisch belasteten Mikrobauteilen (1996) teach gluing a wire onto a specimen surface and exposing the surface to ion milling by a Gatan Duo-Mill. The non-shadowed areas of the specimen are removed, and a thin area is produced in the wire shadow.
However, a need still exists in this art for simplified methods and techniques for specimen preparation for both SEM and TEM analysis.
The present invention provides a method and system for the preparation of specimens for analysis by electron microscopy which utilizes ion beam milling, but without the need for multiple positioning, cutting, and/or handling steps. The system and process are especially useful for the preparation for analysis by either TEM or SEM of semiconductors, metals, alloys, ceramics, and other inorganic materials.
In accordance with one aspect of the present invention, a system and process are provided for the preparation of specimens for analysis by transmission electron microscopy. The system includes a specimen processing chamber, at least two ion beam generators, and a specimen support or holder. Preferably, the system also includes the ability to view the progress of the milling operation and may include an imaging device such as a light microscope which permits monitoring of the area of interest on a specimen as the specimen is milled.
Specimens are prepared by initially forming, cutting, and/or polishing the specimen into a piece having a preferred maximum length of about 3 mm, a width of from about 500-1000 microns, and a thickness of from about 20-150 microns. The edge (thickness dimension and surface of interest for analysis) of the specimen should be relatively flat. A preferred shape for the specimen is a generally semi-circular disc having a radius of about 3 mm and a thickness of from about 20-150 microns, although other shapes may be utilized.
An ion beam masking member is then secured to the edge (thickness dimension and surface of interest for analysis) of the specimen using a suitable adhesive such as an epoxy glue or using a suitable mechanical attachment mechanism. The ion beam masking member is preferably a fiber having a diameter of less than about 100 microns, preferably less than about 80 microns, and most preferably less than about 35 microns. The fiber preferably has a length which approximates the length of the edge of the specimen, although the length of the fiber need only be as long as the area of interest on the specimen. Fibers having diameters down to about 7 microns have been found to be suitable for use. Alternatively, the ion beam masking member may have a non-circular cross-section including square, rectangular, elliptical, or other geometric shape. Preferably, the ion beam masking member comprises an amorphous or single crystal material such as carbon (either amorphous, graphitic, or diamond), silicon carbide, or sapphire. In one embodiment of the invention, the ion beam masking member may be pre-milled prior to securing it to the specimen through ion beam exposure to reduce its diameter or cross-section. This permits a more precise mounting and placement of the masking member on the surface of the specimen relative to features of interest on or in the specimen.
For TEM analysis, once the specimen has been mounted onto a support or holder and installed in the processing chamber, the specimen and ion beam masking member are exposed to two or more ion beams to mill and thin exposed areas on the edge of the specimen. Generally, the surface of interest on the specimen will be positioned perpendicular or nearly perpendicular to the direction of the ion beams. Preferably, an ion beam having a higher intensity in the center of the beam is utilized. That is, for an ion beam having a generally circular cross-section, the intensity at or near the center of the circle is higher than at the edges.
The ion beams will mill both the ion beam masking member as well as the specimen surface causing a necking or thinning of the masking member as milling is continued. Likewise, the masked area of the specimen beneath the ion beam masking member will also be thinned as milling continues because of the thinning of the masking member. The protected area beneath the masking member may be monitored using a suitable imaging device such as an optical or scanning electron microscope which is arranged generally perpendicular to the axis of the ion beams and which provides real time information concerning the progress of the milling process. Alternatively, a light emitting diode and photodetector may be arranged to provide an indication of when the specimen has been sufficiently thinned to become optically transparent. Additionally, if the ion beam masking member is electrically conductive, its electrical resistance may be measured and monitored such that a change in resistance is measured when the milling process causes the member to be severed (i.e., a gap forms).
Once the specimen has been thinned sufficiently to be electron transparent (i.e., less than about 200 nanometers, and preferably less than about 100 nanometers), it is removed from the processing chamber and is ready for TEM analysis. During milling, the specimen and ion beam masking member are positioned in tandem so that there is no relative movement between them. This avoids the need to stop the milling operation and accurately reposition the ion beam masking member prior to the resumption of milling as in some prior art processes.
In an alternative embodiment, the present invention provides a system and process for the preparation of specimens for analysis by a scanning electron microscope. In one form, the system includes a specimen processing chamber, at least one ion beam generator, and a specimen support or holder. Preferably, a second ion beam generator is also included. Generally, a specimen will be prepared so that it has a length of from about 4-8 mm, preferably about 6 mm; a height of from about 6 to about 12 mm, preferably about 8 mm; and a thickness of from about 250-750 microns, preferably about 500 microns.
Preferably, the system also includes the ability to view the progress of the milling operation, in real time, and may include an imaging device such as a light microscope which permits monitoring of the area of interest on a specimen as the specimen is milled. Preferably, the system also includes a sputtering target which may be positioned so that one or both of the ion beam generators can sputter material from the target onto the specimen to coat its surface. Thus, once the specimen is etched and coated, it can be moved to an SEM for analysis.
In a preferred form, the specimen is secured to a rotatable specimen stage for milling. After milling has been completed, the specimen stage is rotated (e.g., 90xc2x0) to a position where the surface of the specimen is etched (cleaned). The specimen stage is then rotated back to its original position for sputter coating using one of the ion beam generators and a sputtering target.
In yet another embodiment of the present invention, the present invention provides a system and process for the preparation of specimens for analysis by a scanning electron microscope in a processing chamber which also includes an SEM. The SEM is arranged such that the specimen milling and preparation process is observable with the SEM being utilized as a high resolution imaging device. The ability to observe the milling process in real time permits precise positioning of the specimen and monitoring of the process. Further, the milled specimen can be analyzed directly in the chamber without movement to a separate apparatus.
Accordingly, it is a feature of the present invention to provide a method and system for the preparation of specimens for analysis by electron microscopy which utilizes ion beam milling, but without the need for multiple cutting, positioning, and/or handling steps. It is another feature of the invention to provide a system and process which is adaptable for specimen preparation for both TEM and SEM analysis. These, and other features and advantages of the present invention, will become apparent from the following detailed description, the accompanying drawings, and the appended claims.

