text:
|Publication number
|Publication type
|Application number
|Publication date
|Jun 1, 1993
|Filing date
|Sep 19, 1989
|Priority date
|Sep 19, 1989
|Fee status
|Publication number
|Tripunithura V. Jayaraman
|Original Assignee
|Ocg Microelectronic Materials, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (9), Non-Patent Citations (2), Referenced by (19), Classifications (10), Legal Events (8)
|External Links: USPTO, USPTO Assignment, Espacenet
The present invention relates to radiation sensitive mixtures (e.g., those particularly useful as positive-working resist compositions) containing the admixture of an alkali-soluble binder resin, a photoactive compound and an effective sensitivity enhancing amount of at least one tris(hydroxyphenyl) lower alkane compound all dissolved in a solvent. Furthermore, the present invention also relates to substrates coated with these radiation sensitive mixtures as well as the process of coating, imaging and developing these radiation sensitive mixtures on these substrates.
Photoresist compositions are used in microlithographic processes for making miniaturized electronic components such as in the fabrication of integrated circuits and printed wiring board circuitry. In these processes, a thin coating or film of a photoresist composition is generally first applied to a substrate material, such as silicon wafers used for making integrated circuits or aluminum or copper plates of printed wiring boards. The preferred method of applying this film is spin coating. By this method, much of the solvent in the photoresist formulation is removed by the spinning operation. The coated substrate is then baked to evaporate any remaining solvent in the photoresist composition and to fix the coating onto the substrate. The baked coated surface of the substrate is next subjected to an image-wise exposure of radiation. This radiation exposure causes a chemical transformation in the exposed areas of the coated surface. Visible light, ultraviolet (UV) light, electron beam, ion beam and X-ray radiant energy are radiation types commonly used today in microlithographic processes.
After this image-wise exposure, the coated substrate is treated with a developer solution to dissolve and remove either the radiation-exposed or the unexposed areas of the coated surface of the substrate. In some processes, it is desirable to bake the imaged resist coating before this developing step. This intermediate step is sometimes called post-exposure bake or PEB.
There are two types of photoresist compositions--negative-working and positive-working. When negative-working photoresist compositions are exposed image-wise to radiation, the areas of the resist composition exposed to the radiation become less soluble to a developer solution (e.g. a cross-linking reaction occurs) while the unexposed areas of the photoresist coating remain relatively soluble to a developing solution. Thus, treatment of an exposed negative-working resist with a developer solution causes removal of the non-exposed areas of the resist coating and the creation of a negative image in the photoresist coating, and thereby uncovering a desired portion of the underlying substrate surface on which the photoresist composition was deposited but not exposed to the radiation. On the other hand, when positive-working photoresist compositions are exposed image-wise to radiation, those areas of the resist composition exposed to the radiation become more soluble to the developer solution (e.g. the Wolff rearrangement reaction of the photoactive compound occurs) while those areas not exposed remain relatively insoluble to he developer solution. Thus, treatment of an exposed positive-working resist with the developer solution causes removal of the exposed areas of the resist coating and the creation of a positive image in the photoresist coating. The desired portion of the underlying substrate surface is uncovered where the photoresist was exposed to the radiation.
Positive-working photoresist compositions are currently favored over negative-working resists because the former generally have better resolution capabilities and pattern transfer characteristics.
After this development operation, the now partially unprotected substrate may be treated with a substrate-etchant solution or plasma gases and the like. This etchant solution or plasma gases etch the portion of the substrate where the photoresist coating was removed during development. The areas of the substrate are protected where the photoresist coating still remains and, thus, an etched pattern is created in the substrate material which corresponds to the photomask used for the image-wise exposure of the radiation. Later, the remaining areas of the photo-resist coating may be removed during a stripping operation, leaving a clean etched substrate surface. In some instances, it is desirable to heat treat the remaining resist layer after the development step and before the etching step to increase its adhesion to the underlying substrate and its resistance to etching solutions.
End users of photoresists are demanding photoresist formulations possess better lithographic properties for the fabrication of smaller microelectronic circuits. The lithographic properties which are critical to positive-working photoresist end-users include the following: (1) good resolution capabilities in both the micron and submicron ranges without incomplete development in the exposed areas (i.e. scumming); (2) higher thermal image deformation temperatures (e.g. above 120� C.); (3) relatively fast photospeeds; (4) good adhesion to substrate; (5) good developer dissolution rates; (6) good process latitude; (7) near to absolute vertical profiles (or good contrast) between exposed and unexposed photoresist areas after development; (8) good resistance to etching solutions and plasma etching techniques; (9) reduced tendency to form insoluble particulates; and (10) mask linearity.
Generally in the past, efforts to improve one of these lithographic properties have caused significant decreases in one or more of the other lithographic properties of the photoresist. Accordingly, there is a need for improved photoresist formulations which possess all of these desired properties without making significant tradeoffs. The present invention is believed to be an answer to that need.
For example, it is well known to add sensitivity enhancers (also known as photospeed enhancers or speed enhancers) to resist formulation to increase the solubility of the resist coating in both the exposed and unexposed areas when the speed of development is an overriding processing consideration. However, some degree of contrast may be sacrificed with the addition of such sensitivity enhancers, (e.g. in positive-working resists, while the exposed areas of the resist coating will be more quickly developed, the sensitivity enhancers will also cause a larger loss of the resist coating from the unexposed areas). Thus, if too much resist coating is removed from the unexposed areas of a positive-working resins, film defects such as pinholes may be introduced into the coating or subsequent plasma etching steps may cause unwanted break-throughs in the unexposed areas. Accordingly, sensitivity enhancers should provide the desired increased speed of development without too much more film loss in the unexposed areas.
Numerous compounds have been proposed as sensitivity enhancers in resist compounds. See U.S. Pat. Nos. 3,661,582; 4,090,033; 4,036,644; 4,115,128; 4,275,139; 4,365,019; 4,650,745; and 4,738,915 for examples of known sensitivity enhancers. All of these U.S. Patents are incorporated herein by reference in their entities. While their known sensitivity enhancers may be suitable for some resist formulation or for some particular end uses, there is a need for new sensitivity enhancers which have better sensitivity enhancement without significant film loss in other resist formulations or in other end uses, or are suitable in a certain combination of resist formulations or a combination of end uses to which the previously known sensitivity enhancers are not suitable. The present invention is believed to be an answer to this need.
Separately, tris(hydroxyphenyl)alkanes are known compounds. See U.S. Pat. No. 3,579,542, which issued to Meyer, et al. on May 18, 1971 and U.S. Pat. No. 4,394,496, which issued to Schrader on Jul. 19, 1983. The Meyer, et al. patent teaches the preparation of tris(p-hydroxyphenyl) ethane and its use as having laxative properties. The Schrader patent teaches the use of tris(hydroxyphenyl) alkanes as chemical intermediates for an epoxidation reaction. Both of these two U.S. Patents are incorporated herein by reference in their entireties.
Accordingly, the present invention is directed to a radiation sensitive composition useful as a positive-working resist comprising an admixture in a solvent of:
(a) at least one photoactive compound;
(b) at least one alkali-soluble binder resin; and
(c) an effective sensitivity enhancing amount of at least one tris(hydroxyphenyl) lower alkane compound; the amount of said photoactive compound or compounds being about 5% to about 40% by weight and the amount of said binder resin or resins being about 60% to 95% by weight, based on the total solids content of said radiation sensitive mixture.
Furtherover, the present invention also encompasses the process of coating substrates with these radiation sensitive mixtures and their exposing and developing these coated substrates.
Also further, the present invention encompasses said coated substrates (both before and after imaging) as novel articles of manufacture.
As mentioned above, the radiation-sensitive compositions of the present invention have three critical ingredients; at least one alkali-soluble binder resin; at least one photoactive compound; and at least one tris(hydroxyphenyl) lower alkane compound.
Any or all binder resins commonly employed in photoresist compositions may be used herein. The preferred class of binder resins is alkali-soluble resin or resins which are useful in positive-working photoresist compositions. The term "alkali-soluble binder resin" is used herein to mean a resin which will dissolve completely in an aqueous alkaline developing solution conventionally used with positive-working Photoresist compositions. Suitable alkali-soluble resins include phenolic novolaks such as phenol-formaldehyde novolak resins, cresol-formaldehyde novolak resins, or polyvinyl phenol resins, preferably those having an average molecular weight of about 500 to about 40,000, and more preferably from about 800 to 20,000. The novolak resins are preferably prepared by the condensation reaction of phenol or cresols with formaldehyde and are characterized by being light-stable, water-insoluble, alkali-soluble and film-forming. The most preferred class of novolak resins is formed by the condensation reaction between a mixture of meta- and para-cresols with formaldehyde.
Any and all photoactive compounds which make radiation-sensitive mixtures useful as photoresists may be employed herein. The preferred class of photoactive compounds (sometimes called "sensitizers") is o-quinonediazide compounds, particularly esters derived from polyhydric phenols, alkyl-polyhydroxyphenones, aryl-polyhydroxyphenones, and the like which can contain up to six or more sites for esterification. The most preferred o-quinonediazide esters are derived from 3-diazo-3,4-dihydro-4-oxo-naphthalene-1-sulfonic acid chloride (also know as 1,2-naphthoquinonediazide-4-sulfinyl chloride) and 6-diazo-5,6-dihydro-5-oxo-naphthalene-1-sulfonic acid chloride (also known as 1,2-naphthoquinonediazide-5-sulfonyl chloride).
Specific examples include resorcinol 1,2-naphthoquinonediazide-4-sulfonic acid esters; pyrogallol 1,2-naphthoquinonediazide-5-sulfonic acid esters, 1,2-quinonediazidesulfonic acid esters of (poly)hydroxyphenyl alkyl ketones or (poly)hydroxyphenyl aryl ketones such as 2,4-dihydroxyphenyl propyl ketone 1,2-benzoquinonediazide-4-sulfonic acid esters, 2,4,dihydroxyphenyl hexyl ketone 1,2-naphthoquinone-diazide-4-sulfonic acid esters, 2,4-dihydroxy-benzophenone 1,2-naphthoquinonediazied-5-sulfonic acid esters, 2,3,4-trihydroxyphenyl hexyl ketone, 1,2-naphthoquinonediazide-4-sulfonic acid esters, 2,3,4-trihydroxybenzophenone 1,2-naphthoquinonediazide-4-sulfonic acid esters, 2,3,4-trihydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonic acid esters, 2,4,6-trihydroxybenzophenone 1,2-naphthoquinone-diazide-4-sulfonic acid esters, 2,4,6-trihydroxybenzophenone 1,2-naphthoquinone-diazide-5-sulfonic acid esters, 2,2',4,4'-tetrahydroxy-benzophenone 1,2-naphthoquinonediazide-5-sulfonic acid esters, 2,3,4,4'-tetrahydroxy-benzophenone 1,2-naphthoquinonediazide-5-sulfonic acid esters, 2,3,4,4'-tetrahydroxybenzopheno 1,2-naphthoquinone-diazide-4-sulfonic acid esters, 2,2',3,4',6'-penta-hydroxybenzophenone 1,2-naphthoquinone-diazide-5-sulfonic acid esters and 2,3,3',4,4',5'-hexahydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonic acid esters; 1,2-quinonediazidesulfonic acid esters of bis[(poly)hydroxyphenyl]alkanes such as bis(p-hydroxyphenyl)-methane 1,2-naphthoquinonediazide-4-sulfonic acid esters, bis(2,4-dihydroxyphenyl)methane 1,2-naphthoquinonediazide-5-sulfonic acid esters, bis(2,3,4-trihydroxyphenyl)methane 1,2-naphthoquinonediazide-5-sulfonic acid esters, 2,2-bis(p-hydroxyphenyl)propane 1,2-npphthoquinonediazide-4-sulfonic acid esters, 2,2-bis(2,4-dihydroxyphenyl)propane 1,2-naphthoquinonediazide-5-sulfonic acid esters and 2,2-bis(2,3,4-trihydroxy)propane 1,2-naphthoquinonediazide-5-sulfonic acid esters. Besides the 1,2-quinonediazide compounds exemplified above, there can also be used the 1,2-quinonediazide compounds described in J. Kosar, "Light-Sensitive Systems", 339-352 (1965), John Wiley & Sons (New York) or in S. DeForest, "Photoresist", 50, (1975), MacGraw-Hill, Inc. (New York). In addition, these materials may be used in combinations of two or more. Further, mixtures of substances formed when less than all esterification sites Present on a particular polyhydric phenol, alkyl-polyhydroxyphenone, aryl-polyhydroxyphenone and the like have combined with o-quinonediazides may be effectively utilized in positive acting photoresists.
Of all the 1,2-quinonediazide compounds mentioned above, 1,2-naphthoquinonediazide-5-sulfonic acid di-, tri-, tetra-, penta- and hexa-esters of polyhydroxy compounds having at least 2 hydroxyl groups, i.e. about 2 to 6 hydroxyl groups, are one class of preferred compounds.
Among this class of preferred 1,2-naphthoquinonediazide compounds are 2,3,4-trihydroxy- benzophenone 1,2-naphthoquinone-diazide-5-sulfonic acid esters, 2,3,4,4'-tetrahydroxy-benzophenone 1,2-naphthoquinonediazide-5-sulfonic acid esters, and 2,2',4,4'-tetra-hydroxybenzophenone 1,2-naphthoquinonediazide-5-sulfonic acid esters. Another preferred 1,2-quinonediazide compound is mixed 1,2-naphthoquinonediazide-5-sulfonic acid esters of 2,2'3,3'-tetrahydro-3,3,3',3'-tetramethyl-1,1-spirobi (1H-indene)-5,5'6,6'7,7'-hexol (C.A.S. Reg. No. 32737-33-0). These 1,2-naphthoquinonediazide compounds may be used alone or in combination of two or more.
