It is an object of the present invention to provide an ultrapure water producing apparatus with reduced problems resulting from impurities generated after replacement of unit apparatuses.

1. Field of the Invention
The present invention relates to an ultrapure water producing apparatus, and more particularly to an ultrapure water producing apparatus having a replaceable unit apparatus.
2. Description of the Background Art
In an industry where ultrapure water is used such as the semiconductor industry or the medical industry, it is becoming necessary to remove impurities at the level of ppt (parts per trillion) to ppq (parts per quadrillion). For removal of impurities at this level, there are introduced unit apparatuses such as an ultraviolet oxidation unit with low pressure mercury lamp, an ion exchange resin and ultrafiltration equipment.
Since such unit apparatuses are consumable products, they need to be replaced at regular time intervals, however, elution of impurities from these unit apparatuses is detected just after the replacement. This eluted component is not acceptable for impurity control at the level of ppt to ppq. However, it is in fact extremely difficult to reduce the eluted component to zero.
A first aspect of the present invention is directed to an ultrapure water producing apparatus. The ultrapure water producing apparatus comprises: an ultraviolet oxidation unit and an ion exchanger provided in this order from the upstream side of a direction in which pure water flows; an oxidant decomposition unit for sampling pure water already undergone ion exchange in the ion exchanger, thereby decomposing all of oxidants included in sampled pure water into dissolved oxygen; and a feedback system for measuring a first dissolved oxygen concentration in the pure water already undergone ion exchange and a second dissolved oxygen concentration in pure water already decomposed in the oxidant decomposition unit to calculate a third dissolved oxygen concentration indicating a difference between the first and second oxygen concentrations, thereby adjusting the amount of ultraviolet light of the ultraviolet oxidation unit based on the third dissolved oxygen concentration.
According to a second aspect of the present invention, in the ultrapure water producing apparatus of the first aspect, the feedback system includes: a first dissolved oxygen concentration meter for detecting the first dissolved oxygen concentration; a second dissolved oxygen concentration meter for detecting the second dissolved oxygen concentration; and a control system for calculating the third dissolved oxygen concentration upon receipt of data from the first and second dissolved oxygen concentration meters and controlling the amount of ultraviolet light of the ultraviolet oxidation unit.
According to a third aspect of the present invention, in the ultrapure water producing apparatus of the first aspect, the oxidant decomposition unit includes a system for alkalizing the sampled pure water already undergone ion exchange by introducing an alkali component.
According to a fourth aspect of the present invention, in the ultrapure water producing apparatus of the first aspect, the oxidant decomposition unit includes a system for bringing the sampled pure water already undergone ion exchange into contact with platinum or activated carbon.
A fifth aspect of the present invention, an ultrapure water producing apparatus includes: at least two ion exchangers provided in series; a main route provided to flow pure water in the order that the at least two ion exchangers are provided; and a plurality of bypass routes connected to the main route for flowing pure water in the order different from that in which the at least two ion exchangers are provided.
According to a sixth aspect of the present invention, in the ultrapure water producing apparatus of the fifth aspect, the at least two ion exchangers at least include: a first ion exchanger provided on the uppermost stream side; and a second ion exchanger other than the first ion exchanger, discharging first processed pure water, the plurality of bypass routes include a first bypass route, a second bypass route and a third bypass route, the first bypass route supplying the first processed pure water to the at least two ion exchangers except the second ion exchanger discharging the first processed pure water, the second bypass route sending, to the main route, second processed pure water discharged from the at least two ion exchangers except the second ion exchanger which have been supplied with the first processed pure water, and the third bypass route supplying pure water to each of the at least two ion exchangers except the first ion exchanger.
According to a seventh aspect of the present invention, the ultrapure water producing apparatus of the sixth aspect further comprises: an ultrafiltration film provided downstream of the at least two ion exchangers; a fourth bypass route for supplying permeate pure water discharged from the ultrafiltration film to the at least two ion exchangers; and a metal concentration meter for detecting a metal component of the permeate pure water flowing through the fourth bypass route.
According to an eighth aspect of the present invention, in the ultrapure water producing apparatus of the sixth aspect, the main route includes a plurality of main route valves provided on its route for interrupting supply of pure water to the at least two ion exchangers by each one of the at least two ion exchangers, and the plurality of main route valves are closed when flowing pure water through the first to third bypass routes.
A ninth aspect of the present invention is directed to an ultrapure water producing apparatus. The ultrapure water producing apparatus comprises a total organic carbon meter for decomposing an organic substance by applying ultraviolet light to pure water, thereby measuring an organic substance concentration of generated carbon dioxide, wherein the total organic carbon meter includes an oxygen dissolution unit provided on an inlet side of pure water for dissolving oxygen in pure water supplied to the total organic carbon meter.
According to a tenth aspect of the present invention, in the ultrapure water producing apparatus of the ninth aspect, the oxygen dissolution unit includes a system for bubbling, in pure water, oxygen gas or ozone gas not including an organic substance.
According to an eleventh aspect of the present invention, in the ultrapure water producing apparatus of the ninth aspect, the oxygen dissolution unit includes a system for cooling pure water supplied to the total organic carbon meter, thereby supplying cooled pure water with oxygen gas or ozone gas not including an organic substance.
A twelfth aspect of the present invention is directed to an ultrapure water producing apparatus comprising a carbon dioxide dissolution unit provided between an outlet of pure water already undergone final processing and a use point to which pure water is finally supplied, for dissolving carbon dioxide in the pure water already undergone final processing.
According to a thirteenth aspect of the present invention, in the ultrapure water producing apparatus of the twelfth aspect, the carbon dioxide dissolution unit includes a system for bubbling carbon dioxide gas in pure water.
According to a fourteenth aspect of the present invention, in the ultrapure water producing apparatus of the twelfth aspect, the carbon dioxide dissolution unit and the use point are connected by a conductive piping.
In the ultrapure water producing apparatus according to the first aspect, the third dissolved oxygen concentration is a value reflecting the amount of oxidants remaining in the pure water already undergone ion exchange. The use of the remaining amount of oxidants as an index for adjusting the amount of ultraviolet light of the ultraviolet oxidation unit allows more appropriate impurity control compared to a conventional apparatus having no other way but to take only total organic carbon concentration or dissolved oxygen concentration as an index.
In the ultrapure water producing apparatus according to the second aspect, there can be obtained a specific structure of the feedback system for adjusting the amount of ultraviolet light of the ultraviolet oxidation unit.
In the ultrapure water producing apparatus according to the third aspect, the pure water already undergone ion exchange is alkalized to thereby decompose oxidants, which allows the oxidant decomposition unit to have a simple structure.
In the ultrapure water producing apparatus according to the fourth aspect, oxidants are decomposed by the catalytic effect of platinum or activated carbon, which allows the oxidant decomposition unit to have a low running cost.
The ultrapure water producing apparatus according to the fifth aspect comprises at least two ion exchangers provided in series and a plurality of bypass routes for flowing pure water in the order different from that in which the at least two ion exchangers are provided, so that the ion exchangers are replaced one by one. During the period in which a brand-new ion exchanger elutes a metal component, its discharge is given to the remainder of the ion exchangers to remove the metal component, which can prevent pure water including the metal component eluted from the brand-new ion exchanger from being supplied to the use point.
In the ultrapure water producing apparatus according to the sixth aspect, except when one of the ion exchangers provided on the uppermost stream side is replaced, pure water is first supplied to a brand-new ion exchanger through the third bypass route. During the period in which the brand-new ion exchanger elutes a metal component, its discharge is given to the remainder of the ion exchangers to remove the metal component and send it to the main route through the second bypass route, thereby preventing pure water including the metal component eluted from the brand-new ion exchanger from being supplied to the use point.
In the ultrapure water producing apparatus according to the seventh aspect, after replacing an ultrafiltration film, removal of a metal component by supplying the permeate pure water to the at least two ion exchangers through the fourth bypass route is continued until the metal component eluted from the ultrafiltration film reaches a predetermined concentration, which prevents pure water including the metal component eluted from a brand-new ultrafiltration film from being supplied to the use point.
The ultrapure water producing apparatus according to the eighth aspect achieves a specific structure in which it is only after supply of pure water to a brand-new ion exchanger that the remainder of the ion exchangers can be supplied with pure water.
In the ultrapure water producing apparatus according to the ninth aspect, since the total organic carbon meter includes an oxygen dissolution unit for dissolving oxygen in pure water to be measured, an organic substance can be completely decomposed even when there is little oxygen dissolved in pure water, allowing an accurate calculation of organic carbon concentration.
The ultrapure water producing apparatus according to the tenth aspect allows the oxidant decomposition unit to have a relatively simple structure.
The ultrapure water producing apparatus according to the eleventh aspect comprises the system for cooling pure water, which makes it possible to bring pure water into the state in which oxygen gas or ozone gas has an increased solubility. Thus, oxygen gas or ozone gas can be dissolved effectively.
The ultrapure water producing apparatus according to the twelfth aspect comprises the carbon dioxide dissolution unit for dissolving carbon dioxide in pure water already undergone final processing. This can reduce the specific resistance of pure water and make its electrical conductivity good, thereby preventing the piping to the use point from being charged. As a result, this prevents electrically charged particulates from being electrostatically adsorbed on the piping and gathering to form a particle, and prevents sudden desorption of this particle due to variations in pressure or variations in the amount of flow. Therefore, it is possible to reduce particles in pure water.
The ultrapure water producing apparatus according to the thirteenth aspect allows the carbon dioxide dissolution unit to have a relatively simple structure.
In the ultrapure water producing apparatus according to the fourteenth aspect, the carbon dioxide dissolution unit and the use point are connected by the conductive piping, which allows to more effectively prevent the piping from being charged.
An object of the present invention is to provide an ultrapure water producing apparatus with reduced problems resulting from impurities generated after the replacement of unit apparatuses.
These and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings.

