text:
|Publication number
|Publication type
|Application number
|Publication date
|Sep 9, 1980
|Filing date
|Mar 9, 1979
|Priority date
|Mar 9, 1979
|Publication number
|John E. Vander Mey
|Original Assignee
|Allied Chemical Corporation
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (7), Referenced by (55), Classifications (31), Legal Events (3)
|External Links: USPTO, USPTO Assignment, Espacenet
This is a continuation-in-part of my application Ser. No. 915,640, filed June 15, 1978 now abandoned.
As described in my copending U.S. Pat. applications Ser. Nos. 873,340 (filed Jan. 30, 1978) and 729,515 (filed Oct. 4, 1976) now Pat. No. 4,165,295, organic stripping solutions including sulfonic acids are known in stripping agents for removing polymeric organic substances such as photoresists from metallized inorganic substrates. While such stripping agents are effective in removing the polymeric substances, they also have a tendency, especially in the presence of water, to corrode the metal, particularly aluminum and titanium. In my above two applications, I describe inhibitors for such stripping agents which reduce the metal corrosion rate. Such systems include fluoride, especially as hydrogen fluoride. It has now been found that nitrile compounds reduce the loss of fluoride through vaporization of HF, and also enhance the corrosion inhibition properties of the fluoride.
In accordance with this invention, there are provided improved organic stripping compositions for removing polymeric organic substances from metallized inorganic substrates which include at least one organic sulfonic acid of the following formula:
R--SO.sub.3 H
wherein R is an organic radical selected from the group consisting of alkyl containing 1 to 18 carbon atoms, monohydroxyalkyl containing 1 to 18 carbon atoms, aryl containing 6 to 10 carbon atoms, monoalkyl aryl wherein the alkyl group contains 1 to 14 carbon atoms, dialkyl aryl wherein each alkyl group contains 1 to 4 carbon atoms, monohydroxy aryl containing 6 to 10 carbon atoms, monoalkyhydroxy aryl containing 7 to 11 carbon atoms, and monochlorohydroxy aryl containing 6 to 10 carbon atoms, at least one organic solvent, optionally phenol and an inhibitor system including about 5 to about 300 ppm fluoride by weight of composition. In the improvement the inhibitor system also includes about 0.01 to about 5 percent by weight of composition of a nitrile compound of the formula H--R--CN or of the formula NC--R--CN, where R is alkylene, arylene or alkylarylene. Such nitrile compounds reduce the loss of fluoride inhibitor through vaporization of HF and also enhance the inhibition of metal corrosion by the fluoride.
The organic stripping compositions of this invention include those which contain as the main stripping agents one or more organic sulfonic acids which possess the property of being able to dissolve and disperse polymeric organic substances away from an inorganic substrate. Among the various classes of organic sulfonic acids which possess this property and are useful in the present invention are the alkyl-, monohydroxyalkyl-, aryl-, monoalkylaryl-, dialkylaryl-, monohydroxyaryl-, monoalkyl-, hydroxyaryl- and monochloro-hydroxyarylsulfonic acids.
Examples of alkyl sulfonic acids are those containing 1 to 18 carbon atoms, preferably linear alkyl sulfonic acids containing 10, 12 or 14 carbon atoms, such as linear dodecanesulfonic acid and linear decanesulfonic acid.
Examples of monohydroxyalkyl sulfonic acids are those containing 1 to 18 carbon atoms, preferably containing 15 to 18 carbons, in a linear or branched chain such as those produced by sulfonation of alpha-olefins. An example is the monohydroxy sulfonic acid mixture produced from the sulfonation of 1-octadecene.
Examples of arylsulfonic acids are those containing 6 to 10 carbon atoms and include naphthalene sulfonic acids, and preferably benzenesulfonic acid.
Examples of monoalkylarylsulfonic acids are those containing an alkyl group composed of 1 to 14 carbon atoms, which may be linear or branched such as toluenesulfonic acid, cumene-sulfonic acid, decylbenzenesulfonic acid and dodecylbenzenesulfonic acid. Preferred among the monoalkylarylsulfonic acids are linear monoalkylbenzenesulfonic acids because of greater biodegradability such as toluene-sulfonic acid (usually the para isomer predominates, but either isomer may be used), linear octyl-, decyl- and dodecylbenzenesulfonic acid.
Examples of dialkylarylsulfonic acids are those containing two alkyl groups each preferably linear and composed of 1 to 4 carbon atoms and include the isomers of xylenesulfonic acid and the isomers of methylethylbenzene sulfonic acid. Preferred are the isomers of xylenesulfonic acid either individually or in admixture.
Examples of monohydroxyarylsulfonic acids are those containing 6 to 10 carbon atoms and include the naphtholsulfonic acids and the phenolsulfonic acids. Preferred sulfonic acids in this group are the phenolsulfonic acids, either the ortho or para isomers, individually or in admixture.
Examples of monoalkyl-hydroxyarylsulfonic acids are those containing 7 to 11 carbon atoms and include methylnaphtholsulfonic acids and cresolsulfonic acids. A preferred example is cresolsulfonic acid, including all of its isomers either individually or in admixture.
Examples of monochloro-hydroxyarylsulfonic acids are those containing 6 to 10 carbon atoms and include chloronaphtholsulfonic acids and chlorophenolsulfonic acids. Preferred in this group are the chlorophenolsulfonic acids, including all of its isomers either individually or in admixture.
The compositions of this invention may contain one or more of the above-mentioned organic sulfonic acids, but it is preferred to use at least two organic sulfonic acids in combination which contain different R groups as defined above to maximize the stripping ability of the composition to remove polymeric organic substances. If only one organic sulfonic acid is used, it is preferred to use linear dodecylbenzenesulfonic acid in the composition because of its superior properties as a stripping agent, and its ready availability and low cost as contrasted to other organic sulfonic acids. When two or more organic sulfonic acids are used, it is preferred to use the combination of linear dodecylbenzenesulfonic acid/para-toluenesulfonic acid, or, if phenol is additionally used in the composition, then phenolsulfonic acid is preferably used in combination with linear dodecylbenzenesulfonic acid. Benzenesulfonic acid is also preferred, especially with compositions free of phenol and free of chlorinated hydrocarbons.
The organic sulfonic acid, used either singly or in admixture, is generally present in the composition in the range of about 20 to 80 weight percent of the composition in the absence of phenol, and preferably about 30 to 60 weight percent. If used in combination with phenol, the sulfonic acid is generally used in the range of about 10 to 80 weight percent with the phenol comprising about 5 to 50 weight percent of the composition. The balance is mainly solvent. In certain compositions with mixtures of sulfonic acids, less than 20 weight percent or even no solvent may be used such that the sulfonic acids may comprise over 80 and up to substantially 100 percent of the composition exclusive of inhibitors.
The solvents which are useful in the compositions of the present invention, either in the absence or in combination with phenol, are selected from the group consisting of aromatic hydrocarbons containing 6 to 14 carbon atoms, of which benzene and naphthalene are examples; aliphatic hydrocarbons containing 6 to 30 carbon atoms, of which dodecane, a mixture of isoparaffinic hydrocarbons with an average molecular weight between 150 and 210 and a boiling point between 160� and 220� C., and light and heavy mineral oils from the distillation of petroleum are examples; monoalkylsubstituted aromatic hydrocarbons containing 7 to 20 carbon atoms, of which the linear alkylbenzenes are preferred such as toluene, ethylbenzene, cumene, octylbenzene, decylbenzene and dodecylbenzene; dialkyl-substituted aromatic hydrocarbons containing 8 to 20 carbon atoms, of which the dialkylbenzenes such as the ortho, meta and para isomers of xylene and diethylbenzene are examples; trialkyl-substituted aromatic hydrocarbons containing 9 to 20 carbon atoms, of which the trialkylbenzenes such as 1,2,3-, 1,2,4- and 1,3,5-isomers of trimethyl- and triethylbenzene are examples; chlorinated aliphatic hydrocarbons containing 1 to 14 carbon atoms and 1 to 4 chlorine atoms, of which methylene chloride and tetrachloroethane are examples; chlorinated olefinic hydrocarbons containing 1 to 14 carbon atoms and 1 to 4 chlorine atoms of which those containing 2 to 4 carbon atoms and 3 to 4 chlorine atoms are preferred such as trichloroethylene and perchloroethylene (tetrachloroethylene); chlorinated aromatic hydrocarbons containing 6 to 12 carbon atoms and 1 to 4 chlorine atoms, of which the chlorinated benzenes containing 1 to 3 chlorine atoms are preferred such as ortho-dichlorobenzene and trichlorobenzene; aliphatic ketones containing 3 to 10 carbon atoms, of which acetone and methylethylketone and methylisobutylketone are examples; monoalkylethers of ethylene glycol containing 3 to 10 carbon atoms, of which ethoxyethanol and butoxyethanol are examples; carboxylic acids containing 1 to 4 carbon atoms, of which acetic, maleic, and trichloroacetic acids are examples; cresols containing 7 to 10 carbon atoms, of which meta- and paracresol are examples; hydroxybenzenes containing 2 to 3 hydroxy groups, of which resorcinol and hydroquinone are examples; formamide; N,N-dialkylalkanoylamides containing 3 to 10 carbon atoms, of which dimethylformamide and dimethylacetamide are examples; N-alkyl lactams containing 6 to 12 carbon atoms, of which N-methylpyrrolidone is an example and cyclic aliphatic sulfones containing 4 to 6 carbon atoms, of which tetramethylenesulfone is an example. It should be appreciated that some of these solvents may also complex with the hydrogen fluoride complex.
The solvents which are preferred for use either individually or in combination in the invention are the aliphatic hydrocarbons, preferably a mixture of isoparaffinic hydrocarbons with an average molecular weight between 150 and 210 and a boiling point between 160� and 220� C. and light and heavy mineral oils produced from the distillation of petroleum, the chlorinated olefinic hydrocarbons, preferably perchloroethylene, the chlorinated aromatic hydrocarbons, preferably ortho-dichlorobenzene, the monoalkyl-substituted aromatic hydrocarbons, preferably octylbenzene, decylbenzene or dodecylbenzene, the dialkyl-substituted aromatic hydrocarbons, preferably the individual isomers or mixtures thereof of xylene and diethylbenzene, respectively, and the trialkyl-substituted aromatic hydrocarbons, preferably the isomers of trimethylbenzene or mixtures thereof.