The proportion of the photoactive compound in the radiation-sensitive mixture may range from about 5% to about 40%, more preferably from about 10% to about 25% by weight of the non-volatile (e.g. non-solvent) content of the radiation-sensitive mixture. The proportion of total binder resin of this present invention in the radiation-sensitive mixture may range from about 60% to about 95%, preferably, from about 75% to 90% by weight, of the non-volatile (e.g. excluding solvents) content of the radiation-sensitive mixture.
The third critical ingredient of the radiation-sensitive composition of the present invention is the tris(hydroxyphenyl) lower alkane compound or mixture of such compounds. The preferred class of tris(hydroxyphenyl) lower alkane is tris(hydroxyphenyl) ethanes. The preferred tris(hydroxyphenyl) ethane is tris(p-hydroxyphenyl) ethane.
The generic formula for the tris(hydroxyphenol) lower alkane compounds used in the present invention is as follows: ##STR1## wherein R is a hydrogen or an alkyl having 1-3 carbon atoms.
The generic formula for tris(hydroxyphenyl) ethane compounds used in the present invention is as follows: ##STR2##
Besides the preferred tris(p-hydroxyphenyl) ethane, other known tris (hydroxyphenyl) ethanes include o,p,p'-hydroxyphenyl ethane (See U.S. Pat. No. 4,394,496).
The preferred tris(p-hydroxyphenyl) ethane is a commercially available product. Its synthesis is also taught in U.S. Pat. No. 3,579,542 which issued to Meyer, et al. on May 18, 1971.
The preferred proportion of the tris(hydroxyphenyl) lower alkane compound or compounds in the radiation-sensitive mixture may range from about 0.5% to about 10%, preferably about 2% to 4% by weight of the non-volatile (e.g., excluding solvents) content of the radiation-sensitive mixture.
These radiation-sensitive mixtures may also contain, besides the resin, photoactive compound and tris (hydroxyphenyl) lower alkane compound, conventional photoresist composition ingredients such as other resins, solvents, actinic and contrast dyes, anti-striation agents, plasticizers, other sensitivity enhancers, and the like. These additional ingredients may be added to the binder resin, photoactive compound and tris(hydroxyphenyl) lower alkane compound solution before the solution is coated onto the substrate.
The binder resin, photoactive compound or sensitizer, and tris(hydroxyphenyl) lower alkane compound may be dissolved in a solvent or solvents to facilitate their application to the substrate. Examples of suitable solvents include methoxyacetoxy propane, diglyme, toluene, ethyl cellosolve acetate, n-butyl acetate, ethyl lactate, propylene glycol alkyl ether acetates, or mixtures thereof and the like. Cosolvents such as xylene, n-butylacetate, or ethyl ethoxy propionate or the like may also be used. The preferred amount of solvent may be from about 50% to about 500%, or higher, by weight, more preferably, from about 100% to about 400% by weight, based on combined resin, sensitizer, and tris(hydroxyphenol) lower alkane compound weight.
Actinic dyes help provide increased resolution on highly reflective surfaces by inhibiting back scattering of light off the substrate. This back scattering causes the undesirable effect of optical notching, especially on a substrate topography. Examples of actinic dyes include those that absorb light energy at approximately 400-460 nm [e.g. Fat Brown B (C.I. No. 12010); Fat Brown RR (C.I. No. 11285); 2-hydroxy-1,4-naphthoquinone (C.I. No. 75480) and Quinoline Yellow A (C.I. No. 47000) and Macrolex Fluoroyellow 10GN (C. I. No. Solvent Yellow 16:1)]and those that absorb light energy at approximately 300-340 nm [e.g. 2,5-diphenyloxazole (PPO-Chem. Abs. Reg. No. 92-71-7) and 2-(4-biphenyl)-6-phenyl-benzoxazole (PBBO-Chem. Abs. Reg. No. 17064-47-0)]. The amount of actinic dyes may be up to 10% weight levels, based on the combined weight of resin and sensitizer.
Contrast dyes enhance the visibility of the developed images and facilitate pattern alignment during manufacturing. Examples of contrast dye additives that may be used together with the radiation-sensitive mixtures of the present invention include Solvent Red 24 (C.I. No. 26105), Basic Fuchsin (C.I. 42514), Oil Blue N (C.I. No. 61555) and Calco Red A (C.I. No. 26125) up to 10% weight levels, based on the combined weight of resin and sensitizer.
Anti-striation agents level out the photoresist coating or film to a uniform thickness. Anti-striation agents may be used up to five percent by weight levels, based on the combined weight of resin and sensitizer. One suitable class of anti-striation agents is non-ionic silicon-modified polymers. Non-ionic surfactants may also be used for this purpose.
The photoresist coatings produced by the above described procedure are particularly suitable for application to silicon/silicon dioxide-coated or polysilicon or silicon nitride wafers such as are utilized in the production of microprocessors and other miniaturized integrated circuit components. An aluminum/aluminum oxide wafer can be used as well. The substrate may also comprise various polymeric resins especially transparent polymers such as polyesters and polyolefins.
After the resist solution is coated onto the substrate, the coated substrate may be preferably baked at approximately 70� C. to 125� C. until substantially all the solvent has evaporated and only a uniform radiation-sensitive coating remains on the substrate.
The coated substrate can then be exposed to radiation, in any desired exposure pattern, produced by use of suitable masks, negatives, stencils, templates, and the like. Conventional imaging process or apparatus currently used in processing photoresist-coated substrates may be employed with the present invention. While ultraviolet (UV) light and electron beam radiations are the preferred sources of radiation, other sources such as visible light, ion beam and X-ray radiant energy may be instead used. In some instances, a post-exposure bake at a temperature about 10� C. higher than the soft bake temperature for about 30-300 seconds is used to enhance image quality and resolution.
The exposed resist-coated substrates are next developed in an aqueous alkaline developing solution. This solution is preferably agitated, for example, by nitrogen gas agitation. Examples of aqueous alkaline developers include aqueous solutions of tetramethylammonium hydroxide, sodium hydroxide, potassium hydroxide, ethanolamine, choline, sodium phosphates, sodium carbonate, sodium metasilicate, and the like. The preferred developers for this invention are aqueous solutions of either alkali metal hydroxides, phosphates or silicates, or mixtures thereof, or tetramethylammonium hydroxide.
Alternative development techniques such as spray development or puddle development, or combinations thereof, may also be used.
The substrates are allowed to remain in the developer until all of the resist coating has dissolved from the exposed areas. Normally, development times from about 10 seconds to about 3 minutes are employed.
After selective dissolution of the coated wafers in the developing solution, they are preferably subjected to a deionized water rinse to fully remove the developer or any remaining undesired portions of the coating and to stop further development. This rinsing operation (which is part of the development process) may be followed by blow drying with filtered air to remove excess water. A post-development heat treatment or bake may then be employed to increase the coating's adhesion and chemical resistance to etching solutions and other substances. The post-development heat treatment can comprise the baking of the coating and substrate below the coating's thermal deformation temperature.
In the manufacture of microcircuitry units, the developed substrates may then be treated with a plasma gas etch employing conventional plasma processing parameters (e.g., pressure and gas flow rates) and conventional plasma equipment.
Later, the remaining areas of the photoresist coating may be removed from the etched substrate surface by conventional photoresist stripping operations.
The present invention is further described in detail by means of the following Examples. All parts and percentages are by weight unless explicitly stated otherwise.
Tris(p-hydroxyphenyl) ethane [0.92 grams (0.003 mole)] was added to 100 grams of a commercially available resist (HEBR-214-1 available from Olin Hunt Specialty Products Inc. of West Paterson, N.J.) consisting of a mixed meta- and para-cresol novolak resin and a naphthoquinone diazide ester photoactive compound in a mixed solvent. The resulting resist composition contained about 27% by weight solids.
The resist made according to Part A and a control resist (i.e. HEBR-214 with no additive) were coated on oxidized four inch silicon wafers with a MTC resist spinner at 5000 rpm for 30 seconds and then soft baked at 100� C. for 30 minutes in a convection oven. The resulting soft baked resist coatings were measured in Angstroms on a Rudolph Film Thickness Monitor FTM-R using a refractive index of 1.63. These thicknesses are shown in Table 1.
The resist coated substrate samples of Part B were then imagewise exposed to an electron beam energy source using a JEOL 845/TN 5500 system at an acceleration voltage of 20 KV at a constant beam current. The electron beam dwell time was varied to obtain various exposure doses at different parts of the coating.
After the exposure in Part C, the resist coatings on the silicon wafers were developed by immersion for two minutes in diluted WAYCOAT LSI developer (5 parts developer diluted with 4 parts deionized water on a volume basis), then rinsed in deionized water and blow-dried with nitrogen. The developed photoresist coatings were measured for film thickness loss and the sensitivities of the resist of this Example 1 and its control were measured.
The film thickness loss measurements were carried out on a Rudolph Film Thickness Monitor FTM-R using a refractive index of 1.63. The sensitivities reported below were the electron doses in uC/cm2 required to clearly image 2 micron lines and spaces. The measured film thickness loss (in Angstroms) and sensitivity are shown in the following Table 1:
TABLE 1______________________________________ Soft Baked Film Film Thickness SensitivityExample Thickness Ang. Loss Ang. (uC/cm2)______________________________________1 10,259 376 20Control 9,780 300 30______________________________________
The data in this Table 1 indicates that the addition of tris(p-hydroxyphenyl) ethane increased the electron beam sensitivity of HEBR 214-1 from 30 to 20 uC/cm2 with only a small increase of film loss of 76 Angstroms, which is acceptable for most applications.
|Cited Patent
|Filing date
|Publication date
|Jan 13, 1960
|Jun 8, 1965
|Azoplate Corp
|Naphthoquinone (1, 2)-diazide-sulfonic acid derivatives and process of producing printing plates therefrom
|Jun 26, 1968
|May 18, 1971
|Hoechst Co American
|Oct 30, 1981
|Jul 19, 1983
|The Dow Chemical Company
|Epoxidation products of 1,1,1-tri-(hydroxyphenyl) alkanes
|Mar 31, 1987
|Apr 19, 1988
|Tokyo Ohka Kogyo Co., Ltd.
|Positive-working O-quinone diazide photoresist composition with 2,3,4-trihydroxybenzophenone
|Jan 20, 1988
|Sep 5, 1989
|Fuji Photo Film Co., Ltd.
|Positive-working o-quinone diazide photoresist composition
|Jun 6, 1988
|Oct 3, 1989
|Fuji Photo Film Co., Ltd.
|Positive-working photoresist composition
|Jul 15, 1988
|Feb 1, 1989
|Ciba-Geigy Ag
|Positive-photoresist compositions
|Title not available
|Title not available
|Celanese Preliminary Information Bulletin Tris(P Hydroxyphenyl)Ethane (THPE).
|Celanese Preliminary Information Bulletin--Tris(P-Hydroxyphenyl)Ethane (THPE).
|Citing Patent
|Filing date
|Publication date
|Feb 28, 1994
|Dec 6, 1994
|Minnesota Mining And Manufacturing Company
|Print stabilizers and antifoggants for photothermography
|Jul 29, 1994
|Mar 28, 1995
|Tokyo Ohka Kogyo Co., Ltd.
|Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
|Apr 19, 1993
|Apr 4, 1995
|Sumitomo Chemical Company, Limited
|Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from tert-butyl-methyl phenol
|May 27, 1993
|Jul 4, 1995
|Sumitomo Chemical Company, Ltd.
|Positive resist composition
|May 27, 1993
|Sep 19, 1995
|Sumitomo Chemical Company, Ltd.
|Positive resist composition
|Apr 7, 1994
|Oct 10, 1995
|Sumitomo Chemical Company, Limited
|Radiation-sensitive positive resist composition
|Apr 7, 1994
|Oct 10, 1995
|Sumitomo Chemical Company, Limited
|Radiation-sensitive positive resist composition
|Dec 23, 1994
|Mar 26, 1996
|Tokyo Ohka Kogyo Co., Ltd.
|Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound
|Apr 5, 1995
|Jul 22, 1997
|Muenzel; Norbert
|High-resolution negative photoresist with wide process latitude
|Mar 17, 1997
|Dec 16, 1997
|Mitsubishi Chemical Corporation
|1,2 quinone diazide photosensitive resin composition containing select additive and method for forming a photoresist pattern
|Jun 14, 1995
|Apr 7, 1998
|Sumitomo Chemical Company, Limited
|Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
|Mar 25, 1997
|Apr 14, 1998
|Tokyo Ohka Kogyo Co., Ltd.
|Positive photoresist composition
|Jul 3, 1996
|May 19, 1998
|Agfa-Gevaert Ag
|Positive-working recording material containing aluminum base and mat-finished quinone diazide layer developable in weak alkaline developers
|Sep 29, 1995
|May 26, 1998
|General Electric Company
|Method for making tris(hydroxyphenyl) compounds using ion exchange
|Jun 14, 1995
|Jul 21, 1998
|Sumitomo Chemical Company, Limited
|Radiation-sensitive positive resist composition
|Sep 22, 1992
|Jan 19, 1999
|Sumitomo Chemical Company, Limited
|Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound
|Sep 10, 2009
|Jul 1, 2010
|Samsung Electronics Co., Ltd.
|Photoresist composition and method for manufacturing a display substrate using the photoresist composition
|Nov 27, 2013
|Dec 3, 2015
|Dow Global Technologies Llc
|Thpe ethers
|Sep 5, 1995
|Mar 27, 1996
|Mitsubishi Chemical Corporation
|Photosensitive resin composition and method for forming a photoresist pattern
|U.S. Classification
|430/165, 430/192, 430/193, 430/278.1, 430/191, 430/272.1, 430/277.1
|International Classification
|Cooperative Classification
|European Classification
|Sep 19, 1989
Owner name: OLIN HUNT SPECIALTY PRODUCTS INC., A CORP. OF DE
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:JAYARAMAN, TRIPUNITHURA V.;REEL/FRAME:005153/0340
Effective date: 19890911
|Mar 14, 1991
Owner name: OCG MICROELECTRONIC MATERIALS, INC.
Free format text: CHANGE OF NAME;ASSIGNOR:OLIN HUNT SPECIALTY PRODUCTS INC.;REEL/FRAME:005630/0516
Effective date: 19901228
|Sep 30, 1996
|Fee payment
Year of fee payment: 4
|Apr 18, 1997
Owner name: OLIN MICROELECTRONIC CHEMICALS, INC., CONNECTICUT
Free format text: CHANGE OF NAME;ASSIGNOR:OCG MICROELECTRONIC MATERIALS, INC.;REEL/FRAME:008495/0994
Effective date: 19960524
|Nov 30, 2000
|Fee payment
Year of fee payment: 8
|Dec 15, 2004
|Maintenance fee reminder mailed
|Jun 1, 2005
|Lapse for failure to pay maintenance fees
|Jul 26, 2005
|Expired due to failure to pay maintenance fee
Effective date: 20050601