Abstract: A TOC-UV (1), a CP (2) and a UF film (3) are provided in this order from the upstream side of a pure water supply route. Ultrapure water flowing through the UF film (3) is supplied to a use point. A branch route branched from the pure water supply route is provided downstream of the UF film (3). A dissolved oxygen concentration meter (M1) is interposed in the branch route for measuring dissolved oxygen concentration in ultrapure water passed through the UF film (3). The branch route is connected to an oxidant decomposition unit (11). Oxidants included in ultrapure water flowing through the branch route are all converted into DO at the oxidant decomposition unit (11).


A marker has a cap with a reverse clip, which opens toward the closed end of the cap, that is, in the same direction as the force applied to remove the cap, thereby allowing the cap to be removed with one hand without dislodging the reverse clip from its attachment. To facilitate single-handed removal and replacement of the marker, the cap has a semi-tubular cap extension, terminating in a flange from which the reverse clip extends. The cap extension acts as a guide for replacing the marker in the cap with one hand, while the flange provides a flat surface against which downward thumb pressure can be applied to separate the cap from the marker as the latter is pulled up with the other fingers of the same hand.

The present invention relates to the field of markers and pens, and more particularly to caps used to cover and protect the writing tips of markers and pens. As used herein, the term "marker" will be used to refer to any ink-based writing or marking implement.
Felt-tipped markers are commonly found in the tool belts of carpenters and other craftsmen to mark measurements on building materials. The problem faced by craftsmen in using such markers involves the removal of the cap, which requires the use of both hands—one to remove the cap and the other to hold the writing portion of the marker. This forces the craftsman to either lay down the tool or material that he/she is working with, or use his/her teeth to pull off the cap, thereby risking injury and/or dental damage.
The present invention provides an alternative cap design, which secures the marker/pen in place in a user's pocket or tool pouch, but allows the user to remove the marker/pen from the cap with one hand.


An image forming apparatus includes: a plurality of image forming units each with an image carrier on which an electrostatic latent image is formed, and each with a developing member for developing process on the electrostatic latent image, wherein the image forming apparatus superimposes toner images of the respective colors to form a composite color image; when images on a plurality of pages are formed, the developing members of the respective colors are started or stopped in response to presence or absence of latent images of the respective colors on a page that is targeted for image formation; and when the image forming unit starts to be driven, a developing member, corresponding to a color whose latent image is not to be formed on a first page of the plurality of pages, is not started.

1. Field of the Invention
The present invention relates to an image forming apparatus such as a copying machine, a facsimile, and a printer employing electrophotography, or a Multi Function Peripheral (MFP) having the functions of the copying machine, facsimile, and printer, and image forming method applied in such apparatuses.
2. Description of the Related Art
Image forming apparatuses of recent years employing electrophotography include an increasing number of those that can form color images such as color copying machines and color printers. The image forming apparatuses particularly include an increasing number of tandem image forming apparatuses each with a plurality of developing units provided with corresponding photosensitive elements. In the tandem image forming apparatus, images are formed on the photosensitive elements with corresponding single-color toners. The single-color toner images thereby formed are transferred onto an intermediate transfer member while being sequentially superimposed on one another to form a composite color image. Then, the composite color image is transferred at one time on a recording sheet.
In order to form a two-color image or a three-color image in the aforementioned image forming apparatuses, an image forming unit corresponding to a color that is not to be used may be started. This unwanted driving operation results in wasteful power consumption while unnecessarily shortening the lifetime of each parts. According to the structure disclosed in Japanese Patent Application Laid-open No. H9-138540, it is determined if an output image includes image writing in a color except black, and if it is determined that there is no image writing in a color except black, a developing and stirring device for the color except black is stopped while an output image is produced. According to the structure disclosed in Japanese Patent Application Laid-open No. 2001-343809, an image carrier driving unit and a developing driving unit are controlled such that a developing unit of an image forming unit that is not intended to be used in image formation is stopped during the image formation. Further, the structure disclosed in Japanese Patent Application Laid-open No. 2006-171233 includes a contact section by which an intermediate transfer belt and a plurality of photosensitive elements are selectively caused to come into contact with each other, and separated from each other. In this structure, a photosensitive element corresponding to an intended color and the intermediate transfer belt are caused to come into contact with each other, while a photosensitive element corresponding to an unintended color and the intermediate transfer belt are separated from each other.
In Japanese Patent Application Laid-open No. 2006-171233, a photosensitive element corresponding to an unintended color is separated from the intermediate transfer belt. This should be done by an additional driving structure, resulting in cost increase and upsizing of the apparatus. Japanese Patent Application Laid-open No. 2006-171233, as well as Japanese Patent Application Laid-open No. H9-138540 and Japanese Patent Application Laid-open No. 2001-343809, does not place consideration on how to deal with a situation where a color to be used for image formation changes from one page to another page when images are to be formed sequentially on a plurality of pages. According to Japanese Patent Application Laid-open No. H9-138540, a developing and stirring device for black as an initial color is always started; therefore, toner of black or of an initial color is always stirred even if black or the initial color is not used for image writing.
A problem to be solved by the invention is to prevent deterioration due to unnecessary stirring of toner or a developer of a color that is not to be consumed in image formation over a plurality of pages.

Image forming apparatus and image forming method used in the apparatus


A connector assembly (2) includes and arc prevention shunt (20) in one of two mating electrical connectors (10, 30). The shunt (20) engages a terminal (34) when the connectors (10) and (20) are in a partially mated configuration. If the terminal (34) is hot, current will pass from the shunt (20) to a relay coil (62) to close contacts (64) in a Form C relay (60). When the normally open switch contacts (64) are closed a bypass circuit (52) disconnects the terminals (14, 34) in the connectors (10, 30) so arcing will not occur when the connectors (10, 30) are mated or unmated under load. When the connectors (10, 30) are in the fully mated or fully unmated, the shunt (20) is electrically isolated from the terminals (14, 34).

1. Field of the Invention
This invention is related to electrical connectors of the type that can be mated and unmated. This invention is also related to the prevention of arcing between mating terminals as electrical connectors are mated or unmated in a hot condition. This invention is also related to the use of a shunt to provide a signal to close a relay to bypass current around the electrical connectors during mating and unmating to reduce the chance of arcing.
2. Description of the Prior Art
Arcing can be a problem when electrical connectors are mated and unmated under load or in a hot condition. If arcing between mating electrical terminals does occur, it would normally occur when the terminals are initially mated or unmated and the terminals are either not in contact or have not been brought into sufficient contact to carry the current
The replacement of a 14 volt system with a 42 volt electrical architecture for automobiles increases the chance that an arc can form if electrical connectors are mated and unmated under load. However, it would be rather expensive to adopt systems for arc avoidance, prevention or suppression that are commonly used for systems with a higher voltage or more current carrying capacity. Applicants are not aware of a simple, existing, inexpensive system using terminals of substantially the same type as are used in current automotive electrical systems and introducing a minimum amount of additional leads or wires. The addition of sacrificial pins that make first and break last to avoid arcing for shorter contact in the same current path requires new terminals and new connectors and increases the contact density.
Shunts have been used to common adjacent contacts in the same connector when unmated from a mating connector. For example, shunts of this type are commonly used in air bag connector. However, applicants are unaware of the use of a single shunt in one of two mating connectors to provide a signal to a relay to bypass current around the electrical connector before mating terminals are in a position where they would be susceptible to arcing.
The instant invention employs a single shunt to provide a signal for bypassing an electrical connector assembly before the mating terminals have reached a position in which arcing can occur between two terminals. Only a single shunt and a single lead needs to be added to an electrical connector. This reduces the number of leads that would be needed for a make first, break last sacrificial contact. Furthermore the single lead can be connected to a switch, such as a Form C relay, that can be used in the electrical system of an automobile. The relay can be connected to a circuit path that bypasses the electrical connector assembly when a signal is received through the shunt to close the Form C relay.
In a preferred embodiment, the relay is a solid state relay device such as that disclosed in U.S. Pat. No. 5,926,354 or, most preferably, that disclosed in U.S. patent application Ser. No. 10/068,925, filed Feb. 8, 2002. These references disclose solid state relays including a power metal oxide semiconductor field effect transducer (xe2x80x9cMOSFExe2x80x9d). In the latter reference, the circuitry of the relay floats when the power MOSFET is commanded OFF to prevent leakage currents from draining a battery. The disclosures of these references are incorporated herein by reference in their entirety.
FIG. 1 is diagrammatic view of an electrical connector assembly showing two fully mated electrical connectors with a shunt in one connector held in a deflected position by engagement with a surface on the other electrical connector.
FIG. 2 is a diagrammatic view of a partially mated electrical connector assembly in which the shunt is in contact with a terminal in the other electrical connector. Mating terminals are still in contact and the terminals are approaching a position in which arcing might occur.
FIG. 3 is a diagrammatic view of the two electrical connectors in an unmated configuration in which the shunt is in an undeflected configuration.
FIG. 4 is a diagrammatic view of a circuit in which a Form C relay has been closed to bypass current around an electrical connector assembly before arcing can occur.
FIG. 5 is a sectional view of a representative embodiment of mating electrical connectors incorporating the instant invention.

