text:
- Age / Gender:
- 26, Male
- Location:
- Belgium,Antwerp
- Joined:
- 7/8/07
- All Stats >
Bam chicka wah wah
User Statshot
- Community Stats
Level 11 Blank Slate
Normal Whistle
Ranked as Civilian
Contact Info / Websites
Latest Games
Latest News
I recently discovered the program Fruity Loops, it didn't take long to create a pretty neat
loop in the program. SO I wanted to upload the little bugger into the Audio Portal and they we're all like:
We must check blah blah Administration blah blah, WITHIN 2 DAYSIT SHOULD BE ONLINE blah blah blaaaah.
I found myself waiting for almost a week and still no response, no conformation, no rejection, no squat!
So WTF, it's a very simple basic breakbeat/hip hop stylish small loop(about 5-10 seconds!)
ANyone knows whattehell is wrong? I'm working and learning to create new songs in Fruity Loops and I hope to become a contributor to the Audio Portal but if Newgrounds fails, it would be the first time for me to happen.
Can someone tell me whatthefuck is wrong?
Latest Favorite Audio
|Drum N Bass Song
|-I Can Fly-
|Drum N Bass Song
|Dubstep Loop
|Tetris Dub Ft Super Mario
|Dubstep Song
Latest Favorite Movies
Latest Favorite Games
Recent Game Medals
Total Medals Earned: 71 (From 15 different games.)


