A spindle motor in one inventive implementation includes a rotor hub (10) for retaining a rotor magnet (70) and a stator (80) which is faced to the radial inner side of the rotor magnet (70) with a gap interposed therebetween. A shield sheet (90) is placed between the upper side of the winding (82) of the stator (80) and the disk mounting portion (13) of the rotor hub (10) and the outer peripheral edge of the shield sheet (90) is placed radially inside of the outer peripheral edge of the core back (83) of the stator (80).

1. Field of the Invention
The present invention relates to an inner-rotor type spindle motor which rotates and drives a magnetic disk such as a hard disk and a recording disk driving device including the spindle motor.
2. Background Art
FIG. 8 illustrates an inner-rotor type spindle motor including a conventional magnetic shield sheet. FIG. 8 is an axial cross-sectional view, wherein the vertical direction in the figure represents the axial direction. FIG. 9 is a main part top view of the spindle motor of FIG. 8 viewed from above.
The spindle motor includes a stationary assembly 1, a bearing 2, and a rotor assembly 3 which is rotatably supported by the bearing 2.
The stationary assembly 1 includes a stator 4 and an annular-shaped shield sheet 5. The shield sheet 5 is placed above the stator 4 to prevent magnetic fluxes generated from the stator 4 generally during driving from being largely leaked to the region above the shield sheet 5.
In recent years, there has been a need for size reduction, thickness reduction and price reduction of information devices such as hard-disk driving devices. Therefore, there has been also a need for size reduction, thickness reduction and price reduction of spindle motors installed in information devices.
However, in the conventional exemplary configuration of FIG. 8 and FIG. 9, if an attempt is made to reduce the thickness of the stator 4 in the axial direction for thickness reduction, a hook 4a of the stator 4 provided just below the shield sheet 5 will make impossible to place the shield sheet 5 below the hook 4a. This increases the difficulty of reducing the thickness of the stator 4.
Furthermore, since the shield sheet 5 is formed to cover the entire stator 4 from thereabove and also to cover a stator fitting portion 6a of the housing 6, a high material cost is required for the shield sheet 5. This increases the difficulty of fabricating an inexpensive shield sheet 5.

Spindle motor and recording disk driving device including the same


An image processing apparatus comprises processing circuitry configured to: obtain an irradiance volume representative of virtual light cast into a volumetric imaging data set, the irradiance volume comprising a respective irradiance value for each of a plurality of points in the irradiance volume; determine, for each of a plurality of reference points in the irradiance volume, a respective value for an accuracy measure, wherein the value for the accuracy measure at each reference point is representative of an accuracy with which irradiance has been determined at or near that reference point; and perform a rendering process using the irradiance volume, wherein the rendering process is performed in dependence on the determined values for the accuracy measure.

It is known to render a volumetric imaging data set to produce a rendered image in which a subject of the image appears to be three-dimensional. The volumetric imaging data set may comprise a three-dimensional array of voxels, each with an associated intensity. The rendered image may comprise a two-dimensional array of pixels. The rendered image may sometimes be referred to as a 3D image because of the three-dimensional appearance of the subject in the rendered image.
In the context of medical imaging, a volumetric imaging data set may be obtained directly from a medical imaging scan or through further processes such as reconstruction and filtering. The intensities of the voxels of the volumetric imaging data may correspond to physical properties of the subject of the scan, for example tissue types. The intensities may be mapped on to opacity and color values, for example by using a transfer function. The opacity and color values may then be used in the rendering process, for example to distinguish different tissue types by rendering them in different colors.
Lighting effects may be added to a 3D image such that the subject of the image appears to be illuminated from a given position and/or direction. In recent years, 3D medical images have been made more realistic through the use of advanced lighting techniques (referred to as global illumination, gradient free lighting, subsurface scattering or photon mapping) that simulate illumination with a more physically accurate model than was previously used.
In Global Illumination (GI), a lighting model may be used that includes both direct illumination by light coming directly from a light source and indirect illumination, for example illumination by light that has been scattered from another surface.
A global illumination imaging algorithm may be divided up into two passes. The first pass is a forward simulation of light into the volume. Light information is stored in an intermediate volumetric structure, which may be referred to as a light volume or irradiance volume. The second pass traces light backwards from a camera. The second pass uses the light information in the light volume to render an image for display.
A two-pass system may allow a single light volume to be used for multiple rendering passes at different viewing angles, thus avoiding the need to recalculate the light volume for each render.
In an example of a GI imaging algorithm, the position of at least one light source is determined with reference to a volumetric imaging data set. In a first pass, virtual light is cast from the at least one light source into the volumetric imaging data set using a global illumination lighting model. The virtual light may be referred to in terms of photons or photon rays. The first pass may be referred to as a photon mapping pass.
The irradiance due to the at least one light source is determined at each of a large array of points in the volumetric imaging data set using absorptive properties assigned to the voxels in dependence on the voxel intensities. The irradiance values at the array of points are stored as a light volume, which may be also be referred to as an irradiance volume. The irradiance volume is representative of light cast into the volumetric imaging data set. The irradiance of each voxel in the light volume is determined by the number of photons that passes through the voxel.
The position of a viewpoint (which may be referred to as a camera) is determined. In a second pass, rays are cast from the camera into the irradiance volume (for example, one ray for each pixel of the resulting rendered image). Irradiances from points along each ray are integrated to provide pixel color values for a final rendered image.
Many global illumination algorithms use stochastic lighting simulation in an attempt to reduce or eliminate structured artefacts. In the first pass of the global illumination method, photons may be sent into the volume in accordance with a stochastic distribution. Optionally, the second pass of the global illumination method may also use stochastic simulation.
In some circumstances, stochastic simulation may introduce grainy noise into an image, which may result in a speckled appearance of the final image. Grainy noise may be unpleasant for a viewer. In some circumstances, grainy noise may make it more difficult for a viewer to interpret an image. For example, in a series of images that show a moving subject, the positioning of the grainy noise may shift from one image to the next in an unpredictable manner, which may be distracting to the viewer.
Grainy noise may be particularly prevalent in areas of an image that correspond to regions of the irradiance volume that were intersected by a relatively low number of photon rays. For example, some regions may be intersected by a low number of photon rays due to shadowing. Some regions may by intersected by a low number of photon rays due to scattering effects, for example multiple scattering.
One method of reducing grainy noise is to run the lighting simulation for a large number of iterations. FIGS. 1a, 1b and 1c are renderings of the same volumetric imaging data set using a different number of photon mapping passes. FIG. 1a uses one photon mapping pass. FIG. 1b uses two photon mapping passes. FIG. 1c uses 32 photon mapping passes.
In each photon mapping pass, photons of virtual light are distributed in a uniform but stochastic pattern across the footprint of the volume projected into the space of the light. The number of photon rays that are sent into the volume scales with the number of photon mapping passes. It may be expected that over multiple passes, the number of photon rays increases even in regions for which the number of intersecting photon rays is relatively low.
It may be seen from FIGS. 1a, 1b and 1c that the amount of grainy noise in the image decreases with an increased number of photon mapping passes. FIG. 1b has less grainy noise than FIG. 1a. FIG. 1c has less grainy noise than FIG. 1b. Each of FIGS. 1a, 1b and 1c comprises an insert showing an enlarged portion of the image, to better show the grainy noise.
It may be possible to reduce the grainy noise by running a number of iterations, for example until the result converges. However, running a large number of iterations may not be practical with regard to time and/or cost. Furthermore, it may be the case that a large proportion of the information available is obtained in the first iteration or first few iterations. Increasing the number of iterations may in some circumstances incur additional time and cost without resulting in much additional information.
Depending on stochastic parameters, the radiance reflected to the camera may be seen as samples of a radiance distribution. Filtering may be used as a tool for smoothing the distribution.
In many algorithms, filtering is performed as a post-processing pass on the rendered image. Such filtering is performed on the two-dimensional array of pixels of the rendered image rather than on a three-dimensional volume. Filtering of the two-dimensional array of pixels of the rendered image may be fast. Filtering of the rendered image may mean that the filtering only operates on the parts of the data that are visible in the image. Filtering only the relevant parts of the data may increase speed and/or decrease complexity of filtering.
It has been found that in some circumstances filtering of the rendered image may be too indiscriminate. In filtering, it may be desirable to remove noise while keeping meaningful features, for example sharply defined structures. It has been found that, in some circumstances, filtering of the rendered image may include filtering (for example, smoothing) of areas in which sharp structures are expected. The appearance of such sharp structures may be smoothed by the filtering in an unwanted manner.
In some circumstances, edge-aware filtering methods may be used to attempt to reduce the unwanted filtering of desired structures. However, in some circumstances even edge-aware filtering methods may filter areas in which filtering has an unwanted effect.
In some circumstances, a non-local means filter may work quite well. However, a non-local means filter may produce a patchy behavior where lighting quality is low.
Filtering of a three-dimensional volume instead of a two-dimensional rendered image is possible. In some methods, the three-dimensional irradiance volume may be filtered. However, in some circumstances, it may be difficult or impossible to filter a three-dimensional volume in real time. For example, a so-called 4D ultrasound image may be updated many times per second. It may not be possible to filter a three-dimensional volume quickly enough to apply such filtering to real time 4D ultrasound images. Some complex filters may take multiple seconds to render a single image.
Furthermore, volumetric filters may be more challenging than two-dimensional filters, especially since the photon data structure (the irradiance volume) may be complex.
FIGS. 2a, 2b and 2c provide a comparison of the same rendered image when different post processing filters are applied to the two-dimensional array of pixels in the rendered image. No filtering is applied to the image of FIG. 2a. Grainy noise is present in the image of FIG. 2a. A medium profile filtering is applied to the image of FIG. 2b. A high profile filtering is applied to the image of FIG. 2c. The image of FIG. 2c is more strongly filtered than the image of FIG. 2b. In the examples of FIGS. 2b and 2c, the filter used is an anisotropic diffusion filter (which is in the category of feature preserving image filters).
It may be seen that, while the filtering reduces the grainy noise, it also reduces a level of detail in the image. For example, a vessel 10 is shown in all three images. The vessel 10 appears less sharp in FIG. 2b than in FIG. 2a. The vessel 10 appears less sharp in FIG. 2c than in FIG. 2b. In the example of FIGS. 2a, 2b and 2c, the definition of detailed features (for example, the vessel 10) is lost before the grainy noise is fully eliminated. In general, definition may be lost before noise is fully resolved. In some circumstances, the noise magnitude may be quite high.

