text:
|Publication number
|Publication type
|Application number
|Publication date
|Jul 6, 1993
|Filing date
|Dec 26, 1990
|Priority date
|Dec 26, 1990
|Fee status
|Publication number
|Gary S. Selwyn, Robert E. Walkup
|Original Assignee
|International Business Machines Corporation
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (22), Referenced by (36), Classifications (9), Legal Events (5)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention generally relates to solid state device manufacturing and, more particularly, to an interferometric optical emission detection system used for trace constituent contamination monitoring and endpoint detection.
2. Description of the Prior Art
Sodium (Na) and other alkali metals are unwanted impurities which adversely affect the operation of transistors and other solid state devices. Sodium is a mobile ion and will cause the gate of a transistor to turn on and off at different voltages. Variable operation of the gate will, in turn, cause inconsistent operation of other devices such as memory chips and the like. Sodium contamination of transistors can result from human contact with chemicals and tools used in device manufacturing (i.e., sodium ions can be transported from a person's body onto a processing tool simply by the person touching the tool), impurities present in processing reagents such as photoresist, from the manufacture and storage of these processing reagents, by the sodium which is naturally present in the atmosphere corrupting the processing plant environment (i.e., fog, mist, and rainwater seepage can carry sodium ions from the atmosphere into a processing plant), or by other means. Field Effect Transistors (FETs) are four orders of magnitude more sensitive to alkali metals than bipolars; therefore, sodium contamination is a particular concern in FET processing.
Sodium emission, as well as other trace constituent emissions, can be detected optically. Most of today's optical emission detecting systems used in transistor processing can be categorized as either monochromators with photodiode array detectors or as scanning monochromators with a photomultiplier detector. These types of optical emission systems are available from the following companies: Tracor-Northern, Plasma-Therm Analytical, Xenix, and EG&G PAR. One problem with these types of optical emission systems is that they offer low resolution detection; often greater than 1 nm and sometimes as poor as 10-20 nm. Low resolution detection results in insufficient wavelength dispersion and convolution of the desired emission signal with unwanted background and other emissive interferences. Because of this, low resolution detection also provides low sensitivity for trace species detection against the intense background emission of plasma processing tools. This is further compounded by low light throughput which is typical of conventional monochromators.
As a result of the low sensitivity of conventional optical emission systems, the usual method used for detecting sodium impurities in FETs is by electrical measurement at the end of the chip fabrication process. Clearly, it would be advantageous to have some means which is sensitive enough to detect trace levels of an impurity such as sodium ion before a large number of chips have been damaged. Ideally, potential processing problems could be identified when unacceptable levels of sodium are detected during the fabrication of FETs, and the processing could be halted temporarily to clean the tools and/or check the sodium levels in the processing reagents.
Proper etching endpoint detection is also a major concern in transistor manufacturing. One prior art method of determining the endpoint of material removal is simply timing the etch process according to the rate of material removal. To use a timed etch procedure, it is necessary to empirically determine the time at which all of the desired material has been removed, but the underlying layer has not been etched significantly. Timing is not an ideal procedure for determining the proper etching endpoint because it is indirect and the consequences of improper etching are significant. Underetching will cause a degradation of the gain of the transistor, while overetching will result in a degraded contact between the intrinsic and extrinsic base regions.
Optical emission detection has been proposed as a means for detecting the endpoint at which an etching operation should be halted. A monochromator or bandpass filter can be used to select wavelengths of light at which a desired optical emission will occur. High spectral resolution is always preferable to low spectral resolution for monitoring and analysis of plasma species because, with sufficiently high resolution, it is possible to minimize interference from other emitting plasma species. Moreover, if light throughput is held constant, peak height will increase relative to the background as spectral resolution is improved. Accordingly, high spectral resolution can provide considerable advantages in sensitivity for etch endpoint detection and in the identification of weakly emitting plasma species such as in sodium ion contaminant analysis. Unfortunately, the usual methods for obtaining high spectral resolution, e.g., narrowing monochromator slits or utilizing larger monochromators, have practical limits for use in transistor manufacturing applications. When the slits of a monochromator are narrowed, higher resolution is achieved; however, the light throughput is significantly reduced and, thus, the overall sensitivity is reduced. Using larger monochromators is unacceptable because they would require costly clean room space and are generally impractical for manufacturing applications.
Laser-induced fluorescence (LIF) is a newer technique used in transistor manufacturing for identifying trench etch endpoints and can be used to identify trace constituents. For example, U.S. Pat. 4,675,072 to Bennett et al. discloses an LIF system used to detect and control the reactive ion etch (RIE) through of a given layer in a wafer by detecting a large change in the concentration of a selected minor species from the wafer in the etching plasma. Although LIF is generally used for monitoring major species, LIF may be used to detect trace Na ion contaminants during etching; however, Na only fluoresces at the excitation wavelength of 588.996 nm or 589.593 nm and since scattered laser light is a severe limitation on the sensitivity of LIF, the presence of Na may not be easily detected because of unavoidable interference from scattered laser light off the tool walls and windows. Furthermore, methods to reduce scattered laser light, such as the use of Brewster angle windows and light baffles, are impractical for use on commercial etch tools. LIF may also be used to detect trace copper atoms which appear in aluminized lines as a means to detect an etch endpoint. However, copper atoms will exhibit fluorescence at 324.775 nm which is a wavelength that would require frequency doubling of the dye laser; a process generally regarded as infeasible for manufacturing applications because more powerful lasers are required for this task and a skilled laser operator would be required.
Several laser interferometer techniques are now in standard practice for optically detecting line widths and etch endpoints. U.S. Pat. No. 4,454,001 to Sternheim et al. and U.S. Pat. No. 4,680,084 to Heimann et al. are directed to etch monitoring using laser interferometric methods whereby the thickness of the region being etched is simultaneously monitored. U.S. Pat. No. 4,838,694 to Betz et al. discloses a laser interferometry process which uses the reflected laser beam. U.S. Pat. No. 4,717,446 to Nagy et al. discloses a method, using a monitor wafer which is correlated to the endpoints of the working wafer, for detecting the endpoint of the etch of an epitaxially grown silicon whereby a laser is used to measure the etch rate of the monitor wafer by measuring the reflected light off the oxide layer. U.S. Pat. No. 4,602,981 to Chen et al. is directed an impedance monitoring technique for plasma etching wherein endpoints are detected by an impedance change of the plasma; however, the Chen et al. reference does disclose that laser interferometry is well established in the art and points out that the laser measures the thickness of the film removed as the etch process proceeds. U.S. Pat. No. 4,758,304 to McNeil et al. discloses an apparatus for ion etching which utilizes an interferometer for surface monitoring. The methods described in Chen et al. and McNeil et al. are generally insensitive to the precise wavelength of the detected light. Before the invention thereof by the applicants, interferometers have not been used in solid state device manufacturing for detecting trace emitting species in a complex background spectra.
Furthermore, several techniques for controlling interferometers are now in common practice. U.S. Pat. No. 4,482,248 to Papuchon et al. discloses an interferometer used for optical filtering. U.S. Pat. No. 4,711,573 to Wijntjes et al. discloses a dynamic mirror alignment control which utilizes an interferogram for analyzing sample materials wherein a closed loop servo motor is used to maintain position orientation. U.S. Pat. No. 4,448,486 to Evans discloses the use of mirrors in a Fabry-Perot interferometer used to change the bandwidth of the Fabry-Perot interferometer. The applicants invention describes completely new methods for using and controlling interferometers in transistor manufacturing.
It is therefore an object of the present invention to provide methods of using light wave interferometry for the detection of trace plasma species.
It is another object of this invention to overcome the low light throughput and corresponding low resolution disadvantages of using a monochromator for wavelength selection to monitor optical emissions of trace plasma species.
It is yet another object of this invention to describe a new, low-cost, durable optical emission detection system which operates using interferometric principles.
According to the invention, light wave interferometry is used in solid state device manufacturing processes to identify trace plasma species. By using light wave interferometry, high resolution optical emission detection is achieved without the use of a monochromator. The light wave interferometry methods of the present invention result in a high light throughput efficiency, high spectral resolution, and an associated improvement in detection sensitivity and selectivity. The light wave interferometry methods of the present invention are useful in etch endpoint analysis and in the identification of important trace contaminants such as sodium impurities encountered during FET fabrication.
