text:
Spangle Left Holding Bill For Pond Pumping
Thu., April 3, 1997
Spokane County officials are refusing to pay for the emergency pumping of Spangle's sewage ponds because the town hired an unlicensed contractor for the job.
Mayor John Logan said he did not know the county required a licensed and bonded contractor as part of the conditions for the $10,500 federal grant. The county administers the federal money.
When county officials found out that Spangle hired an unlicensed contractor, they notified Spangle town officials that the bill would not be paid even though the county had agreed earlier to pay with part of a contingency fund for community development.
The sewage evaporation ponds were within eight inches of overflowing into surrounding fields when contractor Roy Gruenwald started pumping the wastewater.
Logan said county officials never told him to make sure the contractor was licensed and bonded. Logan said he hired Gruenwald after taking bids from three contractors. The mayor said he chose Gruenwald because Gruenwald had done other work for the town and gave a low bid on the pumping project.
In a letter to Logan, the county's acting director of community services said the county could not approve payment for a job that violated state laws and federal regulations regarding contracts with private workers.
"I didn't know it was a problem," Logan said. "He (Gruenwald) did a perfect job."
Now Gruenwald is left waiting for the town to pay his bill.
Logan said the town could pay Gruenwald from its emergency fund, but so far the Town Council has not agreed to the payment. The town has a population of 240, so the unpaid bill amounts to more than $40 per resident.
"It's going to be a battle to get him paid," Logan said.
The sewage problem arose when heavy storm runoff caused the evaporation ponds to fill at three times their normal rate throughout the winter. A lot of the water came from seepage into broken sewer pipes.
The town is in the midst of a project to upgrade the sewage system with a new treatment plant and repairs to existing pipes, Logan said. Spangle is being recommended for a $245,000 community development grant in 1997 to help pay for the new $1.2 million system.
, DataTimes


text: For anyone who speaks Spanish at home but wants to improve their knowledge of the language, this is the perfect resource. The sixth edition provides visuals and dialogues to present vocabulary in context. Charts are also used to organize vocabulary. The readings follow a more authentic approach, featuring shorter and more engaging stories with new illustrations. Numerous support activities are integrated throughout the chapters to build the reader s understanding of vocabulary. Spanish speakers will build their knowledge of reading, writing, and vocabulary skills.

subset: commoncrawl


text:
Best regards
Last edited: 2017-07-10T23:48:56
Ben Wrote:I was just in Las Vegas................... I have to say I much prefer it to the Beverly Hills boutique limited edition Big Pilot that had a yellow-orange on black color scheme and a small seconds subdial. This watch was numbered 16 out of 50; I don't know how many are left but It was hard to pass up...... !
Best regards
Last edited: 2013-04-16T00:36:32
Regards, Michael
Last edited: 2015-02-25T17:29:14
Last edited: 2014-02-06T05:40:50
Best regards
Last edited: 2017-07-10T23:48:56


text:
Lucas gives Rafa backing
Lucas Leiva has vowed to repay Rafa Benitez for his faith, with the Liverpool boss now under pressure.
By Jamie Casey
Last Updated: 24/10/09 1:50pm
Lucas Leiva has vowed to repay Rafa Benitez for his faith, with the Liverpool boss now the man under pressure at Anfield.
Brazilian Lucas has constantly been scrutinised by fans for his unconvincing displays in a Reds shirt since his arrival from Gremio in 2007.
Benitez has persistently defended the player's abilities, but now the tides have turned as the Spanish boss is under immense pressure as a result of Liverpool's dreadful form.
The Reds have lost four on the trot, with Benitez's future now the subject of much speculation, but Lucas will strive to reach his full potential during this tough period for the club.
"We are in a difficult moment, but we are the ones on the pitch and it is up to us to improve," he told The Times.
"Rafa is a really good manager and now we have to try to win for ourselves, but also for him because he has been really good for us and for me in particular.
"He gave me opportunities and he gave me confidence, so now I want to pay him back by playing well, working and performing as he expects me to."
Lucas is yet to win over Liverpool fans and after the departure of Xabi Alonso to Real Madrid in the summer, the Brazil international has at times been made a scapegoat for failing to replace the Spaniard sufficiently.
The 22-year-old believes a stereotypical view of Brazilian footballers does not work in his favour, as his role is different to that of the typical Samba star.
He said: "Everybody knows I had difficult times here, especially with the people who criticised me.
"What I would say, though, is that the style of football in the Premier League is totally different to Brazil.
"I know people sometimes expect Brazilian footballers to play a certain way - to have unbelievable skill, to be able to do tricks and be like Ronaldinho or Kaka, but I am in a different position, where you cannot do those things and you have to work for the team.
"This is my mentality, to try to help my team-mates. I cannot think too much of the criticism. All I can do is try and do my job and hopefully this will be good enough.
"Me and Javier (Mascherano) have to be aware of the counter-attack because we have to make sure that we give the defenders our support. Every team needs these kind of players."


text:
Denver has a lot of talented and generous chefs, says Sheila Lucero, executive chef of Jax Fish House in Denver and Boulder, but I really wanted to create something a little more intimate for the guests that would include a fun group of female chefs.
Welcome to Females on Fire, a collaboration of girl power that will celebrate female chefs and the female force and raise money for a culinary scholarship with dinners at both Jax locations. The dinners, which cost $100 per person, feature a cocktail hour, five courses and wines from Elyse Winery. Participating chefs cooking at the Denver event, which takes place tonight at 6 p.m., include Elise Wiggins (Panzano), Mary Nguyen (Parallel 17), Aniedra Nichols (Elways Cherry Creek), and Kathleen Kenny Davia (Gateaux), along with cocktologist Anika Zappe from Root Down. The second event, featuring a new set of chefs, takes place in Boulder at 6 p.m. tomorrow.
Proceeds will go toward the Females on Fire Scholarship Fund, which is awarded to a female student pursuing a culinary arts degree at Johnson & Wales University.
If you like this story, consider signing up for our email newsletters.
You have successfully signed up for your selected newsletter(s) - please keep an eye on your mailbox, we're movin' in!
We may be few and far between, but when were present, I think we bring a great balancing presence to the kitchen, says Lucero. For more details, go to www.jaxfishousedenver.com and click on the Events heading.
Tue., Jan. 12, 6 p.m., 2010


text:
Dioxalane formation provides a path of protecting a carbonyl group in reaction studied in basic medium in which acetals are not affected. The carbonyl compound may be regenerated by the addition of periodic acid to aqueous solution of the dioxalane or by acidic hydrolysis.
Aldehyde is more reactive than ketone in dioxalane formation.
Transtutors is the best place to get answers to all your doubts regarding formation and properties of dioxalane with examples. You can submit your school, college or university level homework or assignment to us and we will make sure that you get the answers you need which are timely and also cost effective. Our tutors are available round the clock to help you out in any way with chemistry.
