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12/30/2009 · To reduce hips and thighs there are two issues to address. One is diet and the other is exercise. While it is possible to make headway doing just one or ...2/16/2012 · Shaping the muscles of hips and thighs is a significant fitness goal for most of the women, isn't it? Check here ultimate guide of exercises to reduce hips ...I Am 38 Yrs. Old Having 1 Daughter. I Want To Reduce Fat From My Thighs & Hips. Suggest Some Exercises.How to Reduce Hips by Yoga. If your goal is to lose weight in your hip area, pairing yoga with healthy eating habits can certainly help you shed pounds, although ...How to reduce body weight naturally? 10 Tips to reduce 5 to 10 kgs in just weeks. It really works!!!!! Being overweight affects the health of a person as well as his ...4/22/2012 · WATCH Hot Yoga for Beginners - Yoga to Reduce Fat Belly, Thighs and Hips - The aasanas included are chandrasana, vajrasana, sasakasana, one leg …Fruta Planta is formulated to help users reduce their appetite and fight daily cravings. This Chinese weight loss product is an all natural organic solution to SIMPLE ...[ Read: Lose weight] How to Lose Weight From Hips. Here are the important things you can adopt when trying to trim your waistline: Strength Training: Lifting weight ...12/30/2010 · How to Reduce My Weight & Stomach. If you want to reduce your weight -- particularly around the stomach -- you have to commit to a healthy diet and …The first method that is recommended for people who are looking for options on how to reduce fat from hips is to follow a healthy diet, which is low in fat and calories.
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IDOT ready for Rt. 1 bridge replacement in Watseka
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Re: SCHOOL HOLDAYS
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Be the first to rate this answer!Was this helpful? Quote & Answer
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by Pete Prestipino
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Cent has a secret. She lives in isolation, with her parents, hiding from the people who took her father captive and tortured him to gain control over his ability to teleport, and from the government agencies who want to use his talent. Cent has seen the world, but only from the safety of her parents' arms. She's teleported more than anyone on Earth, except for her mother and father, but she's never been able to do it herself. Her life has never been in danger. Until the day when she went snowboarding without permission and triggered an avalanche. When the snow and ice thundered down on her, she suddenly found herself in her own bedroom. That was the first time.
©2013 Steven Gould (P)2012 Audible, Inc.
"Should be listed under teen romance"
Not for me:. I have no interest in how a 15 year old girl adjusts to public school.
The first two books in this series vere excellent.
"where's the vampires?"
8th grade girls.
I can see why they used a woman narrator for this book, but it took some getting used to since the first two books were read by a man.
the kissing parts
When did this series turn into Twilight books? Did the target audience just switch to 13 year old girls? And the story was boring compared to the other two in the series. Very disappointed.
"Another great book in the Jumper series!"
Fun, exciting, fast paced
I thoroughly enjoyed the main character.
I would recommend this book, and in fact the whole series, to anyone. Way better than the JUMPER movie. All the books have been fun, fresh, interesting and compelling.
"Great continuation of Jumper"
There is no difference between the 2, but i prefer the on the go option. With the audio book i can multitask and get work done while listening to the great story.
Great continuation of the Jumper series. Steven Gould does a great job of making me like Cent and her story. Can't wait for the next book!!
I like the other reader more, but Emily did a great job reading as Cent, and it made more sense having a female voice, from the perpective of Cent.
Pretty much, finished the book within 2 days after i got it.
Impulse is a return to the universe of Jumper and Reflex. Jumper is a favorite book of mine and I really enjoyed impulse as well. It was fantastic to meet these characters again - and to meet a new one, Cent, who I think is the strongest of the bunch.
This book is funny, exciting, well written and well narrated. Emily Rankin does a stellar job bringing the characters to life, most especially Cent.
Highly recommended.
Reflex and Jumper
Much better than Jumper.
"Mr Gould, you really need to crank up the speed!"
I first discovered Steven Gould's Jumper Series from one of Audible's sales. I really liked the first two installments, but I found the second book "Reflex" a tough read since it took me to some really dark places. The third book "Impulse" is more like the first book and a very enjoyable listen. I would have preferred if they had kept Macleod Andrews for Davys voice and let Emily do Milly and Cent (she does an excellent job, but for me it was a bit distracting). Although the book is a coming-of-age story of many sorts, I still found it intriguing. It was with some dread I listened to the book since I kept waiting for the other shoe to drop, but I am satisfied how things plays out.
Regarding my choice of headline... Come on, Mr. Gould. Three Jumper-books in more than two decades, I am sure you could cut the time between books in half. :)
"Like being stoned to death with popcorn !"
If I had a teen of 16 - 18 years old I might suggest it to them - - after the homework was done. This is not a book for an older person.
Young self made business man with plenty of time on the road to enjoy the world of audiobooks.
"Teleporting need I say more"
some teleporting books can be hard to follow but this one is exceptional, followed it with easy, great narrator and great story,
just became a fan of Steven Gould.
I hope there is a second book as the ending was abrupt its still a good ending, but got so involved with the characters i want to keep going along with there journey.
"A new jumper into the fray"
Loved it. Fans of the series will get a wonderfully written new entry and enjoy every minute of it. I burned though this so quickly I can't even remember all the point where I LOL'd for reals.
Alright so I'm still reading this faster than should. I honestly loved this book. It was a perfect installment to this series. Whether you're here now because of your love of scifi, the movie, randomly picked off the store shelves I think there's something for us all.
Between the voice of Cent and the actual narrator (I must find out how old she was) it really sound like a teenager was telling you this story. I think it's great. I mean I know it's Gould's writing but really it reads like Cent is real and this is a story about what her life is like in a very important transition of her life. She gets to go to public school. If only it were that simple. Even knowing the most common traps and pitfalls is not going to get this girl through the day. I appreciate how real the day to day felt even in a family with super powers.