One method involves the use of a Fabry-Perot interferometer and relies upon the constructive and destructive interferences of entering light between two highly reflective parallel plates separated by a known distance of air. As discussed by R. P. Feynman et al. in The Feynman Lectures on Physics, Vol. III, Addison-Wesley, Reading, Mass., pp. 4-10, 1965, an interferometer operates on the principle of maintaining a standing wave between two reflective plates. The standing wave criterion will be met when, kf =jπ/L, where kf is the wavenumber (k=2π/λ) of the jth mode (j=any integer) and L is the separation of plates. By varying the separation between the two plates, which can be accomplished with a piezoelectric drive or similar means, the transmitted light may be tuned with very high resolution (e.g., 0.001 to 0.08 nm) over a narrow wavelength range. Such a system can typically transmit 70% of the light at the selected wavelength which compares very favorably with monochromator systems that have lower resolution and transmit only 5-10% of the light. Since multiple orders are also transmitted by the air-spaced etalon, it is also necessary to use prefilters to block out multiple order transmission.
Air-spaced Fabry-Perot interferometers are commercially available and have been primarily used in transistor and other solid state device manufacturing for linewidth measurements of major emitting species. For example, R. Walkup et al. disclosed the use of air spaced Fabry-Perot interferometers for linewidth measurements in J. Chem. Phys., 84, 2668 (1986). In contrast to prior uses of Fabry-Perot interferometers in solid state device manufacturing, the present invention anticipates the use of a Fabry-Perot etalon for end point detection and for the selective detection of trace emitting species from a complex background spectra. The present invention's use of the Fabry-Perot interferometer takes advantage of the high light throughput which occurs with the Fabry-Perot interferometer which is not present in other means of optical emission detection (e.g., monochromators). High light throughput provides no major advantage in line width analysis because a major plasma species, as opposed to a trace species, is usually being monitored during line width analysis.
Another method by which light wave interferometry can be used to monitor trace species during transistor manufacturing is to use a tiltable narrow bandpass interference filter to scan a small range of wavelengths. Narrow bandpass interference filters are commercially available from Oriel Optics, Andover Corp., Spindler, and Hoya and include a series of thin dielectric layers which are used to produce constructive or destructive interference of the incident light. Narrow bandpass interference filters are similar to the air spaced Fabry-Perot etalon in principle; however, the separation between layers in a narrow bandpass interference filter is fixed and several dielectric layers are used instead of air. While the resolution of a narrow bandpass interference filter is typically somewhat lower than with a Fabry-Perot interferometer, multiple order transmission problems associated with Fabry-Perot interferometers are not present when a narrow bandpass interference filter is used. This is because a Fabry-Perot interferometer operates in a single reflective cavity and, narrow bandpass interference filters operate by multiple reflections between successive dielectric layers. In this way, sensitivity to mode effects is minimized. Narrow bandpass interference filters have been widely used in materials processing plasmas for endpoint detection. In fact, some commercial reactors come equipped with specific bandpass interference filters, such as the Zylin metal etch reactor which is equipped with a 10 nm bandpass filter for aluminum (Al) atom detection. Harshberger et al. have described a reactor equipped with a bandpass interference filter in J. Electronic Materials, 7, 429 (1978). Interference filters are typically used in the same way as low resolution optical spectrometers for etch endpoint detection. The high light throughput of these filters provides an advantage over a fixed wavelength monochromator, and also has a lower capital cost and greater reliability than a monochromator. However, the fixed wavelength selection of the filter makes these light detection systems vulnerable to errors resulting from unwanted detection of interferences within the transmission range of the filter. The absolute emission intensity measured by the bandpass filter also includes intensity from the underlying continuous emission of the plasma. This continuous emission can be significant and can dominate over weak, wavelength-specific emission from trace or impurity plasma species. The continuum can result from electron-ion recombination or changes in the electron energy distribution in the plasma. Fixed wavelength detection using filters means that the desired emission may be indistinguishable from other emissions in the plasma.
It is known that bandpass interferometric filters can be tuned to shorter wavelengths by tilting the filter with respect to the incident light. Tilting the filter effectively changes the path length of the light between the dielectric layers without changing the layer separation or composition (as pointed out above, the distance between layers is fixed). Hence, the transmission peak of a given bandpass interferometric filter can be tuned slightly to shorter wavelengths by tilting the filter to an appropriate orientation. FIGS. 1 and 2, which are taken from the Oriel Optics catalog of 1986, illustrate the effect of varying the angle of incidence of a collimated beam on bandpass interferometric filter. FIG. 1 shows that if the angle of incidence is increased, the peak wavelength is shifted to shorter wavelengths. This shift is due to the fact that the path difference between the direct transmitted beam and the beam formed by the multiple reflection decreases. The angle shift in peak wavelength can be estimated for angles less than thirty degrees using equation 1: ##EQU1## where: a is the angle of incidence,
λa is the peak wavelength at angle a,
λo is the peak wavelength at normal incidence, and
Ne is the incidence angle shift factor or the "effective index of refraction" of the filter.
Ne is not the actual refractive index of the spacer layer, rather it is dependent on both the high and low index materials in the filter. Oriel Optics experimentally determined that Ne in a zinc sulfide/cryolite system is 1.45 for a cryolite spacer layer and 2.0 for a zinc sulfide spacer layer. FIG. 2 plots the approximate wavelength shift versus the angle of incidence, as calculated according to equation 1, for two bandpass interferometric filters which each include a sulfide/cryolite system and where one uses a cryolite spacer layer and the other uses a zinc sulfide spacer layer. For small angles (e.g., under 30 degrees), the shape of the band pass does not change appreciably except for a small reduction in transmission. However, at larger angles band pass shape becomes highly distorted. For 5 nm and 10 nm filters, shifting by about 10 nm without drastic change in the band pass shape can be achieved.
Narrow and very narrow bandpass interference filters are a subset of bandpass interferometric filters and include filters having a full-width half maximum (FHWM) ranging between 0.1 nm and 1 nm. The distinctions between bandpass interferometric filters, narrow bandpass filters, and very narrow bandpass interference filters are qualitative. The FHWM refers to the error in wavelength detection measured at one half the peak height. Narrow bandpass interference filters are available from the Andover Corp. of Massachusetts as well as other vendors. Narrow bandpass interference filters show a critical dependence on filter orientation to collimated incident light. For example, if a very narrow bandpass interference filter having an FHWM=0.2 nm varied by 5� from normal incidence, an approximately 1 nm shift in peak wavelength will occur without significant broadening of the transmission curve. Hence, unlike 5 nm and 10 nm bandpass interferometric filters which shift about 10 nm without drastic change in band pass shape, very narrow bandpass interference filters have considerably less range, but have improved spectral resolution over that range.
The present invention uses the "problem" of angular dependent wavelength shifts with narrow bandpass filters as a means to greatly improve optical emission detection sensitivity. Specifically, the invention contemplates mounting a narrow bandpass filter in a holder which can be rapidly tilted with respect to the collimated light collected from a plasma reactor. By tilting the bandpass filter 5�, an approximate range of 1 nm can be scanned with a bandpass of better than 0.2 nm at the half height or 0.05 nm at 90% transmission maximum. FIG. 3 shows a plot of the transmission of the filter versus wavelength where the bandpass is 0.2 nm at the half height and 0.05 nm at 90% transmission and shows how the plot shifts as the narrow bandpass filter is tilted. A photomultiplier tube is used to detect the transmitted light through the tilting narrow bandpass filter. The output from the photomultiplier tube is sent to an oscilloscope or lock-in amplifier which is synchronized with filter movement. Therefore, the lock-in amplifier can sensitively measure a change in the photomultiplier signal as a function of filter orientation.