Imaging data processing apparatus and method


A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.

1. Field of the Invention
The present invention relates generally to a lithographic projection apparatus and more specifically to a lithographic projection apparatus including a controllable reflector.
2. Background of the Related Art
The term xe2x80x9cpatterning structurexe2x80x9d as here employed should be broadly interpreted as referring to means that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate; the term xe2x80x9clight valvexe2x80x9d can also be used in this context. Generally, the said pattern will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit or other device (see below). Examples of such patterning structure include:
A mask. The concept of a mask is well known in lithography, and it includes mask types such as binary, alternating phase-shift, and attenuated phase-shift, as well as various hybrid mask types. Placement of such a mask in the radiation beam causes selective transmission (in the case of a transmissive mask) or reflection (in the case of a reflective mask) of the radiation impinging on the mask, according to the pattern on the mask. In the case of a mask, the support structure will generally be a mask table, which ensures that the mask can be held at a desired position in the incoming radiation beam, and that it can be moved relative to the beam if so desired;
A programmable mirror array. An example of such a device is a matrix-addressable surface having a viscoelastic control layer and a reflective surface. The basic principle behind such an apparatus is that (for example) addressed areas of the reflective surface reflect incident light as diffracted light, whereas unaddressed areas reflect incident light as undiffracted light. Using an appropriate filter, the said undiffracted light can be filtered out of the reflected beam, leaving only the diffracted light behind; in this manner, the beam becomes patterned according to the addressing pattern of the matrix-adressable surface. The required matrix addressing can be performed using suitable electronic means. More information on such mirror arrays can be gleaned, for example, from U.S. Pat. Nos. 5,296,891 and 5,523,193, which are incorporated herein by reference. In the case of a programmable mirror array, the said support structure may be embodied as a frame or table, for example, which may be fixed or movable as required; and
A programmable LCD array. An example of such a construction is given in U.S. Pat. No. 5,229,872, which is incorporated herein by reference. As above, the support structure in this case may be embodied as a frame or table, for example, which may be fixed or movable as required.
For purposes of simplicity, the rest of this text may, at certain locations, specifically direct itself to examples involving a mask and mask table; however, the general principles discussed in such instances should be seen in the broader context of the patterning structure as hereabove set forth.
Lithographic projection apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, the patterning structure may generate a circuit pattern corresponding to an individual layer of the IC, and this pattern can be imaged onto a target portion (e.g. comprising one or more dies) on a substrate (silicon wafer) that has been coated with a layer of radiation-sensitive material (resist). In general, a single wafer will contain a whole network of adjacent target portions that are successively irradiated via the projection system, one at a time. In current apparatus, employing patterning by a mask on a mask table, a distinction can be made between two different types of machine. In one type of lithographic projection apparatus, each target portion is irradiated by exposing the entire mask pattern onto the target portion at once; such an apparatus is commonly referred to as a wafer stepper. In an alternative apparatusxe2x80x94commonly referred to as a step-and-scan apparatusxe2x80x94each target portion is irradiated by progressively scanning the mask pattern under the projection beam in a given reference direction (the xe2x80x9cscanningxe2x80x9d direction) while synchronously scanning the substrate table parallel or anti-parallel to this direction; since, in general, the projection system will have a magnification factor M (generally less than 1), the speed V at which the substrate table is scanned will be a factor M times that at which the mask table is scanned. More information with regard to lithographic devices as here described can be gleaned, for example, from U.S. Pat. No. 6,046,792, incorporated herein by reference.
In a manufacturing process using a lithographic projection apparatus, a pattern (e.g. in a mask) is imaged onto a substrate that is at least partially covered by a layer of radiation-sensitive material (resist). Prior to this imaging step, the substrate may undergo various procedures, such as priming, resist coating and a soft bake. After exposure, the substrate may be subjected to other procedures, such as a post-exposure bake (PEB), development, a hard bake and measurement/inspection of the imaged features. This array of procedures is used as a basis to pattern an individual layer of a device, e.g. an IC. Such a patterned layer may then undergo various processes such as etching, ion-implantation (doping), metallization, oxidation, chemo-mechanical polishing, etc., all intended to finish off an individual layer. If several layers are required, then the whole procedure, or a variant thereof, will have to be repeated for each new layer. Eventually, an array of devices will be present on the substrate (wafer). These devices are then separated from one another by a technique such as dicing or sawing, whence the individual devices can be mounted on a carrier, connected to pins, etc. Further information regarding such processes can be obtained, for example, from the book xe2x80x9cMicrochip Fabrication: A Practical Guide to Semiconductor Processingxe2x80x9d, Third Edition, by Peter van Zant, McGraw Hill Publishing Co., 1997, ISBN 0-07-067250-4, incorporated herein by reference.
For the sake of simplicity, the projection system may hereinafter be referred to as the xe2x80x9clensxe2x80x9d; however, this term should be broadly interpreted as encompassing various types of projection system, including refractive optics, reflective optics, and catadioptric systems, for example. The radiation system may also include components operating according to any of these design types for directing, shaping or controlling the projection beam of radiation, and such components may also be referred to below, collectively or singularly, as a xe2x80x9clensxe2x80x9d. Further, the lithographic apparatus may be of a type having two or more substrate tables (and/or two or more mask tables). In such xe2x80x9cmultiple stagexe2x80x9d devices the additional tables may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other tables are being used for exposures. Twin stage lithographic apparatus are described, for example, in U.S. Pat. No. 5,969,441 and WO 98/40791, incorporated herein by reference.
In a lithographic apparatus the size of features that can be imaged onto the wafer is limited by the wavelength of the projection radiation. To produce integrated circuits with a higher density of devices, and hence higher operating speeds, it is desirable to be able to image smaller features. While most current lithographic projection apparatus employ ultraviolet light generated by mercury lamps or excimer lasers, it has been proposed to use shorter wavelength radiation of around 13 nm. Such radiation is termed extreme ultraviolet (XUV or EUV) or soft x-ray and possible sources include laser-produced plasma sources, discharge plasma sources or synchrotron radiation from electron storage rings. An outline design of a lithographic projection apparatus using synchrotron radiation is described in xe2x80x9cSynchrotron radiation sources and condensers for projection x-ray lithographyxe2x80x9d, J B Murphy et al, Applied Optics Vol. 32 No. 24 pp 6920-6929 (1993).
Lithographic projection apparatus using EUV radiation are intended to image mask patterns with a critical dimension of 90 nm or less. This imposes extremely severe accuracy criteria on the illumination and especially the projection optics. For the projection system, the required accuracy is defined by the wavefront aberration (WFA) which is twice the magnitude of the surface figure error. For a four-mirror system it has been calculated (Gwyn, C. W. et al, Extreme Ultraviolet lithography, J. Vac. Sci. Technol. B 16, (November/December) 1998, pp 3142) that a WFA tolerance of xe2x89xa61 nm rms is required for low frequency errors, i.e. those of spatial wavelength of greater than 1 mm. Independent errors of each mirror must therefore be no greater than 0.25 nm, since in a system of N mirrors the maximum permissible error of each mirror is (2N)xe2x88x921 times the total error for the system. For mid-spatial frequency errors, of wavelength 1 mm to 1 xcexcm, surface roughness must be less than 0.2 nm rms as roughness in this spatial frequency range reduces image contrast. High-spatial frequency errors, of wavelength less than 1 xcexcm, cause large angle scattering, a loss mechanism for the beam, and so surface roughness for these frequencies must be less than 0.1 nm rms.
U.S. Pat. Nos. 5,986,795 and 5,420,436 both disclose the use of adaptive mirrors in photolithography using EUV radiation. In the mirror described in U.S. Pat. No. 5,986,795, a number of actuators are provided between a reaction plate and a face plate bearing a reflective coating suitable for the radiation used in the lithography apparatus. The actuators may be piezoelectric, electroresistive or magnetoresistive and act generally perpendicularly to the face and reaction plates. The reaction plate is more flexible than the face plate. U.S. Pat. No. 5,420,436 describes a similar arrangement, having an array of piezoelectric actuators acting perpendicularly between a reaction plate and a face plate; in this case however the face plate is more flexible than the reaction plate.
An embodiment of the present invention provides an adaptive reflector or system of reflectors, especially for extreme ultraviolet radiation, that can provide improved, control over the surface figure of the mirror and hence over wavefront aberration.
One aspect of the present invention includes a lithographic projection apparatus including a radiation system for providing a projection beam of radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate; and an active reflector comprised in an optical system being either one or both of said radiation system and said projection system, said active reflector comprising a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of said reflective multilayer, wherein said actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer.
The actuator in the active mirror serves to control the surface figure of the reflective multilayer and hence can be used to minimize wavefront aberration in the radiation beam delivered by the optical system. Stress, and particularly stress variations, have been identified as a major source of surface figure errors in reflectors adapted to reflect EUV radiation and the invention can directly compensate for this. The present invention can be used to compensate for stress inherent in the multilayer as a result of its manufacture as well as stresses caused by external factors. The actuators may be piezoelectric stack or patch actuators and are preferably incorporated into the reflector body close to the reflecting multilayer.
The actuators exert a substantial component of force in a direction parallel to the surface figure of the multilayer. In the case of a significantly curved mirror the force component should be parallel to the surface figure at or near the point of connection between the actuator and the multilayer or the member bearing the multilayer. The stiffness of the multilayer, or a member bearing the multilayer, is higher in directions parallel to the surface figure than in the direction perpendicular to the surface figure (note that in a local coordinate system having orthogonal x, y and z axes describing the mirror, the direction perpendicular to the surface figure at the center of the mirror may be referred to as the z-direction.). This means that a given force exerted parallel to the plane of the reflector effects a smaller deformation of the surface figure than the same force exerted perpendicularly. Since the required deformations are very small and actuators of the required strength are easily obtained, the present invention allows for a much more exact control of the surface figure, with reduced risk of over-deforming the mirror.
The actuators may lie wholly in the plane of the reflector, particularly where the actuators are patch actuators. However, the actuators may also be rod actuators arranged diagonally between the reflective layer and base member. In such an arrangement, the actuators may be arranged in pairs connected to the reflective layer at the same point but to the base plate at spaced-apart locations and controlled so that the resultant force exerted by each pair on the reflector layer lies wholly within the plane of the reflector. It is also possible for the actuators to be connected singly but in that case it is preferred that of the force exerted by each actuator on the surface figure, the component perpendicular to the surface is less than 50% and preferably less than 20% of the total force exerted by that actuator.
The actuators may also be arranged such that they are operative to apply torques to said active reflector so as to locally bend the reflective surface of the multilayer for controlling the surface figure. Applying torques proves very efficient in controlling the surface figure and advantageously the torques are about a point in or near the reflective multilayer. Torques may be applied by exerting the forces on projections of the active reflector at a backside opposing the reflective multilayer. In an embodiment the actuators applying the forces that induce the torques are arranged in between projections. The projections may be walls of cavities at the backside of the active reflector and a pneumatic or hydraulic pressure can be applied to the cavities so as to form pneumatic or hydraulic actuators applying forces to the projections. Generally, the projections will be substantially perpendicular to the surface figure and the forces exerted on the projections parallel to the surface figure.
According to a further aspect of the invention there is provided a device manufacturing method including projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on a substrate, wherein at least one of a radiation system for producing the beam and a projection system for projecting the beam include an active reflector that includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of said reflecting multiplayer, wherein said actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer and controlling said active reflector to minimize wavefront aberration in a radiation beam reflected by said active reflector.
Although specific reference may be made in this text to the use of the apparatus according to the invention in the manufacture of ICs, it should be explicitly understood that such an apparatus has many other possible applications. For example, it may be employed in the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, liquid-crystal display panels, thin-film magnetic heads, etc. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the terms xe2x80x9creticlexe2x80x9d, xe2x80x9cwaferxe2x80x9d or xe2x80x9cdiexe2x80x9d in this text should be considered as being replaced by the more general terms xe2x80x9cmaskxe2x80x9d, xe2x80x9csubstratexe2x80x9d and xe2x80x9ctarget portionxe2x80x9d, respectively.
In the present document, the terms xe2x80x9cradiationxe2x80x9d and xe2x80x9cbeamxe2x80x9d are used to encompass all types of electromagnetic radiation, including ultraviolet (UV) radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and extreme ultra-violet (XUV or EUV) radiation (e.g. having a wavelength in the range 5-20 nm), as well as particle beams, such as ion beams or electron beams.

