text:
|Publication number
|Publication type
|Application number
|Publication date
|Oct 12, 1999
|Filing date
|Jul 28, 1997
|Priority date
|Jul 26, 1996
|Fee status
|Also published as
|Publication number
|Jean-Christophe Rostaing, François Coeuret, Claude de Saint Etienne, Michel Moisan
|Original Assignee
|L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (7), Referenced by (51), Classifications (16), Legal Events (4)
|External Links: USPTO, USPTO Assignment, Espacenet
(i) Field of the Invention
The present invention relates to a process for the treatment of perfluorinated gases, in particular perfluorocarbons, as well as to hydrofluorocarbons, for the purpose of destroying them, as well as to a treatment apparatus implementing such a process.
The reduction of gaseous emissions caused by human activity, which are believed to be able to contribute to global warming of the climate by an increase in the greenhouse effect, is currently a major preoccupation of international proceedings. The drafting of directives and recommendations within each country, harmonized within the framework of worldwide conventions, is presently at a relatively advanced stage. The States involved could, in the relatively near future, as a next step, adopt mandatory statutory measures.
Currently, the attention of industrial concerns and governments is essentially focused on the most well-known greenhouse-gas species, namely carbon dioxide (CO2), the amount of which discharged and the concentration of which in the atmosphere are by far the greatest.
However, other gases may also make an equally important contribution to possible warming of the climate, although the volumes of these which are discharged are smaller than those of CO2 by several orders of magnitude. These are the perfluorinated compounds (PFC) and hydrofluorocarbon (HFC) compounds, since these gases have lifetimes in the atmosphere and absorptions in the infrared which give rise to a "global warming capability" which may be several orders of magnitude greater than that of carbon dioxide.
Thus, carbon tetrafluoride (CF4) only exists in the Earth's atmosphere at an average concentration of approximately one part per million (ppmv) compared to 300 to 400 ppmv in the case of CO2. However, its lifetime in the atmosphere is estimated to be approximately 50,000 years compared to 100 in the case of CO2, while its absorption in the infrared is considerably higher.
The situation with regard to these gases is also special because of their widespread use in the semiconductor industry. They are used for plasma etching the patterns in integrated circuits and, above all, for cleaning, also using a plasma, thin-film deposition reactors. They are not completely consumed in these processes and give rise to residual emissions which are far from being negligible.
Compared to many other sectors, the microelectronics industry was aware very early on of the problem of gaseous-effluent reprocessing. There are several reasons for this state of affairs, one of which is the spectacularly dangerous nature of some of the substances involved--very high toxicity, highly corrosive and damaging nature with regard to the respiratory tracts, inflammability and explosiveness. It is therefore quite understandable that this industry is also the first to be concerned about limiting the discharges of perfluorinated and hydrofluorocarbon greenhouse gases which represent a potential hazard of a completely different nature, these being in general not very reactive and having a low to zero toxicity.
Furthermore, certain producers of these gases have chosen as of now to take initiatives which are restrictive vis-a-vis their customers, anticipating the predictable outcome of the official regulatory framework, for example by no longer supplying users who do not take the appropriate measures to destroy or recover a minimum amount (for example 80%) of the unreacted C2 F6 emanating from process machines.
Consequently, integrated-circuit manufacturers are currently seeking to find a quick solution to the problem of reducing emissions of C2 F6 and, more generally, of all the PFCs and HFCs.
The idea of an intermediate step consisting in preferably using, in processes, molecules which, among this range, have the lowest global warming capabilities is completely illusory.
This is because the choice of a molecule for a particular process, etching or reactor cleaning, is governed by its specific properties. Only very few conceivable replacements exist, especially with regard to cleaning which today is the application involving the highest consumption of active gases and for which C2 F6, C3 F8 and NF3 appear almost uncircumventable for reasons of rapidity of the process.
It is therefore in all cases necessary to envisage either destroying or recovering the perfluorinated and hydrofluorocarbon gases which have not reacted in processes and which would otherwise be discharged into the atmosphere.
(ii) Description of the Related Art
Several solutions exist which, a priori, are conceivable for destroying PFZs and HFCs, these having reached different levels of maturity from the technical and commercial standpoint.
At the present time, only pyrolytic destruction using a burner has been achieved on an industrial scale using equipment available on the market.
In these systems, the molecule to be destroyed is thermally decomposed by means of the heat supplied by the combustion of natural gas and/or hydrogen. After decomposition, the fluorine is in the form of very reactive acidic chemical species, in particular HF, which is then very easy to destroy by reaction with an alkaline aqueous solution.
This technique is widely used at the present time. However, it has many disadvantages.
Like any process of combustion in air, it generates nitrogen oxides which are themselves harmful to the environment and which form, or will form, the subject of specific regulatory limitations with regard to their emissions. Moreover, if the combustible gas is natural gas, large quantities of CO2 will be generated.
The potential of global warming of the atmosphere thus produced is very much less than that of the fluorinated gas which is destroyed. However, many authors think that this CO2 emission is a dissuasive element in the dissemination of technology, in particular because the regulations regarding carbon dioxide are changing more rapidly than those regarding PFCs and HFCs.
In fact, natural gas is only used in part, or even not at all, for destroying PFC and HFC compounds since, in order to achieve high destruction yields (95 to 99%), especially in the case of the most stable compounds such as SF6 and CF4, it is necessary to burn hydrogen, and to do so in large quantities. Of course, this raises problems of cost and, to an even greater extent, of safety, greatly limiting the advantage to potential users.
In order to help to overcome these drawbacks, it has been envisaged to treat PFCs and HFCs by thermo-chemical decomposition over a solid, or even by pure and simple complete reaction with this solid. However, these molecules are highly stable, which singularly restricts the range of conceivable materials, and the necessary temperatures in general remain high.
The only promising results have been achieved using catalysts based on extremely expensive noble metals. More common solids capable of providing realistic destruction efficiencies, as is the case with other molecules for which satisfactory commercial systems exist, have not yet been identified.
Faced with the difficulty posed by the destruction of perfluorinated compounds and hydrofluorocarbons, it is possible to envisage another way of reducing the emissions thereof, namely the recovery of these substances after separation from the effluent mixture emitted by the process reactors. In fact, this technique is not completely concurrent with destruction. Indeed, the technological choices may be influenced by certain factors relating, for example, to regulatory constraints or to the professional practices in the country in question.
Thus, in the United States, semiconductor fabrication plants generally include a centralized system for collecting and treating the gaseous effluents, while in Japan the practice is moving more in the direction of small treatment systems close to the point of emission.
However, the known recovery technologies are profitable only in the case of large outputs and are particularly suitable for centralized approaches.
Moreover, it is presently not known how to realize destruction systems in the case of high outputs. The concepts of destruction and recovery are complementary and must be developed in parallel.
There is therefore, whatever the circumstances, a need for destruction systems which are more effective, less expensive and less restrictive than hydrogen burners.
The object of the invention is to help to overcome the drawbacks of the known processes for the treatment of PFC and HFC gases and to provide a process for the treatment of perfluorinated and hydrofluorocarbon gases, for the purpose of destroying them in order to reduce the emissions of these gases into the atmosphere, which is inexpensive and relatively easy to implement.
The subject of the invention is therefore a process for treating perfluorinated and/or hydrofluorocarbon gases, which includes the steps consisting in:
creating an atmospheric-pressure plasma in at least one hollow dielectric tube;
making said gases to be treated flow through said at least one dielectric tube in contact with said plasma for the purpose of dissociating the molecules of which said gases are composed in order to form reactive compounds, especially fluorinated compounds; and
making said reactive compounds formed react with a corresponding reactive element for the purpose of destroying them.
The process according to the invention may furthermore include one or more of the following characteristics:
the step of creating the gas plasma consists in making a carrier gas flow through said dielectric tube and in exciting and ionizing said carrier gas by means of the electric field of a traveling electromagnetic surface wave moving through said carrier gas and through said dielectric tube so as to create a column of plasma which is not in local thermodynamic equilibrium;
the surface wave is produced by means of a surface-wave exciter of the surfatron-guide type;
said carrier gas consists, for example, of argon;
the perfluorinated gases are chosen in particular from CF4, C2 F6, C3 F8, SF6 and NF3 and the hydrofluorocarbon gases are chosen from CHF3, CH2 F2, C2 HF5 and C2 H2 F4 ;
the process furthermore includes a step of mixing the gases to be treated with at least one assistant gas, prior to said step of making said gases flow through said at least one dielectric tube;
the assistant gas consists of oxygen;
said step consisting in making said reactive compounds react with said corresponding reactive element consists in making the reactive compounds react with a reactive element chosen from soda lime, water and an alkaline aqueous solution.
