text:
|Publication number
|Publication type
|Application number
|Publication date
|9 Sep 2008
|Filing date
|7 May 2004
|Priority date
|8 Jun 2001
|Fee status
|Also published as
|Publication number
|Christophe Pierrat, Michel Luc Cote
|Original Assignee
|Synopsys, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (94), Non-Patent Citations (102), Referenced by (2), Classifications (21), Legal Events (3)
|External Links: USPTO, USPTO Assignment, Espacenet
This application is a continuation of U.S. patent application Ser. No. 09/972,428 filed on 5 Oct. 2001, now U.S. Pat. No. 6,852,471 issued 08 Feb. 2005, which is related to, claims the benefit of priority of, and incorporates by reference, the U.S. Provisional Patent Application Ser. No. 60/296,788 filed 08 Jun. 2001 entitled "Phase Conflict Resolution for Photolithographic Masks" having inventors Christophe Pierrat and Michel C�t� and assigned to the assignee of the present invention, and which application is related to, claims the benefit of priority of, and incorporates by reference, the U.S. Provisional Patent Application Ser. No. 60/304,142 filed 10 Jul. 2001 entitled "Phase Conflict Resolution for Photolithographic Masks" having inventors Christophe Pierrat and Michel C�t� and assigned to the assignee of the present invention.
1. Field of the Invention
The present invention relates to manufacturing small dimension features of objects, such as integrated circuits, using photolithographic masks. More particularly, the present invention relates to the application of phase shift masking to complex layouts for integrated circuits and similar objects.
2. Description of Related Art
Phase shift masking has been applied to create small dimension features in integrated circuits. Typically the features have been limited to selected elements of the design, which have a small, critical dimension. See, for example, U.S. Pat. No. 5,766,806.
Although manufacturing of small dimension features in integrated circuits has resulted in improved speed and performance, it is desirable to apply phase shift masking more extensively in the manufacturing of such devices. However, the extension of phase shift masking to more complex designs results in a large increase in the complexity of the mask layout problem. For example, when laying out phase shift windows on dense designs, phase conflicts will occur. One type of phase conflict is a location in the layout at which two phase shift windows having the same phase are laid out in proximity to a feature to be exposed by the masks, such as by overlapping of the phase shift windows intended for implementation of adjacent lines in the exposure pattern. If the phase shift windows have the same phase, then they do not result in the optical interference necessary to create the desired feature. Thus, it is necessary to prevent inadvertent layout of phase shift windows in phase conflict near features to be formed in the layer defined by the mask.
In the design of a single integrated circuit, millions of features may be laid out. The burden on data processing resources for iterative operations over such large numbers of features can be huge, and in some cases makes the iterative operation impractical. The layout of phase shift windows and the assignment phase shift values to such windows, for circuits in which a significant amount of the layout is accomplished by phase shifting, is one such iterative operation which has been impractical using prior art techniques.
Another problem that is associated with the use of phase shift masking arises from the need for two different mask patterns for implementation of a layer of material having small dimension features. Existing systems expose the wafer using a binary mask pattern using a stepper having optical settings optimized for the binary mask pattern, and expose the wafer using the phase shift mask pattern using a stepper having optical settings optimized for the phase shift mask pattern. Typically, the optical settings are quite different. For example, a phase shift pattern is usually exposed using a highly coherent radiation source. However, binary masks achieve better results having less coherent radiation sources. Thus, between the two exposures, the wafer is required to sit while the settings and masks are changed within the stepper. During the time the wafer sits, the quality of the resist can degrade. Furthermore, the time involved in moving the wafer and adjusting a stepper slow down the manufacturing process. For background concerning optical lithography and the phase shift masking, see Wong, RESOLUTION ENHANCEMENT TECHNIQUES IN OPTICAL LITHOGRAPHY, SPIE Press, Bellingham, Wash. (2001).
It is useful to understand the common stepper settings and parameters used in so called "gate shrink" phase shifting designs. A "gate shrink" design, or mask, is simply a layout, or mask, where significant portions of a pattern, usually field polysilicon, must still print properly using the corresponding binary trim mask, while portions such as transistor gates are formed using phase shifting, resulting in so-called "shrunk" gates.
Generally, phase shifting masks require a low partial coherence a arrangement in the stepper, so that the light exposing the wafer is highly coherent.
In contrast, when working with a binary pattern on a mask that has densely packed and small features, high partial coherence σ stepper settings producing less coherent light, and/or off-axis-illumination (OAI), or other illumination configurations are employed.
For that reason, the binary trim pattern on a mask for a gate shrink-type design would commonly be exposed using low coherency (high σ) or off-axis illumination. But, the phase shifting pattern on a mask for such a gate shrink-type design would use high coherency (low σ) illumination. This requires an adjustment of the projection system in the stepper, typically a change in size of an aperture, between the phase shifting pattern and trim pattern exposures.
Because of these and other complexities, implementation of a phase shift masking technology for complex designs will require improvements in the approach to the design of phase shift masks.
Mask and integrated circuit fabrication approaches are described to facilitate use of so called "full phase shift" masks, where substantially all of a layout is defined using phase shifting. Definitions of other patterns, layouts, and mask types for which the invention is suitable are described below.
For the masks used by embodiments of the invention, the optical settings of a stepper are maintained constant, except for dosing in some embodiments, between exposure with the phase shifting pattern and the binary trim pattern. Optical settings that are not changed between the exposures of the phase shifting and trim patterns include one or more members of a set of optical parameters including numerical aperture (N.A.), wavelength (λ) of light, coherency (such as measured by partial coherence σ), illumination configuration (single spot source, dipole source, quadrapole source, annular source), axis of illumination, and defocus, in various combinations.
In various embodiments, the relative dosing between the exposure of the phase shifting pattern and the trim pattern is expressed by a ratio 1.0:r, where r>0.0. In some embodiments, 2.0<r<4.0, so that the exposure dosing of the binary pattern is from 2 to 4 times greater than the dosing of the phase shifting pattern. One embodiment uses a 1:2 ratio, another a 1:3 ratio. The greater exposure of the trim pattern facilitates clearing of cuts, or openings, while preventing exposure of the features defined by the phase shifting pattern. In some embodiments, r is determined from simulation results for a particular optical lithography model, e.g. stepper, wavelength, resist measurements, etc.
Additionally, both patterns are provided on a single reticle in one embodiment of the present invention. A single reticle with multiple patterns can increase mask manufacturing costs. However, the cost of the mask is justified because the use of the single reticle can improve yield, and save manufacturing steps and time. A multiple pattern reticle can allow more rapid exposure of the layer of material using both the phase shifting pattern and the trim pattern. The layout of patterns on the single reticle can be simple (one of each) or more complex (multiple phase patterns; multiple binary patterns; one-dimensional; two-dimensional; etc.) The dosing ratio r for a layer to be exposed can be implemented, for example using constant exposure doses to each pattern with the ratio of the number of phase shifting patterns and to the number of trim patterns on the mask set equal to the dosage ratio 1.0:r. In this example, the exposure dosage is another parameter that is not changed between exposures of the phase shift and trim patterns.
A method for manufacturing an integrated circuit is provided according to the present invention, which includes forming a layer of resist on a semiconductor wafer, moving the wafer to a stepper system including a radiation source and a reticle having a phase shifting pattern and a trim pattern; positioning the wafer and the reticle for exposure of a phase shifting pattern in the reticle; applying a dose of radiation to the wafer through the phase shifting pattern using stepper settings including a set of optical parameters including numerical aperture (N.A.), wavelength (λ) of light, coherency (such as measured by partial coherence σ), illumination configuration (single spot source, dipole source, quadrapole source, annular source), axis of illumination, and defocus; positioning the wafer and the reticle for exposure of a trim pattern in the reticle; applying a dose of radiation to the wafer through the trim pattern using stepper settings including said set of parameters for the trim exposure, wherein all or some of the members of said set of parameters are substantially the same as those used for the phase shifting exposure. The phase shifting and trim patterns may be exposed in any order that results in the die on the wafer being exposed using both, and receiving proper dosages of radiation for the phase shifting and trim patterns. After exposing both patterns, the wafer is removed from the stepper, and available for subsequent steps to complete the integrated circuit. Then, the stepper is available for a next wafer in the line.
In one embodiment, all of said stepper settings are the same, in the sense that the stepper settings are not altered, or in other embodiments, settings of parameters that involve changing or moving an optical device such as an aperture stop setting or a lens position are not changed, between the phase shifting and trim exposures. In some embodiments, one reticle carries the phase shifting pattern and another carries the trim pattern, and the steps of positioning the reticle and the wafer include selecting the appropriate reticle.
In one embodiment, after exposing both patterns, the photoresist is developed, and the resulting pattern of developed photoresist is used for formation of a layer of polysilicon on the wafer, including elements of circuits being formed thereon. Such elements include transistor gates, interconnect structures, and the like.
Resulting ICs produced according to embodiments of the invention can include a large number of subwavelength features due to the use of phase shifting and those features will tend to be extremely well defined because of the high quality energy profile achieved, and the ability to rapidly develop the photoresist by using embodiments of the invention (shorter and more uniform time intervals between exposures; fewer mistakes in lithography settings, fewer mistakes in optical settings; etc.)
The file of this patent contains at least one drawing executed in color. Copies of this patent with color drawing(s) will be provided by the Patent and Trademark Office upon request and payment of the necessary fee.
