text:
|Publication number
|Publication type
|Application number
|Publication date
|Jul 8, 2003
|Filing date
|Nov 17, 2000
|Priority date
|Nov 17, 2000
|Fee status
|Publication number
|Kouros Ghandehari, Bruno LaFontaine, Bhanwar Singh
|Original Assignee
|Advanced Micro Devices, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (5), Non-Patent Citations (7), Referenced by (18), Classifications (29), Legal Events (4)
|External Links: USPTO, USPTO Assignment, Espacenet
The present specification relates generally to the field of integrated circuits and to methods of manufacturing integrated circuits and the masks or reticles used to manufacture these devices. More particularly, the present specification relates to photon assisted deposition for hard mask formation on both device substrates and mask substrates.
Semiconductor devices or integrated circuits (ICs) can include millions of devices, such as, transistors. Ultra-large scale integrated (ULSI) circuits can include complementary metal oxide semiconductor (CMOS) field effect transistors (FET). Despite the ability of conventional systems and processes to put millions of devices on an IC, there is still a need to decrease the size of IC device features, and, thus, increase the number of devices on an IC.
One limitation to the smallness of IC critical dimensions is lithography. In general, projection lithography refers to processes for pattern transfer in various media on the substrate. It is a technique used for integrated circuit fabrication in which a silicon slice, the wafer, is coated uniformly with a radiation-sensitive film, the resist, and an exposing source (such as laser radiation, x-ray photons, or an electron beam) illuminates selected areas of the surface through an intervening master template, the mask, or reticle, for a particular pattern. The lithographic coating or photoresist is generally a radiation sensitive coating suitable for receiving a projected image of the subject pattern. Once the image is projected, it is indelibly formed in the coating. The projected image may be formed using either negative or positive tone photoresist.
Exposure of the coating through a mask causes the image area to become selectively crosslinked where irradiated in the case of a negative tone photoresist and consequently less soluble in the developer fluid where the resist has been exposed. In the case of a positive tone resist, the exposed regions are rendered more soluble than the rest of the film due to deprotection of the polymers in the film where exposed to the imaging radiation. Subsequent to imaging using either tone of resist, the more soluble areas are removed in a developing process to leave the pattern image in the coating as the less soluble polymer. For both cases of resist types the difference in solubility is substantial so that a pattern with good fidelity is formed in the photoresist coating.
The pattern which results in photoresist from lithographic processing is used as a mask for the subsequent plasma etching of the underlying layer or layers. The plasma etch process directs chemical species to bombard the surface and remove material from the layer by means of chemical processes between species in the excited state in the plasma and the wafer surface. If the photoresist is durable enough for the etch warranted for the layer beneath, the resist mask enables transfer of the pattern to the underlying layer by means of the plasma etch process. If the resist mask by itself does not withstand the etch process necessary to etch the underlying layers an additional thin hard mask layer between the resist and the underlying layers to be patterned by the etch process is necessary. In that case, the resist mask is used with one type of etch process to etch the hard mask and a subsequent differing type of etch process to pattern the layers beneath. The final type of etch process does not attack the hard mask and is able to use the hard mask to prevent removal of the material in the desired areas as determined by the original pattern in the photoresist.
Projection lithography is a powerful and essential tool for microelectronics processing. As feature sizes are driven smaller and smaller, optical systems are approaching their limits due to the resolution capability of the combination of the wavelengths of optical radiation and photoresist in use by these systems.
Conventional lithography techniques often utilize a combination of photo-masks or reticles and hard masks to transfer patterns between various layers during integrated circuit fabrication. A hard mask is a layer of material on an integrated circuit wafer which prevents chemical removal of materials below the mask during plasma etch. A reticle is a patterning tool which contains patterns that can be transferred to an entire integrated circuit wafer in one or more exposures by means of a photoresist coating on the substrate being exposed.
Using a hard mask can increase the resolution capability of the manufacturing process by improving the plasma etch process capability by allowing a thinner resist coating to be used which will allow smaller dimensions to be produced in the resist and subsequently in the films comprising the semiconductor device on the wafer.
Another method of improving the device manufacturing capability is to improve the resolution capability of the reticle itself. Typically a reticle used in projection lithography has a 4�or 5�reduction factor so that reducing the minimum feature on the reticle substrate leads to a reduction in the size of the features at the wafer surface. The reticle substrate is coated with layers that are etched in an analagous method to the semiconductor device manufacture using a resist mask produced by exposure to radiation of some sort. Typically the layers are not made using a reticle or mask but rather are written by scanning the radiation from a database held in a computer.
There are several advanced techniques for forming reticles that allow more aggressive imaging resolution capabilities. These include phase shifting masks (PSMs) where the area surrounding the mask feature to be imaged are shifted in phase so as to interfere with the adjacent image from the pattern and create a smaller feature at the wafer surface. Here again, hard masks can be used to improve the manufacturing capability of reticles depending on the films used on the reticle substrates. For some types of phase shifting masks, the addition of the hard mask material itself can form the phase shifting region while for other types of PSMs the hard masks itself can be a layer which acts both as an etching hard mask and a film with optical properties enabling the phase shifting nature of that type of PSM.
Hard masks are generally created by depositing a material in blanket form by chemical vapor deposition (CVD). Subsequently, a pattern is etched from the hard mask layer using a photoresist mask and a variety of different etching or removal techniques. Due to the thickness of the resist and the response of the resist with the imaging system, the resolution capability of conventional systems is limited even with a hard mask. Thus, there is a need to use a photon assisted CVD type of deposition with either laser or synchroton radiation which allows direct patterning of hard mask layers without resist and allow for even greater resolution by selectively growing a thin layer of the hard mask at the sites irradiated by the photon.
Since there is a limitation to the resolution achievable with resist based pattern transfer with or without use of a hard mask to pattern the underlying layer, there is a need to pattern IC devices and reticles using non-conventional lithographic techniques. Furthermore, when patterning with hard masks, there is a need to use an alternative to forming a blanket of hard mask material over the surface of the integrated circuit wafer or the reticle since this must subsequently be etched with a resist based masking process. Yet further, there is a need for photon assisted deposition for hard mask formation due to the resolution enhancing capabilities of this non-resist based lithography since the layer can be selectively grown as a pattern for integrated circuit features.
An exemplary embodiment is related to a method of selectively patterning a hard mask or reticle using a laser, soft x-ray, or e-beam radiation source to cause deposition of hard mask material in locations forming the hard mask pattern. This method can include providing a vapor in a vapor chamber containing an integrated circuit substrate, and applying a laser or the light source to selected areas of the integrated circuit substrate to cause a reaction with the vapor and create a structure on the integrated circuit substrate.
Another exemplary embodiment is related to a system for forming a hard mask or reticle. This system can include a vapor chamber, means for dispensing chemical vapor precursors from a source located in the vapor chamber, an integrated circuit wafer in the vapor chamber, a radiation source which selectively provides laser light, soft x-ray, or e-beam radiation to the integrated circuit wafer such that there is a reaction with chemicals in the chemical vapor causing a deposition of the material where the radiation is applied.
Another embodiment is related to a method of material deposition in the formation of a hard mask or reticle configured to form features on an integrated circuit wafer. This method can include providing a chemical vapor deposition (CVD) vapor in a vapor chamber, and illuminating a portion of an integrated circuit wafer surface of an integrated circuit wafer located in the vapor chamber using light. The light causes a reaction with chemicals in the CVD vapor. The illuminated portion defines geometric patterns for a hard mask.
Other principle features and advantages of the present invention will become apparent to those skilled in the art upon review of the following drawings, the detailed description, and the appended claims.
The exemplary embodiments will hereafter be described with reference to the accompanying drawings, wherein like numerals denote like elements, and:
FIG. 1 is a diagrammatical representation of a hard mask formation system in accordance with an exemplary embodiment;
FIG. 2 is a top view of an integrated circuit wafer including a hard mask manufactured in accordance to an exemplary embodiment;
FIG. 3 is a cross-sectional view of a portion of a reflecting EUV attenuating phase shift mask fabricated in accordance with an exemplary embodiment;
FIG. 4 is a cross-sectional view of the portion of the reflecting EUV attenuating phase shift mask of FIG. 3 after an etching step;
FIG. 5 is a cross-sectional view of a portion of an alternating phase shift mask according to a conventional fabrication technique; and
FIG. 6 is a cross-sectional view of a portion of an alternating phase shifting mask according to an exemplary embodiment.
Referring to FIG. 1, a hard mask formation system 10 includes a chamber 12, a light source 14, a vapor source 16, an integrated circuit wafer supporting structure 18, and a computing device 20. Chamber 12 is an enclosed structure allowing for a vacuum,type reactor with gases as reactants in the formation of structures in integrated circuit fabrication. Light source 14 can be any laser producing mechanism capable of providing a light which is either a UV laser, or soft x-ray source where the UV laser can be an excimer source or a 4th harmonic of the Nd:YAG laser at 266 nm and the soft x-ray source can be between 100 nm and 1 nm or else a EUV source at 13.4 nm.
Vapor source 16 can be any vapor producing mechanism capable of providing a vapor which is a CVD vapor precusor to the material being deposited for the given reaction with the light at the substrate surface. In an exemplary embodiment, vapor material source 16 provides precusor chemicals for inorganic material, such as, SiO2 or Ni in vapor form for deposition by vapor phase epitaxy or other types of chemical vapor deposition (CVD). In alternative embodiments, vapor source 16 is a source of other types of chemical vapors.
Integrated circuit wafer supporting structure 18 provides support for an integrated circuit wafer 22. In an exemplary embodiment, integrated circuit wafer supporting structure 18 can be rotated to facilitate deposition of materials on integrated circuit wafer 22. In another exemplary embodiment, integrated circuit wafer supporting structure can be maneuvered in a variety of directions to facilitate hard mask fabrication and other integrated circuit fabrication steps. As used in this application, the term wafer refers to any substrate used in the integrated circuit fabrication processes or layer above such a substrate. The substrate or layer can be conductive, semiconductive, or insulative.
Computing device 20 can be a personal computer (PC) or a computer workstation coupled to a computer aided design/computer-aided manufacturing (CAD-CAM) data base 24. Computing device 20 is communicatively coupled to light source 14 to provide control signals which selectively move light source 14 to apply a laser or radiation to desired areas. In an exemplary embodiment, computer device 20 is a workstation or computer powered by a microprocessor manufactured by Advanced Micro Devices, Inc. (AMD) of Sunnyvale, Calif.
In operation, hard mask formation system 10 provides a chemical vapor precursor of an inorganic material, such as, Al, Ni, W, SiO2, Si3N4, or Al2O3 from vapor source 16. As such, chemical vapor is provided to chamber 12. Light source 14 provides heat or a photochemical reaction necessary to cause or achieve a reaction with the vapor chemicals in chamber 12. As such, deposition of the vapor chemicals occurs on integrated circuit wafer 22 where the radiation from light source 14 is provided. This deposition forms a hard mask on integrated circuit wafer 22 according to a pattern created by movement of light source 14 and the reaction of the radiation with vapor chemicals.