The solvent or solvent mixture employed in the organic composition of this invention is generally present in an amount of about 20 to 90 weight percent, preferably 30 to 70 weight percent, of the composition. With certain combinations of sulfonic acids such as equal parts of dodecylbenzenesulfonic acid and benzenesulfonic acid, little or no solvent may be required.
The compositions of the present invention possess an important advantage over prior art organic compositions in that they contain only small amounts of fluoride ion which have surprisingly been found to inhibit the dulling and corrosion of metals, particularly aluminum, without causing substantial etching of the inorganic substrates, such as silicon, silicon dioxide and sapphire, particularly silicon dioxide, when subjected to the action of the stripping composition at a temperature of about 20� to 180� C., even after repeated use at such elevated temperatures. By the term "substantial etching" is meant an etch rate greater than about 0.2 A/minute of the thickness of an inorganic wafer, particularly silicon dioxide.
As indicated in the brief description, the present invention includes an inhibitor system of both a fluoride and nitrile compound. These two ingredients may be mixed together with or without reaction therebetween before addition to the rest of the stripping agent. Alternatively, the fluoride and the nitrile may be added separately to the stripping agent. Fluoride may be added in various forms, including HF and various inorganic salts such as ammonium bifluoride or ammonium fluoborate. It is believed, however, that such fluoride normally is converted in the acidic stripping composition to HF.
The fluoride is normally introduced into the composition in a range of about 5 to 300 parts per million (ppm) by weight of the composition, a preferred range being between about 100 and about 250 ppm by weight, and a more preferred range being between about 150 and about 250 ppm by weight. As indicated above, significantly higher amounts of fluoride tend to cause substantial etching of the inorganic substrates.
For many compositions, however, use as a stripping agent at elevated temperatures causes the fluoride concentration to fall below 50 ppm and stabilize at levels of 25, 20, 10 or even 5 ppm. The nitriles of the present invention as described below, are generally effective in preventing the fluoride from falling below about 20 ppm and may keep the fluoride concentration above 50 ppm in some uses. Nevertheless, it is desirable that the nitrile be effective in combination with 10 to 25 ppm fluoride to inhibit metal (and especially aluminum) corrosion.
In the present invention the inhibitor system includes, in addition to the fluoride, a nitrile compound present at levels of between about 0.01 and about 5 weight percent of the total composition, with about 0.05 to about 1 weight percent being preferred and about 0.1 to about 0.3 weight percent being more preferred for general application.
Particularly for applications in which the stripper acts on positive photoresist, levels at the lower end of the above range are preferred. Thus for such strippers, the preferred nitrile level is between about 0.01 and about 0.5 weight percent and the more preferred range is between about 0.05 and about 0.3.
Suitable nitrile compounds include the mononitriles and dinitriles discussed below. Suitable mononitriles are of the formula H--RCN where R is alkylene (preferably of 1 to 8 carbons), arylene (preferably benzene) or alkylarylene (preferably of 7 to 12 carbons). Larger R groups than those indicated as preferred may have decreased solubility, have a tendency to leave a residue on the substrate, contribute fewer nitrile groups compared to the weight of material added or otherwise be less suitable than the preferred smaller molecules. Preferred mononitriles are acetonitrile, propionitrile and isobutyronitrile.
Dinitriles are also suitable for use in the present invention. Such dinitriles are of the formula NC--R--CN where R is alkylene (preferably of 1 to 8 carbons), arylene (preferably benzene) or alkylarylene (preferably of 7 to 12 carbons). By alkylarylene is meant aryl with one or more alkyl side chains and the two CN groups bonded either to the aryl, to the alkyl, or one to the aryl and one to the alkyl. Dinitriles with R groups larger than those indicated as preferred are less preferred for the reasons given above in relation to larger mononitriles. Polynitriles with more than 2 CN groups are not included because of either unavailability or excessive costs. Preferred dinitriles are malonitrile (NC--CH2 --CN), succinonitrile (NC--CH2 CH2 --CN), glutaronitrile (NC--(CH2)3 --CN), adiponitrile (NC--(CH2)4 --CN) and phthalonitrile.
Nitriles corresponding to ethylenically unsaturated acids (i.e. maleic acid) or to oxalic acid (HOOC--COOH) are not contemplated because of toxicity or stability considerations.
In all of the definitions of R, above, the term "alkyl" or "alkylene" is used in its usual sense to include both linear and branched structures.
The inhibitor system of the present invention is particularly effective with non-phenolic strippers of the type containing a large proportion of sulfonic acids. Such strippers are described in my copending United States patent applications Ser. Nos. 740,154 (filed Nov. 8, 1976) and 908,189 (filed May 22, 1978) now U.S. Pat. No. 4,165,294. Exemplary chlorinated hydrocarbon-containing non-phenolic strippers contain linear dodecylbenzene sulfonic acid, para-toluene sulfonic acid, alkylbenzenes such as dodecylbenzene, perchloroethylene and orthodichloro benzene. Exemplary proportions would be 32, 10, 28, 20 and 8% of these five ingredients. To such a composition fluoride may be added at, for example, 150 ppm by weight of fluoride ion in the form of HF. The nitrile, such as acetonitrile, may then be added in quantities sufficient to provide about 0.2 weight percent acetonitrile by weight of composition. It will be appreciated that the amounts of fluoride and acetonitrile are small enough not to have any appreciable affect upon the concentrations of the five other ingredients.
An exemplary composition free of both phenol and chlorinated hydrocarbon compounds is one containing about 45 weight percent benzene sulfonic acid, 45 weight percent dodecylbenzene sulfonic acid and 10 weight percent alkyl benzenes such as dodecylbenzene. Fluoride may be provided to such a composition at, for example, 200 ppm, and acetonitrile at, for example, 0.1 percent by weight. An alternative formulation of this type is one containing 50-55% dodecylbenzenesulfonic acid, 30-35% benzenesulfonic acid and 4-6% dodecylbenzene, all by weight. To this composition would be added HF to give a fluoride concentration of about 200 ppm by weight and acetonitrile, malonitrile or adiponitrile to a concentration of 0.1% or 0.2% by weight.
It should be appreciated that other useful combinations of organic sulfonic acids and organic solvents in various proportions beyond those specifically discussed above would be obvious to one skilled in the art form from a reading of my above-referenced copending applications and the prior art.
Not only are the compositions of the organic strippers an object of this invention, but also the method of using the organic compositions of this invention.
Normally, the compositions will be utilized in removing a polymeric organic substance such as a photoresist agent from the surface of an aluminized inorganic substrate by immersing the substrate into the stripping solution at a temperature of about 20� to 180� C. Normally, the surface of the inorganic substrate which is either silicon, sapphire or silicon dioxide will be metallized with aluminum or titanium as is common in the area of photoresist applications used in the semi-conductor industry. Other common metals include molybdenum, tungsten and nickel-chrome alloys.
Typically, the photoresists which are commonly removed by the compositions of this invention are of the polyisoprene, polyvinyl cinnamate, and phenol-formaldehyde types as well as other types of polymeric organic substrates. These photoresists are applied to a substrate, e.g. silicon dioxide, silicon or aluminum, and portions of the material are then masked. A typical such substrate is silicon with a silicon dioxide surface coating covered by a thin aluminum layer. The masked substrate is then exposed to light, e.g., a 120 volt 650 watt quartz lamp for 1 to 15 seconds at a distance of 6 to 12 inches to harden the exposed photoresist. Other exposure means such as election beams are also used for this purpose. With negative photoresists, the portion of the photoresist which is not exposed, i.e., masked from the light, is then removed by a mild solvent which does not dissolve the exposed photoresist thus leaving a pattern, e.g. a portion of an electrical circuit pattern, on the exposed substrate. In the case of positive photoresists, it is the exposed portion that is removed by a mild solvent. The remaining photoresist is then baked for further hardening and the portion of the substrate which is not covered by the photoresist is etched or otherwise treated. The hardened photoresist must then be removed before the substrate can be further processed or used. In employing the stripping compositions of this invention, the substrate covered with the baked photoresist is contacted with the stripping solution at a temperature of about 20� to about 180� C., preferably between 90� and 120� C.
Times required for stripping the photoresist vary to quite an extent, depending on the specific polymer used in the photoresist and photoresist processing conditions. Generally, the time involved will be between 1 and 10 minutes although some resists, depending upon the bake temperature, may require 15 minutes, 30 minutes or even an hour of contact with the stripping solution before the polymeric photoresist is loosened from the substrate, depending upon the degree of polymerization of the exposed photoresist and the thickness of the formed polymer. After the photoresist has been removed, the substrate is washed with a suitable solvent such as water, alcohol, or chlorinated hydrocarbon such as perchloroethylene to remove traces of the composition before drying.
The following examples are given for illustrative purposes only and are not to be construed as limitations upon the scope of the disclosed invention.
A nonphenolic stripper was prepared from 51 weight % dodecylbenzenesulfonic acid (from Stepan Chemical Co., contains a carbon distribution of about 18% C-16, 38% C-17, 33% C-18 and 10% C-19 and contains about 2.0% free hydrocarbon and 0.5% free sulfuric acid), 20 weight % benzenesulfonic acid (from Jim Walters Associates, contains about 1.0% free sulfuric acid) and 29 weight % dodecylbenzene (from Continental Oil Co., same carbon distribution as the dodecylbenzenesulfonic acid). This composition was determined by azeotropic disillation with xylene to contain about 0.75 weight % water.
Test tubes were prepared with the above composition to which was added HF (as a 50:50 mixture with water) and/or the nitrile compound shown in Table 1 to the respective levels shown in Table 1. Aluminum foil pieces 3 inch � 1 inch � 0.002 inch were weighed on an analytical balance and placed one in each test tube. The tubes were covered and kept at 100� C. for 20 hours. Then the foil pieces were rinsed, dried and reweighed on an analytical balance. From the difference in weight, an aluminum corrosion rate in angstroms per minute was calculated. The results are displayed in Table 1.