The file of this patent contains at least one drawing executed in color. Copies of this patent with color drawing(s) will be provided by the Patent and Trademark Office upon request and payment of the necessary fee.
First, exposure settings for use in conjunction with phase shifting masks that produce substantial portions of a pattern of a layer on an integrated circuit (IC) using phase shifting will be considered. Next, relative dosing considerations between the phase shifting pattern exposure and the binary, trim pattern exposure will be considered. Finally, approaches for using a single reticle in the production of ICs using phase shifting will be considered. (As used herein, the terms "mask" and "reticle" are synonyms, generally referring to a device carrying patterns, also called layouts, for photolithographic exposure used in manufacture of semiconductor wafers or other workpieces.)
Exposure Settings
In one embodiment of the invention, an optical lithography exposure system, generally referred to as a stepper, has a setting of members of a set of one or more optical parameters that control characteristics of exposures, the settings used to expose the phase shifting pattern and the complementary trim pattern used to produce an IC using phase shifting are unchanged, or otherwise kept substantially the same, between the exposures. This is applied for example when all, or substantially all portions, of a pattern are being defined using a phase shifting pattern on a mask, because there is minimal need to print small features using the trim pattern. Thus the trim pattern consists of features that have greater design latitude in exposure settings than do the features formed using the phase shifting pattern, and can be exposed with key optical settings such as one or more members of a set of optical parameters including numerical aperture (N.A.), wavelength (λ) of light, coherency (such as measured by partial coherence σ), illumination configuration (single spot source, dipole source, quadrapole source, annular source), axis of illumination, and defocus, in various combinations.
Masks having a phase shift pattern that results in all, or substantially all portions, of a pattern on the layer of material being exposed being defined using the phase shifting pattern, are sometimes referred to as "full phase" masks. In one embodiment, the masks are defined according to the process described in U.S. patent application Ser. No. 09/932,239 filed on 16 Aug. 2001, now U.S. Pat. No. 7,083,879 issued 01 Aug. 2006 , entitled "Phase Conflict Resolution for Photolithographic Masks" having inventors Christophe Pierrat and Michel C�t�; and assigned to the assignee of the present invention, which is incorporated herein by reference as if fully set forth herein.
In another embodiment, a phase shifting mask that produces substantial portions of a pattern of an IC using phase shifting comprises a phase shifting pattern on the mask where substantially all features for a particular layer are defined using phase shifting. In another embodiment, a phase shifting mask that produces substantial portions of a pattern of an IC using phase shifting comprises a pattern on a mask such that only features that are non-critical for the binary exposure are non-phase shifted. In such an embodiment, a non-critical feature is a feature where there is greater latitude in critical dimension control such that when the non-critical feature is exposed according to the conditions more fully described below the resulting critical dimension variances are acceptable.
In other embodiments, the relevant layout comprises a layout where phase shifting is used to define at least one of:
By maintaining a high coherency illumination setting (low partial coherence σ) for both the phase shifting and binary trim pattern on a mask, it is possible to more quickly, and accurately, produce ICs where all or substantially all of the pattern features are defined using phase shifting. In one embodiment, the percentages are determined based on the number of edges, or edge segments, within the pattern defined using phase shifting.
In one embodiment, one or more of the numerical aperture (NA) of the radiation exposing the wafer, the coherency setting (σ), the illumination configuration (on/off axis, dipole, quadrapole, annular, etc.), and defocus are kept unchanged between the phase shifting and trim exposures. In one embodiment, all optical settings that require mechanical adjustment of items in the optical path to change, such as an aperture stop setting, or a lens position, are left unchanged between the phase shifting and trim pattern exposures.
In one embodiment, keeping the stepper settings unchanged facilitates the use of the single reticle approach described below. In another embodiment, keeping the stepper settings unchanged facilitates the use of a single stepper for exposure of both the phase shifting pattern and the corresponding trim pattern, whether such patterns are on the same mask or on separate masks.
Turning to
Turning to
Looking more closely at the simulation output 200 and the simulation output 300, the outputs include black contour lines (contour line 202, contour line 204, contour line 302, and contour line 304) that indicate where the feature 100 and the feature 102 will print. As can be seen from the figure, with a 1:1 ratio,
More generally, higher values of r in the ratio 1.0:r, where r>1.0 are useful in printing ICs when phase shifting masks of the type discussed here are used. In one embodiment, 2.0<r<4.0. In another embodiment, a 1:3 ratio is used. Most generally, r can have a real numbered value as the stepper/scanner exposure setting will be set in an absolute number of millijoules per square centimeter per exposure, e.g. 10 mJ/cm2 and 20 mJ/cm2, etc.
In some embodiments, one or more simulations are performed using the actual and/or test layouts to select r for a particular optical/stepper model. However, the selected ratio reflects a balance between "hard" or over exposure for cut regions (necessary and desirable) versus exposure of areas under the trim (undesirable).
Single Reticle
The phase shifting pattern 402 and the trim pattern 404 are separated by a small gap. In some embodiments, the gap is dependent on the blading capabilities and accuracy for the stepper. In one embodiment, the separation is 5 mm.
A given stepper/scanner system will have a usable area of a mask, e.g. an n by m millimeter field. Thus, the number of mask patterns that can be accommodated on a single reticle will depend on the size of the design and the usable reticle area.
In one approach, the dosing will be maintained at equal levels for the phase shifting and trim and binary exposures. Turning to
In another approach, dosing can be at a user selected ratio, e.g. 1.0:r, between patterns through the use of blading. By blading, or covering, one region of the reticle 400, an exposure of the type shown in
More complex reticle patterns are possible. For example, two phase shifting patterns could be used, e.g. with one phase shifting pattern having structures in one orientation and another pattern with structures in another orientation. In other embodiments, a two-dimensional pattern of the mask patterns on the reticle is used.
The present invention also provides a method for manufacturing an integrated circuit. The method includes forming a layer of resist on a wafer at a first process station. The resist is cured and prepared for exposure using a stepper or scanner. The wafer with a layer of resist is transported to the stepper. The stepper includes a radiation source, a mask and an optical path for exposing the wafer to radiation. The optical path is characterized by a set of optical parameters including one or more of a wavelength λ of illumination, numerical aperture NA, coherency, illumination configuration and defocus. In the stepper, the layer of resist is exposed to a first dosing radiation to a phase shifting pattern in said mask using a first setting of the set of optical parameters. Next, the layer of resist is exposed to a second dose of radiation through the trim pattern in said mask using said first setting. Thus, the setting of the optical parameters is not changed between the exposures of the phase shift pattern and the trim pattern. As mentioned above, the mask may have more than one trim pattern and more than one phase shift pattern implemented thereon. In this case, the wafer may be subject to additional exposure steps, in which the settings of the optical parameters are not changed. The order of exposure of the phase shift pattern or patterns and trim pattern or patterns can be changed as suits a particular processing situation.
As can be seen, according to this process both the phase shift and trim exposures are carried out in the same stepper, using the same settings. Thus, the wafer does not wait for changing of optical parameters, or to be moved from one stepper to the next, between exposures. This reduces the possibility for error in manufacturing of the device, and reduces the time required to complete the exposure step.
After the exposure, the resist is developed using the techniques that are adapted for use with a particular resist involved. A pattern is left on the wafer which is used for a deposition and/or etching step to form features of an integrated circuit. For example, the pattern may be used for etching an underlying layer of polysilicon to form interconnect, gate, capacitor, resistor and other circuit features on an integrated circuit.
Process Advantages
Maintaining the stepper settings as a constant can significantly improve throughput as well as lead to better critical dimension uniformity. Accordingly, if too much time passes between the first exposure and the second exposure and/or the amount of time is not maintained constant the results may be poorer than expected.
More specifically, current generation photoresist materials are chemically amplified so that exposure to light produces a very small number of acid molecules, that then continue to react. The passage of time and exposure to air may cause carbon dioxide, and other chemicals, to take up the acid and neutralize it. Using the single reticle approach, the photoresist should maintain its properties throughout both exposures and the timing between exposures can be shorter allowing more closely controlled effects of exposure. Additionally, over time, the acid diffuses into the polymer.
The better effects from different dosing can be implemented while maintaining other stepper settings constant.
The increased throughput and yield possible should readily make up for the increase in reticle costs; although, the cost should be comparable, or less than, the cost of a dual reticle approach using separate masks for phase shifting and binary patterns.
Representative Alternative Embodiments
Additionally, although the description has primarily focused on examples of defining a polysilicon, or "poly", layer within an IC, phase shifting can be used to define other layers of material.
Some embodiments of the invention include computer programs for simulating stepper exposures using phase shift and trim patterns to compute appropriate relative dosing between phase and trim/binary exposures. In one embodiment, the ICWorkbench(™) software produced by Numerical Technologies, Inc., San Jose, Calif. is used to simulate the exposure conditions, e.g. as seen in
As used herein, the term optical lithography refers to processes that include the use of visible, ultraviolet, deep ultraviolet, extreme ultraviolet, x-ray, and other radiation sources for lithography purposes.
The foregoing description of embodiments of the invention has been provided for the purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed. Many modifications and variations will be apparent. The embodiments were chosen and described in order to best explain the principles of the invention and its practical application, thereby enabling others to understand the invention for various embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the following claims.