text:
I have installed Windows Vista on my computer and when ever I am trying to install Office 2007 on my system, the setup just stops the install and asks for Proof.cab. When I tried to find the error in SetupExe.log file, then it listed the below things:
Executing chained package: Proof.es-es
12/22/2007 15:45:24 Installing chained package: Proof.es-es
PERF: TickCount=2340108 Name=Verify MSI local install source
Description=Begin function
OSE is detected as a registered service. Service binary is reported at location: C:\Program Files\Common Files\Microsoft Shared\Source Engine\OSE.EXE
OSE service binary is detected at location: C:\Program Files\Common Files\Microsoft Shared\Source Engine\OSE.EXE
Source Resolution succeeded
LIS: start caching file "Proof.en|Proof.cab"
LIS failed to cache download "{90120000-002C-0409-0000-0000000FF1CE}-C"
resource "Proof.en|Proof.cab". Cache Error 0x80070017
I have checked the Cab file and it is already there and installing Office 2007 on Windows XP runs smoothly. What can i do to solve this issue. Please help.

subset: commoncrawl


text:
"What you think of sliced white bread says a lot about who you are" writes AARON BOBROW-STRAIN, Associate Professor of Politics at Whitman College in Washington. His new book WHITE BREAD: A SOCIAL HISTORY OF THE STORE-BOUGHT LOAF is a fascinating and surprising account of how "industrial white bread" came into being and evolved to become the preferred bread of much of America. It's a wild story that centers on a national fear of food impurity, a fear of immigrants and the quest for a bread of the future that would be untouched by human hands. It didn't matter if it was tasteless and doughy as long as it was good for the country. Tune in tonight for an entertaining story of America and the staff of life.
Inquiry welcomes back award-winning author and illustrator GRACE LIN. Her two new books are WHERE THE MOUNTAINS MEETS THE MOON and STARRY RIVER OF THE SKY. These are complex wonderful imaginative novels profusely illustrated by full color plates and intricate drawings that echo Chinese paper cut art. Both books are inspired by traditional Chinese stories and culture, yet are also unique expressions of Lin's imagination. Tune in and learn about how Grace Lin's recent trips to Hong Kong, Taiwan and China inspired parts of her books and Grace even tells the listener how to eat with five-foot long chop sticks.


