A photoinitiator composition that includes (a) 1-aryl-2-alkyl-1,2-ethanedione and (b) a rigid 1,2-dione in a weight ratio of (a):(b) in a range of about 1:20 to about 20:1 is disclosed. The photoinitiator composition can be used in a photocurable dental composition in an amount sufficient to achieve a degree of double-bond conversion of at least 50%. Methods for making the photocurable dental composition are also disclosed.

1. Field of the Invention
The invention generally relates to whiter photoinitiated dental resins and composites, and to methods for making same. More specifically, the invention relates to light-cure dental compositions including at least one photopolymerizable monomer and a photoinitiation system including (a) a 1-aryl-2-alkyl-1,2-ethanedione and (b) a rigid 1,2-dione in a weight ratio of (a):(b) in a range of about 1:20 to about 20:1, wherein the mixture is present in an amount sufficient to achieve a degree of double-bond conversion (DC) of at least 50%.
2. Brief Description of Related Technology
There is a consensus that improved conversion of double bonds during photopolymerization is critical for the optimization of mechanical properties (Ferracane and Greener, 1986; Ferracane et al., 1997; Peutzfeldt and Asmussen, 1996, 1992), biocompatibility (Rietschel, 1986), and color stability (Imazato et al., 1995) of light-activated dental resins. Photopolymerization implies both the light-induced increase of molecular weight by monomer to polymer conversion, as well as crosslinking of developing or preexisting macromolecules.
Photopolymerization reactions commonly are initiated by free-radicals formed by photosensitizers (also referred to hereinafter as photoinitiators). These photosensitizers typically posses a carbonyl group having a non-bonding electron capable of being promoted into the .pi.* anti-bonding orbital by absorption of light of the quantum mechanically allowed wavelength. This electron promotion leads to production of a pair of free radicals, either by intramolecular cleavage (e.g., as with benzoin ethers such as benzoin methyl ether) or by proton abstraction from a labile site (e.g., an .alpha.-alkylamine group on amines such as N,N-dimethylamino ethylmethacrylate) with photosensitizers such as camphorquinone (CQ). Generally, photoinitiators should absorb and photoinitiate polymerization reactions in the visible light spectrum, such as at a wavelength of about 470 namometers (nm) for CQ.
Proton abstraction can be made highly efficient by formation of a complex between the photoexcited sensitizer and an electron-donating (reducing) agent, such as a tertiary amine. The complex is referred to as an "exciplex." Proton abstraction occurs within this exciplex which then breaks down to form free radicals (Oster and Yang, 1968; Hutchison and Ledwith, 1974; Ledwith, 1977). Aliphatic compounds containing two or more vicinal carbonyl groups have also been used as photosensitizers. Diacetyl, for example, absorbs in both the near-ultraviolet and blue regions of the spectrum (up to 467 nanometers (nm)) and has been used as a sensitizer for polymerization of methyl methacrylate with visible light (Gladyshev and Rafikov, 1962).
Even though a variety of compounds can act as initiators in the visible light region (Pummerer and Kehlen, 1933; Oster 1954, 1958; Oster et al., 1959; Fouassier, 1993), most investigations concerning dental resins have utilized CQ as a photosensitizer (Linden, 1993; Taira et al., 1988) in combination with a variety of reducing agents (Kubo, 1989; Nikaido, 1989; Kadoma and Imai, 1990; Yoshida and Greener, 1993). CQ is an alpha dicarbonyl that absorbs light having a wavelength of about 468 nm and, therefore, forms a very effective photoinitiator system when combined with an electron donor. However, CQ is inherently yellow, which causes problems in color matching. This, in turn, places practical limits on the concentration of CQ in a dental resin and, consequently, limits the degree of polymerization and depth of cure that can be attained. Efforts to improve the curing system have investigated the use of alternative photosensitizers (Peutzfeldt and Asmussen, 1992, 1992; Peutzfeldt, 1994, 1994; Peutzfeldt and Asmussen, 1996, 1996), alternative amines (Cohen and Chao, 1968; Antonucci and Venz, 1987), and alternative curing devices (Tarle et al., 1995; Puppala et al. 1996). Peutzfeldt and Asmussen (1996, 1996), seeking to increase crosslinking via additional components in the resin system, reported that diacetyl (2,3-butanedione) and propanal improved several properties in peroxide/amine initiated resins. Earlier, diacetyl had been reported to generate free radicals upon absorption of photons.
More recently, Makinen and Makinen (1982) and Inano et al. (1983) reported that several types of enzymes are photoxidized and inactivated in broad-spectrum visible light in the presence of a variety of alpha-dicarbonyl compounds such as 2,3-butanedione and 1-phenyl-1,2-propanedione. In visible light, 1-phenyl-1,2-propanedione inactivated enzymes more rapidly than the other diketones tested.
Thus, there is a need in the art for new photoinitiator systems for forming photo-cured dental resins which photopolymerize with higher efficiency and with less yellowing.

Photosensitizers for free radical polymerization initiation resins and method of making the same


A stator and a stator manufacturing method is provided in which a space factor can be improved, while reducing the number of components and simplifying the manufacturing process. A stator comprises a plurality of teeth cores 11 positioned at predetermined intervals on a predetermined circumference, a core back core 12 provided on a circumferential outside between adjacent teeth cores, and stator windings 13 which are wound around the teeth cores. An approximately U-shaped insulating sheet 14 is provided between adjacent teeth cores 11 with the ends of the sheet facing towards the circumferential outside, the insulating sheet 14 is provided between the teeth cores 11 and the stator windings 13, and the ends of the insulating sheet 14 are bent inward and occluded by an inner end surface of the core back core 12 which is inserted from the circumferential outside.