text:
|Publication number
|Publication type
|Application number
|Publication date
|16 Nov 1999
|Filing date
|6 Aug 1997
|Priority date
|29 Jan 1996
|Fee status
|Publication number
|Shane P. Leiphart
|Original Assignee
|Micron Technology, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (12), Non-Patent Citations (2), Referenced by (53), Classifications (20), Legal Events (8)
|External Links: USPTO, USPTO Assignment, Espacenet
This application is a continuation-in-part of application Ser. No. 08/593,227 filed Jan. 29, 1996, abandoned, and a continuation-in-part of application Ser. No. 08/629,440 filed Apr. 8, 1996, now U.S. Pat. No. 5,705,042.
1. Field of the Invention
This invention relates to a collimator for use in sputter deposition of films on semiconductor wafers, and a method for using the same. More specifically, the invention relates to the use of a collimator at a free-floating electrical potential, preferably in combination with a negative bias to the wafer, for enhanced step coverage of the wafer. In order to maintain the collimator and, optionally, lower shield at the free-floating potential in a manner suitable for effective and repeatable operation, a kit providing a modified support structure has been invented, as well as a deposition chamber so modified and a method of deposition.
2. State of the Art
Sputtering is a method of depositing thin metal and insulating films onto semiconductor wafers. The term "wafer" includes not only traditional wafer structures, but also other substrates exhibiting an outer layer of semiconductor material useful for formation of integrated circuits thereon, including without limitation so-called silicon-on-insulator, or "SOI", structures. The term sputtering describes a physical mechanism in which atoms are dislodged from the surface of a material by collision with high energy particles. Sputtering has become a widely utilized deposition technique for a variety of metallic films in semiconductor and integrated circuit (IC) fabrication, including aluminum, aluminum alloys, platinum, gold, tungsten, titanium and titanium:tungsten. Sputtering is also used in some applications to deposit molybdenum, Si, SiO2 (silica glass), and refractory metal silicides, although CVD (chemical vapor deposition) or evaporation may be more frequently used for deposition of such materials.
Sputtering takes place in an evacuated chamber. In general, the sputtering process may be summarized in four steps: 1) ions are generated and directed at a target; 2) the ions sputter (dislodge) target atoms; 3) the ejected (sputtered) atoms are transported to the substrate, where 4) they condense and form a thin film.
The energetic particles used to strike target materials to be sputtered in sputter deposition systems are generated by glow-discharges, a glow-discharge being a self-sustaining type of plasma. A plasma may be defined as a partially ionized gas containing an equal number of positive and negative charges, as well as some other number of non-ionized gas particles. Generally, a noble gas, usually argon (although at least neon and xenon have also been employed) comprises the plasma.
One drawback of sputtering is the difficulty in achieving conformal coverage deep within high aspect ratio features on semiconductor wafers. In sputtering, the trajectory of the atomic material sputtered from the target depends in significant part upon the incident angle of the bombarding atom. Accordingly, atoms directed towards the wafer surface come from varying angles, only a relatively small portion of which arrive at the wafer surface in a substantially perpendicular angle in comparison to the other angled atoms. Atoms reaching the substrate surface via non-perpendicular trajectories provide an undesired drawback of not conformally coating deep within high aspect ratio features.
To overcome such a drawback, a device known as a collimator is used. A collimator typically comprises a disk-shaped object having a plurality of holes or openings provided therethrough. The collimator functions effectively as a filter, essentially restricting the path of the sputtered particles to the desired perpendicular or near-perpendicular and allowing only these particles to pass through the collimator and coat the substrate surface, which is normally a semiconductor wafer. This path restriction to substantially perpendicular angled particles results in a more conformal deposition within high aspect ratio features than is possible when a collimator is not used.
Another method used to improve step coverage within contacts is to increase the acceleration of ions from the discharge toward their surfaces. The impinging ions transfer energy to surface atoms, and cause them to be transported to the sidewalls of steps, where they accumulate and locally increase film thickness.
One aspect of the use of a prior art collimator is that it is mounted in a sputter chamber in such a manner that the collimator and the chamber are both grounded. This grounded configuration causes the collimator to behave as a plasma barrier in both directions. The parent and grand-parent applications hereto disclose apparatus and method of using the same that allow improved conformal coverage deep within high aspect ratio features on semiconductor wafers and IC's. This result was achieved by providing a collimator and method of using the same wherein the collimator is not an electrical plasma barrier.
The parent and grand-parent application hereto also disclose the use of an rf bias to the substrate (wafer) for enhanced attraction of plasma ions for reactive sputtering as well as control or inhibition of "pinch off" of high aspect ratio features by the deposited film of target material, wherein material deposited at the upper extent of recessed features effectively precludes coverage of the bottoms thereof.
As taught by the referenced prior applications, a collimator is mounted within a sputter chamber and is interposed between a sputter target and a semiconductor wafer to be coated with a thin film of the sputtered material. The collimator is mounted within the sputter chamber in an insulated manner so that the collimator is electrically isolated from the chamber and the collimator is able to take on a floating electrical potential of or associated with the potential of the plasma generated within the sputter chamber.
In practicing the above-referenced invention, however, the inventor herein has recognized that it is difficult to provide a collimator isolator structure which is robust enough to withstand repeated sputtering operations without shorting and without accumulating deposits of target material in undesired areas between the source and the collimator. In addition, the inventor has recognized the merits of extending electrical isolation of the collimator to the shield below the collimator located between the collimator and the wafer), in contrast to the grounded lower shields of the prior art.
The present invention comprises a kit for electrically isolating a collimator and, optionally, the lower shield of a plasma vapor deposition chamber, a chamber so modified, and a method of using the modified chamber.
The kit comprises an anodized aluminum receiving ring, which is secured to the grounded source adaptor of the chamber surrounding a target bore in the adaptor, through which particles of target material travel toward the wafer or other semiconductor substrate. A collimator adaptor ring, which may be formed of stainless steel, includes a radially outwardly projecting annular flange, the undersurface of which rests on a radially inwardly-extending annular flange or lip of the receiving ring. The anodized receiving ring surface electrically isolates the adaptor ring, and thus the collimator carried thereby suspended in alignment with the source adaptor target bore, from the grounded source adaptor.
An annular shield, commonly termed a "top hat" in the art, which extends below the collimator and laterally around the chamber volume between the collimator and the wafer or other semiconductor substrate surface may also be optionally electrically isolated from the source adaptor by suspending it from a mounting structure, such as a shield mounting ring, suspended from the collimator adaptor ring. Electrical isolation of the shield, which then is maintained at a floating potential like the collimator, has been demonstrated to broaden erosion at the outer lateral periphery of the wafer or other substrate surface, reduce erosion at the inner region thereof, and enhance uniformity and increase planarity of the target material film deposited thereon when used in conjunction with the electrically isolated collimator. Of course, the shield may alternatively be directly connected to the source adaptor if desired, as described below.
FIG. 1 is a schematic cross-sectional view of a prior art having a collimator grounded to the sputtering chamber;
FIG. 2 is a schematic cross-sectional view showing the function of a typical collimator;
FIG. 3 is a schematic cross-sectional view of a sputtering chamber with collimator mounted in an insulated manner in accordance with the present invention;
FIG. 4 is an enlarged, schematic, partial cross-sectional view of a portion of a source adaptor with one embodiment of the electrical isolation kit of the invention installed thereon;
FIG. 5 is an enlarged, schematic, partial cross-sectional view of a portion of a source adaptor with another embodiment of the electrical isolation kit of the invention installed thereon and with a collimator in place;
FIG. 6 is an enlarged, schematic, partial cross-sectional view of a portion of a source adaptor with a prior art collimator and shield suspension structure in place; and
FIG. 7 is an enlarged, schematic, partial cross-sectional view of a portion of a source adaptor depicting a mounting arrangement for the kit of the present invention as an alternative to the arrangement of FIG. 3.
FIG. 1 shows a sputtering chamber 10 equipped with a collimator 20, in a typical prior art configuration. Collimator 20 is located between target mount 30, holding substantially planar target 40, and substrate or wafer 50. Wafer 50 includes a plurality of features 60 which are to be filled with sputtered particles deposited onto wafer 50 during sputter coating. Collimator 20 is preferably machined out of a machinable metal, such as aluminum, copper, stainless steel or titanium, though any suitable material may also be used. The particular material chosen will depend upon the material being sputtered, and the respective adherence characteristics of the two materials.
Other conventional parts of the sputter apparatus include a gas supply and flow controls 32 to control the gas flow into chamber 10 and an exhaust vacuum pump 34 which creates a vacuum in chamber 10 during processing of substrate wafer 50. A shield 36 surrounds wafer 50.
Collimator 20 includes flat member 22 with a plurality of substantially parallel passages 24 machined therethrough. Collimator 20 is mounted between target 40 and wafer 50. Generally collimator 20 is mounted approximately halfway between target 40 and wafer 50, but placement of collimator 40 is variable depending upon the particular fabrication objectives.
The function of collimator 20 can be demonstrated by exemplary directional arrows 70 and 72, in FIG. 2. Directional arrows 70 and 72 depict potential trajectories of travel by sputtered particles as they progress from target 40 to wafer 50. The path of arrow 70 is the ideal trajectory and is a direct, or 90� perpendicular, route from target 40 to wafer 50, through passage 24, and is not directionally influenced by the presence of collimator 20. In the case of a sputtered particle traveling along trajectory of arrow 72, however, the particle is guided unimpeded through one of passages 24 and deposits upon wafer 50. In the case of arrow 74, the trajectory follows an undesirable path and is prevented by collimator 20 from reaching the surface of wafer 50.
During a normal sputtering cycle, as shown in FIG. 1, target mount 30 is connected to power supply 80, establishing a voltage potential between grounded chamber 10 and target 40, mounted onto target mount 30. The negative terminal of power supply 80 is connected to target mount 30 and the positive terminal is grounded to chamber 10. In a typical configuration, as is well known in the art, collimator 20 is mounted in chamber 10 in such a manner that it is grounded to chamber 10. During sputtering, support 52, having substrate 50 thereon, is moved upwardly into a processing position in chamber 10. Positive ions in the plasma generated from the gas resident within chamber 10 are drawn toward and strike or bombard negatively-charged target 40, dislodging or sputtering portions or particles of the target material, which particles are accelerated toward substrate 50, which may be optionally negatively biased.
FIG. 3 is a schematic view of a sputtering chamber 10 modified in accordance with the present invention having collimator 20 mounted therein between target mount 30 and substrate 50. Collimator 20 for the present purposes is mounted within chamber 10 in an insulated manner so that the collimator is electrically insulated or isolated from the chamber and the collimator is able to take on a floating electrical potential associated or related to that of the plasma generated within chamber 10. In one embodiment, collimator 20 is mounted in chamber 10 using high voltage ceramic insulators 21, but any appropriate means of insulating collimator 20 from chamber 10 can be used. In practice, ceramic insulators have proven to present heat transfer problems between the collimator 20 and the structure supporting ceramic insulators 21, as well as mechanical reliability problems.
Target 40 is maintained at a negative, preferably dc, bias during sputtering, while substrate 50 is maintained at a negative potential through, preferably, an rf voltage as shown at 90.
Other parts of sputter chamber 10 illustrated in FIG. 3 are conventional and the same numerals are used as for similar parts in FIGS. 1 and 2.
Since in the prior art, as in FIG. 1, collimator 20 is grounded to chamber 10, collimator 20 becomes a barrier to plasma passage in both directions.
In the sputter deposition of thin metal and insulating films onto semiconductor wafers, it is desired that the thin films maintain a uniform thickness and freedom from cracks or voids. As sputtered thin films cross steps that occur on the surface of the underlying substrate, they may suffer unwanted deviations from the ideal, such as thinning or cracking. A measure of how well a film maintains its nominal thickness is referred to as the step coverage of the film, and is expressed as the percentage of the nominal thickness that occurs at the step.
Step coverage of 100% is ideal, but each process is normally specified by a lesser minimum value that is acceptable for a given application. The height of the step and the aspect-ratio of the feature being covered also determine the expected step coverage. That is, the greater the height of the step, or the aspect ratio (i.e., the height-to-spacing ratio of two adjacent steps or, with specific reference to holes or vias in a substrate, the depth-to-width ratio), the more difficult it is to cover the step without thinning of the film, and hence the worse the expected step coverage.
There is particular difficulty in obtaining coverage of the lower (e.g., deeper) regions of high aspect-ratio features, over and above the above-mentioned difficulties. This is the result of a phenomenon termed "pinch off", wherein target material deposited at the top or within the mouth of the recessed feature accumulates and narrows the opening through which target material may reach the bottom of the feature. Prior art collimators have purportedly reduced pinch off to some extent. However, the continued reduction in size (especially aperture width) of surface features on a wafer, in combination with increased relative depth of apertures necessitated by the large number of layers employed in state-of-the-art semiconductors, presents increasing step coverage problems even with collimator-reduced pinch off. While high aspect ratio collimators may be used to address this problem, the "over-filtration" of particles attendant to the use of such collimators greatly protracts sputtering times and increases costs for a given film thickness and step coverage.
One method to improve coverage is to increase the acceleration of the plasma ions. The impinging ions from the plasma transfer energy to surface atoms, and cause them to be transported to the sidewalls of steps, where they accumulate and locally increase film thickness along with re-sputtering from the wafer surface.
An advantage of this invention is that by electrically isolating collimator 20, plasma passes through it with great ease relative to grounded chamber 10, resulting in substantially enhanced plasma concentration or density between collimator 20 and substrate or wafer 50. Because of this, wafer 50 experiences a much higher flux of ions from the plasma. Certain types of sputtering, for example reactive sputtering, involve the incorporation of components of the sputtering gas into the film. That is, in some circumstances, the film reacts with all or some of the sputtering gas and forms a compound film with it. The degree or rate of reaction is aided by ion bombardment and having the reaction components in ionized or excited form.
An insulated collimator, as with this invention, allows for ionized gas components to exist in significant concentrations near the wafer. The bombardment of these ionized gas components will allow for any chemical reactions with the film to proceed faster (i.e. lower the activation energy for reaction). This is important in many cases of reactive sputtering where the partial pressure of the reactive component needs to be kept to a minimum. It is well known that, at some partial pressures, the sputtering target surface will be reacted. This is almost always accompanied by a dramatic drop in deposition rate. It is desirable to keep the partial pressure low enough to have an unreacted target surface but still have enough of a concentration of reactive gas to produce the desired film. Having ionized reactive species will decrease the reaction activation energy and produce the desired film at a lower partial pressure than in the case of a grounded collimator.
