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Photo of elderly couple's heartbreaking goodbye is as sad as the story behind it
August 26, 2016, 12:48 p.m. by Jenn Savedge
After 62 years of marriage, the couple has been forced to split up, and it is breaking their hearts.
Who invented homework, anyhow?
August 24, 2016, 11:54 a.m. by Jenn Savedge
Kids hate it. Parents hate it. Teachers hate it. So why do we keep making kids do it?
How to find happiness after retirement
August 22, 2016, 3:59 p.m. by Jenn Savedge
There are 5 secrets to a happy life — and the biggest secret of all is that they apply to any stage of life.
How to include your pet in your wedding
August 18, 2016, 11:08 a.m. by Jenn Savedge
Make your furry, feathered or fishy friend a part of your big day with these tips.
Son's photo series captures the spirit of his 93-year-old mother
August 15, 2016, 2:03 p.m. by Jenn Savedge
Tony Luciani hopes his images will shed light on aging.
Parents get giddy as kids head back to school
August 11, 2016, 2:44 p.m. by Angela Nelson
After months of sibling bickering and shelling out big bucks for summer camps, these parents are celebrating as school starts.
How to get connected in your community
August 9, 2016, 3:25 p.m. by Jenn Savedge
Here are 4 ways to develop stronger relationships with people in your neighborhood.
6 things people forget to do before a big move
August 9, 2016, 6:07 a.m. by Chanie Kirschner
If these little tasks slip through the cracks, it could mean big problems for your major move.
Colorado kids help launch world's largest sport rocket
July 27, 2016, 12:48 p.m. by Jenn Savedge
Students join the experts in simulating a real-life launch campaign.
This tooth fairy drives a hard bargain
July 26, 2016, 12:14 p.m. by Jenn Savedge
Parents hijack tooth fairy's goodwill moment to send a legally binding agreement about chores. (Times have changed, kid.)
Mom of 3 honors best friend's dying wish by taking in her 6 kids
July 25, 2016, 8:43 a.m. by Jenn Savedge
'We started dancing as soon as the judge made his ruling.'
Construction worker creates real-life 'Where's Waldo?' game for kids at nearby hospital
July 20, 2016, 6:57 p.m. by Jenn Savedge
And he has even more surprises on the way.

subset: commoncrawl


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|I leave you with yet another doggy photo
Dress – Urban Outfitters
Shirt – Gap
Shoes – Urban Outfitters
I should probably be employed by Urban Outfitters. I mean, they dominate about 60 percent of my wardrobe, so it only makes sense.
|I leave you with yet another doggy photo
Your dress is adorable!! And oh my gosh, I had never before seen "culottes" before this post. Truly awful! Haha
Oh I remember the days you wore those! Oh gosh that seems like a whole different life. It brought back so many memories of days when we were young playing with babies. Oh gosh, it doesn't even feel like that was my life!
ps. love your blog and your cute clothes!
Jenna -- They were so awful! All the photos from that time in my life are on lock-down. haha
Sara -- It really does feel like a different life! It's insane how fast things change. And thank you, I love reading your blog, too!
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text:
Kate Hudson was snapped in a black on black ensemble that we're really into for fall. She wore faded black skinny jeans, a simple black halter-tank, and a gold pendant. She finished off the look with 70s-inspired shades that bring to mind our favorite images of Kate (of the Almost Famous variety, obviously). Grab a pair of black skinnies here and get her look.
Image via Denim Blog
Tags: black skinny jeans, buy jeans online, buy women's jeans, celebrity denim, celebrity style, faded black jeans, kate hudson denim, kate hudson jeans, kate hudson outfit, kate hudson style
One of our favorite denim style icons, Kate Hudson, was photographed wearing a matching printed denim short and printed denim shirt set in chicessays.com(available for pre-order of you click through). Matching sets were all the rage a few seasons ago, but Kate keeps it fresh by translating this woven trend into denim, and the subtle print doesn't register as busy when paired together. If you love printed jeans, check out our favorite picks for fall.
Image via Denim Blog.
Click to purchase the printed denim short and printed denim shirt.
Tags: celebrity denim style, celebrity denim trends, celebrity style, denim shorts, hate hudson denim, kate hudson, kate hudson outfit, kate hudson style, printed denim, star print
Demi Lovato was recently snapped looking calm and confident in a pair of J Brand's 8226 Photo Ready Cropped Skinny Jeans in Remix—click for a similar pair. These jeans have everything you need to transition into fall, from a skinny silhouette and dark wash to edgy distressing at the knees and thighs. Pair them with a filmy tank and your favorite cardigan for a perfect fall look like Demi's.
Image via Denim Blog.
Click here to buy a pair of J Brand's 8226 Photo Ready Cropped Skinny Jeans in Remix.
Tags: black skinny jeans, celebrity denim, celebrity outfit, celebrity style, Demi Lovato, Demi Lovato Denim, Demi Lovato outfit, Demi Lovato style, destroyed skinny jeans, J Brand Jeans
Elle Fanning was photographed looking super cute in NYC in a pair of Stella McCartney flare leg jeans, which have a high waist fit and a cool belted detail. She paired the medium wash jeans with a soft-gathered crop top and a long, 70s inspired hairstyle. She nailed the vintage reference with platform shoes. Simple and chic—we're into it. Grab these jeans and get her look.
Image via Denim Blog.
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First there was Britney Spears and Justin Timberlake in matching denim at the 2001 American Music Awards. The denim gown on Spears and denim tuxedo on Timberlake are forever ingrained on the impressionable minds of young millennials across the country. Then Katy Perry donned denim in an attempt to tug at the heart strings of her "90's kids" fans with her date, Riff Raff, at the 2014 MTV Video Music Awards. In Perry's famously kitschy fashion her gown was an obvious homage to the original worn by Spears.
Then Pharell Williams and his wife Helen Lasichanh wore matching double denim outfits last night at the 2015 MTV Video Music Awards and the whole fashion world was entranced once again. This time, however, it appeared the couple updated the double denim look in an honest act of self expression. Pharell was decked out in a white tee, denim jacket and jeans in a matching shade. Lasichanh wore a denim button up shirt trendily buttoned all the way to the top underneath a distressed pair of overalls. Pharell is known for being true to his sense of self and once you remember that he has joined G-Star to create his own line of denim products made from recycled plastics, G-Star RAW for the the Oceans, the denim outfit seems perfectly appropriate.
