text:
Bloomington includes more hotels than just about any other city in the state, most of which are conveniently located near the Mall of America. SEA LIFE Minnesota highly recommends the following hotels for your next trip to Minnesota. Each of these locations offers discounted SEA LIFE Minnesota tickets for their guests.
Water Park of America | Radisson
1700 American Blvd E
Bloomington, MN 55425
(952) 854-8900
Check out their Ultimate SEA LIFE Package!
The Commons Hotel
615 Washington Ave SE
Minneapolis, MN 55414
(651) 379-8888
The Commons Hotel is pleased to present a SEA LIFE at Mall of America special package featuring a deluxe guestroom for one night, two kids amenities with special Sea Life Stuffed Toys, Two Adult and Two Kids Tickets to SEA LIFE and 4 all-day light rail tickets to get you to Mall of America. Book your package online or call 1-800-822-6757.
Holiday Inn Express
7770 Johnson Ave South
Bloomington, MN 55435
(952) 893-9999
Check out their SEA LIFE Package!
Mall of America
2100 Killebrew Dr
(952) 881-5258
3800 American Blvd E
Bloomington, MN 55425
(952) 893-9500
For more information about how your hotel can be recommended by SEA LIFE Minnesota, please call 952-853-0603 or email email@example.com
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A Sunny Day in Glasgow
Nitetime Rainbows
(Mis Ojos Discos)
US: 2 Mar 2010
UK: 1 Mar 2010
Nitetime Rainbows—a companion EP to last year's excellent Ashes Grammar LP—is a victory lap for the Philly dream-pop sextet. Since the release of Ashes Grammar, the band's profile has gradually risen through a combination of year-end praise, extensive touring and glowing word of mouth. In my review Ashes Grammar , I was a bit premature in my judgment of the album as it turned out to be a textbook grower and one of my favorite albums of 2009. Being an EP, Nitetime Rainbows is, naturally, a more digestible chunk of music and an easy one to love at that.
The EP's title track is a new mix of the Ashes Grammar's standout. It's accompanied by three new songs and three remixes of "Nitetime Rainbows". Each of the remixes is enjoyable in its own way, but they're ultimately forgettable. Let's be honest: an essential remix is an honest-to-god rarity. Fortunately, the three new tracks are all keepers. Filled with flare gun guitar, "Daytime Rainbows" is the bright, molten flipside to the title track. "Piano Lessons" is exactly that: a composition ASDIG leader Ben Daniels pieced together while teaching himself how to play the piano. The resulting song is much better than that description makes it sound. Best of all is the EP's radiant pop center, "So Bloody, So Tight". Questionable song title aside, it's easily one of the band's finest moments to date and, hopefully, a taste of things to come.
We all know how critical it is to keep independent voices alive and strong online. Please consider a donation to support our work as an independent publisher devoted to the arts and humanities. Your donation will help PopMatters stay viable through these changing and challenging times where advertising no longer covers our costs. We need your help to keep PopMatters publishing. Thank you.
Depeche Mode "Where's the Revolution" (Singles Going Steady) // Music
Beth Bombara "Sweet Time" (audio) (premiere) // Music
Oceans Are Zeroes "Inside" (audio) (premiere) // Music
20 Questions: Nashville Singer-Songwriter Natalie Hemby
// Sound Affects
"Natalie Hemby's Puxico is a standout debut from a songwriter who has been behind the scenes for over a decade.READ the article

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Annual Conference of Treasurers 10 May 2014 Cloud Accounting David Olver
Cloud Accounting Accounting software on a remote computer which will be fast and a large memory. Accessed over Internet. Uses web browsers (Chrome, Firefox, Internet Explorer, Safari, Opera etc). Type of Cloud Computing. Growing in popularity with many providers.
Cloud Computing General name for software held in the CLOUD, i.e. somewhere distant and unseen. Cloud software has program plus large database securely holding data for many users. Natural development of World Wide Web. Traditionally: one software – one user. Cloud: one software – many users.
Development of human/computer interface Human Terminal Desktop PC Laptop Netbook etc Tablet Smartphone Wire Cable Optical Wireless Remote computer Internet connects many computers
Development of Accounting PaperCashbooks and ledgers (mental arithmetic, calculators) SpreadsheetsAdd-on to classic spreadsheet (e.g. Sharman spreadsheets) Custom-builtHighly developed and used widely programs- personal (You Need A Budget, Moneydance, Home Accountz, BankTree, AceMoney) - small/medium (Sage, Quickbooks) - large bespoke accounting packages Online programsCustom made programs on remote servers with Internet access - established (e.g. Sage) + new players
Cloud Accounting - Advantages Platform independent (PC, Mac, Tablet). Accessed anywhere – do not need to be at 'home'. Multiple users of same accounts - if want them. Backups taken regularly (daily, hourly). Latest version of software always available.
Cloud Accounting - Disadvantages Internet connection needed. Remote online storage of accounts data. User has less control. Cannot be 'tweaked' for personal preferences. Usually subscription service (£5-£20 per month). Locked to company providing service. Privacy and Security.
Cloud Accounting - Issues Backup of accounts data; Take regular local copies if needed. Privacy; European laws provide protection. Always a potential issue with Internet. Security; Applies to all web usage. Vigilance essential – sensible precautions. Install security software (firewalls, anti-virus).
How Cloud Accounting Software Works Same as other Internet/web software. Secure login. Accounts displayed on web browser. Input transactions, e.g. income to named account. Displays variety of Reports. Processes accounts to give automatic totals. Most designed primarily for accounts required by trading persons, companies and businesses. Generates Balances, End-of-Period totals etc. Can receive data from (say) online bank accounts.
Cloud Accounting software usually includes Sales – Invoices Purchases Ledgers/Journals Payroll VAT Bank reconciliation Reports, e.g. monthly, sales Cash flow Profit & Loss, Balance Sheet, Trial Balances Year-end Reports Access for Accountants and Auditors
Some Online Accounts Software available May 2014 Sage One QuickBooks Online FreeAgent Kashflow Freshbooks Xero ExactOnline ClearBooks Business Accountz Brightbook Aquilla Quick File
Kashflow used by The Friend Used to use MYOB. Then support stopped and problems in moving data around. Need multiple access by Treasurer, Bookeeper, Subscriptions Officer, Advertising Manager – all in different locations. The Friend is a charitable company – a business and a charity. Kashflow satisfied specifications for day-to-day use. SORP Annual accounts need producing outside Kashflow.
Cloud Accounting for Treasurers All accounting software is a tool. If you like current tools – keep them. But computing changes rapidly. Increased connectivity and interactivity all point in direction of cloud computing. Most current cloud accounting software designed for trading and more complex than needed by Treasurers. Future points in direction of cloud accounting software designed for AM and LM Treasurers.
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There are 20 Postdoctoral Fellow-related jobs on Neuvoo UAE . Submit your application now and get the ideal job.
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Colonia (2015) BluRay 720p [850MB]
Download Colonia (2015) BluRay 720p [850MB]
In 1973, a young couple become entangled in a Chilean military coup at a time when there is much protest on the streets against General Augusto Pinochet. When Daniel is abducted by Pinochet's secret police DINA, Lena tries to find and save her boyfriend.[4] She tracks him to a sealed-off organization called "Colonia Dignidad", which presents itself as a charitable mission run by a lay preacher, Paul Schäfer. Lena joins the organization to rescue her boyfriend, only to learn it is a cult from which no one has ever escaped. She later finds Daniel, who acts disabled. Daniel discovers the organization is also an illegal operations center for DINA. Lena and Daniel attempt to escape from Colonia Dignidad along with Ursel, a pregnant nurse. Ursel gets killed and both Lena and Daniel escape to German embassy. Staff from the embassy betray them but the lovers exit the country via a plane with incriminating photographic evidence against Colonia Dignidad.
[RELEASE DATE]:…………[ 15 April 2016
[RUNTIME]:………………………[ 110 min
[STARS]:……………………………[ Emma Watson, Daniel Brühl, Michael Nyqvist
[GENRE]:……………………………[ Drama, History, Romance
[LANGUAGE]:……………………[ English
[ENCODER]:………………………[ [email protected]
[AUDIO]………………………………[ aac, 48000 Hz, stereo (eng)
[VIDEO]………………………………[ h264, yuv420p, 1280×536, 23.98 fps(r)
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To put it simply, school finances are complex.