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text:
Student Profile
Julianne Hill
As a reporter and producer for print, radio and television, Julianne Hill has garnered numerous awards for probing tough subjects, like mandatory medication to treat schizophrenia. But Hill wanted to dig deeper still, to learn new ways to tell her own stories. She found the tools she needed in Northwestern's Master of Fine Arts in Creative Writing (MFA) program, where she specializes in creative nonfiction. "I've focused on essays and memoir," says Hill, "but creative nonfiction is so much more than that. [Writer and MFA instructor] Alex Kotlowitz calls it literary journalism."
Hill's career got off to a heady start after college with an internship with the Associated Press in Rome. "It opened up an Ohio girl's eyes to the world," says Hill, who returned home to report for Crain's Cleveland Business. She transferred to Crain's Chicago publications when her husband, Doug Hill, wanted to study improvisational comedy at The Second City while working in marketing and advertising. Julianne Hill's career thrived in Chicago, where she helped launch the international news edition of Advertising Age and then landed a dream job with television reporter and producer Bill Kurtis: "It was a huge gift. I didn't know a thing about TV. Bill took me on and taught me how to write to pictures." Hill shifted to radio several years ago after recording two ("One Brain Shrinks, Another Brain Grows" and "Heart Shaped Box") poignant essays for Ira Glass's This American Life. The essays recounted her young son's struggle to comprehend his father's slow decline from a degenerative brain disease.
Hill calls the MCW class she took with video essayist John Bresland on writing with images and sound "life-changing." In that class Hill created an eight-minute video — an imagined interview with Mary Magdalene about widowhood — that has appeared in three film festivals. For a class with author Eula Biss, Hill wrote a story called "Ordinary Day" and performed it before a live audience in Chicago. Currently working on a multimedia thesis, Hill cites classes with Bill Savage, Marya Hornbacher, Michael McColly, and Sandi Wisenberg as opening new opportunities, including perhaps teaching full-time at the college level. Says Hill, "The program has helped me develop in ways I hadn't expected."


text:
Results 1 to 1 of 1
Thread: Senior Data Warehouse Architect
09-21-09, 20:23 #1Registered User
- Join Date
- Sep 2009
- Posts
- 1
Senior Data Warehouse Architect
Design and implement:
- High-performance, cloud-based data warehouse and data mining operations
- Advanced analytics and business intelligence data infrastructure
Evaluate and implement a new column-store data warehouse appliance
Design and automate ETL for various data stores
Learn next-generation technologies, including real-time analytics, model-driven apps, rules-based decisioning, goal-based case management and self-configuring UIs
This is a hands-on role; you own data and related operations
MS or PhD in Computer Science or comparable
5+ years experience as enterprise-level Data Architect
Excellent hands-on knowledge of:
- Data warehousing, OLAP and data mining infrastructure
- Business intelligence applications leveraging multi-dimensional, large datasets
- ETL and enterprise ontology
Expert understanding of core data concepts: metadata, retention, scalability, performance, integrity, availability, staging, accessibility, security, access/key management
Experience with Tableau/VizQL, Hadoop, MPP data warehouse appliances and column-store databases
Rules engines and business process management platforms
SOA experience
Salary range: $130K-$150K/year plus stock options and performance-based bonus
We offer a competitive and comprehensive compensation and benefits package
Equal Opportunity Employer, open to sponsoring H1-B visa
This is a full-time position located in New York City
The team will be led by a veteran strategist committed to mentoring on how to achieve an effective balance between business, design and technology.
Embark is led by sharp, knowledgeable and enthusiastic management. The work culture is geared towards performance, execution and fun.
Unlike most large organizations, this initiative is characterized by the clear absence of bureaucracy, departmental politics and infighting.
This unit will move swiftly and expertly to cut through complex problems, with sufficient time granted for research and rapid prototyping. Learn tomorrows design, analytics and development technologies today.
Please explain why you think this job is right for you and why you are right for this job and email with your resume to: firstname.lastname@example.com


text:
Re: Stanko heritage
In reply to:
Re: Stanko heritage
As to the origin of the surname Stanko, it is simply a hypocoristic form of the Slavic name Stanislav or Stanislaw and means something like Stan. My grandfather de facto - not de iure ;) - was Stanko too, born probably at the beginning of the 20th century in Pcoline near Snina in the eastern Slovakia but I don´t have any other information about him. If you do, let me know please.
More Replies:
Re: Stanko heritage
Vaclav Dzofko 11/23/02


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All the information you need in one place! Each Study Brief is a summary of one specific subject; facts, figures, and explanations to help you learn faster.
List price: $27.95Publisher: University Press of New EnglandPublication date: 7/13/2010Binding: PaperbackPages: 336Size: 6.00" wide x 8.75" long x 1.00" tall Weight: 1.100
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Strawberry salsa is a healthy and nutritious…and let's not forget nutritious!…way to celebrate the dearth of strawberries this time of year. Enjoy!... Read More
DIY Friday: Healthy St. Patrick's Day Treatsby Ann Timm
Here's a healthy St. Patrick's Day treat for your little leprechauns to celebrate the coming holiday…or spring…or Easter…or anytime you want a fun snack!... Read More
Nourishing, Savory, and Healthy Popcornby Ann Timm
This popcorn is a nice change from the regular butter and salt version and, with the addition of nutritional yeast and garlic, it has a nourishing twist. So, yes, it's healthy popcorn!... Read More
Ditch the Bag of Chips: 15 Healthier Ideas for Lunchesby Ann Timm
photo credit By Andrea Green, Contributing Writer I love chips. Crisp and salty, chips just seem to be the perfect side to pack up for lunch. What I don't love about chips are the levels of acrylamide - a cancer... Read More
DIY Peaches and Cream Gummiesby Ann Timm
By Stacy Karen, Contributing Writer Do you like fruit snacks or gummy candy, but don't want the yucky food dyes or preservatives that go with them? If so, you need to try these homemade gummies! Not only do homemade gummies... Read More
Explore the Keeper of the Home CollectionHomemade/DIY Real Food Healthy Living For Women Keeping the Home Family Life Do It Yourself Natural Remedies Recipes
Have a Question? Ask Ann!


text:
Legal-Bay Reports Breaking News: Deadly Pileup on I-78, Three Dead and Dozens Injured
Lawsuit Cash Advance Firm says the tragic incident occurred Saturday on I-78 in Bethel Township, PA, and the company wants to remind people they are dedicated to funding similar cases within 24 hours of approval.
