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"In a friendly, engaging voice, the text provides the reader with a safe place to ask and wonder about those tough middle school questions."—Once Upon a Book
"Be Confident in Who You Are gives parents the gift of opening a dialog with their middle school children on the issues they face. While Annie Fox writes to children in their language, parents are reminded of how stressful these times can be. Skip the next movie and read this book with your kids instead."
—Tina Nocera, founder, Parental Wisdom
"Chock-full of helpful hints...lists resources to help readers increase their self-esteem. The graphic-novel-like design will make this self-help tool stand out and appeal to fans of that format." —School Library Journal
"A practical and fun resource for tweens making the adjustment from elementary to middle school." —Jennifer O'Donnell, About.com.
"Smart and funny and real, these tips and tools will help you deal with real life issues. I wish I had this book when I was in middle school."
—Ericka Lutz, author of The Complete Idiot's Guide to Friendship for Teens
"Fox has done a marvelous job of 'reading' tween girls' minds." —ParentingPink.com
Learning and Laughter Favorite Educational Product Award Winner
Kidlutions™ Preferred Product Award (PPA)


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Alloy Shimano V-brake lever that features Shimano's Super Linear Response system for superior braking and an adjustable blade stop to fit any size hand. (3.0 oz)
Note: Includes a Shimano brake cable with 55" long cable housing.
Why hook up a worn out brake cable to your new lever? Check out the selection Dans Comp offers in Brake Accessories

subset: commoncrawl


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O'Brien TR, Pfeiffer RM, Paquin A, […] Prokunina-Olsson L. Comparison of Functional Variants in IFNL4 and IFNL3 for Association with Hepatitis C Virus Clearance. J Hepatol 2015 Jul 14. [Epub ahead of print]
Onabajo OO, Porter-Gill P, Paquin A, […] Prokunina-Olsson L. Expression of Interferon Lambda 4 Is Associated with Reduced Proliferation and Increased Cell Death in Human Hepatic Cells. J Interferon Cytokine Res 2015 Jul 2. [Epub ahead of print]
Aoude LG, Pritchard AL, Robles-Espinoza CD, […] Brown KM, Adams DJ, Hayward NK. Nonsense mutations in the shelterin complex genes ACD and TERF2IP in familial melanoma. J Natl Cancer Inst 2014 Dec 13.
Fu YP, Kohaar I, Moore LE, […] Prokunina-Olsson L. The 19q12 bladder cancer GWAS signal: association with cyclin E function and aggressive disease. Cancer Res 2014 Oct 15.
Hoskins JW, Jia J, Flandez M, […] Amundadottir LT. Transcriptome analysis of pancreatic cancer reveals a tumor suppressor function for HNF1A. Carcinogenesis 2014 Dec; Epub 2014 Sep 18.
Wolpin BM, Rizzato C, Kraft P, […] Amundadottir LT. Genome-wide association study identifies multiple susceptibility loci for pancreatic cancer. Nat Genet 2014 Sep; Epub 2014 Aug 3.
Aoude LG, Xu M, Zhao ZZ, […] Brown KM, Hayward NK. Assessment of PALB2 as a candidate melanoma susceptibility gene. PLoS One 2014 Jun 20.
Jia J, Bosley AD, Thompson A, […] Amundadottir LT. CLPTM1L promotes growth and enhances aneuploidy in pancreatic cancer cells. Cancer Res 2014 May 15; Epub 2014 Mar 19.
Yokoyama S, Woods SL, Boyle GM, […] Brown KM. A novel recurrent mutation in MITF predisposes to familial and sporadic melanoma. Nature 2011 Nov 13.
The Laboratory of Translational Genomics (LTG) conducts studies on germline and somatic genetics of cancer, and analyses on particular regions of the genome conclusively identified in cancer-specific genome-wide association studies (GWAS) and linkage studies in high-risk families.
LTG's mission is to understand the contribution of germline and somatic genetic variation to cancer etiology and outcomes. Its primary goals are to investigate regions of genetic variation by:
Learn more about specific LTG research areas.
LTG accepts fellowship applications on an ongoing basis. Meet the current LTG fellows and learn about research training opportunities in LTG.
Essential to the mission of the Laboratory is a close collaboration with the NCI-Frederick Cancer Genomics Research Laboratory (CGR). Formerly known as the Core Genotyping Facility (CGF), this laboratory designs and conducts high throughput sequencing, genotyping, and analysis in support of large scale epidemiologic studies.
Explore an assortment of talks, videos, and news items by LTG staff.


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Ingus, your new favorite redneck.
Welcome to the city of Thamesis, capital to a kingdom divided....
Dr. Shroud
Follow Dr. Shroud in these serials as he tries to find his missing daughter in the vampire-ridden city of Necropolis!
You are a real flash artist
I just love your flash of zelda, even thouh I really haven play de the game (im play station fan, please dont kill me) but your misadventures and the music videos ar just too perfect, really im fan of your videos, please dont stop making them
this is awesome, I;ve seen all your LOZ music videos, but you should make one for I beleive I can fly, or fighting dreamers *the Naruto season four theme song* or night of fire, its initial D all of them awesome
I love your movies!
This is awesome! I especially love the part with the whole band playing, even the drums were insync with the music! I put 3 on humor because Link pwned the guy and it made me chuckle lol!
You are a Sprite God
I watched your other Zelda/song remakes: Princes of the Universe and We are the Champions. Those were, by themselves, funny and great to watch/listen to. But this was friggin amazing. Words escape me on how to describe the fluid animation, video bites from OoT and WW, and the lip-syncing. I sincerely hope that you don't decide to stop making these anytime soon. You fucking rock.
Geat song, great graphics, great job!
Wow. I NEVER expected this song as a choice for one of your music videos! Awesome. One thing though...where is Purple Link? Is he not an Evanescence fan? :)


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Inside the Navy's P-8A Poseidon
Posted in: Aviation, Inside the Navy– March 16, 2014
Keep searching Guys, you'll find it!
Love the new P8 and the older-but-uber-reliable P3s. Kudos to my family members who work on these ever-so-important aircraft! God speed.
You must be logged in to post a comment.


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Mozart and Salieri Face-Off in Tony-Winning Amadeus
* Additional fees apply. No coupon or promo codes necessary to enjoy the displayed discount price.
The last date listed for Amadeus was Saturday July 13, 2013 / 8:00pm.
Currently at Oak Park Festival Theatre in Austin Gardens
The Mousetrap Recreates '40s Murder-Mystery Radio Broadcast
- Full Price:
- $30
- Our Price:
- $15
Oak Park Festival Theatre whisks you back to the halcyon days of radio plays with The Mousetrap, a… More
Venue Details
Reviews & Ratings
Featured review from Smiljana KisacaninRed Velvet
view more less of this review
Loved it! I was a little bit skeptical at first since the movie is one of my favorites, but 5 minutes into performance I was sucked into it and did not blink till the end. I hope that low attendance is due to a big thunderstorm that preceded the performance because this performance deserves to be seen.
star this review starred report as inappropriate
Intimate venue in a nice, mostly quiet park. I appreciated being able to rent a lawn chair for $2.00 and even more so did I appreciate the basket of bug spray.Good production. Salieri actor was superb, especially in the first act. Truly ,edge of...continued
star this review starred report as inappropriate
What a fun show! The actor who played Mozart was hilarious!
star this review starred report as inappropriate
wonderful performances - definitely recommended
a don't miss. Kudos to the cast!!!


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John Bright (judge)
From Wikipedia, the free encyclopedia
John Bright (May 23, 1884 – March 24, 1948) was a United States federal judge.
Born in Middletown, New York, Bright read law to enter the bar in 1906. He was in private practice in Middletown, New York from 1906 to 1941, serving as corporate counsel to the City of Middletown from 1910 to 1917, and as a director of the Orange County Trust Company in 1914.
On April 25, 1941, Bright was nominated by President Franklin D. Roosevelt to a new seat on the United States District Court for the Southern District of New York created by 54 Stat. 219. Bright was confirmed by the United States Senate on June 3, 1941, and received his commission on June 6, 1941. Bright's service ended on March 24, 1948, when he died unexpectedly of a heart attack.
- John Bright at the Biographical Directory of Federal Judges, a public domain publication of the Federal Judicial Center.
|Legal offices
|Preceded by
new seat
|Judge of the United States District Court for the Southern District of New York
|Succeeded by
Samuel H. Kaufman


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Beautiful Weather Year Round!
Venice is the ideal place to explore the great outdoors. If it's birding or fishing, surfing or kayaking, biking or walking, diving or shelling… you can do it here. And, whether you think of them as indoor or outdoor activities, shopping and dining are always options in historic Downtown Venice!
The Parks of Venice
- The Venice Arboretum at West Blalock Park
- Basketball, Shuffleboard, and Tennis Courts at Hecksher Park
- Intergenerational Splash Fountain at Centennial Park
- Public Golf & Driving Range
- Walking Tour: Heritage Park
- Walking Tour: Venezia Park (tour maps available at the Venice Museum & Archives)
- For more information on area attractions, visit
the Venice Area Chamber of Commerce and the Visit Sarasota County.
- Historic Downtown Venice is unique in its charm and much of that has to do with its beautiful beaches. From Venice Beach, home of the Venice Beach Pavilion, to the area's only dog beach, Venice has something for every beach fan.
The Beaches of Venice
A Bridge between Two Worlds
The Legacy Trail Overpass will connects the Legacy Trail the Venice Waterway Park to Downtown Venice in a safe and stylish way. If you enjoy camping vacations, the Overpass will allow campers in Oscar Scherer State Park bicycle and pedestrian access to Venice and its beaches without having to navigate US 41.
Concerts In The Park
Centennial Park Gazebo 7 - 9pm
December 20, 2015 - Mindy Simmons Christmas Show
January 8 - Patchouli
January 22 - Taylor & Larry (Folk & Pop)
February 12 - Lady Katt & The Howlin' Doggs (Blues)
February 26 - Patchouli
March 11 - Al Fuller (Folk)
March 25 - Sarah T Band
April 8 - Patchouli
April 22 - Nat Langston Group (Folk & Blues)
May 13 - Kat Crosby Band (Blues)
May 27 - Steve Arvey
June 10 - Jason Haram (Blues)
June 24 - Velvet Hammer Band (Blues)
July 8 - Empty Pockets Band (Country)
July 22 - Bluestar Band (Blues)
August 12 - Al Fuller (Folk)
August 26 - Florida Xisles (Steel Drum, Reggae)
September 9 - Melanie Massell (Pop)
September 23 - Nat Langston Group (Folk & Blues)
October 14 - Kat Crosby Band (Blues)
October 28 - Empty Pockets Band (Country)
November 11 - Bluestar Band (Blues)
November 18 - Steve Arvey
November 25 - Taylor & Larry (Folk & Pop)
December 9 - John Howard
December 23 - Mindy Simmons Christmas Concert