Since atomic emission lines are extremely sharp (e.g., on the order of 0.0001 nm) any atomic emission detected will show a very strong signal dependence on filter orientation. This dependency on filter orientation provides the advantage of effectively eliminating background emission noise (i.e., background emission is considered to be the emission which is relatively constant over the range of wavelengths scanned). Eliminating background emission enables the detection of very small signals on a large background. In the conventional method of using bandpass filters where the bandpass filter is fixed (i.e, it is not tilted as referenced above to Harshberger et al., J. Electronic Materials, 7, 429 (1978)), small signals could not be distinguished from a large background because both signal and background are continuously detected. In this wavelength specific detection technique, signal is distinguishable from background. Hence, background subtraction as well as high light throughput and high spectral resolution make the inventive means of optical emission detection wherein a narrow bandpass interference filter is rapidly tilted to achieve a scanning function a far superior means for monitoring plasmas than the conventional optical emission detection systems which use monochromators or fixed wavelength bandpass filters.
The foregoing and other objects, aspects and advantages will be better understood from the following detailed description of a preferred embodiment of the invention with reference to the drawings, in which:
FIG. 1 is a graph showing the bandpass shifting towards a shorter wavelength when the angle of incidence of collimated light on the bandpass interferometric filter moves away from normal;
FIG. 2 is a graph showing the calculated percentage of wavelength shifting which occurs as the angle of incidence of collimated light changes for two different bandpass interferometric filters;
FIG. 3 is a graph showing a plot of the transmission of light versus wavelength when the narrow bandpass interference filter is perpendicular and angularly oriented with respect to the incidence of light;
FIG. 4 is a schematic drawing showing a Fabry-Perot interferometer used to monitor a process chamber;
FIG. 5 is a schematic drawing showing a narrow bandpass interference filter used to monitor a process chamber;
FIG. 6 is the same system shown in FIG. 5 except that a galvanometric oscillator is used for tilting the bandpass filter;
FIG. 7 is an oscilloscope display showing the sodium emission in a CF4 plasma using a narrow bandpass filter tilting at 16 Hertz (Hz); and
FIG. 8 is an enlarged oscilloscope display showing the sodium emission in a CF4 plasma using a narrow bandpass filter tilting at 16 Hertz (Hz) over a single sine wave period.
Referring now to the drawings, and more particularly to FIG. 4, there is shown a process chamber 10 wherein etching processes, such as reactive ion etching (RIE) and the like, performed in the fabrication of solid state devices such as transistors (not shown) are performed. A fiber optic cable 12 is used to collect light from the plasma chamber 10 and transport it to a collimating lens 14. It is anticipated that the fiber optic cable 12 could be eliminated and the collimating lens 14 alone could be used to both collect and collimate light emitted from a reactor window (not shown). It is also anticipated that more complex arrangements which may include multiple fiber optic cables, multiple lenses in series, apertures, and baffles, are likely to be used to collect and collimate light from the plasma chamber 10 since there are many different, well established, techniques for fulfilling these functions. Collimation, of course, can be achieved using a series of lenses where the distances between the optical fiber and each of the lenses are appropriately adjusted. The collimated light from lens 14 is passed through a pre-filter 16, or series of pre-filters, so that multiple order transmissions are blocked out. A narrow bandpass filter (approximately 1 nm) would be a suitable pre-filter 16 and would block many of the unwanted multiple orders that the Fabry-Perot interferometer 18 would otherwise pass. A monochromator could be substituted in place of pre-filter 16 for fulfilling the function of eliminating the transmission of multiple orders; however, if a monochromator were used, it should be set such that the percentage of light transmission through the monochromator is very high.
The filtered, collimated light is then transmitted to an air spaced Fabry-Perot interferometer 18. Fabry-Perot interferometers 18 are commercially available from a number of sources and typically comprise two glass plates with aluminum reflective coatings 20 and 22, respectively, separated by an air space or etalon 24. In order to tune the Fabry-Perot interferometer 18, a piezoelectric drive 26 or some other suitable means is used to vary the separation between the plates 20 and 22. The Burleigh company of Massachusetts makes a Fabry-Perot interferometer 18 which is combined with a piezoelectric drive 26. Using a very sensitive means to vary the separation between the plates 20 and 22 such as a piezoelectric drive 26 allows the transmitted light to be tuned with very high resolution (e.g., on the order of 0.001 to 0.08 nm) over a narrow wavelength range. The Fabry-Perot interferometer 18 is capable of transmitting seventy percent or more of the light at the selected wavelength, which compares very favorably relative to a monochromator which only transmits five to ten percent of the light at a selected wavelength and typically has lower resolution.
The light transmitted from the Fabry-Perot interferometer 18 is collected using lens 28 and sent to a photomultiplier tube 30 for sensing. It is anticipated that other sensing devices such as photodiodes and the like could be used instead of the photomultiplier tube 30 and that the desired sensitivity will dictate which light sensing arrangement is used. Photomultiplier tubes 30 are commercially available from RCA Electronics and EMI Electronics and require a high voltage input 32. The high voltage input 32 is used in the photomultiplier to achieve a high bias potential between successive electron amplification stages for greater detection sensitivity. Output from the photomultiplier tube 30 is sent to an oscilloscope 34 or other suitable signal processor. The wavelength transmission of the Fabry-Perot interferometer 18 varies with plate 20 and 22 separation and is synchronized by the piezoelectric driver 26. Hence, the oscilloscope 34 also receives output from the piezoelectric drive 26 so that the selected wavelength determined by the Fabry-Perot interferometer 18 can be correlated with the light sensed by the photomultiplier tube 30.
Hence, the arrangement shown in FIG. 4 allows an operator to rapidly determine the intensity of emission of a specific wavelength of light from all of light emissions within a specific wavelength range which occur in a processing chamber 10 while etching the solid state devices. Therefore, the presence of trace constituents such as sodium ion, which fluoresces only at the excitation wavelengths of 588.996 nm or 589.593 nm, can be detected by using the Fabry-Perot interferometer 18 to select these wavelengths and using the photomultiplier tube to sense if light is transmitted at these wavelengths. In a particular trace constituent confirmation scheme, the piezoelectric drive 26 drives the plates 20 and 22 to two different separations 24 so that emissions at both wavelengths can be detected and used as a confirmation of the presence of sodium. The continuous background emission is also distinguished from the wavelength specific sodium emission. In another use, the Fabry-Perot interferometer 18 can be used for etch endpoint detection where the interferometer 18 is used to detect copper atoms which are present in aluminized lines. During personalization, or the wiring and interconnection of multiple circuits on a microchip, oxide is etched until metallized lines containing aluminum (Al) that include 2-3% Copper (Cu) are exposed. Al cannot be easily used for endpoint detection because the counter electrode and chamber walls are sources of Al emissions; therefore, the Al from the line is not easily distinguishable from Al sputtered from the walls and electrode of the plasma processing tool. However, it is possible to use the small amounts of copper from the aluminum metallurgy to monitor etch endpoint because small via pattern factors (2-5%) and the small percentage concentration of Cu in the Al metallurgy (2-5%) result in a very low concentration of Cu in the plasma. Copper emission can be detected at 522.006 nm and 521.820 nm using the same concept described above for sodium detection, i.e., detecting emissions at the two wavelengths confirms the presence of copper.
Because the Fabry-Perot interferometer 18 allows a greater light transmission at the desired wavelength than a monochromator, the system shown in FIG. 4 has much greater sensitivity than convention optical emission systems. Moreover, the high spectral resolution of the Fabry-Perot interferometer 18 enables the optical system of FIG. 4 to take full advantage of the very narrow linewidth of atomic transitions which further aids in detection sensitivity and greatly reduces the likelihood of interference resulting from other plasma species emitting at wavelengths close to the desired wavelength. Scanning the Fabry-Perot interferometer 18 allows for the subtraction of background light and thereby, further, improves detection sensitivity. Also, since atomic emission doublets or triplets may be resolved, positive identification of a particular atomic species is possible. Monochromators, which often have lower resolution, tend to blur fine emission structure and, therefore, cannot be used to determine singlets from doublets.