Feb 14, 2016, 01:00 ET from Legal-Bay LLC
NEWARK, N.J., Feb. 14, 2016 /PRNewswire/ -- Legal-Bay LLC, The Lawsuit Settlement Funding Company, reported today that in breaking news, a deadly pileup occurred on Interstate 78 in Bethel Township, Pennsylvania (PA) on Saturday, leaving three dead and dozens injured. According to news sources, authorities said the tragic crash appears to have been related to a "passing snow squall." As of now, three fatalities have been confirmed. The lethal pileup that occurred about 75 miles northwest of Philadelphia involved at least 50 commercial and private vehicles, and police have said that more than 40 people were transported to several different hospitals after the incident. From tractor-trailers to box trucks to cars, a variety of vehicles were involved in the crash and took up three traffic lanes as well as the snow-covered median. Three people died, with dozens injured. The injuries ranged from moderate to severe, and some are in critical condition.
Logo - http://photos.prnewswire.com/prnh/20140714/126845
The incident, which has made headlines, is just an example of an accident that can cause devastation and affect many lives. Legal-Bay, a lawsuit cash advance firm, is reaffirming their dedication to assisting victims who have been involved in any type of accident that resulted in personal injury and/or wrongful death, and wants to remind people in New York (NY), New Jersey, (NJ), and Pennsylvania (PA) to be careful during inclement weather, even just when there are high winds which can result in snow drifts that can cause lethal accidents such as this one.
Chris Janish, CEO of Legal-Bay, commented on the tragic incident, "Snow storms and high winds following snow storms can result in inclement weather and dangerous road conditions, even just when wind is blowing snow onto highways. Our hearts go out to those who have been affected by this crash, and we want to remind people in the tristate area to be as cautious as possible on the roads this winter season."
Legal-Bay is dedicated to helping victims involved in all types of personal injury accidents, including car accidents, bus accidents, tractor trailer crashes, semi wrecks, public transportation accidents, as well as cases involving wrongful imprisonment, wrongful conviction, police brutality, prison injury, prison rape, sexual harassment, sexual abuse, and wrongful death with obtaining pre-settlement funding in order to help the individuals get their lives back on track. For more information on the cases that Legal-Bay funds, please visit the company's website at: http://lawsuitssettlementfunding.com
If you, or a loved one, are in need of some financial support due to your personal situation in your ongoing lawsuit, please call Legal-Bay on its toll-free hotline, where live agents are available to assist you, at: 877.571.0405.
To apply online, visit: http://lawsuitssettlementfunding.com and an experienced agent will promptly respond to your request.
Disclaimer: Legal-Bay's programs are non-recourse lawsuit cash advances, also known as case funding, which means you only repay the settlement advance if you win your case. None of the programs should be considered to be a lawsuit loan, lawsuit loans, settlement loans, settlement loan, pre-settlement loans, or a pre-settlement loan. To learn more about how Legal-Bay's funding process works, visit: http://lawsuitssettlementfunding.com/funding-process.php
Contact: Patty Kirby, COO/Head of Client Relations
Ph. 877.571.0405 Email email@example.com
SOURCE Legal-Bay LLC


text:
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Thanks for helping us associate the correct Pornstars to this video!
Help Us: Do these Pornstars appear in this video?
Pornstar Name:
perfect asshole
he should shave his private parts oO
Best ive seen in awhile. He started with condom and then ended up shooting without one. Magic trick i like to pull on the ladies.
delícia, se meche como uma cobra.
Just wait until trump deports your as
great ass fuckin shots thats it
I would rim her.
i realize its porn, but if your fucking an ass that hot, you go balls deep. all he did was tip it the whole time.
The other night i was playing with my wife pussy and her anal like he doing her and next thing i know she got up on all four and i spread her butt checks apart and lick it and get all nice and wet and she told me i can pick any hole i what so i pick her anal because she never had anal sex before. I was about ready to pull out before i cum she told me to leave it in her so i did and fill her anal up with my cum. I love when i cum her anal
pretty pretty bottom. No wonder he shoots so hard when the time comes
That's right bro, stretch that tiny ass open!
I'd love to be right up her tight Russian arsehole
La sborrata sulla schiena é fantastica,è da una vita che non faccio una cosa del genere con una donna :)
nice ass? whaa she has NO ass.
it is russian girl.... i have some movies on the hardrive.... :DD realy nice nice girl....
She looks like she's in pain. Not cool.
I've seen this girl in other videos. Name?
It's Ivana Fukalot...
beautiful girl and perfect ass
best anal i've ever seen
I like that she's not hollering and screaming like a fool.
so sexy
nice video andy a really nice ass =)
poner mas video casero
Don't know why, but it might one of the best skinny / anal videos at all. I love it!
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Thursday, September 10, 2009
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HIGH SPRINGS - A nudist who acts as caretaker of Lilly Springs supports the proposal to bottle the spring's water. Neighbors are organizing in opposition. And the co-owner of the land around the springs says he's just trying to quench the public's insatiable thirst for bottled water.
Welcome to the wonderful world of water wars. In 21st century Florida, get used to it.
The owners of the land around Lilly Springs seek to bottle an average of 1 million gallons a day. Santa Fe River paddlers know these springs thanks to the presence of John Edward "Naked Ed" Watts, the gray-bearded nudist who has served as the property's caretaker for more than two decades.
Sitting next to the hut where he stays and watches over the springs, Watts said he believes the bottling proposal won't affect his presence there or the flow of the water. He's comfortable with the property owner's rationale that the proposal is merely a response to demand for spring water.
"As long as there's a market for bottled water, there will be bottled-water plants," he said. "They've got to be in somebody's backyard."
But dry conditions and low groundwater levels have exacerbated concerns about water bottling in the Suwannee River Water Management District. Groundwater levels in 91 monitoring wells fell an average of 10 inches from the previous month, according to the district. Nine wells set new lows for the month and two wells set new historic lows.
The news comes as South Florida deals with a full-fledged water crisis, forcing irrigation restrictions and the clamping of coastal wells to prevent saltwater intrusion. But Kirk Webster, the Suwannee district's deputy executive director for water resources, said there should be no concerns of a similar crisis here.
Dry periods and the resulting low groundwater levels are part of the natural cycle, he said. To prevent groundwater withdrawals from extending these periods, he said the district is establishing minimum flows and levels for the river system and major springs.
"The whole point is to avoid getting into a crisis situation," Webster said. Water bottling has caused concern that not enough is being done. The Lilly Springs proposal comes on the heels of a unrelated plan at nearby July Springs, where the owner of Ginnie Springs resort wants to bottle 600,000 gallons a day.
Local opponents say the plans - combined with Coca-Cola's existing water-bottling plant that already can pump an average of 1.15 million gallons a day from Ginnie Springs - would cause a problem that is not easily reversed.
"By the time they figure out it's a problem, it's too late," said Russ Augspurg, a retired aviation administrator who lives near Lilly Springs.
Advocates say the Suwannee district's springs already show signs of excessive withdrawals. Jim Stevenson, the head of a state group charged with protecting Ichetucknee Springs, said the feature called a "spring boil" - or the bubbling effect caused by a strong springs flow - is a relic of the past because of excessive pumping.
He doesn't believe minimum flows will do anything to protect springs.
"What that does is lower the minimum to a point when a spring can lose much of its flow," Stevenson said.