TABLE 1______________________________________Aluminum Corrosion TestComposition of 51% DDBSA, 20% BSA, 29% DDBExample Aluminum CorrosionNo. HF ppm Nitrile % A�/min______________________________________1 5 None -- 742 5 AN 0.7 423 5 AN 1.0 394 175 AN 0.2 0.35 0 AN 2.0 0.16 5 MN 0.7 97 5 MN 1.0 0.58 175 MN 0.2 0.19 5 GN 0.7 3710 5 SN 0.7 36______________________________________ AN = Acetonitrile MN = Malononitrile GN = Glutaronitrile SN = Succinonitrile BN = Benzonitrile
Examples 1-10 were repeated using a stripper of 50 weight % dodecylbenzenesulfonic acid, 34 weight % benzenesulfonic acid and 12 weight % dodecylbenzene (each as in Examples 1-10) and 4 weight % toluenesulfonic acid (from Jim Walters Associates, contains about 1.0% free sulfuric acid). Different batches contained varying water amounts contributed by the benzenesulfonic acid and toluenesulfonic acid ingredients (as measured by azeotrpic extraction with xylene and shown in Table 2). Varying levels of HF and/or acetonitrile were introduced as in Examples 1-10 to level as shown in Table 2. The procedure of Examples 1-10 was followed to determine the aluminum corrosion rates shown in Table 2.
TABLE 2______________________________________Aluminum Corrosion TestComposition of 50% DDBSA, 34% BSA, 12% DDBExample Aluminum CorrosionNo. HF ppm An% H.sub.2 O % A�/min______________________________________11 0 -- 1.3 12312 0 0.5 1.3 7413 0 -- 1.1 11614 0 0.2 1.1 9715 0 1.0 1.1 6616 5 -- 1.1 12217 5 0.2 1.1 8918 15 -- 1.1 10619 15 0.2 1.1 6420 50 -- 1.1 721 50 0.2 1.1 222 50 1.0 1.1 223 100 1.0 1.1 124 0 -- 0.7 6025 5 -- 0.7 4826 5 0.2 0.7 3627 5 0.5 0.7 2828 30 0.2 0.7 0.429 30 0.5 0.7 0.3______________________________________
A composition was prepared as above, but also containing chlorinated hydrocarbon solvents:
______________________________________dodecylbenzenesulfonic acid 34 weight %dodecylbenzene 10 weight %toluenesulfonic acid 8 weight %orthodichlorobenzene 28 weight %perchloroethylene 20 weight %______________________________________
The impurity contents and carbon distributions of the first three ingredients were as in Examples 1-29. The same procedure was followed except that titanium foils were used which were 3 inch � 0.625 inch � 0.008 inch. Levels of HF (analyzed by comparison detection with a fluoride specific ion electrode), nitrile (as added) and water were as shown in Table 3. The titanium corrosion rates were calculated to be the values shown in Table 3.
TABLE 3______________________________________Titanium Corrosion TestComposition of 34% DDBSA, 10% DDB,8% TSA, 28% DDCB, 20% PercExample Titanium CorrosionNo. HF ppm Nitrile % H.sub.2 O % A�/min______________________________________30 50 None -- 0.4 2531 50 BN 0.2 0.4 1532 50 AN 0.2 0.4 1533 40 None -- 0.2 734 40 AN 0.2 0.2 435 40 AN 0.6 0.2 0.4______________________________________
Using the chlorinated hydrocarbon-containing composition of Examples 30-35, HF was added at 150 ppm and acetonitrile at 0%, 0.15% and 0.30%. The composition was then kept in an open beaker at 100� C. for 31/4 hours during which time 15-20 weight % of the total composition was lost to evaporation. This similates repeated use of a stripper. HF levels were then determined by comparison detection to be the levels shown in Table 4 and samples placed in test tubes. The aluminum corrosion rate was then determined as in Examples 1-29.
TABLE 4______________________________________Aluminum Corrosion TestComposition of 34% DDBSA, 10% DDB,8% TSC, 28% DDCB, 20% PercExample Acetoni- Aluminum CorrosionNo. HF ppm trile % H.sub.2 O % A�/min______________________________________36 2 -- 0.25 2137 7 0.15 0.25 238 13 0.30 0.25 0.3______________________________________
In other runs with fluoride containing material, each of the nitriles tested lowered the amount of fluoride lost when the composition was heated to 100� C. for 31/4-31/2 hours. Lowered corrosion rates of aluminum were observed where a combination of fluoride and nitrile was present.
A large batch (about 4 kilograms) was prepared of 51 weight % dodecylbenzenesulfonic acid, 33 weight % benzene sulfonic acid, 11 weight % TXA (a Witco Chemical product containing about one half toluenesulfonic acid and one half xylenesulfonic acid, by weight, and a trace of ethylbenzenesulfonic acid) and 5 weight % dodecylbenzene. Ingredients other than TXA were as described for Examples 1-10. This batch was heated to 110� C. for six hours under vacuum to remove excess water. A small aliquot of this batch was determined by azeotropic vacuum distillation with xylene to contain 0.27% water. Water was added to a one kilogram portion of this batch to a level of 0.3% water. The portion as then split into two halves and nitriles (acetonitrile=AN, malononitrile=MN) were added to samples of the first half as indicated in Table 5 for Examples 39-43. Fluoride was added (as a 50:50 mixture of HF and water) to the second half to 20 ppm fluoride, and nitriles were added as indicated for Examples 44-48. Water was added to a second one-kilogram portion to bring it to 0.6% water and then it was split into halves with fluoride added to the second half to 20 ppm and nitriles added to samples of both halves, all as indicated in Table 5 for Examples 49-58. Examples 59 and 60 were prepared from remaining samples of the first one-kilogram portion and adiponitrile (ADN). Example 61 was a blend of various leftovers.
Each sample was then placed in a test tube with weighed aluminum foil strips of 3 inch�1 inch�0.002 inch. The tubes were covered and kept at 100� C. for eighteen hours. Then the foil pieces were rinsed, dried and weighed on an analytical balance. From the difference in weight an aluminum corrosion rate in angstroms per minute was calculated.
TABLE 5______________________________________Aluminum Corrosion TestComposition of 51% DDBSA,33% BSA, 11% TXA, 5% DDB AluminumExample Water Fluoride Weight Corrosion RateNo. Wt. % ppm Nitrile % Angstroms/Min.______________________________________39 0.3 0 -- -- 14.040 0.3 0 MN 0.1 8.741 0.3 0 MN 0.2 6.642 0.3 0 AN 0.1 7.643 0.3 0 AN 0.2 5.144 0.3 20 -- -- 0.1545 0.3 20 MN 0.05 0.07546 0.3 20 MN 0.1 0.07547 0.3 20 AN 0.05 0.07548 0.3 20 AN 0.1 0.1549 0.6 0 -- -- 21.450 0.6 0 MN 0.1 30.951 0.6 0 MN 0.2 21.052 0.6 0 AN 0.1 20.953 0.6 0 AN 0.2 19.854 0.6 20 -- -- 2.955 0.6 20 MN 0.1 0.2456 0.6 20 MN 0.2 0.1657 0.6 20 AN 0.1 0.2458 0.6 20 AN 0.2 0.1059 0.3 0 ADN 0.1 6.860 0.3 20 ADN 0.1 0.07561 0.5 14 ADN 0.13 0.32______________________________________
To the remainder of the large (4 kilogram) batch of stripper used for Examples 39-61 water was added to achieve 0.6% water. HF and/or the same three nitriles (AN, MN or ADN) were added to ten of eleven samples of this composition to achieve the levels indicated in Table 6 for Examples 63-72. Example 62 was a similar sample without fluoride or nitrile. As indicated in Table 6, four of these compositions were made up to correspond to similar samples used in Examples 49-61.
Each of these strippers was then heated to beakers to 100� C. and held there for one-half hour to simulate use conditions. It should be noted that the original four-kilogram sample (of which these samples were a portion) had been heated to 110� C. for six hours. Failure to heat this stripper may reduce its stripping efficiency. Two-inch diameter silicon wafers coated with a phenolformaldehyde photoresist (AZ 1350J from Shipley Co., Inc.) baked at 175� C. for 40 minutes were then immersed with single-wafer holders in each beaker at 100� C. for intervals of five or so minutes. The wafers were periodically checked to determine the total stripping time. If a wafer was removed and rinsed and found not to be completely stripped, it was returned to the beaker until an approximate total stripping time was determined. Each total stripping time was confirmed by immersing a fresh coated wafer in the beaker. The results are shown in Table 6. It should be apparent that nitriles at a level of 0.2% had little or no deleterious effect upon the stripping time, but that levels of 0.5% and 1.0% had increasingly significant deleterious effects. Referring back to Table 5, it can be seen that the combination of fluoride and nitrile substantially inhibited corrosion at nitrile levels of 0.1% (Examples 55, 57 and 60) and 0.2% (Examples 56 and 58). As shown by Examples 64, 67 and 70, these low levels of nitrile did not seriously impede the stripping rate.
TABLE 6______________________________________Stripping TestComposition of 51% DDBSA, 33% BSA, 11% TXA, 5% DDBAZ 1340J Positive PhotoresistBaked at 175� C. for 40 Minutes Strip-Example Corresp. Water Fluoride pingNo. Example Weight ppm Nitrile Wt. % Time______________________________________62 49 0.6% 0 -- -- 5 min.63 54 0.6% 20 -- -- 564 56 0.6% 20 MN 0.2 565 -- 0.6% 20 MN 0.5 3066 -- 0.6% 20 MN 1.0 7567 58 0.6% 20 AN 0.2 568 -- 0.6% 20 AN 0.5 5569 -- 0.6% 20 AN 1.0 9070 -- 0.6% 20 ADN 0.2 571 -- 0.6% 20 ADN 0.5 1572 -- 0.6% 20 ADN 1.0 50______________________________________
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|Ekc Technology, Inc.
|Cleaning compositions for removing etching residue and method of using
|May 28, 1996
|Aug 29, 2000
|Ekc Technology, Inc.
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Aug 13, 1998
|Oct 31, 2000
|Ekc Technology, Inc.
|Cleaning compositions for removing etching residue and method of using
|Aug 4, 2000
|Jun 5, 2001
|Ekc Technology, Inc.
|Method of stripping resists from substrates using hydroxylamine and alkanolamine
|May 3, 1999
|Jun 19, 2001
|Ekc Technology, Inc.
|Compositions for cleaning organic and plasma etched residues for semiconductors devices
|Jun 26, 2000
|Nov 20, 2001
|Ekc Technologies, Inc.