FIGS. 5 and 6 show alternative optical emission detecting sytems which utilize an interferometric technique for detecting the presence of trace constituents similar to that shown in FIG. 4. For example, a fiber optic cable 12 collects and transports light emissions from a processing chamber 10 in which an etching procedure or the like is being performed. A collimating lens 14 collimates the light from cable 12 and directs it towards an interferometer, shown generally as 40, which allows the high light throughput transmission of certain wavelengths of light. A lens 28 collects the emissions at the selected wavelengths and directs them into a photomultiplier tube 30 driven by a high voltage power supply 32. As described above in conjunction with FIG. 4, there can be several variations on the types of equipment used for collecting, collimating and sensing the light emissions during processing and all those variations are equally applicable with regard to FIGS. 5 and 6. The chief difference between the system shown in FIG. 4 and the systems shown in FIGS. 5 and 6 is the type of interferometric system 40 which is used for selecting the wavelengths of light or scanning through a small range of wavelengths.
FIGS. 5 and 6 show a narrow bandpass filter interferometer 42 is connected to a swivel mount 44 and is positioned in the path of the transmitted light. As pointed out above, narrow bandpass filters 42 are commercially available Andover Corp., Oriel Optics, Spindler, and Hoya, and are used for etch endpoint analysis in present day processing chambers 10. The present invention differs from the prior art in that the narrow bandpass filter interferometer 42 of the present invention is tiltable with respect to the collimated light from lens 14. The inventors have found that the phenomena of tuning a narrow bandpass filter interferometer 42 to shorter wavelengths, which results from tilting the filter with respect to incident light such that the path length of the light between the dielectric layers is changed (i.e., the angular-dependent wavelength shift discussed above), can be used as a means to improve optical emission detection sensitivity. Another advantage of the arrangement shown in FIGS. 5 and 6 is that pre-filters 16 are not required since multiple order transmissions are not a problem when a narrow bandpass filter interferometer 42 is used, unlike when a Fabry-Perot interferometer 18 is used.
FIGS. 5 and 6 show the narrow bandpass filter interferometer 42 is connected at its lower portion to angle unit 43 or galvanometric oscillator 45, respectively; however, it is anticipated that any configuration for mounting the narrow bandpass filter interferometer 42 such that it can be rapidly tilted with respect to the collimated light from lens 14 will be within the scope of the present invention. In a preferred embodiment, the narrow bandpass filter interferometer 42 has an FHWM on the order of 0.2 nm. Any device that responds in a smooth reproducible manner can be used to angularly drive the narrow bandpass filter interferometer 42. For example, a speaker cone 46 as shown in FIG. 5, a piezoelectric drive (not shown), or a galvanometric scanner shown in FIG. 6 can be used for tilting the narrow bandpass filter interferometer 42.
In the configuration shown in FIG. 5, a speaker cone 46, which responds very smoothly to a sine wave, is driven by the output of a sine wave audio driver 48 to rapidly tilt the narrow bandpass filter interferometer 42 reproducibly in phase with the audio frequency sine wave. Undesired motion of the narrow bandpass filter interferometer 42 can be dampened using a spring 50 connected to a weight 51 at the base of said narrow bandpass filter interferometer 42 or by adding other suitable frictional inhibitors to the phase tilt unit 44.
In the preferred configuration shown in FIG. 6, the narrow bandpass filter interferometer 42 is rapidly tilted at a frequency ranging between 5 and 300 Hz by means of connection to a galvanometric oscillator scanner 45 such as the G320 scanner available from General Scanning of Watertown, Mass. The scanner 45 is driven by a sinusoidal frequency supply 49. This tilts the narrow bandpass filter interferometer 42 with respect to the incident light collected from the processing chamber 10 so that the narrow bandpass filter interferometer 42 can be made to scan approximately a 3 nm range of wavelengths with a bandpass better than 0.2 nm at the half height or 0.05 nm at 90% transmission maximum. Closed loop galvanometric scanners 45 are now available so that the angular motion of the filter 42 is highly accurate and reproducible. Output signals from the sine wave audio driver 48 shown in FIG. 5 or the sinusoidal frequency driver 49 shown in FIG. 6 and from the photomultiplier tube 30 are sent to a lock-in amplifier 52. Lock-in amplifiers are commercially available from Stanford Research Instruments and EG&G PAR.
By feeding the photomultiplier tube 30 output into a lock-in amplifier 52 which is synchronized with the narrow bandpass filter interferometer 42 movement (i.e, via the output from the sine wave driver 48 or 49), the lock-in amplifier 52 can sensitively measure a change in the photomultiplier tube 30 signal as a function of the narrow bandpass filter interferometer 42 orientation. Since atomic emission lines are extremely sharp (on the order of 0.001 nm), any atomic emission detected will show a very strong signal dependence on bandpass filter 42 orientation. In addition, the lock-in amplifier 52 effectively eliminates background emission since the background emission is relatively constant over the small range of wavelengths scanned (3 nm) and an emission at a specific wavelength in that range will appear as a relatively sharp spike. Hence, the arrangements shown in FIG. 5 and 6 are capable of detecting small signals on a relatively large, continuous background and can be used to distinguish closely spaced specific lines.
In the past, narrow bandpass filters have been angularly oriented to center the transmission peak on a particular emission line, but in this invention, it is the intentional scanning onto and off of an emission line which makes possible higher sensitivity by baseline subtraction. Since the background light level can sometimes exceed the intensity of an emission line in the case of a trace species, even when a very narrow bandpass filter is used, baseline subtraction provides an important improvement to the use and performance of this technique. Moreover, since the narrow bandpass filter 42 of the present invention is made to scan a broad (3 nm) wavelength range, the problem of having to exactly angularly orient the filter is eliminated. Furthermore, since multiple lines of a given atom may be detected using a scanning filter 42, positive identification and higher selectivity may be achieved than is possible with a fixed position filter.
As described above in conjunction with FIG. 4, sodium ion (Na) fluoresces at the excitation wavelengths of 588.996 nm and 589.593 nm. A 0.2 nm FWHM narrow bandpass filter interferometer 42 can be angle modulated to detect both lines if it is centered at 589.6 nm and the filter 42 is tilted rapidly (5-300 Hz) to scan a 3 nm range of wavelengths. The doublet emission of sodium should clearly be identifiable as the angular position of the narrow bandpass filter 42 is changed with respect to the collimated light.
In one example, starting with the narrow bandpass filter 42 at normal incidence to the collimated light, no sodium emission is transmitted because the filter 42 has been designed to transmit longer wavelengths (590.000 nm) at normal incidence by the manufacturer (Andover Corp.). As the filter 42 angle is changed (angle arbitrarily assigned as +), the 589.593 nm emission is first transmitted with increasing angle and the 588.996 nm emission is transmitted second for detection by the photomultiplier tube 30. Increasing angular displacement in the same direction tunes the filter 42 towards shorter wavelengths so the filter 42 again blocks transmission of either sodium line; however, any wavelength-continuous emission will be transmitted. The filter 42 will then reach its maximum angular displacement and then retrace its movement in the opposite direction towards normal incidence. During this cycle, the two sodium peaks will be detected again, since the filter transmission is determined by the angle of incidence, rather than the direction of motion. After reaching normal incidence, the filter 42 will continue its angular motion (in the - direction with respect to collimated light). Transmission response of the narrow bandpass filter 42 will be identical for the two previous half cycles since the filter transmission is symmetric with respect to positive and negative angular displacement. Because of this, during one sinusoidal period, a single emission line is detected as four peaks and a doublet (such as sodium) is detected as eight individual peaks, or two peaks during each of the four phases of one cycle.
FIGS. 7 and 8 show the detected emission signal from a 0.2 nm bandpass filter tilted at 16 Hz, during reactive ion etching of a pyrex substrate in a CF4 plasma. Sodium emission results from the trace presence of sodium tetraborate added to this glass. Over each complete sine wave period in FIG. 7, eight peaks are observed. These eight peaks correspond to four measurements of each of the two sodium emission doublet lines. FIG. 8 shows an enlarged view of data obtained with the angle-tuned narrow bandpass filter over a single sine wave where the eight peaks which are observed provide a reliable identification of sodium emission. Determining the difference between the height of the peaks in FIGS. 7 and 8 and the baseline between periods is one method for subtracting the continuous background emission of the plasma and enhancing sensitivity to sodium detection. Subtraction of the peak height from the baseline may be performed digitally or by using a phase sensitive lock-in amplifier.