Electrical connector with shunt for hot mating and unmating


A gas detector includes metal-oxide semiconductor gas sensors and their driving circuit. The gas detector stores the ratio of initial gas sensor resistance in air and that in an atmosphere including Freon gas, for the gas sensors. The gas detector learns sensor resistance in air for a gas sensor in use and detects Freon gas by comparing the sensor resistance of the gas sensor in use with the learned resistance in air divided by the ratio. When the first gas sensor has been used for a predetermined period, both the first gas sensor and a second gas sensor are used for a learning period to continue detection of Freon by the first gas sensor and to learn the resistance in air of the second gas sensor. After completion of the learning period, Freon is detected by the second gas sensor.

There have been proposed gas detectors having plural gas sensors. For example, a gas detector proposed by JP S60-31049A has four gas sensors and uses them sequentially one by one. The detector counts the number of alarms for gas. The number of alarms indicates the frequency that a gas sensor in use has been exposed to gas, and therefore, when the number reaches a threshold, the gas sensor in use is deemed to be used up its service life. Therefore, a new gas sensor is used.
A gas detector proposed by JP 6288613B has plural gas sensors; one of them is heated and in use for detecting Freon gas leakage from a refrigerator or an air-conditioner, and others are preheated and in standby mode. When the gas sensor in use detects Freon gas, another gas sensor is made to be operated to confirm the Freon gas leakage.
A gas detector proposed by EP 3153849A has plural gas sensors for increasing the service life of the detector against poisoning compounds such as siloxanes. When one gas sensor has been used for a predetermined period, the gas sensor may be poisoned. Therefore, a next gas sensor is used for gas detection. Further, since the plural gas sensors can be integrated into one MEMS chip, the increase in the sensor cost can be reduced.

Gas detector comprising plural gas sensors and gas detection method thereby


Methods and apparatus for controllably dispensing photoresist solutions and other fluids in semiconductor manufacturing equipment from an array of syringe-based fluid dispensers. A multi-syringe fluid dispensing system is provided for photoresist coating within a wafer track coating module. The coating module may contain a spin chuck that is positioned within a catch cup. A robotic dispense arm and gripper assembly may be positioned within the coating module for gripping and positioning a fluid syringe. An array of syringes may be stored on a solution tray within the wafer track coating module for holding a plurality of fluid syringes containing photoresist solutions.

The photolithography process is an important technique used in forming selected circuit patterns on a semiconductor wafer. In general, a photoresist film can be deposited onto a substrate wafer during this process and thereafter pattern-exposed to lithographic equipment in order to transcribe a selected circuit pattern. The photoresist is subsequently developed with a developer solution to obtain a resist pattern corresponding to the transcribed pattern. The developer is intended to remove the relatively more soluble areas of photoresist, and leave behind the remaining patterned image which basically serves as a mask for etching multiple semiconductor wafer layers.
In order to form desired patterns on a substrate, the photoresist is processed during the development step with a solution that is applied in a highly controlled manner. Photoresist or resist development is carried out while a semiconductor wafer is rotated at various speeds and stopped intermittently at preselected time intervals for processing. For example, the wafer may be rotated while a developing solution is dispensed onto the wafer from the discharge port of a developer nozzle. A developing solution film may be thus formed which is intended to have a relatively uniform thickness across the surface of the wafer. Both the wafer and the developer film formed thereon are held stationary thereafter for a predetermined time interval so that developing solution remains in intimate contact with the resist-coated wafer in order to develop a light-exposed latent image thereon. Upon completion of this step in the development process, pure water or other rinse solution can be supplied from a washing liquid supplying nozzle onto the surface of the wafer. The pure water or rinse solution may be eventually scattered off by rotating the wafer at a relatively high speed to spin dry the surface of the wafer to complete this stage of wafer processing.
A variety of photoresist and developer materials are typically applied to the wafer using a spin coating technique. Either a photoresist or developer solution is sprayed or otherwise applied on the surface of the wafer and spun on a rotating chuck. The spinning of the wafer distributes the fluid over the surface of the substrate and exerts a shearing force that separates the excess fluid from the wafer thereby providing a thin layer or coating of photoresist, developer or any other type of processing solution. It is often desired to produce a highly uniform layer on the substrate without defects to enable the formation of subsequent layers to be precisely constructed thereon.
A significant problem associated with conventional solution dispense apparatus is their failure to prevent the inadvertent dripping of fluids onto processed wafers or substrates which can lead to defects. Following the spin-coating dispense of solutions using conventional liquid nozzles, residual amounts of fluid such as photoresist are often known to "drip" onto the underlying wafer. Drips of solution may also include certain added impurities residing on the surface of a nozzle body which can further contaminate the wafer. The occurrence of drips may result in uneven resist coating, developing defects, line width defects and shape failures and other undesirable consequences. While some fluid dispense systems today incorporate apparatus such as suck-back valves in an attempt to prevent drips, such equipment tends to add extra complexity in addressing the problem of fluid dripping. The effectiveness of suck-back valves are also limited since the long tubing often used can be compressed which can cause dripping despite use of the valves.
The available equipment and methods used today do not fully meet the high performance demands required by current processing solution dispense applications. There is a need for improved processing solution dispense apparatus and methods which reduce the occurrence of wafer defects and uneven application of a semiconductor processing coatings.

Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems


A jointed bat includes a barrel, a handle, and a glue. The barrel is tubular and has one end fixedly connected to a top cap and the other end having a tapered first joint portion. An opening is formed at the end of the first joint portion. The handle is tubular and has one end fixedly connected to a knob and the other end having a tapered resilient second joint portion. At least a relief slit is formed at an end of the second joint portion. A dam protrudes from the second joint portion and abuts against an inner wall of the first joint portion. The second joint portion penetrates the opening to fit inside the first joint portion. The glue is filled between and fixedly connected between the first and second joint portions. Therefore, requirements for precision in production of the barrel and the handle are reduced.

1. Technical Field
The present invention relates to bats, and more particularly, to a jointed bat.
2. Description of Related Art
In general, a conventional jointed bat essentially comprises a barrel and a handle. The barrel and the handle each have a tapered joint portion. A glue is filled between the joint portion of the handle and the joint portion of the barrel, such that the two joint portions are fixed to each other to finalize the manufacturing process of the jointed bat.
However, the conventional jointed bat has drawbacks in terms of its production and operation. As for the production of the conventional jointed bat, it is required that the joint portion of the barrel and the joint portion of the handle of the conventional jointed bat have to be precisely produced, because a gap between the joint portion of the barrel and the joint portion of the handle has to be consistent in size in order to be filled with a glue. If the gap is too small or if the joint portions abut against each other, the glue cannot fill the gap, and in consequence the barrel and the handle cannot be jointed together firmly. Also, considerations must be given to the coaxiality between the barrel and the handle so as to meet the requirements of product quality. Hence, there are strict requirements for precision and tolerance of the dimensions of the joint portion of the barrel and the joint portion of the handle, which add to the costs incurred and difficulties encountered in the manufacturing process of the conventional jointed bat.
Furthermore, an old conventional jointed bat is likely to generate noise. It is because although a gap is provided between the joint portion of the barrel and the joint portion of the handle and filled with a glue, the gap is not equipped with any dam. Hence, the cured glue is likely to detach under the vibration of the old conventional jointed bat in operation, and the glue thus detached hits the inner wall of the barrel and therefore generates noise.


The method of estimating and controlling driveline torque in a continuously variable hydro-mechanical transmission uses pressure data and other metrics of a hydrostatic power unit of the transmission in lieu of actual driveline torque data. A mechanical efficiency of the transmission is determined as a function of whether the power unit is operating in a power generation or regeneration mode, and the torque output of the power unit is estimated from that and other hydrostatic parameters. This is used to estimate a torque output of a planetary power unit of the transmission, and the torque on an output member of the driveline is then estimated using that value, and appropriate corrective action taken.

