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Central Florida's Largest Gathering #9 TONIGHT (Unlimited Walk Ups Welcome)
I'm in. Events.
Thursday, April 11, 2013 from 5:30 PM to 10:30 PM (EDT)
Event Details
Central Florida's Largest Gathering #9 on April 11 at Cedars AND Le Rouge
CFLG #9 on April 11 starting at 5:30 p.m. at Cedars Lebanese Restaurant of Orlando AND Le Rouge Wine Bar & Tapas on Restaurant Row off Sand Lake Road is the LARGEST Get Together of ALL Ages 21+ and ALL Work Backgrounds and the FIRST of its kind across TWO (2) Venues Side by Side. Anyone and everyone is welcome to attend the ONLY 5 Hour Half Networking/Half Party Event in Central Florida.
Pre-Register at http://cflg.co and pay only $10 cash at either door ($15 cash without RSVP) and Receive Entry into Both Locations.
E-mail firstname.lastname@example.com for Sponsorship and VIP Table Info.
Dinner Reservations at Cedars available upon request.
Hosted by Press On Events, Cedars AND Le Rouge.
Professional Photography provided by Brion Price Photography and brionprice.com.
DJ's provided by Tara Yeager and Tony Zappula.
With your paid entry you will receive a wristband along with FREE and paid appetizers from 6:30 to 8:30 p.m. at both locations, FREE Parking, DJ, Professional Photography, Drink, Wine and Bottle Specials plus the opportunity to meet hundreds of people from all over.
Drink and Appetizer Specials at Cedars:
$4 Beers, $5 Smirnoff Vodka/Wine, $6 2 4 1 Shots and $7 Premium Kettle One Vodka and Bacardi Rum. $6 Warak Inab, Baba Ghanouj, Falafel, Safiha, Fatayer and Cheese Rolls.
Drink and Appetizer Specials at Le Rouge: $4 beers and $5 Wines. $6 Beef Sliders, Tomato and Basil Flat Bread, Tuna Tartare, Chicken Skewers, Chicken Flatbread and Fish Tacos.
Raffle Drawing will take place at 8:30 p.m. at Le Rouge and Bellydancer will perform at 9 p.m. at Cedar's.
Work OR Casual Attire. (No shorts, sandals or hats please). Let's get comfortable for once.
Together we will break another record and show Central Florida what we are all about.
Heissam I'm in. Jebailey
Press On Events
Event Planner
VIP and Table Sponsors:
Platinum Nutrition. They specialize in sports nutrition supplements specifically designated to help you reach your health and fitness goals quickly and easily. Our staff is dedicated to education our customers and helping them obtain their goals. They are focused on individual goal management through nutritional supplementation, interactive diet plans and personalized training programs. In addition, they are no carrying Orlando's hottest swimwear and fitness gear. The one-stop fitness shop. For more info. visit http://platinumnutritiononline.com or call 407-601-3975.
Body 20. A State of the Art private one on one training facility. No excuses, just results with two 20 minute training sessions per week. For more info. visit http://body20.com or call 407-363-0020 for a free session and tell them Heissam I'm in. Jebailey sent you.
Nova Cosmetic Center. Where art and science meet to provide you specialized Plastic and Cosmetic surgery as well as cutting edge Medi-Spa services related to your beauty and vitality. They take pride in their ability to deliver stellar one on one patient care and do their best to ensure your cosmetic goals are met. Complimentary consultations and financing available. Nova Cosmetic is the #1 volume injector for Botox in Orlando. They also have all the latest injectables, Vein therapy, SlimLipo, BreastAugmentation, Hormone Replacement, Chemical Peels, Thermage, Laser Hair Removal and Medical Grade Skin Care in the Orlando area just to name a few. For more info. visit http://novacosmeticcenter.com or call 407-278-8668.
Arab Festival Orlando. Anyone and Everyone is welcome to attend on Sunday, April 14, 2013 for Food, Culture, Music, Family Entertainment and Vendors. Located at Festival Park, 2911 East Robinson St. Orlando, FL 32803 (Next to Orlando Executive Airport). Starts at noon until 7. For more info. visit http://ArabAmericanCulturalFestival.org or to sponsor the tax deductible event call
Bar Method. Creates a uniquely lean, firm, sculpted body combining the muscle-shaping principles of isometrics, the body-elongating practive of dance conditioning, the science of physical therapy and the intense pace of interval training into a powerful exercise format that quickly and safely reshapes and elongates muscles. For more info. visit http://orlando-drphillips.barmethod.com/ or call 407-363-0330.
