text:
|Publication number
|Publication type
|Application number
|Publication date
|Jul 20, 2004
|Filing date
|Jul 11, 2001
|Priority date
|Jul 13, 2000
|Fee status
|Also published as
|Publication number
|Antonius Johannes Josephus van Dijsseldonk, Erik Roeloff Loopstra, Dominicus Jacobus Petrus Adrianus Franken
|Original Assignee
|Asml Netherlands B.V.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (7), Referenced by (26), Classifications (20), Legal Events (5)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention relates generally to a lithographic projection apparatus and more specifically to a lithographic projection apparatus including a controllable reflector.
2. Background of the Related Art
The term "patterning structure" as here employed should be broadly interpreted as referring to means that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate; the term "light valve" can also be used in this context. Generally, the said pattern will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit or other device (see below). Examples of such patterning structure include:
A mask. The concept of a mask is well known in lithography, and it includes mask types such as binary, alternating phase-shift, and attenuated phase-shift, as well as various hybrid mask types. Placement of such a mask in the radiation beam causes selective transmission (in the case of a transmissive mask) or reflection (in the case of a reflective mask) of the radiation impinging on the mask, according to the pattern on the mask. In the case of a mask, the support structure will generally be a mask table, which ensures that the mask can be held at a desired position in the incoming radiation beam, and that it can be moved relative to the beam if so desired;
A programmable mirror array. An example of such a device is a matrix-addressable surface having a viscoelastic control layer and a reflective surface. The basic principle behind such an apparatus is that (for example) addressed areas of the reflective surface reflect incident light as diffracted light, whereas unaddressed areas reflect incident light as undiffracted light. Using an appropriate filter, the said undiffracted light can be filtered out of the reflected beam, leaving only the diffracted light behind; in this manner, the beam becomes patterned according to the addressing pattern of the matrix-adressable surface. The required matrix addressing can be performed using suitable electronic means. More information on such mirror arrays can be gleaned, for example, from U.S. Pat. Nos. 5,296,891 and 5,523,193, which are incorporated herein by reference. In the case of a programmable mirror array, the said support structure may be embodied as a frame or table, for example, which may be fixed or movable as required; and
A programmable LCD array. An example of such a construction is given in U.S. Pat. No. 5,229,872, which is incorporated herein by reference. As above, the support structure in this case may be embodied as a frame or table, for example, which may be fixed or movable as required.
For purposes of simplicity, the rest of this text may, at certain locations, specifically direct itself to examples involving a mask and mask table; however, the general principles discussed in such instances should be seen in the broader context of the patterning structure as hereabove set forth.
Lithographic projection apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, the patterning structure may generate a circuit pattern corresponding to an individual layer of the IC, and this pattern can be imaged onto a target portion (e.g. comprising one or more dies) on a substrate (silicon wafer) that has been coated with a layer of radiation-sensitive material (resist). In general, a single wafer will contain a whole network of adjacent target portions that are successively irradiated via the projection system, one at a time. In current apparatus, employing patterning by a mask on a mask table, a distinction can be made between two different types of machine. In one type of lithographic projection apparatus, each target portion is irradiated by exposing the entire mask pattern onto the target portion at once; such an apparatus is commonly referred to as a wafer stepper. In an alternative apparatus—commonly referred to as a step-and-scan apparatus—each target portion is irradiated by progressively scanning the mask pattern under the projection beam in a given reference direction (the "scanning" direction) while synchronously scanning the substrate table parallel or anti-parallel to this direction; since, in general, the projection system will have a magnification factor M (generally<1), the speed V at which the substrate table is scanned will be a factor M times that at which the mask table is scanned. More information with regard to lithographic devices as here described can be gleaned, for example, from U.S. Pat. No. 6,046,792, incorporated herein by reference.
In a manufacturing process using a lithographic projection apparatus, a pattern (e.g. in a mask) is imaged onto a substrate that is at least partially covered by a layer of radiation-sensitive material (resist). Prior to this imaging step, the substrate may undergo various procedures, such as priming, resist coating and a soft bake. After exposure, the substrate may be subjected to other procedures, such as a post-exposure bake (PEB), development, a hard bake and measurement/inspection of the imaged features. This array of procedures is used as a basis to pattern an individual layer of a device, e.g. an IC. Such a patterned layer may then undergo various processes such as etching, ion-implantation (doping), metallization, oxidation, chemo-mechanical polishing, etc., all intended to finish off an individual layer. If several layers are required, then the whole procedure, or a variant thereof, will have to be repeated for each new layer. Eventually, an array of devices will be present on the substrate (wafer). These devices are then separated from one another by a technique such as dicing or sawing, whence the individual devices can be mounted on a carrier, connected to pins, etc. Further information regarding such processes can be obtained, for example, from the book "Microchip Fabrication: A Practical Guide to Semiconductor Processing", Third Edition, by Peter van Zant, McGraw Hill Publishing Co., 1997, ISBN 0-07-067250-4, incorporated herein by reference.
For the sake of simplicity, the projection system may hereinafter be referred to as the "lens"; however, this term should be broadly interpreted as encompassing various types of projection system, including refractive optics, reflective optics, and catadioptric systems, for example. The radiation system may also include components operating according to any of these design types for directing, shaping or controlling the projection beam of radiation, and such components may also be referred to below, collectively or singularly, as a "lens". Further, the lithographic apparatus may be of a type having two or more substrate tables (and/or two or more mask tables). In such "multiple stage" devices the additional tables may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other tables are being used for exposures. Twin stage lithographic apparatus are described, for example, in U.S. Pat. No. 5,969,441 and WO 98/40791, incorporated herein by reference.
In a lithographic apparatus the size of features that can be imaged onto the wafer is limited by the wavelength of the projection radiation. To produce integrated circuits with a higher density of devices, and hence higher operating speeds, it is desirable to be able to image smaller features. While most current lithographic projection apparatus employ ultraviolet light generated by mercury lamps or excimer lasers, it has been proposed to use shorter wavelength radiation of around 13 nm. Such radiation is termed extreme ultraviolet (XUV or EUV) or soft x-ray and possible sources include laser-produced plasma sources, discharge plasma sources or synchrotron radiation from electron storage rings. An outline design of a lithographic projection apparatus using synchrotron radiation is described in "Synchrotron radiation sources and condensers for projection x-ray lithography", J B Murphy et al, Applied Optics Vol. 32 No. 24 pp 6920-6929 (1993).
Lithographic projection apparatus using EUV radiation are intended to image mask patterns with a critical dimension of 90 nm or less. This imposes extremely severe accuracy criteria on the illumination and especially the projection optics. For the projection system, the required accuracy is defined by the wavefront aberration (WFA) which is twice the magnitude of the surface figure error. For a four-mirror system it has been calculated (Gwyn, C. W. et al, Extreme Ultraviolet lithography, J. Vac. Sci. Technol. B 16, (November/December) 1998, pp 3142) that a WFA tolerance of ≦1 nm rms is required for low frequency errors, i.e. those of spatial wavelength of greater than 1 mm. Independent errors of each mirror must therefore be no greater than 0.25 nm, since in a system of N mirrors the maximum permissible error of each mirror is (2N)−1 times the total error for the system. For mid-spatial frequency errors, of wavelength 1 mm to 1 μm, surface roughness must be less than 0.2 nm rms as roughness in this spatial frequency range reduces image contrast. High-spatial frequency errors, of wavelength less than 1 μm, cause large angle scattering, a loss mechanism for the beam, and so surface roughness for these frequencies must be less than 0.1 nm rms.
U.S. Pat. Nos. 5,986,795 and 5,420,436 both disclose the use of adaptive mirrors in photolithography using EUV radiation. In the mirror described in U.S. Pat. No. 5,986,795, a number of actuators are provided between a reaction plate and a face plate bearing a reflective coating suitable for the radiation used in the lithography apparatus. The actuators may be piezoelectric, electroresistive or magnetoresistive and act generally perpendicularly to the face and reaction plates. The reaction plate is more flexible than the face plate. U.S. Pat. No. 5,420,436 describes a similar arrangement, having an array of piezoelectric actuators acting perpendicularly between a reaction plate and a face plate; in this case however the face plate is more flexible than the reaction plate.
An embodiment of the present invention provides an adaptive reflector or system of reflectors, especially for extreme ultraviolet radiation, that can provide improved, control over the surface figure of the mirror and hence over wavefront aberration.
One aspect of the present invention includes a lithographic projection apparatus including a radiation system for providing a projection beam of radiation, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate; and an active reflector comprised in an optical system being either one or both of said radiation system and said projection system, said active reflector comprising a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of said reflective multilayer, wherein said actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer.
The actuator in the active mirror serves to control the surface figure of the reflective multilayer and hence can be used to minimize wavefront aberration in the radiation beam delivered by the optical system. Stress, and particularly stress variations, have been identified as a major source of surface figure errors in reflectors adapted to reflect EUV radiation and the invention can directly compensate for this. The present invention can be used to compensate for stress inherent in the multilayer as a result of its manufacture as well as stresses caused by external factors. The actuators may be piezoelectric stack or patch actuators and are preferably incorporated into the reflector body close to the reflecting multilayer.