1. Field of the Invention
The present invention relates to a stator for use in rotary electric machines such as electric motors and generators, and a stator manufacturing method.
2. Description of the Related Art
Conventionally, stators 1 for use in rotary electric machines such as electric motors and generators include those comprising a stator core 2 as shown in the plan view of FIG. 11. The stator core 2 comprises a core back core 3 formed in an approximately annular shape, and a plurality of teeth cores 4 disposed radially on the core back core 3. Stator winding 6 are wound around the side surfaces of these teeth cores 4 to form the stator 1.
However, in order to prevent excess current from flowing through the teeth cores 4, it is necessary to ensure insulation between the stator windings 6 and the teeth cores 4. Consequently, insulation between the stator windings 6 and the teeth cores 4 is conventionally ensured by providing insulating sheets 7 and 8 such as those shown in FIGS. 12A to 12D, for example.
Specifically, first, the approximately U-shaped insulating sheet 7 is disposed so as to cover the side surfaces of adjacent teeth cores 4 and the inner surface of the core back core 3 (see FIGS. 12A and 12B). Next, the stator windings 6 are wound on the teeth cores 4, the side surfaces of which are covered by the insulating sheet 7 (see FIG. 12C). The approximately flat insulating sheet 8 is then inserted into a slot 5 between the adjacent teeth cores 4 and fitted tightly against the approximately U-shaped insulating sheet 7, thereby sealing the stator windings 6 within the slot 5 (see FIG. 12D). By employing such a construction, insulation between the stator windings 6 and the teeth cores 4 can be ensured. To ensure that the approximately flat insulating sheet 8 is capable of this sealing action, the insulating sheet 8 has a greater thickness than the approximately U-shaped insulating sheet 7.
However, in the related art described above, because the winding of the stator windings and the positioning of the insulating sheets are performed inside the locations of the teeth cores, work space for the equipment (not shown in the figure) which performs the winding or positioning must be made available on the inside of the positioning sites. Consequently, a problem occurs in that the extent to which the stator windings can be wound on the teeth cores is restricted by the space required by this equipment, and the space factor is reduced accordingly.
In addition, in the related art described above, the use of two different types of insulating sheets, which differ in shape and thickness within each of the slots between adjacent teeth cores is problematic in that the number of components increases. Furthermore, because the assembly of the two types of insulating sheet must be performed in separate processes, the manufacturing process becomes complicated.
In accordance with these circumstances, an object of the present invention is to provide a stator and a stator manufacturing method in which the space factor can be improved, while reducing the number of components and simplifying the manufacturing process.
In order to resolve the problems described above, a first aspect of the present invention provides a stator (for example, a stator 10 of the embodiment) comprising a plurality of teeth cores (for example, teeth cores 11 of the embodiment) positioned at predetermined intervals on a predetermined circumference, a core back core (for example, a core back core 12 of the embodiment) provided on a circumferential outside between adjacent teeth cores, and stator windings (for example, stator windings 13 of the embodiment) which are wound around the teeth cores, wherein an approximately U-shaped insulating sheet (for example, an insulating sheet 14 of the embodiment) is provided between adjacent teeth cores with the ends of the sheet facing towards the circumferential outside, the insulating sheet is provided between the teeth cores and the stator windings, and the ends of the insulating sheet are bent inward and sealed off by an inner end surface of the core back core which is inserted from the circumferential outside.
By employing the above construction, it is possible to position the insulating sheet from the circumferential outside, once the plurality of teeth cores have been positioned on the predetermined circumference. Consequently, the operation of positioning the insulating sheet can be performed from the circumferential outside, and it is consequently no longer necessary to reserve space for performing the positioning operation on the circumferential inside. Furthermore, in a similar manner, the core back core can be inserted between and connected with the adjacent teeth cores from the circumferential outside, and consequently it is not necessary to reserve space on the circumferential inside for the core back core connection operation. Accordingly, because the space between the teeth cores for winding the stator windings can be increased, the space factor can be improved.
Furthermore, because the approximately U-shaped insulating sheet is provided in each slot between adjacent teeth cores, and the ends of the insulating sheet are bent inward and sealed off by the inner end surface of the core back core, it is possible to ensure insulation between the stator windings and the teeth cores using a single insulating sheet for each slot. Consequently, the number of components can be reduced when compared with conventional examples because the number of insulating sheets is reduced by half. Moreover because the operation of inserting the core back core and the operation of sealing off the insulating sheet can be performed simultaneously, the manufacturing process can be simplified.
A second aspect of the present invention is a stator wherein there is provided a bending section (for example, a bending section 15 in the embodiment) formed by bending an end of the U-shaped insulating sheet inward between the teeth cores. By employing the above construction, the ends of the approximately U-shaped insulating sheet are reliably bent and sealed off when the core back core is inserted, and consequently the formability can be improved.
A third aspect of the present invention is a stator wherein a guide recess (for example, a guide recess 16 of the embodiment) which guides the ends of the insulating sheet is provided on an inner end surface of the core back core.
By employing the above construction, the ends of the approximately U-shaped insulating sheet are guided and bent inwards by the guide recess when the core back core is inserted, and are more reliably sealed off, and consequently the formability can be even further improved.
A fourth aspect of the present invention is a stator manufacturing method wherein by positioning a plurality of teeth cores at predetermined intervals on a predetermined circumference, providing an approximately U-shaped insulating sheet between adjacent teeth coreso that the ends thereof are facing towards a circumferential outside, windingtator winding around the teeth cores on which the approximately U-shaped insulating sheet is provided, and inserting a core back core between adjacent teeth cores from the circumferential outside, both ends of the approximately U-shaped insulating sheet are bent over and sealed off.
By employing the above construction, the space factor can be improved, the number of components can be kept to a minimum, and the manufacturing process can be simplified.


A pair of dental burs for shaping mandibular teeth into the proper sloped configuration for lingual occlusion or denture teeth. The first bur is provided with a non-cutting central portion that is flanked by two slightly angled cutting surfaces, and the second bur is provided with a cutting central portion that is flanked by two slightly angled non-cutting surfaces. The angulation of the two cutting surfaces on the first bur may or may not match each other on a given set of burs, and the angulation of the two non-cutting surfaces on the second bur may or may not match each other on a given set of burs, but the angles of the cutting surfaces on the first bur match the angles of the non-cuffing surfaces on the second bur. The burs are used sequentially; i.e. the first bur is used first and the second bur is used second, to achieve the desired slope and center floss for the mandibular teeth without cutting too deeply.

1. Field of the Invention
The present invention relates to burs for grinding denture teeth. More specifically, the present invention relates to a pair of burs that can be used in conjunction to grind denture teeth so that the teeth have a lingual occlusion.
2. Description of the Related Art
For many years dental professionals have sought to produce dentures that would be esthetically pleasing, while still being comfortable and functional for the wearer. Many of the problems associated with dentures arise from the fact that the top denture plate is a unitary piece and the bottom denture plate is also a unitary piece and neither plate attaches securely in the wearer's mouth. Thus the top plate and the bottom plate each functions as a unitary tooth that can tip or rise up within the wearer's mouth.
For this reason, it is important that the teeth be positioned relative to each other to maximize chewing efficiency and to minimize tipping and raising up of the dentures. One of the more popular ways of making dentures is to make them with lingual occlusions. A lingual occlusion is where the maxillary lingual cusp is the dominant functional element, and occludes against the corresponding portion of the mandibular tooth. The mandibular teeth of a lingual occlusion are of two general types: they are either flat or they have a slight angulation. It is the latter group of dentures that the present invention is used to create, i.e. dentures with lingual occlusions that employ mandibular teeth with slight angulation and an area usually in the center of the lower tooth that will occlude with the upper tooth lingual cusp.
The angulation of the mandibular teeth in this type of lingual occlusion is slight so that the teeth can grind together to chew food without causing the plate to tip or be kicked up. The mandibular teeth must be shaped so that the fossae of the mandibular teeth are not too deep, the fossae properly receive the maxillary lingual cusps, and the angulation of the mandibular teeth is properly sloped. Currently, there are no burrs to allow a practitioner to quickly and accurately shape the mandibular teeth into the ideal sloped configuration.
The present invention addresses this problem by providing a pair of burs that can be used to shape the mandibular teeth into the proper sloped configuration required for lingual occlusion of the dentures. Specifically, the present invention is a pair of burs that include a first bur for cutting the cusps of the mandibular teeth while not cutting the fossa and a second bur for cutting the fossa of the mandibular teeth while not cutting the cusps. The first bur is provided with a non-cutting central port-on that is flanked by two slightly angled cutting surfaces, and the second bur is provided with a cutting central portion that is flanked by two slightly angled non-cutting surfaces. The burs are used sequentially; i.e. the first bur is used followed by use of the second bur, to achieve the desired slope and center fossa for the mandibular teeth for dentures.
The angulation of the two cutting surfaces on the first bur may or may not match each other on a given set of burs, and the angulation of the two non-cutting surfaces on the second bur may, or may not match each other on a given set of burs. However, the angulation of the slightly angled cutting surfaces provided on the first bur and the angulation of the slightly angled non-cutting surfaces provided on the second bur match each other for any given set of burs. It is important that the first and second burs in a set of burs match so that the non-cutting surfaces of the second bur will fit with the tooth after the tooth has been shaped with the cutting surfaces of the first bur and so that the non-cutting central portion of the first bur will fit with the tooth after the tooth has been shaped with the cutting central portion of the second bur, thus preventing the possibility of cutting away too much of the tooth.


An improved countermeasure detection system and technique for determining e range and azimuth of a noise jammer in a radar environment. A signal limiter is inserted into the output loops of a conventional multi-loop side-lobe canceller system such that the loops only respond to interference signals in the main lobe of a radar antenna as it sweeps through the jamming source. Each of the loops develops a weighting signal that is a measure of the absolute phase of the interference signal at an auxiliary antenna with respect to the phase center of the main radar antenna. By using two or more weighting signals and the known placement of each auxiliary antenna relative to the main radar antenna, the range and azimuth of a jammer can be calculated using available processing equipment to solve simultaneous equations.

The present invention relates to counter countermeasure systems and more particularly to improved techniques for determining the range and direction of an interference source.
One of the most common techniques for disrupting a tracking radar system is to provide a noise jammer to produce interference at the frequency of the tracking radar to prevent information retrieval from the radar signal. This technique is particularly effective when the radar frequency is known or can be approximated because of conditions or environment which dictate the use of specific radar frequencies. While such jamming techniques can in some instances be substantially overcome by using different frequencies or sophisticated cancelling equipment, it is sometimes desirable to be able to simultaneously locate the position of the jammer to enable jammer destruction or provide information as to enemy position and deployment.
One such prior method for determining jammer position has utilized a special directional auxiliary antenna mounted to the main radar antenna of a tracking radar. A special loop is then used to determine signal phase as the radar tracks the jammer, which together with the pointing angles of the antennas, allows a jammer position determination. This technique requires the special directional auxiliary antenna and is limited in accuracy by the distance restriction fixed by mounting the directional antenna onto the radar antenna. In addition, a special loop is required to develope the phase signal necessary for position determination.
Other prior known techniques have used the conventional triangulation approach where the electromagnetic interference radiation is detected by several directional detectors located at various stations or in multiple vehicles separated by relatively large distances. By knowing the distance between the stations or the vehicles and the direction of the jammer from each position, the range and therefore position of the jammer, can easily be calculated. While this technique is relatively successful, the distance between stations must be precisely known and continuously monitored, and the direction information must be transmitted between stations. Such conditions require constant information exchange between plural stations, particularly for moving vehicles, and subject the stations to enemy detection that might otherwise be concealed.
Accordingly, the present invention has been developed to overcome the specific shortcomings of the above known and similar techniques and to provide a relatively simple and reliable technique for determining range and azimuth of an interference source.