Orlando Young Professionals. The purpose of OYP is to encourage and facilitate a meaningful exchange of information and perspectives relative to the Orlando economic region and provide members with increased opportunities to foster quality business and personal relationships in various ways. For more info. visit http://OrlandoYoungProfessional.com.
American Laser Skincare: The nation's largest and most experienced provider of laser cosmetic services, offering laser hair removal, cellulite reduction, body contouring, skin rejuvenation, and skin tightening. Since 2001, American Laser Skincare has performed over 10 million treatments in our more than 100 clinics across the country. For more info. visit http://americanlaser.com or call 407-770-5720.
The Decoding Women Show with Laura J. Empowering Men to Create Extraordinary Relationships. Airs Wednesdays from 8 - 9 p.m. on WFLA News, talk, sports 104.5FM, 540AM and iheart radio. For more info. visit http://decodingwomenshow.com and like her fan page at https://www.facebook.com/DecodingWomen.
Jessilyn Park Art Studio. Jessilyn Park is a local Orlando artist that has taken the scene by storm. Within 1 year she has trained with world famous artist Leonid Afremov, is internationally collected, has been featured in several magazines and won numerous competitions. She is also available for commission work. For more info. e-mail email@example.com or like her fan page at http://facebook.com/jessilynparkart
iLIFESTYLE. Give More. Live Better. iLifestyle helps raise money for non-profit organizations and various local events by way of giving back to their people by providing tremendous savings on travel to ultimately enhance their lifestyle. Raffle Prizes:
3 Day/2 Night Miami Getaway. 5 Day/4 Night Cancun Getaway, (2) Three 20-Minute Sessions at BODY 20 for a couple, (2) Enzian Passes, (1) Laser Package (2) Couple Passes to Hau Hele Wai Paddleboarding, (1) OBAGI Skin Care Gift Bag, For more info. visit http://ilifestyle-golf.com
When & Where
Cedars Lebanese Restaurant of Orlando AND Le Rouge Wine Bar & Tapas
7730 W Sand Lake Rd
Thursday, April 11, 2013 from 5:30 PM to 10:30 PM (EDT)
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I'm in. Events. is an event planning, promotions and speaking company that specializes in promoting, hosting and speaking at only the largest events that can possibly take place in and around Central Florida.


text: He looked a little tired on that missed dunk attempt for sure. It is totally different watching the Pistons when they have a freak on the court. That was the best part about the '04 era Pistons-- watching Ben's physical domination. Drummond is feeling his way right now, but he surprisingly poised for having so little experience and being so young. He looks awkward when he needs to create a shot, but otherwise he doesn't seem to make any boneheaded plays and makes a lot of heads up ones. Plays more like a 23 year old.

subset: commoncrawl


text: To get from Romano Banco to Avola by train you can catch one of the 2 trains that everyday travel between these two cities. The first train to Avola leaves from Romano Banco at 17:55 and the last train departs at 18:55. If you choose a local train the trip lasts on average 16:39 hours. For your trip from Romano Banco to Avola by train you can choose to leave from one of Romano Banco main stations: Corsico On Wanderio you can compare all schedules, fares and railway companies to Avola and book the best itinerary starting from Romano Banco.


text:
Caramelized Mushroom and Onion Frittata RecipeRead Reviews Be the first to add a review
5 2 2
- 1 pound sliced fresh mushrooms
- 1 medium red onion, chopped
- 3 tablespoons butter
- 3 tablespoons olive oil
- 1 shallot, chopped
- 1 garlic clove, minced
- 1/2 cup shredded cheddar cheese
- 1/4 cup shredded Parmesan cheese
- 8 eggs
- 3 tablespoons heavy whipping cream
- 1/4 teaspoon salt
- 1/4 teaspoon pepper
- In a 10-in. ovenproof skillet, saute mushrooms and onion in butter and oil until softened. Reduce heat to medium-low; cook for 30 minutes or until deep golden brown, stirring occasionally. Add shallot and garlic; cook 1 minute longer.
- Reduce heat; sprinkle with cheeses. In a large bowl, whisk the eggs, cream, salt and pepper; pour over top. Cover and cook for 4-6 minutes or until eggs are nearly set.
- Uncover skillet. Broil 3-4 in. from the heat for 2-3 minutes or until eggs are completely set. Let stand for 5 minutes. Cut into wedges. Yield: 4 servings.