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MMA Forum - UFC Forums - UFC Results - MMA Videos (http://www.mmaforum.com/forumindex.php)
- Strength & Power Training (http://www.mmaforum.com/strength-power-training/)
- - Kettellbell workout (http://www.mmaforum.com/strength-power-training/10280-kettellbell-workout.html)
Kettellbell workout
I'm using these things called kettlebells. I was wondering if anyone else used them and what they think. I just started and i know they have increased my strength and i have lost weight. I know some big names use them too. Roy Harris who my bjj instructor is a grappling instructor under uses them and he swears bye them. So yeah if anyone out there knows what i'm talking about the advice would be great.
yeh i use these wat sizes u got? i have 2 16 kgs 1 24kgs and a 32 kgs.there good but dont use them as your only way of training strenght mix in some barbell and dumbells stuff aswell and youll make some good gains
we have a set in the place i train at goes from 16 kgs to 54 kgs i think
lucky bugger wat u training with atm
we also have some 8kgs and becasue i have shoulder problems so anyhting over my head i use a lighter weight but like i do swings and deadlifts with the 24kgs i use the 54kgs for squats and lunges so it varys
Im also very interested in this. Can anyone post an actual workout?
depends wat u after conditioning or strength type stuff ?
24 kgs is a bit light for deadlifts aint it
they're great for swings, like the sledgehammer routine fedor does. great for rotator work
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Summer Youth Employment is back 2016. Small business owners, if you'd like a few employees for 6 weeks, definitely look into it. It's a win-win. You gain employees, young teens gain experience and earn $$.Download flyer here
Summer Youth Employment Job applications are now open --- Students ages 14 and up may apply! Contact Calogero Argento at Summer Youth Employment, email him firstname.lastname@example.com call him at 718-286-8121 or 718-268-5011 ext 299
To get more info, see the links below:http://www.cec24.org/sites/g/files/g951536/f/201603/WorkingPapersFlyer.pdf
Just like we have shared videos about Common Core's advantages per NYC DOE, we are also obligated to share information that is against Common Core. At our last meeting, we shared the following information so that parents have the facts from both sides:


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April 14, 2011: New record retention requirement, Required Practice (1.8), in effect.
Required Practice 1.8: The (Provider) organization has a system in place to retain all information related to CE course planning and registration for a period of 7 years.
July 1, 2011: New ASHA CEU eligibility requirement begins.
Individuals must meet at least one of the following conditions in order to be eligible to earn ASHA CEUs:
Please communicate eligibility criteria to your course attendees. We encourage you to post ASHA CEU eligibility criteria on your website, in promotional materials, and at your live events.
September 14, 2011: New ASHA CEU Participant Form includes place to document eligibility.
If an attendee is not an ASHA member or CCC holder but meets any one of the other criteria, they may provide their eligibility on the ASHA CEU Participant form at the course or inform the ASHA CE Registry of their eligibility by completing the web form.
If an attendee does not meet the eligibility criteria, they should not fill out the ASHA CEU Participant form.
July 1, 2012: New CEB Requirement 3: Transparency in Course Planning, Delivery and Marketing
Effective July 1, 2012, all ASHA Approved CE Providers must be in compliance with Requirement 3: Transparency in Course Planning, Delivery and Marketing.
Background information and resources to assist you in implementing the requirement are available online.
School-Based SLP Salaries Vary by School Type: Speech-language pathologists who work in schools earn most in secondary and special day or residential schools.
What to Know If Your School Bills Medicaid: Does your school system seek Medicaid coverage for services? Here are some pointers.
ASHA Weighs in on ESSA—And You Can, Too
The American Speech-Language-Hearing Association (ASHA) is the national professional, scientific, and credentialing association for 186,000 members and affiliates who are audiologists; speech-language pathologists; speech, language, and hearing scientists; audiology and speech-language pathology support personnel; and students.
The ASHA Action Center welcomes questions and requests for information from members and non-members.
Available 8:30 a.m.–5:00 p.m. ET Monday–Friday
Site Help | A–Z Topic Index | Privacy Statement | Terms of Use
© 1997-2016 American Speech-Language-Hearing Association


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Added by Giyonshe Subscribe 0
Published 9 Jun 2012
Hello gamers and welcome back again on the this Video Tutorial, I'm here with new DLC thing on Battlefield ...
Hello gamers and welcome back again on the this Video Tutorial, I'm here with new DLC thing on Battlefield 3 Game. Which means you've listen to a tutorial about to download Battlefield 3 Close Quarters Expansion Pack DLC without cost on Xbox 360 and PS3 Game. This can be a really scarce and leaked instrument to download Battlefield 3 Close Quarters DLC for free on your own Xbox 360 and PS3 Game. To get more information satisfy pay a visit to following website; http://www.closequartersdlcfree.info/ Just follow the video recording tutorial, After following correct steps you may able to download Battlefield 3 Close Quarters Expansion Pack DLC cost-free on Xbox 360 game. But do you may have any far more queries really feel no cost to deliver me a pm or remark on site. Thanks for watching everybody, And I'll see you up coming time with yet another tutorial. Battlefield 3: Close Quarters is usually a themed expansion pack bringing the staff perform of Battlefield 3 to restricted indoor environments. The frantic close quarters infantry combat is amplified by unprecedented large definition destruction, new approaches to participate in, added persistence, and new weapons. The HD Destruction in Battlefield 3: Close Quarters lets gamers riddle the surroundings with bullets, lowering complete locales to ruin. Everything from furnishings to plaster might be shot to pieces, and gamers can see the result of the mayhem as rubble and damaged items pile up about the floor. The restricted stage design and style and quite a few possibilities for vertical gameplay create a really aggressive setting.


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Reviewed By john b (BROOKLYN, NY) —9/27/2016 8:44 PM
Good stuff, fast delivery, fair price. Satisfied.
Reviewed By richard t (detroit, MI) Reviewed for a 2004 Acura MDX —9/26/2016 4:10 PM
Mechanic stated the fit very nice for after market brakes. Too about 3-4 days to break in and remove the noise. Big visual improvement fTom original brakes. Very good stopping power. Just getting ready to order the front set now.


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Gust Tabbed B1G First Star of the Week
Junior forward had five points in series vs. Canisius
Get to Know the Buckeyes: 16 Questions for 2015-16 with No. 17 David Gust
Junior forward calls Orland Park, Ill., home
Buckeyes Head to B1G Tournament in Saint Paul
Ohio State opens play vs. Michigan State Thursday
Series with No. 1 Minnesota, Senior Night this Weekend in VCA
Buckeyes and Gophers close Ohio State home slate
Buckeyes Suffer 4-3 Loss to No. 13 Michigan
Jardine scores first goal, Niddery post two assists, Tomkins makes 34 saves
Ohio State 6, Michigan 5 OT
Ohio State 6, Michigan 5 OT
Buckeyes Fall to Michigan State, 4-2
Buckeyes Fall to Michigan State, 4-2 (photo credit Ric Kruszynski)
Ohio State 4, Canisius 1
Ohio State 4, Canisius 1
Buckeyes vs. Mercyhurst
Buckeyes vs. Mercyhurst
Ohio State 2, No. 1 Minnesota 2, OSU wins shootout
Ohio State 2, No. 1 Minnesota 2, OSU wins shootout
Sister Kara was a defenseman on the Ohio State women's hockey team, finishing her career in 2014-15 ... began playing hockey at the age of 4 because a neighborhood friend got him into the game ... attracted to Ohio State because of the sports facilities and campus ... loves to play golf away from hockey ... hidden talent is ping pong ... favorite player growing up was Mike Modano because he was a leader and played big in important games ... Pick One: Movie - Olympus has Fallen; Television Show - Breaking Bad; Musician - Luke Bryan; Professional Team - Chicago Blackhawks; Athlete - Patrick Kane; Homecooked meal - Chicken and dumplings; Celebrity - Bradley Cooper; Snack food - Goldfish; Ice cream flavor - Oreo; Sport other than hockey - golf; Vacation spot - Paw Paw Lake in Michigan; Rink - Arctic Ice in Orland Park; Place hockey has taken you - Canada.
Ohio State Career: Ohio State Scholar-Athlete in both 2014 and 2015 and an Academic All-Big Ten selection in 2015.
2014-15 (Sophomore Season): Played in 25 games ... three goals, five assists and eight points ... two-point game, with a goal and an assist, against Penn State in the Big Ten Tournament quarterfinals March 19; +2 in the game ... scored third period game-tying goal at Canisius Oct. 31 ... goal Jan. 23 at Michigan State ... assist and +1 Feb. 20 vs. Michigan ... helper at Wisconsin March 13, +1 in each game vs. the Badgers March 13-14 ... assists Feb. 20 vs. Michigan, Jan. 2 at Mercyhurst and Nov. 21 vs. Michigan State ... named an Ohio State Scholar-Athlete and an Academic All-Big Ten honoree.
2013-14 (Freshman Season): Played in 26-of-37 games ... six goals and four assists for 10 points ... goal and a +1 mark March 2 vs. Wisconsin ... scored a shorthanded goal at Wisconsin Jan. 25 ... assist and +1 rating Jan. 18 at Minnesota ... three points in series vs. Mercyhurst Dec. 28-29; goal in game one and goal and assist for two points in game two; +1 in each contest ... scored against Michigan Dec. 2 ... helper and +1 rating vs. Canisius Nov. 16 ... two points, with a goal and an assist, vs. Bowling Green Oct. 29 for first collegiate points; +2 in the game ... an Ohio State Scholar-Athlete.
Prior to Ohio State: Played for the Fargo Force in the USHL for two seasons ... fourth on the team in scoring, skating in 64 games with 21 goals and 28 assists for 49 points , in 2012-13 ... played in 43 regular season games during the 2011-12 season with Fargo, tallying 14 goals and 16 assists for 30 points ... 15 points in 13 games during the 2013 USHL Playoffs, ranking second in playoff scoring in the USHL ... team advanced to the Clark Cup final in 2013 ... spent two seasons with the Chicago Fury AAA U18 team ... graduated from Marist High School in 2012.
Off the Ice: Son of Dave and Kelly ... three older sisters: Dana, Jena and Kara ... Jena attends Chicago Kent Law School ... majoring in consumer and family financial services.
Team Information
More Headlines
Meet the Buckeyes: Freshmen Edition
Introducing the Buckeye Captains
Watch: Value City Arena Ice Build
Season Tickets On Sale for Winter Sports