I don't remember who said it, and if you do - please reply, but I once heard of someone talking about a show or movie with a good bit of people with super powers. I'm paraphrasing here but "it's not about the powers they have but the people they truly are". Clearly it's stuck with me and here is another great example of "normal" humans getting extraordinary things done. No spoilers but it never seems forced or unrealistic. It just seems like this is how this particular family unit lives.
Now all those positives said I have one negative. Any seasoned fan... hell n00bie who's paying attention realizes that David has a fairly real paranoia from her previous experiences in the series. So can anyone tell me, throughout all the safety measures and precautions, hacks in phones limiting cell tower pickup, disguises, etc etc. Why he would allow his daughter to bring in the most exotic lunches to school daily? It's absurd and it really pains me to say it. I welcome everyone's opinion on this but I think that's the only thing within the pages where I groan internally and try and act like it's not a big deal even though any reasonable person knows that that is like putting a big bullseye on an already hunted individual (family).
See I can't even figure out how to follow that paragraph. It puts such a downer on a very excellent book. I wish everyone could read this. This is one of the super powers on my "if it were real, I'd like that" list. Nightcrawler anyone? YES! Just the idea of a cool family where the sky is the limit living in a world with limits abound makes this interesting. Even if you didn't have..hmm what are they called this time around? Oh, no worries. Even if you didn't have "them" you can still belive that showing off their ability to teleport in the world would be a no no. Who wants that kind of attention.
Yeah I'm sorry, I just can't get the flow back. The food this is minor. I swear on my life. It just cuts me up a bit cause Cent, David, or Millie - some combination of the Rice family, could've been the one cooking fabulous meals on a daily basis and it would've not stuck out. Reading or in the moment. Arg. Definitely going on my "read to many times I'm embarrassed to admit it" shelf. I cannot wait to see what Gould does next. My only sincere hope is that it doesn't take another decade to read about it. BUT if it does it cool. I know it's aged well.
"Just couldn't do it."
Just too YA for me. And I hated the first person narrative.
Not written a book about the daughter.
She was fine.
I'm sure there is an audience for this book. Kind of a wasted credit for me unfortunately. I really enjoyed JUMPER and REFLEX was pretty good too.
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|2011-12-07, 22:24
|Link #81
Senior Member
Join Date: Dec 2005
You know, considering how Wadatsumi was exiled from the island instead of being locked up... how much you want to bet that he might get a role in a cover-ministory-arc?
Also another thing i thought was a nice touch is how when Robin referred to Shirahoshi as Poseidon, shirahoshi was in a fetal position, just like she was when Otihime was talking about her power.
but a third weapon going by the name of zeus/saturn... ya I could easily see that
|2011-12-07, 22:51
|Link #82
Dancing the Panzer Waltz
Join Date: Feb 2007
Location: Resides within the depths of Ned infested Glasgow
Well I for one won't mind one bit if Shira joins, even if she becomes a mini me of her current self(which I think is one of her biggest charms, pun intended)
I think it could happen altho I certainly wouldn't get my hopes up on it, haven't done so for any character(even for Hancock)ever since Brooke joined.
She would fill a role I hoped Vivi could have done, someone of real importance i.e royalty.
Well one way I can reason behind her joining is she wants to explore the world, just as much as the others.
And plus if she wants to follow in her mothers footsteps getting to explore the "human" world is def a requirement(actually hoping on Oda playing on this!)
And effectively she really doesn't have to do anything on Fishman Island, we all know the slate has been wiped clean, altho getting Fishfolk to get on board Otohime's will will still be tough, I think the Princes can handle that.
I can admit it's rather easy getting one's hopes up on Shira joining but at same time, theres always gonna be this ickling feeling it just won't happen.
FYI, I'd also be fine with Madam Shirley joining or anyone of the many beautiful mermaids
As for the chapter, love this "hero" business
A pretty interesting chapter on the whole, the deal with Joyboy has really piqued my interest now.
|2011-12-08, 00:36
|Link #84
Senior Member
Hey I kind of predicted something half right. Noah having somethign to do with ancient weapons. I wouldn't have guessed posseidon was the mermaid princes. It makes sense given the name.
Ridiculous predictions.
1. Fishman Arc actually begins now. A lot f major One piece arcs are paired arcs. Water 7/Enies Lobby. Amazon Lily/ImpelDown/War. Fishman Island has been mentioned for 4+ year in the stories its significant obviously revealed. The whole time, through this arc I've been thinking this is far too short and almost trivial for this to be it.
2. Franky has some contraption that will be capable of bringing shirahoshi along for the ride =). I don't actually believe this.
3. Pluton could still be a ship. Crocodile was looking for pluton, so the person who said franky destroyed its blue prints is incorrect. Frank destroyed blue prints to counter pluton. I like the theory that Pluton is a land weapon as he is the "king of the underworld" while Poseidon was the ruler of the sea. Weakyhoshi's ability makes her infact queen of the sea.
The reason I think Pluton could be a ship is simply because its also the name of A famous spanish ship. The other possibility is Pluton does follow the same pattern as hoshi and is a person. Reading too far into the name, one pattern I've noticed is that Both Neptune and Poseidon refer to gods of sea with minor differences that do not actually make them the same person. However, common knowledge often describe them as the same deity or counter part which is incorrect. Shirahoshi's father is neptune, while she is posseidon. Hades and Pluto share a similar relationship
|2011-12-08, 01:02
|Link #85
Join Date: Nov 2011
This was a surprisingly informative chapter with Oda beginning to address the "Lost History" with info we learned several hundred chapters ago. My prediction about Jimbei not joining turned out true and will probably stay that way. Still, I'm doubtful that they'll leave Fishmen Islan without their tenth and final crewmate in tow.