Originally published as Caramelized Mushroom and Onion Frittata in Country Woman Christmas Annual 2012, p25
Reviews for Caramelized Mushroom and Onion Frittata
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Reviewed Jan. 31, 2016
"this recipe was amazing!ing! I gave it 5 stars! it was easy and tasted great! my family loved it!"
Reviewed Apr. 25, 2013
"This was my first time making it Frittata and this recipe was so easy. You can make everything at your convenience and clean as you go. The mushroom and onion flavors went wonderfully with the egg. I don't think I will ever make another Omelet again!"


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SlideWiki is a platform created as a proof of concept for CrowdLearn concept. The CrowdLearn concept exploits the wisdom, creativity and productivity of the crowd for the creation of rich, deep-semantically structured E-Learning content. With SlideWiki users can create and collaborate on educational slides, diagrams, assessments and arrange slides in presentations. Presentations can be organized hierarchically, so as to structure them reasonably according to their content.
Via Baiba Svenca


text:
Battistini Taddeo Hotel
Kanal Griboedova 29, St Petersburg, Russia
Atmosphere 80%
Cleanliness 92%
Facilities 80%
Location 100%
Safety 96%
Staff 100%
Value 88%
- Free Breakfast
- 24 Hour Reception
- Airport Transfers
- Bicycle Parking
- Free Parking
- Hot Showers
- Internet Access
- Iron / Ironing Board"
- Luggage Storage
- Parking
- Tea/Coffee Making Facilities
- Tours/Travel Desk
- Vending Machines
Check-in / Check-out
Earliest check-in: 00:00
- No Curfew
Group booking?
Group of 15 or more traveling to St Petersburg?
Private Rooms
Basic Double Bed Private Shared Bathroom
Sleeps 2
Room types
Private Room
Shared Bathroom
About Battistini Taddeo
Petersburg Minihotels is a Swiss owned travel company.
Our spacious, modern Minihotel offers calm and comfort in the heart of downtown St. Petersburg.
Located on the Griboedov Canal 29, just a minute's walk from the main avenue Nevsky Prospekt, we provide affordable, civilized accommodations with one or two peoples per room. We are right by the famous "bank bridge" on the Griboedov Canal. Two rooms share one bedroom. Please contact us after booking and send us your arrival time. We can pick you up at the airport and help you with the visa formalities.
See both pictures of the bridge. You can see our house: the first on the right. The second picture shows Kazan Cathedral and Church Savior on blood (view from our bridge). These pictures show, how exclusive our location is! The best restaurants and cafes are just around the corner. We will give you an updated guide and useful instructions when you arrive. St.Petersburg's beauty and rich cultural life is as attractive in winter as it is in summer. Check pictures.
You can check in and check out in our Hostel at any time. If you arrive early in the morning, we will take your baggage and give you keys for the room. If all rooms are booked, room check in will be at 12.
In addition to the Minihotel we offer an array of other services, such as: Russian lessons,
guided tours, visa service and much more.
Cancellation Policy
Customers can cancel their reservation free of charge up to 1 day before arrival. After this date, charges will be applied by the property up to the first nights cost of the reservation, unless otherwise stated in the property's conditions. Deposits paid are non refundable.


text:
|Publication number
|Publication type
|Application number
|Publication date
|2 Mar 2010
|Filing date
|3 Nov 2004
|Priority date
|3 Nov 2004
|Fee status
|Also published as
|Publication number
|Keith A. Miller, Ilya Lavitsky
|Original Assignee
|Applied Materials, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (219), Non-Patent Citations (13), Referenced by (9), Classifications (20), Legal Events (3)
|External Links: USPTO, USPTO Assignment, Espacenet
Embodiments of the present invention relate to a support ring assembly to support a substrate in a process chamber.
In the processing of substrates, such as semiconductor wafers and displays, a substrate is placed in a process chamber and exposed to an energized gas to deposit or etch material on the substrate. A typical process chamber comprises process components that include an enclosure wall that encloses a process zone, a gas supply to provide a gas in the chamber, a gas energizer to energize the process gas to process the substrate, a substrate support, and a gas exhaust. The process chamber components can also comprise a process kit, which typically includes one or more parts that can assist in securing and protecting the substrate during processing, such as for example, substrate rings which are rings that are located about the periphery of the substrate, such as deposition rings, cover rings and shadow rings.