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Explore our many online resources.
Keyword Search:
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CATEGORY: All Categories
Field reports, research news, fossil photos, archival images, and more!
Brought you by the Smithsonian American Art Museum, this blog focuses on how American art reflects our history and culture.
Creating a Field Book Registry in one online location.
An online forum for sharing your travel experiences and discovering far-flung travel destinations.
This blog celebrates the Natural History Museum's past, present, and vision for the future.
Takes readers behind the scenes, sharing insights and information about exhibitions, events, collections, research projects, and more.
National Postal Museum's blog featuring exciting stories about postal history and stamp collecting.
Studio Arts blog from the Smithsonian Associates.
From the Smithsonian Environmental Research Center, postings on everything from climate change to invasive species.
Learn how exhibitions are developed, designed, and created.
Blog from the Smithsonian Associates. The Smithsonian Associates annually offers more than 750 seminars, performances, lectures, studio art classes, and study tours.
Highlights of the hidden treasures among the more then 2 million Smithsonian collections online.
Reports from the annual Smithsonian Folklife Festival on the National Mall in Washington, D.C.
Research, travels, and stories from the Center for Folklife and Cultural Heritage.
Our horticulturists, garden enthusiasts, and back stories you won't hear anywhere else.
Smithsonian Insider shares with you the astounding and diverse work being conducted by the Smithsonian around the world.
Postings from the world's largest traveling exhibition service.
Fostering greater understanding, appreciation, and protection of the grand phenomenon of bird migration.
Highlights ideas, best practices, research, and successes in science education.
News about our Affiliates, exhibitions, and programs.
Page Last Modified: 2/25/2016


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@pkanavos:Thank you. The new files are encoding and this should be fixed in a little while.
Clemens Vasters is the Technical Lead in Microsoft's PM team for the Windows Azure Service Bus. In that function, Clemens is responsible for the technical strategy of the product and to help Windows Azure customers to leverage Service Bus and other middleware components from the Windows Azure and Windows Server stack to build sophisticated, distributed business and consumer solutions. Clemens has over 20 years of industry experience with a deep background in Solution Architecture. He's an accomplished conference speaker, author, teacher, and will soon also be an Internet-video-show host. Follow @ClemensV on Twitter.
@compupc1: Premium Messaging is brokered messaging only, and does not include the Relay. The current version of the Relay would not benefit as much from the resource isolation that we provide here, so the Relay remains available in Standard as you know it. We're in early planning for a significant upgrade of the Relay, and that new version might indeed have a Premium tier. I can't talk about particular capabilities as of yet.
@Mike Schellenberger:Thank you for your patience, Mike. This happens to a few customers and our portal folks are working on figuring it out.
@MattYetAnotherUserName: I'm very sorry about that. We've identified a portal glitch and are working on it. Try going via New > Hybrid Integration > Service Bus
Use the link in the write-up above (points to https://portal.azure.com/?Microsoft_Azure_ServiceBus=true&l=en&r=1#create/Microsoft.ServiceBus ).
We'll take a look at why you can't see it.
@JordiGOnzalez: @arcturien: Added the PPT linked from the text
I'll get there in one of the next few episodes, Dave. The security intro will likely be a whiteboard session since there'll be a lot of basic to cover.
BizTalk really is a premium-feature toolbox. If you need EDI or SWIFT or HL7 support or the adapters then you'll have to license that toolbox according to what you need. The "free" parts of .NET are licensed through Windows Server or through Windows Azure, these premium features are licensed with that toolbox. The BizTalk Branch edition already covers a lot of ground http://www.microsoft.com/biztalk/en/us/pricing-licensing.aspx
You need BizTalk's capabilities for certain paths, not all paths. Yes, if you want to handle EDI interchanges inbound or outbound you will still need a right-sized BizTalk installation for that particular path and scaled to the particular load (which usually isn't consumer-scale) that makes up part of a service's gateway, but it's not "the" gateway.
Multiples service can obviously share that same installation of that kind of traffic if there are clear rules about who owns what and the paths are distinct in order to minimize cross-service dependencies.
That said, I'm working on some pieces that aim to help with gluing things together for gateways. All the technology you'll need exists in the stack, but there's a gap on pulling it all together. You'll hear about this in the next few weeks and it's going to be an open initiative.


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|Format: Hardcover
Vendor: Globe Pequot
Publication Date: 2009
Dimensions: 11.00 X 8.50 (inches)
Availability: In Stock
A heavily-illustrated history of the shoreline, from New York State to Rhode Island.
Diana Ross McCain has written about Connecticut's past for more than twenty-five years and holds an M.A. in history. A frequent contributor to Early American Life and Connecticut magazines and the Hartford Courant, McCain wrote the award-winning publication To All on Equal Terms, the story of Connecticut's official state heroine, Prudence Crandall. Her most recent book is It Happened in Connecticut (Globe Pequot). She lives in Durham, Connecticut.


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Most Memorable Holiday Gifts: Here are the winners!
We wish you Happy Holidays, Merry Christmas and a Happy New Year from all of us at MyHeritage!
Our Holiday competition has now officially ended, and we're ready to announce the winners. We want to take a moment to thank you all for your participation. We can't believe how many responses we received, with so many moving stories of your Christmas memories from over the years.
Without further delay, here are the winners: Continue reading "Most Memorable Holiday Gifts: Here are the winners!" »
Holiday Competition: Win a tablet!
What was the most significant holiday gift you have ever received? Are there special family memories associated with it?
This is a guest post by Karen, MyHeritage's country manager for Germany.
Everyone knows that feeling of really wanting something with all your heart. For some, it may have been a first bike, a soccer ball, or maybe a special book. The gift that I dreamed of and wished for was a puppy. I remember the many months trying to convince my parents that I would be responsible and take care of a dog with love and affection. My parents kept trying to dissuade me of the idea. They told me the dog would mess up the house, eat our shoes, scratch the door, shed hair everywhere and that we would never again be able to take a vacation. Continue reading "Holiday Competition: Win a tablet!" »
Did You Know: 13 interesting Christmas facts
Last year, we wrote about many Christmas traditions still common today, and the history behind them.
This year, as the holidays approach, we had our researchers look into interesting Christmas facts we never knew, and we're sure you didn't, either!
Check them out:
- If you received all the gifts from the song "The Twelve Days of Christmas," you would have 364 presents, and according to a group that prices the gifts each year, the total price tag would be $116,273. Continue reading "Did You Know: 13 interesting Christmas facts" »
Family historians: Perfect holiday gifts
The holidays are fast approaching, and they will be here before we know it.
Do you know what you are getting your friends and family for the holidays this year? What about for the genealogists in your family?
It can be relatively easy to find a present for your family's family historians since they appreciate practical gifts.
- Genealogists spend a lot of time researching and collecting information. In their line of "work," it is important to stay neat and organized. They may like a new pencil case with office supplies such as pencils, paper clips, a stapler, Post-it stickers and labels. Continue reading "Family historians: Perfect holiday gifts" »
Santa Claus: How does he do it?
Ever wonder how Santa Claus (or Kris Kringle or St. Nicholas) manages to deliver all those gifts to children around the world in just one night?
Well, a new science and technology research study from North Carolina State University provides some hints.
Mechanical and aerospace engineering professor Dr. Larry Silverberg explains the principles that allow that red-suited white-bearded fellow to manage this amazing feat every year.
Where did Silverberg learn these secrets?
He was team leader on the first-of-its kind visiting scholars program at Santa's Workshop/North Pole Labs (NPL) last year:
Children shouldn't put too much credence in the opinions of those who say it's not possible to deliver presents all over the world in one night," Silverberg says.
Continue reading "Santa Claus: How does he do it?" »
Best gift for the holidays: Family history
Thinking about a good gift for that special family member? Don't wait too long as the holidays are just around the corner.
December is a month of wonderful worldwide holidays. Christians celebrate Christmas (December 25), Jews celebrate Chanukah (December 21), and there is also the African-American festival of Kwanzaa (December 26).
Although there are many gift options out there, family history can be an unforgettable present.
At MyHeritage, you can create – for free - your own family tree design and then order a professional print delivered directly to your home or to a relative anywhere on the globe. Surprise them! To learn more about this service, click here Continue reading "Best gift for the holidays: Family history" »


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Contact Us Today!
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Does his fan know? The best 'James Blunt quits music' jokes
- From: news.com.au
- October 23, 2012
HIS last name is rhyming slang for something we can't print and his music is frequently derided, so it didn't take long for the web to make fun of James Blunt's reported decision to quit music.
The You're Beautiful singer told the Daily Mail that he wanted to settle down and enjoy life with his girlfriend, Sofia, which sparked a flurry of headlines around the world.
"I just want to take some time out for myself. I haven't got any plans to do more songwriting. I have been chilling out since I finished my world tour and I've spent a lot of time in Ibiza, where I have a villa," he said.
Blunt, who quit the British Army to become a singer, found fame in 2005 with his album Back to Bedlam, which featured the hits Goodbye My Lover and You're Beautiful.
Back to Bedlam sold 11 million copies and earned Blunt five Grammy nominations and two Brit Awards but not much respect.
Although Blunt didn't actually say he was quitting, the Mail report had the jokers out in force. Here's the best of the gags:
- James Blunt has announced that he is quitting the music industry. The US Army will have to come up with a new way of torturing POWs now.
- James Blunt's announced he's no longer making music. I could have told him that 10 years ago
- James Blunt quitting music? This is like Robert Mugabe quitting humanitarian relief work; would scarcely have associated him with it anyway.
- James Blunt announced he is quitting music. Absolutely devastating news for both of his fans.
- Finally, the nightmare is over. We survived eight years of tyranny together. James Blunt is retiring from music.
- Apparently James Blunt has quit music. In other news my accountant no longer performs stand up comedy
- James Blunt is calling it quits on the music making bizz. In more shocking news, James Blunt was still IN the music making bizz
- James Blunt Quits Music Industry [News]: General Music News: "4th most annoying" singer calls it a day.
- Maybe 2012 isn't the year of the apocalypse after all RT @NME James Blunt quits music industry
- Jake Bugg goes straight in at number 1 and James Blunt quits music forever, all in the last 24 hours. Maybe we're not doomed after all.
- Does good news come in 3's? 1. James Blunt quits music 2. Heli crash; all on board survive 3. The rest of my desk arrives tomorrow.
- James Blunt quits the music industry. Gives me the courage to quit my job oh wait I am not rich and have to continue to do something I hate.
And from guardian.co.uk comes this funny video tribute: "In honour of James Blunt quitting music ... here's a 2007 video featuring an animated version of him and various other pop stars, wondering what to do about buying milk."
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Comments on this story
Colin of Mirrabooka WA Posted at 10:37 AM October 23, 2012
Is there anyone that doesnt know who he is? Jealousy is a curse!
Jan of Perth Posted at 10:32 AM October 23, 2012
I must be one of his two fans!!! His style is similar to Rod Stewart only better. He should have done more drugs, boozing and womanising and done lots of interviews with so called DJ's then would would have been more popular.