The actuators exert a substantial component of force in a direction parallel to the surface figure of the multilayer. In the case of a significantly curved mirror the force component should be parallel to the surface figure at or near the point of connection between the actuator and the multilayer or the member bearing the multilayer. The stiffness of the multilayer, or a member bearing the multilayer, is higher in directions parallel to the surface figure than in the direction perpendicular to the surface figure (note that in a local coordinate system having orthogonal x, y and z axes describing the mirror, the direction perpendicular to the surface figure at the center of the mirror may be referred to as the z-direction.). This means that a given force exerted parallel to the plane of the reflector effects a smaller deformation of the surface figure than the same force exerted perpendicularly. Since the required deformations are very small and actuators of the required strength are easily obtained, the present invention allows for a much more exact control of the surface figure, with reduced risk of over-deforming the mirror.
The actuators may lie wholly in the plane of the reflector, particularly where the actuators are patch actuators. However, the actuators may also be rod actuators arranged diagonally between the reflective layer and base member. In such an arrangement, the actuators may be arranged in pairs connected to the reflective layer at the same point but to the base plate at spaced-apart locations and controlled so that the resultant force exerted by each pair on the reflector layer lies wholly within the plane of the reflector. It is also possible for the actuators to be connected singly but in that case it is preferred that of the force exerted by each actuator on the surface figure, the component perpendicular to the surface is less than 50% and preferably less than 20% of the total force exerted by that actuator.
The actuators may also be arranged such that they are operative to apply torques to said active reflector so as to locally bend the reflective surface of the multilayer for controlling the surface figure. Applying torques proves very efficient in controlling the surface figure and advantageously the torques are about a point in or near the reflective multilayer. Torques may be applied by exerting the forces on projections of the active reflector at a backside opposing the reflective multilayer. In an embodiment the actuators applying the forces that induce the torques are arranged in between projections. The projections may be walls of cavities at the backside of the active reflector and a pneumatic or hydraulic pressure can be applied to the cavities so as to form pneumatic or hydraulic actuators applying forces to the projections. Generally, the projections will be substantially perpendicular to the surface figure and the forces exerted on the projections parallel to the surface figure.
According to a further aspect of the invention there is provided a device manufacturing method including projecting a patterned beam of radiation onto a target portion of a layer of radiation-sensitive material on a substrate, wherein at least one of a radiation system for producing the beam and a projection system for projecting the beam include an active reflector that includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of said reflecting multiplayer, wherein said actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer and controlling said active reflector to minimize wavefront aberration in a radiation beam reflected by said active reflector.
Although specific reference may be made in this text to the use of the apparatus according to the invention in the manufacture of ICs, it should be explicitly understood that such an apparatus has many other possible applications. For example, it may be employed in the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, liquid-crystal display panels, thin-film magnetic heads, etc. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the terms "reticle", "wafer" or "die" in this text should be considered as being replaced by the more general terms "mask", "substrate" and "target portion", respectively.
In the present document, the terms "radiation" and "beam" are used to encompass all types of electromagnetic radiation, including ultraviolet (UV) radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and extreme ultra-violet (XUV or EUV) radiation (e.g. having a wavelength in the range 5-20 nm), as well as particle beams, such as ion beams or electron beams.
Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which corresponding reference symbols indicate corresponding parts, and in which:
FIG. 1 depicts a lithographic projection apparatus according to a first embodiment of the invention;
FIG. 2 is a diagram of relevant components of the projection optics of the first embodiment;
FIGS. 3A to 3C are cross-sections of alternative arrangements of bimorph mirrors usable in the first embodiment of the invention;
FIG. 4 is a diagram of a control system used in the first embodiment of the invention;
FIG. 5 is a table of results of two examples of the present invention compared with a static mirror;
FIG. 6 is a cross-sectional view of an active mirror used in a second embodiment of the invention;
FIG. 7 is a cross-sectional view of an active mirror used in a third embodiment of the invention; and
FIG. 8 is a cross-sectional view of an active mirror used in a variation of the third embodiment of the invention.
Embodiment 1
FIG. 1 schematically depicts a lithographic projection apparatus according to a particular embodiment of the invention. The apparatus comprises:
A radiation system Ex, IL, for supplying a projection beam PB of radiation (e.g. UV or EUV radiation). In this particular case, the radiation system also comprises a radiation source LA;
A first object table (mask table) MT provided with a mask holder for holding a mask MA (e.g. a reticle), and connected to first positioning means PM for accurately positioning the mask with respect to item PL;
A second object table (substrate table) WT provided with a substrate holder for holding a substrate W (e.g. a resist-coated silicon wafer), and connected to second positioning means PW for accurately positioning the substrate with respect to item PL; and
A projection system ("lens") PL (e.g. a reflective or a catadioptric system) for imaging an irradiated portion of the mask MA onto a target portion C (e.g. comprising one or more dies) of the substrate W.
As here depicted, the apparatus is of a reflective type (i.e. has a reflective mask). However, in general, it may also be of a reflective type, for example (with a transmissive mask). Alternatively, the apparatus may employ another kind of patterning structure, such as a programmable mirror array of a type as referred to above.
The source LA (e.g. an excimer laser, a laser-produced plasma source or a discharge plasma source) produces a beam of radiation. This beam is fed into an illumination system (illuminator) IL, either directly or after having traversed conditioning means, such as a beam expander Ex, for example. The illuminator IL may comprise adjusting means AM for setting the outer and/or inner radial extent (commonly referred to as σ-outer and σ-inner, respectively) of the intensity distribution in the beam. In addition, it will generally comprise various other components, such as an integrator IN and a condenser CO. In this way, the beam PB impinging on the mask MA has a desired uniformity and intensity distribution in its cross-section.
It should be noted with regard to FIG. 1 that the source LA may be within the housing of the lithographic projection apparatus (as is often the case when the source LA is a mercury lamp, for example), but that it may also be remote from the lithographic projection apparatus, the radiation beam which it produces being led into the apparatus (e.g. with the aid of suitable directing mirrors); this latter scenario is often the case when the source LA is an excimer laser. The current invention and claims encompass both of these scenarios.
The beam PB subsequently intercepts the mask MA, which is held on a mask table MT. Having been selectively reflected by the mask MA, the beam PB passes through the lens PL, which focuses the beam PB onto a target portion C of the substrate W. With the aid of the second positioning means PW (and interferometric measuring means IF), the substrate table WT can be moved accurately, e.g. so as to position different target portions C in the path of the beam PB. Similarly, the first positioning means PM can be used to accurately position the mask MA with respect to the path of the beam PB, e.g. after mechanical retrieval of the mask MA from a mask library, or during a scan. The reference signs M1, M2 correspond to reticle alignment marks and the references P1 and P2 correspond to wafer alignments to each other. These marks are used to respectively align the wafer and the reticle respective to each other. In general, movement of the object tables MT, WT relative to a base plate BP will be realized with the aid of a long-stroke module (coarse positioning) and a short-stroke module (fine positioning), which are not explicitly depicted in FIG. 1. However, in the case of a wafer stepper (as opposed to a step-and-scan apparatus) the mask table MT may just be connected to a short stroke actuator, or may be fixed.
The depicted apparatus can be used in two different modes:
In step mode, the mask table MT is kept essentially stationary, and an entire mask image is projected at once (i.e. a single "flash") onto a target portion C. The substrate table WT is then shifted in the x and/or y directions so that a different target portion C can be irradiated by the beam PB;
In scan mode, essentially the same scenario applies, except that a given target portion C is not exposed in a single "flash". Instead, the mask table MT is movable in a given direction (the so-called "scan direction", e.g. the y direction) with a speed v, so that the projection beam PB is caused to scan over a mask image; concurrently, the substrate table WT is simultaneously moved in the same or opposite direction at a speed V=Mv, in which M is the magnification of the lens PL (typically, M=� or ⅕). In this manner, a relatively large target portion C can be exposed, without having to compromise on resolution.
As shown schematically in FIG. 2, projection system PL comprises a set of mirrors (reflectors) R1 to R4 which collect the exposure radiation reflected from (or transmitted through) the mask MA and focus it onto the wafer W. Further details of the optical design of this system are given in Gwyn et al. (referenced above) which document is incorporated herein by reference. This projection system PL requires mirrors that are thin, especially for mirror R1 which is very close to the wafer.
Suitable active mirrors 10 a to 10 c usable in the projection system PL are shown schematically in FIGS. 3A to 3C. Each mirror essentially comprises a mirror body 11 which provides mechanical support and rigidity, an active layer 12 including the actuators to control the mirror surface configuration and a multilayer coating 13 which forms the actual reflecting surface.
In current designs, the mirror body 11 is relatively thick, e.g. 25 mm or more and up to a third of the lateral extent of the mirror, to avoid surface figure changes due to gravity and stress in the multilayer coating 13. However, by use of the present invention, this can be reduced substantially by using the active control to compensate for changes due to such effects. Preferred materials for the mirror body, whether thick or thin, are the glass, ULE (TM), Zerodur (TM) and aluminum and the body may be solid or, e.g., honeycombed as desired.