In physical vapor deposition (PVD) processes, a substrate ring comprising a deposition ring is provided about the periphery of the substrate. The deposition ring typically surrounds the substrate and has a lip or ledge that rests on the substrate support. The ring shields the sidewall surfaces and peripheral edge of the substrate support that would otherwise be exposed to the energized gas in the chamber, from deposition of process residues. Thus, the deposition ring reduces the accumulation of process residues on the support, which would eventually flake off and contaminate the substrate. The deposition ring can also reduce erosion of the support structure by the energized gas. Providing a deposition ring also lowers the frequency with which the support assembly requires cleaning, because deposition ring itself can be periodically removed from the chamber and cleaned, for example, with HF and HNO3, to remove process residues that accumulate on the ring during substrate process cycles.
However, certain processes, such as for example, tantalum PVD processes with their exposure to the energized gas in the chamber during processing, heats up the deposition ring. Typically, the deposition rings, such as for example aluminum oxide deposition rings do not exchange a sufficient amount of heat with their surroundings in the vacuum environment to lower the temperature of the rings to acceptable levels. Excessive heating of the deposition ring is detrimental, because thermal stresses between the deposition ring and process residues accumulated on the ring, result in the peeling or spalling of the process residues from the deposition ring, and resultant contamination of the substrate. Also, the hot deposition ring can create temperature gradients emanating from the periphery of the substrate, which change the temperature of the substrate or energized gas during processing. Yet another problem with conventional rings, such as aluminum oxide deposition rings, is that they erode during cleaning and refurbishment processes, reducing their lifetime. This is especially true when cleaning process residues that are chemically difficult to remove, such as for example, tantalum deposits formed on aluminum oxide rings.
Accordingly, it is desirable to have a substrate ring, such as a deposition ring, that does not excessively increase in temperature during the processing of substrates. It is furthermore desirable to have a substrate ring that is not excessively eroded during cleaning of the ring. It is furthermore desirable to have a substrate ring that can reduce the formation of excessively high temperature gradients during substrate processing.
In one version, a substrate ring assembly is provided for a substrate support having a peripheral edge. The assembly has an annular band having an inner perimeter that surrounds and at least partially covers the peripheral edge of the substrate support. The assembly also has a clamp to secure the annular band to the peripheral edge of the substrate support.
In another version, the substrate ring assembly has an annular band having an inner perimeter that at least partially surrounds and at least partially covers the peripheral edge of the substrate support. The annular band has at least one protrusion on a top surface of the annular band that is adapted to inhibit a flow of process gas over the top surface. A foot extends downwardly from the annular band, and is adapted to press against a surface of the substrate support.
In another version, the substrate ring assembly has an annular band having an inner perimeter that surrounds and at least partially covers a peripheral edge of the substrate support, and a foot extending downwardly from the annular band. The foot is shaped, sized and positioned to allow the band, when the band is held against the substrate support, to exert substantially a compressive stress on the substrate support.
These features, aspects and advantages of the present invention will become better understood with regard to the following description, appended claims, and accompanying drawings, which illustrate examples of the invention. However, it is to be understood that each of the features can be used in the invention in general, not merely in the context of the particular drawings, and the invention includes any combination of these features, where:
An exemplary version of a substrate ring assembly 20 that can be used to cover or protect at least a portion of a substrate support 22 in a substrate processing environment, is shown in
In one version, the substrate ring assembly 20 comprises a clamp 34 that clamps a portion of the annular band 26 to the substrate support 22. Clamping of the annular band 26 to the support 22 provides improved processing results at least in part because better heat exchange can occur between the clamped band 26 and the support 22. Portions of the annular band 26 can become excessively heated during substrate processing, such as for example the top surface 36 of the annular band 26 that is exposed to energized plasma of process gas. Excessive heating of the top surface 36 can lead to a thermal expansion mismatch between the annular band 26 and any process residues deposited on the top surface 36 of the band 26, which can cause the process residues to flake away from the top surface 36 and potentially contaminate the substrate 104. Clamping of the annular band 26 to the support 22 also allows better heat exchange between the band 26 and the support 22, to improve the temperature control of the annular band 26. For example, the support 22 may be temperature controlled, for example, by providing a temperature controlled cooling plate 127 comprising cooling conduits 123 in the support 22, as shown for example in
One embodiment of a substrate ring assembly 20 comprising a clamp 34 is shown in