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Nintendo Patent Covers Massively Single-Player Online Games
Get the benefits of an MMO without actually having to interact with any jerks.
Nintendo is hardly known for its exploration of the online space. We don't know exactly how things will work on Wii U, but the Wii's online experience is largely inferior to what's been offered by Xbox Live for almost a decade. So any time there's word on Nintendo doing something new with online games, it raises an eyebrow.
A new, online game-related patent Nintendo applied for on February 2, 2010 was finally published last week, giving us some idea of the sort of ideas it's come up with. The patent is titled "Massively Single-Playing Online Game" and is described as, "A method and apparatus that allows a player to play a massively single-player online game without directly interacting with other players, while affecting and being affected by other players playing the online game."
When playing most MMOs, you inevitably encounter other players. You don't necessarily have to play with them, but the game encourages you to and actually running into them is usually unavoidable. The patent is for a "method for playing a massively multiplayer online game without requiring interaction with other player characters." Essentially, it opens the door for actions in your single-player game affecting another player's world without the two ever directly playing together.
It's a very Nintendo-centric idea, as it's always made safety a high priority. One example of what this could allow for is a player spreading gossip to an NPC, which it in turn shares with another player. It sounds like something that would be seen in a game such as Animal Crossing.
Another example of how this could work is the value of in-game items going up or down (or even becoming unavailable) depending upon real-world player demand. Obviously that opens the door for griefing, though if it were ever implemented, presumably there would be the option to opt out. The idea of only being able to interact with friends or those you "authorize" is specifically mentioned.
Yet another possibility is a user who explores the world and finds building materials and decides to construct a house. He or she moves on after doing so, and when the next player comes along to that same location, they see the house that was constructed as opposed to the building materials.
"A high degree of interactivity in real time in RPGs is attractive to many players," the patent states. "However, some players may not want social interaction while nevertheless enjoying the benefit of a very dynamic virtual world. For example, it would be beneficial to provide a method and a system that allows a single player to play a game without the player having to interact with other players playing the game at the same time. However, it would be desirable if the player's avatar's actions still affect the status of the game and the status of other avatars, like in the conventional multiplayer games, even though the game being played is a single-player game from the perspective of each participant of the game."
Alternatively, this could serve almost as a form of asynchronous multiplayer where players are able to have an impact on a friend's game without having to be online at the same time.
The implementation of this could come on a "home video game system such as the Nintendo Wii 3D video game system, a Nintendo DS or other 3D capable interactive computer graphics display systems." It's unclear what the Wii 3D system is; Nintendo has talked about playing around with a 3D-enabled Wii, but the relatively low penetration of 3D TVs and the overall lack of glasses-free 3D TV sets made it an unlikely hook for a Wii follow-up. For what it's worth, "Wii 3D" is also mentioned in several other patent applications.
And keep in mind that's what this is -- a patent. Strange Nintendo patents have surfaced in the past, and very often nothing ever becomes of them. Of course, the notion of a massively single-player online game (MSOG?) seems entirely possible (and is much more likely than sticking your Wiimote into a bicycle pedal), so don't rule it out as something we eventually see from Nintendo.
Source: GameSpot
See Also
Friend Codes "Refined" for Wii U, Things Closer to Xbox Live
Comments (33)
Does this make my fruit safe??Posted: Aug 15, 2011 12:00AM PST by Redmagpie93
I never liked how people could steal your fruit and sell it back home so it would be cool if it was certain elements impacted while others not :)
The loner genre just got more lonely.Posted: Aug 15, 2011 12:00AM PST by Sablicious
If there were any redeeming aspect of the pointless grind-a-thons that are MMOs, it could only be the limited social interaction games of this genre provide.
Nintendo have now made pointless busy work a solitary exercise.
Oh, this is bad....Posted: Aug 15, 2011 12:00AM PST by IssacS
I will be blunt, as far as I understand it... patents in software is a pandora's box. I was rather hoping that Nintendo would avoid that, but the idea itself (that you can lock down an concept, any concept, for a period of 50 years or more) is lurcrative in the gaming space. What makes this worse is that, once opened... it can't be stoped and the USPTO is rather notorious for overlooking vauge patents like this one (which should be invalid at the start).
I would rather not see gaming go down this rabbit hole.
So... Nintendo is patenting...Posted: Aug 14, 2011 12:00AM PST by JonahFalcon
... social networking games? Seriously? We already do that on every Facebook game known to man.
Have no idea what this meansPosted: Aug 14, 2011 12:00AM PST by Masta_C
Massively single player? Is that an oxymoron? Arent all games that are not multiplayer essentially massively single player? My SNES and Genesis collections are made up almost entirely of massively single player games with the exception of sports and fighting games. I just dont understand what the point is. I love Nintendo, and their crazy ass ideas, but um this does not sound like anything that would ever be needed. It might get rid of friend codes though. Yay?
PokemonPosted: Aug 14, 2011 12:00AM PST by AvengerJimmie
is obviously what they're thinking about here. They want to make a WoW equivalent with Pokemon, but they know the age bracket is a lot lower for the game, and there's much more potential for creepers talking to kids. This way they can still work out a micro payment system to leech money through an ever expanding world... MMO style.
Sounds smart to me. Would make far less sense for Animal Crossing in my opinion, but who knows.
I think the opposite is true.Posted: Aug 14, 2011 12:00AM PST by Captain_Gonru
Animal Crossing would open the possibility to have multiple friends living in the same town, much in the way the game currently operates, but with players all playing on different consoles. Sometimes there may be more than one of you playing, other times, just you. You don't need to interact with each other directly, or at all, but you'd all live in the same area, and your actions would indirectly affect others. Plant a bunch of pitfalls around your buddy's house, he's going to have a bad time when he logs in. On the plus side, you'd all (hopefully) be paying into the town fund, thus raising the lighthouse that much sooner.
Pokemon, by contrast, would almost have to come down to trainer versus trainer at some point. Not a bad thing, but an inevitability.
Yep opposte IS truePosted: Aug 15, 2011 12:00AM PST by Redmagpie93
Pokemon will remain handheld only for a start (the core games) and Nintendo tend to be quite blunt in their patents so building a house would instantly suggest Animal Crossing...
BoringPosted: Aug 14, 2011 12:00AM PST by doom_freak
MMO's are boring without other people, remember when you were level 10 in WoW and thought questing was the shit but then you hit level 13 and immediately started trying to find groups for dungeons?
Hahaha, Nintendon'tPosted: Aug 14, 2011 12:00AM PST by SaviorMachine
Demon's Souls?Posted: Aug 14, 2011 12:00AM PST by laser_beams
because that's kind of what it sounds like from the description. although with phantoms and such there was some interaction still. but not much.
So....Posted: Aug 13, 2011 12:00AM PST by pandasnyper723
Massive single player online game?
I'm very confused here.
And This is Patented. . .Why?Posted: Aug 13, 2011 12:00AM PST by Pacario
I'm not sure why an idea like this would even be patented. It's just a game idea. Imagine if someone patented the first FPS deathmatch, or worse, the FPS genre.
Odd, just odd.
Yeah...Posted: Aug 14, 2011 12:00AM PST by Jiggles
I hope Nintendo got this patent for defensive purposes, rather than to sue "infringers", but Nintendo does have an aggressive legal department, so I wouldn't put it past them.
Patents are ostensibly only for "useful" inventions, but courts have decided that the "usefulness" requirement is pretty darn small; that games can qualify as "useful."
Wow, really?Posted: Aug 13, 2011 12:00AM PST by retropreserve
This sounds like a severe case of "Forever Alone." What exactly is the point? Can someone tell me?
Could be fun?Posted: Aug 13, 2011 12:00AM PST by JabezDawz
What would it be like playing animal crossings with no visiting friends? That doesn't sound very satisfying.
It could be like the Dragon Quest IX thing where players would receive weekly updates with missions and objectives. Could this just mean leaderboards? Or could it mean nothing?
.hack (Dot-Hack)Posted: Aug 13, 2011 12:00AM PST by AndElectTheDead
Been there, done that.
Patents being abusedPosted: Aug 13, 2011 12:00AM PST by Sins_Wage
I heard a special report on NPR a few weeks ago that talked about this. There a few companies that buy up these super specific web tech patents for just about anything website related. Little things like these buttons on this site or the bar that follows at the top to tell you your name and rank.
They have a physical office but there is literally no one ever there. The way they make money is if 1up uses this idea like the bar at the top without permission they sue them for patenet infringement. They'll waive it as long as 1up will pay them a monthly fee, kind of like insurance, in order to be able to use the "tech" from any of the millions, literally, of patents that they own without fear of litigation. It's kind of like protection money from the mob. They saunter into your website and say "Do you have a patent for that little bit of flash code? No? It'd be a shame if someone sued you over that."
You hit it on the spot sir!Posted: Aug 13, 2011 12:00AM PST by XHandxBananaX43
That's a great analogy you used there. It is essentially extortion when it comes down to it. Someone should get on top of bringing our patent system up to date, it needs it terribly. But then again I wouldn't be suprised if someone has already patented the idea of updating the patent system.
what needs to be done..Posted: Aug 14, 2011 12:00AM PST by Kevroequis
...is for judges to require the plaintiff in these cases to prove use of or concrete plans to use said patents. if not, the judge should use his lawful powers to deem the case arbitrary, dismiss the case, require the plaintiff's "company" to pay the defendant's legal fees and put an end to this kind of retarded shit.
I hate,,,Posted: Aug 12, 2011 12:00AM PST by mgs8681
That simple ideas like this can be patented especially when games like Demon's Souls have already done similar things. Patents should be for concrete ideas (like characters, pieces of tech, or musical compositions) a patent like this is like having a patent on "Songs that express romantic feelings."
Glad to seePosted: Aug 13, 2011 12:00AM PST by XHandxBananaX43
That I'm not the only one that feels this way. It's ridiculous the things that you can patent nowadays. Just look at the blanket patents that Apple has out that they use to sue companies like HTC. That's a different discussion though. There's no doubt that the patent system needs to be updated.
HmmPosted: Aug 12, 2011 12:00AM PST by Haru24
Posted 4 hours ago...I saw this exact same article 5 hours ago on Kotaku...Great job 1up...nice investigative work there...cough, cough
NotedPosted: Aug 12, 2011 12:00AM PST by TheSmokingManX
I'll make sure to skip anything that's ever covered anywhere in the future.
Sounds like...Posted: Aug 12, 2011 12:00AM PST by Coarse_Limely
Sounds like Demons Souls to me. Single player game with only vague interractions with other players online (except when they join in your game or attack you, of course).