Determination of jammer range and azimuth by use of a coherent side lobe canceller system

The United States of America as represented by the Secretary of the Navy


Some embodiments include methods of forming memory cells. Chalcogenide is formed over a plurality of bottom electrodes, and top electrode material is formed over the chalcogenide. Sacrificial material is formed over the top electrode material. A plurality of memory cell structures is formed by etching through the sacrificial material, top electrode material and chalcogenide. Each of the memory cell structures has a cap of the sacrificial material thereover. The etching forms polymeric residue over the sacrificial material caps, and damages chalcogenide along sidewalls of the structures. The sacrificial material is removed with an HF-containing solution, and such removes the polymeric residue off of the memory cell structures. After the sacrificial material is removed, the sidewalls of the structures are treated with one or both of H2O2 and HNO3 to remove damaged chalcogenide from the sidewalls of the memory cell structures.

Nonvolatile memories can be important elements of integrated circuits due to their ability to maintain data absent a power supply. Phase change materials have been investigated for use in nonvolatile memory cells. Memory cells containing phase change materials are often referred to as phase change memory cells. The phase change memory cells may be incorporated into random access memory (RAM). Such memory may be referred to as phase change RAM (PCRAM).
Chalcogenide materials have been of particular interest for utilization in PCRAM. Chalcogenide materials are capable of stably transitioning between amorphous and crystalline phases. Each phase can exhibit a particular resistance state. Specifically, an amorphous state exhibits a relatively high resistance, and a crystalline state exhibits a relatively low resistance. The different resistance states can be used to represent the logic values of the memory cell.
Although chalcogenide materials show promise for utilization in nonvolatile memory cells, there are often difficulties encountered in attempting to incorporate the chalcogenide materials into integrated circuitry. Accordingly, it would be desired to develop improved methods for fabrication of memory cells containing chalcogenide materials.

Methods of forming memory cells, and methods of patterning chalcogenide-containing stacks


A one-piece miniature insulation displacement contact adapted for post-termination insertion and retention within a channel of an insulative connector housing. The contact includes a continuous channel extending the length of a conductor termination portion formed at one end of the contact, extending the length of a transition portion of the contact, and extending a portion of the length of a terminal engagement portion of the contact; a floor of the continuous channel extending the entire length of the contact. The conductor termination portion includes opposing first walls coextensive with the floor and opposing insulation displacement jaws shear formed from each of the first walls where each of the jaws is displaced inwardly to juxtapose respective innermost insulation piercing edges of each of said jaws to form an insulation displacement slot.

The increasing demand for a reduction in size of electrical connectors dictates a search for a miniature insulation displacement contact that can be inexpensively manufactured while concomitantly possessing the desirable characteristics of high strength and resiliency.
Two proposed types of miniature insulation displacement contacts are disclosed in U.S. Pat. No. 4,243,286 issued to Brown et al. and U.S. Pat. No. 4,385,794 issued to Lucius. Both of these proposed contacts teach the application of indents or embossments to upstanding insulation piercing jaw members to strain harden the jaw members to increase their rigidity and strength in order to prevent termination induced buckling and bending deformation of the jaw members. The application of indents or embossments to the insulation piercing jaw members increases the manufacturing complexity and cost of each contact and by increasing the rigidity of the jaw members the indents or embossments necessarily decrease the resiliency of the insulation displacement jaw members; resilient insulation displacement jaw members being desirable to insure that a terminated conductor remains in electrical and mechanical contact with the insulation displacement jaws in the face of varying environmental stresses experienced by the contact during use, such as vibrational forces and temperature cycles.
The contacts suggested by Brown et al. and Lucius also require the application of lateral support to the piercing jaw members during termination of a conductor therebetween to prevent damage to the contact, Brown et al. requiring termination within a connector housing channel and Lucius requiring the use of special termination tooling as seen in FIG. 3 of Lucius.
Both Brown et al. and Lucius teach the use of a contact having a flat cantilever portion for connecting the insulation displacement portion of each contact with the terminal engagement portion of each contact. Such a flat cantilever connecting portion is not sufficiently strong to insure that axial deformation of the contact during termination and/or insertion of the contact within a connector housing is prevented. Thus, termination of such a contact or post termination insertion of such a contact into a connector housing can result in axial deformation of the contact about the planar cantilever portion of the contact.
Although different types of miniature contacts have been proposed, none disclose or suggest a miniature contact that has sufficient strength to successfully pierce the insulation of a conductor while retaining substantially all of its resiliency to effect reliable termination of a conductor therein, that can be terminated outside of a connector housing without the use of special tooling to provide lateral support, that effectively resists axial deformation during termination and insertion of the contact within a connector housing, and that presents a gradually tapering profile to facilitate insertion of a contact within the housing.


An injection molding nozzle upon which a thermocouple element can be removably mounted and be self-retained in place. The nozzle has a front portion and a larger diameter rear collar portion with a thermocouple element duct therethrough. A thermocouple element bore extends rearwardly from the front end of the nozzle and a thermocouple element groove extends outwardly across the rear end from the thermocouple element duct. A front portion of a suitably bendable and retentive thermocouple element is inserted into the bore in the front end and bent to extend rearwardly to the duct through the rear collar portion. A rear portion of the thermocouple element is bent into place in the groove in the rear end. The thermocouple element securely retains itself in this position while the nozzle is being installed in the mold.

This invention relates generally to injection molding and more particularly to a heated nozzle upon which a thermocouple element can be removably mounted in a predetermined position and be securely self-retained in place.
It is well known to use a thermocouple element to continuously measure the temperature in a heated injection molding nozzle. In order to monitor the operating temperature near the gate, it is important that the thermocouple in the front portion of the thermocouple element be positioned near the front end of the nozzle. It is also very critical that the thermocouple in each nozzle be very accurately positioned. Thus the thermocouple element must be mounted so that it is securely retained in place, particularly during installation of the nozzle in the mold. An example of the thermocouple being positioned near the front end of the nozzle is shown in the applicants' U.S. Pat. No. 4,768,283 which issued Sep. 6, 1988 where the thermocouple element extends into the insulative air space through a thermocouple duct through the rear collar portion of the nozzle. While the thermocouple element is bent into a groove in the rear end of the nozzle, there is no provision for retaining the thermocouple in place during installation.
More recently, the applicants' Canadian patent application Ser. No. 2,078,890 filed Sep. 22, 1992 entitled "Injection Molding Nozzle with Thermocouple Receiving Torpedo" shows the thermocouple retained in position by a wire wrapped around the nozzle to hold the thermocouple element in place against it. In the applicants' Canadian patent application Ser. No. 2,091,409 filed Mar. 10, 1993 entitled "Injection Molding Torpedo with Thermocouple Bore" the thermocouple is held in place by the thermocouple element extending radially outward into contact against a tapered portion of the well in the mold. However, this does not ensure that the thermocouple is retained in place during installation of the nozzle in the mold.

Injection molding nozzle which retains a thermocouple element


A kit enabling creation of a personal keepsake by at least one user and methods of using same. A first container is openable by a user, and a plurality of candles are enclosed in the first container. Each candle has a wick at one end and an opposite end having a base width. The kit further includes a second container which is openable by the user, and a plurality of tubes enclosed in the second container. Each tube has at least one end which is initially open and defines a chamber having a chamber width and a chamber length to receive a storage medium, the initially open end adapted to receive the base width of one of the candles.