Continuously variable hydro-mechanical transmissions are used in a variety of work machines, including for construction, earth moving, forestry, and agriculture. Reference in this regard, Weeramantry, U.S. Pat. No. 7,063,638 B2, issued Jun. 20, 2006, which discloses a representative continuously variable hydro-mechanical transmission. Typically, a continuously variable hydro-mechanical transmission will have a hydrostatic unit as one power input to a planetary gear set, and a mechanical connection to the engine of the machine as a second power input, with the output of the planetary connected via a clutch to one or more final gear reductions in connection with a load, e.g., the wheels, tracks or other drivers of the machine.
An advantage of continuously variable hydro-mechanical transmissions is that they can provide a large speed range seamlessly. As another advantage, continuously variable hydro-mechanical transmissions are typically capable of lower gear ratios than transmissions with fixed gear ratios. As result, the engine and transmission combination can produce higher torques to the wheels, tracks, or other drivers, which is beneficial as it enables the work machine to pull harder. However, the higher torque can damage mechanical aspects of the transmission, particularly, the final gear reduction or output member of the driveline of the transmission. Typically, it is been found that damage to the final gear reduction or output member will occur if the torque is too high for a prolonged period of time.
In agricultural applications, such as wherein a work vehicle such as when a tractor is pulling a large implement, or a deep subsurface tillage tool, a heavy wagon or cart, or the like, potentially damaging continuous high torque loads can be placed on the transmission driveline. Damage from intermittent or incidental high loads can also result from ground conditions, e.g., inclines, ruts, deep furrows, wet spots, transitions onto roads, and the like, when driving, and from contact with denser soil, buried objects such as stones or rock formations, large roots, and the like when doing subsurface tillage.
To avoid such damage, one alternative is to limit engine torque output. However, often the engine supplies power to other systems of the work machine, e.g., auxiliary hydraulics, power take offs, and the like, and it can be problematic to reduce toque output to those systems also. The torque loads of these other systems typically vary and may be unknown, making accurately adjusting engine torque difficult. As another alternative, the transmission torque can be determined using an estimate of the engine torque and subtracting the torque loads of the other systems, or using maximum torque values for those systems, but this is often more complex, more costly and less accurate than desired.
Thus, what is sought is a manner of determining driveline torque of a continuously variable hydro-mechanical transmission of a work machine, particularly in the vulnerable final gear reduction of the driveline, and limiting the torque for preventing damage to the transmission, without the shortcomings set forth above.

Method for estimating and controlling driveline torque in a continuously variable hydro-mechanical transmission


When a lamp is turned on and a wafer is placed on a light exposure surface, a controlling unit opens a shutter plate so that light is emitted on the light exposure surface and an illuminometer receives the light. An accumulated light amount measuring unit converts illumination intensity measured by the illuminometer to an accumulated light amount. The controlling unit turns off the lamp by sending a lamp OFF signal to a power supplying unit. At the same time, the controlling unit sends a shutter closing command to the power supplying unit. After the shutter is closed, the controlling unit relight the lamp by sending a lamp ON signal to the power supplying unit.