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text:
Does This Make You Feel Safer? Rifle-Toting Guards at U.S. Open Reflect Growing Trend of More Visible Security That's a Part of the World We Now Live In
McCoppin, Robert, Daily Herald (Arlington Heights, IL)
Byline: Robert McCoppin Daily Herald Staff Writer
Visitors to a U.S. Open practice round this week in Olympia Fields were greeted by a character who looked like he stepped out of a video war game.
A police tactical officer not only carried a badge, radio and handgun, but he also wore camouflage pants, a knife and knee pads, and he toted an assault rifle. Some 400 other uniformed and plainclothes security guards roved the grounds at Olympia Fields Country Club by foot, bike, golf cart and horseback.
Golf fans passed by the armed guard, some of their surprised glances quickly turning into looks of acceptance. The U.S. public has come to accept such displays of deterrence at sporting events - no longer just at the airport and Sears Tower.
Travelers at airports in Europe have been used to guards with automatic weapons for years, but in the United States, the practice didn't become visible until after Sept. 11, 2001, when National Guardsmen at the nation's airports carried rifles.
Rifles now also are used at high-profile sporting events like the Super Bowl. And police with high-powered rifles hid at Washington Redskins games last year after a sniper spree in the area.
The 2002 Winter Olympics in Utah took security to unprecedented levels, using X-ray checks, Air Force patrols and facial recognition screening.
At Olympia Fields, five police departments have deployed about 200 personnel for the six-day U.S. Open, which shifts from practice to competition today. The U.S. Golf Association hired another 200 to 250 security workers, including state and federal agents.
Despite the impression left by the rifle-toting guard, organizers say, security is slightly down from last year's Open, when the golf championship was held on Long Island, N.Y., the first U.S. Open after Sept. 11, 2001. That tournament was patrolled by 500 state troopers and 150 state park officers.
Olympia Fields police Cmdr. Carl Frey said this year's event needs fewer officers because there is less land to cover, with two rather than five courses.
Part of the SWAT-style protection, Frey said, is for effect.
"It's more of a visibility thing," he said. "If we didn't want anybody to see them, you wouldn't see them. We're trying to give people a sense it's under control, and we're trying to keep them safe."
Security was nowhere near as extensive in 1999 at the PGA Championship at Medinah Country Club, or even last week when Annika Sorenstam won the Kellogg-Keebler Classic at Stonebridge Country Club in Aurora. …


text:
Irving E. Sigel
This book, titled Biology, Society, and Behavior: The Development of Sex Differences in Cognition, edited by Ann McGillicuddy-De Lisi and Richard De Lisi, is the 21st volume in the Applied Development Psychology series dedicated to an in-depth discussion of fundamental issues in the field of developmental psychology.
Sex differences is a topic of interest for researchers and practitioners working in the biological, behavioral, and educational sciences because the more we can fathom the nature of the inequities women receive at the hands of their male counterparts, the sooner we can address them. I hope that such understanding will lead to a recognition of the bases of differences and acceptance of them as part of the nature of human variability without negative attributions.
Differences are not just justification for irrational prejudice, but rather require a rational and egalitarian perspective where the whole person is accepted with differences being part of everyone's human condition. To come to such understanding first requires an attitude of respect for individuality as a value, and second, the need to understand the bases for the inherent variability among all living creatures. It is a difficult lesson to learn that sources of individual differences between men and women, the topic of this volume, are rooted in complex evolutionary, biological, and sociocultural history. The untangling of this mystery can only come about by studying the sources of the differences and the way they are manifested in different situations. Of course, to accomplish these understandings requires careful study and reflection as to the state of the research capabilities available to investigators. However, there is a basic requirement whenever studies of differences between groups are undertaken—to face squarely what are inherent biases among investigators.
In the case of research in male–female differences, it is legitimate to ask what stereotypical beliefs investigators might have about women. There is no reason to


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Managing Microsoft Exchange Server in a Cluster Environment
By Diane Garey (Issue 4 2000)
Microsoft Exchange Server is a business-critical messaging and collaboration application that major corporations depend on to enhance productivity and enable enterprise-wide employee communication. Organizations desiring high availability for Exchange can use Microsoft Exchange Server® 5.5 Enterprise Edition (Exchange 5.5 EE) in a Microsoft Cluster Service (MSCS) clustered environment.
Clusters, however, operate differently than stand-alone servers. Although much of the underlying hardware and operating system configuration is the same, the cluster configuration adds complexity not found in stand-alone server environments. This article discusses how applications differ in a cluster environment and the various methods that VERITAS ClusterX® for MSCS, a management tool for Microsoft clusters and clustered applications, enhances the management, administration, and configuration of Exchange 5.5 EE when operating in a MSCS environment using PowerEdge servers.
MSCS Clustering Increases Availability
Clustering, which integrates hardware and software technologies, enables a group of connected servers to operate as a single system and to present a single system image to clients. Clustering is a solution to a widespread computer issue—downtime. To overcome the negative effects of failure, several computers (or servers) are connected together so that the failure of one computer does not render all services running on that computer inoperable. Clustering provides the means to increase the overall availability of applications provided by the connected servers.
As part of Microsoft Windows 2000 Advanced Server and Windows NT 4.0 Enterprise Edition, MSCS clustering technology is used to increase the availability of business-critical applications and resources on Microsoft Windows servers. MSCS integrates with the core components of Windows 2000 and Windows NT, and provides a mechanism to monitor hardware and software resources, detect failure of such resources, and initiate a recovery of the resources on another server.
In addition to the operating system (OS) and MSCS requirements, the final software component of a cluster is the application. A clustered application has the ability to move from one cluster server to another via a failover. Each application group, sometimes called a virtual server, operates as an independent entity on the cluster.
The virtual server comprises all resources needed by the application, including the application services and/or executables. The virtual server can move independently among the clustered servers. Clients connect to the virtual server, rather than directly to a clustered server. This enables clients to automatically maintain connection to the application, regardless of which clustered server currently owns the application. It is particularly useful when a virtual server fails over—clients incur a brief downtime and then reconnect to the application.
Multiple applications can be installed on an MSCS cluster and the applications need not be aware that they are running on a cluster. However, cluster-aware applications receive additional benefits—such as quicker failover, earlier failure detection, smoother client reconnection, and easier installation.
This article discusses the cluster-aware version of Microsoft Exchange 5.5 Enterprise Edition, although the concepts apply to Microsoft Exchange 2000, Microsoft SQL Server, and other clustered applications.
Managing Clusters
Clusters operate differently than stand-alone servers. Most management applications were designed for stand-alone servers and manage them quite well. Few of them, however, have been designed to handle the unique characteristics of managing a cluster.
ClusterX for MSCS is a management application designed specifically for MSCS clusters. It addresses the cluster needs that can vary in subtle, yet significant ways from the needs of a stand-alone server. Two examples follow.
Clustering Microsoft Exchange
Microsoft Exchange 5.5 EE provides support for MSCS. Clustering Exchange 5.5 EE ensures that messaging services remain uninterrupted, even if a clustered server experiences a fault. For example, if the processor in a clustered node fails or the application experiences a fault, another node in the cluster replaces the failed node. Users on the failed node do not see a change in their e-mail service; they can continue to send and receive mail, and browse public folders.
ClusterX for MSCS has several features designed to improve administration of Exchange 5.5 EE in an MSCS environment:
Of particular interest, ClusterX categorizes applications into their own folders. Microsoft Cluster Administrator only shows cluster groups but not the underlying applications represented by the groups. ClusterX, however, delves deeper into the configuration to identify the applications that are configured on the cluster. ClusterX then fills the application folder with clusters that have the application configured on it. The folder can expand to show the cluster name, nodes, groups, and resources.
Figure 1 shows two clusters configured to run Exchange 5.5 EE. The Microsoft Exchange Server 5.5 folder shows both clusters along with status icons. The error icons indicate whether the group/resource is off-line, failed, or operating on a preferred node. Similar to other standard management applications, ClusterX depicts higher level items in the list with a down arrow when a subcomponent is in a failed state. The ClusterX Cluster List and status icons enable the administrator to quickly identify problems or potential problem areas in their clustered Exchange environment.
Not only does ClusterX maintain the same resource property information, it greatly simplifies viewing and understanding a group's dependency tree. The ClusterX Dependency View automatically scans the dependency properties for a selected group and graphically displays them in an easy-to-understand picture.
ClusterX builds an intuitive and editable dependency tree. Most dependency issues are easily identifiable by visually inspecting the dependency tree. The view can help to locate which resource is not allowing the entire group to come online. Once identified, the problem can be easily rectified. Adding a dependency can occur by dragging one resource onto another; however, removing a dependency requires a right-mouse click followed by a menu selection.
For the Exchange administrator, the dependency tree of an Exchange 5.5 EE cluster group is known to be large and complex. It contains more than a dozen resources, some with multiple dependencies. To investigate a dependency issue using a nongraphical view would be time-consuming and prone to error. The simplicity of an interactive graphical view reduces both administration time and the probability of making incorrect changes.
For Exchange 5.5 EE, ClusterX for MSCS initiates the setup of the clustered application. The wizard leads the administrator through a series of questions that help build the initial Exchange 5.5 EE cluster group. Then the wizard executes these steps:
The wizard initiates the creation of a customized HTML document that explains how to complete the Exchange 5.5 EE installation process. This document contains instructions and tips that clarify the installation process. For example, the Exchange 5.5 EE installation process must begin on the clustered node that currently owns the Exchange 5.5 EE group, and the group must be online. The custom HTML document outlines these requirements before the administrator starts the Exchange 5.5 EE installation program.
ClusterX for MSCS allows administrators to back up the configuration for an entire cluster or a single cluster group. Because Exchange 5.5 EE resides in a single cluster group, administrators can back it up by selecting the group in the Cluster List, choosing the Backup option in the Utility View, and initiating the process. A few seconds later the Exchange 5.5 EE group configuration is backed up to disk and can be archived, e-mailed, or printed.
Cluster state changes that do not invoke notification can lead to serious consequences. An application could attempt to fail over and be unsuccessful. Unless notification of the failover occurs, downtime will be excessive. ClusterX addresses this issue by offering support for SNMP traps and by generating cluster-specific events. ClusterX-generated traps include notification of any of these events:
These traps are then recognized by a higher level management application that can notify the administrator with an e-mail, phone call, or page.
In addition to generating SNMP traps, ClusterX creates dozens of events and places them into the ClusterX for MSCS Audit Log. Events created as a result of ClusterX commands are also forwarded to the Windows Event Log. Events show information very similar to standard Windows events, including date and time of creation, description of the event, which user and computer initiated the event, and the severity of the event.
For Exchange 5.5 EE, ClusterX can generate reports containing detailed configuration information as well as a simple resource report. In Figure 2 , a Resource Parameters report shows the failover properties of resources in the Exchange 5.5 EE group. ClusterX provides quick and easy access to a variety of reports about the cluster environment, including detailed resource and group information.
ClusterX is Designed for Cluster Management
Clusters operate differently than stand-alone servers and cluster-aware applications running in an MSCS environment; they have unique requirements. For Exchange administrators who want to manage their clusters with a tool designed specifically for cluster management, VERITAS ClusterX for MSCS provides distinctive advantages with its configuration, administration, and notification capabilities.
Diane Garey (email@example.com) is a product marketing manager at VERITAS Software, a world-wide enterprise-class application storage management software provider. Ms. Garey is responsible for ClusterX and other Windows high-availability clustering products. She has degrees in Engineering and Business Administration from the University of New Brunswick in New Brunswick, Canada.
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text:
Reflections >Dubstep<
Credits & Info
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- Apr 27, 2010 | 2:47 AM EDT
- File Info
- Song
- 4 min 37 sec
- Score
- 4.39 / 5.00
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You may not use this work for commercial purposes without making specific arrangements with the artist UNLESS your work is a web-based game or animation, in which case you may use this freely.
- Score:
- Rated 4.39 / 5 stars
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- 43,638 Plays | 4,968 Downloads
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- Genres:
- Electronic - Dubstep
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Author Comments
Rated 5 / 5 stars
oh... WOW
Compared to other dubstep here...
Thank you! =D This one's almost a year old too, so hearing that from you at this point in time is fantastic!
Rated 4.5 / 5 stars
Amazing, yet something feels slightly "off"
Marvellous track, my only dissapointment, a minor one at that, is that somehow the vocals feel too "dub-y", I'm no musical genius, so I don't know the correct word for
it. Thouroughly enjoyed the entire track, most notably from around ~4:15.
Great effort!
Thanks, glad you liked it! =D Uhm, by "vocals" I'm guessing you're referring to the formant bass. Yeah, it's a little cheesy, but I'm workin on getting some sicker sounds into my repertoire. Still, glad you liked the overall idea!
Rated 4.5 / 5 stars
Excellent work!
I'm a huge dubstep fan (everything from excision to dub-crooks to Xkore, bar9, flux pavillion. Basically everything)
But too much dubstep is just KICK SNARE WOBOWBOWOBWOWBWOWOWOW!!!!!!!!
And this brings a classical element to the aforementioned timbre.
A mixing of epic proportions!!!
Props for keeping it from falling apart cause of all the different sections.
I do agree with everyone, there sure is some mixing you could fix (couldn't tell you how, I'm still learning. Just have an ear for it)
But you've blown everything straight outta the water with this,
So congratulations epic work!
(I'd really appreciate it if you'd give my stuff a listen, at least one song ;) how bout my "One more day" track. Thanks!)
Haha I love how you mention xKore as a classic dubstep producer, when him and I are in the same boat trying to get our stuff known lol! Thanks for the honest review man, much appreciated! =)
Rated 5 / 5 stars
Real nice
This is beautiful music of dubstep it brings out the true colors and powers of the music type. This makes me wanna become a professional at dubstep
Do it! ;D
Rated 5 / 5 stars
Awesome song!
This is a really cool song. Don't really have much to say. Except that is awesome.
Have you heard of a dj Cetacea? Cetacea's this girl who recently joined soundcloud. She posted quite a bit of songs on her track listing. Including this song and your other song. Iron God.
I thought Cetacea was you. But it says clearly on her profile that she's a girl. So yeah. Just trying to find out what's going on.
Anyway. Really awesome song.
Yes, this is a fraud. I've already reported the incident to Soundcloud. I had absolutely no clue that she put Reflections up on her site. Now the bitch will pay.