Others say the district is doing little to prevent a coming water crisis. While other districts are developing alternatives to groundwater pumping, the Suwannee River district has been reluctant to make the emergency declaration that mandates such measures, said Richard Hamann, an environmental law professor at the University of Florida.
Webster said emergency declarations aren't needed for the district to deal with the issue. Besides, he said, South Florida has millions of residents while the Suwannee district has hundreds of thousands.
Statistics show the Suwannee district has some of the least-populated places in the state but is not immune to growth. The 10 counties bordering the Suwannee and its tributaries are expected to jump from a population of 467,716 in 2005 to 858,076 in 2060, according to a study by the growth-management group 1,000 Friends of Florida.
Water withdrawals from the Floridan Aquifer already increased by more than 500 percent from 1950 to 2000, according to the U.S. Geological Survey. The aquifer extends through Florida and parts of three other Southeastern states, providing drinking water for the Suwannee basin. The basin is in relatively good shape when compared to the rest of the state, according to the most recent USGS statistics. The Suwannee River district withdrew 215 million gallons a day of groundwater in 2000, the lowest figure among the state's five water districts and just 4 percent of the state total.
Industry and agriculture make up 87 percent of those withdrawals. The Suwannee district's biggest water user is PCS Phosphate near White Springs, which is allowed to draw up to an average of 248 million gallons a day.
The next biggest user, Progress Energy, is allowed to draw up to 220 million gallons a day at its 147-megawatt power plant near Ellaville. But most of the water is used in the plant's cooling process and eventually returned to the river.
Two other users can pump more than 10 million gallons a day. Buckeye Florida is allowed to draw up to an average of 49 million gallons a day for its pulp mill near Perry. The Division of Forestry's Andrews Nursery can withdraw up to an average of 11.7 million gallons a day for its pine-growing operation near Chiefland.
But critics say no one really knows how much permitted water users are drawing, because the district relies on users to report the figures themselves. Annette Long, president of the advocacy group Save Our Suwannee, said the district needs to put gauges on users like municipal utility customers have to tally their usage.
Webster said the district is exploring such options. But in the meantime, he concedes the district simply doesn't have the resources to police users and determine whether they're exceeding permit limits.
"We don't have water cops," he said. "We simply don't have the staff to do that."
The minimum-flow process tries to prevent overuse by monitoring the flow of springs and levels of rivers. The 1972 law creating the water districts required the establishment of minimum flows and levels, but districts didn't start working on them for decades.
The issue came to a head in the 1990s, when excessive groundwater pumping around Tampa Bay caused water bodies to dry and salt water to intrude into the aquifer. The Suwannee district established minimum levels for the lower Suwannee River in 2006 and is working through the basin until the whole district is done in 2012.
The system puts the minimum flows and levels into a computer model that then determines the amount of withdrawals that can be permitted. The amount of water that is permitted to be withdrawn will be limited using that model, and existing permits could be restricted at times of low flows, district officials say.
But critics question whether the process does enough to protect water supplies. Spring advocate Stevenson suggested the district wouldn't have the will to restrict withdrawals when flows are low.
"Once you give out these permits and everyone is drawing water out of the ground, who are you going to tell to stop?" he said.
Long said the standards are based on models that might suggest there is plenty of water to distribute, while real-world conditions say otherwise. She said South Florida's current experience with drying wells suggests such standards don't work.
"The big concern is they have nothing to do with the real world," she said. South Florida's experience also raises other issues for the Suwannee district. Gov. Charlie Crist raised eyebrows in April when he suggested North Florida might pipe water to the south to help its parched neighbors. But he quickly backed off the idea.
The Florida Council of 100 raised the same idea in 2003 when the group of business leaders suggested North Florida's water might be diverted to the growing Florida cities to the south. The plan spurred packed houses opposing the plan in Chiefland and a legislative fight involving former state Sen. Nancy Argenziano, R-Crystal River.
She successfully pushed for the "local sources first" law, forcing districts to use water supplies close to home before trying to tap other places.
Webster, of the Suwannee water district, said he believes the local-sources law pretty much closes the book on the possibility of a pipeline from the district to the south.
"I would never say it's impossible - that would be foolish - but it seems unlikely it would happen," he said.
South Florida isn't the only concern. Florida has been engaged in a long-standing battle with Georgia over the Chattahoochee River, which turns into the Apalachicola River as it flows through Florida en route to the Gulf of Mexico. The battle centers over Georgia's use of the Chattahoochee to supply water for Atlanta residents.
While there are no such plans for the Suwannee River, Webster said he keeps a map of the Suwannee in his office to remind him that half the basin is located in Georgia. He said the district is talking with Georgia officials in hopes of working together rather than fighting over water.
"We do not desire to get in a water war with Georgia," Webster said. Regardless of whether outside government taps the Suwannee basin, water is already being taken elsewhere. Three companies bottle water in the district: Suntory Water Group's Gulf Hammock plant can withdraw 0.127 million gallons a day, Coca-Cola's High Springs plant can withdraw 1.15 million gallons a day, and Nestlé Waters' Madison plant can withdraw an average of 1.47 million gallons a day.
There are also six other permits for water bottling, which have not yet been put to use. The permits, issued from 1989 to 2003, would allow an average of nearly 2 million additional gallons to be pumped a day in Columbia, Gilchrist and Suwannee counties.
Last month, the district approved a permit for Aqua Blue Springs Water to pump an average of 650,000 gallons a day in Madison County. The plan has raised the ire of Nestlé Waters, which is demanding assurance the pumping won't affect its nearby operations.
Nestlé spokesman Jim McClellan said the plan came as a surprise to the company.
"We don't know if there's a problem but we want an opportunity to find out," he said.
As for the Coca-Cola plant in High Springs, officials there didn't return calls seeking their opinion of the two proposals in their backyard.
John Barley, a Tallahassee attorney who is co-owner of the Lilly Springs site, said he has no plans to put a bottling plant there. He plans to initially sell water either to the Coca-Cola plant or another bottler, but perhaps eventually build a plant of his own on another site.
Barley said water would be pumped at Lilly Springs and then trucked to another location. The operation would draw one million gallons from a spring that is estimated to produce 39 million a day.
"If it was going to have a negative impact on water levels in the area, we wouldn't do it," Barley said.
Years of legal battles over the ownership of the land preceded the proposal. The previous owner originally allowed "Naked Ed" Watts to be caretaker for the property, and Barley and co-owner Richard Corbin have allowed him to stay there and continue to act as the property's caretaker.
Watts, 57, has made the site a one-man tourist attraction. Paddlers coming from the Santa Fe are greeted by his homemade signs on trees, with sayings like, "A lot of people talk about freedom but very few know how to act if they meet someone who is free."
Watts is usually nude, or he wears a loin cloth when greeting some tour groups. He lives elsewhere but during the day he stays at the spring in a little hut, where he keeps photos of visitors who first came as University of Florida students and have returned in subsequent years.