The subject of the invention is also an apparatus for the treatment of perfluorinated and/or hydrofluorocarbon gases, for the purpose of destroying them, for the implementation of a treatment process as defined hereinabove, which includes at least one high-frequency surface-wave exciter combined with a waveguide designed to guide the waves produced by said at least one wave exciter to at least one hollow dielectric tube supplied with a carrier gas in order to create therein an atmospheric-pressure plasma and through which said gases to be treated flow, the molecules of said perfluorinated and/or hydrofluorocarbon gases being dissociated within the plasma in order to form reactive compounds, in particular reactive fluorinated compounds, and at least one treatment unit for said reactive compounds which is arranged on the exit side of a corresponding hollow dielectric tube.
The apparatus according to the invention may furthermore include one or more of the following characteristics:
each surface-wave exciter is equipped with a cylindrical sleeve made of conductive material, inside which is mounted a corresponding dielectric tube, and includes a region for concentrating the incident waves in a space lying between the internal wall of said exciter and a free end of said sleeve for the purpose of creating therein an electric field coaxial with said tube;
said sleeve includes an inner cylinder in which said dielectric tube is mounted and an outer cylinder which, with said inner cylinder, delimits a cooling chamber supplied with a liquid coolant;
since said sleeve and said discharge tube are separated by a cylindrical space, the apparatus includes means for supplying said space with a gaseous coolant;
said hollow dielectric tube consists of the combination of two hollow dielectric tubes proper which are arranged coaxially and between which is left a cylindrical chamber supplied with carrier gas, said perfluorinated and/or hydrofluorocarbon gases flowing through the inner tube;
as a variant, the dielectric tube is made of a material insensitive to the excited fluorinated species, in particular made of a ceramic such as alumina;
the apparatus furthermore includes a silica tube coaxial with said dielectric tube and between which tubes a coolant flows;
each surface-wave exciter is provided with impedance-adjustment means which include a coaxial plunger forming a quarter-wave trap spaced apart from the wall of the outer cylindrical sleeve in which the plunger slides;
the wall of each surface-wave exciter, close to the incident-wave concentration region, is thinned down;
said at least one treatment unit for said reactive stable compounds each consist of a soda-lime cartridge;
the apparatus includes at least two high-frequency surface-wave exciters placed in series, at least two treatment units for said reactive gases, in particular reactive fluorinated gases, each arranged on the exit side of a corresponding exciter, and at least one dehydration unit inserted between said at least two exciters;
said surface-wave exciters each consist of an exciter of the surfatron-guide type.
Other features and advantages will emerge from the following description, given solely by way of example and with reference to the appended drawings.
FIG. 1 is a diagrammatic view of an apparatus for the treatment of perfluorinated and hydrofluorocarbon gases according to the invention;
FIG. 2 is a longitudinal sectional view of a plasma exciter and of the associated treatment reactor;
FIG. 3 is a cross section on the line III--III of one element of the reactor in FIG. 2;
FIG. 4 is an infrared spectrum of a gas mixture as it leaves the dielectric tube, showing the decomposition of SF6 ;
FIG. 5 is an infrared spectrum of the gas mixture in FIG. 4 as it leaves the soda-lime cartridge, showing the residual composition after treatment;
FIG. 6 is an infrared spectrum of a gas mixture as it leaves the dielectric tube, showing the decomposition of C2 F6 ;
FIG. 7 is an infrared spectrum of the gas mixture in FIG. 6 as it leaves the soda-lime cartridge, showing the residual composition after treatment;
FIG. 8 is a longitudinal sectional view of a plasma-generating reactor according to another embodiment; and
FIG. 9 shows an apparatus for the treatment of perfluorinated and hydrofluorocarbon gases according to another embodiment.
FIG. 1 shows diagrammatically an apparatus for the treatment of perfluorinated gases, in particular perfluorocarbon gases, as well as hydrofluorocarbons, for the purpose of destroying them.
The object of this apparatus is to place a gas to be treated in an electric field sufficiently intense to produce an electrical discharge by ionization of the gas, through the stripping of electrons from the initially neutral gas molecules.
Under the action of this discharge, the gas molecules are dissociated and form radicals, of smaller size than the initial molecules, and, consequently, individual atoms. Furthermore, new molecules or new molecular fragments are formed which have chemical properties different from those of the initial molecules.
This apparatus is intended to be mounted, for example, downstream of an integrated-circuit fabrication plant for the purpose of treating the PFCs and HFCs and, in particular, of converting these scarcely reactive gaseous effluents into reactive compounds capable of being treated using a conventional technique for the destruction of acid effluents, such as treatment in an alkaline medium, either in solution or in solid form.
In order to achieve this conversion, the apparatus according to the invention includes a high-frequency field applicator device, denoted by the numerical reference 10, consisting of a surface-wave exciter, for the purpose of generating a plasma, in order to convert the gases to be treated into corresponding reactive gases, in particular reactive fluorinated gases, and a soda-lime cartridge 12 which destroys the gases converted by the plasma-generating device 10.
The apparatus includes, associated with the high-frequency field applicator 10, a microwave generator 14, a discharge tube 16, through which the gaseous effluent to be treated and a suitable carrier gas flow and in which the plasma 17 is created, as well as a waveguide 18.
The high-frequency field applicator consists of an applicator of the surfatron-guide type which, in combination with the waveguide 18, guides the microwave radiation created by the microwave generator 14 to the discharge tube 16.
In the example in question, and as shown in FIG. 1, the carrier gas consists of argon (Ar) and the gaseous effluent to be treated is SF6.
FIG. 1 also shows that the discharge tube 16 is arranged in a sleeve 20, made of conductive material, the structure of which will be described in detail with reference to FIG. 2. It is connected downstream, with respect to the direction of flow of the gases, outside the field applicator 18, to a line 22 for conveying the converted gases to the cartridge 12.
FIG. 1 also shows that the line 22 includes two branch-off units 30 and 32 which are controlled by corresponding valves 34 and 36 and on which are mounted, in a sealed manner, sampling cells 38 and 40 for the purpose of analyzing the gases using Fourier transform infrared spectrometry.
These cells are "SPECTRA-TEC" single-passage-type cells having a length of approximately 100 mm, giving a detection limit which is amply sufficient for the envisaged application.
It should be pointed out that the line 22 is made entirely of Teflon® PFA, a polymer extremely resistant to corrosive substances. This is because the lifetime of metallic components, including stainless steel of the 316L type, is very short under the envisaged conditions of use.
The assembly consisting of the waveguide 18 and the discharge tube 16 will now be described with reference to FIGS. 2 and 3.
As mentioned previously, the waveguide 18 is associated with the surfatron-guide applicator 10.
The surfatron-guide 10 includes a first part 42, forming a waveguide proper and intended for propagating the microwave radiation which is guided by the waveguide 18 and incident in the direction denoted by the arrow F in FIG. 2, and an impedance-matching second part composed of two elements, a first element 44, coaxial with the discharge tube 16 and called hereafter the coaxial part, and the waveguide plunger 46 shown in FIG. 1.
Moreover, the coaxial part 44 is in the form of a cylinder in which is mounted, so as to be able to move axially, a tuning plunger 48 coaxial with the discharge tube 16 and forming a quarter-wave trap. The plunger is fixed to a sliding washer 50 advantageously made of Teflon®.
The surfatron-guide 10 is furthermore provided with means for controlling the adjustment of the axial position of the plungers 46 and 48, these means consisting of rods 52 and 54 which can be operated manually by a user for the purpose of impedance-matching the microwave-generator/waveguide system to the surfatron-guide/plasma system by moving the tuning plunger 48 and the short-circuiting plunger 46.
It should be pointed out that the coaxial plunger 48 provides contactless short-circuiting by means of a quarter-wavelength trap allowing high-performance operation as well as virtually no maintenance.
Furthermore, a screw 56 is provided in the body of the coaxial part 44 for the purpose of locking the tuning plunger 48 in position after having carried out the adjustment.
It may furthermore be seen in FIG. 2 that an adjustable stop 58 for limiting the movement of the tuning plunger 48 is provided on the corresponding control rod 54 for the purpose of presetting the tuning.