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Nov 22, 1999
|Jun 4, 2002
|Ekc Technology, Inc.
|Alkanolamine semiconductor process residue removal process
|Jul 31, 2000
|Nov 5, 2002
|Shipley Company, L.L.C.
|Photoresist stripping method
|Jun 4, 2002
|May 20, 2003
|Ekc Technology, Inc.
|Alkanolamine semiconductor process residue removal composition and process
|Sep 20, 2002
|Dec 9, 2003
|Shipley Company, L.L.C.
|Jan 9, 2002
|Sep 13, 2005
|Air Products And Chemicals, Inc.
|Aqueous stripping and cleaning composition
|Apr 19, 2004
|May 30, 2006
|Ekc Technology, Inc.
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Jul 15, 2005
|Dec 5, 2006
|Ekc Technology, Inc.
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Jan 9, 2003
|Feb 6, 2007
|Az Electronic Materials Usa Corp.
|Cleaning agent composition for a positive or a negative photoresist
|Jul 30, 2003
|Apr 17, 2007
|Ekc Technology, Inc.
|Cleaning compositions and methods of use thereof
|Dec 5, 2006
|Jun 17, 2008
|Ekc Technology, Inc.
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Dec 21, 2005
|Nov 25, 2008
|Kesheng Feng
|Microetching composition and method of using the same
|Sep 17, 2001
|May 19, 2009
|Advanced Technology Materials, Inc.
|Post plasma ashing wafer cleaning formulation
|Oct 18, 2005
|Mar 9, 2010
|Ecolab Inc.
|Floor stripper/cleaner containing organic acid-base pair
|Aug 14, 2007
|Jan 25, 2011
|Kesheng Feng
|Microetching composition and method of using the same
|May 27, 2005
|Jul 31, 2012
|Air Products And Chemicals, Inc.
|Aqueous stripping and cleaning composition
|Sep 22, 2009
|Feb 25, 2014
|Ekc Technology, Inc.
|Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent
|Dec 22, 2016
|Aug 22, 2017
|Ube Industries, Ltd.
|Non-aqueous electrolytic solution and lithium battery
|Jan 9, 2002
|Jul 10, 2003
|Egbe Matthew I.
|Aqueous stripping and cleaning composition
|May 20, 2003
|Jan 29, 2004
|Wai Mun Lee
|Semiconductor process residue removal composition and process
|Apr 19, 2004
|Oct 7, 2004
|Lee Wai Mun
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Jan 9, 2003
|Jun 2, 2005
|Sae-Tae Oh
|Cleaning agent composition for a positive or a negative photoresist
|May 27, 2005
|Oct 6, 2005
|Egbe Matthew I
|Aqueous stripping and cleaning composition
|Jul 15, 2005
|Jan 5, 2006
|Lee Wai M
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Dec 5, 2006
|Apr 5, 2007
|Ekc Technology, Inc.
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Oct 18, 2005
|May 3, 2007
|Ecolab Inc.
|Floor stripper/cleaner containing organic acid-base pair
|Dec 21, 2005
|Jun 21, 2007
|Kesheng Feng
|Microetching composition and method of using the same
|Apr 9, 2007
|Sep 6, 2007
|Ekc Technology, Inc.
|Cleaning compositions and methods of use thereof
|Apr 13, 2007
|Jan 3, 2008
|Ekc Technology, Inc.
|Semiconductor process residue removal composition and process
|Aug 14, 2007
|Feb 21, 2008
|Kesheng Feng
|Microetching composition and method of using the same
|Apr 25, 2006
|Sep 4, 2008
|William Wojtczak
|Selective Wet Etchings Of Oxides
|Jun 17, 2008
|Jan 8, 2009
|Ekc Technology, Inc.
|Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
|Sep 22, 2009
|Nov 4, 2010
|Wai Mun Lee
|Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent
|Oct 7, 2010
|Jun 23, 2011
|Mr. WAI MUN LEE
|Photoresist stripping solutions
|Mar 27, 2015
|Oct 14, 2015
|Cleaning Industrial Plant Components To Remove Metal Halides
|Jan 6, 2003
|Feb 9, 2011
|Air Products and Chemicals, Inc.
|Aqueous stripping and cleaning compositon
|Mar 31, 2015
|Oct 14, 2015
|Wacker Chemie AG
|Cleaning industrial plant components to remove metal halides
|Jul 3, 1997
|Jan 8, 1998
|Advanced Chemical Systems International, Inc.
|Improved post plasma ashing wafer cleaning formulation
|Jan 6, 2003
|Jul 24, 2003
|Air Products And Chemicals, Inc.
|Aqueous stripping and cleaning composition
|U.S. Classification
|510/176, 510/499, 510/255, 510/108, 134/41, 134/42, 510/414, 510/412, 510/202, 134/3, 134/38
|International Classification
|Cooperative Classification
|European Classification
|Apr 25, 1988
Owner name: HMC PATENTS HOLDING CO., INC., LIBERTY LANE, HAMPT
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:ALLIED CORPORATION, A NY CORP.;REEL/FRAME:004863/0807
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Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:ALLIED CORPORATION, A NY CORP.;REEL/FRAME:004863/0807
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Owner name: HMC PATENTS HOLDING CO., INC.
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:HENLEY GROUP, INC.;GENERAL CHEMICAL CORPORATION;REEL/FRAME:004976/0449
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Free format text: SECURITY AGREEMENT;ASSIGNORS:GENTEK INC. (DE CORPORATION);BALCRANK PRODUCTS, INC. (DE CORPORATION);BIG T-2 COMPANY LLC;AND OTHERS;REEL/FRAME:012506/0461
Effective date: 20011030

subset: commoncrawl


text:
Two Muslim Men Arrested For Sharing Offensive Photos Of Goddess Kali On Facebook
28/05/2016 5:21 PM IST | Updated 15/07/2016 8:27 AM IST
Prajakta Hebbar News Producer, HuffPost India
Two men were arrested by Mumbai police this week for allegedly sharing offensively photoshopped pictures of the Hindu goddess Kali on Facebook.
According to a report in The Indian Express, the two Muslim men from Madhya Pradesh, were traced down in Mumbai following a complaint by religious fringe organisations in Bhopal. Reportedly, the organisation had warned of a "backlash" if the people behind the offensive post on Facebook page called 'Naadan Parinday' were not arrested.
The duo has been remanded to judicial custody after the Mumbai police sent them to Madhya Pradesh. The police told IE that one of them had created the image, while the other had circulated it.
One of the two arrested, Ali Shaikh works a bodyguard and the other, Abdul Qureshi runs an electronics shop.
The men have now been booked under Section 295 (A) (deliberate and malicious intention of insulting a religion or religious beliefs) and Section 153 (A) (promoting disharmony between different groups on grounds of religion and performing acts prejudicial to maintenance of peace).
Superintendent of Police (north) Bhopal, Arvind Saxena said before the "volatile" issue could flare up, it was handled swiftly as it "could have caused tension ahead of Ramzan".
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French, German and Hungarian police on Tuesday arrested 58 people suspected of smuggling Vietnamese migrants to Britain following a probe triggered by a recent surge in trafficking.
French Immigration Minister Eric Besson said Vietnamese migrants were smuggled into France from Hungary, the Czech Republic and Germany and hidden in special compartments in trucks and ferries en route to Britain.
In all, 34 people were arrested in France, 19 in Hungary and five in Germany as part of the joint operation coordinated by Europol, the European police organisation.
Besson said the network was "very well-structured" with many international contacts and whose members had well-defined tasks such as providing shelter or handling finances.
A special task force dealing with Vietnamese people smuggling was created 18 months ago after French authorities noticed a hike in arrests of migrants en route to Britain.
Besson has vowed to crack down on migrants who travel to northern France in the hopes of crossing the Channel illegally into Britain.
Last year, he shut a makeshift camp in Calais known as "the jungle" where hundreds of migrants, mostly from Afghanistan, were living, hoping to sneak on board trains through the Channel tunnel or in trucks that board ferries.
France has dismantled 92 migrant smuggling rings between January and May and Besson has set a target of crushing 200 networks by the end of the year.


text:
We are doing science for policy
The Joint Research Centre (JRC) is the European Commission's science and knowledge service which employs scientists to carry out research in order to provide independent scientific advice and support to EU policy.
Biodiesel is obtained by transferring vegetable oils or animal fats into alkyl esters of their fatty acids. However, the amount of free glycerol as a by-product of the biodiesel production, together with remaining amounts of unreacted triacylglycerides and partially reacted mono- and diacylglycerides, play an important role for the fuel quality. These compounds should be absent in the ideal case.
Read more in: L.R. Miguel et al., On-line hydrogenation of biodiesel – toward a reference method for the determination of glycerides and total glycerol, J. Chromatogr. A, doi: 10.1016/j.chroma.2014.02.040 (2014)


text:
... 112meg/l and exp
Hyponatremia - which interventions would be the most optimun for a patient with a serum sodium of?
- Asked
- 25 Nov 2013 by rsanchez
- Active
- 10 Apr 2014
- Topics
- hyponatremia
Responses (2)
Hyponatremia is a condition in which the amount of sodium (salt) in the blood is lower than normal.
This from https://www.drugs.com/enc/hyponatremia.html
"Treatment of Hyponatremia
The cause of hyponatremia must be diagnosed and treated. If cancer is the cause of the condition, radiation, chemotherapy, or surgery to remove the tumor may correct the sodium imbalance.
Other treatments depend on the specific type of hyponatremia.
Treatments may include:
Fluids through a vein (IV)
Medication to relieve symptoms
Water restriction"
A sodium level of 112 is very low and should definitely be actively normalised.
The assumption is that the hyponatraemia was chronic in nature (ie did not develop within 48 h). Fluid restriction is regarded as the mainstay of treating SIADH but it is very slow and unsuitable for some (free water clearance should be calculated to assess feasibility). I would argue that vaptans are the optimum therapy to normalise serum sodium as they are faster and well tolerated (many patients find it difficult to fluid restrict as SIADH can increase thirst). Monitoring should be carrier out to avoid overly rapid correction as per the SPC recommendations.