Also, because an insulated collimator allows for significant plasma penetration relative to a grounded one, the effects of application of a negative, preferably by rf, electrical bias to wafer 50 will be enhanced. Electrical biasing of wafer 50 is a common technique used to modify film properties. This includes film stress, step coverage, morphology and composition, to name a few. However, unless plasma exists near the biased wafer features, there will be little or no ion contact with the wafer and minimal enhancement of film properties. Prior art sputtering apparatus and structures, through use of a grounded collimator, effectively precluded a substantial plasma presence in the area between the collimator and the wafer. The present invention, with collimator 20 maintained at its floating potential, provides for a substantially enhanced presence of plasma ions attracted (and accelerated) by the negative potential of the rf-biased wafer.
In addition to the foregoing advantages of combining an electrically isolated collimator with a negatively-biased wafer, it has been recognized by the inventor that the rf bias of the wafer or substrate, in combination with the enhanced presence of plasma ions in proximity to the wafer, provides for reduction or control of the aforementioned "pinch off" of high aspect ratio features by sputtering of excess target material accumulating in the pinch off region, thus preventing premature narrowing or even closure of the top or entry area of a feature which would preclude insufficient bottom coverage of that feature.
A kit for modifying conventional plasma vapor deposition chambers has been developed by the inventor, in order to provide an effective, robust, relatively simple structure for effecting the aforementioned electrical isolation of the collimator, as well as optional isolation of the shield (previously referenced herin as 36) extending about the volume between the collimator 20 and the wafer support 52. While the kit has specific applicability to an Applied Materials, Inc. (Santa Clara, Calif.) Endura 5500 physical vapor deposition tool, the same kit, with dimensional and accessory variations, may be employed to accommodate the design of PVD tools offered by other vendors, such as Varian Associates, Inc. of Palo Alto, Calif.
FIG. 4 shows an enlarged view of one side of a lower portion of source adaptor 100 (see FIG. 3 for general positioning of source adaptor 100 within chamber 10), within which target 40 at a negative potential is disposed from target mount 30 in electrical isolation from source adaptor 100 and grounded chamber 10, as schematically shown in FIG. 3. Source adaptor 100 is water-cooled with circulating channels therethrough, as known in the art, and defines an internal, circular target bore 102 above lower surface 104, which includes a plurality of spaced, threaded holes 106 formed therein at intervals around target bore 102. An insulated aluminum collimator receiving ring 110, which may be comprised of anodized 6061-T6 aluminum, is secured, as by bolts 112 extending through bores 114 and threaded into adaptor threaded holes 106 on the lower surface 104 of source adaptor 100. Alternatively, in another source adaptor configuration 100', bolts 112 may extend through unthreaded bores 310 in a flange 300 extending radially inwardly in target bore 102 (see FIG. 7) and into threaded apertures 302 bored and tapped into a support ring 304 resting on the upper surface 306 of flange 300.
Collimator receiving ring 110 comprises an outer wall 116 through which bores 114 extend, and an annular flange or lip 118 extending radially inwardly from wall 116 at the lower extent thereof The outer surface of the collimator receiving ring 110, including the interior of bores 114, is clear, hard anodized, preferably to a thickness or depth on the ring surface of about 6 mils (0.006 inch). Thus, ring 110 and components suspended therefrom are electrically isolated from grounded source adaptor 100.
A stainless steel collimator adaptor ring 130 is disposed within the inner surface 120 of wall 116, and rests on upper surface 122 of flange 118. Collimator adaptor ring 130 may be formed of 316 stainless steel, and includes a circular, vertical wall portion 132 from which annular flange 134 extends radially outwardly over flange 118 of collimator receiving ring 110, by which adaptor ring 130 is suspended from the former. The outer radius of annular flange 134 is less than the radius of inner wall surface 120 by a horizontal distance X, and the vertical distance (height of wall surface 120) between upper flange surface 122 of receiving ring 110 is greater than the thickness of flange 134 by a vertical distance Y, according to design considerations set forth below. At the bottom of wall portion 132 of adaptor ring 130, annular lip 136 extends radially inwardly. Holes 138 are formed through lip 136 at circumferential intervals, holes 138 being topped by enlarged bores 140 for receiving the heads of bolts 142 extending downwardly through holes 138 and through shield (commonly referred to as a "top hat") mounting ring 150, from which shield 36 welded thereto is suspended. A bolt head cover ring 160 lies over the heads of bolts 142, and collimator 20 (not shown in FIG. 4) rests on cover ring 160. Cover ring 160 is significant in protecting the heads of bolts 142 from deposition of target material; otherwise, the bolts 142 might become sealed with deposited target material to the collimator adaptor ring 130, preventing their removal when desired.
Referring to distances X and Y as shown in FIG. 4, it will be appreciated that each should be minimized insofar as is possible while accommodating heat-induced expansion of receiving ring 110 and adaptor ring 130 to prevent contact and consequent potential for binding and warping of the two elements, as well as destruction of the anodized surface on wall 116 from such contact. Distance X is minimized in order to maximize the mutual horizontal, annular contact surface area between flanges 118 and 134 to maximize heat transfer therebetween. Distance Y is minimized in order to preclude, to the extent possible, entry of target material between lower surface 104 of source adaptor 100 and flange 134 of adaptor ring 130, in order to reduce the possibility of shorting the collimator 20 to ground (source adaptor 100) through adaptor ring 130.
Further, it will be noted that the edge or corner surfaces of receiving ring 110 and adaptor ring 130 which lie in close physical proximity have been rounded, as at 162 and 163, to minimize localized electrical field strength and thus reduce the likelihood of breaking down the surface anodization of receiving ring 110. It is noted that anodization has been demonstrated to break down above certain differential voltage levels. As the collimator lies at a floating voltage potential (typically 30 to 40 volts) attributable to the plasma potential environment rather than at ground, this design feature is of some significance in achieving commercially-viable longevity of the collimator and shield support structure.
It will be appreciated from the foregoing description that shield 36 is electrically isolated from source adaptor 100 in this embodiment, since it is suspended from adaptor ring 130. In the embodiment of FIG. 5, wherein previously-described features are identified by the same reference numerals, shield 36 is grounded by its direct connection to source adaptor 100 by bolts 112 secured thereto. Collimator 20 carried by receiving ring 130a (modified by deletion of bolt holes 138) resting on flange 118 of adaptor ring 110, remains electrically isolated.
By way of structural comparison, FIG. 6 illustrates the prior art structure for suspending collimator 20, wherein a stainless steel collimator adaptor ring 200, as well as shield 36, is directly bolted to source adaptor 100 by bolts 202 extending through holes 204. A variation of this design intended to electrically isolate collimator 20 while providing adequate conductive cooling for collimator 20 was attempted by the inventor, using a collimator adaptor ring 200 formed of aluminum with an anodized exterior surface. However, mechanical stresses in combination with thermal cycling caused structural failure of the relatively frail aluminum ring, and the ease with which the anodizing chipped off the edges and interior of the holes 204 during installation and removal of collimator 20 often caused shorting of the collimator to ground, thus rendering the structure inoperable in terms of the present invention for any extended duration. While the anodization on the interior of bores 114 of receiving ring 110 may also chip, this is of no significance as the anodizing on the upper surface 122 of flange 118 maintains its integrity.
It has been ascertained that the structure of FIG. 4 provides operational advantages insofar as deposition of the target material is concerned. Specifically, the use of an electrically isolated or "floating" shield 36 has been observed to improve the uniformity or planarity of target material deposition on the wafer 50 in comparison to results achieved with a floating collimator in combination with a grounded shield. This appears to be due to an increase or extension of erosion of the wafer material toward the outer periphery of the exposed wafer surface, and a decrease of such erosion in the central region of the wafer.
While there is shown and described the preferred embodiment of the invention, it is to be distinctly understood that this invention is not limited thereto but may be variously embodied to practice within the scope of the following claims.
|Cited Patent
|Filing date
|Publication date
|13 Jan 1978
|25 Sep 1979
|Polyohm, Inc.
|Magnetron sputter cathode assembly
|30 Dec 1991
|29 Jun 1993
|Materials Research Corporation
|Extended lifetime collimator
|23 Oct 1991
|19 Jul 1994
|Varian Associates, Inc.
|Collimated deposition apparatus and method
|11 May 1993
|13 Sep 1994
|Andrew Barada
|Sputter coating collimator with integral reactive gas distribution
|17 May 1993
|4 Apr 1995
|Applied Materials, Inc.
|Cleaning of a PVD chamber containing a collimator
|16 Sep 1993
|25 Apr 1995
|Micron Technology, Inc.
|Sputtering with collinator cleaning within the sputtering chamber
|29 Oct 1993
|11 Jul 1995
|Applied Materials, Inc.
|Collimation hardware with RF bias rings to enhance sputter and/or substrate cavity ion generation efficiency
|17 Sep 1993
|26 Dec 1995
|Varian Associates, Inc.
|Method for controlling a collimated sputtering source
|8 Oct 1993
|9 Jan 1996
|Helmer; John C.
|Physical vapor deposition employing ion extraction from a plasma
|23 Jan 1995
|18 Jun 1996
|The Boc Group, Inc.
|Cylindrical magnetron shield structure
|24 Oct 1994
|27 Aug 1996
|Applied Materials, Inc.
|Cleaning of a PVD chamber containing a collimator
|Title not available
|Tetsuya et al., Patent Abstracts of Japan , vol. 18, No. 215 (C 1191), Publication No. 6 10125 (Jan. 18, 1994).
|Tetsuya et al., Patent Abstracts of Japan, vol. 18, No. 215 (C-1191), Publication No. 6-10125 (Jan. 18, 1994).
|Citing Patent
|Filing date
|Publication date
|18 Mar 1999
|19 Jun 2001
|Hyundai Electronics Industries Co., Ltd.
|Radio frequency sputtering apparatus and film formation method using same
|1 Oct 1998
|7 Aug 2001
|Silicon Genesis Corporation
|Collection devices for plasma immersion ion implantation
|14 Jun 2000
|1 Oct 2002
|Silicon Genesis Corporation
|High temperature implant apparatus
|27 Jun 2001
|4 Feb 2003
|Silicon Genesis Corporation
|Method for non mass selected ion implant profile control
|28 Mar 2002
|16 Sep 2003
|Motorola, Inc.
|Method for forming a sputtered layer and apparatus therefor
|18 Jun 1997
|14 Oct 2003
|Silicon Genesis Corporation
|System for the plasma treatment of large area substrates
|30 Sep 2002
|21 Nov 2006
|Tokyo Electron Limited
|Method and apparatus for an improved deposition shield in a plasma processing system
|30 Sep 2002
|12 Dec 2006
|Tokyo Electron Limited
|Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
|19 Mar 2004
|16 Jan 2007
|Tokyo Electron Limited
|Method and apparatus for an improved optical window deposition shield in a plasma processing system
|30 Sep 2002
|23 Jan 2007
|Tokyo Electron Limited
|Method and apparatus for an improved baffle plate in a plasma processing system
|30 Sep 2002
|17 Apr 2007
|Tokyo Electron Limited
|Method and apparatus for an improved bellows shield in a plasma processing system
|14 Dec 2004
|16 Oct 2007
|Tokyo Electron Limited
|Method and apparatus for an improved baffle plate in a plasma processing system
|18 Mar 2004
|6 Nov 2007
|Tokyo Electron Limited
|Barrier layer for a processing element and a method of forming the same
|30 Mar 2006
|8 Apr 2008
|Intel Corporation
|Adjustable suspension assembly for a collimating lattice
|3 Feb 2005
|24 Feb 2009
|Tdk Corporation
|Ion beam irradiation apparatus and insulating spacer for the same
|8 Dec 2004
|30 Jun 2009
|Tokyo Electron Limited
|Method and apparatus for improved baffle plate
|17 Mar 2004
|14 Jul 2009
|Tokyo Electron Limited
|Method for adjoining adjacent coatings on a processing element
|5 Dec 2006
|28 Jul 2009
|Tokyo Electron Limited
|Method and apparatus for an improved upper electrode plate in a plasma processing system
|23 Oct 2006
|28 Jul 2009
|Tokyo Electron Limited
|Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
|11 Jan 2005
|13 Oct 2009
|Tokyo Electron Limited
|Plasma processing system and baffle assembly for use in plasma processing system
|5 Feb 2007
|16 Mar 2010
|Tokyo Electron Limited
|Method and apparatus for an improved bellows shield in a plasma processing system
|28 Nov 2003
|24 Aug 2010
|Tokyo Electron Limited
|Internal member of a plasma processing vessel
|5 Jan 2007
|12 Oct 2010
|Tokyo Electron Limited
|Method and apparatus for an improved optical window deposition shield in a plasma processing system
|27 May 2003
|7 Dec 2010
|Tokyo Electron Limited
|Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
|31 Oct 2007
|1 Feb 2011
|Tokyo Electron Limited
|Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
|7 May 2007
|15 Nov 2011
|Tokyo Electron Limited
|Method and apparatus for an improved baffle plate in a plasma processing system
|6 May 2008
|15 Nov 2011
|Applied Materials, Inc.
|Microwave rotatable sputtering deposition
|16 Oct 2006
|21 Feb 2012
|Tokyo Electron Limited
|Apparatus for an improved deposition shield in a plasma processing system
|5 Jan 2007
|21 Feb 2012
|Tokyo Electron Limited
|Method and apparatus for an improved baffle plate in a plasma processing system
|14 May 2008
|8 Jan 2013
|Applied Materials, Inc.
|Microwave-assisted rotatable PVD
|16 Jul 2010
|28 May 2013
|Tokyo Electron Limited
|Internal member of a plasma processing vessel
|24 Feb 2011
|25 Mar 2014
|Applied Materials, Inc.
|Index modified coating on polymer substrate
|24 May 2013
|4 Nov 2014
|Tokyo Electron Limited
|Internal member of a plasma processing vessel
|6 Apr 2011
|9 Dec 2014
|Intermolecular, Inc.
|Control of film composition in co-sputter deposition by using collimators
|15 Mar 2013
|28 Apr 2015
|Applied Materials, Inc.
|Low shrinkage dielectric films
|5 Mar 2014
|9 May 2017
|Applied Materials, Inc.
|Self-centering process shield
|3 Feb 2005
|29 Sep 2005
|Tdk Corporation
|Ion beam irradiation apparatus and insulating spacer for the same
|30 Mar 2006
|4 Oct 2007
|Norman Robert L Jr
|Adjustable suspension assembly for a collimating lattice
|18 Mar 2008
|24 Sep 2009
|Applied Materials, Inc.
|Coaxial microwave assisted deposition and etch systems
|6 May 2008
|12 Nov 2009
|Applied Materials, Inc.
|Microwave rotatable sputtering deposition
|14 May 2008
|19 Nov 2009
|Applied Materials, Inc.
|Microwave-assisted rotatable pvd
|11 Jun 2009
|17 Dec 2009
|Applied Materials, Inc.
|Apparatus and method for uniform deposition
|11 Jun 2009
|17 Dec 2009
|Applied Materials, Inc.
|Wafer processing deposition shielding components
|26 Sep 2008
|1 Apr 2010
|Applied Materials, Inc.
|Microstrip antenna assisted ipvd
|26 Sep 2008
|1 Apr 2010
|Applied Materials, Inc.
|Microwave plasma containment shield shaping
|9 Jul 2010
|31 Mar 2011
|Applied Materials, Inc.
|High efficiency low energy microwave ion/electron source
|9 Jul 2010
|31 Mar 2011
|Applied Materials, Inc.
|Curved microwave plasma line source for coating of three-dimensional substrates
|9 Jul 2010
|28 Apr 2011
|Applied Materials, Inc.
|Dynamic vertical microwave deposition of dielectric layers
|11 Jun 2009
|10 Apr 2013
|Apparatus and method for uniform deposition
|26 Jul 2001
|31 Jan 2002
|Unaxis Usa Inc.
|Etching apparatus having a confinement and guide object for gas flow of plasma and method for using same
|11 Jun 2009
|23 Dec 2009
|Applied Materials, Inc.
|Apparatus and method for uniform deposition
|11 Jun 2009
|18 Mar 2010
|Applied Materials, Inc.
|Apparatus and method for uniform deposition
|7 Mar 2014
|25 Sep 2014
|Applied Materials, Inc.
|Self-centering process shield
|U.S. Classification
|204/192.12, 204/192.17, 204/192.3, 438/584, 438/597, 204/298.06, 204/298.11
|International Classification
|Cooperative Classification
|European Classification
|6 Aug 1997
Owner name: MICRON TECHNOLOGY, INC., IDAHO
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:LEIPHART, SHANE P.;REEL/FRAME:008667/0084
Effective date: 19970805
|23 Apr 2003
|Fee payment
Year of fee payment: 4
|29 Jul 2003
|Certificate of correction
|20 Apr 2007
|Fee payment
Year of fee payment: 8
|14 Apr 2011
|Fee payment
Year of fee payment: 12
|12 May 2016
Owner name: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGEN
Free format text: SECURITY INTEREST;ASSIGNOR:MICRON TECHNOLOGY, INC.;REEL/FRAME:038669/0001
Effective date: 20160426
|2 Jun 2016
Owner name: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL
Free format text: PATENT SECURITY AGREEMENT;ASSIGNOR:MICRON TECHNOLOGY, INC.;REEL/FRAME:038954/0001
Effective date: 20160426
|8 Jun 2017
Owner name: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGEN
Free format text: CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST;ASSIGNOR:MICRON TECHNOLOGY, INC.;REEL/FRAME:043079/0001
Effective date: 20160426