This invention relates to a lamp lighting controlling apparatus and light emitting apparatus used for an exposure apparatus for exposing a substrate such as a display board, print circuit board, semiconductor wafer etc., especially, to a lamp lighting controlling apparatus and a light emitting apparatus for precisely controlling desired accumulated light amount on a work piece or work pieces suitable for sputtering etc.
In such an exposure apparatus for exposing a substrate or substrates such as a display board, a print circuit board, a semiconductor wafer etc., a light emitting apparatus for emitting exposure light is provided.
In FIG. 8, the structure of such the light emitting apparatus 10 is shown.
As shown in the figure, in a light emitting unit 10, optical components such as a discharge lamp 1, e.g. an ultrahigh-pressure mercury lamp, that emits exposure light, a condensing mirror 2 for condensing light from the discharge lamp 1, a first plane mirror 4 (a reflecting mirror) for reflecting the light from the discharge lamp 1 and the condensing mirror 2, an integrator lens 5 for making the illumination distribution uniform on a light exposure surface, a second plane mirror 7 (a reflecting mirror) for conducting light to a light outgoing window, and a collimator lens 8 for forming light emitted from the light outgoing window into parallel light.
A shutter mechanism 6 comprises a shutter plate 61 (a douser), a shutter driving unit 62, and a shutter opening/closing detecting sensor 63.
The shutter plate 61 is driven by the shutter driving unit 62, and the light emitting amount (light exposure amount) emitted on the light exposure surface is controlled by inserting the shutter plate 61 in the optical path or removing the plate 61 from the optical path.
A open/close state of the shutter 61 is detected by the shutter opening/closing detecting sensor 63. The light exposure surface may be a mask surface on which a pattern of circuit etc. is formed or a work surface on which a photosensitive agent is coated and formed.
An illuminometer 11 provided behind the second plane mirror 7, receives light through a light transmission portion such as a pinhole(s) provided on the second plane mirror 7. Output of the illuminometer 11 is sent to an accumulated light amount measuring unit 12.
In the accumulated light amount measuring unit 12, accumulated light amount is calculated by accumulating light amount measured by the illuminometer 11.
The lamp lighting controlling apparatus 20 comprises a lamp lighting power source 21 for supplying power to turn on the lamp 1, and a controlling unit 22.
The lamp lighting power source 21 has a power supply unit 21a and a start-up circuit 21b (a starter). The power supply unit 21a converts AC into DC and supplies it to the lamp 1. Power supplied to the lamp 1 is controlled by the lamp lighting power source 21.
The start-up circuit 21b generates high voltage so that dielectric breakdown takes place between electrodes of the lamp 1 at the start of discharge lamp lighting.
In turning on a short-arc discharge lamp such as an ultrahigh-pressure mercury discharge lamp, high voltage is instantaneously impressed between the electrodes at a frequency greater than 1 MHz so that the dielectric breakdown takes place and the discharge lamp is turned on. The start-up circuit is called an ignitor, or a starter.
The controlling unit 22 receives output of a controlling section 23 for controlling the exposure apparatus, and controls opening of the shutter plate 61 according to output from the controlling section 23, the accumulated light amount measuring unit 12 and the shutter opening/closing detecting sensor 63 or controls to turn on and off the lamp 1 by controlling the lamp lighting power source 21.
In the light emitting unit 10, the lamp 1 is always tuned on.
In order to make the accumulated light amount emitted on the work piece having the light exposure surface uniform, the controller 22 controls opening of the shutter plate 61 during a period from the opening of the shutter (the start of emission) to the closing of the shutter (end of emission) by controlling the shutter mechanism 6 according to the output of the accumulated light amount measuring unit 12 so that accumulated light amount (light exposure amount) on the light exposure surface becomes a desired value.
The lamp 1 is always turned on because in general once the lamp 1 including mercury in inclusive gas is turned off, the lamp 1 cannot be re-lighted easily since the dielectric breakdown voltage is high while the temperature of the lamp is still high, therefore, the lamp 1 would not be tuned on unless the lamp is cooled off so that the dielectric breakdown voltage becomes sufficiently low.
xe2x80x9cRelightxe2x80x9d means that power is applied to the lamp 1 to turn on the lamp after the lamp is turned off but while the lamp does not sufficiently cool down.
In FIGS. 9A and 9B, an example of the shutter mechanism 6 for the light emitting apparatus is shown.
The shutter plate 61 has light transmission portions 64 and light blocking portions 65. The shutter plates 61 are unidirectionally (in a direction shown as an arrow) rotated with respect to a rotation axis 66 by the shutter driving unit 62 such as a motor (not shown).
When the shutter plate 61 is in a position shown in FIG. 9A, light passes through the light transmission portion 64. When the shutter plate 61 is in a position shown in FIG. 9B, the light is blocked by the light blocking portions 65.
Description of the conventional accumulated light exposure amount control in the light emitting apparatus shown in FIG. 8 will be given below.
At the beginning, the lamp 1 is turned on. When the lighting becomes stable and a work piece such as a wafer etc. is placed on the light exposure surface, the controlling unit 22 sends a shutter opening command to the shutter driving unit 62. And then the shutter plate 61 is opened and light is emitted from the light outgoing window and then the wafer etc. placed on the light exposure surface is exposed.
The accumulated light exposure amount on the light exposure surface is controlled as described below.
As shown in FIG. 8, the illuminometer 11 is provided behind the second plane mirror 7, and light transmitted through the light transmission portion such as a pinhole(s) etc. provided on part of the second plane mirror 7 is entered into the illuminometer 11.
The illuminometer 11 is not placed on the light exposure surface since the shadow of the illuminometer 11 appears against the work piece (a mask etc.) during an actual exposure operation if the illuminometer 11 is placed on the light exposure surface and it is impossible to measure the illumination intensity.
In case that the illuminometer 11 receives the light transmitted through the light transmission portion, it is necessary to be set so that accumulated light amount exposed on the light exposure surface and accumulated light amount measured from the amount of light received by the illuminometer 11 are equivalent.
In particular, it is confirmed that they are in proportionality relation, and the constant of proportion is obtained.
An illumination intensity signal from the illuminometer 11 is input in the accumulated light amount measuring unit 12 and converted into accumulated light exposure amount.
The controlling unit 22 sends a shutter closing command to the shutter driving unit 62 so that the accumulated light amount is controlled to a predetermined value by predictive control described below and closes the shutter plate 61. The operation constitutes one cycle of exposure process for the wafer etc.
As shown in FIGS. 9A and 9B, the shutter plate 61 is rotated. Therefore, it takes minimum amount of time to completely block light trace from a time when the shutter opening command is input to a time when the shutter plate 61 is completely opened and complete light passes through the light transmission portion, or from a time when the shutter closing command is input to a time when the shutter plate is completely closed.
The operation period of the shutter is about 20 ms even though driving mechanism capable of operating at high speed is used.
In FIG. 10, change of illumination intensity (that is, intensity change of a light signal from the illuminometer 11) from a time when the shutter is opened to a time when the shutter is closed is shown.
In the figure, a section marked with diagonal lines shows accumulated light exposure amount. The curved line showing illumination intensity is waved because of flicker (ripple) of light emitted from the lamp 1. This ripple causes subtle change of illumination intensity on the light exposure surface.
The light exposure amount in a period during which the shutter is in operation (a period from the beginning of shutter opening operation to the completion of the opening operation), is shown as a right side triangle portion B.
The accumulated light exposure amount marked with the diagonal lines in FIG. 10 is controlled to a desired light exposure amount by controlling the opening and closing of the shutter. Description of the control is given below.
Illumination intensity is measured by the illuminometer 11 from a time when the shutter command signal is sent to the shutter driving unit 62 (the start of a shutter opening operation), and light amount is accumulated in the accumulated light amount measuring unit 12 and the accumulated light amount is calculated.
However, if a shutter closing operation starts when the light exposure reaches a desired value, excessive light amount is exposed since the right triangle portion B shown FIG. 10 is added to the accumulated light amount.
Therefore, in the controlling unit 22, the light amount A during the shutter opening operation is stored based on output of the accumulated light amount measuring unit 12.
Assuming that the light exposure amount A in the shutter opening operation and the light exposure amount B in the shutter closing operation are equal (A=B), the accumulated light exposure amount reaches a value less than a desired value by the light exposure amount A, the controlling unit 22 sends a shutter closing command to the shutter driving unit, the shutter plate 61 starts a closing operation.
That is, based on the assumption of A=B, the predictive control is carried out. The calculation of light exposure amount in the shutter opening operation is performed every exposure.
Thus, the light exposure amount is controlled based on the prediction that the light exposure amount A during the shutter opening operation and the light exposure amount B during the shutter closing operation are equal.
To satisfy the requirement of A=B, the shutter opening speed and the shutter closing speed must be equal and also ripple of light must be equal.
It is difficult to completely eliminate the ripple and it is impossible to control the size or frequency of the ripple. Therefore, the light exposure amount A and the light exposure amount B are subtly different because of changes of the ripple (that is subtle changes of the illumination intensity).
Also, it is difficult to completely eliminate fluctuation in a shutter mechanism driving operation, e.g. fluctuation of a period from input of the shutter opening command or input of the shutter closing command in the shutter mechanism 6, to the start of the shutter opening or closing operation. In FIG. 10, the fluctuation is shown as a portion marked with diagonal dash lines.
More precisely, when the operation period of the shutter is 20 ms, there is an error of about xc2x10.2 ms. This will cause a light exposure amount error of xc2x11% or more during the shutter closing operation. Therefore, it is difficult to control such light exposure amount error to less than xc2x11% and there is about 0.5% of fluctuation in the light exposure amount as a whole.
In recent years, it is increasingly necessary to precisely control the light exposure amount in order to carry out light exposure with miniaturization and high precision which is suitable for network operations.
Specifically, in the recent years, high-sensitivity of photosensitive material (resist) for light exposure has been advanced in order to carry out light exposure for a short time with a small amount of light exposure.
Conventionally, in the light exposure control, 2% of error was permissible, however, it is desired to control the error to less than 1%, preferably, less than 0.5%.
It is an object of the present invention to precisely control light exposure amount in carrying out light exposure on a substrate such as a semiconductor wafer.
It is another object of the present invention to minimize fluctuation of the light exposure amount due to ripple of light from the lamp and fluctuation of an operation of shutter mechanism.
In the conventional light emitting apparatus as described above, the lamp is always turned on. This is why in general once the discharge lamp including mercury in enclosed gas is turned off, the lamp will not be relighted immediately, since dielectric breakdown voltage is high while the lamp is still hot.
However, in an actual experiment for relighting such an ultrahigh-pressure mercury lamp, it was found that the lamp can be relighted within a limited time.
In FIG. 11, an experiment result of relightable time in the experiment in which a 4 W ultrahigh-pressure mercury lamp is used is shown.
As understood from the figure, it is possible to relight the lamp within 4 seconds after the lamp is turned off.
This is one of examples but any discharge lamp may be relighted if it is relighted within a short time.
It is presumed that the dielectric breakdown voltage is still low, if vapor of mercury generated in the lamp case when the lamp is tuned on does not disappear, that is, the vapor remains for a while after the lamp is turned off.
On the other hand, if the lamp is tuned off in such manner described above, the lamp must be relighted within the period during which the relighting is possible.
Also high voltage must be impressed to the lamp from the starter (start-up circuit).
However, if lighting to reduce power is maintained, the restriction that the lamp must be relighted within the time during which the lamp can be relighted is removed. Further, since it is not necessary to impress high voltage to the lamp from the starter (start-up circuit), design freedom is increased as to light exposure processing control in the apparatus.
The present invention solves the problems as set forth below.
Using the characteristic of a discharge lamp, accumulated light exposure amount is controlled to a desired value by turning off the lamp for a short time when the accumulated light exposure amount reaches a desired amount and the shutter is closed during the short period.
That is, during a period of the discharge lamp""s lighting, a shutter opening command is output to the shutter driving mechanism 6, and light is exposed on the light exposure surface. When the accumulated light amount measured by the accumulated light amount measuring unit reaches a predetermined value, a lamp OFF signal is output to the lamp lighting power source 21, and light emission on the light exposure surface is stopped, and, at the same time, a shutter closing command is output to the shutter mechanism 6 and then a lamp relighting command is output to the lamp lighting power source after the shutter is closed and within the period during which relighting of the discharge lamp is possible.
Thus, within the turning off period during which relighting of the discharge lamp is possible, the closing of the shutter plate 61 is completed and relighting is carried out.
In other words, the lamp turning off period is at least longer than a shutter closing period and shorter than the period during which relighting is possible.
Thus, it is possible to precisely control the light exposure amount without effects of ripple of light from the discharge lamp and/or fluctuation of a shutter mechanism driving operation.
The present invention also solves the problems as set forth below.
When the shutter closing operation takes place, illumination intensity on the light exposure surface is reduced by decreasing power supplied to the lamp to less than the rated apparent power. After the shutter closing operation is completed, the power supplied to the lamp is set back to the rated apparent power before the discharge lamp is turned off.
For example, if the power supplied to the lamp 1 is reduced to 1/n, the illumination intensity is proportional to it and reduced to 1/n.
A predictive control in which (1/n)xc3x97A=B is assumed is carried out.
That is, during lighting of the discharge lamp 1, a shutter opening command is output to the shutter mechanism 6 and light is emitted onto the light exposure surface.
Assuming that 1/n of exposure amount A during the period of the shutter opening operation and the exposure amount B during the shutter closing operation are equal [(1/n)xc3x97A=B], when the accumulated light exposure amount, measured by the accumulated light amount measuring unit 12, from the start of the shutter opening operation, reaches a certain light exposure amount which is less than the predetermined exposure amount by (1/n)xc3x97A, a command for reducing power supplied to the discharge lamp 1 is sent to the lamp lighting power source 21 so that intensity of light emission on the light exposure surface is decreased. At the same time, a shutter closing command is sent to the shutter mechanism 6.
After the shutter closing operation is completed, power supplied to the discharge lamp 1 is increased to the rated apparent power before the lamp 1 is turned off.
The value xe2x80x9cnxe2x80x9d of [1/n rated apparent power] is set not to turn off the lamp 1 during the shutter closing operation. For example, preferably, 1/n equals to about 0.1-0.3.
Since the lower the power supplied to the lamp 1 is with the value xe2x80x9cnxe2x80x9d increased, the less the error of the light exposure amount is, if n=10, it is possible to make the error of the light exposure amount the least.
Since the light exposure amount is small during the shutter closing operation since the intensity of light emission onto the light exposure surface during the shutter closing operation is low, it is possible to output the shutter closing command when the accumulated light exposure amount measured by the accumulated light exposure measuring unit 12, reaches a predetermined light exposure amount without the prediction control described above if such light exposure amount does not become problematic.
As described above, if the illumination intensity is set to 1/n in the shutter closing operation, the error of the light exposure amount generated in the portion B described above becomes 1/n of the conventional error. Therefore, the 2% of the error in the conventional apparatus becomes 2/n % in the present invention.
When the lamp 1 is turned off as in the first method described at above, it is possible to eliminate the errors of light exposure amount, but the lamp 1 must be relighted within the period during which relighting is possible.
As in the second method, when the power supplied to the lamp 1 is lowered and the lighting is maintained, the restriction that the lamp 1 must be relighted within the period during which relighting is possible is eliminated and freedom of design as to the exposure processing control of the apparatus is increased.
Also it is not necessary to relight the lamp 1 by impressing high voltage to the lamp 1 by the starter (start-up circuit).

Lamp lighting controlling apparatus and light emitting apparatus


A tube and fitting assembly can be used in a domestic appliance, such as an oven range, and includes a tube provided through an internal bore of a fitting. The tube includes a first end that is outwardly flared against a shoulder of the fitting via plastic deformation. The inner wall of the tube adjacent the outwardly flared portion is threaded and can be fastened to an orifice such that an internal bore of the orifice is in fluid communication with the tube.