text:
3 Product Reviews - Average rating / 5 (Show All)
Click to review this product
What You Would Expect.
Alex Elliott - Tuesday August 05th 2014
Orange Viper Bats T-Shirt
John Villalovos - Tuesday October 29th 2013
I got this killer bright orange T-shirt from Viper Bats with a large image of the Viper snake head logo on the front! And a smaller snake logo with Team Viper and Swing Hard, Hit Hard!, on the back! Very high quality heavy duty cotton,
generously sized...
T-Shirt was Great!Click to review this product
Cindy Isenhour - Wednesday October 23rd 2013
We bought this along with a bat for our grandson's birthday. He and I thought it was really cool while my husband (who actually despises snakes) did not. But, since our grandson is the one wearing it, it is really a cool t-shirt.


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261 Cocktail
Adapted by StarChefs.com
July 2009
Yield: 1 Cocktail
1½ ounces Sazerac rye
¾ ounce Benedictine
¾ ounce fresh orange juice
1 dash Angostura bitters
In a shaker, combine rye, Benedictine, orange juice, bitters, and ice. Shake and strain into a chilled cocktail glass.
Mixologist Jackson Cannon
- Eastern Standard
518 Commonwealth Ave
Boston, MA 02215


text:
Watching the Lemurs Play
Published: February 21, 1999
(Page 2 of 3)
I was excited when we set off early the next morning in the hotel's open skiff, threading through shrimp fishermen in pirogues near shore. Sun gave way to gray clouds, which produced a deluge, light drizzle and fog for the next two and a half hours. My enthusiasm was seeping quietly away when a massive green shoreline appeared out of a cloud. The sun came out instantly, as if it had never been gone.
The thin strip of pebbly beach in front of us looked embattled. Behind it, a phalanx of tropical trees seemed to be pushing it into the sea, while the waves waged their own campaign to gain ground. A wooden gate in the greenery was the only sign of the village of Ambanizana, and some children peeked out as we landed. Forty-five thousand people live on the peninsula, largely outside the protected area, and they have been part of all aspects of park development, including plans to harvest rain forest products sustainably.
We found no trace of the red ruffed lemurs along the shore, and Nicol explained that the villagers had historically trapped them for food, so they were not likely to be nearby. As we headed inland and uphill toward the park it began to rain, and the path quickly turned into a muddy slide. The sounds of people chopping wood receded and the samll rice fields disappeared. Tall canarium and spreading intsia trees crowded in on us, and green vines fell as thickly as veils.
The rain came down harder, and we heard the distant sound of sawing. We were running out of time, and it sounded as if the forest was, too. But Nicol, who knew the place well, cocked his head. ''Do you hear that sawing in the distance?'' he said. ''It's the alarm call of the red ruffed lemur two or three miles away.''
Seeing animals in the wild takes time and we didn't have nearly enough. We never saw the lemurs.
Back at the beach, we were greeted by a crowd of villagers. They were gathered silently around a beautiful young woman on a bed. Her eyes were closed and her face was still as stone. Our boatman asked if he could bring her with us to a doctor in Maroansetra, a three-day walk through the forest. Her baby had died at birth, and she'd been in a coma since. They lifted her bed onto the boat and crowded onto the narrow beach to watch us leave. A rainbow touched down in the forest behind them. She survived the 18-mile trip and as we were about to take a flight out the next day, we learned she was already walking again.
Madagascar has six climate zones. The spiny desert of the south, where I spent the last few days without my husband, who was on business elsewhere, is the opposite extreme from the Masoala rain forest. The annual rainfall is two inches. In the dry season, people dig holes in the riverbeds to find water, and collect the morning dew with sponges.
A friend, Marie, met me at Amboasary, in the far south, about 35 miles west of Tolanaro (formerly Fort Dauphin), in a Land Rover. She apologized that the opening of Andohahela, the South's new wilderness park, had been delayed. The money had run out after the orientation center was finished, and the paths and self-guided tours weren't complete.
Though Madagascar is eager to promote tourism, it is one of the world's poorest countries and money for parks falls behind that for importing rice and fighting locusts in the national budget. But Madagascar's population has doubled to 13 million in the last 20 years with improved health care and mosquito control programs. If the parks don't open and begin to make money, the few wild places that remain will be encroached on by hungry people.
Andohahela vies with Masoala in its unique biodiversity and importance as a refuge of endangered species. In an odd miracle of nature, three climate zones come together in the park, with rain forest, spiny desert and riverine transition zones meeting at the center. The area was a strict nature reserve until its recent opening as a nature park.
We hurtled down the red dirt road like a bowling ball, scattering herdsmen and their zebu cattle into the cactus. Then we turned onto a track and began a slow, bucking ride over rocks. I tried hard to concentrate on Marie's detailed description of the future park around us. There are 13 kinds of lemurs here and 150 different birds, and an astonishing 90 percent of the plants are medicinal.
But I couldn't focus on any of this as I looked out the window at a dense confusion of prickly plants. Some reached 20 feet high, with tendrils frozen in mid-undulation, and others were jagged as a coral reef. The midday sun sucked up the color and shade, and no wildlife was moving. It looked to me like the harshest environment in the world.
We stopped at a gathering of stick-and-thatch huts in a clearing of sun- hardened earth. A dozen youngsters were singing around a boy playing a single-string gourd. One of them paused to sell my friend three cigarettes from a grocery store the size of a closet, but the others were too engrossed in their song to look up.
Berenty is the oldest and most popular nature reserve in Madagascar. It was created by a French colonial family who set aside 40 acres of tamarind forest along the Mandrare River and a small area of spiny desert. Today, its shaded alleyways and carefully manicured gardens of spiky didierea plants are as orderly and elegant as a Paris park, but one in which every corner is swinging or bounding with lemurs.