subset: commoncrawl


text:
Great one, so it gets a +1.
cool shirt !
man, this should already be out there, to be worn! you got killer skills! print pls! +1
Very cool +1
Love the style!!!! A definite +1 !!!
nice job, love the bottom.
looking good
yup.. nice 1. +1.
very nice one!
LOVE it. +1
damn this is sick dude!
I like this one man.Simple but effective with how it looks on a shirt.This definitely gets my vote.
I wouldn't vote it if I didn't like it and this one I like:)+1
very nice +1
nice one, I like the jacket! thanks for the welcome….
It's a nice design. I like how it represents something. +1
nice design ))))))) +1!!!!!! i want to have this printed )))))))))))
It's good, just seems a little clip arty or something. I really like the idea but I feel like you could develop it more to get a real winner! Keep it up!!
i want one ! LOL
Good design, i like the city sacpe at the botom…
haha looks like you dont need my help :P check my first design if you would be so kind haha :P thanks +1


text:
Earrings are the essential finishing touch to everything you wear. At Gemvara, we believe that your earrings should be as unique as you. All our stylish earrings are made to order in your choice of gems and precious metals. Choose White Sapphire and Yellow Gold or Blue Topaz and White Gold: it's your choice. Mix and match gems and precious metals for a look that's exactly you. Gemvara uses only the highest quality materials to craft your White Gold Marquise Smoky Quartz Drop & Dangle Earrings with meticulous attention to detail. Smoky quartz adds a sophisticated tone to any outfit.Our precious metals are recycled or responsibly mined. The appeal of 14 karat white gold is as versatile as it is beautiful: it shines no matter the occasion. Gemvara also offers every design in premium 18k white gold, which is 75 percent pure for even more lasting value. All Gemvara white gold jewelry is rhodium plated for extra brightness.Our wide selection of White Gold Marquise Smoky Quartz Drop & Dangle Earrings by talented designers means you can find earrings that are exactly your style. You can choose your favorite earring backs too. Gemvara's fine quality White Gold Marquise Smoky Quartz Drop & Dangle Earrings are designed to be passed down for generations to come, crafted by hand in the United States.
We can help right away. Chat with a jewelry expert now!