Furthermore, it is possible to calibrate the modulated signal against a known intense sodium emission source such as a glass rod in a flame. Since sodium emission of the 588.996 nm line should always be accompanied by emission at 589.593 nm, the measured presence of the doublet can be used to further improve the detection sensitivity of this technique. In this case, background subtraction provides a means for measuring weak emission lines against the background level of the plasma and the high resolution of the technique further improves detection sensitivity and reliability.
In a similar manner to identifying sodium impurities, etch endpoints can be identified by sensing trace copper emissions that would be emitted when the etch process reaches an aluminized line containing copper atoms. Copper emissions are detectable at 522.006 nm and 521.820 nm. By centering a 0.2 nm FWHM narrow bandpass filter at 522.010 nm and angle modulating it through a 3 nm range, both copper emission lines will be observed and the presence of both lines can serve as a confirmation that copper has been detected. Background subtraction is used to provide sensitivity of detection and high resolution is used to provided identity of emission as well as to improve sensitivity since both lines must be observed.
An alternate embodiment of the invention uses a narrow bandpass filter which is alternately positioned in two angles corresponding to a wavelength on the center of a peak, such as sodium, and a wavelength off the emission peak. Instead of smoothly scanning back and forth between the two positions, measurements are recorded at one position for a fixed time increment (with the signal level averaged during this time for an improved signal to noise ratio), then the position is rapidly switched to the alternate setting and similar averaged measurement is made. The background level, corresponding the off-peak position, is subtracted from the signal level measured at the on-peak position. Background subtraction by this approach improves detection sensitivity, but does not provide a spectroscopic verification of the signal identity (i.e., as by the measurement of a doublet).
While the invention has been described in terms of its preferred embodiments where either a Fabry-Perot interferometer 18 or a tiltable narrow bandpass filter interferometer 42 are used to identify trace constituents during a transistor or semiconductor manufacturing process such as during etching or plasma assisted deposition, those skilled in the art will recognize that the invention can be practiced with modification within the spirit and scope of the appended claims.
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|Mcneil John R
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|Method for manufacturing a piezoelectric film wafer, piezolelectric film element, and piezoelectric film device
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|Lopushansky Richard L
|Method and apparatus for continuous readout of Fabry-Perot fiber optic sensor
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|Jeffers Larry A
|Interferometric signal conditioner for measurement of absolute static displacements and dynamic displacements of a fabry-perot interferometer
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|Jul 24, 2008
|Berthold John W
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|Apr 24, 1996
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|U.S. Classification
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|Dec 26, 1990
Owner name: INTERNATIONAL BUSINESS MACHINES CORPORATION, ARMON
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:SELWYN, GARY S.;WALKUP, ROBERT E.;REEL/FRAME:005564/0969;SIGNING DATES FROM 19901221 TO 19901226
|Sep 25, 1996
|Fee payment
Year of fee payment: 4
|Jan 30, 2001
|Maintenance fee reminder mailed
|Jul 8, 2001
|Lapse for failure to pay maintenance fees
|Sep 11, 2001
|Expired due to failure to pay maintenance fee
Effective date: 20010706


text:
Project Description
Mellow red brick Tudor mansion with original kitchen, try bakehouse and brewhouse from the 15th century. Award winning re-creations of Tudor life and World War II and other events throughout the year including, among others, A Dickensian Christmas, Scaresville and outside music events.
The great annual Tudor re-creation is mid June-mid July with 250 + Tudors. There are also rare breed animals, woodland trails and a cafe.
Kentwell Hall, Long Melford CO10 9BA
W: www.kentwell.co.uk

subset: commoncrawl


text:
- HubPages»
- Education and Science»
- Medicine & Health Science
Memoirs from a Nursing Career
Graduation Pics
Those Were The Days
When I graduated from nursing school, I considered myself through with school. I had a guaranteed job at the local hospital, no specialty needed. A nurse was a nurse, either a R.N. or an L.P.N. We had not heard of nurse practitioners.... Just as-- A cook was a cook, not a chef.... A telephone was in the house only, and "Little House on the Prairie" was on our small box television. Jimmy Carter was president of the U.S.A.
My first nursing position was working at night on a generalized Medical-Surgical floor. I took care of all types of patients on that floor. Psychiatric patients, heart patients, cancer patients, urology patients - they could all end up in my charge. If a nurse called in sick from the Emergency room, Pediatrics, or any other place, one of us would simply be "pulled" to the other area.
And yes, I wore a white hat.
A Bit of Nursing History
Nurses have been part of society for centuries. Similar to mothers, nurses were known to "nourish" orphans and the sick. They carried basins of water and bedpans. It was a job for the poor, and not something that an educated woman (or man) would do.
Most of you have probably heard of "Florence Nightingale". Ms. Nightingale was considered the "first modern nurse." She was the one who took what had been considered a lowly job, and worked to improve job conditions and respect for nurses. In 1860 she founded a school for nurses in England.
According to Wikipedia, Linda Richards was the first trained American nurse. She graduated from the New England Hospital for Women and Children in 1873.
Religious organizations and the Military also brought increased respect for nursing around the world in the late 19th, and early 20th century.1
Nursing Is Changing
Over the years nurses, hospitals, and the nursing profession have changed. Some changes are for the better, but I am not sure if all the changes are.
Charting used to consist of a few lines, and some checks, per shift on a paper chart. Each shift at my hospital used a different color pen. There were no detailed assessments. Now all charting is on computer with nursing assessments worthy of MD status. Does this make care better?
Don't get me wrong. I love computers. I actually worked at one of the first hospitals in southern USA to become computerized. I do not believe though, that computers have improved hospital care.
Back in the day of "three color pens", nurses had much more time to actually spend with their patients. We did not have to depend on nursing assistants to be our eyes, we had time to care for our patients ourselves. Patients were usually happier, and happy patients are less likely to sue the hospital. Super hospital acquired infections did not exist.
Many Roles, One Profession
More Recent Nursing Photo
Today's Nurse
Today's nurse is smart, and much better educated. Most begin their nursing career with a B.S in Nursing degree. Some come right out of school with a Masters Degree. They are computer savy, and probably couldn't imagine charting with pens. They are great with monitors and pumps, but not so great sometimes with nursing math, involving drip rates and drug conversions. They have never had to monitor drip rates on a free flowing IV. Pills come prepackaged at the time they are needed.
Nursing remains very fast paced, with no room for errors. Patients often have multiple IV lines, many IV meds, and are constantly being scheduled for procedures. Families are demanding, and expect their nurse to always have all the answers. Doctors are often difficult to get along with.
Nurses today must also quickly decide on an area of practice, and receive more training to become competent in their chosen specialty. Education is continuous, and certification becomes mandatory. Each area of a hospital is so specialized, that nurses are usually unable to be pulled to work in another area for which they have not trained.
Florence Nightingale would be proud. The image of nursing has surely improved. While a R.N. may still help with a bedpan at times, bedpans are no longer correlated as the main duty of a nurse's day. The image today is of a high tech nurse in scrubs, multitasking between patients, computers, and medications.
Nursing has come a long way over the years.
Consider Nursing as a Career
- http://www.discovernursing.com/job-opportunities
Find everything you need to know about starting a registered nursing (RN) career including information on nursing salaries, scholarships, schools, available programs, and more.
1. Wikipedia - History of Nursing
Great Hub, Susan. Thank you for sharing. The personal care nurses provide has always impressed me--it is indeed a noble & much needed calling. Blessings to you.
Great hub, Susan! I loved seeing the pictures!
Great hub. I'm glad that the white hats are gone!Nurses back then looked scary to children.(Well to me...lol!) Your memories are inspiring. I remember when nurses were in the rooms much more than they are today.
yes, the uniforms were nice ,clean and crisp...but ooooh..the hats!LOL!
I thoroughly enjoyed this hub and although I trained and worked in the Nursing profession in the UK I can really understand where you are coming from when you say Nursing has changed so much over the last 20/30 years.It certainly has and I'm inclined to agree with you that it hasn't necessarily been to the benefit of the patients.