In an exemplary embodiment, instead of moving light source 14 to move laser light or radiation to different areas of integrated circuit wafer 22, wafer supporting structure 18 is selectively moved using any of a variety of means. In such an embodiment, integrated circuit wafer supporting structure 18 is in communication with computing device 20 which controls its movement. In another exemplary embodiment, light source 14 is moved using a precision motive device. Other mechanisms and arrangements for selectively maneuvering light source 14 may be utilized. In particular, various arrangements and utilities may allow for greater accuracy of movement of light source 14 to achieve precisely directed movement of light from light source 14.
Advantageously, instead of forming a blanket of the material of interest over the entire surface of integrated circuit wafer 22 and then etching the feature into a hard mask, hard mask formation system 10 makes it possible to use light to illuminate the surface of integrated circuit wafer 22 and form a reaction with chemicals in the gas phase such that deposition occurs. In an alternative embodiment, integrated circuit wafer 22 is coated with an assisting chemical, such as, an organosilane (e.g., (aminoethylaminomethyl) phenethyltrimethoxysilane (PEDA) or 4-chloromethylphenyltrichlorosilane (CMPTS)) which assists or facilitates the reaction between the light and vapor chemicals.
Utilizing hard mask formation system 10, dielectrics could be formed to serve as hard masks or, alternatively, metal lines could be formed for interconnect. The light from radiation source 14 can be controlled by computing device 20 utilizing CAD-CAM database 24 to pattern any of a variety of integrated circuit features. If metal lines are formed for an interconnect layer, a second application of light in selected areas can be used to form posts. Subsequently, the entire wafer can be covered with a dielectric material to form damascene in reverse order. Ordinary damascene involves etching an insulating layer with holes and trenches and then depositing metal in the holes and trenches so that interconnect lines are made in the insulating layer which connect to layers above and below the layer which was etched for the holes and trenches. This can be done in as many iterations as necessary to build up the layers necessary to connect the different sections of the integrated circuit device. In an exemplary embodiment, there can be up to 5 or more layers.
In a reverse application of damascene, interconnect lines and posts are formed and then the oxide or insulating material is applied over it. This can be done in multiple iterations to form all necessary layers for the IC as well. A film of Si3N4 can be deposited as a barrier liner over metal lines to prevent diffusion into the oxide.
Furthermore, in an exemplary embodiment, multiple sequential layers can be used to build up the back end of integrated circuit wafer 22 (utilizing hard mask formation system 10) in addition to just one layer for a hard mask or one layer for a metallic interconnect. As such, advantageously, hard mask formation system 10 may be utilized multiple times for a single integrated circuit wafer forming a variety of different masks or patterns used in the fabrication of the integrated circuit.
Referring now to FIG. 2, a top view of integrated circuit wafer 22 is illustrated after application of a laser from light source 14 to form hard mask structures 28. Hard mask structures 28 can be comprised of materials, such as, Al, Ni, W, SiO2, Si3N4, or Al2O3. Hard mask structures 28 can be utilized in the formation of metal lines, posts, gates, or any other integrated circuit feature including features used in intermediate steps of the integrated circuit fabrication process.
As discussed above, there is a push for development of next generation lithographic systems in many areas. One area is Extreme Ultra Violet (EUV) systems which employ 13.4 nm wavelength radiation. In an exemplary embodiment, photo assisted CVD described with reference to FIGS. 1-2 is used to create an attenuating phase shifting mask using a combination of Ni and Al as the absorbing phase shifters.
In an exemplary embodiment, one type of mask blank (an unpatterned mask) used for EUV lithography can be a reflecting mask constructed from a Si wafer over which a multilayer mirror is constructed from alternating layers of Si and Mo. On the surface of the multilayer, a buffer layer of 500 Å SiO2 is made to allow for defect repair and etch protection during feature patterning. Above the buffer layer, the features are normally deposited and patterned. After the features on the mask are patterned, the SiO2 layer is etched in areas other than the features to reveal the multi-mirror surface. FIG. 3 illustrates a portion 30 of an integrated circuit including a substrate 32, a multilayer mirror 34, a buffer layer 36, an aluminum layer 38, and a hard mask 40. In an exemplary embodiment, hard mask 40 is a Ni hard mask which is grown selectively by photon assisted CVD. Multilayer mirror layer 34 can be constructed from alternating layers of silicon (Si) and molybdenum (Mo). In an exemplary embodiment, there are 40 layers in multilayer mirror in total with each silicon (Si) layer being 4 nm while the molybdenum (Mo) layers are 3 nm. The 40 layers gives a mask blank with 65-70% reflectivity to the 13.4 nm EUV radiation.
The features of portion 30 can be completely absorbing which would result in an ordinary binary mask or they can be partially reflecting and 180� out of phase which would result in a phase shifting mask (in reflection) for the mask. The phase shifting mask (PSM) yields smaller critical dimensions (than a binary mask) at the wafer surface due to the interference effect between the high reflective EUV mirror mask surface and the partially reflecting surface of the mask feature. Normal optical PSM masks are partially transmitting with a 180� phase difference in the feature and a transmission level between 5 and 15%.
In an exemplary embodiment, the Ni in hard mask 40 and Al layer 38 serves as a partial reflector in portion 30. In an exemplary embodiment, the mirror surface with the SiO2 buffer layer 36 removed has a 65% reflectivity with phase of 180�. Thicknesses of the 40 layers of silicon (Si) and molybdenum (Mo) in multilayer mirror 34 can be 40 Å Si and 30 Å Mo. In an exemplary embodiment, the top of these 40 layers is covered with a 100 Å layer of Si as a cap. In the area of the reflector, 500 Å of SiO2 is used (buffer layer 36). Buffer layer 36 is first applied over the entire surface of the reflecting mask but etched and remains only under the features covered by the partial reflectors.
In an exemplary embodiment, two separate periods are used to demonstrate the Ni/Al partial reflector (hard mask 40 and Al layer 38): 1) Ni with 4� thickness of Al beneath and 2) Ni with 5� thickness of Al beneath. The reflectivity for selected thicknesses of Ni (with corresponding 4� or 5� thicknesses of Al beneath) give rise to phase differences from the mirror surface of 180� difference (0 degrees for the Ni/Al reflector) and relative percent reflectivity vs. the mask mirror reflectivity (65% absolute) of 13% to 2%.
Exemplary relative reflectivity values are provided in Table 1. Theoretical calculations using Fresnel coeffecients and the matrix propagation method as shown in O.S. Heavens: "Optical Properties of Thin Solid Films", Section 4.8, are used to calculate the reflectivity at the surfaces for the EUV reflecting mask shown here.
Thickness of NI
Thickness of Al
Relative Reflectivity
4X Al
25.2 Å Ni
100.8 Å Al
36.5 Å Ni
146 Å Al
47.5 Å Ni
190 Å Al
58.7 Å Ni
234.8 Å Al
70.3 Å Ni
281.2 Å Al
5X Al
21.5 Å Ni
107.5 Å Al
31.3 Å Ni
156.5 Å Al
40.8 Å Ni
204 Å Al
50.3 Å Ni
251.5 Å Al
59.9 Å Ni
299.5 Å Al
In an exemplary embodiment, to form the EUV reflecting mirror, Al layer 38 is blanket coated over buffer layer 36 using photon assisted CVD until a certain thickness of Al is reached. It is possible that by using the right level of light intensity (e.g. from light source 14), the thickness of Al could be controlled sufficiently to make the features for the PSM. Above the blanket layer (aluminum layer 38), the Ni layer (hard mask 40) is grown selectively by photon assisted CVD to form a hard mask and the Al and SiO2 beneath the Ni hard mask are etched. Al layer 38 could also be formed by PVD (physical vapor deposition) or other methods.
FIG. 4 illustrates portion 30 after an etching step has been performed in which portions of buffer layer 36 and aluminum layer 38 are removed. The thicknesses of hard mask 40 and aluminum layer 38 are variable. SiO2 can have a thickness of 500 Å. In multilayer mirror 34, silicon layers can have a thickness of 40 Å and molybdenum a thickness of 30 Å. Advantageously, the method described with reference to FIGS. 1-3 results in the creation of integrated circuit features of less than one minimum lithographic feature.
FIG. 5 illustrates a conventional alternating phase shifting mask 50 including a reticle substrate 52 and phase shifting features 54. In conventional systems, trenches are etched into reticle substrate 52 on one side of features 54. Typically, features 54 are chrome. Trenches 56 in reticle substrate 52 are positioned such that the phase is shifted with respect to the phase in reticle substrate 52 by 180 degrees.
Conventional alternating phase shifting mask 50, includes an opaque layer which is patterned into phase shifting features 54. In an exemplary embodiment, phase shifting features 54 are chrome (Cr). Many layers such as antireflects or other alternatives for the opaque materials could be used. To one side of the Cr feature on the mask, trenches 56 are etched so that in that region, a 180� phase shift is induced. The light from trenches 56 interferes with light of the same intensity but of opposing phase (0 phase) from the other edge of phase shifting feature 54. This interference is destructive due to the 180� phase difference so that the size of the feature is reduced. The reason that the signals can interfere is that phase shifting feature 54 is small enough on the mask that the light is diffracted and light from trenches 56 and phase shifting feature 54 is scattered so that each side has a tail that is interfering with the other side due to the 180 degree phase difference.
The depiction of a trench on one side and none on the other is exemplary schematic. Algorithms exist to generate the masks with the trench areas defined in other locations so to give the best phase shifting mask (PSM) effect.
FIG. 6 illustrates a portion 60 of a phase shifting mask in accordance with an exemplary embodiment. Utilizing photon assisted CVD as described with reference to FIGS. 1-4, additional material may be deposited on top of reticle substrate 62 and proximate opaque mask features 64. In an exemplary embodiment, opaque mask features 64 are opaque materials, such as, chrome. Additional material deposited in a position proximate to opaque mask feature 64 form phase shifting regions 66 which are configured to cause a 180� phase shift with respect to reticle substrate 62. Opaque mask features 64, such as, chrome represent opaque features for the mask to define a pattern.
In accordance with an exemplary embodiment, instead of etching out the trench, oxide material, such as SiO2, is grown selectively by photon assisted CVD on one side until the necessary thickness is achieved to induce a 180� phase shift between phase shifting regions 66 where the material is grown and the mask blank region (reticle substrate 62) which is left unchanged. The amount of material necessary is similar to the amount etched away in the conventional method described with reference to FIG. 5 since SiO2 is being deposited and the mask is made out of fused silica which is a form of SiO2. However, when depositing materials, there will be a difference in optical properties due to the exact density of the deposited material even though the layer may be chemically similar to the mask.
While the embodiments illustrated in the FIGURES and described above are presently preferred, it should be understood that these embodiments are offered by way of example only. Other embodiments may include, for example, different arrangements or numbers of laser or radiation sources as well as different vapor deposition mechanisms. The invention is not limited to a particular embodiment, but extends to various modifications, combinations, and permutations that nevertheless fall within the scope and spirit of the appended claims.
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|Citing Patent
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|Jul 10, 2002
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|International Business Machines Corporation
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|Enhancement of fabrication yields of nanomechanical devices by thin film deposition
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|Apr 29, 2008
|Applied Materials, Inc.
|Reticle fabrication using a removable hard mask
|Nov 9, 2007
|Jun 15, 2010
|Applied Materials, Inc.
|Method of reducing critical dimension bias during fabrication of a semiconductor device
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|May 17, 2002
|Feb 13, 2003
|Mandeep Singh
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|Jul 10, 2002
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|Sep 22, 2005
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|U.S. Classification
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|International Classification
|Cooperative Classification
|European Classification
|Nov 17, 2000
Owner name: ADVANCED MICRO DEVICES, INC., CALIFORNIA
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:GHANDEHARI, KOUROS;LAFONTAINE, BRUNO;SINGH, BHANWAR;REEL/FRAME:011294/0461;SIGNING DATES FROM 20001115 TO 20001116
|Dec 18, 2006
|Fee payment
Year of fee payment: 4
|Dec 28, 2010
|Fee payment
Year of fee payment: 8
|Dec 17, 2014
|Fee payment
Year of fee payment: 12