Please see the guidelines by Verbalis et al in the American Journal of Medicine for more information.
Disclaimer: I am not a doctor. I have experience of data in SIADH through my work as a scientific writer
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text:
WaMA's Annual Conference in Moses Lake!
June 21-23, 2017 "Oasis"
"As you walk through the desert of life, may you always find your oasis…"
Login to take advantage of WaMA Member Pricing
For visitors museums serve as an oasis full of precious items and inspiring stories. They can transport visitors to places far from the everyday world.
But for museum professionals, that place of respite can sometimes be a mirage. Hectic deadlines, limited funds, long hours, and public indifference can lead museum workers to search for well-traveled paths through the desert. Thankfully there are sources of support; like desert blooms, museum professionals are finding ways to tap deep into those sources to restore beauty.
Just as water runs beneath the surface of an arid desert, your WaMA colleagues offer wellsprings to create your personal oasis. Rediscover your personal haven and share it with others at the 2017 WaMA Annual Meeting in Moses Lake, WA.
This year's Annual Meeting offers your chance to explore the Columbia Basin's land of contrasts. Where water has nourished the state's largest agricultural center, it has also nourished the unexpected. From aerospace to data farms, the Columbia Basin never ceases to surprise. The Moses Lake Museum & Art Center, the site of our Annual Meeting, sits at the heart of Eastern Washington's massive reclamation project, channeling life-giving water to the arid landscape. Originally founded as the Adam East Museum in 1958, the museum has since flourished to provide cultural services for the whole greater Columbia Basin.
When you arrive at the conference you'll find yourself at the center of a professional oasis, surrounded by peers who have faced similar challenges. Engage with others who are bridging barriers between communities, sharing digital collections, and working with unconventional partners. (Take a break in the massage chair if it all becomes too much!)
Reinvigorate yourself with a visit from Museum Hack, a band of renegade museum tour guides. Their VIP Guide will discuss how to approach the challenges of engaging new audiences in a shifting cultural climate. Pre-register for one of Museum Hack's engaging workshops to develop the confidence and skills to tell fascinating stories about your institution from a place of personal connection and passion.
Join WaMA in Moses Lake this summer and leave refreshed and ready to take on the museum world!


text:
Friday 20th October to Sunday 22nd October 2017
Toorak Hotel, Torquay, Devon
Celebrating Dance is an exciting annual festival held in Torquay, Devon each Autumn.
It is the ONLY festival in the UK that is held in a 3 Star hotel,
a luxury belly dance weekend at a price you can afford!
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Afra Al Kahira & John F Hancock
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CHICOLETE CREEK. Chicolete Creek rises near Stratton six miles southeast of Edgar in southeastern DeWitt County (at 29°09' N, 97°10' W) and runs eighteen miles southeast across the southwestern corner of Lavaca County to its mouth on the Lavaca River, south of Horseshoe Lake in northwestern Jackson County (at 29°05' N, 96°49' W). A major tributary, South Chicolete Creek, rises two miles south of the creek near Berry Pond in southeastern DeWitt County and flows ten miles to its confluence with Chicolete Creek (at 29°05' N, 97°02' W). The creeks cross flat terrain with local shallow depressions surfaced by clay and sandy loam that supports water-tolerant hardwoods, conifers, and grasses.
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All copyrighted materials included within the Handbook of Texas Online are in accordance with Title 17 U.S.C. Section 107 related to Copyright and "Fair Use" for Non-Profit educational institutions, which permits the Texas State Historical Association (TSHA), to utilize copyrighted materials to further scholarship, education, and inform the public. The TSHA makes every effort to conform to the principles of fair use and to comply with copyright law.
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Uploaded on June 12, 2010. Published by the Texas State Historical Association.


text:
With InvokerTransformer serializable collections can be build that execute arbitrary Java code. sun.reflect.annotation.AnnotationInvocationHandler#readObject invokes #entrySet and #get on a deserialized collection. If you have an endpoint that accepts serialized Java objects (JMX, RMI, remote EJB, ...) you can combine the two to create arbitrary remote code execution vulnerability.
I don't know of a good fix short of removing InvokerTransformer or making it not Serializable. Both probably break existing applications.
This is not my research, but has been discovered by other people.
Issue Links
- is depended upon by
VELTOOLS-169 Upgrade commons-collections compile dependency to v3.2.2 or v4.1
- Open
- is duplicated by
COLLECTIONS-583 JAVA serialization vulnerability "CVE-2015-4852" in commons-collections*.jar
- Resolved
- is related to
HADOOP-12579 Deprecate WriteableRPCEngine
- Resolved
MYFACES-4020 Update commons-collections to 3.2.2
- Closed
- relates to
IO-487 ValidatingObjectInputStream contribution - restrict which classes can be deserialized
- Closed
KARAF-4135 Upgrade commons-collections to version 3.2.2
- Resolved
- All
- Comments
- Work Log
- History
- Activity
- Transitions
THIS IS NOT A HELP FORUM! If you have questions, go ask on the user's list!
(Note, this was a reply to a comment that has been deleted afterwards by its original author).
The collections 2.x branch is not affected.
@all the issue tracker is no discussion forum, please use the user/dev mailinglist for questions. Furthermore this issue is closed, I will not answer anything here anymore.
Thomas Neidhart Is commons-collections 2.x library affected by this vulnerability ?. I can see there is no functions package inside the 2.x jar.
All 3.X releases and the 4.0 release are affected.
For the 3.X branch we have released 3.2.2 to which all users of the 3.X branch are encouraged to upgrade.
For the 4.X branch we have released 4.1 (same as above applies).
Thomas Neidhart Is this issue also present in Apache Commons Collection v3.1? I see that the affected versions listed on the details as 3.0, 4.0.
"No reflection is used anymore" sounds like a really good thing. Might I ask when you expect a release of collecions4 to be out? Thanks!
In the collections4 branch, the MultiValuedMap implementations do not use the InstantiateFactory anymore.
Committed in r1715302. This required a huge refactoring effort, but should definitely be safer as no reflection is used anymore.
This reminds me of the the general "SerialDoS" code, published here: https://gist.github.com/coekie/a27cc406fc9f3dc7a70d
I am not THAT Java expert, so I just assume, that any application that allows deserialization from untrusted input, can be DoS'ed - regardless what libraries are included in the classpath.
Just creation of code execution needs more investigation and creativity and the need to find suitable gadgets...
Hmm I feared that it would be too easy to create other, similar exploits with still serializable classes.
btw. for the same DOS attack, the guava lib might be exploitable as well. The lib also provides predicates and functions that can be chained in a way or another and are serializable.
I used commons-collections-3.2.2.
ForClosure and WhileClosure can not deserialize.
But, ChainedTransformer can deserialize.
A DoS attack similar to an infinite loop becomes possible by the following way.
HashMap<Integer, Integer> map = new HashMap<Integer, Integer>(); for (int i = Integer.MIN_VALUE + 1; i <= Integer.MIN_VALUE + 10; i++) { map.put(i, i); } Transformer constantTransformer = ConstantTransformer.getInstance(map); Transformer stringValueTransformer = StringValueTransformer.getInstance(); Transformer transformerChain = ChainedTransformer.getInstance(constantTransformer, stringValueTransformer); for (int i = 0; i < 10; i++) { Transformer[] transformers = new Transformer[10]; Arrays.fill(transformers, transformerChain); transformerChain = ChainedTransformer.getInstance(transformers); }
This serialized file size is less than 2KB.
But it takes 6~7 hours for deserialize. (Core i5 CPU)
I think the similar way is also possible in ChainedClosure, AllPredicate, AnyPredicate.
When other class of org.apache.commons.collections.functors package was used,
it was possible to make OutOfMemoryError occur.
I think all classes of org.apache.commons.collections.functors package should call FunctorUtils#checkUnsafeSerialization.
According to CVE assignment team [1] no CVE ID will be allocated for this issue and:
"The CVE-2015-4852 ID came from Oracle and must remain associated only with Oracle's own software (WebLogic Server is the product they've named)."
but then Oracle's Thomas Keefe reply [1] to that thread stated:
"We do not have a problem with this use of the CVE# we registered (CVE-2015-4852)."
[1] http://www.openwall.com/lists/oss-security/2015/11/17/19
[2] http://www.openwall.com/lists/oss-security/2015/11/18/1
+1 (thanks for the fix!)
Regarding CVE number: Mitre did not (yet?) assign one, and there has been a controversial discussion in the OSS Security list around it, see: http://seclists.org/oss-sec/2015/q4/280
CVE-2015-4852 was assigned by Oracle and is started to be used by other vendors, whose products are impacted by the issue.
Let me also extend my thanks for the fix. Question: is there an assigned CVE number for this? I couldn't find one after a quick search.
collections 3.2.2 has been released yesterday.
A new release for collections4 will be done this week hopefully.
Would be interested to know an estimated data on the availability the commons collections with the fix.
Advance Thanks,
Ravi Chamarthy
In collections4 there is also an inner factory class in MultiValueMap that is serializable. This can be solved with a readObject method that checks whether the de-serialized class extends Collection.
The new MultiValuedMap in collections4 uses internally an InstantiateFactory which is serialized. Need to find a better solution for this before we can resolve the issue.
Committed in r1714262 for collections4: unsafe classes do not implement the Serializable interface anymore.
Not sure I fully understand. The critical piece of code is always executed on a fully deserialized object. So the approach should work (or I apologize for not having understood the subject matter).
I did not question your approach, I wanted to point out that in the attack vector, i.e. InvokerTransformer#transform will already be called during de-serialization (of another object).
However, awareness is required on how people have to deal with this finding. The lib is very wide-spread. Thus a minimum behavior change in the software stack is preferred.
We are trying to do this, but the rationale is as follows: if an application uses the unsafe classes in a legit way, i.e. will de-serialize them from a trusted source, the application will most likely also use these objects in a way or another. It means that the application will fail in any way, but it will be easier to spot/fix if it happens already during the de-serialization, but please correct me if you have a use-case where your approach would be more suitable.
For newer versions (major/minor) I would agree to your fail-fast approach. Here I would also suggest to remove the complete Serialization feature.