I have to say that I would like to see nurses once again wearing the white uniforms instead of scrubs.
My younger sister is an RN. She works mostly in nursing homes taking care of older patients. As for HER being computer savvy...she doesn't even know how to set up an email address. In the nursing homes she was worked, the D.O.N. does all the computer work.


text:
quote "Nvidia's Director or PR, Derek Perez, has told Fudzilla that Intel actually won't let Nvidia make its Nforce chipset that will work with Intel's Nehalem generation of processors."
reference "http:/
Might i first say........ Hi Guys :)
This is an outrage in my opinion, i dont see why nvidia dont just give intel the damn info for sli i mean its really selfish in a way, this also means there is gonna be major conflict and performance drops in intel/nvidia setups :(
I was going to bed at night dreaming of having an intel 8 Core cpu and whatever new nvidia card was out at the time and getting like 60000000000000000 3d marks but if this conflict between nvidia and intel keeps happening, the nahalems aren't gonna be as efficient and awesome as expected :(
as much as i hate to say this.......... ATI are going to BOOM if this issue is not avoided.
2 Replies
Aug 6, 2008 at 4:17 UTC
It's pretty simple in my eyes - avoid nForce, which hasn't been anything but a competent chipset since the nForce 2 (with its great APU, Soundstorm)...
Yes, its enthusiast hardware, but then Nvidia have never really been that good at anything except graphics.
Aug 6, 2008 at 5:56 UTC
yeah but i really am pissed off over this little tussle
This discussion has been inactive for over a year.
You may get a better answer to your question by starting a new discussion.


text:
Small list today. I sold yet another two domains this past week. This time one of them was from Toby's newsletter (floridahomeloans) . A potential buyer saw it on his list and we negotiated a deal (yes I am paying Toby full commission). The second was to a company to upgrade their domain name. I had reached out to them with the name and price. I didn't negotiate much. I merely said I had it for sale and it was X,XXX price. They wired money into my account that same day. It was a hell of a January. Because of the sales I have kind of been taking it easy. Writing even less than I normally have. Between all the domain work, name hunting, and nursery work, not as much time for writing. Here are today's names and the daily quote.
"The way to get started is to quit talking and begin doing" -Walt Disney
Television.cc No bidders. I know the extension is crap but I'm going to take a flyer on it if nobody else does. Instead of betting on the Ravens today I am going to put my money in dot cc domains.
ConcreteMedic.com Concrete needs fixing all the time. For $25 I'm pretty sure you could sell this to a guy that already has this name or wants to start a concrete repair company and needs a good brand
CreativeStorm.com It sounded like a good brand to me and after Googling it I realized 10 or 20 companies agree with me. They just don't own the dot com
ThinBooks.com No bidders. Several uses for this short two word dot com. Books that are actually thin and thin notebook computers. 10 year old domain
gold.cc Hell, if I like television I guess I ought to like gold.
Pay.cc This one is getting all the action because cc can mean credit cards. At least that is what I am assuming
CordBloodCenters.com For $12 not a bad number to help people find cord blood banks.
Go Daddy Featured Offer! Save 47%* off your order! Offer Ends 2/12/13!
YankeeClipper.com Plenty of places and things named this. Also Mark Wahlberg's nickname in The Other Guys because he shot Derek Jeter
HomeChef.com I have a home chef. Also known as my wife
uInvent.com For only $119 we'll help you take your invention from idea to millions in sales
Smoking Hot Savings! $2.95 .COM from GoDaddy.com!


text:
PEBBLE BEACH, Calif. -- When does introspection become self-obsession? When does self-medication become hypochondria?
These are questions worth pondering as the NHL's board of governors ended their two-day gathering here on the left coast, discussing, once again, the state of the game.
Now, there's absolutely nothing wrong with the game's gate-keepers having regular, healthy debate over how to make things better. All good corporations do just that, and those that don't run the risk of becoming irrelevant or falling into disrepair.
Topics of Discussion
The NHL's board of governors finished their two-day meeting in Pebble Beach without making any changes to existing rules. These were among the topics that were discussed Friday:
• Standards of officiating: Although some coaches and GMs have grumbled that the standards have eroded since the end of the lockout, video of games from before and after the implementation of the new standards were juxtaposed and NHL commissioner Gary Bettman said the differences are still "night and day."
• Bigger nets: There was some discussion of bigger nets, but Bettman said it remains off the radar in terms of potential implementation.
"I think there is a natural reluctance to go in that direction, but with recognition that if you felt that there was a sufficient problem and that was the only way to address it, it would be your last resort. I don't think anybody's careening out of control in that direction," Bettman said.
• Salary cap: There was further discussion of the salary cap which will rise again next season. Board of governors chairman Jeremy Jacobs said the players will be paid more than they've ever been paid (although Bettman said that's not necessarily the case).
"It is what it is," Jacobs said. "It isn't like we're spending too much based on something out of control. It's staying within a very controlled environment and they're being enriched and rewarded for the success of the league. Hopefully, we'll be giving them more money than that in the future. Hopefully the business will continue to grow."
• No discussion of expansion: There was speculation before the meetings that expansion may have come up during the talks, but Bettman said the issue did not surface. Las Vegas, Kansas City, Houston, Winnipeg and Hamilton, Ontario, are still rumored to be potential NHL destinations.
-- Scott Burnside
But no other sport spends as much time chasing its tail trying to "fix" itself.
What is the casual fan, the fan the game is desperate to lure into the fold, to make of the constant self-recrimination and debate over what's wrong with the game and what's to be done about it?
Too little scoring, the trap, bigger nets, illegal defenses, goalie equipment, bigger ice and a host of other issues and potential solutions constantly muddy the waters surrounding the game.
Who could blame them for saying, "If the game needs that much work, then why should I waste my time?" Or, simply, "Get back to us when you're done."
Many in attendance here seem to share the sentiment that the NHL needs to be careful about the messages it sends to the very people to whom they're trying to appeal.
"The more you talk about it sometimes, the more it makes it seem you've got things that you've got to do. It becomes a self-fulfilling prophecy," suggested Toronto GM John Ferguson. "There is so much that's already great about the game. Let's let it evolve. Let's let the players' talent show. There was really a focus on showcasing our stars and providing access and a real commitment to doing that."
Los Angeles GM Dean Lombardi was happy to hear his colleagues talk about being more cautious about making changes.
"I think the most important thing they said in there, which I think is accurate, is that maybe we've got to spend a little more time on research when we make changes, which I've always kind of advocated," Lombardi said.
"It's sort of like we did [with] the crease rule and Brett Hull's toe ends up in it. These are things I think we probably could do a better job in projecting the potential liabilities," Lombardi said, referring to Hull's controversial Stanley Cup-winning goal in 1999 that, according to league rules, should have been disallowed. "Basically it's the way we do things versus what we're doing."
Buffalo president Larry Quinn made a formal proposal to the board of governors, asking that the league set up a research and development program to hammer out what changes would make the most sense to the game.
"We just talked about what the essence of the game was and whether we should do [research] so we can determine what the effect of proposed rule changes would be," Quinn said. "If somebody wants to go to a bigger net or a smaller catching glove or anything, we have the desired outcome at the end by researching it before we do it. And I don't know how it was received. It'll be interesting to see what people thought.''
No one is suggesting the game is perfect. Or even close to it. And the pursuit of perfection is an admirable goal if it doesn't obscure what is already good and unique about the NHL.
Spend some time around the NFL or Major League Baseball or the NBA, and there is little of the kind of ruminating that dominates much of the discussion of the NHL. There are changes periodically, and, sometimes, like the three-point line in basketball or lowering the pitcher's mound in baseball, they are significant changes. But the alterations do not become central to the game's identity.
In some ways, that has become the reality for the NHL because of significant changes made to the game coming out of the lockout, including the removal of the center red line, the introduction of the shootout and the first real and true crackdown on obstruction fouls.
Now, in its third post-lockout season, the ramifications of those changes are still being felt and are evolving. Sometimes the effects of the changes aren't what was expected or desired. The elimination of the red line, for instance, hasn't opened up the game as expected. Still, it has been a factor in how some coaches, especially those on slower, less skilled teams, have found ways to clog the neutral zone by playing passive 1-3-1 or 1-4 styles that disrupts the flow that's key to the game's appeal.