As mentioned previously, the discharge tube 16 is arranged in the sleeve 20 and is mounted so as to be able to move axially with respect to the coaxial part 44 and to the tuning plunger 48. The body of the coaxial part 44 furthermore includes a device for holding the sleeve 20 in position, consisting of a transverse screw 62.
Referring in particular to FIG. 3, it can be seen that the sleeve 20 has two coaxial walls 64 and 66 which between them delimit a cylindrical chamber 68 which is in communication with a water-cooling circuit 70, shown partially in FIG. 2.
It may be imagined that, in operation, water flows between the inner wall 66 and the outer wall 64 and thus cools the sleeve 20.
Moreover, the sleeve 20 is connected, by means of a suitable connecting flange 72, to a compressed-air supply line 74 for the purpose of causing a flow of forced air through the gap 75 between the discharge tube 16 and the inner wall 66 of the conductive sleeve 20 in order to cause additional cooling.
This is necessary when operating at atmospheric pressure, at which pressure the gas in the plasma reaches temperatures markedly less than those of the electrons but which are nevertheless likely, in the absence of cooling, to cause the discharge tube 16 to melt.
It may be seen in FIG. 2 that a free end of the sleeve 20 emerges in the waveguide 42 and, with the inner wall of the latter, delimits a gap 76 by means of which the microwave energy localized at this point is transmitted to the plasma via a surface wave.
It should be pointed out that the cross section of the wall of the surfatron-guide 18 close to the gap 76 is thinned down to a thickness of between 0.5 and 0.7 mm by removing material from the outer wall of the waveguide 42 so as not to interfere with excitation of the surface waves, without which significant losses of microwave power would occur through heating in the structure making up the wall of the waveguide 42.
It should also be pointed out that the gap 76 can be adjusted by moving the sleeve 20 axially in the coaxial part 44 and by locking it using the screw 62. This adjustment makes it possible to optimize the impedance matching, preventing the formation of an electric arc in the gap 76 when the apparatus is operating at high microwave power.
Moreover, it may be seen in FIG. 2 that the discharge tube 16 is connected, by means of a suitable fitting 78, to a pipe 80 for supplying the carrier gas, consisting, as mentioned previously, of argon, for the purpose of injecting it into the annulus-shaped tube, and the function of which will be described in detail later.
Finally, it may be seen in this figure that a free end of the discharge tube 16 is connected to a fitting 82, shown diagrammatically, for the purpose of connecting the discharge tube 16 to a source, not shown, for supplying the gas mixture to be treated.
It should be noted that the discharge tube is made of a dielectric material. According to a first embodiment, this tube 16 consists of a hollow silica tube 83 having an external diameter equal, for example, to 8 mm and an internal diameter equal, for example, to 6 mm.
It may be imagined that the construction of the surfatron-guide and of the discharge tube makes it possible to concentrate the microwave radiation produced by the generator 14 in the gap 76 so as to propagate, in the discharge tube 83 (FIG. 3) and in the ionized gas mixture which it contains, a traveling electromagnetic surface wave whose associated electric field maintains a discharge in the gas mixture. This construction therefore allows the electric field of the incident wave to be communicated to the plasma in the axial direction of the discharge tube 16 through the gap 76.
The plasma thus generated is in the form of a column and its electron density decreases on going away from the gap according to a known function.
The diameter of the discharge tube 16 is chosen to be small enough to obtain a single plasma filament which is centered on the axis of the tube and which can be established in a stable and reproducible manner. This is because, when operating at atmospheric pressure, in the case of sufficiently large diameters, the diameter of the plasma itself would not increase and the gaseous effluent to be treated which is flowing at the periphery would be subjected to an increasingly weak interaction with the active species in the plasma. Furthermore, several plasma filaments could form, exhibiting erratic behavior and with the possibility of sticking against the wall of the discharge tube, which would damage it.
It should be noted that, in order to increase the permissible flow rates, it is possible to combine several small-diameter discharge tubes in parallel or to mount several microwave applicators in series on a single tube.
The arrangement which has just been described makes it possible to create, in the path of the gaseous effluent to be treated, a plasma which is the site of very high electron-energy excitations, corresponding to temperatures of several tens of thousand kelvin, thus allowing, by electron collision, conversion of the gaseous effluent molecules from a chemically quite inert state to a reactive state with a high yield.
It should be noted that the plasma created by this apparatus is a plasma not in local thermodynamic equilibrium (LTE).
In this type of plasma, only the electrons present in the medium are raised to high energies, the temperatures of the ionic and neutral species remaining much lower, in fact often quite close to ambient temperature. In a system which is not in thermodynamic equilibrium, many states may be attained by varying the discharge parameters, for example the frequency of the electromagnetic field, the diameter of the discharge tube and the composition of the gas mixture to be treated by adding assistant gases thereto.
On the other hand, if we consider the case of plasmas in local thermodynamic equilibrium (LTE), in which all the species are at the same very high temperature (of the order of several tens of thousand K), the total reaction balance is not always favorable for accomplishing a particular chemical conversion process.
As in any system in local thermodynamic equilibrium, the final state of the conversion is essentially determined by the temperature of the system. Undesirable reaction pathways may be favored, just as well as the elementary conversions of use to the desired result. In addition, the very high enthalpy of the medium leads to constraints in the factory layout (cooling, etc.) besides the fact that maintaining this enthalpy is very costly in terms of energy.
It may therefore be imagined that the discharges produced not in local thermodynamic equilibrium are both energetically more effective and offer the possibility of finding even more optimized operating conditions for carrying out the conversion of the envisaged molecules.
The very high-energy excitation levels which certain fluorinated species attain in the discharge can make them particularly aggressive chemically with respect to the discharge tube, possibly leading to the wall of the latter being punctured in a few minutes.
In order to solve the problem of the discharge tube being attacked, FIG. 3 shows a configuration in which this tube includes two coaxial silica tubes, namely an outer first hollow tube 83, the discharge tube proper, having an external diameter equal, for example, to 8 mm and an internal diameter equal, for example, to 6 mm and an inner hollow tube 84, of small diameters, the external diameter being equal, for example, to 4 mm and the internal diameter being equal, for example, to 2 mm, making it possible to inject the gas mixture to be treated into the discharge zone.
These tubes delimit a cylindrical chamber 85 allowing injection of argon, via the fitting 78, around the inner tube 84, thus creating a sheath around the reactive gas for the purpose of reducing the amount of corrosive species which can strike the wall of the surface-wave tube.
The inner tube 84 serves only to inject the gas mixture to be treated into the discharge zone, lies entirely outside the latter, supports the propagation of no electromagnetic surface wave and plays no part in maintaining the plasma, as otherwise it too would be very rapidly damaged.
More specifically, its downstream end does not go beyond that of the conductive inner sleeve 20 and no portion of this tube lies in the gap.
Various experimental results will now be presented, with reference to FIGS. 4 to 7.
First of all, the destruction of SF6 will be described with reference to FIGS. 4 and 5.
These figures are infrared absorbance spectra as a function of the wavenumber of the treated gas sampled respectively as it leaves the discharge tube 16 and as it leaves the soda-lime cartridge 12.
The gaseous effluent to be treated consists of SF6 with a flow rate of 50 sccm (standard cm3 per minute) with an argon dilution of 300 sccm, the incident microwave power being fixed at 300 W.
Beforehand, and as mentioned previously, the impedance-matching adjustment of the plasma generator 10 is carried out by varying the width of the gap 76, the position of the coaxial tuning plunger 48 and the position of the waveguide short-circuiting plunger 46.
It should be noted that only the two latter adjustments, namely the adjustment of the tuning plunger 48 and of the short-circuiting plunger 46, may be made in real time, since the plasma has been turned on, using the maneuvering rods 52 and 54.
Moreover, the gap 76 can only be adjusted by successive approximations, the modifications being made without turning the plasma on in order not to expose the operator to leakage radiation incompatible with the safety standards. Having completed the tuning, a reflected power of only a few watts is obtained.
In operation, it may be noted that the argon sheath 85 is very effective at reducing the rate at which the discharge tube 16 is attacked.