Photo courtesy of Vogue.com
—Emily B. McIntosh
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Hilary Duff was spotted in LA wearing a pair of olive green skinny jeans, specifically the Current/Elliott The Conductor Pants. She paired them with a simple black tank, tied up in the front. She paired them with simple black and white kicks for an off duty look. It seems like olive green is going to be the color of the upcoming season—and it's a great transitional hue, so don't hesitate to work it into your wardrobe. Buy a pair of Current/Elliott The Conductor Pants and get her look.
Image via Denim Blog.
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Classic denim silhouettes rendered in relevant fabrics has always been a great way to mix things up when you're looking to switch up your wardrobe. Miley Cyrus put this into practice when she wore a pair of Free People corduroy overalls on a recent outing. She paired them with a simple grey tee and Chanel sneakers. The icing on the cake of this casual look? Some pretty awesome sunglasses. Grab your overalls here and get Miley's look.
Image via Denim Blog.
Tags: celebrity denim, celebrity style, Corduroy Overalls, Denim Overalls, free people, Miley Cyrus, Miley Cyrus outfit, Miley Cyrus style
Though the hottest days of summer are in the past here in NYC, it's still humid enough to don white jeans, cropped skinny styles, destroyed denim shorts and simple white cotton tanks. We couldn't be anymore in love with Genetic Denim's summer lookbook, which we admittedly wish we'd seen a lot sooner. They nailed cool vintage denim style to a tee, with an effortless vibe that defines the lazy days of summer. See our favorite images from the shoot below, see the full lookbook here, and shop the collection here.
So fresh! What do you think? Tweet at us and let us know!
—DT Staff
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Rosie Huntington-Whiteley totally killed it with this outfit: a pair of moto-style leather skinny jeans and a bomber-inspired olive green coat. This is a pretty spot-on example of the fall style we're aspiring to this year, from her designer sunnies to her killer heels. Grab a similar pair of moto-style leather skinny jeans and get this look.
Image via Denim Blog.
—DT Staff
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Elle Fanning was recently photographed getting out of a car in front of a hotel in West Hollywood in a pair of HUDSON Krista Released Hem Cropped Skinny jeans. She paired them with an off-duty white tank and platform sandals. The cropped hem hits just above her ankle, which we think is pretty chic. Click here to purchase a similar pair of jeans.
Image via Denim Blog.
—DT Staff
Tags: celebrity denim, celebrity style, cropped jeans, Elle Fanning, Elle Fanning denim, Elle Fanning jeans, Elle Fanning style, skinny jeans


text:
|Publication number
|Publication type
|Application number
|Publication date
|May 7, 2002
|Filing date
|Aug 4, 2000
|Priority date
|Aug 4, 2000
|Fee status
|Publication number
|Vladimir Peremychtchev, Joseph Kristul, Igor Rakhvalsky
|Original Assignee
|Vladimir Peremychtchev, Joseph Kristul, Igor Rakhvalsky
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (6), Non-Patent Citations (2), Referenced by (13), Classifications (16), Legal Events (4)
|External Links: USPTO, USPTO Assignment, Espacenet
The present invention relates to the field of semiconductor lithography, in particular to a method and apparatus for coating a substrate with a polymer solution and for drying the applied coating. More specifically, the invention relates to the formation of photo-, electron-, and X-ray resists on the surfaces of semiconductor wafers.
Resists are organic or inorganic materials which are applied either directly onto the surface of semiconductor substrate or onto the surface of a topological layer preformed on the substrate for the formation of a selected latent image of a pattern which later is turned into a functional layer of a chip to be produced. In a majority of cases, the materials applied on the semiconductor substrate are organic materials. There exist a great variety of such materials. Among them, tens of polymer compositions are commercially used as polymer-type resists. Types and properties of some of them are described, by Wayne M. Moreau in: "Semiconductor Lithography. Principles, Practices, and Materials", Plenum Press, New York, London, 1988.
In the process of development of the latent image formed in the resist as a result of exposure to light or other radiant energy, the exposed or non-exposed areas are removed by subsequent etching processes to form the so called mask having a configuration of the aforementioned pattern. The aforementioned process is known as semiconductor lithography. The mask produced by the semiconductor lithography plays a crucially important role for protecting the masked areas during processing of opened areas in subsequent processes such as doping by ion implantation, coating in lift-off lithography, etching, etc. Films from which masks are formed are normally have a thickness within the range of from fractions of micron to several microns.
It is understood that protective property of the mask is one of the most important factors in the quality of the entire chip manufacturing process.
The properties of the mask, in turn, to a great extent depend on technological operations used in the manufacture of the masking film, such as application of a coating material on a substrate from a solution, uniform spreading of the applied material over the substrate, and drying of the applied coating for the formation of a coating film.
Quality of the masking films is determined by such factors as uniformity of thickness and properties, presence of defects such as pinholes, surface cracks, structural nonuniformity caused by foreign particles, etc., and adhesion.
It is understood that processes used for the manufacture of the mask should exclude formation of the aforementioned defects and combination with high adhesion of the film to the substrate.
It is obvious that a main process that determines the final quality of the mask is drying. In the context of the present invention, the term "drying" means removal of the solvent from the liquid polymer coating applied onto the surface of the substrate. It is understood that physical and chemical processes, which accompany removal of the solvent from resist also, may lead to conversions in the polymer itself. Such conversion, however, occur at temperatures higher than the temperature of drying. It should be noted in this connection, that the step of drying can be divided into a process of drying itself at a temperature that does not cause the aforementioned conversions and a process of baking at a temperature that is maintained to cause such conversion as hardening.
More specifically, drying out of a material includes the processes of penetration of the solvent from the polymer itself into free volumes in the polymer, such as voids, microcracks, or air bubbles with subsequent transition of the solvent from the liquid state into a vapor phase a gaseous phase (vapor). Kinetic characteristics (time behavior) of the above-indicated processes determine the mechanism of removal of the solvent from the coating.
The initial stage of drying, which is normally carried out at room temperatures, is characterized by a high content of the solvent in the polymer coating. As the coating becomes dry, the yield of the solvent into a gaseous phase is retarded, whereby the rate of drying is reduced. It is known, however, that by holding the polymer coating only at room temperatures, it is impossible to obtain high values of protective properties such as adhesion, defect-free condition, etc.