Life events such as birthdays and child-births, graduations, first communions and other religious ceremonies, marriages, recoveries from illness or surgeries, and sports victories are generally commemorated by selecting among greeting cards or souvenirs offered by mass-marketing entities such as publishers, souvenir makers, and ring manufacturers. With such "generic" products, however, the customer depends on the manufacturer or vendor to provide a suitable "message" which communicates a desired sentiment or expression of thought.
It can be time-consuming and frustrating to search for an appropriate product that expresses exactly what the customer is feeling or thinking and would like to convey. Additionally, most physical products simply convey a single message.
It is therefore desirable to facilitate creation of a personalized, physical keepsake which exactly reflects the customer's personal message to another person or to herself or himself at a later point in time.


An objective of the present invention is to provide a nitrile hydratase capable of producing 2-hydroxy-4-methylthiobutyroamide. The present invention provides a novel nitrile hydratase producing α-hydroxyamide using, α-hydroxnitrile as the substrate, and the encoding DNA thereof. The enzyme can be obtained from Rhodococcus sp. Further, the enzymatic activity of the enzyme can he maintained stably during the reaction. The present invention provides a method for producing amide compounds, the method comprising the step of reacting this enzyme to nitrile compounds. According to the present invention, from hydroxy nitrile compounds, corresponding amide compounds can be produced biochemically without reducing the enzyme activity of nitrile hydratase.

To improve the expression level of nitrile hydratase, methods that overexpress nitrile hydratase in microorganism cells by genetic engineering and that convert nitrile compounds to the corresponding amide compounds using the cells have been examined. For example, known nitrile hydratases are derived form the following microorganisms. All of the nitrile hydratases are enzymes consisting of two types of heterogeneous subunits.
The genus Rhodococcus (Examined Published Japanese Patent Application (JP-B) NO. Hei 3-54558)
The genus Rhodococcus (Unexamined Published Japanese Patent Application (JP-A) NO. Hei 2-119778)
The genus Pseudomonas (JP-A Hei 3-251184) The genus Rhodococcus rhodochrous (EP Patent Application NO. 455646)
However, in all cases, the expression level of nitrile hydratase activity is not high enough with E. coli transformed with an expression plasmid containing an insert fragment of any nitrile hydratase gene described in these patent publications; the nitrile-hydrating activity per weight of cells of the transformant is lower than that of the original microorganism from which the gene is derived (Ikehata, O., Nishiyama, M., Horinouchi, S. and Beppu, T. "Primary structure of nitrile hydratase deduced from the nucleotide sequence of a Rhodococcus speices N-774 and its expression in Escherichia coli" Eur. J. Biochem. 181(1989), 563-570; Nishiyama, M., Horinouchi, S., Kobayashi, M., Nagasawa, T., Yamada, H. and Beppu, T. "Cloning and Characterization of Genes Responsible for Metabolism of Nitrile Compounds from Pseudomonas chlororaphis B23" Journal of bacteriology 173 (1991):2465-2472; Kobayashi, M., Nishiyama, M., Nagasawa, T., Horinouchi, S., Beppu, T. and Yamada, H. "Cloning nucleotide sequence and expression in Escherichia coli of two cobalt-containing nitrile hydratase genes from Rhodococcus rhodochrous J1" Biochimica et Biophysica Acta. 1129 (1991):23-33).
As mentioned above, it has been possible to express the nitrile hydratase activity itself in E. coli by genetic recombination techniques. However, so far, there is no available transformant having so high nitrile hydration activity as to be used for the industrial production of amides.
On the other hand, a nitrile hydratase, which exhibits very high nitrile hydration activity, has been found in Achromobacter xerosis (IFO 12668), and the gene encoding the enzyme has been cloned. Further, the gene was introduced into E. coli using an expression plasmid, and nitrile hydratase was overproduced with the resulting transformant (JP-A Hei 8-266277). This report shows only examples of acrylamide and α-hydroxyisobutylamide production, and thus there is no description on the activity of this enzyme toward 2-hydroxy-4-methylthiobutyronitrile in the report.
Thus, little is known about nitrile hydratases that can use 2-hydroxy-4-methylthiobutyronitrile (hereinafter abbreviated as HMBN) as a substrate. Furthermore, there is no previous method for producing 2-hydroxy-4-methylthiobutylamides (hereinafter abbreviated as HMBAm) from 2-hydroxy-4-methylthiobutyronitrile using E. coli transformed with an expression plasmid containing the nitrile hydratase gene as an insert fragment.
On the other hand, with respect to the production of α-hydroxyamide by microorganism, there is a known method for producing the corresponding amides from lactonitrile, hydroxyacetonitrile, α-hydroxy methylthiobutyronitrile and such, using microorganisms belonging to the genus Bacillus, the genus Bacteridium, the genus Micrococcus or the genus Brevibacterium (see JP-B Sho 62-21519). In addition, there also exists a publicly known method for producing mandelamide from cyanohydrin (see JP-A Hei 4-222591; JP-A Hei 8-89267).
However, the enzymes having the nitrile hydratase activity capable of converting nitrile compounds to amide compounds have a problem that the enzymes readily lose their own enzymatic activities due to the presence of the nitrile compound as starting material or amide compound as the product. If the concentration of nitrile compound is raised in order to increase the rate of amidation, the nitrile hydratase is readily inactivated in a short period of time, and thus it is hard to obtain amide compound as the reaction product in a desired period of time. In addition, the amide compounds as the products also readily inactivate the nitrile hydratase, and thus it is difficult to obtain a high concentration of amide compound.
Furthermore, in varying degree depending on the type of compound, α-hydroxynitrile has been known to be partially decomposed to the corresponding aldehyde and hydrocyanic acid in a polar solvent (see V. Okano et al., J. Am. Chem. Soc., Vol. 98, 4201 (1976)). In general, aldehydes are linked to proteins and can inactivate the enzymatic activity (see Chemical Modification of Proteins, G. E. Means et al., Holden-Day, 125(1971)). Further, like aldehyde, hydrocyanic acid (cyanide) can also inhibitorily act on many enzymes. Thus, aldehyde and cyanide produced from α-hydroxynitrile as the starting material can be the cause of decreased enzymatic activity. Because of a problem that the enzyme is inactivated in a short period of time in the enzymatic hydration or hydrolysis of α-hydroxy nitrile, it was difficult to obtain a high concentration of α-hydroxyamide with high productivity.
To prevent the loss of enzymatic activity, various methods for increasing the enzymatic activity or for suppressing the loss of enzymatic activity (inactivation) have been tested. Such attempts include, for example, the following:                The reaction is carried out at a lower temperature ranging from the freezing point to 15° C. (JP-B Sho 56-38118).        A lower concentration of substrate is continuously supplied from multiple supply ports (JP-B Sho 57-1234).        A microorganism or processed product thereof is treated with an organic solvent (JP-A Hei 5-308980).        The reaction is carried out in the presence of higher unsaturated fatty acid (JP-A Hei 7-265090).        The microorganism cells are subjected to crosslinking treatment with glutaraldehyde and such (JP-A Hei 7-265091; JP-A Hei 8-154691).        The concentration of hydrocyanic acid contaminated in the nitrile compound is lowered by a chemical method, and then nitrile hydratase is allowed to react with the nitrile compound (see JP-A Hei 11-123098).        The long-term stabilization of the enzymatic activity is achieved by the presence of sulfite ion, acid sulfite ion or dithionite ion (see JP-A Hei 8-89267)        Aldehyde is added (see JP-A Hei 4-222591).
None of these methods had sufficient effects on the industrial applications. Although some of the methods were effective, they had room for economical or practical improvement. For example, the above-mentioned method adding aldehyde requires a large quantity of aldehyde in 1-5 times molar excess of cyanohydrin as the start material, and thus the method was less than an economical solution. Similarly, it is illustrated that the method adding sulfite ion, acid sulfite ion or dithionite ion requires addition of the ion in an amount equivalent to or larger than that of the starting material, and thus the method was not practical one.
An objective of the present invention is to provide a nitrile hydratase having high nitrile-hydrating activity. Another objective of the present invention is to provide a stable nitrile hydratase capable of maintaining the high enzymatic activity over a long period of time. In addition, still another important objective of the present invention is to provide a nitrile hydratase capable of also using 2-hydroxy-4-methylthiobutyronitrile as a substrate.
Furthermore, another objective of the present invention is to provide the gene encoding nitrile hydratase having high nitrile hydration activity, recombinant plasmid containing the gene and transformant containing the recombinant plasmid. In addition, yet another objective of the present invention is to provide a method for producing the corresponding amides from nitrile using the transformant expressing high nitrile hydration activity.