This is indeed the plan, for the 4.1 release we will hopefully remove the Serializable interface from the unsafe classes.
Not sure I fully understand. The critical piece of code is always executed on a fully deserialized object. So the approach should work (or I apologize for not having understood the subject matter).
However, awareness is required on how people have to deal with this finding. The lib is very wide-spread. Thus a minimum behavior change in the software stack is preferred.
For newer versions (major/minor) I would agree to your fail-fast approach. Here I would also suggest to remove the complete Serialization feature.
I prefer a fail-fast approach.
btw. a successful attack will call the transform as part of the call to readObject, thus it will fail during de-serialization.
We (not having seen the attached patch before) have come up with the following solution:
/** * Transforms the input to result by invoking a method on the input. * * @param input the input object to transform * @return the transformed result, null if null input */ public Object transform(Object input) { if (input == null) { return null; } if (deserialized) { throw new IllegalStateException("Transformation on deserialized object not supported. " + "Using this function may indicate an attempted SECURITY BREACH."); } try { Class cls = input.getClass(); Method method = cls.getMethod(iMethodName, iParamTypes); return method.invoke(input, iArgs); } catch (NoSuchMethodException ex) { throw new FunctorException("InvokerTransformer: The method '" + iMethodName + "' on '" + input.getClass() + "' does not exist"); } catch (IllegalAccessException ex) { throw new FunctorException("InvokerTransformer: The method '" + iMethodName + "' on '" + input.getClass() + "' cannot be accessed"); } catch (InvocationTargetException ex) { throw new FunctorException("InvokerTransformer: The method '" + iMethodName + "' on '" + input.getClass() + "' threw an exception", ex); } } private transient boolean deserialized = false; private void readObject(ObjectInputStream in) throws IOException, ClassNotFoundException { in.defaultReadObject(); deserialized = true; }
This approach is a little more 'compatible' and less invasive. It will only fail if transform is invoked on a deserialized object. In particular it does not fail at deserialization time. Only when the transform method is invoked. This may reduce the effects of the change.
There are also other vulnerable classes that allow an attacker to create a quite simple DOS attack.
A gadget like that will result in an infinite loop:
final Transformer[] transformers = new Transformer[] { new ConstantTransformer(Runtime.class), new ClosureTransformer( new WhileClosure(TruePredicate.INSTANCE, new TransformerClosure(CloneTransformer.INSTANCE), false)),
I think that whatever is done with InvokerTransformer should also be done with InstantiationTransformer (and the various related Factories and Closures and such). There are classes that do unsafe things in their constructors. For that matter, there may be classes that do unsafe things in their toStrings.
FWIW the Jenkins project has been assuming that the whole org.apache.commons.collections.functors package is vulnerable and should be blocked from deserialization.
Indeed, I was thinking about that as well. The point is that within the same application it does not make sense to allow serialization when de-serialization will certainly fail.
This will allow people to spot regressions earlier when using the updated jar with serialization disabled.
Furthermore, as mentioned by Chris Frohoff on the mailinglist, the following classes might be unsecure as well:
- InstantiateFactory
- InstantiateTransformer
- PrototypeFactory
I think PrototypeFactory is safe: it calls clone on an object that has been de-serialized already, but for the other 2 I am not sure. Basically they allow an attacker to call an arbitrary public constructor of any class in the application's classpath. There might be a possible attack vector for it, although none is known atm.
If we add the same fix there as well, I would also suggest to change the property to enable the serialization to that: "org.apache.commons.collections.enableUnsafeSerialization"
We are introducing an incompatible change. The more people know about it, the better.
Serialization isn't an issue, I don't see the point of changing that.
Alothough deserialization is the actual problem, I do thing that we should handle serialization, and deserialization in the same manner. I am attaching a suggested patch.
I don't doubt you've done the things properly Thomas and I'm glad you're there to do that. My point is that from a user perspective, an update that just contains a security fix is likely to be a no-brainer, but a security update combined with other changes may trigger a full QA cycle in some development teams.
This should please be discussed on the mailinglist.
I hand-picked the bugfixes that have been backported from the 4.0 release and they only include things that are clearly wrong, and anybody using this functionality must have a broken application.
I think we should release the fix for
COLLECTIONS-580 alone with no other modification. Otherwise people may hesitate to upgrade in fear of a regression. The other changes can be released later.
We will at least make also a release for the 4.x branch.
The problematic class was introduced in 3.0, so in theory we could also make a 3.0.1 and 3.1.1 bugfix release, but as Joerg pointed out users should be able to upgrade to 3.2.2.
Could you point out cases where this might not be possible?
Hi Paul,
we do not re-release, Thomas intends to release new version 3.2.2 only (with some additional cheep bug fixes). I don't know if we gain a lot if we also make releases for older code lines (e.g. release new 3.1.1, 3.0.1, 2.1.2 , 2.0.1 and/or 1.0.1) with this cherry-pick only. The line is supposed to be binary compatible anyway. If someone does not want to upgrade to 3.2.2, why should he consider to upgrade to one of the other "new" releases?
Re "r1713307 for the 3.2.X branch" ... can the same change be cherry-picked back other major/minor branches and those re-released to 'central' too please?
Proposed fix committed in r1713307 for the 3.2.X branch, see here: http://svn.apache.org/viewvc?view=revision&revision=1713307
This sounds great Thomas Neidhart, thank you!
We are currently working on a new release to address the issue.
As a solution, we prefer to introduce a new system property that controls whether the InvokerTransformer can be serialized or not. The default would be false, thus using the new version of the library will mean that any attempt to de-serialize an InvokerTransformer will result in an exception.
This vulnerability puts the whole library at risk of being vetoed in places where security is tight. If InvokerTransformer has to be kept, can it be moved to a different artifacts? Or could we have a build that doesn't contain it (like with a "secure" qualifier).


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Warning: Parameter 3 to mb_videobot() expected to be a reference, value given in /home/roseemma/public_html/libraries/joomla/event/dispatcher.php on line 136
Celebrity Supporters
As BT Buddies grows, so too does the support from some fantastic celebrities who get involved in a number of ways, including taking part in fundraising events and supporting our awareness campaigns.
Wayne and kathy Osmond
Wayne was diagnosed with an Ependymoma in 1994 and continues to do well today. He is currently on The Osmond's 50th Anniversary tour but Wayne and his wife, Kathy, were keen to help with our 'Behind the Mask' project and we are very grateful to them for squeezing this into their very busy schedules!
The mask is currently at BT Buddies HQ and will go on display in Liverpool from the 17th to 28th May 2010. Kathy, Wayne's wife, said "Wayne and I decorated the mask with some of the items that helped Wayne through the whole process of brain cancer, surgery and radiation."
BT Buddies would like to thank Wayne and Kathy for supporting our exhibition and helping us to raise awareness of brain tumours.
Gerry Marsden
Gerry, of Gerry and The Pacemaker's, kindly agreed to decorate a mask for our Behind the Mask exhibition early in 2010. We are very grateful to Gerry for agreeing to be a part of this project and for showing his support to BT Buddies.


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Polaris Vac-Sweep 380 Pool Cleaner
Powered by triple jets and a separate booster pump, the Polaris 380 is one of our most powerful, durable cleaners and is suitable for all in-ground pools. Easily connecting to a dedicated pressure line, the 380 sweeps, scrubs, and vacuums the bottom, walls, and steps of the pool trapping debris in its own filter bag. Also available in a BlackMax for dark bottom pools.
The Polaris Vac-Sweep 380 is designed for all in-ground pools and runs off a booster pump.
Vac-Sweep 380 Features:
- Three jets provide greater vacuum power and faster cleaning (3 hours or less)
- Sweeps and scrubs the bottom and walls of any size or shape pool
- Runs off a separate booster pump, working independently from the rest of your pool system
- Unique filter bag removes debris before it reaches your pump basket or filter, prolonging the life of your filtration system
- Works in all in-ground pools
- Requires booster pump
- Includes 31 feet of feed hose


text:
From catching a cold to landing on your feet, idiomatic expressions add color and style to the English language. The latest edition of Essential Idioms in English remains the resource of choice for mastering more than 500 common English idioms, phrasal verbs, and collocations.
Organized by level for beginning, intermediate, and advanced learners, Essential Idioms in English thoroughly defines and illustrates each idiom, then reinforces its meaning and usage with multiple-choice, true-false, fill-in-the-blank, and matching exercises.
New features include:


text:
Business / Finance / Index Fund: An investment/trading strategy that exploits divergences between actual and theoretical futures prices. An example is the simultaneous buying (selling) of stock index futures (i.e., S&P 500) while selling (buying) the underlying stocks of that index, capturing as profit the temporarily inflated basis between these two baskets. Often, the point at which profitability exists is expressed at the block call as the number of points the future must be over or under the underlying basket for an arbitrage opportunity to exist. See: Program trading.
Fund Adjective Synonyms: supply, stock, reserve, store, pool, cache, reservoir, repository, mine
Fund Noun Synonyms: finance, back, capitalize, stake, support, pay for, endow, grant, subsidize
Index Noun Synonyms: guide, directory, list, listing, table of contents, catalogue, key, thesaurus
Index Adjective Synonyms: mark, sign, clue, token, hint, pointer, indicator, indication, guide
Business / Taxes / Tax-Efficient Funds: When a mutual fund minimizes the income earnings and capital gains it distributes to its shareholders, it may be described as a tax-efficient fund. In general, the smaller a fund's turnover, or the le MORE
Business / Taxes / Enhanced Index Fund: An enhanced index fund chooses selectively among the stocks in a particular index in order to produce a slightly higher return. By contrast, an index fund strives to mirror the performance of a partic MORE
Business / Taxes / Actively Managed Fund: Managers of actively managed mutual funds buy and sell investments to achieve a particular goal, such as providing a certain level of return or beating a relevant benchmark. As a result, they generall MORE


text:
Terrestrial Trailer (2015)
02 October 2015 11 mins
"The observations of an object in motion: A mobile device captures the trajectories of objects liberated from and bound to earth, against a backdrop of uniquely human dissonance. Terrestrial is in part an attempt to articulate a desire to transcend bodily limits with things like mobile devices and machines etc. while acknowledging an unavoidable level of dysfunction.The film was inspired by an incident in 2014 where a Blue Line train in Chicago failed to stop at its final destination, the O'Hare airport, and eventually came to a stop halfway up the escalator at the airport's entrance. Terrestrial reimagines this crash as an earthbound machine's failed takeoff."—Calum Michel Walter
Watch the official Terrestrial 2015 trailer in HD below or find more Terrestrial videos on Vidimovie.