Therefore, for obtaining the above properties, drying should include a high-temperature stage (i.e., the stage at a temperature above room temperature but below the glass transition temperature for the polymer −Tg. After completion of the phase separation at the first stage of drying with the formation of a polymer matrix that contains the solvent, the increase in the process temperature accelerates diffusion of the solvent into the polymer (as a rule, a constant of diffusion depends on the temperature exponentially). As a result, the solvent is rapidly removed from the polymer matrix. Increase in the polymer temperature also decreases its viscosity, which in addition to the aforementioned accelerated diffusion, leads to a decrease in internal stress. This, in turn, affects uniformity of adhesion over the coating area. It is understood, however, that the high-temperature stage of drying should not exceed the level at which such undesirable thermodestruction or thermopolymerization may occur.
It is known that the initial stage of drying of a polymer at an increased temperature is accompanied by a sharp increase in the rate of solvent removal. After having reached its maximum, this rate then drops to zero.
As has been mentioned above, evaporation of the solvent from the external surface of the coating occurs in parallel with a phase transition (evaporation) into free volumes of the polymer matrix, such as microcracks, voids, etc. This process is known as internal vapor formation.
It has been proven experimentally that connection exists between internal vapor formation and protective properties, for example, of a photoresist coating. Many factors influence kinetic characteristics of the process of the internal formation. The following are examples of these factors: concentration of the solvent in the polymer, solvent vapor pressure, geometry of microcavities, density of distribution of microcracks and microcavities in the coating volume, coefficient of diffusion of the solvent, viscosity and surface tension of the polymer coating, and temperature of the coating.
The increase in the rate of internal vapor formation leads to an increase in concentration of defects and to a decrease in adhesion of the coating to the substrate. These phenomena are caused by an increase in the gas pressure of solvent vapor in microcracks and microcavities and by subsequent opening of the aforementioned microcracks and microcavities to the interface between the substrate and the coating film and to the external surface of the film.
It is obvious that surface microcracks as well as microcavities and microcracks located near the surface of the coating film affect adhesive and protective properties of the coating film to a lesser degree than those located inside the film and on the interface between the coating and the substrate. It is understood that aggregation of such defects distributed across the film cross section may lead to the formation of pinholes in the coating film.
At the first stage of drying the internal vapor generation in the protective coating with a high concentration of the solvent does not essentially affects protective properties of the polymer coating. This is explained by favorable conditions for removal of the solvent at this stage of the drying, such as a relatively high rate of diffusion of the solvent molecules in the polymer film and high mobility of the polymer molecules enhancing closing of microcracks and microcavities.
Decrease in the concentration of he solvent is accompanied by an increase in the viscosity of the polymer in the coating film and decrease in planarization ability (as used herein the planarization ability is an ability of the polymer to create a flat surface and to heal irregularities of edges of the opened microcracks).
It should be noted that microcracks and microcavities in the coating film greatly vary in their shape and dimensions and that the smaller these defects, the better properties of the final coating.
The factor preventing the action of internal vapor formation and suppressing the propagation of gas microcracks is an excessive external pressure in combination with heating of the coating film.
An attempt has been made to improve properties of the coating film by a method comprising the steps of: retaining the polymer coating at room temperature for a time interval from 20 sec to 1 hour; heating of the coating at an increased pressure sufficient for suppressing propagation of microcracks into the coating and for deteriorating its properties; and cooling the treated coating. See an article by V. P. Lavrischev, V. A. Peremychtchev in: "Study of mechanism of removing the solvent from the photoresist film", 1975 Electronics, issue 5 (53), pages 58-65).
However, the entire process was conducted in one and the same chamber, and this did not allow to eliminate the phenomenon of internal vapor formation. Therefore the method described above did not allow to produce a defect free product. Furthermore, this method does not ensure adequate adhesion of the coating film to the substrate, which shortens the service life of the polymer coating. Both drawbacks are initiated by the process of propagation of microcracks of the coating during its drying. This has been confirmed by experiments conducted with the use of an apparatus described in "Electronic industry" No. 5 (77), pages 50-52, 1979, Moscow, "Unit for forming photoresist coatings AFF-2", by V. V. Anufrienko, V. I. Osnin, V. A. Peremychtchev, V. L. Sanderov, V. N. Tsarev.
The aforementioned apparatus has a sealed working chamber with a heater connected to a loading chamber via an air-tight damper on one side and to an unloading chamber via an air-tight damper on the other side. The working chamber can be connected via an appropriate shut-off valve system to a high-pressure main.
In such a device the excessive pressure is built up at the stage of holding the polymer coating at elevated temperatures. In this case, building-up of the excessive pressure in a high-temperature chamber is possible only after loading the substrate into the chamber and closing the loading hatch with an air-tight damper. A disadvantage of the aforementioned device is that the high pressure is released while the substrate is still hot and development of microdefects is still possible.
Furthermore, even an insignificant time shift between the high-pressure process and the high-temperature process may result in an instant reaction of the film to deviations in the drying conditions with the formation of the cracks. This is because the film is very thin and can be instantly overheated under normal pressure if the application of high pressure and high temperature are not synchronized.
U.S. Pat. No. 5,361,515 issued to Peremychtchev on Nov. 8, 1994 discloses a method and apparatus for drying the protective polymer coating applied onto the surface of a substrate article from solution. The process described in the aforementioned U.S. patent is characterized by the fact that at the drying stage of holding the coating at room temperature, the action of excessive pressure precedes the raise of temperature, while at the stage of cooling the temperature drop precedes the release of high pressure.
The apparatus of U.S. Pat. No. 5,361,515 differs from the apparatus described above by a provision of two additional drying chambers located in front and behind the working chamber respectively. The front drying chamber, which is installed between the loading chamber and the working chamber, is intended for drying the coating at room temperature, while rear drying chamber is intended for cooling after drying at high temperature and high pressure in the main working chamber.
A main disadvantage of the invention of U.S. Pat. No. 5,361,515 is that the front and rear chambers have limited functional capabilities. More specifically, the front drying chamber, which determined initial stage of drying, makes it possible to conduct initial drying only in a strictly specified temperature range of 18� C. to 28� C. However, films formed prior to transfer to the main high-temperature and high-pressure chamber under the indicated temperature range, may have meso- and macroscopic nonuniformities. This is because isolation of the phase with low content of the solvent may occur already in the initial drying stage in the front chamber. This means that the in the coating film transferred to the main chamber the solvent may already have a nonuniform distribution. In other words, the coating film will contain inclusion of a solid phase, i.e., inclusions of the phase, which is harder than the rest of the coating material. Such clusterization takes place during polymerization even in a liquid phase.