text:
They include an airline worker stopped from wearing a cross and a registrar who did not want to marry gay couples.
All four lost separate employment tribunals relating to their beliefs.
Secular critics have said any ruling in favour of the group could "seriously undermine" UK equality law.
Toward What is God Moving the World?
I'm surprised that the stewardess wearing the cross was part of the Pentecostalism movement. The German Court won't be so compelled to rule in her favor is she were a Catholic.


text:
I was just wondering if the people here have switched over to e-books and which device do you like to use? (phone, kindle, nook.....)
e-books - Have you switched over?
Ad Widget
This topic is closed.
new posts
e-books - Have you switched over?Tags: None
Re: e-books - Have you switched over?
While I have the Amazon Kindle for PC program on my computer, and downloaded a few freebie e-books, I don't use it much. I don't have an e-reader, either. I might get one some day, I dunno. I'm not in any rush. Regular old books, magazines, & newspapers are still just fine with me.
Most of my current reading is a mix of throwaway freebie newspapers and internet news articles. I also listen to podcasts and watch the news voraciously. Haven't read a fiction book in years. I'll occasionally check out books at the public library, too.
Don't get me wrong, I'm not against the Kindle/Nook/other e-readers, I think they're pretty nice, actually. I just haven't been motivated to make such a large expenditure like that, since I'm not that big a book-purchaser.
Re: e-books - Have you switched over?
I love books. Visiting the local book store to browse and have a coffee was once a high point of my week. Sadly, that is no longer my routine as I buy most of my books from Amazon or Apple in digital form. I miss paper books, but there is no denying the ease and convenience of having all my books with me on a single lightweight device.MiceChat 101: Be NICE! If you don't play well with others, you are in the wrong sandbox.
Find us on Facebook: .
How do you support MiceChat? Join MiceChat GOLD!,Save
- Oct 2006
- 8145
Re: e-books - Have you switched over?
I have switched over to the Nook this year. My main motivating factor was when I had to move back home and had a ton of books to move, and limited space to move them back to. Since I take good care of my books I donated them to the local public library and have started to 'buy' them back in e-book form.
For me it is more of a space issue, but I have found it convenient to have so many books in one place without them taking up a lot of space at home. I did purchase the Nook with WiFi+ 3G and enjoy the daily book review, which has piqued my interest at times in books I never would've thought of looking into.
I purchased my Nook right before the Nook Color came out, but I enjoy the simplicity of my reader along with the very excellent battery life it provides. Of course to read at night I need a light, but you would as well with a real book so it doesn't really bother me.
let's talk Disney, okay!
- Apr 2009
- 1306
Re: e-books - Have you switched over?
I am with Dusty on this one. I could spend hours in a used book store! But I don't hang on to all of the books I buy, just the ones that I could see myself re-reading. I sell back everything else. I supposed I could just go to the library and get them for free, but I take pride in helping out local economy. I buy the books from them, they make money, I sell the books back to them, they give me a buck or 2 in store credit, and then they put it back on the shelf for 5 bucks, and they make a profit again. WIN/WIN!
I really have been torn deciding on whether to buy a kindle or not. But there is just something about having a physical that I think I would really miss!
- Oct 2007
- 3272
Re: e-books - Have you switched over?
I bought a Kindle a couple of months ago and absolutely love it. I don't regret the decision for a second.
I wasn't really interested in getting one, until my mom brought up wanting an e-reader for her birthday, and I looked into them. I didn't think I would like reading books on a computer-like screen, but I quickly learned they actually use e-ink technology, and the display is actually very paper-like.
I love the Kindle setup - buttons on either side in just the right spot. I can hold it with one hand or two, and no matter which hand I use I can flip pages with that hand. My mom wants a Kodo which I don't like, as the only spot to flip pages is in the bottom right. With the Kindle, I can hold it in just my left hand should I so choose, and flip pages with my thumb. Not so much with the Kodo.
Another nice feature that my mom wants, is the ability to change font size. A fantastic option for anyone with less than perfect vision.
It's small and light, and if I ever have the desire to buy a new book (when travelling for example), I just need to find a wi-fi hot spot. I passed on the 3G feature.
The only downside I've found so far is that it's not convenient to flip back to re-read something.
I have not tried reading books on my iPad, as I don't think I want to read on a backlit screen. I do love reading comics on it though. Apple has apparently patented a dual layer screen, that would allow for e-ink displays on the iPad. That could be the best of both worlds.My Micechat cruise trip report, Part 1:http://micechat.com/14795-disney-wonder/
Re: e-books - Have you switched over?
I've got the nook and love it, though I'm still about 50/50 with buying actual books. Since I'm a teacher, I have the excuse of buying and reading books for my classroom. After I read them, then they go to my class library. I use the nook a lot for traveling and for reading large books that I don't want to carry. (For example, I'm reading Gone With the Wind on my nook now.) I'm also lucky that I have a Barnes and Noble within walking distance of my house, so I like to take advantage of their free in-store downloads as well.A signature should go here.
Re: e-books - Have you switched over?
I have not bought a book in years. I use the kindle and get ebooks. I also get emagazines on the ipad2.
The only magazine I get delivered is the national geographic, but if I could find the electronic version I would switch.
Re: e-books - Have you switched over?
Originally posted by BC_DisneyGeek View PostI have not tried reading books on my iPad, as I don't think I want to read on a backlit screen. I do love reading comics on it though. Apple has apparently patented a dual layer screen, that would allow for e-ink displays on the iPad. That could be the best of both worlds.
I do read quite a bit on the ipad too. I just adjust the brightness lower,
Re: e-books - Have you switched over?
I have a digital subscription to Architectural Record and free books on Kindle for Mac, but other than that I continue to build my library, which currently has just over 350 volumes. I am currently using my girlfriend's iPad 2, and I could see myself getting both the print and digital editions in the future (whenever the HP TouchPad and Pre 3 actually go on sale), but I am not sure yet. I like my books and I like my library.
Chicago Gal
- Apr 2005
- 57776
Re: e-books - Have you switched over?
I'm not one to do a lot of book reading, due to all the other hobbies that I have. My husband on the other hand is an avid reader. I have tried to talk him into some sort of reading device, and he is adamant, about "wanting to feel the book in his hands". The problem is that I am running out of places in my house to put all his books. The man doesn't even buy paperbacks. Most of his books are hard cover.
I'd love to have an iPad, despite the fact that my grandson says that it's just a glorified iPod Touch.
Re: e-books - Have you switched over?
I'd love to have an iPad, despite the fact that my grandson says that it's just a glorified iPod Touch.
Always watching...
- Jan 2005
- 4257
Re: e-books - Have you switched over?
I have serious space limitations, so lately I've been going the library for books. But it's a pain to have to order books from other libraries (I'm reading a series, and of course every other book is at another library).
I just got a Kindle last week (saw a deal I couldn't refuse) and have to say, so far, I love it. Amazon has quite a few discount/free books you can download too. I also have downloaded the Kindle app on my phone, and can catch up on my book anytime. I downloaded the phone app first, which made me want a real Kindle more.
I'm still going to the library for books too, but the Kindle is easy to carry around, I can read it at any angle, takes only one hand to hold and turn pages, and I love that I can adjust the font size. So, so far, I'm a big fan of e-readers!
Disneyland PAP
- Nov 2006
- 1301
Re: e-books - Have you switched over?
It's taken me about year for my mindset to go from "Absolutely not!" to "I want to buy a digital reader." When the iPad came out, I was definitely intrigued. But I knew it was simply a smartphone on steroids, and I realized that, for the price and my own personal habits, my Pre sufficed just fine.
Fast forward to now. I'm not the typical voracious reader, but I love me getting my comic books every Wednesday. And in the past few months, especially after HP announced their TouchPad, my need to have it on paper and, as others mentioned also, a concern about saving some space at home wore my old school ideas down. Yesterday, HP announced the TouchPad coming out on July 1, and I plan to dent my wallet hard to pick one up. I'm looking forward to finally diving in!
Re: e-books - Have you switched over?
I'd love to have an iPad, despite the fact that my grandson says that it's just a glorified iPod Touch.
The phone screen is just so small. I would not consider using it like I do the ipad2.
Ad Widget


text:
Artist description:
No description entered.
Canvas Draw Created Jan 19, 2013 640 x 460px Unless noted Copyright 2013 vladzalau.
We encourage you to submit a comment and let the artist know what you think of this drawing. Please log in or join to post a comment.
Post a comment
Dunny Jan 19, 2013
Fun colors and some nice textures,, nice job
Page 1


text:
Neo-Con General Calls For Terror Attacks In Iran
Expand Messages
- Neo-Con General Calls For Terror Attacks In Iran
McInerney urges U.S. government to support terrorist organization MEK, Bush administration already bankrolling Al-Qaeda-linked Jundullah groupPaul Joseph Watson
Prison Planet
Friday, May 16, 2008Fresh off the revelation of Donald Rumsfeld's 2006 audio tape admission that a method to reinvigorate the Neo-Con agenda would be another terror attack, Neo-Cons like Ret. Gen. Thomas McInerney, who was part of the Pentagon's "message force multipliers" propaganda program, have been calling for the Bush administration to commit acts of terror in Iran.--------------------------------------------------Get your exclusive Prison Planet.tv membership today and enjoy a plethora of multimedia content as well as access to live video streaming of The Alex Jones Show - click here to subscribe.
Your message has been successfully submitted and would be delivered to recipients shortly.