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Angel TreeAngel Tree 2013Topic: Invest in the Life of a Child of a PrisonerWebsite | Part 1 | Part 2 | Part 3
Jeff BercawLicensed Family Counselor, Spanish River Counseling CenterTopic: Coping with Unexpected TragedySpanish River Counseling Center at (561) 241-9014Contact Jeff Bercaw: (561) 313-1555Website
Pastor Jeremy McKeenLead Pastor, Truth Point Church, West Palm Beach, FloridaTopic: Was God at Sandy Hook Elementary School last Friday?Website | Part 1 | Part 2
Charles DyerProfessor-at-Large of Bible, Moody Bible Institute and Radio Host of The Land and the BookTopic: A Fresh Look at ChristmasWebsite | Listen
Ace CollinsAuthorTopic: 25 Days, 26 Ways to Make This Your Best Christmas EverBook Website | Part 1 | Part 2 | Part 3
Eric Johnson, Audrey Altman and Brigitte Sylvestre
Eric Johnson, Co-Host. He is from Ohio and received his B.A. from Cedarville University. He has been doing morning radio, caffeine free, for almost 20 years. Eric and his wife, Simone, have seven wonderful children who love to listen to Adventures in Odyssey. He enjoys playing catch with his boys, listening to music and cooking dinner for the family.
Audrey Altman, Co-Host. She is originally from Bloomfield, N.J. and attended Northeastern Bible College. She began her career at Moody Radio in 1989. Audrey and her husband, Dick live in the West Palm Beach area. She loves card making and rubber stamping, antique collecting and cooking.Brigitte Sylvestre, News Anchor.
She is a graduate of Palm Beach Atlantic University, and in 2015, she completed the Colson Center Fellows Program, a year-long discipleship training in Christian worldview in action. She enjoys volunteering her time with
Women in the Window International and serving on short-term mission trips, mostly with her husband, Gibson.
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Moody Radio produces and delivers compelling programming filled with solid biblical insight and creative expressions of faith that helps you take the next step in your relationship with Christ. We desire to be the place where you turn—for truth, direction and hope. Through the power of the Word, you will hear and experience more of the life God intends for you in every moment, in every situation.
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text:
The World Trade Organization warned Wednesday that protectionism may be gaining ground in parts of the world amid current economic difficulties and urged world leaders to curb the trend.
"There is a growing perception that trade protectionism is gaining ground in some parts of the world as a political reaction to current local economic difficulties," the WTO said.
There are "signs of a revival in the use of industrial policies to promote national champions and of import substitution measures to back up that policy," it noted.
In addition, more new export restrictions -- targetted mainly at minerals and food products -- were imposed during May to mid-October than in the past, it added.
"Although the majority of these actions were justified on the grounds of national responses to rising food prices, to secure domestic supply, or to address resource depletion, they nevertheless go against the G20 standstill pledge in this respect, and have the potential to seriously affect trading partners," it added.
The WTO also raised the risk that governments may be "tempted to use export restrictions" to obtain an advantage in export pricing or to expand production of their domestic industries.
"The situation is not yet alarming, but it is clearly adding to the downside risks to the global economy," it said.
It called on G20 leaders meeting in Cannes in November to "prevent any further deterioration in their collective trade policy stance" by keeping trade open.


text:
|Publication number
|Publication type
|Application number
|Publication date
|Nov 27, 2001
|Filing date
|Mar 30, 1999
|Priority date
|Mar 30, 1999
|Fee status
|Publication number
|Daniel J. Lenehan, Ram Bhuma
|Original Assignee
|Intel Corporation
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (9), Non-Patent Citations (8), Referenced by (11), Classifications (5), Legal Events (4)
|External Links: USPTO, USPTO Assignment, Espacenet
The invention relates to docking computers, and more specifically, to a cable interconnection between a computer and a docking station.
To decrease the weight and power requirements of portable computers, resources that are used infrequently or have relatively large power requirements are often not included in the portable computer case. These resources remain in a docking station that is typically left at a user's desk or other location where they may be used. For example, network interface circuitry is not used when a portable computer is used away from a home or office, so network interface circuitry is not required for a portable computer to be functional; however network interface circuitry is often used when the portable computer is used in a home or office environment.
Other devices, such as CD drives, may be used so infrequently when operating under battery power that the user prefers a lighter portable computer without the device may also be left out of the portable computer. Resources that are not included in the portable computer case, but which are utilized by the computer user, may be housed in a docking station that is designed to be connected to the portable computer when portability is not necessary.
Typical docking stations include a mechanical attachment device. The portable computer is actually attached into the docking station and must be detached by the docking station before the portable computer is portable. This often results in docking stations that are custom designed to fit with the case of a particular portable computer. A new docking station must be designed each time a computer manufacturer changes the case of its portable computers, which increases the cost of docking stations and slows the progress of portable computers.
Another concern with respect to docking stations is that the docking station may limit the effectiveness of the cooling elements employed by the portable computer. For example, cooling vents are typically located at the back of the portable computer and when the portable computer is attached into the docking station, the docking station often limits the flow of air to the cooling vents, which reduces the effectiveness of the cooling elements. This may restrict the circuitry, particularly the choice of processors, available for use in the portable computer.
Furthermore, typical docking stations consume desk space, which may be limited to the point of requiring that a user use a small portable computer at his or her desk. Because a docking station may take as much or more desk space as a desktop computer system, a docking station may not be feasible for some portable computer users, whereas a docking station that may be placed beneath or beside a desk may be more attractive to these users. Therefore, it would be desirable to provide an improved docking solution.
A portable computer docking solution including a docking cable is described. In one embodiment, the docking cable has a first end coupled to a docking station having devices to be used by a portable computer system and a second end to couple to a portable computer system. The docking cable has a plurality of lines to communicate low voltage differential signals between the portable computer system and the docking station. The docking cable also includes a locking mechanism controllable by software executing on the portable computer system. The locking mechanism selectively locks the portable computer system to the docking cable.
In an alternative embodiment, a network access device has a network interface to access the network, an output interface to provide output signals to a display device, and a port to receive a docking cable. The docking cable has a plurality of lines to communicate low voltage differential signals between the network access device and an external device. The docking cable further includes a locking mechanism controllable by software executing on the network access device. The locking mechanism selectively locks the network access device to the external device.
The invention is illustrated by way of example, and not by way of limitation, in the figures of the accompanying drawings and in which like reference numerals refer to similar elements and in which:
FIG. 1 is one embodiment of a block diagram of an apparatus for docking a portable computer with a docking station according to the present invention.
FIG. 2 is one embodiment of a low-voltage differential signal (LVDS) interface according to the present invention.
FIG. 3 is a hysteresis diagram for one embodiment of receivers according to the present invention.
FIG. 4 is one embodiment of an upgradable Internet appliance with an upgrade connected via a cable according to the present invention.
A computer-docking station interface is described. In the following description, for the purposes of explanation, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the invention may be practiced without these specific details. In other instances, well-known structures and devices are shown in block diagram form in order to avoid obscuring the present invention.
Reference in the specification to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the invention. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment.
Generally, the computer docking station interface comprises a cable that couples a portable computer with a docking station that provides access to resources for use with the portable computer. In the invention, the cable is capable of transmitting data at a high bandwidth over multiplexed lines, such that the pin count of the cable is reduced from that of a non-multiplexed cable. The cable also comprises a locking mechanism controlled by software that prevents the cable from being removed prior to the time when the software prepares the portable computer for separation from the docking station.
FIG. 1 is one embodiment a block diagram of an apparatus for docking a portable computer with a docking station according to the present invention. Generally, portable computer 100 is coupled to docking station 150 via cable 120. Cable 120 also includes lock 130 that locks cable 120 to portable computer 100.
Portable computer 100 may be any portable (e.g., notebook, laptop) computer that a user may wish to couple to a docking station. Portable computer 100 has an interface compatible with cable 120. According to one embodiment, portable computer 100 and cable 120 have a 30 pin connection interface; however, other configurations may also be used. By having a standard interface which is common to many computers, cable 120 may be used to couple many different computers to docking station 150. Thus, a new docking station is not required for each portable computer case, as is typically required in the prior art.
Docking station 150 may provide access to any number of devices to which portable computer 100 may be attached. For example, docking station 150 may contain containing a floppy disk drive, a hard disk drive and/or a CD-ROM drive. Other devices may also be used included in docking station 150. According to one embodiment, cable 120 is permanently attached to docking station 150; however, cable 120 may be coupled using a 30-pin connection or other interface.
Cable 120 is a high bandwidth multiplexed cable that allows the number of pins to be reduced compared to a non-multiplexed cable. According to one embodiment, the cable is designed according to the Low Voltage Differential Signaling (LVDS) technology as described in IEEE standard 1596.3-1996 "LVDS for Scalable Coherent Interface (SCI)" Published Jul. 31, 1996. According to one LVDS embodiment, a 30-pin connection PCI standard bus and sideband signals are propagated over a cable that may be up to 25 feet long. However, other multiplexed transmission schemes may also be used.
Lock 130 locks cable 120 to portable computer 100 when cable 120 is coupled to portable computer 100. In one embodiment, lock 130 is controlled by the operating system running on portable computer 100. The operating system engages lock 130 until the user executes a program through the operating system that prepares portable computer 100 for undocking. To prepare for undocking, the operating system, for example, saves files and settings as necessary and communicates to devices and networks that portable computer 100 is to be removed from its connection. Other software control can also be provided for lock 130.
In one embodiment, the operating system controls an electromechanical locking device that prevents portable computer system 100 from being detached from cable 120. For example, the operating system can prepare computer system 100 for undocking (e.g., by saving files accessed on remote storage devices) prior to releasing computer system 100 form cable 120. In an alternative embodiment, computer system 100 is not physically locked to cable 120, but the operating system informs the user when computer system 100 can be undocked safely.