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PPI rising at an annual rate of 2.9 percent through October
November 17, 1999
For the first 10 months of 1999, the Producer Price Index for Finished Goods increased at a 2.9-percent seasonally adjusted annual rate (SAAR), after showing no change for the 1998 calendar year.
[Chart data—TXT]
Prices for finished goods other than foods and energy rose at a 0.9-percent SAAR for the first 10 months of 1999, after posting a 2.5-percent gain in the previous calendar year.
The index for intermediate goods increased at a 4.0-percent SAAR from December 1998 to October 1999, following a 3.3-percent decline during the 1998 calendar year. Prices for crude goods advanced at a 19.4-percent SAAR during the first 10 months of 1999, after a 16.7-percent decrease during all of 1998.
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A Practical Guide
Print book
Epilepsy is, after headache, the second most common neurological disorder. This book clarifies the many courses of action to take in treating patients with epilepsy. It presents current knowledge about seizures and epilepsy in a comprehensive, socially conscious, and clear manner. The editors have provided this information in a comprehensive, easy-to-use, and practical form.
This short, simple pedagogical guide to the diagnosis and management of epilepsy is an important reference work for all medical schools, hospitals, clinics, and primary care centers.


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Exercise Your Brain for Free
CCSF Older Adults semester-long course on Brain Fitness.
The brain is like any muscle in the body. The old saying "use it or lose it" really does apply. In this very social class you will exercise your brain in fun, challenging and creative ways to maintain and improve your cognitive vitality and your memory. We will also spend time conquering everyday memory challenges, such as remembering names and conquering "tip-of-the-tongue syndrome," as well as discuss the latest news on brain fitness. This course is appropriate both as a next step for those who have previously attended a Memory and Mental Fitness Program, as well as for first-timers.
- Mondays, January 14 - May 20, 2012
- (No class January 21, February 18, March 25, and April 1)
- San Francisco Public Library-Main Branch
Latino-Hispanic Room in the Lower Level
100 Larkin Street (at Grove and Market)
Accessible by several MUNI and BART lines
- FREE - Join us anytime!
- Simply attend the class, and fill out a registration form on site. If you would like additional information please contact Hope Levy at 415.931.8679 or email@example.com, or the Older Adults Department at 415.920.6021.
- Hope Levy has more than twenty years teaching experience, and is formerly the Acting Chairperson of the Older Adults Department at City College of San Francisco. She holds an MA in Gerontology and an MA in Special Education from San Francisco State University. Through her work, Hope promotes positive aging through her passion for lifelong learning.
- The Older Adults Department of City College sponsors this class in partnership with The San Francisco Public Library. The Older Adults Department of City College offers classes designed for adults 55 or older, but all are welcome to attend.
Próximos Eventos
- Computer Help for Adults/Seniors
- Miércoles 28 de Septiembre de 2016, 4:00 pmRichmond, Richmond: Sala de Reuniones
- Computer Help for Adults & Seniors
- Sábado 1 de Octubre de 2016, 2:00 pmChinatown, Chinatown: Zona de Computadoras
- Computer Help for Adults/Seniors
- Domingo 2 de Octubre de 2016, 2:00 pmPortola , Portola: Área Principal
Próximas Clases
- Online Job Search & Digital Economy Opportunities
- Martes 27 de Septiembre de 2016, 9:30 amBiblioteca Central, Centro de Alfabetización: Computadoras
- Book a Librarian in Russian
- Martes 27 de Septiembre de 2016, 10:30 amBiblioteca Central, Sala de Computadoras
- WeChat 101
- Miércoles 28 de Septiembre de 2016, 10:30 amSunset, Sunset: Área Juvenil


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Everything is a fast folder and file name search engine for Windows. Unlike Windows search this tool initially displays every file and folder on your computer. You type in a search filter to limit what files and folders are displayed.
- Fixed an issue with indexing deleted attributes in ReFS volumes
- Fixed an issue with indexing very large ReFS volumes
- Fixed an issue with indexing subst volumes
- Fixed an issue with inline renaming and focus wrapping
- Added option to remember search in bookmarks
- Added option to remember view in bookmarks
- Improved unicode normalization
- Improved open path command
- Improved tooltips
Reviewing 126.96.36.1992 Beta (Sep 30, 2015)
I'm using it since many years, and it's by far the absolute best search tool !!!
Reviewing 126.96.36.1996 (Jun 28, 2015)
The fastest search tool available as everyone else has pointed out. Deserves at least 10 stars! ;) (Agent Ransack isn't too shabby either)
Reviewing 18.104.22.1686 (Dec 23, 2014)
I've been using Everything for ~years~, and it's amazing how fast it is.
Reviewing 184.108.40.2066 (Aug 7, 2014)
Great software, but the author really needs to learn to wait at least 24 hours between releases. It seems there's a new release each time he changes one byte of bloody code!
Reviewing 126.96.36.1996 (Aug 6, 2014)
Everything is beautiful, in it's own way...
Everything-184.108.40.2061 is a beauty - but I cannot install it on Windows 7 - is there a shortcut or ea version for that?