Referring to FIG. 4, the discharge having been established, analysis upstream of the cartridge 12 shows an absence of peaks corresponding to SF6 while absorption lines characteristic of products formed by the reactions in the discharge appear, from which lines may be identified, for example, SO2 at 2510.9 cm-1 and 1373.1 cm-1, SO2 F2 at 1503.3 cm-1, 1269.9 cm-1 and 886.1 cm-1 and SiF4 at 1824.3 cm-1, 1190.8 cm-1 and 1023.1 cm-1, attack of the silica tube playing a major role in the generation of these products. All these products are distinguished by their greater or lesser acidic character.
FIG. 5 shows that, downstream of the soda-lime cartridge 12, only bands corresponding to water vapor remain, which may be explained by the fact that, on the one hand, the soda lime normally has quite a high degree of moisture, which is moreover necessary for it to be effective in the reaction with the fluorinated reactive species, and, on the other hand, the treatment line finally emerges in the open air. It should also be noted that a very small SF6 peak appears at 947 cm-1 in the transient state, this being due to the desorption of SF6 which was previously absorbed by the internal surface of the line 22. This peak rapidly disappears in the steady state.
It may therefore be noted that the desired result, namely the complete disappearance of SF6 is achieved after the treatment.
Thus, such an apparatus mounted downstream of an integrated-circuit fabrication reactor ensures that the gaseous effluents are virtually completely destroyed and also that the conversion products are discharged into the atmosphere at levels below the limits imposed by regulations or established by practice in the microelectronics industry.
Referring to FIGS. 6 and 7, it may be seen that the same treatment technology may be applied to C2 F6, the molecules of which presently are of greatest commercial interest for the plasma cleaning of thin-film deposition reactors, since it is easier to dissociate it in the radiofrequency discharges used in this case, which results in a markedly greater concentration of active species in the discharge, hence a substantially increased rate of attack.
In the case of this molecule however, there exists a priori a difficulty due to possible deposition of a thin solid film of amorphous carbon on the inner wall of the discharge tube 16. This amorphous carbon film would necessarily have a dielectric function different from that of silica (in fact, it would be quite a good conductor compared to the latter) and its presence would therefore modify the wave-propagation conditions, thereby disturbing the plasma and possibly extinguishing it.
It would still be possible to inject, into the gaseous effluents, additional gases capable of attacking the amorphous carbon and of cleaning the tube continuously, but this would restrict the possibilities of optimization of the conversion processes in the gas phase (in fact, it should in any case be pointed out that C2 F6 is always associated with O2 in the reactor-cleaning processes, which could very well prove to be sufficient).
Preliminary tests show that destruction of a large fraction of the C2 F6 flow requires a higher incident microwave power to be applied than for the same flow of SF6. More specifically, there is quite a high probability of C2 F6 being converted into CF4, which is at least as difficult as SF6 to dissociate.
However, it should be noted that, even without the addition of O2 (C2 F6 +Ar only), it seems that there is no carbon deposit of any kind produced on the tube and that the plasma is not disturbed during the treatment. However, the attack on the wall of the silica tube by the fluorinated species may constitute a non-negligible source of oxygen.
The treatment of C2 F6 was carried out with an incident microwave power of 400 W and incident flow rates of 300 sccm of Ar in the outer tube 83 and of 100 sccm of Ar, 50 sccm of assistant gas, consisting of O2, and 50 sccm of C2 F6 in the central inner tube 84.
Having established the discharge, the infrared spectrum in FIG. 6 is obtained on leaving the plasma. No peaks corresponding to C2 F6 can be seen, but a low concentration of CF4 has been produced. The other conversion products identified are CO2, COF2, SiF4 and CO, which are for the most part known to react with wet soda lime, apart from CO.
After the cartridge, the infrared analysis spectrum (FIG. 7) shows that the residual amounts of SiF4 and COF2 are very probably below the TLV (Threshold Limit Value). There is in fact no detectable signal. On the other hand, it would be necessary to measure the concentration of CO in order to check that it is well below the TLV (Threshold Limit Value) for this molecule (50 ppm).
The production of CF4 in the system introduces a degree of ambiguity in the definition of destruction effectiveness. This is because it should be noted that this compound is deemed to be nontoxic and does not have a TLV (Threshold Limit Value). There may therefore be no statutory absolute limit to the concentrations discharged. Moreover, the discharge standards under preparation for greenhouse gases refer to a relative reduction (e.g., 80% of the initial concentrations). There is no CF4 in the effluents to be treated. It will be seen, however, that the final concentration of CF4 seems quite low compared to the initial concentration of C2 F6.
However, increasing the flow rate of oxygen to 100 sccm has shown that the reactions in the discharge no longer produce CF4 generally. It may therefore be stated that, in terms of destruction effectiveness, the results are also very positive in the case of C2 F6. On the other hand, the problem of the attack on the discharge tube 16 is more acute because, inter alia, of the increase in the microwave power density in the discharge.
In order to help to overcome this drawback, it is possible to make the discharge tube from a material which is markedly less liable to be attacked by the excited fluorinated species, for example a tube made of ceramic, such as alumina. It is readily checked that an alumina tube immersed in an aqueous solution of hydrofluoric acid undergoes substantially no degradation. However, this material has a drawback because of its very high sensitivity to the thermal shocks occurring when igniting and extinguishing the plasma.
However, the effect of these thermal shocks may be moderated by providing cooling, by circulating a fluid around the periphery of the discharge tube. An outer concentric tube made of silica provides the confinement of the coolant, which flows through the cylindrical space formed between the two tubes. The coolant is in particular water.
FIG. 8 shows a discharge tube 86 produced as described above.
This figure shows the ceramic discharge tube 86 surrounded by the silica outer tube 88, these two tubes being placed in a sleeve 90, similar to the sleeve described previously.
This figure also shows that, as in the previous illustrative embodiment, the sleeve 90 is connected to a cooling circuit 91, shown partially.
Likewise, a gaseous coolant delivered via a corresponding supply pipe 92 is also made to flow in the space lying between the sleeve 90 and the silica tube 88. However, this gas cooling is optional here because of the presence of the water-cooling of the discharge tube, the latter cooling being in general significantly more effective than the former type of cooling.
The cooling water flows through the space lying between the discharge tube 86 and the outer silica tube 88, between an inlet nozzle 93 and an outlet nozzle 94. If town water is used in an open circuit, the inlet pressure is that of the mains and the water extracted from the outlet nozzle 94 is discharged into the drains.
On the other hand, if closed-circuit cooling is used, this includes, on the outside of the discharge tube, suitable continuous pumping and cooling devices, these not being shown.
Fittings 95 and 96 are designed, as may be seen, so as to provide sealing of the inter-tube space, through which the cooling water flows, with respect to the ambient medium.
Furthermore, the carrier gas and the gases to be treated are delivered simultaneously by means of a supply pipe connected to the upstream end 97 of the discharge tube 86 via a suitable fitting, not shown.
Next, the treated gases are delivered to a treatment unit similar to that described above via a line connected to the downstream end 98 of the discharge tube 86 via a suitable fitting, not shown.
It should be noted that this water cooling is only of advantage in the case of an atmospheric-pressure surface-wave plasma. This is because, in this case, the very dense plasma generated takes an appreciable portion of the energy delivered by the microwaves, while this energy would in practice serve only to heat the water in the case of a less dense plasma maintained at low pressure.
However, it is necessary, even in the first case, to reduce the thickness of the layer of cooling water as much as possible so as to minimize the electromagnetic energy losses in this layer.
Satisfactory results have been obtained using an alumina tube having an external diameter of 5 mm and an internal diameter of 4 mm, with a C2 F6 flow rate equal to 25 sccm, an O2 flow rate equal to 30 sccm and an argon flow rate equal to 500 sccm. With a microwave power equal to 900 W, not only is no C2 F6 peak able to be observed but the CF4 peaks have also virtually disappeared.
However, the various experiments which have been carried out using this apparatus have demonstrated that there is a certain saturation in the permissible flow rates which is about 50 to 70 sccm (standard cm3 /min), this being insufficient for many applications.
It has in fact been found that, above a certain microwave power delivered by the generator to the surfatron-guide applicator, the fraction of the incoming gas (SF6, C2 F6, etc.) dissociated hardly increases anymore. In this case, the additional microwave energy seems to be used merely to excite the dissociation products to higher levels and no longer to decompose the molecules of the incoming gas further.
FIG. 9 shows an apparatus enabling this draw-back to be overcome, in which two plasma generator stages 100 and 102, each associated with a corresponding discharge tube, are arranged in series.