In one embodiment, lock 130 is for compliance with docking requirements of the operating system running on the portable computer. For example, operating systems available from Microsoft Corp. specify certain requirements of the docking connection in order to guarantee file integrity. Thus, lock 130 operates in conjunction with the operating system of the portable computer to prevent undocking prior to the time when the operating system has prepared portable computer 100 and necessary files for decoupling from the docking station.
FIG. 2 is one embodiment of a LVDS interface. The LVDS interface comprises a series of differential signal lines. Thus, both portable computer 100 and docking station 150 include both drivers and receivers. For simplicity, lock 130 is not shown in FIG. 2.
Low voltage differential signal embodiments provide several advantages over single-ended transmission schemes. For example, low voltage swings (<400 mV in one embodiment) provide for very high-speed switching and low power dissipation. Differential signals reduce the area between the signal and return paths and cancel electromagnetic fields through use of equal and opposite current flow. Further, differential signals are relatively immune to external noise and produce little noise to interfere with other signals.
The embodiment of FIG. 2 provides a plurality of LVDS drivers and receivers, whereby data is communicated in a source-synchronous manner. The embodiment is unidirectional because the driver is always at one end of the link and the receiver is always at the other end of the link. The drivers are differential because each driver provides two outputs that are equal in magnitude and opposite in sign. The interface is sourcesynchronous because a clock or other timing signal is sent along with the data to be communicated as if it were another data bit.
Referring to FIG. 2, Portable computer 100 includes a plurality of drivers (e.g., 200) and receivers (e.g., 260). Similarly, docking station 150 also contains a plurality of drivers (e.g., 250) and receivers (e.g., 210). When docked via cable 120, the drivers of portable computer 100 are coupled corresponding receivers in docking station 150 and the drivers of docking station 150 are coupled to corresponding receivers in portable computer 100. Corresponding drivers and receivers are coupled by a pair of lines included in cable 120, such as lines 202 and 204 that couple driver 200 to receiver 210. In order to prevent noise reflected by a driver from becoming a differential signal, the output impedance of the inverting outputs and the non-inverting outputs is closely matched.
Each receiver contains a terminating resistor that has a resistance approximately equal to the impedance of the line coupling the corresponding driver and receiver. This value is typically approximately 100 ohms. Also, the ground to which each driver and receiver is coupled should be within approximately 1 volt of each other.
Because the interface between portable computer 100 and docking station 150 is source synchronous, data transmitted over cable 120 is sampled and aligned with the clock of the receiving component (e.g., portable computer 100 or docking station 150). To do this, data that is transmitted over cable 120 is sampled in response to the transitions of the signal transmitted on the clock signal line. According to one embodiment, data is sampled on both the rising and falling edges of the clock signal. Data is then stored in receiving latches until accessed by the receiving component.
FIG. 3 is a hysteresis diagram for one embodiment of receivers according to the present invention. Hysteresis in the receivers of the invention prevent undefined input signals that occur, for example, due to disconnecting the receiver inputs or powering down the corresponding driver, from causing an oscillating output from the receiver.
In FIG. 3, Vout represents a single-ended output from the receiver. Vidthl and Vidthh represent the low and high input differential threshold voltages, respectively. These are the differential input voltages that cause the output of the receiver transitions to output low and high voltages, respectively. Vidth(min) and Vidth(max) are the minimum and maximum differential input voltages that can be used as inputs to the receiver. According to one embodiment, the hysteresis voltage (Vhyst=Vidthh−Vidthl) is 25 mV. The hysteresis voltage represents the differential voltage input to the receiver below which the output of the receiver does not change.
FIG. 4 is one embodiment of an upgradable Internet appliance with an upgrade connected via a cable according to the present invention. Internet appliance 400 is connected to television 410 or other monitor and to Internet 420. Internet appliance 400 provides access to Internet 420 via television 410 without requiring a full computer system. Thus, Internet appliance 400 may provide inexpensive access to Internet 420.
Eventually, a user of Internet appliance 400 may wish to upgrade by connecting a larger hard disk, a floppy disk drive, or other device. These devices may be located in Internet appliance upgrade 420, which is coupled to Internet appliance 400 via cable 120. Cable 120 (including lock 130, not shown) is the same cable discussed above. Thus, additional devices may be connected to Internet appliance 400 without replacing or opening Internet appliance 400.
In the foregoing specification, the invention has been described with reference to specific embodiments thereof. It will, however, be evident that various modifications and changes may be made thereto without departing from the broader spirit and scope of the invention. The specification and drawings are, accordingly, to be regarded in an illustrative rather than a restrictive sense.
|Cited Patent
|Filing date
|Publication date
|Mar 26, 1992
|Oct 20, 1992
|Traveling Software, Inc.
|Computer data interface for handheld computer transfer to second computer including cable connector circuitry for voltage modification
|Apr 29, 1994
|Apr 2, 1996
|Traveling Software, Inc.
|Low power-consumption interface apparatus and method for transferring data between a hand-held computer and a desk top computer
|Jun 30, 1995
|Apr 8, 1997
|Elonex Ip Holdings Ltd.
|System for extending ISA bus without using dedicated device driver software by using E2 P2 interface which provides multiplexed bus signal through standard parallel port connector
|Aug 2, 1996
|Nov 18, 1997
|Aps Technologies
|SCSI docking adapter
|Dec 20, 1996
|Mar 2, 1999
|N C R Corporation
|Multi-functional retail terminal and associated method
|Nov 21, 1996
|Mar 30, 1999
|Intel Corporation
|Method and apparatus for docking and undocking a notebook computer to and from a docking station while the notebook computer is in an active state
|Nov 18, 1996
|Nov 9, 1999
|Peripheral Vision, Inc.
|Docking station including a port replicator for sharing peripherals between a portable computer and desktop computer
|Mar 7, 1997
|Feb 22, 2000
|Texas Instruments Incorporated
|Computer ducking station with internal microprocessor
|Jul 11, 1997
|Aug 15, 2000
|Hewlett-Packard Company
|Computer communication using fiber-optic cable
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for High-Brandwidth Memory Interface Based on Scalable Coherent Interface Signaling Technology-IEEE STD 1596-1996 Sep. 15, 1996 pp: 1-90.
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for High-Brandwidth Memory Interface Based on Scalable Coherent Interface Signaling Technology—IEEE STD 1596-1996 Sep. 15, 1996 pp: 1-90.
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for Low-Voltage Differential Signals (LVDS) for Scalable Coherent Interface (SCI)-IEEE STD 1596.3-1996 Jul. 31, 1996 pp: 1-30.
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for Low-Voltage Differential Signals (LVDS) for Scalable Coherent Interface (SCI)—IEEE STD 1596.3-1996 Jul. 31, 1996 pp: 1-30.
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for Scalable Coherent Interface (SCI)-IEEE STD 1596-1992 Aug. 2, 1993 pp: 1-249.
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for Scalable Coherent Interface (SCI)—IEEE STD 1596-1992 Aug. 2, 1993 pp: 1-249.
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for Shared Data Formats Optimized for Scalable Coherent Interface Processors-IEEE STD 1596.5-1993 Apr. 25, 1994 pp: 1-81.
|Institute of Electrical and Electronics Engineers, Inc. IEEE Standard for Shared Data Formats Optimized for Scalable Coherent Interface Processors—IEEE STD 1596.5-1993 Apr. 25, 1994 pp: 1-81.
|Citing Patent
|Filing date
|Publication date
|Nov 5, 1999
|Sep 23, 2003
|Zoran Corporation
|Method and apparatus for testing CMOS image sensors
|Jul 13, 1999
|Oct 31, 2006
|Zoran Corporation
|Method and architecture for an improved CMOS color image sensor
|Oct 24, 2002
|Feb 13, 2007
|Zoran Corporation
|Method and apparatus for distributing light onto electronic image sensors
|Feb 3, 2005
|Oct 23, 2007
|Oqo, Inc.
|Docking cable
|Mar 6, 2003
|Sep 9, 2004
|Comcast Cable Holdings, Llc
|Method and system using docking stations to distribute a set top box between multiple monitors
|Aug 22, 2003
|Mar 17, 2005
|Wieck Brian C.
|Remote docking station device
|Feb 3, 2005
|Nov 3, 2005
|Jory Bell
|Docking cable
|Apr 20, 2005
|Oct 26, 2006
|Belady Christian L
|Thermal dissipation device with thermal compound recesses
|Jan 20, 2015
|Aug 20, 2015
|Acer Incorporated
|Docking station of portable electronic device and safe removing method thereof
|Sep 27, 2010
|Jan 19, 2011
|Dock and method for locking mobile terminal in same
|Sep 27, 2010
|Aug 22, 2012
|Dock and method for locking mobile terminal in same
|U.S. Classification
|710/101, 361/679
|International Classification
|Cooperative Classification
|European Classification
|Jun 21, 1999
Owner name: INTEL CORPORATION, CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:LENEHAN, DANIEL J.;BHUMA, RAM;REEL/FRAME:010036/0314
Effective date: 19990611
|May 27, 2005
|Fee payment
Year of fee payment: 4
|May 20, 2009
|Fee payment
Year of fee payment: 8
|Mar 8, 2013
|Fee payment
Year of fee payment: 12


text:
New 2017 Chevrolet Impala 1LT
Price after all offers** $27,016
2017 Chevrolet Impala LT Siren Red Tintcoat Beardmore Chevrolet Subaru is offering this 2017 Chevrolet Impala LT, in Siren Red Tintcoat and Jet Black Cloth, 3.6L V6 DI DOHC, 6-Speed Automatic, Auto-Dimming Inside Rear-View Mirror, Carpeted Trunk Mat, Convenience Package, Driver Confidence Package, Forward Collision Alert, Premium Carpeted Front & Rear Floor Mats, Rear Cross-Traffic Alert, Rear Park Assist, Rear Vision Camera, Remote Vehicle Starter System, Side Blind Zone Alert w/Lane Change Alert, Universal Home Remote.
* Rides smoothly over bumps and rough roads; quiet interior at highway speeds; V6 engine provides quick acceleration; cabin looks sleek and classy; big backseat and trunk are great for carrying passengers and luggage. Source: Edmunds