Nitrile hydratase and a method for producing amides


A battery includes a main body having a space therein, and including a channel communicating between an outside and the space; a pair of electrodes adjoining the space; and a valve that closes the channel responsive to pH.

Batteries are known, which are introduced to the digestive tract of a living body where a fluid in the digestive tract functions as an electrolyte, to generate electric power. For example, the battery disclosed in Patent Document 1 includes a space to which a fluid is to enter, and a channel communicating between the space and the outside of the battery. The gastric fluid are used as a fluid acting as an electrolyte.


A novel retaining clip for use with strain relief connectors on electrical boxes that is capable of being attached to the threaded connector directly without threading has a series of spring clip tabs which engage an electrical box at an opening therein as the connector is displaced through the opening.

Connectors for use with electrical boxes or enclosures are well known in the art. Electrical boxes, junction boxes, fuse boxes and other types of electrical enclosures are universally used in industrial and residential construction. As a result of their extensive use, these enclosures have dimensions which are of a standard magnitude. Electrical wire conduit, i.e. flexible (flex), rigid or intermediate hardness conduit as well as EMT (electric metallic tubing), MC and AC cable are all correspondingly produced with standardized dimensions. Typically, the conduit is joined to electrical boxes or other enclosures using a connector which is fixedly attached to the conduit and to an electrical box at an opening therein. A prime function of these connectors is to provide strain relief.
Known threaded connectors require a labor intensive two step process to assemble with a retaining ring. The connector comprises a body having an end threaded portion, a central flange and a second portion either collinear with the threaded portion or at an angle thereto which is adapted to receive a particular type of wire, conduit or cable. The threaded portion is received by the opening in the electrical box or enclosure. A threaded nut or ring is then screwed onto the threaded portion of the body drawing the flange up against the housing. The ring typically comprises a plurality of angled spaced tabs which extend from an outer peripheral surface of the ring. Tightening of the ring is accomplished by use of a screwdriver and hammer, with the angle of the tabs configured to make unintentional loosening difficult. It would be advantageous to have a retaining apparatus for attaching threaded strain relief connectors to an electrical enclosure which would quickly connect directly to the threaded portion by a one step process and which would securely fasten the connector to the housing. The present invention is drawn towards such an element.

Electrical connector for mounting to electrical enclosures


A curable composition and method for producing a tear resistant, yet soft and deformable in-the-ear product yielding the user greater comfort and durability. The curable composition incorporated into a hearing aid apparatus provides a deformable, yet tear resistant housing, which may be mated to a soft tip component. The hearing aid housing provides better comfort, durability and acoustic performance for a variety of ear canal shapes. The curable composition that provides these properties includes at least one urethane acrylate oligomer, at least one reactive diluent and a cure system. The composition when cured desirably produces a tear strength of at least about 75 pli and a hardness of about Shore A 60 to about 75.

1. Field of the Invention
The present invention relates to curable compositions and methods for producing tear resistant, yet soft and deformable in-the-ear products yielding the user greater comfort and durability. Additionally, the nature of the inventive soft body design provides better acoustic performance for a variety of ear canal shapes and various motion affecting the ear canal, such as head and jaw movements.
2. Brief Description of Related Technology
Hearing aids need to be durable, comfortable and reliable. Otherwise, end users may oftentimes resist their use. Durability focuses on the integrity of the material, long lasting, and integrity of the bonding of the components. Comfortability implies that the device is soft when placed in the ear canal. Reliability implies superior acoustic quality throughout the life of the device, which requires adequate sealing within the ear canal. The challenges to satisfy the comfort and reliability objectives are due to the dynamic nature of the ear canal, and the geometric alterations of the ear canal due to natural anatomical movement. The dynamic nature of the ear canal varies from person to person, and even the anatomical shape varies from ear to ear of the same person. The canal shape is geometrically altered by motion from the head and the mandible, usually causing elliptical elongation. These differences in canal shape and changes due to body movement make it difficult to achieve a comfortable and true acoustic seal.
Challenges in meeting comfort as well as durability are due to the nature of the ear canal and materials able to use. In the past, hearing aids were made from hard acrylic materials which have proven to be durable but uncomfortable. And when the device was displaced by motion, a leakage of sound pressure occurred. Attempts were made to use rubber instead of the hard acrylic materials, such as in U.S. Pat. No. 3,527,901 to Geib. Rubber is softer and more resilient than hard acrylic but it is not very comfortable and still lacks a true acoustic seal upon motion.
Attempt to use soft vinyl materials have also not been entirely successful in meeting the aforementioned characteristics. Although vinyl may be softer than rubber and offers a better acoustic seal, soft vinyl lacks durability, and in fact, after a relatively short period of time it shrinks, turns yellow and becomes hard or brittle. It is recommended in the hearing aid industry to replace vinyl components for behind-the-ear ear molds at least annually.
Silicone materials have also been used as the housing material, such as disclosed in U.S. Pat. No. 6,022,311 to Juneau et al. The '311 patent discloses a two layer silicone housing bonded with an adhesive to the plastic faceplate of the device. Although silicone has a longer wear life than vinyl materials, it lacks strong bonding properties to the plastics commonly used in hearing aid instrumentality.
Polyurethanes have in the past been used for hearing aid components. For example, U.S. Pat. No. 5,763,503 to Cowperthwaite et al. discloses a housing for an in-the-ear hearing aid made from a solid and stiff polyurethane, polyesters or polyether to support the instrumentality. The Shore D hardness is from 50 to 90. Polyurethane has been proven to provide a better acoustic seal than polyvinyl. The properties needed for the housing require a stiff, firm, harder material to support the instrumentality which conflict with the objective for softer, comfortable fit within the ear canal.
Thus, instead of focusing on the housing material, attempts have been made to supply an attachment to the housing such as a covering or sleeve. This preserves the durability of the original housing material, while adding a comfort factor. For instance, U.S. Pat. No. 4,870,688 to Voroba et al. discloses a soft, resilient covering which is affixed to the rigid bonding of the ear shell. No covering material or details on affixing the covering to the ear shell were disclosed. Another example, U.S. Pat. No. 5,002,151 to Oliveira et al., discloses a disposable sleeve made of a soft polyurethane retarded recovery foam attached to the ear piece by mating of screw threads on the sleeve and the ear piece. Unfortunately, a sleeve concept would lack durability and require continual replacement. The sleeve creates a safety concern due to the possibility of this attachment to slip off from motion in the ear canal and possibly lodging in the ear canal. The inadequacy and quality of the disposable sleeves bonded to the housing is a major concern.
Therefore, there is a need for a deformable, soft hearing aid housing, which is tear resistant, and thus, a durable, long-lasting material. It is desired that such hearing aid housing be comfortable, soft enough, and reliable to provide superior acoustics.


A mask, and a method for fabricating the mask, for optically transcribing a pattern corresponding to integrated circuits on a semiconductor substrate by using an exposure device. The mask has a plurality of features corresponding to circuit elements with at least one recessed corner defined by two edges. The mask includes a plurality of proximity correcting auxiliary features, each having two extension parts which extend in parallel along and spaced away from each of two edges defining a recessed corner. The extension parts are bent at a same angle corresponding to the recessed corner, to be connected to each other. The proximity correcting auxiliary features have polygonal shapes having predetermined widths. Since polygonal auxiliary features are provided corresponding to the recessed corner, auxiliary features are symmetrically maintained, reducing a number of auxiliary features. The amount of data representing the whole mask pattern can thus be reduced.