text:
Seven drops in a game is a major concern
No 'Unsung Hero' blog. I have decided I'm going to do those only after the Packers win.
There's too many problems with this team right now.
Offensive coordinator Joe Philbin was on the elevator heading down to the locker room just before halftime at Fed Ex Field Sunday and didn't even realized he had missed two more drops by his receivers in that brief time span.
"Not until I saw the film…I didn't realize that we were that bad," said Philbin. "There's no good explanation."
The Packers, Philbin reiterated, devote a lot of practice time to fundamentals.
But interestingly both he and receivers coach Jimmy Robinson said they need to coach better, that the blame starts with them.
Robinson was especially forthcoming.
"As a coach you can't go out there and catch it for them," said Robinson, who was a receiver in the NFL himself for six years with the Giants, Broncos and 49ers. "You hope as a coach you did a good job of stressing the fundamentals. Hey, we all take it pretty personally when things don't work out well, when you lose and certainly even more personal when you're group doesn't perform well."
He usually harps on fundamentals and catching in practice but said he'll have to do more this week.
"You're reminding. You're prodding, to the point where you're tired of hearing yourself say it so you know they're tired of it," said Robinson. "But that's part of the job. That's what you do until they prove that they've got that part of the message. And quite honestly, you continue to deliver it anyway.
"We did have an issue last year and then we had not had an issue with drops until yesterday. It was kind of surprising with a great weather day, for us to come out there and this thing pops up again. It's obviously disappointing and it affects winning. That's the sad thing, it directly affects the bottom line."
There were seven drops by Packers receivers against Washington. Donald Driver had four, James Jones had two and Jordy Nelson one.
"Close, that's close, depends on how you grade them," said Robinson. "We grade them hard. And the players, quite honestly, were harder on themselves than the coaches. Some of them were fairly routine. Some of them were difficult. We certainly believe that the standard we've set around here is that if we touch the ball, then we should catch it. There are different degrees of difficulty, but this is the NFL. Not Little League.
"I have some ideas on how we'll work on fundamentals. Catching the ball is the most basic fundamental there is. Watch the ball, look it in, watch it hit your hands, don't pull your eyes off it before it gets there and put it away. It's all fundamentals. It's not rocket science."
Some of it comes down to technique. If you hold out your hands, and hold them to the side, and back, almost like cradling a baby – that's not the preferred method of catching a ball. If the defensive back is behind the receiver, that's a prime spot to punch the ball out.
If you hold them in front, with the hands out, that's the best way. It is considered aggressive. The players call that target thumbs together, where the hands create a web for the ball. That's the ideal way to bring in a reception because it is most secure.
Besides technique, the players may be worried about the drop and let that carry over to their next play.
"They've got to have a short memory," said Robinson. "You've got to put the past behind you good play or bad play."
Coach Mike McCarthy wants the issue corrected.
"We just need to catch the ball. We practice on catching the ball every single day. I know our perimeter group takes a lot of pride in their ability to catch the football and perform with yards after the catch, and we definitely did not do that to our standard yesterday. They do the ball drills every single day. Pretty much every position group has post-practice drills, and I'm sure they will emphasize it more this week and we'll spend a little more time on the things we need to correct. That is what coaching is all about; it's about fundamentals, trying to maintain the fundamentals that you feel you are on top of, and trying to improve in the areas you feel like you need to improve on. We need to catch the football better."
If you think the Packers were robbed of a helmet-to-helmet penalty flag on Aaron Rodgers' final throw, you're not alone and the NFL may rule the same and by the end of the week put out a fine. But don't expect the Packers coaching staff to criticize or even question the officiating. "I'm not going to answer those questions. I don't comment on officiating. He suffered a concussion on the last play," said McCarthy. The coaches risk fines if they say anything critical. "Officiating at this stage, who knows what they're going to call," said Philbin, who shrugged.
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text:
|Publication number
|Publication type
|Application number
|Publication date
|Jul 6, 2010
|Priority date
|Apr 20, 2000
|Fee status
|Publication number
|Michael J. Berman
|Original Assignee
|Lsi Logic Corporation
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (115), Non-Patent Citations (6), Referenced by (15), Classifications (12), Legal Events (8)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention relates to the manufacture of semiconductor devices and, more particularly, to thickness detection systems used during chemical-mechanical polishing of an integrated circuit substrate.
2. Description of the Prior Art
In certain technologies, such as integrated circuit fabrication, optical device manufacture, and the like, it is generally crucial to the various fabrication processes for the workpiece from which the integrated circuit, optical or other device is to be formed have a substantially planar front surface and, for certain applications, have both a planar front surface and back surface.
One process for providing a planar surface is commonly referred to as mechanical polishing. In mechanical polishing, the surface of the substrate is scoured with a conformable polishing pad. When a chemical slurry is used in conjunction with the polishing pad, the combination of the chemical slurry and the polishing pad generally provides a higher material removal rate than is possible with mere mechanical polishing. This combined chemical and mechanical, commonly referred to as "CMP", is considered an improvement over mere mechanical polishing processes for polishing or planarizing substrates. The CMP technique is common for the manufacture of semiconductor wafers used for the fabrication of integrated circuit die.
CMP typically involves mounting a semiconductor wafer (substrate) face down on a holder and rotating the wafer against a polishing pad mounted on a platen or a belt. The platen is, in turn, rotated or in an orbital state. A slurry containing a chemical that chemically interacts with the facing wafer layer and an abrasive that physically removes that layer is caused to flow between the wafer and the polishing pad or on the pad near the wafer. This technique is commonly applied to planarize metalization layers in the semiconductor wafer, but is applicable to oxide layers or films on the wafer such as silicon dioxide.
Device geometries for semiconductor integrated circuits are becoming increasingly smaller. As a result, the smaller devices tend to cause a variety of problems. One such problem is the contact via alignment between an upper conductive layer and a lower conductive layer. The contact alignment problem between these conductive layers is often caused by a non-uniform inter-dielectric layer therebetween. The non-uniform inter-dielectric layer is often characterized by peaks and valleys defined in the layer surface. This in turn causes other fabrication problems with each succeeding layer. The CMP process is used to reduce these layer non-uniformities.
In the CMP process, it is critical to utilize end-point detection to determine when and how much of the desired film is removed and to terminate the polishing process, thus minimizing the damage to the device performance that overpolishing will cause. The problem with overpolishing is that the film will be thinner than planned and modeled so the device may not act as planned. Semiconductor wafers and flat panel displays are particularly sensitive to overpolishing and damage to the underlying layer. CMP is performed in the processing of semiconductor wafers and/or chips on commercially available polishers, such as the SF776 & 676, AMT Mirra, and LAM Teres polishers. The standard CMP tools have a circular polishing table and a rotating carrier for holding the substrate.
End-point detection has been determined by motor current measuring mechanisms. As well, end-point detection has been accomplished by measuring the film thickness optically by interferometer, ellipsometer, or light beam displacement. If the film is opaque, the difference in reflectivity between the film being etched or polished and the film beneath it can be used to detect the end point of the process (or simply "endpoint"). The presence of a reaction product or the absence of a reacting species can be monitored and used to determine when the film etching is complete.
Another method utilized for end-point detection is detecting a change in process pressure. Monitoring process pressure, however, is usually not a very sensitive method of detecting end-points. Typically, current systems actively control process pressure, thus masking any pressure changes at end-point.
During the CMP process of silicon dioxide films on semiconductors, it is desirable to know the thickness of the film as it is being polished. By knowing the thickness of the film, the control and process capability of the tool set is enhanced. There are many systems to perform end-point measuring on flat wafers, or wafers with relatively simple film stacks, such as shallow trench isolation, or potentially the first oxide dielectric over a gate metal. However, there are no end-point systems than can reliably end-point polish in production after two, three, four, five, or more layers of metal (i.e. complex film stacks) have been processed.
Currently, all of the oxide end-point systems currently used in production, are optically based. Of these optically based systems, some use broad band visible light, such as IPEC, Speedfam, and Lam, while other systems use a single wavelength laser system such as AMAT. These systems use some form of either through the pad or off the pad optical sensing that have several features in common which prohibit them from measuring thickness on complex film stacks.
A problem with these systems is trying to determine the appropriate signal by reading an area of the semiconductor from a few square millimeters to a few square centimeters. The signal coming from this area will be quite complex, since it can have up to and over a dozen different oxide thicknesses in the area under evaluation. Currently, there are no CMP systems that are capable of accurately performing end-point on semiconductors with a plurality of different oxide thicknesses.
Another problem with the above optical systems is the rate at which the systems operate. Typically, the semiconductor wafer surface is moving at a radial velocity that translates to up to a few hundred linear feet per minute. Such conventional image capturing (optical) systems will not capture a sharp image with such great velocities.
What is needed is a method of determining thickness of films on a substrate during CMP.
What is also needed is a method of determining when an end-point is reached for substrates having a plurality of layers.
What is further needed is process of end-point detection for semiconductors having a plurality of oxide layers each of which may have a different thickness.
What is even further needed is a process of end-point detection during CMP of silicon dioxide films on semiconductors.
The present invention is a process and apparatus for measuring layer thickness and/or determining an end-point during chemical mechanical planarization or polishing (CMP) of a substrate having any number of layers.
In one form, the present invention is a method of determining film or layer thickness during CMP of a substrate comprising the steps of: a) capturing an image of an area of the substrate using high speed imaging; b) comparing the captured high speed image to a predetermined pattern; and c) converting the captured high speed image into a film thickness measurement when the captured high speed image corresponds to the predetermined pattern.
In another form, the present invention is an apparatus for determining layer thickness of a substrate during CMP of the substrate including: a) a high speed imager adapted to acquire images of areas of the substrate in situ; b) a processing unit in electronic communication with the high speed imager; and c) memory in electronic communication with the processing unit and containing a plurality of instructions. The plurality of instructions which, when executed by the processing unit, causes the processing unit to: a) compare images acquired by the high speed imager to image patterns stored in the memory device; and b) convert an acquired image into a layer thickness measurement when the acquired image corresponds to a predetermined one of the image patterns stored in the memory device.
The above-mentioned and other features and advantages of this invention, and the manner of attaining them, will become more apparent and the invention will be better understood by reference to the following description of an embodiment of the invention taken in conjunction with the accompanying drawings, wherein:
Corresponding reference characters indicate corresponding parts throughout the several views. The exemplifications set forth herein illustrate several embodiments of the present invention including a preferred embodiment of the invention, in one form, and such exemplifications are not to be construed as limiting the scope of the invention in any manner.
With reference now to
In the CMP tool 10 depicted in
Referring to