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|Burggraaf, P., "Four More Significant Japanese Advances in Phase Shifting Technology", Semiconductor International, p. 16, Dec. 1991.
|Burggraaf, P., "Lithography's Leading Edge, Part 1: Phase-Shift Technology and Part 2: I-Lime and Beyond", Semiconductor International, pp. 43-47 and 52-56, Feb. 1992.
|Cooke, M., "OPC/PSM Designs For Poly Gate Layers", European Semiconductor, vol. 22, No. 7, pp. 57-59, Jul. 2000.
|Fukuda, H., "Node-Connection/Quantum Phase-Shifting Mask: Path to Below 0.3mum Pitch, Proximity Effect Free, Random Interconnects and Memory Patterning" J. Vac. Sci. Technol. B, vol. 17, No. 6, pp. 3291-3295, Nov./Dec. 1999.
|Fukuda, H., et al., "Determination of High-Order Lens Aberration Using Phase/Amplitude Linear Algebra", J. Vac. Sci. Technol. B, vol. 17, No. 6, pp. 3318-3321, Nov./Dec. 1999.
|Galan, G., et al., "Alternating Phase Shift Generation for Coplex Circuit Designs", SPIE, vol. 2884, pp. 508-519, Sep. 18-20, 1996.
|Galan, G., et al., "Application of Alternating-Type Phase Shift Mask to Polysilicon Level for Random Logic Circuits", Jpn. J. Appl. Phys. vol. 33, pp. 6779-6784 (1994).
|Gordon, R., et al., "Design and Analysis of Manufacturable Alternating Phase-Shifting Masks", Bacus News, vol. 14, Issue 12, pp. 1-9, Dec. 1998.
|Grunik, Y., et al., "Sub-Resolution Process Windows And Yield Estimation Technique Based On Detailed Full-Chip CD Simulation", SPIE, vol. 4182, pp. 335-341 (2000).
|Heng, F., et al., "Application of Automated Design Migration to Alternating Phase Sifht Mask Design", IBM Research Report KC 21978 (98769), Feb. 26, 2001 (7 pages).
|Hirai, Y., et al., "Automatic Pattern Generation System for Phase Shifting Mask", 1991 Symposium on VLIS Technology, Digest of Technical Papers, pp. 95-96, May 28-30, 1991.
|Hosono, K., et al., "A Novel Architecture for High Speed Dual Image Generation of Pattern Data for Phase Shifting Reticle Inspection", SPIE-Integrated Circuit Metrology, Inspection, and Process Control VI, vol. 1673, pp. 229-235 (1992).
|IBM, "Method to Produce Sizes in Openings in Photo Images Smaller Than Lithographic Minimum Size", IBM Technical Disclosure Bulletin, vol. 29, No. 3, p. 1328, Aug. 1986.
|IBM, "Phase-Shift Mask Utilizing Silicon Oxy-Nitride as a Low Reflectivity Phase-Shift Layer", IBM Technical Disclosure Bulletin, vol. 34, No. 10B, pp. 360-361, Mar. 1992.
|Inokuchi, K., et al., "Sub-Quarter Micron Gate Fabrication Process Phase-Shifting-Mask for Microwave GaAs Devices", Extended Abstracts Of The 1991 Intl. Conference On Solid State Devices And Materials, Yokohama, Japan, pp. 92-94 (1991).
|Inokuchi, K., et al., "Sub-Quarter-Micron Gate Fabrication Process Using Phase-Shifting Mask for Microwave GaAs Devices", Japanese Journal Of Applied Physics, vol. 30, No. 12B, pp. 3818-3821, Dec. 1991.
|Inoue, S., et al., "Simulation Study on Phase-Shifting Masks for Isolated Patterns", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3010-3015, Nov. 1991.
|Ishida, S., et al., "Large Assist Feature Phase-Shift Mask for Sub-Quarter Micrometer Window Pattern Formation", SPIE, vol. 3096, pp. 333-343 (1997).
|Ishiwara, N., et al., "Novel Alternating Phase Shift Mask with Improved Phase Accuracy", SPIE, Proceedings Of The 17th Annual Symposium On Photomask Technology And Management, vol. 3236, pp. 243-249 (1997).
|Jinbo, H. et al., "0.2 mum or Less Lithography by Phase-Shifting-Mask Technology", 1990, IEEE, pp. 33.3.1-33.3.4.
|Jinbo, H., et al., "0.2mum or Less i-Line Lithography by Phase-Shifting-Mask Technology", IEEE, pp. 33.3.1-33.3.4 (1990).
|Jinbo, H., et al., "Application of Blind Method to Phase-Shifting Lithography", IEEE, 1992 Symposium On VLSI Technology Digest Of Technical Papers, pp. 112-113 (1992).
|Jinbo, H., et al., "Improvement of Phase-Shifter Edge Line MaskMethod", Japanese Journal Of Applied Physics, vol. 30, No. 11B, pp. 2998-3003, Nov. 1991.
|Jinbo, Hideyuki, et al., "0.2 mum or Less i-Line Lithography by Phase-Shifting-Mask Technology", 1990, IEEE, pp. 33.3.1-33.3.4.
|Kanai, H., et al., "Sub-Quarter Micron Lithography with the Dual-Trench Type Alternating PSM", SPIE, vol. 2793, pp. 165-173 (1996).
|Karklin, L., "A Comprehensive Simulation Study of the Photomask Defects Printability", SPIE, vol. 2621, pp. 490-504 (1995).
|Kemp, K., et al., "Optimized Phase Shift Mask Designs for Real Devices", KTI Microlithography Seminar, pp. 67-75, Oct. 14-15, 1991.
|Kikuchi, K., et al., "Method of Expanding Process Window for the Double Exposure Technique with alt-PSMs", Optical Microlithography XIII, Proceeding of SPIE, vol. 4000, pp. 121-131 (2000).
|Kimura, T., et al., "Subhalf-Micron Gate GaAs Mesfet Process Using Phase-Shifting-Mask Technology", IEEE, GaAs IC Symposium, pp. 281-284 (1991).
|Kuo, C., et al., "Extension of Deep-Ultraviolet Lithography for Patterning Logic Gates Using Alternating Phase Shifting Masks", J. Vac. Sci. Technol. B, vol. 17, No. 6, pp. 3296-3300, Nov./Dec. 1999.
|Langston, J., et al., "Extending Optical Lithography to 0.25mum and Below", Solid State Technology, pp. 57-64, Mar. 1995.
|Levenson, M., et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE, Transactions On Electron Devices, vol. ED-29, No. 12, pp. 1828-1836, Dec. 1982.
|Levenson, M., et al., "The Phase-Shifting Mask U: Imaging Simulations and Submicrometer Resist Exposures", IEEE Transactions on Electro Devices, vol. ED-31, No. 6, pp. 753-763, Jun. 1984.
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|Lin, H.Y., et al., "Fabrication of 0.1mum T-Shaped Gates by Phase-Shifting Optical Lithography", SPIE, Optical/Laser Microlithography VI, vol. 1927, pp. 42-52 (1993).
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|Newmark, D., et al., "Phase-Shifting Mask Design Tool", SPIE-11th Annual BACUS Symposium on Photomask Technology, vol. 1604, pp. 226-235, Sep. 25-27, 1991.
|Nistler, J., et al., "Large Area Optical Design Rule Checker for Logic PSM Application", SPIE, Photomask And X-Ray Mask Technology, vol. 2254, pp. 78-92 (1994).
|Nistler, J., et al., "Phase Shift Mask Defect Printability Analysis", Proceedings Of The Microlithography Seminar Interface '93, OCG Microelectronic Materials, Inc., pp. 11-28 (1993).
|Nitayama, A., et al., "New Phase Shifting Mask with Self-Aligned Phase Sifters for a Quarter Micron Photolithography", IEDM, pp. 3.3.1-3.3.4, Dec. 3-6, 1989.
|Nolscher, C., et al., "Investigation of Self-Aligned Phase-Shifting Reticles by Simulation Techniques", SPIE,-Optical/Laser Microlithography IV, vol. 1463, pp. 135-150 (1991).
|Ogawa, Kiyoshi, et al., "Phase Defect Inspection by Differential Interference," Proceedings of SPIE 4409-71, Apr. 26, 2001, 12 pages.
|Ohnuma, H., et al., "Lithography Computer Aided Design Technology for Embedded Memory in Logic", Jpn. J. Appl. Phys., vol. 37, Part I, No. 12B, pp. 6686-6688, Dec. 1998.
|Ohtsuka, H., et al., "Evaluation of Repair Phase and Size Tolerance for a Phase-Shift Mask", J. Vac. Sci. Technol. B, vol. 11, No. 6, pp. 2665-2668, Nov./Dec. 1993.
|Ohtsuka, H., et al., "Phase Defect Repair Method for Alternating Phase Shift Masks Conference Twin-Shift-Method", Jpn. J. Appl. Phys., vol. 31, pp. 4143-4149 (1992).
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|Ooi, K., et al., "Computer Aided Design Software for Designing Phase-Shifting Masks", Jpn. J. Appl. Phys., vol. 32, Pt. 1, No. 12B, pp. 5887-5891, Dec. 1993.
|Palmer, S, et al., "Dual Mask Model-Based Proximity Correction for High Performance 0.10mum CMOS Process", The 44th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Abstracts, pp. 18-19, May 30-Jun. 2, 2002.
|Pati, Y.C., et al., "Phase-Shifting Masks for Microlithography: Automated Design and Mask Requirements", J. Opt. Soc. Am., vol. 11, No. 9, pp. 2438-2452, Sep. 1994.
|Petersen, J., et al., "Designing Dual-Trench Alternating Phase-Shift Masks for 140nm and Smaller Features Using 248-nm KrF and Pattern ArF Lithography", Bacus News, vol. 14, Issue 8, pp. 1 & 4-13, Aug. 1998.
|Pierrat, C., et al., "A Rule-Based Approach to E-Beam and Process-Induced Proximity Effect Correction for Phase-Shifting Mask Fabrication", SPIE, vol. 2194, pp. 298-309 (1994).
|Pierrat, C., et al., "Phase-Shifting Mask Topography Effects on Lithographic Image Quality", IEEE, pp. 3.3.1-3.3.4 (1992).
|Pierrat, C., et al., "Required Optical Characteristics of Materials for Phase-Shifting Masks", Applied Optics, vol. 34, No. 22, pp. 4923-4928, Aug. 1, 1995.
|Pistor, Thomas V., "Rigorous 3D Simulation of Phase Defects in Alternating Phase-Shifting Masks," Proceedings of SPIE 4562-1038 (Mar. 2002), 13 pages.
|Plat, M., et al., "The Impact of Optical Enhancement Techniques on the Mask Error Enhancement Funchtion (MEEF)", SPIE, vol. 4000, pp. 206-214, Mar. 1-3, 2000.
|Rhyins, P., et al., "Characterization of Quartz Etched PSM Masks for KrF Lithography at the 100 nm node," Proceedings of SPIE 4562 (Mar. 2002), 486-495.
|Rieger, M., et al., "System for Lithography Proximity Compensation", Precim Company, Portland, Oregon, Sep. 1993 (28 pages).
|Roman, B., et al., "Implications of Device Processing on Photomask CD Requirements", SPIE, vol. 3236 (1997) (Abstract Only).
|Sakata, Miwa, et al., "A Novel Radiation Sensitive Spin-on-glass Convertible into SiO2 and the Simple Fabrication Process Using It," Jul. 26, 1993 (ATI Bell Labs fax date), 3 pages.
|Semmier, Armin, et al., "Application of 3D EMF Simulation for Development and Optimization of Alternating Phase Shifting Masks," Proc. of SPIE 4346-37, Mar. 1, 2001, 12 pages.
|Sewell, Harry, et al., "An Evaluation of the Dual Exposure Technique," (As early as 2002), 11 pages The date is based on references 8&9 of the article of Feb. 16, 2001 and Feb. 27, 2002, respectively.
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|Spence, C., et al., "Integration of Optical Proximity Correction Strategies in Strong Phase Shifters Design for Poly-Gate Layers", Bacus News, vol. 15, Issue 12, pp. 1, 4-13. Dec. 1999.
|Spence, C., et al., "Optimization of Phase-Shift Mask Designs Including Defocus Effects", AMD, Princeton University, Vocor Technologies Inc. (8 pages).
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|Terasawa, T., et al., "0.3-Micron Optical Lithography Using a Phase-Shifting Mask", SPIE, Optical/Laser Microlithography II, vol. 1088, pp. 25-33, Mar. 1989.
|Terasawa, T., et al., "Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 2991-2997, Nov. 1991.
|Toh, K., et al., "Chronicles Phase-Shifted Masks: A New Approach to Phase-Shifting Masks", BACUS-Tenth Annual Symposium on Microlithograpy, Sep. 1990 (27 pages).
|Troccolo, P., et al., "Interferometric Measurement of Etch Depths in Phase Shift Masks", BACUS News, vol. 9, Issue 6, pp. 1 & 4-6, Jun. 1993.
|Tsujimoto, E., et al., "Hierarchical Mask Data Design System (Prophet) for Aerial Image Simulation, Automatic Phase-Shifter Placement, and Subpeak Overlap Checking", SPIE, vol. 3096, pp. 163-172 (1997).
|Waas, T., et al., "Automatic Generation of Phase Shift Mask Layouts", Microelectronic Engineering, vol. 23, pp. 139-142 (1994).
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|Watanabe, H., et al., "Pattern Transfer Characteristics of Transparent Phase Shifting Mask", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3004-3009, Nov. 1991.
|Watanabe, H., et al., "Phase-Shifting Lithography: Masks making and its Application", J. Vac. Sci. Technol. B, vol. 11, No. 6, pp. 2669-2674, Nov./Dec. 1993.
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|Citing Patent
|Filing date
|Publication date
|7 Apr 2008
|8 Dec 2009
|Synopsys, Inc.
|Exposure control for phase shifting photolithographic masks
|7 Apr 2008
|7 Aug 2008
|Synopsys, Inc.
|Exposure control for phase shifting photolithographic masks
|U.S. Classification
|430/311, 355/53, 430/5, 430/394, 355/77
|International Classification
|Cooperative Classification
|European Classification
|13 Jan 2005
Owner name: SYNOPSYS, INC., CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SYNOPSYS MERGER HOLDINGS, LLC;REEL/FRAME:015594/0659
Effective date: 20050113
|21 Sep 2011
|Fee payment
Year of fee payment: 4
|24 Feb 2016
|Fee payment
Year of fee payment: 8