Born with brittle bone disease, he has endured a hip replacement, a stroke and the legal battle to remain as caretaker. Barley vowed Watts can stay on the property even if the bottling permit is granted, and Watts takes him at his word.
"Hopefully, I'll be here the day I draw my last breath," he said. "I just feel sorry for the poor old guy who comes up and finds me."
Water wars put springs in spotlight
HIGH SPRINGS - A nudist who acts as caretaker of Lilly Springs supports the proposal to bottle the spring's water. Neighbors are organizing in opposition. And the co-owner of the land around the springs says he's just trying to quench the public's insatiable thirst for bottled water.


text:
LOS ANGELES Giants manager Bruce Bochy made an interestingcomment when discussing Buster Poseys athleticism and his above average defense at first base despite little experience.
I think he could play third, Bochy said. Thats howathletic I think he is.
File away that thought. Its not the first time Ive heardit, either. Bochy isnt alone among scouts and baseball officials, some within the Giants organization, who believePosey would have enough range, reaction skills and certainly enough armstrength to be a solid third baseman. That might be a handy option to keep inmind in future seasons if fitness remains an issue for Pablo Sandoval.
But thats a discussion to pick up again at the wintermeetings. For now, the important information is this: The crick in the neckthat Posey felt in the eighth inning Monday night wasnt serious enough to keephim out of Tuesdays lineup.
Posey is batting cleanup and playing first base against theLos Angeles Dodgers.
Bochy said he planned to watch Poseycarefully in batting practice, and if his cleanup hitter felt anything, theteam would scratch him. So far, so good.
Posey felt a twinge Monday night when he hit the first basebag while making a safe call with his arms. So perhaps his days providinghelpful pantomime to umpires are at an end.
Bochy didnt say it outright, but he made it sound as if Posey originally would have caught Barry Zito a signthat they would form a battery in a potential playoff start. Hector Sanchez hasbeen Zitos personal catcher for most of the season.
Zito and Posey, sure, no problem, Bochy said. And if Ifeel its necessary, hell catch Timmy (Lincecum).
The manager quickly followed by saying that Hector Sanchez morethan likely would catch Lincecum, though.
Bochy dropped one other hint about his postseason rotation,saying Zito wouldnt be on the same 75-pitch limit that the club imposed on Matt Cain a nightearlier. Cain will start Game 1 on Saturday on regular rest. The fact Zito wontbe limited in his final regular-season start suggests strongly that he would not bethe choice to start Game 2 on Sunday.
Bochy still isnt ready to announce the Game 2 starter, butthe expectation is that itll be Madison Bumgarner followed by Lincecum in Game3. If the Giants face elimination entering Game 4, the Giants could bring backCain on short rest. Or they could hand the ball to Zito. That would leave RyanVogelsong, who has more relief experience, as the choice to back up bothLincecum and Zito (even Cain, too) if they get into early trouble. With Lincecum and Zito especially, you can usually tell within the first dozen pitches whether they're on or not.


text:
|Publication number
|Publication type
|Application number
|Publication date
|Jul 10, 2007
|Filing date
|Sep 21, 2004
|Priority date
|Sep 21, 2004
|Fee status
|Also published as
|Publication number
|Sidlgata V. Sreenivasan, Nicholas A. Stacey
|Original Assignee
|Molecular Imprints, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (95), Non-Patent Citations (26), Referenced by (16), Classifications (34), Legal Events (11)
|External Links: USPTO, USPTO Assignment, Espacenet
The field of invention relates generally to micro and/or nano-fabrication of structures. More particularly, the present invention is directed to forming relief structures in substrates.
Micro-fabrication involves the fabrication of very small structures, e.g., having features on the order of micro-meters or smaller. One area in which micro-fabrication has a sizeable impact is in the semiconductor processing industry for the manufacture of integrated circuits. As the semiconductor processing industry continues to strive for larger production yields while increasing the circuits per unit area formed on a substrate, micro-fabrication becomes increasingly important. Other areas of development in which micro-fabrication has been employed include biotechnology, optical technology, mechanical systems and the like.
Traditional micro-fabrication employs photolithography techniques to replicate patterns on substrates. Photolithography includes a combination of an exposure tool and an image transfer process. To that end, a process compatible masking layer, often referred to as a resist-layer, is employed to provide the desired pattern. That is, the material from which the resist-layer is fabricated is optimized for the exposure tool and the image transfer process. As a result, several factors are considered when determining the proper resist material, including the exposure wavelength and compatibility of the resist-layer material to post imaging processes, e.g., subsequent etch and deposition processes. In addition to the resist-layer, replicating patterns with well-defined features is dependent upon operational characteristics of the exposure tool. These characteristics include, and are not limited to, the numerical aperture of the exposure tool lens, wavelength employed and alignment systems.
Recently a new non-photolithographic patterning process has evolved, which is commonly referred to as imprint lithography, overcoming many of the complexities and limitations of exposure tool technology. Exemplary imprint lithographic processes are described in detail in numerous publications, such as U.S. published patent application Ser. No. 2004/0065976, filed as U.S. patent application Ser. No. 10/264960 on Oct. 4, 2002 and entitled METHOD AND A MOLD TO ARRANGE FEATURES ON A SUBSTRATE TO REPLICATE FEATURES HAVING MINIMAL DIMENSIONAL VARIABILITY; U.S. published patent application Ser. No. 2004/0065252, filed as U.S. patent application Ser. No. 10/264926 on Oct. 4, 2002 and entitled METHOD OF FORMING A LAYER ON A SUBSTRATE TO FACILITATE FABRICATION OF METROLOGY STANDARDS; and U.S. published patent application Ser. No. 2004/0046271, filed as U.S. patent application Ser. No. 10/235314 on Sep. 5, 2002 and entitled FUNCTIONAL PATTERNING MATERIAL FOR IMPRINT LITHOGRAPHY PROCESSES, all of which are assigned to the assignee of the present invention.
The fundamental imprint lithography technique disclosed in each of the aforementioned published patent applications includes formation of a relief pattern in a polymerizable layer and transferring a pattern corresponding to the relief pattern into an underlying substrate. To that end, a template is employed spaced-apart from the substrate with a formable liquid present between the template and the substrate. The liquid is solidified to form a solidified layer that has a pattern recorded therein that is conforming to a shape of the surface of the template in contact with the liquid. The substrate and the solidified layer are then subjected to processes to transfer, into the substrate, a relief image that corresponds to the pattern in the solidified layer.
Generally, control over the dimensions of the features formed with the aforementioned processes has been dependent upon the topology of the underlying surface in contact with the formable liquid. The greater anisotropy of the surface the greater the distortion in the relief image.
There is a need, therefore, to provide improved processes for forming relief structures on substrates containing topography.