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World's Biggest Soil Museum
By Express News Service - THIRUVANANTHAPURAM
Published: 02nd January 2014 09:45 AM
Last Updated: 02nd January 2014 09:45 AM
It's everywhere. Outside your home, on your feet, and sometimes - most exasperatingly - even in your shoes. Most of the time you barely give it a second glance and even if you do, it is with disdain. Soil. That's the theme of a museum opened by Chief Minister Oommen Chandy at the Central Soil Analytical Laboratory, Parottukonam here, on Wednesday.
Arguably the biggest of its kind in the world, the Soil Museum has on display eighty-two 1.5 metre-tall monoliths of benchmark soils found in the state. 'Benchmark soils' are those which are found extensively in a region, have a key position in the soil classification system and are of special significance to farming and engineering.
''This museum is the biggest of its kind in the world. The largest one so far, at the Wageningen University in the Netherlands, has only 32 monoliths on display. So our museum is surely of international standards,'' said Soil Survey Director P N Premachandran.
The 82 monoliths of the soil profiles have been arranged district-wise with detailed explanatory notes on each, including physical characteristics, the region of prevalence and uses in various sectors such as farming and engineering. For instance, seven benchmark soils from Thiruvananthapuram district are on display; Kazhakkoottam Series, Amaravila Series, Vellayani Series, Thiruvananthapuram Series, Nedumangad Series, Kallar Series and Ponmudi Series.
The Kazhakkoottam Series of soil is coarse and loamy and occurs along the coastal belt of the district. It is well-drained with a high water table during the rainy season. This type of soil is best suited for farming of coconut, vegetables and also for floriculture. Move to the eastern side of the district, and you find soil best suited for growing rubber, coconut, tapioca and pepper. This soil is classified as the Nedumangad Series. Then again, there is the Ponmudi Series where you find grasslands, tea plantations and forests. ''Kerala is rich in soils. Of the 12 soil orders in the world, eight are found in the state,'' said Premachandran.
Each monolith has been extracted and processed using a painstaking process that takes between two and three months. The museum has also on display rock and mineral samples, geological maps of the state and charts on geological time periods on rock formation and factors of soil formation.
The basic idea of the museum is to create awareness about the importance of caring for the soil as it is of great importance to farming and industry. For those people who glibly say ''why, it's just soil,'' the museum has an interesting tidbit on offer; ''it takes about 1,000 years to make an inch of soil. So let us conserve our soils for the present and for the future.''
Disclaimer: We respect your thoughts and views! But we need to be judicious while moderating your comments. All the comments will be moderated by the NIE editorial. Abstain from posting comments that are obscene, defamatory or inflammatory, and do not indulge in personal attacks. Try to avoid outside hyperlinks inside the comment. Help us delete comments that do not follow these guidelines.


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Robbie Rogers needs to be brave again on another freezing morning in east London. Even walking down the stairs to open the big black door to his apartment takes courage – for this is how the next stage begins. Once the door swings open he will be back on an emotionally bruising ride into the open...
Robbie Rogers: Why Coming out as Gay Meant I Had to Leave Football
From Guardian.co.uk
Use your ← → (arrow) keys to browse more stories


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I am a crocheter who loves to design mainly dolls and afghans although I've been known to come up with other things as well!
I take great pride in my patterns. I write them so that others ...
I am a crocheter who loves to design mainly dolls and afghans although I've been known to come up with other things as well!
I take great pride in my patterns. I write them so that others can easily create their own. All of my designs are tested by several people before they are released to try to catch any typos and to make sure it is as clearly written as possible.
I have been designing for several years and have been published numerous times. You might have seen my designs in a calendar, magazine or even in a booklet...
My main website is www.CraftyDeb.com but my patterns can be found online in several places. I also have a youtube channel where you can see some tutorials - http://www.youtube.com/craftydebdesigns
If you would like something designed, please let me know. I do requests :)
Remember those silly drawings that you probably did when you were a kid? You put your hand down on a piece of paper, draw around your hand and then you make it in to a turkey? That's what I did here.
Have your young one pick out the colors from your stash - even from your scrap bin since this is a scrap friendly project - and go wild with them! I stayed in more subtle colors but you can go to town with the colors! I've seen a lot of pictures of Hand Turkey Trios that others have made and they are just fun! If you have a picture that you or your young one has made, you can even try to duplicate it!
Most of all - have fun making your Hand Turkey Trio. I did!
This original CraftyDeb crochet amigurumi pattern is designed by Deb Richey.
All CraftyDeb patterns are for personal use only and not for resale or selling finished items online. They can be made for in person craft shows and fairs.
Your Craftsy purchase will also be made available for download on my main website at www.CraftyDeb.com.
There is no gauge given however the tighter your stitches, the less stuffing will show through. If you can see air between your stitches, use a smaller hook.


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Exadata And Optimized Systems: "We think the Exadata business is going to be huge—by huge, billions of dollars a year in new systems sales, not including the maintenance on those businesses. Now how long it takes us to get there remains to be seen but our overall view of the computer industry is we have been selling components to large customers and the customers have been hiring systems integrators to glue those components into complete systems." And here's his "overall strategy going forward":
"Our overall strategy right now going forward is not to sell those individual industry-standard components on their own but rather group them together into machines like Exadata, where we have processors, networking, storage, storage software, database software, our Oracle Enterprise Linux operating system—all as a complete database machine for both transaction processing and data warehousing. We think that makes it much easier for the customer—they don't have to buy all the individual parts and glue them together—but instead they buy the boxes: a high-margin product for us and a high-value purchase for them because they don't have to spend a lot of money on systems integration.
"We think that's the way customers are gonna go forward as they build their data centers: not buying components but buying systems like Exadata. And one of the big reasons we bought Sun is that we want to apply that same strategy to middleware, to applications, to the operating system itself: we're not gonna sell operating systems just for an individual computer, but we're gonna sell the next generation of Solaris that's gonna be a Cloud Edition of Solaris, where it manages a group, a cloud, a cluster of these computers that we sell together as a unit.
"That's highly differentiated: high-margin for us, and no systems integration for the customer. How big is that business? We think that's what the computer business is gonna look like for the largest customers going forward, so we think that's billions and billions of dollars. That is our business in the future." (End of excerpt.)
Ellison spoke in detail about his desire to exploit Sun's high-end engineering prowess rather than try to slug it out at the lower end of the market—and please note how he describes that Sun's technology provides the opening for Oracle to become a full-fledged player in the cloud-computing market:
"Since we're getting closer to closing the Sun deal, I'm going to talk a little bit about our strategy with Sun going forward: what we're not gonna do and what we are gonna do. One thing we recognize is that Sun does not really now and is never likely to have the volume to compete in the high-volume, low-margin business selling an Intel server with Windows on it or Linux on it one at a time. We think that high-volume, low-margin business is a good business, so long as you have high volume, and that's something Dell and HP are very good at and we're gonna avoid that business.
"Instead, we are pursuing the high-value, high-performance market:


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French Jewish Leader: Banning Circumcision Will end Jewish Life in Europe
French Jewish leader Richard Prasquier said that banning circumcision in Europe "would inevitably mean the end of Judaism" there.
"You can seek a ban but you need to understand the consequences: The inevitable disappearance of Jewish life from Europe," Prasquier on Thursday told a European Parliament conference on religious freedoms.
Pasquier has been president of the CRIF since 2007.
CRIF (Conseil représentatif des institutions juives de France) is an umbrella body comprising all French Jewish groups, that was originally created in 1944 under the Vichy Regime. Nowadays, this national federation, made up of 62 Jewish organizations, is the voice of the organized French Jewish community.
France has Europe's largest Jewish community, numbering between 500 and 800 thousand.
The conference, titled "Freedom of Religion and/or Mutual Respect in Europe," was jointly organized by the European Parliament and the European Jewish Association.
Prasquier said attacking circumcision "is telling Europe's Jews to pack their suitcases and leave" and that includes "Orthodox, traditional, or non-observant such as myself."
He was replying to a question by Diane Luquiser, one of the conference's 50 participants, who asked why Judaism could not "adapt to modern times" and abandon the practice "which hurts children."
Prasquier revealed he was circumcised 11 years after his birth in Poland in 1945.
"Circumcising me was a difficult decision for my father, a Pole who had to drop his pants when the Nazis caught him," he said. "That kind of difficulty is a reality which we would not like to see repeating itself."
Rabbi Menachem Margolin, director of the European Jewish Association – the Brussels-based organization behind the conference – said that allowing Jewish and Muslim rites is "necessary for mutual respect."
Over the past year, ritual circumcision of underage boys has been briefly banned in a Swiss hospital and in some Austrian hospitals after a court in Cologne ruled in June that such circumcision amounted to a criminal offense.
Last month, the German cabinet passed a draft law to permit ritual circumcision and clarify the legal situation.
JTA content was used in this report.Jewish Press Staff
About the Author:
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If you promote any foreign religions, gods or messiahs, lies about Israel, anti-Semitism, or advocate violence (except against terrorists), your permission to comment may be revoked.