text:
Photographer's Note
I took this picture at Semuc Champey after hiking up to El Mirador.
Both upstream and downstream from this place is a raging river, but these pools sit atop of a limestome bridge. The bulk of the river flows underneath this incredible place.
Nobody has marked this note useful
Photo Information
- Copyright: Steve Dinicol (stevedinicol) (112)
- Genre: Places
- Medium: Color
- Date Taken: 2005-10-23
- Categories: Nature
- Camera: Canon EOS DIGITAL REBEL XT, Canon 18-55mm EFS
- Exposure: f/5.6, 1/400 seconds
- More Photo Info: view
- Photo Version: Original Version
- Date Submitted: 2007-10-02 14:00
- Favorites: 1 [view]
Viewed: 3791
Points: 0


text:
We recommend upgrading to the latest Internet Explorer, Google Chrome, or Firefox.
Learn More
If you are using IE 9 or later, make sure you turn off "Compatibility View".
Handpicked brands for you
GoPro: Insane Piano Improv
Stay logged in
Forgot Password?
Or use these networks
New to GoodPeople?Create an account here!


text:
UWIP Constitution
Article I: Purpose
The purpose of the Undergraduate Women in Physics Group is to provide resources, advice, and a positive social atmosphere for female physics majors in order to recruit and retain women in the physics department.
Article II: Membership
- Any undergraduate member of the MIT community with a strong interest in pursuing an education in physics is eligible to become a member of this organization. One is considered a member of this organization if she has attended at least one meeting in the preceding or current term.
- The voting membership of this organization will at all times contain at least five MIT students and be more than half MIT students.
- This organization will not discriminate based on any characteristic listed in MIT's Non-discrimination Statement.
- In the event that this organization decides to charge any monetary fees, there will be exceptions made for students who cannot afford said fees.
Article III: Officers
- The Undergraduate Women in Physics Group will have five officers:
- President
- The president shall be the official representative of the group to any other organization and to MIT.
- The president will preside over all meetings.
- The president is responsible for setting the schedule.
- The president shall sign all contracts.
- Vice President
- The vice president shall assume full responsibility in the temporary absence of the president.
- The vice president shall take responsibility for ensuring that the other officers and members complete their duties for the group.
- The vice president shall act as a subsitute for any officer unable to fulfill their duties.
- Treasurer
- The treasurer shall be responsible for the finances of the group.
- The treasurer shall be responsible for writing a budget each semester and presenting it to the group for approval.
- The treasurer is required to sign all checks/vouchers of the group.
- Secretary
- The secretary shall take all minutes of meetings.
- The secretary shall write all amendments to this consititution and present them to the group for consideration.
- The secretary shall maintain and update all email lists.
- Women's Advisory Group Representative
- The Women's Advisory Group representative shall attend all meetings of the Women's Advisory Group and report on those meetings to the Undergraduate Women in Physics Group.
- Webmaster
- The webmaster will organize and administer the UWIP locker and webpage.
- President
- The officers of this organization must be distinct persons and MIT students. The officers shall share the responsibility for organizing group events.
- Elections:
- Elections of the officers shall occur at the second to last meeting of the year.
- Any freshman, sophomore, or junior of this organization is eligible to run for office.
- Quorum for elections is half of the group.
- Any member is elected if she receives the most votes.
- The term of office runs from the elections in May until the elections the following May.
- Officers may be removed by a majority vote of the members.
Article IV: Meetings
- Meetings shall be held at least every month.
- Meetings shall be presided over by the president, unless she is absent, in which case the vice-president shall preside.
- All decisions shall be made by a majority vote of all members present.
Article V: Amendments
- Amendments shall be presented by the secretary.
- Amendments shall be passed by a two-thirds vote of the members present.
- Quorum for amending this constitution shall be one third of all members of the organization.
Article: ASA God Clause
The Undergraduate Women in Physics Group agrees to abide by the rules and regulations of the Association of Student Activities, and its executive board. This constitution, amendments to it, and the by-laws of this organization shall be subject to review by the ASA Executive Board to insure that they are in accordance with the aforementioned rules and regulations.


text:
This product is no longer available.
You can try these similar gifts instead.
Green and Blue Stripes Personalized Note Cards
Say "Stay in touch" to someone special with this charming note card set. Decorated with a whimsical green and blue striped pattern, the foldover note cards can be personalized with a name or monogram.


text:
Bail refused to teen accused of murder
The president of the Perth Children's Court has refused bail for one of a group of teenagers accused of murdering a man in Mandurah.
The teenager is one of six accused of murdering Tauri Litchfield in March this year.
Prosecutors allege the teenagers were trying to steal Mr Litchfield's mobile phone but he ran away.
The court heard the group pursued Mr Litchfield but he tripped and fell.
Judge Denis Reynolds said he was not satisfied that there were exceptional circumstances that allowed the boy to be granted bail.
He has been remanded in custody until he appears in court again next month.
Topics: courts-and-trials, murder-and-manslaughter, mandurah-6210


text:
|[CQ-Contest] RE: SO2R
|firstname.lastname@example.com (email@example.com)
|Tue Jan 28 20:42:45 2003
In a message dated 1/28/2003 6:26:11 PM US Mountain Standard Time, email@example.com writes: > I find it amusing that no one ever bothers to mention that I was the > first guy who REALLY started using SO2R in every DX contest, back in > 1985 and won the 1987-1989 ARRLCW by doing two radios before > it became "de rigueur". > > Hi Bob; I don't know what "REALLY" is, but W4KFC, W9IOP and W3GRF (I think) and probably several others had you beat by about 30 years! In fact, that's as far as I go back in ham radio (mid-late 50s) and I suspect they were doing it before then. 73, Bob K8IA Mesa,Arizona USA near the Superstition Mtns
|<Prev in Thread]
|Current Thread
|[Next in Thread>
|Previous by Date:
|[CQ-Contest] SO2R Setup - Left,Right or Up,Down, Pete Smith
|Next by Date:
|[CQ-Contest] CQ 160 robot back on, David L. Thompson
|Previous by Thread:
|[CQ-Contest] RE: SO2R, Leigh S. Jones
|Next by Thread:
|[CQ-Contest] RE: SO2R, Robert Shohet
|[Date] [Thread] [Top] [All Lists]


text:
Alan Green: Top of the tree at Christmas, Manchester City have heart to stay there
Any who continue to harbour doubts about the sustainability of Manchester City's title challenge should push them aside after the team's performances over the last week, both of which I commentated on.
Travesty of justice is too strong a term to describe their loss at Stamford Bridge but, surely, the least Mancini's side deserved was a draw?
Considering the importance of that night to Chelsea, Villas-Boas' players must have been faintly embarrassed by the way they were outplayed in the opening half an hour.
Had the referee given the penalty that he should have, City would have coasted to victory. And Clichy was plain stupid
So the Arsenal game was a 'must win' even if a draw would have been sufficient to see City return to the top of the table.
Think, too, of how important it was to the Gunners: Wenger says they can't win the title now but he was rightly delighted with the way Arsenal contributed to such an absorbing spectacle.
To me, it emphasised the importance of the victory to City.
I've seen them play better, much better: I've seen them create many more chances than they did on Sunday but it was the sheer doggedness of their display that you couldn't ignore.
Bluntly, it was as if you were watching Manchester United in their pomp, squeezing the pips out of the opposition on their way to the title.
The theory goes that you can 'get at' the City defence.
I'm beginning to wonder. For such a young lad, Joe Hart continually shows why he will be the England goalkeeper for a very long time.
He was largely redundant for long periods in the game but still had the concentration to deny Vermaelen with a magnificent last-minute save.
Vincent Kompany was outstanding, contributing most to keeping Robin van Persie as quiet as it's possible to do.
I don't know why it's taken me so long to recognise how good Kompany is. Is there currently a better central defender in the country?
As for Micah Richards, I want to know where Fabio Capello buys his glasses because I wish to avoid the place even if they were giving pairs away free.
It is increasingly outrageous that Richards isn't England's right-back.
Gareth Barry was everywhere in midfield. Perhaps, it's a response to knowing there are players available to the manager, like Nigel De Jong and James Milner, who'd walk into the starting eleven of any other club regularly.
It wasn't just Barry's 'spoiling' on Sunday: it was his constant intelligent distribution of the ball; quietly, my man of the match.
Ahead of him, there was City's customary array of attacking talent: which club wouldn't wish to swap their resources for a situation in which you're choosing between Aguero, Balotelli, Dzeko, Nasri and Silva? Who exactly is Tevez?
I know that Stoke are on a good run but I expect them to lose at the Etihad tomorrow night. City will be top at Christmas for the first time since 1929.
Belfast Telegraph
Related Content
- Alan Green: Valencia could be frozen out at Stoke
- Alan Green: I feel for FA over Suarez 'racism' row