I don't think this arc is over yet, however. MHQ has already learned the Mugiwaras are still alive and will soon learn the recent developments of Fishmen Island. Letting them into the New World would be yet another embarassment and blunder for them. MHQ will show-up and that fight will further destroy the isle, causing Luffy to go on a rampage and fulfill the promise made 800 years ago.
|2011-12-08, 02:04
|Link #86
Madness Through Sound
Join Date: Oct 2011
Location: Californiaaaaaa
Age: 25
I hope that he actually JOINS the crew.. instead of pulling off another Vivi.. that'd be dumb if he did .. This arc probably isn't over just yet.. Got a feeling that something big is going to happen soon or idk hmmmm...
Decent chapter though. Oda always does a nice job in wrapping things up.
|2011-12-08, 03:42
|Link #87
lost ronin
Join Date: Oct 2008
Location: in the recesses of my convoluted mind...
Last edited by ronin myael; 2011-12-08 at 04:37.
|2011-12-08, 04:12
|Link #88
a random Indonesian otaku
Join Date: Dec 2009
Location: Xanadu
Age: 24
my prediction will be : Caribou is hearing Robin and Neptune's conversation... after that he go to do something to Shirahoshi (kidnapping.... or worse than that)
|2011-12-08, 07:08
|Link #89
Join Date: May 2010
Location: Unspecified
and consider fate of Pluton and how dengerous, all ancient weapon maybe will share same fate
anyway my prediction
Caribou Hear the conversation and decide to kidnap Shira hoping he can sell it to WG for huge amount of money. (or he can just say "give me you entire treasure in to ensure Princess safety" or even BOTH! (he get treasure but still selling Shira nyway))
obviously Straw hat crew will rescue her.
then this can be 2 direction
1) they successfully rescue her. however Shira and Jimbei decide to saty on memaid island since it more safe than joining straw hat (it seem every one forgot that big mom is in there ) so yeah no jimbe in straw hat
2) Shira decide to make sacrifice because she think is to dangerous to life in this world (or other reason like saving fishman island from volcano) this make poseidon "destroyed" just like pluton (unleash if one of her bother carry bloodline which probably one piece will end before birth of new mermaid princess). this MAYBE motivated Jimbei to join the crew with hope of saving/destroy the ancient weapon/ overthrown WG/ fulfill mermaid princess wish (Shira or previous one)
|2011-12-08, 08:06
|Link #90
lost ronin
Join Date: Oct 2008
Location: in the recesses of my convoluted mind...
what if the world government would somehow find the original pluton and the power of poseidon will be needed to counteract it? the thing is, shirahoshi is no fighter. she doesn't want to hurt anyone, and she has no killer instincts whatsoever, how could they convince her to go to war? she's not exactly a piece of a hardware that you can just use when you need it, she's a living being.
|2011-12-08, 09:36
|Link #91
Senior Member
Join Date: Dec 2007
If Pluton is a military warship of some kind that has the power to match the WG itself, and Poseidon has dominion/command over humongous sea kings that are capable of destroying the world, it really makes one contemplate just how exactly the third weapon will logically be even more powerful than those two. Since we haven't even heard about it yet, I won't be surprised if it's located at Raftel. Very few have ever stepped foot on that island (in fact, I believe only Roger and his crew have ever made it there), so that would explain why hardly anyone knows about it.
|2011-12-08, 11:24
|Link #93
Custom User Title
|2011-12-08, 11:35
|Link #94
Senior Member
Join Date: Dec 2005
And going back to the subject of people underestimating sea kings, I think now is a good time to once again bring up that one goldfish sea king from Little Garden.... y'know, the one that literally ate entire islands and took the combined strength of two powerful giants to kill? Yeah, guess those monsters sure are weak, huh?
Now it's true that Shirahoshi's ability has the potential to strain the relationship between humans and fish-people, but on the flip-side, she can also be seen as the ultimate "bargaining chip" of sorts to help build relations with the WG. I mean, think of it this way: In the past, the government rejected the idea of using the ancient weapons themselves, going so far as to erase the group of scholars who were closest to unearthing them (Robin being the only survivor of those scholars). And yet, after some time passed, Spandam managed to convince the elders to use the weapons for themselves. Now, if they were to find out that the mermaid princess herself is a weapon, they'd undoubtedly want to use her for themselves. So what if Neptune and the princes negotiate a deal with the government so that their island would receive more support from them in exchange for their services (similar to how they're currently doing business with Big Mom, in other words)? That way, the merfolk won't have to worry about the world nobles waging war against them for the time being (since they'll be too afraid of being eaten by the sea monsters) while at the same time the royalty will be able to keep a closer eye on the government and be properly prepared for them in the event that they DO strike back. Seems like a pretty reasonable solution, no?
And frankly, I wouldn't worry about Shirashoshi's power going berserk anytime soon. She seems way too timid to just randomly order the sea kings to go around destroying everything in their path.....
|2011-12-08, 11:56
|Link #95
ANEGO Worshiper
Join Date: Jun 2011
Location: By the vending machine, drinking tea.
And protector of Fishman Island? Sure, With her power, she could very well station an army of Sea Kings around Fishman Island to keep the WG or Pirates away...but what if they manage to get inside?
An admiral, for example, is quite capable of infiltrating Fishman island and once there he'd be virtually unstoppable (the army is crap and the only strongest guys, the 3 brothers and Neptune can't even beat Hody...who is a joke to be honest...)
Once even a Vice-Admiral or two (don't even need an admiral) are inside the island, Shirahoshi's power is useless because any Sea King that got inside would be either too small and weak to do anything or too big which would endanger FI itself.
I'm not saying Shira should join the Strawhats, but staying on the island with the risk of her power being brought to light to the WG (lets not forget that multiple pirates saw the Sea Kings as well) is too risky for her. Betting if anything Jinbei will go with her into hiding just to keep her safe...of course if she doesn't join the crew...