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MMA Forum - UFC Forums - UFC Results - MMA Videos (http://www.mmaforum.com/forumindex.php)
- UFC (http://www.mmaforum.com/ufc/)
- - UFC 108 Bonuses (http://www.mmaforum.com/ufc/69680-ufc-108-bonuses.html)
UFC 108 Bonuses
As short as it was FOTN for me was Miller/Lauzon.
Daley shouldnt have gotten the bonus for not making weight (AJ @ 106 anyone?)
2 Attachment(s)
All well deserved imo (if it wasn't for the weight issue of Daley, I agree)
Really good fights tonight.
Didnt rumble not get a bonus for not making weight against Yoshida?
Yep, he didnt for that same reason.
Does anyone know, do they fine his bonus the same amount as his purse... the 20% or whatever it is?
they should
Plenty of great KOs without having to give it to Daley. Why not always come in over weight against an already-small opponent, the 25k will more than make up for your 10% docked pay.
JDS should have gotten it, after taunting Gilbert twice than knocking him out in two minutes... :praise01:
Yeah Junior should've got the bonus based on the fact Daley didn't make weight. Other than that I agree with all of them except that one.
Thats crap. Daley doesn't deserve that bonus. JDS should have earned it
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Insert-Name-Here Anime Club
Tuesday, November 18, 2014 | 6:30 pm - 8:30 pm
Join other fans of Bleach, Moon Phase, and obscure anime for a night of fun. Expect snacks, crafts, intense discussions, and watching anime. Ages 12-19. Drop in.
No Registration Required
This program will transition to the Ground Floor once it opens in 2015. Look for announcements at the Library and online at mcpl.info.
Chris Hosler
- Event Type:
Main Library Teen Program
- Location:
Program Room 2B
Notify me about similar events


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Receptionist (2) - part-time
- Employer
- Harry N. Abrams
- Location
- New York
- Posted
- May 20, 2013
- Closes
- Jun 19, 2013
- Contact
- Ms. Human Resources
- Category
- Publishing
- Duration
- Part Time
ABRAMS seeks two part-time receptionists (one morning receptionist from 8:30 AM - 1 PM; and one afternoon receptionist from 1 PM - 5:30 PM) to cover the main desk, attend to visitors, handle inquiries on the phone and in person, and provide information regarding ABRAMS to the general public, clients and customers. Individuals will be responsible for greeting persons entering the organization; answering main telephone, screening and directing calls; scheduling messengers; scheduling conference room bookings; providing information to callers; tactfully handling queries from the public and customers; and providing back-up clerical support on projects as assigned. Salary: $16/hour.Qualifications include a high school diploma; associate's degree preferred; minimum of 2 years' related experience; customer service orientation; excellent verbal communication skills; professional personal presentation. Knowledge of Microsoft Word and Outlook. Reliable attendance and punctuality is essential. Each individual must have the flexibility to cover the morning or afternoon schedule if needed.Please submit resume and cover letter indicating reception/morning or reception/afteroon in the subject line.


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Rent Martial Arts, Boxing, and Other Combat Sports 1st edition today, or search our site for other textbooks by Jason Page. Every textbook comes with a 21-day "Any Reason" guarantee. Published by Crabtree Publishing Company.
Need help ASAP? We have you covered with 24/7 instant online tutoring. Connect with one of our tutors now.


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It kind of represents my ex-boyfriend with who I'm still really close. And I just like the idea of a Rasta penguin, who seems to be singing 🙂 credits to Vincent Schiphorst for the picture
Copyright © 2016 Quadra Media, LLC. All rights reserved. Privacy Policy | Sitemap| DMCA Policy Notice


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Health care-associated Clostridium difficile infection and mortality rates grew in the past decade, according to the CDC. Seventy-five percent of these infections initially present in patients in nursing homes or after care in doctor's offices and clinics, while 25% present in hospital patients, according to the agency's Vital Signs report. The report highlights three infection-control programs that have helped cut C. diff rates at participating hospitals.
Full Story:Nurse.com, Family Practice News


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On the Business of the Blogsphere and Whether I Belong In It...
by Brenda
I'm not real sure where to start in on this topic. I have answers, but those answers only lead to more questions.
But I feel like the readers and past customers of Kidlet Occupation deserve to know why this blog and store, so very much alive 8 months ago, is now a ghost town of forgotten busy bags. And if anything will be done about it. And what will be done. And why.
First, I started this blog and store because I thought I was supposed to. I thought it was my job to be the ideal stay-at-home, blog business running, homeschooling mom. I thought that's what every capable stay-at-home mom was supposed to do, right? Be a conservative, frugal, entrepreneuristic {nice word, huh?} woman with pretty hair and makeup and happy kids.
Thing is: I'm not that person, even if I acted like it, I'm not. I'm not an entrepreneur, by any means. And I think I'm starting to be ok with that. You know, if everyone were an entrepreneur, there'd be no opportunity to entrepreneurize {what about that word?}.
I don't think the world was meant to be full of entrepreneurs. These people are very special people. They can take a dream, pen it down, and chase it for all it's worth. They can acheive that monetary goal {some for very noble reasons} and actually enjoy the process.
But I don't have a dream or a goal that involves loads of money. My dream is to simply enjoy my simple life. I don't need a business to do that. So, why am I trying to fit it in? I don't know... really. Except that for some reason, I assumed that's what I was supposed to do, cause you know, the blogsphere told me so {you know, the subconscious thoughts that perculate while you read blogs of women who "have it all together"}.
What does this mean for Kidlet Occupation?
Currently, Kidlet and I have a relationship that's more like a begrudged servitude. It is set up in a rigid, formal business fashion that is dragging me, kicking and screaming, along with it. When I get tired of it, I cut myself loose, only to feel guilty and thus tie myself back on again.
But there are actually some things about blogging that I love. I love to write. And I love to have people read what I write. I love to create printable stuff for my kids. And I love to share that with other people.
What I'd like to see is Kidlet and I carrying on a much more casual, happy partnership, where I am leading the blog and it assists me in writing and sharing - the things I love - when I ask it to. You know, like a man and his dog. It's a beloved friend and helper all at the same time.
What does this mean for you?
1. I will not be selling busy bags right now. I may have a friend who is willing to take over that part of the business for me, but she is in the middle of a cross country move and remodel, so that is on hold for a while.
2. I will continue to blog, but on my own time table. I know, I know... Blogging 101: Blog three times a week or lose your readers. Your blog will never acheive anything if you are not a consistent blogger. Whatever. Whatever. Blah. Blah. Blah. I would love to blog three times a week, I just know that it doesn't always happen, and right now, it's not top priority for me. I understand that my blog's readership will only grow in proportion to my blogging consistantency. I'm willing to accept that. I've proven that I can start an online fire that explodes bigger than I want. If I want it again, I imagine I could recreate it. {Though I don't see the sense in an unplanned bonfire. A controlled productive fire is a better idea, I would think.}
3. The feel of blogging may change. While finding and doing kid activities with my kids is something I love to do and love to share, it's not my writing passion. I will still share a lot of kidlet occupation sort of things, some busy bag ideas, a LOT of school activities, but there may be more things thrown in... randomness... realness. I'm no good at writing how to's. I sound like a haughty dork.
4. I will still continue to promote busy bag swaps. I still get several hundred hits everyday both on this blog and my personal blog for all things relating to busy bags, so the need and want for busy bag ideas and swaps is out there. If you would like to host a swap, please let me know. I can help you get started and get the word out.
5. I will open up this blog to you. There are SO many creative moms out there with SO many awesome ideas. I know this, because every idea I have ever had is almost always based in some way on an idea someone else had. If you have kid activity ideas or educational activity ideas, please please email me, and I will give you a spot as a guest blogger.
Last but NOT LEAST: It is not my goal to make money. If it happens, so be it. If not, I don't care. It is my goal to enjoy my blog and to enjoy such a creative blog world out there and to invite you to enjoy it with me.
{Oh, and yes, I'm still wanting to move this over to WordPress. I'm so stumped though. I'm used to the simplicty of Blogger. Google is my friend, though, so I reckon I can figure out how to manipulate the design.}
Preschool Busy Bag Swap Open
by Brenda
Lacey, from Sprouting a Little Nostalgia, is once again hosting a preschool busy bag swap.
Here are the cost details:
Registration: $15
Shipping to me: $15
Shipping to you: $15
Cost of project: Around $20 for all 20 bags (this is just an estimate)
You can check out the activities, dates, and how to's at her blog. Have fun!
Would you like to host a busy bag swap? Just drop me an email with the link to your swap post and the cost breakdown, and I will direct Kidlet Occupation's readers your way.
Need help getting a swap started? Email me, and I'll help you out.
A Summer at Home: Tin Foil River
by Brenda
Who knew 20 feet of tin foil, a garden hose, and a few pieces of foam could be so much fun? (Well, ok, up until the point where the argument began and mom put the fun to an end.)
I originally got the idea for the tin foil river last fall from Camo and Bows and promptly pinned it to my Pinterest board to bring out this summer.
This activity kept the kids busy for about an hour, until I just got tired of the fights over whose little foam "ship" won the race. (I really need to find a way to address this tendency to bickering.)
If you're thinking of trying it out, here's how we did it. We unrolled the entire roll in a line. (It works a little better if you have a slight slope in your yard.) We chose to put a curve in our river. Once it's rolled out, we bent up the sides. We had to find wooden blocks and other things to hold up the sides where it tended to leak. To fill up our river, we placed the garden hose at the top of the line and turned it on a slowish speed, but more than a trickle.
Here's what it will cost you:
A cheap roll of 20 feet foil from Walmart - approx. $1
1 hour or so added to your water utility bill
Creative brain cells to find small floatable items laying around
Have fun!
A Summer at Home: Park Hoppin' {free printable}
by Brenda
This summer, the kids and I are park hoppin'! How fun is that?! Well, a lot, actually!
Each Friday, if the kids have performed their morning routine (and I remember to have them do it) each day that week, we visit a new park.
We take note of the features of the park. Things like... is there picnic spots? Could we ride bikes here? Is there playground fun for all four ages (2, 3, 5, 7) and yet condensed enough that mom can keep an eye on everyone at once?
We've visited two new parks so far and look forward to checking out the many others in our sprawling town. We're on the lookout for the perfect park.
I've created a chart to keep track of all the parks we visit and the features they have. It is also my goal to take a group photo of the kids at each park. We'll see if I can remember.
If you'd like to park hop this summer, feel free to make use of our park hoppin' chart. (And if you live near Fort Wayne, drop me an email, and we can park hop together.)
Just for Moms: Guilt Series, Conclusion
by Brenda
Image from phillipmartin.info
I abandoned this series, many weeks ago, with this question:
Is not Proverbs 31 a Scriptural command for us women? Should we not strive to be that woman?
I think a lot of people completely forget that the virteous woman part of this chapter starts with verse 10, not one. The long description of the perfect wife is just another point in a mother's lecture to her son.
I mean, if you were telling your son what kind of woman to marry, wouldn't you also give a long list of good traits? It's not that you expect your son to find a woman who has no faults, but you would like him to marry a woman who was industrious, respectful, and loving. This is what King Lemuel's mother was saying.
"Lemuel, my son... marry a woman who will respect you, make you great, love your family, and care for you all the days of your life."
Yes, her list was a bit more specific, but I don't believe God ever meant for us to take that list and turn into a play by play demonstration of the perfect wife and mother.
We are not Lemuel's wife way back in the negative something hundred's. We are not Victorian women. We are not pioneers. We are not June Cleavers. We are not our friends or relatives or some other blogger.
We are exactly who we are in this decade, in this century, with our own families.
There's no need to set up some elusive super woman on a pedestal and strive to be her.
Respect. Build up. Support. Love. BE YOU!
That's all there is to it.
Be OK with that.
Did you miss the rest of the series? You can find the other posts below.
Guilt Series, Pt. 1
Guilt Series, Pt. 2
Guilt Series, Pt. 3