These stages 100 and 102 are identical to those described above with reference to FIGS. 1 to 3 and they will therefore not be described again below.
The line in which the gaseous effluents under treatment flow, described with reference to FIG. 1, has been modified for this apparatus so as to make the flow of gaseous effluent to be treated pass, in the direction of the arrow F, through the first plasma generator stage 100, then through a first soda-lime cartridge 104, then to the second plasma generator stage 102 and finally to a second soda-lime cartridge 106.
As a result, the first soda-lime cartridge removes from the gas flow to be treated all the dissociated and/or reactive species produced by the first plasma, so that only that fraction of the gas to be treated which has not reacted in the first plasma is introduced into the second.
Moreover, analysis cells 108 and 110, identical to the cells described previously with reference to FIG. 1, are placed on each side of the second soda-lime cartridge 106.
Furthermore, two branch-off lines 112 and 114 enable the gas flows to be analyzed after passing through the first plasma generator stage 100 and after the first soda-lime cartridge 104.
When it is attempted to operate the two plasmas simultaneously, using a C2 F6 /O2 /Ar mixture similar to that used in the experiment described with reference to FIGS. 6 and 7, it appears that the operation of the second discharge is extremely disturbed and is in fact interrupted after a few seconds. It is natural to assume that this is due to the presence of the soda-lime cartridge 104 located upstream of this second plasma. The soda lime may introduce elements into the gas stream which are likely to quench the downstream plasma.
First of all, the granules of commercial soda lime are well-known for producing large amounts of very small solid particles not visible to the naked eye. The spectacular effect of these particles on the behavior of the discharges is well known. In particular, these particles act as very effective electron traps and therefore oppose very strongly the maintenance of plasmas.
Moreover, in order effectively to react with the acid gas effluents, the soda lime must be slightly wet. The neutralization reaction produced in the soda lime produces a surplus of large quantities of water. When water vapor is introduced into the second plasma generator 102, its dissociation creates large concentrations of hydrogen which also tend to attenuate the plasma strongly. It is in fact well known that it is more difficult to maintain a microwave discharge in hydrogen than in argon.
In order to help to overcome this drawback, means for retaining the particles and the water are inserted between the first soda-lime cartridge 104 and the second plasma generator stage 102, these means consisting, for example, of a cartridge 116 of silica gel, very effective for dehydrating the gas stream, and which also seems to stop most of the particles. If this were not the case, a particle filter could also be used.
By operating this apparatus with a microwave power, in the case of the first stage 100, equal to 1100 W and a microwave power, in the case of the second stage 102, equal to 800 W, with a C2 F6 flow rate equal to 200 sccm, an O2 flow rate equal to 215 sccm and an argon flow rate equal to 5000 sccm, 80% of the C2 F6 and of the CF4 generated is destroyed, thereby enabling the targets imposed by the recommendations or regulations in force or currently in preparation to be achieved.
It should be noted that the description of a treatment example with reference to FIGS. 4 to 7 relates to the treatment of SF6 and of C2 F6, but, of course, the treatment process described above also applies to any type of perfluorinated or hydrofluorocarbon gas, as well as to any other type of halogenated gas, for example chlorofluorocarbons.
Moreover, in the description of the apparatus given above, the plasma is created using a surfatron-guide. As a variant, it is also possible to provide the apparatus with other devices for the creation of a high-frequency plasma, for example a surfaguide or an "Ro-Box" with regard to surface waves, or a resonant-cavity device, of known type.
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|U.S. Classification
|204/157.3, 204/157.15, 204/164
|International Classification
|Cooperative Classification
|European Classification
|Jan 22, 1998
Owner name: L AIR LIQUIDE SOCIETE ANONYME POUR L ETUDE ET L EX
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ROSTAING, JEAN CHRISTOPHE;COEURET, FRANCOIS;DE SAINT ETIENNE, CLAUDE;AND OTHERS;REEL/FRAME:008927/0020
Effective date: 19980108
|Mar 26, 2003
|Fee payment
Year of fee payment: 4
|Mar 20, 2007
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|Fee payment
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text:
In 1997, the most severe flood Fargo, N.D., residents had ever experienced inundated three miles of farmland along the Red River, and Public Works Director of Operations Dennis Walaker was feeling the heat.
Although sandbags would ultimately save much of the city from the record crest of 39.5 feet, rumors were circulating that the 15-mgd wastewater treatment plant had exceeded capacity and that the city's water was contaminated. Walaker also faced sharp criticism from his employees, who complained about learning of the city's flood response from the local media.
Though the plant was running at capacity and an illegal discharge wasn't imminent, Walaker scrambled to separate truth from rumor during press conferences.
Seven years later and more than 900 miles to the southeast, Louisville, Ky., Public Works Director Jim Adkins found himself in a similar position when a winter storm dumped 18 inches of snow and freezing rain in 24 hours. "The storm of the century" was one of the worst emergencies the city of 539,000 had experienced.
About 170 vehicles were deployed to priority and secondary routes, dropping 13,000 tons of salt on 2,300 miles of roads around the clock. Still, the media became critical. Reporters commented on air about their own streets not being plowed and that city trucks were nowhere to be found. For five days, Adkins' efforts to oversee his department's response were interrupted by media calls. At one point he conducted 35 interviews in 12 hours.
After the storm, the department revised its communications plan for weather-related events. Now, e-mail alerts are sent to local media four times daily — before each major television newscast — highlighting the progress of response efforts.
"It transforms coverage," says Allison Martin, a former television reporter who was hired as deputy communications director to coordinate messaging during future events. "The media calls dry up."
It's all about being proactive and communicating preparations before severe weather hits. Also, communicating directly to the media isn't the only way to manage the message.
A devastating wind storm from Hurricane Ike knocked out power to 300,000 Louisville residents for up to two weeks last September. In its wake, the city's Public Works' Planning Division created a layer for the city's GIS map that divides the city's 386 square miles into 76 equally sized sections. As soon as crews reported an area of the grid was clear of downed trees and other debris, the division updated the map, which residents can access on the city's Web site.
So when an ice storm hit four months later, the department was prepared to deal with inquiries about its cleanup efforts. More than 200 public works and private contractor employees worked 12 hours a day for up to seven consecutive days to open a dozen roads. Even so, the city's 311 call center fielded up to 60 complaints daily.
Ordinarily, the complaints would have caught the attention of local media, which in turn would have taken advantage of the "gotcha" moment in their coverage. "It's hard to explain to 700,000 people at the same time that you're doing everything you can," says Kerri Richardson, another former television reporter who replaced Martin last year. But this time, operators referred residents and journalists to the online map.
At least one member of the media used it to generate articles about the city's recovery process.
"It drilled a couple stories about where the effort was at, especially after it became clear that there was no way the cleanup was going to be done by the Kentucky Derby on May 2," says Dan Klepal, metro government reporter at the Louisville Courier-Journal.
His stories triggered an online debate among readers about who was ultimately responsible for cleaning up: the city or residents. Public works crews were confronted with greater-than-anticipated volumes when residents began hauling debris from their yards to the curb, extending the deadline for cleanup well beyond initial estimates of a month or two. The last of the debris was hauled away at the end of May.

subset: commoncrawl


text:
Reservations Recommended
Tu. – Thu. 11am – 9pm
Fri. 11am – 10pm
Sat. 5pm – 10pm
Welcome to SALA — a tasteful Italian treasure nestled in the charming East Side of Milwaukee.
Our dining room is the "place where the neighborhood locals go" to dine. So if you are craving delicious food (cooked fresh to order) and are looking to escape the monotony of chain restaurants, come savor our family's modern presentation of traditional Sicilian food and dining experience.
Enjoy family recipes passed down through the generations of the Gentile, D'Amico, and Balistreri families, as well as inspired modern dishes created by Chefs Anthony Balistreri and his team.
Relax and enjoy a bottle of wine or a drink in our comfortable bar, cozy dining room and feel like you've visited Sicily for a memorable dining experience!
Around the Corner with John McGivern recently visited SALA.
We are featured in the segment that recently appeared on PBS for the East Side of Milwaukee.