About joining the crew...I'm not wholly against it...God knows that group needs more ladies than anything. However to me, she doesn't fit the crew personality wise, there's the whole...bigger than Sunny issue and she can't really go on land unless they pull some little mermaid BS and turn her human while on land or something >_>
Hell Hachi and Keimi would be a better fit than her in my honest opinion. Or Shirley...just sayin
|2011-12-08, 13:33
|Link #96
Senior Member
Join Date: Jan 2003
Location: Germany
Those Giants were not really powerful... none of the Giants we've seen so far actually were especially wrong. Even Oars could be defeated by normal people.
About the ancient weapons: I guess one of them has to be some sort of Airship. Air supremacy is the key to winning wars, especially in a world where nearly all movement is on the surface (by ships).
Talking about Franky and the destroyed blueprints: I wonder if he used any of the knowledge from those blueprints, together with the knowledge from Vegapunk's home, to improve his body or the ship.
|2011-12-08, 14:13
|Link #97
Annie Leonhart
Join Date: Jul 2007
Location: Indiana
I always wondered about that? If Franky really did destroy the Blue Print. I mean all those years of defending it and keeping it a secret and he never bothered to look. Two what about Tom's belief that there are no bad ships. I would not be surprised if Franky made a copy or memorized the design for Pluton. For a guy who like do build war ships I don't think he would pass up this one and a life time chance.
Shirahoshi is completely safe were she is at. Has long has the WG does not know about her power and they don't take the legendary Mermaid story actual truth or come to the same conclusion has Robin. If she joins the Straw Hats she would literally be hurting herself. The Straw Hats are famous and enemy to the WG. Adding her will only make the WG suspicious of her. Then they would be more tempted to go to Fisherman Island. Her joining would have more negatives then positives. Second you can't hurt what you do no know. Ignorance is the best defense. If the WG still in the dark about the information that has come to light in this arch then it would be for the best she not join at all.
|2011-12-08, 14:41
|Link #98
Senior Member
Join Date: Apr 2007
Location: East Cupcake
Added to that, since the Tenryubito do know of Shira, I expect the WG is already aware of her gifts and has simply taken a wait and see policy.
|2011-12-08, 14:48
|Link #99
Senior Member
Join Date: Dec 2005
You.... actually took that post of mine seriously? Wow. I mean, I figured there would be a limit to how much one would underestimate things, but just.... wow.
For one thing, you already brushed off Dorry and Broggy as being "not really powerful"..... two giants who have 100-million bounties, making them at least on par with supernova-level pirates (heck, their price probably would have been higher if they weren't fighting each other to the death for over a century). And I guess you also forgot how their combined attack against that sea king split the freaking ocean apart, huh? Or I suppose you think that any nobody pirate is capable of such a feat? Gee, I wasn't aware that all pirates had Moses powers......
And you also brought up Oars (I'm assuming you mean Junior here) as an example..... yes, the giant who was shelled by nearly as much artillery as Whitebeard, and ended up getting taken out by three of the Shichibukai before finally passing out (and yet he STILL managed to recover long enough to help the warring pirates one last time). But nope, I guess those giants are all pansies to you, huh..... just a few thousand bullets and cannonballs and they'll drop like a fly! Nope, no trouble at all!
C'mon man, you should know as well as anyone else that giants or sea kings are nothing to sneeze at, particularly the latter. Sure, a single beast may be no problem for a VA or legendary pirates like Rayleigh, but as others have already said, you amass a huge army of those suckers and even the most beastly of humans would be screwed......
I think the WG cooperating with mermaid island at this point would work because keeping Shira under close surveillance would benefit them just as well as it would benefit Neptune's family. They could observe her strengths and weaknesses and take advantage of her power when the time is right. Like say an envoy from the government convinces her that a group of evil humans whose intentions are to disturb the fish-people's peace are on their way to the island so they suggest that she send a sea king or two their way to gobble them up? However, those "evil humans" are in fact revolutionaries (or anyone opposing the WG, period). See, in that sense, it would be a sort of "win-win" situation for both sides (even if the government's intentions for repairing relations with the fish-people isn't exactly the most honorable or honest)......
And again: If the WG truly did see the princess as a threat, then they should have eliminated her when her mother was still alive, since a world noble even witnessed her ability in action. Now that she's older and is fully aware of her power (and has the added protection of her family + Jinbei), I don't think she would be in as much danger now as she was when she was still a child (or when she spent all those years locked in the tower because of Decken).
And as for the crewmate discussion: While I'd definitely have no objections to a new female member, as you indicated, I'd also prefer for her to actually have some substance rather than just stand around acting cute (besides, that's technically Chopper's role, to some extent ). I'd like to see Shirley join myself, but I think having a seer join would be almost as much overkill as Jinbei joining, to be honest. I guess we'll have to wait until the New World for a suitable lady to appear......
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|Publication number
|Publication type
|Application number
|Publication date
|Jul 19, 2011
|Filing date
|Jun 8, 2006
|Priority date
|Jun 8, 2006
|Fee status
|Publication number
|Pramod Subramonium, Zhiyuan Fang, Jon Henri
|Original Assignee
|Novellus Systems, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (61), Non-Patent Citations (33), Referenced by (20), Classifications (19), Legal Events (2)
|External Links: USPTO, USPTO Assignment, Espacenet
This invention relates to a novel method of producing ashable hard masks in semiconductor processing.
Ashable hard masks (AHMs) are films used in semiconductor processing that may be removed by a technique referred to as "ashing." In particular, AHMs are often used as etch stop layers. 193 nm or lower lithography schemes require these AHMs to have high etch selectivity to underlying dielectric or metal barrier layers. In addition, 193 nm lithography schemes employ a 633 nm mask alignment laser—requiring the AHM to be transparent to light at 633 nm.
To date, know methods of producing highly selective AHMs rely on relatively high temperature (greater than 500 C) PECVD deposition processes. Many PECVD reactors are not designed to withstand such high processing temperatures, however. In addition, the extinction coefficient ("k value") of these films is typically higher than ideal for 193 nm lithography schemes.