The present application claims priority under 35 U.S.C. xc2xa7119 to Korean Application No. 2001-16961 filed on Mar. 30, 2001, which is hereby incorporated by reference in its entirety for all purposes.
1. Field of the Invention
The present invention relates to a mask for a photolithography process and a method of fabricating the same, and more particularly to a mask for a photolithography process and a method for improving an auxiliary feature, such as an assisted bar, a scattering bar or an intensity leveling bar, which is formed at peripheries of isolated edges of features corresponding to each circuit element of an integrated circuit, so as to correct the optical proximity effect (OPE).
2. Description of the Related Art
As the design rule of devices and connecting wires integrated in a semiconductor chip is reduced, conventional lithography techniques using an ultraviolet ray do not prevent the distortion of a pattern formed on a wafer. That is, even though an I-line and a DUV (deep ultraviolet) ray have wavelengths of 248 nm, a minimum design rule thereof is 100 nm, such that distortion of the pattern is caused by diffraction and interruption of light during a semiconductor device manufacturing process. The distortion of the pattern becomes more serious as the minimum design rule is reduced. Accordingly, it is required to compensate for distortion of the pattern occurring during a photolithography process because of a limit-resolution.
In a photolithography process, a pattern of a photo mask is copied on a wafer through an optical lens. Since an optical system for projecting an image acts as a low-band filter, the image formed on the wafer is distorted as compared with an original shape. For instance, when a rectangular-shaped mask is used, a circular pattern is formed on the wafer since the light having high-frequency, that is, the light corresponding to edges of the rectangular-shaped mask, is not transmitted. When the mask pattern has a large size, a basic spatial frequency is lowered, so that light having relatively high frequency can be transmitted through the mask, whereby an image substantially identical to the original image can be formed on the wafer. However, when the pattern has a small size, the spatial frequency becomes high, so that the transmission rate of light is reduced, whereby serious distortion results.
Various types of lithography equipment have been developed to reduce distortion, but distortion still remains a problem. For this reason, there has been an attempt to change the design of the mask to compensate for the distortion of the pattern. For example, optical proximity correction (OPC) has been considered. According to optical proximity correction, the shape of the mask is pre-deformed considering the distortion of the pattern, so as to form a required image on the wafer.
Optical proximity correction can be achieved when adjacent features are interacted with each other in such a manner that a pattern-dependent alteration can be created. That is, lines, which are designed to have the same dimension and which are arranged in a layout such that they have different proximity with respect to other features, have different dimension from each other after the developing process has been finished. Accordingly, densely arranged lines are differently transcribed as compared with spaced lines. If line dimension is not constantly reproduced, serious problems occur in the integrated chip (IC).
U.S. Pat. No. 5,242,770 discloses a mask including additional lines referred to as scattering bars, assisted bars or intensity leveling bars for performing the function of adjusting an edge intensity gradient of an isolated edge in a mask pattern. The gradient of the isolated edge is adjusted such that the gradient of the isolated edge matches the edge intensity gradient of a densely packed edge, by means of the additional lines. As a result, the isolated feature is identically transcribed with respect to the densely packed feature, so that the optical proximity effect is greatly reduced.
U.S. Pat. No. 5,663,893 discloses a method for adding sub-lithographic correction features to all features in an original mask pattern. The original mask pattern is segmented and the correction features are formed in each segment. As a result, computer processings are carried out in a time and memory efficient manner.
U.S. Pat. No. 5,821,014 discloses a design rule of a scattering bar between features which are spaced by a predetermined intermediate distance as compared with isolated features and densely packed features. Accordingly, the proximity correction is possible with respect to the densely packed features.
U.S. Pat. No. 6,120,952 discloses a method for reducing the proximity effect by adjusting a dimension of a main feature with respect to a proximity correction feature, after defining a space between the main feature and the proximity correction feature. By adjusting the dimension of the main feature, an optimum feature dimension can be transcribed.
As mentioned above, techniques for correcting the proximity effect using auxiliary features in the form of bars are variously developed and used in the field. However, the design rule of the conventional bar-type auxiliary features has the following limitations: 1) isolated edges, in which features are spaced by a predetermined distance, have to be used; 2) auxiliary features have to be spaced by a predetermined distance from the isolated edges; and 3) auxiliary features have to be spaced by a predetermined distance from each other.
Accordingly, in view of the above noted limitations, the created auxiliary features can be adapted for simple patterns, such as rectangular pattern. However, when the auxiliary features are used for complex patterns, such as an oblique line pattern, a U-shaped pattern, an L-shaped pattern, a T-shaped pattern, and a cross line pattern, the auxiliary features are asymmetrically created, or relatively short auxiliary features are removed by periphery auxiliary features having relatively long lengths.
In addition, when the shape of patterns are complicated, the created patterns cannot be matched with the design rule. In extreme cases, the singularity inspection by means of a design rule checking (DRC) is impossible.
Also, as auxiliary features are added to an area in which a distance between patterns are small, a distance between adjacent patterns is smaller so that a pattern bridge or a kissing effect is generated, thereby lowering the resolution of the mask. In addition, since the auxiliary features are created as a bar shape with respect to each isolated edge, the number of auxiliary features is increased, so that data of the whole mask pattern is increased. The data of the bar-type auxiliary features are represented as 32 bit data in case of GDS (Graphic Data System) II format, so that data treating time is increased if the data of the whole data set is increased. Also, it is difficult to inspect the mask and a great amount of memory capacitances are required.
Recently, a memory article such as a DRAM requires an integration degree above a GIGA level. Therefore, in order to integrate a great amount of memory cells in a limited area, a cell layout has a complex structure including a bending section instead of a straight section. In the case of a gate electrode pattern, an L-shaped cell layout is adopted so as to increase the current driving capacitance in a narrow area.
In the above gate electrode pattern, the entire length of a gate has to be uniformly formed in an active area. If the length of the gate is short, a critical value of the threshold voltage is extremely lowered by a short channel effect of a MOS FET, so that the cell malfunctions. In contrast, if the length of the gate is long, the current driving capacitance is reduced so that a critical operating speed is lowered.
In addition, in order to allow the MOS FETs to have the same features over the entire area of the chip, the length of the gates have to be uniformly maintained over the entire area of the chip. Accordingly, it is required to solve and improve the problem of the conventional auxiliary feature-creating algorithm.
The present invention is therefore directed to a mask, and a method of fabricating a mask, which substantially overcome one or more of the problems due to the limitations and disadvantages of the related art.
The present invention has been made to solve the above problems of the related art, and therefore has as an object to provide a mask capable of reducing the amount of data required by reducing the number of auxiliary features, wherein the auxiliary features corresponding to recessed corners are formed in a polygonal shape while maintaining the symmetry of the auxiliary features. Another object of the present invention is to provide a method for fabricating such a mask.
To achieve these and other objects of the present invention, there is provided a mask for optically transcribing a pattern corresponding to integrated circuits onto a semiconductor substrate, by using an exposure device. The mask has a plurality of features corresponding to circuit elements for forming the integrated circuits, and includes at least one recessed corner defined by two edges.
In addition, the mask has a plurality of polygonal proximity correcting auxiliary features including two extension parts which extend in parallel along each of two edges defining the recessed corner and that are spaced apart from the two edges by a predetermined distance. The two extension parts are bent at a same angle corresponding to the recessed corner, so as to be connected to each other. The proximity correcting auxiliary features have polygonal shapes with predetermined widths.
To also achieve the objects of the present invention, there is provided a method of fabricating a mask for optically transcribing a pattern corresponding to integrated circuits onto a semiconductor substrate, by using an exposure device. The method includes fabricating a plurality of features corresponding to circuit elements for forming integrated circuits onto the mask and including at least one recessed corner defined by two edges; and fabricating a plurality of polygonal proximity correcting auxiliary features having predetermined widths onto the mask, including two extension parts which extend in parallel along each of two edges defining the recessed corner and that are spaced apart from the two edges by a predetermined distance. The two extension parts are bent at a same angle corresponding to the recessed corner, so as to be connected to each other.
According to another embodiment of the present invention, there is provided a method of fabricating a mask for optically transcribing a pattern corresponding to integrated circuits onto a semiconductor substrate, by using an exposure device. The method includes creating data sets of a plurality of features on the mask, the features corresponding to circuit elements for forming the integrated circuits; selecting first data sets of isolated edges from the data sets of the plurality of features; creating second data sets of bar-type auxiliary features in view of the selected first data sets of the isolated edges, the bar-type auxiliary features having predetermined widths and extending in parallel along isolated edges spaced from each isolated edge by a predetermined distance; creating third data sets of the bar-type auxiliary features corresponding to the recessed corner in view of the first data sets of isolated edges and the second data sets of bar-type auxiliary features; creating fourth data sets of polygonal auxiliary features by removing extension parts of the bar-type auxiliary features, which extend within the predetermined distance from the isolated edges, in view of the second data sets of bar-type auxiliary features corresponding to the recessed corner; creating final auxiliary feature data sets by replacing the third data set of the bar-type auxiliary features corresponding to the recessed corner among the second data sets of the bar-type auxiliary features with the fourth data sets of the polygonal auxiliary features; and creating mask pattern data sets by combining the data sets of the features and the final auxiliary feature data sets.
Further scope of applicability of the present invention will become apparent from the detailed description given hereinafter. However, it should be understood that the detailed description and specific examples, while indicating preferred embodiments of the invention, are given by way of illustration only, since various changes and modifications within the spirit and scope of the invention will become apparent to those skilled in the art from this detailed description.