The 5LM substrate 100 includes a plurality of horizontal oxide layers labeled OX1, OX2, OX3, OX4, OX5, and OX6. Interspersed over the various oxide layers are a plurality of metal boxes or layers that can be labeled B1, B2, B3, B4, and B5 (as boxes) or M1, M2, M3, M4, and M5 (as layers). The horizontal length and placement of each metal layer or box is dependent upon design. The 5LM substrate 100 also includes a plurality of vias in each of the oxide layers, some of the vias of which are labeled (i.e. V1, V2, V3, V4, and V5). This is a typical exemplary structure for a substrate that will be "read" by the present invention.
Referring to back to
The CMP tool 10 also includes a polishing platen 20 that also rotates during CMP operation as indicated by the arrow 21. The polishing platen 20 retains a polishing pad 22 and rotates this polishing pad 22 during CMP operation. A polish slurry line 24 is provided to apply a polish slurry as is known in the art to the polishing pad 22 during CMP operation. The polish slurry and the polishing pad 22 are used to polish a substrate such as substrate 14.
The CMP tool 10 further includes an in situ image acquisition (imager) unit 26 employed to obtain images of the substrate 14 during CMP operation. Specifically, the in situ image acquisition unit 26 obtains images of the layers or films of oxides and the like on one side of the substrate 14. Alternatively, CMP operation may be periodically halted for obtaining images using the in situ image acquisition unit 26. The in situ image acquisition unit 26 may take several forms each of which can be described with reference to
It should be appreciated that the position of the image acquisition unit 26, as shown in
In one form, the in situ image acquisition unit 26 is a high speed image acquisition system. According to one embodiment of the in situ image acquisition unit 26, there is included a light source 28 and a high speed camera/sensor 30. The high speed camera 30 may be any type of high speed camera such as a high speed digital (e.g. CCD) and/or analog camera such as ones made by EG&G and Kodak. The light source 28 is adapted and/or configured to produce and/or project a light beam 32 towards a window 34 in the polishing platen 20 and a corresponding window 36 in the polishing pad 22. The light beam 32 is reflected (denoted by the reflection beam 33), at least in part, off of the substrate 14, through the windows 36 and 34, and back to the high speed camera 30. In the depicted example, the window 36 in the polishing pad 22 should be filled in with a flexible plastic or other similar material to provide a continuous surface for the polishing slurry to flow over during the polishing operation. The high speed camera 30 is thus able to acquire or capture high resolution images of areas or portions of the substrate 14 by virtue of its high speed nature.
According to another embodiment of the in situ image acquisition unit 26 and still referring to
According to yet another embodiment of the in situ image acquisition unit 26 and still referring to
In the case that the image acquisition unit 26 is on the inside or outside of the polishing pad 22 as indicated above, it may not be necessary to have windows 34 and 36 in order to capture images of the substrate 14. By moving the substrate 14 relative to the polishing pad 22 or vice versa the image acquisition unit 26 may obtain the necessary images without the windows 34 and 36.
In all of the above forms of the in situ image acquisition system 26, the camera 30 is in communication with a processing unit 38 via a communication/data line 42. The processing unit 38 includes a processor and associated processing circuitry 48 of which are known in the art, that is in communication with a memory device 50 as is known in the art. The memory device 50 contains a plurality of substrate image patterns and/or encoded data files of substrate image patterns. Additionally, the memory device 50 contains program instructions that are executable by the processor and associated processing circuitry 48 which allows the processing unit 38 to perform conventional pattern recognition for each of the substrate images acquired by the camera/sensor 30 with or against the substrate images stored in the memory device 50.
The memory device 50 of the processing unit 38 further includes layer thickness measuring program instructions (program) that are executable by the processor and associated processing circuitry 48. The layer thickness measuring program, such as one available from IPEC Precision, is able to convert individual pixels of the image into a thickness measurement. In this manner, the thickness of a particular area or portion of the substrate may be measured once a particular area or portion is ascertained.
The processing unit 38 is in communication with a wafer carrier driver module 40 via a communication/data line 44, while the driver module 40 is in turn in communication with the wafer carrier 12 via a communication/data line 46. The driver module 40 receives signals from the processing unit 38 which it uses to control the location and/or movement of the wafer carrier 12. The processing unit 38 generates appropriate signals that are transmitted to the driver module 40 as the processing unit 38 determines whether an image acquired by the camera 30 matches a stored pattern.
It should be appreciated that the in situ image acquisition unit 26 may be placed anywhere as long as the camera and/or light beam and sensor can obtain or capture images of the substrate 14. Thus, the windows 34 and 36 in the polishing platen 20 and the polishing pad 22 respectively, may or may not be necessary depending on the location of the in situ image acquisition unit 26.
With additional reference to
If the acquired image does match the particular stored image pattern, the acquired image is analyzed to determine the thickness of the layer(s), block 70. If the thickness is determined to be greater than that necessary for ending the CMP process, the CMP process continues and additional images are acquired, i.e. a return to block 64. If, however, the thickness is determined to be within a tolerance level for the particular area of the substrate 14, then CMP operation is stopped, block 74.
It should be appreciated that the particular stored image pattern is selectable by the user depending on what area of the substrate 14 is to be measured. This may be accomplished via an interface (not shown) with the processing unit 38. As well, the desired thickness tolerances or exact measurements are selectable by the user. In this manner, any area or portion of the substrate 14 may be measured and CMP operation continued or stopped depending on the measurement.
Each time the proper box (metal layer length) is located and a reading is taken, preferably an estimate is calculated by the processing unit 38 as to when endpoint will occur to close in on the right time. If a reading is taken every five to ten seconds, the CMP 10 can be stopped at the correct time based on the previous reading of the wafer. If the exact reading is acquired or one under the correct value, overpolishing can be minimized.
With reference again to
With additional reference to
It should be appreciated that instead of reflection patterns stored in the memory device 50, program instructions regarding data calculations of reflection patterns may be stored and subsequently used to determine film thickness depending on the reflection patterns acquired by the sensor 30.
Continuing with the program flow chart 80, if the acquired reflection image does match the particular stored image pattern, the thickness of the film(s) of the reflection area of the acquired image is determined, then CMP operation is stopped, block 90.
Each time the proper box (metal layer length) is located and a reading is taken, preferably an estimate is calculated by the processing unit 38 as to when endpoint will occur to close in on the right time. If a reading is taken every five to ten seconds, the CMP 10 can be stopped at the correct time based on the previous reading of the wafer. If the exact reading is acquired or one under the correct value, overpolishing can be minimized.
It should also be appreciated that the methods described above with reference to
While this invention has been described as having a preferred design and/or configuration, the present invention can be further modified within the spirit and scope of this disclosure. This application is therefore intended to cover any variations, uses, or adaptations of the invention using its general principles. Further, this application is intended to cover such departures from the present disclosure as come within known or customary practice in the art to which this invention pertains and which fall within the limits of the appended claims.
|Cited Patent
|Filing date
|Publication date
|Jun 14, 1940
|Oct 8, 1946
|Edgerton Harold E
|High-speed flash-photography
|Apr 1, 1971
|May 22, 1973
|Multiple band atomic absorption apparatus for simultaneously measuring different physical parameters of a material
|Dec 22, 1971
|Jul 24, 1973
|Columbia Broadcasting Sys Inc
|Near-confocal device for optical scan enhancement
|Mar 10, 1980
|Jan 26, 1982
|Bell Telephone Laboratories, Incorporated
|Method for the optical monitoring of plasma discharge processing operations
|Jul 30, 1981
|Feb 22, 1983
|Intel Corporation
|High contrast alignment marker for integrated circuit fabrication
|Aug 19, 1985
|Dec 30, 1986
|International Business Machines Corporation
|Visibility enhancement of first order alignment marks
|Apr 19, 1985
|Aug 25, 1987
|Datasonics Corp.
|Semiconductor wafer scanning system
|Jun 27, 1986
|May 17, 1988
|The United States Of America As Represented By The Secretary Of The Air Force
|Laser photography pulse synchronization circuit
|Jan 25, 1988
|Dec 27, 1988
|Ibm Corporation
|In situ conductivity monitoring technique for chemical/mechanical planarization endpoint detection
|Sep 24, 1990
|Jul 30, 1991
|Micron Technology, Inc.
|Method of endpoint detection during chemical/mechanical planarization of semiconductor wafers
|May 1, 1990
|Jan 14, 1992
|At&T Bell Laboratories
|In situ monitoring technique and apparatus for chemical/mechanical planarization endpoint detection
|Oct 15, 1991
|Sep 29, 1992
|Applied Materials, Inc.
|Method and apparatus for endpoint detection in a semiconductor wafer etching system
|Jul 29, 1991
|Dec 8, 1992
|Micron Technology, Inc.
|Method of etching SiO2 dielectric layers using chemical mechanical polishing techniques
|Jan 3, 1992
|Mar 23, 1993
|Micron Technology, Inc.
|Method for controlling a semiconductor (CMP) process by measuring a surface temperature and developing a thermal image of the wafer
|Mar 26, 1992
|Jun 29, 1993
|Micron Technology, Inc.
|Acoustical method and system for detecting and controlling chemical-mechanical polishing (CMP) depths into layers of conductors, semiconductors, and dielectric materials
|Dec 11, 1991
|Aug 31, 1993
|Micron Technology, Inc.
|Chemical mechanical planarization (CMP) of a semiconductor wafer using acoustical waves for in-situ end point detection
|Feb 14, 1992
|Sep 21, 1993
|Lsi Logic Corporation
|Ultrasonic energy enhanced chemi-mechanical polishing of silicon wafers
|Apr 9, 1992
|Sep 21, 1993
|Advanced Micro Devices, Inc.
|Audio end point detector for chemical-mechanical polishing and method therefor
|Dec 21, 1992
|Nov 2, 1993
|Motorola, Inc.
|Procss for fabricating a ferroelectric capacitor in a semiconductor device
|Jul 10, 1992
|Nov 30, 1993
|Lsi Logic Corporation
|Detecting the endpoint of chem-mech polishing and resulting semiconductor device
|Mar 29, 1993
|Dec 21, 1993
|Micron Technology, Inc.
|Method for selective removal of a material from a wafer's alignment marks
|Dec 30, 1991
|Dec 21, 1993
|Nec Corporation
|Method of leveling the laminated surface of a semiconductor substrate
|Jan 30, 1992
|May 3, 1994
|International Business Machines Corporation
|Endpoint detection apparatus and method for chemical/mechanical polishing
|Jul 10, 1992
|May 10, 1994
|Lsi Logic Corporation
|Techniques for assembling polishing pads for chemi-mechanical polishing of silicon wafers
|Mar 19, 1993
|Jun 14, 1994
|Lsi Logic Corporation
|Detecting the endpoint of chem-mech polishing, and resulting semiconductor device
|Jun 14, 1993
|Aug 9, 1994
|International Business Machines Corporation
|In-situ endpoint detection method and apparatus for chemical-mechanical polishing using low amplitude input voltage
|Jun 24, 1993
|Nov 8, 1994
|Northern Telecom Limited
|Method of making integrated circuits
|Jun 22, 1994
|Jan 31, 1995
|International Business Machines Corporation
|Polish planarizing using oxidized boron nitride as a polish stop
|Jun 15, 1993
|Feb 14, 1995
|Lsi Logic Corporation
|Methods of cleaning semiconductor substrates after polishing
|Sep 29, 1993
|Mar 21, 1995
|Motorola Inc.
|Acoustically regulated polishing process
|Jul 8, 1993
|Apr 4, 1995
|Lsi Logic Corporation
|Techniques for assembling polishing pads for silicon wafer polishing
|Mar 29, 1994
|Apr 11, 1995
|Motorola Inc.
|Method for forming a metal silicide interconnect in an integrated circuit
|Mar 2, 1994
|Aug 8, 1995
|Micron Technology, Inc.
|Chemical-mechanical polishing techniques and methods of end point detection in chemical-mechanical polishing processes
|Apr 25, 1994
|Sep 12, 1995
|Micron Technology, Inc.
|Method of chimical mechanical polishing for dielectric layers
|Nov 3, 1994
|Jan 9, 1996
|Kabushiki Kaisha Toshiba
|Pad condition and polishing rate monitor using fluorescence
|Sep 26, 1994
|Feb 20, 1996
|International Business Machines Corp.
|Chemical-mechanical polishing tool with end point measurement station
|May 9, 1994
|May 14, 1996
|Lsi Logic Corporation
|Techniques for assembling polishing pads for chemical-mechanical polishing of silicon wafers
|Jan 17, 1995
|Jul 2, 1996
|Motorola, Inc.
|Chemical-mechanical-polishing pad cleaning process for use during the fabrication of semiconductor devices
|Apr 10, 1995
|Sep 24, 1996
|International Business Machines Corporation
|In-situ monitoring of the change in thickness of films
|Sep 5, 1984
|Oct 1, 1996
|The United States Of America As Represented By The Secretary Of The Army
|Frustrated total internal reflection optical power limiter
|Nov 30, 1994
|Jan 21, 1997
|Intel Corporation
|Method and apparatus for endpoint detection in a chemical/mechanical process for polishing a substrate