The actuator layer 12 is preferably embedded in the mirror body close to the multilayer 13 in order to have a direct influence on the surface figure. FIG. 3A shows such an arrangement whereby the actuator layer 12 is placed between the mirror body 11 and multilayer 12 and has a flat form. The surface figure is formed wholly in the multilayer 13. FIG. 3B is a similar arrangement but with the mirror body 11 and actuator layer 12 having a similar figure to the mirror surface figure. If it is not feasible to embed the actuator layer 12 in the mirror body 11, it can be attached to the bottom of the mirror body 11, as shown in FIG. 3C.
Actuator layer 12 includes a suitable number and arrangement of actuators to effect the desired control over mirror shape; this is discussed further below. The actuators themselves may be of any suitable form and use any suitable actuating principle, e.g. piezoelectricity, electrostriction, magnetostriction or by use of permanent magnet and coil, either moving magnet or moving coil.
Presently, piezoelectric actuators are preferred and, of piezoelectric materials, lead zirconium titanate (PZT) is preferred over polyvinylideen diflouride (PVDF). PZT has high force per unit mass, static force capability, high unconstrained strain/blocked force product, negligible DC resistance, relatively widespread availability, and flexibility in dimensions, materials and electrode configurations, which characteristics make it desirable for use in the present invention.
The actuators included in actuator layer 12 are preferably patch actuators, i.e. thin plate-like bending mode actuators which act as bimorph assemblies when attached to a plate. With such actuators the major principle by which curvature in the assembly is created is the in-plane forces generated in the piezoelectric material. Piezoelectric patch actuators usable in the invention include two major types: actuators in which the electric field is applied in the thickness, i.e. out-of-plane direction; and actuators in which the field is applied in the in-plane direction. One particularly suitable form of the latter type is the Active Fiber Composite (RTM) actuator manufactured by Continuum Control Corporation, Massachusetts, USA. The Active Fiber Composite (AFC) actuator comprises thin rods or fibers arranged in parallel to the in-plane direction with interdigitated electrodes. The distance between the electrodes is relatively large, requiring large voltages, but the capacitance of the actuators is relatively small so currents in operation are likewise small. AFC actuators are active only along their length and have a similar overall efficiency, expressed as the mechanical power delivered to a load divided by the reactive electrical input power, to conventional patch actuators. A particular advantage of AFC actuators in the present invention is their mechanical flexibility which allows them to be applied to surfaces with a relatively large degree of curvature.
The patch actuators used in the invention exert substantially all their operating force in the plane of the multi-layer 13. Since the multilayer 13 has higher in-plane stiffness than out-of-plane stiffness, this arrangement allows more accurate control of the surface figure since a given force will cause a smaller change in the surface figure. Thus the voltage applied to the actuator can be controlled with greater exactitude and any error, e.g. as a result of a non-linear voltage response of the actuator, will cause a smaller error in the surface figure.
The number size, and layout of actuators in the actuator layer 12 is dependent on the precise mirror construction, particularly its size and shape as well as the thickness of the mirror body and the nominal stress in the multi-layer 13. The required accuracy of the controlled surface figure is also important. As a starting point, actuators can be arrayed evenly across the mirror in a suitable regular array. However it is also possible to concentrate actuators in areas of the mirror where surface figure errors contribute disproportionally to wavefront errors or where greater surface figure errors are expected.
A control system for the active mirror of the invention is shown schematically in FIG. 4; this control system is based on interferometer wavefront sensing and a zero reference interferogram, but other sensing principles and references may be employed. A laser source 21 outputs two coherent laser beams of suitable frequency. One beam is passed through the adaptive optical system 100 according to the present invention, e.g. projection system PL, before the two beams are recombined and interfere in interferogram detector 22. The output of interferogram detector 22 is compared to the zero reference interferogram zri by subtractor 23 and the difference supplied to fringe pattern analyzer 24 which provides wavefront information of the beam that has passed through the adaptive optics 100. Subtractor 25 subtracts this wavefront information from the desired wavefront information dw to generate the wavefront error we which is supplied to controller 26. Controller 26 in turn generates drive signals for the actuators of the adaptive optics 100 to minimize the wavefront error.
As alternatives to the above wavefront sensing arrangement it is also possible to sense the surface figure directly, e.g. using an interferometer to directly measure the surface figure via an array of points, or to measure the stress in the multilayer, since it is determined that this is the source of the error. Piezo-electric PVDF sensors integrated into the mirror at a suitable position may be used for this.
The control system for the active mirror can be operated in either on-line or off-line methods. In off-line methods, the actuation forces necessary to correct the mirror surface figures are determined at machine installation and periodically thereafter during maintenance of the machine. In the off-line control method, a recursive approach may be used, whereby a set of control signals is determined as an approximation to correct the surface figure; the wavefront aberration is then measured again and the control signals adjusted to improve the correction. This procedure may be repeated through a number of iterations suitable to meet the necessary tolerances in the optical system.
An on-line control method enables real-time or quasi real-time correction of the mirror surface figures to compensate for changing environmental conditions, e.g. ambient temperature, which may change during an exposure or series of exposures and component drift. For the on-line control, an at-wavelength (i.e. operating at the exposure wavelength) interferometer may be integrated into the projection optics. This interferometer may measure the interferogram during convenient intervals of the exposure process, e.g. during wafer or mask exchange. The data from this can then be used to update the control signals to correct the mirror surface figure(s).
With the invention, it is preferable to control the optical system including the active mirrors as a whole, rather than controlling individual active mirrors separately. In this way errors of one mirror may be optimally corrected by adjusting the surface figure of another and surface figure errors of static mirrors included in the system may also be corrected. In this way it may not be necessary to provide all mirrors included in the system with actuators.
The following examples of the first embodiment of the invention are based on analysis of a 400 mm�400 mm mirror on a 25 mm thick mirror body of ULE and a multilayer of 1 μm total thickness with a nominal stress of 400 MPa.
In the examples, piezo-electric patch actuators operating on the mirror in the in-plane direction are used. The actuator material is conventional PZT with a piezo constant of 166 pC/N in both directions, an effective Young's modulus of 6.3�1010 Pa, a Poisson ratio of 0.3 and an effective thickness and electrode distance both of 0.19 mm. Square patch actuators cover the entire surface of the mirror in a square array of 1, 9, 16, 25, 36, 100 or 400 actuators. A 10% sinusoidal variation in the nominal stress in the multilayer is assumed.
The results of the examples are shown in FIG. 5. The first column shows the number of actuators, with the first row being a corresponding arrangement with no actuation for comparison. In column A, the rms surface figure error in nm is given. It can be seen that even a single actuator gives a substantial improvement and that the rms error improves rapidly with additional actuators.
In column A the total error is given. It can be shown that for wavefront errors the surface figure can be decomposed into characteristic Seidel shapes of which piston, tip/tilt and focus are the lowest order terms. A mirror mount adjustable in 6 degrees of freedom can compensate for these low order terms. Accordingly, column B in FIG. 5 gives results assuming that the piezoelectric actuators according to the invention only compensate for the higher order errors. As can be seen, if low order errors are corrected by the mirror mount, the comparison, without control, value is much improved, but the introduction of actuators according to the invention still results in significant improvements, increasing with the number of actuators.
Many projection systems will not make use of the entire mirror surface; assuming a 20% unused freeboard and low order correction via the mirror mount, results are given in column C of FIG. 5. Again substantial improvements in surface figure are provided with increasing numbers of actuators.
Embodiment 2
In a second embodiment of the invention, which may be the same as the first embodiment save as described below, stack actuators acting diagonally are used.
Stack actuators used in the second embodiment of the present invention comprise rod-like actuators arrayed diagonally to the mirror surface and acting along their lengths. Though generally necessitating a bulkier construction than patch actuators, stack actuators can use multiple electrodes along their length to reduce the driving voltages and can be used if linear motion with large concentrated forces is required. Stack actuators also allow any surface figure to be controlled.
A mirror 30 employing stack actuators and used in the second embodiment of the invention is shown in FIG. 6. In this mirror, two arrays of oppositely inclined actuators 31, 32 are connected diagonally between base plate 11 and the reflective member 33, which comprises a multilayer 13 provided on a suitable substrate. The angle of inclination, a, of the actuators is preferably less than about 60� and most preferably less than about 45�. At least in part of the mirror, the actuators 31, 32 are arranged in pairs so that two oppositely inclined actuators 31 a, 32 a are connected to the reflective member 33 at the same point. With this arrangement, one actuator 31 a can be arranged to exert an expansive force, fa, and the other actuator 32 a compressive force, fb, of equal magnitude so that the resultant force, fr, is wholly in the plane of the mirror. A similar effect can be achieved even where the angles of inclination of the actuators are not equal by suitable adjustment of the magnitudes of the forces applied.
In addition to the diagonal actuators, some perpendicular actuators may also be included, e.g. for compensating for perpendicular components of the forces exerted by the diagonal actuators. Combinations of patch, diagonal and/or perpendicular actuators may also be used.