Lithographic apparatus, device manufacturing method, and device manufactured thereby


An alternator device includes a first rotating disk having a first set of spaced intervals between rotor teeth; a second rotating disk having a second set of spaced intervals between rotor teeth; a permanent magnet located intermediate the rotating disks and to generate a first magnetic field having a first magnetic pole at the first rotating disk and a second magnetic field having a second magnetic pole opposite the first magnetic pole at the second rotating disk; and a coil base located intermediate the first and second rotating disks, the coil base receiving coils in alignment with the first and second spaced intervals; wherein the rotating disks rotate along a rotation axis while the magnet and the coil base remain in a static position, the rotation of the rotating disks enabling a rotational movement of the magnetic fields through the coils for the generation of electric current within the coils.

In this technologically running world, energy is essential for each and every system or machine to work. Energy can be of any type, for example heat energy, electrical energy, mechanical energy, chemical energy, and the like.
As we all know, energy can neither be created nor be destroyed, it can be converted from one form to another form. So, the energy conversion field has always been the subject of invention. The invention in energy conversion field takes place very frequently, at the same time it has never been easy to invent any device or method for converting one form of energy to another form of energy. It is already known through the study of thermodynamics that energy can be converted from one form to another form. For example, chemical energy into heat energy, heat energy into mechanical energy, mechanical energy into electrical energy, and the like.
Energy is the main requirement for the efficient working of the present industrial world. Moreover, the electrical energy is the main source of providing power to every industrial activity. The well-known methods for generating the electrical energy require the use of hydrocarbons which are polluting our environment. Hence, there is always a need for generating electrical energy from other energy sources.
Some of the well-known methods are use of hydro energy, wind energy, atomic energy, and other renewable energy sources into electrical energy. However, such conversion is not always hundred percent efficient and there is always a loss of energy during the conversion process.
Hence, there is always a requirement of devices which can efficiently convert naturally available renewable energy into electrical energy. Moreover, there is always a requirement of devices which can covert one form of energy into another form of energy without wasting the valuable part of the energy during the conversion process.
A lot of devices and methods have been suggested in the art for conversion of energy from one form to another form. The most wanted devices and methods in the field of energy conversion is a device which can convert mechanical energy into electrical energy. We have lot of sources around us which can give input as mechanical energy. However, due to lack of efficient devices and methods such mechanical energy input cannot be converted efficiently into another useful form of energy.
This problem of efficient conversion of mechanical energy into electrical energy is solved upto some extent. There have been some solutions to this problem, for example, electrical generator, hydraulic turbine and the like. Every such device and method has their own advantages and disadvantages and thus accordingly gets implemented.
Traditional solutions do provide a way for conversion of mechanical energy into electrical energy, but still have limitations. These limitations are based on sources of mechanical energy, loss of energy during conversion, compactness, installation and the like. A disadvantage of traditional alternators is the energy loss due to the contact between the magnetized disks and/or spaced intervals between the rotor teeth. Another disadvantage of traditional alternators is the loss of energy due to the dual pole magnetization (North and South) of a same magnetized disk or spaced intervals between rotor teeth during operation. Also, traditional alternators have N/S alternating members which results in magnetizing the fixed magnet, so it is difficult to turn the alternator. These traditional alternators require electromagnetic energy to enable them to rotate.


The present invention provides a lathe, comprising a machine frame, a first working spindle with a first workpiece receiving means, at least one first tool slide with a tool carrier, a second working spindle with a second workpiece receiving means which faces the first workpiece receiving means, and at least one second tool slide with a tool carrier, The machine frame has an elongated machine base member, having a first support section and a second support section arranged to follow the first support section. Each support section has a base side, a spindle support side located opposite this and two slide support sides located opposite one another and between the base side and the spindle support side. The first working spindle is arranged on the spindle support side of the first support section and the second working spindle is arranged on the spindle support side of the second support section.