The fastener 40 comprises a structure suitable for passing through the opening 38 in the annular band 26 and connecting to the bracket 44, such as for example at least one of a screw, clip, spring or other connector structure. For example, in one version, the fastener 40 can comprise a threaded screw that fits through the opening 38 in the annular band 26 and at least partially through an opening 39 in the bracket 44, and where the opening 39 of the bracket 44 comprises complimentary threading that allows the bracket 44 to be tightened against the support 22 upon turning the screw. Also, a desired number of openings 38 and fasteners 40 can be provided to secure the annular band 26 to the support 22. For example, the support ring assembly 20 can comprise from about 3 to about 24 openings 38, such as about 8 openings 38, that are placed in a desired configuration about the annular band 26. In the version shown in
In yet another embodiment, the clamp 34 comprises a swiveling fastener 41 that is adapted to rotate the bracket 44 into a desired position to clamp the annular band 26 against the support 22, as shown for example in
In one version, the top surface 36 of the annular band comprises a textured surface that is adapted to reduce the deposition of process deposits on undesired areas of the support 22 and support assembly 20. The top surface 36 desirably comprises features 52 that are shaped, sized and positioned to reduce the deposition of process residues on at least a portion of the surface 36. For example, the top surface 36 may inhibit a flow or migration of process residues towards one or more openings 38 in the annular band at a periphery 50 of the annular band. The top surface 36 may collect process residues in depressions in the surface 36 and inhibit the migration of these residues towards the substrate 104 to reduce contamination of the substrate 104. In one version, the top surface 36 comprises at least one feature 52 comprising a protrusion 51 that is sized and shaped—as well as positioned on the top surface 36—to reduce the flow or migration of process residues towards the substrate. The protrusion 51 may comprise, for example, a raised ring or other feature 52 that may be formed on the surface 36. Textured features 52 on the surface 36 can also comprise, for example, one or more grooves 53 or other depressions in the surface 36. The grooves 53 extend below the top surface 36 and each comprise a rounded bottom apex, and the protrusion 51 and grooves 53 are concentric to the circumference of the annular band, as shown for example, in
In one embodiment, the ring assembly 20 comprises a foot 54 that extends downwardly from the annular band 26 to press against the substrate support 22. The foot 54 is desirably shaped and sized to press against the substrate support 20 substantially without inducing cracks or fractures in the support 20, and thus provides an improved structure for bracing the band 26 against the support. For example, as shown in
The annular band 26 desirably also comprises recessed surface regions 60 about the downwardly extending foot 54 that substantially do not contact the peripheral edge 30 of the support 22, to reduce the stress of the band 26 on the peripheral edge 30 of the support 22. For example, one or more of the recessed regions 60 may be about a top corner 58 a of the peripheral edge 30, to reduce the amount of stress exerted on the top corner 58 a. Other parts of the substrate ring assembly 20 may also be adapted to reduce the amount of pressure and/or stress exerted on the peripheral edge 30 of the support 22. For example, the bracket 44 may comprise a raised lip 62 that presses against the peripheral edge 30 with substantially only a compressive force, and an adjacent recess 64 about a bottom corner 58 b of the peripheral edge to reduce pressure on the bottom corner 58 b. The bracket 44 and annular band foot 54 may also be complementarily positioned such that the clamping force of one against the peripheral edge 30 is at least partially counteracted by the other. For example, the bracket 44 may press against the peripheral edge 30 substantially directly below where the foot 54 presses, so the force on the peripheral edge 30 is substantially equal above and below the peripheral edge 30. Thus, the substrate ring assembly 20 is adapted to reduce cracking or fracturing of the substrate support 22 by exerting substantially only a vertical, compressive stress on the peripheral edge 30 of the support, and substantially without pressing against portions of the support 22 that are readily cracked or chipped, such as corners 58 a,b of the peripheral edge 30.
In one version, the substrate ring assembly 20 comprises a cover ring 70 that at least partially surrounds and at least partially covers a periphery 50 of the annular band 26, as shown for example in
In yet another version, the substrate ring assembly 20 comprises a clamp 34 having a spring 80 a,b to hold the annular band 26 against the substrate support 22, as shown for example in
The clamp 34 can also comprise a ball bearing 88 at one or more ends 89 a,b of the radial spring 80 a,b to exert a compressional force to secure the annular band 26. For example, the ball bearing may be at a first end 89 a of the spring 80 a that contacts the annular band 26, to increase the clamp surface area that contacts the band 26. The ball bearing 88 can also ease removal of the annular band 26, for example to allow cleaning of the band 26, by allowing the band to "roll" off of the support 22 when a steady force is exerted upwardly on the band 26. A second end 89 b of the radial spring 80 a may comprise a compression plate 92 having a surface area that is adapted to press against the peripheral edge 30 of the support 22, to provide a greater surface area for the compression clamping. The annular band 26 may also comprise a raised ridge 90 or bump on the interior surface 82 that is positioned below the radial spring 80 a when the annular band 26 is secured on the support 22. The raised ridge 90 increases the force required to move the band 26 upwardly by increasing the spring contraction distance that is necessary to roll the ball-bearing over the ridge 90. Thus, the raised ridge 90 and radial spring clamp 34 secure the annular band 26 to the support 22 during processing, while also allowing for efficient removal of the band 26 by applying a sufficient lift-off pressure.