Accordingly, it would be desirable to be able to produce transparent hard mask films having high etch selectivity. It would also be desirable to produce hard mask films having high etch selectivity at a relatively low deposition temperature (below 500° C., e.g., no more than 400° C.).
The present invention addresses this need by providing a method for forming transparent PECVD deposited ashable hardmasks (AHMs) that have high plasma etch selectivity to underlying layers. Methods of the invention involve depositing the AHM using dilute hydrocarbon precursor gas flows and/or low process temperatures. The AHMs produced are transparent (having absorption coefficients of less than about 0.1 in certain embodiments) and have high etch selectivities. The lower temperature process also allows reduction of the overall thermal budget for a wafer.
One aspect of the invention relates to a method of depositing an AHM involving providing a semiconductor device substrate in a deposition chamber, exposing the substrate to a process gas comprising a hydrocarbon precursor gas having a partial pressure between about 0.01 and 4 Torr and depositing on the substrate an ashable hard mask by a plasma enhanced chemical vapor deposition (PECVD) process at a process temperature between about 30 and 500 C, e.g., between about 30 and 300 C.
In particular embodiments, the partial pressure of the hydrocarbon precursor is between about 0.05 and 0.5 Torr, for example between about −0.05 and 0.1 Torr. Also in particular embodiments, the temperature may be between about 100 and 250 C. To maintain a low hydrocarbon partial pressure, a high flow carrier gas may be used to dilute the precursor gas. Examples of carrier gases include argon, nitrogen, helium and hydrogen. In a particular embodiment, hydrogen gas is used as the carrier gas. For example, between about 80-99% (by volume) of the process gas may be hydrogen. The overall pressure of the deposition chamber may be any suitable pressure. In some embodiments, the overall pressure may be less than about 2 Torr, for example 1.5 Torr.
The resulting hardmasks have low extinction coefficients, for example less than about 0.1. In some embodiments, the extinction coefficients are less than about 0.05. The hardmask are also highly selective, having selectivities of at least about 12:1, or at least about 15:1 according to various embodiments. Carbon content typically ranges between about 50-70%.
Also provided are methods of forming an ashable hard mask involving providing a semiconductor device substrate in a deposition chamber, exposing the substrate to a process gas comprising a hydrocarbon precursor gas having a partial pressure between about 0.01 and 0.05 Torr, and depositing on the substrate an ashable hard mask by a plasma enhanced chemical vapor deposition (PECVD) process.
In certain embodiments, the temperature may be low, for example less than 500 C, or in some embodiments, less than 400 C or 300 C. Other suitable temperature ranges are as described above.
Another aspect of the invention relates to methods of depositing an ashable hard mask involving providing a semiconductor device substrate in a deposition chamber, exposing the substrate to a process gas comprising a hydrocarbon precursor gas and depositing on the substrate an ashable hard mask by a plasma enhanced chemical vapor deposition (PECVD) process at process temperature between about 30 and 330 C. Suitable temperature and pressure ranges that may be used in accordance with this method are as described above.
In certain embodiments, the AHMs deposited by the methods of the invention are suitable for use as etch stops. In addition, the AHMs are suitable for use with 193 nm and below lithography schemes.
Reference will now be made in detail to specific embodiments of the invention. Examples of the specific embodiments are illustrated in the accompanying drawings. While the invention will be described in conjunction with these specific embodiments, it will be understood that it is not intended to limit the invention to such specific embodiments. On the contrary, it is intended to cover alternatives, modifications, and equivalents as may be included within the spirit and scope of the invention as defined by the appended claims. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may be practiced without some or all of these specific details. In other instances, well known process operations have not been described in detail in order not to unnecessarily obscure the present invention.
Hard masks are used as etch stop layers in semiconductor processing. Ashable hard masks (AHM) have a chemical composition that allows them to be removed by a technique referred to as ashing once they have served their purpose. An ashable hard mask is generally composed of carbon & hydrogen with trace amount of one or more dopants (e.g., nitrogen, fluorine, boron, silicon). The bonding structure in these hard masks can vary from sp2 (graphite-like) to sp3 (diamond-like) or a combination of both, depending on the deposition conditions. In a typical application, after etching the hard mask has served its purpose and must be removed from the underlying dielectric oxide (e.g., SiO2). This is generally accomplished, at least in part, by ashing, also referred to as "plasma ashing" or "dry stripping." Substrates with hard masks to be ashed, generally partially fabricated semiconductor wafers, are placed into a chamber under vacuum, and oxygen is introduced and subjected to radio frequency power which creates oxygen radicals (plasma). The radicals react with the hard mask to oxidize it to water, carbon monoxide, and carbon dioxide. In some instances, complete removal of the hard mask may be accomplished by following the ashing with additional wet or dry etching processes, for example when the ashable hard mask leaves behind any residue that cannot be removed by ashing alone.
AHMs used as etch stop layers require have high etch selectivity so that the material being etched is removed faster than the AHM. In many applications, AHMs with etch selectivities of at least 15:1-20:1 (meaning the material being etched is removed 15-20 faster than the AHM during etching) are required. For example, 193 nm generation and below lithography schemes in particular require high selectivity of the hard mask to the underlying layers.
As indicated above, in many applications transparent AHMs are required. One measure of transparency is the extinction coefficient, k, a measure of the rate of extinction or diminution of electromagnetic radiation as it passes through the medium. For many applications, an extinction coefficient of around 0 indicates optical transparency and one around 1.3 indicates a very absorptive, almost opaque material. Extinction coefficients change according to the wavelength of the electromagnetic radiation. In many applications, AHMs having k values of at 0.1 or less at 633 nm are required. As transparency is inversely proportional to extinction coefficient times the film thickness, required extinction coefficient may depend on the film thickness. In a particular example, extinction coefficients at 633 nm of at or less than about 0.1 for a 5 kÅ AHM film are required.