text:
Gerald the Line
A hideously deformed, top heavy scrawl of a shape. He appeared to have multiple protuberances, a hernia or two, and fistulas covering what you might call a body. He was horrible. He couldn't stand to look at himself.
"Look at yourself, you're pathetic!" Gerald would snap, as Sneb was trying to think of a word that rhymed with Orange.
Sneb enjoyed multiplying by thirds and hyphenating quadrants, which made no sense and drove Gerald insane.
"Why didn't they hang us up?", wondered Sneb.
" It's your fault! " Gerald hissed. " If I hadn't been next to such an ugly waste of ink I'll bet they would've hung me up too ". Crushed by such harsh words, Sneb tried to worm himself as far away from Gerald as he could. He slipped off the edge of the desk and onto the floor, out of sight.

subset: commoncrawl


text:
How to Shovel Your Driveway to Help Keep it Clear
Snow Routes
Drive Prepared
Sharing the Road With Snow Plows
Plowing Priorities
Check Road Conditions
KC Traffic
MoDOT's first priority during a snow event is to keep the roadways clear of snow and ice. This requires crews to make several trips along the same route to ensure the driving surface remains clear. Once the snow has stopped falling, crews will return to the area to widen the cleared areas and clear the shoulders.
As crews clear a path, snow plowed from roads could possibly block a private drive or entrance for some time. MoDOT understands the inconvenience this can cause, but due to limited time and resoureces, plows can only clear private driveways at the request of local emergency officials.
Here are some tips to help reduce the amount of snow that might block your driveway. When clearing your driveway, shovel an open area along the shoulder at the entrance. This will give the plowed snow a place to go from the roadway, preventing the snow from backfilling your driveway. Plow blades will push snow into the area just before your entrance, leaving a much smaller amount in front of it


text:
If you are a faculty or staff member at IUPUC, you may utilize Microsoft Exchange e-mail.
Contact the UITS Support Center at IUPUC for information. We can be reached at firstname.lastname@example.com, by visiting LC Room 1500, or by calling 812.314.8600.
If you are a student at IUPUC, you have two options for e-mail service:
Create an Imail or Umail account by following these instructions.
Although you may create both an Imail and a Umail account, you must choose one for your preferred e-mail address.