In subsequent drying under high temperature and high pressure the aforementioned solid phase inclusions will serve as sources of concentration of stress, impair adhesion, and form microcracks and microcavities around the nuclei of the stress.
It is known that the film formation process has a very complicated mechanism, which depends not only on the temperature of drying but also on variation of temperature in time. Therefore it is very important to control the initial drying process in time. However, the apparatus of U.S. Pat. No. 5,361,515 does not allow such control.
The stage of cooling in the rear chamber after release of pressure is carried out via a contact-type cooler which does not allow quick and combined modes of cooling which may be required for obtaining a high quality coatings free of internal stress and microdefects in combination with high adhesive properties of the coating film.
It is an object of the invention to provide a method and apparatus, which allow initial drying in a wide temperature range with controlled temperature variation mode in the drying stage. Another object is to provide method and apparatus which allow quick and combined modes of cooling of the coating film at the cooling stage after release of high temperature and high pressure. Still another object is to provide coating films, which are free of defects caused by internal stress and microcavities.
An apparatus of the invention is intended for the formation of coating films on substrates and consists of a main high-temperature and high pressure drying chamber with two additional chambers located in front and behind the working chamber respectively. The front drying chamber, which is installed between the loading station and the working chamber, is intended for drying the coating at room temperature, while the rear drying chamber is intended for cooling after drying at high temperature and high pressure in the main working chamber. The front and rear chambers are provided with means for adjusting the respective drying and cooling processes by means of respective heating and cooling systems. This allows initial drying in a wider temperature range and final cooling under most optimum conditions.
FIG. 1 is a side sectional view of a known apparatus for the formation of coating films on substrates with the drying under elevated pressure.
FIG. 2 is a side sectional view of an apparatus of the invention for the formation of coating films on substrates with an improved chambers for preliminary drying and a for post-drying cooling.
FIG. 3 is a graph illustrating an example of temperature variations during preliminary drying of the coating layer.
An apparatus of the invention for drying a polymer coating on a substrate is shown in FIGS. 2, which is a side sectional view of the apparatus. As can be seen from this drawing, similar to the prior art device, the apparatus of the invention consists of three major parts sequentially arranged one after another in the direction of process steps, i.e., a preliminary drying chamber 10, a main high-pressure drying chamber 11, and a post-drying cooling chamber 13.
The preliminary drying chamber 10 is a sealed chamber, which has a loading hatch 12 with an air-tight damper 14 and an unloading hatch 16 with an air-tight damper 18. Located inside the chamber 10 is a platform 20 for receiving semiconductor substrates (not shown) with a polymer coating, e.g., a semiconductor wafer with a resist coating in a liquid state, and a conveying mechanism 22 in the form of an endless belt for conveying the wafers from the loading hatch 12 to the unloading hatch 16.
Located underneath the platform 20 is a preheater 24, e.g., of an infrared type. This infrared preheater may comprise, e.g., quartz lamps having tungsten spiral heating elements and filled with krypton. The preheater is connected to an electric power supply unit 26 via electric feedthrough devices 28 and 30 and lead wires 32 and 34. Such feedthrough devices are known in the art.
Located above the platform 20 is a precooler 36 in the form of a flat heat exchanger with dimensions exceeding the size of the water being treated. The precooler may comprise, e.g., a Peltier-type cooler which consists of a semiconductor plate 38 connected to a current supply unit 40 via electric feed through devices 42 and 44. The heat generated by the semiconductor plate is removed by heat-exchanging tubes 46, which are guided outside the chamber 10 via feedthrough devices (not shown). Peltier-type coolers are produced, e.g., by ThermoElectric Cooling America, Chicago Ill., USA.
The coolers of this type are characterized by instant cooling which is very important for controlling the preliminary drying process.
The current supply units 26 and 40 are connected to a controller 48 for simultaneous controlling operations of the preheater 24 and the precooler 36.
The chamber 10 is connected via shut-off valves 50 and 52 with a high-pressure pipeline 54. A branch 56 from the portion of the pipeline 54 located between the shut-off valves 50 and 52 has a shut-off valve 58 for connection to the atmosphere.
The preliminary drying chamber 10 is connected via the unloading hatch 16 to the main high-temperature high-pressure drying chamber 11.
The high-temperature chamber 11 is a sealed chamber which is provided with a hatch 60 and an air-tight damper 62 for unloading the wafers into the post-drying cooling chamber 13. Located inside the high-temperature chamber 11 is a platform 64 for receiving the wafers from the chamber 11 and a mechanism 66 in the form of an endless belt for conveying the wafers. The chamber 11 is connected with a high-pressure pipeline 54 through a pipe 68 with two shut-off valves 70 and 72. The pipe 68 has a branch 74 between the shut-off valves 70 and 72. The branch 74 has a shut-off valve 76 for connecting the pipe 68 to the atmosphere.
Located beneath the platform 64 is a heater 78, which is connected via electric feedthrough devices 80 and 82 to a current supply unit (not shown).
Next in the direction of movement of the substrate in the technological process is the post-drying cooling chamber 13. Similar to the chambers 10 and 11, the chamber 13 is a sealed chamber that has a platform 84 with a wafer conveying means 86 in the form of an endless belt. The wafers are loaded onto the platform 84 via the hatch 60 and an air-tight damper 62 of the high-temperature high-pressure chamber 11. The treated wafers are unloaded from the chamber 13 via a hatch 88 and an air-tight damper 90.
Located beneath the platform 84 is a cooler 92, e.g., of the same type as the Peltier cooler 36 of the chamber 10. The feedthrough devices, power supply, and a controller of the cooler 36 are not shown as they are substantially the same as those associated with the cooler 36. Similar to the chambers 10, and 11, the cooling chamber 13 is connected to the high-pressure pipeline 54 via a pipe 94 having two shut-off valves 96 and 98. The pipe 94 has a branch 100 at a point between the shut-off valves 96 and 98 with a shut-off valve 102 for connecting the pipe 94 to the atmosphere.
Operation of the Apparatus of FIG. 2
The apparatus of the invention operates as follows:
Preliminarily, the high-temperature chamber 11 is prepared for operation. For this purpose, the air-tight dampers 18 and 62 are closed, the heater 78 is activated, the shut-off valves 70 and 72 of the high-pressure pipeline 54 are opened (the shut-off valve 76, which connects the chamber 11 with the atmosphere, is closed for the entire cycle of drying of the polymer protective coating).