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cough for 1 month old baby
Hi my baby has a cough and flu and I dont want to give him any medicine.what would be the other alternative medication that i will give to him.thank you.
Started by Joan on 09/25/2014 in Welcome To Circle Of Moms!!
Last update on 09/25/2014 by Joan


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Hello and welcome to the latest edition of the Giant Bomb Community Spotlight, I am your host as always. Brad not only watched The International in person, but he also celebrated his birthday this week. Speaking of The International there are plenty of pictures of not just Brad enjoying the event, but also members of the Giant Bomb community. Special thanks to @matt for flipping the bird on @mattbodega. Things have calmed down as the Summer gaming drought has fully sunk in. @buzz_clik recently shared some concept art for his Gerstmannia t-shirt design. With that let's get on with the latest edition of the Giant Bomb Community Spotlight!
Clip of the Week
Someone on YouTube has compiled of every example of Jeff showing disgust of Dan's opinions in movies and games. I think we can at least partially agree that Dan is a monster.
Community Activities
- Giant Bomb Warframe PC Clan - Under New Management - Join Giant Bomb Heavy Industries Here!
- The Crew Community PC Closed Beta Hook-up Thread - Join Other Users in The Crew By Heading Over Here!
- Giant Bomb Community Premier League 2014/2015 Fantasy League - Join Other Users in Some Footie Over Here!
Wonderful Wikis
Giant Bomb is now your go to source on Don Bradman Cricket 14! No really check out our wiki page for the game. @bobafettjm did some great work on our Steam Trading Card wiki page, and you can thank @mento for taking the time to explain why Troddlers is all about. Ryu is fifty years old, so the least you could do is check out his wiki page. Finally some great work has been done on our recently added The Divide wiki page.
Best of Blogs
The top blog of the week comes from JadeGL who discusses why Super Mario Bros. 2 has a special place in her heart. A close second comes from billymagnum who converted his NES into an awesome looking guitar. tharrington has some awesome Barkerville fanart that you can check out below, but also support him on his blog. We have a record breaking number of multi-blog posters this week. thatpinguino provides a deep look into FTL, and has two introspective blogs on his hopes and relationship with the Kingdom Hearts franchise. Mento has a two part blog series in which he examines various game mechanics from the perspective of a former designer, similarly noahtheboa999 used Mega Man 2 as a case study for the evolution of game design and he shares his first impressions of Shovel Knight. CottoneUD finished finals for the latest part to his Persona 4 Golden let's play, and Video_Game_King topped anime with anime with a continuation of his Katawa Shoujo let's play and a blog on Lunar and Stafy 3. ChampInMaking extrapolates on why he thinks KOTOR 2 is objectively better than KOTOR 1, whereas TheYouthfuls talks about striking Shadow of the Colossus from his gaming backlog. Speaking of backlogs MooseyMcMan played catch up and burned through a number of his PlayStation Plus games. GrantHeaslip shares what it was like and why he digitally imported Project Diva 2. FLStyle wants you to join him in celebrating Ryu's 50th birthday. bonbolapti played a bunch of FFXIV and Soul Blazer this week, and Wess shares his detailed impressions of Contrast. MikeLemmer had the pleasure of spending more time on Outpost Taswell in Eve Online, whereas Raven10 questions if the season pass ruins the balance of Bioshock Infinite. Finally PerfidiousSinn talks about his various attempts to get into GTA Online, and bobafettjm has a new edition of his wiki update blog series.
- Choosing to be Someone Like Me - How it Gave Me a Voice Beyond the Game (By: @jadegl)
- Deep Look: FTL- Randomness (By: @thatpinguino)
- Trying to Articulate My Problems with Kingdom Hearts (By: @thatpinguino)
- My Kingdom Hearts Crossover Wish List (By: @thatpinguino)
- My NES-Guitar Project (By: @billymagnum)
- Welcome to Barkerville: Updated! (By: @tharrington)
- Lost Potential: A KOTOR Retrospective (By: @champinmaking)
- Thoughts on Shadow of the Colossus (By: @theyouthfuls)
- I (Digitally) Imported Hatsune Miku: Project Diva 2nd (By: @grantheaslip)
- Mento + The Mechanics: Part 1 [Part 2] (By: @mento)
- From the Moon and the Stars, This Blog I Deliver Unto You (By: @video_game_king)
- The Screenshot Ballad of Heartbreakin' Hisao Nakai. Episode 5: End of the Tropes (By: @video_game_king)
- PlayStation Plus Catch Up! (By: @mooseymcman)
- Happy 50th Birthday to Street Fighter's Own Wandering Warrior, Ryu! (By: @flstyle)
- Persona 4 Golden New Game Plus -- The Continuing Adventures of William Rikeru (Part 31 7/22/2014) [Part 30] (By: @cottoneud)
- Observations on Old Game Design (and Some Thoughts on Mega Man 2) (By: @noahtheboa999)
- Shovel Knight Thoughts: 1 Hour of Playtime (By: @noahtheboa999)
- Ganbare Bon: Game Related Things I've Felt Like Typing About (By: @bonbolapti)
- My Thoughts on Contrast (By: @wess)
- Season Pass Ruins Balance? (By: @raven10)
- 4 Weeks in Eve: Taswell vs the Russians (By: @mikelemmer)
- GTA Online: 100 Tiny Cuts (By: @perfidioussinn)
- Weekly Wiki Update - Saturday, July 19th 2014 (By: @bobafettjm)
Fantastic Forums
Be on the right side of history and vote Terminator 2 on the Terminator poll. It's important. In terms of games we have discussion threads for Gods Will Be Watching, The Walking Dead, and the latest DLC for Dark Souls II as well as Hearthstone: Curse of Naxxramas. Can you think of any hidden gems on Steam, well share them on our discussion thread for buried treasure on Steam. Finally vote on what your Dragon Age: Inquisition character will look like.
- The Terminator Poll (By: @wrecks)
- Gods Will Be Watching Discussion Thread (By: @mikaelboogart)
- Dragon Age: Inquisition Player Character Poll (By: @yummylee)
- Naxxramas Discussion (By: @fredchuckdave)
- Hidden Gems on Steam (By: @bad_karate)
- Dark Souls II Crown of the Sunken King DLC Discussion Thread (By: @drmechano)
- The Walking Dead Season 2, Episode 4 - Decision Discussion Thread (By: @andrewb)
Lovable Lists
Our list this week comes from bartok who wants to remind you that not all video games based on television shows are bad.
Useful User Reviews
- @junior_ain's review of Need for Speed: Undercover
- @plasticpals's review of The Divide: Enemies Within


text: As a community health center we offer basic general dentistry services to our patients to include restorative dentistry as well as preventative dentistry. The clinic works in collaboration with the University of Nebraska Dental College and often hosts dental and hygiene students who are nearly ready to graduate. Dr. Susan Alexander our dental director is a faculty member of UNMC.