Piles of spreadsheets and account codes can seem daunting to those who operate outside of the school business office. Yet, we live at a time when community members demand more transparency about the state of a district's financial health.
A financial dashboard is a tool that can provide a clear, visual snapshot of a district's finances at any moment in time.
What are Financial Dashboards?
Much like a vehicle dashboard, a district's financial dashboard offers a graphical summary that can be used to monitor and evaluate the organization's performance. It can provide context for understanding those piles of spreadsheets.
The dashboard should be simple enough that any visitor to a district's website or any community member who attends a board meeting can read one and understand an overview of the district's finances.
They should be visual. They should highlight and illustrate the information people most want to know, such as how much money is coming in, how much is going out, and how much the district is spending on each student.
Building your own Financial Dashboard
A district's financial dashboard can and should be tailored to its own individual needs, a refreshing departure from mandated budget and audit documents. Officials must first decide what information is most important to its particular community, considering the district's unique strategic goals.
Jeff Feyerer, business manager for the Fairview South School District in Skokie, Ill., created such a dashboard. He offers up the key questions he compiled before creating a financial dashboard for his district:
- Are we spending more money than we're bringing in?
- How do the actuals compare with our budgeted amounts?
- What percentage of our revenues and expenditures is allocated to each fund?
- How have our budget and actuals changed over time?
- Are our district demographics changing?
- What data matter most to our community?
From that list of questions, Feyerer was then able to assemble a list of metrics for his financial dashboard:
- Budget vs. actual
- Total revenues vs. expenditures
- Fund balances as a percentage of expenditures
- Education fund revenues/expenditures
- Debt
- Tax rates
- Financial profile score
- Per-pupil expenditures
- Enrollment
- Projected revenues/expenditures
Dashboard decision-making
Not only are the dashboards essential for communication with the school community, they can also support data-driven decision-making.
A dashboard's visual snapshot helps provide context for recommendations from the school business officials to the board and the community. It offers a clear, easy way to analyze past performance, compare it with current performance, and set goals for the future.
Schools district's using eFinancePLUS will have access to the solution's dashboard. The eFinancePLUS dashboard is a convenient place to simply pull data for the dashboard you want to share with your community.


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This fragrance is absolutely divine. Soft and comforting to wear. I made the Cocoa butter cashmere body mousse that was a project suggestion when I bought the autumn scent sampler. With the harsh winter we have been having I started slathering up my dry hands, but it seemed when I used this mousse the flakiness spread and got worse in areas that weren't so chapped before. Unfortunately I had to stop using my wonderful fragrant lotion on my hands. Perhaps it is just a combination of factors, but do take heed to watch your own skin for signs of drying. The rest of my sample bottle will likely end up in soap next! I want to enjoy it somehow. ;)
I have heard a vicious rumor that this scent might only be a temporary additional to the Brambleberry fragrance oil line. I would never ever ever put what I'm smelling from this little amber bottle into a season selling window! This fragrance is a warm latte on a cool spring morning, summer sun-bathing at the lake while you dry off lying on a wooden deck, or an autumn movie night snuggle with your man, and of course.. a warm winter scent to indulge and treat yourself when it's snowing outside. Can you see that this smell has a place in every season? Brambleberry, have I convinced you? Please keep this scent forever AND offer it year round. To those who are thinking about trying it to see if you like it…. You will.
I love this scent, and my customers do as well. I can't keep it in stock. I use it with cocoa and Shea Butter in a whipped body Butter. Also in bath bombs, soaps, and sugar scrubs. It's divine.
I ordered this fragrance after seeing a project that utilized this scent. I only ordered a small bottle though but I have gotten nothing but rave reviews for it. I haven't tried it yet in CP soap, but I've used it in bath bombs, lotion and emulsified sugar scrub. Everyone just raves over this fragrance. It's very sofisticated and alluring. The other day I applied some lotion and people were looking around, trying to figure out the scent. Please keep this in stock - it is amazing!
Didn't have much of an expectation but I thought it would be muskier for some reason. I don't think I can describe the scent but it is absolutely amazing! Probably my favors scent I've ever ordered. I really hope they keep this around!!
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The metadata committee meetings take place in person, but there are also call-in options for remote participation. These details are sent out closer to the time of the event. If you are not already on the mailing list for the BISG Metadata Committee, please contact Kim Graff at [email protected]
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If you're in the market for a 2-in-1 laptop that can also serve your tablet needs, but you don't want to spend a ton of money on it, Asus's new offering might interest you. The Taiwanese manufactures announced the launch of the Asus Transformer T102HA book hybrid computing device that packs in high-end innards and is priced at $399. The ... Read More »
Verizon listed Asus ZenPad Z10 4G LTE Tablet for $229.99 in USA
Verizon has started selling the Asus ZenPad Z10 4G LTE Tablet in USA. It is being sold to the Verizon customers with a 2-year contract for US $229.99, while the unlocked variant is priced at $329.99 without any contract. It is also expected to be available on Verizon offline stores starting from 13th October. Asus ZenPad Z10 Specifications The Asus ... Read More »
Asus ZenPad 3 8.0 (Z581KL) Tablet goes Official
Asus ZenPad 3 8.0 (Z581KL) Tablet is official now, it is high-end the latest 4G-enabled tablet from the company with premium design and powerful performance. The price and release date of the tablet is still a mystery. The ZenPad 3 8.0 features a 7.9-inch IPS LED display with a QXGA resolution of 1536 x 2048 pixels and the there is ... Read More »
Asus ZenPad Z8 Tablet with Snapdragon 650 and USB-C Launched in USA
Asus ZenPad Z8 has been officially announced in USA exclusively via Verizon carrier. Its a latest tablet from the company in ZenPad series, but it comes with a little bit change in design compared to ZenPad S 8.0. Asus ZenPad Z8 price in USA is $249 without contract, while $149.99 with the two-year contract or user can also buy it ... Read More »
Asus Transformer 3, Transformer 3 Pro and Transformer Mini 2-in-1 PCs Unveiled
Asus has introduced its 3rd generation of the Transformer series at a Zenvolution event in Taipei on Monday. In this new Transformer line-up, Asus has unveiled a total of three new tablets including most powerful Asus Transformer 3 Pro, slightly basic named Transformer 3, and quite gentle device called Transformer Mini. All three are designed somewhat similar to the Microsoft ... Read More »
Asus ZenPad C 7.0 Tablet with 3G Listed online for Sale in India
Asus ZenPad C 7.0 Tablet has been officially launched in India back in October along with the ZenPad 8.0 and ZenPad 7.0. Now the tablet is available for purchase from online retailer shops, it is available in two different variants such as ASUS ZenPad C 7.0 Z170MG with MediaTek SoC has been priced at Rs 7,999 and sold on Snapdeal; ... Read More »
Top 5 Tablets can replace iPad: Worth Buying Today
As of now, most of the manufacturers offer its Smartphones with big screen simultaneously due to its effect on the fall of the tablet market, but still there are plenty of good Android tablets available in the market with good pricing – a value for money tablets. Nvidia Shield K1: Last month, Nvidia announced a tablet dedicated to gamers. This ... Read More »
Asus Transformer Book Flip TP200SA and Transformer Book T100HA 2 in 1 Tablet PCs Unveiled
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8 Free Apron Sewing Patterns
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"The Hushabye Shell Afghan is a beautiful blanket that would be a great shower gift. The pattern is an easy shell stitch and the colts are great for a boy or girl. I am sure that it will keep baby nice and warm. It is made with a nice four ply yarn and should work up fast. This one to save for a later date."
"The wavy rainbow baby blanket is one of the cutest that I have seen. The colors are so bright that a baby will enjoy looking at it. The blanket could also be worked up in other colors that would be great for that special little one. this is not for a beginner, so if this is your first try at crocheting you may not want to try it. Looking forward to working on this."
"The Springtime Lace Afghan Pattern is so cute. It will make a great baby blanket for that special baby. This could be made in many different colors that will really be pretty. The pattern reads really easy and a beginner could do this.I am looking forward to to this project in the very near future."