In yet another version; the clamp 34 comprises a spring 80 b that is adapted to be extended between the annular band 26 and a portion of the support 22 to hold the band 26 on the support 22, as shown for example in
In one version, the second end 94 b of the spring 80 b is attached by means that substantially fixes the second end 94 b to the support 22, for example by wrapping the second end 94 b about an attachment rod 97 on the support 22, and the first end 94 a is detachably secured to the band 26, as shown in
An example of a suitable process chamber 106 having the substrate ring assembly with the annular band 26 on the support 22 is shown in
The chamber 106 comprises a substrate support 22 to support the substrate 104 in the sputter deposition chamber 106. The substrate support 22 may be electrically floating or may comprise an electrode 170 that is biased by a power supply 172, such as an RF power supply. The substrate support 22 can also comprise a moveable shutter disk 133 that can protect the upper surface 134 of the support 22 when the substrate 104 is not present. In operation, the substrate 104 is introduced into the chamber 106 through a substrate loading inlet (not shown) in a sidewall 164 of the chamber 106 and placed on the support 22. The support 22 can be lifted or lowered by support lift bellows and a lift finger assembly (not shown) can be used to lift and lower the substrate onto the support 22 during transport of the substrate 104 into and out of the chamber 106.
The chamber 106 can further comprise a temperature control system 119 to control one or more temperatures in the chamber 106, such as a temperature of the support 22. In one version, the temperature control system 119 comprises a fluid supply adapted to provide heat exchange fluid to the support 22 from a fluid source 121. One or more conduits 123 deliver the heat exchange fluid from the fluid source 121 to the support 22. The support 22 can comprise one or more channels 125 therein, such as for example channels 125 in a metal cooling plate 127, through which the heat exchange fluid is flowed to exchange heat with the support 22 and control the temperature of the support 22, for example by heating or cooling the support 22. A suitable heat exchange fluid may be, for example, water. Controlling the temperature of the support 22 can also provide good temperature of elements that are in good thermal contact with the support 22, such as for example a substrate 104 on the surface 134 of the support 22, and also a clamped portion of a substrate ring assembly 20.
The support 22 may also comprise the substrate ring assembly 20 comprising one or more rings, such as the cover ring 70 and the annular band 26, which may be called a deposition ring, and which cover at least a portion of the upper surface 134 of the support 22, and such as a portion of the peripheral edge 30 of the support 22, to inhibit erosion of the support 22. The annular band 26 at least partially surrounds the substrate 104 to protect portions of the support 22 not covered by the substrate 104. The cover ring 70 encircles and covers at least a portion of the annular band 26, and reduces the deposition of particles onto both the annular band 26 and the underlying support 22. The substrate ring assembly 20 further comprises a clamp 34 to clamp the annular band 26 onto the substrate support 22.
A process gas, such as a sputtering gas, is introduced into the chamber 106 through a gas delivery system 112 that includes a process gas supply comprising one or more gas sources 174 that each feed a conduit 176 having a gas flow control valve 178, such as a mass flow controller, to pass a set flow rate of the gas therethrough. The conduits 176 can feed the gases to a mixing manifold (not shown) in which the gases are mixed to from a desired process gas composition. The mixing manifold feeds a gas distributor 180 having one or more gas outlets 182 in the chamber 106. The process gas may comprise a non-reactive gas, such as argon or xenon, which is capable of energetically impinging upon and sputtering material from a target. The process gas may also comprise a reactive gas, such as one or more of an oxygen-containing gas and a nitrogen-containing gas, that are capable of reacting with the sputtered material to form a layer on the substrate 104. Spent process gas and byproducts are exhausted from the chamber 106 through an exhaust 122 which includes one or more exhaust ports 184 that receive spent process gas and pass the spent gas to an exhaust conduit 186 in which there is a throttle valve 188 to control the pressure of the gas in the chamber 106. The exhaust conduit 186 feeds one or more exhaust pumps 190. Typically, the pressure of the sputtering gas in the chamber 106 is set to sub-atmospheric levels.