The present invention features a method of patterning a substrate that includes forming, on the substrate, a first film having an original pattern that includes a plurality of projections a subset of which extends from a nadir surface terminating in an apex surface defining a height therebetween. A second film is disposed upon the first film and defines a surface spaced-apart from the apex surface of the plurality of projections. A variation in a distance between the apex surface of any one of the plurality of projections and the surface being within a predetermined range. A recorded pattern is transferred onto the substrate that corresponds to the original pattern, within the predetermined range being selected to minimize pattern distortions in the recorded pattern. These and other embodiments are described herein.
Referring to
Multi-layer film stack 16 includes a primer layer 18 deposited on a surface 20 of substrate 10, a patterned layer 22 disposed upon primer layer 18, and an etch-differential layer 24 deposited upon patterned layer 22. Primer layer 18 functions to provide surface 26 with planarity perturbations having a frequency that is less than the frequency of the planarity perturbations in surface 20.
Patterned layer 22 and etch-differential layer 24 define an etch rate differential interface 28 that results from the relative etch rates and thicknesses of the materials from which patterned layer 22 and etch-differential layer 24 are formed. This facilitates formation, on substrate 10, of a pattern corresponding to a shape of patterned layer 22. For example, as shown, patterned layer 22 is provided with features that include projections 30 having a thickness t1, and recessions 32 having a thickness t2, measured between primer layer 18 and a bottom of recessions 32. Thickness t2 is shown varying over the area of patterned layer 22 to the planarity perturbations that presents as curved surface in primer layer 18. Thickness t2 is referred to as a residual thickness. Thicknesses "t1" and "t2" may be any thickness desired, dependent upon the application.
Each of projections 30 has an apex surface 34 and each of recessions 32 has a nadir surface 36. In the absence of etch-differential layer 24, the thickness differential between t1 and t2 of projections 30 and recessions 32, respectively, defines the amount of etch time required before exposing regions of substrate 10. Specifically, some or all of patterned layer 22 is sacrificed during the etching process to provide the desired dimensions of the pattern eventually recorded in substrate 10. Assuming a uniform thickness t2, a greater amount of etch time is required to expose regions of substrate 10 in superimposition with projections 30 compared with the time required for regions of substrate 10 in superimposition with recessions 32. For a given etching process, therefore, etching will commence sooner in regions of substrate 10 in superimposition with recessions 32 than regions in superimposition with projections 30. This facilitates formation of a pattern in substrate 10 corresponding to the shape of patterned layer 22.
By properly selecting the imprinting materials and etch chemistries, the relational dimensions between the differing features of the pattern, referred to as etched pattern characteristics (EPC), eventually transferred onto substrate 10, i.e., the recorded pattern, may be controlled as desired. To that end, it is desired that the etch characteristics of patterned layer 22, for a given etch chemistry, be substantially uniform. However, the presence of planarity perturbations may result in exposure of some regions of substrate 10 in superimposition with projections 34 before exposure of regions of substrate 10 in superimposition with recessions 32. As a result features of the pattern may be lost, which is undesirable.
Etch-differential layer 24 provides added variability in a given pattern transfer process for a given patterned layer by modifying the EPC. This facilitates overcoming problems associated with the planarity perturbations. Specifically, for a given etch process and patterned layer 22, etch-differential layer 24 operates to modify the EPC by varying the time required before the etch chemistry breakthrough of all, or any sub-portion of, the patterned layer 22 to expose the region of substrate 10 in superimposition therewith.
The modification of the EPC is dependent upon several factors. One of these factors includes the relative etch rates of the materials from which patterned layer 22 and etch-differential layer 24 are formed. Another factor is the variation in the spacing between normalization surface 40 and an interface of patterned layer 22 with etch-differential layer 24, with the interface being referred to as etch rate interface (ERI) over the area of the ERI. The variations in distance between normalization surface 40 and the ERI are a function of the shape of the relative shapes of both normalization surface 40 and patterned layer 22. It is the volume of etch-differential layer 24 disposed between normalization surface 40 and the ERI that defines an etch-differential interface. Considering that all or some of etch-differential layer 24 and some or all of patterned layer 22 are sacrificed to form onto substrate 10 the desired recoded pattern, it is seen that etch differential interface 28 provides the modification to the EPC. By establishing a suitable etch-differential interface 28, the deleterious effects of planarity perturbations may be attenuated, if not avoided.
For example, as mentioned above, the planarity perturbations include undulations 12 and polygonal structures 14; however, it should be understood that the topology of surface 20 may include any known shape, including substantially smooth, if not planar regions over a substantial area thereof. Further, the entire surface 20 may comprise undulations 12, or the entire surface 20 may comprise polygonal structures 14. Further, surface 20 may comprise of silicon and any native oxide present thereon that is associated with a standard silicon wafer or may include an indium phosphate wafer, a gallium arsenide wafer, a gallium nitride wafer and the like. Furthermore, substrate 10 may include any one of the aforementioned wafers with one or more pre-existing layer deposited thereon, any one of which may be comprised of a metallic material, a dielectric material or combination thereof.
Primer layer 18 is applied to substrate 10 employing any known technique, e.g., chemical vapor deposition techniques, atomic layer deposition techniques, physical vapor deposition techniques, spin-coating techniques, imprint lithography techniques and the like. In the present example, primer layer 18 may be formed from a material available from Brewer Science, Inc. of Rolla Mo. under the trade name DUV30J-6 that is spun-on substrate 10. Primer layer 18 is typically provided with a thickness to function as an anti-reflective coating and provide a continuous, smooth, relatively defect-free surface that may exhibit excellent adhesion to material deposited thereon and without being opaque to optical sensing equipment employed to detect patterns, such as alignment marks (not shown), on substrate 10.
Both patterned layer 22 and etch-differential layer 24 are deposited using any known technique, e.g., chemical vapor deposition techniques, atomic layer deposition techniques, physical vapor deposition techniques, spin-coating techniques, imprint lithography techniques and the like. In the present example, patterned layer 22 and etch-differential layer 24 are formed employing imprint lithography techniques. An exemplary technique for forming patterned layer 22 employs depositing a plurality of droplets of imprinting material, referred to as a drop-dispense technique. An exemplary drop dispense technique is described in U.S. patent application Ser. No. 10/789,319 filed Feb. 27, 2004 entitled COMPOSITION FOR AN ETCHING MASK COMPRISING A SILICON-CONTAINING MATERIAL, which is assigned to the assignee of the present invention and incorporated by reference herein. Typically, drop dispense imprinting is practiced in a helium rich atmosphere, e.g., with helium being flowed into a process region at about 5 pounds per square inch, in a manner described in U.S. patent application Ser. No. 10/677,639, entitled SINGLE PHASE FLUID IMPRINT LITHOGRAPHY METHOD filed Oct. 2, 2003 and is incorporated by reference herein. An exemplary system is available under the trade name IMPRIO 100™ from Molecular Imprints, Inc. having a place of business at 1807-C Braker Lane, Suite 100, Austin, Tex. 78758. The system description for the IMPRIO 100™ is available at www.molecularimprints.com and is incorporated herein by reference.