Embodiment 3
In a third embodiment of the invention, which may be the same as the first or second one save as described below, torques are exerted to control the surface figure. FIG. 7 shows mirror 40 comprising a multilayer structure 43 presenting a reflective surface having the surface figure to be controlled. Multilayer structure 43 is provided on mirror body 41 provided with projections 44 that project in a direction opposed to and substantially perpendicular to the reflective surface. The projections are arranged in a two-dimensional array on the backside of mirror 40. They need not be an integral part of mirror body 41, as shown in FIG. 7, but may also take the form of rods that are inserted in respective holes provided in the mirror body.
Actuators 42 are provided to exert a force on the projections at a distance D from the reflective surface so as to exert a torque around a point P on or near the reflective surface. A larger distance D implies a larger torque at an equal force. The torque will bend the reflective surface for controlling its surface figure. The forces exerted on the projections 44 will generally be predominantly parallel to the surface figure of reflective multilayer 43.
Forces may be exerted in between a separate reaction plate and each projection 44, but are in the embodiment shown exerted in between two projections 44. The latter arrangement does not require a reaction plate. FIG. 7 shows an actuator 42 inserted in between neighboring projections, but may also be put in between projections that are further apart. Actuators 42 may be rod-like actuators acting along their lengths as discussed for the second embodiment. Contraction of such an actuator will induce an outward directed (convex) curvature of the surface figure and expansion will induce an inward directed (concave) curvature of the surface figure in between and around those projections on which the actuator is acting. The amount of curvature will be dependent on the thickness a of mirror body 41, the distance b between projections and the length c and thickness d of the projections.
FIG. 8 shows a variation of the third embodiment, which comprises cavities 46 on the backside of mirror body 41. A gas (or liquid) having a certain (pneumatic or hydraulic) pressure may be put in the cavities to provide pneumatic (or hydraulic) actuators acting on walls 47 of the cavities. Those walls are equivalent to the projections as discussed above. Pressure differences between neighboring cavities will exert a force on their separating wall so as to exert a torque on the reflective surface of the mirror for controlling its surface figure. Like parameters a to d as discussed above will influence the amount of curvature. A control system will control pressures in the various cavities arranged on the backside of the active reflector by supplying an appropriate amount of fluid (gas and/or liquid) through openings 48 to cavities 47. The cavities and their separating walls (projections) may be arranged in a regular (two-dimensional) array.
While specific embodiments of the invention have been described above, it will be appreciated that the invention may be practiced otherwise than as described. The description is not intended to limit the invention.
|Cited Patent
|Filing date
|Publication date
|Apr 15, 1976
|Jan 3, 1978
|The Perkin-Elmer Corporation
|Configuration control apparatus
|Aug 22, 1977
|Apr 8, 1980
|The Perkin-Elmer Corporation
|Configuration control apparatus
|Nov 25, 1985
|Apr 7, 1987
|Itek Corporation
|Variable thickness deformable mirror
|Jul 27, 1988
|Jul 31, 1990
|Thermo Electron Technologies Corp.
|Active segmented mirror including a plurality of piezoelectric drivers
|Nov 5, 1990
|Aug 25, 1992
|Litel Instruments
|Adaptive optic wafer stepper illumination system
|Nov 23, 1993
|May 30, 1995
|Hitachi, Ltd.
|Methods for measuring optical system, and method and apparatus for exposure using said measuring method
|Jun 15, 1998
|Nov 16, 1999
|Chapman; Henry N.
|Deformable mirror for short wavelength applications
|Citing Patent
|Filing date
|Publication date
|Apr 13, 2004
|Nov 1, 2005
|Asml Netherlands B.V.
|Lithographic apparatus, device manufacturing method and device manufactured thereby
|Nov 4, 2002
|Jan 10, 2006
|General Dynamics Advanced Information Systems, Inc.
|Hinged substrate for large-aperture, lightweight, deformable mirrors
|Mar 25, 2002
|Aug 1, 2006
|Carl Zeiss Smt Ag
|Adjusting apparatus for devices and for setting adjustments
|Oct 6, 2005
|May 13, 2008
|Asml Holding N.V.
|Method of using deformable mirror using piezoelectric actuators formed as an integrated circuit
|Sep 19, 2006
|Oct 28, 2008
|Canon Kabushiki Kaisha
|Optical element holding apparatus, exposure apparatus and device manufacturing method
|Dec 1, 2009
|Asml Netherlands B.V.
|Lithographic apparatus and device manufacturing method
|Apr 13, 2010
|Asml Holding N.V.
|Resonant scanning mirror
|Mar 9, 2006
|May 11, 2010
|Asml Holding N.V.
|Lithographic apparatus and device manufacturing method
|Nov 5, 2010
|Dec 3, 2013
|Cymer, Llc
|EUV optics
|Oct 9, 2013
|Dec 9, 2014
|Asml Netherlands B.V.
|EUV optics
|Jul 10, 2009
|Feb 24, 2015
|Device for correcting optical defects of a telescope mirror
|Mar 25, 2002
|Oct 24, 2002
|Klaus-Dieter Klein
|Adjusting apparatus for devices and for setting adjustments
|Nov 4, 2002
|May 6, 2004
|Sarma Gullapalli
|Hinged substrate for large-aperture, lightweight, deformable mirrors
|Apr 13, 2004
|Oct 13, 2005
|Asml Netherlands B.V.
|Lithographic apparatus, device manufacturing method and device manufactured thereby
|Oct 6, 2005
|Feb 9, 2006
|Asml Holding N.V.
|Method of using deformable mirror using piezoelectric actuators formed as an integrated circuit
|Sep 19, 2006
|Apr 5, 2007
|Canon Kabushiki Kaisha
|Optical element holding apparatus, exposure apparatus and device manufacturing method
|Dec 9, 2005
|Jun 28, 2007
|Asml Netherlands B.V.
|Lithographic apparatus and device manufacturing method
|Mar 9, 2006
|Jun 28, 2007
|Asml Netherlands B.V.
|Lithographic apparatus and device manufacturing method
|Dec 8, 2006
|Jul 12, 2007
|Asml Netherlands B.V.
|Lithographic apparatus and device manufacturing method
|Jun 23, 2006
|Jan 17, 2008
|Asml Holding N.V.
|Resonant scanning mirror
|May 18, 2009
|Sep 10, 2009
|Carl Zeiss Smt Ag
|Projection objective of a microlithographic projection exposure apparatus
|Jul 15, 2010
|Device for Correcting Optical Defects of a Telescope Mirror
|Mar 31, 2011
|EUV Optics
|Apr 21, 2010
|May 12, 2015
|Asml Holding N.V.
|Method of using deformable mirror using piezoelectric actuators formed as an integrated circuit
|Jul 24, 2012
|Jun 6, 2013
|Carl Zeiss Smt Gmbh
|Mirror assembly for extreme UV lithography system used during manufacture of integrated circuits, has actuation device which introduces fluid into cavity by exerting pressure over contact element on inner surface of mirror substrate
|Apr 4, 2014
|Oct 8, 2015
|Carl Zeiss Smt Gmbh
|Optical module comprising a deformation arrangement and method of deforming an optical element
|U.S. Classification
|359/291, 359/224.1, 359/849, 250/492.22
|International Classification
|Cooperative Classification
|European Classification
|Sep 5, 2001
Owner name: ASM LITHOGRAPHY B.V., NETHERLANDS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:VAN DIJSSELDONK, ANTONIUS JOHANNES JOSEPHUS;LOOPSTRA, ERIK ROELOF;FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS;REEL/FRAME:012137/0301
Effective date: 20010823
|Mar 28, 2002
Owner name: ASML NETHERLANDS B.V., NETHERLANDS
Free format text: CHANGE OF NAME;ASSIGNOR:ASM LITHOGRAPHY B.V.;REEL/FRAME:012735/0001
Effective date: 20020125
Owner name: ASML NETHERLANDS B.V.,NETHERLANDS
Free format text: CHANGE OF NAME;ASSIGNOR:ASM LITHOGRAPHY B.V.;REEL/FRAME:012735/0001
Effective date: 20020125
|Jan 10, 2008
|Fee payment
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|Sep 22, 2011
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|Jan 12, 2016
|Fee payment
Year of fee payment: 12


text:
Cleopatra Mathis
Professor of EnglishFrederick Sessions Beebe '35 Professorship in the Art of Writing
The lessons that literature can hold for students as they go from Dartmouth into the world can be life-changing. I want students to recognize the cruciality of language in how we relate to ourselves and others. As a poet with seven books, I am devoted to the teaching of that genre. Equally important is the relationship poetry holds with other forms of literature, criticism, and all the arts.
213 Sanborn
B.A. Southwest Texas State University
M.F.A. Columbia University
Selected Publications
Book of Dog, Sarabande Books, 2013
White Sea, Sarabande Books, 2005
What to Tip the Boatman? Sheep Meadow Press, 2001
Guardian, Sheep Meadow Press, 1995
The Center for Cold Weather, Sheep Meadow Press, 1990
The Bottom Land, Sheep Meadow Press, 1983
Aerial View of Louisiana, Sheep Meadow Press, 1979

subset: commoncrawl


text:
Ars Technica looks at iPod Mini pricing
Related Stories
- iLounge reader creates all-wood iPod mini, accessories
- iPod mini still a popular choice
- Apple threatens Korean company over iPod knockoffs
- Report: Samsung woos Apple with cheap flash prices
- HP to sell iPod mini
- iPod mini price cut 'bad news for the competition'
finally an unbiased look at what i've been saying all along..WITH PROOF!!