The sputtering chamber 106 further comprises a sputtering target 124 facing a surface 105 of the substrate 104, and comprising material to be sputtered onto the substrate 104, such as for example at least one of tantalum and tantalum nitride. The target 124 is electrically isolated from the chamber 106 by an annular insulator ring 132, and is connected to a power supply 192. The sputtering chamber 106 also has a shield 120 to protect a wall 118 of the chamber 106 from sputtered material. The shield 120 can comprise a wall-like cylindrical shape having upper and lower shield sections 120 a, 120 b that shield the upper and lower regions of the chamber 106. In the version shown in
The chamber 106 can be controlled by a controller 194 that comprises program code having instruction sets to operate components of the chamber 106 to process substrates 104 in the chamber 106. For example, the controller 194 can comprise a substrate positioning instruction set to operate one or more of the substrate support 22 and substrate transport to position a substrate 104 in the chamber 106; a gas flow control instruction set to operate the flow control valves 178 to set a flow of sputtering gas to the chamber 106; a gas pressure control instruction set to operate the exhaust throttle valve 188 to maintain a pressure in the chamber 106; a gas energizer control instruction set to operate the gas energizer 116 to set a gas energizing power level; a temperature control instruction set to control a temperature control system 119 to control temperatures in the chamber 106; and a process monitoring instruction set to monitor the process in the chamber 106.
The present invention has been described with reference to certain preferred versions thereof; however, other versions are possible. For example, the substrate ring assembly 20 comprising the clamp 34 and annular band 26 can be used in other types of applications, as would be apparent to one of ordinary skill, for example, etching, CVD and cleaning processed. Other configurations of the substrate ring assembly 20 and clamp 34 can also be used. For example, other methods and configurations for clamping and annular band 26 to a support 22 can be provided. Therefore, the spirit and scope of the appended claims should not be limited to the description of the preferred versions contained herein.
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|Lam Research Corporation
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|U.S. Classification
|118/728, 118/729, 156/345.52, 118/730, 156/915, 156/345.51, 156/345.54, 156/345.53
|International Classification
|Cooperative Classification
|European Classification
|3 Nov 2004
Owner name: APPLIED MATERIALS, INC., CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MILLER, KEITH A.;LAVITSKY, ILYA;REEL/FRAME:015957/0767
Effective date: 20041103
Owner name: APPLIED MATERIALS, INC.,CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MILLER, KEITH A.;LAVITSKY, ILYA;REEL/FRAME:015957/0767
Effective date: 20041103
|10 Aug 2010
|Certificate of correction
|6 Jun 2013
|Fee payment
Year of fee payment: 4


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Peter Scupham
Carcanet Poetry, August 2011
Format: ePub
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A 05 WRX w/ STI mods, so it comes with the sport heated seats and sunroof. Anything done to this car, especially under the hood, has been done for a stealth look, so everything I have replaced is either black or hidden. Car has NO ISSUES.
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[Date Index]
[Thread Index]
[Author Index]
svg import
Can Mathematica 5.2 import and display svg (scalable vector graphics)
files into its notebook XML format? If not, is there a plan in the
future to import svg files? I know currently data can be exported as
svg. I wanted to import some figures with loss-less reproduction and
then generate a pdf.


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Health Story: I've Been Given My Life Back
What is viscosupplementation with hyaluronic acid?
Viscosupplementation with hyaluronic acid is a treatment for symptoms of osteoarthritis. Natural hyaluronic acid helps lubricate and cushion joints. People with osteoarthritis have less hyaluronic acid in their joint fluid than normal. Viscosupplementation with hyaluronic acid involves injecting synthetic joint lubricant into the affected joint. This can help reduce inflammation and pain in joints, such as the knee, hip, shoulder and wrist.
Viscosupplementation does not cure osteoarthritis but can reduce symptoms, including inflammation and pain. Viscosupplementation may also signal the body to produce more of its own natural hyaluronic acid. Viscosupplementation is only one method used to treat osteoarthritis. Discuss all of your treatment options with your doctor to understand which options are right for you.
Other procedures that may be performed
Your doctor will likely recommend one or more complementary treatments or lifestyle modifications along with viscosupplementation with hyaluronic acid. These can include physical therapy, exercise, or assistive devices such as braces or canes. Recommendations will vary depending on the extent of your joint's deterioration, your age, your symptoms, and other factors.
© 2016
Healthgrades Operating Company, Inc. All rights reserved. May not be reproduced
or reprinted without permission from Healthgrades Operating Company, Inc. Use
of this information is governed by the Healthgrades User Agreement.