"he Cape Cod Afghan is really a cute pattern. It would be a great one for beginners. The pattern only calls for two skeins of yarn. The pattern reads really easy. This could also be used as a baby blanket and would look great in one of those baby colors. This is one pattern that I will definitely save for a later project down the road."
Light & Bright Tie Dye Shirt
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This sweater from I Love to Create is a great one to make yourself. It only takes a few steps and you can wear it to an 80's party too. Scrunch the shirt together and get coloring.
- Tulip® Dye Techniques Kit™
- 100% cotton sweater - white
- PVC pipe - 6" round and 1-foot long
- Spray bottle
- Prewash fabric to remove sizing. Do not use fabric softener.
- Cover work surface with trash bags. Lay damp fabric on prepared surface.
- Wearing rubber gloves, add water to the Lime dye bottle, following instructions. Replace cap tightly. Shake until dye is dissolved.Lay the bottom portion of the sweater on pipe and scrunch fabric together, leaving upper portion laying out flat.
- Squeeze the Lime dye over the scrunched bottom portion of the sweater.
- Add water to the Turquoise dye bottle. Replace cap tightly. Shake until dye is dissolved. Pour dye into a spray bottle.
- Move the PVC pipe to underneath the top portion of the sweater and scrunch fabric. Spray top portion of sweater with Turquoise dye. (Refer to photo.)
- Cover fabric with trash bag or plastic tablecloth. Let sit 4-6 hours. Wash in a large load of water with a small amount of laundry soap. Line dry.
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How to Survive and Maybe Even Love Nursing School (3rd Revised edition)By: Kelli S. Dunham (author)Paperback
More than 4 weeks availability
DescriptionThis light-hearted, fun, fresh, and easy-to-read guide for nursing students by nursing students is full of practical information to help them cope with - and get the most out of - nursing school.It features a new section, "staff nurses speak," with quotes from staff nurses currently advising nursing students. It covers the use of podcasts, voice recorders, and CD-burning technology for recording and preserving lectures. It offers new, illustrative quotes from current nursing students and faculty members. It advises on respecting patient autonomy and dealing with end of life issues. It includes a new section on the nurse and media advocacy. It highlights financial aid and alternative ways to pay for education. It offers updated NCLEX coverage, including changing pass rates and tips for foreign students. It provides strategies to deal with the competitive nursing school admission process, including alternative ways to get an RN degree. It includes discussions of the nursing shortage and its impact on students' career choices and workplace environments. It shows how to compare job offers, evaluate sign-on bonuses, and make wise decisions after graduation.
Create a review
ContentsYes, You Can Avoid...; 1. Confusion, Acute, Related to Multiple Choices; 2. Powerlessness Related to Excessive Stress; 3. Role Confusion Related to Juggling Multiple Tasks; 4. Impaired Memory Related to Information Overload; 5. Anxiety Related to a Life Built Around Multiple-Choice Tests; 6. Fatigue Related to Being Perceived as "Different"; 7. Fear Related to the Start of Clinical Rotations; 8. Anxiety, Severe, Related to the Upcoming NCLEX; 9. Confusion, Chronic, Related to Changing Issues and Trends in Nursing; 10. Sleep Pattern Disturbance Related to Occupational Worries; Appendix A: Humor for Healing.
Product Details
- publication date: 01/03/2008
- Format: Paperback
- weight: 376
- edition: 3rd Revised edition
Delivery Information
- Saver Delivery: Yes
- 1st Class Delivery: Yes
- Courier Delivery: Yes
- Store Delivery: Yes


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Sony Cyber-shot DSC-HX10V Review
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Moroccanoil Dry Texture Spray, R385
Chanel Coco Codes Collection
Coco Chanel would be delighted with the modern twist her iconic shades have been given this season.
{ Review } PediRelax Regenerative Foot Cream
Isn't summer great? Sea, sun, Semillon and sandals.
L'Occitane L'Homme Cologne Cedrat
I've always had a love for men's fragrances. And not only on men, on myself.
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UGG nightfall chestnut UK
Guide price: £130
Last updated on 17th Mar 2010
UGG nightfall chestnut UK
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This here book contains the harrowing, true stories of working for an anarchist dog-walking collective. It's actually a ...Add to Cart $24.95
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The Enlightened Cyclist: Commuter Angst, Dangerous Drivers, And Other Obstacles on the Path to Two-wheeled Transcendence
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text: Can a day pass without the New York Times' 24/7 coverage of the Met's Ring getting on yet another of La Cieca's nerves? Apparently not. The quote du jour (from Susan Froemke's film about the Robert Lepage process) is after the jump, with La Cieca's bitching to follow. Read more »


text:
Confirming the incident, Samburu Central OCPD Abagoro Guyo, said:
"Eight students, five boys and three girls took the chemical. Some took it dry while others diluted it with soda."A doctor at Samburu County Referral Hospital where the surviving victim, a 17-year-old girl, was admitted explained:
"She cannot talk or open her eyes but her sleeping position shows she has severe abdominal pains."
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text:
|Publication number
|Publication type
|Application number
|Publication date
|Sep 30, 2003
|Filing date
|May 17, 2001
|Priority date
|May 17, 2001
|Fee status
|Also published as
|Publication number
|Nathan P. Shapiro
|Original Assignee
|Nathan P. Shapiro
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (18), Referenced by (3), Classifications (15), Legal Events (3)
|External Links: USPTO, USPTO Assignment, Espacenet
The present invention relates to a chamber for the vapor-phase chemical processing of semiconductor substrates. More particularly, the present invention provides a continuous processing chamber that allows the deposition of highly uniform films with decreased depletion effects.
Vapor-phase processing techniques that utilize the flow of a reactive gas through a processing chamber are central to the ability to fabricate integrated circuits on semiconductor substrates. As an example, chemical vapor deposition (CVD) is one of the most important methods of forming films of SiO2, polycrystalline silicon and silicon nitride on silicon substrates. Other vapor-phase processing techniques, such as dry etching, are equally important.
Chemical vapor deposition is the deposition of a non-volatile film on the surface of a substrate by the reaction of vapor phase chemicals that contain the desired constituents of the product film. Many different types of CVD reactors are known, and may have very different designs and performance characteristics relative to one another. For example, two very broad classes of CVD reactors are atmospheric pressure reactors (APCVD) and low-pressure reactors (LPCVD). Found within each of these classes are both batch process systems, in which wafers are processed one batch at a time, and continuous-process systems, in which wafers are continuously fed through a process chamber while the chamber is maintained at process conditions.
Continuous process chambers are generally preferred over batch process chambers for CVD processes, as the continuous-process chambers generally have a higher throughput, especially for APCVD. Many different types of continuous-process reaction chamber designs are known. For example, some chambers are designed to cause the reactant gas mixture to flow parallel to the wafer surfaces as the wafers move through the chamber. In other chamber designs, the reactant gas initially flows generally perpendicular to the wafer surface, and is then exhausted out of an end of the chamber. Various examples of continuous processing chambers are found in U.S. Pat. Nos. 3,598,082, 3,652,444, 3,750,620 and 5,863,338, the disclosures of which are hereby incorporated by reference.
In spite of the large number of continuous-process CVD reactor designs and the mature state of the technology, many reactors, both APCVD and LPCVD, share some common problems. For example, wafers processed in many CVD chambers may suffer depletion effects. Depletion effects are variations in the thickness (or other properties) of a film due to the depletion of reactant gasses in the reactant gas mixture as the mixture flows through the chamber. In the absence of corrective procedures, thinner films tend to grow on wafers positioned toward the end of the gas flow path than on wafers positioned toward the beginning of the gas flow path.
Several techniques currently exist for ameliorating depletion effects in CVD systems. For example, one common technique is the use of a temperature gradient across the length of a CVD reaction chamber to increase the film deposition rate toward the end of the chamber. Another is the use of a tapered chamber shape that narrows toward the end of the gas flow path, causing reactant gasses to flow more quickly across the wafers positioned in this part of the chamber. Furthermore, the wafer carriers may be rotated during their passage through the deposition wafer to lessen edge-to-edge depletion effects. While these techniques lessen the severity of depletion effects, they may still produce wafers with some degree of non-uniformity.