Orifice assemblies, such as tube and fitting assemblies are often included in kitchen ranges for providing flammable gas. In particular, tube and fitting assemblies provide a fluid-tight seal to mitigate leakage of flammable gas. In conventional tube and fitting assemblies, the tube is longitudinally compressed inside the fitting to thereby radially expand the tube into contact with the fitting.


A paver machine includes a screed arranged to level out road material disposed on the ground and a pressure actuated screed lifting cylinder arranged to lift and lower the screed with respect to the ground. A pressure sensor is arranged to measure the pressure in the cylinder when the screed is being lifted or lowered. Further a control unit configured to receive pressure data from the pressure sensor indicative of the pressure in the screed lifting cylinder when the screed is being lifted by the screed lifting cylinder. Based on analysing the pressure data, the control unit sets a reference height position for the screed.

Paver machines are generally used for distributing road material such as asphalt on the ground and also provide initial compaction of the asphalt. The road material is typically provided from a truck to a hopper of the paver machine from which the road material is transported via conveyors to in front of a screed. The screed is generally arranged at the rear of the paver machine for levelling out the road material provided in front of the screed across a predetermined width such as for example the width of the road where the road material is laid.
The screed functions not only to level out the road material but also to define the layer thickness of the road material after it has been levelled out. By placing the screed at a desired height from the ground, the paving height can be adjusted accordingly.
A common type of screed is a so-called floating screed. With a floating screed, the thickness of the paved road material is adjusted by controlling the angle of attack of the screed relative the horizontal axis. A larger angle of attack results in a thicker layer of road material on the ground. The distance from the rear edge of the screed to the ground defines the paving thickness. Therefore, it would be advantageous to be able to determine the distance from the rear edge of the screed to the ground. US2009/0226255 discloses a paver comprising a floating screed. Screed-transporting cylinders are used for raising the screed in a transport position and actuating cylinders are used for moving the screed to height corresponding to a paving height dimension. The height of the screed is measured relative some reference line such as the ground or a span wire using paving height sensors.
However, determining the height with reference to the reference line requires a calibration with respect to the reference line. Such calibration is commonly done by visual inspection which is both time consuming and inaccurate.
Thus, there is a need for improving the height calibration for paver screeds.

Paver machine and a method for paver screed height calibration


There is disclosed a composition for forming a protective coating upon a substrate. The composition has been found particularly useful for forming a protective coating upon components of automotive vehicles, such as a bedliner for a pick-up truck. The composition may include, without limitation, an isocyanate component and an amine component and optionally includes one or more of a catalyst, stabilizer, pigment, fire retardant or other additives.

Historically, coatings have been applied to substrates, both to protect the substrates and to improve the properties of the substrates. For example, and without limitation, coatings have been developed to protect substrates from various environmental conditions and to protect substrates during contact of the substrates with other objects. Moreover, coatings have been developed to improve properties of substrates such as durability, strength, environmental resistance and the like.
In the automotive industry, coatings are used for protecting various components of an automotive vehicle. As an example, coatings are used for protecting vehicle components against cosmetic damage (e.g., degradation, marring, denting) due to corrosion, abrasions, impacts, chemicals, ultraviolet light, thermal cycling or the like. While, it is desirable for such coatings to protect against cosmetic damage, it is also desirable to provide a composition that is relatively easy to handle, and particularly exhibits relatively low volatile emissions. Thus, the present invention provides a composition for forming a coating with improved protection capabilities, ease of handling and relatively low volatile emissions.

This patent is subject to a terminal disclaimer.

Coating process and composition for same


A fair scheduling system with methodology for fairly scheduling queries for execution by a database management system is disclosed. The techniques involve obtaining computer-executable query jobs and cost estimates to execute the query jobs. For example, the cost estimate can be a number of results the query is expected to return. Based on the cost estimates, the fair scheduling system causes the database management system to execute the query jobs as separately executable sub-query tasks in a round-robin fashion which can decrease latency of low cost queries concurrently executing with high cost queries.

Many database management systems are available to help users manage data. One way such systems help users is to answer questions the users have about the data. In the context of database management systems, questions are typically referred to as "queries" and answers typically referred to as "results". Users submit queries to database management systems and receive answers to the queries in the form of results.
To answer queries, database management systems use computing resources such as memory and processor resources. Different queries require different amounts of computing resources to answer. For example, a query that returns 50,000 results may consume more computing resources than one that returns 10 results.
Many database management systems have the ability to execute multiple queries at the same time (i.e., concurrently). The process performed by a database management system of determining the results of a query is often referred to as "executing" the query. Multiple queries executed concurrently by a database management system can contend with each other for use of the same computing resources. Many database management systems perform synchronization and scheduling functions for the purpose of sharing computing resources amongst multiple concurrent query executions.
Unfortunately, despite these synchronization and scheduling efforts, problems can arise when database management systems execute multiple queries concurrently where some of the queries are "high cost" queries and others are "low cost" queries. With this type of mixed query-load, execution of the high cost queries can require use of so many computing resources that they "starve" low cost queries of computing resources. The result may be that the database management systems take a long amount of time to return answers to the low cost queries. Overall, some database management systems handle mixed query loads in such a way that latency of the low cost queries and the throughput of the query load are longer than users expect them to be.
The approaches described in this section are approaches that could be pursued, but not necessarily approaches that have been previously conceived or pursued. Therefore, unless otherwise indicated, it should not be assumed that any of the approaches described in this section qualify as prior art merely by virtue of their inclusion in this section.


A method of analyzing a body (log) containing elements (e.g. knots) having different densities than the remainder of the body by passing electromagnetic energy from at least one source for substantially symmetrical bodies (pruned logs) or at least two sources through the body and sensing the amount of energy passing through the body from each source by sensors mounted opposite each source. Each sensor is formed by an array of discrete detectors positioned in side by side relationship opposite their respective sources. The amount of radiation passing through the body is detected as the body passes between the source(s) and its (their) respective detector(s) and a longitudinal plan is generated based on the radiation detected from each of the sensors over at least a preselected length of the body. For non-symmetrical bodies the longitudinal plans are then analyzed to identify the same element in each of the plans and then the body is reconstructed in a plurality of cross sections representing discrete lengths of the body shorter than the selected length with the detected elements positioned in the cross section.. A longitudinal axis of the body is selected based on the shape of the body and the plurality of the cross sections are collapsed along lines parallel to the selected longitudinal axis to provide an accumulation of the overlying elements along the axis in a single cross section representative of the length of body being collapsed. This system provides a means for a real time analysis of a body such as a log to determine the location of defects and generate a rotation decision for rotating the log for presentation to the headrig to permit the optimization of a sawing solution for the log. The system may also be used to determine a bucking solution to select the length of the log for which the sawing solution is determined.

The disclosure will deal with logs but some of the technology described will have another application. The term defects is intended to include one or more of stones or nails or other intrusions in the tree and natural defects such as knots or rot or very low density volumes or voids.
It has long been a desire of the forest products industry to provide a system for internally examining the log to find its defects and then, based on defects and their location, automatically in "real time" provide a sawing solution to permit maximization of the wood recovery or lumber recovery from the log. By "real time" it is meant at a rate that keeps pace with the normal speed of operation of the sawmill particularly the headrig of the mill.
In the Fourth Nondestructive Testing of Wood Symposium in August 1978 in a paper entitled "Scanning of and Computing Methods for Measuring Knots and Other Defects in Lumber and Veneer" by Torbjorm Schmidt there was a brief description of the application of tomography to investigate defects in a log. In that description the exposure time for tomography was 37 seconds and the computer took two minutes to provide the resulting picture illustrating a cross section through one section of the log. It will be apparent that, while it was evident one could determine the internal structure of a log using tomography in 1978, it was simply impossible to do this in a time frame that was useful for control in a sawmill. This is particularly true when one considers that only a single cross sectional image was obtained in a two and half minute time frame.
In Wood Science (Vol 14, No. 3, p 97-104, January 1982) an article entitled "Application of Automatic Image Analysis to Wood Science" by Charles W. McMillan discusses automatic image analysis and describes scanning technology for primary log breakdown and for cutting clear furniture parts from defective boards. The use of computerized axial tomography "CATSCAN" to nondestructively locate defects in the log interiors is described.
The majority of the McMillan paper is directed toward image analysis of photographic images and is simply an indication of what might be accomplished. However none of the operations are done in "real time". These teachings are not useful for a commercial log scanner to determine a sawing solution in "real time".
In the McMillan article the concept of using a CATSCAN to determine the interior of a log is discussed as well the use of a plurality of such scans to define the x-y coordinates for a knot in each such cross sectional scan. McMillan suggests that the information from the cross sectional scans then be used in a computer to determine the log positions needed to maximize grade or value yield but provides no teaching on how this might be done.
In Forest Research Bulletin No. 8 (Feb. 19, 1982) there is a paper entitled "Computed Tomographic Scanning for the Detection of Defects within Logs" by Benson-Cooper et al. that also suggests that a sawing solution based upon CATSCAN information might be derived, but does not provide any teaching as to how one might obtain this objective.


A rechargeable battery 100 includes a plurality of electrode assemblies 10; a case 34 housing the electrode assemblies 10; at least one electrode terminal 21, 22, electrically connected to the electrode assemblies 10 by a lead tab 40, 50, the lead tab 50 including a terminal junction part 51; and a prong portion extending from the terminal junction plate, the prong portion comprising a plurality of prongs 53, 54, each of the prongs having a main body 53a electrically connected to one of the electrode assemblies 10 and an angled body 53b bent at one angle from the main body 53a.