I read that earlier..good read.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 2:53 PM (CST)
I still think more people are going to make the apple to apple comparison rather than the iPod mini in terms of lower end flash players, apple needed to make it more of an obvious price difference in my opinion. But they will still fly off the shelves by a very ignorant market.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 3:33 PM (CST)
Apple is playing a dangerous game by strategically concentrating on getting people to compare MiniPod pricing with Flash players for around the same price. All well and good except for several things:
Capacity. You can buy 20GB Zens for around the same price as a 4GB MiniPod. Apple are trying to compare down the price scale… but many consumers will compare up.
Competitors. The MuVo 4GB is $200 in Best Buy and Amazon. At those levels, even a $50 difference is hyper sensititive for many people.
Features. Flash players usually have FM. And their batteries last 20+ hours. And they never, ever, ever, ever, ever skip. And they are half the weight and size of even the Mini iPod. For many people, flash players are a better fit than the Mini iPod.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 3:45 PM (CST)
Some people will choose the mini vs. the flash competitors. It doesn't matter if everyone makes that comparison. Some will—or there wouldn't even BE 512 MB flash players at all.
And when other people compare the two iPods and spring for the higher-margin 15 GB iPod—as many should and will—that too is GOOD for Apple, not just the user.
It's win-win. Compare the mini to Flash players and Apple wins. Compare it to the 15 GB iPod and Apple wins. And in either case, the user can choose what is best for THEM.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 3:55 PM (CST)
Right now the iPod Mini Silver is at sales rank 158 on Amazon.
Out of tens of thousands of products on sale at amazon, I'd say that ain't bad. Especially for a pre-orderable item that isn't even shipping yet.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 4:59 PM (CST)
My take is that Apple is PURPOSELY trying to keep down demand until they have enough volume to fill it. Setting the price as they did would cause this. There have been many reports that prices will be coming down in less than six months. I can't verify that at all. It is just my impression of why they priced it as they did. Anyone have any numbers as for production vs demand?
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 5:07 PM (CST)
If Apple hadn't upped the 10gb to 15gb on the day they released the mini then everyone would be saying 4gig mini 50 bucks less then 10gig iPod. The 10gig would look redundant. There are people on this sight saying how good value their second hand 5gig is for the money - forgetting it was 399 new. It seems to me that if it had been 199 then people would be saying they could have cleaned up at 149, or 129. They could corner themarket tomorrow at 99 bucks - they would go bust in the process, however. In time they'll be cheaper anyway.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 5:57 PM (CST)
Oh yeah - if they released a 1gig flash player tomorrow for 199 some would say - that's only 50 less than a mini. It will go on till judgement day.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 6:00 PM (CST)
The one thing I think is missing from the whole argument is the idea of exclusivity. Sure, Apple could price the thing lower and get much better market share… but that would diminish one of the key aspects of the iPod: the fact that it's somewhat of a status symbol and it's not something the masses can't just go out and buy. When people stop saying, "Oh, you have an iPod? Wow!" then it's over.
Let's face it, the regular iPods cost a fortune. Many of us have sunk well over $500 into them with all the accessories. When's the last time you spent that much on a walkman or a discman? It's unheard of. The iPod needs to be priced slightly above what it's worth on technical merit alone. Sure, the iPod is a better machine than the Nomad Zen or the Dell DJ, but on a technical level it's not better enough to justify the price difference. We paid it because we had to have iPods.
It's the same with the mini. You need people to say, "Yeah, I could get a MuVo2 for $200… but for just a little more I can get an iPod!"
If Apple dropped the price, Creative and Rio would be forced to drop their prices in the short term, as well… since the "iPod image" would still be worth a premium. But eventually, if everyone gets iPods, that image will diminish and that would be a bad thing. So I think there's no reason for Apple to price this thing much lower… especially given the other prices in that article.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 6:24 PM (CST)
I am just happy to get a player that will work with iTunes!! :-)
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 6:30 PM (CST)
You're right kauffee. If the government gave out free iPods sites like this would cease to exist. An iPod is a luxury - as such it commands a luxury price. The surprise is that it isn't dearer than the Creative equivalent.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 6:32 PM (CST)
You can use iTunes to manage Archos, Nomads, iRivers. Probably Rios as well, but I haven't seen that yet.
It's just a matter of installing an iTunes plugin. I don't think the iPod-iTunes connection is as exclusive as Apple wants it to be.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 7:03 PM (CST)
I think it's more about the iTunes Music Store than managing the player with iTunes (which I find horrible on PC's ... it's bloaty and slow).
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 7:12 PM (CST)
Quality matters to me. 128K AAC just sounds muddy. I prefer APS Extreme MP3 - averages around 210 Kbps, sounds divine. That's why I prefer to buy CDs and rip them myself. The iTunes store holds no attraction for me - plus I get my CDs second-hand for around $5. I am also wary of buying vaporous downloads over real CDs. What if God Forbid some time in the future I wanted to move my music to some other player? If it was all AAC I'm in trouble. CDs give me flexibility.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 7:16 PM (CST)
If capacity was the only thing on people's minds then they would be lining up to buy this $150 20GB mp3 player.
But they are not.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 8:02 PM (CST)
Just for the record…not everyone that buys an ipod does so for the so called "coolness" factor. Personally, I could give a rats ass if everyone in the world had one. As long as mine is filled with music I will be happy. And I promise you that I will abandon the ipod when it is not the best, no matter how "uncool" the better one is.
Posted by Dennis Lloyd in Irvine, CA on January 27, 2004 at 11:41 PM (CST)
Even if Apple hadn't upped the 10gig to 15, people would still complain that "for $50 more you can get 6 more gigs".
- narco
Posted by Dennis Lloyd in Irvine, CA on January 28, 2004 at 12:10 AM (CST)
I would have rather had Apple save a few r&d dollars and release a 5-6GB ipod in the 3g form factor for 199. Yes, the minis are cool, but they're a tad expensive. As the current situation stands, I'd rather spend a few extra dollars for a slightly larger, full-sized, 15gb iPod.
An inexpensive full-sized iPod would have been just as effective as a mini iPod in making people think twice about flash based devices. The mini part in my mind is just a marketing gimmick (gotta admit though, the new control pad on the minis are neat). Big or small, iPods are great… and that's coming from someone who owns and loves an mp3/hd device made by someone other than Apple!
Posted by Dennis Lloyd in Irvine, CA on January 28, 2004 at 12:12 AM (CST)
Here's what I think Apple is up to. While supplies of the ipod mini ramp up, Apple wants people to take a serious look at there higher end models. As time passes and sales of the ipod mini start to level off - Apple will probably lower the price to $200 and introduce a new design for the higher end models at the same price - thus creating demand for both the ipod mini for those who want small at $200 max and creating demand for those who want good price/memory ratio of the big boys in a new and improved ipod mini type design.
Posted by Dennis Lloyd in Irvine, CA on January 28, 2004 at 12:15 AM (CST)
Posted by Dennis Lloyd in Irvine, CA on January 28, 2004 at 3:35 AM (CST)
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Kirk Binning
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I love the history of Southeast North Carolina. Let me help you with your research.
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Ken S.
Hi Kirk,
Thank you, for the transfer of William to. He is now with the rest of my family.
Ken S.
Added by
Ken S.
on Oct 01, 2015 6:10 AM
Casey Bridges
Willie and Martha Pearson
Thank you for the photos of the grave.
Added by
Casey Bridges
on Jul 06, 2015 6:36 PM
Pleasant Grove Baptist Church Cemetery
Thank you for adding the Hoyle family grave photos from Pleasant Grove Baptist Church Cemetery. I really appreciate your doing so!
Added by
on Jul 05, 2015 7:57 PM
Thank you so much for the picture! :)
Added by
on Jul 05, 2015 4:03 PM
Kathryn Wagner
RE: Nora Dozier
Thank you so much for letting me know, and I'm glad that my thoughts were correct. I am glad to be a part of more accuracy in anyone's history. I appreciate your considering my ideas ... and really enjoyed reading about the family. They were quite the family ... indeed ... and I loved the family portrait on the first page. One doesn't see a grand family portrait like that often from that era. Take care, and God bless. Thanks again for letting me know.
Added by
Kathryn Wagner
on Apr 16, 2015 2:06 PM
Kathryn Wagner
RE: Nora FoyI
Thank you so much! I will look into the Foys. Their obituaries were fascinating, and I know that I'd enjoy reading more about them. Do let me know about the "birth mother" situation. I'm really interested. As I said, in my mother's obit, it never mentioned her birth mother, although she was well aware of who she was. She had died, when my mother was two, so the only mother she really knew was her stepmother ... and considered her "Mother". I linked her birth mom with the edit tab for parents - and then put a link in her bio WITH a story about how "my grandmother", who was actually my stepgrandmother had raised her. So, I know that "things aren't always what they seem", and when looking at her birth date ... and the date of death for her dad's first wife ... I figured that the first wife had to be the mom. The names are WAY confusing for both, aren't they? What would be the chances of marrying 2 Sarahs ... with the same last names? LOL Thank you for letting me know and for your response. God bless!