To date, known methods for producing films having high etch selectivity (e.g., 15:1-20:1) rely on high temperature deposition processes. These processes produce highly graphitic and dense films having a carbon content around 80%. The dense and graphitic nature of the films drives down the etch rate of the AHM, increasing selectivity. However, because of the high sp2 content (sp2:sp3 ratio>2:1), these films do not have good transparency. For example, AHMs produced by high temperature deposition process have k-values of around 0.2-0.5 at 633 nm. Thus, they are not suited for use with mask alignment lasers at 633 nm.
Increasing the sp3 content makes the film diamond-like, increasing transparency. Lower temperature processes at typical PECVD operating conditions (e.g., temperature between about 300 and 400 C and relatively high precursor partial pressures around 5 Torr) may be used to produce films having carbon content around 60%. The resulting films have a significantly high sp3 fraction (typically for such films, NMR data show a sp2:sp3 ratio˜1:1) and hence good transparency. However, these films are not dense and therefore have low etch selectivity.
The methods of the present invention produce films having good transparency and high etch selectivity. It has been found that by depositing AHMs at low process temperatures and/or low precursor partial pressure, AHMs having good transparency and high etch selectivity may be formed. For example, NMR data typically show a sp2:sp3 ratio<1:3 for films produced by these methods. Using relatively low temperatures results in transparent films. Lower temperatures prevent the film from graphitizing as well, resulting in films with high sp3 content (e.g., about 75%) and low extinction coefficients. Without being bound by a particular theory, it is believed that the using low partial precursor partial pressure results in increased density, thereby decreasing the etch rate and increasing the etch selectivity. Specifically, it is believed that low precursor partial pressure increases the number of non-depositing ions in the plasma relative to depositing radicals and that the resulting increased ion bombardment of the film facilitates compacting the film during its growth.
Low precursor partial pressure may be achieved by using a carrier gas having a high partial pressure. The carrier gas may be an inert gas such as helium, nitrogen, argon or a combination thereof. In some embodiments, hydrogen gas is used as the carrier gas. Using hydrogen as the carrier gas may further facilitate increasing the density of the film and creating high sp3 content by various reactive mechanisms.
The lower process temperatures used in embodiments of the present invention are compatible with existing semiconductor processing equipment, in particular PECVD reactors, such as Sequel™ or Vector™ reactor chambers available from Novellus Systems, Inc., San Jose, Calif. Thus, an ashable hard mask with the improved performance characteristics of increased selectivity and increased transparency, may be made without any hardware change.
PECVD Deposition Process
The hydrocarbon precursor may be, for example, one defined by the formula CXHY, wherein X=2 to 10 and Y=2-24. Specific examples include methane, acetylene, ethylene, propylene, butane, cyclohexane, benzene and toluene and (CH4, C2H2, C2H4, C3H6, C4H10, C6H6, C6H12 and C7H8, respectively). Acetylene is a preferred precursor in many applications.
As discussed above, a carrier gas may be used to dilute the precursor flow. The carrier gas may be any suitable carrier gas, including helium, argon, nitrogen, hydrogen, or a combination of any of these.
An ashable hard mask is deposited on the substrate by a PECVD process wherein the process (substrate) temperature is below 500 C (206). In some embodiments, the process temperature is below about 400 C, for example, between about 30 and 400 C. In some embodiments, the process temperature is below about 300 C, for example between about 30 and 300 C. In particular embodiments, the process temperature is between about 50 and 250 C, e.g, between 150 and 250 C.
Operation 206 is continued until the desired thickness of film is deposited. According to various embodiments, between about 1000 and 9000 angstroms is deposited.
Chamber pressure may be any suitable pressure. In conventional AHM deposition processes, pressure is typically 5-10 Torr. In particular embodiments of the present invention, the total chamber pressure may be lower than conventionally used. For example, it may range from 1-2 Torr. In embodiments wherein hydrogen is used as the carrier gas, hydrogen flow rate typically ranges from 1000-50000 sccm
According to various embodiments, the methods of the present invention produce AHMs having etch selectivity of between about 15:1-20:1 relative to underlying dielectric and metal barrier layers. Also according to various embodiments, the highly selective AHMs are transparent at 633 nm. In certain embodiments, the AHMs have extinction coefficients less than or equal to about 0.1 at 633 nm. Acceptable k values may depend on AHM film thickness, with thicker films requiring lower extinction coefficients. In a particular embodiment, an AHM of 5000 angstroms having a k of no more than about 0.1 is deposited. In another embodiment, an AHM of 9000 angstroms having a k of no more than about 0.05 is deposited.
The present invention is preferably implemented in a plasma enhanced chemical vapor deposition (PECVD) reactor. Such a reactor may take many different forms. Generally, the apparatus will include one or more chambers or "reactors" (sometimes including multiple stations) that house one or more wafers and are suitable for wafer processing. Each chamber may house one or more wafers for processing. The one or more chambers maintain the wafer in a defined position or positions (with or without motion within that position, e.g. rotation, vibration, or other agitation). In one embodiment, a wafer undergoing hard mask deposition is transferred from one station to another within a reactor chamber during the process. For example, for a 2000 Å hard mask film deposition, 500 Å of film may be deposited at each of four stations in accordance with the present invention. Of course, the full film deposition may occur entirely at a single station or any fraction of the total film thickness may be deposited at any number of stations.
While in process, each wafer is held in place by a pedestal, wafer chuck and/or other wafer holding apparatus. For certain operations in which the wafer is to be heated, the apparatus may include a heater such as a heating plate. In a preferred embodiment of the invention, a Vector™ (e.g., C23 Vector) or Sequel™ (e.g., C2 Sequel) reactor, produced by Novellus Systems of San Jose, Calif., may be used to implement the invention.