A substrate (not shown) with a liquid polymer coating on its upper surface is loaded into the preliminary drying chamber through the opened loading hatch 12 by means of the conveying belt 22 onto the platform 20. The damper 14 of the hatch 12 is closed, and the shut-off valve 50 is opened while the shut-off valve 52 is opened (the shut-off valve 58 that connects the chamber 10 with the atmosphere, is closed). Under these condition, the preliminary drying cycle, i.e., the first temperature cycle, is initiated. The heater 24 and the cooler 36 are activated, and the controller 48 sets the temperature mode for the first temperature cycle.
The inventor has found that polymeric coatings may require different temperature modes of preliminary drying, which depend, e.g., on the type of the polymer and the type of a solvent in the coating. Therefore the temperatures required for the first temperature cycle may go beyond the range of 18� C. to 28� C., as specified by the U.S. Pat. No. 5,361,515. In other words, the temperature of first temperature cycle may be below 18� C. and higher than 28� C. Furthermore, some types of resists, e.g., Kodak KTFR negative photoresist (trademark of Eastman Kodak), or the like, in combination with a number of solvents, demonstrate the best results when the first temperature cycle is carried out at a temperature exceeding 30� C. Other resists may require complicated temperature modes with rapidly alternating cycles of heating and cooling to room temperature. An example of such alternating temperature modes is shown in FIG. 3, where time is plotted on the abscissa axis and the temperature is plotted on the ordinate axis. More specifically, the mode of the first temperature cycle in the chamber 10 may include several cycles of rapid heating to a temperature close to or even slightly exceeding (by several degrees) the glass transition point Tg and even the boiling point Tb of the solvent, in which the polymer is dissolved. Under this condition, the solvent is not transferred into a gaseous phase, but rather is turned into an overheated liquid, which has a very high mobility in the polymer matrix. As a result, the solvent is expelled from the inner layers of the coating film to the surface of the film without violation of the continuity of the coating film.
As shown in FIG. 3, the first temperature cycle in the chamber is started at atmospheric pressure and then, after a certain period of time, the shut-off valve 58 is closed, the shut-off valves 50 and 52 are opened, and hatch 18 is opened. As a result, the working gas is supplied under an elevated pressure to the chamber 10, so that the pressure in this chamber rapidly increases (FIG. 3). This constitutes a first pressure cycle, i.e., the pressure cycle conducted in the preliminary drying chamber.
The final temperature of the wafer at this stage of drying is determined by the temperature mode which is set by the controller and is selected in a wide range, depending on the type of the polymer and solvent in the coating layer. An example of the temperature mode in the chamber 10 is shown in FIG. 3 as alternating heating and cooling cycles. It is understood that such a mode is given only as an example and that many other temperature modes are possible.
After the first temperature cycle, which is conducted in the chamber 10, is accomplished, the wafer is transferred via the open hatch 16 onto the platform 64 of the chamber 11 by the conveyor belt 66. Since the hatch 16 was open, the pressure in the chamber 11 is the same as in the chamber 10.
The main drying cycle, i.e., the second temperature cycle, which is conducted in the high-temperature high-pressure chamber 11, does not differ from that of the prior art device. More specifically, the wafer is retained in the chamber 11 at a predetermined temperature, which in general is higher than the temperature in the chamber 10 (FIG. 3), and under the same predetermined pressure selected so as to provide the most optimal conditions for the main drying cycle and for the formation of a high-quality coating layer free of defects.
After the wafer is transferred to the platform 64 of the high-temperature high-pressure chamber, the damper 18 may be closed for closing communication between the chambers 10 and 11. However, since the shut-off valves 70 and 72 are open, and the shut-off valve 76 is closed, the chamber 11 remains connected to the high-pressure pipeline 54, so that pressure in the chamber 11 remains high. As soon as the hatch 16 is closed, the shut-off valve 52 is closed, and the shut-off valve 58 is opened, whereby the pressured in the chamber 10 is released to the atmosphere. The hatch 12 can now be opened by opening the damper 14, so that the next wafer can be loaded into the preliminary drying chamber 10, and processing of the next wafer can be started while the first wafer is still in the high-temperature high-pressure cycle in the chamber 11. The pressure cycle conducted in the chamber 11 is called the second pressure cycle.
When this high-temperature high-pressure cycle is close to completion, the shut-off valve 102 is closed and the shut-off valves 96 and 98 are opened. The damper 90 of the hatch 88 in the post-drying cooling chamber 13 is also closed. Upon completion of the second temperature cycle and the second pressure cycle in the chamber 11, the pressure in the chambers 11 and 13 is the same, since both these chambers are connected to the high-pressure pipeline 54 via respective shut-off valves. Now the damper 62 of the hatch 60 can be opened, and the first wafer is transferred by the conveyor belt 66 to the conveyor belt 86 via the hatch 60 and is placed onto the platform 84 of the post-drying cooling chamber 13.
Since the temperature of the platform 84 and of the entire environment in the chamber 13 is preset by the controller (not shown) and is lower than in the high-pressure high-temperature chamber 11, the process of cooling of the first wafer is started at the moment when this wafer enters the chamber 13. The cooling is carried out by means of the heat-exchange cooler 92. During this cooling cycle the high-temperature high-pressure cycle can be started for the second wafer, and the first chamber 10 can be prepared for loading the third wafer. The third wafer is then loaded into the first chamber 10 after the hatch 60 is closed. When the cooling cycle in the chamber 13 is close to completion, the hatch 60 is closed by the damper 62, and the pressure in the chamber 13 is dropped by closing the shut-off valve 98 and opening the shut-off valve 102. The hatch 88 is then opened by raising the damper 90, and the first wafer is unloaded from the apparatus as a final product.
The entire wafer treatment cycle is then repeated for the second wafer, which by that time could have been transferred to the platform 64 of the chamber 11.
The method and the apparatus of the invention were tested experimentally by drying coating films prepared from photoresists of DQ-type produced by Elma Factory, Zelenograd, Russia and of FP-051SH type produced by NIOPIK, Dolgtoprudny, Russia.
The tests were aimed at studying dependence of adhesion on parameters of drying of the photolayer under pressure, in particular, on the temperature of the polymer coating in the low-temperature stage of the process prior to the high-temperature high-pressure cycle.
Types of photoresists chosen for the tests had different compositions including different solvents and different viscosities.