The present disclosure relates to the subject matter disclosed in German Application No. 100 48 291.0 of Sep. 29, 2000, which is incorporated herein by reference in its entirety and for all purposes.
The invention relates to a lathe comprising a machine frame arranged on a support surface, a first working spindle which is arranged on the machine frame, is drivable for rotation about a first spindle axis and has a first workpiece receiving means, at least one first tool slide, with which a tool carrier can be displaced in an X direction transversely to the first spindle axis so that a workpiece held in the first workpiece receiving means can be machined with at least one tool held on the tool carrier, a second working spindle which is arranged on the machine frame, is drivable for rotation about a second spindle axis and has a second workpiece receiving means which faces the first workpiece receiving means, at least one second tool slide, with which a tool carrier can be displaced in an X direction transversely to the second spindle axis so that a workpiece held in the second workpiece receiving means can be machined with at least one tool held on the tool carrier.
Lathes of this type are known from the state of the art as so-called counterspindle machines.
The problem with such counterspindle machines is to be seen in the fact that when as large a number of tools as possible is intended to be available for machining, in particular, as large a number of tools as possible is intended to be brought into engagement for the machining at the same time, these machines are of a very large construction.
The object underlying the invention is therefore to improve a lathe of the generic type in such a manner that this is of as compact a construction as possible.
This object is accomplished in accordance with the invention, in a lathe of the type described at the outset, in that the machine frame has a machine base member elongated in a longitudinal direction, that the machine base member has a first support section and a second support section arranged to follow this in the longitudinal direction, that each of the support sections has a base side, a spindle support side located opposite this in a first transverse direction in relation to the longitudinal direction and two slide support sides located opposite one another in a second transverse direction in relation to the longitudinal direction and between the base side and the spindle support side, that the first working spindle is arranged on the spindle support side of the first support section and the second working spindle is arranged on the spindle support side of the second support section and that the first tool slide is held on one of the slide support sides of the first support section and the second tool slide is held on one of the slide support sides of the second support section.
The advantage of the inventive solution is to be seen in the fact that with the use of such a machine base member a particularly space-saving type of construction of the inventive lathe has been developed.
Furthermore, such a machine base member has the advantage that with such an arrangement of working spindle and tool slide as well as tool carrier relative to one another this machine base member has a negative influence on the exactness of the rotary machining only to a slight degree with the heat expansion inherent in it since the heat expansion of the machine base member is slight in the transverse directions which are decisive for the exactness of the rotary machining and the expansion of the machine base member in the longitudinal direction is insignificant for the exactness of the respective rotary machining.
In this respect, a particularly favorable solution provides for the support sections to have essentially the same cross section so that the heat expansion in both support sections has the same effect and thus the relative exactness during the machining of the front and rear sides is very high since the heat expansion affects the exactness of the rotary machining in the same way in both support sections.
The machine base member could, in principle, be realized in the most varied of ways; for example, it is possible to construct the machine base member in a special profiled shape, for example, in a double T profile or in similar profiled shapes. A particularly favorable solution provides for the machine base member to extend like a beam in the longitudinal direction, wherein the beam-like shape is to be understood, in particular, such that the machine base member is designed on the basis of the beam-like basic shape.
With respect to the subdivision of the machine base member, it has merely been mentioned so far that this is intended to have two support sections.
In principle, it is possible to design the machine base member such that the support sections merge into one another.
A particularly favorable solution does, however, provide for a connecting section to be provided between the support sections.
Such a connecting section can, in the inventive solution, have essentially the same cross-sectional shape as the support sections.
It is, however, also possible when providing such a connecting section for this to have a cross-sectional shape different from the support sections.
Even when a connecting section is provided, the machine base member does, however, preferably form an integral part with the support sections and the connecting section.
With respect to the movability of the working spindles, no further details have so far been given in conjunction with the explanations concerning the individual embodiments. One advantageous embodiment, for example, provides for at least one of the support sections to have, on its spindle support side, guides means for a working spindle which is displaceable in Z direction parallel to the spindle axis, these guide means being located in a spindle guide plane, so that at least one of the working spindles can be moved in Z direction.
In this respect, the guide means are preferably located in a spindle guide plane extending parallel to the longitudinal direction.
In principle, it would be conceivable to mount the tool slides securely on the respective slide support sides of the machine base member.
However, since movability of the tools relative to the working spindle is necessary in any case, it is preferably provided for at least one of the tool slides to be guided so as to be movable on the machine base member with slide guide means located in a slide guide plane.
In this respect, the slide guide means preferably extend in slide guide planes extending parallel to the longitudinal direction.
With respect to the arrangement of the slide support sides relative to the spindle guide plane, it is particularly advantageous for reasons of space, especially to accommodate the tool slides in a space-saving manner, when the slide support sides of the machine base member are located on the same side of the spindle guide plane.
A particularly favorable geometry is present when the slide guide plane extends transversely to the spindle guide plane. It is even more favorable when the slide guide planes located opposite one another extend transversely to the spindle guide plane.
Such an extension of the slide guide plane transversely to the spindle guide plane includes all angles between these planes which are greater than 0xc2x0. The slide guide planes preferably extend at least at an angle of 45xc2x0 to the spindle guide plane.
It is even better when the angle between the slide guide planes and the spindle guide plane is close to a right angle. A particularly expedient solution provides for the slide guide planes to extend approximately at right angles to the spindle guide plane.
In order to obtain as space-saving a construction of the inventive lathe as possible, it is particularly favorable for the machining of the respective workpiece when the corresponding tool slide and the corresponding working spindle are arranged on the same side of the respective tool located in working position in relation to this workpiece.
The compact mode of construction is benefited further when all the tool slides which can be used for the machining of the workpiece held in one of the workpiece receiving means are arranged, when seen in longitudinal direction of the machine base member, essentially on the same side of the tools borne by them and able to be brought into working position.
Furthermore, the compact mode of construction is benefited, in addition, when the tool slides associated with the respective support section are arranged on a side of the tools borne by them which faces away from the respectively other support section.
With respect to the number of tool slides, no further details have been given in conjunction with the preceding explanations concerning the individual embodiments. In principle, it is sufficient to associate one tool slide with each working spindle in order to be able to machine a workpiece with each of the working spindles at the same time and independently of one another.
However, a particularly favorable solution provides for two tool slides to be associated with at least one support section, these tool slides offering the possibility of machining at one working spindle with two tools which are in engagement.
With respect to the arrangement of the tool slides relative to the respective support section, it is particularly favorable when the tool slides on at least one of the support sections are designed to be in mirror symmetry to a mirror plane. This solution has the great advantage that with it the production of the tool slides is very simple since a large proportion of identical parts or parts which merely have to be produced in mirror image can be used on account of the mirror symmetry.
It is even more advantageous for reasons of cost when a tool slide of the one support section is of an identical design to a tool slide of the other support section since, as a result, the number of identical parts can be increased even further and thus the costs reduced even further.
A particularly inexpensive solution with respect to the construction of the tool slides provides, in the case of two tool slides respectively associated with each working spindle, for two tool slides to be of an identical design and for the other two tool slides to likewise be identical to one another but designed so as to be in mirror symmetry to the other tool slides so that the optimum number of identical parts or parts merely different due to mirror symmetry can be achieved and thus a high reduction in costs occurs during the production of the inventive machine tool.
It is particularly favorable when the tool slides designed to be identical to one another are arranged on different slide support sides of the machine base member in order to be able to utilize the advantages of the alignment of the tool slides relative to the tools with respect to a compact construction of the inventive lathe.
With respect to the movability of the tool slides, no further details have been given in conjunction with the preceding explanations concerning the individual embodiments. One advantageous embodiment, for example, provides for at least one of the two tool slides associated with one of the working spindles to have a slide member movable in Z direction. This solution has the advantage that, as a result, the possibility of machining with two tools engaging on one workpiece at the same time is improved further since, for example, in the case of a relative movement in Z direction between tool and working spindle which is required for the machining with one tool a second movability in Z direction is present, in addition, due to the slide member of the other tool slide which is movable in Z direction and so both tools can be used with different relative movements in Z direction.
With respect to the arrangement of the slide guide means in longitudinal direction of the machine base member, the most varied of possibilities are conceivable. A particularly favorable solution provides for the slide guide means for the at least one tool slide to be respectively provided in the area of the support sections on the slide support sides.
It is particularly favorable when the slide guide means are arranged outside a longitudinal section of the machine base member, in which a working space is located, in which machining of the workpieces held in the two working spindles takes place.
With respect to the movement of the tool slides relative to the machine base member in the area of the slide support sides, no further details have been given in conjunction with the preceding explanations of the individual embodiments. One advantageous embodiment, for example, provides for the tool slides to be guided on the slide support sides of the machine base member so as to be movable in Z direction.
This solution has the great advantage that a very stable guidance of the tool slides relative to the machine base member can be realized, in particular, when large movements in Z direction are intended to take place.
This may be realized in a particularly favorable manner in that Z guide means for the movable guidance of the respective tool slide are provided on at least one slide support side.
Since Z guide means are generally provided on both support sections, the Z guide means are preferably arranged such that the Z guide means of the one slide support side of one support section are aligned with Z guide means of the same slide support side of the other support section.