Ion beam milling system and method for electron microscopy specimen preparation


A wide angle imaging lens is provided and includes, in order from an object side, four lenses of a first lens of a negative meniscus lens having a convex surface on the object side, a negative second lens having a concave surface on an image side and constituting at least one of both surfaces by an aspherical surface, a positive third lens having a convex surface on the object side and constituting at least one of both surfaces by an aspherical surface, and a fourth lens having a convex surface on the image side and constituting at least one of both surfaces by an aspherical surface. Further, Abbe numbers of the respective first to fourth lenses with respect to d line are respectively set to be equal to or larger than 40, equal to or larger than 50, equal to or smaller than 40 and equal to or larger than 50, and an aperture diaphragm is arranged between the third lens and the fourth lens.

According to an imaging lens used in a vehicle mounted camera, it is requested that a focusing aberration characteristic of a total of an effective screen is excellent although the lens is of a wide angle in order to ensure an excellent field of view over a wide range and small-sized and light-weighted since a space of mounting the camera in the vehicle is limited.
In a background art, there is known such a wide angle imaging lens described in, for example, JP-A-2003-307674 and JP-A-2003-232998.
In recent years, particularly in- a wide angle imaging lens mounted to a vehicle mounted camera, it is requested to achieve further small-sized formation, light-weighted formation while maintaining an excellent optical function.
However, according to the wide angle imaging lens described in JP-A-2003-307674 and JP-A-2003-232998, although brightness can be ensured, since the lens is mainly constituted by glass spherical lenses and a number of lenses is as large as 5 through 6, there poses a problem that it is difficult to meet the request in view of a size and a weight thereof.
Further, although there is also known a wide angle imaging lens achieving small-sized formation, light-weighted formation by reducing a number of constituent lenses by using aspherical lenses, heretofore, according to a constitution using the aspherical lenses, it is indicated that an optical function is not sufficient and particularly, lateral color is not corrected sufficiently and there is a concern of bringing about spread of color (refer to JP-A-2003-232998).
A fish eye wide angle lens including four lens elements is disclosed in JP-A-2005-227426 published on Aug. 25, 2005.


A projection lens is provided and includes: in order from the object, a first lens group having a negative refractive power and including an aspheric lens and a double-concave lens in this order from the magnification side; a second lens group having a positive refractive power and including one positive lens or one positive lens and one negative lens; and a third lens group having a positive refractive power, including three to five lenses including a cemented lens portion and a positive lens portion in this order from the magnification side, and including a surface closest to the magnification side as an aspheric surface. The projection lens has a substantially telecentricity on the reduction side, the third lens group has a magnification-side focal position located between the third and second lens groups, the projection lens has the longest air space between the first and second lens groups, and the projection lens satisfies specific conditions.