The present invention provides a processing system for processing a wafer with a processing vapor. The processing system comprises a chamber, a wafer holder disposed within the chamber for holding the wafer, a drive mechanism for moving the wafer holder through the chamber, and a processing vapor inlet disposed within the chamber for introducing the processing vapor into the chamber and directing the processing vapor onto the wafer. The processing vapor inlet has a generally elongate cross-section configured to create a flow of processing vapor with a generally elongate cross-section and to direct the flow onto the wafer surface in an orientation generally perpendicular to the wafer surface, thus causing the formation of a generally linear stagnation zone in the flow of the processing vapor where the flow meets the wafer surface. The processing system may include a first outlet positioned toward the front of the chamber and a second outlet positioned toward the back of the chamber.
FIG. 1 is a perspective view of a first embodiment of a processing system according to the present invention.
FIG. 2 is a partially sectioned side view of the chamber of the embodiment of FIG. 1.
FIG. 3 is a schematic diagram of a flow of reactant gas hitting a wafer surface in the chamber of the embodiment of FIG. 1.
FIG. 4 is a side sectional view of a flow shape converter of the embodiment of FIG. 1.
FIG. 5 is a front sectional view of the flow shape converter of FIG. 4.
FIG. 6 is a top sectional view of the flow shape converter of FIG. 4, taken along line 6—6 of FIG. 4.
FIG. 7 is a top sectional view of the flow shape converter of FIG. 4, taken along line 7—7 of FIG. 4.
FIG. 8 is a top sectional view of the flow shape converter of FIG. 4, taken along line 8—8 of FIG. 4.
FIG. 9 is a side sectional view of the wafer holder of the embodiment of FIG. 1.
FIG. 10 is a partially sectioned side view of input and exit locks of the embodiment of FIG. 1.
FIG. 11 is a schematic diagram of a wafer processing line that includes the wafer processing system of FIG. 1.
FIG. 12 is a somewhat simplified side sectional view of a second embodiment of a processing system according to the present invention.
FIG. 13 is a somewhat simplified side sectional view of a third embodiment of a processing system according to the present invention.
FIG. 14 is a perspective view of a fourth embodiment of a processing system according to the present invention.
FIG. 15 is a somewhat simplified, side sectional view of the embodiment of FIG. 14.
A first embodiment of a processing system according to the present invention is shown generally at 10 in FIG. 1 as a CVD system. Processing system 10 includes a chamber 12 sealed from the outside environment in which wafer processing occurs. Processing system 10 also includes a reactant gas inlet 14, a front exhaust gas outlet 16 and a rear exhaust gas outlet 18. An input lock 20 and an exit lock 22 are provided at opposing ends of chamber 12 to allow wafers 24 to be moved into and out of the chamber without exposing the chamber to the external environment. Finally, a conveyor mechanism 26 may be used to move wafers 24 into, through and out of chamber 12.
FIG. 2 shows the interior of chamber 12 in more detail. The interior boundaries of chamber 12 are defined by a top wall 32, a bottom wall 34, a front wall 36, a back wall 38, and a pair of side walls not shown in this view. Chamber 12 also has two interior walls, front interior wall 40 and rear interior wall 42, that define the shape of the gas flow passage within chamber 12. Front interior wall 40 and rear interior wall 42 extend downwardly from top wall 32 adjacent gas inlet 14, and then curve around in opposite directions from one another to meet top wall 32 at front outlet 16 and rear outlet 18, respectively.
The portions of front interior wall 40 and rear interior wall 42 that extend downwardly from gas inlet 14 form a generally vertical inlet gas passage 44. Likewise, the portions of front interior wall 40 and rear interior wall 42 that curve away from each other define one wall of a front gas flow passage 46 and a rear gas flow passage 48, respectively. Front gas flow passage 46 leads to front exhaust gas outlet 16, and rear gas flow passage 48 leads to rear exhaust gas outlet 18. Typically, front exhaust gas outlet 16 and rear exhaust gas outlet 18 will be pumped by the same pump, so the back pressure at the two exhaust gas outlets 16 and 18 will be generally the same. Therefore, reactant gas introduced into chamber 12 via inlet 14 will split to flow in generally equal proportions along front gas flow passage 46 and rear gas flow passage 48.
Processing system 10 has several features that allow a flow of reactant gas through chamber 12 to be modified in various ways to create unique processing environments compared to known processing systems. For example, each of front gas flow passage 46 and rear gas flow passage 48 has a region in which the cross-sectional area of the gas flow passage suddenly expands. This region is defined by a step 50 formed in each of front interior wall 40 and rear interior wall 42. By pumping front outlet 16 and rear outlet 18 to a sufficiently low back pressure, a supersonic flow can be created in the regions downstream of each step 50.
Referring to FIG. 2, the cross-sectional area of each of front gas flow passage 46 and rear gas flow passage 48 converges through its length until it reaches step 50, where it suddenly expands or diverges. This allows each of gas flow passages 46 and 48 to act as a Laval nozzle. When the back pressure is pumped to a sufficiently low level, gas flow through each of gas flow passages 46 and 48 may become choked upstream of step 50. At step 50, the choked gas flow can expand into a supersonic flow. It will be appreciated that step 50 will not cause a supersonic flow to form unless the pressure at front outlet 16 and rear outlet 18 is pumped sufficiently low. Thus, chamber 12 can also be used to create entirely subsonic flows by using a higher back pressure at outlets 16 and 18.
When a supersonic flow is created, a corresponding shock wave will form a short distance downstream of step 50, where the flow again becomes subsonic. The subsonic shock wave region has much higher pressures and temperatures than the supersonic flow region, and can be used to create unique processing conditions. For example, the sudden changes in pressure found at the shock wave boundary may be used in front gas flow passage 46 to break up a boundary layer on the top of wafer 24 to create more sites on the wafer surface for CVD reactions. Similarly, the large temperature differential between the shockwave and the supersonic flow region can be used to activate a reaction in either the front gas flow passage 46 or the rear gas flow passage 48.
The pressures required to create a supersonic flow are a function of the cross-sectional area of front and rear gas flow passages 46 and 48. To allow the flow characteristics of chamber 12 to be varied, front interior wall 40 and rear interior wall 42 may be coupled to top wall 32 with an adjustment mechanism 52 that allows the interior walls to be raised or lowered relative to bottom wall 34. In this manner, raising an interior wall would require a greater pressure differential between inlet 14 and outlets 16 and 18 to create supersonic flow. Likewise, lowering an interior wall would require a lesser pressure differential to create a supersonic flow. Furthermore, the interior wall heights may be changed independently to balance the flow of vapor in front and rear gas flow passages 46 and 48.
Any suitable adjustment mechanism may be used to allow the adjustment of the heights of front and rear interior walls 40 and 42. In the depicted embodiment, each adjustment mechanism 52 includes a motor 54 for driving an axle 56 that is coupled to the corresponding interior wall via a pair of threaded rods 58, or other suitable connectors (such as belts or chains). Turning axle 56 causes threaded rods 58 to turn, which either raises or lowers the interior wall, depending upon the direction in which the axle is turned. Each end of both front interior wall 40 and rear interior wall 42 is connected to top wall 32 with an expandable/contractable bellows 60 to maintain the airtight seal of front gas flow passage 46 and rear gas flow passage 48.
The use of separate adjustment mechanisms 52 for front interior wall 40 and rear interior wall 42 allows the heights of the interior walls to be independently varied. This allows the flow velocities of front gas flow passage 46 and rear gas flow passage 48 to be independently varied, giving process system 10 much flexibility. However, front and rear interior walls 40 and 42 may also be raised and lowered with a single adjustment mechanism, or may even be unadjustably fixed to top wall 32, without departing from the scope of the present invention.
CVD reactions typically require the input of some form of energy to cause the desired reactions to take place. Thus, chamber 12 may include reaction energy sources 62. Energy sources 62 may be positioned in any desired location within chamber 12, and may be configured to supply any desired form of energy. In the depicted embodiment, energy sources 62 take the form of lamps (typically infrared lamps) disposed within front interior wall 40 and rear interior wall 42. Each lamp 62 is focused by a lens 64 through a window 66 into each of front gas flow passage 46 and rear gas flow passage 48. Other possible energy sources include resistive or inductive heating elements, or electron beams. One or more masks 67 may also be provided within chamber 12 to give more precise control to deposition processes conducted in the chamber.