It is particularly favorable when the Z guide means of the slide support sides of both support sections merge into one another so that, in principle, it is possible to have the tool slides traveling from one support section to the other.
In this respect, it would, for example, be possible to associate a tool slide not only with one working spindle but also with the other working spindle for the machining of the workpiece so that the flexibility can be increased during use of such a lathe for workpieces of different types.
Even when a connecting section is provided between the support sections, one advantageous embodiment provides for the Z guide means to extend beyond the connecting section and thus to extend continuously from the one support section to the other support section.
Alternatively to the solution, with which the movability in Z direction takes place between the machine base member and the tool slide held thereon, a different solution provides for at least one of the tool slides to comprise a Y slide member which is guided on the slide support side of the machine base member so as to be movable in Y direction.
This solution has the advantage that with it the Y axis, which is the axis used the least dynamically, is seated as close as possible to the machine base member and the X axis and, where applicable, also a Z axis, which are intended to be drivable with dynamics which are as great as possible, are integrated into the tool slide and the axes, which are intended to be driven with great dynamics, have masses which are as low as possible and thus a mass inertia which is as low as possible.
In this respect, it is preferably provided for Y guide means for the movable guidance of the respective tool slide to be provided on at least one slide support side.
It is particularly favorable with this design of the tool slide when at least one of the tool slides comprises a Z slide member which is movable in Z direction in relation to the Y slide member guided on the slide support side so that a movement in Z direction can also be realized but this movability is realized by the tool slide itself and so only slight masses still have to be moved by the Z axis drivable with dynamics which are as great as possible.
In order to likewise have as little moved mass as possible in the X axis used mainly for a rotary machining, it is preferably provided for each tool slide to comprise an X slide member which is guided for movement in X direction in relation to a slide member guided on the slide support side.
In conjunction with the preceding explanations concerning the individual embodiments it has merely been described how as space-saving a construction of the lathe as possible can be achieved by way of favorable arrangement of the tool slides.
In order to continue this procedure in a consistent manner, it is advantageously provided, for the machining of the respective workpiece, for the corresponding tool carrier and the corresponding workpiece receiving means, when seen in longitudinal direction of the machine base member, to be arranged essentially on the same side of the respective tool located in working position in relation to this workpiece.
Furthermore, it is favorable for a compact mode of construction when all the tool carriers which can be used for the machining of the workpiece held in one of the workpiece receiving means are, when seen in longitudinal direction of the machine base member, arranged essentially on the same side of the tools which can be brought into working position.
Furthermore, the compactness of the construction may also be advantageously achieved due to the fact that the tool carriers associated with the respective support section extend essentially in the direction of a side of the respective tools borne by it which faces away from the respectively other support section.
With respect to the number of tool carriers it is favorable, when as large a number of tools as possible is intended to engage on the workpiece, when two tool carriers are associated with at least one of the working spindles.
In order to obtain as large a number of identical parts as possible, the tool carriers are preferably designed such that they are constructed on a least one of the carrier sections so as to be in mirror symmetry to a mirror plane.
Such a mirror symmetrical construction of the tool carriers already allows the use of a large number of identical parts, in particular in the case of the rotary parts, and the parts to be designed in mirror symmetry can also be produced simply and inexpensively from a technical point of view.
The number of identical parts may be kept particularly high when a tool carrier of one support section is of an identical design to the tool carrier of the other support section since, as a result, the identical parts are used for the two tool carriers and thus a considerable reduction in costs is possible.
In order to combine the advantages of an inexpensive construction with as space-saving a construction as possible, it is preferably provided for the tool carriers which are of an identical design to one another to be arranged on different slide support sides of the machine base member.
In the case of a lathe with two working spindles and two tool carriers respectively associated with each working spindle, in particular, a particularly favorable solution provides for altogether two tool carriers to be of an identical design and for the other two tool carriers to be in mirror symmetry to them so that the number of identical parts is maximized.
With respect to the design of the tool carriers themselves, no further details have so far been given.
It is, for example, conceivable to provide a tool carrier which bears a single tool.
It is particularly favorable in order to keep the number of usable tools as high as possible when the tool carriers are designed as multiple tool carriers.
Such a multiple tool carrier could, for example, be a linear tool carrier.
Another solution provides for a double linear tool carrier pivotable, in addition, about an axis to be provided as multiple tool carrier.
A particularly favorable solution provides, however, for at least one of the tool carriers to be designed as a tool turret.
Such a design of a tool turret creates the possibility of making a large number of tools available for use.
In order to keep such a tool turret as slight as possible with respect to its radial extension and thus be able to position a turret housing as close as possible to the spindle during the machining of the workpiece, it is preferably provided for the turret to have a turret axis extending at an angle of less than 45xc2x0 to the respective spindle axis.
One possibility for realizing this would be for the turret axis to extend essentially parallel to the spindle axis.
This solution does, however, make it necessary, in particular, in the case of driven tools to separate the drive for the tools and the drive for the indexing of the turret for reasons of space when the diameter of the turret head is intended to be kept as small as possible and thus the turret axis is intended to be positioned as close as possible to the working spindle during the machining of the workpiece.
A particularly favorable solution provides, in this respect, for the turret axis to extend in an angular range of approximately 10xc2x0 to approximately 30xc2x0 in relation to the respective spindle axis so that it is possible on account of the inclined extension of the turret axis in relation to the spindle axis to provide the drive for driven tools and for the indexing of the turret coaxially to the turret axis.
In principle, it is conceivable within the scope of the inventive solution to arrange only tool carriers on the tool slides.
It is, however, also conceivable to provide on the tool slides auxiliary devices which are likewise considered within the scope of the present invention to be tools in the broadest sense.
One advantageous embodiment of an inventive lathe therefore provides for one of the tool slides to bear an element carrier for elements usable on the workpiece which creates the possibility of acting on one of the workpieces, in addition, during the machining.
The most varied of possibilities are conceivable as elements of the element carrier. For example, elements of the element carrier can be workpiece clamping elements or workpiece holding elements.
One particularly advantageous embodiment provides for the element carrier to bear a workpiece support element as element, with which an additional support of the respective workpiece during the machining is, for example, possible in order to either be able to machine more precisely or to be able to work with greater cutting forces.
In the simplest case, the workpiece support element is a center for supporting the workpiece; it is, however, also conceivable to provide any type of workpiece receiving means for supporting the workpiece instead of the center.
Alternatively or in addition to the provision of a workpiece support element it is preferably provided for the element carrier to bear a tool as element so that additional machinings are, for example, possible.
One advantageous embodiment provides for the element carrier to have not only workpiece clamping elements and/or workpiece guide elements and/or workpiece support elements but also tools and for different elements to be brought into use on the workpiece due to suitable movement of the element carrier relative to the workpiece.
In this respect, the most varied of solutions are conceivable in order to arrange the elements in a suitable manner.
It is particularly favorable when the elements are located with their central axes in a plane, preferably at a distance from one another, so that by arranging the plane such that this extends through the respective spindle axis of the workpiece the most varied of elements can be brought into use.
A solution which is particularly favorable for reasons of collision provides for the plane to extend parallel to the Y axis so that by displacing the element carrier in the direction of the Y axis the most varied of elements, i.e. workpiece clamping elements or workpiece guide elements or workpiece support elements or tools, can be positioned such that action on the workpiece can be realized with one of them.
It is particularly favorable when the element carrier has receiving means for the workpiece accommodated in the first workpiece receiving means and the second workpiece receiving means and thus the two workpieces can be supported at the same time by the element carrier.
In order to be able to machine a workpiece on both sides with the inventive machine tool as efficiently as possible, it is advantageously provided for at least one of the working spindles to be displaceable in Z direction to such an extent in the direction of the other working spindle that the workpiece can be transferred from one workpiece receiving means to the other workpiece receiving means.
With respect to the arrangement of the guide means for the working spindle displaceable in Z direction, it is preferably provided for these to each be arranged in the area of the support sections and, nevertheless, for the working spindle to be movable as far as the other working spindle to take over the workpiece.
In this respect it is particularly favorable when the guide means are arranged outside a longitudinal section of the machine base member, in which a working space is located, so that there is no necessity to guide these guide means through the working space.
In conjunction with the preceding explanations concerning the individual embodiments no further details have been given concerning the type of machining of the workpieces.
A customary machining of a workpiece which is held in a workpiece receiving means of the working spindle has merely be presupposed.
The inventive solution may, however, also be used particularly advantageously when a guiding device for longitudinal turning is associated with one of the working spindles so that the inventive lathe can operate as a special long-turning lathe.
In this respect, the working spindle can preferably be moved in Z direction relative to the guiding device in order to guide the workpiece through the guiding device, wherein machining takes place each time close to the guiding device by means of the tools held by the tool carriers.
In this respect, it is particularly favorable when the working spindle is guided on Z guide means arranged on the spindle support side of the support section.
In principle, it would be conceivable to configure the guiding device so as to also be movable in Z direction. For reasons of the simplicity of the construction and the precision of the machining it is, however, favorable when the guiding device is held stationary on the support section.
With respect to the movability of the other oppositely located working spindle, no particular details have been given in this respect. However, in order to likewise be able to provide for a transfer of the workpiece for machining on the second side, the oppositely located working spindle is preferably movable in Z direction relative to the support section and, in particular, displaceable to such an extent that its workpiece receiving means reaches the guiding device.
Additional features and advantages of the inventive solution are the subject matter of the following description as well as the drawings illustrating several embodiments.