1. Field of the Invention
The present invention relates to a transmission-type or reflection-type liquid crystal display device, or a projection lens for enlarging and projecting display information etc. from a light valve such as DMD, and particularly relates to a projection lens suitable for a rear projection display apparatus such as a rear projection TV, and a projection display apparatus using the projection lens.
2. Description of Related Art
Front projection apparatus and rear projection apparatus have been heretofore known as projection display apparatus. In the front projection apparatus, a projection lens is disposed on the same side as a viewer with respect to a screen so that light outgoing from the projection lens is imaged on the reflection type screen. In the rear projection apparatus, a projection lens and a viewer are disposed to put a screen therebetween so that light outgoing from the projection lens is imaged on the transmission type screen.
Of them, the rear projection display apparatus, for example, like a rear projection television set, has a well known configuration in which constituents between the light source and the screen are put in a cabinet, and light carrying video information is projected from the projection lens disposed on the back face of the cabinet toward the screen disposed on the front face of the cabinet.
In recent years, various projection lenses have been proposed as applications to such a cabinet type projection display apparatus.
An optical system-using a plurality of light valves to obtain a color image requires a synthesis portion for synthesizing light beams from the light valves. It is therefore necessary to secure a certain amount of spacing for a back focal distance of a projection lens (i.e., on the reduction side). Particularly when a projection lens is used in a rear projection TV, the projection lens has to be made wide-angle. Thus, the back focal distance becomes larger than the focal length of the projection lens. In order to miniaturize the apparatus as a whole, it is necessary to insert a reflecting mirror into the projection lens.
Projection lenses disclosed in JP-A-2002-131636, JP-A-2003-287676 and Japanese Patent No. 3244606 etc. are known as wide-angle projection lenses each with a long back focal distance. In any of the documents, there is no consideration about a space to dispose a reflecting mirror in the projection lens. When the reflecting mirror is disposed in the projection lens, the number of lenses will increase so that the manufacturing cost will increase on a large scale.
Projection lenses disclosed in JP-A-2003-156683 and JP-A-2004-354405 are known as solutions to the aforementioned issue.
According to the projection lens disclosed in JP-A-2003-156683 and JP-A-2004-354405, however, an aspheric surface is disposed on the reduction side with respect to an aperture position, and set at a distance from the aperture position, and thus, the balance of the image plane as a whole deteriorates or there survives a difference between the sagittal and tangential planes. Further, the size of the aspheric surface cannot help increasing so as to increase in cost.
According to the projection lens disclosed in JP-A-2003-156683, the power of an aspheric lens itself is made high. Thus, when the aspheric lens is made of plastic, the shape of the lens is deformed excessively due to a temperature change, causing deterioration in performance.
On the other hand, according to the projection lens disclosed in JP-A-2004-354405, the power of an aspheric lens itself is not so high, but the number of lenses is large to be 9 to 11. Radical improvement to reduce such a large number of lenses is required.

Projection lens and projection display apparatus


The durability of a belt is enhanced by improving the strength of rubber itself while enhancing its peeling strength with respect to a cord, a fabric or a short fiber. A toothed belt (10) comprises a belt body (13) that is integrally formed by a tooth rubber (11) provided on one surface side thereof, a backing rubber (12) provided on the other surface side, and an embedded cord (14) spirally wound in a boundary portion between the tooth rubber (11) and the backing rubber (12) that extends in the longitudinal direction of the belt. A facing fabric (20) covering the tooth rubber (11) is adhered to a surface of the tooth rubber (11), or one surface of the belt body (13). The tooth rubber (11) is obtained by vulcanization-molding a rubber composition including rubber such as HNBR, resorcinol, a melamine compound, silica and the like.