Within the reactor, a wafer pedestal 318 supports a substrate 316. The pedestal typically includes a chuck, a fork, or lift pins to hold and transfer the substrate during and between the deposition and/or plasma treatment reactions. The chuck may be an electrostatic chuck, a mechanical chuck or various other types of chuck as are available for use in the industry and/or research.
The process gases are introduced via inlet 312. Multiple source gas lines 310 are connected to manifold 308. The gases may be premixed or not. Appropriate valving and mass flow control mechanisms are employed to ensure that the correct gases are delivered during the deposition and plasma treatment phases of the process. In case the chemical precursor(s) is delivered in the liquid form, liquid flow control mechanisms are employed. The liquid is then vaporized and mixed with other process gases during its transportation in a manifold heated above its vaporization point before reaching the deposition chamber.
Process gases exit chamber 300 via an outlet 322. A vacuum pump 326 (e.g., a one or two stage mechanical dry pump and/or a turbomolecular pump) typically draws process gases out and maintains a suitably low pressure within the reactor by a close loop controlled flow restriction device, such as a throttle valve or a pendulum valve.
The invention may be implemented on a multi-station or single station tool. In specific embodiments, the 300 mm Novellus Vector™ tool having a 4-station deposition scheme or the 200 mm Sequel™ tool having a 6-station deposition scheme are used. It is possible to index the wafers after every deposition and/or post-deposition plasma anneal treatment until all the required depositions and treatments are completed, or multiple depositions and treatments can be conducted at a single station before indexing the wafer. It has been shown that film stress is the same in either case. However, conducting multiple depositions/treatments on one station is substantially faster than indexing following each deposition and/or treatment.
The following examples are provided to further illustrate aspects and advantages of the present invention. These examples are provided to exemplify and more clearly illustrate aspects of the present invention and are in no way intended to be limiting.
Film stacks as shown in
TABLE 1 Selectivity and Extinction Coefficient of Various AHMs C2H2 C2H2 H2 He N2 Partial Feature Temp flow flow flow flow Pressure Pressure Top k @ (° C.) (sccm) (sccm) (sccm) (sccm) (Torr) (Torr) Selectivity 633 nm 1 150 750 13500 0 0 1.5 0.08 17.5 0.06 2 150 1250 13500 0 0 1.5 0.12 13.5 0.04 3 150 2000 7500 0 0 1.5 0.32 12 0.02 4 400 6750 0 13500 1500 8 2.48 11 0.03 5 550 2500 0 12000 1000 6 0.97 15 0.39
Feature top selectivity is one of the several different ways of measuring AHM etch selectivity. Feature top selectivity is calculated as
Other process conditions for AHMs 1-3 include the HFRF and LFRF power and frequency. HFRF power was 200 W and HFRF frequency was 13.56 MHz for the above processes. LFRF power was 2400 W and LFRF frequency was 400 kHz for the above processes. AHMs 4-5 used HF=400 W & LF=1200 W.
AHMs 1-3 were produced according to certain embodiments of the present invention, i.e., at low temperature and low C2H2 partial pressure. All of these AHMs have selectivity of at least 12:1 and k of less than 0.1. AHM #4, produced at 400 C and 8 Torr (2.5 Torr C2H2 partial pressure) also has good transparency, though lower selectivity than the AHMs produced at lower pressure. AHM #5, produced by a high temperature process, had a high selectivity, 15:1, but is not transparent, with an extinction coefficient of almost 0.4.
As can be seen from comparing AHMs 1-3 in Table 1, selectivity improves as the partial pressure is decreased, with the highest selectivity/low temperature AHM formed using a C2H2 partial pressure of 0.08. It is believed this is a result of lower partial pressure causing increased densification of the film. As can be seen from comparing AHMs 1-3 to AHM #5, lower temperature results in better transparency. It is believed that this is because lower temperature prevents the film from graphitizing; the films are thus dominated by sp3 bonds and have good transparency.
AHMs A-G were also produced at various process conditions, with composition, transparency and density as shown in Table 2. AHM A was produced at 400 C, with HFRF power. AHMs B, C and D were produced at 550 C, with process conditions for B the same as for AHM #5 in Table 1. A nitrogen-free process for AHM C was used, with C2H2/H2/He flowrates of 2000/3500/13500 sccm, HFRF/LFRF powers of 200/1200 W, and a pressure of 4 Torr. The process conditions for D the same as for AHM #5 except using high LFRF. AHMs E, F and G were produced as for AHMs #1-3 in Table 1, at low temperature (150 C) with low C2H2 partial pressure, H2 flows of 7500-13500 sccm, and a total pressure of 1.5 Torr. Process conditions for AHMS A-G are summarized below:
A: 400 C, C2H2/H2 flow of 2000/9000 sccm, HFRF/LFRF=2000/400 W, pressure of 6 Torr
B: 550 C, conditions as for #5, Table 1
C: 550 C, C2H2/H2/He flows of 2000/3500/13500 sccm, HFRF/LFRF powers of 200/1200 W and pressure of 4 Torr
D: 550 C, High LFRF of 2400 W (600 W per station). All other conditions same as AHM #5, Table 1
E: conditions as for #1, Table 1
F: conditions as for #2, Table 1
G: conditions as for #3, Table 1
Composition, density, stress and transparency were determined for each of the AHMs and are shown in Table 2.
TABLE 2 Composition, density and transparency of various AHMs A B C D E F G Composition 43:56:00 20:79:0.2 14:86:00 21:77:00 41:59:00 43:53:00 46:54:00 (H:C:N) Density (g/cc) 1.03 1.45 1.54 1.26 1.29 1.16 1.14 Stress 0.4 0.2 0.6 0.4 −5 −3.9 −3.9 (E9 dynes/cm2) Transparency 0.06 0.39 0.46 0.38 0.06 0.04 0.02 (k at 633 nm)
AHMs E-G in Table 2 were produced according to certain embodiments of the present invention, i.e., at low temperature and low precursor partial pressure. Carbon content is between about 50-60% for these films, similar to the carbon content of AHM A, which was produced at 400 C. However, the density is superior to AHM A. Note that the transparency of all high temperature processes is unacceptably high for mask alignment lasers.