text:
Added by SockMonkey on March 9, 2016 at 11:49pm — 2 Comments
OK so I know you're used to reading my rantings about killing, raping, dismembering etc in entertaining ways (I like to think), but I really want your opinion on something ...
I'm on a quest for the sickest, weirdest, offensive, most violent, socially unacceptable films ever made.
I'm talking FUCKED UP! The type of shit that makes you feel dirty for watching, and makes you want to kill yourself for…Continue
Added by SockMonkey on January 17, 2012 at 8:00pm — 2 Comments
So this fucking Indo cunt takes exception to my musings ...
So she deletes my posts within a few minutes of me hitting enter!
Does she know we're on TWATTER? The Anti-Fucking-Social Network?
Where abuse is to be expected?
What a fucking cunt.
AND she just changed her name from ike dania oktarisa to try & outfox my blog post - ha ha ha x2 CUNT!
Everybody please rain down insults on this Indo…Continue
Added by SockMonkey on August 13, 2011 at 12:14am — 2 Comments
... but watch this video & tell me this isn't one of the hottest cunts on the planet
Added by SockMonkey on August 12, 2011 at 11:34pm — No Comments
For Fuck's Sake you cunt - this is TWATTER!!
What fucking site do you think this is??
It isn't facebook or twitter - it says at the top 'The Anti-Social Network' - are you so fucking dumb?
You want to join but you can't handle the things that might be said? Boo fucking hoo.
Added by SockMonkey on July 15, 2011 at 7:32pm — No Comments
Justin Bieber is Pop's hottest commodity right now ... and here he is talking about fame, success & the long term (how many more years does he think he'll be performing!) ...
Check out this link :
Added by SockMonkey on July 14, 2011 at 8:59pm — No Comments
... cos no one else will!!
Well, fuck me - looks like I said just about everything in the title.
You can check my page to see for yourself - but I warn you - It's pretty fucking dull!!
Please join me in abusing this vanilla flavored faggot - maybe we'll provoke some imagination out of the boring cunt!
Added by SockMonkey on July 14, 2011 at 8:51pm — No Comments
... The only thing not in this clip is the ass-raping I would give them & having their parents tied to chairs with their eyelids cut off so they had to watch.
Added by SockMonkey on March 5, 2011 at 12:08pm — 1 Comment
So I posted a reply to John Fiddz blog 'How to Survive Marriage' or some bullshit.
Then I post one of my favorite insulty jokes :-
Q: What does John Fiddz use a contraceptive?
A: His personality
Dull Cunt.
But now he's gone ... after he posted a reply to my reply which I never got to fully read cos the email I received to notify me doesn't have all the text, and he also posted a retort to the above 'I actually…Continue
Added by SockMonkey on January 24, 2011 at 9:00pm — 3 Comments
So it's not even news that AJ Scott is a fag that sucks a lot of cock - especially the maggot of Mitchell Ryan Link ... but the slimy piece of shit sends me a message - and we've had a few exchanges - so I go to comment back, but now his profile is set to private - So I can't drop him a line ...
Added by SockMonkey on January 2, 2011 at 10:32pm — No Comments
Is anyone decent at photoshopping?
Can you take this pic & make it so this slut's left boob is exposed?
I can masturbate without it, but it would make things quicker.
And Inggy if you're reading this ... yes, please say I…Continue
Added by SockMonkey on January 2, 2011 at 9:16pm — No Comments
Look at this face - who wouldn't want to shoot their baby batter over it?
The pearl necklace is definitely a 'come & get me' message - she wants it.
Come on you dirty little whore - show us more ... tits first would…Continue
Added by SockMonkey on December 30, 2010 at 12:44pm — No Comments
I have it on good authority from one of his real-life friends that the pic in the link below is the guy who calls himself Dave Pilchy-Clunk on Twatter...
Added by SockMonkey on December 18, 2010 at 11:13am — 1 Comment
So this could be the first incidence of twatter seeping into real life ...
This stupid little fuck has put his email on show & this is an opportunity to break out of the box & put real hands on the throats of these Indo cunts!
With dark & twisted cunts like me around - surely that's a mistake.
I'm so dark I even use a black towel, so I can feel evil stepping out of the shower - none of this pastel blue fluffy…Continue
Added by SockMonkey on December 18, 2010 at 8:11am — No Comments
... 10 year old girl??
You can turn her over & pretend she's a 10 year old boy!
Added by SockMonkey on December 17, 2010 at 8:31pm — No Comments
So if you check back through my blogs you'll find an entry about Mitchell Ryan Link who posted a message on my profile then deleted it cos he putts from the rough.
Mitchell Ryan Stink's message was "Why are you such a dumb fuck? For real?"
So when he reinstated his account a week or so ago - I looked at his profile & his only friend was this schlong schlurper (I just made that term up by the way!) called AJ Scott.
Brothers in arms for sure…Continue
Added by SockMonkey on December 17, 2010 at 12:27am — No Comments
.... from a 5 yr old .... is ....
Added by SockMonkey on December 15, 2010 at 10:56pm — No Comments
Could they be performing together soon?
Added by SockMonkey on December 14, 2010 at 8:38pm — 2 Comments
So a couple of weeks ago I get an email ...
Added by SockMonkey on December 12, 2010 at 7:55pm — 1 Comment
So this cunt Rani Biebs joins Twatter ... I'm already wary as her pic is of that AIDS ridden cock jockey Justin Bieber ... So I gives her some shit saying little Justin would rather slit her throat than fuck her etc.
Fair enough - I understand she's not happy - & I respect that.
BUT!! ... She says some shit to me about what I'm saying is not appropriate for social-networking!!
Have a look…Continue
Added by SockMonkey on December 11, 2010 at 8:54pm — No Comments
© 2017 Created by Gary Glitter. Powered by


text:
|They grow up so fast...
Our peppers are finally coming on really well, which is a relief after the tomatoes didn't do as well as we'd like. They were ravaged by caterpillars, and many split after all of the rain. We're getting a lot of good lunchbox peppers.
The habanero peppers Doug planted last year are a strange red color. We think they probably cross-pollinated with some other peppers, so it'll be interesting to see what they taste like.
|Mystery Pepper


text:
Ideal Standard HP Venturi Exposed Shower A5699AA
A High performance venturi [non thermostatic] shower without the need for a pump. Boost uses the Venturi principle to harness the power of the cold water mains supply. Only suitable for mains fed cold and tank fed hot water supply.
- High performing shower without Pump
- Cool Body Technology
- Suitable for High & Low Pressure Systems
- Temperature Limit Stop
- Manufactured in Ideal's German factory


text:
table of contents
The data described here represent the first attempt to develop an understanding …
Home » Biology Articles » Cryobiology » Cryobiology of Rat Embryos I: Determination of Zygote Membrane Permeability Coefficients for Water and Cryoprotectants, Their Activation Energies, and the Development of Improved Cryopreservation Methods » Introduction
© Biology-Online.org. All Rights Reserved. Register | Login | About Us | Contact Us | Link to Us | Privacy Policy


text:
PHOTO: Dairy Queen Miracle Treat Day
Ranae Johnston scoops cookie dough into a Blizzard on Thursday at Dairy Queen in Mitchell during the ninth annual Dairy Queen Miracle Treat Day. Participating locations donate $1 from each of the day's Blizzard sales to the Children's Miracle Network. Allan Catellier, general manager of the Mitchell Dairy Queen, said the store's goal this year was to sell 3,500 Blizzards. As of 9 p.m. Thursday, the store had sold 1,800 Blizzards, and sales were still going strong. Last year, the local store sold a total of 1,700 Blizzards. (Sean Ryan/Republic)