The present invention relates to compositions and methods for the treatment of heart failure.

Heart failure may be described as the inability of the heart to adequately pump blood throughout the body, and is among the leading causes of death in industrialized countries; it is characterized by the desensitization of G protein-coupled receptor (GPCR) signaling, particularly the β-adrenergic receptor (βAR) system (Huang, Z M et al. Front Biosci (Landmark Ed). 2011; 16:3047-60). β-1 adrenergic receptor (β-1 AR) stimulation and β-2 adrenergic receptor (β-2 AR) stimulation are essential to adjust cardiac force generation in the presence of physiological stress (i.e., exercise) or pathological hemodynamic stress (Huang, Z M et al. Front Biosci (Landmark Ed). 2011; 16:3047-60). However, the long-term use of βAR agonists in the failing heart generates catecholamine toxicity, and instead, βAR antagonists (βAR-blockers) can improve mortality and function of the failing heart (Huang, Z M et al. Front Biosci (Landmark Ed). 2011; 16:3047-60). For example, U.S. Patent Application Publication 2010/0305213 A1 (Beddies et al.) relates to a method of reversing cardiac remodeling of animals with a pathological cardiac disorder by administering to the animal in need thereof a β-blocker. While phasic control of myocardial function by βAR signaling is certainly important for the normal heart, modulation of alternative pathways may provide additional therapeutic benefits.
Brain-derived neurotrophic factor (BDNF) induces a more "tonic" influence on myocardial function by specifically binding to its specific sarcolemmal tyrosine kinase B receptor, TrkB (Feng, N et al. Proc Natl Acad Sci USA. 2015; 112:1880-5). Cardiac BDNF/TrkB signaling can be induced by calorie restriction and improved physical activity in obese mice, with beneficial effects (Chen, R et al. The Internet Journal of Cardiovascular Research, 8:1), while deleting cardiac TrkB results in a marked reduction in both basal cardiac contraction and relaxation (Feng, N et al. Proc Natl Acad Sci USA. 2015; 112:1880-5). It has been suggested that β-1 and β-2 AR stimulation can promote BDNF production in neurons (Chen, M J et al. Cell Signal. 2007; 19:114-28), but whether BDNF is released from myocytes is unknown. Similarly, the importance of any autologous production of BDNF in myocytes, and its regulation by βAR signaling in the pathophysiology of heart failure also remains unknown.
Thus, there remains a need in the art for an improved understanding of the pathways affecting the failing heart, especially the BDNF/TrkB pathway, and for therapies that utilize these pathways in a beneficial manner. The present invention, compositions and methods for treating heart failure by administering a BDNF or TrkB agonist in combination with βAR-blockers, addresses this unmet need.

Methods for treating heart failure with a TRKB agonist

Temple University-Of The Commonwealth System of Higher

Education Johns Hopkins Technology Ventures


The present invention is to enable an adsorbent disposed in the vicinity of a tank port to be appropriately subjected to a purge when the adsorbent in a canister is subjected to the purge by air, thereby eliminating a non-desorption region of fuel vapor. In a fuel tank according to the present invention, a tank port (20t) that communicates with a space in a fuel tank body (10m), a purge port (20p), and an atmosphere port (20a) are formed in a container (21) of a canister (20) constituted by a container body (22) and a cover material (23), an inside of the container (21) of the canister (20) is configured to be partitioned to form passages (T1) and (T2) so that insides of the passages (T1) and (T2) are filled with an adsorbent (C), and the atmosphere port (20a) is provided on one end side in an air flow direction of the passages (T1) and (T2) and the tank port (20t) is provided on the other end side in the air flow direction of the passages (T1) and (T2) together with the purge port (20p).

A technique related to the fuel tank described above is disclosed in JP-A-2008-168767.
As illustrated in FIG. 8, a fuel tank body 100 of the fuel tank is configured by joining an upper shell 101 and a lower shell (illustration is omitted). A container body 122 of a canister 120 is molded integrally with the inner side of the upper shell 101 at the ceiling portion. In the container body 122 of the canister 120, an atmosphere port 120a and a purge port 120p are formed at positions of the ceiling portion of the upper shell 101, and an opening portion 122h is formed at the lower end position of the container body 122. In addition, the opening portion 122h of the container body 122 is configured to be closed by a cover material 124. A partition 122w that protrudes downward is formed at the ceiling portion of the container body 122, and the atmosphere port 120a and the purge port 120p are separated by the partition 122w to the left and the right. In addition, a vertical wall 124w that protrudes upward and is disposed parallel to the partition 122w of the container body 122 is provided in a cover material 124, and on the lower surface side of the cover material 124 positioned on the right of the vertical wall 124w, a tank port 120t including a bidirectional check valve is provided. That is, the inside of the container of the canister 120 is partitioned by the partition 122w and the vertical wall 124w and has a passage T formed to reach the purge port 120p and the tank port 120t from the atmosphere port 120a. In addition, the inside of the passage T of the canister 120 is filled with an adsorbent C to which fuel vapor is adsorbed.
During a stop of an engine, when the pressure in the fuel tank body 100 is increased due to a temperature rise or the like, air and the fuel vapor in the fuel tank body 100 flow into the canister 120 via a cut-off valve 111, a vapor passage 112, and the bidirectional check valve of the tank port 120t. In addition, the fuel vapor that flows in from the tank port 120t is adsorbed to the adsorbent C such that only the air diffuses to the outside from the atmosphere port 120a.
In addition, during driving of the engine, a negative pressure is applied to the purge port 120p that communicates with an intake passage (illustration is omitted) of the engine, air flows into the canister 120 from the atmosphere port 120a, the air flows in the passage T to cause the adsorbent C to be subjected to a purge, and thus the fuel vapor is desorbed from the adsorbent C. In addition, the fuel vapor desorbed from the adsorbent C and the air are supplied to the intake passage of the engine from the purge port 120p.
JP-A-2008-168767

Fuel tank and method of manufacturing the same


An information handling system, method, and processor that detects a store instruction for data in a processor where the store instruction is a reliable indicator of a future load for the data; in response to detecting the store instruction, sends a prefetch request to memory for an entire cache line containing the data referenced in the store instruction, and preferably only the single cache line containing the data; and receives, in response to the prefetch request, the entire cache line containing the data referenced in the store instruction.

Embodiments presented herein are related to handling and processing data and/or improving an information handling or data processing system, and more specifically, to identifying and handling of special store instructions by a processor, including in an embodiment prefetching special store instructions, for example, stack accesses by a processor.
With advancements in information technology and the wide use of the Internet to store and process information, more and more demands are placed on the acquisition, processing, storage and dissemination of information by computing systems. Computing systems are being developed to increase the speed at which the computers are able to execute increasingly complex applications for business, personal use, and entertainment. Overall computer system performance is affected by each of the key elements of the computer structure, including the performance/structure of the processors, any memory caches, input/output (I/O) subsystems, efficiency of the memory control functions, the performance of the memory devices and systems, and any associated memory interface elements, and the type and structure of the memory interconnect interfaces.
The constantly increasing speed of processors which execute increasingly complex applications places more rigorous performance demands on all of the other subsystems in the computer. Computing demands require the ability to access data at increasing speeds and efficiency. One technique to decrease latency in processors is to prefetch data so that the data is local to the processor before it is needed. Traditional prefetchers use access patterns found using data or instruction addresses to prefetch data into some level of cache in the processor cache hierarchy. It would be advantageous to increase prefetching from memory subsystems data into the cache hierarchy of a processor to reduce processor latency.

Store prefetches for dependent loads in a processor

International Business Machines Corporation


A package terminal is provided, which comprising: a base; an end portion with a first section; and a bent portion having a C-shape bend with a gradual change section, wherein the bent portion includes a first end and a second end, the first end is connected to the end portion, the second end is connected to the base, the bent portion includes a second section, and an area of the second section is smaller than an area of the first section.