The polymers were applied onto a chromium-plated glass substrates by a centrifuge with the frequency of rotation that ensured thickness of the coating layer in the range of 1.0�0.05 μm. Subsequent drying was carried out on the apparatus of the invention. The test was carried out under the following temperature conditions:
22� C.—temperature of the environment (the heat exchanger is switched off);
14� C.—manufacturer-recommended storage temperature for DQ-photoresists;
30� C.—temperature at which rapid removal of the solvent from the photoresist is initiated.
Other temperature and pressure conditions were the same as in the method described in U.S. Pat. No. 5,361,515. The residence time of preliminary drying in the first chamber was 3 min. The residence time for high-temperature high-pressure drying in the second chamber at 100� C. was 15 min. The pressure was 0.8 MPa. Ten plates of photoresists of each type were tested.
A criterion of adhesive strength of the coating layer to the substrate was a condition of a 1 μm-wide control line produced in photoresist by photolithography. The adhesive strength was evaluated by immersing the test plates in a weak solution (06.%) of KOH and measuring the lifetime of the aforementioned line on the substrates.
The results of the test are given in a table below.
Number of plates (out of 10) that preserved
the marking line
(0.5 μm
Treatment time (min)
drying, � C.
As can be seen from this table, the temperature during preliminary drying affects the adhesive strength. This dependence is different for different resists. It can also be seen that improved adhesion can be obtained by preliminary drying at temperatures beyond the limits specified by U.S. Pat. No. 5,361,515.
Thus, it has been shown that the present invention provides a method and apparatus, which allow initial drying in a wide temperature range with controlled temperature variation mode in the drying stage, and combined modes of cooling of the coating film at the cooling stage after release of high temperature and high pressure. The invention provides quick removal of the solvent at the initial drying stage without violating the continuity of the coating film and without defects caused by internal stress and microcavities.
Although the invention has been described with reference to a specific embodiment, it is understood that this embodiment should not be construed as limiting the application of the invention. Therefore any changes in the shapes, materials, and constructions are possible, provided these changes do not depart from the scope of the patent claims. For example, the temperature mode in the chamber 10 can be different from the one shown in FIG. 3. The temperature in the chamber 10 can be raised to the level of temperature in the chamber 11 prior to initiation of the preliminary drying cycle in the chamber 10. The shut-off valves 50, 62, 58, 70, 72, 76, 96, 98, 102 can be controlled automatically and in synchronism with opening and closing the hatches by means of respective dampers. The three chamber apparatus was shown as an example of the most productive process suitable for continuous treatment of large quantities of substrates. It is understood that the entire method can be carried out in a single chamber, e.g., in the first chamber. In this case, however, each next drying step can be initiated only after completion of the previous step.
|Cited Patent
|Filing date
|Publication date
|Jun 6, 1975
|Sep 27, 1977
|Eastman Kodak Company
|Method for reducing mottle in coating a support with a liquid coating composition
|Jul 18, 1990
|Apr 16, 1991
|The Standard Oil Company
|Epoxy fluorocarbon coating compositions and the process to make the same
|Jun 28, 1991
|Sep 28, 1993
|Xerox Corporation
|Method of cleaning, coating and curing receptor substrates in an enclosed planetary array
|May 8, 1991
|Nov 8, 1994
|Nauchno-Prorvodstvennaya Firma Aktsionernoe Obschestov Zaknytogo Tika Teknologia Obarudovanie Materialy (Ao "Tom")
|Method of drying a protective polymer coating applied onto a surface of an article from a solution, and device for effecting thereof
|Mar 24, 1995
|Aug 5, 1997
|Apx International
|Method of minimizing defects in painted composite material products
|Aug 26, 1998
|Dec 11, 2001
|Clariant International, Ltd.
|Antireflection or light-absorbing coating composition and polymer therefor
|V. P. Lavzischev et al. "Study of Mechanism . . .", 1975, Electronics, Issue 5(53) pp. 58-65 (Russian).
|V.V. Anufrienko, et al. "Electronic Industry", No. 5(77) p. 50-52, 1979, Moscow.
|Citing Patent
|Filing date
|Publication date
|Jul 13, 2000
|Jul 20, 2004
|Kabushiki Kaisha Toshiba
|Pattern forming method and light exposure apparatus
|Jan 12, 2010
|Ppg Industries Ohio, Inc.
|Water based damper
|Aug 23, 2005
|Mar 16, 2010
|Bsh Bosch Und Siemens Hausgeraete Gmbh
|Drying method for a household appliance and household appliance for carrying the drying method
|Jun 1, 2007
|Feb 1, 2011
|Tokyo Electron Limited
|Substrate processing apparatus
|Dec 20, 2010
|May 22, 2012
|Tokyo Electron Limited
|Substrate processing method
|Dec 28, 2001
|Aug 5, 2004
|Tetsuya Saito
|Substrate heating device and method of purging the device
|Feb 17, 2006
|Aug 24, 2006
|Dow Global Technologies Inc.
|Water based damper
|Aug 23, 2005
|Jan 10, 2008
|BSH Bosch und Siemens Hausger�te GmbH
|Drying Method For A Household Appliance And Household Appliance For Carrying The Drying Method
|May 12, 2005
|May 22, 2008
|Josef Krizek
|Method and Device for Drying Objects, Especially Painted Vehicle Bodies
|Dec 6, 2007
|Jul 10, 2008
|Tetsuya Saito
|Substrate heating apparatus and purging method thereof
|Feb 17, 2006
|Jul 17, 2008
|Dow Global Technologies Inc.
|Water based damper
|Dec 31, 2009
|Jun 16, 2011
|Hon Hai Precision Industry Co., Ltd.
|Spraying method for forming coating layer on workpiece
|May 12, 2005
|Dec 8, 2005
|Eisenmann Anlagenbau Gmbh & Co. Kg.
|Method and device for drying objects, especially painted vehicle bodies
|U.S. Classification
|34/497, 34/428, 427/374.1, 34/429
|International Classification
|Cooperative Classification
|European Classification
|Oct 5, 2005
|Fee payment
Year of fee payment: 4
|Dec 14, 2009
|Maintenance fee reminder mailed
|May 7, 2010
|Lapse for failure to pay maintenance fees
|Jun 29, 2010
|Expired due to failure to pay maintenance fee
Effective date: 20100507


text:
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Model: 29812 Item: AVE29812
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Monday, August 29, 2016
Starz Presents Animated Double Features
Starz Kids & Family will present a monthlong "Amazing Animation" double feature lineup starting Saturday, August 1 at 6 p.m. ET/PT. Ten kid-friendly titles are scheduled, with ... Continue Reading →
Patrick Warburton to Host 41st Annies
The 41st Annual Annie Awards, will be hosted by popular comic actor and voice-over star Patrick Warburton, on Feb. 1st, 2014 at UCLA's Royce Hall. "We are really excited ... Continue Reading →
Reel FX, Crest Propose 10-Pic Venture
India's Crest Animation Studios and U.S.-based vfx studio Reel FX are looking to join forces in a proposed $220 million venture that would generate 10 films over eight year, according ... Continue Reading →


text:
Articles in Stories, True and Otherwise
A short film co-starring Dirk Birthworthy.