text: Spart248 0 Report post Posted July 15, 2013 I am planning on doing alot of pottery (thrown-ware) pit firings over the summer. However, I have nowhere to bisque the pots I throw in a kiln, so I plan to bisque-fire them in a pit fire, just as the natives did. I also plan on pit firing them again using chemical, salt, etc. to color them. What kind of clay would be best for this? In terms of both survival (not breaking from thermal shock) and receiving the coloring from the second pit firing best. Keep in mind when I say "pit firing" I don't mean "wood-firing" in a special wood fire anagama kiln or anything. I literally mean firing in a pit. I know how to pit-fire to bisque and then to pit fire for coloration. I have to order from this supplier, Ceramic Supply Inc. I am thinking of ordering some this S105G, white stoneware with grog. Also some S239 raku clay (without kyanite because it is cheaper). Should I spend the extra money on the raku with kyanite to increase survival? It does have a lower temp-bisque which would be easier to achieve. Do you think the stoneware with grog will have a decent survival rate with pit-fire bisquing? Or should I just solely get the raku? I imagine the only options would either be a low-fire or raku clay. If you see anything you think would fair better on their website, please let me know. Thanks everybody Share this post Link to post Share on other sites


text:
Could Grant Hill make another all-star appearance?
just curious if any of you think Grant Hill (as long as he's healthy) could be voted in as a starter for the All-Star game. would you give your vote for him to be a starter?
Possible through popularity and simpathy for his injury plight but, I doubt he would legitimately qualify as being one of the geniunely best forwards.
nah... conference has too many fowards better than Hill... maybe the coaches may put him in if he plays as well as he's doing now...
i wouldnt think so either howard will be our only all star starter
no way...hill is no where near as popular as he used to be
|All times are GMT -4. The time now is 05:46 PM.
Powered by vBulletin Version 3.5.4
Copyright ©2000 - 2017, Jelsoft Enterprises Ltd. Terms of Use/Service | Privacy Policy


text:
Written on: 19/02/2013 by katy1980 (6 reviews written)
Republic really are the lowest of the low. Over the years I've spend thousands with them. Recently, few weeks ago, I placed an order of £250 (which I've received) and last week an order of £105 (not received).
They marked my £105 order as "dispatched" and even provided a tracking number - but never actually shipped the goods. They do this so that they can charge your card - knowing FULL WELL you will not receive the goods.
As for my earlier £250 order (which I did receive) I have a couple of items to return (but I'll be damned if I do because I wouldn't trust them in a million years to refund me!)
IMPORTANANT: If you paid by credit card they will refund you. Legally credit card companies HAVE TO to refund for orders between £100 and £30,0000 (however many credit card companies do cover you for lower value items too - so MAKE SURE YOU CONTACT THEM if you order was below £100.)
If you paid by debit card.... good luck getting your money back.... However if they've traded illegally (like they have with me - charging my card - knowing I won't get my goods) then perhaps you should get on to Trading Standards (and make sure you let Republic know you are aware of their wrong doing)
I've also hear that people are not allowed to use their gift vouchers in-store either - unbelievable!
Here is the email for Repulsive, I mean Republics administration team (these are the only people who can deal with your request so try them, and if no luck contact your credit card company for a charge back): firstname.lastname@example.com
I despise, I really do!!!
Good luck everyone. Don't let the scum bags keep your money (especially when they've taken it knowing full well you were never going to receive your goods).


text:
Comic books browse by: Shop category:
Scenarist Mimi PondAvailable series in store category "Comic books"
Mimi Pond in the COMICLOPEDIA
" Mimi Pond enjoyed drawing as a child. She studied in art school, but never graduated. Her graphic influences are Aubrey Beardsley, Hillary Knight, Louise Fitzhugh, Robert Crumb, MK Brown, Aline Kominsky, Tina Fey, Charles Burns, Art Spiegelman, Marjane Satrapi, Lynda Barry and..." [ Read more ]


text:
Peyton Manning Released From Colts to Save $35 Million
Fellow teammates on the Indianapolis Colts have confirmed that team owner Jim Isray has released Peyton Manning. The news is to be announced by press conference Wednesday at noon.
Manning has played quarterback for the Colts for 14 years, earning four MVP awards and one Super Bowl title. However, over the past two years he has suffered severe neck injuries, which have made his overall come back to the NFL questionable to some. Manning missed the entire 2011 NFL season.
Although the news will not be confirmed until the press conference, ESPN reported that Manning and Isray travelled together by private jet from South Florida Tuesday night. The pair was later seen in Indianapolis, talking in Isray's car.
Isray responded to the media present, "we'll see ya'll tomorrow. We're gonna talk tomorrow."
Manning was also pushed to comment on the recent changes and how he felt about them. He offered a similar response: "We're good, we're good. We're gonna talk tomorrow. We're gonna do it the right way tomorrow."
In 2011, Manning signed a 5-year contract with the Colts for $90 million. To retain the NFL player, the Colts would have to pay out a $28 million bonus due to Peyton for the next year. The team will save $35 million by releasing him to the free agent list.
The Colts also hold the first 2012 draft pick and will likely choose Stanford quarterback Andrew Luck; former Baylor quarterback Robert Griffin III has also been considered.
After the press conference announcement, the Colts will have until Thursday to complete the transaction. If made a free agent, Manning is open immediately to sign with a different team.
The ESPN reported that it was Manning's preference to stay with the Colts, but Isray has remained dead set on reconstructing the team after suffering a 2-14 season without Manning.


text:
|You are in: World: South Asia
Wednesday, 19 December, 2001, 08:31 GMT
UN bogged down over Afghan peacekeepers
The United Nations Security Council has made little progress towards issuing a mandate for the multinational force which is due to start arriving in Afghanistan at the end of this week.
The British Government has already given details of an advance contingent of soldiers it expects to arrive in the Afghan capital, Kabul, on Saturday.
Most diplomats expect Security Council members to adopt a resolution before then, but BBC UN correspondent Greg Barrow says the vote may appear little more than a rubber stamp because of plans already announced by the governments of the major troop-contributing nations.
The reason for the slow pace of diplomacy at the UN has been put down to differences of opinion among the five permanent members of the Security Council over the scale and the scope of the proposed multinational force.
There has been some dispute about whether the international force would be given a mandate under Chapter Seven of the UN Charter, which allows the use of force to deal with threats to peace and acts of aggression, or on the basis of Chapter Six, which would only sanction to use force in self defence.
But Russia and France are said to want strict time limits on the period in which foreign troops will remain in Afghanistan, while Britain and the US are said to be arguing for a more open-ended mission.
There is also the question of how the multinational security force will relate to the command and control structure of the American-led military operation already under way in Afghanistan.
Diplomats who have been following the discussions say they expect these differences to be resolved in the coming days, clearing the way for a swift adoption of the new resolution.
See also:
19 Nov 01 | South Asia
Afghan powerbrokers: Who's who
18 Dec 01 | UK
British marines head for Kabul
18 Dec 01 | South Asia
Efforts intensify to agree Afghan force
19 Dec 01 | South Asia
Afghan leader ready for foreign troops
19 Dec 01 | UK
Britain to outline Afghan force plan
Internet links:
The BBC is not responsible for the content of external internet sites
Top South Asia stories now:
Links to more South Asia stories are at the foot of the page.
Links to more South Asia stories
|^^ Back to top
News Front Page | World | UK | UK Politics | Business | Sci/Tech | Health | Education | Entertainment | Talking Point | In Depth | AudioVideo
To BBC Sport>> | To BBC Weather>>
© MMIII | News Sources | Privacy


text:
Sony Computer Entertainment America informed IGNPS2 that it has shuffled its small deck of first-party games for the first half 2001, and that there are no big disappointments.
First and foremost on the reshuffle board is ATV Off-road Fury, which is delayed until February 6, back from its former January 15 slating.
Second, as part of its giant March push, SCEA is now saying that perhaps the most important game in the first half 2001, Gran Turismo 3: A-spec, is now due in "Early Spring." We read "Early Spring" as March, but SCEA will not confirm a specific date yet. Meanwhile, the Japanese version is due in February. For a big update on the game, we have posted an insane amount of footage of the game in today's preview (200 screens and 50 movies). Go crazy. We did.
Third, and not to be outdone by any other racing game is Incognito Studios' dark, menacing car-combat sequel, Twisted Metal Black, which, like before, is still slated for an early summer release. We can't wait for that!
So, there you go. That wasn't any worse than a Tetanus shot, was it? Now, go pretend it's still vacation, or something...


text:
Artist description:
Never forget the inbetween..
Flash Draw Created Mar 25, 2013 640 x 460px Unless noted Copyright 2013 RobinLaufenburg.
We encourage you to submit a comment and let the artist know what you think of this drawing. Please log in or join to post a comment.
Post a comment
Nobody has commented on this drawing yet. Be the first!


text: Steve Goddard and the KOOL kids on the block were at Berge VW today having guest playing triva, winning prizes and signing up for a chance to win a one year lease on a NEW VW Beetle. We also had some great breakfast food from Paradise Bakery with some great tasting coffee. Make sure you head on down to Berge VW to sign up before the contest ends and also check out the great deals they have on all the VW models during their "Sign THEN Drive" special.