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The Crew:
Principal List
Directors: Roger Spottiswoode and Lekha Singh
Executive Producer: Lekha Singh
Producers: Lekha Singh and Rebecca Chaiklin
Editor: Paul Seydor, A.C.E.
Original Music by: David Hirschfelder
Directors of Photography: Robert Adams, Robert Fitzgerald, and Tony Hardmon
Roger Spottiswoode
Roger Spottiswoode began his career as an editor but became a director with the 1980 film Terror Train. He is well-known for directing action movies such as Turner and Hooch and Tomorrow Never Dies, but he also directs more political films (Spinning Boris and Shake Hands with the Devil). Collaborating with fine-art photographer Lekha Singh, Roger Spottiswoode co-directed Beyond Right & Wrong, a documentary which presents stories of unimaginable loss and remarkable resilience.
Director and Producer:
Lekha Singh
Fine-art photographer Lekha Singh's work offers insight into the human condition around the world. She contributed photographs to National Geographic's The Other Side of War: Women's Stories of Survival and Hope, and her photography books include Call to Love: In the Rose Garden with Rumi, Bhutan, and Pop-Up Pianos. She also executively produced the documentary The Square, which won three Emmys and was nominated for an Academy Award. Singh made her directorial debut with the documentary film Beyond Right & Wrong.


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Thunder notebook: Wizards Warning
Don't read too much into Washington's 3-7 record. Many predicted the Wizards would make the playoffs. Look for a rapid climb in the standings now that Antawn Jamison has returned from a shoulder injury. Jamison scored 31points and grabbed 10 rebounds Wednesday night in his season debut, a 17-point win over Cleveland.
"They had some injuries," said Thunder coach Scott Brooks. "When they're healthy they're a much different team. They're a talented team. We'll have to play with energy and play well."
For all the talk about the lack of a dominant defensive inside presence, Oklahoma City ranks eighth in the league in blocked shots (5.5).
Jeff Green (1.1) leads the team. Etan Thomas (0.9), Nick Collison (0.8), Thabo Sefolosha (0.8) and Kevin Durant (0.7) also are contributing.
"We're doing a good job with our weak-side (defense)," Brooks said. "Last year we struggled guarding the ball. This year we're doing a better job. We're not a great shot-block team but are putting ourselves in position to get a few."
Green said: "We have athletic guys with long arms who can jump and force bad shots. It's just hustle, making a play."
Three back-to-backs in a nine-day span ended with a lopsided loss at Orlando. But the Thunder is 4-3 away from the Ford Center, highlighted by road wins at San Antonio, Miami and Detroit. Last season OKC was 8-33 in road games.
"It shows we're growing as a team," Durant said. "We know how to handle situations throughout a game. Last year when we were up nine points with about four minutes left (like at Miami) we probably would have given the game away. Now we're sustaining leads and making plays down the stretch."
Collison is emerging as the Thunder's top interior reserve. The past week, Collison has played some game-on-the-line, fourth-quarter minutes. He said an ankle injury that's hampered him since training camp is 90 to 95 percent healed.
"It feels pretty good but it was still a little tender in our last home game (last Sunday)," Collison said. "Hopefully it will keep improving. It depends on what happens in the game. If I jam it or something it's sore the rest of the night."
Guard Kyle Weaver averaged 4.3 points and 2.3 rebounds in 56 games his rookie season. He started 19 games. With Shaun Livingston sidelined (arthroscopic knee surgery) Weaver will be active every game. He scored 11 points in his season debut Wednesday night after the Magic built a 30-point lead.
"The biggest thing is to be ready," Weaver said. "It was good to get in that first time to get the feel back. It was good to get to play a whole quarter. I made a couple of shots which helped my rhythm."


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The Warped Case for Jew-Hatred: Martin Jay "Explains" How Jews Cause Antisemitism
Alexander, Edward, Midstream
There is a great temptation to explain away the intrinsically incredible by means of liberal rationalizations. In each one of us, there lurks such a liberal, wheedling us with the voice of common sense.
--Hannah Arendt (1)
The academic boycotters of Israeli universities and the professorial advocates of suicide bombing of Israeli citizens are in the front lines of the defense of terror, which is the very essence of Palestinian nationalism. (2) But they themselves are supported by a rearguard of fellow travelers, a far more numerous academic group whose defining characteristic is not fanaticism but timeserving timorousness. In the thirties, "fellow travelers" usually referred to the intellectual friends of communism (well analyzed in David Caute's book on the subject (3)), although Hitler competed with Stalin in attracting people from America and Britain who never actually joined the Nazi or Communist parties but served their purposes in the conviction that they were engaged (at a safe distance) in a noble cause. At the moment, as Martin Peretz has pointed out, (4) the favorite cause of peregrinating political tourists is the Palestinian movement; and the reason why fellow travelers favor this most barbaric of all movements of "national liberation" is that its adversaries are Jews, always a tempting target because of their ridiculously small numbers (currently, 997 out of every 1000 people in the world are not Jews), and their enormous image (as Christ-killers, corrupters of the young, thieves, agents of Satan, beneficiaries of Judas, devils dancing around the cross, Zionist imperialists).
As a representative example of the academic fellow-traveler in the ongoing campaign to depict Israel as the devil's own experiment station and make it ideologically vulnerable to terror, take the case of Martin Jay, a professor of history at the University of California, Berkeley, and author of books about the Frankfurt school in Germany and "ocularcentric discourse" in France. In the Winter-Spring 2003 issue of Salmagundi, a quarterly journal of the social sciences and humanities, Jay argues, in an essay entitled "Ariel Sharon and the Rise of the New Anti-Semitism," (5) that Jews themselves, primarily Sharon and the "fanatic settlers" (22) but also the American Jews who question the infallibility of The New York Times and National Public Radio, or protest the antics of tenured guerrillas on the campuses, are "causing" the "new" anti-semitism. Jay, unlike such people as the late Edward Said (of whom he writes with oily sycophancy), does not deny the existence of a resurgent antisemitism, although his examples of its manifestations are vandalized synagogues and cemeteries, "tipping over a tombstone in a graveyard in Marseilles or burning torahs in a temple on Long Island [as] payback for atrocities [my emphasis] committed by Israeli settlers" (14); such unpleasant words as stabbings, shootings, murder--all of which have been unleashed against Jews in Europe as well as Israel--are not part of Jay's vocabulary. But his main interest is in proposing that the Jews are themselves the cause of the aggression against them. "The actions of contemporary Jews," Jay alleges, "are somehow connected with the upsurge of anti-Semitism around the globe" (21), and it would be foolish to suppose that "the victims are in no way involved in unleashing the animosities they suffer."(17)
Although Jay's main concern is the (supposedly) "new" antisemitism, his heavy reliance on the thesis and even the title of Albert Lindemann's unsavory and deviously polemical book, Esau's Tears: Modern Anti-Semitism and the Rise of the Jews (1998), suggests that he believes political antisemitism, from its inception in the 19th century, has been in large part the responsibility of the Jews themselves. Lindemann's book argued not merely that Jews had "social interactions" (a favorite euphemism of Jay's) with their persecutors but were responsible for the hatreds that eventually consumed them in Europe; antisemitism was, wherever and whenever it flared up, a response to Jewish misbehavior. …


text:
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Mary, Queen of Scots and All Her Ghosts
ISBN13:by Miller, Joyce; Coventry, Martin
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What is included with this book?
- The New copy of this book will include any supplemental materials advertised. Please check the title of the book to determine if it should include any CDs, lab manuals, study guides, etc.
Mary, Queen of Scots, is well-known to history for her tragic life and brutal death, so it is not surprising that her ghost reputedly haunts more sites than any other ghost in the world. There are stories of more than 20 sites being visited by Mary's spirit, from the place of her birth and the castles she visited as queen of Scots, to the prisons in England where she was held captive, and the stairs she descended at Fotheringhay on the day of her execution. This lavishly illustrated book covers Mary's life and the various sites with which her ghost is associated, along with supernatural stories of her contemporaries, including two of her husbands, her mother, and the location of her last stand in Scotland.