Medical References
- Arthritis of the Knee. American Academy for Orthopaedic Surgeons. http://orthoinfo.aaos.org/topic.cfm?topic=a00212
- Intra-articular Hyaluronic Acid Injections for Knee Osteoarthritis. American Family Physician. http://www.aafp.org/afp/2000/0801/p565.html
- Osteoarthritis. American College of Rheumatology. http://www.rheumatology.org/Practice/Clinical/Patients/Diseases_And_Conditions/Osteoarthritis/
- Therapeutic trajectory of hyaluronic acid versus corticosteroids in the treatment of knee osteoarthritis: A systematic review and meta-analysis. Arthritis and Rheumatism. http://www.ncbi.nlm.nih.gov/pubmed/19950318
- Viscosupplementation. Cleveland Clinic. http://my.clevelandclinic.org/services/viscosupplementation/hic_viscosupplementation.aspx
- Viscosupplementation in the hip: evaluation of hyaluronic acid formulations. Archives of Orthopaedic and Trauma Surgery. http://www.ncbi.nlm.nih.gov/pmc/articles/PMC2228384/
- Viscosupplementation for osteoarthritis of the knee: a systematic review and meta-analysis. Annals of Internal Medicine. http://www.ncbi.nlm.nih.gov/pubmed/22868835
- Viscosupplementation Treatment for Arthritis. American Academy for Orthopaedic Surgeons. http://orthoinfo.aaos.org/topic.cfm?topic=a00217


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|Message view
|« Date » · « Thread »
|« Date » · « Thread »
|Oleg Dulin <oleg.du...@gmail.com>
|Data aggregation -- help me design a solution
|Tue, 21 Aug 2012 20:08:18 GMT
Here are my requirements. We use Cassandra. I get millions of invoice line items into the system. As I load them I need to build up some data structures. * Invoice line items by invoice id (each line item has an invoice id on it ), with total dollar value * Invoice line items by customer id , with total dollar value * Invoice line items by territory, with total dollar value In all of those cases, what we want is to see the total by a given attribute, that's all there is to it. Line items may change daily, i.e. a territory may change or they may correct the values. In this case I need to update the aggregations accordingly. Here are my ideas: - I can use counters and store the data in buckets - I can just store the data in buckets and do the math in Java In both cases the challenge is that the items can be updated. Which means I need to look up a current version of an item and decide how to proceed. That puts a huge performance penalty on the application (# of line items we receive is in the millions and we need to process them in a timely fashion). Help me out here -- any ideas on how I could design this in Cassandra ? Regards, Oleg
|View raw message


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ESPN's SEC Network will broadcast its live SEC Nation program from the south lawn of Ayres Hall from 10:00 a.m. to noon Saturday.
ESPN News
Put UT in the Next College GameDay Commercial
ESPN College GameDay is letting fans choose the campus where ESPN will film one of its commercials. Volunteer fans can help give UT a leg up by voting early and often. Fans from all Division I Football Bowl Subdivision schools are voting to have the opportunity for GameDay to shoot an ad on their campus in late July or early August. The school that receives the most votes by May 10 wins.
ESPN Documentary on UT's Condredge Holloway Premieres Sunday
Condredge Holloway, former Vols quarterback and current UT associate athletics director, broke racial barriers when he was named the first African-American quarterback in the Southeastern Conference in 1971. "The Color Orange: The Condredge Holloway Story," a documentary chronicling Holloway's story, will premier Sunday, Feb. 20, at 8 p.m. on ESPN. The documentary was produced and narrated by country music star and lifelong UT fan, Kenny Chesney.


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could you post a video of how you would do it correctly? then I will comment
lol @ bomber
I'ts better to burn out than fade away!
(I'm in the blue gi)
Then unless your willing to take criticism dont criticise others thats just rude!
Fight videos are just that shit happens
Last edited by youngun; 10-12-2010 at 12:09 PM.
I'ts better to burn out than fade away!
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June 29, 2013
Guard (1942, 44-45)
Manning the offensive and defensive lines after World War II was Bob Dobelstein at right guard, earning All-America honors as a junior in 1944. It was also the year he served as captain of the team, the only junior to do so until the 2003 season. Dobelstein helped lead the Vols to a 7-1-1 record in 1944, completing an unbeaten regular season before losing to Southern California in the Rose Bowl. Tennessee went 8-1 the following year to set the table for an SEC title run the year after Dobelstein departed.
Guard (1954-56)
Tweet @Vol_Football to tell us who your favorite Vol to wear the No. 63 is!