Another advantage of processing system 10 is found in its reactant gas inlet 12. Inlet 12 is configured to introduce a flow of gas with a long, narrow cross-section into vertical inlet gas passage 44. The long dimension of the gas flow cross-section is oriented perpendicular to the direction of wafer travel in chamber 12, and extends completely across the width of wafer 24. This causes a stagnation point to form in the reactant gas flow where the flow meets the surface of wafer 24, as shown at 68 in FIG. 3.
When a flow of gas impinges perpendicularly upon a flat object, a stagnation region is formed in the center of the flow. In the stagnation region, the velocity of the flow is zero, and the pressure is higher than the pressure in the surrounding flow. Flows on either side of the stagnation region take on the form of near hyperbolic curves as they deflect to the sides. In the context of the present invention, as wafer 24 moves beneath inlet 14, it moves directly underneath the elongate gas flow. As a result, an elongate stagnation region is formed on the wafer surface, which sweeps across the entire wafer. In this manner, the entire wafer is exposed to a flow of reactant gas with a generally consistent concentration of reactants, causing the growth of an even layer with little to no depletion effects.
Inlet 12 may have any suitable configuration for giving the reactant gas mixture flow an elongate cross-section. In the depicted embodiment, inlet 12 includes a flow shape converter 70 for smoothly achieving this transition with the introduction of minimal turbulence. Flow shape converter 70 includes an outer wall 72 and an inner flow diverter 74 around which the reactant gas mixture must flow to reach the interior of chamber 12.
FIGS. 4-8 show flow shape converter 70 in more detail. First, referring to FIGS. 4-6, it can be seen that flow diverter 74 has a generally spherical shape at its top, where the incoming flow of the reactant gas mixture impinges on the flow diverter. Outer wall 72 tapers outwardly in this region to accommodate the shape of flow diverter 74. The shape of flow diverter 74 changes smoothly from spherical to elongate from its top end to its bottom end. This is best seen in FIGS. 7 and 8. At its bottom end, flow diverter 74 has a fairly sharp edge, allowing the gas flow around it to come smoothly together. Thus, as the reactant gas flow leaves flow shape converter 70, it has an elongate cross-sectional shape. If desired, an energy source such as a heating element or microwave source may be positioned at the exit to (or other location within) flow shape converter 70 to initiate any desired pre-deposition chemical reactions in the reactant gas mixture. Throughout its change in shape, the cross-sectional area of the space between outer wall 72 and flow diverter 74 maintains a generally constant perimeter.
The spacing between outer wall 72 and flow diverter 74 in flow shape converter 70 is such that the overall cross-sectional area of any slice of the space between the outer wall and flow diverter in a direction perpendicular to the overall gas flow is generally constant. This prevents the incoming gas from changing velocity, and thus helps to prevent the formation of turbulence in the gas flow.
The use of front gas flow passage 46 and rear gas flow passage 48 in chamber 12 adds another measure of protection against depletion effects. Generally, some film growth occurs in front gas flow passage 46 and rear gas flow passage 48, especially in subsonic flow conditions. As wafer 24 moves through front gas flow passage 46, reactant gas flows from the leading edge 76 of the wafer to the lagging edge 78 of the wafer. The resulting film may be thicker adjacent leading edge 76 than adjacent to lagging edge 78. However, as wafer 24 next moves through rear gas flow passage 48, the reactant gas flows from lagging edge 76 of the wafer to leading edge 78. This may cause the resulting film to grow more quickly adjacent lagging edge 76 than leading edge 78, thus compensating for any variations in thickness that were caused by front gas flow passage 46.
Processing system 10 may have any suitable conveyor mechanism for moving wafers 24 through chamber 12. In the depicted embodiment, each wafer 24 is carried on a wafer holder 80, which is in turn coupled to a suitable conveyor mechanism. An example of a suitable wafer holder 80 is shown in more detail in FIG. 9. Wafer holder 80 includes a central recessed portion 82. Central recessed portion 82 is configured to prevent wafer 24 from falling off wafer holder 80 during processing. Typically, central recessed portion will have a similar circumference to wafer 24 and a depth approximately equal in magnitude to the thickness of the wafer so that the flow of the reactant gas mixture over the wafer is disturbed to the smallest possible extent. Wafer holder 80 may also include one or more outwardly extending wing portions 84 to help further smooth the flow of gas over wafer 24. Wafer holders 80 are preferably positioned closely enough to one another so that wing portions 84 almost meet to create a continuous floor in the processing chamber, as shown in FIG. 2. Small breaks between adjacent wafer holders 80 allow for the operation of input lock 20 and exit lock 22, as described in more detail below.
Similarly, any desired drive mechanism may be used to drive wafer holders 80 through chamber 12. An example of a suitable drive mechanism is the use of linear motors to drive wafer holders 80 along rails.
Wafer holder 80 will typically have a wafer securing mechanism to ensure that the wafer does not shift positions during processing. Any suitable securing mechanism may be used. In the depicted embodiment, wafer holder 80 includes an electrostatic securing mechanism 86. Other suitable securing mechanisms, such as a vacuum chuck, may also be used. Furthermore, wafer holder 86 may have one or more lifting pins 88 (two are shown) to help remove wafer 24 from wafer holder 80 after processing has been completed. Wafer holder 80 may also have any other desired features, such as heating elements to maintain wafer 24 at an even temperature throughout processing, and a rotary motor to turn the wafer during processing.
Input lock 20 and exit lock 22 allow wafers 24 to be inserted into and removed from chamber 12 without exposing chamber 12 to the outside atmosphere. Typically, input and exit locks 20 and 22 each include an exterior door 90 and an interior door 92 that are operated via any suitable mechanism, such as hydraulic cylinders 94. Exterior doors 90 and interior doors 92 are sufficiently narrow to fit between adjacent wafer holders 80. Input lock 20 may also include heating elements 96 to heat wafer 24 to deposition temperature before the wafer enters chamber 12, and exit lock 22 may include cooling elements 98 to cool wafer 24 before removing it from chamber 12.
Input lock 20 is operated as follows. First, exterior door 90 is opened, and wafer 24 is moved into the interior of input lock 20 on wafer holder 80. Next, the interior of input lock 20 is pumped down with a vacuum pump (not shown) to remove atmospheric gases. After pumpdown, the interior of input lock 20 is backfilled with the same gas mixture that is being used in chamber 12 for the deposition. Alternatively, the interior of input lock 20 may be backfilled with an inert gas, or any other suitable gas mixture. Finally, interior door 92 is opened and wafer 24 is moved into chamber 12. The pumpdown and backfilling steps may be repeated multiple times if desired.
Exit lock 22 operates in a similar fashion. First, interior door 90 is opened, and wafer 24 is moved into the interior of exit lock 22. Next, reactant gases are removed via a pump (not shown), and the interior of exit lock 22 is backfilled with whatever gas the wafer will encounter in the next processing stage. Multiple pumpdown and backfilling stages may be used if desired. Once the interior of exit lock 22 has been purged of all reactant gas mixture, exterior door 90 is opened and wafer 24 is moved out of the interior of the exit lock.
Processing system 10 will typically be used on an automated continuous process line. A schematic diagram of an exemplary process line is shown generally at 100 in FIG. 11. Process line 100 includes a wafer input queue 102, where wafers 24 await processing. A robotic arm 104 moves an individual wafer 24 onto a wafer holder 80, which carries the wafer to processing system 10. After processing, wafer 24 is carried back to robotic arm 104, which removes wafer 24 from wafer carrier 90 and places the wafer in an output queue 106, where the wafer awaits the next processing stage. Often, other processing machines may be integrated into the same process line as processing system 10. Furthermore, to increase throughput, more than one processing system 10 may be operated in parallel on a single processing line.
FIG. 12 shows generally at 110 a simplified view of a second embodiment of a processing system chamber according to the present invention. Processing system chamber 110 has a very similar construction as processing chamber 12, and includes a front interior wall 112 defining a front gas flow passage 116 and a rear interior wall 114 defining a rear gas flow passage 118, respectively. Unlike processing chamber 12, however, interior walls 112 and 114 of processing chamber 110 do not have a step 50 that creates a sudden increase in the cross-sectional areas of front and rear gas flow passages 116 and 118. Thus, processing chamber 110 is not configured to cause supersonic gas flows. However, processing system 110 still offers the advantages of the formation of the reaction gas stagnation region on the wafer surface, and also the advantages in film uniformity offered by the opposing gas flow directions of front gas flow passage 116 and rear gas flow passage 118.