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Berklee Responds to the Refugee Crisis
The Berklee Mediterranean Music Institute
releases a powerful awareness-raising set of music.
The Berklee Mediterranean Music Institute
releases a powerful awareness-raising set of music.
Apply to Berklee's undergraduate, master's, and summer programs and register for courses offered by our online school.More
The Boston Conservatory and Berklee merge as a powerhouse 21st-century performing arts institution.More
In a new interview, David Wallace talks about empowering string players with new approaches to playing, collaborating, and creating.More
Learn, play, and take your musicianship to the next level. Register now for summer programs that give you a taste of Berklee—on the stage and in the classroom.More
Read about members of an alt-rock band and other Berklee students who have spent a semester studying in Valencia, Spain.More
BerkleeICE and the Brown Leadership Institute join forces in a program that will help students hone their entrepreneurship skills, creativity, leadership, and capacity for innovation.More
Professor of music production and engineering Prince Charles Alexander talks in our podcast about working with everyone from Notorious B.I.G. to his former student, Charlie Puth.More
Learn about Berklee's master's degrees offered on our Boston and Valencia, Spain campuses, with programs including music therapy, performance, business, film scoring, and music technology.More
Berklee is ranked the No. 2 music school in the world by The Hollywood Reporter.Read more
Students are taking their education to the next level with Berklee's two new graduate programs—a master of music in contemporary performance (global jazz concentration) and a master of arts in music therapy program.More
Beginning with the fall 2016 class, all students accepted into Berklee's master of music in contemporary performance (global jazz concentration) program will be awarded full-tuition grants valued at $47,500.More
Drawing on her talents as a producer, songwriter, and remix artist, Chrissy Tignor-Fisher shows her students how technology can be a dynamic part of the creative process.More
Apply to this full-scholarship program to study with jazz greats and perform on a Newport Jazz Festival stage.More
Berklee's first international campus, in Valencia, Spain, offers master's degrees, summer programs, and many other opportunities for global music education.
Berklee Online is now accepting applications for the new online Songwriting degree program. Apply today and receive an admissions decision within two weeks.More
Get a glimpse of this year's graduating class, which hails from more than 60 countries and nearly every U.S. state.More
Eleven students traveled with BerkleeICE to Silicon Valley to get an inside look at what drives the nation's hub of innovative technology companies, such as Google, Apple, and Facebook.More
Faculty Annette Philip talks about the importance of Indian music for Berklee as the college prepares a visit to the country.More
Two alumni are touring the world with this Grammy-winning pop hitmaker.More
Six Berklee and Boston Conservatory alumni have been nominated for 2016 Tony Awards, including Berklee's Alex Lacamoire '95 for his work on Broadway megahit, Hamilton.More
Rita Morena broke into a rap during her commencement address as she and other industry luminaries received honorary degrees and more than 900 musicians graduated from Berklee.More
Get a glimpse of this year's graduating class, which hails from more than 60 countries and nearly every U.S. state.More
Contribute to or catch a glimpse of the pics, posts, and tweets in this year's commencement live feed.More
Ensemble and City Music faculty Chantel Hampton '08 and Alonzo Harris underscore the importance of being versatile as a musician and how technology can enhance performance.More
From Serial to This American Life, alumni are make a living in New York mixing and creating sound for podcasts.More
Associate Songwriting Professor Melissa Ferrick talks about touring, writing honest songs, and getting students to open up.More
Brookline's Coolidge Corner Theatre will present the world premiere of the Berklee Silent Film Orchestra's new, original score to E.A. Dupont's Varieté, on May 2.More
Berklee hosts thousands of concerts every year, but none of them quite like the Concert for 100 Mobile Devices—one that featured a mix of traditional music performances on a stage and audience participation via iPhones and iPads.More
Student Zaid Tabani talks about his journey as a rapper, and the peaks and valleys that led him to the release of his new record.More
Eleven students traveled with BerkleeICE to Silicon Valley to get an inside look at what drives the nation's hub of innovative technology companies, such as Google, Apple, and Facebook.More
David Murillo R., a Berklee student from Medellín, Colombia, travels to the Sundance Film Festival, where a feature film he scored, Between Sea and Land, won two awards.More
Berklee has its stamp all over the music of Hamilton, including the work of music director and orchestrator Alex Lacamoire '95.More
A new slate of graduate programs in Boston—a master of music in contemporary performance (global jazz concentration) and a master of arts in music therapy—rounds out the graduate work being conducted at Berklee's campus in Valencia, Spain.More
Zoya '14 is a singer-songwriter who is finding success in her native India and the United States with her signature folk fusion that combines elements of pop and Northern Indian music with varied, unusual instrumentation.More
Producer, songwriter, and artist, T Bone Burnett inspires, engages, and challenges Berklee students during a recent visit to Berklee.More
While building his music production and engineering chops, Federico Masetti also finds the time to give back by founding an international nonprofit in Ghana.More
Belgian harpist Pia Salvia expands the borders of her classical training, creating her own unique brand of original music combining elements of jazz, Latin music, flamenco, and vocal pop music.More
Four Berklee alumni, including Dominican singer-songwriter Juan Luis Guerra '82 and faculty bassist Oscar Stagnaro, received seven Latin Grammy Awards.More
The legendary Eagles guitarist offers Berklee students life lessons from the road.More
Grammy-winning trumpeter and composer Terence Blanchard is a visiting scholar in the Jazz Composition Department.More
Jana Susteric expands her voice at Berklee's graduate Contemporary Performance Program (Production Concentration) in Valencia, Spain.More
Berklee student Luis Gamarra founded the nonprofit Sonidos Bolivianos as a way to nurture artists and musicians in his native Bolivia.More
Berklee band Cordelia and the Buffalo was selected to play the 2015 Osheaga Festival—a three-day music and arts festival in Montreal that draws more than 100,000 attendees each year.More
Larry Watson, Berklee's ensembles professor and artist-in-residence at Harvard Law School's Charles Hamilton Houston Institute for Race and Justice, talks about the resilient messages of African American music.More
Help us create a global laboratory for musical discovery and artistry.
Help us promote the power of music to change people's lives for the better.
Help us transform the current model of higher education.


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You can expect spectacular view of the fireworks from the water while sitting aboard her elegant deck as the Manhattan skyline lights up in celebration of the Fourth of July.
Guests are treated to an open bar of fantastic local beers, soda, wine, and champagne, plus passed hors d' oeuvres!
Some illuminated views along the way will include:
- The New York City skyline from the middle of the grand Hudson River!
- Hundreds of festive boaters out on the water to celebrate our nation's independence!
- The famous Macy's Fourth of July fireworks, shot from the East River!
Climb aboard the America 2.0 and experience the city's most festive summer night!
What Is Not Included?
Meeting Location
- Do sails sell out frequently?
- This sail will definitely sell out - please book as early as possible.
- What happens if the sail is sold out?
- Unfortunately, we do not have a wait list for our sails, so please book well in advance. However, if you find the sail you are looking for is full, you should also check out cruises aboard the Schooner Adirondack and the Yacht Manhattan - there may be one available!
- Is there parking and how much is it?
- There is parking at Chelsea Piers. You must be south-bound on the West Side Hwy in order to access the turn-in for parking on Piers 61, 60, and 59. Up to 3 hours of parking is $25, and up to 4 hours is $38. However, on the Fourth of July, parking may be filled early in the day. We cannot ensure that parking will be available. Taking mass transit and walking to Chelsea Piers my be the best guarantee access.
- What exactly do we see on the sail?
- You will get excellent views of lower Manhattan from the west side, and spectacular views of the Macy's Fourth of July Fireworks!
- Is food served during the Fourth of July Sail?
- Yes - Your ticket includes heavy passed hors d' oeuvres prepared by our chef and an open bar of beer, wine, soda, water and champagne!
- How about drinks? Should I bring those?
- No, it is illegal for you to bring alcohol of your own on board. Our sail includes complimentary champagne, wine, beer, soft drinks and water, and we therefore ask that you do not bring your own drinks on your sail. (One quick note: We will serve a few rounds, but it is not an unlimited booze-cruise. We aim to create an elegant, relaxing, peaceful, and safe experience for all of our guests.)
- Is the Schooner America 2.0 Safe?
- Absolutely. The schooner is a safe and gentle vessel. Along with your captain, there is a minimum of two crew members on every sail to make sure you feel comfortable and at home on the water. We are stocked with water, beverages, blankets, pillows, and life jackets, should you feel you need one. There are also private marine heads (bathrooms) below.
- How steady is the sailing? Am I likely to get seasick?
- The schooner is a steady, gentle vessel. It is very rare for our guests to become seasick. While most people do not experience any seasickness on the schooner, you may want to consider light medication if you normally take such precautions for motion sickness. However, we cannot officially advise you to take any medication.
- Is there a bathroom on the boat?
- Yes, the boat is equipped with a bathroom that is accessible at all times. We call it a "marine head" and it is unlike the bathroom you use at home. It involves pumping and there are simple directions posted in the bathroom on how to use it.
- Is there seating on the boat?
- The America 2.0 has comfortable bench-style seating.
- Is there an age limit for these sails?
- While there is no age limit for the sails, all attendees under 18 must be accompanied by a parent or guardian. Note that there is no reduced rate for children.
- Can I stow anything (eg, my briefcase) during the sail?
- There is an area below deck where you may store your belongings. Please keep in mind that this area is not guarded, so we cannot take responsibility for any broken, lost or missing items. But we have not had any problems to date with theft or damage.
- Where does the sail finish?
- Our sails will end at the same pier from which they departed.
- Can I get a refund or reschedule my tickets after buying them?
- Because we are guaranteeing your space on the sail, tickets cannot be refunded or rescheduled once purchased.
- Do you ever cancel sails due to bad weather?
- The sail usually runs in light rain and other moderate weather situations. The only time we cancel a trip is in the event of severe or unsafe weather conditions. Our captains monitor the radar to watch fronts and cells in the area on days when inclement weather is possible. Cancellations are made on the day of the sail, by the captain, up to one hour prior to sail time. If you have purchased tickets for a sail that is canceled, you will have the opportunity to reschedule your tickets (subject to availability), receive credit towards a future event, or get a refund.
- What happens if it starts raining when we're out on our sail?
- Don't worry, we won't melt! Trips with a little wetness have proven to be some of the most memorable bonding experiences for our guests. (This all depends on attitude of course...) We have ankle-length, button-down raincoats available for all of our guests in the case we are caught in a rain-shower.
- Is gratuity included in the price of the sail?
- Gratuity is not included in the price of the sail. Parties of 12 or more will be contacted directly by Classic Harbor Line within 48 hours of purchasing tickets to provide credit card information for an additional charge of 18% gratuity.
- Why do they call her Schooner America 2.0?
- The Schooner America 2.0 is named for the boat she was based on. Her hull and rigging are designed after the famous Schooner America, which was built in New York Harbor in 1851 and won the Worlds Cup in Britian that same year. However, America 2.0 is not an exact replica; she is constructed with modern materials, thus 2.0.
- What is the difference between the sails on the America 2.0 versus Adirondack?
- The viewing area for this event is the same, however the duration of the trip aboard America is longer and passed hors d' oeuvres are included. America is also 25 feet longer and 5 feet wider that Adirondack and holds 50% more guests. She is the newest yacht in the fleet and features the most opulent deck layout and finishings of all our vessels.
- Is the schooner handicap accessible?
- No, unfortunately the schooner is not wheelchair-accessible.
- Can I book a private charter sail?
- Yes, a private sail on the Schooner America 2.0 is a unique and elegant event for your group. If you are interested in booking a private sail, please contact us by clicking the 'Contact SailNYC' link.
- Is smoking permitted during the sail?
- No, smoking is not permitted anywhere on the boat.
- Are gift certificates available for this sail?
- No, since this is a special Fourth of July fireworks sail, gift certificates are not available. Please check out our other regularly scheduled public trips for fantastic gift certificate options!
Refund/Rescheduling Policy
- Non-refundable, cannot be rescheduled.
- Once purchased, tickets cannot be refunded and cannot be rescheduled because your space is being guaranteed at the event.
Other Policies
- Activity may be canceled due to severe weather.
- The activity runs in light rain or moderate weather, but the seller may cancel up to an hour before the start time in the event of severe or unsafe weather conditions. If the event is canceled, ticket-holders will be able to reschedule tickets (there's a chance that the fireworks show and event might be rescheduled to the following evening), receive credit for future events, or receive a refund.
- Parties of 12 or more will be contacted for an additional gratuity charge of 18%.
- Classic Harbor Line will contact you directly within 48 hours of your purchase to take your credit card information for the additional charge. You must be reachable at the telephone number and email you provide.
Classic Harbor Line
Fast forward to 2011 and Scarano Boat Building in Albany, NY takes classic American values of craftsmanship and efficient design and adds in 21st century concepts--modern materials and eco-friendly propulsion-- and creates the most prestigious state-of-the-art ship of our time, America 2.0.
Sailing on the Schooner America 2.0 is a privilege. She moves through the water effortlessly and beautifully, and we take great pride in sharing her with you. Our staff is known for their amazing hospitality, and are all professionally trained and experienced on sailing our vessels well and safely. Do not hesitate to ask our crew about the boat or any of the NYC sites.