1. Field
The present invention relates to a rechargeable battery and, more particularly, to a rechargeable battery with a current collecting lead tab.
2. Description of the Related Art
Unlike a primary battery, which is not rechargeable, a rechargeable battery can be discharged and recharged. A low-capacity rechargeable battery can be used for small portable electronic devices such as mobile phones, notebook computers, or camcorders, while a large-capacity rechargeable battery can be used as a power source for, for example, a motor for an electric vehicle.
Recently, a high-output rechargeable battery using a non-aqueous electrolyte of high energy density is being developed, and a plurality of high-output rechargeable batteries are connected in series to constitute a large-capacity battery module so as to be used for driving a motor of a device, e.g., an electric automobile or the like, that requires much power.
Also, a single high-output rechargeable battery generally includes a plurality of rechargeable batteries connected in series, and such rechargeable batteries may have a cylindrical type, a prismatic type, and the like.
The prismatic rechargeable battery may include a terminal electrically connected with the electrode assembly enclosed in a case via a current collecting lead tab and protruding from an outer surface of the case.
When a plurality of electrode assemblies are inserted in a single case, the current collecting lead tab needs to be inserted between the electrode assemblies. In this case, however, a space between uncoated regions is so small that the electrode assemblies may be damaged when the current collecting lead tab is inserted. Also, if the current collecting lead tab is attached only to some of the electrode assemblies, the flow path of current is lengthened, which increases resistance and generates much heat.

Rechargeable battery with terminal junction and prong


A method, system, and computer program product for evaluating digital images of handwritten documents comprising handwritten symbols are disclosed. A set of symbols from the digital image is determined by applying a first predefined technique. If the set of symbols determined by applying the first predefined technique does not match with a predefined set of symbols, a second predefined technique is applied to determine the set of symbols from the digital image. Thereafter, an evaluation report is created based on the determining by applying the first predefined technique or the determining by applying the second predefined technique.

In education, assessments are often given to students to assess the students' mastery of a subject. Many such assessments require the student to write an answer on the assessment. Various character recognition techniques/algorithms are available for recognizing such handwritten characters. In certain cases, these character recognition techniques may result in false negatives (i.e., correct answers that are scored as incorrect) when used to compare recognized characters with known answers. Further, some of the tools implementing the character recognition techniques offer a validation feature requiring a user (e.g., a teacher) to check each answer marked as wrong; however, too many false negatives may lead to user dissatisfaction.

Method and system for evaluating handwritten documents


Methods and systems for computer program optimization utilize function cloning in program code, such as post-linked code. Each function call is directed to a different cloned version of the called function. Conventional profiling methods such as hardware event sampling, basic block profiling, and edge profiling may then be applied to the modified program code to obtain call path-based, clone-specific profile data. The profile data can be further exploited to optimize the program code.

1. Field of the Invention
This invention relates to optimization of computer code to achieve faster execution. More particularly, this invention relates to gathering of data about the frequencies with which different execution paths in a program are traversed.
2. Description of the Related Art
Profiling as a tool for optimization and restructuring is well known in the computer arts. Profile-based optimizations are widely used today in commercial compilers and post-link optimization tools. For example, post-link run time profiling is described by Henis et al., in "Feedback Based Post-Link Optimization for Large Subsystems," Second Workshop on Feedback Directed Optimization (Haifa, Israel, November, 1999), pages 13 20; and by Schmidt et al., in "Profile-Directed Restructuring of Operating System Code," IBM Systems Journal 37:2 (1998), pages 270 297.
Runtime profiling of a program creates a log recording usage statistics of each code block in two stages. First, in an instrumentation stage, each basic block or function is modified with either a new header or footer, wherein the added code increments a counter every time that basic block or function is run. In the second stage (the execution stage), the modified program is executed. At the end of the execution, the counters are written into a log file. Statistical analysis of the frequency of use of each basic block provides a method to rank the code blocks by importance. Code blocks that are frequently executed are called "hot" blocks, as opposed to rarely executed "cold" blocks.
Two general methods of obtaining profiling information are known, for example, from U.S. Pat. No. 7,120,906 to Stephenson et al. Sampling is the periodic measurement of a computer's register contents during execution of the program binary. The approach identifies where most of the time is spent during execution of a particular computer program. However, it is difficult to derive information about the source code or any of the series of intermediate representations that are produced during the compilation process.
A second method, known as instrumentation, is the insertion of extra instructions into the code during compilation in order to collect information at run time. There are disadvantages of such an invasive approach, e.g., increased code, prolonged execution time, and possibly altered program behavior. On the other hand, instrumentation is amenable to source code and intermediate representations of a program. Indeed, it is even proposed to dynamically add instrumentation code to a program while the target program is executing, as described in U.S. Pat. No. 7,165,242 to Dmitriev.

Method for enabling profile-based call site tailor-ing using profile gathering of cloned functions

International Business Machines Corporation


A bias circuit integrated on a silicon wafer includes first, second and third branches. The first branch includes a first PMOS transistor in series with a first NMOS transistor. The second branch includes a second PMOS transistor, a second NMOS transistor and an electric resistor in series. The gate of the first NMOS transistor is connected to the gate of the second NMOS transistor. The first branch and the second branch are arranged as a current mirror. The third branch includes a third PMOS transistor in series with a third NMOS transistor. The third PMOS and NMOS transistors are arranged to maintain a drain voltage of the first PMOS transistor that is substantially identical to a drain voltage of the second PMOS transistor.

The present invention relates to integrated circuits, and in particular, to a bias circuit integrated on a silicon wafer.
A bias circuit is often used in integrated circuits to apply a reference voltage to current generators or to voltage generators. A bias circuit 10 is shown in FIG. 1, and includes first and second branches B1, B2. The first branch B1 comprises a PMOS transistor TP1 and an NMOS transistor TN1 connected in series. The second branch B2 comprises a PMOS transistor TP2, an NMOS transistor TN2 and a resistor R connected in series. The transistor TN2 has a gate width to length ratio (W/L ratio) that is equal to N times that of the transistor TN1. This is generally achieved by NMOS transistors identical to the transistor TN1, arranged in parallel.
The branches B1, B2 are supplied by a voltage Vcc applied to the sources of the PMOS transistors, and are arranged as a current mirror. The gate G of the transistor TP2 is, for example, connected to the gate of the transistor TP2, which is also connected to its drain D. To ensure the self-bias of the circuit 10 at a determined operating point, the gate of the transistor TN2 is connected to the gate of the transistor TN1, which is connected to its drain. Therefore, after being activated, the bias circuit 10 is set to an operating point so that an identical current I passes through the branches B1, B2. This current I is assumed to be constant.
The bias circuit 10 shown in FIG. 1 may also be a current generator. A reference voltage Vref that is representative of the current I passing through the branches B1, B2 is sampled at one point of the circuit 10, for example, on the gate of the transistor TN1, and is applied to the gate of an external NMOS transistor TN0 arranged in an external branch Be. The transistor TN0 is identical to the transistor TN1, and provides a current Ie equal to the current I in the external branch Be. The transistor TN0 is therefore equivalent to a current generator inserted into the branch Be. Other current generators can be created in this way by applying the voltage Vref to other branches of an integrated circuit.
This bias circuit 10 has the advantage of being very simple, and small in size in terms of the silicon surface occupied. However, it is sensitive to variations in the supply voltage Vcc or in the temperature. For a better understanding, FIG. 2 shows curves of the current/voltage of the bias circuit 10 as a function of the temperature T. The current I varies with the temperature for a given supply voltage Vcc. Furthermore, for a given temperature T, the current I rises when the voltage Vcc rises.
In view of the foregoing background, an object of the present invention is to overcome the above described voltage variation defects and temperature variation defects in a relatively straightforward manner without using complex stabilization circuits.
More particularly, an object of the present invention is to provide a bias circuit of the above-mentioned type that has a stable and constant current over a wide range of supply voltage values.
More particularly, another object of the present invention is to provide a bias circuit of the above-mentioned type that has a stable and constant current over a wide range of temperatures.
One of the objects of the present invention is achieved by providing a bias circuit integrated on a silicon wafer that includes a first branch and a second branch. The first branch comprises a first PMOS transistor in series with a first NMOS transistor. The second branch comprises a second PMOS transistor, a second NMOS transistor and a resistor all in series. The gate of the first NMOS transistor is connected to the gate of the second NMOS transistor. The first branch and the second branch are arranged as a current mirror. The bias circuit also includes a third branch comprising at least a third PMOS transistor in series with at least a third NMOS transistor. The third PMOS and NMOS transistors are arranged to maintain a voltage that is identical or roughly identical to the drain voltage of the first PMOS transistor and on the drain of the second PMOS transistor.
According to one embodiment, the gate of the third PMOS transistor is connected to the drain of the second PMOS transistor, and the gate of the third NMOS transistor is connected to the drain of the third NMOS transistor and to the gate of the first NMOS transistor. According to another embodiment, the drain of the first PMOS transistor is connected to the gate of the first PMOS transistor.
Another object of the present invention is achieved by providing a bias circuit of the type described above, in which the resistor has a temperature coefficient chosen so that the variations with the temperature ensure the stability of a current passing through the second branch.
According to one embodiment, the resistor comprises at least a first and a second resistor in series or in parallel. These resistors have distinct temperature coefficients. According to another embodiment, the first resistor is in N doped silicon and the second resistor is in N+ or P+ doped silicon.
According to one embodiment, the first branch comprises a fourth NMOS transistor arranged in series between the first PMOS transistor and the first NMOS transistor, and has a threshold voltage that is lower than that of the first NMOS transistor. The second branch comprises a fifth NMOS transistor arranged in series between the second PMOS transistor and the second NMOS transistor, and has a threshold voltage that is lower than that of the second NMOS transistor. The gates of the fourth and fifth NMOS transistors are connected to the gate of the first NMOS transistor.
According to another embodiment, the second NMOS transistor comprises a plurality of NMOS transistors in parallel. According to another embodiment, the bias circuit comprises an output delivering a reference voltage sampled on the gate of the first NMOS transistor. The output is connected to the gate of an external transistor arranged in an external branch.
According to one embodiment, the first and the second resistors have, at ambient temperature, values R10, R20, which meet the following equations: (1) R10=R0(xcex12xe2x88x92xcex1)/(xcex12xe2x88x92xcex11); and (2) R20 =R0(xcex1xe2x88x92xcex11)/(xcex12xe2x88x92xcex11). R0 is the value of the resistor at ambient temperature, xcex11 is the temperature coefficient of the first resistor, xcex12 is the temperature coefficient of the second resistor, and xcex10 is the temperature coefficient of the resistor ensuring the stability in temperature of the bias circuit.