FIG. 13 shows generally at 210 a third embodiment of a processing chamber according to the present invention. Like processing chamber 12, processing chamber 210 includes an interior wall 212 that defines a gas flow passage 214 within chamber 210. Also, interior wall 212 includes a step 216 that defines a region of gas flow passage 214 with a sudden increase in cross-sectional area. However, unlike processing chamber 12, processing chamber 210 has only a single gas outlet 218. Thus, processing chamber 210 is configured to create supersonic gas flows, but does not offer the advantages of the opposing gas flow directions of front gas flow passage 46 and rear gas flow passage 48 of chamber 12. Processing chamber 210 also may include a deflector 220 that causes the reactant gas mix to smoothly change directions in the chamber. Deflector 220 prevents the reactant gas mix from flowing directly downward onto the wafer, and thus prevents the formation of a stagnation region on surface of wafer 24, but also may prevent vortices from forming in the flow of the reactant gas mix and thus may improve the overall performance of processing chamber 210.
When wafers must be run through a number of sequential processing stages, the required purging and pumpdown steps needed at each load lock or processing chamber can greatly increase the amount of time needed to process the wafers. To increase the efficiency of multistep processes, a plurality of processing chambers according to the present invention may be integrated into a single body or frame. An example of a multichamber processor is shown generally at 310 in FIGS. 14-15. Multichamber processor 310 includes three individual processing chambers 312. Each individual processing chamber 312 has front and rear interior walls 314 and 316, defining front and rear gas flow passages 318 and 320 respectively, for each chamber. Front and rear interior walls 314 and 316 may have a smooth contour, as shown in FIG. 15, or may have a step to allow for the possibility of supersonic processing. If each individual chamber 312 is used to deposit sequential layers of the same compound, then the individual chambers may be directly connected, without the use of any load locks between the chambers. Likewise, if the individual chambers 312 are used to deposit layers of different materials, then the stages may be separated by load locks, and a pumpdown/purging routine may be performed between each section.
While the depicted multistage processing chamber has three individual processing stages, it will be appreciated that it may have either fewer or more stages if desired. Furthermore, while each of the embodiments disclosed above is a CVD system, it will be appreciated that a processing chamber according to the present invention may be used with any other suitable type of vapor phase processing device.
The disclosure set forth above encompasses multiple distinct inventions with independent utility. Although each of these inventions has been disclosed in its preferred form(s), the specific embodiments thereof as disclosed and illustrated herein are not to be considered in a limiting sense, because numerous variations are possible. The subject matter of the inventions includes all novel and nonobvious combinations and subcombinations of the various elements, features, functions, and/or properties disclosed herein. The following claims particularly point out certain combinations and subcombinations regarded as novel and nonobvious and directed to one of the inventions. These claims may refer to "an" element or "a first" element or the equivalent thereof; such claims should be understood to include incorporation of one or more such elements, neither requiring nor excluding two or more such elements. Inventions embodied in other combinations and subcombinations of features, functions, elements, and/or properties may be claimed through amendment of the present claims or through presentation of new claims in this or a related application. Such claims, whether directed to a different invention or to the same invention, and whether broader, narrower, equal, or different in scope to the original claims, also are regarded as included within the subject matter of the inventions of the present disclosure.
|Cited Patent
|Filing date
|Publication date
|Aug 25, 1949
|May 12, 1953
|Ohio Commw Eng Co
|Method and apparatus for continuously plating irregularly shaped objects
|Jul 28, 1954
|Aug 12, 1958
|Ohio Commw Eng Co
|Method and apparatus for gas plating printing circuits
|Oct 7, 1963
|Dec 27, 1966
|Western Electric Co
|Apparatus for processing materials in a controlled atmosphere
|May 31, 1968
|Jun 15, 1971
|Western Electric Co
|Advancing workpieces through a sputtering chamber
|Aug 14, 1969
|Aug 10, 1971
|Texas Instruments Inc
|Continuous epitaxial deposition system
|Oct 24, 1969
|Mar 28, 1972
|Continuous vacuum process apparatus
|Jan 2, 1970
|Jun 27, 1972
|Method for diffusion limited mass transport
|Mar 4, 1971
|Aug 7, 1973
|Philips Corp
|Vapor deposition reactor
|Jun 15, 1990
|Apr 28, 1992
|Mitsubishi Denki Kabushiki Kaisha
|Dry etching apparatus
|Dec 24, 1990
|Apr 28, 1992
|General Electric Company
|Diamond crystal growth process
|Mar 13, 1991
|Jun 16, 1992
|Watkins-Johnson Company
|Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD
|Feb 22, 1996
|Dec 8, 1998
|Anelva Corporation
|In-line film deposition system
|Jan 5, 1996
|Jan 26, 1999
|Matsushita Electric Industrial Co., Ltd.
|Apparatus and method for forming thin film
|Apr 14, 1997
|Aug 17, 1999
|Wj Semiconductor Equipment Group, Inc.
|Exhaust vent assembly for chemical vapor deposition systems
|Jul 14, 1997
|Feb 8, 2000
|Semiconductor Equipment Group, Llc
|Single body injector and method for delivering gases to a surface
|Sep 9, 1997
|Feb 29, 2000
|Lsi Logic Corporation
|Method and apparatus for forming dielectric films
|Nov 3, 1998
|May 2, 2000
|Silicon Valley Group Thermal Systems
|Free floating shield and semiconductor processing system
|Title not available
|Citing Patent
|Filing date
|Publication date
|Jul 23, 2013
|Jan 31, 2017
|Meyer Burger (Germany) Ag
|Gas separation
|Dec 28, 2009
|Jun 30, 2011
|Guardian Industries Corp.
|Flame guard and exhaust system for large area combustion deposition line, and associated methods
|Jul 23, 2013
|Aug 13, 2015
|Roth & Rau Ag
|Gas Separation
|U.S. Classification
|118/715, 118/729, 118/718, 118/719
|International Classification
|Cooperative Classification
|European Classification
|Apr 18, 2007
|Maintenance fee reminder mailed
|Sep 30, 2007
|Lapse for failure to pay maintenance fees
|Nov 20, 2007
|Expired due to failure to pay maintenance fee
Effective date: 20070930


text:
- Worldwide Rank #155,536,252
- Follower/Following Ratio 0.2
- Daily New Followers 0
Falsiane Twitter Stats
@01Falsiane - Tracking Falsiane Twitter profile since August 29, 2015
Twitter novo , Ajude a Divulgar ❤ ~ Pra todas que tem uma invejosa no bairro e aquela que se faz de amiga e da em cima do seu namorado ! kk
Falsiane's story
Falsiane, also known as @01Falsiane has a reasonably significant presence on Twitter and is ranked by us in the 30% percentile for account strength. Active on Twitter since August 2015, Falsiane made it to having a respectable 31 Twitter followers and to being ranked 155,536,252 for number of followers among all Twitter users.
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This account is tracked by us Only August 2015. As of February 27 2017 we track 271.912.987 Twitter accounts, so feel free to search for other accounts you're interested in and reveal their Twitter story!
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This account is #155,536,252 in the worldwide rank of the most popular Twitter users.
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text:
The effectiveness and risk comparison of EDTA with EGTA in enhancing Cd phytoextraction by Mirabilis jalapa L.