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2015 ABLD at Vanderbilt
In April I attended the annual meeting of the Academic Business Library Directors (ABLD) on the campus of Vanderbilt University in Nashville.
ABLD is a small association of librarians from most of the top 50 business schools in North America. During the past year, I served as chair of the board of directors of the group. The Vanderbilt meeting marked the end of my term as chair and I will now serve one more year on the board as past chair.
ABLD holds its meetings on the campus of a member school. Doing so allows the members of ABLD to become familiar with other business schools and the libraries that serve them. Among ABLD schools and their libraries, there are many organizational models and no two schools and libraries are exactly alike. Vanderbilt's business school offers only graduate degrees and its library is a full-service branch of the main library.
The conference began on a Tuesday afternoon with a campus tour led by Vanderbilt's landscape architect. He pointed out the many exotic species of trees found on the campus that allow the entire campus to be designated as the Vanderbilt arboretum. After the tour Vanderbilt's Interim Dean of Libraries, Jody Combs, hosted a reception in the main library.
Most of Wednesday's program consisted of a variety of presentations by ABLD members. I was interested in a presentation by Meg Trauner of Duke who described the experience of the Duke business school library with an e-book program from Overdrive. Overdrive allows library users to borrow e-books and audio books from libraries and access them via the Overdrive app on a smartphone or tablet. Meg reported that business school library users much prefer this means of access to accessing e-books on a computer.
After a lunch at Vanderbilt's on-campus University Club, the members spent some time with the seven vendor representatives who had been invited to showcase their products at the meeting. I learned more about BCC Research, a company that provides full text market research reports on industrial (rather than consumer) products. It's a database to which we would like to subscribe if the price is right.
Later Tuesday afternoon the group visited the Nashville Entrepreneur Center in downtown Nashville. Michael Burcham is a member of the faculty at Vanderbilt and he founded the Entrepreneur Center as an organization to foster entrepreneurs in the city. It's an impressive facility that is home to many companies that are just starting out. It provides office space, training and opportunities for mentoring and networking.
Thursday's program contained more presentations by ABLD members along with a couple others by faculty from the business school. Professor David Owens spoke about the topic of innovation and Professor Kimberly Pace spoke about communication skills.
Among the topics discussed in member presentations were library space, teaching classes for credit and library support for classes in entrepreneurship.
Two guests from abroad attended the meeting: Andy Priestner of Cambridge University and president of the European Business School Librarians' Group (EBSLG) and Gina de Alwis of Singapore Institute of Management and representing the Asia Pacific Business School Library Group (APBSLG) both made presentations. Andy spoke about his experience using ethnographic techniques to study library users and Gina spoke about the plans for the 2016 joint meeting of ABLD, EBSLG and APBSLG in Singapore.
The meeting concluded with a Thursday night visit to the Country Music Hall of Fame in downtown Nashville and a dinner on the site. After dinner, some of the members continued the fun on Nashville's famous Honky Tonk Row.
More photos from my trip to Vanderbilt and Nashville are located here.


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SAYRE, Okla. - Madeline Prather, 79, died Tuesday, April 9, 2002.
Services will be at 10:30 a.m. today in Rose Chapel Funeral Service Chapel with Charles Tatyrek and Dr. John Hubanks officiating. Burial will be in Delhi Cemetery.
Mrs. Prather was born Sept. 29, 1922, in Carter, Okla. She was a member of Spring Creek Baptist Church.
Survivors include a daughter, Mary Jane Prather of Sayre; three sons, T.J. Prather of Erick, James Prather of Panhandle, Texas, and Donnie Prather of Sayre; six grandchildren; and 14 great-grandchildren.
Amarillo Globe-News, April 11, 2002
Amarillo Globe-News © 2016. All Rights Reserved. Terms of Service | Privacy Policy / About Our Ads


text:
I am a student at Washington State University, and one of the pressing issues is the lack of health care for students.
Student services should implement low-cost health care for ongoing students who are without health insurance. Something must be done soon because the amount of sickness that spreads at the college is rapid.
Those who do not have any means of health care will only suffer longer. I am suggesting that low-cost health care would greatly increase proficiency and morale to continue the daily life of a student at Washington State.
Crystal Lee


text:
: Misc. Gaming:
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Pattern Recognition, Machine Intelligence and Biometrics
your country
"Pattern Recognition, Machine Intelligence and Biometrics" covers the most recent developments in Pattern Recognition and its applications, using artificial intelligence technologies within an increasingly critical field. It covers topics such as: image analysis and fingerprint recognition; facial expressions and emotions; handwriting and signatures; iris recognition; hand-palm gestures; and multimodal based research. The applications span many fields, from engineering, scientific studies and experiments, to biomedical and diagnostic applications, to personal identification and homeland security. In addition, computer modeling and simulations of human behaviors are addressed in this collection of 31 chapters by top-ranked professionals from all over the world in the field of PR/AI/Biometrics.
The book is intended for researchers and graduate students in Computer and Information Science, and in Communication and Control Engineering.
Dr. Patrick S. P. Wang is a Professor Emeritus at the College of Computer and Information Science, Northeastern University, USA, Zijiang Chair of ECNU, Shanghai, and NSC Visiting Chair Professor of NTUST, Taipei.
882 pages; ISBN 9783642224072
Read online, or download in secure PDF format
Title: Pattern Recognition, Machine Intelligence and Biometrics
Author: Patrick S. P. Wang
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- Academic > Engineering > Electrical engineering. Electronics. Nuclear engineering > Telecommunication
- Academic > Engineering > Electrical engineering. Electronics. Nuclear engineering > Electronics
- Academic > Engineering > Engineering (General). Civil engineering (General) > Engineering instruments, meters, etc. Industrial instrumentation
- Academic > Engineering > Engineering (General). Civil engineering (General) > Applied optics. Photonics
- Computers > Artificial Intelligence
- Computers > Computer Vision
- Computers > Information Technology
- Technology > Electronics
- Technology > Optics


text:
Search over a million flights, hotels, packages and more
No Expedia cancellation fee to change or cancel almost any hotel reservation
Search over a million flights, hotels, packages and more
No Expedia cancellation fee to change or cancel almost any hotel reservation
Check for the cheapest flights to and from Natrona County Intl. – CPR on Expedia by searching in our cheap airfare section. We offer year-round discount flights from CPR to a broad range of destinations on a wide selection of airlines. Let Expedia help you find great deals on Casper airfare and book your Casper flights today to and from CPR airport.
When flying from Natrona County Intl. (CPR), give yourself plenty of time to make your flight because nothing's worse than running to catch your plane. Getting to the airport early lets you check into your flight, drop off your luggage, pass through the TSA checkpoint, and leisurely arrive at your terminal gate with time to spare.
Before you head to the airport though, check your flight time. Check your flight status at CPR to determine if there are any changes in your itinerary. Once you've confirmed your CPR flight status, many airlines recommend you arrive at the airport at least two hours early for domestic flights and three hours prior to international flights.
When you have a flight from Natrona County Intl. (CPR), take advantage of the various transportation options available. If you've bribed your friend to drive you the airport, use the convenient curbside drop-off or the short-term parking at CPR. Alternatively, if you prefer to drive yourself, the airport provides safe and secure long-term parking for your vehicle during your trip. Furthermore, you'll find rental car and taxi services at the airport offering easy and reliable transportation.
Browse the most popular US domestic flight destinations from Casper airport.
Browse popular international flights from Casper, CPR airport.
Natrona County Intl., also known by IATA (International Air Transport Association) code CPR and ICAO (International Civil Aviation Organization) code KCPR, offers flights from multiple airline carriers to many popular global destinations. Above you'll find some useful information about Casper's airport that can help you in planning your next trip. Expedia offers flights from CPR airport on multiple airline carriers, and makes it easy and affordable for you to book low cost Casper flights.
Expedia offers amazing deals on flights around the world. Find Cheap Flights to San Juan and feel confident that your online booking experience will be fast and easy.
With tens of thousands of hotels to choose from including Hanoi Hotels you will always find the best place to stay on Expedia.
Find the best Rocky Mountain National Park today. Get a flight, hotel and rental car at the best online rates.


text: This is a real odd problem and my searching of the mailing lists and docs has not shed any light on it. I created 3 logical volumes (with lvm 1.0.1r2, r3 and r4) across 4 disks on a dual 300 MHz PII running 2.4.6 (same behavior under 2.4.9) and readhat 7.1. After this I noticed IO errors while reading some files and SCSI errors when accessing lvol2. The errors were similar to the following Sep 28 17:11:21 gar kernel: scsi0: ERROR on channel 0, id 11, lun 0, CDB: Read (10) 00 00 ba e1 97 00 00 80 00 Sep 28 17:11:21 gar kernel: Info fld=0xbae1e6, Current sd08:21: sense key Medium Error Sep 28 17:11:21 gar kernel: Additional sense indicates Unrecovered read error Sep 28 17:11:21 gar kernel: I/O error: dev 08:21, sector 12247456 lvol2 spanned two disks and all the errors were on only one of them. I naturally thought that the problem was a hardware problem with the disk. The only odd thing was that lvol1 which spanned the same two disks did not have any errors. The first thing I tried was an mke2fs with bad block checking on lvol2. It found several errors and when I copied the files back on new errors cropped up and more files were lost. The next thing I did was to move all the data off of that disk (pvmove) and then did a low level format on that disk. No errors were detected during the low lever format nor the verify I did after that. I then did a mke2fs with bad block checking on the disk without LVM. No errors. I then did a pvcreate and re-created lvol2 and then did a mke2fs with bad block checking. Once again the SCSI errors. Removing that drive from LVM and formatting yet again without LVM showed no errors. Moving lvol2 to a different physical volume results in the SCSI errors moving to that volume. I am now convinced that the problem is with LVM and not with the hardware. I still have two other logical volumes (lvol1 and lvol3) that are not having ANY problems at all. Does anyone have any suggestion on how to solve this one? Thanks. ----------------------------------------------------- Protect yourself from spam, use http://sneakemail.com


text: Well I am looking to install 5.5 HTTP Net Install on the computer of mine by using the linux askmethod command. I have boot off the DVD by using the netinstall.iso and it seems to be working fine and till I enter the location of the HTTP server. After the same it seems to fail the installation. I have searched on the Google but there was nothing which I can use to fix the problem of mine. any help on this particular matter would be highly appreciated. Thanks a lot in advance.


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