Although the foregoing invention has been described in some detail for purposes of clarity of understanding, it will be apparent that certain changes and modifications may be practiced within the scope of the appended claims. It should be noted that there are many alternative ways of implementing both the process and compositions of the present invention. Accordingly, the present embodiments are to be considered as illustrative and not restrictive, and the invention is not to be limited to the details given herein.
All references cited herein are incorporated by reference for all purposes.
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Owner name: NOVELLUS SYSTEMS, INC., CALIFORNIA
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Love by Chloe is a feminine and sophisticated floral composition. The noses of Louise Turner and Nathalie Gracia-Cetto are credited for blending notes of orange blossom, pink pepper, iris, lilac, wisteria, hyacinth, heliotrope, powdery musk, talc and rice.
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Little blue penguins on the mend after oil spill
When an oil spill hits the news, the images of environmental devastation are often soon followed by more optimistic pictures of people cleaning and rehabilitating wildlife. But some critics have called the effectiveness of these recovery efforts into question.
To find out whether the cost justifies the conservation value, researchers need to know how well rehabilitated animals fare after release. In a recent study, a team in New Zealand found that penguins cleaned up after a 2011 oil spill now appear to be diving normally — a hopeful sign for their long-term recovery.
The spill released more than 300 tonnes of oil at Astrolabe Reef off the coast of New Zealand. In response, people rehabilitated 383 little blue penguins — diminutive birds that measure less than 1.5 feet tall — and released 347 with implanted microchips back into the wild. Follow-up research showed that the treated penguins had survival rates similar to those of other penguins in the area that had not been oiled or rehabilitated.
In the new study, the researchers wanted to investigate the birds' foraging behavior. The team caught 10 rehabilitated penguins, as well as 10 that had not been oiled or rehabilitated, and fitted them with tracking devices. The devices could detect how frequently the animals dived, how deep, and whether the shapes of the dives resembled a V, U, or W.
The team managed to gather data on 24,508 dives from 14 of the penguins. A typical foraging trip was about 13 hours long, and the birds dived an average of 131 times per hour. The rehabilitated and non-rehabilitated penguins showed similar diving patterns.
The researchers also collected six feathers from each penguin and analyzed the carbon and nitrogen content. The rehabilitated and non-rehabilitated birds' feathers had similar chemical signatures, suggesting that the two groups of penguins were eating the same types of prey. So the clean-up effort "appears effective," the authors write, "and helps justify the rehabilitation of oiled wildlife across the world." — Roberta Kwok | 15 October 2015
Source: Chilvers, B.L. et al. 2015. Diving behaviour of wildlife impacted by an oil spill: A clean-up and rehabilitation success? Marine Pollution Bulletin doi: 10.1016/j.marpolbul.2015.09.019.
Image © Stanislav Fosenbauer | Shutterstock
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2 Comments
Larry Wilhelmsen October 21, 2015 at 8:57 am
Maybe I missed something. The conclusion I got was that the special treatment of the birds made little difference so why should we make the special effort and have cleaning waste to treat? Job security I guess.
Jenni October 21, 2015 at 12:30 pm
The study conclusion was that after the birds were cleaned and released, they were able to go back to their normal behaviors just as well as birds who didn't get oiled at all. Therefore the costs are justified because the cleaned animals can survive. However, 14 penguins isn't a very big sample size and you'd probably want to follow the animals longer to see if any difference shows up long-term, but if it isn't going on already that research will likely come about because of this study.


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AILA makes recommendations to restore due process for Central American children, families, and adults seeking asylum and legal protection at our border. Read Report Today
AILA Doc. No. 06010665 | Dated January 5, 2006 | File Size: 445 KDownload the Document
Text of the enrolled (final) version of the Violence Against Women and Department of Justice Reauthorization Act of 2005 (H.R. 3402), signed by the President on 1/5/06.
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Sweet Tea Cocktail
- 2 pieces skinned cucumber, chopped
- 4 fresh mint leaves
- 3 raspberries
- Ice
- 3 ounces lemonade
- 2 ounces sweet tea vodka
- Lemon wheel, for garnish
DirectionsWatch how to make this recipe.
Muddle the cucumber, mint, raspberries and ice in a shaker. Add the lemonade and sweet tea vodka. Shake well. Pour into a high ball glass or mason jar and garnish with a lemon wheel.
Recipe courtesy of Guy Fieri
Cooking Tips
More Recipes and Ideas
Sweet Tea Mojito
Recipe courtesy of Food Network Kitchen
Sweet Tea Collins
Recipe courtesy of Food Network Kitchen


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State and local government compensation costs up 3.3 percent in past 12 months
May 03, 2004
The rate of increase in compensation costs slowed to 3.3 percent for State and local governments for the year ended March 2004, compared with an over-the-year gain of 4.2 percent in March 2003.
The components of compensation—wages and salaries, and benefit costs—continued to show significant differences. For State and local government workers, wages and salaries rose 2.1 percent in the year ended March 2004, compared with an increase of 6.2 percent for benefits.
These data are from the BLS Compensation Cost Trends program. Over-the-year percent changes are calculated using not-seasonally-adjusted data. For more information, see "Employment Cost Index – March 2004" (PDF) (TXT), news release USDL 04-751.
Bureau of Labor Statistics, U.S. Department of Labor, The Economics Daily, State and local government compensation costs up 3.3 percent in past 12 months on the Internet at https://www.bls.gov/opub/ted/2004/may/wk1/art01.htm (visited January 22, 2017).
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