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Related Searches: corning ware tea pot, corning tea pot, corning ware blue cornflower coffee pot, corning ware coffee pot parts
1 Results for Corning Ware Tea Pot in Perry Mi - Classifieds
Corning Ware detachable handle with lock and hanging ring. 7.5" longBlack Handle with Stainless EndNo chips or cracksMarked Corning Ware Pat No. 2,856,279Please view pictures for best description.Smoke/pet free inv 161 month ago on ebay.com
Results for Corning Ware Tea Pot in Perry, MI


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Greg Osby: A Candid Conversation
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Craftsman 208cc* Front Tine Tiller
$353.93 - $363.93
1 year parts and labor
Find Out More »
Tear Up New Ground with this Craftsman Front Tine Tiller Powered by a 208cc OHV Craftsman engine, the Craftsman 208cc front tine tiller runs cooler and ensures years of reliability and ultra-tough performance. Heavy-duty chain drive transmission has the power and durability to handle tough garden jobs. Adjustable tilling width from 12 in. to 24 in. gives you the ability to till wide rows or maintain between rows in less time. Four 12 in. steel heat-treated, standard rotating tines are great for cultivating, as well as for breaking hard ground. Featuring a standard-rotating front tine design, the front tine tiller is easy to operate for small or large gardens and flower beds. An adjustable padded plow style handle with rubber grips provide comfort and control while tilling or transporting. The easily adjustable depth stake allows for the user to control tilling depth and speed. Tines are designed to maximize cultivation in many soil types and are made from heat treated, hardened steel for long life.
- The Craftsman 208cc Front Tine Tiller powers through tough soil to rejuvenate seed beds
- Comes with a 2-year full warranty to protect your investment. Its 8-in rear wheels deliver better traction and easy maneuverability
- 208cc OHV Craftsman engine runs cooler for long-lasting life
- Adjustable 12 in. to 24 in. tilling width tills large areas in less time
- Adjustable depth stake for easy tilling depth adjustments
- Heavy-duty chain drive transmission is extremely durable and powerful
- Rubberized grips provide comfort and control while tilling or transporting
- Low-profile design lets you see your work area easier
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Are you Ji-Yong Ge?Claim your profile
Publications (3)
Article: Diagnostic accuracy of a questionnaire and simple home monitoring device in detecting obstructive sleep apnoea in a Chinese population at high cardiovascular risk[Show abstract] [Hide abstract] ABSTRACT: OSA is a common condition associated with cardiovascular (CV) morbidity. It remains underdiagnosed globally in part due to the limited availability and technical requirements of polysomnography (PSG). The aim of this study was to test the accuracy of two simple methods for diagnosing OSA. Consecutive subjects identified from a community register with high CV risk were invited to complete the Berlin Sleep Questionnaire and undergo simultaneous, home, overnight PSG and ApneaLink device oximetry and nasal pressure recordings. The relative accuracies of the Berlin Questionnaire, oximetry and nasal pressure results in diagnosing PSG-defined moderate-severe OSA were assessed. Of 257 eligible high CV risk subjects enrolled, 190 completed sleep studies and 143 subjects' studies were of sufficient quality to include in final analyses. Moderate-severe OSA was confirmed in 43% of subjects. The Berlin Questionnaire had low overall diagnostic accuracy in this population. However, ApneaLink recordings of oximetry and nasal pressure areas had high diagnostic utility with areas under the receiver operating characteristic curves of 0.933 and 0.933, respectively. At optimal diagnostic thresholds, oximetry and nasal pressure measurements had similar sensitivity (84% vs 86%) and specificity (84% vs 85%). Technical failure was lower for oximetry than nasal pressure (5.8% vs 18.9% of tests). In patients with high CV risk overnight single-channel oximetry and nasal pressure measurements may provide high diagnostic accuracy and offer an accessible alternative to full PSG.
Article: Left ventricular hypertrophy in relation to systolic blood pressure and the angiotensin converting enzyme I/D polymorphism in Chinese[Show abstract] [Hide abstract] ABSTRACT: Objective There is little population-based data on the prevalence and the environmental or genetic determinants of left ventricular hypertrophy (LVH) in China. The purpose of this paper is to study LVH in relation to systolic blood pressure and the angiotensin converting enzyme (ACE) insertion/deletion(I/D) polymorphism in Chinese. Methods We recorded 12-lead ECG (CardioSoft, v4.2) in 1365 residents in the Jingning County, Zhejiang Province, China. LVH was defined according to the gender-specific Sokolow-Lyon and Cornell product ECG criteria. Results Regardless of whether the Sokolow-Lyon or Cornell product ECG criteria was used, the prevalence of LVH (20.7% and 4.8%, respectively) significantly (P<0.0001) increased with male gender (odds ratio [OR] 2.33 and 7.15) and systolic blood pressure (per 10 mm Hg increase, OR 1.46 and 1.33). If the Sokolow-Lyon criteria was used, the prevalence of LVH was also influenced by alcohol intake (OR 1.44, P=0.03) and body mass index (OR 0.83, P=0.0005). The association between the Sokolow-Lyon voltage amplitude and the ACE I/D polymorphism was dependent on antihypertensive therapy (P=0.01). In 1262 untreated subjects, but not 103 patients on antihypertensive medication, the ACE DD compared with II subjects had significantly higher Sokolow-Lyon voltage amplitudes (29.8±0.6 vs. 28.0±0.5 mV, P=0.02) and higher risk of LVH (OR 1.74, 95% CI: 1.12-2.69, P=0.01). Conclusion LVH is prevalent in Chinese, and is associated with systolic blood pressure and the ACE D allele. The genetic association might be modulated by antihypertensive therapy(J Geriatr Cardiol 2009; 6:131-136) .
Article: Elasticity Indices of Large and Small Arteries in Relation to the Metabolic Syndrome in Chinese[Show abstract] [Hide abstract] ABSTRACT: The purpose of this study was to investigate the elasticity of large and small arteries in relation to the components of the metabolic syndrome in a Chinese population. Arterial elasticity indices were derived from pulse wave analysis based on a modified Windkessel model in 688 subjects, aged 33-65 years, who volunteered to participate in our study. The study population included 420 (61.0%) men and 433 (62.9%) hypertensive patients, of whom 197 (28.6%) took antihypertensive medication. Overall, the presence of the metabolic syndrome was 20.5%. In univariate analysis, both large artery elasticity index (C1) and small artery elasticity index (C2) were higher in men than in women (P < or = 0.008) and were inversely (P < or = 0.05) correlated with age, systolic and diastolic blood pressure (BP), pulse pressure, pulse rate, and plasma glucose concentration, and positively (P < 0.0001) correlated with body height and body weight. In men, smokers, compared with nonsmokers, had significantly lower C2 (P = 0.007), but they had similar C1 (P = 0.33). In adjusted analysis, patients with the metabolic syndrome, compared with those without, had significantly (P < 0.01) lower C1 and C2. In continuous adjusted analysis, both C1 and C2 were significantly (P < 0.0001) associated with systolic and diastolic BP, whereas in addition, C1 was also significantly associated with plasma glucose concentration (P = 0.007), and C2 with serum high-density lipoprotein (HDL) cholesterol (P = 0.02). Conclusions: The metabolic syndrome is indeed a risk factor for reduced arterial elasticity.
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Ruijin Hospital NorthShanghai, Shanghai Shi, China