text:
1. English Heritage welcomes the opportunity
to submit a memorandum to the Urban Affairs Sub-committee inquiry
into New Towns. Conceived at a time when there was relatively
little new building in Europe, the UK's post-war New Towns achieved
international renown as "the greatest conscious programme
of city building ever undertaken by any country in history"1
Like all social innovations, they have had a mixed history. Where
they have worked well, it has often been because of the sensitivity
of the original masterplan, its responsiveness to the existing
topography and settlement pattern and the quality of its landscape
2. One or two generations on, the Towns
have matured and gained their own momentum, and change in response
to new social and economic conditions is inevitable. However,
some of their most positive features may be at risk if the strengths
of their original design are forgotten and individual development
control decisions are taken without reference to the coherence
of their founding vision.
3. Although social legislation and the trend
towards smaller families gradually improved living conditions
during the course of the twentieth century, overcrowded and insanitary
housing remained a serious problem throughout the 1940s both in
the inner cities and the countryside. Nevertheless, New Towns
were not always well received locally, and this hostility, combined
with restrictions on funding, resulted in a shaky start for the
New Town movement. Some of the first New Towns were nevertheless
outstanding. They shared the vision that architecture, planning
and landscape design were onethe art of town design.
Harlow in particular inherited a quintessentially English sense
of the picturesque. New build sits organically in the landscape.
The size of neighbourhoods, and the segregation of traffic and
pedestrians, meant that children did not have to cross major roads
to reach schoola major cause of congestion in older towns.
Small areas of houses with common building materials were designed
to achieve coherence and intimacy, a sense of identity. Museum-quality
art adorned streets and other publicly accessible places.
4. Second generation New Towns had to take
more account of the carcar ownership doubled between 1947
and 1959 and increased by as much again by 1963but the
incorporation of old buildings and landscape features and the
creation of distinctive skylines continued to ensure characterful
neighbourhoods. These trends reached their apogee in Milton Keynes,
which resembles modern American models of the "urban countryside".
5. New Towns have fared unevenly. Some architecturally
striking buildings (Stirling's flats at Southgate, Runcorn, for
instance) have been demolished, and so have the undistinguished
system-built flats at Killingworth. Other problemsfrom
high rents (to cover high infrastructure costs) to unsupervised
parking areasare widespread. But, overall, New Town housing
has brought fewer problems than contemporary large-scale housing
developments in the inner cities. The successful ingredients appear
to be what they were at the outset low density, gardens and privacy,
informality, greenery and open space, attractive but undemonstrative
architecture. In many cases, buildings may be individually unexceptional
but their setting and lay out have been designed with great care
and sensitivity. This raises a significant management issue. Careful
evaluation of what survives and the principles underlying the
design needs to inform future development. Decisions relating
to individual buildings or sites should not be made in isolation,
since ill-informed change in one place can begin to unravel the
coherence of whole neighbourhoods. An example of this is the proposed
demolition of Sir Frederick Gibberd's exceptional Water Gardens
at Harlow. Their contribution to the wider urban fabric, and how
the town worked around and with them, has been overlooked.
6. Town centres have suffered disproportionately,
partly as a result of poor maintenance, partly because many of
them were designed shortly before radical changes in car use and
shopping patterns combined to undermine their economic viability.
Historic villages incorporated within the New Towns, on the other
hand, have often been lovingly restored and revitalised. On balance,
the later New Towns (possibly because of the lessons that were
learnt from earlier failures, possibly simply because they were
better adapted to universal car ownership) appear to have performed
better than their forebears.
7. New Towns were conceived and designed
as a unified whole, embracing architecture, planning and landscape
design, and the management of change within them needs to be informed
by a similarly unified and comprehensive vision. This needs to
be based on a thorough historical understanding and evaluation,
not only of their designers' original intentions, but also of
the ways they have evolved in response to changing circumstances
over the last 25 to 50 years. They were an unusual, largely unprecedented,
experiment in social and environmental engineering, and their
social, demographic and economic history deserves greater study.
This would be particularly valuable given that some of the problems
they were designed to solvethe pressure for additional
housing in the London and the South East, and the need to create
sustainable and civilised communitiesare still very much
with us in the twenty-first century.
8. This brief memorandum is based on unpublished
background research by Elain Harwood of English Heritage into
the history of the New Town movement in the second half of the
twentieth century. We would be happy to make this available to
the Committee if it would be useful.
Leslie Lane, then Director of the Civic Trust,
quoted in Colin Ward: New Town, Home Town (London Calouste Gulbenkian
Foundation, 1993), p. 11.


text:
Ulalume Premieres FRIDAY NITE on MTV – Hosted by Kat Von D
New Moon Cast's Candy Cravings
Kellan and Teddy Bears of course!!! so adorable
Oh Kellan, don't you know? Its 'all' about the chocolate! I wonder have any of them eaten the Twilight candy? I had to try it, did anyone else?
Twilight candy? Wow, sometimes I think there's nothing in the world left that doesn't have Twilight somehow in it 😀
That video was somehow adorable 🙂 Made me smile the whole time I was watching it!
By Twilight candy do you mean those disgusting "Sweetheart" candies that taste like Pepto Bismol? Yeah, those stayed in the package… The box was great, though! 😉
HAHA! i totally agree about the sweetheart candies.. i gagged when i tried them! blah! but the box they came in is totally worth it! Mmmm Edward!
What the heck is Jackson talking about? candy with razor blades!? I've never heard of those!
Back in the 80s, malicious people were putting razor blades into candies or injecting them with poison and giving them away like that. Parents had to inspect every candy before the kids could eat any. It was horrible. I think he was just making reference to that. I thought it was funny… I guess it dates me!
Jackson Rathbone! LMAO!!! You've got to LOVE that boy's weird sense of humor…."that kind with the razor blades…"
He's really quirky and weird in a hilarious sort of way! lol
Jackson: "The candy with the razor-blades inside"…WTF? LOL He's so freakin weird and funny. I love his appearance…its so quirky. Love him to death 🙂
And Kellan likes gummy BEARS! haha what do ya know!
Lol they are so funny, Ashley going on and on about candy, Kellan and the gummy bears(lol) and Jackson with razor blades 🙂
So funny.
Love these little interview snippets, they crack me up…especially Kellan & Jackson! 🙂
One thing though, Nikki says she doesn't like "hard candy" like lollipops…wasn't there an interview a while back done at an awards show & she was sucking on a lollipop during it?
Just a thought that came to mind! 😉
OMG!! Ashley likes the small ones. I cant belive she had 4? I guess cause they are so small. I bet she would like my fun size one.
oh, and there's a new one for new moon. they're skybars.
I love chocolate like Nikki.
I know I'm… a bit late commenting on this. But I felt the need to defend the Sweethearts by saying that the apple ones are probably one of my favorite candies ever – even if the other flavors were pretty gross.
You can always count on Jackson to make an interveiw a bit more interesting, huh?


text:
Successful companies hire individuals with the aptitude to thrive in the roles they are given. Measure the aptitude of potential employees, provide sales training and help them to perform at expert levels.
Getting the right people in the right seats on the bus should be every company's goal. Our assessments can reduce turnover, lower training costs and improve sales results. WHY YOU SHOULD ASSESS
The sales assessment is designed to evaluate a person's scores, on a scale of 1-100, for each one of the primary and secondary personality traits. Those scores are then overlaid on a chart that highlights specific ranges within each trait where success was found most often for that specific position.
A sales person with high aptitude for sales will outsell the low aptitude sales person by a factor of 4. Depending on sales quotas, the ROI of using a APQ can be as high as $75,000 for every $1 spent on the assessment.
Every top performing sales manager and team, understands the importance of the 'they were born to sell' traits that top sales people possess. Imagine being able to identify, hire, and coach those traits within your existing sales team! ASHER utilizes the APQ Sales Assessment test as that 'must-have' tool in every HR & sales manager's hiring arsenal.
Sales Aptitude Testing - APQ Assessment identifies and scores primary and secondary personality traits using 81 questions, delivering easy to read reports, customized for different sales and non-sales positions.
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Simply put, getting the right folks in the right seats on the bus is a MUST when building your sales team. Over 600 correlation studies show natural aptitude is the most significant factor in predicting sales success.
Consider the impact on sales of these three companies whose sales teams are made up of those with 'natural sales talent':
Company A
Company B
Company C
14 out of the Top 26 Sales People Tested HIGH for Sales Aptitude
7 out of the Top 26 Sales People Tested HIGH for Sales Aptitude
3 out of the Top 26 Sales People Tested HIGH for Sales Aptitude
70% Increase in sales over previous year
30% Increase in sales over previous year
4% Increase in sales over previous year
Of the Top Five Factors of Top Salespeople, Natural Sales Aptitude, accounts for over 50% of a persons success, and they are born with. The other factors can be learned:
"So the profile of top sales people is that they're knowledge giants who help customers solve real business problems, they have a natural talent for outside sales, and they have the top 10 skills and use them. They're self-motivated and they're at that point in their lives where they're charged up to make more sales. And they're working in companies where they are supported by best practice processes for branding, marketing, sales and customer service. When all five of those are clicking along, you have a top sales person," Asher says.
Learn how to develop consistent, scalable, measurable ROI and top line revenue growth through sales training, marketing, and process improvement.
Learn More & Download Your Sample Chapter
Learn More & Download Your Sample Chapter