Toothed belts have been widely used for power transmission in internal combustion engines of automobiles, and the like. Recently, toothed belts have been increasingly used in high-temperature and high-load environments. That is, downsizing of engines or the like requires toothed belts to be used in environments with higher temperature and to be smaller in width. Conventionally, to enhance the durability of a toothed belt in a high-load environment, for example, a short fiber or the like is incorporated into the tooth rubber, and rubber with a relatively high modulus based on a so-called performing technology is used as the tooth rubber.
Furthermore, in a high-temperature environment the amount of deformation sustained by the teeth of a toothed belt increases. Hence, the amount of internal heat generation is increased, and consequently the toothed belt is more likely to thermally degrade. In addition, the rubber and the fabric at tooth root portions are repeatedly elongated to a great extent, and consequently cracks are more likely to occur in the toothed belt. Conventionally, the fabric, the short fiber, the cord, and the like are subjected to surface treatment with RFL, rubber cement, or the like for prevention of cracks and the like, so that the adhesive forces of rubber with these members are enhanced.
Moreover, as disclosed, for example, in Patent Document 1, a V-ribbed belt is known which has such a structure that a resorcin-formalin resin or a melamine resin is incorporated into an adhesion rubber to enhance the adhesive force between the cord and the adhesion rubber in which the cord is embedded.    Patent Document 1: Japanese Patent Application Publication No. 2008-261489


Label contention in a label switched network is resolved by applying a contention resolution scheme that reconciles policies for handling unidirectional and bidirectional label switched path setup.

The present invention relates to label distribution in a label switched network and, more particularly, to resolving contention in networks that permit unidirectional and bidirectional label switched paths.
Multi-Protocol Label Switching (MPLS) is an advanced framework for high-speed data forwarding that differs from conventional destination-based IP routing: each packet is provided with a "label" that is used by label switched routers (LSRs) to forward the packet along what is referred to as a label switched path (LSP). See E. Rosen et al., "Multiprotocol Label Switching Architecture," Internet Engineering Task Force (IETF) Network Working Group, Request for Comments (RFC) 3031. LSRs inform adjacent nodes of label bindings using a process of label distribution which is known as LSP setup. See, e.g., L. Andersson et al., "LDP Specification," IETF Network Working Group, RFC 3036. Labels are by convention allocated and distributed from a downstream direction—where "downstream" in the art refers to the direction of data flow. In the context of IP networks, where LSPs are assumed to be unidirectional, downstream label selection convention assures that there is no label contention among connection requests coming from different directions.
Generalized MPLS ("GMPLS"), also referred to in the art as Multi-Protocol Lambda Switching ("MPL(ambda)S"), extends MPLS to support—not just packet-switching devices—but devices that perform switching in the time, wavelength, and space domains. GMPLS provides the potential for a control plane that can be utilized with legacy equipment (e.g. SONET) as well as newer devices (e.g. optical crossconnects ("OXCs")). See, e.g., D. Awduche et al., "Multi-Protocol Lambda Switching: Combining MPLS Traffic Engineering Control with Optical Crossconnects," IETF Network Working Group, Internet Draft. For various practical reasons, current GMPLS signaling mechanisms permit the setup of what are referred to in the art as bidirectional LSPs. See P. Ashwood-Smith, et al., "Generalized MPLS—Signaling Functional Description," IETF Network Working Group, Internet Draft. The introduction of bidirectional LSPs creates the practice of upstream label distribution and suggested label distribution. These two label distribution policies presents the possibility of contention between two bidirectional LSP requests traveling in opposite directions between two adjacent nodes. If there is no restriction on the ports/channels that can be used for bidirectional LSPs and if there are alternate resources, then both nodes will pass different labels upstream/downstream and the contention will be resolved naturally. If there is a restriction on the ports/channels that can be used for the bidirectional LSPs (for example if they must be physically coupled on a single I/O card), or if there are no more resources available, then the contention must be resolved by some other means. The current GMPLS signaling proposal suggests letting the node with the higher node ID win the contention.
Unfortunately, current GMPLS proposals do not address the situation when a unidirectional LSP and a bidirectional LSP compete for the same resources. A network operator, in fact, may wish to offer both unidirectional and bidirectional high speed connections over the same network—without incurring the possible provisioning costs of segregating interfaces on network nodes between such connections. In a shared unidirectional and bidirectional LSP GMPLS network, a unidirectional LSP setup request message may carry a suggested label; the corresponding reply message may carry a label based on downstream label distribution policy. A bidirectional LSP setup request message should carry an upstream label and may carry a suggested label; the related reply message may carry a label based on downstream label distribution policy. The above-mentioned prior art contention schemes for handling bidirectional and unidirectional LSPs, however, are not consistent. Accordingly, there is a need for enhanced contention resolution procedures that can handle such situations.

Method for unidirectional and bidirectional label switched path setup in a label switched network