Wang S.,Tianjin Academy of Environmental science |
Liu J.,Nankai University
Environmental Monitoring and Assessment | Year: 2014
In the previous study, Mirabilis jalapa L. had revealed the basic Cd hyperaccumulator characteristics, but the accumulation ability was not as strong as that of other known Cd hyperaccumulators. In order to improve the accumulation ability of this ornamental plant, the chelants were used to activate the Cd in soil. As a substitute, ethylene glycol bis(2-aminoethyl) tetraacetic acid (EGTA) was selected to testify whether it has better effectiveness and can bring lesser metal leaching risk than EDTA. The data showed that the growth of M. jalapa was inhibited, while the Cd concentration of the plant was significantly increased under the treatments containing EDTA or EGTA. The Cd translocation ability under the EGTA treatments was higher than that under the EDTA treatments. The available Cd resulted from the application of chelant EGTA to the contaminated soils can be limited to the top 5 cm, while the application of chelant EDTA to the contaminated soils can be limited to the top 10 cm. In a word, EGTA showed better effectiveness than EDTA in enhancing Cd phytoextraction of M. jalapa. As an ornamental plant, M. jalapa has the potential to be used for phytoextraction of Cd-contaminated soils and it can beautify the environment at the same time. © 2013 Springer Science+Business Media Dordrecht. Source
Particulate polycyclic aromatic hydrocarbons in the urban Northeast Region of China: Profiles, distributions and sources
Li W.,Nankai University |
Li W.,Tianjin Academy of Environmental science |
Peng Y.,Liaoning Provincial Environmental Monitoring Center |
Shi J.,Nankai University |
And 3 more authors.
Atmospheric Environment | Year: 2011
In this study, concentrations of polycyclic aromatic hydrocarbons (PAHs) associated with PM 10 were measured to examine the status, characteristics and sources of atmospheric PAH pollution in the industrial Northeast Region of China. Mean concentrations of total PAHs were 65.5, 40.0, 73.0 and 436.7 ng m -3 in the four seasons respectively. The calculated BaPeq concentrations in winter all exceeded the national standard, imposing serious PAH exposure risk. PAH concentrations varied between the cities, but PAH concentrations in different functional areas within a city did not show significant difference. In general, particulate PAH profiles were dominated by 4- and 5-ring compounds. Elevated proportions of 3-ring PAHs and 5-ring PAHs were found in winter and in summer respectively. Diagnostic ratios and principal component analysis (PCA) were used to identify potential sources of PAHs. Coal combustion activities were the main contributors of particle-associated PAHs in this region. © 2011 Elsevier Ltd. All rights reserved. Source
Tang J.,Nankai University |
Lu X.,Tianjin Academy of Environmental science |
Sun Q.,Nankai University |
Zhu W.,Nankai University
Agriculture, Ecosystems and Environment | Year: 2012
In this paper, aging process of petroleum-contaminated soil was characterized during 210. d of attenuation under different conditions: clean soil spiked with petroleum (Run 1), clean soil spiked with petroleum and humic acid (Run 2), quartz sand spiked with petroleum (Run 3) and petroleum-contaminated saline soil from an oil field (Run 4). An initial increase of pH was found before 60. d of aging. Total petroleum hydrocarbon (TPH) content decreased with the process of aging and the degradation rates for the 4 runs were 61%, 60%, 24% and 20% after 210. d of aging, respectively. The saturated fraction of petroleum hydrocarbons was most degraded in Run 1 in clean soil; while addition of humic acid enhanced the degradation of aromatic fraction and asphaltene and polar fraction. Addition of TPH in soil resulted in the increase of the dehydrogenase activity at the initial period of aging. A significant negative correlation was found between bacteria count and TPH content during aging process and fungi number was only increased at certain time of aging. The biological toxicity increased at the middle of aging process of 30-60. d as determined by plant growth and luminescent bacteria experiment. The result suggested that proper regulation on the influencing factors such as particle size and salinity was important for the management of contaminated soils and could enhance the natural attenuation of the petroleum pollutants. © 2012 Elsevier B.V. Source
MOF-5 metal-organic framework as sorbent for in-field sampling and preconcentration in combination with thermal desorption GC/MS for determination of atmospheric formaldehyde
Gu Z.-Y.,Nankai University |
Wang G.,Tianjin Academy of Environmental science |
Yan X.-P.,Nankai University
Analytical Chemistry | Year: 2010
Metal-organic frameworks (MOFs) are one kind of highly porous crystalline materials, which are constructed by metal-containing inorganic nodes and organic linkers. With large surface area and high thermal stability, MOFs have great potential as sorbents for the preconcentration of trace analytes. However, such application of MOFs to the analysis of real samples has not been reported before. Here we report the utilization of MOF-5 as sorbent for in-field sampling and preconcentration of atmospheric formaldehyde before thermal desorption (TD) GC/MS (TD-GC/ MS) determination without the need for any chemical derivatization. MOF-5 gave a 53 and 73 times better concentration effect than Tenax TA (organic polymers) and Carbograph 1TD (graphitized carbon black), respectively, for TD-GC/MS determination of formaldehyde. MOF-5 showed good performance for in-field sampling and preconcentration of formaldehyde from air samples with a relative humidity less than 45%. The collected formaldehyde on MOF-5 sorbent was stable for at least 72 h at room temperature before TD-GC/MS analysis. One tube packed with 300 mg of MOF-5 lasted 200 cycles of adsorption/TD without significant loss of collection ef-ficiency. The breakthrough volume of such a tube was 1.2 L of 28.35 mg m-3 formaldehyde at a sampling flow rate of 100 mL min-1. The use of MOF-5 for in-field sampling and preconcentration in combination with TD-GC/MS for the determination of formaldehyde offered a linear range covering 3 orders of magnitude, and a detection limit of 0.6 μ g m-3. The precision for six replicate cycles of in-field sampling and preconcentration for TD-GC/MS determination using one 300 mg MOF-5 packed tube ranged from 2.8% to 5.3%. The tube-to-tube reproducibility of three MOF-5 tubes prepared in parallel was 7.7%. The developed method was applied to analysis of local indoor and outdoor air samples for formaldehyde and validated by the standard method TO-11A of the United States Environmental Protection Agency. The concentration of formaldehyde and the recovery of spiked formaldehyde in the air samples ranged from 12 to 48 μ gm-3, and from 93% to 107%, respectively. © 2010 American Chemical Society. Source
Yang Y.,Tianjin Academy of Environmental science |
Chen Y.,Tianjin Academy of Environmental science |
Zhang X.,Beijing Normal University |
Ongley E.,Beijing Normal University |
And 2 more authors.
Environmental Pollution | Year: 2012
Agricultural non-point source (NPS) pollution has been recently identified by the Chinese government as a major source of aquatic pollution. Methodologies commonly used to make basin-wide or area-wide assessments are problematic and regional distinctions have not been made relative to rainfall and runoff. Using a typical agricultural county in the Hai River basin of the North China Plan we developed methodology to estimate potential load and delivered load for crops (field crops + rice), animal production, rural living and from atmospheric N input. We use scenarios to allow for uncertainty in delivery to estimate the relative roles of different rural forms of pollution. Livestock raising is the major source of NPS pollution. Despite a 75% rural population, rural living contributes almost nothing to surface water pollution. While over-fertilization is typical, nutrient runoff from crops is low. Our results have implications for policies now under development for NPS control in China. © 2012 Elsevier Ltd. All rights reserved. Source


text:
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Ad ID: 21323


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text:
Professional Development
Apics News
Read More
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Welcome to our chapter website!
To Chapter Members and friends of the APICS DANBURY Chapter:
We normaly do not schedule meetings for February because of the weather. This year tuned ot to be an excellent example as we meet the first Wednesday of the month.
We will be meeting in March, Wednesday March 1st to be specific. Our topic will be PRESENT WITH IMPACT given by Steve Mazzuca of IBM. No matter what level you are in the organization you may be asked to give a presentation. Join us for some tips on how to make a good impression and convey your message.
Follow us on Twitter @APICS_Danbury
We look forwarding to seing you at our meetings.
Doug Stevens CFPIM CIRM CSCP President
Member Area Login
Please click below to be taken to the Member Login screen.
Not a member yet? Click here to join
Danbury members or visitors do not need to sign in to access the site.
Renewed Members
Lise Bowman CPIM
Thomas Catalano MBA
Steven Riehl


text:
Home Tags Law student internship experience
Tag: law student internship experience
Internship @ National Insurance Company, Kolkata: Tons of Experience
We were asked to read various claims files based on various insurance policies. We debated on the legal aspects of a particular case while discussing, and we didn't feel like outsiders. Our opinion was respected and heard very patiently.
Internship @ United Way of Baroda, Vadodara: Great NGO Internship, Organizing Events, Friendly Environment
The biggest thing I learnt from the internship was how to communicate effectively with people at work place and get the job done!