Mask for a photolithography process and method of fabricating the same


A method and structure are provided to enable wire bond connections over active and/or passive devices and/or low-k dielectrics, formed on an Integrated Circuit die. A semiconductor substrate having active and/or passive devices is provided, with interconnect metallization formed over the active and/or passive devices. A passivation layer formed over the interconnect metallization is provided, wherein openings are formed in the passivation layer to an upper metal layer of the interconnect metallization. Compliant metal bond pads are formed over the passivation layer, wherein the compliant metal bond pads are connected through the openings to the upper metal layer, and wherein the compliant metal bond pads are formed substantially over the active and/or passive devices. The compliant metal bond pads may be formed of a composite metal structure.

(1) Field of the Invention
The invention relates to the fabrication of integrated circuit devices, and more particularly to the fabrication of wire bond pads over underlying active devices, passive devices and/or weak dielectric layers.
(2) Background of the Invention
Performance characteristics of semiconductor devices are typically improved by reducing device dimensions, resulting in increased device densities and increased device packaging densities. This increase in device density places increased requirements on the interconnection of semiconductor devices, which are addressed by the packaging of semiconductor devices. One of the key considerations in the package design is the accessibility of the semiconductor device or the Input/Output (I/O) capability of the package after one or more devices have been mounted in the package.
In a typical semiconductor device package, the semiconductor die can be mounted or positioned in the package and can further be connected to interconnect lines of the substrate by bond wires or solder bumps. For this purpose the semiconductor die is provided with pads (bond pads) that are, typically mounted around the perimeter of the die, and are located such as not to be formed over regions containing active or passive devices.
One reason the bond pads are not formed over the active or passive devices is related to the thermal and/or mechanical stresses that occur during the wire bonding process. During wirebonding, wires are connected from the bond pads to a supporting circuit board or to other means of interconnections.
The semiconductor industry has recently turned increasingly to low dielectric-constant (or low-k) materials for intermetal dielectrics. However, such materials typically have lower mechanical strength than traditional insulating materials and are thus also susceptible to damage by wire bonding.
U.S. Pat. No. 4,636,832 (Abe et al.) describes a method of forming a bond pad over an active area, using a silicon layer for stress reduction.
U.S. Pat. No. 5,751,065 (Chittipeddi et al.) discloses a method of providing an integrated circuit with active devices under the bond pads, and uses metal for stress relief.
U.S. Pat. No. 6,384,486 (Zuniga et al.) shows a method of forming an integrated circuit under a contact pad, also using a metal layer for stress absorption.
U.S. Pat. No. 6,229,221 (Kloen et al.) describes forming a wire bond to a bond pad formed over active devices, where the bond pad and passivation must have specified thickness and be substantially free from interruptions under the wire bonding region.

Method of wire bonding over active area of a semiconductor circuit


Provided are a method and device for generating a notification and a method and device for subscribing a notification message. The method for generating a notification (300) includes: receiving a subscription request (S310); creating a first subscription resource according to the subscription request, the first subscription resource including a plurality of first event notification criteria and a second event notification criterion (S320); receiving a plurality of first events generated according to the plurality of first event notification criteria (S330); determining whether the plurality of first events satisfy the second event notification criterion (S340); and generating a notification in a case where the plurality of first events satisfies the second event notification criterion, the notification indicating a second event (S350).

In the Internet of Things (IoT) system, mechanism of subscribing to a notification as far as an inventor(s) knows is realized by creating a <subscription> element under subscribed resources, and any change in attributes of the subscribed resources and any change in direct child resources would be likely to generate an event notification. However, the mechanism of subscribing a notification as far as the inventor(s) knows can subscribe and generate a notification only for a single event.
Therefore, it is needed a method and apparatus being capable of subscribing and generating a notification for multiple events.

Method and apparatus for generating and subscribing to notifications


A method of forming a semiconductor device. The method may include providing a device structure, where the device structure comprises a masked portion and a cut portion. The masked portion may comprise a mask covering at least one semiconductor fin of a fin array, and the cut portion may comprise a trench, where the trench exposes a semiconductor fin region of the fin array. The method may further include providing an exposure of the trench to oxidizing ions, the oxidizing ions to transform a semiconductor material into an oxide.

As semiconductor devices scale to smaller dimensions, the ability to harness device improvements with decreased size becomes more challenging. The synthesis of three-dimensional semiconductor transistors, such as fin type field effect transistors (finFET), involves challenging processing issues. In many finFET designs, an array of fins may be formed, wherein at least a portion of this array of fins is to be removed during device fabrication. So-called fin cutting processes may employ masks to protect fins not to be removed, while creating fin cut regions to expose other fins to be removed. Because of overlay and etching issues, the fins targeted for removal may be incompletely etched using known anisotropic etching processes, leaving fin remnants such as so-called fin spikes, where the fin spikes may protrude above the surface of isolation oxide. Notably, the fin spikes, being formed of semiconductor material such as silicon, may be removed using isotropic etching. This approach carries the unwanted side-effect of etching silicon fins in a lateral direction, so the length of the fins may be unduly reduced.
With respect to these and other considerations, the present disclosure is provided.

Method of forming transistor device having fin cut regions

Varian Semiconductor Equipment Associates, Inc.


A method of supporting distribution means, such as a pipeline, that accommodates temperature-induced expansion or contraction of the distribution means as well as unexpected, infrequent shocks to the structure, and provides effective thermal isolation of the distribution means from the surface on which the structure rests. The method includes arranging laterally spaced apart fixed bearing supports on a surface adjacent a path for distribution means and supporting elongated elastic members on the bearing supports at a distance spaced inwardly from the ends of the elastic members. Distribution means may be placed in association with the elastic members. Beginning from an equilibrium state, each elastic member is capable of bending in proportion to the magnitude of an additional load applied intermediate the ends of the elastic member, with the ends of each member sliding against the bearing members a distance also proportional to the magnitude of the additional load.