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Reviewed by GREG KING Documentary Director: Charles Ferguson. Although the title suggests a heist thriller, Inside Job instead offers a fascinating, eye-opening exploration of the global financial crisis of 2008 and the root causes. This documentary comes from Charles Ferguson, whose previous film was 2007's No End In Sight, a blisteringly honest exploration of the war in Iraq and a fierce criticism of the Bush administration's conduct of the war. Ferguson has a doctorate in political science, and his research is always impeccable and his arguments Continue reading
Archives for November 2010
Reviewed by GREG KING Director: George Tillman Stars: Dwayne Johnson, Billy Bob Thornton, Carla Gugino, Oliver Jackson-Cohen. After flirting with bland family friendly fare for Disney (The Game Plan, Race To Witch Mountain), former wrestler turned action hero Dwayne Johnson returns to full on action mode. Faster is a nasty, gratuitously violent and visually ugly vengeance-fuelled action thriller that owes more than a debt to the films of Walter Hill. It also has echoes of John Boorman's violent revenge thriller Point Blank and the Mel Gibson thriller Continue reading
Reviewed by GREG KING Director: Paul Haggis Stars: Russell Crowe, Elizabeth Banks, Liam Neeson, Brian Dennehy, Helen Carey, Olivia Wilde. A moderately gripping yarn about a man who goes to extraordinary lengths to break his wife out of prison, The Next Three Days requires a healthy suspension of disbelief from the audience to succeed. Mild mannered college professor John Brennan (Russell Crowe) finds his life turned upside down when his lawyer wife Lara (Elizabeth Banks) is arrested for the murder of her colleague. Most of the evidence against her is Continue reading
Reviewed by GREG KING Director: David Yates Stars: Daniel Radcliffe, Emma Watson, Rupert Grint, Ralph Fiennes, Bill Nighy, Timothy Spall, Jason Isaacs, Rhys Ifans, John Hurt, Helen McCrory, Imelda Staunton, Michael Gambon, Peter Mullan . "These are dark times," remarks a character in this seventh installment of the lucrative Harry Potter franchise. Indeed, it's time for Harry (Daniel Radcliffe) and his best friends Hermione (Emma Watson) and Ron (Rupert Grint) to put away childish things as they are thrust into a more adult world away from the comforts and Continue reading
Reviewed by GREG KING Director: George Berlanti Stars: Josh Duhamel, Katherine Heigl, The premise of the most unlikely people being unexpectedly thrust into the role of parenthood and having to bring up someone else's baby is not new. Previously we have had Three Men And A Baby, in which carefree bachelors Ted Danson, Tom Selleck and Steve Guttenberg raised a baby abandoned by a former girlfriend. In Baby Boom, Diane Keaton played high powered businesswomen who inherited a baby from a distant cousin and whose hard nosed exterior was changed by the experience. Continue reading


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Below are poems written by poet
Sayf Mahasneh. Click the Next or Previous links below the poem to navigate between poems. Remember, Poetrysoup is an environment of encouragement and growth. Thank you.
List of ALL
mahasneh poems
Sayf Mahasneh
The poem(s) are below...
upon the skin of the drunk earth
The black fear breaks the column of the blue lightes
And the lighthouses of the white sea ,
Sinking in the ridiculous anger
And the rebellious love crying above space of the tired universe
And breaks my horizon mania .
Copyright © sayf mahasneh | Year Posted 2011


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Fairfield Police Department arrested Thaddeus Rashad Nolan, 23, of 801 South D St., at 3:25 a.m. today at Second Street and Stone Avenue. He is charged with public intoxication or intoxication.
Police received a report at 2:44 p.m. Monday about shoplifting/theft of $17.89 in merchandise from Fairfield Hy-Vee Food and Drug Store, 1300 W. Burlington Ave.
Police log
6:37 p.m. caller reported a dog locked in car, no windows down. Dog is panting, in a Jeep with a black roof.
5:53 p.m. caller reported two babies left in the sun in an unoccupied tan, with a red front, Neon.
1:51 p.m. Caller in 1200 block of South Sixth Street reported hearing two pops or bangs and something hit the house window. Two holes found in large window facing Sixth Street, possibly made by a BB gun. Caller did not see any vehicle. Officer talked with neighbors and got a description of a vehicle that may be involved. Estimated replacement cost for window is $360.
9:45 a.m. Fairfield Public Library employee called to report about four months ago, an unknown person damaged four books, each about Hillary Clinton and valued at $10 a piece. The library had no suspects or an exact date the vandalism occurred. Officer advised library to possibly move books to a more visible location for staff and/or install video surveillance. Employee noted checking around at other public libraries in the area and learned this type of vandalism has occurred at other libraries also, including in Ottumwa.


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My First Blu-ray Movie
I bought a Blu-ray player a couple months ago. I didn't have any Blu-ray discs and didn't run out to buy any, but I was loving the machine anyway. It's not like when we switched from VHS to DVD and had to either keep two machines around or replace all of our tapes. Not only do Blu-ray players play regular DVDs, they make them look crisper and better!
Then along came Disney. As if they knew that we had just purchased a Blu-ray player, Disney offered me a review copy of the Diamond Edition of "Snow White" on Blu-ray disc. It's still our one-and-only blue-ray disc, but my daughter has watched it four or five times in the couple of weeks we've had it. It even comes with a regular DVD of "Snow White", to use in your car or on another TV or computer.
I put the disc in and the first thing I noticed about it was the sound. We have an HD DVR, so I've heard shows with good sound on that same TV, but the sound coming from this disc when the previews started was something else entirely. And that was just on the speakers from our Bravia – we don't even have surround sound speakers. The next little surprise was a viewing option called "Disney View." Instead of stretching the picture or having those annoying black bars on the sides, "Disney View" lets you see "Snow White" in its original aspect ratio, with original artwork on the sides (columns, pulled-back theater curtains, etc.). It's a beautiful way to watch the movie. At first I thought it might be distracting, but it turns out that it's the jarring black bars that are annoying. The "Disney View" artwork frames the movie in a very natural way.
I'm not sure that a hand-drawn cartoon that's over 70-years-old is the best vehicle to tout the benefits of Blu-ray. Don't get me wrong, the movie has been completely cleaned up and sparkles for its Blu-ray debut. It looks absolutely gorgeous, especially the colors, which were much more earthy than later, more pastel Disney movies. But sometime soon I'm going to buy something with lots of explosions and special effects so that I can see what the Blu-ray player can really do (I'm thinking I Am Legend). One huge benefit of Blu-ray though is that the discs themselves are reportedly more scratch-resistant than regular DVDs. That doesn't mean that I'm going to let the kids touch it, but at least when I drop it (which will happen eventually) it will hopefully hold up better.
The cons? It can take a minute or two for the Blu-ray disc to load (but I suspect that isn't specific to this disc – they load and are read in a different way than regular DVDs). In a world where I've gotten used to having everything in an instant, that took a little getting used to. And they're more expensive. My two-minute, completely unscientific survey of Amazon movies shows that the Blu-ray titles tend to be between about 30% and 60% more expensive than the regular DVDs. But for that extra money you will likely get better picture, better sound, better wear, and more extras.
Win Snow White for yourself
And now the really fun part: I get to give away the Diamond 2-disc edition of "Snow White", along with a Seven Dwarf Plush Set!
To enter, all you have to do is leave a message on this post telling me what your favorite Disney movie is, or which one you would like most to see on Blu-ray.
You can also get one extra entry by tweeting about this contest. Just make sure to link back to this page, and don't forget to leave a separate comment linking to your tweet! Or, you can just copy and tweet this:
Win the Diamond Edition of "Snow White" on Blu-ray & a Seven Dwarfs Plush Toy set over @SelfishMom! http://bit.ly/3gq519
So, that's a maximum of two entries per household, please. The comments will close at noon-ish on Wednesday, October 28th and random.org will draw a winner. For complete rules, please see my Giveaway Rules page. Good luck!
Originally posted on Selfish Mom. All opinions expressed on this website come straight from Amy unless otherwise noted. Please visit Amy's Full Disclosure page for more information.


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Austin Bice Update
Preliminary autopsy results show that Austin Bice, the SDSU student who died while studying abroad in Spain, drowned in the Manzanares River in Madrid, according to a Spanish newspaper.
Toxicology tests to determine whether Bice, 22, was under the influence of drugs or alcohol will not be known for one to three weeks, according to unnamed officials quoted in the Madrid newspaper ABC.
Bice apparently fell into the slow-moving waterway, which is near the nightclub from which he left alone to walk home. Bice was last seen in the early hours of Feb. 26 at a nearby fast food restaurant.
National police officials also said that Bice was found fully clothed with his wallet, money, credit cards and two cell phones.
Although officials in Spain have said no foul play is suspected, Bice's father said at a news conference Wednesday morning at the family's home in Carlsbad that he still thinks that's a possibility.
Larry Bice, who went to Madrid after his son disappeared, also disputed reports that his son was drinking heavily the night he was last seen.
"I don't think the drinking he did earlier precluded him from getting back home," he said.
He said his son had moderate drinking habits and was comfortable walking around Madrid. "There's something else going on," the father said.
He also noted his son was a very good swimmer and that there were ladders around the river that he could have climbed up.
"That's just not something you would just fall into," he said.
He and his wife, Pamela, also wish the investigation could be done sooner. "We want to know right now what it is. I do understand that these things take time and need to be done carefully," Larry Bice said.
The initial autopsy findings will be given to the Bice family. It will be up to the judge handling the case to determine if the results will be made public, a spokesman for Madrid's Superior Justice Tribunal said.
After the court receives the findings, a decision will be made as to when the body will be released to be returned home.
Bice, a Torrey Pines High School graduate, was a senior at San Diego State University. He was studying international business at the Universidad Carlos III de Madrid, where he a arrived in January for the winter semester.
firstname.lastname@example.com • (619) 293-1710 • Twitter@debbi_baker
firstname.lastname@example.com • (619) 293-5253Copyright © 2017, The San Diego Union-Tribune


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ORCHARD PARK, N.Y. -- Buffalo Bills tight end Joe Klopfenstein was placed on the injured reserve list Thursday.
Klopfenstein's exact injury is unknown. An injury settlement with the four-year veteran remains a possibility, which would allow him to play elsewhere in 2010 should he heal in time.
The Bills signed Klopfenstein two different times during the 2009 season, and he played in only one game, the season finale, making one catch for 11 yards.
Prior to 2009, Klopfenstein spent three seasons with St. Louis, which selected him in the second round of the 2006 draft. In 49 career games, Klopfenstein has 34 receptions for 397 yards and two touchdowns.