|Oct 16, 1995
|Jan 28, 1997
|Taiwan Semiconductor Manufacturing Company Ltd.
|Chemical/mechanical planarization (CMP) endpoint method using measurement of polishing pad temperature
|Nov 28, 1995
|Jan 28, 1997
|Nikon Corporation
|Apparatus for removing a thin film layer
|Apr 13, 1995
|Mar 11, 1997
|Hitachi, Ltd.
|Polishing method
|Jun 7, 1995
|Mar 25, 1997
|Advanced Micro Devices, Inc.
|Holding apparatus, a metal deposition system, and a wafer processing method which preserve topographical marks on a semiconductor wafer
|Aug 23, 1994
|Apr 29, 1997
|Lsi Logic, Inc.
|Techniques for assembling polishing pads for chemi-mechanical polishing of silicon wafers
|Oct 12, 1995
|May 6, 1997
|Lsi Logic Corporation
|Methods of polishing semiconductor substrates
|Oct 24, 1994
|May 6, 1997
|Advanced Micro Devices, Inc.
|Method for eliminating window mask process in the fabrication of a semiconductor wafer when chemical-mechanical polish planarization is used
|Mar 30, 1995
|Jun 10, 1997
|Rensselaer Polytechnic Institute
|Systems for performing chemical mechanical planarization and process for conducting same
|Jan 18, 1996
|Jun 17, 1997
|Ebara Corporation
|Polishing endpoint detection method
|Jan 31, 1996
|Jun 17, 1997
|International Business Machines Corporation
|Assembly and method for making in process thin film thickness measurments
|Feb 17, 1995
|Jul 1, 1997
|Kabushiki Kaisha Toshiba
|Polishing method and apparatus for detecting a polishing end point of a semiconductor wafer
|May 23, 1996
|Jul 1, 1997
|Industrial Technology Research Institute
|Chemical/mechanical polish (CMP) thickness monitor
|Mar 19, 1996
|Jul 1, 1997
|International Business Machines Corporation
|Endpoint detection for chemical mechanical polishing using frequency or amplitude mode
|May 28, 1996
|Jul 8, 1997
|Micron Technology, Inc.
|Apparatus and method for conditioning a planarizing substrate used in chemical-mechanical planarization of semiconductor wafers
|Apr 1, 1996
|Jul 15, 1997
|Industrial Technology Research Institute
|Chemical/mechanical polish (CMP) endpoint method
|Jun 2, 1995
|Aug 12, 1997
|Nikon Corporation
|Method for removing a thin film layer
|Oct 24, 1995
|Aug 19, 1997
|Micron Technology, Inc.
|System for real-time control of semiconductor wafer polishing including optical monitoring
|Apr 10, 1995
|Aug 26, 1997
|International Business Machines Corporation
|In-situ monitoring of conductive films on semiconductor wafers
|Feb 7, 1996
|Sep 2, 1997
|International Business Machines Corporation
|Semiconductor structure having multiple levels of self-aligned interconnection metallization, and methods for its preparation
|May 16, 1996
|Sep 2, 1997
|Micron Technology, Inc.
|Method and apparatus for detecting the endpoint in chemical-mechanical polishing of semiconductor wafers
|Sep 4, 1996
|Sep 9, 1997
|National Semiconductor Corporation
|Methods and apparatus for control of polishing pad conditioning for wafer planarization
|Sep 25, 1996
|Sep 16, 1997
|Chartered Semiconductor Manufacturing Pte Ltd.
|New chemical mechanical planarization (CMP) end point detection apparatus
|Jun 7, 1995
|Sep 16, 1997
|Lsi Logic Corporation
|Keyed end effector for CMP pad conditioner
|Jun 21, 1996
|Sep 16, 1997
|Chartered Semiconductor Manufactuing Pte, Ltd.
|Method and apparatus for determination of the end point in chemical mechanical polishing
|May 23, 1995
|Sep 16, 1997
|Watkins Johnson Company
|Method of planarizing a layer of material
|Sep 25, 1996
|Sep 23, 1997
|Chartered Semiconductor Manufacturing Pte Ltd.
|Method of forming integrated CMP stopper and analog capacitor
|Dec 22, 1995
|Sep 30, 1997
|Ebara Corporation
|Polishing apparatus having endpoint detection device
|Oct 2, 1996
|Oct 7, 1997
|Taiwan Semiconductor Manufacturing Company, Ltd.
|Method for forming polish stop layer for CMP process
|Jun 5, 1995
|Nov 25, 1997
|Motorola, Inc.
|Process for polishing and analyzing an exposed surface of a patterned semiconductor
|Mar 14, 1996
|Dec 9, 1997
|Luxtron Corporation
|Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
|Oct 24, 1995
|Dec 23, 1997
|Micron Technology, Inc.
|System for real-time control of semiconductor wafer polishing
|Oct 31, 1996
|Dec 30, 1997
|Micron Technology, Inc.
|Apparatus and method for loading and unloading substrates to a chemical-mechanical planarization machine
|Jan 19, 1996
|Jan 6, 1998
|International Business Machines Corporation
|Process for removing residue from a semiconductor wafer after chemical-mechanical polishing
|Nov 12, 1996
|Jan 6, 1998
|Taiwan Semiconductor Manufacturing Company, Ltd.
|Recovery of alignment marks and laser marks after chemical-mechanical-polishing
|Aug 9, 1996
|Jan 6, 1998
|Industrial Technology Research Institute
|Chemical-mechanical polishing (CMP) apparatus
|Sep 3, 1996
|Jan 20, 1998
|Industrial Technology Research Institute
|Method for fabricating a sub-half micron MOSFET device with global planarization of insulator filled shallow trenches, via the use of a bottom anti-reflective coating
|Apr 23, 1996
|Jan 27, 1998
|United Microelectronics
|Method for forming shallow trench isolation
|May 6, 1996
|Feb 10, 1998
|Micro Technology, Inc.
|Method for cleaning waste matter from the backside of a semiconductor wafer substrate
|Jan 17, 1996
|Feb 24, 1998
|Liu; Keh-Shium
|Wafer polisher head used for chemical-mechanical polishing and endpoint detection
|May 30, 1996
|Mar 3, 1998
|Tokyo Electron Limited
|Method and apparatus for polishing
|Oct 11, 1996
|Mar 3, 1998
|Lam Research Corporation
|Technique for improving within-wafer non-uniformity of material removal for performing CMP
|Nov 5, 1996
|Mar 10, 1998
|Micron Technology, Inc.
|Method and apparatus for conditioning polishing pads used in mechanical and chemical-mechanical planarization of substrates
|Apr 26, 1996
|Apr 7, 1998
|Sony Corporation
|Method of etching back layer on substrate
|Aug 20, 1996
|Apr 14, 1998
|Micron Technology, Inc.
|Polishing pad for chemical-mechanical planarization of a semiconductor wafer
|Aug 19, 1996
|Apr 21, 1998
|Sagitta Engineering Solutions, Ltd.
|Precision polishing system
|Feb 26, 1996
|May 5, 1998
|Taiwan Semiconductor Manufacturing Company, Ltd.
|Robust end-point detection for contact and via etching
|Mar 17, 1997
|May 26, 1998
|Integrated Process Equipment Corporation
|Rinse water recycling in CMP apparatus
|Feb 6, 1997
|Jun 9, 1998
|Lam Research Corporation
|Sensors for a linear polisher
|Mar 21, 1997
|Jun 9, 1998
|Micron Technology, Inc.
|System for real-time control of semiconductor wafer polishing including heater
|Feb 16, 1996
|Jul 7, 1998
|Micron Technology, Inc.
|Endpoint detector and method for measuring a change in wafer thickness in chemical-mechanical polishing of semiconductor wafers
|Sep 8, 1995
|Aug 18, 1998
|Micron Technology, Inc.
|Method of chemical mechanical polishing for dielectric layers
|Mar 20, 1997
|Jan 19, 1999
|Lsi Logic Corporation
|Polishing composition for CMP operations
|Aug 20, 1997
|Feb 2, 1999
|Lsi Logic Corporation
|Apparatus and method for polish removing a precise amount of material from a wafer
|Aug 13, 1996
|Feb 9, 1999
|Lsi Logic Corporation
|Subsonic to supersonic and ultrasonic conditioning of a polishing pad in a chemical mechanical polishing apparatus
|Nov 10, 1997
|Mar 16, 1999
|Ebara Corporation
|Polishing apparatus
|Aug 19, 1997
|Mar 16, 1999
|Lsi Logic Corporation
|Chemical mechanical polishing pad slurry distribution grooves
|Sep 29, 1997
|Mar 30, 1999
|Lsi Logic Corporation
|Method and apparatus for chemical mechanical polishing
|Aug 26, 1997
|Apr 13, 1999
|Lsi Logic Corporation
|Use of ethylene glycol as a corrosion inhibitor during cleaning after metal chemical mechanical polishing
|Aug 25, 1997
|Aug 3, 1999
|Lsi Logic Corporation
|Method and apparatus for using pressure differentials through a polishing pad to improve performance in chemical mechanical polishing
|May 23, 1996
|Sep 7, 1999
|Lsi Logic Corporation
|Catalytic acceleration and electrical bias control of CMP processing
|Oct 30, 1997
|Sep 28, 1999
|Lsi Logic Corporation
|Conditioning CMP polishing pad using a high pressure fluid
|Jul 16, 1997
|Sep 28, 1999
|Speedfam-Ipec Corporation
|Method for cleaning workpiece surfaces and monitoring probes during workpiece processing
|Jun 12, 1997
|Nov 16, 1999
|Lsi Logic Corporation
|Automated endpoint detection system during chemical-mechanical polishing
|Jun 4, 1997
|Aug 22, 2000
|Lsi Logic Corporation
|Automated inspection system for residual metal after chemical-mechanical polishing
|Nov 2, 1998
|Dec 12, 2000
|Applied Materials, Inc.
|Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing
|Dec 4, 1998
|Feb 13, 2001
|International Business Machines Corporation
|Multi-wafer polishing tool
|Dec 11, 1998
|Mar 20, 2001
|Filmetrics, Inc.
|Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample
|Sep 24, 1999
|May 8, 2001
|Prism Science Works Incorporated
|High speed photography light source
|Jan 25, 1999
|Jun 19, 2001
|Applied Materials, Inc.
|Method and apparatus for determining substrate layer thickness during chemical mechanical polishing
|May 15, 1998
|Jun 19, 2001
|Yokogawa Electric Corporation
|Confocal microscopic equipment
|Mar 18, 1999
|Mar 26, 2002
|Speedfam-Ipec Corporation
|Method and apparatus for endpoint detection for chemical mechanical polishing
|Apr 28, 2000
|Apr 16, 2002
|The United States Of America As Represented By The Secretary Of The Navy
|Underwater strobe light control circuitry
|Jun 15, 2004
|Mar 28, 2006
|Applied Materials Inc.
|Method for monitoring a substrate during chemical mechanical polishing
|Mar 27, 2002
|Oct 10, 2002
|Lam Research Corporation
|Method and apparatus for end point triggering with integrated steering
|Aaron Sussman, The Amateur Photographer's Handbook, pp. 6, 286-290, (8th ed. 1973), Thomas Y. Crowell Company, Inc., (1941).
|Abidi et al., Facet Model and Mathematical Morphology for Surface Characterization, The International Society for Optical Engineering, Proc. of SPIE Conf. on Intelligent Robots and Computer Vision XVIII: Algorithms, Techniques, and Active Vision, vol. 3837, pp. 334-344, Boston, MA Sep. 1999.
|Chen et al., Optimal Scheduling of Capture Times in a Multiple Capture Imaging System, The International Society for Optical Engineering, Proc SPIE vol. 4669, (2002) © 2002 SPIE, pp. 288-296.
|Wikipedia, the free encyclopedia, High speed photography, Internet Article, [Online] 2000, Retrieved from the Internet: http://en.wikipedia.org/wiki/High-speed-photography >[retrieved on Apr. 8, 2008], 7 pages.
|Wikipedia, the free encyclopedia, High speed photography, Internet Article, [Online] 2000, Retrieved from the Internet: http://en.wikipedia.org/wiki/High—speed—photography >[retrieved on Apr. 8, 2008], 7 pages.
|Wolfe et al., High Speed Imaging Polarimeter, The International Society for Optical Engineering, Proc. of SPIE vol. 5158, 2003, Bellingham, WA, pp. 24-32.
|Citing Patent
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|May 9, 2013
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|U.S. Classification
|382/141, 348/125, 348/86
|International Classification
|Cooperative Classification
|European Classification
|Apr 20, 2000
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text:
After years of toiling in the considerable shadow cast by the boys' soccer program at national power Wando High School, the James Island Trojans have broken into the spotlight this season.
Tuesday's Schedule
Class AAAA
Bluffton at Stratford
Spring Valley at Ashley Ridge
Fort Dorchester at Wando
West Ashley at Summerville
Class AAA
Hanahan at Myrtle Beach
North Myrtle Beach at James Island
Stall at Socastee
St. James at Hilton Head
Class AA
Edisto at Academic Magnet
Ridgeland-Hardeeville at Bishop England
Battery Creek at Silver Bluff
Timberland at Waccamaw
James Island, which dropped from Class AAAA to AAA last year, claimed its first outright region championship since 1997, and begins the playoffs Tuesday as the third-seeded team in the Lower State.
"We've always had a David vs. Goliath situation in AAAA, especially with Wando in our region," said James Island coach Todd Robinson, in his 11th season with the Trojans. "Our boys have really been hungry and they really worked for it this season. We drove them hard, but they've been really disciplined and that's been great to see."
Wando, the largest high school in the state with more than 3,500 students, has overshadowed many programs, not just James Island's. The Warriors won a state title in 2011, made the finals in 2012 and are ranked No. 1 in the nation this season. Over a nine-year stretch, James Island finished second to Wando in region standings six times.
James Island, with fewer than 1,400 students, was placed in Class AAA for two years during the 2012-14 realignment by the S.C. High School League and has made the most of its opportunity in boys soccer.
Last year, the Trojans were the only team to defeat eventual AAA champion Hilton Head. This season, James Island beat Hilton Head twice to claim the Region 8-AAA title, and also took wins over Bishop England, West Ashley, Hanahan, Summerville, Beaufort and Cane Bay en route to a 14-3 regular season. The Trojans are ranked No. 6 in the state in Class AAA.
"Our teams have always played bigger than what our school is," said Robinson, who was an assistant to former Wando coach Tom Reilly before coming to James Island. "But these last two years, we've been matched up with schools more our size and we've been able to show the quality that we have."
Garrett Glaze, a senior centerback, is the first James Island player to make the Clash of the Carolinas all-star game, set for July 12 at Blackbaud Stadium. He will play soccer at Presbyterian starting in the fall.
"He's a very vocal leader and keeps everyone motivated," Robinson said. "He keeps everyone in line and leads by example, in word and deed."
Another senior, Lars Bentley, patrols the midfield and helps out on defense.
"He reads the game so well," Robinson said. "He can tell what's going to happen before it happens. Those guys are the rock the team is built around." The Trojans open the playoffs against North Myrtle Beach today, with second-ranked Brookland-Cayce and No. 3 Myrtle Beach also in the Lower State bracket.
Elsewhere in Class AAA, Hanahan is at Myrtle Beach and Stall is at Socastee.