text:
2015 Opening Night
"The Wannabe is one film you don't want to miss." -THE EXAMINER/Gary Miller
"Arquette is magnificent as the ferocious and emotionally volatile Rose" -SLANT/Elise Nakhnikian
Opening Night Reception
Wednesday, Nov 4th 6–7PM
Red Carpet Special Screening
Wednesday, NOV 4th 7PM
Obsessed with mob culture, and desperate to fit in, Thomas sets out to fix the 1992 trial of John Gotti. He believes if the plan is executed, it will put him at the center of all that he idolizes. The plot is foiled setting off events worthy of mob lore. The Wannabe intertwines real people and true events, past and present, with fantasy.
Director/Writer: Nick Sandow
Producers: Lizzie Nastro, Vincent Piazza, Michael Gasparro
Executive Producers: Academy Award® Winner Martin Scorsese and Dean Devlin
Cast: Vincent Piazza, Patricia Arquette, Michael Imperioli, Nick Sandow
Charleston Music Hall at 37 John Street, Charleston SC
Tickets $25 pp
Includes both Reception & Screening
Beverages and Hors d'oeuvres included


text:
|By PR Newswire
Article Rating:
|January 22, 2013 09:31 PM EST
BEIJING, Jan. 22, 2013 /PRNewswire/ -- The GSMA today announced the first details of the 2013 GSMA Mobile Asia Expo, which will be held June 26-28 at the Shanghai New International Exhibition Centre in Shanghai. Now in its second year, Mobile Asia Expo will include a conference programme featuring CEOs and senior executives from leading companies in Asia and around the world; an extensive exhibition showcasing innovative mobile products and services, including the new Connected City; the App Planet programme for the mobile application development community; a government and regulatory programme; and a variety of other seminars, meetings and educational programmes.
"We are pleased to be returning to Shanghai for our second Mobile Asia Expo," said Michael O'Hara, Chief Marketing Officer, GSMA. "Building on the success of our inaugural event last year, the 2013 edition of Mobile Asia Expo will attract more than 20,000 attendees, including executives and mobile professionals from across the broad mobile communications ecosystem, government officials, technology-savvy consumers. Mobile Asia Expo 2013 promises to be bigger and better, with a range of new programmes and activities for both business and consumer attendees."
New at Mobile Asia Expo: Connected City
For the first time, the Mobile Asia Expo exhibition will feature the Connected City. In partnership with leading companies including China Mobile, Cisco, the Ford Motor Company and Huawei, the GSMA will showcase a range of mobile connected products and services, providing Mobile Asia Expo attendees the opportunity to experience the "Connected Life" first-hand.
"The Connected City is a very exciting addition to the Mobile Asia Expo programme. Asia Pacific has more than half of the world's 6.8 billion mobile connections and is at the forefront of next-generation mobile broadband technologies and cutting-edge innovation, but there is far greater scope for growth," commented O'Hara. "The projected rise of connected devices across the region demonstrates the enormous potential for the entire Connected Life ecosystem, with billions of new devices connected via mobile networks, enabling innovative applications, services and experiences across all sectors."
Showcasing Mobile Innovation
In addition to the Connected City, the Mobile Asia Expo exhibition will include more than 200 leading companies showcasing innovative products, services and solutions. Exhibitors currently confirmed to participate at Mobile Asia Expo include CyWee Group, Datang Telecom Technology, Co. Ltd., JDSU China, Mozilla, Oracle, Panguso Corporation and ZTE, among others.
Mobile Asia Expo will again include the Innovation Lab, which provides a platform through which companies can highlight products and services and which will be open to all Mobile Asia Expo attendees. In an open stage located in the Mobile Asia Expo exhibition, Innovation Lab partners will present products, developments and advances, technologies or novel ideas on how to meet the needs of the mobile ecosystem.
App Planet at Mobile Asia Expo
App Planet presents a unique opportunity for attendees to explore the many dimensions of the ever-changing and critically important mobile apps market. App Planet presents opportunities for developers and mobile professionals to sharpen their knowledge as well as connect with other major apps influencers. Elements of App Planet include the App Pavilion, an exhibition area dedicated to the world of mobile apps; the App Lab, an open stage in the heart of the exhibition floor where companies can demonstrate new products and services specifically focused on the mobile app development community; and the App Cafe, which provides a central meeting point for the developer ecosystem to meet and engage.
Mobile Asia Expo Conference
The 2013 Mobile Asia Expo conference programme will comprise visionary keynotes and breakout sessions providing essential insights on current and future trends impacting the ever-changing mobile industry. Keynote sessions will focus on mobile operator strategies, mobile broadband technologies and big data, while breakout sessions will examine topics such as applications, business transformation, connected living, devices, mobile cloud, mobile money, mobile in retail and advertising, NFC, small cells and social media, among others.
The Call for Papers for the Mobile Asia Expo conference programme will be open through Friday, 8 February. Please visit http://www.mobileasiaexpo.com/cfp/ for more information.
Introducing the Smart City Summit
In another Mobile Asia Expo first, the GSMA will be hosting the Smart City Summit, a one-day programme for executives from municipalities with "smart city" plans and aspirations in China and the rest of Asia, as well as Europe and North America. The Smart City Summit will offer a combination of keynote presentations, smart city deployment case studies and round table discussions, and will conclude with a tour of the Connected City on the exhibition floor.
GSMA Public Policy Forum
Given the importance of sound government policy to the mobile ecosystem and the impact Asia Pacific has on a global scale, the GSMA will be hosting its second annual Public Policy Forum at Mobile Asia Expo, which will bring together key stakeholders from telecommunications ministries and regulatory authorities, mobile operators and industry manufacturers. Under the theme of "Reaching Total Connectivity", the 2013 Forum will examine the regulatory environment that will help in delivering services, creating growth and improving lives in the region and beyond.
For more information on Mobile Asia Expo 2013, including details on how to attend, exhibit or sponsor, please visit www.mobileasiaexpo.com.
About the GSMA
The GSMA represents the interests of mobile operators worldwide. Spanning more than 220 countries, the GSMA unites nearly 800 of the world's mobile operators with more than 230 companies in the broader mobile ecosystem, including handset makers, software companies, equipment providers and Internet companies, as well as organisations in industry sectors such as financial services, healthcare, media, transport and utilities. The GSMA also produces industry-leading events such as the Mobile World Congress and Mobile Asia Expo.
For more information, please visit the GSMA corporate website at www.gsma.com or Mobile World Live, the online portal for the mobile communications industry, at www.mobileworldlive.com.
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DevOps at Cloud Expo, taking place Nov 1-3, 2016, at the Santa Clara Convention Center in Santa Clara, CA, is co-located with 19th Cloud Expo and will feature technical sessions from a rock star conference faculty and the leading industry players in the world. The widespread success of cloud computing is driving the DevOps revolution in enterprise IT. Now as never before, development teams must communicate and collaborate in a dynamic, 24/7/365 environment. There is no time to wait for long dev...
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Data is the fuel that drives the machine learning algorithmic engines and ultimately provides the business value. In his session at Cloud Expo, Ed Featherston, a director and senior enterprise architect at Collaborative Consulting, will discuss the key considerations around quality, volume, timeliness, and pedigree that must be dealt with in order to properly fuel that engine.
Aug. 27, 2016 10:15 AM EDT Reads: 1,918
Pulzze Systems was happy to participate in such a premier event and thankful to be receiving the winning investment and global network support from G-Startup Worldwide. It is an exciting time for Pulzze to showcase the effectiveness of innovative technologies and enable them to make the world smarter and better. The reputable contest is held to identify promising startups around the globe that are assured to change the world through their innovative products and disruptive technologies. There w...
Aug. 27, 2016 07:45 AM EDT Reads: 689
Personalization has long been the holy grail of marketing. Simply stated, communicate the most relevant offer to the right person and you will increase sales. To achieve this, you must understand the individual. Consequently, digital marketers developed many ways to gather and leverage customer information to deliver targeted experiences. In his session at @ThingsExpo, Lou Casal, Founder and Principal Consultant at Practicala, discussed how the Internet of Things (IoT) has accelerated our abil...
Aug. 27, 2016 02:30 AM EDT Reads: 2,021
With so much going on in this space you could be forgiven for thinking you were always working with yesterday's technologies. So much change, so quickly. What do you do if you have to build a solution from the ground up that is expected to live in the field for at least 5-10 years? This is the challenge we faced when we looked to refresh our existing 10-year-old custom hardware stack to measure the fullness of trash cans and compactors.