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Kathryn Wagner
on Apr 13, 2015 3:42 PM
fallen acorn
Clarence Gravey
Thank you for the picture of Clarence Gravey's memorial stone. I appreciate your time and efforts in helping me. May you have a great day.
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fallen acorn
on Feb 20, 2015 1:58 PM
Chris Nelson
Simpson & Mary Aycock Photos
Hi Kirk,
Thanks for getting these pictures. Much appreciated!
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on Jan 19, 2015 7:30 PM
Ginger Addis
Catherine Sandlin
Thank you so much for such a quick response, good picture and for what you do.
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on Jan 19, 2015 4:31 PM
Jean MacCallum
John W. Rowe
Thanks so much for the transfer... I am so proud of g-g-GF SGT Rowe's Confederate service! :) I hope to visit his grave this year and leave a small CS flag!!
God bless,
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ARLINGTON, Va. (WJLA) - D.C.-area resident Ira Goldman has been in defense mode the past couple of days.
He's defending his knees.
He's defending his Knee Defender.
He's defending his invention.
And all because of what happened on a United Airlines flight last Sunday.
Passenger in front can't get her seat to recline because the passenger seated behind is using his Knee Defender, a $22 contraption that clips onto a tray table and prevents reclining by the person in front.
Woman gets mad. Flight attendants asks man to remove it. He doesn't. Woman throws glass of water in his face. Plane makes an unscheduled landing because of the fracas.
Media madness ensues.
Goldman's initial reaction?
"My first reaction was, after 11 years, one idiot bought the product and didn't follow the instructions," he said Wednesday during a phone interview on News Channel 8's NewsTalk. "Every Knee Defender ever sold has said (to) listen to the flight crew.
"The website says that, the instructions say that, and listen -- that was the problem."
So why'd you invent the Knee Defender?
"At 6-foot-3, I'm certainly taller than average but not exceptionally so (but) when I sit down in a seat. . .in the plane, my knees are already touching the front of the seat in front of me."
"So (even) without a knee defender, the person in front of me is not going to be able to recline because my legs are there."
And ?
"If I use the knee defender, I can see them trying to push back and I can say, 'Excuse me but my legs are so long there's no room back here,' versus that person banging me in the knees and THEN saying, 'By the way, there's no room back here.' ''
But isn't that unfair to the person seated in front of you?
"If you have a baby in a car seat on a plane, which is now legal under the FAA, the baby car seat will stop the seat from reclining. My knees will stop the seat from reclining, so are my knees illegal because they interfere with the reclining?"
But aren't you preventing the person in front from, say, taking a better nap?
"The concept that you have a right to recline defies physics, because people's legs are back there. It's (a matter) of common courtesy."
And if the airlines crack down completely on the Knee Defender?
"I think people have a right to defend themselves from being hit, and if the airlines want to step in, they can get their lawyers prepared to deal with the consequences."
The defense rests.


text:
[Previous PotM Winner][July] If you were were a mod...
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July 10th, 2013 (1:23 AM).
Nakala Pri
Join Date: Nov 2012
Nature: Naughty
Posts: 2,386
I would be playful, not at all intimidating and I would give people warnings. If they ignored me completely, then I would call in the big guns. >:T
I would love to hand out Emblems and stuff. That would rock!
Nakala Pri
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This is the day you'll remember when you checked this thing >8D
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Your suggestions for Essentials
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February 8th, 2012 (7:44 AM).
Ho-oh 112
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Join Date: Feb 2011
Age: 20
Gender: Male
Nature: Hasty
Posts: 311
Originally Posted by
Also, support for boulder pushing puzzles, especially ones like pushing boulders through holes in the floors and onto switches that appeared in gen1 games in most caves, would be very appreciated.
Being able to have multiple roamers of the same species would be cool. Events like having the player clear out a swarm of ghosts from a room would be much easier to pull off.
1. I have successfully made a boulder pushing puzzle WITHOUT SCRIPTING, you just need to read the map x/y of the puzzle and when they are correct an autorun/parrellel process runs the effect.
2. I thought this was already possible (didn't check yet...)
3. I would like to see a universal screen like the i-pad and other things it's 1 screen but you can touch(in this case click) on an object and something will happen(mostly used for Guis....) but using these for pokedex scrolling/battles/pokegear it could be better(in terms of features, I really hate using the D-pad in the hand-held games for typing my name/ other processes that may take a while(1 minutes+) excluding battles though...)
Scripting Level: Advance
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text:
I have two tables, has-many relationship, in the master add.ctp, allow user to upload 0~5 files(file path information are stored in details table)
I want to dynamically display attachment(detail) form in the master/add.ctp
1, user choose number of files want to upload from dropdown list,
echo $this->Form->input('attachments', array( 'options' => array(1, 2, 3, 4, 5),'empty' => '(choose one)', 'onchange' => 'showNumber(this.value)'));
then forloop
echo $this->Form->input('attachment_path', array('type'=>'file','label' =>'Attachment, Maximum size: 10M'));
//but I don't know how to capture this.value, I know Javascript can not pass value to php.
or user click 'add another attachment' link, then detail form shows up.
How to achieve this function, any help would be appreciated.
I have read this article: Assign Javascript variable to PHP with AJAX and get same error: the variable is undefined
Edit: http://cakephp.1045679.n5.nabble.com/Adding-fields-to-a-form-dynamically-a-complex-case-td3386365.html
'For each field use a default name with [] at the end (which will make it stack like a array) example: data[][book_id] after the fields have been submitted'
Where should I place the []?


text:
OKC Thunder-Miami Heat: Five questions for Sunday's game
No one on either side will admit it.
But they don't have to. We all know the truth.
Sunday's game inside Chesapeake Energy Arena is as big as it gets.
The Oklahoma City Thunder will host the Miami Heat in the first meeting between the two teams this season and, in terms of significance, this battle of conference heavyweights could hold far greater implications than any other regular-season game.
This could be an NBA Finals preview.
Oklahoma City continues to sit atop the Western Conference standings, as it has all season. Miami, meanwhile, is second in the East but still holds a trump card over first-place Chicago from last year's playoffs.
While a handful of teams could derail the Thunder and Heat, it certainly appears as though both teams are on a collision course to meet again for all the marbles in three months.
With that as the backdrop, Sunday's game is worthy of close scrutiny. The things that occur in this contest could serve as clues for what type of Finals series we'd be in store for. And both teams have plenty to prove against each other.
Ignoring the obvious matchups involving the stars, here are five important questions for Sunday's game, as they could come into play in June.
Does Miami have an answer for James Harden?
The playoffs are all about matchups. And in those matchups, an X-factor routinely makes all the difference. Harden has shown his ability to be that X-factor for the Thunder. The Heat, however, don't have a player outside of its stars who can match Harden's offensive production and might not have a player on the entire roster who can stop Harden. LeBron James and Shane Battier are big, physical forwards who figure to give Harden the most fits. But the more they key in on Harden, the more liberty it will give Kevin Durant and Russell Westbrook.
How will OKC's transition defense stack up against the Heat's fast break?
There isn't a better team in the league at turning mistakes into made field goals. Statistically, Denver ranks first in fast break points. But those numbers are a little skewed considering the Heat handle business in three quarters most nights. Officially, Miami is tied with OKC for sixth in fast break points at 16.1 per game. But trust us, the Heat are more dangerous than any other team on the break. How the Thunder defends Miami's transition game will be key, because it's been a bit of a problem area for the Thunder this season. OKC is around the middle of the pack in opponent fast break points, allowing 12.7 per game. The key to the Thunder's success starts with taking care of the ball. The Thunder leads the league in turnovers at 16.5 per game. And if OKC turns it over at a high rate against Miami, it has no chance of stopping the Heat in transition.
Which team executes better down the stretch?
It's been well-documented how both teams have struggled with half-court offense the past two seasons, particularly late in games. This is a chance to see which team plays like the more mature bunch when easy baskets aren't available, especially in crunchtime. In James, Dwyane Wade, Kevin Durant and Russell Westbrook, both teams have a pair of the best closers in basketball. At times, though, it's been each team's over-reliance on their stars, in addition to unimaginative offense, which has led to late-game struggles. The team that shows the most discipline in running through sets and doing small things like setting solid screens and running hard off of them could have a leg up. Of course, there's always the chance that whichever team's star has it going the most is the side that's going to win. If that happens, nothing else will matter.
Can the Heat survive the Thunder's size advantage?