Bias circuit with voltage and temperature stable operating point


Herein disclosed is a flared double-wall structure which forms one open end of a metal pipe to be connected to one end of a mating joint. The flared double-wall structure has one annular brim formed on and along the inner sheet face of the double walls and in the open end.

1. Field of the Invention
The present invention relates to a structure for connecting a metal pipe and, more particularly, to an improvement in a flared double-wall structure which is formed at one open end of a metal pipe to be connected to one end of a mating joint. The metal pipe has a relatively small diameter and thickness, e.g., a diameter of 20 mm and a thickness of 1.5 mm or less and is generally arranged for oil or air feed passages in an automobile or a variety of machines or apparatus.
2. Description of the Prior Art
A flared double-wall structure of this kind for the connection according to the prior art is shown in FIG. 4. In this structure, one open end 11' of a pipe P' to be connected is so flared at 11 that it is formed of a conical wall 12 opened outward merely smoothly. For the connection, the flared double-wall structure is fastened and firmly clamped between the pressure receiving seat of a mating joint 13 and the pressure seat of a nut 14.
In this prior art, however, the double-wall flare 11 has its seat made to abut in a facial contact all over its face against the pressure receiving seat of the partner by the flatness of the conical wall 12, so that its facial pressure is reluctant to rise and feasible to cause a leakage. Moreover, an excessive fastening is invited to prevent the leakage at the mating pressure receiving seat due to a dispersion in the bent shape of the pipe P'. On the other hand, concentrations of fatigue and stress are caused at the neck of the double-wall flare 11 due to the structural limitation such as the small thickness of the pipe P' itself and the state of arrangement under vibrations. Thus, the structure of the prior art is frequently troubled by a cracking or breakage.

Flared double-wall structure for connecting metal pipes


The present disclosure relates to an endoscopic retractor apparatus for retracting and/or positioning organs during minimally invasive surgery. The apparatus includes an elongate shaft having proximal and distal ends and a lumen extending therebetween, and a retracting sleeve operatively associated with the elongate shaft. The retracting sleeve includes a first and a second spindle each disposable in the lumen of the elongated shaft, each spindle being selectively translatable through the lumen of the elongate shaft, and a sling portion extending between the distal ends of the first and second spindles, the sling portion defining a cradle for receiving organs therein, the sling portion being selectively movable upon translation of at least one of the first and second spindles.

1. Technical Field
The present disclosure relates to devices and methods used for retracting organs during surgical procedures and, more particularly, to an endoscopic apparatus for retracting or positioning organs during minimally invasive surgery.
2. Background of Related Art
As a result of the recent technological improvements in surgical instruments, surgical procedures, using minimally invasive techniques, are routinely performed which surgical procedures cause less trauma to the patient. Some minimally invasive surgical procedures have limitations due to the small internal diameter of many commonly used cannulas and trocar systems. As a result, instrument manufacturers must come up with innovative and novel solutions for using many common instruments such as organ retractors and tissue retrieval bags which utilize deformable frame openings to fit through the trocar and into the patient. In fact, some organ retractors and tissue retrieval bags use inflatable frames which form components used for manipulating tissue. An exemplary inflatable organ retraction device is disclosed in U.S. Pat. No. 5,823,945 to Moll, et al., the entire content of which is incorporated herein by reference.
As a result thereof, additional systems for pressurizing the inflatable frames are needed. As can be appreciated, inflatable tissue retrieval instruments tend to be vulnerable to accidental deflation in the operating theater and are unnecessarily dependent upon the rigidity of the inflatable structure to support the organ and/or contain the tissue as it is manipulated. Moreover, inflatable type instruments tend to be more complex and costly than corresponding non-inflatable instruments.
A continuing need exists for an endoscopic apparatus for retracting an organ that reduces the forces exerted on the organs and enables improved control of the organ.

Organ retractor and method of using the same


A robotic surgery method for cutting a bone of a patient includes characterizing the geometry and positioning of the bone and manually moving a handheld manipulator, the handheld manipulator operatively coupled to a bone cutting tool having an end effector portion, to cut a portion of the bone with the end effector portion. The handheld manipulator further comprises a manipulator housing and an actuator assembly movably coupled between the manipulator housing and the bone cutting tool. The method further includes causing the actuator assembly to automatically move relative to the manipulator housing to maintain the end effector portion of the tool within a desired bone cutting envelope in response to movement of the manipulator housing relative to the bone.

Minimally invasive surgery (MIS) is the performance of surgery through incisions that are considerably smaller than incisions used in traditional surgical approaches. For example, in an orthopedic application such as total knee replacement surgery, an MIS incision length may be in a range of about 4 to 6 inches, whereas an incision length in traditional total knee surgery is typically in a range of about 6 to 12 inches. As a result of the smaller incision length, MIS procedures are generally less invasive than traditional surgical approaches, which minimizes trauma to soft tissue, reduces post-operative pain, promotes earlier mobilization, shortens hospital stays, and speeds rehabilitation.
MIS presents several challenges for a surgeon. For example, in minimally invasive orthopedic joint replacement, the small incision size may reduce the surgeon's ability to view and access the anatomy, which may increase the complexity of sculpting bone and assessing proper implant position. As a result, accurate placement of implants may be difficult. Conventional techniques for counteracting these problems include, for example, surgical navigation, positioning the subject patient limb for optimal joint exposure, and employing specially designed, downsized instrumentation and complex surgical techniques. Such techniques, however, typically require a large amount of specialized instrumentation, a lengthy training process, and a high degree of skill. Moreover, operative results for a single surgeon and among various surgeons are not sufficiently predictable, repeatable, and/or accurate. As a result, implant performance and longevity varies among patients.
To assist with MIS and conventional surgical techniques, advancements have been made in surgical instrumentation, and in technologies for understanding the spatial and rotational relationships between surgical instruments and tissue structures with which they are intervening during surgery. For example, instruments for calcified tissue intervention that are smaller, lighter, and more maneuverable than conventional instruments have become available, such as handheld instruments configured to be substantially or wholly supported manually as an operator creates one or more holes, contours, etc. in a subject bony tissue structure. In certain surgical scenarios, it is desirable to be able to use such handheld type instrumentation while understanding where the working end of the pertinent tools are relative to the anatomy. In particular, it is desirable to be able to control the intervention such that there are no aberrant aspects, wherein bone or other tissue is removed outside of the surgical plan, as in a situation wherein a surgical operator has a hand tremor that mistakenly takes the cutting instrument off path, or wherein a patient moves unexpectedly, thereby taking the instrument off path relative to subject tissue structure. There is a need for handheld systems that are capable of assisting a surgeon or other operator intraoperatively by compensating for aberrant movements or changes pertinent to the spatial relationship between associated instruments and tissue structures.

Systems and methods for handheld robotic surgery


In an example embodiment, described herein is an apparatus that comprises a user interface, a communication interface, and logic coupled to the user interface and communication interface. The logic is configured to receiving a request via the user interface to forward a message to a recipient to determine whether distribution of the message is restricted to a group. The logic is further configured to determine whether the recipient is a member of the group responsive to determining distribution of the message restricted to a group. The logic is configured to send the message to the recipient via the communication interface responsive to determining the recipient is a member of the group.

Electronic messages such as electronic mail (email), text messaging such as Short Messaging Service (SMS), instant messaging (IM), voicemail, etc. are a popular form of communications. Two popular functions of these types of communication are the capability of sending messages to a group of people and the ability to forward messages. User agents provide user friendly functions to forward and reply to messages. Address books can be employed in order to provide a convenient way to specify the addresses of the recipients and to create and process groups.

Controlling the distribution of messages