Internship @ Chambers of Adv Vrinda Grover, Delhi: Research Work & Court Visits, Nurturing Litigation Interests
Great experience for developing researching skills. It is perfect for someone aiming a career in litigation. One-to-one interaction with Vrinda Ma'am instilled inspiration and zest to keep working for contemporary causes.
Internship @ PUCL, Jaipur: Enriching Work Environment, Researched Based Internship
The work environment was very nice and enriching. Having a large number of co-interns was a lot of fun and all the tasks however back breaking were always fun to do. One can never get bored.
Internship @ Abhay Nevagi & Associates, Pune: Cordial People, Research Work, No Stipend
It's an internship that will give you tasks to do and make you perform. They teach you how to research and it will enhance your confidence. Moreover, no pressure from seniors and no work is given for home.
Internship @ Child Rights And You (CRY), Mumbai: Best First Internship, Summarizing Laws
The most important thing is not to make laws but to implement them properly and to make sure that it benefits the target group that it was made for in the beginning!
Internship Experience @ YUWA, Hutup, Jharkhand: For the Love of Football and Rural Education
You should be adaptive/flexible, creative (not artistically, but generally) and ready for some massive loving by the kids!
Internship @ Mulla & Mulla & Craigie Blunt & Caroe, Mumbai: Professional Environment, Case Summaries, Court Visits
This was my first internship so it gave me an insight into how a corporate law office actually functions. I have definitely learnt a lot in the process.
Internship @ Shardul Amarchand & Mangaldas, Delhi: Grand Office, Corporate Research
Amarchand's office itself, like I mentioned before, it is a very fancy place and makes you feel like an important corporate lawyer who can achieve anything!
Internship Experience @ Advocate John Ralph, Kochi: Rich Learning Environment, Rs. 1K Stipend
Adv. Ralph assisted me in drafting applications and also created a learning environment within which I learnt how to formulate arguments and build a strong defence.
Internship @ Chambers of Justice Mahanty, Odisha: Case Notes and Homework, Networking Opportunities, Fabulous Experience
After the final day of the Justice Mahanty internship, I was handed a kindly worded internship certificate, wished luck for my future.
Internship @ Centre for Sustainable Development, Madras: Friendly Environment, Research Work on Trade and Environment {s}
Small set up. Doing good work. Very friendly. No formalities as such. Good work experience.
Internship @ Senior Advocate J P Sengh, Delhi: Court Visits, Follow-ups on Cases {s}
There were two co interns in the office and many in the high court, we usually just chilled there only, but Khan Market is close by too.
Internship @ Economic Laws Practice, Mumbai: Drafting, Due Diligence Work, Rs. 10,000 Stipend
Everyone was open and super helpful. The associates made you feel welcome and were happy to help in case you didn't understand certain things.
Internship @ Dua Associates, Delhi: Lots of Networking, Research & Drafting Work
Name of Organisation, City? Dua Associates, New Delhi Duration of internship? 3 weeks How big was the office? Team Strength? Dua Associates has a big office and a huge...
Internship @ Human Rights Law Network, Delhi: Typical NGO Exposure | Perfect Initial Internship | Case Studies
All in all, it was a fantastic experience working at HRLN Delhi, as it was the perfect start to internships; it was light but not too idle on the work front and gave us enough understanding of ability to sit on the desk for 8 hours minimum every day.
Internship @ Chambers of Senior Advocate K T S Tulsi: Great Mentors | Mock Trials | Rs.7.5K Stipend!
Once a week, we had a mock trial based on current affairs and the interns get divided into two, for and against. It's judged by K.T.S. Tulsi himself, and you have best speakers in those trials.
Internship @ Adv Anil Kilor, Nagpur: Small Office | Friendly Associates | Flexible Timings
It was a 6 days a week internship. I used to go to the High Court in the morning and then at around 6 to his office and I could go back around 8 but it was quite flexible.
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Job Description
We are looking for the candidate who has excellent English Communication and one who will be accountable for doing Primary and Secondary Research for the company.
The candidate will be responsible for:
[1] Client communication, consulting the clients on the basis of study findings.
[2] Product Research, Market Research, Industry Research, Oil & Gas Research.
About Company
Profitable businesses need smarter people, because great products and services don't happen by accident."
OUT OF BOX HR Solutions is the HR arm of SaiKalp Consultancy Pvt. Ltd, the decade old Mumbai (India) based business-consulting group.Together, the conglomerate holds over 40 years of experience across business verticals and geographies.
What We Do?
OBOX HR Solutions is a leading end-to-end HR solution provider company with a special focus on Compliance and Staffing, OBOX HR offers a wide range of comprehensive services like:
1. HR Outsourcing
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4. Compilance
5. Recruitment
6. Audits
7. Tax Management


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Wednesday, April 21, 2010
santa, are you listening?
Delight by Design posted this pic yesterday. i am sort of obsessed with this molding. my condo is very molding heavy... mehhh. wainscoting in the living room, dining area, and hallways. crown molding EVERYWHERE. its pretty, im not complaining... but if i could have polka dot molding, i would be one happy girl.
and yes, im jewish, but santa can still see my wish list.
Posted by Alex {Things That Sparkle} at 4/21/2010 08:22:00 AM
Labels: inspiration
1 comment:
Thank you so much for your comment, and I'm VERY sorry for the word verification, I had to do it, too much spam!
Subscribe to: Post Comments (Atom)


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中古 ノートパソコン 中古パソコン FUJITSU FMV-A8290 Celeron/3GB/160GB/マルチ/無線 / MAR Windows10
Shopping > Computers > Notebook PC > A4 size notebook中古パソコン通販テイーケイワイ
There may be more pictures and product information shown on Y! Shopping's product detail page.
Please visit Y! Shopping for more about the product.
Please visit Y! Shopping for more about the product.
Item Description* The item description provided by the shop is machine translated.
In some circumstances, the automatic translation may not provide a clear or accurate description, so please only use it as a reference when placing an order.


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Tanzania revels on anti-corruption move success
STAKEHOLDERS' involvement in the fight against corruption has been cited as an essential move to be used by Commonwealth in the fight against corruption in the wake of success in Tanzania.
Revealing his remarks while speaking to the Commonwealth Secretary-General Patricia Scotland at the sideline of International AntiCorruption Summit 2016 held at Lancaster House London last week, the Prime Minister, Kassim Majaliwa (pictured right) said Tanzania is ready to support the commonwealth countries in ensuring the strategies in fight against corruption are met using the homegrown approach.
He said the pace of the Phase 5 Government under the leadership of President John Magufuli has its commitment to fight corruption by having various initiatives against it and the trend has proved commendable to recent years devlopment.
The premier told commonwealth secretary the that


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Chandrababu's speech in Women's Day fete in Nellore dist - NTv
Sun, Mar 08, 2015, 02:54 PM
Andhra Pradesh Chief Minister Nara Chandrababu Naidu today participated in Women's Day celebrations held in Nellore district. He felicitated women who have excelled in different fields. TDP government is likely to provide better healthcare for poor and middle class people under public/private partnership model. "We will develop the AP state into a healthcare hub and provide empowerment to women," Chandrababu said.


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B&P Accounting Solutions, Corp.
Accountant, Quickbooks Consultant, Tax And Accounting
We have worked in the accounting field for more than 13 years and studied accounting for 18 years. We have experience as payroll manager, accounting assistant, accounts payable clerk , accounts receivable clerk, department manager, payroll specialist, freelance tax preparer and office assisting. We were certified in payroll for more than 5 years. We are certified Quick Books Pro-Advisers and trainers with more than 7 years experience working Quick Books (various versions).
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Accounting has been a passion of mine since my first accounting class in high school. I earned top grades in the class and received an award from Dixon and Odom (now Dixon and Hughes). That was my first taste of accounting. I have since worked in the filed for almost 18 years. I graduated "Cum Laude" from Strayer University. I really enjoy the field and working with people to watch their businesses grow!
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Does Flex needs it's own JRE?
Short answer: no! Full answer here. However when I had Flex2 beta2 installed, I deleted the JRE that installed with Flex because I already had the JRE 5.0 installed and it caused no problems at all. I don't really like the idea that every application installs it's own JRE on my harddisk (Maya is such another app). Not that the ~50Mb are wasting too much space but its getting confusing if there are many JRE's installed and Windows doesn't make this fact easier with it's obscure environment variables configuration.