Patterned layer 22 includes the features discussed above. Etch-differential layer 24 includes first and second opposed sides. The first side faces patterned layer 22 and has a profile complementary to the profile of the patterned layer 22. The second side faces away from patterned layer 22 forming a substantially smooth if not planar surface, defining a normalization surface 40.
The materials employed to form the patterned layer 22 and etch-differential layer 24 are selected to obtain the desired etch-differential interface 28. In one example, patterned layer 22 is a polymerized and cross-linked silicon-free material formed from the following composition:
The acrylate component isobornyl acrylate (IBOA) has the following structure:
and comprises approximately 55% of COMPOSITION 1 by weight, but may comprise 20-80% of the same. As a result, the mechanical properties of patterned layer 22 are primarily attributable to IBOA. An exemplary sample of IBOA is available from Sigma-Aldrich of St. Louis, Mo. under product number 392103. The component n-hexyl acrylate (nHA) has the following structure:
and comprises approximately 27% of COMPOSITION 1 by weight, but may comprise 0 to 50% of the same. Also providing mechanical strength to patterned layer 22, nHA is employed to provide the desired viscosity of COMPOSITION 1, in the liquid phase, to be in a range 2-9 Centipoises. Another advantage of nHA is that it improves the flexibility of COMPOSITION 1. An exemplary sample of nHA is available from Sigma-Aldrich of St. Louis, Mo. under product number 408905. A cross-linking component, ethylene glycol diacrylate, has the following structure:
and comprises approximately 15% of COMPOSITION 1 by weight, but may comprise 10-50% of the same. EGDA facilitates cross-linking of nHA and IBOA during polymerization of COMPOSITION 1, as well as contributes to the modulus and stiffness build up. An initiator component, 2-hydroxy-2-methyl-1-phenyl-propan-1-one is available from Ciba Specialty Chemicals of Tarrytown, N.Y. under the trade name DAROCUR 1173, has the following structure:
and comprises approximately 3% of COMPOSITION 1 by weight, but may comprise 0.1% to 5% of the same. The initiator is responsive to a broad band of ultra-violet radiation to facilitate cross-linking and polymerization of the components of COMPOSITION 1.
The component R1R2 is a surfactant having the general structure R1═F(CF2CF2)y, with y being in a range of 1 to 7, inclusive, and R2═CH2CH2O(CH2CH2O)xH, with X is in a range of 0 to 15, inclusive. The surfactant may be any known in the art that provides COMPOSITION 1 with suitable wetting properties in the liquid phase, as well as desired release characteristics in the solid phase. For purposes of this invention a surfactant is defined as any molecule, one tail of which is hydrophobic. Surfactants may be either fluorine-containing, e.g., include a fluorine chain, or may not include any fluorine in the surfactant molecule structure. An exemplary surfactant has the following general structure:
and is available under the trade name ZONYL� FSO-100 from DUPONT™, which consists of 0.25 to 2% of the composition, with the remaining components being reduced a proportionate amount.
In the present example, etch differential layer 24 is formed employing the drop-dispense technique discussed above with respect to patterned layer 22. As a result, a plurality of droplets (not shown) of imprinting material are deposited atop of patterned layer 22 and a planarization mold (not shown) is placed in contact therewith. Exemplary imprinting materials from which etch-differential layer 24 is a polymerized and cross-linked material formed from one of the following compositions:
COMPOSITION 2 differs from COMPOSITION 1 by the
substitution of nHA with
acryloxymethylpentamethyldisiloxane that has the
following structure:
The remaining components of COMPOSITION 2 are that same as COMPOSITION 1, but are present in differing amounts. For example, IBOA of COMPOSITION 2 typically comprises approximately 37% of COMPOSITION 2, and EGDA and 2-hydroxy-2-methyl-1-phenyl-propan-1-one, comprising approximately 18% and 3%, respectively. The surfactant R1R2 is approximately 0.5% of the COMPOSITION.
Composition 3 differs from COMPOSITION 2 only by the substitution of acryloxymethylpentamethyldisiloxane with acryloxymethylbis(trimethylsiloxy)methylsilane. The component acryloxymethylbis(trimethylsiloxy)methylsilane has the following structure:
The relative quantities of each of the components of COMPOSITION 3 are the same as discussed with COMPOSITION 2.
Referring to
Referring to
After exposure of regions 50, suitable etch processes, such as a types discussed above may be employed to transfer a pattern onto substrate 10 corresponding to the recorded pattern. Alternatively, or in conjunction therewith, the recorded pattern may be covered with a conductive material (not shown), such as aluminum, copper, tungsten, titanium, ti-tungsten or a combination thereof and the like, to, inter alia, fill recesses in furtherance of contact formation, discussed more fully below.
An advantage with the present invention is that control over the dimensions of the features is facilitated despite the presence of planarity perturbations on substrate 10. This is achieved by ensuring that normalization surface 40 is provided with a profile to ensure that distances k2, k4, k6, k8, k10 and k12 between apex surfaces 34 of each of projections 30 and normalization surface 40 are within a predetermined range. Specifically, normalization surface 40 is provided with a profile to ensure that the maximum difference between any two of distances k2, k4, k6, k8, k10 and k12 is less than � the height of the smallest projection 30. Control of variations between distances, k1, k3, k5, k7, k9 and k11 is not as critical so along as the measure of any one of distances k1, k3, k5, k7, k9 and k11 is no less than the measure of the largest distance among distances k2, k4, k6, k8, k10 and k12. With this criteria being satisfied, the distortions occurring during formation of recorded pattern is substantially independent of the planarity perturbations, by decoupling the resolution of the patterning process from the resulting variations in the thickness t2 over the area of patterned layer 22.
It was also determined that the resolution of the patterning process may be substantially decoupled from the thickness t2, in addition to the variations in the same. Specifically, without the presence of etch-differential layer 24, the aspect ratio of the recorded pattern was defined, in part, by the difference between t2 and t1. In the absence of planarity perturbations, t2 being on the order of the size of t1, or larger than t1, would result in no features being be produced in the recorded pattern. As a result, it was highly desired to minimize the thickness of t2. Further, the presence of planarity perturbations, control over thickness t2 becomes problematic, because the same varies over the area of patterned layer 22. This may also result in a loss of pattern features. Specifically, assume a maximum value of t2, t2max, and a minimum value of t2, t2min. Were the difference between t2max and t2min on the order of the size of t1, or larger than t1, features in the recorded pattern would be lost. Further, the speed at which the patterning process occurred was often decreased due to the time required to fill the features of a template (not shown). Also, the time required to imprint increased as the feature dimensions on the template decreased, particularly with low viscosity imprinting materials, e.g., having a viscosity of less than 25 Centipoises, wherein the patterning process is dominated by the capillary forces of the imprinting material with the template (not shown). Although compressive forces may be applied to reduce the time required to fill the features of the template (not shown), there are limits, e.g., the mechanical strength of the underlying substrate 10 to mention one. The mechanical strength of substrate 10 becomes a limitation when patterning materials having high viscosity, e.g., in a range of 25 to 10,000 Centipoises. At the greater range of viscosity the patterning process becomes dominated by viscous forces of the imprinting material, as opposed to capillary forces. The compressive force required to pattern an imprinting material is believed to increase cubically as thickness t2 decreases.