Thanks, Doc.
I take a walk almost every day, usually early, before the day gets hot and busy.
Jane Misha Bunting, born 16 September 2014, 10:10 AM, seven pounds, one ounce; and her favorite aunt.
Time is the main topic on a funeral day: the quality of it spent, its scarcity, the odd way it behaves.
One of the strange things about my life in writing about TV, if by "strange" you mean "eminently predictable by anyone who finished Psych 101," is that my parents allowed me to watch almost no …
Sherry went into her bedroom. The livable half, the light coming through the blue tarps, looked like it should be a seafood restaurant called The Mermaid Grotto, and it smelled like a lumberyard.
Chapter 1.
The Conference on Baseball in Literature and Culture is Friday!
One time, years ago, I started making a list of all the nicknames I had for the Hobe: Orangino. Hobey Wan. Clicks. Herr Mittenspiel. Grampy. Creamsicle. Tolstoy.


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Home > Vehicle Ratings > Used Car Safety Ratings
On this page:
Used Car Safety Ratings provide you with the crash safety rating for the driver. They show you how well each vehicle protects its driver from death or serious injury in a crash.
It is also important that your vehicle offers good protection to other road users with which it might collide, including pedestrians, cyclists and motorcyclists, or the drivers of other vehicles. For example, the crash statistics analysed by Monash University indicate that many large SUVs are more likely to cause serious injuries to other road users in a crash than most other vehicles.
If you want to help reduce road trauma, you need to consider how your vehicle protects other road users as well as you, the driver.
Browse the Used Car Safety Ratings for vehicle categories
How the Used Car Safety Ratings are calculated
Records from more than 7.5 million vehicles in police-reported road crashes and more than 1.7 million injured road users in New Zealand and Australia between 1987 and 2013 were analysed by Monash University Accident Research Centre.
Ratings on protection to drivers (crashworthiness), harm to other road users (aggressivity) and combined crashworthiness and aggressivity (total secondary safety) were calculated using internationally reviewed methods. The ratings shown are the crashworthiness ratings.
Vehicles identified as a "Safe Pick" are those that score in the best category for both crashworthiness and total crash safety, do not have a worse than average aggressivity and also have Electronic Stability Control available at lest on some models. It is recommended that vehicles with electronic stability control are purchased where possible. The ratings are influenced by the vehicle mass, the structural design of the vehicle body and the safety features such as airbags and types of seatbelts in the vehicle.
The ratings include only those results for 1996 vehicles onwards. This reflects mandated compliance of post 1996 vehicles to a minimum standard for occupant protection in frontal impacts (ADR69). The vast majority of pre 1996 vehicles provide relatively poor occupant protection in a crash. No pre 1996 vehicle was rated in the best category for crashworthiness performance.
There are 217 vehicle models with ratings for protection to drivers. These cover most of the popular vehicles in the Australian and New Zealand vehicle fleets.
The "Safe Pick" vehicles have been identified from the Total Safety Rating for each model that combines driver protection as well as harm to other road users in a crash as well as only recommending vehicles available with Electronic Stability Control. Why?
The total safety rating identifies how well individual vehicle models protect ALL road users from injury in the event of a crash, including cyclists, pedestrians, motorcyclists and drivers of other vehicles. This is a better guide to the TOTAL COMMUNITY IMPACT of vehicle safety.
The crashworthiness of a light vehicle is relevant to injury outcome in around 90% of crashes in Australasia whilst vehicle aggressivity is relevant to injury outcome in around 55% of crashes. Consequently the total crash safety rating is weighted more highly towards the crashworthiness performance than aggressivity performance of each vehicle. This also means that the estimated total safety rating correlates more closely with the crashworthiness estimates of the vehicle rather than the aggressivity estimates.
If we are serious about reducing road trauma, we need to consider how any vehicle we purchase protects ALL road users, not just its own occupants. Vehicles identified as a "Safe Pick" provide best possible injury protection to all road users including their own occupants.
Electronic Stability Control is a crash avoidance technology that has been proven to be effective in a number of studies internationally. Vehicles are only recommended as a "Safe Pick" if Electronic Stability Control is available on that model. For some vehicle models Electronic Stability Control will be only available on certain variants or as an option. The "Safe Pick" only applies to vehicles fitted with Electronic Stability Control.
Why have the Used Car Safety Ratings been produced?
These ratings are produced to help people in the market who are buying a used car identify the safest models. Armed with this information, consumers can also place pressure on importers and dealers to encourage them to sell and promote safer vehicles. People are encouraged to use this guide to help them choose the safest possible car for the money they have available.
If all vehicle designs were equivalent to the safest model, the number of fatal and disabling crash injuries could be significantly reduced. Safety designs that may significantly reduce risk of death or injury include: crumple zones, collapsible steering columns, reinforced door frames, front, side and curtain airbags and seat belts designed to work with airbags and minimise crash forces on occupants. The overall safety of a vehicle will depend on how many of these features are present and how well they are designed and work in combination to protect people from injury in a crash. These ratings give objective assessment of the safety performance of the models rated when involved in a crash.
What types of vehicles are included in the ratings?
These ratings cover the majority of popular passenger vehicles and light commercial vehicles. The rated vehicles have been classified into 10 categories, comprising 4 categories of regular passenger car, 3 categories of Sport Utility Vehicle (SUV), 2 categories of light commercial vehicle, and 1 category of people movers.
How accurate are the ratings in predicting how safe a vehicle will be in a crash?
These ratings are calculated from the outcomes of actual crashes using statistical methods. The more often a particular vehicle model is involved in a crash, the more accurate will be the rating for that vehicle.