This present invention relates to a method for supporting distribution means, such as a pipeline or aqueduct. More particularly, the present invention relates to a homeostatic method for supporting distribution means that accommodates temperature-induced expansion or contraction of the distribution means, resists unexpected, infrequent shocks such as might be encountered during an earthquake or similar disaster, and provides effective thermal isolation of the distribution means from the surface on which the structure rests.
Conventional methods for supporting distribution means such as pipelines frequently are designed to use essentially rigid structures, i.e., the structures do not yield appreciably on the application of an external force. When an external force is applied to such a rigid structure, a variety of tensile, compressive and bending forces may be created within the structure. If the external force is sufficiently high, the method for supporting the distribution means may fail, resulting in rupture of the pipeline.
Release of the substances contained in a pipeline or other distribution means may result in disruption of the supply of such substances to users, for example, the supply of water to a municipal water system, fuel to a power plant, or feedstock chemicals to a manufacturing plant. Release of these substances also may result in other adverse effects, such as flooding, exposure of persons to thermally or physiologically harmful substances, or environmental contamination. To reduce the risk of such occurrences, existing methods for supporting distribution means frequently call for overdesign of at least some portions of these rigid supporting structures.
In addition, conventional methods for supporting distribution means generally are ineffective in minimizing undesirable thermal transfer from the distribution means to the supporting structure when the temperature of the material contained in the distribution means varies substantially from the ambient temperature. For example, oil being transported by pipeline through extremely cold regions must be kept warm to maintain flow in the pipeline; however, heat transferred from the pipeline to its supporting structure may in turn be transferred to the ground supporting the structure, resulting in undesirable melting of frozen matter adjacent the structure, including permafrost soil. Melting of the permafrost may lead to instability of the supporting structure in addition to adverse environmental consequences. In addition, melting of snow and ice produces water that accelerates corrosion of metal parts of the distribution means and its supporting structure.
The present invention provides a method for supporting a pipeline or other distribution means on a structure whose elements are in or tending toward a relatively stable state of equilibrium. "Homeostasis" is defined as "a relatively stable state of equilibrium or a tendency toward such a state between the different but interdependent elements or groups of elements of an organism or group" (Webster's New Collegiate Dictionary, G.&C. Merriam Co., 1976). Hence the method of the present invention may be referred to as a homeostatic method.
The present invention provides a method of supporting distribution means that includes arranging laterally spaced apart fixed bearing members on a surface adjacent a path for distribution means and supporting elongated elastic members on a bearing surface of the bearing members at a distance spaced inwardly from the ends of the elastic members. Each elastic member is capable of bending in proportion to the magnitude of a load applied intermediate its ends. Distribution means may be placed in association with the elastic members, each of which supports only the share of the distribution means which is acting directly above it. The method of the present invention establishes an equilibrium state between the bending elastic members and the weight of the distribution means.
Beginning from such an equilibrium state, an additional load applied intermediate the ends of the elastic members causes the midportion of each elastic member to bend from a first equilibrium position an amount proportional to the magnitude of the additional load and assume a second, more downwardly bowed position. The ends of the elastic members slide against the bearing members a distance also proportional to the magnitude of the additional load as the midportion bows downwardly. The movement of the elastic members establishes a new equilibrium state between the bending elastic members and the weight of the distribution means. When the additional load is removed, the midportions unbow, returning to substantially the same positions as their original equilibrium positions. The ends of the elastic members slide a corresponding distance in the opposite direction, also returning to substantially the same positions as their original equilibrium positions. The midportions of the elastic members bend and the ends of the elastic members slide in a similar manner in response to a force applied upwardly against the bottom of the elastic members or to a force applied against any of the bearing supports.
The bending and sliding of the elastic members in response to changes in the load supported by the structure may perform shock and energy absorbing functions when the elastic members engage the bearing surface. The absorbed energy is dissipated primarily in the form of heat generated by the frictional contact between the elastic members and the bearing surfaces. Preferably, the elastic members engage the bearing surface during bending from an external force at a homeostatic, or critical, angle, i.e., an angle within the range of about 25 to about 50 degrees from a vertical axis of support for the structure.
In the method of the present invention, the contact between the elastic members on which the distribution means is supported and the ground-engaging fixed bearing members is minimized, thereby reducing undesirable thermal transfer from the distribution means to the supporting structure and thence to the ground. In addition, the method of the present invention may include providing means for dissipating heat into the air more efficiently than conventional methods, because the heat dissipating means may be attached directly to elements of the supporting structure that are in contact with the distribution means.

Method for supporting distribution means


The present invention relates to a multilayer composite having improved chemical resistance and improved intimate bonding between layers comprising (A) a layer of a polyamide molding composition, and (B) a molding composition comprising a linear crystalline polyester and an epoxide containing compound.

1. Field of the Invention
The present invention relates to a thermoplastic multilayer composite having improved barrier action against diffusion of chemicals, and improved adhesion between the layers of the composite.
2. Discussion of the Background
While polyamides and polyesters are individually useful for a variety of end products, they are unsuitable for a number of specific uses. For example, polyamides show poor resistance to weathering, since they age under exposure to light and absorb atmospheric moisture, leading to discoloration, deterioration in mechanical properties and warping phenomena.
Although polyamides have good mechanical properties, in particular a good toughness, they provide poor barrier properties. In particular polar substances migrate easily through polyamides. This is especially a problem in fuel lines which transport alcohol-containing fuel.
Polyesters, on the other hand, exhibit good resistance to weathering and excellent barrier properties against both polar and non-polar media. However, they generally show unacceptable impact properties such as notched impact strength. Thus, polyesters cannot be used in cases where combinations of properties such as excellent barrier action, high temperature resistance and good rigidity, are desired.
German Patent 38 27 092 describes a multilayer pipe which has, from the inside outward, layers of polyamide, polyvinyl alcohol, polyamide and polyester. The polyester is used only as a thin outer layer, in order to achieve a higher resistance to short-term heat deformation. However, it is well known in the field of polymer composites that the majority of polymers, such as polyamides and polyesters, are incompatible with one another. Thus, the typical result of most multilayer composites is that the laminate layers show no adhesion to one another. An intimate bond between the individual polymer layers is absolutely essential for industrial uses, in order to avoid delamination.
Multilayer composites of particular polyamide mixtures and various other thermoplastics, such as polyethylene terephthalate, are known from EP-A-287 839. Conventionally, in order to achieve necessary adhesion, an adhesion promoter is introduced between the laminate layers. Examples of such adhesion promoters include functionalized polyolefins, functionalized ethylene/vinyl acetate copolymers, ethylene/acrylate copolymers, ionomers, polyalkylene oxide/polyester block copolymers, derivatives of carboxymethyl cellulose and blends of these polymers with polyolefins.
It has now been found that these adhesion promoters do not give a long-term intimate bond, especially in a polyamide/polyester system. Because the adhesion promoters are not sufficiently resistant to thermal deformation and solvents, the adhesion which is achieved is usually lost under conditions of heating or under the action of solvents. Additionally, these composites fail when exposed to shear forces due to cold flow the adhesion promoter.


Apparatus for bending glass plates provides a conveyor of serverable sections, each of which feeds glass plates to separate stations for bending the glass plates, the glass plates having first passed through a reheating furnace. The stations for bending or transfer employ a common upper unit, which is provided with a plurality of means for retaining the glass by aspiration under a vacuum. Each means for retaining the glass plate, and vacuum means associated therewith, is operable independently, such that the glass plates can be aspirated and released at each station independently of the actions of the remaining stations. After having been bent or shaped either on the upper retaining means, or lower bending units provided thereunder, the glass plates may be subjected to temper. Mass production of bent or shaped, and tempered, glass plates, with high, reproducible quality, and varying requirements, is made possible through such a system.

1. Field of the Invention
The invention concerns the bending of glass plates into convex shape in a high-capacity convexing installation, entailing a possibility of simultaneous convexing of several, that installation being of the type in which a glass plate is brought to its bending (hereinafter, bending to assume a convex form will be referred to by the term "convexing") temperature, carried over a conveyor, stopped under an, upper transfer and/or convexing unit, picked up by that, upper unit and then released on a lower discharge and/or convexing unit after said plate is applied against the upper transfer and/or convexing unit.
2. Background of the Prior Art
It is known from U.S. Pat. Nos. 3,778,244; 4,813,993 and 4,682,997 how to use upper units capable of treating one glass plate at a time.
However, in order to increase production capacities when the convexed sheet glass manufactured is of small size, it is advantageous to bend several glass plates into convex shape simultaneously.
If the glass plates to be simultaneously treated are supplied on the conveyor arranged beside each other and the different stations available on a same upper unit are juxtaposed crosswise to the direction of feed of the conveyor, everything happens in the synchronization of operations, as in the case of a single glass plate. The different glass plates follow two exactly identical parallel paths and they must then undergo strictly identical convexing treatments.
That implies that the glass plates retain exactly identical relative positions all along their path; now, that can be difficult to obtain and it is impossible to correct, the position of just one glass plate without altering the position of the other, insofar as they are all on, one and the same conveyor.
In another connection, it was previously proposed in U.S. Pat. Nos. 4,364,766 and 4,475,937 that two convexing locations be juxtaposed on the same upper unit, one after the other in the longitudinal direction of feed of the conveyor. But the placement of the glass plates under each convexing location demands complicated means of delivery, so as to organize a correction of the delay of the glass plate the farthest up in relation to the one farthest down, thanks to detection systems, and means of logic, of independent conveyors. Thus, for each glass plate a new path and new speeds are to be defined. Furthermore, in spite of those complex means employed, there is no certainty of perfect positioning of the two glass plates at the end of travel under the upper unit, for, on the one hand, the detection of the glass plates is carried out at a relatively long distance from that end of travel and deviations and all kinds of disturbances can occur until the end of travel and, on the other, the optical detections, as proposed, are inaccurate at the high temperatures prevailing in the convexing installations.
Simplification of the system would lead to a need for a system capable of convexing glass plates possibly arriving at different instants under their convexing location, having followed different paths, the glass plates therefore being in different thermal states, thus resulting in convexing differences for those glass plates.

Apparatus for bending glass plates into convex shape