With the present invention, variations in the thickness t2, as well as the overall thickness may be modified without unduly deteriorating the resolution of the features to be formed in recorded pattern. For example, the difference between t2max and t2min may be the same size or greater than t1. Additionally, thickness t2 may be the same size as the thickness t1, or may be two to ten times greater than t1. An advantage with substantially increasing the thickness t2 is that the compressive forces required to achieve an imprint process may be substantially independent of thickness t2, which facilitates patterning process dominated by viscous forces. Further, increasing thickness t2 facilitates reversing the tone of the pattern formed in substrate so that the tone may be commensurate with the tone of the pattern of patterned layer 22.
Referring to
Referring to
Referring to
Referring to
Referring to
Another advantage with the tone reversal is found when fabricating patterned layer 22 employing imprint lithography techniques. It has been found that filling of features on a template (not shown), such as recesses may be difficult if the same are too small. With the tone reversal process, the recess may be fabricated in the template (not shown) as protrusions with the same being subsequently formed into a recorded pattern as recessions. In other words, the tone of the pattern in the template may be chosen independent of the recorded tone of the recorded pattern desired. Instead, the tone of the pattern in the template may be selected to satisfy other operational characteristics of the imprint process, e.g., throughput by decreasing feature fill-time.
It should be understood that the benefits of the aforementioned processes is not limited to forming patterns having single-recessed-level features, as discussed above, but may also be employed forming patterns having bi-level recessed features, i.e., stepped features. For example, referring to
An inverse shape of patterned layer 322 is transferred onto substrate 310 to form a via portion (not shown) and a trench portion (not shown) therein, discussed more fully below. In this manner, the dimensions of the via portion (not shown) are established as a function of the dimensions of projections, and the dimensions of the trench portion (not shown) are established as a function of the dimensions of the shoulders. To that end, substrate 310 may include several preexisting layers disposed upon a wafer 312, shown as layers 314, 315 separated by etch stop layers 316, 317 and 318. Etch-differential layer 324 is disposed adjacent to patterned layer 322. Substrate 310, patterned layer 322 and etch-differential layer 324 define a multi-layered structure 338.
Referring to
Referring to
Referring to
Referring to
Although the foregoing has been discussed with respect to forming etch-differential layer 24 using drop-dispense techniques, etch-differential 24 layer may be formed employing spin-on techniques as discussed in U.S. patent application Ser. No. 10/789,319 filed Feb. 27, 2004 entitled COMPOSITION FOR AN ETCHING MASK COMPRISING A SILICON-CONTAINING MATERIAL. To that end, the following compositions may be employed:
In COMPOSITION 4, hydroxyl-functional polysiloxane comprises approximately 4% of the composition, hexamethoxymethylmelamine comprises approximately 0.95%, toluenesulfonic acid comprises approximately 0.05% and methyl amyl ketone comprises approximately 95%. In COMPOSITION 5, hydroxyl-functional polysiloxane comprises approximately 4% of the composition, hexamethoxymethylmelamine comprises approximately 0.7%, gamma-glycidoxypropyltrimethoxysilane comprises approximately 0.25%, toluenesulfonic acid comprises approximately 0.05%, and methyl amyl ketone comprises approximately 95%.
Both COMPOSITIONS 4 and 5 are made up of at least 4% of the silicone resin. Upon curing, however, the quantity of silicon present in etch-differential layers 24, 124, 224 and 324 is at least 10% by weight and typically in a range of 20% or greater. Specifically, the quantity and composition of the solvent present in COMPOSITIONS 4 and 5 is selected so that a substantial portion of the solvent evaporates during spin-coating application of the COMPOSITIONS 4 or 5 on patterned layers 22, 122 and 322. In the present exemplary silicon-containing material, approximately 90% of the solvent evaporates during spin-coating. Upon exposing the silicon-containing material to thermal energy, the remaining 10% of the solvent evaporates, leaving etch-differential layer 24, 124, 224 and 324 with approximately 20% silicon by weight.
An exemplary method of forming etch-differential layers 24, 124, 224 and 324 includes spinning-on approximately 4 mL of the silicon-containing material deposited proximate to a center of the previously deposited layer. To that end, substrates 10, 110 or 310 are spun at 1000 rev/min for 1 minute by placing substrate 10, 110 or 310 on a hot plate. Thereafter, the silicon-containing material is subjected to thermal energy by baking at 150� C. for 1 min. This produces the silicon-containing material from which etch-differential layer 24, 124, 224 and 324 is formed, with thickness variations of 20 nm or less. Were it desired to increase the thickness of the solidified silicon-containing layer, e.g., to provide the solidified silicon-containing layer with a thickness of 200 nm, the aforementioned spin-coating and curing processes are simply repeated. As a result, the solvent employed is selected so as not to remove, "wash away," silicon-containing material in a well-cured etch-differential layer.
Referring to
Additionally, should circumstances warrant, the aforementioned processes may be altered to take advantage of the material of the layer upon which pattern occurs. For example, it is possible to form patterned layers 22, 122 and 322 from COMPOSITIONS 2, 4 or 5, with etch-differential layers 24, 124, 224 and 324 being formed from COMPOSITION 1. With this configuration, it might be beneficial to form primer layer 18 from one of COMPOSITIONS 2-5, i.e., were the surface upon which primer layer 18 disposed formed from a non-silicon containing organic material. Additionally, it is possible to form primer layer 18 from COMPOSITION 1. The etch process employed would be established to provide the desired etch selectivity in the manner similar to that described above.
Referring to
Referring to
Referring to
Referring to
Referring to
Referring to
Referring to
Referring to
Referring to
The embodiments of the present invention described above are exemplary. Many changes and modifications may be made to the disclosure recited above, while remaining within the scope of the invention. The scope of the invention should, therefore, be determined not with reference to the above description, but instead should be determined with reference to the appended claims along with their full scope of equivalents.
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- Ultrasonic Surgery- Compare to Piezotome®* Tips
Ultrasonic Surgery- Compare to Piezotome®* Tips
Professional Grade Piezo Surgery Tips Vista Dental™ offers the most comprehensive line of piezo surgery tips available. Manufactured to the highest quality standards, SeriesOS™ tips incorporate specialized heat and surface treatments, proprietary metallurgy, and precision machining that provides optimal cutting performance and expanded tip longevity. Specifically designed and tuned to operate with Satelec® Acteon Piezotome units. *Satelec® is a registered trademarks of SATELEC SAS (ACTEON group)