Miami doesn't have a dominant big man on either end of the floor. After starting power forward Chris Bosh and center Joel Anthony, the Heat have a huge drop off. Udonis Haslem is a rugged reserve at power forward, and Miami is hoping Ronny Turiaf can still supply some productive minutes. And even though the Thunder lacks an interior scorer, the Heat could get pounded on the glass. Many have called the Thunder's four-man rotation of Kendrick Perkins, Serge Ibaka, Nick Collison and Nazr Mohammed the best in basketball. They've had their share of problems against athletic big men and big men with versatility. But the Heat don't have much of any of that. It could be a chance for the Thunder to dictate the style and tempo of the game.
Can Miami win in OKC?
The Thunder has been dominant at home save a few recent slip-ups. Therefore, if the Thunder handles the Heat rather easily it could provide another shred of evidence that it's absolutely critical for the Thunder to get home-court advantage through the Finals. Dallas defeated Miami in last year's Finals despite not entering the series with home court advantage. But the Mavs stole it from Miami in Game 2 before winning the series on the Heat's court in Game 6. We're not sure the Thunder is quite there yet, although OKC did win three road games — one in each of its three series — in last year's postseason. The Heat are currently 20-2 at home, and in last year's postseason they came one win shy of tying Chicago's 1996 record of 10 straight home wins. That's why failing to get home court through the playoffs could be costly for the Thunder if it does indeed meet the Heat. In the NBA Finals, the seven-game series format changes to 2-3-2, and it's extremely difficult in an even matchup to win three straight, even at home. In fact, since the Finals series changed to its current format in 1985, only five teams have won all three middle games. And only two of those teams were the host teams.


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Red Curry Salmon With Bok Choy and Pineapple Slaw
- 1pound baby bok choy, thinly sliced (4 cups)
- 1/2 medium pineapple, cut into bite-size pieces
- 1cup fresh cilantro leaves
- 4tablespoons canola oil
- kosher salt and black pepper
- 1tablespoon Thai red curry paste
- 1teaspoon light brown sugar
- 1 1/4pounds skinless salmon fillet, cut into 4 pieces
- In a medium bowl, toss the bok choy and pineapple with the cilantro, 3 tablespoons of the oil, ½ teaspoon salt, and ¼ teaspoon pepper. Let sit for 15 minutes before serving.
- Meanwhile, heat broiler. In a small bowl, mix together the curry paste, sugar, the remaining tablespoon of oil, ½ teaspoon salt, and ¼ teaspoon pepper.
- Place the salmon on a foil-lined broilerproof baking sheet and, dividing evenly, brush with the curry paste mixture. Broil until the salmon is opaque throughout, 5 to 7 minutes. Serve with the slaw.


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Saturday, May 28 and Monday, May 30 for Memorial Day.
A popular feature of The Milwaukee Journal from 1963 through 1994 prepared by library staff to highlight Milwaukee's past as preserved in the Historic Photo Collection
Book searching coming soon. For now use County Cat
Doing research or looking for magazine articles? Search across multiple EBSCO databases at once. Discover all the EBSCO database subscriptions available at the Milwaukee Public Library. Most of the databases are provided as part of Wisconsin's BadgerLink program.
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Create ringtones on Audiko.net! Here is a chance to download a free Busy Signal ringtones for your iPhone or mobile. Cut your favorite measures from your favorite award-winning track - Busy Latino, Sweet Love (Night Shift), Night Shift, or any other track. Then download the prepared Busy Signal ringtones to your gadget, and enjoy Dancehall music by Busy Signal every time your phone rings. If you adore Dancehall or maybe Reggae and Bashment music, then you will probably like bugle, Movado, or Ward 21 as well. For all who want a free Busy Signal ringtone, we also recommend listening to ragga, Jamaica, and . You are free to receive your tune both in the MP3 and m4a formats, compatible with both mobile phones and iPhones. Just select a track, and choose free Busy Signal ringtones download option.
Download Busy Signal Ringtones
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|Everybody Move
|#Text Message
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|Come Over
|Sports Day
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Busy Signal
Busy Signal
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text:
Rel Principal
Michelle Stone
Team Leaders
Amy Anderson - Early Stage 1
Deb Barrett - Stage 1
Natalie Goodman - Stage 2
Nicolle Gadd - Stage 3
Teaching Staff
Early Stage 1
Amy Anderson - K/1A
Karen Bulloch - KB
Jessica Tysoe - KT
Anekke Bateman - K/1B
Stage 1
Steve Sutton - 1S
Melinda Moore - 1M
Anekke Bateman - K/1C
Deb Barrett - 2D
Tara Turner - 2T
Kerrie Koppman - 1/2K
Kristy Davies - 2/6D
Stage 2
Bill Fisher - 3/4F
Nalatie Goodman - 3/4G
Sarah Hollingsworth (M/T/W/Th) - 3/4H
Peta O'Neil (F) - 3/4H
Kelly King - 3/4L
Cathy Tisdell - 4/5/6C
Kristy Davies - 2/6D
Stage 3
Nicolle Dry (Tech Class) - 5/6M
Cathy Tisdell (Art Class)- 4/5/6C
Nicolle Gadd (Performing Art Class)- 5/6G
Maclain Smith(Tech Class) - 6S
Kristy Davies - 2/6D
Learning & Support Teachers
Karen Sammut
Fiona Curtis (W)
RRF Teaching Staff
Karen Morrow (M/T/W)
Rochelle Dewar
Christie Jack
Lisa Hecht (F)
Angela Byrnes (W/Th/F)
Vanessa McCarthy
School Counsellors
Bob Cotterill (F)
Wayne Hill (M)
Support Staff
Katrina Rossetti - School Administration Manager
Carol Murch - School Administration Officer
Audrey Lyons - School Administration Officer
Steve Arrell - General Assistant
Teresa Finnie - School Learning Support Officer (2/6D)
Benita Newcombe - School Learning Support Officer
Lee Lyell - School Learning Support Officer
Gareth Davy - School Learning Support Officer
Megan Woodhead - School Learning Support Officer
Lynne Jeffery - Canteen
David Mitchell - School IT (W)
Our professional, university-educated teachers encourage students to develop a love of learning and a desire to succeed. They maintain the highest integrity and concern for your child's wellbeing.
The principal is responsible for the educational leadership and management of our school. If you would like to speak to the principal, please contact us to make an appointment.
Our school administrative staff can answer your enquiries or direct you to the appropriate staff member for help.


text:
It's Faithy! I thought I'd try doing him a little more realistic, but got too lazy to stick in the wings XD
About 4 hours PS CS4 ^^
About 4 hours PS CS4 ^^
Looks like Firestar wolfinized (whatever you call it)
O.O that's awesome.....goldy??
I has a 3D notebook.
I tried to pet the wolf. lol ^^
I tried to pet the wolf. lol ^^
MARVELOUS work AND GALLERY!! .... LRW.
holy. crap.
thats awesome
thats awesome
IT'S FAITHY! (lawl) I love faithy. The first video you made of him was the first video I saw of yours. (That was back in 2010) I have loved your art ever since.
OMG Another amazing picture! Of course, all of your drawings are always and will always continue to be awesome! Great job!
GORGEOUS. LOVE the fur.
Very beautiful ~^.^~
Golden Wolf
He 's beautiful !
He 's beautiful !
I LOVE FAITH!!! x3
and its AWESOME
and its AWESOME
Ohhh, I am always so jealous on how awesome you do these pics, and you don't even try.
You are one of my many role-models
You are one of my many role-models
Love the fur, foreground effect, and sky~!!!
Faaaaaaaaaaaaaaith. I like him in the realistic style! SO FLOOFY
wow, so absolutely beautiful!! i love how the fur just seems to flow, and the light in Faith's eyes!!
This is awesome, the only thing is the muzzle looks a little weird to me somehow. It seems a little twisted, but that's probably just me. xD
That looks beautiful! :')
daw he's so cute! but, i thought faith wuz a girl. O.O sorry!
Hehe he's both - because Faith is the physical embodiment of happiness, and because happiness is not specific to gender, Faith can actually be male or female - whichever you prefer to use. Sometimes I make Faith a female. others a male. In this pic I guess she's kinda neutral
ahh got it, i thought he/she was a little character of yours and you she wasn't really a "physical embodiment" lawl. I still luv her!
very nice
omg thats amazing!! you do fur texture so beautifully i love the background too :3
That's absolutely gorgeous, Golden. *w*
Faith. It's a nice name for a wolf.
Can I draw Faith?
Sure thing - I'd be honoured
Yay, does he have a ref?
lol, he really should but I haven't gotten round to giving him a proper one yet. Also because of Faith's nature I like to leave his interpretation to whoever is drawing him
Wow, the fur is amazing. Did you draw every single hair on your own? Wow
This is beautiful! He looks so soft!
wow this is beautiful <3
It's amazing! I love this...
But you should make the wolf's smaller, or more in the eye socket. But don't you worry - this is amazing. I loved it...
But you should make the wolf's smaller, or more in the eye socket. But don't you worry - this is amazing. I loved it...
beautiful, nice work
Wow... thats beautiful, looks like a photo
Gorgeous! through I guess you were bored doing it?
Looks fantastic! congratulations. Im going to post it on my facebook too to show it to everyone.


text:
30 May 2012 7:02 AM #1
How to change the color of titlebar
Can anyone help me to change the color of my titlebar.Is there any simple method to do it or we need to use css.