"What we said is, goal scoring is going down, we don't think the zone trap is what our fans want to see, and we've got to find a way to get it out of the game without damaging the game. And that requires a lot of research and development in my opinion. So it was a good discussion," Quinn said.
Fair enough. No one wants to see a trap. But the reasons goal scoring is down are multi-layered -- a precipitous decline in the number of power-play opportunities and power-play goals is another factor which suggests players are actually learning not to hook and hold.
San Jose Sharks coach Ron Wilson said many of the game's poor skaters have been weeded out because the pace is so much greater since the end of the lockout.
"We've taken just about every bad skater there was in the league and he's not playing," Wilson said. "That's especially true on the back end. That's a good thing; but on the other hand; it's a bad thing for offensive hockey. I wish we had all the bad skaters playing defense so you could skate around them. Now, everybody's eliminated their bad-skating defensemen and now they've all learned how to defend, generally speaking."
The debate on scoring also assumes that having more goals should be the game's Holy Grail. It shouldn't.
"Does [the decline in scoring] make it a bad game necessarily? A lot of people ask that question," offered Jim Devellano, senior vice president of the Detroit Red Wings and a member of the organization for 26 years. "I grew up in an era in the '50s and the Original Six when I used to see games that were 2-1, 3-2, we had ties, 1-1. And I thought the games were terrific, so I don't know that we need to put as much emphasis on scoring a lot of goals to make the game interesting.
"The biggest concern I have is that you can't every year change the style of play ... because what happens is, you're always saying there's something wrong with your game or your product and I don't that that's healthy."
Anaheim GM Brian Burke agrees.
"People wring their hands about that but I don't think goals sell our game. It's scoring chances," he said. "I've said that for years and I've built my teams on that in terms of entertainment value. If you go to a game, there's a series of events that entertain you -- scoring chances, a fight, a big hit. Our goal is to provide as many of those per period. We don't need more goals.
Scott Burnside is the NHL writer for ESPN.com.


text:
Man shot by S.J. police accused of biting cop, crime spree
Updated 4:31 am, Friday, February 14, 2014
(02-13) 18:49 PST SAN FRANCISCO -- A man shot and wounded by San Jose police at the end of a chase had carjacked a resident and assaulted a sleeping family at another home moments earlier, police said Thursday.
Gulmaro Martinez, 28, has been charged by Santa Clara County prosecutors with burglary, assault with a deadly weapon and carjacking for the alleged crime spree early Sunday.
The series of incidents began about 2:30 am. when Martinez, armed with a shotgun, broke into a home on Waterman Court and assaulted two adults and a child as they were sleeping, said San Jose police Sgt. Heather Randol.
Latest news videos
The victims were taken to the hospital and treated for head lacerations.
A half-hour later, police said, Martinez accosted a resident on Holly Drive and stole the victim's car before leading police on a five-minute chase through a residential neighborhood.
Martinez turned onto Kotake Court, a dead-end street off North White Road, and rammed a marked patrol cruiser, injuring the officer inside, Randol said.
Officer Marco Monzon, a five-year veteran, fired his weapon, hitting Martinez twice, police said. The suspect continued to struggle with officers, biting one of them before he was subdued, police said.
Martinez is in police custody at a hospital and will be booked at Santa Clara County Jail in lieu of $400,000 bail when he is medically cleared.
Henry K. Lee is a San Francisco Chronicle staff writer. E-mail: firstname.lastname@example.com Twitter: @henryklee


text: To get from Sesto San Giovanni to Syracuse by train you can catch one of the 10 trains that everyday travel between these two cities. The first train to Syracuse leaves from Sesto San Giovanni at 06:29 and the last train departs at 22:30. If you choose a local train the trip lasts on average 00:15 hours. For your trip from Sesto San Giovanni to Syracuse by train you can choose to leave from one of Sesto San Giovanni main stations: Sesto S. Giovanni On Wanderio you can compare all schedules, fares and railway companies to Syracuse and book the best itinerary starting from Sesto San Giovanni.


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Text (in Stretched English):
Hyrbi, thy yleven brovinses of Stretch dyklare that they are their own nashon. Nobody has abbroved of their kulture yven tho there is nothing wrong with rubber bands. They kan and wil govern over themselves. Therefore, Stretch shoud by allowed to make their own kountry built on rubber, wich shal by a Utopya for al! I, Hakym Gy, found thy Kingdom of Stretch, and name miself thy prime band aid. Unlike macronashons, Stretch will allow anybody intoo thy country.
Hakym Gy
Lane Bernado
Maya Prise
Seth Nikson
Troy Kuin
Webber Kuals
Dale Ewing


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Cracking Varnish
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Water-based varnish that can be used on any painted or smooth surface ( glass , metal, wood, cardboard ) . Krakleeraus handles of the object the paint to create small cracks , giving the impression of an old object . soveltuvt a primer for water-based craft paints .
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HRBP Skills: From Concepts to Application
The role of HR has changed over the past twenty years, and as a result the HR professional is expected to bring an expanded set of skills, and a different kind of information to the boardroom table.
This series of workshops is designed to give HR professionals the practical skills necessary to act as a true business partner within their organization. To lead, rather than follow.
Who Should Attend?
- HR Heads/Directors
- HR Business Partners
- HR Generalists
- Business Owners and Executives; or,
- Anyone interested in transforming the role of HR to a strategic business partner!
This course is built around 4 core modules:
Module 1: Business Analysis
Participants will recognize the advantages of a thorough analysis of all aspects of a business situation when preparing to pro-actively influence their business allies.
- Analyze situations from a company-wide, business perspective, as well as a human resources perspective using both qualitative and quantitative methods.
- Use the results of the analysis to construct logical and persuasive arguments in favor of a particular course of action.
- Measure the costs and benefits of the current state, their recommendations, and the desired state in order to sell the need to management and employees.
- Perform Stakeholder analysis and enlist powerful allies to drive change and handle resistance.
- Choose appropriate communication channels to achieve objectives.
Module 2: Consultation
Participants will recognize the need and benefits of taking a consultative approach with their business allies: thereby increasing commitment, resulting in long-term change due to a clearer understanding of the issues.
- Recognize the advantages and disadvantages of the consultative approach. Know which approach to use based on desired outcomes.
- Use constructive questioning techniques and active listening to work with colleagues to help them to identify and recognize needs, define problems, and uncover and agree on root causes of issues.
- Present analysis in clear and understandable ways, lead discussions towards resolution.
- Elicit potential, realistic solutions which can be committed to, scheduled, and monitored for success.
- Compare options using quantitative and qualitative measures to ensure best decisions are made.
Module 3: The Art of Persuasion
Participants will learn to present recommendations and solutions persuasively by connecting expected results to the personal and business motivators of their clients, showing a positive benefit/cost ratio, and presenting a strong business case.
- Outline the business case for a particular action and sell it to management.
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- Gain commitment by allowing colleagues to choose their own course of action based on logical examination of the facts.
- Uncover and overcome objections or resistance to recommendations.
Module 4: Consolidation
Participants will practice the full set of skills covered in the preceding three modules as a way to consolidate their understanding and develop "muscle memory".
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Hi Everyone!
We have a lot to update you about! Things have been pretty hectic as always, but we've made tons of progress so far and have some exciting news to share with you all!
We're currently in the process of setting up our new warehouse in San Diego, which will serve as a storage place for inventory and a distribution center to ship the EcoQube and all its add-ons to you! It was a lot of heavy lifting and hauling during move-in, but we managed to transport all of our supplies and equipment this past Sunday. Now, we're working to gather all the components of the EcoQube, including packaging, pumps, instructions, fish, driftwood, soil, and much more.
The tooling is finished, and the production model of the EcoQube arrived a week ago. The first sample was intact and functioning.There are only a few minor details that need to be tweaked with regard to the design and construction of the product.
We've been working extremely hard to follow through with our vision of creating a unique and gorgeous package, but after consulting with professionals and trying to create our "perfect" packaging, we've come to the realization that with low volumes, and now with limited time, we won't be able to get the packaging rendered exactly the way we want it to be.