text: Ann Arbor Schools of Choice Falls Short of Target ShareTwitter Facebook Google+ Email By Andrew Cluley Listen Listening... / Ann Arbor, MI – For the second year in a row, the Ann Arbor school district has not attracted as many schools-of-choice students as targeted. Hear more from WEMU's Andrew Cluley. View the discussion thread.


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Product Details
Inspired by a vintage silhouette, we made this drapey dress a little more modern (read: something old and something new) with a sexy crisscross back and an overwrap front, so it's a bit sassy but still totally tasteful. Made from silk chiffon with an interior bodice for extra support and a flowy, floor-grazing skirt, this dress works for bridesmaids, guests of the bride and really anyone who wants something pretty to wear.
Size & Fit Details
Anabel long dress in silk chiffon
Rated 3 out of 5 by 2 reviewers.
Rated 5 out of 5 by Elen Ideal bridsmaid dress This is an elegant bridsmaid dress. I bought the dark cove color and once worn it makes a much greater impression than in the images. Nice fabric quality. Dress is long enough, so unless you are very tall and plan to wear very high hills you will need to shorten it. It runs however a bit large. I bought one size down from my usual and still it was large, especially for my body shape (pear). Also the color was just a shade darker than it appears to be on the product images. Perfect in any other aspect. March 23, 2016
Rated 1 out of 5 by Carrie Disappointed Ordered this dress for my beach wedding in St John and was disappointed by the overall fit of the dress, it's super tight through the bodice, the arm holes were huge and it was 6-8 inches too long! Ugh! The gown looked gorgeous online, not so hot in person! Sorry JCrew, it's going back! March 30, 2016
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