Aug. 27, 2016 01:45 AM EDT Reads: 1,753
The emerging Internet of Everything creates tremendous new opportunities for customer engagement and business model innovation. However, enterprises must overcome a number of critical challenges to bring these new solutions to market. In his session at @ThingsExpo, Michael Martin, CTO/CIO at nfrastructure, outlined these key challenges and recommended approaches for overcoming them to achieve speed and agility in the design, development and implementation of Internet of Everything solutions wi...
Aug. 27, 2016 01:15 AM EDT Reads: 2,040
Is the ongoing quest for agility in the data center forcing you to evaluate how to be a part of infrastructure automation efforts? As organizations evolve toward bimodal IT operations, they are embracing new service delivery models and leveraging virtualization to increase infrastructure agility. Therefore, the network must evolve in parallel to become equally agile. Read this essential piece of Gartner research for recommendations on achieving greater agility.
Aug. 25, 2016 05:15 PM EDT Reads: 828
SYS-CON Events announced today that Venafi, the Immune System for the Internet™ and the leading provider of Next Generation Trust Protection, will exhibit at @DevOpsSummit at 19th International Cloud Expo, which will take place on November 1–3, 2016, at the Santa Clara Convention Center in Santa Clara, CA. Venafi is the Immune System for the Internet™ that protects the foundation of all cybersecurity – cryptographic keys and digital certificates – so they can't be misused by bad guys in attacks...
Aug. 25, 2016 01:00 PM EDT Reads: 2,656
For basic one-to-one voice or video calling solutions, WebRTC has proven to be a very powerful technology. Although WebRTC's core functionality is to provide secure, real-time p2p media streaming, leveraging native platform features and server-side components brings up new communication capabilities for web and native mobile applications, allowing for advanced multi-user use cases such as video broadcasting, conferencing, and media recording.
Aug. 25, 2016 08:45 AM EDT Reads: 2,183


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Sandler and friends reunite for lazy, unfunny sequel
Despite being lambasted by critics, 2010's "Grown Ups" was an enormous hit, grossing $162 million domestically and another $109 million worldwide. It stands to reason that "Grown Ups 2" will do just as well — even though it's made for home viewing when you're flipping channels late at night and nothing else is on.
Once again, producer/co-writer/star Adam Sandler decided to gather all his friends and hang out for a few months — and get a major studio to pay for their get-together. Sometimes you wonder if they even knew (or cared) that cameras were rolling. »Read Full Article(4)
Setzer brings swinging holiday cheer to Potawatomi
On the 16th day of November, Brian Setzer gave with glee: 5 sax men, 4 trumpet players, 2 backing singers...and drums dressed in tinsel, glittering.
The Brian Setzer Orchestra's Christmas show, at Potawatomi Bingo Casino's Northern Lights Theater, also had falling suds (subbing for snow), TV theme song cameos (including "The Flintstones," "Peter Gunn" and "The Andy Griffith Show") and covers from Setzer's Stray Cats rockabilly days. »Read Full Article(1)
Danceworks' 'Intersect' showcases breadth of artists involved
If one creative mind is a good thing, bringing many together for a project must be an even better thing — right?
Apparently so, given the variety of dance and original music in the Danceworks Performance Company's collaborative "Intersect" program. »Read Full Article
Next Act Theatre offers solid primer on Marxism with 'Groucho'
Like the Marx Brothers' early vaudeville show, Next Act Theatre's"Groucho: A Life in Revue" is a "skule" act. It gently and congenially educates the audience about one of America's great comedians, Groucho Marx, whose remarkable career included Broadway, movie and TV hits built around his wisecracking persona.
After a brief opening sequence, this revue, written by Groucho's son Arthur and Robert Fisher, unfolds chronologically. It's sentimental in spots, but heck, you might be sentimental, too, if you were writing a show about your father and uncles. It's not warts and all, but it does acknowledge Groucho's regrets about three marriages that ended in divorce. »Read Full Article


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Results 161 to 170 of 561
Thread: Adventure: Love Bites
Tuesday, 12th January, 2010, 12:54 AM #161
Thaumaturgist (Lvl 9)
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- Nov 2008
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- Austin, TX
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Realizing that she must, alas, destroy an elf to ensure that a human dies, Mikara targets the healer from her hidden vantage point.
Look over here, Sis.
Death is coming at you fast.
Arrows give it speed.
Two arrows fly and hit their mark, but they fail to bring her down,
"Girl! You won't live long!
You might as well give it up!
The gold's not worth it!
Tonight. You spend your reward in hell!"
ActionsMove: shift to H3
Minor: HQ on the elf
Standard: Twin Strike
Target: Elf
Attack: 1d20+9+2(CA)=17; 1d10+1+1d8(HQ;LH)=8;1d20+9+2(CA)=26;1d10+1=11
Two hits for 19 damage
Atreus, Kathalia: You'd better finish her off before she gets the human back up!
LEB Character: Arkavas - Deva Artivicer 5
L4W Character: Mikara Li Mesadh - Elf Ranger 7
L4W Character: Eithal Lemindt Arehei - Goliath Warden 10
L4W Character: Ixenvalignat - Dragonborn Warlord 3
"Taking one's chances is like taking a bath, because sometimes, you end up feeling comfortable and warm, and sometimes, there is something terrible lurking around that you cannot see until it is too late, and you can do nothing else but scream and cling to a plastic duck." -Lemony Snicket The Slippery Slope
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Tuesday, 12th January, 2010, 08:40 AM #162
Novice (Lvl 1)
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Atreus finally swings his mighty axe, which looks to be a deadly strike but unused to the weapons weight he miscalculates his aim and slams it into the building. The assassin retrieves his axe and moves into a better position, now flanking with Kathalia.
" Take that as an warning, my next attempt will not be so kind " he says as if he hit the building on purpose.
Actions and OOC
Free Action: Shrouds Elf
Standard Action: attacks elf with leaping shadow, does not hit.
Move action: Shifts to L1 to flank with kathalia
Minor Action: Nothing
[quote=Covaithe]Atreus, in your char sheet can you include which defense the power targets? And don't let me forget that you need a second approval still
I have it included in my attack section, since renau1g told me to remove it from my summary to avoid reverse engineering. Oh, and I haven't forgotten that my character isn't approved, been waiting for ages to get him accepted but didn't want to push the matter since we haven't been rewarded anything yet. Should I send another request to get him approved?
Last edited by Atriden; Wednesday, 13th January, 2010 at 05:11 PM.
Tuesday, 12th January, 2010, 11:15 AM #163
Defender (Lvl 8)
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oocI think r1 was talking about things like "Dex vs. AC". The Dex part is unnecessary, but the AC part is needed. We want to see "+9 vs AC".
Probably not necessary to submit another request for approval, though it wouldn't hurt. But if it looks like this adventure is heading for a rest where XP might be awarded, an ooc reminder here would be appropriate.
My games
Check out Living 4th Edition, a community-run 4e D&D living world open to all. Now open for character and adventure submissions!
Wednesday, 13th January, 2010, 05:13 PM #164
Novice (Lvl 1)
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Alright, i will make the changes
Wednesday, 13th January, 2010, 06:35 PM #165
Cutpurse (Lvl 5)
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Kathalia swipes at the elf again, temporarily distracting it with the force of her attack (Pounce hits for 9 damage - the next person to attack the elf before the end of Kathalia's next turn gets combat advantage).
Kathalia Stat Block
Kathalia, Elf Druid 3
Passive Perception 22, Passive Insight 15
AC 19, Fort 14, Reflex 17, Will 17
HP 19/36 Bloodied 18, Surge Value 9, Surges 9/9
Speed 8, Initiative +5
Action Points: 1
Current Effects
wolf form
Encounter Resources
Darting Bite
USED Predator's Flurry
USED Elven Accuracy (+ feat)
USED Screaming Hide Armor
Second Wind
Use Action Point
Daily Resources
Healing Word
Amulet of Resolution
Fleet Persuit
USED Fires of Life
Last edited by nerdytenor; Wednesday, 13th January, 2010 at 06:40 PM. Reason: formatting
Wednesday, 13th January, 2010, 08:21 PM #166
Defender (Lvl 8)
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ooc: By my count that drops the elf.
My games
Check out Living 4th Edition, a community-run 4e D&D living world open to all. Now open for character and adventure submissions!
Wednesday, 13th January, 2010, 10:04 PM #167
Gallant (Lvl 3)
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ø Block KenHood
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Last edited by KenHood; Wednesday, 13th January, 2010 at 10:13 PM.