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ACParadise Network: American Cosplay Paradise American Cosplay Experience American Cosplay Snapshots
Cosplayer Arlette > Costume of Debbie DuPree (Sealab 2021)
- Most Recent Photo
- Series
- Sealab 2021
- Character
- Debbie DuPree
- Year Completed:
- 2004
- Construction Difficulty:
- Very Easy
- Costume worn at:
- Dragon*Con 2004
This Costume has been retired
About this Costume
- Construction Details:
Did this for an Adult Swim group at Dragon*Con. Anyway, the Sealab guys were there and had their pic taken with us. Afterwards, they put it on the air during a commercial bump. It was pretty sweet.
Add a Comment


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Well, not exactly, but you have to expect a headline like that from a Rangers fan. Right?
According to the Florida Panthers website today:
Sunrise Sports & Entertainment and the Florida Panthers announced today the restructuring of the hockey club's broadcast teams on FOX Sports Florida and Sports Talk 790 the Ticket for the 2009-10 NHL season. Steve Goldstein, Billy Lindsay and Randy Moller will return to the broadcast booth in 09-10, while Denis Potvin will not be retained. Goldstein will continue to handle television play-by-play duties with Lindsay joining him as color analyst, while Moller will call Panthers radio broadcasts on 790 The Ticket.According to the Sun Sentinel in Florida who spoke with Potvin this evening, the move is nothing personal. The Panthers have decided to eliminate one of the radio positions and instead rotated Bill Lindsay from his radio position to the TV role previously filled by Potvin.
"We look forward to teaming Steve "Goldie" Goldstein and Billy Lindsay on our television broadcasts and we are confident that they will provide entertaining and insightful commentary that will resonate well with our fans. Meanwhile, Randy Moller has done a superb job in the radio booth over the last two seasons providing our fans with exciting and colorful broadcasts that have gained attention on a local and national level." said SSE president & chief operating officer Michael Yormark. "Finally, the entire Florida Panthers organization would like to thank Denis Potvin and his family for their service to our club, and we wish him the best in his future endeavors."


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Current Newswire:
LinuxDevices.com: My Linux is smaller than your LinuxJun 11, 2000, 18:49 (0 Talkback[s])
(Other stories by Rick Lehrbaum)
WEBINAR: On-Demand
No-Size-Fits-All! An Application-Down Approach for Your Cloud Transformation REGISTER >
[ Thanks to LinuxDevices.com for this link. ]
"Unlike many realms of human endeavor, when it comes designing embedded systems, the goal is often to use as few resources as possible. In embedded systems, less is more, in many ways. Using less resources means less cost, less heat generation, more battery life, more reliability -- and best of all, a more successful product."
"During the past year, Linux has rocketed to prominence as one of the two or three most popular operating systems for new embedded system designs. Since "Embedded Linux" as a product is less than one year old, and given the common perception of Linux as a full-function server or desktop OS that requires hundreds of megabytes of disk space, it's no surprise that one of the most common questions about embedded Linux among developers is "How much RAM memory and disk space does an embedded system require to run Linux?"
"There are two reasons why it's difficult to answer that question with a few simple numbers. First, Linux is open source. As a result, developers possess the tools to eliminate unnecessary functionality to match the requirements of a given configuration. Secondly, embedded systems are incredibly diverse, so there are almost as many required Linux configurations as there are unique embedded systems (and that's in the tens of thousands)."
Related Stories:
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"He pumped her roughly, filling the room with the sounds of their breathing and the smell of their sin. She felt drunk, this man's harsh energy as intoxicating as ten bottles of wine. She stroked his chest and dug her fingernails into his shoulders. Spurs, telling him to make it rougher.—Cara McKenna, Don't Call Her Angel
No matter what intensity of romance novel you read—from kisses only to erotic—your favorite authors write some iteration of sex scenes.
Putting aside plot, and characterization, and overall readability, and all of that, who would you say writes the best sex in romance novels? (Bonus if you include specific scenes in your comment!)


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It Is Our honor To Present, Once Again, Joe G and The Globe
We love high-concept. We love vision. We love Joe G. Which is why we're just so damn excited about Globe's newest film, Strange Rumblings in Shangri-La, now in production at a surf break far from you. And, as usual, Joe G is pulling the puppet strings and my, how those puppets dance. Emphasizing exploration, fun and large living around the world, Joe and the crew, which includes faces old and new, are searching for surfing's Holy Grail — and perhaps making the best surf film ever. Stranger things have happened.
Brendon Gibbons, Iceland. Photo: DJ Struntz
SURFING: What's your vision for this project?
Joe G: Like Year Zero, we really love the conceptual stuff. Our goal is to tell a story in a fun way. Really, I want to make a fantasy or surrealized version of what we go through while making these surf films. That's the concept. A sort of unreal portrayal of surf travel. And though it's not a documentary, we'd like the film to have shades of some older documentaries from the '50s and '60s that aren't necessarily about surfing, but more about adventures. The project is inspired by Jacques Cousteau, the classic surf films of Bruce Brown and George Greenough, frozen piña coladas and a few other things that I can't talk about.
How does this film differ from Year Zero?
Well, I always try to evolve the way my crew and I make movies. I don't want to get stuck doing the same thing in the same way each time. In this film, we won't be going to the places that surfers usually go. Like, our first trip we went to Iceland [see our February 2013 issue]. Basically, I want to go to places that may be harder to score or get good clips, but go deeper, stay longer and have the film reflect that adventure. Then when we do score, it'll show how valuable that method is. And visually, we want it better than anything we've ever done.
So this is an action-adventure surf movie?
Well the whole theme of "adventure" in the film will be kind of tongue-in-cheek because you've got the real adventurers like Chris Malloy, who are serious. [laughs] Like, they're real explorers. But I'm not quite the man that he is. For instance, I could see us lasting three days tops camping and shooting in some harsh, faraway land before Dion, the gang and I would retreat to the finest hotel within 1,000 miles to regain our strength by occupying the penthouse suite and eating venison paired with a nice pinot noir while doing a casting for a bikini-scene shoot at the rooftop pool. We're not exactly hard core adventurers.
And who will be starring in this film?
The Globe team! Dion Agius, Nate Tyler, Taj Burrow, Yadin Nicol, CJ and Damien Hobgood. But this time we're also trying to get some of the younger guys in the spotlight — Alex Smith, Creed McTaggart and our latest addition to the gang, Brendon Gibbens. We also want to have our friends come along, so there will probably be a few surprise guests along the way…


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The man, aged in his 50s, was flown to hospital by air ambulance following the incident on Sunday, the West Midlands Ambulance Service said.
A medically-trained staff member was in the West Midland Safari Park in Bewdley, Worcestershire, at the time and treated the victim before the helicopter arrived.
An ambulance service spokeswoman said: "When crews and the doctor arrived, they found one of the park's snake handlers being cared for by their on-site first aiders.
"They had already immobilised the leg, administered excellent first aid and had anti-venom ready to administer if needed."
Although the patient was assessed as being stable and suffering no serious effects from the bite, he was airlifted to the Worcester Royal Hospital for his condition to be monitored.
The ambulance service spokesman explained: "Due to the fact the venom can be lethal if it enters the bloodstream, the man was airlifted to hospital as a precaution."