Which property should be used for css and where to write the code of css.
30 May 2012 10:26 AM #2
- Join Date
- Mar 2007
- Location
- Melbourne, Australia (aka GMT+10)
- Posts
- 1,093
- Vote Rating
- 56
everything is css, in 4.x you can do this with compass... either way:
open firefox with firebug installed (or chome) right click and select inspect element, then use css panels to see what classes require override.Lead Trainer / Sencha Specialist
Community And Learning Systems
Lead Architect
1 Jun 2012 1:54 AM #3
try to give a class to your panel ....like 'sampleColor'.
and try this in your css after default css file of extjs:-
.sampleColor .x-panel-header{ color:'red !important' //do what ever you want but don't forget !important }sword-it.com, Sencha Developer House in Turkey - Istanbul University Technopark Suite 204.


text:
Take A Census
powers-old-account 270000NC1K Visits (1844)
The Fierce Government, "the Government IT News Briefing" site, posted a story titled "Federal CISOs remove the 'human element,' focus on known risk" about an Information Week sponsored event called the "Government IT Leadership Forum." The story lede focused on calls to focus on solving security problems "at scale." By that they mean if you have a large scale security problems, don't try to solve them with solutions that only work at small scales. In particular there was discussion about how relying on people to directly address shoring up security vulnerabilities doesn't scale. The emphasis should instead be on large scale automation of security management. Hey, no argument from me and I'll kindly point you to IBM's acquisition of BigFix for exactly that same reason.
But the story that from that conference that actually caught my eye came from the US State Department's Chief Information Security Officer, John Streufert.
As described, it sounds like Streufert didn't follow the usual definition of risk = likelihood * impact. Fine. Whatever. What impressed me is that rather than starting with a laundry list/control set like FISMA, he actually took a "census" of his known past incidents. That enabled his department to put a prioritization method in place and vastly improve their patch rates, especially for remote, overseas offices.
The strategy cuts both ways of course. On the one hand, people can argue if you stay too focused on just your past incidents, you're likely to miss other big vulnerability areas that haven't been exploited yet. So you need to conduct a through risk analysis and standard control catalog like FISMA. On the other hand, if you look at a standard control set and take the approach of trying to implement all the controls everywhere, you'll never be done and you might not have the attention span/resources to address the most basic known issues.
The "Take a census" approach to prioritizing vulnerability mitigation work will help offset the security control laundry list trap we fall into sometimes.


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A federal judge has issued a six-month stay in the civil lawsuit filed by a former Miss Washington USA contestant who claims she was raped by illusionist David Copperfield while on his private island in the Bahamas.
A federal judge has issued a six-month stay in the civil lawsuit filed by a former Miss Washington USA contestant who claims she was raped by illusionist David Copperfield while on his private island in the Bahamas.
U.S. District Judge John Coughenour stayed the case on Tuesday at the request of Copperfield so the U.S. Attorney's Office in Seattle can complete a criminal investigation into the woman's allegation.
The woman filed the suit in July just before a two-year statute of limitations for filing a civil lawsuit was about to expire. While the lawsuit identifies her, The Seattle Times has not published her name because of the newspaper's policy to protect the identities of alleged victims of sexual assault.
- Students seeking sugar daddies for tuition, rent
- Seattle-based seafood company shuts down
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Most Read Stories
The woman alleges she was attacked by Copperfield while visiting the 52-year-old illusionist's $50 million private island in the Bahamas in July 2007. The woman said she met Copperfield, whose real name is David Seth Kotkin, during a performance in Kennewick.
Copperfield, who is one of the wealthiest entertainers in the world, denies any sexual assault and claims the woman is a gold digger.
Copperfield recently sought a stay in the woman's civil suit, saying he was being put in the untenable legal position of having to provide information in the civil case that could be used against him in a criminal prosecution. His attorneys argued that Copperfield might have to invoke his Fifth Amendment protection against self-incrimination in the civil case, because disclosures there could be used against him in the criminal investigation.
The woman's attorney, Becky Roe of Seattle, has agreed to the stay, saying her client has already waited two years.
Prosecutors have said they are close to winding up their investigation and said a decision on whether to file criminal charges would be made in the next six months. Coughenour set a status hearing for the case in March.
Mike Carter: 206-464-3706 or email@example.com


text:
Gimmicks by BKE Pieced Shirt
Sorry, this product is currently not available on buckle.com.
- Pieced lace and chiffon shirt
- Oversized dolman sleeves
- Body length 23" on size medium
- Self: 65% Ramie, 35% Cotton. Contrast: 100% Polyester.
- Hand wash cold. Do not bleach. Hang dry.
- Made in Vietnam.
Have a Question?
- Body length 23" on size medium.


text:
Meet AGA's Next National President: Richard V. Norment, CGFM, CIA
Force, Marie Sullivan, The Journal of Government Financial Management
Richard Norment has the reputation in the Tennessee Comptroller of the Treasury's office as the "go to" man for information that others would never find on their own. His files are legendary, his organizational skills second to none. Now as Norment prepares for his year as AGA's "go to" man, he plans to put these skills to work for the Association, using the theme "Lead to Succeed."
At 58, Norment serves as the director of the division of county audit and assistant to Comptroller of the Treasury John G. Morgan. He and his staff of 92 oversee annual audits of the state's 95 counties, with 87 of the audits actually performed by his staff.
A protege of William R. Snodgrass, who retired two years ago after a remarkable 44-year term as comptroller, Norment is the second member of the Nashville Chapter to hold AGA's highest elected position. Charles L. Harrison, CGFM, director of management services and also an assistant to the comptroller, was National President in 1992-1993. Harrison, Norment and other members of the Nashville Chapter are credited with establishing AGA's Annual State and Local Government Leadership Conference in 1992. Snodgrass recently expressed great pride in seeing his staff rise to leadership ranks within the Association and the profession.
The group of AGA members who started the Nashville Chapter in 1977 has worked together in the comptroller's office for more than 30 years. Norment, who served as AGA National Treasurer in 1997-1998, has logged more than 34 years in state government and says the job has never bored him. He says he vividly remembers his first days and never once thought-"I've got 30 years to go before I can retire" He acknowledges that government jobs will never be as financially rewarding as private sector positions, but he can't imagine being more fulfilled by any career.
"I tell our younger employees that I don't look at these 34 years as an eternity," he says. When he had just started his career, he says he was told by someone he respected that government would be a good place to start, but it was not the place to make a career. "I almost didn't do it because of that negative comment."
Norment believes the example set by Snodgrass and continued under his successor John Morgan, has probably kept an entire group of people-including fellow AGA members Arthur Alexander, CGFM,Arthur Hayes, CGFM, Bob Powell, CGFM, Barbara White, CGFM, and Harrisonhappily employed for many years. "He was demanding," Norment recalls of Snodgrass, still a close friend and frequent lunch partner, "but we had freedom too. No one had to punch a clock. You might not talk to him for a week or two, but when he was ready to talk, you had better be ready with the answers"
He hopes to take the pride and professionalism he has found in Tennessee to the national stage as AGAs President. "In our office, we have a tremendous amount of pride in our work and in the fact that we are respected by the local governments we have oversight of," he says, adding that he wants to help to instill more of that pride in AGAs members and encourage them to share the message with others. …


text:
FCPA Compliance and Ethics Report-Episode 241 on Human Trafficking Compliance
FCPA Compliance and Ethics Report-Episode 169-the First Mailbag Issue
FCPA Compliance and Ethics Report-Episode 108-Supply Chain Under the FCPA
In this client alert we discuss the implications of the transition to a 'circular economy' for producers of, and traders in, raw and/or recycled materials of all kinds, manufacturers of products and actors in all stages of...more
It's Friday and time for another overview of developments in the field of business and human rights that we've been monitoring....more
Companies face a range of new requirements and expectations calling for enhanced transparency regarding human rights-related risks in connection with their operations. Responsible compliance with both mandatory requirements...more
It's time for another rundown of five developments in the field of business and human rights — and broader corporate social responsibility — that we've been monitoring....more
As discussed in this Bloomberg article, Costco and some of its suppliers are facing class action litigation alleging that Costco misled consumers about the use of slave labor and human trafficking in its supply chain for the...more
News reports on human rights issues have become a steady drumbeat for companies in a variety of industries that operate in and source from nations in the developing world. The risks to companies posed by human rights abuses...more
Agricultural sector companies, and companies with large agricultural supply chains, face new scrutiny from investors and other stakeholders concerning human rights-related risks in their corporate supply chains. Key issues...more
As memories of New Year's Eve fade, and another Inauguration Day winds down in Washington, D.C., it's time to look ahead and identify key events and emerging trends that we think will help shape the business and human rights...more
With an effective corporate social responsibility (CSR) policy that adequately addresses supply chain issues, a company can better manage legal, reputational and economic risks.
A company risks legal, reputational and...more
Twenty years ago less than 100 companies worldwide disclosed or reported on their supply chain compliance or corporate social responsibility (CSR) practices. Those that did were trailblazers supporting the idea that...more
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