With the increasing requirement of the power system for efficiency, power density, reliability, installing convenience, the power device develops from the discrete devices to the modular devices. The power modularization becomes an important trend in the power electronics industry. Due to a number of semiconductor chips and some logic, control, detection and protection circuits being integrated therein, the power device can be conveniently applied. The system volume and the development time are decreased, and the reliability of the system is greatly improved.
Due to the harsh environment for product application, the power electronic product may have structure failures after long working hours. Thus more and more attention is paid to improving the reliability of the power electronic product. The optimal design of the structural stress is important for improving the reliability of the power electronic product.
In the related art, the package terminal of the package module of the power device is shown in FIGS. 1 and 2A-2C. The package terminal includes an end portion 91 and a base 93. The base 93 of the package terminal is connected through the solder 94 to the substrate 95, such as a Direct Bonded Copper (DBC) substrate, a Direct Bonded Aluminum (DBA) substrate, a metallized ceramic substrate or a Low Temperature Co-fired Ceramic (LTCC) substrate. The end portion 91 is bonded to the PCB 96. Thereby the signal transmission between the power device and the PCB 96 is achieved. By the impact of the structure and the application of the package terminal, the failure risks of the package terminal in the related art are shown as follow.
Firstly, due to the different coefficient of thermal expansion of various materials in the application, the thermal stress is generated in the package module. Because strength of the material of soldering interface is lower, the fracture of the soldering layer between the package terminal and the substrate becomes one of the major failure forms.
Secondly, due to the manufacture tolerance and the location deviation of the terminal, the fracture of the soldering layers can also be generated from the continuous mechanical interference force after assembly. In addition, in the storage and service process, the damage at the soldering layers can also be generated by various external mechanical vibrations.
In order to overcome the above drawbacks, many technical solutions are proposed. The Z-shape terminal is shown in FIGS. 2A-2C. The Z-shape bend is applied to the root (i.e., the bent portion 92) of the package terminal to release the stress. The stress is significantly reduced after the design of FIGS. 2A-2C is applied.
The experimental value of the mechanical property of the Z-shape terminal is shown in FIG. 3, in which the horizontal axis shows the deflection (mm), and the vertical axis shows the normal force (kgf). In the package terminal (e.g. Z-shape terminal) in the related art shown in FIG. 3, the elastic property in the two directions perpendicular to each other is very different (Dir.1 indicates the bending direction; Dir.2 indicates the direction perpendicular to the bending direction). As shown in FIG. 3, the solid line presents the mechanical property in Dir.2 direction, the dashed line presents the mechanical property in Dir.1 direction, the elasticity value of K (the ratio value of the vertical axis value and the horizontal axis value) is in a range of 0.080 to 0.394 kgf/mm, which means the stress-releasing effect in Dir.1 direction is better than that in Dir.2 direction.
Based on the above experimental value, as the direction of the external force is highly uncertain during the actual application, the installing direction of the package terminal is thus randomly allocated in general. The obvious drawback is that when the external force direction is concordant with the direction perpendicular to the bending direction, the soldering point generally withstands a relatively large stress, which may cause the risk of failure. Thus, it is necessary to further improve the reliability of the package terminal in the related art.

Package module, package terminal and manufacturing method thereof


Systems and methods for resource utilization management, such as resources available through one or more accessible resource facilities. Embodiments provide resource utilization management systems and methods which facilitate user-controlled reservation, access, and accounting for resource utilization. Embodiments implement an electronic user key-based infrastructure to enable access to and accounting for resources. Embodiments include optical recognition or geolocation for each resource for which resource utilization management is provided. A user device, such as a smart phone, personal digital assistant (PDA), or tablet computer, executing a resource utilization management application, may be configured to provide a resource key device which is operable to scan the resource for accessing and relinquishing that resource, whether on an ad hoc and/or reservation basis.

A number of different space resources have been made available to various users in the past. Such space resources have included shared space resources which are accessible to a number of unaffiliated users simultaneously and exclusive space resources which, although being available for use by any number of unaffiliated users, are only accessible to a particular user at any particular point in time. Management of the utilization of such resources has, however, not been robust.
For example, corporate and airline lounges provide shared space resources which have often been made available to users at locations throughout the world. However, the access to such shared spaces has typically been membership based, whereby membership is required for entry into the lounge premises. A member user may thus present credentials to a receptionist or other gatekeeper and be permitted access to the lounge on an ad hoc basis. Once permitted access, the user is typically permitted complete access to the shared space facilities. Thus, the membership charges for access to the resource are generally based upon a "one-size-fits-all" pricing model (e.g., an annual membership fee, a monthly membership fee, or a daily access fee), typically determined based upon the average or expected utilization of the shared space resource and its amenities. Accordingly, although a user may be required to separately pay for certain items purchased at a point of sale within the shared space resource (e.g., beverages or meals consumed by the user), a user is not enabled to pay for only those aspects of the shared space resource that the user actually avails him/herself of.
Although an operator of a shared space resource may be able to track a user entering the space, such as through the aforementioned presentation of credentials, the operator is often unable to track the user's exit. For example, the presentation of credentials for access is cumbersome enough that user's will not tolerate a similar process upon departing the space resource. Moreover, even when a user's entrance and exit of the space resource are captured, present solutions fail to provide information regarding the users' behavior within the space resource (e.g., the particular areas of the space which are utilized, the amenities the user does/does not avail themselves of, etc.). Accordingly, the operator of the space resource is provided with little information regarding the actual use of the space resource and its amenities by the users.
As another example, meeting rooms are often provided by hotels and airport fixed base operators (FBOs), whereby a user may have exclusive access to the space resource for some period of time. The reservation and access process, however, is typically tedious and limited. For example, a user must often call and speak with a customer service agent, or engage in an email exchange, to determine the availability of the space resource, provide payment information to reserve the space, and then manually check in with a customer service agent, often again providing the payment information, upon arrival at the space.
Although some providers of such exclusive access space resources have provided some level of automation for reserving a space resource, such attempts are generally limited to a simple calendar for a particular space resource showing its reserved/open times. The user may be enabled to select a time for their reservation and denote that on the calendar. However, if the desired time is not available the user must generally manually select another space resource (if one is even offered) to determine if the desired time is available. Moreover, the user of such a space resource calendar must typically still manually check in with a customer service agent upon arrival at the space.
Moreover, although a user may be provided exclusive use of the space resource, the user is nevertheless not charged only for their utilization of that space resource. For example, a user is typically charged based upon their reservation of the space resource (e.g., a number of hours or days that the user reserved the meeting room for their exclusive use), rather than the actual time that they availed themselves of the space resource. Accordingly, if a user relinquishes the space resource prior to the end of their reservation the user is charged for the entire time of the reservation. This is often despite another user being ready and willing to utilize that space resource. This result may stem from the often cumbersome and generally slow process by which the utilization of the space resource is managed, whereby the first user's relinquishment of the space and the second user's desire to utilize the space are not able to be identified and connected in time to facilitate the transition in use of the space resource.
Existing solutions have been unable to satisfactorily provide for ad hoc utilization of exclusive space resources. That is, although shared space resources, wherein a large number of users are permitted to simultaneously utilize the space resource, enable users to access the space resource on an spontaneous, ad hoc basis, exclusive space resources are generally most effectively utilized via prior reservation of the space resource. For example, the process of determining availability of the space resource (e.g., due to upcoming reservations by other users), blocking a time period for an ad hoc user, implementing a payment methodology, and granting physical access to the space resource often discourages many casual, ad hoc uses (e.g., spontaneous uses of an hour or less) of the space.

This patent is subject to a terminal disclaimer.


A system and method for modifying the appearance of graphical elements in an application (“app”) to promote cross-brand synergy for a company is described. In one embodiment, the app displays a top-level banner menu that includes a plurality of selectable icons. Each selectable icon serves as a link to a landing page for a specific product group (“brand”) of the company. When the user initially accesses the app, each of the selectable icons appear greyed-out. When a user selects one of the icons in order to navigate to the landing page for the corresponding product group, the app responds by altering the appearance of that icon from a greyscale to a chromatic format. In some cases, the color applied to the icon corresponds to the color associated with the selected brand.

The embodiments relate generally to methods and systems for adjusting the stylistic appearance of elements across multiple application channels presented to a user on a screen via a graphical user interface ("GUI").
Multi-business firms or vertical integration companies in a supply chain are united through a common owner (e.g., a conglomerate). In larger enterprises, each department or team can operate as a separate and distinct group or sub-company that pursues and develops its own set of goals and initiatives. These companies exist across many industries such as industrial goods, finance, telecommunications, etc. In some cases, these companies may desire to realize a synergy between their sub-companies (cross-business synergies) in order to increase corporate performance. In addition to raising their efficiency and reducing their costs, companies increasingly focusing on achieving profitable returns have found that collaborating across their internal businesses is a major lever of growth, particularly in saturated markets. In other words, it can often work to a company's advantage to align the strategies of two or more of its businesses. For example, such an approach can reduce interunit competition as well as offer a powerful and effective tactic in countering competitive threats. In particular, marketing strategies for multiple brands can benefit from cross-business synergy. However, implementation of this approach through online media marketing has been challenging.
Currently, many conglomerates include brand divisions that operate independently, resulting in separated responsibility for marketing design for different product groups and a lost opportunity for cross-promotion. Such a separation can also be associated with an erratic, inconsistent user experience for customers attempting to engage with two or more brands owned by the same enterprise, and lead to a potential disconnect with customers. It is therefore highly desirable for a multi-business firm to employ a synergistic, unified marketing approach to enhance the promotion of each of its brands while ensuring each individual brand retains its own unique identity that is readily and consistently recognizable by its customers.
There is a need in the art for a system and method that addresses the shortcomings discussed above.