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Five Questions, plus More Free Band Names
I enjoyed the replies to the previous "Get To Know Me" blog, so here's a followup of sorts, another frequent visitor to my inbox that I finally replied to ----
A) Five places that I go to over and over: wild, crazy, out, the bathroom, to Hell in a handbasket
B) Five people who e-mail me (regularly): Nigerian Prince with Banking Problem, Viagra Salesman, British Barrister with Hitherto Unknown Inheritance from Hitherto Unknown Relative, Mail Returned: Unable to deliver, and Some Guy Who Thinks I Need a Larger Penis (As If it's Any of His Effin Business).
C) Five of my favorite places to eat: I usually eat food, not places, but if I DID eat places, I bet I'd like the Paris Hilton,
D) Five places I would rather be right now: Movin' on up, goin' way down, over there, nowheresville man, and anywhere but here.
E) Five TV Shows I watch: Twilight Zone, Dark Shadows, History's Mysteries, the Daily Show, and the Mexican soap opera De Pocas Pocas Pulgas, which translates to "Of few few fleas."
Free for all who wish to use, here's another list of band names I've been dreaming up, all so far unused (as far as I know). I designed most for maximum internet search possibilities and cult tie-in potential – if anyone ends up getting rich and/or famous using any of my band names, I expect you to at least buy me a large pizza....and maybe a Porsche ---
Oh yeah, I design band logos, record sleeves, and concert flyers too, so maybe hire me for that…
Danish Plato
Watchers From the Blind
P Test
Duodnym Duo
Same To You Bud
Why You I Oughtta
George LeRoy Tirebiter
Rizzuto's Revenge
The Hell You Say
Sickon U
Strapon Dickoff
Schwing Kings of Bling
Manos Hand of Fate
Zoey Loves Zeus
Aaark Aaark
The Steekin Badgers
There's No Need To Fear
Restless Natives
Nightmare Feet
The Saggy Baggies
My Fellow Terrariums
Pudding Pipers
Things Won't Leave
Not Wearing Pants
Spa Fon
Squa Tront
Quitcher Wining
Opposing Bums
Eye See Eeew
I.C. Underpants
He's Dead Jim
Giant Rats of
Monsters Due
Orion Slave Traders
Jenna's Douche
Way 2 Bigg
Mylar Zone
Bees, She Sees
Lionel and the Security Blankets
Thank You Mask Man
So Far So What
Zoso Mofos
The Whoop Woops
Jerkin Gerkins
WTF Whitey
Alba's Abs
Overlord Obscura
Yorga Counts
I Said Goode Daye
Broken GayDar
Tara La Bouvier
The Shoephones
Tents On Fire
Bitten by Barnabas
Attaway Castaway
Jay Men Forever
Beware of Torgo
Milk Me Dammit
Freaky Fantasm
Phrankly Phinks
Wish You Were Beer
It Takes Beef
Coconut Radio
Eggplant Revenge
I Got a Rock
Who Killed Todd Loren?
The Phoneups
The Homegrownups
Minor Murders
Max Madder
Themes of Josette
Chef Schweaty
The Shaft Workers
Scary Serling
Servants of Sexploitation
Cathouse Theater
The Hairy Poms
See Thru U (abbreviated as C/U)
Put That Thing Away
Robert's Ridge
Munchin Brady
Future Faire
Joel VS Mike
Miss B. Natural
Psycho Tsunami
The Friendly Giants
The Fraidy Scats
Sax Afire
Margo Escargot
The Pullout Nows
Nobody For President
Ducking Howard
Bare Whiz
The Golden Hind
Kitten Kundalini
Bunches of Hooey
Knot Insane
Fuggit Forgot
Fleas on Feet
Peeble's Pet
Wholly Moley
Cheez Toe
Demons of Demi
The Tube Grooves
Groovy Groo Bees
Bozo Buskers
The Dwarf Crushers
Rotten Cratchet
Cartman's Probe
More Science High
See Sigmund
The Vulcan Itch
Whynot Measles
Ribsey's Treat
Clams Got Legs
Highway Bloody Hwy
Whacko Mole
R.U. Nutts
Tearaway Newsome
Eyes of
Duz Not Die
Know Duh
Nose Hoes
Ghostly Trioka
Takeout Wrenched Ankle
Gallery of Night
Lowbrow Unibrow
The Unibrowser
Bundy's Bride
Buddy Buddha Breath
Zeta Zilch
The Beta Rays
The Crankups
Indoor Outhouse
Freddie Fullasheet
Return of Mr. Hand
Faster Phoebe and the Fallouts
Wot the Hey
V.A. Jay Jay
Gamma Made Me Green
Collector's Attrition
Lela's Eyeball
Finches of
Busted Chifarobe
Busted by Boo
The Tumblin' Tombstones
Stewie Luvs Rupert
The Giggity-gigs
Pigga Fuggen Name
More like this:
- Barnabas Collins Has Risen From the Grave (Again!) - the Return of Dark Shadows — Feb. 9, 2011
- A Most Exceptional Duck — April 24, 2010
- Why I Don't Like Hippies — March 3, 2010
- Tim Curry Rocks, Tower Bar Rebuilt, Love-In Musical, Local Recording Studios, more — March 30, 2009
- The Day the Monkees Turned Del Mar Into Clarksville — Sept. 16, 2007


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The iconic marquee of the former Warwick Theatre in Marblehead is going nowhere. The structure behind it, however, may be another story. And whether that marquee will one day once again advertise the new releases currently being screened inside is yet another matter, but one that at least a couple of residents are hoping to make a reality.
The iconic marquee of the former Warwick Theatre is going nowhere. The structure behind it, however, may be another story. And whether that marquee will one day once again advertise the new releases currently being screened inside is yet another matter, but one that at least a couple of residents are hoping to make a reality.
Property owner Eijk van Otterloo has filed plans with the Marblehead Planning Board to remove the existing buildings to the left of the Rechabite Building housing the Spirit of '76 bookstore down to Anderson Street and replace them with a three-story, 38,400-square-foot development that would house commercial space on the first floor and offices on the top two floors.
The project was slated to undergo the town's voluntary design-review process on Friday and come before the Planning Board on Feb. 8. The Zoning Board will also be reviewing the plans, in part because the project calls for a lot with only 89 spaces in the area behind the proposed buildings on Pleasant Street bordered by Anderson Street and Roundhouse Road while the town's zoning bylaw would require 128.
As to the former theater, which closed its doors on Oct. 28, 1999, and reopened sometime later as the YMCA's gymnastics center, the plans would "restore and conserve existing original elements at façade, canopy and signage." That includes the marquee, which would have its lettering "reconditioned." The rest of the façade would be beautified as well but would still be recognizable to longtime residents.
Attorney Paul Lynch, who represents van Otterloo, argues that the project as a whole will "revitalize downtown."
20-20 vision
Lynch added that incorporating a movie theater into the project "has not been ruled out."
"I'm sure [van Otterloo is] looking at all avenues of proposed uses," Lynch said.
Local architect Michael McCloskey is hoping, however, that a window is now open to make a reality a dream he has been pursuing for five years —seeing movies return to Marblehead.
While stressing that no plans had yet to be submitted to van Otterloo, he suggested that he and Marblehead 20-20 partner Harold Blank are actively investigating the possibility, revising floor plans and business plans to fit within the confines of van Otterloo's proposed project. He hoped preliminary architectural plans could be pulled together by the end of the week.
McCloskey's general vision has long been in place, however, for a "fairly small" but high-tech two-screen theater with luxury seating and "very upscale" food and beverage service. In one of the theaters, the plan would be to erect a stage suitable for hosting concerts or plays, and the hope would be also to install digital equipment capable of streaming live programming via the Internet, like sports events or shows from the Metropolitan Opera. The hope is to provide a different, more "intimate" experience than heading to the mall multiplex, according to McCloskey.
McCloskey envisions the facility as a "community-based theater" rather than a private enterprise. Such a theater would run on subscriptions and possibly be staffed by volunteers, according to McCloskey, noting that there are theaters operating under such a model in Cambridge and elsewhere.
It's not too soon for volunteers to start coming forward, either, McCloskey stressed. If a Marblehead movie theater is to become a reality, McCloskey said volunteers with expertise — carpenters, craftsmen, technicians — will be particularly valuable. But the contributions of "anybody and everybody" would be welcome, he added.
Anyone interested in getting involved can contact McCloskey at email@example.com or email@example.com.


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Fellows tutors Patrick in NASCAR
DEAN McNULTY, QMI Agency
, Last Updated: 11:28 PM ET
MONTREAL - If Danica Patrick finishes anywhere near the top five or top 10 on Saturday in the NASCAR Nationwide NAPA 200 at Circuit Gilles Villeneuve, she said she will owe Ron Fellows big time. Patrick said that in preparation for her first attempt at NASCAR road racing, she spent a day and about 100 laps or so at Road Atlanta earlier this month being tutored on the finer points of turning a 3,300-pound stock car both left and right. With my IndyCar background, with all the bells and whistles that we use, we can get instant feedback on what we are doing lap over lap compared to other drivers, she said. In NASCAR you dont have that, so what Ron was able to show me in testing was invaluable. Fellows, who has five Nationwide victories on his resume, including a 2008 win at Montreal, will be Patricks teammate with JR Motorsports, owned by Dale Earnhardt Jr., this weekend. She will drive the No. 7 Chevrolet and he will drive the same No. 5 Chevrolet that ran second earlier this season at Road America. Patrick said she was amazed watching how Fellows went into corners in the stock cars. It was beneficial for me just to see how deep he drove into corners, Patrick said. He really did do a good job. More than just watching, Patrick said, she was able to try to do what Fellows was doing in real time on the track. Just being able to compare myself to him throughout the day ... it was just so good to watch and learn how he does things in a stock car, she said. We certainly will be able to use what I learned from Ron on the race weekend.


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Directories / Files turned into pipes !
Hello, I've had this problem before, and it conked a server tonight. We have Dell PowerEdge servers with PERC controllers and SAS drives. One of the drives will fail, and even after rebuilding the drive, after reboot, the system is corrupted. It fails with the dreaded
Kernel panic - not syncing: Attempted to kill init!
Today I had a server do this, and upon mounting the bad partition, I see that the /lib directory has been turned into a pipe!
[root@slinux dm-0]# ls -l
What causes this? Is there an easier way to recover from this kind of error?
Edit: I successfully recovered the server, just had to drop to a shell and fsck 3 times, after copying /lib from the other server. If anyone knows an alternate way of recovering a directory from becoming a pipe, please let me know. It looks like all the files were moved into the "pipe" and maybe could have been repaired.
Should I expect better stability if I were to put my system files in ext3 file systems directly on disk partitions, rather than using LVM?
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