Thursday, 14th January, 2010, 10:30 AM #168
Acolyte (Lvl 2)
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OOCHey guys, sorry for the delay. I've been very sick, but I'll post later today.
Thursday, 14th January, 2010, 05:14 PM #169
Scout (Lvl 6)
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"You bit me?" Tristan gives his head a little shake. "Maybe you're rabid," the elf says with a shrug. "Guess that means I should put you down." Suddenly lashing out, his sword flies across the hobgoblin's neck; blood splatters Tristan and the building, and the hobgoblin drops to the ground.
With a satisfied smile, Tristan moves through the alley and back into the street to find his next prey. Pointing at the dwarf he declares very seriously, "By Dayna's power, you will fall today, dwarf." The serious look leaving his face, his wolfish smile returns as he sets himself up to attack.
OOCStandard: Bond of Pursuit vs. hob: crit! Damage: 17+1d12+1d8=29 damage. By my count, that kills him, and Oath of Enmity recharges.
Move: to L8.
Minor: Oath of Enmity on dwarf.
Tristan statsTristan Moonblade - Male Elf Avenger (Dayna) 2
Passive Perception: 22, Passive Insight: 15; Low-light vision
AC:18, Fort:15, Reflex:17, Will:17 -- Speed:7
HP:20/34, Bloodied:17, Surge Value:8, Surges Left:9/9
+2 item bonus to saves vs. poison keyword, weakened, slowed, immobilized.
Action Points: 0, Second Wind: available
Bond of Pursuit
Radiant Vengeance
Angelic Alacrity
Avenger's Resolve
Channel Divinity
Elven Accuracy
Oath of Enmity
Oath of the Final Duel
Group Awareness: All non-elf allies within 5 squares of Tristan gain a +1 bonus to Perception.
Current and past PbP: http://www.enworld.org/forum/4853360-post58.html
Friday, 15th January, 2010, 04:55 PM #170
Acolyte (Lvl 2)
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Woe coughs and waves a path through the stench, while gathering his composure. While it may have seemed like the arrows whizzing past had both impacted with Hacker, it turns out Woe actually managed to instinctively deflect one despite the blinding fog, and thus the bard is not mortally wounded after all.
"No time to nap, Hacker. Your questionably patriotic kinsman over there on the roof seems to have misplaced his membership card to the United Gnomes Society. It's probably somewhere in his spleen; let's help him find it."
The warrior moves through the dispersing cloud and takes cover against the rooftop sniper, while closing the distance to his foes.
Standard: Second Wind.
Minor: Inspiring Word to heal Hacker a surge +6 hp.
Move: L9, "hiding" with Stealth 12 relative to the gnome and hobgoblin.
Nice, max healing. Must be the alternative narrative approach to describe it.
Woe Chinua - Human Fighter 3
Passive Perception 12, Passive Insight 12
AC 22, Fort 21, Reflex 19, Will 16
HP 30/46, Bloodied 23, Surge Value 11, Surges 10/11
Speed 5, Initiative +3
Action Points: 1,
Second Wind
Powers: Cleave, Knockdown Assault, Tide of Iron; Pass Forward; Spear of Myrdroon's Shard, Heavy Throwing Shield;
Passing Attack, Rain of Blows;
Comeback Strike,
Inspiring Word; Spear of Myrdroon's Shard, Heavy Throwing Shield


text:
Definición de bombora en inglés:
1A wave which forms over a submerged offshore reef or rock, sometimes breaking heavily and producing a dangerous stretch of broken water.
Oraciones de ejemplo
- There we met up with a Naval boat which led us out through the huge swell generated by a bombora.
- Just a few metres off the point there is a bombora that comes up from more than 20 metres to less than 4 metres.
- There was a huge bombora breaking to our left, and huge seas crashing on the rocks around the cliffs to our right.
1.1A submerged offshore reef or rock.
Oraciones de ejemplo
- The Southbound Voyage (3 nights) has an accent on the fascinating flora and fauna of the tropical rainforest islands and the outer 'bombora' reefs.
- Navigational hazards within Sydney Harbour include the Sow and Pigs reef (just inside the entrance and well-lit) and the Gowlland Bombora.
- With the sounder on and eyes focused on the screen, I slowly motored the boat up and over the submerged bombora.
1930s: from an Aboriginal word, perhaps Dharuk bumbora.
For editors and proofreaders
Saltos de línea: bom|bora
Definición de bombora en:
¿Qué te llama la atención de esta palabra o frase?
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By SUSANNE KAPPLER, Fort Jackson LeaderSeptember 16, 2009
FORT JACKSON, S.C. -- The Fort Jackson community mourned the loss of one of its Soldiers during a memorial service Monday at the Solomon Center. Spc. Christopher Hogg, Company D, 3rd Battalion, 13th Infantry Regiment died Sept. 10 after being hospitalized for one week at Palmetto Health Richland Memorial Hospital with pneumonia.
Hogg was remembered by his commanders, drill sergeants and comrades in Basic Combat Training as a quiet, but highly motivated Soldier who drew strength from his faith and was close to his family.
"Chris was no ordinary young man. He was an example of the best our nation has to offer," said Lt. Col. Benjamin Higginbotham, 3-13th commander. "Chris Hogg's exemplary life shows us that what measures you ... is not how many days you've had, but how you lived those days."
Hogg, 23, enlisted in the Army in July and wanted to become a cryptologic linguist. He was a graduate of Stetson University, but chose to serve his country instead of pursuing a civilian career in information technology.
"Spc. Hogg was very motivated. He put his best foot forward with every single thing he did," said Pfc. Richard Seyfang, a Soldier in Hogg's platoon.
Hogg was also remembered for keeping a positive attitude, even when things were tough in basic training.
"We were tired. We were weak," said Pvt. Daryl Tippens, also in Hogg's platoon. "He smiled and said, 'It's only a part of the training.'"
Pfc. Joel Birch said Hogg's death had a profound effect on the entire platoon.
"When we first heard the news, we were shocked and very disheartened," he said.
But the tragedy also inspired the platoon to pull together and focus on graduating, Birch said.
"We need to do this for Spc. Christopher Hogg, because that was the (kind of) Soldier he was," he said.
Sgt. 1st Class Anthony Edwards, one of Hogg's drill sergeants, remembered how Hogg displayed leadership ability early in basic training by motivating other Soldiers to overcome their fear of height on Victory Tower.
"Spc. Hogg was going to be a true Soldier who had the potential to one day lead and command troops," Edwards said. "He will forever be missed and will always be a '40 Rounds' Soldier."
Hogg, who hailed from Deltona, Fla., is survived by his mother and stepfather, Sarah and Gregory Wybo, his father Christopher Hogg and his sister and brother-in-law, Alicia and Nathan Adams. Hogg was scheduled to graduate Oct. 15.
"All he wanted was to wake up in ACUs and boots with an M16A2 rifle next to him," Tippens said.


text:
Created using this Craftsy indie pattern
This project was made from an independent Craftsy designer's pattern:
Recent projects from Craftsy Quilting classes:
QuiltingHearts and Flowers
QuiltingFalling Leaves
QuiltingTrinity Celtic Knot
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Love it!! Your felt wall hangings turned out beautifully!
09/24/2013 Flag
Your compliment means a lot to me. I'm making all of the silhouette mug rug series of your patterns this way. Love them. I hope you will continue to do one each month like this.
09/27/2013 Flag


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President, Blow Molded Specialties


text:
Citizens interested in helping professional emergency workers are invited to attend County Sheriff Jim Cummings' Community Emergency Response Team (CERT) class. Sessions will be held every Thursday from 6:30 to 8:30 p.m. from Oct. 3 through Nov. 21.
Those trained help during emergencies but also during large-scale events such as road races and festivals.
Classes will be held at the GenOn Energy Facility Training Room on Freezer Road in Sandwich.
Applications are available at www.bsheriff.com under "Community Relations."
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This monograph, without claiming originality, deals in a concise and readable form with the common animal parasites of man and the diseases caused by them. The format is excellent, and the many splendid illustrations are an outstanding feature. The American reader, educated by the work of the Council on Pharmacy and Chemistry of the American Medical Association, is shocked at the emphasis placed on proprietary pharmaceuticals, such as filmaron, gelodurat, helminal, butolan, oxylax, oxymors, oxural and wurmserol. Owing to absence of an index, the book is difficult to use for reference.
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