This means that, in general, the ratings for more common and/or older vehicles may be more accurate than ratings for newer and/or less common models. Only vehicles with a specified minimum number of crash involvements and where the rating meets minimum accuracy criteria are included. The rating category given to a vehicle reflects the estimated average risk of death or serious injury in a crash as well as the level of statistical confidence in the estimate.
Vehicles with limited real world crash experience and hence limited statistical confidence in the rating estimate tend to be late vehicle models that have only been on sale for a short time before the end of the data period on which the ratings are based. Ratings for these vehicles will possibly change in future updates as more crash data become available. Vehicles with a high degree of uncertainty in the ratings have been excluded.
Any vehicle safety rating system can only provide an indication of how much protection a vehicle is likely to offer a driver in the event of a crash, or how much harm it is likely to cause the driver of another vehicle. Whether or not death or serious injury results also depends on how safely the vehicle is driven and the particular circumstances of the crash.
What's the difference between these ratings and the New Car Safety Ratings?
New car safety ratings (eg ANCAP) should not be compared directly to these ratings due to fundamental differences between the 2 systems.
These differences include:
|New Car Safety Ratings
|Used Car Safety Ratings
|Determined by crash testing vehicles in a controlled laboratory setting
|Calculated using data from police reports on actual crashes
|Consider only certain crash configurations - offset frontal, side impact, pole crashes and pedestrian impacts
|Consider all crash types
|Consider both the ability of the vehicle to protect occupants and pedestrians from injury in a crash as well as the presence of certain safety features such as seatbelt reminder systems, ESC and other driver assist technologies in the rating
|Rate only the ability of a vehicle to protect people involved in the crash from injury. The presence of vehicle crash avoidance features is not considered in the ratings apart from the Best Picks being restricted to those vehicles available with Electronic Stability Control
|Considers injury protection of the vehicle's own occupants in the rating and pedestrian protection
|Considers the injury protection of road users inside the vehicle and all potential collision partners including other vehicle occupant, pedestrians, motorcyclists and bicyclists
|Do not reflect the role of vehicle mass in determining injury outcomes in a crash hence ratings cannot be directly compared across vehicles of different mass.
|Do reflect the role of vehicle mass in determining injury outcomes in a crash hence ratings can be directly compared across all vehicles.
These differences in the ratings can lead to differences in the assessment of some vehicles.
Any vehicle safety rating system can only provide an indication of the relative levels of protection between vehicles you can expect in the event of a crash. Whether or not you die or are seriously injured in a crash also depends on how safely you drive your vehicle.
To find out more about used car safety ratings, read our brochure. (pdf 3.6mb)
How do the Australian and New Zealand vehicle fleets rate for safety compared with fleets from other countries?
These ratings compare vehicles with the rest of the vehicle fleet, not against a fixed standard. That means that there will always be vehicles that rate good or bad. Therefore, it is not possible to objectively assess, from these ratings, the overall safety standard of the New Zealand or Australian vehicle fleets. They have not been compared with vehicle fleets from other countries for the same reason.
But aren't some vehicles likely to rate poorly because of the types of people that drive them or where they are driven?
This was considered when the data was analysed. The ratings measure how well the vehicle protected people involved in the crash. They factor out, as much as possible, effects not related to the vehicle such as the age and gender of people involved in the crash or where and when the crash occurred. This means the ratings are about how the vehicle itself contributes to injury outcome in a crash and not who was driving the vehicle and where.
What should people do if the vehicle they currently drive is rated poorly?
Crashes in even the best-rated vehicles can still result in serious injury or death to the driver. The best protection against injury is to drive safely and encourage other road users to drive safely. When people are ready to buy another vehicle, they should take these ratings into account and consider choosing one of the best-rated models.
What should people do if they can't afford one of the best-rated vehicles?
On average, newer models provide their occupants with better protection in a crash but a number of less expensive models do rate well. People should work out what they can afford to spend on a used car and consider choosing one of the best-rated vehicles that their budget allows.
Why aren't vehicles that are rated poorly taken off the road?
These ratings rate vehicles against each other, not against any fixed standard. This means that there will always be vehicles that are rated average, above average and below average. So, although some vehicle models offer better protection to drivers in a crash than others, this does not mean that the less safe models are dangerous to the extent they should be taken off the roads. All vehicles must meet local design standards for safety before they can be made available for sale.
The Monash University Accident Research Centre
The Monash University Accident Research Centre (MUARC) has been conducting research into issues relating to vehicle safety for more than 24 years.
It began developing consumer advice on vehicle safety based on mass crash data in 1990. The same year, the NSW Roads and Traffic Authority (RTA) and National Roads and Motorists' Association (NRMA) independently set out on a joint project to develop a car safety rating system based on police records of crashes. By 1991 they had produced a relative ranking of vehicles.
In mid 1991, the two groups began to work together and combine their data into one vehicle safety rating system. The creation of the Used Car Safety Ratings resulted from that work.


text:
Usain Bolt wants tryout with Manchester United
Track star today, soccer star tomorrow? If Usain Bolt has his way, that's what the headlines will say.
Bolt and Manchester United's Rio Ferdinand exchanged tweets (because that's how business is done these day) about the possibility Tuesday. That was one day after the Jamaican, who claimed gold in the 100 meters Sunday night in London, told The Sun newspaper he would welcome a call from Sir Alex Ferguson, the club's manager since 1986.
"People think I am joking. But if Alex Ferguson called me up and said, 'OK let's do this, come and have a trial,' it would be impossible for me to say No," Bolt was quoted as saying. "I would not take up the challenge if I didn't think I was good enough. I am a very accomplished player and know I could make a difference."
Ferdinand, a 33-year-old defender for The Red Devils, jumped on the Bolt bandwagon. "If you want that trial at Man Utd shout me, I'll speak to the boss!!"
Bolt has unfinished business in London before he can start sprinting up and down the pitch at Old Trafford. The men's 200-meter semifinals are Wednesday. The finals are Thursday. But afterward? "After the Olympics we work on that...lol..thanks man," the world's fastest man replied to Ferdinand.
Manchester United fans took to Twitter to encourage both parties to seal the deal."
Could Bolt make a difference in a team like Man U?" tweeted Stephen Taylor (@Stephen_Aufc). "They could hit it over the defence and let him sprint past and get it."
Added Kamil Pawelec (@Parkour681): "Did you hear about bolt wanting to play for man u? That would be so op in FIFA, it'd be like putting a jet engine on peter crouch."
Image: Manchester United defender Rio Ferdinand and Olympic 100m champion Usain Bolt. From Sky Sports.


text:
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