Method and system for enriching cross-brand user in interface experiences


A method for the formation of monomolecular adsorption films of a silane compound having a diacetylene bond is described. The silane compound is chemically adsorbed on a substrate through .dbd.SiO-- bonds and the resultant film is significantly reduced in number of defects such as pinholes. When the monomolecular film is irradiated with actinic light, the diacetylene bonds are convered into a conjugated diacetylene polymer. Similarly, a built-up film of a desired number of monomolecular layers of a silane compound having an acetylene bond formed on a substrate by chemical adsorption and a corresponding number of monomolecular layers of an aliphatic acid or alcohol having an acetylene bond and alternately deposited on the first-mentioned layer is also provided.

1. Field of the Invention
This invention relates to a method for forming a monomolecular adsorption film of a material having diacetylene bonds on a substrate by chemical adsorption and also to a method for forming built-up films of monomolecular layers wherein diacetylene bonds or polydiacetylene bonds are formed in the films. These films have wide utility as a conductive or insulating film in the fields of semiconductive industries.
2. Description of the Prior Art
Attention has been heretofore directed to polydiacetylene materials since they have a very long conjugated polydiacetylene bond in the molecule and exhibit a non-linear optical effect and electric conductivity. These materials are considered to have utility as a functional material. For obtaining these polymers from monomer molecules in the form of crystals which are more functional, studies have been made using the Langmuir-Blodgett technique or vacuum deposition technique.
In general, in order to impart good optical properties to polydiacetylene material, it is necessary that the polymer have a very long polydiacetylene bond. When the Langmuir-Blodgett technique is used, the molecular orientation and density of the monomer can be arbitrarily controlled. This is advantageous in that the reactivity of the monomer by irradiation of actinic light ca be easily controlled. However, when the monomolecular film of the polydiacetylene is formed by the technique, the diacetylene monomer on the water surface in the Langmuir-Blodgett trough is crystallized to form defects in spite of the surface pressure from outside. This leads to the problem that the conjugation length after the polymerization is limited.
On the other hand, the formation of polydiacetylene by the vacuum deposition technique is advantageous in that the film thickness can be appropriately controlled. However, the drawback of the technique is that when heated excessively, the monomer decomposes.
In U.S. Pat. No. 4,673,474, there is mentioned chemical adsorption but this patent does not particularly set out the type of material to be adsorbed and adsorption conditions for such a material.

Method for the formation of monomolecular adsorption films or built-up films of monomolecular layers using silane compounds having an acetylene or diacetylene bond

Matsushita Electric Industrial Co., Ltd.


A nursing device for feeding infants with a cleft lip and/or cleft palate includes upper and lower portions. The upper portion includes a bottle with an opening in its top for containing a liquid, a nipple and a screw cap for maintaining the nipple in sealing engagement with the opening. A submersible pump is disposed in the bottom of the bottle and connected to an opening in the nipple by a tube. A lower portion of the device includes a motor and a magnetic coupling for activating the pump. A microprocessor control timer includes means for regulating the timing and flow of a feeding cycle with a display for help in regulating the feeding cycle. Alternatively, the motor, pump, controls, and power supply may be disposed at the top of the bottle as a removable unit.

Cleft lips and cleft palates are common birth defects and require special attention during the initial six months of a child's life. To be more specific, there are three types of cleft lip, i.e., unilateral incomplete, unilateral complete and bilateral complete. There are also three types of cleft palates, namely the soft palate only, the unilateral complete, and the bilateral complete. However, each of the cleft lip and/or cleft palate malformations involves leakage of air from the mouth through the nose, which causes an infant to be unable to suck, causing regurgitation of fluids through the nose and difficulty in swallowing and breathing.
For a period of about six months until the infant has matured enough for corrective surgery, the infant must be fed. Feeding is not only the most immediate problem encountered in the daily care of an infant with a cleft lip and/or cleft palate, but it is one of the more difficult to solve and the most necessary for the survival of the child.
A U.S. Pat. No. 4,856,663 of Epp discloses a nursing device for infants with a cleft lip or cleft palate. As disclosed, the device comprises a solid duckbill-shaped shield with an incorporated nipple on its underside, together with means for interconnecting the nipple and a baby bottle or breast. The shield acts to seal the cleft palate while keeping the nipple from collapsing into the cleft palate and cleft lip to allow an infant to suck liquids from a bottle or the breast.
A French Patent No. 2,622,102 A1 of Michel Grateau discloses a control device with feedback for artificial feeding systems for force-feeding of infants. The device that is fitted into a nursing bottle allows a caregiver to control the feeding device.
A more recent U.S. Pat. No. 6,033,367 of Goldfield discloses a smart bottle and system for neonatal nursing. The system for diagnosing or monitoring sucking/swallowing/breathing of an impaired neonate includes a processor for receiving a signal from a breath sensor. The system develops an output for intraoral tactical or flow control feedback. In a feeding or monitoring embodiment, the processor applies a signal to control a liquid feeding valve, which supplies nutrients through a feeding nipple. In another embodiment, adapted for manual feeding, the processor displays a waveform indicative of the breath or airflow sensor output, and a manually operated pressure bulb is provided to allow a nurse to apply arrhythmic muscular pressure stimulus via a feeding or surrogate nipple in a manner visually synchronized with the displayed breath activity.
Notwithstanding the above, it is presently believed that there is a need for and a commercial potential for an improved feeding device in accordance with the present invention. There should be a demand for such devices because the devices pump measured amounts of milk in pre-selected periods of time to overcome the difficulties in feeding children with cleft lips and cleft palates. Further, the devices in accordance with the invention include a nipple so that a baby can develop an ability to suck and, at the same time, to exercise and massage the muscles of the face. In some cases, a baby cannot cope with swallowing because of the defect in the palate. However, with the devices in accordance with the present invention, a nurse or mother can pump measured amounts of nutrient so that the child obtains enough nutrients in enough time without adversely affecting their general condition.
The devices in accordance with the present invention are also applicable for pre-natal infants, i.e., those born before 32 weeks. The suction reflex in such infants may not be fully developed, and the child may choke on nutrient from an ordinary bottle. Such choking may lead to infection. Further, the use of the present invention may allow the infant to leave the hospital at an earlier time, since the mother will be able to feed the child at home. Another advantage of the device is that it has a nipple that helps in developing a child's ability to suck.
Further, children with special needs that have a problem with swallowing may also benefit from the use of the devices in accordance with the invention. Still further, the devices avoid a problem associated with spilling relatively large amounts of milk during feeding. Also, such devices can be used to feed fluid foods to elderly people who are having feeding problems.


A method and apparatus for providing flow into a processing chamber are provided. In one embodiment, a vacuum processing chamber is provided that includes a substrate support pedestal disposed in an interior volume of a chamber body, a lid enclosing the interior volume, a gas distribution plate positioned below the lid and above the substrate support pedestal, and a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate.

1. Field of the Invention
Embodiments of the present invention relate to a plasma processing system. More particularly, embodiments of the invention relate to a plasma processing chamber that induces a circulating flow of gases just prior to distributing the gases through a showerhead.
2. Background of the Related Art
Integrated circuits have evolved into complex devices that can include millions of components (e.g., transistors, capacitors, resistors, and the like) on a single chip. The evolution of chip designs continually requires faster circuitry and greater circuit density. The demands for greater circuit density necessitate a reduction in the dimensions of the integrated circuit components. The minimal dimensions of features of such devices are commonly referred to in the art as critical dimensions. The critical dimensions generally include the minimal widths of the features, such as lines, columns, openings, spaces between the lines, and the like.
As these critical dimensions shrink, process uniformity across the substrate becomes paramount to maintain high yields. One problem associated with a conventional plasma etch process used in the manufacture of integrated circuits is the non-uniformity of the etch rate across the substrate, which may be due, in part, to a lateral offset between the reactive species and the substrate being etched. One factor contributing to the tendency of the reactive species to be offset from the center of the substrate is inability for completely eliminate skew or azimuthal non-uniformity of gases provide to the processing chamber through a gas distribution plate. As gases may exit the gas distribution plate preferentially to one area of the chamber relative to another, the reactive (or other) species may become concentrated or starved in those areas, causing an offset, skew or azimuthal non-uniformity of processing results. This offset contributes to a loss of etch uniformity over the surface of the substrate which may significantly affect performance and increase the cost of fabricating integrated circuits.
Thus, as linewidths and critical dimensions continue to shrink, the need remains for a continued improvement in process uniformity in order to enable fabrication of next generation devices at a practical cost of manufacture. Therefore, there is a need in the art for an improved method and apparatus for etching material layers during the manufacture of integrated circuits.

Plasma processing chamber with enhanced gas delivery