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Fear of Developing Dementia
Date: February 28, 2013
Creator: Page, Kyle S.; Hayslip, Bert & Wadsworth, Dee
Description: This presentation is part of the faculty lecture series UNT Speaks Out on Alzheimer's disease and dementia. The presenter discusses his research into the fear of dementia.
Contributing Partner: UNT College of Arts and Sciences
UNT Speaks Out on Alzheimer's Disease and Dementia
Date: February 28, 2013
Creator: Lawrence, Samantha
Description: This poster introduces the faculty lecture series UNT Speaks Out on Alzheimer's Disease and Dementia. This series features Dr. Meharvan Singh, professor and chair of the Department of Pharmacology and Neurosciencea at the UNT Health Science Center, Dr. Bert Hayslip, regents professor in the Department of Psychology, and Kyle Page, a doctoral candidate in the Department of Psychology.
Contributing Partner: UNT Libraries
Risk Factors for Vascular Dementia
Date: May 2005
Creator: Cornett, Patricia F.
Description: Dementia is a devastating disorder that commonly affects people over the age of 65. Alzheimer's disease and vascular dementia are the most common forms of dementias. A number of studies have implicated cardiovascular risks as important factors in the development of dementia. These risks include high-risk behaviors such as smoking and risks related at least partially to health behaviors such as diet and exercise. This study examines a group of cardiovascular risk factors, as defined by the Framingham study, to ascertain if they are predictors of dementia. A retrospective chart review of 481consecutive patients seen in a geriatric medicine clinic produced a sample of 177 individuals diagnosed with dementia and 304 individuals without a dementia diagnosis. Relative risk ratio (RRR) results indicate that a history of hypertension (RRR= 1.80, p = .009) and a history of hypercholesterolemia (RRR = 1.85, p = .016) are significant predictors of Alzheimer's disease. A history of tobacco use (RRR = 2.18, p = .01) is a significant predictor of vascular dementia. Stepwise regression analyses indicate that hypercholesterolemia is an independent predictor of dementia (b = -.113, p = .009) and hypercholesterolemia (b = -.104, p = .018) and hypertension (b = -.094, p = ...
Contributing Partner: UNT Libraries
Caring for Yourself as a Caregiver
Date: February 28, 2013
Creator: Hayslip, Bert
Description: This presentation is part of the faculty lecture series UNT Speaks Out on Alzheimer's Disease and Dementia. In this presentation, Bert Hayslip, Regents Professor in the Department of Psychology, will discuss caregiving for Alzheimer's and dementia patients.
Contributing Partner: UNT College of Arts and Sciences
Proposed Therapeutic Art to Diminish Agitation in Elder Care
Date: May 2012
Creator: Curington, Bonnie Dearen
Description: This research study examines the decreased agitation level utilizing nonpharmacological therapeutic interventions in dementia patients, age 65 and older. The study examined the following question: Will a therapeutic art program diminish agitated behaviors in persons diagnosed with dementia, aged 65 and older? In this quasi-experimental research design, the sample consisted of 19 participants in 3 groups, selected using these criteria: must be receiving services from a long term care facility, be diagnosed with dementia, display agitated behaviors, and be age 65 and older. This research measures the reduction of agitated behaviors in demented patients with the use of a therapeutic art program. The therapeutic art group pretest, midtest and posttest means were separated into Factor 1: aggressive behavior, Factor 2: physically nonaggressive behaviors, and Factor 3: verbally aggressive behavior. A multivariate analysis of covariance (ANCOVA) was conducted on the data for Factor 1, Factor 2, and Factor 3. The ANCOVA was not statistically significant for Factor 1. The ANCOVA indicated statistically significant findings when using a one tailed test for Factor 2 and Factor 3. The ANCOVA indicated statistically significant findings using a two tailed test for overall agitation. These findings inform professionals about the efficacy of therapeutic art programs ...
Contributing Partner: UNT Libraries
Development of a Differential Neurocognitive Profile for Alzheimer's Dementia and Vascular Dementia
Date: August 2013
Creator: Hill, Jonathan
Description: Alzheimer's Dementia (AD) is among the most common diseases in the Geriatric population, and its prevalence is expected to quadruple by 2047.Vascular Dementia (VaD) is the second most frequent cause of dementia, with studies indicating VaD accounts for 10-20% of dementia cases across the globe. A diagnostic model differentiating AD and VaD would be clinically and scientifically valuable, considering the treatment approaches for these conditions are different. Although there are differences between AD and VaD on their neuropsychological profiles, a diagnostic model that successfully differentiates AD and VaD on neuropsychological testing has not been developed, despite previous attempts. Our study addresses this gap in the literature by examining two diagnostic models used to predict the conversion of AD from mild cognitive impairment, and a third model was proposed to differentiate AD from VaD. We conducted ROC Analyses using the variables LM II Standard Score, Animals Total, and CDRS Sum based on a previous diagnostic model. The sensitivity and specificity for the diagnosis of mild VaD were calculated for all possible scores of each test measure. The Animals Total cutoff score of 7 achieved excellent sensitivity and specificity, receiving 96% and 92%, respectively. In this sample, patients who could name at ...
Contributing Partner: UNT Libraries
Factors of the Geriatric Depression Scale that may Distinguish between Four Cognitive Diagnostic Groups: Normal, Mild Cognitive Impairment, Dementia of the Alzheimer's Type, and Vascular Dementia
Date: December 2009
Creator: Cornett, Patricia F.
Description: The purpose of the current study was to explore the relationship between cognitive status and depression in a sample of geriatric patients. Participants included 282 geriatric patients ranging in age from 65 to 96 years who were classified according to diagnosis as: DAT, VaD, MCI, and Norm. All were referred for neurocognitive testing from the Geriatric Assessment Program (GAP) at the University of North Texas Health Science Center (UNTHSC) in Fort Worth, Texas. This study sought to identify factor structures for two versions of the GDS using a geriatric sample of cognitively impaired and intact patients. It then compared these factors to each other to determine whether the GDS-15 is truly a shorter version of the GDS-30. These were then compared to a previously determined factor structure. This study explored whether the four-factors of the GDS-30 are able to differentiate cognitive diagnostic groups. Further, this study sought to identify whether the severity of cognitive decline impacted GDS factor score for each of the cognitively impaired groups. Results revealed a two-factor model of the GDS - 15 and a four-factor model with the GDS - 30. The GDS-15 factors did not differ from the first two factors of the GDS-30. Comparison ...
Contributing Partner: UNT Libraries
Differential Scoring Patterns on the Clock Drawing Test: a Comparison of Vascular Dementia and Alzheimer's Dementia.
Date: May 2006
Creator: Everitt, Alaina
Description: This study examined differences in scoring patterns among those diagnosed with Alzheimer's dementia and vascular dementia on the clock-drawing test. Archival clock drawing data was retrieved on 279 patients presenting at a county hospital-based memory clinic. Analysis of drawings was based on frequency of qualitative errors, as well as an overall quantitative score. Mean comparisons found those patients with Alzheimer's dementia to perform worse on both quantitative and qualitative scoring measures. However, Pearson's chi-squared test revealed a significantly higher rate of spacing errors among subjects with vascular dementia. Such lends support to my hypothesis that impaired executive functioning in vascular dementia patients would lead to poor qualitative performance. Logistic regression found significant predictive ability for the qualitative criteria in diagnosis (χ2 = 25.49, p < .001), particularly the rate of omission (z = 8.96, p = .003) and addition errors (z = 7.58, p = .006). Such findings hold important implications for the use of qualitative criteria in cognitive screening assessments.
Contributing Partner: UNT Libraries
HIV-Associated Dementia: Cofactors as Predictors of Severity of Neurocoenitive Deficits
Date: December 1996
Creator: Anderson, Deborah E. (Deborah Elaine), 1967-
Description: The objective of the present study was to evaluate the relationship between a set of cofactors and severity of cognitive impairment, to determine if there were any factors which significantly predicted more severe neurocognitive deficits in persons with AIDS. Twenty-four male volunteers recruited from community groups and physician referrals participated. Subjects completed several self-report questionnaires eliciting information regarding demographics and risk factor variables, in addition to a comprehensive battery of neuropsychological tests. A severity of cognitive impairment summary score was computed for each subject, reflecting both the number of impaired tests and their distance in the impaired direction from normative data. Neither CD4 count, number of months since diagnosis of AIDS, number of AIDS-related illnesses, number of recent stressors, history of head injury/LOC, history of substance use, current or past psychiatric disorder, history of learning disability nor history of other medical illness were found to be significantly related to severity of cognitive impairment in this sample, after controlling for the effects of age, level of education, estimated premorbid IQ and mood status. However, no reliable conclusions could be drawn from this study because the small sample size resulted in an unacceptably low level of statistical power for the desired regression ...
Contributing Partner: UNT Libraries
Association Between Folate, Vitamin B12 and Cognitive Performance in Demented Elderly.
Date: August 2008
Creator: Serova, Svetlana
Description: Dementia is prevalent among elderly people. As the world population ages, it is projected that the number of people affected by dementia may triple in the next 50 years. Over the last two decades, research has focused on identifying potentially modifiable risk factors in development and progression of dementia, such as vitamin B12 and folate. Results concerning the effects of low folate and vitamin B12 on cognitive performance are mixed. The main objective of the present study was to investigate the effects of vitamin deficiency on cognitive functioning in a clinical sample of elderly individuals with cognitive problems using a comprehensive neuropsychological assessment. A retrospective chart-review was performed on the 102 records of patients from the Geriatrics Clinic at the University of North Texas Health Science Center who presented with cognitive deficits. Charts were reviewed to obtain data on vitamin supplementation, vitamin status, history of chronic conditions and other biochemical data. The available database was used to obtain data on neuropsychological assessment. The study demonstrated mild association between vitamin B12 and folate status and cognitive deficits. There appeared to be a higher cut-off level that is above the traditionally used levels for vitamin B12 and folate deficiency concentrations at which ...
Contributing Partner: UNT Libraries
Distress and Causal Attributions Associated with Caring for Family Members with Senile Dementia
Date: August 1993
Creator: Henschel, Peter W.
Description: None
Contributing Partner: UNT Libraries
[Transcript of letter from Josephus Moore to Charles Moore, April 8, 1865]
Date: April 8, 1865
Creator: Moore, Josephus C.
Description: Transcript of a letter from Josephus Moore to Charles Moore about family health and a marriage.
Contributing Partner: UNT Libraries Special Collections
[Letter from Josephus Moore to Charles Moore, April 8, 1865]
Date: April 8, 1865
Creator: Moore, Josephus C.
Description: Letter from Josephus Moore to Charles Moore about family health and a marriage.
Contributing Partner: UNT Libraries Special Collections


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Prices, specials, features and availability subject to change.
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Surrounded by a mature oak tree canopy, Briarcrest at Winterhaven is centrally located in the heart of Downtown Winter Haven, offering our residents unparalleled convenience, superior amenities, affordable rental rates and the largest apartments in the area! This charming community is just steps from endless shopping options, restaurants, hospitals, banks, major employers and entertainment venues, yet offers the unique feeling of being tucked away in a relaxing setting. You'll love calling Briarcrest at Winter Haven your New Home!
12 Month Lease Term
Pet Policy: LARGE PETS WELCOME (breed restrictions apply)
Breed Restriction. Call for service animal policy.
460 units
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The apartments are large by today's standards, and the management team is very quick to respond to all request Read Mores we have made. The laundry facilities are well kept and well placed. I observe constant 'policing' of the grounds for debris and trash. The property is well located for shopping and to restaurants.
November 17, 2015
Thank you for taking the time to provide our community with such positive feedback. We're glad to hear that you are enjoying our spacious floorplans, dedicated team and convenient location! As always, if there is anything that we can assist you with, please don't hesitate to reach out to us here in the office.
There are so many upgrades that need to be done in the apartments (kitchens all cabinets) just as one example. Read More They are falling apart. Front doors leading into the stairwells slam shut all the time. Bad for downstairs residence. All outlets need replacing. Etc...
October 27, 2015
Thank you for this valuable feedback. While we're disappointed to have only earned two stars at this time, we'd like to take it as an opportunity to help improve your situation, as well as our community as a whole. If you haven't already, we highly encourage you to contact us in person and schedule a meeting at your earliest convenience. We're more than willing to have our team take a look at any areas you believe require special attention.
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Saturday: 10:00am-5:00pm
Sunday: Closed
Robbins Property Associates
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