Ideal packaging:
The best we could do:
Fun fact: In the process of learning about how to package a product, we actually learned that one of the many reasons why iPhones are made in China is because their packaging material (the gorgeous matte finished boxes) are made with 80%+ manual labor. Each one of those boxes we throw away can cost up to $8 EACH!
As a result, we've decided to go back to a more conventional box packaging. But of course, since we are perfectionists, we worked our butts off to make it as gorgeous as the EcoQube itself:
In the process of unpacking the aquarium and setting it up, we noticed several minor details of concern in user experience and aesthetics as listed below:
1. There is a small gap between the filter and its cover. This is likely due to the change of magnets on the filter cover, as we were unable to purchase the previous magnets that had worked in quantity.
2. We found that it was a bit difficult to install and adjust the light on the filter. Since we are changing the packaging, we will pre-install the light onto the filter and secure the wires that make it hard to adjust. The tightness of the rubbers will also be modified.
3. Similar to the situation with the magnets, we had trouble finding 12 volt DC pumps (which is much safer and can be used internationally) that were as strong as the 110V AC pump we had used before. When we finally found the 12 volt pump that would work for the filter, we noticed the angle of the new pump's output caused extremely inefficient water flow and unnecessary noise. We know there's room for improvement and believe that with a new piece to redirect the flow of water, all of these issues can be fixed with time.
We're doing our best to perfect the EcoQube within the coming weeks so that in the end, we can give you a quality product that we're proud of. Kevin will be visiting our manufacturers on July 22 to ensure that everything is fixed while the same standard of aesthetics and structural integrity is maintained. He will stay with them until the final product is complete and ready to be shipped.
As for the timeline for delivery, we have to consult our manufacturers to see exactly how long the modifications will take before giving a more accurate estimate. But if the issues can be resolved within the next month, we will still be able to deliver the EcoQube to you before the end of October!
That's it for now! Please feel free to message us directly if you have any questions!
We thank you so much for your support and patience as we work towards our goal of introducing the EcoQube and aquaponics to the world!
Team ADI


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Pedro Garcia
Black Leather " Diem" Wedge
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|Message view
|« Date » · « Thread »
|« Date » · « Thread »
|Tim Costello <timcoste...@ozemail.com.au>
|RE: Platform Specific MPM Design Questions
|Thu, 01 Jan 1970 00:00:00 GMT
On Wednesday, 24 May 2000, William A. Rowe, Jr. wrote: > http_main.c main() calls > mod_mpm_winnt ap_hook_args() calls > kernel32 StartService() calls > mod_mpm_hookservice() which will set up a vector to return back into > the return vector of the ap_hook_args() call so > we resume execution exactly where we left off. Aaaaah. I'm starting to see what you're getting at. You want http_main to contain the real main, and to do away with main_win32.c. Then, have the mpm do stuff, call the scm, then return to the end of the mpm, so main's always at the top of the call stack (instead of service_main). Right? > Recursive main() I hope won't happen. Not if I can get return vectors to > resume execution at the code step after launching the service. Any good > examples would be appreciated. [This does -not- have to be xplatform :-] I have another suggestion - what about the following for the mpm's pre-config hook: void winnt_pre_config() { if (running_as_service) { service_sync_event = CreateEvent(not_signaled); CreateThread(dispatcher_thread_proc); } ... /* all other pre-config processing */ ... if (running_as_service) { WaitForSingleObject(service_sync_event, INFINITE); SetServiceStatus(SERVICE_START_PENDING); } } int dispatcher_thread_proc() { StartServiceCtrlDispatcher(service_main); /* * blocks in above function "forever" - the thread becomes becomes the * service control dispatcher */ } void service_main() { /* save the service name somewhere if we need it */ SetEvent(service_sync_event); return; } I figure the phony ServiceMain is okay because it's unlikely that multiple (different) services will share apache's executable. I know this doesn't touch your problem of getting at the command-line - but it's another option that retains the flow of execution (and the values of main's local variables). It also might spark something better in someone else's head. Tim This message was sent through MyMail http://www.mymail.com.au
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Updated 12 November, 2016
MTV has said that it 'wrongfully' awarded the MTV EMA Award best Africa Act to Nigerian Musician, Wizkid.
MTV simply said it was as a result of 'an error' and said the award was for Tanzanian musician, Alikiba. The incident is particularly curious as Wizkid and Alikiba are reportedly rivals who have had rumored beef before.


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The cynic would be quick to shrug his shoulders at the Toronto Maple Leafs' win over the New York Islanders last night. After all, a matchup with the second worst team in the NHL that was forced to start its fifth-string goaltender following a mishap in the pre-game skate probably should result in an easy victory.
It wasn't easy, but the team did leave Uniondale with a 5-3 win to move within eight points of the final playoff spot in the Eastern Conference with 28 games left in the regular season. Get ready for the flood of unlikely playoff push stories. As stated in this space before, winning enough games to keep another lottery pick away from the Boston Bruins would feel like a major victory. The playoffs feel like a pipe dream.
Mirtle is headed down to practice this afternoon as the blue and white prepare for a visit from the New Jersey Devils Thursday night. He will file something to this space later in the day.
Until then, the links:
Paul Hunter of the Toronto Star on last night's game.
Toronto Sun reporter Lance Hornby on how an easy two points almost got away.
Game report from Pension Plan Puppets
Franklin Steele at The Hockey Writers claims the Leafs are not doomed.
Michael Langlois at Vintage Leaf Memories says Tomas Kaberle is bound to be dealt this year.
AM640's Jonas Siegel says trade talk won't distract Kaberle.
Report Typo/Error


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What To Expect
When it comes to airboat eco tours, we guarantee that we will give you the most bang for your buck! We're just a short drive from the Orlando and Disney area, and we offer beautiful day tours, relaxing sunset tours and exciting night tours that guests of all ages will love.
After the tour, explore the amazing wildlife park full of zebras, watusi, deer, water buffalo, emu, wild boar, zebu and monster alligators! Visit the tropical bird aviary, hands-on alligator demonstrations, gift shop and 500 ft. sightseeing dock. Discover the Hawk Swamp boardwalk through a pristine Florida cypress swamp ecosystem. Day or night, we are prepared to offer an experience you will never forget.
Travel the perimeter of 4,200 acres of protected swamps, marshes and rivers that make up the Central Florida Everglades
Amazing wildlife park, breathtaking sightseeing pier and boardwalk
Wildlife Park general admission
30-minute airboat tour
Hotel pick-up and drop-off
Meals and drinks
Tips and gratuities
Personal expenses
Wildlife Park: Mon - Saturday 09:00 - 17:30. Closed Sundays.
Children 2 years old and below are free of charge.
During the winter months, please bring warm clothes.
All our card payments are protected by thawte to give you peace of mind.
Free Cancellation
Free Cancellation
Free Cancellation


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Saturday, 6 June 2015
My Sunday Photo
We went to a local attraction yesterday, a place where I spent a lot of time as a child. I've taken lots of photos and I'm hoping to do a post in detail later this week. In the meantime I'd like to share this edited photo, because I loved the actual photo and because editing it has given it an older feel which has taken me back to my childhood. We used to have photos printed in black and white back then!
As always, I'm linking up to One Dad 3 Girls, who is also in the MAD Blog Awards Final, so don't forget to vote.
7 comments:
It does look stunning in black and white, I love streams xReplyDelete
So stunning in B&W has a calm feel to it. Thank you for the MADs mention and good luck to youReplyDelete
Thank you for linking up
It truly is a beautiful picture, Clio lending a helping hand for coombe millReplyDelete
What a beautiful scene! It looks so peaceful there xReplyDelete
Lovely photo! I love black and white too. xReplyDelete
A gorgeous capture - and well done for getting to the finals of the MADs too :) xReplyDelete
Amazing how you can share part of your childhood to your family ans children =) #mysundayphotoReplyDelete
It is so nice of you to stop by my blog, I would love for you to leave a comment too. I will reply to as many as I can and if you are a blogger you can expect a return visit from me. Many thanks, Anne xx
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